TWI492203B - Method of manufacturing display panel and laminated structure - Google Patents
Method of manufacturing display panel and laminated structure Download PDFInfo
- Publication number
- TWI492203B TWI492203B TW101145438A TW101145438A TWI492203B TW I492203 B TWI492203 B TW I492203B TW 101145438 A TW101145438 A TW 101145438A TW 101145438 A TW101145438 A TW 101145438A TW I492203 B TWI492203 B TW I492203B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- carrier
- colloid
- display panel
- manufacturing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Liquid Crystal (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
- Joining Of Glass To Other Materials (AREA)
Description
本發明關於一種顯示面板之製造方法及疊層體,尤指一種超薄顯示面板之製造方法及於製造超薄顯示面板時所產生的疊層體。The present invention relates to a method and a laminate for manufacturing a display panel, and more particularly to a method for manufacturing an ultra-thin display panel and a laminate produced when an ultra-thin display panel is manufactured.
隨著消費性電子產品逐漸往輕、薄、短、小的設計趨勢發展,目前已有超薄顯示器問世。於先前技術中,超薄顯示器之製造方法是在將顯示面板之上下玻璃基板完成對組貼合後,進行玻璃薄化製程。於玻璃薄化製程中,一般係使用0.5mm或0.4mm玻璃基板進行蝕刻至所需的厚度。然而,當玻璃基板薄化至0.1mm以下時,容易造成玻璃基板破裂或表面析出物等問題,使得生產良率大大降低,進而增加生產成本。As consumer electronics products have evolved toward light, thin, short, and small design trends, ultra-thin displays have emerged. In the prior art, the ultra-thin display is manufactured by performing a glass thinning process after the glass substrate is mounted on the upper and lower sides of the display panel. In the glass thinning process, a 0.5 mm or 0.4 mm glass substrate is generally used for etching to a desired thickness. However, when the glass substrate is thinned to 0.1 mm or less, problems such as cracking of the glass substrate or surface precipitates are liable to occur, so that the production yield is greatly lowered, thereby increasing the production cost.
因此,本發明的目的之一在於提供一種顯示面板之製造方法及疊層體,以解決上述問題。Accordingly, it is an object of the present invention to provide a method and a laminate for manufacturing a display panel to solve the above problems.
根據一實施例,本發明之顯示面板之製造方法包含:提供一第一基板、一第二基板、一第一膠體、一第二膠體、一第一載體以及一第二載體;以第一膠體將第一基板貼合於第一載體上,並且以第二膠體將第二基板貼合於第二載體上;將第一基板與第二基板對組 貼合,以形成一疊層體;施加一第一外力於第一載體上,以使第一載體與第一基板分離;以及加熱第二膠體,以降低第二膠體之黏性,並且施加一第二外力於第二載體上,以使第二載體與第二基板分離。According to an embodiment of the present invention, a method of manufacturing a display panel includes: providing a first substrate, a second substrate, a first colloid, a second colloid, a first carrier, and a second carrier; Bonding the first substrate to the first carrier, and bonding the second substrate to the second carrier with the second colloid; pairing the first substrate with the second substrate Laminating to form a laminate; applying a first external force to the first carrier to separate the first carrier from the first substrate; and heating the second colloid to reduce the viscosity of the second colloid and applying a A second external force is applied to the second carrier to separate the second carrier from the second substrate.
根據另一實施例,本發明之疊層體包含一第一載體、一第一膠體、一第一基板、一第二載體、一第二膠體以及一第二基板。第一膠體形成於第一載體上,其中第一膠體之熱裂解溫度大於370℃。第一基板藉由第一膠體貼合於第一載體上。第二膠體形成於第二載體上,其中第二膠體之熱裂解溫度大於230℃。第二基板藉由第二膠體貼合於第二載體上,且與第一基板對組貼合。According to another embodiment, the laminate of the present invention comprises a first carrier, a first colloid, a first substrate, a second carrier, a second colloid, and a second substrate. The first colloid is formed on the first support, wherein the first colloid has a thermal cracking temperature greater than 370 °C. The first substrate is attached to the first carrier by the first colloid. The second colloid is formed on the second support, wherein the second colloid has a thermal cracking temperature of greater than 230 °C. The second substrate is bonded to the second carrier by the second colloid and is bonded to the first substrate pair.
綜上所述,本發明可以超薄玻璃(例如,厚度介於0.05mm與0.1mm之間)作為上述之第一基板與第二基板,以厚玻璃(例如,厚度介於0.4mm與0.7mm之間)作為上述之第一載體與第二載體,並且藉由第一膠體與第二膠體將第一基板與第二基板分別貼合於第一載體與第二載體上,以增加支撐強度,進而避免第一基板與第二基板在製程的運輸過程中發生破裂。在完成顯示面板之製程後,由於第二基板有第二載體支撐,可先以外力直接使第一載體與第一基板分離,接著再加熱第二膠體,以降低第二膠體之黏性,此時,即可以較小的外力使第二載體與第二基板分離。藉此,即可有效提高超薄顯示面板之生產良率。In summary, the present invention can be used for ultra-thin glass (for example, between 0.05 mm and 0.1 mm in thickness) as the first substrate and the second substrate, and the thick glass (for example, the thickness is between 0.4 mm and 0.7 mm). Between the first carrier and the second carrier, and the first substrate and the second substrate are respectively attached to the first carrier and the second carrier by the first colloid and the second colloid to increase the support strength. Further, the first substrate and the second substrate are prevented from being broken during transportation of the process. After the process of the display panel is completed, since the second substrate has the second carrier support, the first carrier can be directly separated from the first substrate by external force, and then the second gel is heated to reduce the viscosity of the second colloid. At this time, the second carrier can be separated from the second substrate by a small external force. Thereby, the production yield of the ultra-thin display panel can be effectively improved.
需說明的是,顯示面板之製程在不同階段的最高溫會有不同的 要求,舉例而言,若於第一基板上形成驅動電路(例如,薄膜電晶體陣列),則其製程最高溫例如約為370℃,此時,第一膠體之熱裂解溫度需大於370℃,以避免第一膠體在製程中因高溫裂化而污染產品;若於第二基板上形成彩色濾光層,則其製程最高溫例如約為230℃,此時,第二膠體之熱裂解溫度需大於230℃,以避免第二膠體在製程中因高溫裂化而污染產品。It should be noted that the process of the display panel will have different temperatures at different stages of the process. For example, if a driving circuit (for example, a thin film transistor array) is formed on the first substrate, the maximum temperature of the process is, for example, about 370 ° C. At this time, the thermal decomposition temperature of the first colloid needs to be greater than 370 ° C. To avoid contamination of the product by the high temperature cracking of the first colloid in the process; if the color filter layer is formed on the second substrate, the highest temperature of the process is, for example, about 230 ° C. At this time, the thermal cracking temperature of the second colloid is greater than 230 ° C to avoid contamination of the product by the high temperature cracking of the second colloid during the process.
關於本發明之優點與精神可以藉由以下的發明詳述及所附圖式得到進一步的瞭解。The advantages and spirit of the present invention will be further understood from the following detailed description of the invention.
請參閱第1A圖至第8圖,第1A圖與第1B圖為根據本發明一實施例之顯示面板之製造方法的流程圖,第2圖至第8圖為搭配第1A圖與第1B圖的製程示意圖。首先,執行步驟S10,提供一第一基板10、一第二基板12、一第一膠體14、一第二膠體16、一第一載體18以及一第二載體20。於此實施例中,第一基板10之厚度可介於0.05mm與0.1mm之間,第二基板12之厚度可介於0.05mm與0.1mm之間,第一載體18之厚度可介於0.4mm與0.7mm之間,且第二載體20之厚度可介於0.4mm與0.7mm之間。換言之,第一載體18與第二載體20之厚度較第一基板10與第二基板12之厚度來得厚,以在顯示面板之製程中增加支撐強度,進而避免第一基板10與第二基板12在製程的運輸過程中發生破裂。此外,第一基板10、第二基板12、第一載體18以及第二載體20可為玻璃,但不以此為 限。Referring to FIGS. 1A to 8 , FIGS. 1A and 1B are flowcharts showing a method of manufacturing a display panel according to an embodiment of the present invention, and FIGS. 2 to 8 are a combination of FIGS. 1A and 1B. Schematic diagram of the process. First, step S10 is performed to provide a first substrate 10, a second substrate 12, a first colloid 14, a second colloid 16, a first carrier 18, and a second carrier 20. In this embodiment, the thickness of the first substrate 10 may be between 0.05 mm and 0.1 mm, the thickness of the second substrate 12 may be between 0.05 mm and 0.1 mm, and the thickness of the first carrier 18 may be between 0.4 mm and 0.1 mm. Between mm and 0.7 mm, and the thickness of the second carrier 20 may be between 0.4 mm and 0.7 mm. In other words, the thickness of the first carrier 18 and the second carrier 20 is thicker than the thickness of the first substrate 10 and the second substrate 12 to increase the support strength in the process of the display panel, thereby avoiding the first substrate 10 and the second substrate 12 Cracking occurred during transportation of the process. In addition, the first substrate 10, the second substrate 12, the first carrier 18, and the second carrier 20 may be glass, but not limit.
接著,執行步驟S12,將第一載體18與第二載體20分別洗淨。接著,執行步驟S14,使第一膠體14形成於第一載體18上,且使第二膠體16形成於第二載體20上,如第2圖所示。接著,執行步驟S16,預烘乾第一膠體14與第二膠體16。於此實施例中,例如可以約170℃的溫度預烘乾第一膠體14與第二膠體16。執行步驟S18,以第一膠體14將第一基板10貼合於第一載體18上,並且以第二膠體16將第二基板12貼合於第二載體20上,如第3圖所示。於此實施例中,可以真空貼合的方式藉由第一膠體14將第一基板10貼合於第一載體18上,並且可以真空加熱貼合的方式藉由第二膠體16將第二基板12貼合於第二載體20上。Next, step S12 is performed to wash the first carrier 18 and the second carrier 20, respectively. Next, step S14 is performed to form the first colloid 14 on the first carrier 18, and the second colloid 16 is formed on the second carrier 20, as shown in FIG. Next, step S16 is performed to pre-bake the first colloid 14 and the second colloid 16. In this embodiment, for example, the first colloid 14 and the second colloid 16 may be pre-baked at a temperature of about 170 °C. Step S18 is performed, the first substrate 10 is attached to the first carrier 18 by the first colloid 14, and the second substrate 12 is attached to the second carrier 20 by the second colloid 16, as shown in FIG. In this embodiment, the first substrate 10 can be attached to the first carrier 18 by the first colloid 14 in a vacuum bonding manner, and the second substrate can be pressed by the second colloid 16 by vacuum heating and bonding. 12 is attached to the second carrier 20.
接著,執行步驟S20,於第一基板10上形成一驅動電路22(例如,薄膜電晶體陣列),如第4圖所示。一般而言,形成薄膜電晶體陣列之製程最高溫例如約為370℃,此時,第一膠體14之熱裂解溫度(Td)則需大於370℃,以避免第一膠體14在製程中因高溫裂化而污染產品。於此實施例中,第一膠體14可包含烯基(alkenyl group)之有機聚矽氧烷(diorganopolysiloxane),但不以此為限,以使第一膠體14之熱裂解溫度大於370℃。同時,執行步驟S22,於第二基板12上形成一彩色濾光層24,如第4圖所示。一般而言,形成彩色濾光層24之製程最高溫例如約為230℃,此時,第二膠體16之熱裂解溫度(Td)則需大於230℃,以避免第二膠體16在製程中因 高溫裂化而污染產品。於此實施例中,第二膠體16可包含環烯烴共聚物(cycloolefin copolymer,COC),但不以此為限,以使第二膠體16之熱裂解溫度大於230℃。此外,於本實施例中,於第二基板12上更可形成一共通電極層27於彩色濾光層24上。Next, in step S20, a driving circuit 22 (for example, a thin film transistor array) is formed on the first substrate 10, as shown in FIG. Generally, the process for forming the thin film transistor array has a maximum temperature of, for example, about 370 ° C. At this time, the thermal decomposition temperature (Td) of the first colloid 14 needs to be greater than 370 ° C to avoid the high temperature of the first colloid 14 during the process. Cracking and contaminating products. In this embodiment, the first colloid 14 may comprise an alkenyl group of organopolysiloxane (diorganopolysiloxane), but not limited thereto, so that the first colloid 14 has a thermal cracking temperature greater than 370 °C. At the same time, step S22 is performed to form a color filter layer 24 on the second substrate 12, as shown in FIG. Generally, the process for forming the color filter layer 24 has a maximum temperature of, for example, about 230 ° C. At this time, the thermal decomposition temperature (Td) of the second colloid 16 needs to be greater than 230 ° C to avoid the second colloid 16 in the process. Cracking at high temperatures contaminates the product. In this embodiment, the second colloid 16 may include a cycloolefin copolymer (COC), but not limited thereto, so that the thermal decomposition temperature of the second colloid 16 is greater than 230 ° C. In addition, in the embodiment, a common electrode layer 27 is formed on the second substrate 12 on the color filter layer 24.
接著,執行步驟S24,將第一基板10與第二基板12對組貼合,以形成一疊層體1,並且設置一顯示介質26於第一基板10與第二基板12之間,如第5圖所示。疊層體1即包含第一基板10、第二基板12、第一膠體14、第二膠體16、第一載體18以及第二載體20。接著,執行步驟S26,施加一第一外力F1於第一載體18上,以使第一載體18與第一基板10分離,如第6圖所示。於此實施例中,可利用第6圖中的設備3之底座30以抽真空的方式吸附疊層體1之第二載體20,並且利用第6圖中的設備3之旋轉臂32以抽真空的方式吸附疊層體1之第一載體18,接著,再操作頂出件34以至少大於1N/25mm之第一外力F1朝上頂,以使旋轉臂32帶動第一載體18朝箭頭A的方向轉動,進而使第一載體18與第一基板10分離。由於第二基板12有第二載體20支撐,因此在以第一外力F1直接使第一載體18與第一基板10分離的過程中,不會使第二基板12發生破裂。Next, step S24 is performed to bond the first substrate 10 and the second substrate 12 to each other to form a laminate 1 and a display medium 26 is disposed between the first substrate 10 and the second substrate 12, as described in Figure 5 shows. The laminate 1 includes a first substrate 10, a second substrate 12, a first colloid 14, a second colloid 16, a first carrier 18, and a second carrier 20. Next, step S26 is performed to apply a first external force F1 on the first carrier 18 to separate the first carrier 18 from the first substrate 10, as shown in FIG. In this embodiment, the second carrier 20 of the laminate 1 can be vacuumed by the base 30 of the apparatus 3 in FIG. 6, and the rotary arm 32 of the apparatus 3 in FIG. 6 can be used to evacuate. The first carrier 18 of the laminate 1 is adsorbed, and then the ejector 34 is operated to face the first external force F1 of at least greater than 1 N/25 mm so that the rotating arm 32 drives the first carrier 18 toward the arrow A. The direction is rotated to further separate the first carrier 18 from the first substrate 10. Since the second substrate 12 is supported by the second carrier 20, the second substrate 12 is not broken during the process of directly separating the first carrier 18 from the first substrate 10 by the first external force F1.
接著,執行步驟S28,加熱第二膠體16,以降低第二膠體16之黏性,並且施加一第二外力F2於第二載體20上,以使第二載體20與第二基板12分離,如第7圖所示。於此實施例中,第二外力 F2之施力方向平行於第二載體20與第二基板12之貼合面,以使第二載體20相對第二基板12滑動,進而與第二基板12分離。雖然,第二外力F2之施力方向是以平行於第二載體20與第二基板12之貼合面的方式為佳,但並不以此為限。換言之,第二外力F2之施力方向亦可垂直於第二載體20與第二基板12之貼合面或與此貼合面夾任意角度,以使第二載體20與第二基板12分離,視實際應用而定。於此實施例中,在溫度低於60℃時,第二膠體16之黏性大於100Pa.s,可使第二基板12與第二載體20穩固地貼合在一起,而不會產生相對移動;在溫度介於150℃與200℃之間時,第二膠體16之黏性小於50Pa.s,此時,只要施加一定大小的第二外力F2,即可輕易地使第二載體20與第二基板12分離。換言之,只要將第二膠體16加熱至150℃與200℃之間,即可以較小的第二外力F2使第二載體20與第二基板12分離,進而避免使已經無第一載體18支撐的第一基板10發生破裂。Next, step S28 is performed to heat the second colloid 16 to lower the viscosity of the second colloid 16 and apply a second external force F2 to the second carrier 20 to separate the second carrier 20 from the second substrate 12, such as Figure 7 shows. In this embodiment, the second external force The direction of application of F2 is parallel to the bonding surface of the second carrier 20 and the second substrate 12, so that the second carrier 20 slides relative to the second substrate 12 and is separated from the second substrate 12. The direction of the second external force F2 is preferably parallel to the bonding surface of the second carrier 20 and the second substrate 12, but is not limited thereto. In other words, the direction of the second external force F2 can also be perpendicular to the bonding surface of the second carrier 20 and the second substrate 12 or at any angle with the bonding surface, so that the second carrier 20 and the second substrate 12 are separated. Depending on the application. In this embodiment, when the temperature is lower than 60 ° C, the viscosity of the second colloid 16 is greater than 100 Pa. s, the second substrate 12 and the second carrier 20 can be firmly bonded together without relative movement; when the temperature is between 150 ° C and 200 ° C, the viscosity of the second colloid 16 is less than 50 Pa. s, at this time, the second carrier 20 and the second substrate 12 can be easily separated by applying a second external force F2 of a certain size. In other words, as long as the second colloid 16 is heated to between 150 ° C and 200 ° C, the second carrier 20 can be separated from the second substrate 12 by a second, lower external force F2, thereby avoiding the support of the first carrier 18 . The first substrate 10 is broken.
在第一載體18與第二載體20分別自第一基板10與第二基板12移離後,即可完成如第8圖所示之顯示面板1'。於此實施例中,顯示介質26可為液晶(liquid crystal),則最後完成之顯示面板1'即為液晶顯示面板。由於液晶的耐熱度例如約為200℃左右,因此只要加熱第二膠體16之溫度不超過200℃,即不會對液晶造成損傷。此外,由於黃光製程所用到的液體溫度約為60℃左右,因此在溫度低於60℃時,第二膠體16之黏性大於100Pa.s,可有效確保第二基板12與第二載體20穩固地貼合在一起,而不會在黃光製程 的運輸過程中產生相對移動。After the first carrier 18 and the second carrier 20 are removed from the first substrate 10 and the second substrate 12, respectively, the display panel 1' as shown in FIG. 8 can be completed. In this embodiment, the display medium 26 can be a liquid crystal, and the final display panel 1 ′ is a liquid crystal display panel. Since the heat resistance of the liquid crystal is, for example, about 200 ° C, if the temperature of the second colloid 16 is not more than 200 ° C, the liquid crystal is not damaged. In addition, since the liquid temperature used in the yellow light process is about 60 ° C, when the temperature is lower than 60 ° C, the viscosity of the second colloid 16 is greater than 100 Pa. s, can effectively ensure that the second substrate 12 and the second carrier 20 are firmly attached together without being in the yellow light process The relative movement occurs during the transportation process.
需說明的是,除了液晶顯示面板外,本發明亦可用來製造其他顯示面板,例如有機發光二極體(Organic Light-Emitting Diode,OLED)顯示面板、電泳顯示面板(ElectroPhoretic Display,EPD)等。請參閱第9圖,第9圖為根據本發明另一實施例之顯示面板1"的示意圖。如第9圖所示,顯示面板1"為以第1A圖與第1B圖所示之製造方法製造之OLED顯示面板。需說明的是,於製造顯示面板1"時,形成於第一基板10上之驅動電路22係為具導電性質的透明導電層,如銦錫氧化物(Indium Tin Oxide,ITO),設置於第一基板10與第二基板12之間的顯示介質26係為有機材料,顯示介質26係夾置於驅動電路22與另一金屬電極28之間,且不需於第二基板12上形成彩色濾光層(亦即,不需上述之步驟S22)。It should be noted that, in addition to the liquid crystal display panel, the present invention can also be used to manufacture other display panels, such as an Organic Light-Emitting Diode (OLED) display panel, an ElectroPhoretic Display (EPD), and the like. Please refer to FIG. 9. FIG. 9 is a schematic view of a display panel 1" according to another embodiment of the present invention. As shown in FIG. 9, the display panel 1" is a manufacturing method shown in FIGS. 1A and 1B. Manufactured OLED display panel. It should be noted that, when manufacturing the display panel 1", the driving circuit 22 formed on the first substrate 10 is a transparent conductive layer having a conductive property, such as Indium Tin Oxide (ITO). The display medium 26 between the substrate 10 and the second substrate 12 is an organic material, and the display medium 26 is interposed between the driving circuit 22 and the other metal electrode 28, and the color filter is not required to be formed on the second substrate 12. The light layer (i.e., step S22 described above is not required).
相較於先前技術,本發明可以超薄玻璃(例如,厚度介於0.05mm與0.1mm之間)作為上述之第一基板與第二基板,以厚玻璃(例如,厚度介於0.4mm與0.7mm之間)作為上述之第一載體與第二載體,並且藉由第一膠體與第二膠體將第一基板與第二基板分別貼合於第一載體與第二載體上,以增加支撐強度,進而避免第一基板與第二基板在製程的運輸過程中發生破裂。在完成顯示面板之製程後,由於第二基板有第二載體支撐,可先以外力直接使第一載體與第一基板分離,接著再加熱第二膠體,以降低第二膠體之黏性,此時,即可以較小的外力使第二載體與第二基板分離。藉此,即可有效提高 超薄顯示面板之生產良率。Compared with the prior art, the present invention can be ultra-thin glass (for example, between 0.05 mm and 0.1 mm in thickness) as the first substrate and the second substrate described above, with thick glass (for example, thickness between 0.4 mm and 0.7) Between the first carrier and the second carrier, and the first substrate and the second substrate are respectively attached to the first carrier and the second carrier by the first colloid and the second colloid to increase the support strength. In turn, the first substrate and the second substrate are prevented from being broken during transportation of the process. After the process of the display panel is completed, since the second substrate has the second carrier support, the first carrier can be directly separated from the first substrate by external force, and then the second gel is heated to reduce the viscosity of the second colloid. At this time, the second carrier can be separated from the second substrate by a small external force. By doing this, you can effectively improve Production yield of ultra-thin display panels.
需說明的是,顯示面板之製程在不同階段的最高溫會有不同的要求,舉例而言,若於第一基板上形成驅動電路(例如,薄膜電晶體陣列),則其製程最高溫例如約為370℃,此時,第一膠體之熱裂解溫度需大於370℃,以避免第一膠體在製程中因高溫裂化而污染產品;若於第二基板上形成彩色濾光層,則其製程最高溫例如約為230℃,此時,第二膠體之熱裂解溫度需大於230℃,以避免第二膠體在製程中因高溫裂化而污染產品。It should be noted that the process of the display panel may have different requirements at the highest temperature in different stages. For example, if a driving circuit (for example, a thin film transistor array) is formed on the first substrate, the process of the highest temperature is, for example, about At 370 ° C, at this time, the thermal decomposition temperature of the first colloid needs to be greater than 370 ° C to avoid contamination of the product by the high temperature cracking of the first colloid in the process; if the color filter layer is formed on the second substrate, the process is the highest The temperature is, for example, about 230 ° C. At this time, the thermal decomposition temperature of the second colloid needs to be greater than 230 ° C to avoid contamination of the product by the high temperature cracking of the second colloid during the process.
以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。The above are only the preferred embodiments of the present invention, and all changes and modifications made to the scope of the present invention should be within the scope of the present invention.
1‧‧‧疊層體1‧‧‧Laminated body
1'、1"‧‧‧顯示面板1', 1"‧‧‧ display panel
3‧‧‧設備3‧‧‧ Equipment
10‧‧‧第一基板10‧‧‧First substrate
12‧‧‧第二基板12‧‧‧second substrate
14‧‧‧第一膠體14‧‧‧First colloid
16‧‧‧第二膠體16‧‧‧Second colloid
18‧‧‧第一載體18‧‧‧ first carrier
20‧‧‧第二載體20‧‧‧second carrier
22‧‧‧驅動電路22‧‧‧Drive circuit
24‧‧‧彩色濾光層24‧‧‧Color filter layer
26‧‧‧顯示介質26‧‧‧Display media
27‧‧‧共通電極層27‧‧‧Common electrode layer
28‧‧‧金屬電極28‧‧‧Metal electrodes
30‧‧‧底座30‧‧‧Base
32‧‧‧旋轉臂32‧‧‧Rotating arm
34‧‧‧頂出件34‧‧‧Top pieces
F1‧‧‧第一外力F1‧‧‧First external force
F2‧‧‧第二外力F2‧‧‧Second external force
A‧‧‧箭頭A‧‧‧ arrow
S10、S12、S14、S16、S18、S20、S22、S24、S26、S28‧‧‧步驟S10, S12, S14, S16, S18, S20, S22, S24, S26, S28‧‧
第1A圖與第1B圖為根據本發明一實施例之顯示面板之製造方法的流程圖。1A and 1B are flowcharts showing a method of manufacturing a display panel according to an embodiment of the present invention.
第2圖至第8圖為搭配第1A圖與第1B圖的製程示意圖。Fig. 2 to Fig. 8 are schematic diagrams showing the process of the first and third panels.
第9圖為根據本發明另一實施例之顯示面板的示意圖。Figure 9 is a schematic view of a display panel in accordance with another embodiment of the present invention.
1‧‧‧疊層體1‧‧‧Laminated body
10‧‧‧第一基板10‧‧‧First substrate
12‧‧‧第二基板12‧‧‧second substrate
14‧‧‧第一膠體14‧‧‧First colloid
16‧‧‧第二膠體16‧‧‧Second colloid
18‧‧‧第一載體18‧‧‧ first carrier
20‧‧‧第二載體20‧‧‧second carrier
22‧‧‧驅動電路22‧‧‧Drive circuit
24‧‧‧彩色濾光層24‧‧‧Color filter layer
26‧‧‧顯示介質26‧‧‧Display media
27‧‧‧共通電極層27‧‧‧Common electrode layer
Claims (17)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101145438A TWI492203B (en) | 2012-12-04 | 2012-12-04 | Method of manufacturing display panel and laminated structure |
CN201310021679.8A CN103048823B (en) | 2012-12-04 | 2013-01-21 | Method for manufacturing display panel and laminate |
JP2013060472A JP5767663B2 (en) | 2012-12-04 | 2013-03-22 | Display panel manufacturing method and laminated structure |
KR1020130031862A KR101529773B1 (en) | 2012-12-04 | 2013-03-26 | Method of manufacturing display panel and laminated structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101145438A TWI492203B (en) | 2012-12-04 | 2012-12-04 | Method of manufacturing display panel and laminated structure |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201423690A TW201423690A (en) | 2014-06-16 |
TWI492203B true TWI492203B (en) | 2015-07-11 |
Family
ID=48061520
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101145438A TWI492203B (en) | 2012-12-04 | 2012-12-04 | Method of manufacturing display panel and laminated structure |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5767663B2 (en) |
KR (1) | KR101529773B1 (en) |
CN (1) | CN103048823B (en) |
TW (1) | TWI492203B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104793357A (en) * | 2014-01-17 | 2015-07-22 | 鸿富锦精密工业(深圳)有限公司 | Carrier, thin film transistor array substrate manufacturing method and liquid crystal display panel manufacturing method |
CN103770386B (en) * | 2014-02-11 | 2016-01-27 | 欧派家居集团股份有限公司 | Panel and adhering method thereof |
JP2016044015A (en) * | 2014-08-21 | 2016-04-04 | 株式会社日立製作所 | Carrier peeling device |
CN109283727A (en) * | 2018-11-07 | 2019-01-29 | 南京工道光电技术有限公司 | A kind of preparation method of heatproof electrically-controlled liquid crystal film |
CN111554152B (en) * | 2020-05-29 | 2021-09-14 | 重庆工程职业技术学院 | Preschool psychology teaching auxiliary device |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0864926A (en) * | 1994-08-26 | 1996-03-08 | Fujitsu Ltd | Mounting structure of semiconductor chip |
TW200619701A (en) * | 2004-12-08 | 2006-06-16 | Nitto Denko Corp | Liquid crystal panel and liquid crystal display apparatus |
WO2007018028A1 (en) * | 2005-08-09 | 2007-02-15 | Asahi Glass Company, Limited | Thin sheet glass laminate and method for manufacturing display using thin sheet glass laminate |
US7256766B2 (en) * | 1998-08-27 | 2007-08-14 | E Ink Corporation | Electrophoretic display comprising optical biasing element |
TW200901408A (en) * | 2007-06-22 | 2009-01-01 | Powertech Technology Inc | Mounting assembly of semiconductor package prevent soldering defect caused from substarte warpage |
CN101431066A (en) * | 2007-11-05 | 2009-05-13 | 力成科技股份有限公司 | Semiconductor packaging stack combination construction with movable outer terminal |
TW200931109A (en) * | 2008-01-02 | 2009-07-16 | Au Optronics Corp | Liquid crystal display, electro-optical apparatus, and method thereof |
TW201042346A (en) * | 2009-03-03 | 2010-12-01 | E Ink Corp | Electro-optic displays with color filters |
US8139005B2 (en) * | 2001-01-31 | 2012-03-20 | Seiko Epson Corporation | Display device |
TW201214359A (en) * | 2010-09-16 | 2012-04-01 | Wintek Corp | Touch display panel |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3081122B2 (en) * | 1994-07-18 | 2000-08-28 | シャープ株式会社 | Jig for transporting substrate and method of manufacturing liquid crystal display element using the same |
JP2000252342A (en) * | 1999-03-01 | 2000-09-14 | Seiko Epson Corp | Method for transporting thin plate and manufacture of liquid crystal panel |
JP5532918B2 (en) * | 2007-03-12 | 2014-06-25 | 旭硝子株式会社 | Method for manufacturing display device using glass substrate with protective glass |
KR20090108951A (en) * | 2008-04-14 | 2009-10-19 | 삼성전자주식회사 | Method of manufacturing display device |
KR101458901B1 (en) * | 2008-04-29 | 2014-11-10 | 삼성디스플레이 주식회사 | Method of manufacturing flexible display device |
JP5029523B2 (en) * | 2008-07-14 | 2012-09-19 | 旭硝子株式会社 | GLASS LAMINATE, PANEL FOR DISPLAY DEVICE WITH SUPPORT, PANEL FOR DISPLAY DEVICE, DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF |
JP5792958B2 (en) * | 2011-01-13 | 2015-10-14 | キヤノン株式会社 | Radiation imaging apparatus, radiation imaging system, and method of manufacturing radiation imaging apparatus |
-
2012
- 2012-12-04 TW TW101145438A patent/TWI492203B/en active
-
2013
- 2013-01-21 CN CN201310021679.8A patent/CN103048823B/en active Active
- 2013-03-22 JP JP2013060472A patent/JP5767663B2/en active Active
- 2013-03-26 KR KR1020130031862A patent/KR101529773B1/en active IP Right Grant
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0864926A (en) * | 1994-08-26 | 1996-03-08 | Fujitsu Ltd | Mounting structure of semiconductor chip |
US7256766B2 (en) * | 1998-08-27 | 2007-08-14 | E Ink Corporation | Electrophoretic display comprising optical biasing element |
US8139005B2 (en) * | 2001-01-31 | 2012-03-20 | Seiko Epson Corporation | Display device |
TW200619701A (en) * | 2004-12-08 | 2006-06-16 | Nitto Denko Corp | Liquid crystal panel and liquid crystal display apparatus |
WO2007018028A1 (en) * | 2005-08-09 | 2007-02-15 | Asahi Glass Company, Limited | Thin sheet glass laminate and method for manufacturing display using thin sheet glass laminate |
TW200901408A (en) * | 2007-06-22 | 2009-01-01 | Powertech Technology Inc | Mounting assembly of semiconductor package prevent soldering defect caused from substarte warpage |
CN101431066A (en) * | 2007-11-05 | 2009-05-13 | 力成科技股份有限公司 | Semiconductor packaging stack combination construction with movable outer terminal |
TW200931109A (en) * | 2008-01-02 | 2009-07-16 | Au Optronics Corp | Liquid crystal display, electro-optical apparatus, and method thereof |
TW201042346A (en) * | 2009-03-03 | 2010-12-01 | E Ink Corp | Electro-optic displays with color filters |
TW201214359A (en) * | 2010-09-16 | 2012-04-01 | Wintek Corp | Touch display panel |
Also Published As
Publication number | Publication date |
---|---|
TW201423690A (en) | 2014-06-16 |
CN103048823B (en) | 2015-10-07 |
CN103048823A (en) | 2013-04-17 |
KR20140071857A (en) | 2014-06-12 |
KR101529773B1 (en) | 2015-06-17 |
JP5767663B2 (en) | 2015-08-19 |
JP2014109774A (en) | 2014-06-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI492203B (en) | Method of manufacturing display panel and laminated structure | |
US8568184B2 (en) | Display modules | |
US20150324045A1 (en) | Curved touch display device and method for forming the same | |
TWI451610B (en) | Mother substrate structure of light emitting devices and light emitting device and method of fabricating the same | |
JP2011227205A (en) | Display device | |
WO2016095332A1 (en) | Oled touch display device and manufacturing method therefor | |
WO2012042822A1 (en) | Flexible display and method for manufacturing same | |
TWI616706B (en) | Method for manufacturing display panel and system for performing the same | |
JP2014206596A (en) | Liquid crystal display and manufacturing method thereof | |
TWI674466B (en) | Display panel and manufacturing method thereof | |
TW201931345A (en) | Electronic device and manufacturing method thereof | |
TWI566005B (en) | Method for fabricating display panel | |
TWI545746B (en) | Organic light emitting diode display device | |
JP2018004948A (en) | Display | |
WO2019179431A1 (en) | Heat transfer printing substrate, touch display panel and manufacturing methods therefor, and display device | |
TWI551440B (en) | Substrate unit, element substrate and manufacturing method of display device | |
WO2018072297A1 (en) | Oled display panel manufacturing method | |
WO2016177267A1 (en) | Packaging adhesive, packaging method, display panel and display device | |
CN104898316A (en) | Manufacturing method for thin type liquid crystal panel | |
TWI628079B (en) | Method for producing glass substrate | |
WO2016180079A1 (en) | Display panel and manufacturing method thereof, and display device | |
KR20140023206A (en) | Method for manufacturing member for electronic device, method for manufacturing electronic device, and member for electronic device | |
TW201302462A (en) | Display apparatus and method of manufacturing the same | |
US8927912B2 (en) | Sealant curing apparatus | |
JP2017024947A (en) | Laminated body and method for manufacturing the same, and electronic device and method for manufacturing the same |