TWM547221U - Contact image sensor and illuminant module - Google Patents

Contact image sensor and illuminant module Download PDF

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Publication number
TWM547221U
TWM547221U TW106206595U TW106206595U TWM547221U TW M547221 U TWM547221 U TW M547221U TW 106206595 U TW106206595 U TW 106206595U TW 106206595 U TW106206595 U TW 106206595U TW M547221 U TWM547221 U TW M547221U
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Taiwan
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light
wafer
circuit board
photosensitive
image sensor
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TW106206595U
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Chinese (zh)
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陳鴻吉
吳信宏
林明傑
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菱光科技股份有限公司
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Publication of TWM547221U publication Critical patent/TWM547221U/en

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Description

接觸式影像感測器及發光模組Contact image sensor and light module

本創作是關於用於閱讀或識別印刷或書寫文字或者用於識別圖形之方法或裝置,且特別是有關於接觸式影像感測器。The present invention relates to a method or apparatus for reading or recognizing printed or written text or for identifying graphics, and more particularly to a contact image sensor.

光電二極體(photodiode)為一種半導體元件,其可感應光線強弱變化,並依據所接受到光線的強度產生相對應的電流輸出。在實際應用中,多將一或多個光電二極體及一轉換電路以半導體製程整合於單一半導體晶片之內而形成感光晶片;其中,轉換電路可將光電二極體產生的電流轉換為類比電壓輸出。多個感光晶片可以一定次序排列於一電路板上而達到截取一物件的影像的功能。A photodiode is a semiconductor component that senses the change in light intensity and produces a corresponding current output depending on the intensity of the received light. In practical applications, one or more photodiodes and a conversion circuit are integrated into a single semiconductor wafer by a semiconductor process to form a photosensitive wafer; wherein the conversion circuit converts the current generated by the photodiode into an analogy Voltage output. The plurality of photosensitive wafers can be arranged in a certain order on a circuit board to achieve the function of capturing an image of an object.

一般來說,感光晶片多以半導體製程製作而來。在半導體製程中,感光晶片12可形成在圖1所示的晶圓10上,每個感光晶片12可包含一或多個光電二極體14;其中,晶圓10主要由圖2所繪示的圓柱狀晶柱1沿著方向A切割而形成。In general, photosensitive wafers are often fabricated in a semiconductor process. In the semiconductor process, the photosensitive wafers 12 can be formed on the wafer 10 shown in FIG. 1, and each of the photosensitive wafers 12 can include one or more photodiodes 14; wherein the wafers 10 are mainly illustrated by FIG. The cylindrical crystal column 1 is formed by cutting along the direction A.

由於晶圓10的外型為圓形,而感光晶片12的外型呈矩形,如圖2所示;因此在晶圓10的周邊會形成寬度或長度不符合感光形晶片12製造需求的複數無用區域16,這使得晶圓10利用率降低。Since the outer shape of the wafer 10 is circular, and the outer shape of the photosensitive wafer 12 is rectangular, as shown in FIG. 2, a plurality of useless widths or lengths which do not conform to the manufacturing requirements of the photosensitive wafer 12 are formed at the periphery of the wafer 10. Region 16, which results in reduced wafer 10 utilization.

完成切割後的複數感光晶片12可以一定次序排列於一電路板18上以形成一感光陣列,如圖3所示,並可與一光源及一柱狀透鏡配合形成所謂的接觸式影像感測器。The plurality of photosensitive wafers 12 after the cutting is completed may be arranged on a circuit board 18 in a certain order to form a photosensitive array, as shown in FIG. 3, and may cooperate with a light source and a cylindrical lens to form a so-called contact image sensor. .

一般來說,接觸式影像感測器中的感光陣列的長度必須超過掃描紙張的寬度,才能夠接收完整的影像資訊;然而,受限於晶圓尺寸及成本考量,目前市面上常見的接觸式影像感測器多以拼接複數感光晶片12來形成長度超過掃描紙張的寬度的感光陣列。舉例來說,掃描寬度為105毫米的A6紙張需要使用6個感光晶片才能完整接收到紙張影像。In general, the length of the photosensitive array in the contact image sensor must exceed the width of the scanned paper to receive the complete image information; however, limited by the size and cost of the wafer, the current common contact type The image sensor mostly splicing the plurality of photosensitive wafers 12 to form a photosensitive array having a length exceeding the width of the scanned paper. For example, A6 paper with a scan width of 105 mm requires 6 photoreceptors to receive the full image.

在感光晶片12完成定位後,接著會利用打線製程以於每個感光晶片12及電路板18之間形成複數金線19來讓感光晶片12與電路板18形成電性連接;如圖3所示。當感光晶片12的數量愈多,則跨接在感光晶片12及電路板18之間的金線19隨之增加,接觸式影像感測器的製作成本也隨之增加。After the positioning of the photosensitive wafer 12 is completed, a wire bonding process is then used to form a plurality of gold wires 19 between each of the photosensitive wafers 12 and the circuit board 18 to electrically connect the photosensitive wafer 12 to the circuit board 18; . As the number of photosensitive wafers 12 increases, the number of gold wires 19 that are bridged between the photosensitive wafer 12 and the circuit board 18 increases, and the manufacturing cost of the contact image sensor increases.

再者,如圖3所示,一般在相鄰的二感光晶片12間存在有一間隙G,藉以避免在將感光晶片12定位在電路板18上,碰觸位於鄰近感光晶片12邊緣的光電二極體14而讓光電二極體14毀損。然而,間隙G也可能導致接觸式影像感測器所產生的影像出現線條或異常,進而影響影像品質。在過去,一般都會在產線中增設一工作站來檢測感光晶片12之間的間隙G,以確保接觸式影像感測器的影像品質能落在安全規格中;但這樣卻讓製造工序及成本增加。Moreover, as shown in FIG. 3, there is generally a gap G between adjacent two photosensitive wafers 12 to avoid touching the photodiode 12 adjacent to the edge of the photosensitive wafer 12 while positioning the photosensitive wafer 12 on the circuit board 18. The body 14 causes the photodiode 14 to be damaged. However, the gap G may also cause lines or abnormalities in the image generated by the contact image sensor, thereby affecting the image quality. In the past, a workstation was added to the production line to detect the gap G between the photosensitive wafers 12 to ensure that the image quality of the contact image sensor can fall within the safety specifications; but this increases the manufacturing process and costs. .

又,類似的問題也發生於印表機中用以曝光感光鼓的曝光光源中。更具體言之,一般用於曝光感光鼓用的曝光光源主要以拼接複數發光晶片來實現,故具有晶圓的利用率降低、製作成本增加等問題;相鄰二發光晶片間的間隙將導致光斑的產生,影響曝光品質。Also, a similar problem occurs in the exposure light source of the printer for exposing the photosensitive drum. More specifically, the exposure light source generally used for exposing the photosensitive drum is mainly realized by splicing a plurality of light-emitting wafers, so that the utilization ratio of the wafer is lowered, the manufacturing cost is increased, and the like; the gap between adjacent two light-emitting wafers causes a spot. The production, affecting the quality of exposure.

依據本創作提供一種接觸式影像感測器,用以擷取一物件的影像;接觸式影像感測器包含一座體、一光源模組、一感光晶片及一成像模組。座體包含一容置槽及一穿槽,物件位於座體之一側;光源模組設於容置槽中並供產生一線型光線來照射物件,感光晶片位於座體之另一側並接收物件反射線型光線產生之一影像光線;成像模組設於穿槽中並使影像光線成像於感光晶片。當感光晶片的長度為X,寬度為Y時,滿足下列條件:X/Y ≥ 500。According to the present invention, a contact image sensor is provided for capturing an image of an object; the contact image sensor comprises a body, a light source module, a light sensing chip and an imaging module. The base body comprises a receiving slot and a through slot, and the object is located on one side of the base body; the light source module is disposed in the receiving slot for generating a line of light to illuminate the object, and the photosensitive wafer is located on the other side of the base body and receives The object reflects linear light to produce one of the image light; the imaging module is disposed in the through slot and images the image light onto the photosensitive wafer. When the length of the photosensitive wafer is X and the width is Y, the following conditions are satisfied: X/Y ≥ 500.

在本創作之一實施方式中,當感光晶片的長度為X,可滿足下列條件:  X ≥ 105 mm。In one embodiment of the present invention, when the length of the photosensitive wafer is X, the following conditions are satisfied: X ≥ 105 mm.

在本創作之一實施方式中,當感光晶片的長度為X,感光晶片的寬度為Y時,可滿足下列條件:X/Y ≥ 1000。In one embodiment of the present invention, when the length of the photosensitive wafer is X and the width of the photosensitive wafer is Y, the following conditions are satisfied: X/Y ≥ 1000.

在本創作之一實施方式中,感光晶片的長度可大於物件的寬度。In one embodiment of the present invention, the length of the photosensitive wafer can be greater than the width of the article.

在本創作之一實施方式中,接觸式影像感測器可更包含一電路板、一膠材及複數金線,感光晶片設於電路板上,膠材設於電路板及感光晶片之間,以將感光晶片緊固於電路板上;金線跨接於電路板及感光晶片之間,使感光晶片與電路板形成電性連接。In one embodiment of the present invention, the contact image sensor further includes a circuit board, a glue material, and a plurality of gold wires. The photosensitive chip is disposed on the circuit board, and the glue material is disposed between the circuit board and the light sensing chip. The photosensitive wafer is fastened to the circuit board; the gold wire is connected between the circuit board and the photosensitive wafer to electrically connect the photosensitive wafer to the circuit board.

在本創作之一實施方式中,發光模組可包含一接合件、一發光件、一光導桿及一反光件;發光件設於接合件之一側,光導桿設於接合件之另一側並接收發光件發出的光線,光導桿具有一出光面,線性光線經出光面照射物件;反光件部分包覆光導桿,出光面露出在該反光件之外。In an embodiment of the present invention, the light emitting module may include an engaging member, a light emitting member, a light guiding rod and a light reflecting member; the light emitting member is disposed on one side of the joint member, and the light guiding rod is disposed on the other side of the joint member And receiving the light emitted by the illuminating member, the light guiding rod has a light emitting surface, the linear light illuminates the object through the light emitting surface; the light reflecting member partially covers the light guiding rod, and the light emitting surface is exposed outside the reflecting member.

在本創作之一實施方式中,感光晶片可包含複數光電二極體,感光晶片的寬度相同於光電二極體的寬度。In one embodiment of the present invention, the photosensitive wafer may comprise a plurality of photodiodes having a width equal to the width of the photodiode.

在本創作之一實施方式中,感光晶片可形成於沿著一矩形晶柱之一長度方向切割而成的矩形晶片上,感光晶片之一長度方向平行於矩形晶柱之長度方向。In one embodiment of the present invention, the photosensitive wafer may be formed on a rectangular wafer cut along a length direction of one of the rectangular crystal columns, and one of the photosensitive wafers has a longitudinal direction parallel to the longitudinal direction of the rectangular crystal column.

在本創作之一實施方式中,感光晶片的長度可大於物件的寬度。In one embodiment of the present invention, the length of the photosensitive wafer can be greater than the width of the article.

本創作的接觸式影像感測器僅包含單一個感光晶片,故可降低製作工序、製作成本,並提升成像品質。The contact image sensor of the present invention includes only a single photosensitive wafer, thereby reducing the manufacturing process, the manufacturing cost, and improving the image quality.

本創作另提供一種發光模組,其用以朝向一物件發出一光線。發光模組包含一座體及一發光晶片,發光晶片設置於座體之一側並產生光線以照射物件;當發光晶片的長度為X,發光晶片的寬度為Y時,滿足下列條件: X/Y ≥ 500。The present invention further provides a light emitting module for emitting a light toward an object. The illuminating module comprises a body and an illuminating chip. The illuminating chip is disposed on one side of the pedestal and generates light to illuminate the object. When the length of the illuminating chip is X and the width of the illuminating chip is Y, the following conditions are met: X/Y ≥ 500.

在本創作之一實施方式中,當發光晶片的長度為X,發光晶片的寬度為Y時,可滿足下列條件: X/Y ≥ 1000。In one embodiment of the present invention, when the length of the light-emitting wafer is X and the width of the light-emitting wafer is Y, the following conditions can be satisfied: X/Y ≥ 1000.

在本創作之一實施方式中,發光晶片可包含複數發光二極體,發光晶片的寬度相同於發光二極體的寬度。In one embodiment of the present invention, the illuminating wafer may comprise a plurality of illuminating diodes having a width equal to the width of the illuminating diode.

在本創作之一實施方式中,發光模組可更包含一成像模組,安裝於座體中,並位於物件及發光晶片之間,使光線投射於物件的特定位置。In an embodiment of the present invention, the light-emitting module further includes an imaging module mounted in the body and located between the object and the light-emitting chip to project light to a specific position of the object.

在本創作之一實施方式中,發光模組更包含一電路板、一膠材及複數金線,發光晶片設於該電路板上,膠材設於電路板及發光晶片之間,以將發光晶片緊固於電路板上,金線跨接於電路板及發光晶片之間,使發光晶片與電路板形成電性連接。In one embodiment of the present invention, the light-emitting module further includes a circuit board, a glue material and a plurality of gold wires. The light-emitting chip is disposed on the circuit board, and the glue material is disposed between the circuit board and the light-emitting chip to emit light. The wafer is fastened to the circuit board, and the gold wire is connected between the circuit board and the light emitting chip to electrically connect the light emitting chip to the circuit board.

本創作的發光模組僅包含單一個發光晶片,除了可降低製作工序、製作成本之外,更可避免非必要光斑的產生。The light-emitting module of the present invention only includes a single light-emitting chip, and in addition to reducing the manufacturing process and manufacturing cost, the generation of unnecessary light spots can be avoided.

請參見圖4及圖5,其等分別繪示依照本創作之接觸式影像感測器之立體分解圖及剖視圖。接觸式影像感測器2用以擷取一(平面)物件的影像,並將物件的光學影像轉換為類比或數位電子信號以利於儲存及傳輸。接觸式影像感測器2包含一座體20、一光源模組22、一成像模組24及一感光模組26。Please refer to FIG. 4 and FIG. 5 , which are respectively an exploded perspective view and a cross-sectional view of the contact image sensor according to the present invention. The contact image sensor 2 is used to capture an image of a (planar) object and convert the optical image of the object into an analog or digital electronic signal for storage and transmission. The contact image sensor 2 includes a body 20, a light source module 22, an imaging module 24, and a photosensitive module 26.

座體20包含一頂面200、一相對於頂面200的底面202、一容置槽204及一穿槽206;底面202大致平行於頂面200。容置槽204形成在頂面200並朝向底面202的方向凹陷,穿槽206為貫穿頂面200及底面202的槽孔結構。座體20可使用塑膠或其它高分子材料利用射出成型或鑄模技術製作而成。座體20可呈黑色或其它不具反光效果的深色材料製程,藉以避免經物件反射而產生的光學影像受到座體20反射而影響成像對比度。The base 20 includes a top surface 200, a bottom surface 202 opposite to the top surface 200, a receiving groove 204, and a through groove 206. The bottom surface 202 is substantially parallel to the top surface 200. The accommodating groove 204 is formed on the top surface 200 and is recessed toward the bottom surface 202. The through groove 206 is a slot structure penetrating the top surface 200 and the bottom surface 202. The body 20 can be fabricated using injection molding or molding techniques using plastic or other polymeric materials. The body 20 can be black or other non-reflective dark material process to avoid reflection of the optical image produced by the object reflection by the body 20 to affect the imaging contrast.

光源模組22安裝於容置槽204中,並供產生一線性光線以照射物件。光源模組22包含一接合件220、至少一發光件222、一光導桿224及一反光件226。發光件222設於固定座220之一側,光導桿224設於固定座220之另一側並接收發光件222發出的光線。The light source module 22 is mounted in the accommodating groove 204 and generates a linear light to illuminate the object. The light source module 22 includes an engaging member 220, at least one illuminating member 222, a light guiding rod 224 and a reflecting member 226. The illuminating member 222 is disposed on one side of the fixing base 220. The light guiding rod 224 is disposed on the other side of the fixing base 220 and receives the light emitted by the illuminating member 222.

接合座220用以緊固發光件222及光導桿224,使發光件222及光導桿224達到定位效果,據此發光件222發出的光線才能夠進入光導桿224。發光件222可為發光二極體或小型燈泡,並可供產生白色光線。光導桿224可透光並包含一出光面2240;由發光件222發出並進入光導桿224光線是由出光面2240射出並傳遞至物件。光導桿224用以將發光件222產生的點狀光源轉換為線性光形。The joint 220 is used to fasten the illuminating member 222 and the light guiding rod 224 to achieve the positioning effect of the illuminating member 222 and the light guiding rod 224, so that the light emitted by the illuminating member 222 can enter the light guiding rod 224. The illuminating member 222 can be a light emitting diode or a small bulb and can be used to generate white light. The light guiding rod 224 can transmit light and include a light emitting surface 2240; the light emitted by the light emitting member 222 and entering the light guiding rod 224 is emitted by the light emitting surface 2240 and transmitted to the object. The light guiding rod 224 is used to convert the point light source generated by the light emitting member 222 into a linear light shape.

反光件226部分包覆光導桿224,出光面2240露出反光件226之外。反光件226是使用白色或銀色等具有反光效果的材料製作而成,用以反射不是由光導桿224的出光面2240出射的光線,藉以提高光線的使用效率。The light reflecting member 226 partially covers the light guiding rod 224, and the light emitting surface 2240 is exposed outside the reflecting member 226. The reflector 226 is made of a material having a reflective effect such as white or silver to reflect light that is not emitted by the light-emitting surface 2240 of the light guiding rod 224, thereby improving the efficiency of light use.

成像模組24容設於穿槽206中,用以使位於座體20一側的物件的影像得以成像於位在座體20另一側的感光模組26;成像模組24可例如包含沿著預定方向D排列的複數折射率漸變透鏡240。The imaging module 24 is disposed in the through slot 206 for imaging an image of an object located on one side of the base 20 on the photosensitive module 26 located on the other side of the base 20; the imaging module 24 may include, for example, along A plurality of refractive index progressive lenses 240 arranged in a predetermined direction D.

感光模組26用以接收物件反射線性光線所產生並通過成像模組24的影像光線;感光模組26包含一電路板260及一感光晶片262。電路板260可例如(但不限定)為印刷電路板。感光晶片262設於電路板260上,並與電路板260形成電性連接;其中,感光晶片262可先以膠材264固定於電路板260上,之後再以打線製程形成跨接於感光晶片262的焊墊2620及電路板260的焊墊2600間複數金線266(如圖3所示),來讓感光晶片262與電路板260形成電性連接。感光晶片262可對應於成像模組24設置,且感光晶片262可為電荷耦合元件、互補式金屬氧化物半導體或其他具有光電轉換特性之元件;每個感光晶片262包含一或多個光電二極體。在本創作中,接觸式影像感測器2僅包含一感光晶片262,故可簡化打線製程、打線時間,降低製作成本,且因無需進行對感光晶片262進行拼接,故可提高成像品質。The photosensitive module 26 is configured to receive the image light generated by the object reflecting the linear light and passing through the imaging module 24; the photosensitive module 26 includes a circuit board 260 and a photosensitive wafer 262. Circuit board 260 can be, for example, but not limited to, a printed circuit board. The photosensitive wafer 262 is disposed on the circuit board 260 and electrically connected to the circuit board 260. The photosensitive wafer 262 may be first fixed on the circuit board 260 with a glue 264, and then formed by a wire bonding process to bridge the photosensitive wafer 262. The solder pads 2620 and the pads 2600 of the circuit board 260 are connected by a plurality of gold wires 266 (shown in FIG. 3) to electrically connect the photosensitive wafer 262 to the circuit board 260. The photosensitive wafer 262 may be disposed corresponding to the imaging module 24, and the photosensitive wafer 262 may be a charge coupled device, a complementary metal oxide semiconductor, or other component having photoelectric conversion characteristics; each photosensitive wafer 262 includes one or more photodiodes body. In the present invention, the contact image sensor 2 includes only one photosensitive wafer 262, so that the wire bonding process and the wire bonding time can be simplified, the manufacturing cost can be reduced, and the image quality can be improved because the photosensitive wafer 262 is not required to be spliced.

其次,為了能完整地接收物件的影像資訊,感光晶片262的長度必須超過物件的寬度;同時如圖6所示,當感光晶片262的長度為X時,則當其用以掃描寬度為105毫米(mm)的A6紙張,滿足下列條件: X ≥ 105 mm。Secondly, in order to completely receive the image information of the object, the length of the photosensitive wafer 262 must exceed the width of the object; and as shown in FIG. 6, when the length of the photosensitive wafer 262 is X, when it is used for scanning width of 105 mm (6) A6 paper with the following conditions: X ≥ 105 mm.

換言之,當感光晶片262用以掃描寬度為105毫米的A6紙張時,其長度不得小於105毫米,才能完整地接收紙張的影像。In other words, when the photosensitive wafer 262 is used to scan A6 paper having a width of 105 mm, the length of the photosensitive wafer 262 is not less than 105 mm in order to completely receive the image of the paper.

其次,當感光晶片262的長度為X,寬度為Y,滿足下列條件: X/Y ≥ 500。Next, when the length of the photosensitive wafer 262 is X and the width is Y, the following conditions are satisfied: X/Y ≥ 500.

感光晶片262也可用以截取更大尺寸的物件的影像資訊;當感光晶片262的長度為X,寬度為Y,可滿足下列條件: X/Y ≥ 1000。The photosensitive wafer 262 can also be used to intercept image information of a larger-sized object; when the length of the photosensitive wafer 262 is X and the width is Y, the following conditions can be satisfied: X/Y ≥ 1000.

為了製造出長度及寬度符合前述條件的感光晶片262,本創作的感光晶片262必須形成在圖7所繪示的矩形晶片30上。矩形晶片30上可形成有複數感光晶片262,且每個感光晶片262可包含一或多個光電二極體2622及一轉換電路(圖中未示);其中,光電二極體2622可感應光線強弱變化,並依據所接受到光線的強度產生相對應的電流輸出,轉換電路則用以將光電二極體產生的電流轉換為類比電壓輸出。In order to manufacture a photosensitive wafer 262 having a length and a width in accordance with the foregoing conditions, the photosensitive wafer 262 of the present invention must be formed on the rectangular wafer 30 illustrated in FIG. A plurality of photosensitive wafers 262 may be formed on the rectangular wafer 30, and each of the photosensitive wafers 262 may include one or more photodiodes 2622 and a conversion circuit (not shown); wherein the photodiode 2622 can sense light. The strong and weak changes, and the corresponding current output is generated according to the intensity of the received light, and the conversion circuit is used to convert the current generated by the photodiode into an analog voltage output.

長條形晶片30可由圖8所繪示的矩形晶柱32沿著方向B切割而成,方向B為矩形晶柱32的長度方向。藉此,除了可以達到節省時間、減少設備耗損之外,且因本創作的感光晶片262非拼接而成,故並無間隙存在,可不需額外的工作站來檢察,進而可增加製造效率。The elongated wafer 30 can be cut from the rectangular crystal pillar 32 illustrated in FIG. 8 along the direction B, and the direction B is the longitudinal direction of the rectangular crystal pillar 32. In this way, in addition to saving time and reducing equipment wear, and because the photosensitive wafer 262 of the present invention is not spliced, there is no gap, and no additional workstation can be used for inspection, thereby increasing manufacturing efficiency.

請參見圖9及圖10,其等分別繪示依照本創作之發光模組之剖視圖及俯視圖。發光模組4包含一座體40、一發光單元42及一成像模組44。座體40包含一頂面400、一相對於頂面400的底面402,以及一穿槽406;底面402大致平行於頂面400;穿槽406為貫穿頂面400及底面402的槽孔結構。Please refer to FIG. 9 and FIG. 10 , which are respectively a cross-sectional view and a top view of a light emitting module according to the present invention. The light module 4 includes a body 40, a light unit 42 and an imaging module 44. The base 40 includes a top surface 400, a bottom surface 402 opposite to the top surface 400, and a through slot 406. The bottom surface 402 is substantially parallel to the top surface 400. The through slot 406 is a slot structure extending through the top surface 400 and the bottom surface 402.

發光單元42包含一電路板420及一發光晶片422。電路板420可例如(但不限定)為印刷電路板。發光晶片422設於電路板420上,並與電路板420形成電性連接;其中,發光晶片422可先以膠材424固定於電路板420上,之後再以打線製程形成跨接於發光晶片422的焊墊4220及電路板420的焊墊4200間複數金線426(如圖10所示),來讓發光晶片422與電路板420形成電性連接。每個發光晶片422包含一或多個發光二極體4222。在本創作中,發光模組40僅包含一發光晶片422,故可簡化打線製程及打線時間,降低製作成本,且因無需進行發光晶片422的拼接,故可避免光斑產生而達爆高出光均勻度的效果。The light emitting unit 42 includes a circuit board 420 and a light emitting chip 422. Circuit board 420 can be, for example, but not limited to, a printed circuit board. The light-emitting chip 422 is disposed on the circuit board 420 and electrically connected to the circuit board 420. The light-emitting chip 422 can be first fixed on the circuit board 420 with a glue 424, and then formed in a wire bonding process to be connected to the light-emitting chip 422. A plurality of gold wires 426 (shown in FIG. 10) between the pads 4220 and the pads 4200 of the circuit board 420 are used to electrically connect the light-emitting chip 422 to the circuit board 420. Each of the light emitting wafers 422 includes one or more light emitting diodes 4222. In the present invention, the light-emitting module 40 only includes a light-emitting chip 422, which simplifies the wire-bonding process and wire-bonding time, reduces the manufacturing cost, and eliminates the need for the splicing of the light-emitting chip 422, thereby avoiding the occurrence of light spots and achieving high uniformity of light emission. Degree effect.

在本創作中,當發光晶片422的長度為X,寬度為Y,滿足下列條件: X/Y ≥ 500。In the present creation, when the length of the light-emitting wafer 422 is X and the width is Y, the following conditions are satisfied: X/Y ≥ 500.

發光晶片422也可用以提供更大照射面積;於此,當發光晶片422的長度為X,寬度為Y,可滿足下列條件: X/Y ≥ 1000。The light-emitting wafer 422 can also be used to provide a larger illumination area; here, when the length of the light-emitting wafer 422 is X and the width is Y, the following conditions can be satisfied: X/Y ≥ 1000.

為了製造出長度及寬度符合前述條件的發光晶片422,本創作的發光晶片422必須形成在圖11所繪示的矩形晶片50上。矩形晶片50可由圖12所繪示的矩形晶柱52沿著方向B切割而成,方向B為矩形晶柱52的長度方向。In order to fabricate a light-emitting wafer 422 having a length and a width in accordance with the foregoing conditions, the light-emitting wafer 422 of the present invention must be formed on the rectangular wafer 50 illustrated in FIG. The rectangular wafer 50 can be cut along the direction B by the rectangular crystal pillar 52 illustrated in FIG. 12, and the direction B is the length direction of the rectangular crystal pillar 52.

矩形晶片50上可形成有複數發光晶片422,且每個發光晶片422可包含一或多個發光二極體4222。發光晶片422上亦可覆蓋有波長轉換層(圖中未視)來達到改變光色的效果。舉例來說,當發光模組4供產生白光時,發光晶片422可供產生藍色光線,波長轉換層吸收發光晶片產生的藍色光線後可產生黃色光線。A plurality of light emitting wafers 422 may be formed on the rectangular wafer 50, and each of the light emitting wafers 422 may include one or more light emitting diodes 4222. The light-emitting chip 422 may also be covered with a wavelength conversion layer (not shown) to achieve the effect of changing the color of light. For example, when the light emitting module 4 is configured to generate white light, the light emitting chip 422 can generate blue light, and the wavelength converting layer absorbs blue light generated by the light emitting chip to generate yellow light.

在此要特別說明的是,發光單元42可用於取代前述的光源模組22,以提供圖4所繪示之接觸式影像感測器2感測物件時所需之一線性光線;如此一來,接觸式影像感測器2即不需使用高價及不易製造的光導桿來提供線性光源,達到降低成本及亦於製造等特點。It should be noted that the light-emitting unit 42 can be used to replace the light source module 22 to provide a linear light required for sensing the object of the contact image sensor 2 shown in FIG. 4; The contact image sensor 2 does not need to use a high-priced and difficult-to-manufacture light guide rod to provide a linear light source, thereby achieving cost reduction and manufacturing.

復參見9及圖10;成像模組44容設於穿槽406中,用以使位於座體40一側的光線得以投射於位在座體40另一側的物件(例如感光鼓)上;成像模組44可例如包含沿著預定方向D排列的複數折射率漸變透鏡(未另標號),其等用以使發光晶片422產生的光線得以投影至物件的特定位置,以對物件進行曝光。Referring to FIG. 9 and FIG. 10, the imaging module 44 is disposed in the through slot 406 for projecting light on one side of the base 40 onto an object (such as a photosensitive drum) on the other side of the base 40; The module 44 can, for example, comprise a plurality of refractive index progressive lenses (not labeled) arranged along a predetermined direction D, such as to cause light generated by the light-emitting wafer 422 to be projected to a particular location of the object to expose the object.

雖然本創作已以實施方式揭露如上,然其並非用以限定本創作,任何熟習此技藝者,在不脫離本創作的精神和範圍內,當可作各種的更動與潤飾,因此本創作的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any person skilled in the art can make various changes and refinements without departing from the spirit and scope of the present creation. The scope is subject to the definition of the scope of the patent application.

1‧‧‧晶柱1‧‧‧ crystal column

10‧‧‧晶圓10‧‧‧ wafer

12、262‧‧‧感光晶片12, 262‧‧‧Photosensitive wafer

14‧‧‧光電二極體14‧‧‧Photoelectric diode

16‧‧‧無用區域16‧‧‧Useless area

18、260、420‧‧‧電路板18, 260, 420‧‧‧ circuit boards

19、266、426‧‧‧金線19,266, 426‧‧ gold thread

2‧‧‧接觸式影像感測器2‧‧‧Contact Image Sensor

20、40‧‧‧座體20, 40‧‧‧ body

200、400‧‧‧頂面200, 400‧‧‧ top

202、402‧‧‧底面202, 402‧‧‧ bottom

204‧‧‧容置槽204‧‧‧ accommodating slots

206、406‧‧‧穿槽206, 406‧‧‧through slot

22‧‧‧光源模組22‧‧‧Light source module

220‧‧‧接合件220‧‧‧Joint parts

222‧‧‧發光件222‧‧‧Lighting parts

224‧‧‧光導桿224‧‧‧Light guide rod

2240‧‧‧出光面2240‧‧‧Glossy surface

226‧‧‧反光件226‧‧‧Reflecting parts

24、44‧‧‧成像模組24, 44‧‧‧ imaging module

240‧‧‧折射率漸變透鏡240‧‧‧ Index of Refractive Index Lens

26‧‧‧感光模組26‧‧‧Photosensitive module

2600、2620、4200、4220‧‧‧焊墊2600, 2620, 4200, 4220‧‧‧ solder pads

2622‧‧‧光電二極體2622‧‧‧Photoelectric diode

264、424‧‧‧膠材264, 424‧‧‧ glue

30、50‧‧‧矩形晶片30, 50‧‧‧ Rectangular wafer

32、52‧‧‧矩形晶柱32, 52‧‧‧ Rectangular crystal column

4‧‧‧光源模組4‧‧‧Light source module

42‧‧‧發光模組42‧‧‧Lighting module

422‧‧‧發光晶片422‧‧‧Lighting chip

4222‧‧‧發光二極體A、B切割方向4222‧‧‧Lighting diode A, B cutting direction

D‧‧‧預定方向D‧‧‧Predetermined direction

G‧‧‧間隙G‧‧‧ gap

圖1繪示一晶圓之示意圖;1 is a schematic view of a wafer;

圖2繪示一圓型晶柱之示意圖;2 is a schematic view of a circular crystal column;

圖3繪示一感光晶片及一電路板之俯視圖;3 is a top plan view of a photosensitive wafer and a circuit board;

圖4繪示依照本創作之接觸式影像感測器之立體分解圖;4 is an exploded perspective view of the contact image sensor according to the present invention;

圖5繪示依照本創作之接觸式影像感測器之剖視圖;Figure 5 is a cross-sectional view of the contact image sensor in accordance with the present invention;

圖6繪示依照本創作之影像感光模組之俯視圖;6 is a top plan view of an image sensing module according to the present invention;

圖7繪示一矩形晶片之示意圖;Figure 7 is a schematic view of a rectangular wafer;

圖8繪示一矩形晶柱之示意圖;Figure 8 is a schematic view of a rectangular crystal column;

圖9繪示依照本創作之發光模組之剖視圖;9 is a cross-sectional view of a light emitting module according to the present invention;

圖10繪示依照本創作之發光單元之俯視圖;10 is a top plan view of a light unit according to the present invention;

圖11繪示一矩形晶片之示意圖;以及Figure 11 is a schematic view of a rectangular wafer;

圖12繪示一矩形晶柱之示意圖。Figure 12 is a schematic view of a rectangular crystal column.

2‧‧‧接觸式影像感測器 2‧‧‧Contact Image Sensor

20‧‧‧座體 20‧‧‧ body

200‧‧‧頂面 200‧‧‧ top surface

204‧‧‧容置槽 204‧‧‧ accommodating slots

206‧‧‧穿槽 206‧‧‧through slot

22‧‧‧光源模組 22‧‧‧Light source module

220‧‧‧接合件 220‧‧‧Joint parts

222‧‧‧發光件 222‧‧‧Lighting parts

224‧‧‧光導桿 224‧‧‧Light guide rod

226‧‧‧反光件 226‧‧‧Reflecting parts

24‧‧‧成像模組 24‧‧‧ imaging module

240‧‧‧折射率漸變透鏡 240‧‧‧ Index of Refractive Index Lens

26‧‧‧感光模組 26‧‧‧Photosensitive module

260‧‧‧電路板 260‧‧‧ circuit board

262‧‧‧感光晶片 262‧‧‧Photosensitive wafer

D‧‧‧預定方向 D‧‧‧Predetermined direction

Claims (14)

一種接觸式影像感測器,用以擷取一物件的影像,該接觸式影像感測器包含:      一座體,包含一容置槽及一穿槽,該物件位於該座體之一側;      一光源模組,設於該容置槽中並供產生一線型光線來照射該物件;      一感光晶片,位於該座體之另一側並接收該物件反射該線型光線產生之一影像光線;以及      一成像模組,設於該穿槽中,並使該影像光線成像於該感光晶片;      其中,當該感光晶片的長度為X,該感光晶片的寬度為Y時,滿足下列條件:      X/Y ≥ 500。A contact image sensor for capturing an image of an object, the contact image sensor comprising: a body comprising a receiving slot and a slot, the object being located on one side of the base; a light source module disposed in the accommodating groove for generating a line of light to illuminate the object; a photosensitive wafer on the other side of the body and receiving the object to reflect the linear light to generate an image light; An imaging module is disposed in the through slot and images the image light on the photosensitive wafer; wherein when the length of the photosensitive wafer is X and the width of the photosensitive wafer is Y, the following conditions are satisfied: X/Y ≥ 500. 如請求項第1項所述之接觸式影像感測器,其中當該感光晶片的長度為X,滿足下列條件:      X ≥ 105 mm。The contact image sensor of claim 1, wherein when the length of the photosensitive wafer is X, the following condition is satisfied: X ≥ 105 mm. 如請求項第1項或第2項所述之接觸式影像感測器,其中當該感光晶片的長度為X,該感光晶片的寬度為Y時,滿足下列條件:      X/Y ≥ 1000。The contact image sensor of claim 1 or 2, wherein when the length of the photosensitive wafer is X and the width of the photosensitive wafer is Y, the following condition is satisfied: X/Y ≥ 1000. 如請求項第3項所述之接觸式影像感測器,更包含:      一電路板,該感光晶片設於該電路板上;      一膠材,設於該電路板及該感光晶片之間,以將該感光晶片緊固於該電路板上;以及      複數金線,跨接於該電路板及該感光晶片之間,使該感光晶片與該電路板形成電性連接。The contact image sensor of claim 3, further comprising: a circuit board, the photosensitive chip is disposed on the circuit board; a glue material is disposed between the circuit board and the light sensing chip, The photosensitive wafer is fastened to the circuit board; and a plurality of gold wires are connected between the circuit board and the photosensitive wafer to electrically connect the photosensitive wafer to the circuit board. 如請求項第4項所述之接觸式影像感測器,其中該發光模組包含:      一接合件;      一發光件,設於該接合件之一側;      一光導桿,設於該接合件之另一側並接收該發光件發出的光線,該光導桿具有一出光面;以及      一反光件,部分包覆該光導桿,該出光面露出在該反光件之外。The contact image sensor of claim 4, wherein the light-emitting module comprises: a joint member; a light-emitting member disposed on one side of the joint member; and a light guide rod disposed on the joint member The other side receives the light emitted by the illuminating member, the light guiding rod has a light emitting surface, and a reflecting member partially covers the light guiding rod, and the light emitting surface is exposed outside the reflecting member. 如請求項第4項所述之接觸式影像感測器,其中該發光模組包含一發光晶片,當該發光晶片的長度為X,該發光晶片的寬度為Y時,滿足下列條件:      X/Y ≥ 1000。The contact image sensor of claim 4, wherein the light emitting module comprises a light emitting chip. When the length of the light emitting chip is X and the width of the light emitting chip is Y, the following conditions are met: X/ Y ≥ 1000. 如請求項第6項所述之接觸式影像感測器,其中該感光晶片包含複數光電二極體,該感光晶片的寬度相同於該光電二極體的寬度。The contact image sensor of claim 6, wherein the photosensitive wafer comprises a plurality of photodiodes having a width equal to a width of the photodiode. 如請求項第6項所述之接觸式影像感測器,其中該感光晶片形成於沿著一矩形晶柱的長度方向切割形成之一矩形晶片上,該感光晶片的長度方向平行於該矩形晶柱的長度方向。The contact image sensor of claim 6, wherein the photosensitive wafer is formed by cutting along a length direction of a rectangular crystal column to form a rectangular wafer, and the length direction of the photosensitive wafer is parallel to the rectangular crystal The length direction of the column. 如請求項第8項所述之接觸式影像感測器,其中該感光晶片的長度大於該物件的寬度。The contact image sensor of claim 8, wherein the length of the photosensitive wafer is greater than the width of the object. 一種發光模組,用以朝向一物件發出一光線,該發光模組包含:      一座體;以及      一發光晶片,安裝於該座體之一側並產生該光線以照射該物件;      其中,當該發光晶片的長度為X,該發光晶片的寬度為Y時,滿足下列條件:      X/Y ≥ 500。a light emitting module for emitting a light toward an object, the light emitting module comprising: a body; and a light emitting chip mounted on one side of the body and generating the light to illuminate the object; wherein, when the light is emitted When the length of the wafer is X and the width of the light-emitting wafer is Y, the following conditions are satisfied: X/Y ≥ 500. 如請求項第10項所述之發光模組,其中當該發光晶片的長度為X,該發光晶片的寬度為Y時,滿足下列條件:      X/Y ≥ 1000。The illuminating module of claim 10, wherein when the length of the illuminating wafer is X and the width of the illuminating wafer is Y, the following condition is satisfied: X/Y ≥ 1000. 如請求項第11項所述之發光模組,其中該發光晶片包含複數發光二極體,該發光晶片的寬度相同於該發光二極體的寬度。The illuminating module of claim 11, wherein the illuminating chip comprises a plurality of illuminating diodes having a width equal to a width of the illuminating diode. 如請求項第10項或第11項或第12項所述之發光模組,更包含一成像模組,安裝於該座體中,並位於該物件及該發光晶片之間,使該光線投射於該物件的特定位置。The illuminating module of claim 10 or claim 11, further comprising an imaging module mounted in the housing and located between the object and the illuminating wafer to cause the ray to be projected At a specific location on the object. 如請求項第12項所述之發光模組,更包含:      一電路板,該發光晶片設於該電路板上;      一膠材,設於該電路板及該發光晶片之間,以將該發光晶片緊固於該電路板上;以及      複數金線,跨接於該電路板及該發光晶片之間,使該發光晶片與該電路板形成電性連接。The lighting module of claim 12, further comprising: a circuit board, the light emitting chip is disposed on the circuit board; a glue material disposed between the circuit board and the light emitting chip to emit the light The wafer is fastened to the circuit board; and a plurality of gold wires are connected between the circuit board and the light emitting chip to electrically connect the light emitting chip to the circuit board.
TW106206595U 2017-05-09 2017-05-09 Contact image sensor and illuminant module TWM547221U (en)

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