TWI768872B - Single photon emission device and light-emitting device - Google Patents
Single photon emission device and light-emitting device Download PDFInfo
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Abstract
Description
本發明是有關於一種單光子發光元件(Single Photon Emission Device,SPED),且特別是有關於一種以單激子元件(Single Exciton Device,SED)型態構成之單光子發光元件與發光裝置。 The present invention relates to a single-photon light-emitting device (Single Photon Emission Device, SPED), and more particularly, to a single-photon light-emitting device and a light-emitting device composed of a single exciton device (Single Exciton Device, SED).
量子通訊是量子科技的主要研究應用方向之一,最理想的量子通訊光源是單光子源。要實現單光子發光,必須可以「單獨地」操縱一個特定二能級系統,以在每一次外部觸發下,只有一個光子產生。現階段重點研究的單光子槍候選系統包括半導體量子點、介觀量子井、單分子發光、單原子發光以及鑽石中的色心發光等等。 Quantum communication is one of the main research and application directions of quantum technology. The most ideal light source for quantum communication is a single photon source. To achieve single-photon luminescence, a specific two-level system must be manipulated "individually" so that only one photon is produced per external trigger. The single-photon gun candidate systems currently under study include semiconductor quantum dots, mesoscopic quantum wells, single-molecule luminescence, single-atom luminescence, and color-center luminescence in diamonds.
然而,目前實用的、可控制的、電激勵的單光子源還沒有研製成功。 However, no practical, controllable, electrically excited single-photon source has yet been developed.
本發明提供一種單光子發光元件,能達成可控制單光子源。 The present invention provides a single-photon light-emitting element, which can achieve a controllable single-photon source.
本發明另提供一種發光裝置,能抑制多餘不被利用的自發輻射(spontaneous emission),提升被需要的自發輻射。 The present invention further provides a light-emitting device, which can suppress unnecessary and unused spontaneous emission and increase the required spontaneous emission.
本發明的一種單光子發光元件包括:堆疊結構、源極與汲極以及外部驅動電路。源極與汲極分別設置於所述堆疊結構的相對側。所述堆疊結構包括:單電子(single electron)量子點、第一穿隧層、單電子閘極結構、單電洞(single hole)量子點、第二穿隧層以及單電洞閘極結構。第一穿隧層完全包覆所述單電子量子點,單電子閘極結構完全環繞所述單電子量子點並透過所述第一穿隧層,與所述單電子量子點相隔離。單電洞(single hole)量子點與所述單電子量子點相鄰,第二穿隧層完全包覆所述單電洞量子點,而單電洞閘極結構完全環繞所述單電洞量子點並透過所述第二穿隧層,與所述單電洞量子點相隔離。所述外部驅動電路則被配置以輸出一驅動信號,根據所述驅動信號,控制單電子量子點的單電子穿隧注入單電洞量子點,以使電子電洞在所述單電洞量子點復合發出單光子;或者,控制單電洞量子點的單電洞穿隧注入單電子量子點,以使電子電洞在所述單電子量子點復合發出單光子。 A single-photon light-emitting element of the present invention includes a stack structure, a source electrode and a drain electrode, and an external driving circuit. The source electrode and the drain electrode are respectively disposed on opposite sides of the stack structure. The stacked structure includes a single electron quantum dot, a first tunnel layer, a single electron gate structure, a single hole quantum dot, a second tunnel layer and a single hole gate structure. The first tunneling layer completely covers the single-electron quantum dots, and the single-electron gate structure completely surrounds the single-electron quantum dots and is isolated from the single-electron quantum dots through the first tunneling layer. A single hole quantum dot is adjacent to the single electron quantum dot, the second tunneling layer completely covers the single hole quantum dot, and the single hole gate structure completely surrounds the single hole quantum dot The dots are isolated from the single-hole quantum dots through the second tunneling layer. The external drive circuit is configured to output a drive signal, and according to the drive signal, control the single-electron tunneling of the single-electron quantum dot to inject into the single-hole quantum dot, so that the electron hole is injected into the single-hole quantum dot. Recombination emits a single photon; or, controlling the single-hole tunneling of the single-hole quantum dot to inject the single-electron quantum dot, so that the electron-hole recombination at the single-electron quantum dot emits a single photon.
在本發明的一實施例中,上述單電子量子點的數量為多個,上述單電洞量子點的數量為單一個,且所述多個單電子量子點與所述單一個單電洞量子點彼此上下堆疊。 In an embodiment of the present invention, the number of the single-electron quantum dots is multiple, the number of the single-hole quantum dots is single, and the multiple single-electron quantum dots and the single single-hole quantum dot are Points are stacked on top of each other.
在本發明的一實施例中,上述單電子量子點的數量為單一個,上述單電洞量子點的數量為多個,且所述單一個單電子量子點與所述多個單電洞量子點彼此上下堆疊。 In an embodiment of the present invention, the number of the single-electron quantum dots is single, the number of the single-hole quantum dots is multiple, and the single single-electron quantum dot and the multiple single-hole quantum dots Points are stacked on top of each other.
在本發明的一實施例中,上述單電子量子點的數量為多個,上述單電洞量子點的數量為多個,且所述多個單電子量子點與所述多個單電洞量子點彼此水平相鄰。 In an embodiment of the present invention, the number of the single-electron quantum dots is multiple, the number of the single-hole quantum dots is multiple, and the multiple single-electron quantum dots and the multiple single-hole quantum dots Points are horizontally adjacent to each other.
在本發明的一實施例中,上述單電子量子點的數量為多個,上述單電洞量子點的數量為多個,且所述多個單電子量子點與所述多個單電洞量子點是上下成對配置。 In an embodiment of the present invention, the number of the single-electron quantum dots is multiple, the number of the single-hole quantum dots is multiple, and the multiple single-electron quantum dots and the multiple single-hole quantum dots Dots are configured in pairs up and down.
本發明的另一種單光子發光元件包括:堆疊結構、源極與汲極以及外部驅動電路。源極與汲極分別設置於所述堆疊結構的相對側。所述堆疊結構包括:單電子量子點、第一穿隧層、單電子閘極結構、單電洞量子點、第二穿隧層、單電洞閘極結構以及未摻雜的(undoped)直接能隙半導體層。第一穿隧層完全包覆所述單電子量子點,單電子閘極結構完全環繞所述單電子量子點並透過所述第一穿隧層,與所述單電子量子點相隔離。第二穿隧層完全包覆所述單電洞量子點,而單電洞閘極結構完全環繞所述單電洞量子點並透過所述第二穿隧層,與所述單電洞量子點相隔離。未摻雜的直接能隙半導體層介於所述單電子量子點與所述單電洞量子點之間,並透過第一與第二穿隧層,分別與單電子量子點以及單電洞量子點相隔離。所述外部驅動電路則被配置以輸出一驅動信號,根據所述驅動信號,控制所述單電子量子點的單電 子與所述單電洞量子點的單電洞穿隧注入所述未摻雜的直接能隙半導體層,以使電子電洞在未摻雜的直接能隙半導體層復合發出單光子。 Another single-photon light-emitting element of the present invention includes a stack structure, a source electrode and a drain electrode, and an external driving circuit. The source electrode and the drain electrode are respectively disposed on opposite sides of the stack structure. The stacked structure includes a single-electron quantum dot, a first tunneling layer, a single-electron gate structure, a single-hole quantum dot, a second tunneling layer, a single-hole gate structure, and an undoped direct energy gap semiconductor layer. The first tunneling layer completely covers the single-electron quantum dots, and the single-electron gate structure completely surrounds the single-electron quantum dots and is isolated from the single-electron quantum dots through the first tunneling layer. The second tunneling layer completely covers the single-hole quantum dot, and the single-hole gate structure completely surrounds the single-hole quantum dot and passes through the second tunneling layer, and the single-hole quantum dot is connected to the single-hole quantum dot. isolated. The undoped direct energy gap semiconductor layer is interposed between the single-electron quantum dot and the single-hole quantum dot, and through the first and second tunneling layers, the single-electron quantum dot and the single-hole quantum dot are respectively connected with the single-electron quantum dot and the single-hole quantum dot. points are isolated. The external drive circuit is configured to output a drive signal, and control the single electron of the single electron quantum dot according to the drive signal. The electrons and the single hole of the single hole quantum dot are tunneled and injected into the undoped direct energy gap semiconductor layer, so that the electron holes recombine in the undoped direct energy gap semiconductor layer to emit a single photon.
在本發明的另一實施例中,所述單光子發光元件還可包括控制閘極結構與一絕緣層。控制閘極結構完全環繞所述未摻雜的直接能隙半導體層,絕緣層則位於所述控制閘極結構與所述未摻雜的直接能隙半導體層之間。 In another embodiment of the present invention, the single-photon light-emitting element may further include a control gate structure and an insulating layer. The control gate structure completely surrounds the undoped direct energy gap semiconductor layer, and an insulating layer is located between the control gate structure and the undoped direct energy gap semiconductor layer.
在本發明的另一實施例中,上述未摻雜的直接能隙半導體層為量子點層或量子井層。 In another embodiment of the present invention, the undoped direct energy gap semiconductor layer is a quantum dot layer or a quantum well layer.
在本發明的以上實施例中,上述單電子量子點與上述單電洞量子點可為相同材料或不同材料。 In the above embodiments of the present invention, the single-electron quantum dots and the single-hole quantum dots may be of the same material or different materials.
本發明的又一種單光子發光元件包括:堆疊結構、源極與汲極以及外部驅動電路。源極與汲極分別設置於所述堆疊結構的相對側。所述堆疊結構包括:量子點、一穿隧層、控制閘極結構以及反態載子池(anti-state doped region carrier pool)。所述量子點為單電子量子點或單電洞量子點,穿隧層完全包覆所述量子點。控制閘極結構則完全環繞所述量子點並透過所述穿隧層,與所述量子點相隔離。反態載子池與所述量子點相鄰且與量子點為相反導電態,並透過所述穿隧層與所述量子點相隔離。所述外部驅動電路則被配置以輸出一驅動信號,根據所述驅動信號,控制所述量子點的單電子或單電洞穿隧注入所述反態載子池,以使電子電洞在反態載子池復合發出單光子。 Yet another single-photon light-emitting element of the present invention includes: a stack structure, a source electrode and a drain electrode, and an external driving circuit. The source electrode and the drain electrode are respectively disposed on opposite sides of the stack structure. The stacked structure includes quantum dots, a tunnel layer, a control gate structure, and an anti-state doped region carrier pool. The quantum dots are single-electron quantum dots or single-hole quantum dots, and the tunneling layer completely covers the quantum dots. The control gate structure completely surrounds the quantum dots and is isolated from the quantum dots through the tunneling layer. The anti-state carrier pool is adjacent to the quantum dots and has an opposite conductive state with the quantum dots, and is isolated from the quantum dots through the tunneling layer. The external driving circuit is configured to output a driving signal, and according to the driving signal, control the single electron or single hole of the quantum dot to be injected into the reverse state carrier pool, so that the electron hole is in the reverse state The carrier pool recombines to emit a single photon.
在本發明的又一實施例中,上述量子點是單電子量子點,且上述反態載子池是P型載子池。 In yet another embodiment of the present invention, the quantum dots are single-electron quantum dots, and the anti-state carrier pool is a P-type carrier pool.
在本發明的又一實施例中,上述量子點是單電洞量子點,且上述反態載子池是N型載子池。 In yet another embodiment of the present invention, the quantum dots are single-hole quantum dots, and the anti-state carrier pool is an N-type carrier pool.
在本發明的又一實施例中,上述反態載子池為一維或二維或三維的半導體結構。 In yet another embodiment of the present invention, the inverse carrier pool is a one-dimensional or two-dimensional or three-dimensional semiconductor structure.
在本發明的又一實施例中,上述一維的半導體結構包括奈米線(Nano Wire),上述二維的半導體結構包括量子井(Quantum Well),上述三維的半導體結構包括塊體(Bulk)。 In yet another embodiment of the present invention, the one-dimensional semiconductor structure includes a nanowire, the two-dimensional semiconductor structure includes a quantum well, and the three-dimensional semiconductor structure includes a bulk. .
在本發明的各個實施例中,上述單電子量子點為N型直接能隙半導體量子點或金屬量子點。 In various embodiments of the present invention, the single-electron quantum dots are N-type direct energy gap semiconductor quantum dots or metal quantum dots.
在本發明的各個實施例中,上述單電洞量子點為P型直接能隙半導體量子點。 In various embodiments of the present invention, the single-hole quantum dots are P-type direct energy gap semiconductor quantum dots.
本發明的再一種發光裝置包括:具有光學共振腔的結構以及上述單光子發光元件,且單光子發光元件設置於所述具有光學共振腔的結構內。 Still another light-emitting device of the present invention includes: a structure with an optical resonant cavity and the above-mentioned single-photon light-emitting element, and the single-photon light-emitting element is arranged in the structure with an optical resonant cavity.
在本發明的再一實施例中,上述具有光學共振腔的結構包括微柱型(micropillar)結構、光子晶體型(photonic crystal)結構或微碟型(microdisk)結構。 In yet another embodiment of the present invention, the structure with the optical resonant cavity includes a micropillar structure, a photonic crystal structure or a microdisk structure.
在本發明的再一實施例中,上述發光裝置還可包括布拉格反射鏡(DBR)外腔,用以聚光。 In yet another embodiment of the present invention, the above-mentioned light emitting device may further include a Bragg reflector (DBR) outer cavity for condensing light.
基於上述,本發明經由單電子電晶體(SET)或單電洞電 晶體(SHT)的量子點結構,搭配外部電路達到可控制單光子發光的機制,且本發明的單光子發光元件之電子電洞復合中心可控制在預設區域,所以預期能實現單光子發光。此外,本發明的單光子發光元件設置在具有光學共振腔的結構內,所以能顯著提高量子點的發射效率。 Based on the above, the present invention uses a single-electron transistor (SET) or a single-hole The quantum dot structure of the crystal (SHT) can be combined with an external circuit to achieve a controllable single-photon luminescence mechanism, and the electron-hole recombination center of the single-photon light-emitting element of the present invention can be controlled in a preset area, so it is expected to achieve single-photon luminescence. In addition, the single-photon light-emitting element of the present invention is arranged in a structure with an optical resonant cavity, so the emission efficiency of the quantum dots can be significantly improved.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 In order to make the above-mentioned features and advantages of the present invention more obvious and easy to understand, the following embodiments are given and described in detail with the accompanying drawings as follows.
10、10’、10”、10'''、50、50’、80、SPED:單光子發光元件 10, 10', 10", 10 ''' , 50, 50', 80, SPED: single photon light-emitting element
90:發光裝置 90: Lighting device
100、500、800:堆疊結構 100, 500, 800: Stacked structure
102a:源極 102a: source
102b:汲極 102b: Drain
104:外部驅動電路 104: External drive circuit
106:單電子量子點 106: Single Electron Quantum Dots
108:第一穿隧層 108: The first tunneling layer
110:單電子閘極結構 110: Single Electron Gate Structure
112:單電洞量子點 112: Single-hole quantum dots
114:第二穿隧層 114: Second Tunneling Layer
116:單電洞閘極結構 116: Single-hole gate structure
502、i:未摻雜的直接能隙半導體層 502, i: undoped direct energy gap semiconductor layer
504、806:控制閘極結構 504, 806: Control gate structure
506:絕緣層 506: Insulation layer
802:量子點 802: Quantum Dots
804:穿隧層 804: Tunneling Layer
808:反態載子池 808: Anti-state carrier pool
900:具有光學共振腔的結構 900: Structures with Optical Resonant Cavities
C_spacer、C1_spacer、C2_spacer、C3_spacer、Cn_spacer:SET與SHT之間的穿隧層產生的電容 C_spacer, C1_spacer, C2_spacer, C3_spacer, Cn_spacer: capacitance generated by the tunneling layer between SET and SHT
C_SET_spacer:SET與未摻雜的直接能隙半導體層之間的穿隧層產生的電容 C_SET_spacer: The capacitance generated by the tunneling layer between the SET and the undoped direct-gap semiconductor layer
C_SHT_spacer:SHT與未摻雜的直接能隙半導體層之間的穿隧層產生的電容 C_SHT_spacer: The capacitance generated by the tunneling layer between the SHT and the undoped direct-gap semiconductor layer
Cd_SHT:SHT與汲極之間的穿隧層產生的電容 Cd_SHT: capacitance generated by the tunneling layer between SHT and drain
Cg_SET、Cg_SET1、Cg_SET2、Cg_SET3、Cg_SETn:SET與單電子閘極結構之間的穿隧層產生的電容 Cg_SET, Cg_SET1, Cg_SET2, Cg_SET3, Cg_SETn: Capacitance due to tunneling layer between SET and single electron gate structure
Cg_SHT:SHT與單電洞閘極結構之間的穿隧層產生的電容 Cg_SHT: The capacitance generated by the tunneling layer between the SHT and the single-hole gate structure
Cs_SET、Cs_SET1、Cs_SET2、Cs_SET3、Cs_SETn:SET與源極之間的穿隧層產生的電容 Cs_SET, Cs_SET1, Cs_SET2, Cs_SET3, Cs_SETn: capacitance generated by the tunneling layer between SET and source
SET、SET#1、SET#2、SET#3、SET#n:單電子量子點的位置
SET,
SHT:單電洞量子點的位置 SHT: Location of single-hole quantum dots
Vd:汲極電壓 Vd: drain voltage
Vg_SET、Vg_SET1、Vg_SET2、Vg_SET3、Vg_SETn:單電子閘極電壓 Vg_SET, Vg_SET1, Vg_SET2, Vg_SET3, Vg_SETn: single electron gate voltage
Vg_SHT:單電洞閘極電壓 Vg_SHT: single-hole gate voltage
Vs、Vs1、Vs2、Vs3、Vsn:源極電壓 Vs, Vs1, Vs2, Vs3, Vsn: source voltage
圖1是依照本發明的第一實施例的一種單光子發光元件的分解示意圖。 FIG. 1 is an exploded schematic view of a single-photon light-emitting element according to the first embodiment of the present invention.
圖2是圖1的單光子發光元件的能帶圖。 FIG. 2 is an energy band diagram of the single-photon light-emitting element of FIG. 1 .
圖3是圖1的單光子發光元件的等效電路圖。 FIG. 3 is an equivalent circuit diagram of the single-photon light-emitting element of FIG. 1 .
圖4A是第一實施例的另一例的單光子發光元件的分解示意圖。 4A is an exploded schematic view of a single-photon light-emitting element of another example of the first embodiment.
圖4B是圖4A的單光子發光元件的等效電路圖。 FIG. 4B is an equivalent circuit diagram of the single-photon light-emitting element of FIG. 4A .
圖4C是第一實施例的又一例的單光子發光元件的分解示意圖。 4C is an exploded schematic view of the single-photon light-emitting element of still another example of the first embodiment.
圖4D是第一實施例的再一例的單光子發光元件的分解示意圖。 FIG. 4D is an exploded schematic view of the single-photon light-emitting element of still another example of the first embodiment.
圖5是依照本發明的第二實施例的一種單光子發光元件的分 解示意圖。 FIG. 5 is a schematic diagram of a single-photon light-emitting element according to the second embodiment of the present invention. Solution diagram.
圖6是圖5的單光子發光元件的等效電路圖。 FIG. 6 is an equivalent circuit diagram of the single-photon light-emitting element of FIG. 5 .
圖7是第二實施例的另一例的單光子發光元件的分解示意圖。 7 is an exploded schematic view of a single-photon light-emitting element of another example of the second embodiment.
圖8是依照本發明的第三實施例的一種單光子發光元件的分解示意圖。 FIG. 8 is an exploded schematic view of a single-photon light-emitting element according to the third embodiment of the present invention.
圖9是依照本發明的第四實施例的一種發光裝置的分解示意圖。 FIG. 9 is an exploded schematic view of a light emitting device according to a fourth embodiment of the present invention.
下文列舉實施例並配合所附圖式來進行詳細地說明,但所提供的實施例並非用以限制本發明所涵蓋的範圍。此外,圖式僅以說明為目的,並未依照原尺寸作圖。為了方便理解,下述說明中相同的元件將以相同的符號標示來說明。 The following examples are described in detail with the accompanying drawings, but the provided examples are not intended to limit the scope of the present invention. In addition, the drawings are for illustrative purposes only and are not drawn in full scale. In order to facilitate understanding, the same elements in the following description will be described with the same symbols.
此外,關於文中所使用「包含」、「包括」、「具有」等等用語,均為開放性的用語,也就是指「包括但不限於」。 In addition, the terms such as "include", "include", "have", etc. used in the text are all open-ended terms, that is, "including but not limited to".
應當理解,儘管術語「第一」、「第二」、「第三」等在本文中可以用於描述各種元件、部件、區域、層及/或部分,但是這些元件、部件、區域、及/或部分不應受這些術語的限制。這些術語僅用於將一個元件、部件、區域、層或部分與另一個元件、部件、區域、層或部分區分開。因此,下面討論的「第一元件」、「部件」、「區域」、「層」、或「部分」可以被稱為第二元件、部件、區 域、層或部分而不脫離本文的教導。 It will be understood that, although the terms "first," "second," "third," etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, and/or or parts shall not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, "a first element", "component", "region", "layer", or "section" discussed below can be termed a second element, component, region domains, layers or sections without departing from the teachings herein.
另外,文中所提到的方向性用語,例如「上」、「下」等,僅是用以參考圖式的方向,並非用來限制本發明。 In addition, the directional terms mentioned in the text, such as "up", "down", etc., are only used to refer to the direction of the drawings, and are not used to limit the present invention.
圖1是依照本發明的第一實施例的一種單光子發光元件的分解示意圖。 FIG. 1 is an exploded schematic view of a single-photon light-emitting element according to the first embodiment of the present invention.
請參照圖1,一種單光子發光元件10包括:堆疊結構100、源極102a與汲極102b以及外部驅動電路104。源極102a與汲極102b分別設置於所述堆疊結構100的相對側。需注意的是,說明書所附的結構分解示意圖雖然都是以圓柱、圓盤形狀表示,但只是用來表達空間上相對的位置,並不因此侷限本發明的單光子發光元件的實際形狀,且垂直或水平或其它方向的擺放不受限制。第一實施例中的堆疊結構100包括單電子(single electron)量子點106、第一穿隧層108、單電子閘極結構110、單電洞(single hole)量子點112、第二穿隧層114以及單電洞閘極結構116。第一穿隧層108完全包覆所述單電子量子點106,單電子閘極結構110完全環繞所述單電子量子點106並透過所述第一穿隧層108,與所述單電子量子點106相隔離。單電洞(single hole)量子點112與單電子量子點106相鄰,第二穿隧層114完全包覆所述單電洞量子點112,而單電洞閘極結構116完全環繞所述單電洞量子點112並透過所述第二穿隧層114,與所述單電洞量子點112相隔離。因此,本發明的單光子發光元件10是一種閘極全環繞式(gate-all-around,GAA)結構,並且在載子傳輸的路徑上需要穿
隧通過很薄的絕緣層。舉例來說,第一穿隧層108的厚度、第二穿隧層114的厚度各自在約60Å以下,如30Å至60Å的厚度。
Referring to FIG. 1 , a single-photon light-emitting
所述外部驅動電路104則被配置以輸出一驅動信號,根據所述驅動信號,控制單電子量子點106的單電子穿隧注入單電洞量子點112,以使電子電洞在所述單電洞量子點112復合發出單光子;或者,控制單電洞量子點112的單電洞穿隧注入單電子量子點106,以使電子電洞在所述單電子量子點106復合發出單光子。
The
本實施例利用單電洞量子點112做為電洞源,以單電子電晶體(single electron transistor,SET)做為電子源,將單電子穿隧注入單電洞量子點112;或者反過來,利用單電子量子點106做為電子源,以單電洞電晶體(single hole transistor,SHT)做為電洞源,將單電洞穿隧注入單電子量子點106,使電子電洞復合發出單光子,復合中心在單電洞量子點112與單電子量子點106其中之一。
In this embodiment, the single-
此處所稱的SET,結構是被絕緣層(第一穿隧層108)所包覆的量子點,具有量子侷限效應(quantum confinement effect),稱為中央島(單電子量子點106),其中SET的量子點是n型的直接能隙半導體。SET的電性上是三端元件:載子由源極102a穿隧進入中央島,再由中央島穿隧而出進入汲極102b,中央島的電位被控制閘極(單電子閘極結構110)所控制。
The structure of SET referred to here is a quantum dot covered by an insulating layer (the first tunneling layer 108 ) and has a quantum confinement effect, which is called a central island (single electron quantum dot 106 ). The quantum dots are n-type direct-gap semiconductors. The SET is electrically a three-terminal device: the carrier tunnels from the
此處所稱的SHT,結構是被絕緣層(第二穿隧層114)所
包覆的量子點,同樣具有量子侷限效應,稱為中央島(單電洞量子點112),其中SHT的量子點中央島是P型直接能隙半導體量子點。SHT的電性上是三端元件:載子由源極102a穿隧進入中央島,再由中央島穿隧而出進入汲極102b,中央島的電位被控制閘極(單電洞閘極結構116)所控制。
Here, the SHT structure is defined by the insulating layer (the second tunneling layer 114).
The coated quantum dots also have quantum confinement effect and are called central islands (single-hole quantum dots 112 ), wherein the central island of the quantum dots of the SHT is a P-type direct energy gap semiconductor quantum dot. The SHT is electrically a three-terminal device: the carriers tunnel from the
理論上,對單光子信號源的標定是採用光場的二階強度相關係數來描述:
理想的單光子源是每次只發射一個光子時,兩個光子同時到達的機率為零,即g (2)(0)=0。本發明則可藉由外部驅動電路104的訊號,控制電路開啟或關斷以調整單光子發光元件10中SET/SHT的電位,來決定單光子的發射頻率。
The ideal single-photon source is when only one photon is emitted at a time, and the probability of two photons arriving at the same time is zero, that is, g (2) (0)=0. In the present invention, the signal of the
單光子發光元件10的模式有如是人造的單激子二極體(Single Exciton Device,SED)結構。傳統對於激子的定義是由電子-電洞之間的庫倫作用力關聯在一起;至於第一實施例的單電子-單電洞的量子點發光元件,其復合發射光子的關聯性,是由外部驅動電路104透過上述控制閘極來加以控制(開關速度),所以也可視為單激子電晶體。藉由SET或SHT此天生的量子點結構,高的態密度(density of state,DOS)使內部量子效率(IQE)提高,以減少非輻射性復合。簡言之,單光子發光元件10的結構及
功能為單電子-單電洞的量子點發光元件。
The mode of the single photon light-emitting
在本實施例中,所述單電子量子點106與所述單電洞量子點112可為相同材料或不同材料。若是單電子量子點106與單電洞量子點112是相同材料,則單光子發光元件10可視為均質單激子元件(Homogeneous SED),例如單電子量子點106與單電洞量子點112都是GaAs;若是單電子量子點106與單電洞量子點112是不同材料,則單光子發光元件10可視為異質單激子元件(Heterogeneous SED),例如單電子量子點106為矽、單電洞量子點112為GaAs;單電子量子點106為SiGe、單電洞量子點112為GaAs。
In this embodiment, the single-
在一實施例中,上述堆疊結構100的製作例如先在一矽基板(未示出)上依序形成AlGaAs/n-SiGe(N型直接能隙半導體)/AlGaAs/p-GaAs(P型直接能隙半導體)/AlGaAs,再進行濕氧製程,僅將AlGaAs氧化成Al2O3作為穿隧層。然而,本發明並不限於此,亦可利用現有技術製作單光子發光元件10。
In one embodiment, the fabrication of the above-mentioned
圖2是圖1的單光子發光元件的能帶圖,其中並顯示相對應的結構與膜層。在圖2中,SET代表單電子量子點106的位置、SHT代表單電洞量子點112的位置,而第一與第二穿隧層108、114一般為氧化物所以具有高能障。在外部驅動電路供應電場的情況下,高能障區域的能帶會傾斜,驅使單電子或單電洞發生穿隧。
FIG. 2 is an energy band diagram of the single-photon light-emitting element of FIG. 1 , wherein corresponding structures and layers are shown. In FIG. 2 , SET represents the position of the single-
圖3則是圖1的單光子發光元件的等效電路圖。在圖3中,C_spacer是指SET與SHT之間的穿隧層產生的電容,Cs_SET 是指SET與源極之間的穿隧層產生的電容、Cd_SHT是指SHT與汲極之間的穿隧層產生的電容、Cg_SET是指SET與單電子閘極結構之間的穿隧層產生的電容、Cg_SHT是指SHT與單電洞閘極結構之間的穿隧層產生的電容、Vs是源極電壓、Vd是汲極電壓、Vg_SET是指單電子閘極電壓以及Vg_SHT是指單電洞閘極電壓。 FIG. 3 is an equivalent circuit diagram of the single-photon light-emitting element of FIG. 1 . In Figure 3, C_spacer refers to the capacitance generated by the tunneling layer between SET and SHT, Cs_SET refers to the capacitance generated by the tunneling layer between SET and source, Cd_SHT refers to the capacitance generated by the tunneling layer between SHT and drain, and Cg_SET refers to the tunneling layer generated between SET and the single-electron gate structure Cg_SHT refers to the capacitance generated by the tunneling layer between the SHT and the single-hole gate structure, Vs is the source voltage, Vd is the drain voltage, Vg_SET refers to the single-electron gate voltage, and Vg_SHT refers to the single-electron gate voltage. hole gate voltage.
圖4A是第一實施例的另一例的單光子發光元件的分解示意圖,其中省略部分構件,以凸顯與圖1的差異。 FIG. 4A is an exploded schematic view of the single-photon light-emitting element of another example of the first embodiment, in which some components are omitted to highlight the difference from FIG. 1 .
請參照圖4A,單光子發光元件10’中的單電子量子點106的數量為多個(如n個),單電洞量子點112的數量為單一個,且單電子量子點106與單一單電洞量子點112彼此上下堆疊。單電子量子點106與單電洞量子點112同樣有第一與第二穿隧層108與114完全包覆,其餘未示出的構件則與圖1完全相同。
Referring to FIG. 4A , the number of single-
圖4B是圖4A的單光子發光元件的等效電路圖,其中的SET1、SET2...SETn分別代表第一個、第二個…第n個單電子量子點,且由此實施例可實現複數個可控單激子陣列。 4B is an equivalent circuit diagram of the single-photon light-emitting element of FIG. 4A , wherein SET1 , SET2 . . . SETn represent the first, second . A controllable single exciton array.
在另一實施例中,單電子量子點106的數量可為單一個,單電洞量子點112的數量可為多個,且單一單電子量子點106與單電洞量子點112可彼此上下堆疊配置。
In another embodiment, the number of single-
圖4C是第一實施例的又一例的單光子發光元件的分解示意圖,其中省略部分構件,以凸顯與圖1的差異。 FIG. 4C is an exploded schematic view of the single-photon light-emitting element according to another example of the first embodiment, in which some components are omitted to highlight the difference from FIG. 1 .
請參照圖4C,單光子發光元件10”中的單電子量子點106的數量是多個,單電洞量子點112的數量也是多個,且彼此水平
相鄰,成為複數個可控單激子陣列的另一種幾何排列。
Referring to FIG. 4C , the number of single-
圖4D是第一實施例的再一例的單光子發光元件的分解示意圖,其中省略部分構件,以凸顯與圖1的差異。 FIG. 4D is an exploded schematic view of the single-photon light-emitting element according to still another example of the first embodiment, in which some components are omitted to highlight the difference from FIG. 1 .
請參照圖4D,單光子發光元件10'''中的單電子量子點106和單電洞量子點112的數量都是多個,且上下成對配置,成為複數個可控單激子陣列的又一種幾何排列。
Referring to FIG. 4D , the number of single-
圖5是依照本發明的第二實施例的一種單光子發光元件的分解示意圖,其中使用與第一實施例相同的元件符號來表示相同或近似的構件,且相同或近似的構件內容也可參照第一實施例的內容,不再贅述。 5 is an exploded schematic view of a single-photon light-emitting element according to the second embodiment of the present invention, wherein the same element symbols as in the first embodiment are used to represent the same or similar components, and the content of the same or similar components can also be referred to The content of the first embodiment will not be repeated here.
請參照圖5,本實施例與第一實施例的差別在於:單光子發光元件50的堆疊結構500還具有一未摻雜的(undoped)直接能隙半導體層502,其中未摻雜的直接能隙半導體層502為量子點層或量子井層。未摻雜的直接能隙半導體層502介於所述單電子量子點106與所述單電洞量子點112之間,並透過第一與第二穿隧層108與114,分別與單電子量子點106以及單電洞量子點112相隔離。外部驅動電路104輸出的驅動信號,可控制單電子量子點106的單電子與單電洞量子點112的單電洞穿隧注入所述未摻雜的直接能隙半導體層502,以使電子電洞在未摻雜的直接能隙半導體層502復合發出單光子。未摻雜的直接能隙半導體層502的材料可與單電子量子點106相同或者不同,未摻雜的直接能隙半導體層502的材料也可與單電洞量子點112相同或者不同。
Referring to FIG. 5 , the difference between this embodiment and the first embodiment is that the
圖6是圖5的單光子發光元件的等效電路圖,其與圖3的差異在於SET與SHT之間具有代表未摻雜的直接能隙半導體層的i,且C_SET_spacer是指SET與未摻雜的直接能隙半導體層之間的穿隧層產生的電容,C_SHT_spacer是指SHT與未摻雜的直接能隙半導體層之間的穿隧層產生的電容。 FIG. 6 is an equivalent circuit diagram of the single-photon light-emitting element of FIG. 5 . The difference from FIG. 3 is that there is an i representing an undoped direct energy gap semiconductor layer between SET and SHT, and C_SET_spacer refers to SET and undoped semiconductor layers. C_SHT_spacer refers to the capacitance generated by the tunneling layer between the SHT and the undoped direct energy gap semiconductor layer.
圖7是第二實施例的另一例的單光子發光元件的分解示意圖,其中使用與圖5相同的元件符號來表示相同或近似的構件,且相同或近似的構件內容也可參照圖5的內容,不再贅述。 7 is an exploded schematic view of a single-photon light-emitting element according to another example of the second embodiment, wherein the same element symbols as in FIG. 5 are used to represent the same or similar components, and the content of the same or similar components can also refer to the content of FIG. 5 ,No longer.
請參照圖7,單光子發光元件50’還可包括控制閘極結構504與一絕緣層506。控制閘極結構504完全環繞所述未摻雜的直接能隙半導體層502,絕緣層506則位於控制閘極結構504與未摻雜的直接能隙半導體層502之間。控制閘極結構504可提高控制自由度。
Referring to FIG. 7 , the single-photon light-emitting element 50' may further include a
圖8是依照本發明的第三實施例的一種單光子發光元件的分解示意圖,其中使用與第一實施例相同的元件符號來表示相同或近似的構件,且相同或近似的構件內容也可參照第一實施例的內容,不再贅述。 8 is an exploded schematic view of a single-photon light-emitting element according to the third embodiment of the present invention, wherein the same element symbols as in the first embodiment are used to represent the same or similar components, and the content of the same or similar components can also be referred to The content of the first embodiment will not be repeated here.
請參照圖8,本實施例與第一實施例的差別在於:單光子發光元件80的堆疊結構800包括:量子點802、穿隧層804、控制閘極結構806以及反態載子池(anti-state doped region carrier pool)808。穿隧層804完全包覆所述量子點802,控制閘極結構806則完全環繞所述量子點802並透過穿隧層804,與所述量子點
802相隔離。
Referring to FIG. 8 , the difference between this embodiment and the first embodiment is that the
反態載子池808是與量子點802相鄰且與量子點802為相反導電態,並透過穿隧層804與量子點802相隔離。反態載子池808例如一維或二維或三維的半導體結構。上述一維的半導體結構包括奈米線(Nano Wire),上述二維的半導體結構包括量子井(Quantum Well),上述三維的半導體結構包括塊體(Bulk)。
The
請繼續參照圖8,本實施例是以單電子量子點為例,其中單電子量子點為N型直接能隙半導體量子點或金屬量子點、反態載子池808是P型載子池。所述外部驅動電路104輸出的驅動信號,經由源極102a、汲極102b與控制閘極結構806,可控制所述量子點802的單電子穿隧注入所述反態載子池808,以使電子電洞在反態(P型)載子池808復合發出單光子。
Please continue to refer to FIG. 8 , in this embodiment, single-electron quantum dots are used as an example, wherein the single-electron quantum dots are N-type direct energy gap semiconductor quantum dots or metal quantum dots, and the
在另一實施例中,量子點802若是單電洞量子點,則反態載子池是N型載子池,源極與汲極的位置也會互換。所述單電洞量子點可為P型直接能隙半導體量子點。一旦外部驅動電路104輸出驅動信號,可經由源極(102a所指的部位)、汲極(102b所指的部位)與控制閘極結構806控制所述量子點802的單電洞穿隧注入N型載子池(反態載子池808),以使電子電洞在N型載子池復合發出單光子。
In another embodiment, if the
圖9是依照本發明的第四實施例的一種發光裝置的分解示意圖。 FIG. 9 is an exploded schematic view of a light emitting device according to a fourth embodiment of the present invention.
請參照圖9,第四實施例的發光裝置90包括具有光學共
振腔的結構900以及單光子發光元件SPED,且單光子發光元件SPED設置於具有光學共振腔的結構900內。單光子發光元件SPED可採用第一至第三實施例中提出的任一元件。
Referring to FIG. 9, the light-emitting
對單光子發光元件SPED來說,其主要的發光形式以自發輻射為主,為了大幅度提升其效率,需要抑制多餘不被利用的自發輻射,並提升被需要的自發輻射。自發輻射形成原因為電子由激發態回到基態,且以光子的形式與未被佔領的光學模態(optical modes)耦合後放出光子,而由激發態回到基態發生的機率會與光子能態密度(photonic density of state)與電場強度與位置有關,因此本發明通過光子晶體光子能隙的特性來控制自發輻射,可以在光子晶體中製造一個點缺陷,在缺陷的位置由於光子能隙的效應形成了波長等級的共振腔,光子晶體共振腔當中水平方向對光能量的侷限是由光子能隙,而在垂直方向是利用全反射的條件,光能量的損失主要也由垂直方向所貢獻。由於光子晶體共振腔具有高品質因子(high Q-factor)以及超小模態體積(small Vm)的特徵,因此第四實施例的發光裝置90預期可具有超高的Q/Vm的值。當Q/Vm足夠大的時候可以觀察到電子與光的交互作用(quantum electro-dynamics)。設計具有高品質因子以及超小模態體積的光子晶體共振腔可以達到抑制多餘不被利用的自發輻射,提升被需要的自發輻射。因為提高某個頻率的Q-factor就是在增加該頻率的光子模態數目;而降低Vm就是在增強電場的強度。
For the single-photon light-emitting element SPED, its main light-emitting form is mainly spontaneous emission. In order to greatly improve its efficiency, it is necessary to suppress the unnecessary and unused spontaneous emission, and to increase the required spontaneous emission. The reason for the formation of spontaneous emission is that the electrons return from the excited state to the ground state, and couple with the unoccupied optical modes in the form of photons to emit photons, and the probability of returning from the excited state to the ground state is related to the photon energy state. The density (photonic density of state) is related to the electric field strength and position, so the present invention controls the spontaneous emission through the characteristics of the photonic energy gap of the photonic crystal, and can create a point defect in the photonic crystal, at the position of the defect due to the effect of the photonic energy gap A wavelength-level resonant cavity is formed. In the photonic crystal resonant cavity, the limitation of light energy in the horizontal direction is the photon energy gap, while in the vertical direction, the condition of total reflection is used, and the loss of light energy is mainly contributed by the vertical direction. Since the photonic crystal resonant cavity has the characteristics of high Q-factor and ultra-small modal volume (small Vm), the light-emitting
因此在圖9中,具有光學共振腔的結構900是光子晶體型(photonic crystal)結構。然而,本發明並不限於此。半導體微共振腔種類還包括微柱型(micropillar)結構以及微碟型(microdisk)結構。這些半導體微共振腔的共同特點是可以形成非常小的模態體積,約達為V0~(λ/n)3(其中n為半導體折射率),而品質因子Q則可高達Q>104。半導體微共振腔的模態體積都遠小於V0<<1μm3,且半導體的躍遷偶極矩又通常比原子來的大,因此已經足以達到SPED與共振腔的強耦合的條件。 Therefore, in FIG. 9, the structure 900 with the optical resonant cavity is a photonic crystal structure. However, the present invention is not limited to this. Types of semiconductor microresonators also include micropillar structures and microdisk structures. The common feature of these semiconductor micro-resonators is that they can form very small modal volumes, about V 0 ~(λ/n) 3 (where n is the refractive index of the semiconductor), and the quality factor Q can be as high as Q>10 4 . The modal volume of the semiconductor micro-resonator is much smaller than V 0 <<1μm 3 , and the transition dipole moment of the semiconductor is usually larger than that of the atom, so it is sufficient to achieve the condition of strong coupling between SPED and the resonator.
另外,發光裝置90還可包括布拉格反射鏡(DBR)外腔(未示出),圍繞具有光學共振腔的結構900,用以聚光。所述DBR外腔例如橢圓反射腔,但本發明亦可省略此構件。當發射的單光子能量和偏振與光學共振腔匹配時,可以顯著提高單光子發光元件SPED的發射效率。
In addition, the
綜上所述,本發明利用單電洞電晶體(SHT)做為電洞源,以單電子電晶體(SET)做為電子源,將單電子穿隧注入直接能隙單電洞電晶體,或者反過來,將單電洞穿隧注入直接能隙單電子電晶體,使之電子電洞復合發出單光子,復合中心在SET或SHT其中之一。本發明另一種模式為SET和SHT分別將電子和電洞注入一個未摻雜的直接能隙半導體層的復合區,此區可有額外的控制閘極,以調整電位,並在此區復合發出光子。本發明又一種模式為只用SET或SHT其中一種,作為復合區域,搭配反態載子池來將反態載子穿隧注入所述復合區域,使電子電洞復合發出單光 子。以上模式均可利用外部驅動電路透過控制閘極,來加以控制開關速度,因此本發明的單光子發光元件可視為單激子電晶體,並且因為SET和SHT中的量子點外部被穿隧(絕緣)層所包覆,也有機會能在室溫下操作。此外,本發明的單光子發光元件若是設置在具有光學共振腔的結構內,還可顯著提高量子點的發射效率。 To sum up, the present invention utilizes a single-hole transistor (SHT) as a hole source, and a single-electron transistor (SET) as an electron source to inject single-electron tunneling into a direct-energy-gap single-hole transistor, Or conversely, the single-hole tunneling is injected into the direct energy gap single-electron transistor, so that the electron-hole recombination emits a single photon, and the recombination center is in one of the SET or SHT. Another mode of the present invention is that SET and SHT respectively inject electrons and holes into a recombination region of an undoped direct energy gap semiconductor layer, this region may have an additional control gate to adjust the potential, and recombination emits light in this region photon. Another mode of the present invention is to use only one of SET or SHT as the recombination region, and the anti-state carrier pool is used to tunnel anti-state carriers into the recombination region, so that the electron-hole recombination emits single light son. The above modes can use an external drive circuit to control the switching speed by controlling the gate, so the single-photon light-emitting element of the present invention can be regarded as a single-exciton transistor, and because the quantum dots in the SET and SHT are externally tunneled (insulating ) layer, also has the opportunity to operate at room temperature. In addition, if the single-photon light-emitting element of the present invention is arranged in a structure with an optical resonant cavity, the emission efficiency of the quantum dots can be significantly improved.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed above by the embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, The protection scope of the present invention shall be determined by the scope of the appended patent application.
10:單光子發光元件 10: Single-photon light-emitting element
100:堆疊結構 100: Stacked Structure
102a:源極 102a: source
102b:汲極 102b: Drain
104:外部驅動電路 104: External drive circuit
106:單電子量子點 106: Single Electron Quantum Dots
108:第一穿隧層 108: The first tunneling layer
110:單電子閘極結構 110: Single Electron Gate Structure
112:單電洞量子點 112: Single-hole quantum dots
114:第二穿隧層 114: Second Tunneling Layer
116:單電洞閘極結構 116: Single-hole gate structure
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TW554388B (en) * | 2001-03-30 | 2003-09-21 | Univ California | Methods of fabricating nanostructures and nanowires and devices fabricated therefrom |
EP2993696A1 (en) * | 2014-09-02 | 2016-03-09 | IMEC vzw | Heterosection tunnel field-effect transistor (TFET) |
TW201727915A (en) * | 2012-12-18 | 2017-08-01 | 英特爾股份有限公司 | Vertical nanowire transistor with axially engineered semiconductor and gate metallization |
CN108598170A (en) * | 2018-05-24 | 2018-09-28 | 清华大学 | Nano-wire transistor and preparation method thereof |
US20200328292A1 (en) * | 2019-04-12 | 2020-10-15 | The Research Foundation For The State University Of New York | Gate all-around field effect transistors including quantum-based features |
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TW201727915A (en) * | 2012-12-18 | 2017-08-01 | 英特爾股份有限公司 | Vertical nanowire transistor with axially engineered semiconductor and gate metallization |
EP2993696A1 (en) * | 2014-09-02 | 2016-03-09 | IMEC vzw | Heterosection tunnel field-effect transistor (TFET) |
CN108598170A (en) * | 2018-05-24 | 2018-09-28 | 清华大学 | Nano-wire transistor and preparation method thereof |
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