USD893441S1 - Base plate for a processing chamber substrate support - Google Patents

Base plate for a processing chamber substrate support Download PDF

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Publication number
USD893441S1
USD893441S1 US29/696,587 US201929696587F USD893441S US D893441 S1 USD893441 S1 US D893441S1 US 201929696587 F US201929696587 F US 201929696587F US D893441 S USD893441 S US D893441S
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US
United States
Prior art keywords
base plate
processing chamber
substrate support
chamber substrate
view
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Active
Application number
US29/696,587
Inventor
Shreesha Yogish Rao
Mukund Sundararajan
Cheng-Hsiung Tsai
Manjunatha P. Koppa
Steven Sansoni
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
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Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/696,587 priority Critical patent/USD893441S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: TSAI, CHENG-HSIUNG, KOPPA, MANJUNATHA P., RAO, SHREESHA YOGISH, SANSONI, STEVEN, SUNDARARAJAN, MUKUND
Priority to TW108308059F priority patent/TWD212933S/en
Priority to TW108308059D01F priority patent/TWD214516S/en
Priority to JPD2020-45F priority patent/JP1679836S/ja
Priority to JPD2020-20290F priority patent/JP1679911S/ja
Application granted granted Critical
Publication of USD893441S1 publication Critical patent/USD893441S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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FIG. 1 is a top isometric view of a base plate for a processing chamber substrate support, according to the novel design.
FIG. 2 is a bottom isometric view thereof.
FIG. 3 is a top plan view thereof.
FIG. 4 is a bottom plan view thereof.
FIG. 5 is a front elevation view thereof.
FIG. 6 is a back elevation view thereof.
FIG. 7 is a left side elevation view thereof.
FIG. 8 is a right side elevation view thereof.
FIG. 9 is a cross-sectional view taken along line 9-9 in FIG. 3.
FIG. 10 is a cross-sectional view taken along line 10-10 in FIG. 3.
FIG. 11 is a top isometric view of a base plate for a processing chamber substrate support, according to the novel design.
FIG. 12 is a bottom isometric view thereof.
FIG. 13 is a top plan view thereof.
FIG. 14 is a bottom plan view thereof.
FIG. 15 is a front elevation view thereof.
FIG. 16 is a back elevation view thereof.
FIG. 17 is a left side elevation view thereof.
FIG. 18 is a right side elevation view thereof.
FIG. 19 is a cross-sectional view taken along line 19-19 in FIG. 13; and,
FIG. 20 is a cross-sectional view taken along line 20-20 in FIG. 13.
The dashed lines in FIGS. 1-20 represent unclaimed environment forming no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a base plate for a processing chamber substrate support, as shown and described.
US29/696,587 2019-06-28 2019-06-28 Base plate for a processing chamber substrate support Active USD893441S1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US29/696,587 USD893441S1 (en) 2019-06-28 2019-06-28 Base plate for a processing chamber substrate support
TW108308059F TWD212933S (en) 2019-06-28 2019-12-27 Base plate for a processing chamber substrate support
TW108308059D01F TWD214516S (en) 2019-06-28 2019-12-27 Base plate for a processing chamber substrate support
JPD2020-45F JP1679836S (en) 2019-06-28 2020-01-06
JPD2020-20290F JP1679911S (en) 2019-06-28 2020-01-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/696,587 USD893441S1 (en) 2019-06-28 2019-06-28 Base plate for a processing chamber substrate support

Publications (1)

Publication Number Publication Date
USD893441S1 true USD893441S1 (en) 2020-08-18

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Family Applications (1)

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US29/696,587 Active USD893441S1 (en) 2019-06-28 2019-06-28 Base plate for a processing chamber substrate support

Country Status (3)

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US (1) USD893441S1 (en)
JP (2) JP1679836S (en)
TW (2) TWD212933S (en)

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD908645S1 (en) * 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD913979S1 (en) * 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
US11177074B1 (en) 2005-04-07 2021-11-16 Amrad Manufacturing, Llc Capacitor for multiple replacement applications
US11183336B2 (en) 2005-04-07 2021-11-23 Amrad Manufacturing, Llc Capacitor with multiple elements for multiple replacement applications
US11183337B1 (en) 2005-04-07 2021-11-23 Amrad Manufacturing, Llc Capacitor with multiple elements for multiple replacement applications
US11183338B2 (en) 2005-04-07 2021-11-23 Amrad Manufacturing, Llc Capacitor with multiple elements for multiple replacement applications
US11183335B2 (en) 2013-05-21 2021-11-23 Amrad Manufacturing, Llc Power factor correction capacitors
US11183341B1 (en) 2006-12-29 2021-11-23 Amrad Manufacturing, Llc Electrolytic capacitive device
US11183330B2 (en) 2018-12-28 2021-11-23 Amrad Manufacturing, Llc Capacitor with multiple elements for multiple replacement applications
US11189426B1 (en) 2005-04-07 2021-11-30 Amrad Manufacturing, Llc Capacitor with multiple elements for multiple replacement applications
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
US11195663B2 (en) 2017-05-12 2021-12-07 Amrad Manufacturing, Llc Capacitor with multiple elements for multiple replacement applications
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD947914S1 (en) * 2020-11-23 2022-04-05 Applied Materials, Inc. Base plate for a processing chamber substrate support
US11424077B1 (en) 2017-12-13 2022-08-23 Amrad Manufacturing, Llc Hard start kit for multiple replacement applications
US11551960B2 (en) 2020-01-30 2023-01-10 Applied Materials, Inc. Helical plug for reduction or prevention of arcing in a substrate support
USD975010S1 (en) * 2020-12-28 2023-01-10 Philip Morris Products S.A. Charger for an aerosol generating device
US11575298B2 (en) 2021-04-30 2023-02-07 Amrad Manufacturing, Llc Hard start kit for multiple replacement applications
USD985362S1 (en) * 2021-04-12 2023-05-09 Youjun HU Base bracket
USD986830S1 (en) * 2019-03-29 2023-05-23 Weidmüller Interface GmbH & Co. KG Standalone plug with socket cover
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US11887878B2 (en) 2019-06-28 2024-01-30 Applied Materials, Inc. Detachable biasable electrostatic chuck for high temperature applications

Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD375961S (en) * 1995-08-03 1996-11-26 American Standard Inc. Base plate for a refrigeration compressor
US6046885A (en) * 1998-04-03 2000-04-04 Intri-Plex Technologies, Inc. Base plate suspension assembly in a hard disk drive with step in flange
US6324743B1 (en) * 1998-11-30 2001-12-04 Societe De Prospection Et D'inventions Techniques Spit Method for setting a piece fastening base plate
US6673651B2 (en) * 1999-07-01 2004-01-06 Oki Electric Industry Co., Ltd. Method of manufacturing semiconductor device including semiconductor elements mounted on base plate
US6853533B2 (en) 2000-06-09 2005-02-08 Applied Materials, Inc. Full area temperature controlled electrostatic chuck and method of fabricating same
US7324307B2 (en) * 2002-02-20 2008-01-29 Intri-Plex Technologies, Inc. Plated base plate for suspension assembly in hard disk drive
US7589950B2 (en) 2006-10-13 2009-09-15 Applied Materials, Inc. Detachable electrostatic chuck having sealing assembly
US7697260B2 (en) 2004-03-31 2010-04-13 Applied Materials, Inc. Detachable electrostatic chuck
USD623500S1 (en) * 2009-04-20 2010-09-14 Armorworks Enterprises, Llc Tie-down base plate
US8476793B2 (en) * 2008-05-03 2013-07-02 Anthony J. Aiello Stiffener tab for a spindle motor base plate
USD707257S1 (en) * 2012-04-30 2014-06-17 Samhongsa Co., Ltd. Base plate for spindle motor
US9666467B2 (en) 2014-11-21 2017-05-30 Varian Semiconductor Equipment Associates, Inc. Detachable high-temperature electrostatic chuck assembly
US9668873B2 (en) * 2013-03-08 2017-06-06 Biomet Manufacturing, Llc Modular glenoid base plate with augments
USD793816S1 (en) * 2014-08-19 2017-08-08 Frank J Alteslaben Saucer base plate
US9853579B2 (en) 2013-12-18 2017-12-26 Applied Materials, Inc. Rotatable heated electrostatic chuck
USD847982S1 (en) * 2016-02-04 2019-05-07 Atos Medical Ab Heat exchanger base plate
US10559327B2 (en) * 2018-02-28 2020-02-11 Nidec Corporation Base plate with electrodeposition coating film and method for producing base plate

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1605838S (en) 2017-11-10 2018-06-04

Patent Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD375961S (en) * 1995-08-03 1996-11-26 American Standard Inc. Base plate for a refrigeration compressor
US6046885A (en) * 1998-04-03 2000-04-04 Intri-Plex Technologies, Inc. Base plate suspension assembly in a hard disk drive with step in flange
US6324743B1 (en) * 1998-11-30 2001-12-04 Societe De Prospection Et D'inventions Techniques Spit Method for setting a piece fastening base plate
US6673651B2 (en) * 1999-07-01 2004-01-06 Oki Electric Industry Co., Ltd. Method of manufacturing semiconductor device including semiconductor elements mounted on base plate
US6853533B2 (en) 2000-06-09 2005-02-08 Applied Materials, Inc. Full area temperature controlled electrostatic chuck and method of fabricating same
US7324307B2 (en) * 2002-02-20 2008-01-29 Intri-Plex Technologies, Inc. Plated base plate for suspension assembly in hard disk drive
US7697260B2 (en) 2004-03-31 2010-04-13 Applied Materials, Inc. Detachable electrostatic chuck
US7589950B2 (en) 2006-10-13 2009-09-15 Applied Materials, Inc. Detachable electrostatic chuck having sealing assembly
US8476793B2 (en) * 2008-05-03 2013-07-02 Anthony J. Aiello Stiffener tab for a spindle motor base plate
USD623500S1 (en) * 2009-04-20 2010-09-14 Armorworks Enterprises, Llc Tie-down base plate
USD707257S1 (en) * 2012-04-30 2014-06-17 Samhongsa Co., Ltd. Base plate for spindle motor
US9668873B2 (en) * 2013-03-08 2017-06-06 Biomet Manufacturing, Llc Modular glenoid base plate with augments
US9853579B2 (en) 2013-12-18 2017-12-26 Applied Materials, Inc. Rotatable heated electrostatic chuck
USD793816S1 (en) * 2014-08-19 2017-08-08 Frank J Alteslaben Saucer base plate
US9666467B2 (en) 2014-11-21 2017-05-30 Varian Semiconductor Equipment Associates, Inc. Detachable high-temperature electrostatic chuck assembly
USD847982S1 (en) * 2016-02-04 2019-05-07 Atos Medical Ab Heat exchanger base plate
US10559327B2 (en) * 2018-02-28 2020-02-11 Nidec Corporation Base plate with electrodeposition coating film and method for producing base plate

Cited By (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11189426B1 (en) 2005-04-07 2021-11-30 Amrad Manufacturing, Llc Capacitor with multiple elements for multiple replacement applications
US11651903B1 (en) 2005-04-07 2023-05-16 Amrad Manufacturing, Llc Capacitor for multiple replacement applications
US11183338B2 (en) 2005-04-07 2021-11-23 Amrad Manufacturing, Llc Capacitor with multiple elements for multiple replacement applications
US11177074B1 (en) 2005-04-07 2021-11-16 Amrad Manufacturing, Llc Capacitor for multiple replacement applications
US11183336B2 (en) 2005-04-07 2021-11-23 Amrad Manufacturing, Llc Capacitor with multiple elements for multiple replacement applications
US11183337B1 (en) 2005-04-07 2021-11-23 Amrad Manufacturing, Llc Capacitor with multiple elements for multiple replacement applications
US11183341B1 (en) 2006-12-29 2021-11-23 Amrad Manufacturing, Llc Electrolytic capacitive device
US11631550B2 (en) 2006-12-29 2023-04-18 Amrad Manufacturing, Llc Electrolytic capacitor with multiple sections
US11189425B1 (en) 2013-05-21 2021-11-30 Amrad Manufacturing, Llc Power factor correction capacitors
US11183335B2 (en) 2013-05-21 2021-11-23 Amrad Manufacturing, Llc Power factor correction capacitors
US11195663B2 (en) 2017-05-12 2021-12-07 Amrad Manufacturing, Llc Capacitor with multiple elements for multiple replacement applications
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US11424077B1 (en) 2017-12-13 2022-08-23 Amrad Manufacturing, Llc Hard start kit for multiple replacement applications
US11183330B2 (en) 2018-12-28 2021-11-23 Amrad Manufacturing, Llc Capacitor with multiple elements for multiple replacement applications
USD986818S1 (en) * 2019-03-29 2023-05-23 Weidmüller Interface GmbH & Co. KG Wallbox and power outlet
USD986830S1 (en) * 2019-03-29 2023-05-23 Weidmüller Interface GmbH & Co. KG Standalone plug with socket cover
US11887878B2 (en) 2019-06-28 2024-01-30 Applied Materials, Inc. Detachable biasable electrostatic chuck for high temperature applications
USD908645S1 (en) * 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
USD913979S1 (en) * 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber
US11551960B2 (en) 2020-01-30 2023-01-10 Applied Materials, Inc. Helical plug for reduction or prevention of arcing in a substrate support
USD970566S1 (en) 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD960216S1 (en) * 2020-11-23 2022-08-09 Applied Materials, Inc. Base plate for a processing chamber substrate support
USD947914S1 (en) * 2020-11-23 2022-04-05 Applied Materials, Inc. Base plate for a processing chamber substrate support
USD966357S1 (en) 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD975010S1 (en) * 2020-12-28 2023-01-10 Philip Morris Products S.A. Charger for an aerosol generating device
USD985362S1 (en) * 2021-04-12 2023-05-09 Youjun HU Base bracket
US11575298B2 (en) 2021-04-30 2023-02-07 Amrad Manufacturing, Llc Hard start kit for multiple replacement applications
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

Also Published As

Publication number Publication date
JP1679836S (en) 2021-02-22
JP1679911S (en) 2021-02-22
TWD212933S (en) 2021-08-01
TWD214516S (en) 2021-10-11

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