TWI768939B - Memory device - Google Patents
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- TWI768939B TWI768939B TW110119697A TW110119697A TWI768939B TW I768939 B TWI768939 B TW I768939B TW 110119697 A TW110119697 A TW 110119697A TW 110119697 A TW110119697 A TW 110119697A TW I768939 B TWI768939 B TW I768939B
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- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
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- G—PHYSICS
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- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
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- G11C16/24—Bit-line control circuits
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- G11C16/00—Erasable programmable read-only memories
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- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/34—Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
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Abstract
Description
本發明是有關於一種記憶體領域,且特別是有關於一種能夠至少儲存用於記憶體裝置的操作資料的記憶體裝置。The present invention relates to the field of memory, and more particularly, to a memory device capable of storing at least operating data for the memory device.
一般來說,記憶體裝置會需要操作資料已進行啟動操作。操作資料也是被儲存在其他的記憶體元件中。然而,以ETOX快閃記憶體為例,現行的記憶體裝置在上電之後,讀取電壓值必需要到達5伏特才能讀取操作資料。因此,上述的讀取操作的時間長度會被延長。此外,用以儲存操作資料的記憶體元件必須要有較高的可靠性,從而使記憶體裝置能夠依據正確的操作資料來進行預期的啟動操作。因此,如何縮短讀取操作的時間長度以及確保記憶體裝置執行正確的啟動操作,是本領域技術人員的研究重點之一。Generally, a memory device will require operational data to perform a boot operation. Operational data is also stored in other memory elements. However, taking the ETOX flash memory as an example, after the current memory device is powered on, the read voltage value must reach 5 volts to read the operation data. Therefore, the time length of the above-mentioned read operation is prolonged. In addition, the memory device for storing the operation data must have high reliability, so that the memory device can perform the expected start-up operation according to the correct operation data. Therefore, how to shorten the time length of the read operation and ensure that the memory device performs the correct start-up operation is one of the research focuses of those skilled in the art.
本發明提供一種記憶體裝置,能夠縮短讀取操作的時間長度以及確保記憶體裝置執行正確的啟動操作。The present invention provides a memory device capable of shortening the time length of a read operation and ensuring that the memory device performs a correct start-up operation.
本發明的記憶體裝置包括設定記憶體陣列以及控制器。設定記憶體陣列包括彼此並聯耦接的多個快閃記憶體串列。所述多個快閃記憶體串列分別包括多個虛設記憶胞以及單一位元的修整記憶胞。修整記憶胞儲存用於記憶體裝置的操作資料。在相同的快閃記憶體串列中,修整記憶胞串聯耦接於所述多個虛設記憶胞的其中二者之間。控制器耦接於設定記憶體陣列。控制器對設定記憶體陣列的所述多個修整記憶胞進行近似零電壓值讀取操作以讀取操作資料。The memory device of the present invention includes a setting memory array and a controller. The configuration memory array includes a plurality of flash memory strings coupled in parallel with each other. The plurality of flash memory strings respectively include a plurality of dummy memory cells and trimmed memory cells of a single cell. Trim memory cells store operational data for the memory device. In the same flash memory string, trim memory cells are coupled in series between two of the plurality of dummy memory cells. The controller is coupled to the setting memory array. The controller performs an approximately zero-voltage reading operation on the plurality of trim cells of the setting memory array to read operation data.
基於上述,本發明的設定記憶體陣列包括彼此並聯耦接的多個快閃記憶體串列。所述多個快閃記憶體串列分別包括多個虛設記憶胞以及單一位元的修整記憶胞。控制器對所述設定記憶體陣列的所述多個修整記憶胞進行近似零電壓值讀取操作以讀取所述操作資料。如此一來,用於設定記憶體陣列的讀取操作的時間長度可以被縮短。此外,在相同的快閃記憶體串列中,修整記憶胞串聯耦接於所述多個虛設記憶胞之間。如此一來,所述多個修整記憶胞具有較高的可靠性。Based on the above, the setting memory array of the present invention includes a plurality of flash memory strings coupled in parallel with each other. The plurality of flash memory strings respectively include a plurality of dummy memory cells and trimmed memory cells of a single cell. The controller performs an approximately zero-voltage reading operation on the plurality of trim cells of the setting memory array to read the operation data. In this way, the time length of the read operation for setting the memory array can be shortened. In addition, in the same flash memory string, trim memory cells are coupled in series between the plurality of dummy memory cells. In this way, the plurality of trimmed memory cells have high reliability.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more obvious and easy to understand, the following embodiments are given and described in detail with the accompanying drawings as follows.
本發明的部份實施例接下來將會配合附圖來詳細描述,以下的描述所引用的元件符號,當不同附圖出現相同的元件符號將視為相同或相似的元件。這些實施例只是本發明的一部份,並未揭示所有本發明的可實施方式。更確切的說,這些實施例只是本發明的專利申請範圍中的範例。Some embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Element symbols quoted in the following description will be regarded as the same or similar elements when the same element symbols appear in different drawings. These examples are only a part of the invention and do not disclose all possible embodiments of the invention. Rather, these embodiments are only examples within the scope of the patent application of the present invention.
請參考圖1,圖1是依據本發明一實施例所繪示的記憶體裝置的示意圖。在本實施例中,記憶體裝置100包括主記憶體陣列110、設定記憶體陣列120以及控制器130。主記憶體陣列110是快閃記憶體陣列。主記憶體陣列110儲存用戶資料DTA。舉例來說,主記憶體陣列110可以反應於控制器130的操作來儲存用戶資料DTA。設定記憶體陣列120包括彼此快閃記憶體串列ST1~STm。快閃記憶體串列ST1~STm分別包括多個虛設記憶胞以及單一位元的修整記憶胞。舉例來說,快閃記憶體串列ST1包括虛設記憶胞D11~D1n以及修整記憶胞T1。快閃記憶體串列ST2包括虛設記憶胞D21~D2n以及修整記憶胞T2。同理可推,快閃記憶體串列STm包括虛設記憶胞Dm1~Dmn以及修整記憶胞Tm。在本實施例中,修整記憶胞T1~Tm儲存用於記憶體裝置100的操作資料OD。因此,設定記憶體陣列120能夠儲存m位元的操作資料OD。以m=3為例,操作資料OD可例如是操作程序的選擇碼。設定記憶體陣列120例如能夠儲存8種關聯於不同操作程序的不同選擇碼(option code)。因此,控制器130可依據儲存於設定記憶體陣列120中選擇碼進行對應於選擇碼的操作程序(如,啟動主記憶體陣列110的程序)。由於修整記憶胞T1~Tm為快閃記憶胞,因此,修整記憶胞T1~Tm可以被至少執行多次編寫(multi-time programmable)操作。Please refer to FIG. 1 , which is a schematic diagram of a memory device according to an embodiment of the present invention. In this embodiment, the
在本實施例中,在相同的快閃記憶體串列中,修整記憶胞串聯耦接於虛設記憶胞的其中二者之間。以快閃記憶體串列ST1為例,修整記憶胞T1與虛設記憶胞D11~D1n串聯耦接,並且耦接於虛設記憶胞D11、D12之間。也就是說,修整記憶胞T1並不是快閃記憶體串列ST1的第一位元記憶胞或最後位元記憶胞。應注意的是,快閃記憶體串列ST1~STm的第一位元記憶胞或最後位元記憶胞都是位於設定記憶體陣列120的邊界(boundary)的邊界記憶胞。邊界記憶胞的可靠性較為不佳。由於修整記憶胞T1~Tm並不是邊界記憶胞。修整記憶胞T1~Tm並不會受到設定記憶體陣列120本身的邊界條件的影響。如此一來,修整記憶胞T1~Tm具有較高的可靠性。In this embodiment, in the same flash memory string, the trim memory cells are coupled in series between two of the dummy memory cells. Taking the flash memory string ST1 as an example, the trim memory cell T1 is coupled in series with the dummy memory cells D11 to D1n, and is coupled between the dummy memory cells D11 and D12. That is, the trim cell T1 is not the first or last bit memory cell of the flash memory string ST1. It should be noted that the first bit memory cell or the last bit memory cell of the flash memory strings ST1 ˜ STm are both boundary memory cells located at the boundary of the
在本實施例中,控制器130耦接於主記憶體陣列110以及設定記憶體陣列120。控制器130被操作以對主記憶體陣列110以及設定記憶體陣列120進行存取操作。控制器130對設定記憶體陣列120的修整記憶胞T1~Tm進行近似零電壓值讀取操作以讀取操作資料OD。因此,控制器130可以在啟動時不需要將讀取用的判斷電壓的電壓值抬升到高電壓準位(如5伏特)。控制器130可以在啟動時即對設定記憶體陣列120進行讀取操作。如此一來,用於設定記憶體陣列120的讀取操作的時間長度可以被縮短。In this embodiment, the
在本實施例中,修整記憶胞T1~Tm為快閃記憶胞。透過製程參數的變更,修整記憶胞T1~Tm的本質(intrinsic)門檻電壓值可以被降低。上述的製程參數例如是阱(如共用阱(common well))的設計及/或阱的摻雜濃度。在本實施例中,修整記憶胞T1~Tm的負門檻電壓值對應第一邏輯值。修整記憶胞T1~Tm的正門檻電壓值對應第二邏輯值。第一邏輯值不同於第二邏輯值。因此,控制器130能夠利用具有低電壓值(如0~1.2伏特)的判斷電壓來對修整記憶胞T1~Tm執行讀取操作。In this embodiment, the trimmed memory cells T1-Tm are flash memory cells. By changing the process parameters, the intrinsic threshold voltage of the trimmed memory cells T1~Tm can be lowered. The above-mentioned process parameters are, for example, the design of the well (eg, common well) and/or the doping concentration of the well. In this embodiment, the negative threshold voltage values of the trimmed memory cells T1 ˜Tm correspond to the first logic value. The positive threshold voltage values of the trimmed memory cells T1 ˜Tm correspond to the second logic value. The first logical value is different from the second logical value. Therefore, the
在本實施例中,設定記憶體陣列120中的虛設記憶胞以及修整記憶胞的佈局分別大致上等於主記憶體陣列110的記憶胞的佈局。因此,設定記憶體陣列120的邊界佈局(boundary layout)規則也會符合主記憶體陣列110的的邊界佈局規則。如此一來,設定記憶體陣列120不需要例用額外的光罩。因此,光罩的設計成本得以降低。In this embodiment, the layouts of the dummy memory cells and the trimmed memory cells in the
在本實施例中,設定記憶體陣列120可位於記憶體裝置100的周邊區域,並且獨立於主記憶體陣列110。也就是說,設定記憶體陣列120與主記憶體陣列110分別被設置在不同的區域。因此,設定記憶體陣列120並不會佔用到主記憶體陣列110的儲存空間。In this embodiment, it is assumed that the
進一步來說明設定記憶體陣列的實施細節。請參考同時參考圖1以及圖2,圖2是依據本發明一實施例所繪示的設定記憶體陣列的示意圖。設定記憶體陣列220可適用於記憶體裝置100。在本實施例中,設定記憶體陣列220以3個快閃記憶體串列ST1~ST3來示例。本發明的快閃記憶體串列的數量可以是多個,並不以本實施例的快閃記憶體串列ST1~ST3的數量為限。The implementation details of setting the memory array are further described. Please refer to FIG. 1 and FIG. 2 at the same time. FIG. 2 is a schematic diagram of a configuration memory array according to an embodiment of the present invention. The
在設定記憶體陣列220中,快閃記憶體串列ST1位於第一行。快閃記憶體串列ST1包括虛設記憶胞D11~D13以及修整記憶胞T1。快閃記憶體串列ST2位於第二行。快閃記憶體串列ST2包括虛設記憶胞D21~D23以及修整記憶胞T2。快閃記憶體串列ST3位於第三行。快閃記憶體串列ST3包括虛設記憶胞D31~D33以及修整記憶胞T3。在本實施例中,虛設記憶胞D11~D13以及修整記憶胞T1彼此串聯耦接。修整記憶胞T1耦接於虛設記憶胞D12、D13之間。虛設記憶胞D21~D23以及修整記憶胞T2彼此串聯耦接。修整記憶胞T2耦接於虛設記憶胞D22、D23之間。虛設記憶胞D31~D33以及修整記憶胞T3彼此串聯耦接。修整記憶胞T3耦接於虛設記憶胞D32、D33之間。In the
在本實施例中,修整記憶胞T1~T3的控制端共同連接至相同的字元線WL。因此,修整記憶胞T1~T3會被設置在同一列。如此一來,設定記憶體陣列220可以僅有單一字元線WL。In this embodiment, the control terminals of the trimming memory cells T1 ˜ T3 are commonly connected to the same word line WL. Therefore, trimmed memory cells T1~T3 are arranged in the same column. As such, the
在本實施例中,修整記憶胞T1的第一端電性連接至位元線BL1而不會經過虛設記憶胞D11~D13的至少其中之一。修整記憶胞T2的第一端電性連接至位元線BL2而不會經過虛設記憶胞D21~D23的至少其中之一。修整記憶胞T3的第一端電性連接至位元線BL3而不會經過虛設記憶胞D31~D33的至少其中之一。舉例來說,修整記憶胞T1的第一端直接電性連接至位元線BL1。修整記憶胞T2的第一端直接電性連接至位元線BL2。修整記憶胞T3的第一端直接電性連接至位元線BL3。In this embodiment, the first end of the trimming memory cell T1 is electrically connected to the bit line BL1 without passing through at least one of the dummy memory cells D11 ˜ D13 . The first end of the trim memory cell T2 is electrically connected to the bit line BL2 without passing through at least one of the dummy memory cells D21-D23. The first end of the trimming memory cell T3 is electrically connected to the bit line BL3 without passing through at least one of the dummy memory cells D31 ˜ D33 . For example, the first end of the trimmed memory cell T1 is directly electrically connected to the bit line BL1. The first end of the trimmed memory cell T2 is directly electrically connected to the bit line BL2. The first end of the trimmed memory cell T3 is directly electrically connected to the bit line BL3.
在本實施例中,修整記憶胞T1的第二端、修整記憶胞T2的第二端以及修整記憶胞T3的第二端電性連接至源極線CSL(或稱共用源極線)而不會經過虛設記憶胞D11~D13、D21~D23、D31~D33的至少其中之一。舉例來說,修整記憶胞T1的第二端、修整記憶胞T2的第二端以及修整記憶胞T3的第二端直接電性連接至源極線CSL。如此一來,設定記憶體陣列220可以僅有單一源極線CSL。基於上述的配置,控制器130可以對修整記憶胞T1~T3進行一次性的抹除操作,隨後對需要被編程的選中修整記憶胞進行編程操作。In this embodiment, the second end of the trimmed memory cell T1, the second end of the trimmed memory cell T2, and the second end of the trimmed memory cell T3 are electrically connected to the source line CSL (or the common source line) without It will pass through at least one of the dummy memory cells D11~D13, D21~D23, and D31~D33. For example, the second end of the trimmed memory cell T1, the second end of the trimmed memory cell T2, and the second end of the trimmed memory cell T3 are directly electrically connected to the source line CSL. In this way, the
在此值得一提的是,基於上述的配置,控制器130利用字元線WL、源極線CSL以及位元線BL1~BL3僅對修整記憶胞T1~T3進行抹除操作以及編程操作的至少其中之一。此外,控制器130利用字元線WL、源極線CSL以及位元線BL1~BL3僅對修整記憶胞T1~T3進行讀取操作。如此一來,本實施例可避免虛設記憶胞D11~D13、D21~D23、D31~D33的過抹除(over-erase)現象所造成的讀取干擾。It is worth mentioning here that, based on the above configuration, the
在一些實施例中,修整記憶胞T1的第二端、修整記憶胞T2的第二端以及修整記憶胞T3的第二端分別電性連接至不同的源極線。In some embodiments, the second end of the trimmed memory cell T1, the second end of the trimmed memory cell T2, and the second end of the trimmed memory cell T3 are electrically connected to different source lines, respectively.
請同時參考圖1以及圖3,圖3是依據本發明一實施例所繪示的修整記憶胞的資料狀態示意圖。在本實施例中,控制器130可以對修整記憶胞T1~Tm進行抹除操作以及編程操作的至少其中之一以使對修整記憶胞T1~Tm儲存操作資料OD。控制器130會提供較大的抹除電壓並維持0.1秒到1秒來對修整記憶胞T1~Tm的至少其中之一進行抹除操作。因此,被執行抹除操作的修整記憶胞的門檻電壓值Vt會小於或等於-1伏特。小於或等於-1伏特的電壓值Vt可對應到第一邏輯值LG1,例如是邏輯「1」。在本實施例中,抹除操作可以是單擊(one shot)強抹除操作。因此,控制器130可以不用執行抹除操作後的抹除驗證操作。Please refer to FIG. 1 and FIG. 3 at the same time. FIG. 3 is a schematic diagram of a data state of a trimmed memory cell according to an embodiment of the present invention. In this embodiment, the
此外,控制器130還可以對修整記憶胞T1~Tm的至少其中之一以使被執行編程操作的修整記憶胞的門檻電壓值Vt會大於或等於2伏特。大於或等於2伏特的電壓值Vt可對應到第二邏輯值LG2,例如是邏輯「0」。In addition, the
在本實施例中,控制器130可利用低電壓值(如0伏特~預設電壓值VDD)的判斷電壓來對修整記憶胞執行讀取操作。以被執行抹除操作的修整記憶胞為例,由於被執行抹除操作的修整記憶胞的門檻電壓值Vt小於或等於-1伏特,判斷電壓足夠使修整記憶胞導通,進而產生大於一電流閾值的讀取電流值(約10~15微安培,本發明並不以此為限)。因此,修整記憶胞可以被獲知儲存了第一邏輯值LG1(例如是邏輯「1」)的資料。In this embodiment, the
以被執行編程操作的修整記憶胞為例,由於被執行編程操作的修整記憶胞的門檻電壓值Vt大於或等於2伏特,判斷電壓無法使被執行編程操作的修整記憶胞導通。在被進行讀取操作的過程中,被執行編程操作的修整記憶胞被斷開。讀取電流值則趨近於0。讀取電流值會低於電流閾值。因此,修整記憶胞可以被獲知儲存了第二邏輯值LG2(例如是邏輯「0」)的資料。Taking the trimmed memory cell to be programmed as an example, since the threshold voltage Vt of the trimmed memory cell to be programmed is greater than or equal to 2 volts, it is judged that the voltage cannot make the trimmed memory cell to be programmed to conduct. During the read operation being performed, the trim cell to which the programming operation is performed is disconnected. The read current value approaches 0. Reading the current value will be lower than the current threshold. Therefore, the trimmed memory cell can be known to store the data of the second logic value LG2 (eg, logic "0").
在本實施例中,預設電壓值VDD可以是1.2伏特。也就是說,當前的判斷電壓的電壓值可具有1.2伏特的裕度(margin)M。透過製程參數的變更,修整記憶胞在不同邏輯狀態下的門檻電壓值Vt可以被改變。因此,判斷電壓的電壓值的裕度M可以更寬。In this embodiment, the preset voltage value VDD may be 1.2 volts. That is, the voltage value of the current judgment voltage may have a margin M of 1.2 volts. By changing the process parameters, the threshold voltage value Vt of the trimmed memory cell in different logic states can be changed. Therefore, the margin M of the voltage value of the judgment voltage can be wider.
請參考圖4,圖4是依據本發明另一實施例所繪示的記憶體裝置的示意圖。在本實施例中,記憶體裝置300包括主記憶體陣列310、設定記憶體陣列320以及控制器330。與圖1所示的記憶體裝置100不同的是,設定記憶體陣列320是由主記憶體陣列310分割出來的子陣列。設定記憶體陣列320以及控制器330的實施細節可以由圖1至圖3的多個實施例獲得足夠得教示,因此恕不在此重述。Please refer to FIG. 4 , which is a schematic diagram of a memory device according to another embodiment of the present invention. In this embodiment, the
綜上所述,本發明的設定記憶體陣列包括彼此並聯耦接的多個快閃記憶體串列。所述多個快閃記憶體串列分別包括多個虛設記憶胞以及單一位元的修整記憶胞。修整記憶胞儲存用於所述記憶體裝置的操作資料。控制器對所述設定記憶體陣列的所述多個修整記憶胞進行近似零電壓值讀取操作以讀取所述操作資料。如此一來,用於設定記憶體陣列的讀取操作的時間長度可以被縮短。在相同的快閃記憶體串列中,修整記憶胞串聯耦接於所述多個虛設記憶胞之間。因此,修整記憶胞並不會受到設定記憶體陣列本身的邊界條件的影響。如此一來,所述多個修整記憶胞具有較高的可靠性。此外,記憶體裝置對修整記憶胞進行操作。如此一來,本發明可避免虛設記憶胞的過抹除現象所造成的讀取干擾。To sum up, the setting memory array of the present invention includes a plurality of flash memory strings coupled in parallel with each other. The plurality of flash memory strings respectively include a plurality of dummy memory cells and trimmed memory cells of a single cell. Trim memory cells store operational data for the memory device. The controller performs an approximately zero-voltage reading operation on the plurality of trim cells of the setting memory array to read the operation data. In this way, the time length of the read operation for setting the memory array can be shortened. In the same flash memory string, trim memory cells are coupled in series between the plurality of dummy memory cells. Therefore, trimming the memory cells is not affected by setting the boundary conditions of the memory array itself. In this way, the plurality of trimmed memory cells have high reliability. In addition, the memory device operates on trimmed memory cells. In this way, the present invention can avoid the read disturbance caused by the over-erase phenomenon of the dummy memory cells.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed as above with examples, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The protection scope of the present invention shall be determined by the scope of the appended patent application.
100、300:記憶體裝置
110、310:主記憶體陣列
120、220、320:設定記憶體陣列
130、330:控制器
BL1、BL2、BL3:位元線
CSL:源極線
D11、D12、D13、D1n、D21、D22、D23、D2n、D31、D32、D33、Dm1、Dm2、Dmn:虛設記憶胞
DTA:用戶資料
LG1:第一邏輯值
LG2:第二邏輯值
M:裕度
OD:操作資料
ST1、ST2、ST3、STm:快閃記憶體串列
T1、T2、T3、Tm:修整記憶胞
VDD:預設電壓值
Vt:門檻電壓值
WL:字元線100, 300:
圖1是依據本發明一實施例所繪示的記憶體裝置的示意圖。 圖2是依據本發明一實施例所繪示的設定記憶體陣列的示意圖。 圖3是依據本發明一實施例所繪示的修整記憶胞的資料狀態示意圖。 圖4是依據本發明另一實施例所繪示的記憶體裝置的示意圖。 FIG. 1 is a schematic diagram of a memory device according to an embodiment of the present invention. FIG. 2 is a schematic diagram illustrating a configuration memory array according to an embodiment of the present invention. 3 is a schematic diagram of a data state of a trimmed memory cell according to an embodiment of the present invention. FIG. 4 is a schematic diagram of a memory device according to another embodiment of the present invention.
100:記憶體裝置 100: Memory device
110:主記憶體陣列 110: Main memory array
120:設定記憶體陣列 120: Set the memory array
130:控制器 130: Controller
D11、D12、D1n、D21、D22、D2n、Dm1、Dm2、Dmn:虛設記憶胞 D11, D12, D1n, D21, D22, D2n, Dm1, Dm2, Dmn: dummy memory cells
DTA:用戶資料 DTA: User Profile
OD:操作資料 OD: Operational Data
ST1、ST2、STm:快閃記憶體串列 ST1, ST2, STm: Flash memory string
T1、T2、Tm:修整記憶胞 T1, T2, Tm: trimmed memory cells
Claims (11)
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US20010044918A1 (en) * | 2000-04-18 | 2001-11-22 | Hitachi, Ltd. | Semiconductor integrated circuit and design method and manufacturing method of the same |
US6724647B1 (en) * | 2000-01-28 | 2004-04-20 | Renesas Technology Corporation | Variable logical circuit, semiconductor integrated circuit, and method for manufacturing semiconductor integrated circuit |
US20080019206A1 (en) * | 2006-06-29 | 2008-01-24 | Freescale Semiconductor, Inc. | Integrated circuit having a memory with low voltage read/write operation |
US20180226125A1 (en) * | 2015-08-27 | 2018-08-09 | Sony Corporation | Memory, information processing system, and method of controlling memory |
TWI666640B (en) * | 2017-03-06 | 2019-07-21 | 美商桑迪士克科技有限責任公司 | First read countermeasures in memory |
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US6724647B1 (en) * | 2000-01-28 | 2004-04-20 | Renesas Technology Corporation | Variable logical circuit, semiconductor integrated circuit, and method for manufacturing semiconductor integrated circuit |
US20010044918A1 (en) * | 2000-04-18 | 2001-11-22 | Hitachi, Ltd. | Semiconductor integrated circuit and design method and manufacturing method of the same |
US20080019206A1 (en) * | 2006-06-29 | 2008-01-24 | Freescale Semiconductor, Inc. | Integrated circuit having a memory with low voltage read/write operation |
US20180226125A1 (en) * | 2015-08-27 | 2018-08-09 | Sony Corporation | Memory, information processing system, and method of controlling memory |
TWI666640B (en) * | 2017-03-06 | 2019-07-21 | 美商桑迪士克科技有限責任公司 | First read countermeasures in memory |
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