TWI386152B - Heat sink - Google Patents

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TWI386152B
TWI386152B TW94139793A TW94139793A TWI386152B TW I386152 B TWI386152 B TW I386152B TW 94139793 A TW94139793 A TW 94139793A TW 94139793 A TW94139793 A TW 94139793A TW I386152 B TWI386152 B TW I386152B
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substrate
carbon nanotubes
heat sink
manufacturing
sink according
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TW94139793A
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TW200719811A (en
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Mong Tung Lin
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Hon Hai Prec Ind Co Ltd
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Description

散熱器 heat sink

本發明涉及熱傳領域,尤其涉及一種散熱器及其製造方法。 The present invention relates to the field of heat transfer, and more particularly to a heat sink and a method of manufacturing the same.

隨著積體電路技術之不斷進步及工業應用需求之不斷提高,電子資訊產業蓬勃迅速發展,電腦之應用得到普及,且其更新換代之速度日趨加快,因此,電腦內之核心元件--中央處理器之運行頻率越來越高,高頻高速處理器不斷推出,但處理器運行頻率越高,則其單位時間內產生之熱量越多,熱量累積將引起溫度昇高,從而導致其運行性能包括穩定性下降,因此,必需及時地將其產生之熱量散發出去,目前,散熱已經成為每一代高速處理器推出時必需解决之問題。 With the continuous advancement of integrated circuit technology and the increasing demand for industrial applications, the electronic information industry is booming and rapid development, the application of computers has become popular, and the speed of its replacement has been accelerating. Therefore, the core component of the computer - central processing The operating frequency of the device is getting higher and higher, and the high-frequency high-speed processor is continuously introduced. However, the higher the operating frequency of the processor, the more heat it generates per unit time, and the heat accumulation will cause the temperature to rise, resulting in its running performance including The stability is degraded, so it is necessary to dissipate the heat generated in time. At present, heat dissipation has become a problem that must be solved when each generation of high-speed processors is introduced.

金屬氧化物場效應二極體(Metal Oxide Semiconductor Field Effect Transistor,MOSFET)係電腦主機板上中央處理器之電壓調節單元中重要元件,其主要起穩壓與濾波作用。由於目前之中央處理器頻率越來越高,功率越來越大,大量電容器被應用到中央處理器之電壓調節單元中,導致MOSFET之溫度越來越高,其溫度甚至能達到125℃。如此,會嚴重影響中央處理器之性能,有必要對MOSFET進行散熱。然而,由於上述MOSFET相對於中央處理器等元件,體積小很多,且由於電腦主機板上空間之限制,要求用於MOSFET散熱之散熱器體積小且有較好之散熱性能。 The Metal Oxide Semiconductor Field Effect Transistor (MOSFET) is an important component of the voltage regulation unit of the central processing unit on the computer main board, which mainly functions as a voltage regulator and a filter. Due to the increasing frequency of the central processing unit and the increasing power, a large number of capacitors are applied to the voltage regulating unit of the central processing unit, resulting in higher and higher temperature of the MOSFET, and the temperature can reach 125 ° C. As such, the performance of the central processing unit will be seriously affected, and it is necessary to dissipate the MOSFET. However, since the above MOSFET is much smaller than the components such as the central processing unit, and because of the space limitation on the computer main board, the heat sink for the MOSFET heat dissipation is required to have a small volume and good heat dissipation performance.

有鑒於此,有必要提供一種體積小且有較好散熱性能之散熱器。 In view of this, it is necessary to provide a heat sink that is small in size and has good heat dissipation performance.

一種散熱器,其包括:一基底,其具有一第一表面及一與所述第一表面相對之第二表面;及複數奈米碳管,所述複數奈米碳管從基底之第一表面穿過所述第二表面向外延伸。 A heat sink comprising: a substrate having a first surface and a second surface opposite the first surface; and a plurality of carbon nanotubes, the plurality of carbon nanotubes from the first surface of the substrate Extending outward through the second surface.

一種散熱器之製造方法,其包括以下步驟:提供一基板;於所述基板上形成複數奈米碳管;於所述複數奈米碳管一末端形成一基底;除去所述基板,得到一散熱器。 A method for manufacturing a heat sink, comprising the steps of: providing a substrate; forming a plurality of carbon nanotubes on the substrate; forming a substrate at one end of the plurality of carbon nanotubes; removing the substrate to obtain a heat dissipation Device.

所述散熱器包括一基底及複數奈米碳管,其中複數奈米碳管可做為散熱器之散熱鰭片,由於奈米碳管直徑很小,一般為幾奈米到幾十奈米,使得單個奈米碳管散熱鰭片具有極大之高徑比,一般在10000:1以上,大大增加所述散熱器之散熱面積,提高散熱器之散熱性能,且由於奈米碳管體積很小,從而使得所述散熱器在具有較好之散熱性能之同時具有較小之體積。 The heat sink comprises a substrate and a plurality of carbon nanotubes, wherein the plurality of carbon nanotubes can be used as heat sink fins of the heat sink, and the diameter of the carbon nanotubes is generally from a few nanometers to several tens of nanometers, The single carbon nanotube fins have a very high aspect ratio, generally above 10000:1, greatly increasing the heat dissipation area of the heat sink, improving the heat dissipation performance of the heat sink, and because the carbon nanotubes are small in volume, Therefore, the heat sink has a small volume while having better heat dissipation performance.

下面結合附圖對本發明作進一步詳細說明。 The invention will be further described in detail below with reference to the accompanying drawings.

請參閱第一圖,本發明之實施例提供之散熱器10,其包括:一基底20,該基底20具有一第一表面21及一與所述第一表面21相對之第二表面22;複數奈米碳管30,所述複數奈米碳管30從基底20之第一表面21穿過所述第二表面22向外延伸。 Referring to the first embodiment, a heat sink 10 according to an embodiment of the present invention includes: a substrate 20 having a first surface 21 and a second surface 22 opposite to the first surface 21; A carbon nanotube 30, the plurality of carbon nanotubes 30 extending outwardly from the first surface 21 of the substrate 20 through the second surface 22.

所述基底20可選自一高分子材料,如矽橡膠、聚酯、聚氯乙烯、聚乙烯醇、聚乙烯、聚丙烯、環氧樹脂、聚甲醛、聚縮醛等高分子材料中之一種或幾種之混合。所述基底20之厚度不宜太厚,亦不宜太薄,太厚不利於散熱,太薄會降低其對奈米碳管30之固持力,導致奈米碳管30傾倒。優選地,所述基底20之厚度為0.1毫米~2毫米。 The substrate 20 may be selected from a polymer material such as ruthenium rubber, polyester, polyvinyl chloride, polyvinyl alcohol, polyethylene, polypropylene, epoxy resin, polyoxymethylene, polyacetal, and the like. Or a mixture of several. The thickness of the substrate 20 should not be too thick, nor should it be too thin. Too thick is not conducive to heat dissipation. Too thin will reduce its holding force on the carbon nanotubes 30, resulting in the pouring of the carbon nanotubes 30. Preferably, the substrate 20 has a thickness of 0.1 mm to 2 mm.

本實施例中,所述複數奈米碳管30可採用奈米碳管陣列,陣列中每個奈米碳管30分別從基底20之第一表面21穿過所述第二表面22向外延伸。優選地,所述複數奈米碳管30彼此平行且基本垂直於所述第一表面21,其底部與第一表面21基本平齊或伸出所述第一表面21。所述複數奈米碳管30之高度可根據所述基底20之厚度以及實際使用時之空間大小而定。優選地,所述奈米碳管30之高度為1毫米~5毫米。所述複數奈米碳管30亦可為奈米碳管束陣列,每一奈米碳管束具有複數奈米碳管30,該奈米碳管束間之間距為100微米~1毫米。 In this embodiment, the plurality of carbon nanotubes 30 may adopt an array of carbon nanotubes, and each of the carbon nanotubes 30 in the array extends outward from the first surface 21 of the substrate 20 through the second surface 22, respectively. . Preferably, the plurality of carbon nanotubes 30 are parallel to one another and substantially perpendicular to the first surface 21, the bottom of which is substantially flush with or extends from the first surface 21. The height of the plurality of carbon nanotubes 30 may depend on the thickness of the substrate 20 and the amount of space in actual use. Preferably, the carbon nanotubes 30 have a height of 1 mm to 5 mm. The plurality of carbon nanotubes 30 may also be an array of carbon nanotube bundles, each of the carbon nanotube bundles having a plurality of carbon nanotubes 30 having a distance of between 100 micrometers and 1 millimeter.

請一併參閱第二圖至第六圖,本發明之實施例提供之上述散熱器10之製備方法,其包括下述步驟: Please refer to the second to sixth figures. The method for preparing the heat sink 10 according to the embodiment of the present invention includes the following steps:

步驟(1),提供一基板40,如第三圖所示。所述基板40之材料可選自玻璃、矽、金屬及其氧化物。本實施例中基板40為矽基板。優選地,所述基板40之一用於後續形成奈米碳管之表面預先經過抛光處理。 In step (1), a substrate 40 is provided as shown in the third figure. The material of the substrate 40 may be selected from the group consisting of glass, ruthenium, metals, and oxides thereof. In the embodiment, the substrate 40 is a germanium substrate. Preferably, one of the substrates 40 is used for the subsequent formation of the surface of the carbon nanotubes before being polished.

步驟(2),於所述基板40上形成複數奈米碳管30,如第四 圖所示。本實施例中於所述基板40上形成複數奈米碳管30之方法為化學氣相沈積法。其步驟如下,首先於基板40上形成催化劑,然後於高溫下通入碳源氣以形成複數奈米碳管30。所述催化劑可採用鐵、鎳、鈷、鈀等過渡金屬。所述碳源氣可採用甲烷、乙烯、丙烯、乙炔、甲醇及乙醇等。本實施例中首先於基板40上覆蓋一層5奈米厚之鐵膜(圖未示),並於空氣中300℃條件下進行退火;然後於化學氣相沈積腔體(Chemical Vapor Deposition Chamber)中700℃條件下以乙烯為碳源氣生長複數奈米碳管30。按上述方法獲得之複數奈米碳管30彼此平行且基本垂直於所述基板40。優選地,所述複數奈米碳管30之高度為1毫米~5毫米,所述奈米碳管30之高度可通過控制反應時間來控制,本實施例中其高度為3毫米左右。本步驟中可通過在基板40上形成催化劑陣列來生長出奈米碳管束陣列,每一奈米碳管束之大小及形狀可通過形成催化劑之區域之大小及形狀來決定。 Step (2), forming a plurality of carbon nanotubes 30 on the substrate 40, such as the fourth The figure shows. The method of forming the plurality of carbon nanotubes 30 on the substrate 40 in this embodiment is a chemical vapor deposition method. The steps are as follows. First, a catalyst is formed on the substrate 40, and then a carbon source gas is introduced at a high temperature to form a plurality of carbon nanotubes 30. The catalyst may be a transition metal such as iron, nickel, cobalt or palladium. The carbon source gas may be methane, ethylene, propylene, acetylene, methanol, ethanol or the like. In this embodiment, the substrate 40 is first covered with a 5 nm thick iron film (not shown) and annealed in air at 300 ° C; then in a Chemical Vapor Deposition Chamber. A plurality of carbon nanotubes 30 were grown at a temperature of 700 ° C using ethylene as a carbon source gas. The plurality of carbon nanotubes 30 obtained as described above are parallel to each other and substantially perpendicular to the substrate 40. Preferably, the height of the plurality of carbon nanotubes 30 is from 1 mm to 5 mm, and the height of the carbon nanotubes 30 can be controlled by controlling the reaction time, which is about 3 mm in this embodiment. In this step, a carbon nanotube bundle array can be grown by forming a catalyst array on the substrate 40, and the size and shape of each nanocarbon bundle can be determined by the size and shape of the region in which the catalyst is formed.

步驟(3),於所述複數奈米碳管30一末端形成一基底20,如第五圖所示。所述複數奈米碳管30包括一第一末端31及一第二末端32,所述第一末端31與基板40相連。所述基底20可形成於所述複數奈米碳管30任一末端上。其中,通過將高分子材料之熔融液或溶液注入複數奈米碳管30與基板40之連接處,可於複數奈米碳管30之第一末端31形成基底20。本實施例中為在所述複數奈米碳管30之第二末端32上形成基底20,具體方法為將所述複數奈米碳管30之第二末端32浸入熔融態高分子材料中,取出後 於室溫下冷卻固化,即於所述複數奈米碳管30之第二末端32上形成基底20。所述高分子材料可選自矽橡膠、聚酯、聚氯乙烯、聚乙烯醇、聚乙烯、聚丙烯、環氧樹脂、聚甲醛、聚縮醛等中之一種或幾種之混合。本實施例中使用聚乙烯醇。所述基底20之厚度可通過奈米碳管30之第二末端32浸入熔融態高分子材料中之深度決定,優選地,所述基底20之厚度為0.1毫米~2毫米,本實施例中其厚度為0.8毫米。 In step (3), a substrate 20 is formed at one end of the plurality of carbon nanotubes 30, as shown in the fifth figure. The plurality of carbon nanotubes 30 includes a first end 31 and a second end 32, and the first end 31 is connected to the substrate 40. The substrate 20 may be formed on either end of the plurality of carbon nanotubes 30. Here, the substrate 20 can be formed at the first end 31 of the plurality of carbon nanotubes 30 by injecting a melt or solution of the polymer material into the junction of the plurality of carbon nanotubes 30 and the substrate 40. In this embodiment, the substrate 20 is formed on the second end 32 of the plurality of carbon nanotubes 30 by immersing the second end 32 of the plurality of carbon nanotubes 30 in a molten polymer material. Rear The substrate 20 is formed by cooling at room temperature, i.e., on the second end 32 of the plurality of carbon nanotubes 30. The polymer material may be selected from one or a mixture of ruthenium rubber, polyester, polyvinyl chloride, polyvinyl alcohol, polyethylene, polypropylene, epoxy resin, polyoxymethylene, polyacetal, and the like. Polyvinyl alcohol is used in this embodiment. The thickness of the substrate 20 can be determined by the depth at which the second end 32 of the carbon nanotube 30 is immersed in the molten polymer material. Preferably, the substrate 20 has a thickness of 0.1 mm to 2 mm, which is in the embodiment. The thickness is 0.8 mm.

步驟(4),除去基板40,得到散熱器10,如第六圖所示。所述除去基板40之方法有多種,如機械研磨、化學蝕刻等,本實施例中使用機械研磨之方法將基板40除去。 In step (4), the substrate 40 is removed to obtain the heat sink 10 as shown in the sixth figure. The method of removing the substrate 40 is various, such as mechanical polishing, chemical etching, etc., and the substrate 40 is removed by mechanical polishing in this embodiment.

所述散熱器包括一基底及複數奈米碳管,其中複數奈米碳管可做為散熱器之散熱鰭片,由於奈米碳管直徑很小,一般為幾奈米到幾十奈米,使得單個奈米碳管散熱鰭片具有極大之高徑比,一般在10000:1以上,大大增加所述散熱器之散熱面積,提高散熱器之散熱性能,且由於奈米碳管體積很小,從而使得所述散熱器在具有較好之散熱性能之同時具有較小之體積。 The heat sink comprises a substrate and a plurality of carbon nanotubes, wherein the plurality of carbon nanotubes can be used as heat sink fins of the heat sink, and the diameter of the carbon nanotubes is generally from a few nanometers to several tens of nanometers, The single carbon nanotube fins have a very high aspect ratio, generally above 10000:1, greatly increasing the heat dissipation area of the heat sink, improving the heat dissipation performance of the heat sink, and because the carbon nanotubes are small in volume, Therefore, the heat sink has a small volume while having better heat dissipation performance.

綜上所述,本發明確已符合發明專利之要件,遂依法提出專利申請。惟,以上所述者僅為本發明之較佳實施方式,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。 In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

10‧‧‧散熱器 10‧‧‧ radiator

20‧‧‧基底 20‧‧‧Base

21‧‧‧第一表面 21‧‧‧ first surface

22‧‧‧第二表面 22‧‧‧ second surface

30‧‧‧奈米碳管 30‧‧‧Nano Carbon Tube

31‧‧‧第一末端 31‧‧‧ first end

32‧‧‧第二末端 32‧‧‧second end

40‧‧‧基板 40‧‧‧Substrate

第一圖係本發明之實施例提供之散熱器結構剖面示意圖 ;第二圖係本發明之實施例提供之散熱器之製造方法流程圖;第三圖係本發明之實施例提供之散熱器之製造方法中提供之基板示意圖;第四圖係於第三圖中之基板上形成奈米碳管後之示意圖;第五圖係於第四圖中之複數奈米碳管一末端形成基底後之示意圖;第六圖係於第五圖中之複數奈米碳管去除基板後之示意圖。 The first figure is a schematic cross-sectional view of a heat sink structure provided by an embodiment of the present invention. The second figure is a flow chart of a method for manufacturing a heat sink provided by an embodiment of the present invention; the third figure is a schematic view of a substrate provided in the method for manufacturing the heat sink provided by the embodiment of the present invention; The schematic diagram of the carbon nanotubes formed on the substrate; the fifth diagram is a schematic diagram of the bottom of the plurality of carbon nanotubes in the fourth figure; the sixth figure is the plurality of nanocarbons in the fifth figure Schematic diagram of the tube after removal of the substrate.

10‧‧‧散熱器 10‧‧‧ radiator

20‧‧‧基底 20‧‧‧Base

21‧‧‧第一表面 21‧‧‧ first surface

22‧‧‧第二表面 22‧‧‧ second surface

30‧‧‧奈米碳管 30‧‧‧Nano Carbon Tube

Claims (7)

一種散熱器之製造方法,其包括以下步驟:提供一基板;於所述基板上形成複數奈米碳管;於所述複數奈米碳管一末端形成一基底;除去所述基板。 A method of manufacturing a heat sink, comprising the steps of: providing a substrate; forming a plurality of carbon nanotubes on the substrate; forming a substrate at one end of the plurality of carbon nanotubes; and removing the substrate. 如申請專利範圍第1項所述之散熱器之製造方法,其中,所述基底為高分子材料。 The method of manufacturing a heat sink according to claim 1, wherein the substrate is a polymer material. 如申請專利範圍第2項所述之散熱器之製造方法,其中,所述高分子材料為矽橡膠、聚酯、聚氯乙烯、聚乙烯醇、聚乙烯、聚丙烯、環氧樹脂、聚甲醛及聚縮醛中之一種或幾種之混合。 The method for manufacturing a heat sink according to claim 2, wherein the polymer material is ruthenium rubber, polyester, polyvinyl chloride, polyvinyl alcohol, polyethylene, polypropylene, epoxy resin, polyoxymethylene And a mixture of one or more of polyacetals. 如申請專利範圍第1項所述之散熱器之製造方法,其中,所述複數奈米碳管高度為1毫米~5毫米。 The method of manufacturing a heat sink according to claim 1, wherein the plurality of carbon nanotubes have a height of 1 mm to 5 mm. 如申請專利範圍第1項所述之散熱器之製造方法,其中,於所述複數奈米碳管一末端形成基底之方法為將所述複數奈米碳管遠離基板之末端浸入熔融態高分子材料中。 The method for manufacturing a heat sink according to claim 1, wherein the method of forming a substrate at one end of the plurality of carbon nanotubes is to immerse the plurality of carbon nanotubes away from the end of the substrate into the molten polymer. In the material. 如申請專利範圍第1項所述之散熱器之製造方法,其中,所述基底之厚度為0.1毫米~2毫米。 The method of manufacturing a heat sink according to claim 1, wherein the substrate has a thickness of 0.1 mm to 2 mm. 如申請專利範圍第1項所述之散熱器之製造方法,其中,所述除去基板之方法採用化學蝕刻或機械研磨。 The method of manufacturing a heat sink according to claim 1, wherein the method of removing the substrate is chemical etching or mechanical polishing.
TW94139793A 2005-11-11 2005-11-11 Heat sink TWI386152B (en)

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TWI232286B (en) * 2003-06-03 2005-05-11 Hon Hai Prec Ind Co Ltd Thermal interface material and method for making same
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TWI246879B (en) * 2004-04-16 2006-01-01 Hon Hai Prec Ind Co Ltd Thermal interface material and method for making same

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