TWI785907B - Pressure chamber level maintaining device - Google Patents
Pressure chamber level maintaining device Download PDFInfo
- Publication number
- TWI785907B TWI785907B TW110144444A TW110144444A TWI785907B TW I785907 B TWI785907 B TW I785907B TW 110144444 A TW110144444 A TW 110144444A TW 110144444 A TW110144444 A TW 110144444A TW I785907 B TWI785907 B TW I785907B
- Authority
- TW
- Taiwan
- Prior art keywords
- cavity
- base
- pressure chamber
- level
- maintaining
- Prior art date
Links
Images
Landscapes
- Particle Accelerators (AREA)
- Motor Or Generator Frames (AREA)
- Stabilization Of Oscillater, Synchronisation, Frequency Synthesizers (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
Description
本發明是有關於一種水平保持裝置,且特別是有關於一種壓力腔水平保持裝置。 The present invention relates to a level maintaining device, and in particular to a pressure chamber level maintaining device.
目前,針對使用真空鍍膜的產品日益增加,在鍍膜製程中,微小圖案的鍍膜零件若沒有透過水平定位平台來作定位基準,將使鍍膜圖案堆疊不完全,而導致被鍍物無法有效產生應有性能,嚴重影響到產品之良率。 At present, in view of the increasing number of products using vacuum coating, in the coating process, if the coated parts with tiny patterns are not used as a positioning reference through the horizontal positioning platform, the stacking of the coating patterns will be incomplete, resulting in the inability to effectively produce the desired coating. Performance seriously affects the yield of the product.
然而,真空腔在抽真空的狀態下,腔壁會因為負壓而變形,即便在真空腔內設置水平定位平台,固定在腔壁的水平定位平台也會隨著腔壁的變形而難以保持水平。 However, when the vacuum chamber is evacuated, the chamber wall will be deformed due to negative pressure. Even if a horizontal positioning platform is installed in the vacuum chamber, the horizontal positioning platform fixed on the chamber wall will be difficult to maintain level due to the deformation of the chamber wall. .
本發明提供一種壓力腔水平保持裝置,其位於腔體內的治具平台可保持水平。 The invention provides a device for maintaining the level of a pressure chamber, in which a jig platform located in the cavity can be kept horizontal.
本發明的一種壓力腔水平保持裝置,包括一腔體、一治 具平台、一基座、多個連接件及多個調整件。治具平台設置於腔體內。基座位於腔體外。這些連接件連接於腔體內的治具平台,且延伸至腔體外而可移動地設置於基座。這些調整件設置於腔體外且分別連動於這些連接件,以調整這些連接件相對於基座的位置,而使治具平台於腔體內呈水平。 A pressure chamber level maintaining device of the present invention comprises a cavity body, a It has a platform, a base, multiple connecting pieces and multiple adjusting pieces. The jig platform is arranged in the cavity. The base is located outside the cavity. These connecting pieces are connected to the jig platform inside the cavity, and extend out of the cavity to be movably arranged on the base. The adjusting parts are arranged outside the cavity and respectively linked with the connecting parts to adjust the positions of the connecting parts relative to the base so that the jig platform is horizontal in the cavity.
在本發明的一實施例中,上述的壓力腔水平保持裝置更包括多個密封組件,設置於腔體外且連通於腔體,各密封組件套設於對應的連接件位於腔體外的一部分。 In an embodiment of the present invention, the above-mentioned device for maintaining the level of the pressure chamber further includes a plurality of sealing components disposed outside the cavity and communicated with the cavity, and each sealing component is sleeved on a part of the corresponding connecting member outside the cavity.
在本發明的一實施例中,上述的各密封組件包括一可撓管,各可撓管套設於對應的連接件位於腔體外的部分。 In an embodiment of the present invention, each of the above-mentioned sealing components includes a flexible tube, and each flexible tube is sheathed on a part of the corresponding connecting element outside the cavity.
在本發明的一實施例中,上述的各密封組件包括一固定件,固定件設置於對應的可撓管的一端且固定於腔體的外表面,對應的連接件穿過固定件。 In an embodiment of the present invention, each of the above-mentioned sealing components includes a fixing piece, the fixing piece is disposed at one end of the corresponding flexible tube and fixed on the outer surface of the cavity, and the corresponding connecting piece passes through the fixing piece.
在本發明的一實施例中,上述的各密封組件包括一密封件,密封件設置於對應的可撓管的另一端,對應的連接件穿過密封件。 In an embodiment of the present invention, each of the above-mentioned sealing components includes a sealing element, the sealing element is disposed at the other end of the corresponding flexible tube, and the corresponding connecting element passes through the sealing element.
在本發明的一實施例中,上述的這些調整件設置於這些密封組件與基座之間,各連接件包括一螺桿部,各調整件螺接於螺桿部。 In an embodiment of the present invention, the above-mentioned adjusting elements are disposed between the sealing components and the base, each connecting element includes a screw portion, and each adjusting element is screwed to the screw portion.
在本發明的一實施例中,上述的壓力腔水平保持裝置更包括多個定位件,各調整件及對應的定位件夾設於基座的兩側,各螺桿部穿過對應的調整件、基座及對應的定位件,各定位件螺 接於對應的螺桿部,以使對應的連接件固定於基座。 In an embodiment of the present invention, the above-mentioned device for maintaining the level of the pressure chamber further includes a plurality of positioning pieces, each adjusting piece and the corresponding positioning piece are clamped on both sides of the base, and each screw part passes through the corresponding adjusting piece, The base and the corresponding positioning parts, the screw of each positioning part connected to the corresponding screw part, so that the corresponding connecting piece is fixed on the base.
在本發明的一實施例中,上述的各可撓管包括一波紋管。 In an embodiment of the present invention, each of the above-mentioned flexible tubes includes a corrugated tube.
在本發明的一實施例中,上述的壓力腔水平保持裝置更包括一機架,腔體位於機架上,基座及這些連接件位於機架內。 In an embodiment of the present invention, the above-mentioned device for maintaining the level of the pressure chamber further includes a frame, the cavity is located on the frame, and the base and these connecting parts are located in the frame.
在本發明的一實施例中,當腔體內的壓力小於腔體外的壓力時,腔體變形而部分地分離於機架。 In an embodiment of the invention, when the pressure inside the cavity is lower than the pressure outside the cavity, the cavity is deformed and partially separated from the frame.
基於上述,本發明的壓力腔水平保持裝置將治具平台設置於腔體內,這些連接件連接於腔體內的治具平台,且延伸至腔體外而可移動地設置於基座。此外,調整件設置於腔體外且連動於這些連接件,以調整這些連接件相對於基座的位置,而使治具平台於腔體內呈水平。因此,操作者只要先調整這些連接件相對於基座的位置,以將腔體內的治具平台校正為水平,後續在製程過程中,即便腔體的壁面因為腔體內部壓力小於或大於外界壓力而變形,由於治具平台透過連接件固定於腔體外的基座,而不直接接觸於腔體的壁面,因此,腔體內的治具平台並不會受到腔體的壁面變形的影響,而可維持在水平狀態。 Based on the above, in the device for maintaining the level of the pressure chamber of the present invention, the jig platform is arranged in the cavity, and the connecting parts are connected to the jig platform in the cavity, and extend out of the cavity to be movably arranged on the base. In addition, the adjusting part is arranged outside the cavity and linked to the connecting parts to adjust the positions of the connecting parts relative to the base so that the jig platform is horizontal in the cavity. Therefore, the operator only needs to adjust the position of these connecting parts relative to the base to correct the fixture platform in the cavity to be horizontal. In the subsequent process, even if the internal pressure of the cavity is less than or greater than the external pressure And deformation, because the jig platform is fixed on the base outside the cavity through the connecting piece, and does not directly contact the wall of the cavity, therefore, the jig platform in the cavity will not be affected by the deformation of the wall of the cavity, and can remain horizontal.
100:壓力腔水平保持裝置 100: Pressure chamber level maintaining device
110:腔體 110: Cavity
112:內部空間 112: Internal space
114:穿孔 114: perforation
120:治具平台 120: Fixture platform
121:固定件 121:Fixer
121a:貫孔 121a: through hole
122:連接件 122: connector
122a:螺桿部 122a: screw part
123:密封件 123: seal
125:密封組件 125: sealing assembly
126:調整件 126: Adjustment parts
127:定位件 127: Positioning piece
128:可撓管 128: flexible tube
130:機架 130: Rack
135:基座 135: base
圖1是依照本發明的一實施例的一種壓力腔水平保持裝置的示意圖。 Fig. 1 is a schematic diagram of a pressure chamber level maintaining device according to an embodiment of the present invention.
圖2是圖1的壓力腔水平保持裝置的連接件、密封組件、調 整件及定位件的示意圖。 Fig. 2 is the connecting piece, sealing assembly, adjusting device of the pressure chamber level maintaining device in Fig. 1 Schematic diagram of the whole and positioning parts.
圖3是圖1的壓力腔水平保持裝置的腔體內為負壓時的示意圖。 Fig. 3 is a schematic diagram of the chamber of the device for maintaining the level of the pressure chamber in Fig. 1 when the chamber is under negative pressure.
圖1是依照本發明的一實施例的一種壓力腔水平保持裝置的示意圖。圖2是圖1的壓力腔水平保持裝置的連接件、密封組件、調整件及定位件的示意圖。圖3是圖1的壓力腔水平保持裝置的腔體內為負壓時的示意圖。 Fig. 1 is a schematic diagram of a pressure chamber level maintaining device according to an embodiment of the present invention. Fig. 2 is a schematic diagram of the connecting part, sealing assembly, adjusting part and positioning part of the device for maintaining the pressure chamber level in Fig. 1 . Fig. 3 is a schematic diagram of the chamber of the device for maintaining the level of the pressure chamber in Fig. 1 when the chamber is under negative pressure.
請參閱圖1至圖3,本實施例的壓力腔水平保持裝置100包括一腔體110、一治具平台120、一基座135、多個連接件122及多個調整件126。在本實施例中,腔體110包括一內部空間112。
在製程中,內部空間112例如可被抽真空,而呈負壓,或者,內部空間112例如可被填充氣體,而呈現高壓。
Referring to FIGS. 1 to 3 , the
治具平台120設置於腔體110內,因此,治具平台120所承受到的壓力為腔體110的內部空間112的壓力。基座135位於腔體110外,基座135所承受到的壓力為外界壓力,例如是一大氣壓。
The
腔體110包括多個穿孔114,這些連接件122連接於腔體110內的治具平台120,且透過穿孔114延伸至腔體110外而可移動地設置於基座135。連接件122可相對於基座135上下移動,且可固定於基座135。
The
詳細地說,在本實施例中,各連接件122包括一螺桿部122a(圖2),螺桿部122a例如是位於連接件122的下端,但螺桿部122a的位置不以此為限制。連接件122的螺桿部122a穿過基座135。
In detail, in this embodiment, each connecting
此外,壓力腔水平保持裝置100更包括多個定位件127,定位件127具有內螺紋而可螺接於螺桿部122a,並抵接於基座135,以使連接件122固定於基座135。
In addition, the pressure chamber
因此,當鬆開定位件127時,連接件122可相對於基座135上下移動。當要固定連接件122與基座135之間的相對位置時,只要將定位件127螺接於螺桿部122a且抵接至基座135,連接件122便可不會相對於基座135移動。
Therefore, when the
要說明的是,在本實施例中,由於腔體110的內部空間112中的壓力可以是負壓或是高壓,為了避免壓力洩漏,壓力腔水平保持裝置100更包括多個密封組件125,設置於腔體110外且連通於腔體110。
It should be noted that, in this embodiment, since the pressure in the
具體地說,在本實施例中,密封組件125包括一可撓管128、一固定件121及一密封件123。可撓管128例如是一波紋管,可撓管128的壁面具有氣密且可變形的效果,但可撓管128的種類不以此為限制。可撓管128套設於連接件122位於腔體110外的一部分。
Specifically, in this embodiment, the
固定件121設置於對應的可撓管128的一端(上端)且固定於腔體110的外表面。固定件121例如是法蘭片,但不以此為限
制。固定件121可透過螺絲鎖固在腔體110的壁面上。固定件121包括一貫孔121a,對應於腔體110的穿孔114,連接件122穿過固定件121的貫孔121a。
The fixing
密封件123設置於對應的可撓管128的另一端(下端),連接件122穿過密封件123。密封件123例如是法蘭片,但不以此為限制。密封件123與連接件122之間可以設有O環(未繪示),以保持氣密。
The sealing
如圖3所示,當製程中,腔體110的壁面因為腔體110內部壓力小於或大於外界壓力而變形時,由於固定件121固定於腔體110的壁面而會隨著改變位置,可撓管128對應地略微彎曲而吸收變形。因此,密封件123與連接件122之間的位置可保持不變。
As shown in Figure 3, when the wall surface of the
請回到圖1,在本實施例中,這些調整件126設置於腔體110外且連動於這些連接件122,以調整這些連接件122相對於基座135的位置,而使治具平台120於腔體110內呈水平。
Please return to FIG. 1 , in this embodiment, these
具體地說,這些調整件126設置於這些密封組件125的這些密封件123與基座135之間。調整件126的上緣抵接於密封件123,調整件126的上緣抵接於基座135。調整件126及對應的定位件127夾設於基座135的兩側,螺桿部122a穿過對應的調整件126、基座135及對應的定位件127。
Specifically, the adjusting
在本實施例中,調整件126具有內螺紋,而螺接於螺桿部122a。因此,當需要調整連接件122相對於基座135的位置時,
只要轉動調整件126,連接件122便可向上或向下移動,進而調整腔體110內的治具平台120的角度。
In this embodiment, the
當然,調整件126的種類不以此為限制。在其他實施例中,調整件126也可以是馬達,設置於基座135上且使連接件122相對於基座135上下移動。
Of course, the type of the
此外,在本實施例中,壓力腔水平保持裝置100更包括一機架130,腔體110位於機架130上,基座135及這些連接件122位於機架130內。如圖3所示,當腔體110內的壓力小於腔體110外的壓力時,腔體110變形而部分地分離於機架130。
In addition, in this embodiment, the pressure chamber
也就是說,腔體110與機架130相接觸的部位可以不是完全固定,而是部分固定,以降低腔體110受到壓力變形時連帶地使機架130變形的機率,因此機架130能更穩固地立於地面上,以承載腔體110。
That is to say, the part where the
在使用本實施例的壓力腔水平保持裝置100時,在尚未對腔體110抽真空或是加壓之前,操作者可將水平儀(未繪示)放置於腔體110內的治具平台120上,來確定治具平台120是否呈水平。若治具平台120尚未呈水平,操作者只要先調整這些連接件122相對於基座135的位置,以將腔體110內的治具平台120校正為水平之後,即可固定連接件122相對於基座135的位置,且移除水平儀。
When using the pressure chamber
後續在製程過程中,即便腔體110的壁面因為腔體110內部壓力小於或大於外界壓力而變形,由於治具平台120透過連
接件122固定於腔體110外的基座135,而不直接接觸於腔體110的壁面。因此,腔體110內的治具平台120並不會受到腔體110的壁面變形的影響,而可維持在水平狀態。
During the subsequent manufacturing process, even if the wall surface of the
因此,本實施例的壓力腔水平保持裝置100可適用各式精準微小圖案鍍膜製程,治具平台120可提供良好水平,以達成高良率之精準鍍膜處理要求。另外,本實施例的壓力腔水平保持裝置100僅有治具平台120與連接件122的一部分位於腔體110內,腔體110內用來調整水平的元件數量相當少,具有維護容易的優點。
Therefore, the pressure chamber
綜上所述,本發明的壓力腔水平保持裝置將治具平台設置於腔體內,這些連接件連接於腔體內的治具平台,且延伸至腔體外而可移動地設置於基座。此外,調整件設置於腔體外且連動於這些連接件,以調整這些連接件相對於基座的位置,而使治具平台於腔體內呈水平。因此,操作者只要先調整這些連接件相對於基座的位置,以將腔體內的治具平台校正為水平,後續在製程過程中,即便腔體的壁面因為腔體內部壓力小於或大於外界壓力而變形,由於治具平台透過連接件固定於腔體外的基座,而不直接接觸於腔體的壁面,因此,腔體內的治具平台並不會受到腔體的壁面變形的影響,而可維持在水平狀態。 To sum up, in the device for maintaining the level of the pressure chamber of the present invention, the jig platform is arranged in the cavity, and the connecting parts are connected to the jig platform in the cavity, and extend out of the cavity to be movably arranged on the base. In addition, the adjusting part is arranged outside the cavity and linked to the connecting parts to adjust the positions of the connecting parts relative to the base so that the jig platform is horizontal in the cavity. Therefore, the operator only needs to adjust the position of these connecting parts relative to the base to correct the fixture platform in the cavity to be horizontal. In the subsequent process, even if the internal pressure of the cavity is less than or greater than the external pressure And deformation, because the jig platform is fixed on the base outside the cavity through the connecting piece, and does not directly contact the wall of the cavity, therefore, the jig platform in the cavity will not be affected by the deformation of the wall of the cavity, and can remain horizontal.
100:壓力腔水平保持裝置 100: Pressure chamber level maintaining device
110:腔體 110: Cavity
112:內部空間 112: Internal space
114:穿孔 114: perforation
120:治具平台 120: Fixture platform
121:固定件 121:Fixer
121a:貫孔 121a: through hole
122:連接件 122: connector
123:密封件 123: seal
125:密封組件 125: sealing assembly
126:調整件 126: Adjustment parts
127:定位件 127: Positioning piece
128:可撓管 128: flexible tube
130:機架 130: Rack
135:基座 135: base
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW110144444A TWI785907B (en) | 2021-11-29 | 2021-11-29 | Pressure chamber level maintaining device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW110144444A TWI785907B (en) | 2021-11-29 | 2021-11-29 | Pressure chamber level maintaining device |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI785907B true TWI785907B (en) | 2022-12-01 |
TW202321483A TW202321483A (en) | 2023-06-01 |
Family
ID=85794799
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW110144444A TWI785907B (en) | 2021-11-29 | 2021-11-29 | Pressure chamber level maintaining device |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI785907B (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW464919B (en) * | 1999-03-30 | 2001-11-21 | Tokyo Electron Ltd | Plasma processing apparatus, maintenance method thereof and setting method thereof |
US20110061591A1 (en) * | 2009-09-17 | 2011-03-17 | Sciaky, Inc. | Electron beam layer manufacturing |
TW202022145A (en) * | 2018-12-05 | 2020-06-16 | 財團法人金屬工業研究發展中心 | Vacuum fixture |
-
2021
- 2021-11-29 TW TW110144444A patent/TWI785907B/en active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW464919B (en) * | 1999-03-30 | 2001-11-21 | Tokyo Electron Ltd | Plasma processing apparatus, maintenance method thereof and setting method thereof |
US20110061591A1 (en) * | 2009-09-17 | 2011-03-17 | Sciaky, Inc. | Electron beam layer manufacturing |
TW202022145A (en) * | 2018-12-05 | 2020-06-16 | 財團法人金屬工業研究發展中心 | Vacuum fixture |
Also Published As
Publication number | Publication date |
---|---|
TW202321483A (en) | 2023-06-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8720873B2 (en) | Substrate holding device | |
JP3205145U (en) | Board lift pin actuator | |
TWI807080B (en) | Electrostatic chuck, attaching equipment having same, and attaching method | |
TWI785907B (en) | Pressure chamber level maintaining device | |
KR101979090B1 (en) | Vacuum film-forming apparatus | |
US8943669B2 (en) | Assembly method for vacuum processing apparatus | |
CN109468588B (en) | Mask plate preparation method and mask plate | |
US10483142B1 (en) | Vacuum robot positioning system with reduced sensitivity to chamber pressure | |
JPH0578930B2 (en) | ||
TW202205349A (en) | Rf return path for reduction of parasitic plasma | |
US10858735B2 (en) | Alignment systems employing actuators providing relative displacement between lid assemblies of process chambers and substrates, and related methods | |
CN113981409B (en) | Vacuum optical airtight cabin without negative pressure stress | |
TW202314947A (en) | Bracket, semiconductor chamber and semiconductor process equipment | |
CN102118005A (en) | Modular optical resonant chamber of high-power laser | |
JP2827959B2 (en) | Focused ion beam apparatus and pattern forming method | |
KR102229916B1 (en) | Composite material spring-back compensation processing device | |
TWI702681B (en) | Wafer transfer device | |
TWI827891B (en) | Bellows structure, method for adjusting verticality and plasma treatment device | |
KR101451094B1 (en) | Close-type exposure apparatus | |
TWI836026B (en) | Substrate lifting mechanism, substrate supporter and substrate processing device | |
CN218956880U (en) | Lens calibration device and optical instrument | |
CN114807906B (en) | Atomic layer deposition equipment | |
CN215004064U (en) | Sealing device | |
CN113589652B (en) | Mask table, exposure device and photoetching equipment | |
CN117270336A (en) | Surface shape adjusting device |