TWI425311B - Photosensitive resin composition, laminate comprising the same, cured product of the same and method for forming pattern using the same(3) - Google Patents

Description

Photosensitive resin composition, laminate thereof, cured product thereof, and formation method of pattern using the same (3)

The present invention relates to a photosensitive resin composition capable of forming a high resolution, high aspect ratio pattern, a laminate thereof, a cured product thereof, and a method of forming a pattern using the composition.

The photoresist of photolithographic processing has recently been widely used in semiconductor or MEMS (Micro Electro Mechanical Systems) applications. This photolithography process is performed by patterning exposure on a substrate, followed by development. The liquid is developed to selectively remove the exposed or non-exposed areas. The photo-resistance (photoresist) that can be photolithographically processed has a positive or negative type, and is positively dissolved in the developing solution by exposure, and negative in insoluble. The advanced electropackage application requires a high aspect ratio. On the other hand, MEMS applications require uniform spin coating film formation and a thick film of 100 μm or more to maintain a straight shape, and high aspect ratio and photolithography. Light resistance. Among them, the aspect ratio is represented by the photoresist film thickness/pattern line width, and is an important characteristic indicating the performance of photolithography.

The prior art positive photoresist based on the naphthoquinone-novolac reaction is not suitable for applications requiring a thick film of 50 μm or more, and has a limit when thick filming, because it is generally used for photoresist exposure. The dinaphthoquinone type (DNQ) photoreactant having a wavelength in the near ultraviolet region (350 to 450 nm) has a relatively high light absorption, and the DNQ type photoresist is different in solubility due to the specificity of the exposed region and the non-exposed region in the developer. The shape of the side wall is not linear but instead presents a slanted shape. The light intensity can be gradually reduced by the light absorption at the top to the bottom of the film, but if the light absorption is too high, the bottom of the photoresist appears to be underexposed in comparison with the top, so that the side wall shape may have an inclined shape or a skewed shape.

Negative chemically enhanced thick film photolithographic composition, known to have very low light absorption in the 350-450 nm wavelength range, consisting of a polyfunctional bisphenol A novolac epoxy resin ( Resolution Polymer Product EPON SU-8 resin), photo-cationic polymerization initiator of CYRACURE UVI-6974 manufactured by Dow Chemical (this photo-cationic polymerization initiator is a propylene carbonate solution of aromatic hexafluoroantimonate) The photoresist composition is applied to various substrates by spin coating or curtain coating, and then the solvent is volatilized by baking to form a solid photoresist having a thickness of 100 μm or more. The layer is further subjected to photolithography by irradiating the near-ultraviolet light through a mask, and then using various exposure methods such as contact exposure, proximity exposure, and projection exposure, and then immersing in the developer to dissolve the non-exposed area. A negative image of the high resolution mask is formed on the substrate.

EPON SU-8 resin is a low molecular weight epoxy oligomer with excellent characteristics in thick film and high aspect ratio photolithography. (i) high epoxy functional group, (ii) high branching Degree, (iii) high transmittance of 350 to 450 nm, (iv) low molecular weight necessary for formation of solids; high epoxy functional group and high branching degree cause sufficient crosslinking under strong acid catalyst, high transmittance The system penetrates the thick film and is uniformly irradiated with light, and has a resistive property of forming a thick film of 100 μm or more and having an aspect ratio of 10 or more. Selecting a resin having a high epoxy functional group number and a high degree of branching is an important item for forming a side wall having a straight line and a structure having a high aspect ratio; selecting a low molecular weight resin can be formed on the substrate by a minimum number of coating stages. Thick film photoresist solid layer.

A photocationic polymerization initiator based on a phosphonium salt or an iodonium salt is well known, and a useful photocationic polymerization initiator having a suitable absorbance is disclosed, which contains a carbonyl-p-phenylene sulfide (Patent Document 1) And 2), and may also add a sensitizer such as 2-alkyl-9,10-dimethoxyanthracene or other anthracene, naphthalene, beryl or pyrryl compound, or may be introduced into the photo-induced Cationic polymerization initiator (Patent Document 3).

Negative photoresists based on compounds suitable for spin coating as disclosed above are sold by MICRO CHEM, in particular commercially used in MEMS device parts. For example, the "SU-8 series" supplied by MICRO CHEM is spin-coated at 1000 to 3000 rpm in order to form a film of 30 to 100 μm thick, followed by exposure. After development, a pattern having a film thickness of 100 μm or more and an aspect ratio of 10 or more can be formed.

The use of a dry film photoresist coated on a substrate such as a polyester film is also disclosed (Patent Document 4).

A composition for a photosensitive cationically polymerizable flame retardant suitable for use as a solder mask (Patent Documents 5, 6, and 7) is disclosed, which is composed of 10 to 80% by weight of bisphenol A and epichlorohydrin. a mixture of condensates, starting from 20 to 90% by weight of bisphenol A novolac epoxy resin, 35 to 50% by weight of epoxidized tetrabromobisphenol A, 0.1 to 15% by weight of photocationic polymerization The composition of the agent.

Also disclosed are photopolymerizable compounds based on a hydroxyl group-containing additive, a photocationic polymerization initiator, and an epoxy resin having a functional group number of 1.5 or more, and a hydroxyl group-containing additive has been reported to increase flexibility or decrease 100. Stress of a thick film having a thickness of μm or more (Patent Document 8).

Patent Document 9 discloses a method of producing a hard epoxy resin in an EB-curable application, in which the main improvement point is the friability of the epoxy resin which is hardened by irradiation, and most of the structures or consumables are used. Resin (epoxy resin), in order to withstand years of strict use, must have sufficient strength and impact resistance, which reveals a wide range of tough materials including SU-8 resin, regarding the increased strength, in Patent Document 9 The effectiveness of the invention of the claims is expressed by the fracture toughness and the flexural modulus, which are composed of various thermoplastic plastics, hydroxyl-containing thermoplastic oligomers, epoxy-containing thermoplastic oligomers, and reactions. Sexual softness, elastomer, rubber and a mixture of these. However, the composition described in Patent Document 9 is applied to a composition of a film that is imaged by non-pattern EB irradiation, and is patterned by UV, X-ray, or EB irradiation. The properties of the substance cannot be used as a reference for sensitized use.

Many proposals have been made for an epoxy-containing photoresist composition (Patent Document 10) in which, for example, the necessity of modulating a photoresist composition suitable for a spin coating method is required, and rheological properties are required, plus here. The composition must have sufficient transmittance for exposure irradiation such as photodegradation of the photoinitiator after passing through the film thickness. Further, in order to withstand various applications, the photoresist composition must have appropriate physical and chemical properties such as solder resistance or ink resistance, deterioration of strength, or deterioration of adhesion. If the photoresist composition is used for other purposes such as etching photoresist, other characteristics are required, but the specific epoxy resin that satisfies all of the various requirements is currently absent, and many different combinations have been disclosed. Or a mixture of various epoxy resins, the well-known patents describe various resins and photoinitiators for photohardenable compositions, most of which are photosensitive photoresists suitable for permanent film applications, but these are all The composition that we are trying to accomplish that is most suitable for MEMS applications is not disclosed. In fact, most examples of plasticizers, softeners, and tougheners can degrade lithography performance.

[Patent Document 1] USP 5,502,082, [Patent Document 2] USP 6368769 [Patent Document 3] USP 5102772 [Patent Document 4] USP 4882245 [Patent Document 5] USP 5026624 [Patent Document 6] USP5278010 [Patent Document 7] USP 5304457 [Patent Document 8] USP 4256828 [Patent Document 9] USP 5726216 [Patent Document 10] USP 5264325

A photosensitive resin composition of the prior art using a polyfunctional epoxy resin such as a novolac type epoxy resin, because the photocationic polymerization initiator contained therein has low sensitivity and requires a large amount of an initiator, In a short period of time, the reticle pattern faithfully reproduces the problem of the resin pattern. In addition, the photo-cationic polymerization initiator containing SbF ₆ ^- is relatively high-sensitivity, but it may be used for its toxicity problem. Restricted issues.

The present invention has been made in view of the above-described problems of the prior art, and an object of the invention is to provide a photosensitive resin composition which can form a pattern having high resolution and a high aspect ratio and which has high sensitivity and low toxicity.

In order to solve the above problems, the inventors of the present invention have repeatedly studied, experimented, and reviewed the results of high sensitivity and high resolution of the photosensitive resin composition, and found that a specific polyfunctional epoxy resin and a specific photocation are combined. The polymerization initiator prepares a photosensitive resin composition, and when the photosensitive resin composition is used to form a resin pattern, a resin pattern having high sensitivity and a high aspect ratio can be formed. That is, the constitution of the present invention is as follows.

(1) A photosensitive resin composition comprising a photocationic polymerization initiator (A) of ruthenium (pentafluoroethyl)trifluorophosphonate and a polyfunctional epoxy represented by the following formula (1) Made of resin (B).

(The epoxy group in the formula may be a bisphenol A type epoxy resin or a polymer polymerized with a bisphenol A novolak type epoxy resin, and n represents an average value and is an integer of 0 to 30.)

(2) The photosensitive resin composition according to the above (1), wherein the photocationic polymerization initiator (A) is a compound (A-1) represented by the following formula (2).

(3) The photosensitive resin composition according to the above (1) or (2), which contains a reactive epoxy monomer (C).

(4) The photosensitive resin composition according to any one of the above (1) to (3), wherein the solid content of the photosensitive resin composition containing the solvent (D) is 5 to 95% by weight. .

(5) A photosensitive resin composition laminate according to any one of the above (1) to (4), wherein the photosensitive resin composition according to any one of the above (1) to (4) is used.

(6) A cured product comprising the photosensitive resin composition according to any one of the above (1) to (4).

(7) A pattern forming method comprising the photosensitive resin composition layer obtained by applying the photosensitive resin composition according to any one of the above (1) to (4) to a desired support. After drying, the film is exposed according to a predetermined pattern, baked after exposure, and the resin composition layer is developed, and the obtained resin pattern is heat-treated to obtain a cured resin pattern of a predetermined shape.

(8) A pattern forming method comprising the photosensitive resin composition layer remaining after the substrate is removed from the laminate according to the above (5), laminated on the desired support, and laminated. The photosensitive resin composition layer is exposed to a predetermined pattern, baked after exposure, and the resin composition layer is developed, and the obtained resin pattern is heat-treated to obtain a cured resin pattern having a predetermined shape.

[Best Practice for Carrying Out the Invention]

Embodiments of the present invention will be described below.

The photosensitive resin composition of the present invention is characterized in that it contains a photo-cationic polymerization initiator (A) of a salt of cerium (pentafluoroethyl)trifluorophosphate ion of cerium, and is represented by the above general formula (1) The polyfunctional epoxy resin (B) can form a resin pattern having high sensitivity and a high aspect ratio, and the ability to form the above resin pattern is not deteriorated, and the characteristics which can be exhibited for a long period of time can be imparted. There are various possibilities for such combinations, but in particular, a photo-cationic polymerization initiator of a bisphenol A novolak type epoxy resin (EPON SU-8 resin manufactured by Resolution Performance Product) and a compound represented by the above formula (2) The best combination.

The photocationic cationic polymerization initiator of the present invention is subjected to irradiation with radiation of excimer laser, X-ray, electron beam or the like of ultraviolet rays, far ultraviolet rays, KrF, ArF or the like to generate cations, and the cation can be polymerized. The compound of the starting agent.

The photocationic polymerization initiator (A) is ruthenium (pentafluoroethyl)trifluorophosphate.

The ruthenium of the photocationic polymerization initiator may, for example, be triphenylsulfonium, tri-p-methylphenylphosphonium, tri-o-methylphenylphosphonium, stilbene (4-methoxyphenyl)fluorene or 1-naphthyl. Diphenyl hydrazine, 2-naphthyldiphenyl fluorene, stilbene (4-fluorophenyl) fluorene, tri-1-naphthyl anthracene, tri-2-naphthyl anthracene, ginseng (4-hydroxyphenyl) fluorene, 4-(phenylthio)phenyldiphenylphosphonium, 4-(p-tolylthio)phenyldi-p-methylphenyl, 4-(4-methoxyphenylthio)phenyl bis (4 -Methoxyphenyl)anthracene, 4-(phenylthio)phenylbis(4-fluorophenyl)anthracene, 4-(phenylthio)phenylbis(4-methoxyphenyl)anthracene, 4 -(phenylthio)phenyldi-p-tolylhydrazine, bis[4-(diphenylfluorenyl)phenyl] sulfide, bis[4-(bis[4-(2-hydroxyethoxy)) Phenyl]fluorenyl)phenyl] sulfide, bis(4-[bis(4-fluorophenyl)indenyl]phenyl) sulfide, bis(4-[bis(4-methylphenyl)fluorenyl) Phenyl) thioether, bis(4-[bis(4-methoxyphenyl)indenyl]phenyl) sulfide, 4-(4-benzylidene-4-chlorophenylthio)phenyl double (4-fluorophenyl)indole, 4-(4-benzoguanidine-4-chlorophenylsulfanyl)phenyldiphenylphosphonium, 4-(4-benzamide) Phenylthio)phenylbis(4-fluorophenyl)anthracene, 4-(4-benzylidenephenylthio)phenyldiphenylphosphonium, 4-isopropyl-4-oxo-10-thio- 9,10-dihydroinden-2-yldi-p-methylphenyl, 7-isopropyl-9-oxo-10-thia-9,10-dihydroindol-2-yldi-phenyl Bismuth, 2-[(di-p-methylphenyl)indolyl]thioxanthone, 2-[(diphenyl)indenyl]thioxanthone, 4-[4-(4-tert-butylbenzhydrazide) Phenylthio]phenyldi-p-tolylhydrazine, 4-[4-(4-tert-butylbenzylidene)phenylsulfonyl]phenyldiphenylphosphonium, 4-[4-(phenylene) Phenylphenylsulfanyl]]phenyldi-p-tolylhydrazine, 4-[4-(benzimidinophenylthio)]phenyldiphenylphosphonium, 5-(4-methoxyphenyl)thiazepine Anthrenium, 5-phenylthiaanthenium, 5-tolylthiaanthenium, 5-(4-ethoxyphenyl)thiaanthenium, 5-(2,4,6-trimethylphenyl)sulfide Triaryl hydrazine of anthrenium, etc.; diaryl hydrazine of diphenylphenylhydrazine methyl hydrazine, diphenyl 4-nitrophenylhydrazine methyl hydrazine, diphenylbenzyl hydrazine, diphenylmethyl hydrazine, etc.; benzene Methylbenzyl hydrazine, 4-hydroxyphenylmethylbenzyl , 4-methoxyphenylmethylbenzyl hydrazine, 4-ethyl hydrazine carbonyl phenyl methyl benzyl hydrazine, 2-naphthylmethyl benzyl hydrazine, 2-naphthylmethyl (1-ethoxyl) Carbonyl)ethylhydrazine, phenylmethylphenylhydrazinemethylhydrazine, 4-hydroxyphenylmethylphenylhydrazinemethylhydrazine, 4-methoxyphenylmethylphenylhydrazinemethylhydrazine, 4-ethylhydrazinecarbonyl oxidation Phenylmethylphenylhydrazine methylhydrazine, 2-naphthylmethylphenylhydrazinemethylhydrazine, 2-naphthyloctadecylphenylhydrazinemethylhydrazine, 9-fluorenylmethylphenylhydrazinemethylhydrazine, etc. Aryl hydrazine; dimethyl phenyl hydrazine methyl hydrazine, benzoquinone methyl tetrahydrothiophene hydrazine, dimethyl benzyl hydrazine, benzyl tetrahydrothiophene hydrazine, octadecyl methyl benzoquinone methyl hydrazine, etc. Alkyl hydrazine and the like. These are described in the following documents.

Examples of the triaryl sulfonium include U.S. Patent No. 4,231,951, U.S. Patent No. 4,256,828, Japanese Patent Publication No. 4-61964, Japanese Patent Application No. Hei 8-165290, No. Hei No. Hei 7-10914, No. Hei 7-25922, and JP-A-8 -27208, special Kaiping 8-27209, special Kaiping 8-165290, special Kaiping 8-301991, special Kaiping 9-143212, special Kaiping 9-278813, special Kaiping 10-7680, special Kaiping 10- 287643, special Kaiping 10-245378, special Kaiping 8-157510, special Kaiping 10-204083, special Kaiping 8-245566, special Kaiping 8-157451, special Kaiping 7-324069, special Kaiping 9-268205 No. 9-278935, special opening 2001-288205, special Kaiping 11-80118, special Kaiping 10-182825, special Kaiping 10-330353, special Kaiping 10-152495, special Kaiping 5-239213 Japanese Patent Application Laid-Open No. Hei 7-333834, No. Hei 9-12537, No. Hei 8-325259, No. Hei 8-160606, No. 2000-186071 (U.S. Patent No. 6,368,769), and the like; For example, JP-A-7-300504, JP-A-64-45357, JP-A-63-29419, etc.; Examples of the monoaryl hydrazine include JP-A-6-345726, JP-A-8-325225, JP-A-9-118663 (U.S. Patent No. 6,093,537), JP-A No. 2-196812, and JP-A No. 2-1470. Special Kaiping No. 2-196812, Special Kaiping No. 3-237107, Special Kaiping No. 3-17101, Special Kaiping No. 6-228086, Special Kaiping No. 10-152469, Special Kaiping No. 7-300505, Special Open 2003-277353, Special Japanese Patent Publication No. 2003-277352, etc.; for the trialkyl sulfonium, JP-A-4-308563, JP-A-5-14010, JP-A-5-140209, JP-A-5-230189, JP-A-6-271532, JP-A-58-37003, Special Kaiping 2-178303, Special Kaiping 10-338688, Special Kaiping 9-328506, Special Kaiping 11-228534, Special Kaiping 8-27102, and Special Kaiping 7-333834, Japanese Laid-Open Patent Publication No. Hei 5-222167, No. Hei 11-21307, No. Hei 11-35613, and U.S. Patent No. 6,031,014.

In particular, the ruthenium of the photocationic polymerization initiator is preferably triphenylphosphonium or 4-(phenylthio)phenyldiphenylphosphonium, 4-(phenylsulfate) represented by the following formula (2). Phenyldiphenylphosphonium (A-1) is the best.

The bisphenol A novolac type polyfunctional epoxy resin (B) in the present invention is a bisphenol A novolac type polyfunctional epoxy having a sufficient epoxy group in one of the patterns for forming a thick film. The resin can be any epoxy resin. Specific examples of such bisphenol A novolak-type polyfunctional epoxy resins include EPON SU-8 (manufactured by Resolution Performance Product), EPIKOTE 157S70, EPIKOTE 157S65 (manufactured by Nippon Epoxy Co., Ltd.), and YD-128 (Dongdu Chemical Co., Ltd.) Company system), EPICLON N-885, EPICLON N-865, EPICLON 2055 (manufactured by Dainippon Ink Chemical Industry Co., Ltd.). The epoxy equivalent of these bisphenol A novolac type polyfunctional epoxy resins is preferably from 150 to 400, and is less than this range, and is not preferable from the viewpoint of large hardening shrinkage and easy occurrence of warpage or cracking of the cured product. On the other hand, when it is larger than this range, the crosslinking density is small, the strength of the cured film or the chemical resistance, the heat resistance, and the crack resistance are poor. Further, in the above general formula (1), n represents a repeating unit, and n is preferably 3 to 30. If it is less than this range, it is generally liquid, and the hardenability is poor and it is not resistant to use. On the other hand, when it is larger than this range, development is performed. Sex. The transferability is poor and less; this n is the value of the number average molecular weight measured by gel permeation chromatography (GPC) divided by the molecular weight of the repeating unit. n is preferably from 0 to 30. When it is less than this range, it is generally liquid, and the curability is poor and it is not resistant to use. On the other hand, when it is larger than this range, the developability and transferability are poor. The bisphenol A novolac type polyfunctional epoxy tree which is in the above range is particularly preferably EPON SU-8 (manufactured by Resolution Performance Product) or EPIKOTE 157S70 (manufactured by Nippon Epoxy Co., Ltd.).

The above polyfunctional epoxy tree (B) is represented by the following general formula (1).

(The epoxy bisphenol A type in the formula may be an epoxy resin or a polymer polymerized with a bisphenol A novolak type epoxy resin, and n represents an average value and is an integer of 0 to 30.)

When the softening point of the polyfunctional epoxy resin (B) is low, the mask is likely to adhere when patterning, and when used as a dry film photoresist, it is less preferred to soften at normal temperature, and on the other hand, When the softening point of the functional epoxy resin (B) is high, when the dry film photoresist is laminated on the substrate, it is hard to soften, and the adhesion to the substrate is deteriorated, which is not preferable. For the above reasons, the polyfunctional epoxy resin preferably has a softening point of 40 to 120 ° C, more preferably 50 to 100 ° C.

The content of the photocationic polymerization initiator (A) in the photosensitive resin composition is too high, and the content of the bisphenol A novolac type polyfunctional epoxy resin (B) in the photosensitive resin composition is too low. At the time, development of the resin composition is difficult, and the film after hardening becomes brittle, which is not preferable. On the contrary, the content of the above photocationic polymerization initiator (A) in the photosensitive resin composition is too low, and the bisphenol A novolac type polyfunctional epoxy resin (B) is in the above photosensitive resin composition. When the content is too high, the hardening time of the resin composition by radiation exposure becomes long when applied to the substrate, which is less preferable. In view of the above problems, the photocationic cationic polymerization initiator (A) and the bisphenol A novolak-type multifunctional epoxy resin (B) are preferably used in a ratio of 0.1:99.9 to 15:85, preferably 0.5: 99.5~10:90.

In the photosensitive resin composition of the present invention, in order to further improve the performance of the pattern, a reactive epoxy monomer (C) having a miscibility may be added, and a reactive epoxy monomer may be used. For example, a glycidyl ether compound may be used. Diethylene glycol diglycidyl ether, hexanediol diglycidyl ether, dimethylolpropane diglycidyl ether, polypropylene glycol diglycidyl ether (made by Asahi Kasei Co., Ltd., ED506), trimethylolpropane Triglycidyl ether (ED50, manufactured by Asahi Kasei Co., Ltd.), pentaerythritol tetraglycidyl ether, etc.; these may be used alone or in combination of two or more. The reactive epoxy monomer (C) component is used for improving the reactivity of the photoresist or the physical properties of the cured film. The reactive epoxy monomer component is more in liquid form, and when the component is in a liquid state, When the blending is more than 20% by weight, the film after the solvent is removed is liable to stick to the reticle, and is less suitable. From this point of view, when the reactive epoxy monomer component is blended, the blending is carried out. The total amount of the components (A), (B) and (C) is preferably 1 to 10% by weight, particularly 2 to 7 by weight, based on the solid content of the photoresist. % is more suitable.

When the viscosity of the photosensitive resin composition of the present invention is lowered, a solvent (D) which improves the coating property can be used, and a solvent can be used by using an organic solvent which is generally used and which can dissolve each component. Such an organic solvent can be exemplified. a ketone such as acetone, methyl ethyl ketone or cyclohexanone; an aromatic hydrocarbon such as toluene, xylene or tetramethylbenzene; a glycol ether such as dipropylene glycol dimethyl ether or dipropylene glycol diethyl ether; Ethyl acetate, butyl acetate, butyl cellosolve acetate, carbitol acetate, propylene glycol monomethyl ether acetate, γ-butyrolactone, etc., methanol, ethanol, cellosolve An alcohol such as a methyl cellosolve, an organic solvent such as an aliphatic hydrocarbon such as octane or decane, a petroleum solvent such as petroleum ether, naphtha, hydrogenated naphtha or solvent naphtha.

These solvents may be used singly or in combination of two or more. The purpose of the solvent component is to adjust the film thickness or coatability when applied to a substrate, in order to maintain proper solubility of the main component, volatility of the component, and composition. The liquid viscosity of the material is preferably from 5% by weight to 95% by weight, particularly preferably from 10% by weight to 90% by weight, based on the photosensitive resin composition.

In the photosensitive resin composition of the present invention, in order to further improve the adhesion of the composition to the substrate, a miscibility imparting agent having a miscibility may be used, and a decane coupling agent or a titanium coupling agent may be used as the adhesion imparting agent. The coupling agent is preferably a decane coupling agent.

The above decane coupling agent may, for example, be 3-chloropropyltrimethoxydecane, vinyltrichlorodecane, vinyltriethoxydecane, vinyltrimethoxydecane or vinyl. Ginseng (2-methoxyethoxy)decane, 3-methylpropoxypropyltrimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-epoxy Propoxypropyltrimethoxydecane, 3-mercaptopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, N-2-(aminoethyl)-3-aminopropyltrimethyl Oxydecane, 3-guanidinopropyltriethoxydecane, and the like. These adhesion imparting agents may be used singly or in combination of two or more. Since the main component is unreactive, the adhesion imparting agent exists as a residual component after hardening, in addition to the component acting on the interface of the substrate. Therefore, if it is used in a large amount, it will cause a bad influence such as a decrease in physical properties. Depending on the substrate, it is appropriate to use it in a range that does not cause adverse effects from the viewpoint of exerting a small amount, and the ratio of use is relative to The photosensitive resin composition is preferably 15% by weight or less, particularly preferably 5% by weight or less.

In the photosensitive resin composition of the present invention, a sensitizer which absorbs ultraviolet light and supplies the absorbed light energy to the photocationic polymerization initiator may be further used as the sensitizer, preferably, for example, 9-position. And a hydrazine compound having an alkoxy group at the 10-position (9,10-dialkoxyfluorene derivative), and the alkoxy group may, for example, a C1 to C4 alkoxy group such as a methoxy group, an ethoxy group or a propoxy group. base. The 9,10-dialkoxyfluorene derivative may further have a substituent, and examples of the substituent include a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and a methyl group, an ethyl group, a propyl group or the like. An alkyl group or a sulfonic acid alkyl ester group or a carboxylic acid alkyl ester group of C1 to C4. The alkyl group of the alkyl sulfonate group or the alkyl carboxylate may, for example, be a C1 to C4 alkyl group such as a methyl group, an ethyl group or a propyl group, and the substitution position of these substituents is preferably 2 positions.

The 9,10-dialkoxypurine derivative may, for example, be 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 9,10-dipropoxyanthracene, 9,10-di Methoxy-2-ethyl hydrazine, 9,10-diethoxy-2-ethyl hydrazine, 9,10-dipropoxy-2-ethyl hydrazine, 9,10-dimethoxy-2 -chloropurine, 9,10-dimethoxyindole-2-sulfonic acid methyl ester, 9,10-diethoxyindole-2-sulfonic acid methyl ester, 9,10-dimethoxyanthracene- 2-carboxylic acid methyl ester or the like; these may be used singly or in combination of two or more. The sensitizer component is effective in a small amount, and therefore the use ratio is preferably 3% by weight or less, particularly preferably 1% by weight or less, based on the photocationic polymerization initiator (A).

In the present invention, it is necessary to reduce the adverse effects caused by ions derived from the photocationic cationic starting polymerization agent (A), and it is also possible to add methoxy aluminum, ethoxylated aluminum, and isopropoxy aluminum. Aluminum alkoxide such as propoxydiethoxyaluminum or butylaluminum hydride; phenoxy aluminum such as phenoxy aluminum or para-methylphenoxy aluminum; Aluminum stearate, aluminum arsenate, aluminum propionate, aluminum acetonide, aluminum hexafluoroacetate, aluminum acetoacetate, diethyl acetonide acetonate An ion scavenger such as an organoaluminum compound such as aluminum or diisopropoxy (ethyl acetoacetate) aluminum; these components may be used singly or in combination of two or more kinds, and the blending amount thereof may be relative to The solid content is 10% by weight or less.

Further, in the case of the present invention, various additives such as a thermoplastic resin, a coloring agent, a tackifier, an antifoaming agent, and a leveling agent can be used. Examples of the thermoplastic resin include polyether oxime, polystyrene, and polycarbonate; and examples of the coloring agent include phthalocyanine blue, phthalocyanine green, iodine green, crystal violet, titanium oxide, carbon black, and naphthalene black. Examples of the tackifier include Orben, Pantone, and montmorillonite. Examples of the antifoaming agent include antifoaming agents such as polyoxyalkylene-based, fluorine-based, and polymeric. The amount of the additive to be used in the photosensitive resin composition of the present invention is, for example, about 0.1 to 30% by weight, which is an approximate simple standard, and can be appropriately increased or decreased depending on the purpose of use.

Further, in the present invention, an inorganic filler such as barium sulfate, barium titanate, cerium oxide, amorphous cerium oxide, talc, clay, magnesium carbonate, calcium carbonate, aluminum oxide, aluminum hydroxide or mica powder may be used. The blending ratio may be 0 to 60% by weight in the composition.

The photosensitive resin composition of the present invention is preferably added in the proportions shown in Table 1 below, and if necessary, the above-mentioned adhesion imparting agent, sensitizer, ion trapping agent, thermoplastic resin, coloring agent, and tackifier may be added. , antifoaming agent, coating agent and inorganic filler. The mixture may be mixed by a general method, or may be stirred only, and if necessary, it may be dispersed and mixed using a disperser such as a dissolver, a homogenizer or a 3-roller, and after mixing, it may be reused, filtered by a mesh sieve, a membrane filter or the like.

The photosensitive resin composition of the present invention is preferably used in the form of a liquid, and when the photosensitive resin composition of the present invention is used, for example, it can be applied to a tantalum wafer with a thickness of 0.1 to 1000 μm using a spin coater or the like. On a substrate such as glass, heat-treating at 60 to 130 ° C for about 5 to 60 minutes, removing the solvent to form a photosensitive resin composition layer, and then placing a mask having a predetermined pattern, irradiating the ultraviolet rays, and performing the irradiation at 50 to 130 ° C. After heat treatment for about 50 minutes, the unexposed portion is developed with a developing solution at room temperature to 50 ° C for about 1 to 180 minutes, and then formed into a pattern, followed by heat treatment at 130 to 200 ° C to obtain a permanent protective film conforming to various characteristics. . As the developer, for example, an organic solvent such as γ-butyrolactone, triethylene glycol dimethyl ether or propylene glycol monomethyl ether acetate, or a mixture of the above organic solvent and water may be used, and a development type may be used. A developing device such as a spray type or a shower type may be subjected to ultrasonic irradiation if necessary.

The photosensitive resin composition of the present invention is coated with a roller coater, a die coater, a knife coater, a bar coater, a gravure coater, or the like. After drying on the base film, it is dried in a drying oven set at 45 to 100 ° C, by removing the amount of solvent, and if necessary, by laminating the outer layer film as a dry film photoresist. At this time, the thickness of the photoresist on the base film is adjusted to 2 to 100 μm. For the base film and the outer layer film, a film such as polyester, polypropylene, polyethylene, TAC, or polyimide may be used. A film which is subjected to release treatment by an oxime release treatment agent or a non-oxime release treatment agent can be used. By using this dry film photoresist, for example, by peeling off the outer layer film by a manual roller, a laminator or the like, and transferring it to the substrate at 40 ° C to 100 ° C and a pressure of 0.05 to 2 MPa, the same exposure and exposure as in the previous paragraph can be performed. Baking, developing, and heat treatment.

The above-mentioned photosensitive resin composition is supplied as a film, and the step of applying to the support and drying can be omitted, and pattern formation can be performed more easily.

The cured product of the resin composition of the present invention obtained by the above method is used as a permanent photoresist film for a MEMS component such as a jet recording head.

[Examples]

The embodiments of the present invention are described below, and the examples are merely illustrative of the present invention and are not intended to limit the invention.

(Examples 1 to 3, Comparative Example 1) (Photosensitive Resin Composition) A polyfunctional epoxy resin, a photocationic polymerization initiator, and a blending amount (unit: parts by weight) according to Table 2 The other components were stirred and mixed at 60 ° C for 1 hour in a flask equipped with a stirrer to obtain a photosensitive resin composition.

(Picture of photosensitive resin composition) (Examples 1 to 3, Comparative Example 1) The photosensitive resin composition was applied onto a tantalum wafer by a spin coater and dried to obtain 80 μm. a photosensitive resin composition layer having a film thickness, and the photosensitive resin composition layer was prebaked by a hot plate at 65 ° C for 5 minutes and at 95 ° C for 20 minutes, and then an i-line exposure apparatus (mask pair) was used. Quasi-device: manufactured by USHIO Motor Co., Ltd.) for pattern exposure (soft contact, i-line), followed by post-exposure bake (PEB) at 95 ° C for 6 minutes using a hot plate, followed by propylene glycol monomethyl ether acetate. The development process was carried out at 23 ° C for 7 minutes by a dipping method to obtain a cured resin pattern on the substrate.

(Evaluation of Photosensitive Resin Composition) The following evaluations were carried out by the necessary exposure amount after development, and the results are shown in Table 2 below.

Optimum exposure: the photographic mask transfer precision is the best exposure aspect ratio: film thickness / the thinnest pattern width in the formed photoresist pattern

Note: (A-1): photocationic polymerization initiator (trade name: CPI-210S san-apro (manufactured by the company)) (B-1): bisphenol A novolac type multifunctional epoxy resin (trade name EPON) (C): Reactive epoxy monomer (trade name: ED506, manufactured by Asahi Kasei Co., Ltd.) (D): Solvent cyclopentanone (E): Fluorine coating agent (product) MEGAFAC F-470 Dainippon Ink Chemical Industry Co., Ltd.) (F): decane coupling agent (trade name: S-510 CHISSO Co., Ltd.) (G): photocationic polymerization initiator (trade name UVI- 6974 Dow Chemical Company made 50% propylene carbonate solution)

As shown in Table 2, Examples 1 to 3 are all good results.

(Example 4) (Photosensitive resin composition) 100 parts by weight of a bisphenol A novolac type polyfunctional epoxy resin (product EPON SU-8, manufactured by Resolution Performance Product) and 2.3 parts by weight of photopolymerization were mixed and mixed. A starting agent (trade name: CPI-210S san-apro (manufactured by the company)), 4 parts by weight of a reactive epoxy monomer (trade name: ED506, manufactured by Asahi Kasei Kogyo Co., Ltd.), and 40 parts by weight of MEK, and obtained photosensitivity Resin composition.

(Picture of the photosensitive resin composition) This photosensitive resin composition was uniformly applied to a 60 μm polypropylene (PP) film (base film, manufactured by Toray Industries, Inc.) by convection by warm air. After drying in a dryer at 65 ° C for 10 minutes and at 80 ° C for 15 minutes, a PP film (outer film, manufactured by Toray Industries, Inc.) having a film thickness of 60 μm was laminated on the photosensitive resin composition layer to form a film of 40 μm. A thick photosensitive resin composition laminate.

The outer layer film of the photosensitive resin composition laminate was peeled off, laminated on a ruthenium wafer at a roll temperature of 70 ° C, a gas pressure of 0.2 MPa, and a speed of 0.5 m/min, and the base film was peeled off, and this operation was repeated once more. A photosensitive resin composition layer of 80 μm was obtained. On the photosensitive resin composition layer, pattern exposure (soft contact, i line) was performed using an i-line exposure apparatus (mask alignment apparatus: manufactured by USHIO Electric Co., Ltd.), and then, by a heating plate at 95 ° C. The PEB of the minute, followed by PGMEA, was subjected to development treatment at 23 ° C for 4 minutes by a dipping method to obtain a hardened resin pattern on the substrate. An excellent result of an optimum exposure amount of 300 mJ/cm ² and an aspect ratio of 5.5 was obtained.

From the comparison of the results of Examples 1 to 4 and Comparative Example 1, it is clear that a combination of a polyfunctional epoxy resin having a specific structure and a specific photocationic polymerization initiator can provide a high which cannot be obtained by other combinations. A resin pattern with a shape of sensitivity and a high aspect ratio.

[Industrial Availability]

As described above, the photosensitive resin composition according to the present invention is suitable for forming a resin pattern having an outer shape having a high aspect ratio, and is particularly suitable for resin molding having high dimensional stability such as an electronic device having a fine size.

Claims (8)

A photosensitive resin composition characterized by comprising a photo-cationic polymerization initiator (A) of ruthenium (pentafluoroethyl)trifluorophosphoric acid and a polyfunctional epoxy resin represented by the following general formula (1) (B) made, (The epoxy group in the formula may be a bisphenol A type epoxy resin or a polymer polymerized with a bisphenol A novolak type epoxy resin, and n represents an average value and is an integer of 0 to 30). The photosensitive resin composition of the first aspect of the invention, wherein the photocationic polymerization initiator (A) is a compound represented by the following formula (2) (A-1) A photosensitive resin composition according to claim 1 or 2, which contains a reactive epoxy monomer (C). The photosensitive resin composition of claim 1 or 2, wherein the photosensitive resin composition containing the solvent (D) has a solid content concentration of 5 to 95% by weight. A photosensitive resin composition laminate characterized in that the substrate is impregnated with the photosensitive resin composition according to any one of claims 1 to 4. A cured product comprising the photosensitive resin composition according to any one of claims 1 to 4. A pattern forming method comprising a photosensitive resin composition layer obtained by coating a photosensitive resin composition according to any one of claims 1 to 4 on a desired support, after drying, The film is exposed to a predetermined pattern, baked after exposure, and the resin composition layer is developed, and the obtained resin pattern is heat-treated to obtain a cured resin pattern of a predetermined shape. A pattern forming method, the characteristics of which will include a patent application patent The photosensitive resin composition layer remaining after removing the substrate from the laminate of the fifth item is bonded to the desired support and laminated, and the photosensitive resin composition layer is exposed according to a predetermined pattern. After baking, the resin composition layer is developed, and the obtained resin pattern is heat-treated, and a step of obtaining a cured resin pattern of a predetermined shape is obtained.