TWI489079B - Projection apparatus and depth measuring system - Google Patents

Description

Projection device and depth measurement system

This invention relates to an optical device and measurement system, and more particularly to a projection device and depth measurement system.

Coding structured light is considered a reliable technique for solving the topography of an object's surface. Structured light refers to some light with a specific pattern, from the simplest lines, faces to lattices and more complex graphics.

The basic principle is to project structured light onto an object or scene and take images from one or more perspectives. Since the pattern has been encoded, the correspondence between the imaged point and the projected point can be easily found. Each point after decoding can solve the three-dimensional information of the object by using the trigonometric function method. Application examples include target distance detection, manufacturing part inspection, reverse engineering, gesture recognition, and 3D map creation.

A structured optical coding system is based on projecting a single pattern or set of patterns onto a measurement scene, followed by image capture by a single camera or multiple cameras. The patterns are designed so that the coded code is assigned to a set of pixels. Each coded pixel has its own code name, so it is directly reflected from the code name. The coordinates of the pixels in the corresponding pattern are shot. According to the user's coding strategy, it is divided into time coding, spatial coding and direct coding. The most commonly used strategy is time-based coding. An advantage of temporal encoding based systems is that a plurality of different coding patterns are projected onto the scene surface in a time sequence to obtain a corresponding sequence of encoded images. After that, the encoded image sequences are combined for decoding. It has the advantages of high accuracy and high resolution.

In the case of time coding, a set of patterns is projected onto the measurement surface in chronological order. In the past, the most typical projection device used a slide projector. The slide projector needs a mechanism to switch slides, which is bulky and cumbersome, and is difficult to use. In recent years, the commonly used projection device uses a liquid-crystal-on-silicon panel (liquid-crystal-on-silicon panel). LCOS panel) or digital micro-mirror device (DMD) video projectors have improved the bulkiness, but the projector's equipment is not only expensive but only projects a few patterns, so it is wasteful.

A projection system is disclosed in U.S. Patent No. 5,135,308. U.S. Patent No. 5,366,025 discloses a measuring system. U.S. Patent No. 7,397,550 discloses a three-dimensional scanning device. A measuring system is disclosed in U.S. Patent No. 5,366,025. U.S. Patent No. 6,263,234 discloses a projection system using a video projector. U.S. Patent No. 7,742,633 discloses a device for rapidly establishing a three-dimensional shape of a foot. A pattern projector is disclosed in U.S. Patent No. 4,212,073. A projection system is disclosed in U.S. Patent Nos. 4,464,1972 and 4,465,934. U.S. Patent No. 6,977,732 discloses a micrometer. A projection system is disclosed in U.S. Patent No. 6,509,559. US Patent No. 6,577,405 discloses a grating projector phase contour measuring system. Other application examples include the three-dimensional scanner of U.S. Patent No. 6,501,554 and the detection system of U.S. Patent No. 6,750,899. The Republic of China Patent No. I358525 discloses a method for measuring the surface topography of an object by using a stripe reflection method. A three-dimensional ring field scanning device is disclosed in the Republic of China Patent No. I358606. The Republic of China Patent No. I371699 discloses a method and apparatus for rapid measurement of the three-dimensional size of a foot. An image displacement detecting method is disclosed in the Republic of China Patent No. I372554. A dynamic object image sampling device is disclosed in the Republic of China Patent No. M395155. The Republic of China Patent No. 580556 discloses a method for measuring the three-dimensional shape of an object surface.

The invention provides a projection device with lower cost, higher operating speed and higher precision.

The invention provides a depth measuring system with lower cost, higher operating speed and higher precision.

Other objects and advantages of the present invention will become apparent from the technical features disclosed herein.

In order to achieve one or a part or all of the above or other purposes, an embodiment of the present invention provides a projection apparatus including at least one light source, at least one pattern unit, and a projection lens. At least one light source provides at least one illumination beam. The at least one pattern unit has a fixed pattern and is correspondingly disposed on at least one transmission path of the at least one illumination beam to convert the at least one illumination beam into the at least one pattern beam. The projection lens is disposed on the transmission path of the pattern beam. The at least one light source provides at least one illumination combination, and the at least one pattern beam correspondingly has at least one pattern combination.

An embodiment of the invention provides a depth measurement system adapted to measure the depth of a test object. The depth measuring system includes the above-described projection device and imaging device. The projection lens is used to project a pattern beam onto the object to be tested to form a reference pattern on the object to be tested. The camera device is used to capture a reference pattern.

In an embodiment of the invention, the pattern unit comprises at least one of a transmissive pattern unit or a reflective pattern unit.

In an embodiment of the invention, when the number of the light sources is plural and the number of the pattern units is plural, the pattern unit is divided into a plurality of pattern unit pairs, and each pattern unit pair includes the transmissive pattern unit and the reflective pattern. a unit, the light source is divided into a plurality of light source pairs, the light source pairs respectively corresponding to the pattern unit pairs, one light source of each light source pair corresponding to the reflective pattern unit of the corresponding pattern unit pair, and the other light source of each light source pair Corresponding pattern unit pairs correspond to the transmissive pattern elements.

In an embodiment of the invention, the light source comprises a laser source, a light emitting diode, an organic light emitting diode, a mercury lamp, a halogen lamp, or a combination thereof.

In an embodiment of the invention, when the number of light sources is plural, the colors of the illumination beams are different.

In an embodiment of the invention, when the number of the light sources is plural, the projection device further includes a control unit electrically connected to the light source to control the light combination of the light sources.

In an embodiment of the invention, when the number of light sources is multiple and the pattern is single When the number of the elements is plural, the projection device further includes a light combining unit, and the light combining unit is disposed on the transmission path of the pattern beam, and is used to merge the pattern beams. In an embodiment, the light combining unit comprises a color separation X 稜鏡, a color separation X plate, a polarization split 稜鏡 or a polarization beam splitter.

In an embodiment of the invention, when the number of the light sources is plural and the number of the pattern units is plural, the projection device further includes a light combining unit and an internal total reflection unit. The light combining unit is disposed on the transmission path of the illumination beam, and the internal total reflection unit is disposed on the transmission path of the illumination beam and the pattern beam.

In an embodiment of the invention, the depth measurement system further includes a calculation unit electrically connected to the imaging device and configured to calculate the depth of the object to be tested according to the reference pattern captured by the camera device.

Embodiments of the invention may achieve at least one of the following advantages or benefits. In the depth measurement system and the projection device of the embodiment of the present invention, the projected pattern beam can be combined in a plurality of different combinations by the combination of different illumination combinations of the light source and the pattern unit. Since the pattern unit is a fixed pattern with a lower cost, the depth measurement system and the projection apparatus of the embodiment of the present invention can achieve higher operation speed and higher precision at a lower cost.

The above described features and advantages of the invention will be apparent from the following description.

100‧‧‧Deep Measurement System

100a, 200a, 300a, 400a‧‧‧projector

10‧‧‧Test object

120, 120a, 120b, 120c‧‧‧ light source

120a1, 120a2, 120b1, 120b2, 120c1, 120c2‧‧‧ light source pair

B1, B1', B1a, B1b, B1c, B1d, B1e, B1f‧‧‧ illumination beam

B2, B2', B2a, B2b, B2c, B2d, B2e, B2f‧‧‧ pattern beam

140, 140a, 140a1, 140a2, 140a3, 140b1, 140b2, 140b3‧‧‧ pattern unit

150a, 150a1, 150a2, 150a3, 150a4, 150a5, 150a6‧‧ lens

150b1, 150b3‧‧‧ mirror

150d1, 150d2, 150d3‧‧‧ quarter wave plate

160, 170, 170a, 170b, 170c‧‧ ‧ light unit

160a, 160b‧‧‧first dichroic film, second dichroic film

180‧‧‧Projection lens

190‧‧‧Internal total reflection稜鏡

220‧‧‧ camera

240‧‧‧Control unit

260‧‧‧Computation unit

T'‧‧‧ phase

S1, S2, S3‧‧‧ sinusoidal periodic pattern

G1-8‧‧‧Gray code pattern

A, B, C, D, E, F, G, H‧‧ points

1A is a schematic structural diagram of a depth measurement system according to a first embodiment of the present invention; Figure.

FIG. 1B is a schematic structural diagram of a projection apparatus in FIG. 1A.

Figure 1C is a schematic illustration of a pattern beam arranged in Gray code.

Figure 1D is a schematic illustration of a pattern beam employing a sinusoidal periodic pattern.

Figure 1E is a graph of intensity versus time for the pattern beam of Figure 1D.

2A is a schematic view of a projection apparatus of a depth measuring system in a second embodiment of the present invention.

2B is a partial schematic view of a projection apparatus of another embodiment.

3 is a schematic view of a projection apparatus of a depth measuring system in a third embodiment of the present invention.

4 is a schematic view of a projection apparatus of a depth measuring system in a fourth embodiment of the present invention.

The above and other technical contents, features and advantages of the present invention will be apparent from the following detailed description of the preferred embodiments. The directional terms mentioned in the following embodiments, such as up, down, left, right, front or back, etc., are only directions referring to the additional drawings. Therefore, the directional terminology used is for the purpose of illustration and not limitation.

1A is a schematic structural view of a depth measuring system according to a first embodiment of the present invention, and FIG. 1B is a schematic structural view of a projection device of FIG. 1A. Referring to FIG. 1A, in the embodiment, the depth measurement system 100 includes a projection device 100a. And an imaging device 220. The depth measurement system 100 is configured to measure the surface depth of the object to be tested 10, wherein the depth of the object to be tested 10 can be projected through the projection device 100a (to be detailed later) to the side object 10 and captured by the camera device 220. The reference pattern on the side object 10 is obtained. In detail, the projection device 100a is used to project the encoded pattern beam B2 onto the surface of the object 10 to be tested. The depth measurement system 100 of the present embodiment further includes a calculation unit 260. The calculation unit 260 is electrically connected to the imaging device 220 for calculating the image of the pattern light beam B2 on the object to be tested 10 captured by the image capturing device 220. The depth of the object 10 is calculated, for example, by the decoding result of the pattern beam B2 and the triangulation principle to calculate the depth of the object 10 to be tested.

Referring to FIG. 1B, the projection apparatus 100a of the present embodiment includes a plurality of light sources 120 (eg, light sources 120a, 120b, and 120c), a plurality of pattern units 140 (eg, pattern units 140a1, 140a2, and 140a3), a light combining unit 160, and Projection lens 180. These light sources 120 provide a plurality of illumination beams B1, respectively. These pattern units 140 have a fixed pattern, and each pattern unit 140 is disposed on a transmission path of the corresponding illumination beam B1 to convert the illumination beam B1 into a pattern beam B2. Specifically, in the embodiment, the light source 120 includes a light source 120a, a light source 120b, and a light source 120c, wherein the light sources 120a, 120b, and 120c respectively provide illumination beams B1a, B1b, and B1c of different wavelength bands on different light transmission paths. The light source 120 is, for example, a light-emitting diode (LED). However, in other embodiments, the light source 120 may be other suitable light sources, such as a laser light source, an organic light emitting diode, a mercury lamp, and a halogen. Light or a combination thereof. In addition, the pattern unit 140 in this embodiment is, for example, a transmissive pattern unit. However, the invention is not limited thereto, for example, In other embodiments, a reflective pattern unit or a combination of a transmissive pattern unit and a reflective pattern unit may be employed. In the present embodiment, the pattern unit 140 is, for example, a light shielding sheet, a slide or other optical element that partially penetrates and partially reflects the incident light beam.

Further, in the present embodiment, the light source 120a of the projection device 100a provides the illumination beam B1a of the first wavelength band, wherein the illumination beam B1a is transmitted on the first optical path. The illumination beam B1a is transmitted to the mirror 150b1 after passing through the lens 150a1, and the mirror 150b1 reflects the illumination beam B1a to the transmissive pattern unit 140a1. The transmissive pattern unit 140a1 is disposed on the transmission path of the illumination beam B1a to convert the illumination beam B1a into the pattern beam B2a. Then, the pattern light beam B2a is transmitted to the light combining unit 160. In addition, the light source 120b provides an illumination beam B1b of the second wavelength band, wherein the illumination beam B1b is transmitted on the second optical path, and the illumination beam B1b is directly transmitted to the transmissive pattern unit 140a2 after passing through the lens 150a2, and the transmissive pattern unit 140a2 It is disposed on the transmission path of the illumination beam B1b to convert the illumination beam B1b into the pattern beam B2b. Then, the pattern light beam B2b is transmitted to the light combining unit 160. In addition, the light source 120c provides an illumination beam B1c of a third wavelength band, wherein the illumination beam B1c is transmitted on the third optical path, and the illumination beam B1c is transmitted to the mirror 150b3 after passing through the lens 150a3, and the mirror 150b3 reflects the illumination beam B1c to Transmissive pattern unit 140a3. The transmissive pattern unit 140a3 is disposed on the transmission path of the illumination beam B1c to convert the illumination beam B1c into the pattern beam B2c. Then, the pattern light beam B2c is transmitted to the light combining unit 160.

In accordance with the above, the light combining unit 160 is disposed on the pattern beams B2a, B2b, and B2c. The pattern beams B2a, B2b, and B2c are received and transmitted on the transfer path to further combine the pattern beams B2a, B2b, and B2c. The light combining unit 160 in this embodiment is, for example, a color separation X. In other embodiments, the light combining unit 160 is, for example, a color separation X plate, and the invention is not limited thereto. Specifically, the light combining unit 160 has a first dichroic film 160a and a second dichroic film 160b, and is disposed on the first optical path, the second optical path, and the third optical path, and the pattern beams B2a, B2b, and B2c The bands are different. In the present embodiment, the light combining unit 160 combines the pattern beams B2a, B2b, and B2c into the pattern beam B2 and transmits it to the projection lens 180. In detail, the pattern beam B2a is reflected by the first dichroic film 160a to the projection lens 180, and the first dichroic film 160a penetrates the pattern beam B2b and the pattern beam B2c. On the other hand, the pattern beam B2c is reflected by the second dichroic film 160b to the projection lens 180, and the second dichroic film 160b penetrates the pattern beam B2a and the pattern beam B2b. The pattern beam B2c penetrates the first dichroic film 160a and the second dichroic film 160b and is transmitted to the projection lens 180.

In addition, in the embodiment, at least one light source 120 emits an illumination beam B1, and thus the light source 120 can provide at least one illumination combination, so that the pattern beam B2 transmitted by the light combining unit 160 can correspondingly have at least one pattern combination. Specifically, in the embodiment, the projection device 100a includes a control unit 240 electrically connected to the light sources 120a, 120b, and 120c to control the combination of illumination of the respective light sources 120. The control unit 240 controls each of the light sources 120 to respectively emit three illumination beams B1a, B1b, and B1c on different transmission paths, and the illumination beams B1a, B1b, and B1c are respectively converted by the corresponding transmissive pattern units 140a1, 140a2, and 140a3, respectively. The pattern beams B2a, B2b, and B2c are patterned to merge the combined light beams of the light combining unit 160 B2 can include both pattern beams B2a, B2b, and B2c. Alternatively, in other embodiments, the control unit 240 controls the three light sources 120 to selectively emit an illumination beam, for example, any one of the three light sources 120a, 120b, and 120c emits an illumination beam, or three light sources 120a, 120b, and 120c. Either of them emits an illumination beam, or three of the sources 120a, 120b, and 120c emit an illumination beam. In this way, the pattern beam transmitted by the light combining unit 160 can have at least one pattern combination, that is, the embodiment can provide a B2a pattern beam, a B2b pattern beam, a B2c pattern beam, a pattern beam composed of B2a and B2b, and B2a and A pattern beam composed of B2c, a pattern beam composed of B2b and B2c, and a pattern beam composed of B2a, B2b, and B2c are combined in seven patterns.

Furthermore, referring to FIG. 1A and FIG. 1B simultaneously, the projection lens 180 of the projection device 100a in the depth measurement system 100 is disposed on the transmission path of the transmitted pattern beam B2 from the light combining unit 160, and is used to The pattern beam B2 is projected onto the object to be tested 10. In the embodiment, the depth measurement system 100 further includes a calculation unit 260 electrically connected to the imaging device 220. When the projection device 100a projects the pattern light beam B2 onto the surface of the object to be tested 10, the image pickup device 220 in the depth measurement system 100 captures the pattern light beam B2 on the object to be tested 10, and can further decode the pattern light beam B2. Or use the principle of trigonometry to calculate the depth of the object to be tested 10. In the present embodiment, since the pattern unit 140 is a fixed pattern and thus the cost is low, the embodiment of the present invention can improve the operation speed and accuracy of the depth measuring system and the projection apparatus at low cost.

Referring to FIG. 1C, the pattern beam of this embodiment adopts Gray code (Gray). The arrangement of the Gray code pattern G1 to the Gray code pattern G8 may be sequentially projected onto the surface of the object 10 to be tested. However, the number of patterns encoded by the Gray code can increase or decrease the number of patterns according to the actual resolution requirements. In other embodiments, for example, nine Gray code patterns can be used, and the present invention is not limited thereto.

Referring to FIG. 1D, the three pattern beams of the present embodiment are sinusoidal periodic patterns S1, S2, and S3 which are different from each other by a specific phase difference. For example, the phase difference between the two sinusoidal periodic patterns S1, S2, and S3 is, for example, 2π/3 degrees. In addition, the sinusoidal periodic patterns S1, S2, and S3 of the present embodiment are sequentially projected onto the surface of the object 10 to be tested. However, the present invention does not limit the aspect of the pattern beam. For example, the pattern beam may also be a combination of the above patterns or other coding patterns.

In detail, referring to FIG. 1A and FIG. 1E, the three illumination light beams B1 provided by the three light sources 120 in the projection apparatus 100a of the present embodiment are respectively generated through the three pattern units 140 to have sinusoidal periodic patterns S1, S2 and S3. The pattern beams B2a, B2b, and B2c, and according to the three-step phase shift principle, the original illumination beam B1 is converted into a pattern beam B2 containing a specific coded information and structure, and then the pattern beam B2 is projected onto the surface of the object to be tested 10, and the image is captured. The device 220 can further obtain the object to be tested by extracting the image on the surface of the object to be tested 10 and transmitting the captured result to the calculating unit 260, and calculating the correspondence between the phase T′ and the height obtained by the calculation and the trigonometric principle. The surface profile of 10 or the depth of the object to be tested 10 is calculated.

2A is a schematic view of a projection apparatus of a depth measuring system in a second embodiment of the present invention. Referring to FIG. 2A, in the present embodiment, different waves emitted by the light sources 120a1, 120a2, 120b1, 120b2, 120c1, and 120c2 in the projection device 200a The illumination beams B1a, B1b, B1c, B1d, B1e, and B1f of the segment are all polarized beams. The projection device 200a further includes a plurality of light combining units 170a, 170b, and 170c, and the light combining units 170a, 170b, and 170c are polarization beam splitters, and are respectively disposed on the pattern light beams B2a, B2b, B2c, and B2d from different pattern unit pairs. The transfer path of B2e and B2f is used to transmit the pattern beam B2. The light combining units 170a, 170b, and 170c are located on the transmission path of the pattern light beam B2 between the corresponding pattern unit pair and the light combining unit 160. In detail, the pattern unit 140 is divided into a plurality of pattern unit pairs, each pattern unit pair including a transmissive pattern unit and a reflective pattern unit, that is, a pattern unit pair formed by the transmissive pattern unit 140a1 and the reflective pattern unit 140b1 The pattern unit pair formed by the transmissive pattern unit 140a2 and the reflective pattern unit 140b2 and the pattern unit pair formed by the transmissive pattern unit 140a3 and the reflective pattern unit 140b3. Further, the light source 120 has a plurality of light source pairs respectively corresponding to a plurality of pattern unit pairs. For example, a pair of light sources composed of the light source 120a1 and the light source 120a2 and the pattern unit pair formed by the transmissive pattern unit 140a1 and the reflective pattern unit 140b1 respectively correspond to each other, wherein the light source 120a1 is disposed corresponding to the reflective pattern unit 140b1, The light source 120a2 is disposed corresponding to the transmissive pattern unit 140a1; the light source pair composed of the light source 120b1 and the light source 120b2 and the pattern unit pair formed by the transmissive pattern unit 140a2 and the reflective pattern unit 140b2 respectively correspond to each other, wherein the light source 120b1 Corresponding to the transmissive pattern unit 140a2, the light source 120b2 is disposed corresponding to the reflective pattern unit 140b2; the pair of light sources composed of the light source 120c1 and the light source 120c2 and the pair of the transmissive pattern unit 140a3 and the reflective pattern unit 140b3 The pattern unit pairs correspond to each other, wherein the light source 120c1 and the reflection pattern The file unit 140b3 is correspondingly disposed, and the light source 120c2 is disposed corresponding to the transmissive pattern unit 140a3.

In the present embodiment, the light combining units 170a, 170b, and 170c are, for example, polarization splitters, and in other embodiments, the light combining units 170a, 170b, and 170c may also be polarizing beamsplitters. For example, the light source 120a1 of the present embodiment provides the illumination beam B1a, and the illumination beam B1a is, for example, polarized light having an S polarization direction. The illumination beam B1a is transmitted to the light combining unit 170a after passing through the lens 150a1. The light combining unit 170a can reflect the illumination beam B1a to the quarter wave plate 150d1, wherein the quarter wave plate 150d1 is disposed in the reflective pattern unit 140b1. Between the light combining unit 170a. Thereafter, the illumination beam B1a is transmitted to the reflective pattern unit 140b1 corresponding to the light source 120a1, the reflective pattern unit 140b1 converts the illumination beam B1a into the pattern beam B2a, and the pattern beam B2a is reflected to the quarter-wave plate 150d1 and again Through the quarter-wave plate 150d1, the light polarization direction of the pattern light beam B2a is the P polarization direction and is transmitted to the light combining unit 160 after passing through the light combining unit 170a. On the other hand, the illumination light beam B1b emitted from the other light source 120a2 belonging to the same light source pair as the light source 120a1 is a polarized light beam and its polarization direction is, for example, an S polarization direction. The illumination beam B1b passes through the lens 150a2, then passes through the transmissive pattern unit 140a1 of the corresponding pattern unit pair and is converted into the pattern beam B2b. The pattern light beam B2b is then transmitted to the light combining unit 170a and is reflected to the light combining unit 160. The pattern beam B2a and the pattern beam B2b penetrate the first beam splitting film 160b in the light combining unit 160, and both the pattern beam B2a and the pattern beam B2b are reflected by the first beam splitting film 160a in the combining unit 160 to the projection lens 180.

The illumination light beam B1c emitted by the light source 120b2 of the other light source pair is reflected by the reflective pattern unit 140b2 of the corresponding pattern unit pair into the pattern light beam B2c, and the illumination light beam B1d emitted by the other light source 120b1 of the same light source pair penetrates the phase A pattern beam B2d is formed by the transmissive pattern unit 140a2 of the corresponding pattern unit pair. In detail, the light source 120b2 supplies the illumination light beam B1c, and the illumination light beam B1c is, for example, polarized light having an S polarization direction, passes through the lens 150a4 and is transmitted to the light combining unit 170b. The illumination beam B1c in the S polarization direction is reflected by the light combining unit 170b and passes through the quarter wave plate 150d2, wherein the quarter wave plate 150d2 is disposed between the reflective pattern unit 140b2 and the light combining unit 170b. Thereafter, the illumination beam B1c is transmitted to the reflective pattern unit 140b2 corresponding to the light source 120b2, and the illumination beam B1c is converted into the pattern beam B2c by the reflective pattern unit 140b2 and passes through the quarter-wave plate 150d2 again. At this time, the light polarization direction of the pattern light beam B2c is the P polarization direction and passes through the light combining unit 170b and is transmitted to the light combining unit 160. On the other hand, the illumination light beam B1d emitted from the other light source 120b1 belonging to the same light source pair as the light source 120b2 and whose polarization direction is, for example, the S polarization direction. After the illumination beam B1d passes through the lens 150a3, it then penetrates the transmissive pattern unit 140a2 of the corresponding pattern unit pair to form the pattern beam B2d. Then, the pattern light beam B2d is transmitted to the light combining unit 170b and is reflected to the light combining unit 160. Both the pattern beam B2c and the pattern beam B2d are reflected by the second beam splitting film 160b in the combining unit 160 to the projection lens 180, and the pattern beam B2c and the pattern beam B2d penetrate the first beam splitting film 160a in the combining unit 160.

The light source 120c1 of the other pair of light sources provides the illumination beam B1e, and the illumination beam B1e is, for example, polarized light having an S polarization direction, which is transmitted after passing through the lens 150a6. To the light combining unit 170c. The illumination beam B1e of the S polarization direction is reflected by the light combining unit 170c and passes through the quarter wave plate 150d3, wherein the quarter wave plate 150d3 is disposed between the reflective pattern unit 140b3 and the light combining unit 170c. Thereafter, the illumination beam B1e is transmitted to the reflective pattern unit 140b3 corresponding to the light source 120c1, which converts the illumination beam B1e into the pattern beam B2e and is reflected by the reflective pattern unit 140b3, and the illumination beam B1e then passes through the quarter-wave plate 150d3 again. . At this time, the light polarization direction of the pattern light beam B2e is the P polarization direction and passes through the light combining unit 170c and is transmitted to the light combining unit 160. On the other hand, the illumination beam B1f emitted from the other light source 120c2 belonging to the same source pair as the light source 120c1 is a polarized beam and the polarization direction is, for example, the S polarization direction. After the illumination beam B1f passes through the lens 150a5, it penetrates the transmissive pattern unit 140a3 of the corresponding pattern unit pair to form the pattern beam B2f. The pattern light beam B2f is then transmitted to the light combining unit 170c and is reflected to the light combining unit 160. The pattern beam B2e and the pattern beam B2f pass through the first beam splitting film 160a and the second beam splitting film 160b in the light combining unit 160 and are transmitted to the projection lens 180. Based on the above, it can be seen that the depth measurement system of the present embodiment can make at least one combination of the pattern beams projected onto the object to be tested by the combination of the light sources of different wavelength bands and the pattern unit.

It should be noted that the illumination beams B1a, B1b, B1c, B1d, B1e, and B1f that provide different wavelengths for each of the above-mentioned light sources are, for example, polarized light, but the invention is not limited thereto, that is, each illumination beam may also be unpolarized. Light. In addition, since the control unit 240 controls the six light sources 120a1, 120a2, 120b1, 120b2, 120c1, and 120c2 to selectively emit illumination light beams, for example, six light sources 120a1, 120a2, 120b1. At least one of 120b2, 120c1, and 120c2 emits an illumination beam, and thus, the embodiment can provide sixty-three pattern combinations.

2B is a partial schematic view of a projection apparatus of another embodiment. Referring to FIG. 2A, the light source 120a1 provides an illumination beam B1a, wherein the illumination beam B1a is, for example, a polarized beam having a P polarization direction. The illumination beam B1a is transmitted to the light combining unit 170a after passing through the lens 150a1, and the light combining unit 170a can penetrate the light beam of the P polarization direction, so that the illumination beam B1a of the P polarization direction penetrates the light combining unit 170a and passes through the quarter wavelength. The plate 150d1, wherein the quarter-wave plate 150d1 is disposed between the reflective pattern unit 140b1 and the light combining unit 170a. Thereafter, the illumination beam B1a is transmitted to the reflective pattern unit 140b1 corresponding to the light source 120a1, and the reflective pattern unit 140b1 converts the illumination beam B1a into the pattern beam B2a and reflects the pattern beam B2a to the quarter-wave plate 150d1, the pattern beam B2a passes through the quarter-wave plate 150d1 again. At this time, the light polarization direction of the pattern beam B2a is the S-polarization direction and is reflected by the light combining unit 170a, and then can be transmitted to the subsequent light combining unit (not shown).

3 is a schematic view of a projection apparatus of a depth measuring system in a third embodiment of the present invention. Referring to FIG. 3, in the embodiment, the pattern unit 140 included in the projection apparatus 300a of the depth measurement system is the reflective pattern units 140b1, 140b2, and 140b3. In this embodiment, the light combining unit 160 includes a first dichroic film 160a and a second dichroic film 160b, and the light combining unit 170 is, for example, a color separation X稜鏡. However, in another embodiment, the light combining unit 170 may be For the color separation X board. The light combining unit 170 is disposed on the transmission paths of the illumination light beams B1a, B1b, and B1c from the light sources 120a, 120b, and 120c to pass the illumination light beams B1a passing through the lenses 150a1, 150a2, and 150a3, respectively. B1b and B1c are combined into an illumination beam B1', and the illumination beam B1' is transmitted to the vicinity of point A of the internal total reflection 稜鏡190, since the incident angle of the illumination beam B1' and the incident path are incident through the appropriate design of the illumination beam B1' The angle is greater than the critical angle such that the illumination beam B1' is totally reflected to the vicinity of the point B in the light combining unit 160.

In addition, the wavelength bands of the illumination beams B1a, B1b, and B1c emitted by each of the light sources 120a, 120b, and 120c in this embodiment are different, and the wavelength bands of the illumination beams B1a, B1b, and B1c are, for example, the first band and the second band, respectively. And the third band. The first band, the second band, and the third band of the embodiment are respectively blue, green, and red, but the invention is not limited thereto. For example, the first band, the second band, and the third band are also Other combinations of blue, green, and red can be used. In this embodiment, the first dichroic film 160a in the light combining unit 160 can reflect the light beam of the third wavelength band and penetrate the light beam of the first wavelength band and the second wavelength band. However, in other embodiments, the first minute The color film 160a can reflect the light beam of the second wavelength band and penetrate the light beams of the first wavelength band and the third wavelength band; or the first color separation film 160a can also reflect the light beam of the first wavelength band and make the second wavelength band and the third wavelength band The beam penetration of the band is not limited by this invention. In addition, since the second dichroic film 160b in the light combining unit 160 of the present embodiment can reflect the light beam of the third wavelength band and penetrate the light beam of the second wavelength band, when the illumination light beam B1' is transmitted to the first color separation film When the vicinity of the point B in 160a, the illumination beam B1c of the third wavelength band in the illumination beam B1' is reflected by the first dichroic film 160a to the vicinity of the point C in the light combining unit 160, and the incident angle of the illumination beam B1c is greater than the critical angle. Therefore, the illumination beam B1c is totally reflected to the reflective pattern unit 140b1, and the illumination beam B1c is converted into the pattern beam B2c by the reflective pattern unit 140b1 and reflected back to the first point. The vicinity of the point D of the color film 160a. Then, the pattern light beam B2c is reflected again near the point D and is transmitted to the outside of the light combining unit 160.

On the other hand, the first band and the second band in the illumination beam B1' penetrate the first dichroic film 160a near the point B and are transmitted to the vicinity of the point E on the second dichroic film 160b, and the second dichroic film The 160b reflects the illumination beam B1a of the first band in the illumination beam B1' and penetrates the illumination beam B1b of the second band. Further, the illumination beam B1b penetrates the second dichroic film 160b near the point E and is transmitted to the reflective pattern unit 140b2, and the illumination beam B1b is converted into the pattern beam B2b by the reflective pattern unit 140b2 and reflected back to the second point. The vicinity of the point H of the color film 160b. Next, the pattern beam B2b penetrates the second dichroic film 160b at a point H and penetrates the first dichroic film 160a near the point D and is transmitted to the outside of the light combining unit 160.

In addition, the illumination beam B1a of the first wavelength band is reflected near the point E on the second dichroic film 160b to the vicinity of the point F on the first dichroic film 160a. Since the incident angle of the illumination beam B1a is greater than the critical angle at this time, the illumination beam B1a is totally reflected to the reflective pattern unit 140b3 near the point F. The illumination beam B1a is converted into the pattern beam B2a by the reflective pattern unit 140b3 and is again reflected by the reflective pattern unit 140b3 to the vicinity of the point G on the first dichroic film 160a, and at this time again because the incident angle of the pattern beam B2a is larger than the critical angle The pattern beam B2a is totally reflected to the vicinity of the point H on the second dichroic film 160b, and the second dichroic film 160b transmits the pattern beam B2a to the vicinity of the point D of the first dichroic film 160a, and then the pattern beam B2a is at the point D. The first dichroic film 160a is penetrated nearby and is transmitted to the outside of the light combining unit 160.

Based on the above, the pattern beam B2' is transmitted to the outside of the light combining unit 160. The pattern beams B2a, B2b, and B2c are included and penetrate the internal total reflection 稜鏡190, and then transferred to the projection lens 180. In addition, the depth measurement system in this embodiment further includes a control unit 240 electrically connected to the light sources 120a, 120b, and 120c to control the combination of illumination of the respective light sources. For example, in this embodiment, the control unit 240 may control the light sources 120a, 120b, and 120c to simultaneously provide the illumination beams B1a, B1b, and B1c; or may control both of the light sources 120a, 120b, and 120c to simultaneously provide the illumination beam; Alternatively, one of the light sources 120a, 120b, and 120c can be controlled to provide an illumination beam. In this embodiment, expensive components such as a digital micromirror device, a 矽-based liquid crystal panel, a transmissive liquid crystal panel or other spatial light modulators are not required, and an motivating member for switching the slides is not required. . The contour or depth of the object to be tested can be obtained by capturing the image of the pattern beam projected onto the object to be tested.

4 is a schematic view of a projection apparatus of a depth measuring system in a fourth embodiment of the present invention. Referring to FIG. 4, in the embodiment, the projection device 400a in the depth measurement system includes a light source 120, a pattern unit 140a, and a projection lens 180. In this embodiment, the light source 120 is, for example, a light emitting diode or other non-coherent light source, that is, the light source 120 may not be a laser light source, wherein the light source 120 provides the illumination light beam B1. The pattern unit 140a is a transmissive pattern unit. The projection device 400a of the present embodiment can have a single pattern unit 140a and can be achieved by controlling the single light source 120 through the control unit 240, thereby reducing production costs.

In summary, the embodiment of the present invention has at least one of the following advantages: in the depth measurement system and the projection device of the embodiment of the present invention, by combining different illumination combinations of the light source and the pattern unit, the projection can be performed. Pattern beam has A variety of different combinations. In the embodiment of the present invention, the depth measuring system and the projection device can have a plurality of combinations of pattern beams projected onto the object to be tested by using light sources of different wavelength bands in combination with corresponding pattern units. Since the pattern unit is a fixed pattern with a lower cost and does not require expensive components such as a digital micromirror device, a germanium-based liquid crystal panel, a transmissive liquid crystal panel, or other spatial light modulators, A modifiable component for switching slides. By capturing the image of the pattern beam projected onto the object to be tested, the contour or depth of the object to be tested can be obtained, and the characteristics of low cost, high precision, and rapid measurement are obtained.

The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention are All remain within the scope of the invention patent. In addition, any of the objects or advantages or features of the present invention are not required to be achieved by any embodiment or application of the invention. In addition, the abstract sections and headings are only used to assist in the search of patent documents and are not intended to limit the scope of the invention.

100a‧‧‧Projector

120, 120a, 120b, 120c‧‧‧ light source

B1, B1a, B1b, B1c‧‧‧ illumination beam

B2, B2a, B2b, B2c‧‧‧ pattern beam

140, 140a1, 140a2, 140a3‧‧‧ pattern unit

150a1, 150a2, 150a3‧‧ lens

150b1, 150b3‧‧‧ mirror

160‧‧‧Finishing unit

160a‧‧‧first color separation film

160b‧‧‧Second color separation film

180‧‧‧Projection lens

240‧‧‧Control unit

Claims (17)

A projection device, comprising: a plurality of light sources, providing a plurality of illumination beams; a plurality of pattern units, and correspondingly disposed on the plurality of transmission paths of the illumination beams to convert the illumination beams into a plurality of pattern beams; a projection lens disposed on a transmission path of the pattern beams, wherein the light sources provide at least one illumination combination, the pattern beams correspondingly having at least one pattern combination; a first light combining unit disposed on the The transmission paths of the illumination beam; and an internal total reflection 配置 are disposed on the transmission paths of the illumination beams and the pattern beams. The projection device of claim 1, wherein the pattern units comprise at least one of at least one transmissive pattern unit or at least one reflective pattern unit. The projection device of claim 1, wherein the pattern units are divided into a plurality of pattern unit pairs, each of the pattern unit pairs comprising a transmissive pattern unit and a reflective pattern unit, wherein the plurality of light sources are divided into Pair of light sources, the pair of light sources respectively corresponding to the pair of pattern elements, each of the light sources One of the pair of light sources corresponds to the corresponding reflective pattern unit of the pair of pattern elements, and the other of the light source pairs corresponds to the corresponding transmissive pattern unit of the pair of pattern elements. The projection device of claim 1, wherein the light sources comprise a laser light source, a light emitting diode, an organic light emitting diode, a mercury lamp, a halogen lamp, or a combination thereof. The projection device of claim 1, wherein the illumination beams are different in color. The projection device of claim 1, further comprising a control unit electrically connected to the light sources to control the combination of illumination of the light sources. The projection device of claim 1, further comprising: a second light combining unit disposed on the transmission paths of the pattern beams and configured to combine the pattern beams. The projection device of claim 7, wherein the second light combining unit comprises a color separation X 稜鏡, a color separation X plate, a polarization split 稜鏡 or a polarization beam splitter. A depth measurement system adapted to measure a depth of a test object, the depth measurement system comprising: a projection device comprising: a plurality of light sources, providing a plurality of illumination beams; a plurality of pattern units, and correspondingly disposed on the plurality of transmission paths of the illumination beams to convert the illumination beams into a plurality of pattern beams; a projection lens disposed on a transmission path of the pattern beams, the projection lens for projecting the pattern beams onto the object to be tested to form a reference pattern on the object to be tested; a unit disposed on the transmission paths of the illumination beams; and an internal total reflection 稜鏡 disposed on the transmission paths of the illumination beams and the pattern beams; and an imaging device for capturing The reference pattern can be used to calculate the depth of the object to be tested, wherein the light sources provide at least one combination of illuminations, the pattern beams correspondingly having at least one pattern combination. The depth measuring system of claim 9, wherein the pattern units comprise at least one of at least one transmissive pattern unit or at least one reflective pattern unit. Such as the depth measurement system described in claim 9 of the patent scope, The pattern unit is divided into a plurality of pattern unit pairs, each of the pattern unit pairs includes a transmissive pattern unit and a reflective pattern unit, and the light sources are divided into a plurality of light source pairs, and the pair of light sources are respectively opposite to the pattern unit Correspondingly, one of the light source pairs corresponds to the corresponding reflective pattern unit of the pair of pattern elements, and the other of the light source pairs and the corresponding pair of the pattern unit are transparent. The pattern unit corresponds. The depth measuring system of claim 9, wherein the light sources comprise a laser light source, a light emitting diode, an organic light emitting diode, a mercury lamp, a halogen lamp or a combination thereof. The depth measurement system of claim 9, wherein the illumination beams are different in color. The depth measurement system of claim 9, further comprising a control unit electrically connected to the light sources to control the combination of illumination of the light sources. The depth measuring system of claim 9, further comprising a computing unit electrically connected to the camera device, and configured to calculate the object to be tested according to the reference pattern captured by the camera device depth. The depth measuring system of claim 9, further comprising: a second light combining unit disposed on the transmission paths of the pattern beams and configured to combine the pattern beams. The depth measuring system of claim 16, wherein the second light combining unit comprises a color separation X 稜鏡, a color separation X plate, a polarization split 稜鏡 or a polarization beam splitter.