TWI456725B - Semiconductor device with a plurality of mark through substrate vias - Google Patents

Semiconductor device with a plurality of mark through substrate vias Download PDF

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Publication number
TWI456725B
TWI456725B TW099140104A TW99140104A TWI456725B TW I456725 B TWI456725 B TW I456725B TW 099140104 A TW099140104 A TW 099140104A TW 99140104 A TW99140104 A TW 99140104A TW I456725 B TWI456725 B TW I456725B
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Taiwan
Prior art keywords
original
pillars
conducting
conductive
semiconductor device
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TW099140104A
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Chinese (zh)
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TW201222758A (en
Inventor
Chi Chih Shen
Jen Chuan Chen
Hui Shan Chang
Chung Hsi Wu
Meng Jen Wang
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Advanced Semiconductor Eng
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Priority to TW099140104A priority Critical patent/TWI456725B/en
Publication of TW201222758A publication Critical patent/TW201222758A/en
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Publication of TWI456725B publication Critical patent/TWI456725B/en

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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Claims (10)

一種具有標記導通柱之半導體裝置,包括:一半導體基板,具有一正面及一背面;複數個原始導通柱,位於該半導體基板內,其中該等原始導通柱包括複數個第一原始導通柱及複數個第二原始導通柱,該等第一原始導通柱係排列成一第一陣列,該等第二原始導通柱係排列成一第二陣列,二相鄰第一原始導通柱間之間距係定義為一第一間距,二相鄰第二原始導通柱間之間距係定義為一第二間距;且複數個標記導通柱,位於該半導體基板內且顯露於該背面,其中該等標記導通柱包括複數個第一標記導通柱及複數個第二標記導通柱,該等第一標記導通柱係排列成一第一群組,該等第二標記導通柱係排列成一第二群組,該第一群組係位於靠近該第一陣列的位置,該第二群組係位於靠近該第二陣列的位置,二相鄰第一標記導通柱間之間距係定義為一第三間距,最靠近該等第一標記導通柱之該第一原始導通柱及該第一標記導通柱間之間距係定義為一第四間距,二相鄰第二標記導通柱間之間距係定義為一第五間距,最靠近該等第二標記導通柱之該第二原始導通柱及該第二標記導通柱間之間距係定義為一第六間距,其中該第三間距不等於該第四間距,該第三間距及該第四間距皆不可被該第一間距整除,該第五間距不等於該第六間距,且該第五間距及該第六間距皆不可被該第二間距整除。A semiconductor device having a labeled via, comprising: a semiconductor substrate having a front side and a back side; a plurality of original conducting pillars located in the semiconductor substrate, wherein the original conducting pillars comprise a plurality of first original conducting pillars and a plurality a second original conducting pillar, the first original conducting pillars are arranged in a first array, the second original conducting pillars are arranged in a second array, and the distance between two adjacent first original conducting pillars is defined as a a first pitch, a distance between two adjacent second conductive vias is defined as a second pitch; and a plurality of mark vias are located in the semiconductor substrate and are exposed on the back surface, wherein the mark conductive pillars comprise a plurality of a first labeled conductive column and a plurality of second labeled conductive posts, the first labeled conductive pillars are arranged in a first group, and the second labeled conductive pillars are arranged in a second group, the first group is Located at a position close to the first array, the second group is located near the second array, and the distance between two adjacent first labeled conductive columns is defined as a third spacing The distance between the first original conducting pillar and the first marking conducting pillar closest to the first marking conducting pillars is defined as a fourth spacing, and the distance between two adjacent second marking conducting pillars is defined as a first The fifth spacing, the distance between the second original conducting post and the second marking conducting post closest to the second marking conducting posts is defined as a sixth spacing, wherein the third spacing is not equal to the fourth spacing, The third pitch and the fourth pitch are not divisible by the first pitch, and the fifth pitch is not equal to the sixth pitch, and the fifth pitch and the sixth pitch are not divisible by the second pitch. 如請求項1之半導體裝置,其中該半導體裝置係為一半導體晶圓或一半導體晶片。The semiconductor device of claim 1, wherein the semiconductor device is a semiconductor wafer or a semiconductor wafer. 如請求項1之半導體裝置,其中該等原始導通柱係為可導電的,且該等標記導通柱係為不具功能的。The semiconductor device of claim 1, wherein the original conductive pillars are electrically conductive, and the labeled conductive pillars are non-functional. 如請求項1之半導體裝置,其中該等原始導通柱及該等標記導通柱係皆為可導電的。The semiconductor device of claim 1, wherein the original conductive pillars and the labeled conductive pillars are electrically conductive. 如請求項1之半導體裝置,其中該第一群組係位於靠近該第一陣列之一角落的位置。The semiconductor device of claim 1, wherein the first group is located near a corner of the first array. 如請求項1之半導體裝置,其中該等第一標記導通柱係排列成至少一第一標記列,該等第一原始導通柱係排列成至少一第一原始列,且該第一標記列及該第一原始列位於同一列。The semiconductor device of claim 1, wherein the first mark conductive pillars are arranged in at least one first mark row, the first original conductive pillars are arranged in at least one first original column, and the first mark column and The first original column is in the same column. 如請求項1之半導體裝置,其中該等第一標記導通柱係排列成至少一第一標記行,該等第一原始導通柱係排列成至少一第一原始行,且該第一標記行及該第一原始行位於同一行。The semiconductor device of claim 1, wherein the first mark conducting pillars are arranged in at least one first marking row, the first original conducting pillars are arranged in at least one first original row, and the first marking row and The first original line is on the same line. 一種具有標記導通柱之半導體裝置,包括:一半導體基板,具有一正面及一背面;複數個原始導通柱,位於該半導體基板內,其中該等原始導通柱係排列成複數個原始陣列,每一該等原始陣列具有一原始圖案;且複數個標記導通柱,位於該半導體基板內及顯露於該背面,其中該等標記導通柱包括複數個第一標記導通柱及複數個第二標記導通柱,該等第一標記導通柱係排列成一第一圖案以形成一第一群組,該等第二標記導通柱係排列成一第二圖案以形成一第二群組,該第一群組係位於該背面之一第一角落,該第二群組係位於該背面之一第二角落,該第一角落係相對於該第二角落,且該第一圖案及該第二圖案皆不同於該原始圖案。A semiconductor device having a labeled via, comprising: a semiconductor substrate having a front side and a back side; a plurality of original conducting pillars located in the semiconductor substrate, wherein the original conducting pillars are arranged in a plurality of original arrays, each The original array has an original pattern; and a plurality of mark conductive pillars are disposed in the semiconductor substrate and exposed on the back surface, wherein the mark conductive pillars comprise a plurality of first mark conductive pillars and a plurality of second mark conductive pillars, The first labeled conductive pillars are arranged in a first pattern to form a first group, and the second labeled conductive pillars are arranged in a second pattern to form a second group, the first group is located in the first group a first corner of the back surface, the second group is located at a second corner of the back surface, the first corner is opposite to the second corner, and the first pattern and the second pattern are different from the original pattern . 如請求項8之半導體裝置,其中該等原始導通柱係為可導電的,且該等標記導通柱係為不具功能的。The semiconductor device of claim 8, wherein the original conductive pillars are electrically conductive, and the labeled conductive pillars are non-functional. 如請求項8之半導體裝置,其中該第一圖案係為十字形圖案或L形圖案。The semiconductor device of claim 8, wherein the first pattern is a cross-shaped pattern or an L-shaped pattern.
TW099140104A 2010-11-19 2010-11-19 Semiconductor device with a plurality of mark through substrate vias TWI456725B (en)

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TW099140104A TWI456725B (en) 2010-11-19 2010-11-19 Semiconductor device with a plurality of mark through substrate vias

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TWI456725B true TWI456725B (en) 2014-10-11

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6239482B1 (en) * 1999-06-21 2001-05-29 General Electric Company Integrated circuit package including window frame
US6271469B1 (en) * 1999-11-12 2001-08-07 Intel Corporation Direct build-up layer on an encapsulated die package
US6399418B1 (en) * 2001-07-26 2002-06-04 Amkor Technology, Inc. Method for forming a reduced thickness packaged electronic device
US6506632B1 (en) * 2002-02-15 2003-01-14 Unimicron Technology Corp. Method of forming IC package having downward-facing chip cavity
US20040087043A1 (en) * 2001-10-30 2004-05-06 Asia Pacific Microsystems, Inc. Package structure and method for making the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6239482B1 (en) * 1999-06-21 2001-05-29 General Electric Company Integrated circuit package including window frame
US6271469B1 (en) * 1999-11-12 2001-08-07 Intel Corporation Direct build-up layer on an encapsulated die package
US6399418B1 (en) * 2001-07-26 2002-06-04 Amkor Technology, Inc. Method for forming a reduced thickness packaged electronic device
US20040087043A1 (en) * 2001-10-30 2004-05-06 Asia Pacific Microsystems, Inc. Package structure and method for making the same
US6506632B1 (en) * 2002-02-15 2003-01-14 Unimicron Technology Corp. Method of forming IC package having downward-facing chip cavity

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