TWI794589B - Device and method for processing hard and brittle plates in high temperature environment - Google Patents

Abstract

A device and method for processing hard and brittle plates in a high-temperature environment, comprising at least one optical processing device with at least one terminal lens group at the front end, a processing chamber, and at least a pair of positive pressure devices arranged on the periphery of the front half and the rear half of the processing chamber A generator, a negative pressure generator, and a heating device, wherein the optical processing device can generate at least one processing beam after passing through the terminal lens group, and at least one opening is provided on the periphery of the processing cavity for the terminal lens of the optical processing device The components are incorporated, the front half of the processing chamber is fed by the positive pressure generator to generate positive pressure air pressure and the negative pressure generator generates negative pressure air pressure, so that at least one air barrier area (Air curtains) is formed in the front half of the processing chamber, The heating device heats the second half of the processing cavity and the hard and brittle plate workpiece to a high temperature environment above 400 degrees Celsius, and then passes through the processing beam of the optical processing device through the air barrier area (Air curtains) to the hard and brittle plate workpiece. The brittle plate workpiece is processed, and the air curtains are used to isolate the thermal convection rising heat energy generated by the high temperature environment of the hard and brittle plate workpiece, so as to protect the terminal lens group of the optical processing device.

Description

Device and method for processing hard and brittle plates in high temperature environment

The present invention relates to a high-temperature environment processing device and method for hard and brittle plates, especially for processing hard and brittle plate workpieces, and at least one air barrier (Air curtains) is used to isolate the optical processing device from the hard and brittle plate workpieces in a processing cavity. Device and method for high-temperature processing of ambient heat.

According to various hard and brittle plates such as optical glass, sapphire, quartz glass, etc., they are widely used in new-generation smart phones, tablet computers, electrical instrument panels, display glass panels, automotive instrument panels, and watch mirror products to provide Smartphones, tablet computers, electrical instrument panels, display glass panels, automotive instrument panels, and watch products have edge surface display or touch operation functions in the four directions of top, bottom, left, and right. However, for the above hardware As for the heating method of brittle plates, it is known to use beams of laser processing equipment to perform processing operations such as cutting, drilling, surface engraving, etching, polishing, etc., so that the hard and brittle plates can be processed into finished or semi-finished products.

However, with the above-mentioned known hard and brittle plate processing methods, since the hard and brittle plate materials such as various optical glasses, sapphire, and quartz are quite sensitive to sudden changes in temperature, as the hard and brittle plate is at normal room temperature, the above-mentioned The high-temperature laser beam is instantly irradiated on the surface of the hard and brittle plate workpiece for processing, which will cause the instantaneous local temperature of the hard and brittle plate workpiece surface to be changed and sharply increased, resulting in cracking or damage on the surface of the hard and brittle plate. Therefore, the surface processing quality of the hard and brittle plate is greatly affected, and the processing yield of the hard and brittle plate is greatly reduced.

In addition, if it is considered to heat the surface of the hard and brittle plate to a higher temperature environment, for example: above 400°C, so that the high-temperature laser processing beam can make the hard and brittle plate The surface of the surface will not have the problem of cracking or chipping due to the sudden rise in temperature difference, but in this way, the heat of the high-temperature processing environment of the hard and brittle plate and the heat of the laser beam processing temperature of the laser processing equipment will be caused by thermal convection. ascending to the terminal lens of the laser processing equipment, For example: the final focusing lens, so it is very easy to cause high temperature damage to the terminal lens of the laser processing equipment, resulting in damage to the terminal lens of the laser processing equipment, so that the laser processing equipment cannot be used for hard and brittle plates Processing in high temperature environment.

In addition, in terms of previous relevant patent technical documents, such as the new patent case of the Republic of China Patent Publication No. M461498 "Workpiece Pressing Device for Laser Cutting Machine", it is disclosed that the laser head is provided with an output end, and at the output The end is provided with an end seat with a slot, and the laser beam is emitted from the slot of the end seat for cutting the workpiece. In addition, an air jet structure is provided around the slot of the end seat for ejecting gas, and the laser beam is used to cut the workpiece. An air curtain that presses against the workpiece is formed around the laser beam, which means that the laser head equipment must be greatly modified in the prior patent, which cannot be applied to the existing laser processing equipment, thus greatly limiting its application scope and industrial utilization benefits, and , when the workpiece is a hard and brittle plate, there are still problems and shortcomings of the hard and brittle plate workpiece due to fragmentation or damage due to the sudden change in the high temperature rise of the laser beam projected on the surface of the workpiece. In addition, the jet The structure forms an air curtain that presses against the workpiece around the laser beam of the laser head. The volume and range of its influence are too small, and it is not suitable for high-temperature working environments where the workpiece is heated to above 400°C, and cannot effectively block and isolate such workpieces. The convective thermal energy of the processing high-temperature environment and the high-temperature thermal energy of the laser head lens, according to the current industrial application of the laser system optical lens and its coating, the temperature resistance is less than 300 degrees Celsius, which will still make the laser head The lens is thus damaged.

In addition, as in the case of US Patent No. US8288684 "Laser micro-machining system with post-scan lens deflection (with a laser micro-machining system deflected after scanning lens)", it discloses a mirror that is positioned on the The scan lens is tilted between the workpiece and relative to the work surface to reflect the laser pulses toward the workpiece such that the laser pulses strike the mirror at a 90 degree angle relative to the work surface, and at angles relative to the work surface One of the working surfaces is modified to reflect the technology of the working surface towards the working surface, but similarly, this kind of conventional laser micromachining system cannot be applied to the high-temperature environment processing of the above-mentioned hard and brittle plates, because the lens assembly will also It is damaged by the thermal energy of the high-temperature processing environment of hard and brittle plates, but there are still problems and shortcomings that the terminal mirror group produced by the conventional laser processing system used in the high-temperature processing environment of hard and brittle plates will be damaged by high-temperature heat convection heat.

The laser processing system or optical processing system in the above conventional or various patents In a high-temperature working environment, there are problems and disadvantages that the generated high-temperature heat energy will damage the terminal mirror components of the laser processing or optical processing system.

Therefore, a high-temperature environment processing device for hard and brittle plates of the present invention includes: at least one optical processing device, the front end of the optical processing device is provided with at least one terminal lens group, and the optical processing device can produce at least one end lens group through the terminal lens group. A processing light beam; a processing chamber, the periphery of the processing chamber is provided with at least one opening for the entry of the terminal lens group of the optical processing device, and at least a pair of positive pressure input ports are respectively provided on the periphery of the front half of the processing chamber And a negative pressure output port, the rear half of the processing chamber is used to accommodate at least one hard and brittle plate workpiece; at least one pair of positive pressure generators and negative pressure generators, the positive pressure generators are correspondingly connected to the processing chamber The positive pressure input port is used to input positive pressure air into the processing chamber, and the negative pressure generator is correspondingly connected to the negative pressure output port of the processing chamber to suck out the positive pressure air input into the processing chamber by the positive pressure generator so that at least one air barrier area (Air curtains) is formed in the front half of the processing chamber; The workpiece is heated to a high temperature of 400°C to the softening point of the material of the hard and brittle plate workpiece, so that the processing beam of the optical processing device passes through the gas formed in the front half of the processing chamber by the positive pressure generator and the negative pressure generator. The screen area is used to process the hard and brittle plate workpiece in a high temperature environment.

Furthermore, in the high-temperature-environment processing device for hard and brittle plates of the present invention, the optical processing device is constituted by a laser processing device.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, the optical processing device is composed of a far-infrared processing device.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, the terminal lens group is composed of at least one lens.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, the terminal lens group is composed of at least one special-shaped multi-convex lens.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, the terminal lens group is composed of a plurality of compound lenses.

In the high-temperature environment processing device for hard and brittle plates according to the present invention, the hard and brittle plate workpiece accommodated in the second half of the processing chamber is made of glass.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, the hard and brittle plate workpiece accommodated in the second half of the processing chamber is made of sapphire glass.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, the hard and brittle plate workpiece accommodated in the second half of the processing chamber is made of quartz.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, at least one working platform is combined with the bottom surface of the hard and brittle plates in the processing chamber.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, the working platform combined with the bottom surface of the hard and brittle plates in the processing chamber is constituted by a multi-axis moving platform.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, the working platform where the bottom surface of the hard and brittle plates in the processing chamber is combined is formed by a bending jig.

In the high-temperature environment processing device for hard and brittle plates of the present invention, at least one movable door is provided outside the processing chamber, and the movable door is opened and closed to allow at least one heat radiation heating device to enter and exit the processing chamber. , and use the heat radiation heating device to preheat the hard and brittle plate workpiece in the processing chamber to a high temperature from 400°C to the softening point of the hard and brittle plate workpiece with a wavelength between mid-infrared and far infrared.

In the high-temperature environment processing device for hard and brittle plates of the present invention, the positive pressure generator is constituted by an air compressor.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, the negative pressure generator is constituted by a suction device.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, the heating device is composed of an electric heating device.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, the heating device is connected to at least one temperature control circuit to control the heating temperature of the heating device.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, at least one first reflector and second reflector are provided in the rear half of the processing cavity, and the first reflector and the second reflector are at 90 degrees to each other. The location is configured so that the processing beam of the optical processing device is reflected by the first reflector to the second reflector, and then the process beam is reflected by the second reflector to the hard and brittle material workpiece in the second half of the processing cavity for further processing. processing.

In the high-temperature environment processing device for hard and brittle plates of the present invention, the processing chamber The first reflector and the second reflector in the rear half of the body are made of a metal reflector.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, at least one water-cooling device is combined with the first reflector and the second reflector in the second half of the processing chamber.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, at least one first deflection driver and second deflection driver are respectively combined on the first reflector and the second reflector in the second half of the processing cavity, so as to be respectively controlled by The first deflection driver and the second deflection driver control the deflection and reflection angles of the first mirror and the second mirror.

In the high-temperature environment processing device for hard and brittle plates of the present invention, the first deflection driver and the second deflection driver combined with the first mirror and the second mirror in the second half of the processing chamber are arranged in the processing chamber outside the body.

In the high-temperature-environment processing device for hard and brittle plates of the present invention, the first deflection driver and the second deflection driver combined with the first reflector and the second reflector in the rear half of the processing chamber are constituted by a motor.

A method for processing hard and brittle plates in a high-temperature environment, the steps of which include:

(a) At least one air barrier area is formed in a processing cavity, that is, at least one pair of positive pressure generators and negative pressure generators are respectively combined in the front half of the peripheral edge of a processing cavity containing a hard and brittle sheet metal workpiece , so as to respectively perform positive air pressure input and negative air pressure output on the front half of the processing chamber, so that at least one air barrier area is formed in the front half of the processing chamber;

(b) Heating the hard and brittle plate workpiece in the processing cavity to a high temperature environment, that is, the rear half of the processing cavity and the hard and brittle plate workpiece in step (a), to be combined with at least one of the peripheral edges of the rear half of the processing cavity The heating device is used to heat the hard and brittle plate workpiece to a temperature between 400°C and the softening point, so that the second half of the processing chamber and the hard and brittle plate workpiece form a high-temperature temperature environment;

(c) The processing light beam passes through the gas barrier area, that is, at least one optical processing device and at least one terminal lens assembly at the front end of the optical processing device are combined in the front half of the processing cavity of the step (a), so as to pass through the optical processing device. The processing beam generated by the processing device through the terminal lens group passes through the air barrier area and shoots to the hard and brittle plate workpiece in the processing cavity; and

(d) Processing hard and brittle plate workpieces under high temperature environment, that is, heating the hard and brittle plate workpieces in the processing chamber and the hard and brittle plate workpieces to a high temperature environment in step (b) and the processing beam in step (c) passing through the gas barrier area, so that the The hard and brittle plate workpiece accommodated in the processing cavity can be processed by the optical processing device in a high temperature environment.

Further, in the above-mentioned method for processing hard and brittle plates in a high-temperature environment of the present invention, the gas barrier area in the processing cavity in the step (a) is formed under the condition of 1 atmosphere pressure.

The method for processing hard and brittle plates in a high-temperature environment of the present invention, wherein, the processing cavity in the step (b) of the step (b) and the processing cavity where the hard and brittle plate workpiece is heated to a high-temperature environment can pass through at least one movable and The removed mobile heat radiation heating device irradiates the hard and brittle plate workpiece with wavelengths between near infrared and far infrared to heat the hard and brittle plate workpiece to a temperature between 400°C and softening point.

In the method for processing hard and brittle plates in a high-temperature environment of the present invention, the processing temperature of the hard and brittle plate workpieces processed in the high-temperature environment of the step (d) is 500°C to 900°C.

The high-temperature environment processing device and method for hard and brittle plates of the present invention have the function of forming an air barrier area through the front half of the processing cavity to isolate the terminal lens group of the optical processing device from the rear half of the processing cavity and the hard and brittle plate. The high-temperature environment area of the plate workpiece allows the processing beam emitted by the optical processing device to pass through the air barrier area and then perform processing such as cutting, drilling, polishing, grinding, surface engraving, etching, etc. on the hard and brittle plate workpiece , the hard and brittle plate workpiece can be processed in a high temperature environment, and the hard and brittle plate workpiece will never be cracked or damaged due to the sharp rise in temperature from normal temperature. In addition, it can also be used by The air barrier area effectively isolates the terminal lens group of the optical processing device from the heat convection heat energy of the high-temperature environment of the second half of the processing cavity and the hard and brittle plate workpiece, so that the terminal lens group of the optical processing device is effectively protected from any The intrusion and destruction of temperature rise or thermal convection heat energy can ensure the processing stability and processing quality of the hard and brittle plate workpiece, and further enhance the industrial utilization value and economic benefits of the present invention.

100: Hard and brittle plate high temperature environment processing device

10: Optical processing device

11: Terminal lens group

11': terminal lens group

11A: terminal lens group

12: Processing beam

12': processing beam

12A: Processing beam

20: Processing cavity

21: opening

22: Positive pressure input port

23: Negative pressure output port

24: First reflector

25: Second reflector

26: Water cooling device

27: First deflection drive

28: Second deflection driver

30: positive pressure generator

40: Negative pressure generator

50: heating device

200: Hard and brittle plate workpiece

210: work platform

210': work platform

300: finished product

400: formed in a processing cavity at least one air barrier

410: Machining cavity and hard and brittle plate workpieces Heating to high temperature environment

420: The processing beam passes through the gas barrier area

430: High temperature ring for hard and brittle plate workpieces Environmental processing

X: air barrier area

51: Temperature control circuit

29: movable door

60: thermal radiation heating device

220:Vertical Auxiliary Accelerator

The first figure is a figure of the first embodiment of the high-temperature environment processing device for hard and brittle plates of the present invention;

The second figure is a figure of the second embodiment of the high-temperature environment processing device for hard and brittle plates of the present invention;

The third figure is the figure of the third embodiment of the high-temperature environment processing device for hard and brittle plates of the present invention;

The fourth figure is a figure of the fourth embodiment of the high-temperature environment processing device for hard and brittle plates of the present invention;

The fifth figure is a figure of the fifth embodiment of the high-temperature environment processing device for hard and brittle plates of the present invention;

The sixth figure is the figure of the sixth embodiment of the high-temperature environment processing device for hard and brittle plates of the present invention;

The seventh figure is the figure of the seventh embodiment of the high-temperature environment processing device for hard and brittle plates of the present invention;

The eighth figure is a schematic diagram of the opening of the movable door in the seventh figure to make the heat radiation heating device move out of the processing chamber;

Figure 9 is a schematic diagram of the formal processing of the hard and brittle plate workpiece inside the processing chamber in Figure 7 after being heated to a high temperature environment by a thermal radiation heating device;

Figure 10 is a preferred application example of the high-temperature environment processing device for hard and brittle plates of the present invention;

The eleventh figure is a schematic diagram of the finished product of the hard and brittle plate workpiece in the high-temperature environment processing device for the hard and brittle plate in the tenth figure;

The twelfth figure is a flow chart of the high-temperature environment processing method for hard and brittle plates of the present invention.

First, please refer to the first figure, which is the first embodiment of the hard and brittle plate high-temperature environment processing device 100 of the present invention. The hard and brittle plate high-temperature environment processing device 100 includes at least one optical processing device 10, and its type is not limited. In the present invention, laser processing equipment and far-infrared processing equipment are cited as examples, and the front end of the optical processing device 10 is provided with at least one terminal lens group 11, and the optical processing device 10 can pass through the terminal lens group 11 to produce The type of the at least one processing light beam 12 is not limited. In the first embodiment of the present invention, the configuration of at least one lens is taken as an example.

A processing cavity 20 is provided with at least one opening 21 on the periphery for the terminal lens group 11 of the optical processing device 10 to be taken in, and at least one pair of positive pressure input ports 22 and negative The pressure output port 23, and the arrangement of the positive pressure input port 22 and the negative pressure output port 23 is not limited. In the present invention, the positive pressure input port 22 is arranged above the negative pressure input port 23. The processing chamber The rear half of the 20 is also for at least one hard and brittle plate workpiece 200 to accommodate. The type of the hard and brittle plate workpiece 200 is not limited. In the present invention, the hard and brittle plate workpiece 200 is glass Glass, sapphire glass, and quartz are taken as examples. The bottom of the hard and brittle plate workpiece 200 is combined with at least one working platform 210. The type of the working platform 210 is not limited. In the first embodiment of the present invention, the series is a multi-axis moving platform. Taking the configuration as an example, the hard and brittle plate workpiece 200 can be driven to move in multiple axes.

At least one pair of positive pressure generator 30 and negative pressure generator 40, the positive pressure generator 30 is correspondingly connected to the positive pressure input port 22 of the processing chamber 20, so as to input positive pressure air into the processing chamber 20, the The negative pressure generator 40 is correspondingly connected to the negative pressure output port 23 of the processing chamber, so as to suck out the positive pressure air pressure (as shown in the direction of the arrow in the first figure) input by the positive pressure generator 30 into the processing chamber, so as to Form at least one gas barrier area X in the front half of the processing chamber. The type of the positive pressure generator 30 is not limited. In the present invention, an air compressor is used as an example, and the type of the negative pressure generator 40 is not limited. , in the present invention, an air extraction device is taken as an example.

At least one pair of heating devices 50 are respectively arranged on the periphery of the rear half of the processing cavity 20 to heat the interior of the processing cavity 20 and the hard and brittle plate workpiece 200 to 400°C until the material of the hard and brittle plate workpiece 200 softens Point high temperature, the temperature of the softening point is not limited, in the present invention, 500°C is taken as an example, so that the processing beam 12 of the optical processing device 10 passes through the positive pressure generator 30 and negative pressure generator 40 in the processing chamber The gas barrier area X formed in the front half of the body 20 is used to perform processing such as cutting, drilling, polishing, grinding, surface engraving, etching, etc. on the hard and brittle plate workpiece 200 in a high-temperature environment. The hard and brittle plate The processing temperature of the workpiece 200 is a temperature of 500°C~900°C. The type of the heating device 50 is not limited. In the invention, an electric heating device is used as an example, and the heating device 50 is connected to at least one temperature control circuit 51 , so as to control the heating temperature of the heating device 50 through the temperature control circuit 51 .

Please cooperate with the second figure, which is the second embodiment of the hard and brittle plate high-temperature environment processing device 100 of the present invention, wherein, it shows that the terminal lens group 11' is formed as an example of at least one special-shaped multi-convex lens, which can be used The processing beam 12' is in the form of a plurality of single-focus beams at different processing points, and passes through the gas barrier area X to process the hard and brittle plate workpiece 200 in the high-temperature environment in the rear half of the processing chamber 20 .

Please refer to the third figure again, which is the third embodiment of the hard and brittle plate high-temperature environment processing device 100 of the present invention, wherein it shows that the terminal lens group 11A is composed of a plurality of compound lenses as an example, so that the processing beam can be made 12A is in the form of a single-focus beam, which passes through the gas barrier area X to process the hard and brittle plate workpiece 200 in the high-temperature environment in the rear half of the processing chamber 20 .

Please cooperate with the fourth figure, which is the fourth embodiment of the hard and brittle plate material high-temperature environment processing device 100 of the present invention, wherein it shows that the terminal lens group 11 is composed of at least one lens as an example, and the processing cavity At least one first reflector 24 and second reflector 25 are provided in the rear half of the 20. The types of the first reflector 24 and the second reflector 25 are not limited. In the present invention, the series are made of a metal reflector. For example, and the first reflector 24 and the second reflector 25 are arranged at a position of 90 degrees to each other, so that the processing light beam 12 of the optical processing device 10 is reflected by the first reflector 24 to the second reflector 25 , and then the processing beam 12 is reflected by the second reflector 25 to the hard and brittle material workpiece 200 in the second half of the processing cavity 20 for processing. The first reflector 24 and the second reflector 25 are respectively combined with at least one water-cooled The heat dissipation device 26 can provide heat dissipation for the first reflector 24 and the second reflector 25 respectively, and at least one first deflection driver 27 and the second reflector 25 are respectively combined on the first reflector 24 and the second reflector 25. Two deflection drivers 28, to control the deflection and reflection angles of the first mirror 24 and the second mirror 25 by the first deflection driver 27 and the second deflection driver 28 respectively, the first deflection driver 27 and the second deflection driver 28 is arranged on the outside of the processing chamber 20, and the types of the first deflection driver 27 and the second deflection driver 28 are not limited. In the present invention, a motor is used as an example, that is, in the fourth embodiment The figure shows that the hard and brittle plate workpiece 200 and the working platform 210 in the second half of the processing cavity 20 can remain stationary, and only the first deflection driver 27 and the second deflection driver 28 need to control the first reflector 24 and the second deflection driver 28. The deflection amount and reflection angle of the second reflector 25 can allow the processing beam 12 to move and cover the entire range of the hard and brittle plate workpiece 200 for processing.

Please refer to the fifth figure again, which is the fifth embodiment of the hard and brittle plate high-temperature environment processing device 100 of the present invention, wherein the difference from the fourth figure is that the terminal lens group 11' is at least one special-shaped multi-convex Taking the configuration of point lens as an example, the processing beam 12' can be in the form of a plurality of single-focus beams of different processing points. Similarly, it can be maintained by the hard and brittle plate workpiece 200 and the working platform 210 in the second half of the processing cavity 20. The processing beam 12' can be moved only by controlling the deflection amount and reflection angle of the first mirror 24 and the second mirror 25 by the first deflection driver 27 and the second deflection driver 28 Covering the entire range of hard and brittle plate workpieces 200 for processing.

Please cooperate with the sixth figure, which is the sixth embodiment of the hard and brittle plate high-temperature environment processing device 100 of the present invention, wherein the difference from the fourth figure is the terminal lens group 11A Taking multiple compound lenses as an example, the processing beam 12A can be in the form of a single-focus beam. Similarly, the hard and brittle plate workpiece 200 and the working platform 210 in the second half of the processing cavity 20 can be kept still. state, and only need to control the deflection amount and reflection angle of the first mirror 24 and the second mirror 25 by the first deflection driver 27 and the second deflection driver 28, the processing beam 12A can be moved to cover the entire hard disk. The range of the brittle plate workpiece 200 is processed in the form of a multi-focus beam, and passes through the air barrier area X to process the hard and brittle plate workpiece 200 in the high temperature environment in the rear half of the processing chamber 20 .

Please refer to the seventh figure, the eighth figure and the ninth figure again, the seventh figure is the seventh application example of the hard and brittle plate high-temperature environment processing device 100 of the present invention, wherein, it is the same as the first one shown in the first figure The difference between the embodiments is that at least one movable door 29 is provided outside the processing chamber 20, and the movable door 29 provides at least one heat radiation by opening and closing (as shown in the seventh figure and the eighth figure). The heating device 60 enters and exits the inside of the processing cavity 20, and the hard and brittle plate workpiece 200 in the processing cavity 20 is pre-heated by the heat radiation heating device 60 at a wavelength between mid-infrared rays and far-infrared rays to the above-mentioned heating. To 400°C to the high temperature of the material softening point of the hard and brittle plate workpiece 200, and then the heat radiation heating device 60 is moved out of the processing chamber 20 through the opened movable door 29 (as shown in the eighth figure), After closing the dodge door 29, the processing light beam 12 emitted by the optical processing device 10 passes through the air barrier area X to process the hard and brittle plate workpiece 200 in the high temperature environment in the rear half of the processing chamber 20. (As shown in the ninth figure), it is also possible to process the hard and brittle plate workpiece 200 in a high temperature environment as shown in the first embodiment to the sixth embodiment of the hard and brittle plate high temperature environment processing device 100 of the present invention shown above. The effect.

Please refer to the tenth figure and the eleventh figure again, the tenth figure is a preferred application example of the hard and brittle plate high-temperature environment processing device 100 of the present invention, wherein it shows that the terminal lens group 11' is at least one special-shaped multi-convex Taking the configuration of a point lens as an example, the processing beam 12' can be in the form of a plurality of single-focus beams of different processing points, and pass through the gas barrier area X to harden the high-temperature environment in the second half of the processing chamber 20. The brittle plate workpiece 200 is processed, and the working platform 210 ′ accommodating the hard and brittle plate workpiece 200 is formed by a bending fixture, that is, the fixture for bending the hard and brittle plate workpiece 200 , and the working platform 210 The bottom is combined with at least one vertical auxiliary accelerator 220, which can be processed by the upper processing beam 12' as a plurality of single-focus beams of different processing points respectively contacting the bending points of the four peripheries of the hard and brittle plate workpiece 200, and then processed by the Vertical auxiliary accelerator 220 up and down The vertical acceleration movement (shown by the arrows of the upper and lower dotted lines in the tenth figure) makes the four peripheral parts of the hard and brittle plate workpiece 200 heated and softened, and then accelerates to bend and sag and shape, so that the hard and brittle plate workpiece 200 can be finalized. The above-mentioned processed product 300 (as shown in FIG. 11 ), which is formed with a three-dimensional peripheral bending, can be used as a three-dimensional bending touch panel of a smart phone.

The processing method of the four peripheral bending parts of the hard and brittle plate workpiece 200 disclosed in the preferred application example of the hard and brittle plate high-temperature environment processing device 100 of the present invention shown in the tenth and eleventh figures above does not follow the above-mentioned method. The description in Figure 10 and Figure 11 is limited to the auxiliary acceleration bending type of the working platform 210' of the bending fixture type and the vertical auxiliary accelerator 220, and other methods such as non-contact guided airflow (Fig. Not shown), such as the ROC invention patent announcement number: I660920 "Non-contact forming device and method" invention patent case of the applicant who previously applied to China for approval. The application scope of the processing method of the four peripheral bending parts of the hard and brittle plate workpiece 200 in the preferred application example of the hard and brittle plate high-temperature environment processing device 100 shown in the tenth and eleventh figures above.

Please cooperate with the twelfth figure, which is a flow chart of the high-temperature environment processing method for hard and brittle plates of the present invention, and its steps include steps 400-430, wherein: (400) form at least one gas barrier area in a processing cavity, That is to say, the positive pressure generator 30 and the negative pressure generator 40 are respectively combined with the periphery of the front half of the processing chamber 20 which accommodates a hard and brittle sheet material workpiece 200 inside, so as to separate the front half of the processing chamber 20. Partly carry out positive air pressure input and negative air pressure output, so that the front half of the processing cavity 20 forms at least one air barrier area X; (410) heating the hard and brittle plate workpiece in the processing cavity to a high temperature environment, that is, the step (400) The rear half of the processing cavity 20 and the hard and brittle plate workpiece 200 are combined with at least one pair of heating devices 26 on the periphery of the rear half of the processing cavity 20 to heat the hard and brittle plate workpiece 200 to between 400°C and softening point. to allow the rear half of the processing cavity 20 and the hard and brittle plate workpiece 200 to form a high-temperature environment; (420) the processing beam passes through the gas barrier area, that is, through at least one optical processing device 10 and the optical processing device 10 At least one terminal lens assembly 11 at the front end is combined with the first half of the processing cavity 20 in this step (400), so that the processing beam 12 generated by the optical processing device 10 through the terminal lens group 11 passes through the air barrier area X and Injecting into the hard and brittle plate workpiece 200 in the processing cavity 20; and (430) processing the hard and brittle plate workpiece in a high temperature environment, that is, passing through the processing cavity 20 of the step (420) The hard and brittle plate workpiece 200 is heated to a high temperature environment and the processing beam 12 of step (430) passes through the gas shield area X step, so that the hard and brittle plate workpiece 200 contained in the processing cavity 20 can be subjected to the optical processing device 10. Processing is carried out in a high-temperature environment, and the processing temperature of the hard and brittle plate workpiece 200 is a temperature of 500° C. to 900° C.

The high-temperature environment processing device and method for hard and brittle plates of the present invention shown in the first to twelfth figures above, the relevant descriptions and drawings disclosed therein are only for the convenience of clarifying the technical content and technical means of the present invention, so A corner of the preferred embodiment is disclosed, but its scope is not limited, and any modification of the detailed structure of the present invention or equivalent replacement of components does not depart from the spirit and scope of the present invention, and its scope will be determined by the following application to define the scope of the patent.

100: Hard and brittle plate high temperature environment processing device

10: Optical processing device

11: Terminal lens group

12: Processing beam

20: Processing cavity

21: opening

22: Positive pressure input port

23: Negative pressure output port

30: positive pressure generator

40: Negative pressure generator

50: heating device

51: Temperature control circuit

200: Hard and brittle plate workpiece

210: work platform

X: air barrier area

Claims (15)

A high-temperature environment processing device for hard and brittle plates, including: at least one optical processing device, at least one terminal lens group is arranged at the front end of the optical processing device, and the terminal lens group is composed of at least one special-shaped multi-convex lens. The optical processing device A processing beam in the form of a single-focus beam that can pass through the terminal lens group to generate a plurality of different processing points; a processing cavity, at least one opening is provided on the periphery of the processing cavity for the terminal lens group of the optical processing device to enter, in The periphery of the front half of the processing chamber is respectively provided with at least one pair of positive pressure input ports and negative pressure output ports; At least one first reflector and second reflector, and at least one water-cooling heat dissipation device is combined on the first reflector and the second reflector, and the first reflector and the second reflector are arranged at a position of 90 degrees to each other , and at least a first deflection driver and a second deflection driver are respectively combined on the first reflector and the second reflector, and the first deflection driver and the second deflection driver are arranged outside the processing chamber to respectively The first deflection driver and the second deflection driver control the deflection and reflection angles of the first reflector and the second reflector, so that the processing light beam of the optical processing device is reflected by the first reflector to the second reflector, and then The processing beam is reflected by the second reflector to the hard and brittle material workpiece in the second half of the processing chamber for processing, and at least one movable door is provided outside the processing chamber, and the movable door is opened and closed for at least A thermal radiation heating device enters and exits the processing cavity, and preheats the hard and brittle plate workpiece in the processing cavity to a wavelength between mid-infrared and far-infrared to 400°C to the The high temperature of the material softening point of the hard and brittle plate workpiece; at least one pair of positive pressure generator and negative pressure generator, the positive pressure generator is correspondingly connected to the positive pressure input port of the processing cavity to input positive pressure air to the processing In the cavity, the negative pressure generator is correspondingly connected to the negative pressure output port of the processing cavity, so as to suck out the positive pressure air pressure input by the positive pressure generator into the processing cavity, so that at least one gas is formed in the front half of the processing cavity. Screen area (Air curtains); and at least one pair of heating devices, which are respectively arranged on the periphery of the second half of the processing chamber, to heat the inside of the processing chamber and the hard and brittle plate workpiece to 400°C to the hard and brittle plate workpiece The material The high temperature of the softening point allows the processing beam of the optical processing device to pass through the gas barrier area formed by the positive pressure generator and the negative pressure generator in the front half of the processing chamber, so as to direct the hard and brittle plate workpiece in the high temperature environment for processing. The high-temperature environment processing device for hard and brittle plates as described in item 1 of the scope of the patent application, wherein the optical processing device is composed of a laser processing device. The high-temperature environment processing device for hard and brittle plates as described in Item 1 of the scope of the patent application, wherein the optical processing device is composed of a mid-infrared or far-infrared processing device. The device for processing hard and brittle plates in a high-temperature environment as described in item 1 of the scope of the patent application, wherein the hard and brittle plate workpiece accommodated in the second half of the processing chamber is made of glass. The high-temperature environment processing device for hard and brittle plates as described in item 1 of the scope of the patent application, wherein, the hard and brittle plates workpiece accommodated in the second half of the processing chamber is made of quartz. The high-temperature environment processing device for hard and brittle plates as described in item 1 of the scope of the patent application, wherein the bottom surface of the hard and brittle plates in the processing chamber is combined with at least one working platform. The high-temperature environment processing device for hard and brittle plates as described in item 6 of the scope of the patent application, wherein the working platform combined with the bottom surface of the hard and brittle plates in the processing chamber is composed of a multi-axis moving platform. The high-temperature environment processing device for hard and brittle plates as described in item 6 of the scope of the patent application, wherein, the working platform combined with the bottom surface of the hard and brittle plates in the processing chamber is formed by a bending jig. The high-temperature environment processing device for hard and brittle plates as described in claim 1 of the patent application, wherein the heating device is connected to at least one temperature control circuit to control the heating temperature of the heating device. The high-temperature environment processing device for hard and brittle plates as described in Item 1 of the scope of the patent application, wherein the first reflector and the second reflector in the rear half of the processing chamber are formed by a metal reflector. The high-temperature environment processing device for hard and brittle plates as described in item 1 of the scope of the patent application, wherein, the first deflection driver and the second deflection driver combined on the first reflector and the second reflector in the second half of the processing chamber Consists of a motor. A method for processing hard and brittle plates in a high-temperature environment, the steps of which include: (a) forming at least one air barrier area in a processing cavity, that is, combining at least one pair of positive pressure generators and negative pressure generators in an inner container respectively The periphery of the front half of the processing cavity of a hard and brittle sheet metal workpiece, so as to respectively perform positive air pressure input and negative air pressure output on the front half of the processing cavity, so that the front half of the processing cavity forms at least one air barrier area; (b) Heating the hard and brittle plate workpiece in the processing cavity to a high temperature environment, that is, the rear half of the processing cavity and the hard and brittle plate workpiece in step (a), to be combined with at least one of the peripheral edges of the rear half of the processing cavity Heat the hard and brittle plate workpiece to a temperature between 400°C and the softening point between the heating device and at least one thermal radiation heating device that can move in and out of the processing cavity, so that the second half of the processing cavity is hard and brittle The plate workpiece forms a high-temperature environment. The rear half of the processing chamber is provided with at least one first reflector and a second reflector, and the first reflector and the second reflector are respectively combined with at least one water cooling device. A reflective mirror and a second reflective mirror are arranged at a position of 90 degrees to each other, and the first reflective mirror and the second reflective mirror are respectively combined with at least one first deflection driver and a second deflection driver, the first deflection driver and The second deflection driver is arranged outside the processing cavity to control the deflection and reflection angles of the first mirror and the second mirror by the first deflection driver and the second deflection driver respectively; (c) the processing beam passes through The air barrier area, that is, at least one optical processing device and at least one terminal lens assembly at the front end of the optical processing device are combined in the first half of the processing cavity of the step (a), and the terminal lens group is at least one special-shaped multi-convex lens constituted, the processing beam in the form of a single-focus beam of a plurality of different processing points generated by the optical processing device through the terminal lens group passes through the gas barrier area, and the rear half of the cavity is processed by the step (b) The first reflector reflects the processing beam of the optical processing device to the second reflector, and then the second reflector reflects the processing beam to the hard and brittle material workpiece in the second half of the processing cavity for processing; and ( d) Processing hard and brittle plate workpieces in a high-temperature environment, that is, heating the hard and brittle plate workpieces in the processing chamber and the hard and brittle plate workpieces to a high-temperature environment in step (b) and the processing beam in step (c) passing through the gas barrier area, so that the container The hard and brittle plate workpiece placed in the processing cavity can be processed by the optical processing device under high temperature environment. The method for processing hard and brittle plates in a high-temperature environment as described in item 12 of the scope of the patent application, wherein the gas barrier area in the processing cavity of the step (a) is formed under a pressure of 1 atmosphere. For the heating method of hard and brittle plate workpieces described in item 12 of the scope of the patent application, the processing cavity in the processing cavity of the step (b) and the processing cavity where the hard and brittle plate workpieces are heated to a high temperature environment can be moved in and out through at least one movement The heat radiation heating device of the type irradiates the hard and brittle plate workpiece with wavelengths between near-infrared rays and far-infrared rays to heat the hard and brittle plate workpiece to a temperature between 400°C and the softening point. The method for processing hard and brittle plates in a high-temperature environment as described in item 12 of the scope of the patent application, wherein the processing temperature of the hard and brittle plates processed in the high-temperature environment of the step (d) is 500°C~900°C temperature in °C.

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