TWI731033B - Photosensitive resin composition and uses thereof - Google Patents

Abstract

The invention relates to a photosensitive resin composition and a color filter and a liquid crystal display element manufactured with the photosensitive resin composition. The photosensitive resin composition includes a pigment (A), an alkali-soluble resin (C), a compound including an unsaturated ethylenically group (D), a photoinitiator (E), and an solvent (F). The color filter formed by the photosensitive resin composition has the advantage of resistance to bubble-appearance defects.

Description

Photosensitive resin composition and its application

The present invention relates to a photosensitive resin composition, and the use of the photosensitive resin composition to manufacture color filters and liquid crystal display elements; in particular, to provide a photosensitive resin composition, which is made of the photosensitive resin composition Color filters have the advantage of not prone to bubble display defects.

At present, color filters have been widely used in the field of office equipment such as color liquid crystal displays, color fax machines, and color cameras. With the increasing market demand, the production technology of color filters has also become diversified. At present, manufacturing methods such as dyeing, printing, electroplating, and dispersion have been developed, of which dispersion is the mainstream process.

The process of the dispersion method is to first disperse the colored pigments in the photosensitive resin, and then coat the photosensitive resin on the glass substrate, and go through the steps of exposure, development, etc., to obtain a specific pattern. After repeating the operation three times, red (R), green (G) and blue (B) pixel colored layer patterns can be prepared, and then a protective film can be applied on the pixel colored layer pattern if necessary.

The photosensitive resin composition disclosed in the Japanese Patent Application Publication No. 2001-075273, which contains a polymer obtained by polymerizing an unsaturated monomer containing a carboxylic acid group and a monomer containing a glycidyl group as the alkali-soluble photosensitive resin Resin. However, the color filter made from the photosensitive resin composition of the conventional technology has the problem of bubble display defects.

Therefore, how to overcome the problem of bubble display defects to meet the current industry requirements is the goal of hard research in the technical field of the present invention.

The photosensitive resin composition of the present invention uses a special alkali-soluble resin and a photoinitiator, so that the obtained color filter has the advantage of not having bubble display defects.

式(C1) 式(C1)中： Z₁ 及Z₂ 分別獨立地代表氫原子或鹵素原子；其中，Z₁ 及Z₂ 為相同或不同； Z₃ 、Z₄ 及Z₅ 分別獨立地代表氫原子、鹵素原子或烷基；其中，Z₃ 、Z₄ 及Z₅ 為相同或不同； Z₆ 及Z₇ 分別獨立地代表氫原子或烷基；其中，Z₆ 及Z₇ 為相同或不同； s表示1至2之整數；及 *表示鍵結處； 該光起始劑(E)包含一環戊二酮肟酯化合物(E-1)，且該環戊二酮肟酯化合物(E-1)包含至少一種選自由式(E1-1)、式(E1-2)、式(E1-3)、式(E1-4)及式(E1-5)所組成之群的環戊二酮肟酯化合物：

式(E1-1)

式(E1-2)

式(E1-3)

式(E1-4)

式(E1-5) 式(E1-1)、式(E1-2)、式(E1-3)、式(E1-4)及式(E1-5)中，Ar₁ 為鄰亞芳基或鄰亞雜芳基，該鄰亞芳基或該鄰亞雜芳基是以相鄰的兩個原子與Y₁ 和羰基相連構成並環結構，其餘原子上的取代基各自獨立地選自由氫原子，鹵素原子，C₁ -C₁₂ 烷基，C₅ -C₇ 環烷基，被C₅ -C₇ 環烷基取代之C₁ -C₄ 烷基，苯基，任意被一個或多個C₁ -C₄ 烷基、羧基、C₁ -C₁₂ 烷基醯基、芳基醯基、雜芳基醯基、JT₁₇ 、苯基、鹵素原子或CN取代之苯基，C₁ -C₄ 烷基苄氧基，被T₁ C(O)O取代之C₁ -C₄ 烷氧基，C₁ -C₃ 亞烷基二氧基，T₁ C(O)O，C₁ -C₁₂ 烷基硫基，C₁ -C₄ 烷基苯硫基，被T₁ C(O)O取代之C₁ -C₄ 烷基硫基，CN，羧基，C₁ -C₁₂ 烷氧基甲醯基，芳基醯基，雜芳基醯基及JT₁₈ 所組成之群；或 Ar₁ 之上述取代基中相鄰的兩個取代基之間或者取代基與Ar₁ 之間通過單鍵、碳原子或羰基相連構成環狀結構； 其中，JT₁₇ 及JT₁₈ 中，J係選自由O、S及NT₁₉ 所組成之群； Y₁ 係選自由O、S、NT₂₀ 、BT₂₀ 、CT₁₅ T₁₆ 、SiT₁₅ T₁₆ 、S=O及C=O所組成之群； Ar₂ 係選自由下列結構所組成之群：

、

、

及

，其中J係選自由O、S及NT₁₉ 所組成之群； U₁ 係選自由下列所組成之群：單鍵、C₁ -C₁₀ 直鏈亞烷基、C₁ -C₁₀ 支鏈亞烷基、被一個或多個氧原子或硫原子連在端基的C₂ -C₁₀ 直鏈亞烷基或C₂ -C₁₀ 支鏈亞烷基、被一個或多個氧原子或硫原子插入的C₂ -C₁₀ 直鏈亞烷基或C₂ -C₁₀ 支鏈亞烷基、無取代基的亞芳香基及有取代基的亞芳香基； Y₂ 係選自由下列所組成之群：單鍵、O、S、NT₂₀ 、BT₂₀ 、CT₁₅ T₁₆ 、SiT₁₅ T₁₆ 、C=O及Y₃ -U₂ -Y₃ ； U₂ 係選自由下列所組成之群：C₁ -C₁₀ 直鏈亞烷基、C₁ -C₁₀ 支鏈亞烷基、被一個或多個氧原子或硫原子連在端基的C₂ -C₁₀ 直鏈亞烷基、被一個或多個氧原子或硫原子連在端基的C₂ -C₁₀ 支鏈亞烷基、被一個或多個氧原子或硫原子插入的C₂ -C₁₀ 直鏈亞烷基、被一個或多個氧原子或硫原子插入的C₂ -C₁₀ 支鏈亞烷基、無取代基的亞芳香基及有取代基的亞芳香基； Y₃ 係選自由下列所組成之群：O、S、NT₂₀ 、BT₂₀ 及O-C(O)； T₁ 係選自由下列所組成之群：氫原子，C₁ -C₁₈ 烷基，C₁ -C₁₈ 烷氧基，C₂ -C₁₈ 烯基，任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代及／或被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入之C₂ -C₁₈ 烯基，任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代及／或被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入之C₂ -C₁₈ 烷基，C₅ -C₇ 環烷基，任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子或CN取代之C₅ -C₇ 環烷基，苯基，任意被一個或多個C₁ -C₄ 烷基、C₁ -C₄ 烷氧基、苯基、鹵素原子或CN取代之苯基，萘基，苯甲醯基及苯氧基羰基；其中苯甲醯基及苯氧基羰基的苯基可被一個或兩個以上鹵素原子、T₁₇ 、C₅ 環烷基、C₆ 環烷基、CN、OH或JT₁₇ 所取代； T₁₁ 及T₁₂ 各自獨立地選自由下列所組成之群：氫原子，鹵素原子，C₁ -C₁₂ 烷基，C₅ -C₇ 環烷基，被C₅ -C₇ 環烷基取代之C₁ -C₄ 烷基，C₁ -C₁₂ 烷氧基，C₁ -C₄ 烷基苄氧基，苯基，任意被一個或多個C₁ -C₄ 烷基、羧基、C₁ -C₁₂ 烷基醯基、C₁ -C₁₂ 芳基醯基、雜芳基醯基、JT₁₇ 、苯基、鹵素原子或CN取代之苯基，C₁ -C₄ 烷基苄氧基，被一個或多個C₁ -C₁₂ 烷氧基、C₁ -C₄ 烷基苄氧基或T₁ C(O)O取代之C₁ -C₄ 烷氧基，T₁ C(O)O，CN，羧基，C₁ -C₁₂ 烷氧基羰基，芳基羰基，雜芳基羰基，JT₁₈ ，被一個或多個C₁ -C₄ 烷基取代之苯氧基，被一個C₁ -C₈ 烷基醯基、C₅ -C₆ 環烷基醯基、芳基醯基或雜芳基醯基取代之苯氧基，被C₅ -C₆ 環烷基取代之C₁ -C₄ 烷基醯基苯氧基，C₁ -C₃ 亞烷基二氧基，C₁ -C₁₂ 烷基硫基，被T₁ C(O)O取代之C₁ -C₄ 烷基硫基，被T₁ C(O)O取代之C₁ -C₄ 烷基苯硫基，被一個C₁ -C₈ 烷基醯基、C₅ -C₆ 環烷基醯基、芳基醯基或雜芳基醯基取代之苯硫基，被C₅ -C₆ 環烷基取代之C₁ -C₄ 烷基醯基苯硫基，及環氧丙基；其中環氧基可任意地與C₁ -C₄ 烷基醛或酮縮合；或 T₁₁ 和T₁₂ 相連構成飽和或不飽和環狀結構； T₁₅ 及T₁₆ 各自獨立地選自由下列所組成之群：氫原子，C₁ -C₁₈ 烷基，被羧基取代之C₁ -C₅ 烷基，被C₁ -C₄ 烷氧基醯基取代之C₁ -C₅ 烷基，被T₁ C(O)O取代之C₁ -C₄ 烷基，任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代之C₂ -C₁₈ 烷基，被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入之C₂ -C₁₈ 烷基，C₅ -C₇ 環烷基，任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子或CN取代之C₅ -C₇ 環烷基，苯基，及任意被一個或多個C₁ -C₄ 烷基、C₁ -C₄ 烷氧基、羧基、C₁ -C₁₂ 烷基醯基、C₅ -C₆ 環烷基甲醯基、被C₅ -C₆ 環烷基取代之C₂ -C₄ 烷基醯基、苯甲醯基、JT₁₇ 、苯基、鹵素原子或CN取代之苯基；或 T₁₅ 、T₁₆ 與其共同所連的碳原子或矽原子一起構成環狀且成環之原子數為4至7；或 T₁₅ 、T₁₆ 分別與相鄰的取代基一起構成環狀且成環之原子數為4至7； T₁₇ 為C₁ -C₄ 烷基； T₁₈ 係選自由下列所組成之群：氫原子，C₁ -C₁₈ 烷基，被C₁ -C₄ 烷氧基醯基取代之C₁ -C₅ 烷基，被T₁ C(O)O取代的C₁ -C₄ 烷基，任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代之C₂ -C₁₈ 烷基，被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入之C₂ -C₁₈ 烷基，C₅ -C₇ 環烷基，任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子或CN取代之C₅ -C₇ 環烷基，苯基，任意被一個或多個C₁ -C₁₂ 烷基、羧基、C₁ -C₁₂ 烷基醯基、C₅ -C₆ 環烷基甲醯基、芳基醯基、雜芳基醯基、JT₁₇ 、苯基、鹵素原子、CN或NO₂ 取代之苯基，任意被一個有C₅ -C₆ 環烷基取代之C₂ -C₄ 烷基醯基取代的苯基，任意被一個有亞苯基、O、S或NT₁₇ 插入之C₂ -C₁₂ 烷基醯基取代之苯基，C₁ -C₄ 烷基醯基，C₁ -C₄ 共軛烯醯基，苯甲醯基及苯氧基羰基；其中該苯甲醯基或該苯氧基羰基中的苯基可任意被一個或兩個以上鹵素原子、T₁₇ 、C₅ 環烷基、C₆ 環烷基、CN、OH或JT₁₇ 取代；或 T₁₈ 通過單鍵、碳原子、羰基與Ar₁ 或Ar₂ 中的芳環相連構成新的環； T₁₉ 及T₂₀ 各自獨立地選自由下列所組成之群：氫原子，C₁ -C₁₈ 烷基，被C₁ -C₄ 烷氧基醯基取代之C₁ -C₅ 烷基，被T₁ C(O)O取代之C₁ -C₄ 烷基，任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代之C₂ -C₁₈ 烷基，被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入之C₂ -C₁₈ 烷基，C₅ -C₇ 環烷基，任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子或CN取代之C₅ -C₇ 環烷基，苯基，及任意被一個或多個C₁ -C₄ 烷基、羧基、C₁ -C₁₂ 烷基醯基、C₅ -C₆ 環烷基甲醯基、被C₅ -C₆ 環烷基取代之C₂ -C₄ 烷基醯基、芳基醯基、JT₁₇ 、苯基、鹵素原子或CN取代之苯基；或 T₁₉ 分別通過單鍵、碳原子、羰基與Ar₁ 或Ar₂ 中的芳環相連構成新的環； 其中當Ar₁ 為取代咔唑基團時，Y₁ 不為C、O、S或NT₂₀ 。Therefore, the present invention provides a photosensitive resin composition comprising: a pigment (A); an alkali-soluble resin (C); an ethylenically unsaturated group-containing compound (D); a photoinitiator (E); and a solvent (F) ); Wherein, the alkali-soluble resin (C) comprises a first alkali-soluble resin (C-1), and the first alkali-soluble resin (C-1) has a structural unit represented by formula (C1):

Formula (C1) In formula (C1): Z ₁ and Z ₂ each independently represent a hydrogen atom or a halogen atom; wherein, Z ₁ and Z ₂ are the same or different; Z ₃ , Z ₄ and Z ₅ each independently represent hydrogen Atom, halogen atom or alkyl group; wherein, Z ₃ , Z ₄ and Z ₅ are the same or different; Z ₆ and Z ₇ each independently represent a hydrogen atom or an alkyl group; wherein, Z ₆ and Z ₇ are the same or different; s represents an integer from 1 to 2; and * represents a bonding site; the photoinitiator (E) contains a cyclopentadione oxime ester compound (E-1), and the cyclopentadione oxime ester compound (E-1 ) Contains at least one cyclopentadione oxime selected from the group consisting of formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4) and formula (E1-5) Ester compound:

Formula (E1-1)

Formula (E1-2)

Formula (E1-3)

Formula (E1-4)

Formula (E1-5) In formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4) and formula (E1-5), Ar ₁ is an o-arylene group or The ortho-heteroarylene group, the ortho-arylene group or the ortho-heteroarylene group is formed by connecting two adjacent atoms with Y ₁ and the carbonyl group to form a ring structure, and the substituents on the remaining atoms are independently selected from hydrogen atoms , Halogen atom, C ₁ -C ₁₂ alkyl group, C ₅ -C ₇ cycloalkyl group, _{C 1} -C ₄ alkyl group substituted _{by C 5} -C ₇ cycloalkyl group, phenyl group, optionally with one or more C _1- C ₄ alkyl group, carboxyl group, C ₁ -C ₁₂ alkyl acyl group, aryl acyl group, heteroaryl acyl group, JT ₁₇ , phenyl group, halogen atom or CN substituted phenyl group, C ₁ -C ₄ Alkylbenzyloxy, _{C 1} -C _{4 alkoxy substituted by T 1} C(O)O, C ₁ -C ₃ alkylene dioxy, T ₁ C(O)O, C ₁ -C ₁₂ alkylthio, C ₁ -C ₄ alkyl group, the substituted _{T 1 C (O) O C} 1 -C 4 alkylthio, CN, carboxy, C ₁ -C ₁₂ acyl alkoxysilyl Group, aryl acyl group, heteroaryl acyl group and JT ₁₈ ; or between two adjacent substituents of the above-mentioned substituents of _{Ar 1 or between the substituents and Ar 1} through a single bond, carbon Atoms or carbonyl groups are connected to form a ring structure; among JT ₁₇ and JT ₁₈ , J is selected from the group consisting of O, S and NT _{19 ; Y 1} is selected from O, S, NT ₂₀ , BT ₂₀ , CT ₁₅ The group consisting of T ₁₆ , SiT ₁₅ T ₁₆ , S=O and C=O; Ar ₂ is selected from the group consisting of the following structures:

,

,

and

, Where J is selected from the group consisting of _{O, S and NT 19 ; U 1} is selected from the group consisting of: single bond, C ₁ -C ₁₀ linear alkylene, C ₁ -C ₁₀ branched chain _{Alkyl group, C 2} -C ₁₀ straight chain alkylene group or C ₂ -C ₁₀ branched chain alkylene group connected to the end group by one or more oxygen atoms or sulfur atoms, and one or more oxygen atoms or sulfur atoms Inserted C ₂ -C ₁₀ linear alkylene or C ₂ -C ₁₀ branched alkylene, unsubstituted arylene and substituted arylene; Y ₂ is selected from the group consisting of the following : Single bond, O, S, NT ₂₀ , BT ₂₀ , CT ₁₅ T ₁₆ , SiT ₁₅ T ₁₆ , C=O and Y ₃ -U ₂ -Y ₃ ; U ₂ is selected from the group consisting of: C ₁ -C ₁₀ linear alkylene group, C ₁ -C _{10 branched chain alkylene group, C 2} -C ₁₀ linear alkylene group connected to the end group by one or more oxygen atoms or sulfur atoms, by one or more oxygen atom or a sulfur atom in the end groups attached C ₂ -C ₁₀ branched alkylene, substituted by one or more oxygen atoms or sulfur atom inserted straight chain C ₂ -C ₁₀ alkylene group, substituted with one or more _{A C 2} -C ₁₀ branched alkylene group with an oxygen atom or a sulfur atom inserted, an unsubstituted arylene group and a substituted arylene group; Y ₃ is selected from the group consisting of: O, S, NT ₂₀ , BT ₂₀ and OC(O); T ₁ is selected from the group consisting of hydrogen atom, C ₁ -C ₁₈ alkyl, C ₁ -C ₁₈ alkoxy, C ₂ -C ₁₈ alkenyl, arbitrary By one or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryl A C ₂ -C ₁₈ alkenyl group substituted by an oxy group and/or _{inserted by a C 5} -C ₇ cycloalkylene, phenylene, O, S or NT ₁₇ group, optionally with one or more halogen atoms, C _1- C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryloxy substituted and/or substituted by C _5- C ₇ cycloalkylene, phenylene, O, S or NT ₁₇ inserted C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkyl, optionally with one or more C ₁ -C ₄ alkyl, Phenyl, halogen atom or C ₅ -C ₇ cycloalkyl substituted by CN, phenyl, optionally substituted by one or more C ₁ -C ₄ alkyl, C ₁ -C ₄ alkoxy, phenyl, halogen atom or CN-substituted phenyl, naphthyl, benzyl and phenoxycarbonyl; the phenyl group of benzyl and phenoxycarbonyl can be substituted by one or more halogen atoms, T ₁₇ , C ₅ cycloalkyl , C ₆ cycloalkyl, CN, OH or JT ₁₇ ; T ₁₁ and T ₁₂ are each independently selected from the group consisting of: hydrogen atom , Halogen atom, C ₁ -C ₁₂ alkyl, C ₅ -C ₇ cycloalkyl, C ₁ -C _{4 alkyl substituted by C 5} -C ₇ cycloalkyl, C ₁ -C ₁₂ alkoxy, C _1- C ₄ alkylbenzyloxy, phenyl, optionally substituted by one or more C ₁ -C ₄ alkyl, carboxyl, C ₁ -C ₁₂ alkyl acyl, C ₁ -C ₁₂ aryl acyl, hetero Aryl acyl group, JT ₁₇ , phenyl group, halogen atom or CN substituted phenyl group, C ₁ -C ₄ alkylbenzyloxy group, substituted by one or more C ₁ -C ₁₂ alkoxy groups, C ₁ -C ₄ alkyl or benzyloxy T ₁ C (O) substituted with the O C ₁ -C _{4 alkoxy, T 1 C (O) O} , CN, carboxy, C ₁ -C ₁₂ alkoxycarbonyl, arylcarbonyl, Heteroarylcarbonyl, JT ₁₈ , phenoxy substituted by one or more C ₁ -C ₄ alkyl groups, substituted by one C ₁ -C ₈ alkyl acyl group, C ₅ -C ₆ cycloalkyl acyl group, aryl group Phenoxy group substituted with acyl group or heteroaryl group, C ₁ -C _{4 alkyl phenoxy group substituted by C 5} -C ₆ cycloalkyl group, C ₁ -C ₃ alkylene dioxy group , C ₁ -C ₁₂ alkylthio, the substituted _{T 1 C (O) O C} 1 -C 4 alkylthio group, it is substituted with _{T 1 C (O) O C} 1 -C 4 alkylphenyl sulfur Group, a _{phenylthio group substituted by a C 1} -C ₈ alkyl acyl group, a C ₅ -C ₆ cycloalkyl acyl group, an aryl acyl group or a heteroaryl acyl group, and a C ₅ -C ₆ cycloalkyl group Substituted C ₁ -C ₄ alkyl phenylthio and glycidyl groups; wherein the epoxy group can be optionally _{condensed with C 1} -C ₄ alkyl aldehydes or ketones; or T ₁₁ and T _{12 are} connected to form saturation Or unsaturated cyclic structure; T ₁₅ and T ₁₆ are each independently selected from the group consisting of hydrogen atom, C ₁ -C ₁₈ alkyl group, C ₁ -C ₅ alkyl group substituted by carboxyl group, and C _1- the C ₄ alkoxy substituted with acyl C ₁ -C ₅ alkyl, substituted of _{T 1 C (O) O C} 1 -C 4 alkyl, optionally substituted with one or more halogen atoms, C ₁ -C ₄ alkoxy Group, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryl oxy substituted C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkylene, phenylene, O, S or NT ₁₇ inserted C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkyl, optionally with one or more C ₁ -C ₄ Alkyl, phenyl, halogen atom or CN substituted C ₅ -C ₇ cycloalkyl, phenyl, and optionally one or more C ₁ -C ₄ alkyl, C ₁ -C ₄ alkoxy, carboxyl, C ₁ -C ₁₂ alkyl acyl group, C ₅ -C ₆ cycloalkyl methanyl group, C ₂ -C _{4 alkyl acyl group substituted by C 5} -C ₆ cycloalkyl group, benzyl acyl group, JT ₁₇ , Phenyl, halogen atom or CN substituted phenyl; or T ₁₅ , T ₁₆ and the carbon atom or silicon atom to which they are connected together form a ring and the number of atoms forming the ring is 4 to 7; or T ₁₅ , T ₁₆ It forms a cyclic ring together with adjacent substituents and the number of atoms forming the ring is 4 to 7; T ₁₇ is a C ₁ -C ₄ alkyl group; T ₁₈ is selected from the group consisting of: hydrogen atom, C _1- C ₁₈ alkyl, the substituted C ₁ -C ₄ alkoxy C ₁ -C ₅ acyl group, substituted _{T 1 C (O) O C} 1 -C 4 alkyl, optionally substituted with one or more Halogen atom, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryloxy substituted C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkylene, phenylene, O, S, or NT ₁₇ inserted into the C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkyl, optionally substituted One or more C ₁ -C ₄ alkyl groups, phenyl groups, halogen atoms or CN substituted C ₅ -C ₇ cycloalkyl groups, phenyl groups, optionally substituted by one or more C ₁ -C ₁₂ alkyl groups, carboxyl groups, C _1- C ₁₂ alkyl acyl group, C ₅ -C ₆ cycloalkyl methanyl group, aryl acyl group, heteroaryl acyl group, JT ₁₇ , phenyl group, halogen atom, CN or NO ₂ substituted phenyl group, Any phenyl substituted with a C ₅ -C ₆ cycloalkyl substituted C ₂ -C ₄ alkyl acyl group, optionally with a C ₂ -C ₁₂ alkane inserted with a phenylene, O, S or NT ₁₇ Phenyl substituted with a benzoyl group, C ₁ -C ₄ alkyl acyl group, C ₁ -C ₄ conjugated alkenyl group, benzyl group and phenoxycarbonyl group; wherein the benzyl group or the phenoxy group The phenyl group in the carbonyl group can be optionally substituted by one or more halogen atoms, T ₁₇ , C ₅ cycloalkyl, C ₆ cycloalkyl, CN, OH or JT ₁₇ ; or T _{18 is} through a single bond, carbon atom, carbonyl group Connected with the aromatic ring in Ar ₁ or Ar ₂ to form a new ring; T ₁₉ and T ₂₀ are each independently selected from the group consisting of: hydrogen atom, C ₁ -C ₁₈ alkyl, C ₁ -C ₄ alkane the substituted acyl group C ₁ -C ₅ alkyl, T ₁ C (O) substituted with the O C ₁ -C ₄ alkyl, optionally substituted with one or more halogen atoms, C ₁ -C ₄ alkyl, C _5- C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryl oxy substituted C ₂ -C ₁₈ alkyl group, which is _{substituted by C 5-} C ₇ cycloalkylene, phenylene, O, S or NT ₁₇ inserted C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkyl, optionally with one or more C ₁ -C ₄ alkyl, Phenyl, halogen atom or C ₅ -C ₇ cycloalkyl substituted by CN, phenyl, and optionally one or more C ₁ -C ₄ alkyl, carboxyl, C ₁ -C ₁₂ alkyl acyl group, C ₅ -C ₆ cycloalkyl methanyl group, C ₂ -C _{4 alkyl acyl group substituted by C 5} -C ₆ cycloalkyl group, aryl acyl group, JT ₁₇ , Phenyl, halogen atom or CN substituted phenyl; or T _{19 is connected to the aromatic ring in Ar 1} or Ar ₂ through a single bond, carbon atom, carbonyl group to form a new ring; where Ar ₁ is a substituted carbazolyl group In group, Y _{1 is} not C, O, S or NT ₂₀ .

The present invention also provides a method for manufacturing a color filter, the color filter including a pixel layer, and the manufacturing method includes using the aforementioned photosensitive resin composition to form the pixel layer.

The present invention also provides a color filter which is manufactured by the aforementioned manufacturing method.

The present invention further provides a liquid crystal display device including the aforementioned color filter.

式(C1) 式(C1)中： Z₁ 及Z₂ 分別獨立地代表氫原子或鹵素原子；其中，Z₁ 及Z₂ 為相同或不同； Z₃ 、Z₄ 及Z₅ 分別獨立地代表氫原子、鹵素原子或烷基；其中，Z₃ 、Z₄ 及Z₅ 為相同或不同； Z₆ 及Z₇ 分別獨立地代表氫原子或烷基；其中，Z₆ 及Z₇ 為相同或不同； s表示1至2之整數；及 *表示鍵結處； 該光起始劑(E)包含一環戊二酮肟酯化合物(E-1)，且該環戊二酮肟酯化合物(E-1)包含至少一種選自由式(E1-1)、式(E1-2)、式(E1-3)、式(E1-4)及式(E1-5)所組成之群的環戊二酮肟酯化合物：

式(E1-1)

式(E1-2)

式(E1-3)

式(E1-4)

式(E1-5) 式(E1-1)、式(E1-2)、式(E1-3)、式(E1-4)及式(E1-5)中，Ar₁ 為鄰亞芳基或鄰亞雜芳基，該鄰亞芳基或該鄰亞雜芳基是以相鄰的兩個原子與Y₁ 和羰基相連構成並環結構，其餘原子上的取代基各自獨立地選自由氫原子，鹵素原子，C₁ -C₁₂ 烷基，C₅ -C₇ 環烷基，被C₅ -C₇ 環烷基取代之C₁ -C₄ 烷基，苯基，任意被一個或多個C₁ -C₄ 烷基、羧基、C₁ -C₁₂ 烷基醯基、芳基醯基、雜芳基醯基、JT₁₇ 、苯基、鹵素原子或CN取代之苯基，C₁ -C₄ 烷基苄氧基，被T₁ C(O)O取代之C₁ -C₄ 烷氧基，C₁ -C₃ 亞烷基二氧基，T₁ C(O)O，C₁ -C₁₂ 烷基硫基，C₁ -C₄ 烷基苯硫基，被T₁ C(O)O取代之C₁ -C₄ 烷基硫基，CN，羧基，C₁ -C₁₂ 烷氧基甲醯基，芳基醯基，雜芳基醯基及JT₁₈ 所組成之群；或 Ar₁ 之上述取代基中相鄰的兩個取代基之間或者取代基與Ar₁ 之間通過單鍵、碳原子或羰基相連構成環狀結構； 其中，JT₁₇ 及JT₁₈ 中，J係選自由O、S及NT₁₉ 所組成之群； Y₁ 係選自由O、S、NT₂₀ 、BT₂₀ 、CT₁₅ T₁₆ 、SiT₁₅ T₁₆ 、S=O及C=O所組成之群； Ar₂ 係選自由下列結構所組成之群：

、

、

及

，其中J係選自由O、S及NT₁₉ 所組成之群； U₁ 係選自由下列所組成之群：單鍵、C₁ -C₁₀ 直鏈亞烷基、C₁ -C₁₀ 支鏈亞烷基、被一個或多個氧原子或硫原子連在端基的C₂ -C₁₀ 直鏈亞烷基或C₂ -C₁₀ 支鏈亞烷基、被一個或多個氧原子或硫原子插入的C₂ -C₁₀ 直鏈亞烷基或C₂ -C₁₀ 支鏈亞烷基、無取代基的亞芳香基及有取代基的亞芳香基； Y₂ 係選自由下列所組成之群：單鍵、O、S、NT₂₀ 、BT₂₀ 、CT₁₅ T₁₆ 、SiT₁₅ T₁₆ 、C=O及Y₃ -U₂ -Y₃ ； U₂ 係選自由下列所組成之群：C₁ -C₁₀ 直鏈亞烷基、C₁ -C₁₀ 支鏈亞烷基、被一個或多個氧原子或硫原子連在端基的C₂ -C₁₀ 直鏈亞烷基、被一個或多個氧原子或硫原子連在端基的C₂ -C₁₀ 支鏈亞烷基、被一個或多個氧原子或硫原子插入的C₂ -C₁₀ 直鏈亞烷基、被一個或多個氧原子或硫原子插入的C₂ -C₁₀ 支鏈亞烷基、無取代基的亞芳香基及有取代基的亞芳香基； Y₃ 係選自由下列所組成之群：O、S、NT₂₀ 、BT₂₀ 及O-C(O)； T₁ 係選自由下列所組成之群：氫原子，C₁ -C₁₈ 烷基，C₁ -C₁₈ 烷氧基，C₂ -C₁₈ 烯基，任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代及／或被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入之C₂ -C₁₈ 烯基，任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代及／或被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入之C₂ -C₁₈ 烷基，C₅ -C₇ 環烷基，任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子或CN取代之C₅ -C₇ 環烷基，苯基，任意被一個或多個C₁ -C₄ 烷基、C₁ -C₄ 烷氧基、苯基、鹵素原子或CN取代之苯基，萘基，苯甲醯基及苯氧基羰基；其中苯甲醯基及苯氧基羰基的苯基可被一個或兩個以上鹵素原子、T₁₇ 、C₅ 環烷基、C₆ 環烷基、CN、OH或JT₁₇ 所取代； T₁₁ 及T₁₂ 各自獨立地選自由下列所組成之群：氫原子，鹵素原子，C₁ -C₁₂ 烷基，C₅ -C₇ 環烷基，被C₅ -C₇ 環烷基取代之C₁ -C₄ 烷基，C₁ -C₁₂ 烷氧基，C₁ -C₄ 烷基苄氧基，苯基，任意被一個或多個C₁ -C₄ 烷基、羧基、C₁ -C₁₂ 烷基醯基、C₁ -C₁₂ 芳基醯基、雜芳基醯基、JT₁₇ 、苯基、鹵素原子或CN取代之苯基，C₁ -C₄ 烷基苄氧基，被一個或多個C₁ -C₁₂ 烷氧基、C₁ -C₄ 烷基苄氧基或T₁ C(O)O取代之C₁ -C₄ 烷氧基，T₁ C(O)O，CN，羧基，C₁ -C₁₂ 烷氧基羰基，芳基羰基，雜芳基羰基，JT₁₈ ，被一個或多個C₁ -C₄ 烷基取代之苯氧基，被一個C₁ -C₈ 烷基醯基、C₅ -C₆ 環烷基醯基、芳基醯基或雜芳基醯基取代之苯氧基，被C₅ -C₆ 環烷基取代之C₁ -C₄ 烷基醯基苯氧基，C₁ -C₃ 亞烷基二氧基，C₁ -C₁₂ 烷基硫基，被T₁ C(O)O取代之C₁ -C₄ 烷基硫基，被T₁ C(O)O取代之C₁ -C₄ 烷基苯硫基，被一個C₁ -C₈ 烷基醯基、C₅ -C₆ 環烷基醯基、芳基醯基或雜芳基醯基取代之苯硫基，被C₅ -C₆ 環烷基取代之C₁ -C₄ 烷基醯基苯硫基，及環氧丙基；其中環氧基可任意地與C₁ -C₄ 烷基醛或酮縮合；或 T₁₁ 和T₁₂ 相連構成飽和或不飽和環狀結構； T₁₅ 及T₁₆ 各自獨立地選自由下列所組成之群：氫原子，C₁ -C₁₈ 烷基，被羧基取代之C₁ -C₅ 烷基，被C₁ -C₄ 烷氧基醯基取代之C₁ -C₅ 烷基，被T₁ C(O)O取代之C₁ -C₄ 烷基，任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代之C₂ -C₁₈ 烷基，被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入之C₂ -C₁₈ 烷基，C₅ -C₇ 環烷基，任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子或CN取代之C₅ -C₇ 環烷基，苯基，及任意被一個或多個C₁ -C₄ 烷基、C₁ -C₄ 烷氧基、羧基、C₁ -C₁₂ 烷基醯基、C₅ -C₆ 環烷基甲醯基、被C₅ -C₆ 環烷基取代之C₂ -C₄ 烷基醯基、苯甲醯基、JT₁₇ 、苯基、鹵素原子或CN取代之苯基；或 T₁₅ 、T₁₆ 與其共同所連的碳原子或矽原子一起構成環狀且成環之原子數為4至7；或 T₁₅ 、T₁₆ 分別與相鄰的取代基一起構成環狀且成環之原子數為4至7； T₁₇ 為C₁ -C₄ 烷基； T₁₈ 係選自由下列所組成之群：氫原子，C₁ -C₁₈ 烷基，被C₁ -C₄ 烷氧基醯基取代之C₁ -C₅ 烷基，被T₁ C(O)O取代的C₁ -C₄ 烷基，任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代之C₂ -C₁₈ 烷基，被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入之C₂ -C₁₈ 烷基，C₅ -C₇ 環烷基，任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子或CN取代之C₅ -C₇ 環烷基，苯基，任意被一個或多個C₁ -C₁₂ 烷基、羧基、C₁ -C₁₂ 烷基醯基、C₅ -C₆ 環烷基甲醯基、芳基醯基、雜芳基醯基、JT₁₇ 、苯基、鹵素原子、CN或NO₂ 取代之苯基，任意被一個有C₅ -C₆ 環烷基取代之C₂ -C₄ 烷基醯基取代的苯基，任意被一個有亞苯基、O、S或NT₁₇ 插入之C₂ -C₁₂ 烷基醯基取代之苯基，C₁ -C₄ 烷基醯基，C₁ -C₄ 共軛烯醯基，苯甲醯基及苯氧基羰基；其中該苯甲醯基或該苯氧基羰基中的苯基可任意被一個或兩個以上鹵素原子、T₁₇ 、C₅ 環烷基、C₆ 環烷基、CN、OH或JT₁₇ 取代；或 T₁₈ 通過單鍵、碳原子、羰基與Ar₁ 或Ar₂ 中的芳環相連構成新的環； T₁₉ 及T₂₀ 各自獨立地選自由下列所組成之群：氫原子，C₁ -C₁₈ 烷基，被C₁ -C₄ 烷氧基醯基取代之C₁ -C₅ 烷基，被T₁ C(O)O取代之C₁ -C₄ 烷基，任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代之C₂ -C₁₈ 烷基，被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入之C₂ -C₁₈ 烷基，C₅ -C₇ 環烷基，任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子或CN取代之C₅ -C₇ 環烷基，苯基，及任意被一個或多個C₁ -C₄ 烷基、羧基、C₁ -C₁₂ 烷基醯基、C₅ -C₆ 環烷基甲醯基、被C₅ -C₆ 環烷基取代之C₂ -C₄ 烷基醯基、芳基醯基、JT₁₇ 、苯基、鹵素原子或CN取代之苯基；或 T₁₉ 分別通過單鍵、碳原子、羰基與Ar₁ 或Ar₂ 中的芳環相連構成新的環； 其中當Ar₁ 為取代咔唑基團時，Y₁ 不為C、O、S或NT₂₀ 。The present invention provides a photosensitive resin composition comprising: a pigment (A); an alkali-soluble resin (C); an ethylenically unsaturated group-containing compound (D); a photoinitiator (E); and a solvent (F); Wherein, the alkali-soluble resin (C) comprises a first alkali-soluble resin (C-1), and the first alkali-soluble resin (C-1) has a structural unit represented by formula (C1):

Formula (C1) In formula (C1): Z ₁ and Z ₂ each independently represent a hydrogen atom or a halogen atom; wherein, Z ₁ and Z ₂ are the same or different; Z ₃ , Z ₄ and Z ₅ each independently represent hydrogen Atom, halogen atom or alkyl group; wherein, Z ₃ , Z ₄ and Z ₅ are the same or different; Z ₆ and Z ₇ each independently represent a hydrogen atom or an alkyl group; wherein, Z ₆ and Z ₇ are the same or different; s represents an integer from 1 to 2; and * represents a bonding site; the photoinitiator (E) contains a cyclopentadione oxime ester compound (E-1), and the cyclopentadione oxime ester compound (E-1 ) Contains at least one cyclopentadione oxime selected from the group consisting of formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4) and formula (E1-5) Ester compound:

Formula (E1-1)

Formula (E1-2)

Formula (E1-3)

Formula (E1-4)

Formula (E1-5) In formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4) and formula (E1-5), Ar ₁ is an o-arylene group or The ortho-heteroarylene group, the ortho-arylene group or the ortho-heteroarylene group is formed by connecting two adjacent atoms with Y ₁ and the carbonyl group to form a ring structure, and the substituents on the remaining atoms are independently selected from hydrogen atoms , Halogen atom, C ₁ -C ₁₂ alkyl group, C ₅ -C ₇ cycloalkyl group, _{C 1} -C ₄ alkyl group substituted _{by C 5} -C ₇ cycloalkyl group, phenyl group, optionally with one or more C _1- C ₄ alkyl group, carboxyl group, C ₁ -C ₁₂ alkyl acyl group, aryl acyl group, heteroaryl acyl group, JT ₁₇ , phenyl group, halogen atom or CN substituted phenyl group, C ₁ -C ₄ Alkylbenzyloxy, _{C 1} -C _{4 alkoxy substituted by T 1} C(O)O, C ₁ -C ₃ alkylene dioxy, T ₁ C(O)O, C ₁ -C ₁₂ alkylthio, C ₁ -C ₄ alkyl group, the substituted _{T 1 C (O) O C} 1 -C 4 alkylthio, CN, carboxy, C ₁ -C ₁₂ acyl alkoxysilyl Group, aryl acyl group, heteroaryl acyl group and JT ₁₈ ; or between two adjacent substituents of the above-mentioned substituents of _{Ar 1 or between the substituents and Ar 1} through a single bond, carbon Atoms or carbonyl groups are connected to form a ring structure; among JT ₁₇ and JT ₁₈ , J is selected from the group consisting of O, S and NT _{19 ; Y 1} is selected from O, S, NT ₂₀ , BT ₂₀ , CT ₁₅ The group consisting of T ₁₆ , SiT ₁₅ T ₁₆ , S=O and C=O; Ar ₂ is selected from the group consisting of the following structures:

,

,

and

, Where J is selected from the group consisting of _{O, S and NT 19 ; U 1} is selected from the group consisting of: single bond, C ₁ -C ₁₀ linear alkylene, C ₁ -C ₁₀ branched chain _{Alkyl group, C 2} -C ₁₀ straight chain alkylene group or C ₂ -C ₁₀ branched chain alkylene group connected to the end group by one or more oxygen atoms or sulfur atoms, and one or more oxygen atoms or sulfur atoms Inserted C ₂ -C ₁₀ linear alkylene or C ₂ -C ₁₀ branched alkylene, unsubstituted arylene and substituted arylene; Y ₂ is selected from the group consisting of the following : Single bond, O, S, NT ₂₀ , BT ₂₀ , CT ₁₅ T ₁₆ , SiT ₁₅ T ₁₆ , C=O and Y ₃ -U ₂ -Y ₃ ; U ₂ is selected from the group consisting of: C ₁ -C ₁₀ linear alkylene group, C ₁ -C _{10 branched chain alkylene group, C 2} -C ₁₀ linear alkylene group connected to the end group by one or more oxygen atoms or sulfur atoms, by one or more oxygen atom or a sulfur atom in the end groups attached C ₂ -C ₁₀ branched alkylene, substituted by one or more oxygen atoms or sulfur atom inserted straight chain C ₂ -C ₁₀ alkylene group, substituted with one or more _{A C 2} -C ₁₀ branched alkylene group with an oxygen atom or a sulfur atom inserted, an unsubstituted arylene group and a substituted arylene group; Y ₃ is selected from the group consisting of: O, S, NT ₂₀ , BT ₂₀ and OC(O); T ₁ is selected from the group consisting of hydrogen atom, C ₁ -C ₁₈ alkyl, C ₁ -C ₁₈ alkoxy, C ₂ -C ₁₈ alkenyl, arbitrary By one or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryl A C ₂ -C ₁₈ alkenyl group substituted by an oxy group and/or _{inserted by a C 5} -C ₇ cycloalkylene, phenylene, O, S or NT ₁₇ group, optionally with one or more halogen atoms, C _1- C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryloxy substituted and/or substituted by C _5- C ₇ cycloalkylene, phenylene, O, S or NT ₁₇ inserted C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkyl, optionally with one or more C ₁ -C ₄ alkyl, Phenyl, halogen atom or C ₅ -C ₇ cycloalkyl substituted by CN, phenyl, optionally substituted by one or more C ₁ -C ₄ alkyl, C ₁ -C ₄ alkoxy, phenyl, halogen atom or CN-substituted phenyl, naphthyl, benzyl and phenoxycarbonyl; the phenyl group of benzyl and phenoxycarbonyl can be substituted by one or more halogen atoms, T ₁₇ , C ₅ cycloalkyl , C ₆ cycloalkyl, CN, OH or JT ₁₇ ; T ₁₁ and T ₁₂ are each independently selected from the group consisting of: hydrogen atom , Halogen atom, C ₁ -C ₁₂ alkyl, C ₅ -C ₇ cycloalkyl, C ₁ -C _{4 alkyl substituted by C 5} -C ₇ cycloalkyl, C ₁ -C ₁₂ alkoxy, C _1- C ₄ alkylbenzyloxy, phenyl, optionally substituted by one or more C ₁ -C ₄ alkyl, carboxyl, C ₁ -C ₁₂ alkyl acyl, C ₁ -C ₁₂ aryl acyl, hetero Aryl acyl group, JT ₁₇ , phenyl group, halogen atom or CN substituted phenyl group, C ₁ -C ₄ alkylbenzyloxy group, substituted by one or more C ₁ -C ₁₂ alkoxy groups, C ₁ -C ₄ alkyl or benzyloxy T ₁ C (O) substituted with the O C ₁ -C _{4 alkoxy, T 1 C (O) O} , CN, carboxy, C ₁ -C ₁₂ alkoxycarbonyl, arylcarbonyl, Heteroarylcarbonyl, JT ₁₈ , phenoxy substituted by one or more C ₁ -C ₄ alkyl groups, substituted by one C ₁ -C ₈ alkyl acyl group, C ₅ -C ₆ cycloalkyl acyl group, aryl group Phenoxy group substituted with acyl group or heteroaryl group, C ₁ -C _{4 alkyl phenoxy group substituted by C 5} -C ₆ cycloalkyl group, C ₁ -C ₃ alkylene dioxy group , C ₁ -C ₁₂ alkylthio, the substituted _{T 1 C (O) O C} 1 -C 4 alkylthio group, it is substituted with _{T 1 C (O) O C} 1 -C 4 alkylphenyl sulfur Group, a _{phenylthio group substituted by a C 1} -C ₈ alkyl acyl group, a C ₅ -C ₆ cycloalkyl acyl group, an aryl acyl group or a heteroaryl acyl group, and a C ₅ -C ₆ cycloalkyl group Substituted C ₁ -C ₄ alkyl phenylthio and glycidyl groups; wherein the epoxy group can be optionally _{condensed with C 1} -C ₄ alkyl aldehydes or ketones; or T ₁₁ and T _{12 are} connected to form saturation Or unsaturated cyclic structure; T ₁₅ and T ₁₆ are each independently selected from the group consisting of hydrogen atom, C ₁ -C ₁₈ alkyl group, C ₁ -C ₅ alkyl group substituted by carboxyl group, and C _1- the C ₄ alkoxy substituted with acyl C ₁ -C ₅ alkyl, substituted of _{T 1 C (O) O C} 1 -C 4 alkyl, optionally substituted with one or more halogen atoms, C ₁ -C ₄ alkoxy Group, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryl oxy substituted C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkylene, phenylene, O, S or NT ₁₇ inserted C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkyl, optionally with one or more C ₁ -C ₄ Alkyl, phenyl, halogen atom or CN substituted C ₅ -C ₇ cycloalkyl, phenyl, and optionally one or more C ₁ -C ₄ alkyl, C ₁ -C ₄ alkoxy, carboxyl, C ₁ -C ₁₂ alkyl acyl group, C ₅ -C ₆ cycloalkyl methanyl group, C ₂ -C _{4 alkyl acyl group substituted by C 5} -C ₆ cycloalkyl group, benzyl acyl group, JT ₁₇ , Phenyl, halogen atom or CN substituted phenyl; or T ₁₅ , T ₁₆ and the carbon atom or silicon atom to which they are connected together form a ring and the number of atoms forming the ring is 4 to 7; or T ₁₅ , T ₁₆ It forms a cyclic ring together with adjacent substituents and the number of atoms forming the ring is 4 to 7; T ₁₇ is a C ₁ -C ₄ alkyl group; T ₁₈ is selected from the group consisting of: hydrogen atom, C _1- C ₁₈ alkyl, the substituted C ₁ -C ₄ alkoxy C ₁ -C ₅ acyl group, substituted _{T 1 C (O) O C} 1 -C 4 alkyl, optionally substituted with one or more Halogen atom, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryloxy substituted C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkylene, phenylene, O, S, or NT ₁₇ inserted into the C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkyl, optionally substituted One or more C ₁ -C ₄ alkyl groups, phenyl groups, halogen atoms or CN substituted C ₅ -C ₇ cycloalkyl groups, phenyl groups, optionally substituted by one or more C ₁ -C ₁₂ alkyl groups, carboxyl groups, C _1- C ₁₂ alkyl acyl group, C ₅ -C ₆ cycloalkyl methanyl group, aryl acyl group, heteroaryl acyl group, JT ₁₇ , phenyl group, halogen atom, CN or NO ₂ substituted phenyl group, Any phenyl substituted with a C ₅ -C ₆ cycloalkyl substituted C ₂ -C ₄ alkyl acyl group, optionally with a C ₂ -C ₁₂ alkane inserted with a phenylene, O, S or NT ₁₇ Phenyl substituted with a benzoyl group, C ₁ -C ₄ alkyl acyl group, C ₁ -C ₄ conjugated alkenyl group, benzyl group and phenoxycarbonyl group; wherein the benzyl group or the phenoxy group The phenyl group in the carbonyl group can be optionally substituted by one or more halogen atoms, T ₁₇ , C ₅ cycloalkyl, C ₆ cycloalkyl, CN, OH or JT ₁₇ ; or T _{18 is} through a single bond, carbon atom, carbonyl group Connected with the aromatic ring in Ar ₁ or Ar ₂ to form a new ring; T ₁₉ and T ₂₀ are each independently selected from the group consisting of: hydrogen atom, C ₁ -C ₁₈ alkyl, C ₁ -C ₄ alkane the substituted acyl group C ₁ -C ₅ alkyl, T ₁ C (O) substituted with the O C ₁ -C ₄ alkyl, optionally substituted with one or more halogen atoms, C ₁ -C ₄ alkyl, C _5- C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryl oxy substituted C ₂ -C ₁₈ alkyl group, which is _{substituted by C 5-} C ₇ cycloalkylene, phenylene, O, S or NT ₁₇ inserted C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkyl, optionally with one or more C ₁ -C ₄ alkyl, Phenyl, halogen atom or C ₅ -C ₇ cycloalkyl substituted by CN, phenyl, and optionally one or more C ₁ -C ₄ alkyl, carboxyl, C ₁ -C ₁₂ alkyl acyl group, C ₅ -C ₆ cycloalkyl methanyl group, C ₂ -C _{4 alkyl acyl group substituted by C 5} -C ₆ cycloalkyl group, aryl acyl group, JT ₁₇ , Phenyl, halogen atom or CN substituted phenyl; or T _{19 is connected to the aromatic ring in Ar 1} or Ar ₂ through a single bond, carbon atom, carbonyl group to form a new ring; where Ar ₁ is a substituted carbazolyl group In group, Y _{1 is} not C, O, S or NT ₂₀ .

The pigment (A) according to the present invention may be an inorganic pigment, an organic pigment, or a combination of these.

The above-mentioned inorganic pigments can be metal compounds such as metal oxides, metal complex salts, etc., which can be selected from the oxides of metals such as iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, leadite, antimony, etc. Composite oxides of the aforementioned metals.

The above-mentioned organic pigments are selected from C.1. Pigment Yellow 1, 3, 11, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 55, 60, 61, 65, 71, 73, 74, 81, 83, 93, 95, 97, 98, 99, 100, 101, 104, 106, 108, 109, 110, 113, 114, 116, 117, 119, 120, 126, 127, 128, 129, 138, 139, 150, 151, 152, 153, 154, 155, 156, 166, 167, 168, 175; CI Pigment Orange 1, 5, 13, 14, 16, 17, 24, 34, 36, 38 , 40, 43, 46, 49, 51, 61, 63, 64, 71, 73; CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 14, 15, 16, 17, 18, 19, 21, 22, 23, 30, 31, 32, 37, 38, 40, 41, 42, 48: 1, 48: 2, 48: 3, 48: 4, 49: l, 49: 2, 50: 1, 52: 1, 53: 1, 57, 57: 1, 57: 2, 58: 2, 58: 4, 60: 1, 63: 1, 63: 2, 64: l, 81: l, 83, 88, 90: l, 97, 101, 102, 104, 105, 106, 108, 112, 113, 114, 122, 123, 144, 146, 149, 150, 151, 155, 166, 168, 170, 171, 172, 174, 175, 176, 177, 178, 179, 180, 185, 187, 188, 190, 193, 194, 202, 206, 207, 208, 209, 215, 216, 220, 224, 226, 242, 243, 245, 254, 255, 264, 265; CI Pigment Violet 1, 14, 19, 23, 29, 32, 33, 36, 37, 38, 39, 40, 50; CI Pigment Blue 1, 2, 15, 15:1, 15: 2, 15: 3, 15: 4, 15: 5, 15: 6, 16, 21, 22, 60, 61, 64, 66; CI Pigment Green 7 , 36, 37, 42, 58; CI Pigment Brown 23, 25, 28; and CI Pigment Black 1, 7. The organic pigments can be used alone or in combination of multiple types.

The average particle diameter of the primary particles of the pigment (A) is preferably 10 nm to 200 nm, more preferably 20 nm to 150 nm, and most preferably 30 nm to 130 nm.

Based on the total usage amount of the alkali-soluble resin (C) being 100 parts by weight, the usage amount of the pigment (A) is 30 parts by weight to 500 parts by weight, preferably 40 parts by weight to 400 parts by weight, more preferably 50 parts by weight Parts to 300 parts by weight.

When necessary, the pigment (A) can also optionally use dispersants, such as cationic, anionic, nonionic, amphoteric, silicone, fluorine, and other surfactants.

The surfactant may include, but is not limited to, polyethylene oxide alkyl ethers such as polyethylene oxide lauryl ether, polyethylene oxide stearyl ether, and polyethylene oxide oil ether; Polyethylene oxide alkyl phenyl ether surfactants such as ethylene oxide octyl phenyl ether and polyethylene oxide nonyl phenyl ether; polyethylene glycol dilaurate, polyethylene glycol distearate Polyethylene glycol diester surfactants such as acid esters; sorbitan fatty acid ester surfactants; fatty acid modified polyester surfactants; tertiary amine modified polyurethane interface Active agent; manufactured by Shin-Etsu Chemical Industry, model KP, manufactured by Toray Dow Corning Silicon, model SF-8427, manufactured by Kyoeisha Oleochemical Industry, model Polyflow, manufactured by Tochem Products Co. ., Ltd.), the product model is F-Top, the product of Dai Nippon Ink Chemical Industry, the model is Megafac product, the product of Sumitomo 3M, the model is Fluorad product, the product is Asahi Glass, the model is product of Asahi Guard and Surflon . The surfactant can be used singly or in combination.

The photosensitive resin composition according to the present invention may include a dye (B), and the dye (B) can be used with the pigment (A). Those skilled in the art to which the present invention belongs can select the dye (B) with a specific spectrum. . The dye (B) such as but not limited to azo dyes, azo metal complex dyes, anthraquinone dyes, indigo dyes, thioindigo dyes, phthalocyanine dyes, diphenylmethane dyes, triphenylmethane dyes, xanthene dyes, Thiazine dyes, cationic dyes, cyanine dyes, nitro dyes, quinoline dyes, naphthoquinone dyes, oxazine dyes, etc.

In a specific example, the dye (B) is CI Solvent Red 2, CI Solvent Red 24, CI Solvent Red 27, CI Solvent Red 49, CI Solvent Red 52, CI Solvent Red 57, CI Solvent Red 89, CI Solvent Red 111, CI Solvent Red 114, CI Solvent Red 119, CI Solvent Red 124, CI Solvent Red 135, CI Solvent Red 136, CI Solvent Red 137, CI Solvent Red 138, CI Solvent Red 139, CI Solvent Red 143, CI Solvent Red 144, CI Solvent Red 145, CI Solvent Red 146, CI Solvent Red 147, CI Solvent Red 148, CI Solvent Red 149, CI Solvent Red 150, CI Solvent Red 151, CI Solvent Red 152, CI Solvent Red 155, CI Solvent Red 156, CI Solvent Red 162, CI Solvent Red 168, CI Solvent Red 169, CI Solvent Red 170, CI Solvent Red 171, CI Solvent Red 172, CI Solvent Red 177, CI Solvent Red 178, CI Solvent Red 179, CI Solvent Red 181, CI Solvent Red 190, CI Solvent Red 191, CI Solvent Red 194, CI Solvent Red 199, CI Solvent Red 200, CI Solvent Red 201, CI Solvent Red 299, CI Direct Red 2, CI Direct Red 81, CI Acid Red 1. CI Acid Red 14, CI Acid Red 27, CI Acid Red 52, CI Acid Red 87, CI Acid Red 88, CI Acid Red 289, CI Basic Red 1, CI Mordant Red 3, CI Ice Dye Red 21, CI Vat Red 1, CI Vat Red 2, CI Vat Red 15, CI Vat Red 23, CI Vat Red 41, CI Vat Red 47, CI Disperse Red 1, CI Disperse Red 11, CI Disperse Red 15, CI Disperse Red 22, CI Disperse Red 60, CI Disperse Red 92, CI Disperse Red 146, CI Disperse Red 191, CI Disperse Red 283, CI Disperse Red 288, CI Reactive Red 12. The above-mentioned dyes (B) can be used singly or in combination of multiple types according to the required properties.

When the dye (B) is used, the color filter made from the photosensitive resin composition has better brightness and contrast.

Preferably, based on the usage amount of the alkali-soluble resin (C) being 100 parts by weight, the usage amount of the dye (B) is 0 parts by weight to 50 parts by weight; preferably 0 parts by weight to 40 parts by weight; more preferably It is 0 parts by weight to 30 parts by weight.

式(C1) 式(C1)中： Z₁ 及Z₂ 分別獨立地代表氫原子或鹵素原子；其中，Z₁ 及Z₂ 為相同或不同； Z₃ 、Z₄ 及Z₅ 分別獨立地代表氫原子、鹵素原子或烷基；其中，Z₃ 、Z₄ 及Z₅ 為相同或不同； Z₆ 及Z₇ 分別獨立地代表氫原子或烷基；其中，Z₆ 及Z₇ 為相同或不同； s表示1至2之整數；及 *表示鍵結處。The alkali-soluble resin (C) according to the present invention comprises a first alkali-soluble resin (C-1), which is a resin having an ethylenically unsaturated group, and the first alkali-soluble resin (C-1) has the formula ( C1) Structure unit shown in:

Formula (C1) In formula (C1): Z ₁ and Z ₂ each independently represent a hydrogen atom or a halogen atom; wherein, Z ₁ and Z ₂ are the same or different; Z ₃ , Z ₄ and Z ₅ each independently represent hydrogen Atom, halogen atom or alkyl group; wherein, Z ₃ , Z ₄ and Z ₅ are the same or different; Z ₆ and Z ₇ each independently represent a hydrogen atom or an alkyl group; wherein, Z ₆ and Z ₇ are the same or different; s represents an integer from 1 to 2; and * represents the bonding location.

式(C1-i) 式(C1-i)中，Z₁ 至Z₇ 以及s的定義分別與式(C1)中的Z₁ 至Z₇ 以及s的定義相同，在此不另贅述。The first alkali-soluble resin (C-1) is composed of an ethylenically unsaturated monomer (c-1-1) having a structure represented by formula (C1-i), ethylene with one or more carboxylic acids or carboxylic anhydrides Unsaturated monomers (c-1-2) and other copolymerizable ethylenic unsaturated monomers (c-1-3) after copolymerization, and the ethylenic unsaturated monomers with epoxy groups (c- 1-4) Obtained by reaction;

In the formula (C1-i) of formula (C1-i), Z ₁ in the formula respectively (C1) Z ₁ to Z ₇ and the same definition s to Z ₇ and s is defined, which is not repeated herein.

In one embodiment, the first alkali-soluble resin (C-1) is made by combining the ethylenically unsaturated monomer (c-1-1) having the structure represented by formula (C1-i) with one or more Carboxylic acid or carboxylic acid anhydride ethylenic unsaturated monomer (c-1-2) and other copolymerizable ethylenic unsaturated monomers (c-1-3) undergo double bond copolymerization to form a polymer , Wherein the side chain of this polymer has a carboxylic acid group. Then, the carboxylic acid group in the side chain of the polymer and the ethylenically unsaturated monomer (c-1-4) having an epoxy group undergo an addition reaction to prepare the first alkali-soluble resin (C-1 ). Preferably, the first alkali-soluble resin (C-1) has an ethylenically unsaturated group.

In another embodiment, the first alkali-soluble resin (C-1) is made by combining the ethylenically unsaturated monomer (c-1-1) with the structure represented by formula (C1-i) and other copolymerizable resins. The ethylenic unsaturated monomer (c-1-3) and the ethylenic unsaturated monomer with epoxy group (c-1-4) undergo a double bond copolymerization reaction to form a polymer, wherein the polymer The side chain has epoxy groups. Then, the epoxy group in the side chain of the polymer and the ethylenically unsaturated monomer (c-1-2) having one or more carboxylic acid or carboxylic anhydride undergo an addition reaction to prepare the first base Soluble resin (C-1).

In another embodiment, the first alkali-soluble resin (C-1) is firstly mixed with an ethylenically unsaturated monomer (c-1-1) having a structure represented by formula (C1-i) and other copolymerizable monomers. The ethylenic unsaturated monomer (c-1-3) and the ethylenic unsaturated monomer with epoxy group (c-1-4) undergo a double bond copolymerization reaction to form a polymer, wherein the polymer The side chain has epoxy groups. Then, the epoxy group in the side chain of the polymer and the ethylenically unsaturated monomer (c-1-2) having one or more carboxylic acid or carboxylic anhydride undergo an addition reaction, and then further react with an acid anhydride compound The first alkali-soluble resin (C-1) is prepared by a half-esterification reaction.

The ethylenically unsaturated monomer (c-1-1) having the structure represented by the formula (C1-i) can include, but is not limited to, N-benzyl maleimide, N-(1 -Phenylethyl) maleimide (N-(1-phenylethyl)maleimide), N-(2-phenylethyl)maleimide (N-(2-phenylethyl)maleimide), 2, 3-Dichloro-N-benzylmaleimide, 2,3-dichloro-N-(1-phenylethyl)maleimide, 2,3-dichloro-N-(2- Phenylethyl)maleimide, 2,3-dichloro-N-(2-chlorobenzyl)maleimide, 2,3-dichloro-N-(4-chlorobenzyl)maleimide Leximine, 2,3-Dichloro-N-(2-methylbenzyl)maleimide, 2,3-Dichloro-N-(4-methylbenzyl)maleimide , 2,3-Dichloro-N-(2,4-dimethylbenzyl)maleimide, 2,3-dichloro-N-(3,4-dimethylbenzyl)maleimide Imine, 2,3-dichloro-N-(2,4-dichlorobenzyl) maleimide or 2,3-dichloro-N-(2,4,6-trimethylbenzyl) Maleimide.

Preferably, the ethylenically unsaturated monomer (c-1-1) having the structure represented by formula (C1-i) is selected from N-benzylmaleimide, N-(1-phenylethyl Base) maleimide, N-(2-phenylethyl)maleimide, 2,3-dichloro-N-(2-phenylethyl)maleimide, 2,3 -Dichloro-N-(2,4-dimethylbenzyl)maleimide, 2,3-dichloro-N-(2,4-dichlorobenzyl)maleimide or 2, 3-Dichloro-N-(2,4,6-trimethylbenzyl)maleimide.

In a specific example of the present invention, the ethylenically unsaturated monomer (c-1-1) having a structure represented by formula (C1-i) based on the alkali-soluble resin (C-1) has one or more The total amount of carboxylic acid or carboxylic acid anhydride ethylenic unsaturated monomer (c-1-2) and other copolymerizable ethylenic unsaturated monomer (c-1-3) copolymer monomers is 100 weight The amount of the ethylenically unsaturated monomer (c-1-1) with the structure represented by formula (C1-i) ranges from 5 parts by weight to 50 parts by weight; preferably from 10 parts by weight to 45 parts by weight ; More preferably 15 parts by weight to 40 parts by weight.

When the use amount of the ethylenically unsaturated monomer (c-1-1) with the structure represented by formula (C1-i) ranges from 5 parts by weight to 50 parts by weight, the composition of the photosensitive resin can be further improved The bubble-like display defect of the liquid crystal display element of the color filter made by the material.

The ethylenically unsaturated monomer (c-1-2) with one or more carboxylic acids or carboxylic anhydrides, wherein the ethylenically unsaturated monomer with one or more carboxylic acids may include, but is not limited to, unsaturated A monocarboxylic acid compound, an unsaturated polycarboxylic acid compound, a polycyclic compound having an unsaturated group and one carboxylic acid group, or a polycyclic compound having an unsaturated group and multiple carboxylic acid groups.

The unsaturated monocarboxylic acid compound may include, but is not limited to, (meth)acrylic acid, crotonic acid, α-chloroacrylic acid, ethacrylic acid, cinnamic acid, 2-(meth)acrylic acid ethoxy succinate ( 2-methacryloyloxyethyl succinate monoester), 2-(meth)acryloyloxyethyl succinate monoester), 2-(meth)acryloyloxyethyl hexahydrophthalate, 2-(meth)acryloyloxyethyl succinate monoester), 2-(meth)acryloyloxyethyl succinate monoester), 2-(meth)acryloyloxyethyl succinate monoester) Lactone polyol monoacrylate etc. The ω-carboxylic acid-based polycaprolactone polyol monoacrylate can be manufactured by East Asia Synthetic, and the product model is ARONIX M-5300.

The unsaturated polycarboxylic acid compound may include, but is not limited to, maleic acid, fumaric acid, methyl fumaric acid, itaconic acid, citraconic acid, and the like.

The polycyclic compound having an unsaturated group and a carboxylic acid group may include, but is not limited to, 5-carboxylic acid group bicyclo[2.2.1]hept-2-ene, 5-carboxylic acid group-5-methyl bicyclo[2.2. 1]Hept-2-ene, 5-carboxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-carboxy-6-methylbicyclo[2.2.1]hept-2- Ene or 5-carboxy-6-ethylbicyclo[2.2.1]hept-2-ene, etc.

The polycyclic compound having an unsaturated group and a plurality of carboxylic acid groups can be, for example, 5,6-dicarboxylic acid bicyclo[2.2.1]hept-2-ene and the like.

Preferably, the ethylenically unsaturated monomer with one or more than one carboxylic acid is selected from acrylic acid, methacrylic acid, 2-methacrylic acid ethoxy succinate, 2-methacrylic acid group Ethoxy hexahydrophthalate, or any combination of the above compounds.

The ethylenically unsaturated monomer (c-1-2) with one or more carboxylic acids or carboxylic anhydrides, wherein the ethylenically unsaturated monomer with one or more carboxylic anhydrides may include, but is not limited to, unsaturated A carboxylic acid anhydride compound or a polycyclic compound having an unsaturated group and a carboxylic acid anhydride.

The unsaturated carboxylic anhydride compound may include, but is not limited to, maleic anhydride, fumaric anhydride, methyl fumaric anhydride, itaconic anhydride, or citraconic anhydride, and the like. The polycyclic compound with unsaturated group and carboxylic anhydride may include, but is not limited to, 5,6-dicarboxylic anhydride bicyclo[2.2.1]hept-2-ene and the like.

Preferably, the ethylenically unsaturated monomer with one or more carboxylic anhydrides is maleic anhydride.

The above-mentioned ethylenically unsaturated monomers (c-1-2) having one or more carboxylic acids or carboxylic anhydrides can be used alone or in combination.

In a specific example of the present invention, the ethylenically unsaturated monomer (c-1-1) having a structure represented by formula (C1-i) based on the alkali-soluble resin (C-1) has one or more The total amount of carboxylic acid or carboxylic acid anhydride ethylenic unsaturated monomer (c-1-2) and other copolymerizable ethylenic unsaturated monomer (c-1-3) copolymer monomers is 100 weight Parts, the use amount of the ethylenically unsaturated monomer (c-1-2) with one or more carboxylic acids or carboxylic anhydrides ranges from 5 parts by weight to 40 parts by weight; preferably from 10 parts by weight to 35 parts by weight ; More preferably 15 parts by weight to 30 parts by weight.

The other copolymerizable ethylenically unsaturated monomers (c-1-3) may include, but are not limited to, alkyl (meth)acrylate, cycloaliphatic (meth)acrylate, and aryl (meth)acrylate Esters, unsaturated dicarboxylic acid esters, hydroxyalkyl (meth)acrylates, polyethers having (meth)acrylate groups, styrene compounds, or unsaturated compounds other than the above-mentioned compounds.

The aforementioned alkyl (meth)acrylate may include, but is not limited to, methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, ( N-butyl meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate or tertiary butyl (meth)acrylate, etc.

The above-mentioned alicyclic (meth)acrylate may include but is not limited to cyclohexyl (meth)acrylate, 2-methylcyclohexyl (meth)acrylate, dicyclopentyl (meth)acrylate Tricyclic [5.2.1.0 ^2,6 ]dec-8-yl (meth)acrylate}, dicyclopentyloxyethyl (meth)acrylate, isobornyl (meth)acrylate or (meth)acrylic acid Tetrahydrofuran ester and so on.

The aforementioned aryl (meth)acrylate may include, but is not limited to, phenyl (meth)acrylate, benzyl methacrylate, and the like.

The unsaturated dicarboxylic acid ester may include, but is not limited to, diethyl maleate, diethyl fumarate, diethyl itaconate, and the like.

The hydroxyalkyl (meth)acrylate may include, but is not limited to, 2-hydroxyethyl (meth)acrylate or 2-hydroxypropyl (meth)acrylate, and the like.

The polyether having a (meth)acrylate group may include, but is not limited to, polyethylene glycol mono(meth)acrylate or polypropylene glycol mono(meth)acrylate.

The styrenic compound may include, but is not limited to, styrene, α-methylstyrene, m-methylstyrene, p-methylstyrene or p-methoxystyrene, and the like.

Unsaturated compounds other than the above compounds may include, but are not limited to, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, ethyl vinyl, 1,3-butadiene, Isoprene, 2,3-dimethyl 1,3-butadiene, N-butanediimino-3-maleimide benzoate, N-butanediimino- 4-maleimidyl butyrate, N-succinylimidyl-6-maleimid hexanoate, N-succinylimidyl-3-maleimid propionate , N-(9-acridinyl) maleimide, N-octylmaleimide (N-octylmaleimide), N-cyclohexylmaleimide (N-cyclohexylmaleimide) or N-phenyl N-phenylmaleimide and so on.

The other copolymerizable ethylenically unsaturated monomers (c-1-3) can be used alone or in combination.

Preferably, the other copolymerizable ethylenically unsaturated monomer (c-1-3) is selected from methyl (meth)acrylate, butyl (meth)acrylate, 2-(meth)acrylic acid Hydroxyethyl, tert-butyl (meth)acrylate, benzyl (meth)acrylate, dicyclopentyl (meth)acrylate, isobornyl methacrylate, dicyclopentyloxy (meth)acrylate Ethyl, styrene, p-methoxystyrene or any combination of the above compounds.

In a specific example of the present invention, the ethylenically unsaturated monomer (c-1-1) having a structure represented by formula (C1-i) based on the alkali-soluble resin (C-1) has one or more The total amount of carboxylic acid or carboxylic acid anhydride ethylenic unsaturated monomer (c-1-2) and other copolymerizable ethylenic unsaturated monomer (c-1-3) copolymer monomers is 100 weight Parts, the use amount of the other copolymerizable ethylenically unsaturated monomer (c-1-3) ranges from 10 parts by weight to 90 parts by weight; preferably from 20 parts by weight to 80 parts by weight; more preferably 30 parts by weight Parts to 70 parts by weight.

The ethylenically unsaturated monomer (c-1-4) having an epoxy group may include, but is not limited to, a (meth)acrylate compound having an epoxy group, an α-alkyl acrylate compound having an epoxy group, or Glycidyl ether compounds, etc.

The (meth)acrylate compound having an epoxy group may include, but is not limited to, glycidyl (meth)acrylate, 2-methylglycidyl (meth)acrylate, 3,4 (meth)acrylate -Epoxybutyl ester, 6,7-epoxyheptyl (meth)acrylate, 3,4-epoxycyclohexyl (meth)acrylate or 3,4-epoxycyclohexylmethyl (meth)acrylate Wait.

The α-alkyl acrylate compound with epoxy group may include, but is not limited to, α-ethyl glycidyl acrylate, α-n-propyl glycidyl acrylate, α-n-butyl glycidyl acrylate, or α-Ethyl acrylate-6,7-epoxyheptyl ester, etc.

The glycidyl ether compound may include, but is not limited to, o-vinylbenzylglycidylether, m-vinylbenzylglycidylether, or p-vinylbenzene Methyl glycidyl ether (p-vinylbenzylglycidylether) and so on.

The ethylenically unsaturated monomer (c-1-4) having an epoxy group can be used singly or as a mixture of plural kinds.

Preferably, the ethylenically unsaturated monomer (c-1-4) with epoxy group is selected from the group consisting of glycidyl methacrylate, 2-methylglycidyl methacrylate, and methacrylic acid. 3,4-epoxycyclohexyl methyl ester, 6,7-epoxyheptyl methacrylate, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-ethylene Benzyl glycidyl ether or any combination of the above compounds.

The initiator used in the above polymerization reaction includes but is not limited to 2,2'-azobis-2-methylbutyronitrile and 2,2'-azobis-(2,4-dimethylvaleronitrile).

In a specific example of the present invention, the ethylenically unsaturated monomer (c-1-1) having a structure represented by formula (C1-i) based on the alkali-soluble resin (C-1) has one or more The total amount of carboxylic acid or carboxylic acid anhydride ethylenic unsaturated monomer (c-1-2) and other copolymerizable ethylenic unsaturated monomer (c-1-3) copolymer monomers is 100 weight Parts, the use amount of the epoxy-containing ethylenic unsaturated monomer (c-1-4) ranges from 1 part by weight to 35 parts by weight; preferably 3 parts by weight to 30 parts by weight; more preferably 5 parts by weight Parts to 25 parts by weight.

In addition, the number average molecular weight of the first alkali-soluble resin (C-1) in terms of polystyrene measured by Gel Permeation Chromatography (GPC) is generally 1,000 to 35,000, preferably 3,000 to 30,000. More preferably, it is 5,000 to 25,000.

In the specific example of the present invention, based on the total usage amount of the alkali-soluble resin (C) being 100 parts by weight, the usage amount of the first alkali-soluble resin (C-1) is 10 parts by weight to 100 parts by weight; preferably It is 15 parts by weight to 90 parts by weight; more preferably, it is 20 parts by weight to 80 parts by weight.

When the first alkali-soluble resin (C-1) having the structure represented by the formula (C1) is not used, a liquid crystal display element with a color filter made of the photosensitive resin composition will have a bubble display The problem of defects.

The alkali-soluble resin (C) according to the present invention may further comprise a second alkali-soluble resin (C-2), the second alkali-soluble resin (C-2) is prepared by polymerization reaction of a mixture, and the mixture It contains an epoxy compound (c-2-1) having at least two epoxy groups, and a compound (c-2-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group. In addition, the above-mentioned mixture may optionally contain a carboxylic anhydride compound (c-2-3) and/or an epoxy group-containing compound (c-2-4).

式(C2-I) 式(C2-I)中，R⁶¹ 、R⁶² 、R⁶³ 與R⁶⁴ 分別為相同或不同，且表示氫原子、鹵素原子、C₁ 至C₅ 的烷基、C₁ 至C₅ 的烷氧基、C₆ 至C₁₂ 的芳基或C₆ 至C₁₂ 的芳烷基。The epoxy compound (c-2-1) having at least two epoxy groups may have a structure represented by the following formula (C2-I) or the following formula (C2-II). Here, the description of "the epoxy compound (c-2-1) may have the following formula (C2-I) or the structure represented by the following formula (C2-II)" also covers the following formula (C2-I) The case where the compound of the structure shown and the compound of the structure shown by the following formula (C2-II) coexist as the epoxy compound (c-2-1). Specifically, the aforementioned epoxy compound (c-2-1) having at least two epoxy groups has, for example, a structure represented by the following formula (C2-I):

Formula (C2-I) In formula (C2-I), R ⁶¹ , R ⁶² , R ⁶³ and R ⁶⁴ are respectively the same or different, and represent a hydrogen atom, a halogen atom, a C ₁ to C ₅ alkyl group, and C ₁ To C ₅ alkoxy, C ₆ to C ₁₂ aryl, or C ₆ to C ₁₂ aralkyl.

The epoxy compound (c-2-1) having at least two epoxy groups of the aforementioned formula (C2-I) may include those obtained by reacting a bisphenol fluorene compound (bisphenol fluorene) with a halogenated propylene oxide (epihalohydrin) Epoxy-containing bisphenol fluorene type compound, but not limited to this.

Specific examples of the above-mentioned bisphenol fluorene type compound include: 9,9-bis(4-hydroxyphenyl)fluorene [9,9-bis(4-hydroxyphenyl)fluorene], 9,9-bis(4-hydroxyphenyl)fluorene -3-methylphenyl)fluorene [9,9-bis(4-hydroxy-3-methylphenyl)fluorene], 9,9-bis(4-hydroxy-3-chlorophenyl)fluorene[9,9-bis (4-hydroxy-3-chlorophenyl)fluorene], 9,9-bis(4-hydroxy-3-bromophenyl)fluorene [9,9-bis(4-hydroxy-3-bromophenyl)fluorene], 9,9 -Bis(4-hydroxy-3-fluorophenyl)fluorene [9,9-bis(4-hydroxy-3-fluorophenyl)fluorene], 9,9-bis(4-hydroxy-3-methoxyphenyl) Fluorene [9,9-bis(4-hydroxy-3-methoxyphenyl)fluorene], 9,9-bis(4-hydroxy-3,5-dimethylphenyl)fluorene [9,9-bis(4-hydroxy -3,5-dimethylphenyl)fluorene], 9,9-bis(4-hydroxy-3,5-dichlorophenyl) fluorene [9,9-bis(4-hydroxy-3,5-dichlorophenyl) fluorene], 9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorene [9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorene] and other compounds.

The aforementioned halogenated propylene oxide (epihalohydrin) may include, but is not limited to, 3-chloro-1,2-epoxypropane (epichlorohydrin) or 3-bromo-1,2-epoxypropane (epibromohydrin) and the like.

The above-mentioned epoxy-containing bisphenol fluorene compounds obtained by reacting bisphenol fluorene compounds with halogenated propylene oxide include, but are not limited to: (1) products manufactured by Nippon Steel Chemical Co., Ltd. : For example, ESF-300, etc.; (2) Products manufactured by Osaka Gas Co., Ltd.: For example, PG-100, EG-210, etc.; (3) Manufacturing by SMS Technology Co., Ltd. Products: such as SMS-F9PhPG, SMS-F9CrG, SMS-F914PG, etc.

式(C2-II) 式(C2-II)中，R⁶⁵ 至R⁷⁸ 分別為相同或不同，且表示氫原子、鹵素原子、C₁ 至C₈ 的烷基或C₆ 至C₁₅ 的芳香基，且t表示0至10之整數。Secondly, the above-mentioned epoxy compound (c-2-1) having at least two epoxy groups may also have a structure represented by the following formula (C2-II):

Formula (C2-II) In formula (C2-II), R ⁶⁵ to R ⁷⁸ are the same or different, respectively, and represent a hydrogen atom, a halogen atom, a C ₁ to C ₈ alkyl group, or a C ₆ to C ₁₅ aromatic group , And t represents an integer from 0 to 10.

式(C2-II-1) 式(C2-II-1)中，R⁶⁵ 至R⁷⁸ 以及t的定義分別與式(C2-II)中的R⁶⁵ 至R⁷⁸ 以及t的定義相同，在此不另贅述。The epoxy compound (c-2-1) of the aforementioned formula (C2-II) having at least two epoxy groups, for example, has the following formula (C2-II-1) in the presence of an alkali metal hydroxide The structure compound reacts with halogenated propylene oxide to obtain:

In the formula (C2-II-1) of formula (C2-II-1), R ⁶⁵ to R, and defined ⁷⁸ t are respectively ⁶⁵ to R ⁷⁸ and the definition of the formula (C2-II) R t is the same, here No further details.

式(C2-II-2) 式(C2-II-2)中，R⁷⁹ 與R⁸⁰ 分別為相同或不同之氫原子、鹵素原子、C₁ 至C₈ 的烷基或C₆ 至C₁₅ 的芳香基；T¹ 及T² 分別為相同或不同之鹵素原子、C₁ 至C₆ 的烷基或C₁ 至C₆ 的烷氧基。較佳地，上述鹵素原子可例如氯或溴，上述烷基可例如甲基、乙基或第三丁基，上述烷氧基可例如甲氧基或乙氧基。Furthermore, the epoxy compound (c-2-1) having at least two epoxy groups of the aforementioned formula (C2-II) is used, for example, in the presence of an acid catalyst and having a structure of the following formula (C2-II-2) After the compound and phenols undergo condensation reaction, a compound with the structure of formula (C2-II-1) is formed. Next, by adding an excess of halogenated propylene oxide for dehydrohalogenation, an epoxy compound (c-2-1) having at least two epoxy groups as shown in formula (C2-II) is obtained .

Formula (C2-II-2) In formula (C2-II-2), R ⁷⁹ and R ⁸⁰ are respectively the same or different hydrogen atom, halogen atom, C ₁ to C ₈ alkyl group or C ₆ to C ₁₅ Aromatic group; T ¹ and T ² are respectively the same or different halogen atom, C ₁ to C ₆ alkyl group or C ₁ to C ₆ alkoxy group. Preferably, the halogen atom may be chlorine or bromine, the alkyl group may be methyl, ethyl or tert-butyl, and the alkoxy group may be methoxy or ethoxy.

Specific examples of the above-mentioned phenols include: phenol, cresol, ethylphenol, n-propylphenol, isobutylphenol, t-butylphenol (t-butylphenol), octylphenol, nonylphenol, xylenol, methylbutylphenol, di-t-butylphenol, vinyl phenol (vinylphenol), propenylphenol, ethinylphenol, cyclopentylphenol, cyclohexylphenol or cyclohexylcresol. The above-mentioned phenols can generally be used alone or in combination of multiple types.

Based on the above-mentioned compound having a structure of formula (C2-II-2), the usage amount is 1 mol, and the usage amount of phenols is 0.5 mol to 20 mol, and 2 mol to 15 mol is preferred.

Specific examples of the above acid catalyst include hydrochloric acid, sulfuric acid, p-toluenesulfonic acid (p-toluenesulfonic acid), oxalic acid, boron trifluoride, and aluminum chloride anhydrous. ), zinc chloride, etc., among which p-toluenesulfonic acid, sulfuric acid or hydrochloric acid is preferred. The above-mentioned acid catalysts can be used alone or in combination.

In addition, although the usage amount of the above acid catalyst is not particularly limited, the usage amount based on the compound having the structure of the formula (C2-II-2) is 100 weight percent (wt%), and the usage amount of the acid catalyst is better It is 0.1 wt% to 30 wt%.

The above condensation reaction can be carried out without a solvent or in the presence of a solvent. Next, specific examples of the above-mentioned solvent include toluene, xylene, methyl isobutyl ketone, and the like. The above-mentioned solvents can be used singly or in combination of multiple types.

Based on the total amount of compounds with the structure of formula (C2-II-2) and phenols used is 100 wt%, the use amount of the above solvents is 50 wt% to 300 wt%, of which 100 wt% to 250 wt% is preferred . In addition, the operation temperature of the condensation reaction is 40°C to 180°C, and the operation time of the condensation reaction is 1 hour to 8 hours.

After the above condensation reaction is completed, neutralization treatment or water washing treatment can be carried out. The above neutralization treatment is to adjust the pH of the solution after the reaction to pH 3 to pH 7, and pH 5 to pH 7 is preferred. The above-mentioned water washing treatment can be performed using a neutralizing agent, which is an alkaline substance, and specific examples thereof include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide; hydrogen Alkaline earth metal hydroxides such as calcium hydroxide and magnesium hydroxide; diethylene triamine, triethylenetetramine, aniline, phenylenediamine Organic amines such as phenylene diamine; and ammonia, sodium dihydrogen phosphate, etc. The above-mentioned water washing treatment can be performed by a conventional method, for example, an aqueous solution containing a neutralizing agent is added to the solution after the reaction, and the extraction can be repeated. After neutralization treatment or water washing treatment, heat treatment under reduced pressure, unreacted phenols and solvents are distilled off, and concentrated to obtain a compound having a structure of formula (C2-II-1).

As specific examples of the above-mentioned halogenated propylene oxide, 3-chloro-1,2-epoxypropane (3-chloro-1,2-epoxypropane), 3-bromo-1,2-epoxypropane (3 -bromo-1,2-epoxypropane) or any combination of the above. Before the dehydrohalogenation reaction described above, alkali metal hydroxides such as sodium hydroxide and potassium hydroxide may be added in advance or during the reaction. The operating temperature of the above dehydrohalogenation reaction is 20˚C to 120˚C, and the operating time ranges from 1 hour to 10 hours.

In the specific example of the present invention, the alkali metal hydroxide added in the above-mentioned dehydrohalogenation reaction can also use its aqueous solution. In this specific example, while the aqueous alkali metal hydroxide solution is continuously added to the dehydrohalogenation reaction system, water and halogenated propylene oxide can be continuously distilled under reduced pressure or normal pressure, thereby separating and removing water At the same time, the halogenated propylene oxide can be continuously refluxed into the reaction system.

Before the dehydrohalogenation reaction described above, tetramethyl ammonium chloride, tetramethyl ammonium bromide, trimethyl benzyl ammonium chloride, etc. may also be added. Grade ammonium salt is used as a catalyst, and react at 50˚C to 150˚C for 1 hour to 5 hours, then add alkali metal hydroxide or its aqueous solution, and make it at a temperature of 20˚C to 120˚C. The reaction is carried out for 1 hour to 10 hours to proceed the dehydrohalogenation reaction.

Based on the total equivalent of hydroxyl groups in the compound having the structure of the formula (C2-II-1) being 1 equivalent, the amount of the halogenated propylene oxide used may be 1 to 20 equivalents, with 2 to 10 equivalents being preferred. Based on the total equivalent of hydroxyl groups in the compound having the structure of the formula (C2-II-1) being 1 equivalent, the amount of alkali metal hydroxide added in the dehydrohalogenation reaction can be 0.8 to 15 equivalents, of which 0.9 The equivalent to 11 equivalents is preferable.

In addition, in order to make the dehydrohalogenation reaction proceed smoothly, in addition to alcohols such as methanol and ethanol, aprotic such as dimethyl sulfone and dimethyl sulfoxide can also be added. The polar solvent and so on to carry out the reaction. In the case of using alcohols, based on the total amount of the above-mentioned halogenated propylene oxide being 100 wt%, the usage amount of alcohols may be 2 wt% to 20 wt%, preferably 4 wt% to 15 wt%. In the example of using an aprotic polar solvent, based on the total amount of halogenated propylene oxide being 100 wt%, the usage amount of the aprotic polar solvent may be 5 wt% to 100 wt%, of which 10 wt% It is preferably up to 90 wt%.

After the dehydrohalogenation reaction is completed, water washing treatment can be selectively performed. After that, the halogenated propylene oxide, alcohols, aprotic polar solvents, and the like are removed by heating and reducing pressure. The above heating and decompression is performed, for example, in an environment with a temperature of 110°C to 250°C and a pressure of 1.3 kPa (10 mmHg) or less.

In order to prevent the formed epoxy resin from containing water-decomposable halogens, the solution after the dehydrohalogenation reaction can be added to toluene, methyl isobutyl ketone and other solvents, and sodium hydroxide, potassium hydroxide and other alkalis can be added. The metal hydroxide aqueous solution undergoes dehydrohalogenation reaction again. In the dehydrohalogenation reaction, based on the total equivalent of hydroxyl groups in the compound having the formula (C2-II-1) structure described above, the amount of alkali metal hydroxide used is 0.01 mol to 0.3 mol, wherein It is preferably 0.05 mol to 0.2 mol. In addition, the operating temperature range of the above dehydrohalogenation reaction is 50˚C to 120˚C, and the operating time range is 0.5 hour to 2 hours.

After the dehydrohalogenation reaction is completed, the salts are removed by steps such as filtration and water washing. In addition, solvents such as toluene and methyl isobutyl ketone can also be distilled off by heating and decompressing, and an epoxy compound having at least two epoxy groups as shown in formula (C2-II) can be obtained. (c-2-1). The epoxy compound (c-2-1) having at least two epoxy groups of the above formula (C2-II) can include, but is not limited to, such as the trade name NC-3000, NC-3000H, NC-3000S and NC-3000P Such as products manufactured by Nippon Kayaku Co. Ltd.

The aforementioned compound (c-2-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group is, for example, selected from the group consisting of the following (1) to (3): (1) acrylic acid, methacrylate Acrylic acid, 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxyethylbutanedioic acid Methacryloxybutyl adipic acid, 2-methacryloxyethyl hexahydrophthalic acid, 2-methacryloxyethyl maleic acid, 2-methacryloxypropyl horse Acetic acid, 2-methacryloxybutyl maleic acid, 2-methacryloxypropyl succinic acid, 2-methacryloxypropyl adipic acid, 2-methacryloxypropyl Tetrahydrophthalic acid, 2-methacryloxypropyl phthalic acid, 2-methacryloxybutyl phthalic acid, or 2-methacryloxybutylhydrophthalic acid Formic acid; (2) A compound obtained by reacting a hydroxyl-containing (meth)acrylate with a dicarboxylic acid compound, wherein the dicarboxylic acid compound includes but is not limited to adipic acid, succinic acid, maleic acid, ortho Phthalic acid; (3) a half-ester compound obtained by reacting a hydroxyl-containing (meth)acrylate with a carboxylic anhydride compound, wherein the hydroxyl-containing (meth)acrylate includes but is not limited to 2-hydroxyethyl acrylate [(2-hydroxyethyl) acrylate], 2-hydroxyethyl methacrylate [(2-hydroxyethyl) methacrylate], 2-hydroxypropyl acrylate [(2-hydroxypropyl) acrylate], 2-hydroxypropyl methyl Acrylate [(2-hydroxypropyl) methacrylate], 4-hydroxybutyl acrylate [(4-hydroxybutyl) acrylate], 4-hydroxybutyl methacrylate [(4-hydroxybutyl) methacrylate], or pentaerythritol trimethacrylate Wait. In addition, the carboxylic anhydride compound described here may be the same as the carboxylic anhydride compound (c-2-3) contained in the mixture of the second alkali-soluble resin (C-2) described below, so it will not be repeated here.

The mixture of the above-mentioned second alkali-soluble resin (C-2) may further optionally include a carboxylic anhydride compound (c-2-3) and/or an epoxy group-containing compound (c-2-4). The aforementioned carboxylic anhydride compound (c-2-3) can be selected from the group consisting of (1) to (2): (1) butanedioic anhydride, maleic anhydride, and Itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride , Methyl hexahydrophthalic anhydride, methyl endo-methylene tetrahydro phthalic anhydride, chlorendic anhydride, glutaric anhydride, or trimellit Dicarboxylic acid anhydride compounds such as 1,3-dioxoisobenzofuran-5-carboxylic anhydride; and (2) benzophenone tetracarboxylic dianhydride (BTDA), bispyromellitic dianhydride or diphenyl Tetracarboxylic acid anhydride compounds such as ether tetracarboxylic dianhydride.

The epoxy group-containing compound (c-2-4) is, for example, selected from glycidyl methacrylate, 3,4-epoxycyclohexyl methacrylate, unsaturated group-containing glycidyl ether compounds, A group consisting of epoxy-containing unsaturated compounds or any combination of the above. The aforementioned unsaturated group-containing glycidyl ether compounds include but are not limited to trade names Denacol EX-111, EX-121 Denacol, Denacol EX-141, Denacol EX-145, Denacol EX-146, Denacol EX-171, Denacol EX-192 And other compounds (manufactured by Nagase Kasei).

The aforementioned second alkali-soluble resin (C-2) can be composed of an epoxy compound (c-2-1) having at least two epoxy groups of formula (C2-I) and at least one carboxylic acid group and at least one ethylenic compound. The saturated group compound (c-2-2) undergoes a polymerization reaction to form a reaction product containing a hydroxyl group, and then, a carboxylic anhydride compound (c-2-3) is added and reacted. Based on the total equivalent of hydroxyl groups of the above-mentioned hydroxyl-containing reaction product, the equivalent of the acid anhydride group contained in the carboxylic anhydride compound (c-2-3) is preferably 0.4 to 1 equivalent, more preferably 0.75 to 1 equivalent. When multiple carboxylic anhydride compounds (c-2-3) are used, they can be added sequentially or simultaneously during the reaction. When a dicarboxylic acid anhydride compound and a tetracarboxylic acid anhydride compound are used as the carboxylic anhydride compound (c-2-3), the molar ratio of the dicarboxylic acid anhydride compound and the tetracarboxylic acid anhydride compound is preferably 1/99 to 90/ 10, more preferably 5/95 to 80/20. In addition, the operating temperature range of the above reaction is, for example, in the range of 50°C to 130°C.

The aforementioned second alkali-soluble resin (C-2) can be composed of an epoxy compound (c-2-1) having at least two epoxy groups of formula (C2-II) and at least one carboxylic acid group and at least one ethylenic compound. The saturated group compound (c-2-2) reacts to form a reaction product containing a hydroxyl group, and then, by adding a carboxylic anhydride compound (c-2-3) and/or an epoxy group-containing compound (c-2 -4) Prepared by polymerization reaction. The total equivalent of epoxy groups on the epoxy compound (c-2-1) having at least two epoxy groups based on the formula (C2-II) is 1 equivalent, and the above-mentioned having at least one carboxylic acid group and at least one ethylenic compound The acid value equivalent of the saturated group compound (c-2-2) is preferably 0.8 to 1.5 equivalents, more preferably 0.9 to 1.1 equivalents. The total amount of hydroxyl groups based on the above-mentioned hydroxyl-containing reaction product is 100 mol% (mol%), and the amount of carboxylic anhydride compound (c-2-3) used is preferably 10 mol% to 100 mol%, more preferably It is 20 mol% to 100 mol%, particularly preferably 30 mol% to 100 mol%.

When preparing the above-mentioned second alkali-soluble resin (C-2), in order to accelerate the reaction, a basic compound is usually added as a reaction catalyst to the reaction solution. The above reaction catalysts can be used alone or in combination, and the above reaction catalysts include but are not limited to: triphenyl phosphine, triphenyl stibine, triethylamine, triethanolamine , Tetramethylammonium chloride, benzyltriethylammonium chloride, etc. Based on the above-mentioned epoxy compound (c-2-1) having at least two epoxy groups and the compound (c-2-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group, the total amount of use is 100 Parts by weight, the usage amount of the reaction catalyst is preferably 0.01 parts by weight to 10 parts by weight, more preferably 0.3 parts by weight to 5 parts by weight.

In addition, in order to control the degree of polymerization, a polymerization inhibitor is usually added to the reaction solution. The above-mentioned polymerization inhibitors may include but are not limited to: methoxyphenol, methylhydroquinone, hydroquinone, 2,6-di-tertiary butyl-p-cresol (2,6-di -t-butyl-p-cresol) or phenothiazine (phenothiazine) etc. In general, the above-mentioned polymerization inhibitors can be used alone or in combination of multiple types. Based on the above-mentioned epoxy compound (c-2-1) having at least two epoxy groups and the compound (c-2-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group, the total amount of use is 100 Parts by weight, the amount of the polymerization inhibitor used is preferably 0.01 parts by weight to 10 parts by weight, more preferably 0.1 parts by weight to 5 parts by weight.

When preparing the second alkali-soluble resin (C-2), a polymerization solvent may be used if necessary. Specific examples of the above-mentioned polymerization solvent include alcohol compounds such as ethanol, propanol, isopropanol, butanol, isobutanol, 2-butanol, hexanol or ethylene glycol; methyl ethyl ketone or cyclohexanone And other ketone compounds; aromatic hydrocarbon compounds such as toluene or xylene; cellosolve or butyl cellosolve and other cellosolve compounds; carbitol or butyl carbitol Butyl carbitol and other carbitol compounds; propylene glycol monomethyl ether and other propylene glycol alkyl ether compounds; di(propylene glycol) methyl ether and other polypropylene glycol alkyl ethers [poly(propylene glycol) alkyl ether] compounds; acetates such as ethyl acetate, butyl acetate, ethylene glycol monoethyl ether acetate or propylene glycol methyl ether acetate Compounds; alkyl lactate compounds such as ethyl lactate or butyl lactate; or dialkyl glycol ethers. The above-mentioned polymerization reaction solvents can generally be used alone or in combination of multiple types. In addition, the acid value of the second alkali-soluble resin (C-2) is preferably 50 mgKOH/g to 200 mgKOH/g, more preferably 60 mgKOH/g to 150 mgKOH/g.

In addition, the number average molecular weight of the second alkali-soluble resin (C-2) in terms of polystyrene measured by Gel Permeation Chromatography (GPC) is generally 500 to 10,000, preferably 800 to 8,000. More preferably, it is 1,000 to 6,000.

In a specific example of the present invention, based on the total usage amount of the alkali-soluble resin (C) being 100 parts by weight, the usage amount of the second alkali-soluble resin (C-2) ranges from 0 parts by weight to 90 parts by weight; It is preferably 10 parts by weight to 85 parts by weight; more preferably 20 parts by weight to 80 parts by weight. When the second alkali-soluble resin (C-2) is used, the problem of bubble display defects of liquid crystal display elements with color filters made from the photosensitive resin composition can be further improved.

The ethylenically unsaturated group-containing compound (D) can be selected from compounds having one ethylenically unsaturated group or compounds having two or more (including two) ethylenically unsaturated groups.

The aforementioned compound having an ethylenically unsaturated group may include, but is not limited to, (meth)acrylamide, (meth)acrylamide, (meth)acrylic acid-7-amino-3,7-dimethyl Octyl ester, isobutoxymethyl (meth)acrylamide, isobornyloxyethyl (meth)acrylate, isobornyl (meth)acrylate, 2-ethylhexyl (meth)acrylate , Ethyl diethylene glycol (meth)acrylate, the third octyl (meth)acrylamide, diacetone (meth)acrylamide, dimethylaminoethyl (meth)acrylate, ( Dodecyl meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, dicyclopentenyl (meth)acrylate, N,N-dimethyl(meth)acrylamide, Tetrachlorophenyl (meth)acrylate, 2-tetrachlorophenoxyethyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, tetrabromophenyl (meth)acrylate, (meth) Acrylic acid-2-tetrabromophenoxyethyl, (meth)acrylic acid-2-trichlorophenoxyethyl, (meth)acrylic acid tribromophenyl ester, (meth)acrylic acid-2-tribromophenoxyethyl Ethyl ester, 2-hydroxy-(meth)acrylate ethyl, 2-hydroxy-(meth)propyl acrylate, vinyl caprolactam, N-vinylpyrrolidone, (meth)acrylate phenoxy ethyl Ester, pentachlorophenyl (meth)acrylate, pentabromophenyl (meth)acrylate, polyethylene mono(meth)acrylate, polypropylene mono(meth)acrylate or borneol (meth)acrylate Compounds such as esters. The compound having one ethylenically unsaturated group can be used alone or in combination of plural kinds.

The aforementioned compounds having two or more (including two) ethylenically unsaturated groups may include, but are not limited to, ethylene glycol di(meth)acrylate, dicyclopentenyl di(meth)acrylate, and triethylene glycol di(meth)acrylate. (Meth)acrylate, tetraethylene glycol di(meth)acrylate, tris(2-hydroxyethyl)isocyanate di(meth)acrylate, tris(2-hydroxyethyl)isocyanate (Meth) acrylate, caprolactone modified three (2-hydroxyethyl) isocyanate tri(meth)acrylate, tri(meth)acrylate trimethylol propyl ester, ethylene oxide ( (Referred to as EO) modified three (meth)acrylic acid trimethylol propyl ester, propylene oxide modification (abbreviated as PO) three (meth)acrylic acid trimethylol propyl ester, tripropylene glycol di(meth)acrylic acid Esters, neopentyl glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, polyester di(meth)acrylate ) Acrylate, polyethylene glycol di(meth)acrylate, dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol tetra(meth)acrylate, caprolactone modified Dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta(meth)acrylate modified by caprolactone, ditrimethylol propyl tetra(meth)acrylate, modified with ethylene oxide Bisphenol A di(meth)acrylate, bisphenol A di(meth)acrylate modified with propylene oxide, hydrogenated bisphenol A di(meth)acrylate modified with ethylene oxide, Hydrogenated bisphenol A di(meth)acrylate modified by propylene oxide, bisphenol F di(meth)acrylate modified by ethylene oxide, or novolac polyglycidyl ether (meth)acrylate, etc. The compound. The compound having two or more (including two) ethylenic unsaturated groups can be used alone or in a mixture of multiple types.

Specific examples of the ethylenically unsaturated group-containing compound (D) may include but are not limited to: trimethylol propyl triacrylate, trimethylol propyl triacrylate modified by ethylene oxide, epoxy Propane-modified trimethylol propyl triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, dipentaerythritol tetraacrylate, caprolactone modified dipentaerythritol hexa Acrylate, ditrimethylolpropyl tetraacrylate, glycerol triacrylate modified by propylene oxide, or any combination of the above compounds.

The ethylenically unsaturated group-containing compound (D) may preferably be trimethylol propyl triacrylate, dipentaerythritol tetraacrylate, dipentaerythritol hexaacrylate or any combination of the above compounds.

Based on the usage amount of the alkali-soluble resin (C) being 100 parts by weight, the usage amount of the ethylenically unsaturated group-containing compound (D) is 20 parts by weight to 300 parts by weight, preferably 30 parts by weight to 250 parts by weight , More preferably 40 parts by weight to 200 parts by weight.

式(E1-1)

式(E1-2)

式(E1-3)

式(E1-4)

式(E1-5)The photoinitiator (E) contains a cyclopentadione oxime ester compound (E-1), and the cyclopentadione oxime ester compound (E-1) contains at least one compound of formula (E1-1), formula (E1- 2) Cyclopentadione oxime ester compounds of the group consisting of formula (E1-3), formula (E1-4) and formula (E1-5).

Formula (E1-1)

Formula (E1-2)

Formula (E1-3)

Formula (E1-4)

Formula (E1-5)

、

、

及

，其中J係選自由O、S及NT₁₉ 所組成之群；U₁ 為單鍵、C₁ -C₁₀ 直鏈亞烷基、C₁ -C₁₀ 支鏈亞烷基； 或U₁ 為被一個或多個氧原子或硫原子連在端基的C₂ -C₁₀ 直鏈亞烷基或C₂ -C₁₀ 支鏈亞烷基； 或U₁ 為被一個或多個氧原子或硫原子插入的C₂ -C₁₀ 直鏈亞烷基或C₂ -C₁₀ 支鏈亞烷基； 或U₁ 為無取代基的亞芳香基或有取代基的亞芳香基； Y₂ 為單鍵、O、S、NT₂₀ 、BT₂₀ 、CT₁₅ T₁₆ 、SiT₁₅ T₁₆ 、C=O、或Y₃ -U₂ -Y₃ ； U₂ 為C₁ -C₁₀ 直鏈亞烷基或C₁ -C₁₀ 支鏈亞烷基； 或U₂ 為被一個或多個氧原子或硫原子連在端基的C₂ -C₁₀ 直鏈亞烷基或被一個或多個氧原子或硫原子連在端基的C₂ -C₁₀ 支鏈亞烷基； 或U₂ 被一個或多個氧原子或硫原子插入的C₂ -C₁₀ 直鏈亞烷基或被一個或多個氧原子或硫原子插入的C₂ -C₁₀ 支鏈亞烷基； 或U₂ 為無取代基的亞芳香基或有取代基的亞芳香基； Y₃ 為O、S、NT₂₀ 、BT₂₀ 或O-C(O)； T₁ 為氫原子、C₁ -C₁₈ 烷基、C₁ -C₁₈ 烷氧基； 或T₁ 為任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代及／或被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入的C₂ -C₁₈ 烷基；C₂ -C₁₈ 烯基；任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代及／或被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入的C₂ -C₁₈ 烯基，或上述兩者情況同時存在； 或T₁ 為C₅ -C₇ 環烷基，或任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子、CN取代的C₅ -C₇ 環烷基； 或T₁ 為苯基，或任意被一個或多個C₁ -C₄ 烷基、C₁ -C₄ 烷氧基、苯基、鹵素原子或CN取代的苯基； 或T₁ 為萘基、苯甲醯基、苯氧基羰基，其中苯甲醯基及苯氧基羰基的苯基任意被一個或兩個以上鹵素原子、T₁₇ 、C₅ 或C₆ 環烷基、CN、OH或上述JT₁₇ 所取代； T₁₁ 及T₁₂ 各自分別為氫原子、鹵素原子、C₁ -C₁₂ 烷基、C₅ -C₇ 環烷基，C₅ -C₇ 環烷基取代的C₁ -C₄ 烷基、C₁ -C₁₂ 烷氧基； 或T₁₁ 及T₁₂ 各自分別為苯基，或任意被一個或多個C₁ -C₄ 烷基、羧基、C₁ -C₁₂ 烷基醯基、C₁ -C₁₂ 芳基醯基、雜芳基醯基、上述JT₁₇ 、苯基、鹵素原子、CN取代的苯基； 或T₁₁ 及T₁₂ 各自分別為C₁ -C₄ 烷基苄氧基；被一個或多個C₁ -C₁₂ 烷氧基、C₁ -C₄ 烷基苄氧基、T₁ C(O)O取代的C₁ -C₄ 烷氧基； 或T₁₁ 及T₁₂ 各自分別為T₁ C(O)O、CN、羧基、C₁ -C₁₂ 烷氧基羰基、芳基羰基、雜芳基羰基、上述JT₁₈ ； 或T₁₁ 及T₁₂ 各自分別為被一個或多個C₁ -C₄ 烷基取代的苯氧基；被一個C₁ -C₈ 烷基醯基、C₅ -C₆ 環烷基醯基、芳基醯基、雜芳基醯基取代的苯氧基；被C₅ -C₆ 環烷基取代的C₁ -C₄ 烷基醯基苯氧基；C₁ -C₃ 亞烷基二氧基；C₁ -C₁₂ 烷基硫基；被T₁ C(O)O取代的C₁ -C₄ 烷基硫基；被T₁ C(O)O取代的C₁ -C₄ 烷基苯硫基；被一個C₁ -C₈ 烷基醯基、C₅ -C₆ 環烷基醯基、芳基醯基、雜芳基醯基取代的苯硫基； 或T₁₁ 及T₁₂ 各自分別為被C₅ -C₆ 環烷基取代的C₁ -C₄ 烷基醯基苯硫基； 或T₁₁ 及T₁₂ 各自分別為環氧丙基，其中上述環氧基可任意地與C₁ -C₄ 烷基醛、酮縮合； 或上述T₁₁ 及T₁₂ 相連構成飽和或不飽和環狀結構； T₁₅ 及T₁₆ 各自分別為氫原子、C₁ -C₁₈ 烷基、被羧基取代的C₁ -C₅ 烷基、被C₁ -C₄ 烷氧基醯基取代的C₁ -C₅ 烷基、被T₁ C(O)O取代的C₁ -C₄ 烷基； 或T₁₅ 及T₁₆ 各自分別為任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基、芳醯氧基取代的C₂ -C₁₈ 烷基，或是被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入的C₂ -C₁₈ 烷基，或是上述兩種情況同時存在； 或T₁₅ 及T₁₆ 各自分別為C₅ -C₇ 環烷基，或任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子、CN取代的C₅ -C₇ 環烷基； 或T₁₅ 及T₁₆ 各自分別為苯基，或任意被一個或多個C₁ -C₄ 烷基、C₁ -C₄ 烷氧基、羧基、C₁ -C₁₂ 烷基醯基、C₅ -C₆ 環烷基甲醯基、C₅ -C₆ 環烷基取代的C₂ -C₄ 烷基醯基、芳基醯基、上述JT₁₇ 、苯基、鹵素原子或CN取代的苯基； 或上述T₁₅ 及T₁₆ 與其共同所連的碳原子或矽原子一起構成環狀且成環之原子數為4至7； 或上述T₁₅ 及T₁₆ 分別與相鄰的取代基一起構成環狀且成環之原子數為4至7； T₁₇ 為C₁ -C₄ 烷基； T₁₈ 為氫原子、C₁ -C₁₈ 烷基、被C₁ -C₄ 烷氧基醯基取代的C₁ -C₅ 烷基、被T₁ C(O)O取代的C₁ -C₄ 烷基； 或T₁₈ 為任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代的C₂ -C₁₈ 烷基，或是被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入的C₂ -C₁₈ 烷基，或是上述兩種情況同時存在； 或T₁₈ 為C₅ -C₇ 環烷基，或任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子或CN取代的C₅ -C₇ 環烷基； 或T₁₈ 為苯基，或任意被一個或多個C₁ -C₁₂ 烷基、羧基、C₁ -C₁₂ 烷基醯基、被亞苯基、O、S或NT₁₇ 插入的C₂ -C₁₂ 烷基醯基、C₅ -C₆ 環烷基甲醯基、C₅ -C₆ 環烷基取代的C₂ -C₄ 烷基醯基、芳基醯基、雜芳基醯基、上述JT₁₇ 、苯基、鹵素原子、CN或NO₂ 取代的苯基，其中具體的芳基醯基有苯甲醯基、被一個或多個鹵素原子、C₁ -C₄ 烷基、C₁ -C₄ 烷氧基取代的苯甲醯基； 或T₁₈ 為C₁ -C₄ 烷基醯基、C₁ -C₄ 共軛烯醯基、苯甲醯基、苯氧基羰基，其中上述苯甲醯基及上述苯氧基羰基中的苯基可任意被一個或兩個以上鹵素原子、上述T₁₇ 、C₅ 環烷基、C₆ 環烷基、CN、OH或上述JT₁₇ 取代；或T₁₈ 通過單鍵、碳原子、羰基與Ar₁ 或Ar₂ 中的芳環相連構成新的環； T₁₉ 及T₂₀ 各自分別為氫原子、C₁ -C₁₈ 烷基、被C₁ -C₄ 烷氧基醯基取代的C₁ -C₅ 烷基、被T₁ C(O)O取代的C₁ -C₄ 烷基； 或T₁₉ 及T₂₀ 各自分別為任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代的C₂ -C₁₈ 烷基，被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入的C₂ -C₁₈ 烷基，或是上述兩種情況同時存在； 或T₁₉ 及T₂₀ 各自分別為C₅ -C₇ 環烷基，或任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子或CN取代的C₅ -C₇ 環烷基； 或T₁₉ 及T₂₀ 各自分別為苯基，或任意被一個或多個C₁ -C₄ 烷基、羧基、C₁ -C₁₂ 烷基醯基、C₅ -C₆ 環烷基甲醯基、C₅ -C₆ 環烷基取代的C₂ -C₄ 烷基醯基、芳基醯基、上述JT₁₇ 、苯基、鹵素原子或CN取代的苯基；或T₁₉ 分別透過單鍵、碳原子、羰基與Ar₁ 或Ar₂ 中的芳環相連構成新的環； 其中當Ar₁ 為取代咔唑基團時，Y₁ 不是C、O、S、NT₂₀ 。Series 1: Cyclopentadione oxime ester compounds represented by formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4) and formula (E1-5), in which Ar ₁ is an o-arylene group or an o-heteroarylene group, the above-mentioned o-arylene group or the above-mentioned o-heteroarylene group is _{a ring structure formed by connecting two adjacent atoms with Y 1} and a carbonyl group, and the remaining atoms are substituted The groups are each selected from a hydrogen atom; a halogen atom; a C ₁ -C ₁₂ alkyl group; a C ₅ -C ₇ cycloalkyl group; a _{C 1} -C ₄ alkyl group substituted _{by a C 5} -C ₇ cycloalkyl group; a phenyl group; any By one or more C ₁ -C ₄ alkyl group, carboxyl group, C ₁ -C ₁₂ alkyl acyl group, C ₁ -C ₁₂ aryl acyl group, heteroaryl acyl group, JT ₁₇ , phenyl group, halogen atom or the CN-substituted phenyl; C ₁ -C ₄ alkylbenzyl group; the substituted _{T 1 C (O) O C} 1 -C 4 alkoxy; C ₁ -C ₃ alkylenedioxy; T _{1 C (O) O; C 1} -C 12 alkylthio; C ₁ -C ₄ alkyl group; the substituted _{T 1 C (O) O C} 1 -C 4 alkylthio; the CN; carboxy ；C ₁ -C ₁₂ alkoxymethyl group; aryl acyl group; the group consisting of _{heteroaryl group and JT 18} ; or between two adjacent substituents of the above-mentioned substituents of _{Ar 1 or substituted} The group and Ar ₁ are connected through a single bond, a carbon atom, and a carbonyl group to form a cyclic structure; among JT ₁₇ and JT ₁₈ , J is selected from the group consisting of O, S and NT _{19 ; Y 1} is selected from O , S, NT ₂₀ , BT ₂₀ , CT ₁₅ T ₁₆ , SiT ₁₅ T ₁₆ , S=O and C=O; Ar ₂ is selected from the group consisting of the following structures:

,

,

and

, Where J is selected from the group consisting of _{O, S and NT 19 ; U 1} is a single bond, C ₁ -C ₁₀ linear alkylene, C ₁ -C ₁₀ branched alkylene; or U ₁ is One or more oxygen atoms or sulfur atoms are connected to a C ₂ -C ₁₀ linear alkylene group or a C ₂ -C ₁₀ branched chain alkylene group; or U ₁ is one or more oxygen atoms or sulfur atoms The inserted C ₂ -C ₁₀ linear alkylene group or C ₂ -C ₁₀ branched chain alkylene group; or U ₁ is an unsubstituted arylene group or a substituted arylene group; Y ₂ is a single bond, O, S, NT ₂₀ , BT ₂₀ , CT ₁₅ T ₁₆ , SiT ₁₅ T ₁₆ , C=O, or Y ₃ -U ₂ -Y ₃ ; U ₂ is a C ₁ -C ₁₀ linear alkylene group or C ₁ -C ₁₀ branched alkylene group; or U _{2 is a C 2} -C ₁₀ linear alkylene group connected to the end group by one or more oxygen atoms or sulfur atoms or connected by one or more oxygen atoms or sulfur atoms the end groups C ₂ -C ₁₀ branched alkylene; U _2, or by one or more oxygen atom or a sulfur atom inserted C ₂ -C ₁₀ straight chain alkylene group one or more oxygen or sulfur atom or A C ₂ -C ₁₀ branched alkylene group with _{atom inserted; or U 2} is an unsubstituted arylene group or a substituted arylene group; Y ₃ is O, S, NT ₂₀ , BT ₂₀ or OC(O ); T ₁ is a hydrogen atom, C ₁ -C ₁₈ alkyl, C ₁ -C ₁₈ alkoxy; or T ₁ is any one or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ Cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryl oxy substituted and/or substituted by C ₅ -C ₇ cycloalkylene, phenylene Group, O, S or NT ₁₇ inserted C ₂ -C ₁₈ alkyl group; C ₂ -C ₁₈ alkenyl group; optionally with one or more halogen atoms, C ₁ -C ₄ alkyl group, C ₅ -C ₇ cycloalkane Group, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryl oxy substituted and/or substituted by C ₅ -C ₇ cycloalkylene, phenylene, O , S or NT ₁₇ inserted C ₂ -C ₁₈ alkenyl group, or both of the above conditions exist at the same time; or T ₁ is C ₅ -C ₇ cycloalkyl group, or any one or more C ₁ -C ₄ alkyl groups , A phenyl group, a halogen atom, a C ₅ -C ₇ cycloalkyl group substituted by CN; or T ₁ is a phenyl group, or any one or more C ₁ -C ₄ alkyl groups, C ₁ -C ₄ alkoxy groups, A phenyl group, a halogen atom or a CN substituted phenyl group; or T ₁ is a naphthyl group, a benzyl group, a phenoxycarbonyl group, wherein the benzyl group and the phenyl group of the phenoxycarbonyl group are optionally halogenated by one or more Atom, T ₁₇ , C ₅ or C ₆ cycloalkyl, CN, OH or JT ₁₇ above; T ₁₁ and T ₁₂ each From hydrogen atom, halogen atom, C ₁ -C ₁₂ alkyl, C ₅ -C ₇ cycloalkyl, C ₅ -C ₇ cycloalkyl substituted C ₁ -C ₄ alkyl, C ₁ -C ₁₂ alkane Oxy; or T ₁₁ and T ₁₂ are each a phenyl group, or are optionally substituted by one or more C ₁ -C ₄ alkyl groups, carboxyl groups, C ₁ -C ₁₂ alkyl acyl groups, C ₁ -C ₁₂ aryl groups Group, heteroaryl acyl group, the above-mentioned JT ₁₇ , phenyl group, halogen atom, CN-substituted phenyl group; or T ₁₁ and T ₁₂ are each a C ₁ -C ₄ alkylbenzyloxy group; ₁ -C ₁₂ alkoxy, C ₁ -C ₄ alkylbenzyloxy, T ₁ C(O)O substituted C ₁ -C ₄ alkoxy; or T ₁₁ and T ₁₂ are each T ₁ C( O) O, CN, carboxyl, C ₁ -C ₁₂ alkoxycarbonyl, arylcarbonyl, heteroarylcarbonyl, the above-mentioned JT ₁₈ ; or T ₁₁ and T ₁₂ are each one or more C ₁ -C ₄ Alkyl substituted phenoxy groups; phenoxy groups substituted with one C ₁ -C ₈ alkyl acyl group, C ₅ -C ₆ cycloalkyl acyl group, aryl acyl group, heteroaryl acyl group; C ₅ -C ₁ -C ₄ alkyl phenoxy substituted with C _{6 cycloalkyl; C 1} -C ₃ alkylenedioxy; C ₁ -C ₁₂ alkylthio; with T ₁ C(O) A C ₁ -C ₄ alkylthio group substituted by O; a C ₁ -C _{4 alkylphenylthio group substituted by T 1} C(O)O; a C ₁ -C ₈ alkylthio group, C ₅ -C ₆ cycloalkyl aniline, aryl aniline, heteroaryl aniline substituted phenylthio; or T ₁₁ and T ₁₂ are each _{a C 1} -C ₄ alkyl substituted with a C ₅ -C _{6 cycloalkyl group} A phenylthio group; or T ₁₁ and T ₁₂ are each glycidyl group, wherein the above-mentioned epoxy group can be optionally _{condensed with C 1} -C ₄ alkyl aldehydes or ketones; or the above-mentioned T ₁₁ and T _{12 are} connected to form Saturated or unsaturated cyclic structure; T ₁₅ and T ₁₆ are each a hydrogen atom, a C ₁ -C ₁₈ alkyl group, a C ₁ -C ₅ alkyl group substituted by a carboxyl group, and a C ₁ -C ₄ alkoxy acyl group A substituted C ₁ -C ₅ alkyl group, _{a C 1} -C _{4 alkyl group substituted by T 1} C(O)O; or T ₁₅ and T ₁₆ are each optionally substituted by one or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy, aryloxy substituted C ₂ -C ₁₈ alkyl , Or C ₂ -C _{18 alkyl group inserted by C 5} -C ₇ cycloalkylene, phenylene, O, S or NT ₁₇ , or both of the above conditions exist simultaneously; or T ₁₅ and T ₁₆ are each Each is C ₅ -C ₇ cycloalkyl, or any one or more C ₁ -C ₄ alkyl groups, phenyl groups, halogen atoms, C ₅ -C ₇ cycloalkyl groups substituted by CN; or T ₁₅ and T ₁₆ are each a phenyl group, or are optionally substituted by one or more C ₁ -C ₄ alkyl groups, C ₁ -C ₄ alkoxy group, carboxyl group, C ₁ -C ₁₂ alkyl acyl group, C ₅ -C ₆ cycloalkyl methanyl group, C ₅ -C ₆ cycloalkyl substituted C ₂ -C ₄ alkyl acyl group Group, aryl acyl group, the above-mentioned JT ₁₇ , phenyl group, halogen atom or CN-substituted phenyl group; or the above-mentioned T ₁₅ and T ₁₆ together with the carbon atom or silicon atom to which they are connected to form a ring and the number of atoms forming a ring It is 4 to 7; or the above T ₁₅ and T ₁₆ form a ring together with the adjacent substituents and the number of atoms forming the ring is 4 to 7; T ₁₇ is a C ₁ -C ₄ alkyl group; T ₁₈ is a hydrogen atom , C ₁ -C ₁₈ alkyl, substituted C ₁ -C ₄ alkoxy C ₁ -C ₅ acyl group, substituted _{T 1 C (O) O C} 1 -C 4 alkyl; or T ₁₈ is arbitrarily substituted by one or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy _{C 2} -C ₁₈ alkyl substituted with aryloxy or aryloxy, or C ₂ -C _{18 alkyl inserted by C 5} -C ₇ cycloalkylene, phenylene, O, S or NT ₁₇ , or where there is both simultaneously; or T ₁₈ is a C ₅ -C ₇ cycloalkyl, or optionally substituted with one or more C ₁ -C ₄ alkyl group, a phenyl group, a halogen atom or CN substituted C ₅ -C ₇ Cycloalkyl; or T ₁₈ is phenyl, or optionally inserted _{by one or more C 1} -C ₁₂ alkyl, carboxy, C ₁ -C ₁₂ alkyl acyl, phenylene, O, S or NT ₁₇ C ₂ -C ₁₂ alkyl acyl group, C ₅ -C ₆ cycloalkyl methanyl group, C ₅ -C ₆ cycloalkyl substituted C ₂ -C ₄ alkyl acyl group, aryl acyl group, heteroaryl Aryl group, the aforementioned JT ₁₇ , phenyl group, halogen atom, CN or NO ₂ substituted phenyl group, wherein specific aryl group includes benzyl group, substituted by one or more halogen atoms, C ₁ -C ₄ alkane Group, C ₁ -C ₄ alkoxy substituted benzyl group; or T ₁₈ is C ₁ -C ₄ alkyl group, C ₁ -C ₄ conjugated alkenyl group, benzyl group, phenoxy group A carbonyl group, wherein the phenyl group in the above-mentioned benzyl group and the above-mentioned phenoxycarbonyl group may be optionally substituted by one or more halogen atoms, the above-mentioned T ₁₇ , C ₅ cycloalkyl, C ₆ cycloalkyl, CN, OH or the above JT _{17 is} substituted; or T _{18 is connected to the aromatic ring in Ar 1} or Ar ₂ through a single bond, a carbon atom, and a carbonyl group to form a new ring; T ₁₉ and T ₂₀ are each a hydrogen atom, a C ₁ -C ₁₈ alkyl group, is C ₁ -C ₄ alkoxy substituted with acyl C ₁ -C ₅ alkyl, T ₁ C (O) O Substituted C ₁ -C ₄ alkyl; or T ₁₉ and T ₂₀ are each optionally substituted by one or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, Phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryloxy substituted C ₂ -C ₁₈ alkyl group, substituted by C ₅ -C ₇ cycloalkylene, phenylene, O, The C ₂ -C ₁₈ alkyl group inserted by S or NT ₁₇ or the above two cases exist simultaneously; or T ₁₉ and T ₂₀ are each C ₅ -C ₇ cycloalkyl group, or any one or more C ₁ -C ₄ alkyl, phenyl, halogen atom or CN substituted C ₅ -C ₇ cycloalkyl; or T ₁₉ and T ₂₀ are each a phenyl group, or are optionally substituted by one or more C ₁ -C ₄ alkyl groups , Carboxyl group, C ₁ -C ₁₂ alkyl acyl group, C ₅ -C ₆ cycloalkyl methanyl group, C ₅ -C ₆ cycloalkyl substituted C ₂ -C ₄ alkyl acyl group, aryl acyl group, The above-mentioned JT ₁₇ , phenyl, halogen atom or CN substituted phenyl; or T _{19 is connected to the aromatic ring in Ar 1} or Ar ₂ through a single bond, carbon atom, or carbonyl group to form a new ring; where Ar ₁ is substituted In the case of a carbazole group, Y ₁ is not C, O, S, or NT ₂₀ .

Series 2: Cyclopentadione oxime ester compounds represented by formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4) and formula (E1-5), in which Ar ₁ is an o-arylene group or an o-heteroarylene group, but is not an o-arylene group or an o-heteroarylene group which is a condensed ring formed by two or more of aromatic rings and heterocycles. The heteroarylene group is formed by connecting two adjacent atoms with Y ₁ and the carbonyl group to form a ring structure. The substituents on the remaining atoms are each: a hydrogen atom; a halogen atom; a C ₁ -C ₁₂ alkyl group; a C ₅ -C ₇ cycloalkyl; _{C 1} -C ₄ alkyl substituted _{by C 5} -C ₇ cycloalkyl; or phenyl; or optionally by one or more C ₁ -C ₄ alkyl, carboxyl, C ₁ -C ₁₂ Alkyl acyl or aryl acyl, heteroaryl acyl, JT ₁₇ , phenyl, halogen atom or CN substituted phenyl; or C ₁ -C ₄ alkylbenzyloxy group; by T ₁ C( O) O-substituted C ₁ -C ₄ alkoxy; C ₁ -C ₃ alkylenedioxy; T ₁ C(O)O; C ₁ -C ₁₂ alkylthio; C ₁ -C ₄ alkane Phenylthio; _{C 1} -C _{4 alkylthio substituted by T 1} C(O)O; CN; carboxy; C ₁ -C ₁₂ alkoxymethanyl; Base and JT ₁₈ .

In addition, when the ortho-arylene group or ortho-heteroarylene group is a monocyclic structure, two adjacent substituents can be connected to form a ring structure, but not a condensed ring structure; when the ortho-arylene group or ortho-heteroarylene group When the group is a non-condensed ring structure with more than two rings, two adjacent substituents can be connected to form a cyclic structure.

In addition, other groups in formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4), formula (E1-5) and other structural formulas are defined as the corresponding compounds in series 1. The definition of the group.

、

、

、

、

、

、

、

； T₁₁ 、T₁₂ 、T₁₃ 及T₁₄ 各自為氫原子、鹵素原子、C₁ -C₁₂ 烷基、C₅ -C₇ 環烷基、被C₅ -C₇ 環烷基取代的C₁ -C₄ 烷基、C₁ -C₁₂ 烷氧基； 或T₁₁ 、T₁₂ 、T₁₃ 及T₁₄ 各自分別為被一個或多個C₁ -C₁₂ 烷氧基、C₁ -C₄ 烷基苄氧基、T₁ C(O)O取代的C₁ -C₄ 烷氧基； 或T₁₁ 、T₁₂ 、T₁₃ 及T₁₄ 各自分別為苯基，或任意被一個或多個C₁ -C₄ 烷基、羧基、C₁ -C₁₂ 烷基醯基、C₁ -C₁₂ 芳基醯基、雜芳基醯基、JT₁₇ 、苯基、鹵素原子或CN取代的苯基； 或T₁₁ 、T₁₂ 、T₁₃ 及T₁₄ 各自分別為C₁ -C₄ 烷基苄氧基、T₁ C(O)O、被T₁ C(O)O取代的C₁ -C₄ 烷基硫基、CN、羧基、C₁ -C₁₂ 烷氧基羰基、芳基羰基、雜芳基羰基、JT₁₈ ； 或T₁₁ 、T₁₂ 、T₁₃ 及T₁₄ 各自分別為被一個或多個C₁ -C₄ 烷基取代的苯氧基；被一個C₁ -C₈ 烷基醯基、C₅ -C₆ 環烷基醯基、芳基醯基、雜芳基醯基取代的苯氧基；被C₅ -C₆ 環烷基取代的C₁ -C₄ 烷基醯基苯氧基；C₁ -C₃ 亞烷基二氧基；C_l -C₁₂ 烷基硫基；被T₁ C(O)O取代的C₁ -C₄ 烷基硫基；被T₁ C(O)O取代的C_l -C₄ 烷基苯硫基； 或T₁₁ 、T₁₂ 、T₁₃ 及T₁₄ 各自分別為被一個C₁ -C₈ 烷基醯基、C₅ -C₆ 環烷基醯基、芳基醯基、雜芳基醯基取代的苯硫基；C₅ -C₆ 環烷基取代的C₁ -C₄ 烷基醯基苯硫基； 或T₁₁ 、T₁₂ 、T₁₃ 及T₁₄ 各自分別為環氧丙基，其中上述的環氧基任意地與C₁ -C₄ 烷基醛、酮縮合； 或上述T₁₁ 、T₁₂ 、T₁₃ 及T₁₄ 之中相鄰兩者相連構成飽和或不飽和環狀結構； J為O、S或NT₁₉ ； Y₁ 為O、S、NT₁₅ 、CT₁₅ T₁₆ 或C=O； Ar₂ 為

、

、

或

； Y₂ 為O、S、NT₂₀ 及Y₃ -U₂ -Y₃ ； U₂ 為C₁ -C₁₀ 直鏈亞烷基或C₁ -C₁₀ 支鏈亞烷基； 或U₂ 為被一個或多個氧原子或硫原子連在端基的C₂ -C₁₀ 直鏈亞烷基、被一個或多個氧原子或硫原子連在端基的C₂ -C₁₀ 支鏈亞烷基； 或U₂ 為被一個或多個氧原子或硫原子插入的C₂ -C₁₀ 直鏈亞烷基、被一個或多個氧原子或硫原子插入的C₂ -C₁₀ 支鏈亞烷基； 或U₂ 為無取代基的亞芳香基或有取代基的亞芳香基； Y₃ 為O、S、NT₂₀ 或O-C(O)； T₁ 為C₁ -C₄ 烷基、C₅ -C₇ 環烷基、被C₅ -C₇ 環烷基取代的C₂ -C₆ 烷基、C₂ -C₄ 烯基； 或T₁ 為苯基，或任意被一個或多個C₁ -C₄ 烷基、C₁ -C₄ 烷氧基取代的苯基； 或T₁ 為苯甲醯基； T₁₅ 及T₁₆ 各自分別為氫原子，C₁ -C₁₂ 烷基，被羧基取代的C₁ -C₅ 烷基，被T₁ C(O)O取代的C₁ -C₄ 烷基、C₅ -C₇ 環烷基； 或T₁₅ 及T₁₆ 各自分別為苯基，或任意被一個或多個C₁ -C₄ 烷基、C₁ -C₄ 烷氧基、羧基、C₁ -C₁₂ 烷基醯基、C₅ -C₆ 環烷基甲醯基、C₅ -C₆ 環烷基取代的C₁ -C₄ 烷基醯基，苯甲醯基取代的苯基； 或上述T₁₅ 及T₁₆ 分別與其所連的碳原子或矽原子一起構成環狀且成環之原子數為4至7； 或上述T₁₅ 及T₁₆ 分別與相鄰的取代基一起構成環狀且成環之原子數為4至7； T₁₇ 為C₁ -C₄ 烷基； T₁₈ 為C₁ -C₁₈ 烷基、被C₁ -C₄ 烷氧基醯基取代的C₁ -C₅ 烷基、被T₁ C(O)O取代的C₁ -C₄ 烷基； 或T₁₈ 為任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基或芳醯氧基取代的C₂ -C₁₈ 烷基；被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入的C₂ -C₁₈ 烷基；或是上述兩種情況同時存在； 或T₁₈ 為C₅ -C₇ 環烷基，或任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子或CN取代的C₅ -C₇ 環烷基； 或T₁₈ 為苯基，或任意被一個或多個C₁ -C₁₂ 烷基、羧基、C₁ -C₁₂ 烷基醯基、被亞苯基、O、S或NT₁₇ 插入的C₂ -C₁₂ 烷基醯基、C₅ -C₆ 環烷基甲醯基、C₅ -C₆ 環烷基取代的C₂ -C₄ 烷基醯基、芳基醯基、雜芳基醯基、上述JT₁₇ 、苯基、鹵素原子、CN或NO₂ 取代的苯基；具體的芳基醯基有苯甲醯基、被一個或多個鹵素原子、C₁ -C₄ 烷基、C₁ -C₄ 烷氧基取代的苯甲醯基； 或T₁₈ 為C₁ -C₄ 烷基醯基、C₁ -C₄ 共軛烯醯基、苯甲醯基、苯氧基羰基，其中苯甲醯基及苯氧基羰基的苯基任意被一個或兩個以上鹵素原子、T₁₇ 、C₅ 環烷基、C₆ 環烷基、CN、OH或上述JT₁₇ 取代； T₁₉ 及T₂₀ 各自分別為氫原子、C₁ -C₁₈ 烷基、被C₁ -C₄ 烷氧基醯基取代的C₁ -C₅ 烷基、被T₁ C(O)O取代的C₁ -C₄ 烷基； 或T₁₉ 及T₂₀ 各自分別為任意被一個或多個鹵素原子、C₁ -C₄ 烷基、C₅ -C₇ 環烷基、雜環烷基、苯基、雜芳基、CN、C₁ -C₄ 烷醯氧基、芳醯氧基取代的C₂ -C₁₈ 烷基，被C₅ -C₇ 環亞烷基、亞苯基、O、S或NT₁₇ 插入的C₂ -C₁₈ 烷基；或是上述兩種情況同時存在； 或T₁₉ 及T₂₀ 各自分別為C₅ -C₇ 環烷基；或任意被一個或多個C₁ -C₄ 烷基、苯基、鹵素原子或CN取代的C₅ -C₇ 環烷基； 或T₁₉ 及T₂₀ 各自分別為苯基，或任意被一個或多個C₁ -C₄ 烷基、羧基、C₁ -C₁₂ 烷基醯基、C₅ -C₆ 環烷基甲醯基、C₅ -C₆ 環烷基取代的C₂ -C₄ 烷基醯基、芳基醯基、上述JT₁₇ 、苯基、鹵素原子或CN取代的苯基。Series 3: Cyclopentadione oxime ester compounds represented by formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4) and formula (E1-5), in which Ar ₁ is the following o-arylene or o-heteroarylene:

,

,

,

,

,

,

,

; T ₁₁ , T ₁₂ , T ₁₃ and T ₁₄ are each a hydrogen atom, a halogen atom, a C ₁ -C ₁₂ alkyl group, a C ₅ -C ₇ cycloalkyl group, or C _{1 substituted by a C 5} -C _{7 cycloalkyl group} -C ₄ alkyl, C ₁ -C ₁₂ alkoxy; or T ₁₁ , T ₁₂ , T ₁₃ and T ₁₄ are each one or more C ₁ -C ₁₂ alkoxy, C ₁ -C ₄ alkane Benzyloxy, T ₁ C(O)O substituted C ₁ -C ₄ alkoxy; or T ₁₁ , T ₁₂ , T ₁₃ and T ₁₄ are each a phenyl group, or are optionally substituted by one or more C ₁ -C ₄ alkyl group, carboxyl group, C ₁ -C ₁₂ alkyl acyl group, C ₁ -C ₁₂ aryl acyl group, heteroaryl acyl group, JT ₁₇ , phenyl group, halogen atom or CN substituted phenyl group; or T ₁₁ , T ₁₂ , T ₁₃ and T ₁₄ are each C ₁ -C ₄ alkylbenzyloxy, T ₁ C(O)O, _{and C 1} -C ₄ alkyl _{substituted by T 1} C(O)O Thio, CN, carboxyl, C ₁ -C ₁₂ alkoxycarbonyl, arylcarbonyl, heteroarylcarbonyl, JT ₁₈ ; or T ₁₁ , T ₁₂ , T ₁₃ and T ₁₄ are each one or more C Phenoxy _{substituted with 1 -C 4} alkyl; phenoxy substituted with one C ₁ -C ₈ alkyl acyl group, C ₅ -C ₆ cycloalkyl acyl group, aryl acyl group, heteroaryl acyl group ; C ₁ -C ₄ alkyl phenoxy substituted by C ₅ -C _{6 cycloalkyl; C 1} -C ₃ alkylene dioxy; C ₁ -C ₁₂ alkylthio; by T ₁ C (O) O-substituted C ₁ -C ₄ alkylthio; is T ₁ C (O) O-substituted C _l -C ₄ alkyl group; or T _11, T _12, T ₁₃ and T ₁₄ Each is a _{phenylthio group substituted with one C 1} -C ₈ alkyl acyl group, C ₅ -C ₆ cycloalkyl acyl group, aryl acyl group, heteroaryl acyl group; C ₅ -C ₆ cycloalkyl group A substituted C ₁ -C ₄ alkyl phenylthio group; or T ₁₁ , T ₁₂ , T ₁₃ and T ₁₄ are each an glycidyl group, wherein the above-mentioned epoxy group is optionally combined with a C ₁ -C ₄ alkane Condensation of base aldehydes and ketones; or _{adjacent two of the above-mentioned T 11} , T ₁₂ , T ₁₃ and T ₁₄ are connected to form a saturated or unsaturated cyclic structure; J is O, S or NT ₁₉ ; Y ₁ is O, S , NT ₁₅ , CT ₁₅ T ₁₆ or C=O; Ar ₂ is

,

,

or

; Y ₂ is O, S, NT ₂₀ and Y ₃ -U ₂ -Y ₃ ; U ₂ is C ₁ -C ₁₀ linear alkylene or C ₁ -C ₁₀ branched alkylene; or U ₂ is by C ₂ -C ₁₀ linear alkylene group with one or more oxygen atoms or sulfur atoms attached to the end group, C ₂ -C ₁₀ branched chain alkylene group with one or more oxygen atoms or sulfur atoms attached to the end group ; Or U ₂ is a C ₂ -C ₁₀ linear alkylene group inserted by one or more oxygen atoms or sulfur atoms, or a C ₂ -C ₁₀ branched chain alkylene group inserted by one or more oxygen atoms or sulfur atoms ; Or U ₂ is an unsubstituted arylene group or a substituted arylene group; Y ₃ is O, S, NT ₂₀ or OC(O); T ₁ is a C ₁ -C ₄ alkyl group, C _5- C ₇ cycloalkyl, _{C 2} -C ₆ alkyl substituted _{by C 5} -C ₇ cycloalkyl, C ₂ -C ₄ alkenyl; or T ₁ is phenyl, or optionally one or more C _1- C ₄ alkyl group, C ₁ -C ₄ alkoxy substituted phenyl group; or T ₁ is a benzyl group; T ₁₅ and T ₁₆ are each a hydrogen atom, C ₁ -C ₁₂ alkyl group, substituted by a carboxyl group C ₁ -C ₅ alkyl group, _{C 1} -C ₄ alkyl group _{substituted by T 1} C(O)O _{, C 5} -C ₇ cycloalkyl group; or T ₁₅ and T ₁₆ are each a phenyl group, or optionally One or more C ₁ -C ₄ alkyl groups, C ₁ -C ₄ alkoxy groups, carboxyl groups, C ₁ -C ₁₂ alkyl acyl groups, C ₅ -C ₆ cycloalkylmethanyl groups, C ₅ -C ₆ Cycloalkyl substituted C ₁ -C ₄ alkyl acyl group, benzyl substituted phenyl group; or the above-mentioned T ₁₅ and T ₁₆ together with the carbon atom or silicon atom to which they are connected to form a cyclic and ring-forming atom The number is 4 to 7; or the above T ₁₅ and T ₁₆ form a ring together with the adjacent substituents and the number of atoms forming the ring is 4 to 7; T ₁₇ is a C ₁ -C ₄ alkyl group; T ₁₈ is C ₁ -C ₁₈ alkyl, C ₁ -C ₄ alkoxy substituted with acyl C ₁ -C ₅ alkyl, substituted with _{T 1 C (O) O C} 1 -C 4 alkyl; or T ₁₈ is Arbitrarily by one or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aromatic acyl-substituted C ₂ -C ₁₈ alkyl group; a ₅ -C ₇ cycloalkylene, phenylene, O, S, or insertion of NT ₁₇ C C ₂ -C ₁₈ alkyl; or the two circumstances exist; or T ₁₈ is a C ₅ -C ₇ cycloalkyl, or optionally substituted with one or more C ₁ -C ₄ alkyl group, a phenyl group, a halogen atom or CN substituted C ₅ -C ₇ cycloalkyl; Or T ₁₈ is a phenyl group, or any one or more C ₁ -C ₁₂ alkyl groups, carboxyl groups, C ₁ -C _{12 Alkyl acyl group, C 2} -C ₁₂ alkyl acyl group inserted by phenylene, O, S or NT _{17 , C 5} -C ₆ cycloalkylmethanyl, C ₅ -C ₆ cycloalkyl substituted The C ₂ -C ₄ alkyl acyl group, aryl acyl group, heteroaryl acyl group, the above-mentioned JT ₁₇ , phenyl group, halogen atom, CN or NO ₂ substituted phenyl group; specific aryl acyl group includes benzyl An acyl group, a benzyl group substituted by one or more halogen atoms, a C ₁ -C ₄ alkyl group, or a C ₁ -C ₄ alkoxy group; or T ₁₈ is a C ₁ -C ₄ alkyl acyl group, C ₁ -C ₄ conjugated alkenyl, benzyl, phenoxycarbonyl, wherein the phenyl groups of benzyl and phenoxycarbonyl are optionally substituted by one or more halogen atoms, T ₁₇ , and C ₅ cycloalkyl , C ₆ cycloalkyl, CN, OH or the above JT ₁₇ substitution; T ₁₉ and T ₂₀ are each a hydrogen atom, a C ₁ -C ₁₈ alkyl group, and C ₁ -C ₄ alkoxy substituted with a C _{1 -C 4 alkoxy group.} -C ₅ alkyl group, _{C 1} -C _{4 alkyl group substituted by T 1} C(O)O; or T ₁₉ and T ₂₀ are each optionally substituted by one or more halogen atoms, C ₁ -C ₄ alkyl group, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C _{4 alkoxy, C 2} -C ₁₈ alkyl substituted with aryloxy, substituted by C ₅ -C ₇ cycloalkylene, phenylene, O, S or _{C 2} -C ₁₈ alkyl group inserted by _{NT 17} ; or the above two cases exist simultaneously; or T ₁₉ and T ₂₀ are each C ₅ -C ₇ cycloalkyl; or any _{C 5} -C _{7 cycloalkyl substituted with one or more C 1} -C ₄ alkyl, phenyl, halogen atom or CN; or T ₁₉ and T ₂₀ are each a phenyl group, Or optionally substituted by one or more C ₁ -C ₄ alkyl, carboxyl, C ₁ -C ₁₂ alkyl acyl, C ₅ -C ₆ cycloalkylmethanyl, C ₅ -C ₆ cycloalkyl substituted C _2- C ₄ alkyl acyl group, aryl acyl group, the above-mentioned JT ₁₇ , phenyl group, halogen atom or CN substituted phenyl group.

In addition, other groups in the structural formulas of formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4), formula (E1-5) are defined as the corresponding compounds in series 2 The definition of the group.

； T₁₁ 、T₁₂ 、T₁₃ 及T₁₄ 各自為氫原子； 或T₁₁ 、T₁₂ 、T₁₃ 及T₁₄ 各自為被一個或多個C₁ -C₁₂ 烷氧基、C₁ -C₄ 烷基苄氧基取代的C₁ -C₄ 烷氧基、T₁ C(O)O取代的C₁ -C₄ 烷氧基； 或T₁₁ 、T₁₂ 、T₁₃ 及T₁₄ 各自為被一個或多個C₁ -C₄ 烷基取代的苯氧基；被一個C₁ -C₈ 烷基醯基、C₅ -C₆ 環烷基醯基、芳基醯基、雜芳基醯基取代的苯氧基；C₅ -C₆ 環烷基取代的C₁ -C₄ 烷基醯基苯氧基；C₁ -C₃ 亞烷基二氧基；T₁ C(O)O；C₁ -C₁₂ 烷基硫基；T₁ C(O)O取代的C₁ -C₄ 烷基硫基；C₁ -C₄ 烷基苯硫基；T₁ C(O)O取代的C₁ -C₄ 烷基苯硫基； 或T₁₁ 、T₁₂ 、T₁₃ 及T₁₄ 各自為被一個C₁ -C₈ 烷基醯基、C₅ -C₆ 環烷基醯基、芳基醯基、雜芳基醯基取代的苯硫基，或C₅ -C₆ 環烷基取代的C_1- C₄ 烷基醯基苯硫基； Y₁ 為CH₂ 、CHCH₃ 或C(CH₃ )₂ ； Ar₂ 為

或

； U₁ 為單鍵或1,3-亞苯基； T₁ 為甲基、乙基、苯基、2-甲基苯基、3-甲基苯基、2,4,6-三甲基苯基或2,6-二甲氧基苯基； T₂₀ 為C_1- C₈ 烷基。Series 4: Cyclopentadione oxime ester compounds represented by formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4), formula (E1-5), in which Ar ₁ is

; T ₁₁ , T ₁₂ , T ₁₃ and T ₁₄ are each a hydrogen atom; or T ₁₁ , T ₁₂ , T ₁₃ and T ₁₄ are each one or more C ₁ -C ₁₂ alkoxy groups, C ₁ -C ₄ Alkylbenzyloxy substituted C ₁ -C ₄ alkoxy, T ₁ C(O)O substituted C ₁ -C ₄ alkoxy; or T ₁₁ , T ₁₂ , T ₁₃ and T ₁₄ are each substituted by one Or more C ₁ -C ₄ alkyl substituted phenoxy groups; substituted by one C ₁ -C ₈ alkyl acyl group, C ₅ -C ₆ cycloalkyl acyl group, aryl acyl group, heteroaryl acyl group的phenoxy; C ₅ -C ₆ cycloalkyl substituted C ₁ -C ₄ alkyl phenoxy; C ₁ -C ₃ alkylene dioxy; T ₁ C(O)O; C ₁ -C ₁₂ alkylthio; T ₁ C(O)O substituted C ₁ -C ₄ alkylthio; C ₁ -C ₄ alkylphenylthio; T ₁ C(O)O substituted C _1- C ₄ alkylphenylthio; or T ₁₁ , T ₁₂ , T ₁₃ and T ₁₄ are each a C ₁ -C ₈ alkyl acyl group, a C ₅ -C ₆ cycloalkyl acyl group, an aryl acyl group, Heteroarylthiol substituted phenylthio, or C ₅ -C ₆ cycloalkyl substituted C _1- C ₄ alkylthiol phenylthio; Y ₁ is CH ₂ , CHCH ₃ or C(CH ₃ ) ₂ ; Ar ₂ is

or

; U ₁ is a single bond or 1,3-phenylene; T ₁ is methyl, ethyl, phenyl, 2-methylphenyl, 3-methylphenyl, 2,4,6-trimethyl Phenyl or 2,6-dimethoxyphenyl; T ₂₀ is C _1- C ₈ alkyl.

In addition, the definitions of other groups in the above formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4), formula (E1-5) and other structural formulas are the same as those in series 3. The group definition of the compound.

Series 5: Cyclopentadione oxime ester compounds represented by formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4), and formula (E1-5), in which Among the substituents of Ar ₁ , at least one of the substituents is in the para position of the carbonyl group connected _{to Ar 1 ; in Ar 2} , the O atom or N atom is in the para position of the carbonyl group connected to the benzene ring. In addition, other groups in the above formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4), formula (E1-5) and other structural formulas have the same definitions as those in series 4. The group definition of the compound.

Series 6: Cyclopentadione oxime ester compounds represented by formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4), and formula (E1-5), in which Ar ₁ is an o-arylene group or an o-heteroarylene group, and an o-arylene group or an o-heteroarylene _{group is connected to Y 1} and a carbonyl group with two adjacent atoms to form a ring structure, and the substituents on the remaining atoms are each Hydrogen atom; halogen atom; C ₁ -C ₁₂ alkyl; C ₅ -C ₇ cycloalkyl; C ₅ -C ₇ cycloalkyl substituted C ₁ -C ₄ alkyl; or phenyl; or any one Or more C ₁ -C ₄ alkyl groups, carboxyl groups, C ₁ -C ₁₂ alkyl acyl groups or aryl acyl groups, JT ₁₇ , phenyl groups, halogen atoms, CN-substituted phenyl groups; C ₁ -C ₄ alkyl groups Benzyloxy; T ₁ C(O)O substituted C ₁ -C ₄ alkoxy; C ₁ -C ₃ alkylene dioxy; T ₁ C(O)O; C ₁ -C ₁₂ alkyl sulfide group; C ₁ -C ₄ alkyl group; T ₁ C (O) O-substituted C ₁ -C ₄ alkylthio; the CN; a carboxyl group; C ₁ -C ₁₂ alkoxycarbonyl; arylcarbonyl; Heteroarylcarbonyl; JT ₁₈ ; or between the above two adjacent substituents or between the substituents and Ar ₁ can be connected through a single bond, carbon atom, or carbonyl group to form a cyclic structure; J is O, S or NT ₁₉ ; Y ₁ is CT ₁₅ T ₁₆ . In addition, other groups in the above formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4), formula (E1-5) and other structural formulas have the same definitions as those in series 1. The group definition of the compound.

Series 7: Cyclopentadione oxime ester compound represented by formula (E1-1), in which Ar ₁ is an ortho-arylene group or ortho-heteroarylene group, and an ortho-arylene group or ortho-heteroarylene group is adjacent to Two atoms are connected with Y ₁ and a carbonyl group to form a ring structure, and the substituents on the remaining atoms are hydrogen atoms, C ₁ -C ₁₂ alkyl groups, C ₅ -C ₇ cycloalkyl groups, and C ₅ -C ₇ cycloalkyl groups. The substituted C ₁ -C ₄ alkyl group, JT ₁₈ , or the two adjacent substituents mentioned above or between the substituents and Ar ₁ can be connected by a single bond, carbon atom, or carbonyl group to form a cyclic structure; but Ar ₁ It is not a substituted carbazole group; J is O, S or NT ₁₉ ; Y ₁ is O, S, CT ₁₅ T ₁₆ or C=O; T ₁ is a hydrogen atom, C ₁ -C ₁₈ alkyl or alkoxy, C ₂ -C ₁₈ alkenyl; or T ₁ is optionally substituted by one or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy group, aryl oxy group substituted and/or C ₂ -C ₁₈ alkyl group _{inserted by C 5} -C ₇ cycloalkylene, phenylene, O, S, NT ₁₇ , Or the above two situations exist at the same time; or T ₁ is C ₂ -C ₁₈ alkenyl; arbitrarily by one or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycle Alkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy, aryl oxy substituted and/or substituted by C ₅ -C ₇ cycloalkylene, phenylene, O, S, NT _{17 The} inserted C ₂ -C ₁₈ alkenyl group, or the above two situations exist at the same time; or T ₁ is a C ₅ -C ₇ cycloalkyl group, or any one or more C ₁ -C ₄ alkyl groups, phenyl groups , A halogen atom, a C ₅ -C ₇ cycloalkyl group substituted by CN; or T ₁ is a phenyl group, or any one or more C ₁ -C ₄ alkyl groups, C ₁ -C ₄ alkoxy groups, phenyl groups, Halogen atom, CN substituted phenyl group; or T ₁ is naphthyl or benzyl group, phenoxycarbonyl group, wherein the phenyl group of benzyl group or phenoxycarbonyl group is optionally replaced by one or more halogen atoms, T ₁₇ , C ₅ cycloalkyl, C ₆ cycloalkyl, CN, OH, JT ₁₇ substitution; T ₁₅ and T ₁₆ are hydrogen atoms, C ₁ -C ₁₈ alkyl groups respectively; or T ₁₅ and T ₁₆ are any one Or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy, aryloxy _{C 2} -C ₁₈ alkyl group substituted with C ₅ -C ₇ cycloalkylene, phenylene, O, S, NT ₁₇ inserted C ₂ -C ₁₈ alkyl group; or both of the above ; Or T ₁₅ and T ₁₆ are C ₅ -C ₇ cycloalkyl groups; or T ₁₅ and T ₁₆ are respectively phenyl, or any one or Multiple C ₁ -C ₄ alkyl groups, C ₁ -C ₄ alkoxy groups, phenyl groups, halogen atoms, CN-substituted phenyl groups; or T ₁₅ , T ₁₆ and the carbon atoms to which they are connected together form a ring and form The number of ring atoms is 4 to 7; T ₁₇ is a C ₁ -C ₄ alkyl group; T ₁₈ is a phenyl group, or any one or more C ₁ -C ₁₂ alkyl groups, C ₁ -C ₁₂ alkyl acyl groups _{, C 2} -C ₁₂ alkyl acyl group inserted by phenylene, O, S, NT _{17 , C 5} -C ₆ cycloalkylmethanyl, C ₅ -C ₆ cycloalkyl substituted C ₂ -C ₄ Alkyl acyl, aryl acyl, heteroaryl acyl, the above-mentioned JT ₁₇ or NO ₂ substituted phenyl group; wherein the specific aryl acyl group is an unsubstituted benzyl group, which is substituted by one or more A halogen atom, a C ₁ -C ₈ alkyl group, a C ₁ -C ₈ alkoxy group substituted benzyl group; or the above T ₁₈ is connected to the aromatic ring in _{Ar 1} through a single bond, a carbon atom, or a carbonyl group to form a new ring ; T ₁₉ is a hydrogen atom, C ₁ -C ₁₈ alkyl, C ₁ -C ₄ alkoxy substituted with acyl C ₁ -C ₅ alkyl, substituted with T ₁ C (O) O a C ₁ -C ₄ alkoxy Group; or T ₁₉ is any one or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C _{4 C 2} -C ₁₈ alkyl substituted by alkoxy, aryloxy, or C ₂ -C _{18 inserted by C 5} -C ₇ cycloalkylene, phenylene, O, S, NT ₁₇ alkyl; or T ₁₉ is a C ₅ -C ₇ cycloalkyl, or optionally substituted by one or more C ₁ -C ₄ alkyl group, a phenyl group, a halogen atom, CN C ₅ -C ₇ cycloalkyl; Or T ₁₉ is a phenyl group, or any one or more C ₁ -C ₄ alkyl group, carboxyl group, C ₁ -C ₁₂ alkyl acyl group, C ₅ -C ₆ cycloalkylmethanyl group, C ₅ -C ₆ -cycloalkyl substituted C ₂ -C ₄ alkyl acyl group, aryl acyl group, the above-mentioned JT ₁₇ , phenyl group, halogen atom or CN-substituted phenyl group; or the above-mentioned T _{19 is} respectively through a single bond, a carbon atom, or a carbonyl group Connect _{with the aromatic ring in Ar 1} to form a new ring.

The definitions of other groups in the structural formula of the above formula (E1-1) are the same as those of the corresponding compounds in Series 1.

In the above formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4), formula (E1-5), T ₁ C(O) can also be ( T ₁ ) ₂ P or T ₁ S(O ₂ ) instead of generating the corresponding phosphorous (phosphonate) ester or sulfonate, it also has a photo-induced free radical or photo-induced cation initiation.

式(I-1)、

式(I-2)、

式(I-3)、

式(I-4)、

式(I-5)、

式(I-6)、

式(I-7)、

式(I-8)、

式(I-9)、

式(I-10)、

式(I-11)、

式(I-12)、

式(I-13)、

式(I-14) 、

式(I-15)、

式(I-16)、

式(I-17)、

式(I-18)、

式(I-19)、

式(I-20)、

式(I-21)、

式(I-22)、

式(I-23)、

式(I-24)、

式(I-25)、

式(I-26)、

式(I-27)、

式(I-28)、

式(I-29)、

式(I-30)、

式(I-31)、

式(I-32)、

式(I-33)、

式(I-34)及

式(I-35)。Series 8: Examples of cyclopentadione oxime ester compounds represented by formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4), and formula (E1-5) The following compounds represented by formula (I-1) to formula (I-35) are included:

Formula (I-1),

Formula (I-2),

Formula (I-3),

Formula (I-4),

Formula (I-5),

Formula (I-6),

Formula (I-7),

Formula (I-8),

Formula (I-9),

Formula (I-10),

Formula (I-11),

Formula (I-12),

Formula (I-13),

Formula (I-14) 、

Formula (I-15),

Formula (I-16),

Formula (I-17),

Formula (I-18),

Formula (I-19),

Formula (I-20),

Formula (I-21),

Formula (I-22),

Formula (I-23),

Formula (I-24),

Formula (I-25),

Formula (I-26),

Formula (I-27),

Formula (I-28),

Formula (I-29),

Formula (I-30),

Formula (I-31),

Formula (I-32),

Formula (I-33),

Formula (I-34) and

Formula (I-35).

In addition, the rings represented by formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4), and formula (E1-5) in the series 1-8 The manufacturing method of the pentanedione oxime ester compound includes the steps listed in the following steps.

、

、

、

、

、

。Step 1: Take one of the compounds represented by formula (A) or formula (B-1) and formula (B-2) (wherein Ar ₁ , Y ₁ , and Ar ₂ have the same definition as the existing description) Selective oximation is carried out on the ortho-methylene group of the carbonyl group. The above-mentioned selective oximation method is based on the oximation reaction of alkyl nitrite in acidic alcohol solution to obtain corresponding intermediates (respectively from formula (C), formula (D-1), and formula (D-2)) The compound shown). In addition, when the oxime group has cis-anti-stereochirality, a compound represented by formula (C), formula (D-1), and formula (D-2) or a mixture of each enantiomer with a single chirality is obtained.

,

,

,

,

,

.

、

、

、

)或其等價醯化試劑發生酯化反應，得到與其對應之由式(E1-1)、式(E1-4)、式(E1-5)所示的環戊二酮肟酯化合物；或將上述由式(D-1)以及式(D-2)所式之化合物的中間體之一與下列醯化試劑(

、

)或其等價醯化試劑發生酯化反應，得到與其對應之由式(E1-2)、式(E1-3)所示的環戊二酮肟酯化合物。Step 2: Combine the intermediate of the compound represented by formula (C) with the following acylation reagent (

,

,

,

) Or its equivalent acylating reagent undergoes an esterification reaction to obtain the corresponding cyclopentadione oxime ester compound represented by formula (E1-1), formula (E1-4), and formula (E1-5); or Combine one of the intermediates of the compound of formula (D-1) and formula (D-2) with the following acylation reagent (

,

) Or its equivalent acylating reagent undergoes an esterification reaction to obtain the corresponding cyclopentadione oxime ester compound represented by formula (E1-2) and formula (E1-3).

When the intermediates of the compounds represented by formula (C), formula (D-1), and formula (D-2) have stereochiral properties, monochiral ones can be obtained by formula (E1-1) and formula ( E1-2), formula (E1-3), formula (E1-4), formula (E1-5) represented by the cyclopentadione oxime ester compound or the mixture of their respective isomers, wherein T ₁ and U ₁ The definition is the same as the existing description.

Wherein, in the method for producing the cyclopentadione oxime ester compound represented by the formula (E1-1), the compound represented by the formula (A) may be: wherein Ar ₁ is an o-arylene group Or o-heteroarylene, o-arylene or o-heteroarylene is connected to Y ₁ and carbonyl with two adjacent atoms to form a ring structure, and the substituents on the remaining atoms are each hydrogen atom, C ₁ -C ₁₂ alkyl group, C ₅ -C ₇ cycloalkyl group, C ₅ -C ₇ cycloalkyl group substituted C ₁ -C ₄ alkyl group, JT ₁₈ ; or two adjacent substituents of the above-mentioned _{substituents on Ar 1} Between the groups or between the substituents and Ar ₁ can be connected through a single bond, carbon atom, carbonyl group to form a cyclic structure; but Ar ₁ is not a substituted carbazole group; J is O, S or NT ₁₉ ; Y ₁ is O, S, CT ₁₅ T ₁₆ or C=O; T ₁₅ and T ₁₆ are hydrogen atoms, C ₁ -C ₁₈ alkyl groups, respectively; or T ₁₅ and T ₁₆ are any one or more halogen atoms, C ₁ -C ₄ Alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy, aryloxy substituted C ₂ -C ₁₈ alkyl, Or a C ₂ -C ₁₈ alkyl group inserted by C ₅ -C ₇ cycloalkylene, phenylene, O, S, NT ₁₇ ; or T ₁₅ and T ₁₆ are C ₅ -C ₇ cycloalkyl groups; or T ₁₅ and T ₁₆ are each a phenyl group or a phenyl group optionally substituted by one or more C ₁ -C ₄ alkyl groups, C ₁ -C ₄ alkoxy groups, phenyl groups, halogen atoms, or CN; or T ₁₅ , T ₁₆ To form a cyclic ring together with the carbon atoms to which they are connected together, and the number of atoms forming the ring is 4 to 7; T ₁₇ is a C ₁ -C ₄ alkyl group; T ₁₈ is a phenyl group or optionally substituted by one or more C ₁ -C ₄ Alkyl group, C ₁ -C _{12 alkyl acyl group, C 2} -C ₁₂ alkyl acyl group inserted by phenylene, O, S, and NT _{17 , C 5} -C ₆ cycloalkyl methanyl group, C _5- C ₆ cycloalkyl substituted C ₂ -C ₄ alkyl acyl group, aryl acyl group, heteroaryl acyl group, the above-mentioned JT ₁₇ , NO ₂ substituted phenyl group; wherein the specific aryl acyl group is not A substituted benzyl group, a benzyl group substituted by one or more halogen atoms, a C ₁ -C ₈ alkyl group, a C ₁ -C ₈ alkoxy group; T ₁₉ is a hydrogen atom, and C _1- C ₁₈ alkyl, C ₁ -C ₄ alkoxy substituted with acyl C ₁ -C ₅ alkyl, T ₁ C (O) O-substituted C ₁ -C ₄ alkyl; or T ₁₉ is optionally substituted with one or Multiple halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy, aryloxy Substituted C ₂ -C ₁₈ alkyl, or C ₅ -C ₇ cycloalkylene, phenylene, O, S, NT ₁₇ is inserted into the C ₂ -C ₁₈ alkyl; or T ₁₉ is a C ₅ -C ₇ cycloalkyl, or optionally substituted with one or more C ₁ -C ₄ alkyl group, a phenyl group, a halogen atom, CN unsubstituted C ₅ -C ₇ cycloalkyl;

Or T ₁₉ is a phenyl group, or any one or more C ₁ -C ₄ alkyl group, carboxyl group, C ₁ -C ₁₂ alkyl acyl group, C ₅ -C ₆ cycloalkylmethanyl group, C ₅ -C ₆ -cycloalkyl substituted C ₂ -C ₄ alkyl acyl group, aryl acyl group, the above-mentioned JT ₁₇ , phenyl group, halogen atom, CN-substituted phenyl group.

Based on the usage amount of the alkali-soluble resin (C) being 100 parts by weight, the usage amount of the cyclopentadione oxime ester compound (E-1) is 5 parts by weight to 80 parts by weight, preferably 10 parts by weight to 75 parts by weight Parts, more preferably 15 parts by weight to 70 parts by weight. When the cyclopentadione oxime ester compound (E-1) is not used, a liquid crystal display element having a color filter prepared from the photosensitive resin composition has a problem of bubble display defects.

式(E2) 式(E2)中，R₁ 、R₂ 、R₃ 、R₄ 、R₅ 、R₆ 、R₇ 及R₈ 各自獨立地為氫、C₁ 至C₂₀ 烷基、COR₁₆ 或

；或者，R₁ 及R₂ 、R₂ 及R₃ 、R₃ 及R₄ 、R₅ 及R₆ 、R₆ 及R₇ 或R₇ 及R₈ 各自獨立地共同為

；但條件是R₁ 及R₂ 、R₂ 及R₃ 、R₃ 及R₄ 、R₅ 及R₆ 、R₆ 及R₇ 或R₇ 及R₈ 中的至少一對是

； R₉ 、R₁₀ 、R₁₁ 及R₁₂ 各自獨立地為氫、C₁ 至C₂₀ 烷基，該C₁ 至C₂₀ 烷基是未經取代或經一或多個以下基團取代：鹵素、苯基； 或R₉ 、R₁₀ 、R₁₁ 及R₁₂ 各自獨立地為未經取代的苯基或經一或多個以下基團取代的苯基：C₁ 至C₆ 烷基、鹵素； X表示CO或單鍵； R₁₃ 表示C₁ 至C₂₀ 烷基，其未經取代或經一或多個以下基團取代：鹵素、R₁₇ 、COOR₁₇ 、OR₁₇ ； 或R₁₃ 表示C₂ 至C₂₀ 烷基，其間雜有一或多個O或CO，其中該經間雜的C₂ 至C₂₀ 烷基是未經取代或經一或多個鹵素取代； 或R₁₃ 表示苯基或萘基，其各為未經取代或經一或多個以下基團取代：C₁ 至C₂₀ 烷基、C₁ 至C₄ 鹵代烷基； R₁₄ 表示氫、C₁ 至C₂₀ 烷氧基或C₁ 至C₂₀ 烷基； R₁₅ 是C₆ 至C₂₀ 芳基，其各是未經取代或經一或多個以下基團取代：鹵素、C₁ 至C₄ 鹵代烷基、OR₁₇ 、間雜有一或多個O的C₂ 至C₂₀ 烷基；或其各經C₁ 至C₂₀ 烷基取代，該C₁ 至C₂₀ 烷基是未經取代或經一或多個以下基團取代：鹵素、COOR₁₇ 、苯基、OR₁₇ ； 或R₁₅ 表示氫、C₃ 至C₈ 環烷基；或R₁₅ 是C₁ 至C₂₀ 烷基，其是未經取代或經一或多個以下基團取代：鹵素、C₃ 至C₈ 環烷基； R₁₆ 表示C₆ 至C₂₀ 芳基，其各是未經取代或經一或多個以下基團取代：鹵素、C₁ 至C₄ 鹵代烷基、OR₁₇ ；或其各經一或多個C₁ 至C₂₀ 烷基取代，該C₁ 至C₂₀ 烷基是未經取代或經一或多個以下基團取代：鹵素、OR₁₇ ； R₁₇ 表示氫、C₁ 至C₂₀ 烷基，其是未經取代或經一或多個以下基團取代：鹵素或間雜有一或多個O的C₃ 至C₂₀ 環烷基； 或R₁₇ 表示C₂ 至C₂₀ 烷基，其間雜有一或多個O； 或R₁₇ 表示苯基，其各是未經取代或經一或多個以下基團取代：鹵素、C₁ 至C₁₂ 烷基、C₁ 至C₁₂ 烷氧基； 但條件為在式(E2)中存在至少一個

。 式(E2)所示之光起始劑(E-2)的咔唑部分上包含一或多個成環(annelated)不飽和環。也就是說，R₁ 及R₂ 、R₂ 及R₃ 、R₃ 及R₄ 、R₅ 及R₆ 、R₆ 及R₇ 或R₇ 及R₈ 中至少一對為

。 C₁ 至C₂₀ 烷基是直鏈或支鏈且例如為C₁ 至C₁₈ 、C₁ 至C₁₄ 、C₁ 至C₁₂ 、C₁ 至C₈ 、C₁ 至C₆ 或C₁ 至C₄ 烷基或C₄ 至C₁₂ 或C₄ 至C₈ 烷基。實例是甲基、乙基、丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、戊基、己基、庚基、2,4,4-三甲基戊基、2-乙基己基、辛基、壬基、癸基、十二基、十四基、十五基、十六基、十八基及二十基。C₁ 至C₆ 烷基具有與上文針對C₁ 至C₂₀ 烷基所給出相同的含義且具有最高相應C原子數。 C₁ 至C₄ 鹵代烷基是如下文所定義經鹵素取代的如上文所定義C₁ 至C₄ 烷基。烷基基團是(例如)單-或多鹵化，直至所有氫原子替換為鹵素。其是(例如)C_z H_x Hal_y ，其中x+y=2z+1且Hal是鹵素，較佳為F。具體實例是氯甲基、三氯甲基、三氟甲基或2-溴丙基，尤其為三氟甲基或三氯甲基。 間雜有一或多個O的C₂ 至C₂₀ 烷基經O間雜(例如)1至9次、1至5次、1至3次或1次或2次。兩個O原子由至少一個亞甲基、較佳至少兩個亞甲基(即伸乙基)隔開。該等烷基是直鏈或支鏈。舉例而言，將存在以下結構單元：-CH₂ -CH₂ -O-CH₂ CH₃ 、-[CH₂ CH₂ O]_y -CH₃ (其中y=l至9)、-(CH₂ -CH₂ O)₇ -CH₂ CH₃ 、-CH₂ -CH(CH₃ )-O-CH₂ -CH₂ CH₃ 、-CH₂ -CH(CH₃ )-O-CH₂ -CH₃ 。 C₁ 至C₁₂ 烷氧基是經一個O原子取代的C₁ 至C₁₂ 烷基。C₁ 至C₁₂ 烷基具有與上文針對C₁ 至C₂₀ 烷基所給出相同的含義且具有最高相應C原子數。 C₆ 至C₂₀ 芳基是(例如)苯基、萘基、蒽基、菲基、芘基、屈基、并四苯基、聯伸三苯基等，尤其為苯基或萘基，較佳為苯基。萘基是1-萘基或2-萘基。 經取代的芳基(苯基、萘基、C₆ 至C₂₀ 芳基)是分別經1至7次、1至6次或1至4次、尤其1次、2次或3次取代。顯而易見，所定義芳基不能具有比芳基環處的自由位置為多的取代基。 苯基環上的取代基較佳在苯基環上的位置4中或呈3,4-、3,4,5-、2,6-、2,4-或2,4,6-組態。 間雜1次或多次的經間雜基團間雜(例如)1至19次、1至15次、1至12次、1至9次、1至7次、1至5次、1至4次、1至3次或1次或2次(顯而易見，間雜原子數取決於擬間雜的C原子數)。經1次或多次取代的經取代基團具有(例如)1至7個、1至5個、1至4個、1至3個或1個或2個相同或不同取代基。 經一或多個所定義取代基取代的基團意欲具有一個取代基或多個如所給出相同或不同定義的取代基。鹵素是氟、氯、溴及碘，尤其為氟、氯及溴，較佳為氟及氯。若R₁ 及R₂ 、R₂ 及R₃ 、R₃ 及R₄ 或R₅ 及R₆ 、R₆ 及R₇ 、R₇ 及R₈ 各自獨立地共同為由化學式

所表示的基團、化學式

則形成例如以下式(E2-a)至(E2-i)所示之結構：

(E2-a)、

(E2-b)、

(E2-c)、

(E2-d)、

(E2-e)、

(E2-f)、

(E2-g)、

(E2-h)、

(E2-i)。較佳地，該

形成結構(E2-a)。The photoinitiator (E) may further include the photoinitiator (E-2) represented by formula (E2).

Formula (E2) In formula (E2), R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, C ₁ to C ₂₀ alkyl, COR ₁₆ or

; Or, R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are each independently and jointly

; But the condition is that at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ is

; R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently hydrogen, a C ₁ to C ₂₀ alkyl group, and the C ₁ to C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen , Phenyl; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently an unsubstituted phenyl group or a phenyl group substituted with one or more of the following groups: C ₁ to C ₆ alkyl, halogen; X represents CO or a single bond; R ₁₃ represents C ₁ to C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ ; or R ₁₃ represents C ₂ To C ₂₀ alkyl group, with one or more O or CO interposed therebetween, wherein the interspersed C ₂ to C ₂₀ alkyl group is unsubstituted or substituted with one or more halogens; or R ₁₃ represents phenyl or naphthyl , Each of which is unsubstituted or substituted with one or more of the following groups: C ₁ to C ₂₀ alkyl, C ₁ to C ₄ haloalkyl; R ₁₄ represents hydrogen, C ₁ to C ₂₀ alkoxy or C ₁ To C ₂₀ alkyl; R ₁₅ is C ₆ to C ₂₀ aryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C ₁ to C ₄ haloalkyl, OR ₁₇ , interspersed one or _{A C 2} to C ₂₀ alkyl group of a plurality of O; or each of them is _{substituted with a C 1} to C ₂₀ alkyl group, the C ₁ to C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , phenyl, OR ₁₇ ; or R ₁₅ represents hydrogen, C ₃ to C ₈ cycloalkyl; or R ₁₅ is C ₁ to C ₂₀ alkyl, which is unsubstituted or has one or more of the following groups Substitution: halogen, C ₃ to C ₈ cycloalkyl; R ₁₆ represents C ₆ to C ₂₀ aryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C ₁ to C ₄ haloalkyl , OR ₁₇ ; or each of them is _{substituted with one or more C 1} to C ₂₀ alkyl groups, the C ₁ to C ₂₀ alkyl groups are unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ ; R ₁₇ represents hydrogen, a C ₁ to C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen or a C ₃ to C ₂₀ cycloalkyl group interspersed with one or more O; or R ₁₇ represents C ₂ to C ₂₀ alkyl group, with one or more O interposed therebetween; or R ₁₇ represents a phenyl group, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C ₁ to C ₁₂ alkyl group, C ₁ to C ₁₂ alkoxy; but the condition is that there is at least one in formula (E2)

. The photoinitiator (E-2) represented by the formula (E2) contains one or more annelated unsaturated rings on the carbazole moiety. In other words, at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ is

. The C ₁ to C ₂₀ alkyl group is linear or branched and is, for example, C ₁ to C ₁₈ , C ₁ to C ₁₄ , C ₁ to C ₁₂ , C ₁ to C ₈ , C ₁ to C ₆ or C ₁ to C ₄ alkyl or C ₄ to C ₁₂ or C ₄ to C ₈ alkyl. Examples are methyl, ethyl, propyl, isopropyl, n-butyl, second butyl, isobutyl, tertiary butyl, pentyl, hexyl, heptyl, 2,4,4-trimethyl Pentyl, 2-ethylhexyl, octyl, nonyl, decyl, dodecyl, tetradecyl, pentadecyl, hexadecyl, octadecyl and eicosyl. The C ₁ to C ₆ alkyl group has the _{same meaning as given above for the C 1} to C ₂₀ alkyl group and has the highest corresponding number of C atoms. A C ₁ to C ₄ haloalkyl is substituted by halogen as defined above, a C ₁ to C ₄ alkyl group as defined below. Alkyl groups are, for example, mono- or polyhalogenated until all hydrogen atoms are replaced by halogens. It is, for example, C _z H _x Hal _y , where x+y=2z+1 and Hal is halogen, preferably F. Specific examples are chloromethyl, trichloromethyl, trifluoromethyl or 2-bromopropyl, especially trifluoromethyl or trichloromethyl. _{The C 2} to C ₂₀ alkyl group interspersed with one or more O is interspersed with O, for example, 1 to 9 times, 1 to 5 times, 1 to 3 times, or 1 or 2 times. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (ie, ethylene groups). These alkyl groups are linear or branched. For example, there will be the following structural units: -CH ₂ -CH ₂ -O-CH ₂ CH ₃ , -[CH ₂ CH ₂ O] _y -CH ₃ (where y=1 to 9), -(CH _2- CH ₂ O) ₇ -CH ₂ CH ₃ , -CH ₂ -CH(CH ₃ )-O-CH ₂ -CH ₂ CH ₃ , -CH ₂ -CH(CH ₃ )-O-CH ₂ -CH ₃ . A C ₁ to C ₁₂ alkoxy group with one O atom is substituted with a C ₁ to C ₁₂ alkyl. The C ₁ to C ₁₂ alkyl group has the _{same meaning as given above for the C 1} to C ₂₀ alkyl group and has the highest corresponding number of C atoms. The C ₆ to C ₂₀ aryl group is, for example, phenyl, naphthyl, anthracenyl, phenanthryl, pyrenyl, pyrenyl, naphthyl, triphenylene, etc., especially phenyl or naphthyl, preferably Is phenyl. Naphthyl is 1-naphthyl or 2-naphthyl. The substituted aryl groups (phenyl, naphthyl, C ₆ to C ₂₀ aryl) are substituted 1 to 7 times, 1 to 6 times, or 1 to 4 times, especially 1 time, 2 times or 3 times, respectively. Obviously, the defined aryl group cannot have more substituents than the free positions at the aryl ring. The substituents on the phenyl ring are preferably in position 4 on the phenyl ring or in a 3,4-, 3,4,5-, 2,6-, 2,4- or 2,4,6-configuration . Interspersed 1 or more times interspersed with interspersed groups (for example) 1 to 19 times, 1 to 15 times, 1 to 12 times, 1 to 9 times, 1 to 7 times, 1 to 5 times, 1 to 4 times, 1 to 3 times or 1 time or 2 times (obviously, the number of heteroatoms depends on the number of C atoms to be interleaved). Substituted groups that are substituted one or more times have, for example, 1 to 7, 1 to 5, 1 to 4, 1 to 3, or 1 or 2 identical or different substituents. A group substituted with one or more defined substituents is intended to have one substituent or multiple substituents with the same or different definitions as given. Halogen is fluorine, chlorine, bromine and iodine, especially fluorine, chlorine and bromine, preferably fluorine and chlorine. If R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R _4, or R ₅ and R ₆ , R ₆ and R ₇ , R ₇ and R ₈ are each independently of the chemical formula

Represented group, chemical formula

Then, for example, the structure shown in the following formulas (E2-a) to (E2-i) is formed:

(E2-a),

(E2-b),

(E2-c),

(E2-d),

(E2-e),

(E2-f),

(E2-g),

(E2-h),

(E2-i). Preferably, the

Form structure (E2-a).

At least one phenyl ring of the photoinitiator (E-2) represented by the formula (E2) is fused with the carbazole part to form a "naphthyl" ring.

的實例是如上文所定義的式(E2-a)至(E2-g)。較佳為式(E2-a)、(E2-b)、(E2-c)，尤其式(E2-a)或(E2-c)、或式(E2-a)、(c)或(d)，更佳為(E2-a)所示的化合物。The

Examples of are the formulas (E2-a) to (E2-g) as defined above. Preferably the formula (E2-a), (E2-b), (E2-c), especially the formula (E2-a) or (E2-c), or the formula (E2-a), (c) or (d) ), more preferably the compound represented by (E2-a).

The photoinitiator (E-2) represented by formula (E2), wherein R ₁₅ represents (for example) hydrogen, phenyl, naphthyl, each of which is unsubstituted or substituted with C ₁ to C ₈ alkyl, OR ₁₇ ; Or R ₁₅ represents a C ₁ to C ₂₀ alkyl group; or R ₁₅ represents a C ₂ to C ₂₀ alkyl group, with one or more O interposed therebetween.

R ₁₆ represents a C ₆ to C ₂₀ aryl group (especially phenyl or naphthyl, especially phenyl), each of which is unsubstituted or substituted with one or more of the following groups: halogen, C ₁ to C ₄ haloalkyl, OR ₁₇ ; or each of them is _{substituted with one or more C 1} to C ₂₀ alkyl groups, the C ₁ to C ₂₀ alkyl groups are unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ .

In addition, R ₁₆ represents phenyl or naphthyl, especially phenyl or carbazole, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C ₁ to C ₄ haloalkyl, OR ₁₇ or C ₁ To C ₂₀ alkyl.

In addition, R ₁₆ represents phenyl or naphthyl, especially phenyl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ or C ₁ to C ₂₀ alkyl.

R _{16 is} especially phenyl, which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ or C ₁ to C ₂₀ alkyl.

Preferably, R ₁₆ is phenyl, which is _{substituted with one or more C 1} to C ₂₀ alkyl groups.

R ₁₇ represents hydrogen, a C ₁ to C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen or a C ₃ to C ₂₀ cycloalkyl group interspersed with one or more O; or R ₁₇ represents Phenyl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C ₁ to C ₁₂ alkyl, C ₁ to C ₁₂ alkoxy.

Specific examples of the photoinitiator (E-2) represented by the formula (E2) include the compounds represented by the following formulas (E2-1) to (E2-22): <img wi="370"he="281"file="IMG-2/Draw/02_image178.jpg"img-format="jpg"><imgwi="362"he="294"file="IMG-2/Draw/02_image180.jpg"img-format="jpg"><imgwi="389"he="278"file="IMG-2/Draw/02_image182.jpg"img-format="jpg">< img wi="404"he="269"file="IMG-2/Draw/02_image184.jpg"img-format="jpg"><imgwi="388"he="270"file="IMG-2/Draw/02_image186.jpg"img-format="jpg"><imgwi="376"he="301"file="IMG-2/Draw/02_image188.jpg"img-format="jpg"><imgwi="390"he="232"file="IMG-2/Draw/02_image190.jpg"img-format="jpg"><imgwi="369"he="262"file="IMG-2/Draw/02_image192.jpg"img-format="jpg"><imgwi="384"he="268"file="IMG-2/Draw/02_image194.jpg"img-format="jpg"><img wi ="375"he="261"file="IMG-2/Draw/02_image196.jpg"img-format="jpg"><imgwi="352"he="242"file="IMG-2/Draw/02_image198.jpg"img-format="jpg"><imgwi="364"he="252"file="IMG-2/Draw/02_image200.jpg"img-format="jpg"><img wi= "364"he="254"file="IMG-2/Draw/02_image202.jpg"img-format="jpg"><imgwi="366"he="259"file="IMG-2/Draw/02_image204.jpg"img-format="jpg"><imgwi="384"he="235"file="IMG-2/Draw/02_image206.jpg"img-format="jpg"><img wi ="374"he="243"file="IMG-2/Draw/02_image208.jpg"img-format="jpg"><imgwi="378"he="248"file="IMG-2/Draw/02_image210.jpg"img-format="jpg"><imgwi="383"he="227"file="IMG-2/Draw/02_image212.jpg"img-format="jpg"><img wi= "320"he="253"file="IMG-2/Draw/02_image214.jpg"img-format="jpg"><imgwi="367"he="290"file="IMG-2/Draw/02_image216.jpg"img-format="jpg"><imgwi="341"he="276"file="IMG-2/Draw/02_image218.jpg"img-format="jpg"><imgwi="319"he="269"file="IMG-2/Draw/02_image220.jpg"img-format="jpg">

Preferably, based on the usage amount of the alkali-soluble resin (C) being 100 parts by weight, the usage amount of the photoinitiator (E-2) is 5 parts by weight to 50 parts by weight; preferably 10 parts by weight to 45 parts by weight Parts; more preferably 15 parts by weight to 40 parts by weight. When the photoinitiator (E-2) is used, the problem of bubble display defects of liquid crystal display elements with color filters made from the photosensitive resin composition can be further improved.

式(E3) 式(E3)中，E₃₀ 表示含有碳數為3至20的環烷基之有機基團，E₃₁ 及E₃₂ 各自獨立地表示烷基或芳基，E₃₃ 表示烷基。Preferably, the photoinitiator (E) may further include a photoinitiator (E-3). The photoinitiator has the structure shown in chemical formula E3

Formula (E3) In formula (E3), E ₃₀ represents an organic group containing a cycloalkyl group having a carbon number of 3 to 20, E ₃₁ and E ₃₂ each independently represent an alkyl group or an aryl group, and E ₃₃ represents an alkyl group.

In consideration of sensitivity can be further improved, E ₃₀ represents an organic group having a carbon number cycloalkyl group having 3 to 10 is preferred, E ₃₀ represents a cycloalkyl group having a carbon number of 5 to 8, the organic group is more good.

E ₃₀ represents an organic group containing a cycloalkyl group having a carbon number of 3 to 20, which may be an organic group containing a cycloalkyl group interspersed with a divalent hydrocarbon group. An example of the divalent hydrocarbon group is preferably a divalent hydrocarbon group. The alkyl group is more preferably an alkylene group having a carbon number of 2 to 5, and most preferably an ethylene group.

The E ₃₀ is an organic group containing a cycloalkyl group having a carbon number of 3 to 20, preferably a cycloalkylalkylene group, and more preferably a cyclopentylethyl group.

In the chemical formula E3, in order to further improve the sensitivity, the E ₃₁ is an alkyl group or an aryl group, preferably an alkyl group, more preferably an alkyl group having 1 to 5 carbon atoms, and most preferably a methyl group.

In the chemical formula E3, in order to further enhance the sensitivity, the E ₃₂ is an alkyl group or an aryl group, preferably an alkyl group, more preferably an alkyl group having 1 to 10 carbon atoms, and most preferably an ethyl group.

In the chemical formula E3, in order to further enhance the sensitivity, the E ₃₃ is an alkyl group, preferably an alkyl group having 1 to 5 carbon atoms, and more preferably a methyl group.

In the chemical formula E3, _{the substitution position of E 33} can be ortho position, meta position or para position. In consideration of further improving the sensitivity, the adjacent position is preferred.

In the example of the compound represented by the chemical formula E3, E ₃₀ is a cycloalkyl ethylene group, E ₃₁ is a methyl group, E ₃₂ is an ethyl group, and E ₃₃ is a methyl group. The specific product is, for example, TR-PBG- from Changzhou Power Co., Ltd. 304 and so on.

式(E3-a)

式(E3-b)

式(E3-c)

式(E3-d)

式(E3-e)

式(E3-f)

式(E3-g)

式(E3-h)

式(E3-i)

式(E3-j)Specific examples of the photoinitiator (E-3) include, but are not limited to, photoinitiators having the structures shown in the following chemical formulas E3-a to E3-j.

Formula (E3-a)

Formula (E3-b)

Formula (E3-c)

Formula (E3-d)

Formula (E3-e)

Formula (E3-f)

Formula (E3-g)

Formula (E3-h)

Formula (E3-i)

Formula (E3-j)

Based on the usage amount of the alkali-soluble resin (C) being 100 parts by weight, the usage amount of the photoinitiator (E-3) ranges from 5 parts by weight to 50 parts by weight, preferably from 10 parts by weight to 45 parts by weight, and more It is preferably 15 parts by weight to 40 parts by weight. When the photoinitiator (E-3) is used, the problem of bubble display defects of liquid crystal display elements with color filters made from the photosensitive resin composition can be further improved.

The photoinitiator (E) may also contain other radical-type photoinitiators (E-4).

The other radical photoinitiator (E-4) can be selected from acetophenone, biimidazole, acyl oxime, or a combination of these.

The above-mentioned acetophenone compound is selected from p-dimethylamino-acetophenone (p-dimethylamino-acetophenone), α,α'-dimethoxyazoxy-acetophenone (α,α'-dimethoxyazoxy-acetophenone) ), 2,2'-dimethyl-2-phenyl-acetophenone (2,2'-dimethyl-2-phenyl-acetophenone), p-methoxy-acetophenone (p-methoxy-acetophenone), 2- Methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone [2-methyl-1-(4-methylthio phenyl)-2- morpholino-1-propanone], 2- Benzyl-2-N,N-di-methylamino-1-(4-morpholinophenyl)-1-butanone [2-benzyl-2-N,N-di-methylamino-1- (4-morpholinophenyl) )-1-butanone].

The above-mentioned diimidazole compound is selected from 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetraphenyl diimidazole [2,2'-bis(o-chlorophenyl) )- 4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(o-fluorophenyl)-4,4,5,5'-tetraphenyl diimidazole[2,2' -bis(o-fluorophenyl)- 4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(o-methylphenyl)-4,4',5,5'-tetraphenyl Biimidazole [2,2'-bis(o-methylphenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(o-methoxyphenyl)-4,4 ',5,5'-tetraphenyl diimidazole [2,2'-bis(o-methoxyphenyl)-4,4', 5,5'-tetraphenyl-biimidazole], 2,2'-bis(o-ethyl Phenyl)-4,4',5,5'-tetraphenyl diimidazole [2,2'-bis(o-ethylphenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2, 2'-bis(p-methoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole [2,2'-bis(p-methoxyphenyl)-4,4', 5,5' -tetraphenyl-biimidazole], 2,2'-bis(2,2',4,4'-tetramethoxyphenyl)-4,4',5,5'-tetraphenyl diimidazole[2,2 '-bis(2,2',4,4'- tetramethoxyphenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(2-chlorophenyl)-4,4' ,5,5'-tetraphenyl diimidazole [2,2'-bis (2-chlorophenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis (2,4- Dichlorophenyl)-4,4',5,5'-tetraphenyl diimidazole [2,2'-bis (2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-biimidazole] .

式(E4-1)

式(E4-2)

式(E4-3)The above-mentioned oxime compound is selected from ethane ketone, 1-[9-ethyl-6-(2-methylbenzyl)-9hydro-carbazole-3-substituent)-,1- (Oxygen-acetyl oxime) [Ethanone,1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]-,1-(O-acetyl oxime), such as manufactured by Ciba Specialty Chemicals The product name is CGI-242, and its structure is shown in the following formula: Chemical formula E4-1], 1-[4-(phenylthio)phenyl]-octane-1,2-dione 2-(O-phenylene Oxime) [1-[4-(phenylthio)phenyl]-octane-1,2-dione2-(O-benzoyloxime), such as a product manufactured by Ciba Specialty Chemicals under the trade name CGI-124, and its structure is as follows: 2], Ethanone, 1-[9-ethyl-6-(2-chloro-4-benzyl-thio-benzyl)-9hydro-carbazole-3-substituent] -,1-(Oxygen-acetoxime)［Ethanone,1-[9-ethyl-6-(2-chloro-4-benzyl-thio-benzoyl)-9H-carbazole-3-yl]-,1-( O-acetyl oxime), for example, manufactured by Solectron Ka, its structure is shown in the following formula (E4-3)]:

Formula (E4-1)

Formula (E4-2)

Formula (E4-3)

Preferably, the other free radical type photoinitiator (E-4) is 2-methyl-1-(4-methylthiophenyl)-2-morpholino-1-acetone, 2-benzyl 2-nitrogen, nitrogen-dimethylamine-1-(4-morpholinophenyl)-1-butanone, 2,2'-bis(o-chlorophenyl)-4,4',5, 5'-Tetraphenyl diimidazole, ethane ketone, 1-[9-ethyl-6-(2-methylbenzyl)-9hydro-carbazole-3-substituent)-,1-( Oxygen-acetoxime) or a combination of the above.

The other free radical photoinitiator (E-4) can be further added with the following compounds: thioxanthone, 2,4-diethyl-thioxanthanone, thioxanthone Thioxanthone-4-sulfone, benzophenone, 4,4'-bis(dimethylamino) benzophenone [4,4'-bis(dimethylamino) benzophenone], 4 ,4'-bis(diethylamine)benzophenone [4,4'-bis(diethylamino)benzophenone] and other benzophenone compounds; benzil, acetyl ) And other α-diketone (α-diketone) compounds; ketone alcohol (acyloin) compounds such as benzoin; benzoin methylether (benzoin methylether), benzoin ethyl ether (benzoin ethylether), benzoin isopropyl ether and other acyloin ether compounds; 2,4,6-trimethylphenydiphenylphosphine oxide (2,4,6 -trimethyl-benzoyl-diphenyl- phosphineoxide), bis-(2,6-dimethoxyphenyl)-2,4,4-trimethylphenylphosphine oxide [bis-(2,6-dimethoxy-benzoyl )-2,4,4-trimethyl-benzyl-phosphineoxide] and other acylphosphineoxide compounds; anthraquinone, 1,4-naphthoquinone and other quinones ) Compounds; phenacyl chloride, tribromomethyl-phenylsulfone, tris(trichloromethyl)-s-triazine [tris(trichloromethyl)-s-triazine], etc. Halides; and peroxides such as di-tertbutyl peroxide. Among them, benzophenone compounds are preferred, and 4,4'-bis(diethylamine)benzophenone is particularly preferred.

The above-mentioned other radical-type photoinitiators (E-4) can be used singly or as a mixture of plural kinds.

Preferably, based on the usage amount of the alkali-soluble resin (C) being 100 parts by weight, the usage amount of the other radical-type photoinitiator (E-4) is 0 parts by weight to 50 parts by weight; preferably 0 parts by weight Parts by weight to 45 parts by weight; more preferably 0 parts by weight to 40 parts by weight.

Preferably, based on the usage amount of the alkali-soluble resin (C) being 100 parts by weight, the usage amount of the photoinitiator (E) is 15 parts by weight to 230 parts by weight; preferably 30 parts by weight to 210 parts by weight ; More preferably from 45 parts by weight to 190 parts by weight.

The preparation of the photosensitive resin composition of the present invention usually involves first dissolving the components other than the pigment (A) in the solvent (F) to prepare a liquid composition, and then adding the pigment (A) to uniformly mix. The solvent (F) must be selected to dissolve the dye (B), alkali-soluble resin (C), ethylenically unsaturated group-containing compound (D), and photoinitiator (E), and it must not interact with these components. Reacts and has appropriate volatility.

Based on the total usage amount of the alkali-soluble resin (C) being 100 parts by weight, the usage amount of the solvent (F) ranges from 500 parts by weight to 5000 parts by weight; preferably 800 parts by weight to 4500 parts by weight; more preferably 1000 parts by weight Parts by weight to 4000 parts by weight.

In addition, the solvent (F) may be the same as the solvent used in the preparation of the alkali-soluble resin (C), and will not be repeated here. Preferably, the solvent (F) is selected from propylene glycol methyl ether acetate, cyclohexanone or ethyl 3-ethoxypropionate.

Preferably, the photosensitive resin composition may optionally contain an additive (G), such as fillers, polymer compounds other than alkali-soluble resin (C), adhesion promoters, antioxidants, ultraviolet absorbers, anti- Agglutinating agent, etc.

The additives (G) are, for example, but not limited to (1). Fillers such as glass and aluminum; (2). Alkali-soluble resins (B) such as polyvinyl alcohol, polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate, etc. The polymer compound; (3). Vinyl trimethoxysilane, vinyl triethoxy silane, vinyl tris (2-methoxyethoxy) silane, nitrogen-(2-aminoethyl)-3 -Aminopropylmethyldimethoxysilane, nitrogen-(2-aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-ring Oxypropanol propyl trimethoxy silane, 3-glycidyl alcohol propyl methyl dimethoxy silane, 2-(3,4-epoxycyclohexyl) ethyl trimethoxy silane, 3-chloropropyl Adhesion promoters such as methyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, etc.; ( 4) Antioxidants such as 2,2-thiobis(4-methyl-6-tert-butylphenol) and 2,6-di-tert-butylphenol; (5).2-(3-th Tributyl-5-methyl-2-hydroxyphenyl)-5-chlorophenyl azide, alkoxy benzophenone and other ultraviolet absorbers; and (6). Sodium polyacrylate and other anti-agglutination agents. The above additives (G) can be used alone or in combination.

Preferably, based on the usage amount of the alkali-soluble resin (C) being 100 parts by weight, the usage amount of the additive (G) is 0 parts by weight to 10 parts by weight; preferably 0.3 parts by weight to 7 parts by weight; more preferably It is 0.5 parts by weight to 4 parts by weight.

The present invention also provides a method for manufacturing a color filter, the color filter including a pixel layer, and the manufacturing method includes using the aforementioned photosensitive resin composition to form the pixel layer.

The present invention also provides a color filter which is manufactured by the aforementioned manufacturing method.

Preferably, the color filter includes a pixel layer, and the pixel layer is formed using the aforementioned photosensitive resin composition for the color filter.

The method of forming the color filter of the present invention mainly adopts coating methods such as spin coating, casting coating, ink-jet coating or roll coating to mix the aforementioned into a solution state. The photosensitive composition for color filters is coated on a substrate. After coating, first remove most of the solvent by drying under reduced pressure, and then remove the solvent by pre-bake to form a pre-baked coating film. Among them, the conditions of reduced-pressure drying and pre-baking vary according to the types of ingredients and the mixing ratio. Generally, the reduced-pressure drying is performed under a pressure of 0 to 200 mm-Hg for 1 to 60 seconds, and the pre-baking Roasting is carried out at a temperature of 70 to 110°C for 1 minute to 15 minutes. After pre-baking, the pre-baked coating film is exposed under a specified mask, and immersed in a developer solution at a temperature of 23±2°C for 15 seconds to 5 minutes for development, and unnecessary parts are removed to form a pattern. The light used for exposure is preferably ultraviolet rays such as g-line, h-line, and i-line, and the ultraviolet device can be a (ultra) high-pressure mercury lamp or a metal halide lamp.

Specific examples of the aforementioned substrates are: alkali-free glass, soda lime glass, hard glass (Pyles glass), quartz glass, and transparent conductive films attached to these glass used in liquid crystal display devices; or used in solid-state photography devices And other photoelectric conversion device substrates (such as: silicon substrates) and so on. These substrates generally form a black matrix that separates the colored layers of the pixels.

Furthermore, the specific examples of the developer are: sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, potassium bicarbonate, sodium silicate, sodium methyl silicate, ammonia, ethylamine, diethylamine, Dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo-(5,4,0)-7-undecene and other bases The concentration of the alkaline aqueous solution composed of the sexual compound is generally 0.001 to 10% by weight, preferably 0.005 to 5% by weight, and more preferably 0.01 to 1% by weight.

When the developer composed of the aforementioned alkaline aqueous solution is used, it is generally washed with water after development, and then the pattern is air-dried with compressed air or compressed nitrogen.

After air-drying, the substrate with a light-curing coating film layer is heated at a temperature of 100°C to 280°C for 1 to 15 minutes using a heating device such as a hot plate or oven to remove the volatile components in the coating film and make the coating The unreacted ethylenically unsaturated double bonds in the film undergo a thermosetting reaction. Use the photosensitive resin composition of various colors (mainly including red, green and blue) on the predetermined pixels by repeating the same steps three times to obtain the red, green and blue pixel colored layers.

Secondly, on the pixel colored layer, an ITO (Indium Tin Oxide) vapor-deposited film is formed under vacuum at a temperature of 220°C to 250°C. If necessary, after etching and wiring the ITO vapor-deposited film, a liquid crystal alignment film is applied. Using polyimide, and then firing it, it can be used as a color filter for liquid crystal displays.

The present invention further provides a liquid crystal display device including the aforementioned color filter.

The liquid crystal display element of the present invention is mainly composed of a color filter substrate formed by the above-mentioned color filter forming method, and a drive substrate provided with a thin film transistor (TFT, Thin Film Transistor). A gap (cell gap) is inserted between the substrates for opposing arrangement. The surrounding parts of the two substrates are bonded with a sealant, and the surface of the substrate and the gap separated by the sealant are filled with liquid crystal to seal the injection Holes constitute a liquid crystal cell (cell). Then, on the outer surface of the liquid crystal cell, that is, on the other side surfaces of each substrate constituting the liquid crystal cell, a polarizing plate is attached to produce a liquid crystal display element.

As for the liquid crystal used above, that is, the liquid crystal compound or the liquid crystal composition, there is no particular limitation here, but any liquid crystal compound and liquid crystal composition can be used.

Furthermore, the aforementioned liquid crystal alignment film is used to restrict the alignment of liquid crystal molecules, and is not particularly limited here, and any inorganic or organic substance may be used. As for the technique of forming the liquid crystal alignment film, it is well known to anyone with ordinary knowledge in the technical field to which the present invention belongs, and is not the focus of the present invention, so it will not be described in detail.

The following examples are used to illustrate the present invention in detail, but it does not mean that the present invention is limited to the content disclosed by these examples. Synthesis Example: Preparation of the first alkali-soluble resin (C-1) Preparation method of Synthesis Example C-1-1 :

A stirrer, thermometer, condenser, and nitrogen inlet are set on a four-necked conical flask, and nitrogen is introduced. Then, 100 parts by weight of propylene glycol methyl ether acetate (referred to as PGMEA) is added, and the temperature is increased to 100°C. Next, 3 parts by weight of N-(2-phenylethyl)maleimide (abbreviated as NPME), 90 parts by weight of N-phenylmaleimide (abbreviated as N-PMI), 5 Parts by weight of 3,4-epoxycyclohexyl methyl methacrylate (referred to as ECMMA) and 4 parts by weight of 2,2'-azobis-2-methylbutyronitrile (referred to as AMBN) dissolved in 100 parts by weight Parts of propylene glycol methyl ether acetate, and drop the mixed solution into a four-necked conical flask within 2 hours. After reacting at 100°C for 6.5 hours, 7 parts by weight of acrylic acid (abbreviated as AA) was added to a four-necked Erlenmeyer flask filled with nitrogen, and the temperature was increased to 110°C. After 6 hours of reaction, the resin with ethylenic unsaturated group of Synthesis Example C-1-1 can be prepared. The manufacturing method of synthesis examples C-1-2 to C-1-7:

Synthesis Examples C-1-2 to C-1-7 are prepared by the same steps as Synthesis Example C-1-1 to prepare the first alkali-soluble resin (C-1), the difference lies in: changing the types of ingredients and The usage amount is detailed in Table 1. Synthesis Example: Preparation of the second alkali-soluble resin (C-2) Preparation method of Synthesis Example C-2-1 :

100 parts by weight of fluorene epoxy compound (model ESF-300, manufactured by Nippon Steel Chemical; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 parts by weight 2,6-Di-tert-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500 mL four-neck flask, and the feeding rate was controlled at 25 parts by weight/min, and the temperature was maintained at 100 Within the range of °C to 110 °C, after 15 hours of reaction, a light yellow transparent mixed liquid with a solid content concentration of 50 wt% can be obtained.

Next, 100 parts by weight of the above mixed solution was dissolved in 25 parts by weight of ethylene glycol ethyl ether acetate, and 6 parts by weight of tetrahydrophthalic anhydride and 13 parts by weight of benzophenone tetracarboxylic dianhydride were added at the same time , And heated to 110°C to 115°C, after 2 hours of reaction, the second alkali-soluble resin (C-2-1) with an acid value of 98.0 mgKOH/g and a number average molecular weight of 1,623 can be obtained. The manufacturing method of Synthesis Example C-2-2:

100 parts by weight of fluorene epoxy compound (model ESF-300, manufactured by Nippon Steel Chemical; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 parts by weight 2,6-Di-tert-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500 mL four-neck flask, and the feeding rate was controlled at 25 parts by weight/min, and the temperature was maintained at 100 Within the range of °C to 110 °C, after 15 hours of reaction, a light yellow transparent mixed liquid with a solid content concentration of 50 wt% can be obtained.

Next, 100 parts by weight of the above mixed solution was dissolved in 25 parts by weight of ethylene glycol ether acetate, and 13 parts by weight of benzophenone tetracarboxylic dianhydride were added at the same time, and the reaction was carried out at 90°C to 95°C Hours, then, add 6 parts by weight of tetrahydrophthalic anhydride and react at 90°C to 95°C for 4 hours to obtain an acid value of 99.0 mgKOH/g and a number average molecular weight of 2,162 Two-alkali soluble resin (C-2-2). The manufacturing method of Synthesis Example C-2-3:

400 parts by weight of epoxy compound (model NC-3000, manufactured by Nippon Kayaku Co., Ltd.; epoxy equivalent 288), 102 parts by weight of acrylic acid, 0.3 parts by weight of methoxyphenol, 5 parts by weight Triphenylphosphine and 264 parts by weight of propylene glycol methyl ether acetate are placed in a reaction flask, and the temperature is maintained at 95°C. After 9 hours of reaction, an intermediate product with an acid value of 2.2 mgKOH/g can be obtained. Then, add 151 parts by weight of tetrahydrophthalic anhydride and react at 95°C for 4 hours to obtain the second alkali solubility with an acid value of 102 mgKOH/g and a number average molecular weight of 2,589 Resin (C-2-3). Synthesis Example: Preparation Example Synthesis of other alkali-soluble resin (C ') of the method of manufacturing the C'-1-1:

A stirrer, thermometer, condenser, and nitrogen inlet are set on a four-necked conical flask, and nitrogen is introduced. Then, 100 parts by weight of propylene glycol methyl ether acetate (referred to as PGMEA) is added, and the temperature is increased to 100°C. Next, 70 parts by weight of 2-hydroxyethyl methacrylate (referred to as HEMA), 5 parts by weight of 2-methylglycidyl methacrylate (referred to as MGMA), and 4.5 parts by weight of 2,2 '-Azobis-2-methylbutyronitrile (abbreviated as AMBN) was dissolved in 100 parts by weight of propylene glycol methyl ether acetate, and the mixed solution was dropped into a four-necked conical flask within 2 hours. After reacting at 105°C for 6 hours, add 25 parts by weight of 2-methacrylic acid ethoxy succinate (referred to as HOMS) and 5 parts by weight of acrylic acid (referred to as AA) to the four-necked cone filled with nitrogen In the bottle and raise the temperature to 110°C. After 6 hours of reaction, the resin with ethylenic unsaturated group of Synthesis Example C'-1-1 can be prepared. Synthesis examples C'-1-2 to C'-1-3 :

實施例：彩色濾光片用感光性樹脂組成物之製備 實施例 1 ： Synthesis Examples C'-1-2 to C'-1-3 are prepared by the same steps as Synthesis Example C'-1-1 to prepare the other alkali-soluble resin (C'), the difference lies in: changing the types of ingredients And the usage amount, and the details are shown in Table 1. Table 1:

Example: Preparation Example 1 of photosensitive resin composition for color filter :

Using 100 parts by weight of the first alkali-soluble resin (C-1-1) obtained in the aforementioned synthesis example, 30 parts by weight of CI Pigment Red 254 (hereinafter referred to as A-1), and 20 parts by weight of EO modified triacrylate Hydroxymethyl propyl ester (hereinafter referred to as D-1) and 15 parts by weight of the photoinitiator with the structure represented by formula (I-11) (hereinafter referred to as E-1-1), add 500 parts by weight of 3-ethyl Ethyl oxypropionate (hereinafter referred to as F-1) is dissolved and mixed with a shaking stirrer to prepare a photosensitive resin composition for color filters. The photosensitive resin for color filters The composition was evaluated by the following measurement and evaluation methods, and the results obtained are shown in Table 2-1. Examples 2 to 23 and Comparative Examples 1 to 5 :

表2-2：

表3：

表2-1、表2-2及表3中：<img wi="370" he="281" file="IMG-2/Draw/02_image178.jpg" img-format="jpg"><img wi="345" he="275" file="IMG-2/Draw/02_image218.jpg" img-format="jpg"><img wi="382" he="265" file="IMG-2/Draw/02_image194.jpg" img-format="jpg"><img wi="314" he="239" file="IMG-2/Draw/02_image260.jpg" img-format="jpg"><img wi="333" he="240" file="IMG-2/Draw/02_image262.jpg" img-format="jpg"><img wi="302" he="257" file="IMG-2/Draw/02_image264.jpg" img-format="jpg"> 評價方式： 泡狀顯示缺陷： Examples 2 to 23 and Comparative Examples 1 to 5 used the same operation method as the production method of the photosensitive resin composition for a color filter of Example 1, except for Examples 2 to 23 and Comparative Examples 1 to 5. The type and amount of raw materials used in the photosensitive resin composition for color filters were changed. The formula and the following evaluation results are shown in Table 2-1, Table 2-2 and Table 3. table 2-1:

Table 2-2:

table 3:

In Table 2-1, Table 2-2 and Table 3: <img wi="370"he="281"file="IMG-2/Draw/02_image178.jpg"img-format="jpg"><imgwi="345"he="275"file="IMG-2/Draw/02_image218.jpg"img-format="jpg"><imgwi="382"he="265"file="IMG-2/Draw/02_image194.jpg"img-format="jpg">< img wi="314"he="239"file="IMG-2/Draw/02_image260.jpg"img-format="jpg"><imgwi="333"he="240"file="IMG-2/Draw/02_image262.jpg"img-format="jpg"><imgwi="302"he="257"file="IMG-2/Draw/02_image264.jpg"img-format="jpg"> Evaluation method: Bubble display defect:

Place the finished liquid crystal display element in an environment with a high temperature of 100°C and a high humidity of 95RH%, and observe the time t for the appearance of bubble display defects with the naked eye. The evaluation criteria are as follows. ◎: t>500 hours ○: 400 hours<t≦500 hours △: 300 hours<t≦400 hours ╳: t≦300 hours

The above-mentioned embodiments only illustrate the principles and effects of the present invention, but do not limit the present invention. Modifications and changes made by those skilled in the art to the above-mentioned embodiments still do not violate the spirit of the present invention. The scope of rights of the present invention should be listed in the scope of patent application described later.

Claims (14)

A photosensitive resin composition comprising: a pigment (A); an alkali-soluble resin (C); an ethylenically unsaturated group-containing compound (D); a photoinitiator (E); and a solvent (F); wherein, the The alkali-soluble resin (C) includes a first alkali-soluble resin (C-1), and the first alkali-soluble resin (C-1) has a structural unit represented by formula (C1):

In formula (C1): Z ₁ and Z ₂ each independently represent a hydrogen atom or a halogen atom; wherein, Z ₁ and Z ₂ are the same or different; Z ₃ , Z ₄ and Z ₅ each independently represent a hydrogen atom and a halogen atom Or an alkyl group; wherein Z ₃ , Z ₄ and Z ₅ are the same or different; Z ₆ and Z ₇ each independently represent a hydrogen atom or an alkyl group; wherein, Z ₆ and Z ₇ are the same or different; s represents 1 to An integer of 2; and * represents the bonding location; the photoinitiator (E) contains a cyclopentadione oxime ester compound (E-1), and the cyclopentadione oxime ester compound (E-1) contains at least one Cyclopentadione oxime ester compounds selected from the group consisting of formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4) and formula (E1-5):

In formula (E1-1), formula (E1-2), formula (E1-3), formula (E1-4) and formula (E1-5), Ar ₁ is an ortho-arylene group or ortho-heteroarylene group, The ortho-arylene group or the ortho-heteroarylene group is formed by connecting two adjacent atoms with Y ₁ and a carbonyl group to form a ring structure, and the substituents on the remaining atoms are independently selected from hydrogen atoms, halogen atoms, and C ₁ -C ₁₂ alkyl, C ₅ -C ₇ cycloalkyl, C ₁ -C _{4 alkyl substituted by C 5} -C ₇ cycloalkyl, phenyl, optionally with one or more C ₁ -C ₄ alkyl , Carboxyl group, C ₁ -C ₁₂ alkyl acyl group, aryl acyl group, heteroaryl acyl group, JT ₁₇ , phenyl group, halogen atom or CN substituted phenyl group, C ₁ -C ₄ alkylbenzyloxy group, _{C 1} -C ₄ alkoxy substituted by T ₁ C(O)O, C ₁ -C ₃ alkylene dioxy, T ₁ C(O)O, C ₁ -C ₁₂ alkylthio, C ₁ -C ₄ alkyl phenylthio, _{C 1} -C _{4 alkylthio substituted by T 1} C(O)O, CN, carboxyl, C ₁ -C ₁₂ alkoxymethanyl, aryl thiol , The group consisting of heteroaryl acyl and JT ₁₈ ; or between two adjacent substituents of the above-mentioned substituents of _{Ar 1 or between the substituents and Ar 1} through a single bond, carbon atom or carbonyl group to form a ring Like structure; among JT ₁₇ and JT ₁₈ , J is selected from the group consisting of O, S and NT _{19 ; Y 1} is selected from the group consisting of O, S, NT ₂₀ , BT ₂₀ , CT ₁₅ T ₁₆ , SiT ₁₅ T _16. The group consisting of S=O and C=O; Ar ₂ is selected from the group consisting of the following structures:

and

, Where J is selected from the group consisting of _{O, S and NT 19 ; U 1} is selected from the group consisting of: single bond, C ₁ -C ₁₀ linear alkylene, C ₁ -C ₁₀ branched chain _{Alkyl group, C 2} -C ₁₀ straight chain alkylene group or C ₂ -C ₁₀ branched chain alkylene group connected to the end group by one or more oxygen atoms or sulfur atoms, and one or more oxygen atoms or sulfur atoms Inserted C ₂ -C ₁₀ linear alkylene or C ₂ -C ₁₀ branched alkylene, unsubstituted arylene and substituted arylene; Y ₂ is selected from the group consisting of the following : Single bond, O, S, NT ₂₀ , BT ₂₀ , CT ₁₅ T ₁₆ , SiT ₁₅ T ₁₆ , C=O and Y ₃ -U ₂ -Y ₃ ; U ₂ is selected from the group consisting of: C ₁ -C ₁₀ linear alkylene group, C ₁ -C _{10 branched chain alkylene group, C 2} -C ₁₀ linear alkylene group connected to the end group by one or more oxygen atoms or sulfur atoms, by one or more oxygen atom or a sulfur atom in the end groups attached C ₂ -C ₁₀ branched alkylene, substituted by one or more oxygen atoms or sulfur atom inserted straight chain C ₂ -C ₁₀ alkylene group, substituted with one or more _{A C 2} -C ₁₀ branched alkylene group with an oxygen atom or a sulfur atom inserted, an unsubstituted arylene group and a substituted arylene group; Y ₃ is selected from the group consisting of: O, S, NT ₂₀ , BT ₂₀ and OC(O); T ₁ is selected from the group consisting of hydrogen atom, C ₁ -C ₁₈ alkyl, C ₁ -C ₁₈ alkoxy, C ₂ -C ₁₈ alkenyl, arbitrary By one or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryl A C ₂ -C ₁₈ alkenyl group substituted by an oxy group and/or _{inserted by a C 5} -C ₇ cycloalkylene, phenylene, O, S or NT ₁₇ group, optionally with one or more halogen atoms, C _1- C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryl oxy substituted and/or C _5- C ₇ cycloalkylene, phenylene, O, S or NT ₁₇ inserted C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkyl, optionally with one or more C ₁ -C ₄ alkyl, Phenyl, halogen atom or C ₅ -C ₇ cycloalkyl substituted by CN, phenyl, optionally substituted by one or more C ₁ -C ₄ alkyl, C ₁ -C ₄ alkoxy, phenyl, halogen atom or CN-substituted phenyl, naphthyl, benzyl and phenoxycarbonyl; the phenyl group of benzyl and phenoxycarbonyl can be substituted by one or more halogen atoms, T ₁₇ , C ₅ cycloalkyl , C ₆ cycloalkyl, CN, OH or JT ₁₇ ; T ₁₁ and T ₁₂ are each independently selected from the group consisting of: hydrogen atom, halogen atom, C ₁ -C ₁₂ alkyl, C ₅ -C ₇ cycloalkyl, C ₁ -C _{4 alkyl substituted by C 5} -C ₇ cycloalkyl, C ₁ -C ₁₂ alkoxy, C ₁ -C ₄ Alkylbenzyloxy, phenyl, optionally substituted by one or more C ₁ -C ₄ alkyl groups, carboxyl groups, C ₁ -C ₁₂ alkyl acyl groups, C ₁ -C ₁₂ aryl acyl groups, heteroaryl acyl groups , JT ₁₇ , phenyl, halogen atom or CN substituted phenyl, C ₁ -C ₄ alkylbenzyloxy group, with one or more C ₁ -C ₁₂ alkoxy groups, C ₁ -C ₄ alkylbenzyloxy group or a T ₁ C (O) substituted with the O C ₁ -C _{4 alkoxy, T 1 C (O) O} , CN, carboxy, C ₁ -C ₁₂ alkoxycarbonyl, arylcarbonyl, heteroarylcarbonyl group , JT ₁₈ , a phenoxy group substituted by one or more C ₁ -C ₄ alkyl groups, a C ₁ -C ₈ alkyl acyl group, a C ₅ -C ₆ cycloalkyl acyl group, an aryl acyl group or Heteroaryl acyl substituted phenoxy, C ₁ -C _{4 alkyl phenoxy substituted by C 5} -C ₆ cycloalkyl, C ₁ -C ₃ alkylene dioxy, C _1- C ₁₂ alkylthio, the T ₁ C (O) substituted with the O C ₁ -C ₄ alkylthio group, it is substituted with _{T 1 C (O) O C} 1 -C 4 alkyl group, is a C ₁ -C ₈ alkyl acyl group, C ₅ -C ₆ cycloalkyl acyl group, aryl acyl group or heteroaryl acyl group substituted phenylthio group, C ₅ -C ₆ cycloalkyl group substituted C ₁ -C ₄ alkyl phenylthio group, and glycidyl group; wherein the epoxy group can be optionally _{condensed with C 1} -C ₄ alkyl aldehyde or ketone; or T ₁₁ and T _{12 are} connected to form a saturated or unsaturated ring Shape structure; T ₁₅ and T ₁₆ are each independently selected from the group consisting of: hydrogen atom, C ₁ -C ₁₈ alkyl, C ₁ -C ₅ alkyl substituted by carboxyl, C ₁ -C ₄ alkoxy the substituted acyl group C ₁ -C ₅ alkyl, substituted of _{T 1 C (O) O C} 1 -C 4 alkyl, optionally substituted with one or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryl oxy substituted C ₂ -C ₁₈ alkyl group, substituted by C ₅ -C ₇ cycloalkylene, phenylene, O, S or NT ₁₇ C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkyl, optionally with one or more C ₁ -C ₄ alkyl, benzene C ₅ -C ₇ cycloalkyl, phenyl, and optionally substituted by one or more C ₁ -C ₄ alkyl, C ₁ -C ₄ alkoxy, carboxyl, C ₁ -C ₁₂ Alkyl acyl group, C ₅ -C ₆ cycloalkyl methanyl group, C ₂ -C _{4 alkyl acyl group substituted by C 5} -C ₆ cycloalkyl group, benzyl group, JT ₁₇ , phenyl group, Halogen atom or CN substituted phenyl; or T ₁₅ , T ₁₆ and the carbon atom or silicon atom to which they are connected together form a ring and the number of atoms forming the ring is 4 to 7; or T ₁₅ , T ₁₆ are adjacent to each other The substituents of together form a cyclic ring and the number of atoms forming the ring is 4 to 7; T ₁₇ is a C ₁ -C ₄ alkyl group; T ₁₈ is selected from the group consisting of: hydrogen atom, C ₁ -C ₁₈ alkyl group is C ₁ -C ₄ alkoxy-substituted acyl group of C ₁ -C ₅ alkyl, substituted with _{T 1 C (O) O C} 1 -C 4 alkyl, optionally substituted with one or more halogen atoms, C ₁ -C ₄ alkyl, C ₅ -C ₇ cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryloxy substituted C ₂ -C ₁₈ alkyl group, C ₂ -C ₁₈ alkyl group _{inserted by C 5} -C ₇ cycloalkylene, phenylene, O, S or NT _{17 , C 5} -C ₇ cycloalkyl group, optionally with one or more C ₁ -C ₄ alkyl, phenyl, halogen atom or CN substituted C ₅ -C ₇ cycloalkyl, phenyl, optionally with one or more C ₁ -C ₁₂ alkyl, carboxyl, C ₁ -C ₁₂ Alkyl acyl group, C ₅ -C ₆ cycloalkyl methanyl group, aryl acyl group, heteroaryl acyl group, JT ₁₇ , phenyl group, halogen atom, CN or NO ₂ substituted phenyl group, any one of them has C ₅ -C ₆ cycloalkyl substituted C ₂ -C ₄ alkyl acyl substituted phenyl group, optionally substituted by a C ₂ -C ₁₂ alkyl acyl group _{inserted with phenylene, O, S or NT 17} The phenyl group, C ₁ -C ₄ alkyl acyl group, C ₁ -C ₄ conjugated alkenyl group, benzyl group and phenoxycarbonyl group; wherein the benzyl group or the benzene in the phenoxycarbonyl group The group can be optionally substituted by one or more halogen atoms, T ₁₇ , C ₅ cycloalkyl, C ₆ cycloalkyl, CN, OH or JT ₁₇ ; or T _{18 is} through a single bond, a carbon atom, a carbonyl group and Ar ₁ or The aromatic rings in Ar ₂ are connected to form a new ring; T ₁₉ and T ₂₀ are each independently selected from the group consisting of: a hydrogen atom, a C ₁ -C ₁₈ alkyl group, and a C ₁ -C ₄ alkoxy group Substituted C ₁ -C ₅ alkyl group, _{C 1} -C _{4 alkyl group substituted by T 1} C(O)O, optionally by one or more halogen atoms, C ₁ -C ₄ alkyl group, C ₅ -C ₇ Cycloalkyl, heterocycloalkyl, phenyl, heteroaryl, CN, C ₁ -C ₄ alkoxy or aryl oxy substituted C ₂ -C ₁₈ alkyl group, substituted by C ₅ -C _{7 ring} Alkyl, phenylene, O, S or NT ₁₇ inserted C ₂ -C ₁₈ alkyl, C ₅ -C ₇ cycloalkyl, optionally with one or more C ₁ -C ₄ alkyl, phenyl, halogen Atom or CN substituted C ₅ -C ₇ cycloalkyl, phenyl, and optionally one or more C ₁ -C ₄ alkyl, carboxyl, C ₁ -C _{1 2} Alkyl acyl group, C ₅ -C ₆ cycloalkyl methanyl group, C ₂ -C _{4 alkyl acyl group substituted by C 5} -C ₆ cycloalkyl group, aryl acyl group, JT ₁₇ , phenyl group, A halogen atom or a CN substituted phenyl group; or T _{19 is connected to the aromatic ring in Ar 1} or Ar ₂ through a single bond, a carbon atom, and a carbonyl group to form a new ring; wherein when Ar ₁ is a substituted carbazole group, Y _{1 is} not C, O, S or NT ₂₀ ; the photoinitiator (E) further comprises a photoinitiator (E-3) having a structure of formula (E3):

In formula (E3): E ₃₀ represents an organic group containing a cycloalkyl group having a carbon number of 3 to 20, E ₃₁ and E ₃₂ each independently represent an alkyl group or an aryl group, and E ₃₃ represents an alkyl group; based on the alkali solubility The total usage amount of the resin (C) is 100 parts by weight, and the usage amount of the photoinitiator (E-3) ranges from 5 parts by weight to 50 parts by weight. The photosensitive resin composition according to claim 1, wherein the first alkali-soluble resin (C-1) has an ethylenically unsaturated group. The photosensitive resin composition according to claim 1 or 2, wherein the first alkali-soluble resin (C-1) is composed of an ethylenically unsaturated monomer (c-1-1) having a structure represented by formula (C1-i) ), after copolymerization of ethylenically unsaturated monomers (c-1-2) with one or more carboxylic acids or carboxylic anhydrides and other copolymerizable ethylenically unsaturated monomers (c-1-3), then It is obtained by reacting with an ethylenically unsaturated monomer (c-1-4) having an epoxy group;

In formula (C1-i): Z ₁ and Z ₂ each independently represent a hydrogen atom or a halogen atom; wherein, Z ₁ and Z ₂ are the same or different; Z ₃ , Z ₄ and Z ₅ each independently represent a hydrogen atom, A halogen atom or an alkyl group; wherein Z ₃ , Z ₄ and Z ₅ are the same or different; Z ₆ and Z ₇ each independently represent a hydrogen atom or an alkyl group; wherein Z ₆ and Z ₇ are the same or different; and s Represents an integer from 1 to 2. According to the photosensitive resin composition of claim 1, the alkali-soluble resin (C) further comprises a second alkali-soluble resin (C-2), and the second alkali-soluble resin (C-2) is polymerized from a mixture Prepared, and the mixture contains an epoxy compound (c-2-1) with at least two epoxy groups and a compound with at least one carboxylic acid group and at least one ethylenically unsaturated group (c-2- 2). The photosensitive resin composition according to claim 4, wherein the epoxy compound (c-2-1) having at least two epoxy groups has a structure represented by formula (C2-I) or formula (C2-II) ；

In the formula (C2-I): R ⁶¹ , R ⁶² , R ⁶³ and R ⁶⁴ are respectively the same or different, and represent a hydrogen atom, a halogen atom, a C ₁ to C ₅ alkyl group, and a C ₁ to C ₅ alkoxy group Group, C ₆ to C ₁₂ aryl group or C ₆ to C ₁₂ aralkyl group;

In formula (C2-II): R ⁶⁵ to R ⁷⁸ are the same or different, respectively, and represent a hydrogen atom, a halogen atom, a C ₁ to C ₈ alkyl group or a C ₆ to C ₁₅ aromatic group, and t represents 0 to An integer of 10. According to the photosensitive resin composition of claim 1, the photoinitiator (E) further comprises a photoinitiator (E-2) having a structure of formula (E2):

In formula (E2): R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, C ₁ to C ₂₀ alkyl, COR ₁₆ or

Or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are each independently and jointly

But the condition is that at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ is

R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently hydrogen, a C ₁ to C ₂₀ alkyl group, and the C ₁ to C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, Phenyl; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently an unsubstituted phenyl group or a phenyl group substituted with one or more of the following groups: C ₁ to C ₆ alkyl, halogen; X Represents CO or a single bond; R ₁₃ represents C ₁ to C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ ; or R ₁₃ represents C ₂ to C ₂₀ alkyl group with one or more O or CO interposed therebetween, wherein the interspersed C ₂ to C ₂₀ alkyl group is unsubstituted or substituted with one or more halogens; or R ₁₃ represents phenyl or naphthyl, Each of them is unsubstituted or substituted with one or more of the following groups: C ₁ to C ₂₀ alkyl, C ₁ to C ₄ haloalkyl; R ₁₄ represents hydrogen, C ₁ to C ₂₀ alkoxy or C ₁ to C ₂₀ alkyl; R ₁₅ is C ₆ to C ₂₀ aryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C ₁ to C ₄ haloalkyl, OR ₁₇ , one or more interspersed A C ₂ to C ₂₀ alkyl group of O; or each of them is _{substituted with a C 1} to C ₂₀ alkyl group, the C ₁ to C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , phenyl, OR ₁₇ ; or R ₁₅ represents hydrogen, C ₃ to C ₈ cycloalkyl; or R ₁₅ is C ₁ to C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups : Halogen, C ₃ to C ₈ cycloalkyl; R ₁₆ represents C ₆ to C ₂₀ aryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C ₁ to C ₄ haloalkyl, OR ₁₇ ; or each of them is _{substituted with one or more C 1} to C ₂₀ alkyl groups, the C ₁ to C ₂₀ alkyl groups are unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ ; R ₁₇ Represents hydrogen, C ₁ to C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen or C ₃ to C ₂₀ cycloalkyl interspersed with one or more O; or R ₁₇ represents C ₂ to C ₂₀ alkyl group, with one or more O interposed therebetween; or R ₁₇ represents a phenyl group, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C ₁ to C ₁₂ alkyl group, C ₁ to C ₁₂ alkoxy; provided that there is at least one in formula (E2)

The photosensitive resin composition according to claim 1, wherein the total usage amount based on the alkali-soluble resin (C) is 100 parts by weight, and the usage amount of the pigment (A) ranges from 30 parts by weight to 500 parts by weight Parts; the use amount of the ethylenically unsaturated group-containing compound (D) ranges from 20 parts by weight to 300 parts by weight; the use amount of the photoinitiator (E) ranges from 15 parts by weight to 230 parts by weight; the solvent The use amount of (F) ranges from 500 parts by weight to 5000 parts by weight. The photosensitive resin composition according to claim 1, wherein the total usage amount based on the alkali-soluble resin (C) is 100 parts by weight, and the usage amount of the alkali-soluble resin (C-1) ranges from 10 parts by weight to 100 parts by weight Copies. The photosensitive resin composition according to claim 4, wherein the total usage amount based on the alkali-soluble resin (C) is 100 parts by weight, and the usage amount of the second alkali-soluble resin (C-2) ranges from 0 parts by weight to 90 parts by weight. The photosensitive resin composition according to claim 1, wherein the total usage amount based on the alkali-soluble resin (C) is 100 parts by weight, and the usage amount of the photoinitiator (E-1) ranges from 5 parts by weight to 80 parts by weight Copies. The photosensitive resin composition according to claim 6, wherein the total usage amount based on the alkali-soluble resin (C) is 100 parts by weight, and the usage amount of the photoinitiator (E-2) ranges from 5 parts by weight to 50 parts by weight Copies. A method for manufacturing a color filter, the color filter including a pixel layer, the manufacturing method comprising forming the pixel layer using the photosensitive resin composition according to any one of claims 1 to 11. A color filter manufactured by the manufacturing method according to claim 12. A liquid crystal display device comprising the color filter according to claim 13.