TWI272450B - Photosensitive transfer film - Google Patents

Abstract

To obtain a photosensitive transfer film for a plasma display panel capable of forming a pattern through at least transfer, exposure, development and baking steps, capable of easily forming a pattern having high dimensional accuracy and excellent in adhesion to a substrate. The photosensitive transfer film has a photosensitive transfer layer containing (A) inorganic particles, (B) an alkali-soluble resin, (C) a compound containing an ethylenically unsaturated group and (D) a photopolymerization initiator and having 5-30 mum thickness.

Description

1272450 A7 B7 V. DESCRIPTION OF THE INVENTION (1) [Detailed description of the invention (please read the precautions on the back side and then fill out this page) [Technical Field of the Invention] The present invention relates to a pattern suitable for forming a pattern with high dimensional accuracy The photosensitive transfer film, more specifically, is suitable for forming a pattern having high dimensional accuracy in an electrode, a phosphor, a color filter, and a black matrix constituting each display element of the plasma display panel. Photosensitive transfer film. [Previous technology] Printed by the Consumers' Cooperatives of the Intellectual Property Office of the Ministry of Economic Affairs In recent years, the plasma display has been focused on as a flat fluorescent display. Fig. 1 is a model diagram showing a cross-sectional shape of an alternating current type plasma display panel (hereinafter also referred to as "PDP"). In the figure, 1 and 2 are oppositely disposed glass substrates, and 3 is a partition wall, and the battery is formed to be partitioned via the glass substrate 1, the glass substrate 2, and the partition walls 3. 4 is a transparent electrode fixed to the glass substrate 1, 5 is a bus electrode formed on the transparent electrode for reducing the resistance of the transparent electrode, 6 is an address electrode fixed to the glass substrate 2, and 7 is held by the battery In the phosphor, 8 is a dielectric layer formed on the surface of the glass substrate 1 for covering the transparent electrode 4 and the bus electrode 5, and 9 is a layer formed on the surface of the glass substrate 2 for covering the address electrode 6. The electric layer, 10 is a protective film made of, for example, magnesium oxide.尙 In the DC type P D P, a resistor is usually provided between the electrode terminal (anode terminal) and the electrode lead (anode lead). In addition, in order to improve the contrast of the PDP, the Chinese National Standard (CNS) A4 specification (210 X 297 mm) is also applied to the above-mentioned glass basic paper scale. 1272450 A7 B7 V. Invention Description (2) Plate 1 and dielectric layer 8 Between the dielectric layer 8 and the protective film 10, red, green, and blue color filters are provided, and a black matrix having a strip shape and a lattice shape is generally provided. (Please read the precautions on the back and fill out this page.) The height of the PDP electrode, phosphor, color filter, and black matrix should be as low as possible without compromising performance. By increasing the height of the pattern, the flatness of the dielectric layer and the protective film covering the electrode, the color filter, and the black matrix is deteriorated, and a bright spot of P D P appears. Further, in the phosphor, the height of the pattern is increased, so that the discharge space is reduced and the brightness is lowered. In the method for producing such a PDP electrode, a phosphor, a color filter, and a black matrix, it is known that (1) a paste containing non-photosensitive inorganic particles is subjected to screen printing on a substrate to obtain a pattern, and In the screen printing method of calcination, (2) the paste containing the photosensitive inorganic particles is screen-printed to form a film on the substrate, and the film is irradiated with ultraviolet rays through the mask to develop a pattern, so that the pattern remains on the substrate. And a photosensitive paste method of calcining it. [Problems to be Solved by the Invention] Printed by the Ministry of Economic Affairs, the Intellectual Property Office, and the Consumer Cooperatives. However, the above-mentioned screen printing method is very strict with the accuracy of the position of the pattern as the panel is enlarged and refined. Has the problem of not meeting the usual printing. Moreover, although the above-mentioned photosensitive paste method is excellent in the positional accuracy of the pattern, when a film is formed on a substrate by a screen, it is easy to cause film thickness variation and film defects via paste properties and printing conditions, and it is obtained. Difficulties in engineering management of drawings with high dimensional accuracy. This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). 1272450 Α7 Β7 5. Inventive Description (3) The present invention is based on the invention as described above. A first object of the present invention is to provide a photosensitive transfer film which can be formed into a pattern by at least a transfer, exposure, development, and calcination process. (Please read the following precautions and then fill out this page.) A second object of the present invention is to provide a photosensitive transfer film which can easily form a pattern having a high dimensional accuracy. A third object of the present invention is to provide a photosensitive transfer film which is excellent in adhesion to a substrate. [Means for Solving the Problem] The photosensitive transfer film of the present invention (hereinafter referred to as "photosensitive transfer film of the present invention" or "transfer film of the present invention") contains (A) inorganic particles, ( B) an alkali-soluble resin, (C) a compound containing an ethylenically unsaturated group and (D) a photopolymerization initiator, and having a photosensitive transfer layer having a film thickness of 5 to 30 // m. [Embodiment of the Invention] Printing by the Ministry of Economic Affairs, Intellectual Property Office, and Staff Cooperatives The following describes the photosensitive transfer film of the present invention in detail. Photosensitive transfer film · The photosensitive transfer film of the present invention must contain (A) inorganic particles, (B) alkali-soluble resin, and the paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) - ό - 1272450 Α7 Β7 Ministry of Economic Affairs Intellectual Property Bureau Employees Consumption Cooperatives Printing 5, Inventions (4) (C) Compounds containing ethylenically unsaturated groups and '(D) photopolymerization initiators and having a film thickness of 5 to 3 0 vm photosensitive transfer layer. Further, the photosensitive transfer film of the present invention has a support film and a photosensitive transfer layer formed thereon, and a protective film may be provided on the surface of the photosensitive transfer layer. <Support film and protective film> The support film ′ constituting the photosensitive transfer film of the present invention is preferably a resin having heat resistance and solvent resistance and having flexibility. By having flexibility, the support film can be coated with a paste-like composition to form a photosensitive transfer layer, and the photosensitive transfer layer can be stored and supplied in a roll-like state. Examples of the resin forming the support film include fluorine-containing resins such as polyethylene terephthalate, polyester, polyethylene, polypropylene, polybutene, polyimine, polyvinyl alcohol, and polyvinyl fluoride, and nylon. Cellulose, etc. The thickness of the support film can be, for example, 2 0 to 1 Ο Ο μΐΏ. The surface of the support film is preferably subjected to a release treatment. Thereby, the pattern forming process described later can be easily performed to carry out the peeling operation of the support film.尙 As for the protective film, the same film as the support film can also be used. Further, a normal release treatment must be applied to the surface of the protective film, and the peeling strength between the protective film/photosensitive transfer layer must be smaller than the peel strength between the support film/photosensitive transfer layer. This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) ------------Package--------Book--- (Please read the back Note: Please fill out this page again. 1272450 Ministry of Economic Affairs, Intellectual Property Office, Staff and Consumers Cooperative, Print A7 _____Β7 V. Inventive Note (5) <Photosensitive Transfer Layer> Photosensitive transfer layer constituting the photosensitive transfer film of the present invention It is usually contained with (A) inorganic particles, (B) an alkali-soluble resin, (C) a compound containing an ethylenically unsaturated group, (D) a photopolymerization initiator, (E) a solvent, and optionally (F) various additives. The paste-like photosensitive composition is formed by coating on a support film and drying the coating film to remove a part or all of the solvent. A method of applying a photosensitive composition onto a support film to obtain a photosensitive transfer layer, and a method of forming a film having a large film thickness (for example, 1 // m or more) having excellent film thickness uniformity is preferable, and Specific examples thereof include a coating method by a roll coater, a coating method of a blade coater, a coating method of a slit coater, a coating method of a curtain coater, a coating method of a wire coater, and the like. The drying condition of the coating film is about 0 to 5 to 30 minutes at 50 to 150 ° C, and the residual ratio of the solvent after drying (content in the photosensitive transfer layer) is usually 2% by mass or less. The film thickness of the photosensitive transfer layer formed on the support film as described above is 5 to 30//m, preferably 8 to 2 5//ΙΠ, more preferably 1 〇 to 2 0 // m 〇 In the photosensitive transfer film of the present invention, the mass loss during the photosensitive transfer layer calcination treatment at 60 ° C is preferably from 20 to 80% by mass. The mass loss in the calcination process of the photosensitive transfer layer is 20 to 80. The paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ' "" ----I-- ---装·丨—丨丨i丨丨定---- (Please read the notes on the back and fill out this page) 1272450 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed A7 B7 V. Invention description (6) In the mass%, it is possible to obtain a photosensitive transfer film which is excellent in adhesion to a substrate and which can form a pattern having high dimensional accuracy. The above-mentioned mass loss is preferably 2 5 to 7 5 % by mass, particularly preferably 3 0 to 7 % by mass. Further, the content of the (A) inorganic particles in the photosensitive transfer layer is preferably 2 〇 to 80% by mass, more preferably 2 5 to 7 5 %, based on the entire photosensitive transfer layer in the transfer film. %, especially good for 3 0~7 0 quality.%. By having such a photosensitive transfer layer, it is possible to obtain a photosensitive transfer film which is excellent in adhesion to a substrate and which can form a pattern having high dimensional accuracy. <Photosensitive Composition> The photosensitive composition for forming the photosensitive transfer layer constituting the photosensitive transfer film of the present invention may contain (A) inorganic particles, (B) alkali-soluble resin, and (C) ethylene. a compound of an unsaturated group, (D) a photopolymerization initiator, (E) a solvent, and optionally (F) various additives, using a kneading machine, a mixer, a homogenizer, a ball mill, an ingot mill, or the like. Mixing can be modulated. The photosensitive composition prepared as described above is a paste composition having a fluidity suitable for coating, and its viscosity is usually from 10 to 10,000 cp, preferably from 500 to 10, 〇0 〇 cp. Hereinafter, each component constituting the photosensitive composition will be described. (A) Inorganic particles The inorganic particles used in the photosensitive composition vary depending on the type of the molding material. This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) ---I--------Install ------ —Set i! (Please read the notes on the back first) Fill in this page) # 1272450 A7 B7 i, Inventions (7) (Please read the back note and fill out this page) PDP, LCD, organic EL components, printed circuit boards, multilayer boards, multi-chip modules and LSI Examples of the inorganic particles used in the electrode forming material include Ag, Au, Al, Nu, Ag_Pcl alloy, C u, C r and the like. Among them, it is preferable to use a relatively inexpensive A g which does not cause a decrease in conductivity due to oxidation even if it is calcined in the atmosphere. The shape of the inorganic particles used for the electrode forming material is not particularly limited to a granular form, a spherical form, a sheet form, or the like, and inorganic particles of two or more types may be used singly or in combination. Further, the average particle diameter is preferably 0 · 0 1 to 10 / zm, more preferably 〇 · 0 5 to 5 # m, and inorganic particles having different average particle diameters may be used in combination. Examples of the inorganic particles used for the transparent electrode forming material such as PDP, LCD, and organic EL device include indium oxide, tin oxide, tin-containing indium oxide (IT〇), antimony-containing tin oxide (AT〇), and fluorine-added oxidation. Indium (FI〇), fluorine-added tin oxide (FT〇), fluorine-added zinc oxide (FZO), and oxidation of one or more metals selected from Al, Co, Fe, In, Sn, and butyl Zinc particles and the like. The inorganic particles used in the phosphor forming material of PDP can be used in red. 〇2〇3: ugly 1131, 丫281〇5: £1131, printed by the Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperative, Y 3 A 1 5 0 1 2 : E u 3 ! . YV 0 1 : E u 3 1 . (Y,

Gd) B〇3: Eu31, Zn3(P〇4)2: Mn, etc., green can use ZnSi〇4: Mn, BaAli2〇i9: Mn. B a M g A 1 1 1 0 2 3 : Μ η , L a P 0 4 : (Ce, T b ), Y3 (A1, Ga) 5〇12: Tb, etc., blue can use Y 2 S i 0 5 , Ce, B a M g A 1 i 〇0 i 7 : E u 2 1 . -10- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1272450 Α7 Β7 V. Invention description (8) Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative prints B a Μ g A 1 1 1 〇2 3 : Ε U ο : ( C a X Sr Β a ) 1 〇( Ρ 0 1 ) 6 C 1 2 · E i α 2 Bu, (Z η C d ) S :A g, etc. 0 Ρ D Ρ, LCD, organic EL elements, etc. used in color filter forming materials ΛΒΕ J \ \\ machine particles in red can be used ί 吏 F e 2 0 3 and other green can use C r 2〇 3, etc., blue, C 0 〇., A 1 2 〇3, etc. 0 Ρ D Ρ, black stripes (matrix) of LCD, organic EL element, etc. The inorganic particles used in the material for formation may be, for example, C 〇, C r CUF e , Μ η Metals such as N i T i and Z π and their oxide composite oxide carbides 氮化 nitrides, sulfides, bismuth boride and UU ash graphite, and may be used alone or in combination of two or more kinds. Jiazhi's inorganic industry can be exemplified by C 〇, C r > C u , F e > η η N 1 and Τι c, metal particles, metal oxides and composite oxide particles, etc. The particle size is preferably 0 • 0 1 1 0 β m is more preferably 0. 〇5 ～5 # ] [ΊΊ , 特佳为0 . . . . . . . . . . . . . . . 2 m [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ [ Among the materials for forming color filters and black stripes (matrix), one can also use a low-melting glass frit as a component of the 4ee machine particle 0 low-melting glass frit. For example, lead oxide or boron oxide oxide system (P b〇) — Β 2〇3 - -S i〇2 series) 2 lead oxide boron oxide ruthenium oxide, alumina system (P b 〇 B B 2 〇 3 - S i ( D 2 ) - A 1 2 〇 3 series) > 3 oxygen Fresh boron oxide, lanthanum oxide system (Z η 〇-B 2 〇3 -S ] L 0 2 system), > zinc oxide, boron oxide, yttrium oxide alumina system ( Ζ η 〇 B 2 0 ^ J _ -S 1 〇2 — A 1 2〇3 series) 5 Lead oxide, zinc oxide, boron oxide, lanthanum oxide system (P b〇一Ζ η〇—(Please read the back of the note before you fill out this page) The scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1272450 A7

V. Description of invention (9) Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed B 2〇3 -S i〇2 series), 6 lead oxide, zinc oxide, boron oxide, oxidized sand, oxidation i Lu (Pb〇一Zn〇-B2〇3 — S i〇2 — A 1 2〇3 series), 7 yttrium oxide, boron oxide, lanthanum oxide system (B i 2〇3 - B 2〇3 — S 1〇2 series), 8 Cerium oxide, boron oxide, cerium oxide, aluminum oxide (B 1 2〇3—B2〇3—S 1〇2 — a 12〇3 series), 9 cerium oxide, zinc oxide, boron oxide, lanthanum oxide system (B i 2〇3 Zn〇-B2〇3—S i〇2 series), 10 yttrium oxide, zinc oxide, boron oxide, oxidized oxidized stone, oxidized I lys (B i 2〇3 ζ 〇 〇 B 2 〇3 — 5 1〇2 — A 1 2〇3 series) and so on. In these low-melting glass frits, it is better to use the error-free glass frit from the side of the ring, and from the viewpoint of the stability of the photosensitive composition, it is particularly preferable to use yttrium oxide. As the main component of the error-free glass frit. The softening point of the above low-melting glass frit is usually 650 ° C or less, preferably 4 〇〇 to 6 〇〇 ° C. Further, the shape of the low-melting point glass frit is not particularly limited, and the average particle diameter is preferably 〇 1 to 1 0 // m, more preferably 0.5 to 5 // m. The low-melting glass frit described above may be used alone or in combination of two or more low-melting glass frits having different glass frit compositions, different softening points, different shapes, and different average particle diameters. The content of the low-melting-point glass frit in this case varies depending on the use, and is usually 70 parts by mass or less, preferably 50 parts by mass or less, based on 100 parts by mass of the total amount of the inorganic particles containing the low-melting glass frit. Preferably, it is 30 parts by mass or less of the photosensitive transfer film of the present invention, and the number of inorganic particles having a particle diameter exceeding the film thickness of the photosensitive transfer layer is preferably the number of all inorganic particles in the photosensitive transfer layer. 1% or less, more preferably 5% or less, and the paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) — — — — II — ——— — — —I— ^ « — — — — — — II (Please read the note on the back and fill out this page) 1272450 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed Β 7 Β 7 5, invention description (10) is less than 1%, especially good for q · 5 or less. Usually, the number of inorganic particles having a particle diameter exceeding the intended thickness of the photosensitive transfer layer is preferably 10,000 times or less of the total number of inorganic particles by a method such as pulverization, classification, filtration or the like. (B) Alkali-soluble resin The alkali-soluble resin used in the photosensitive composition may be various resins. Here, the term "alkali solubility" means a property of being dissolved by an alkaline developing solution and having a solubility which can be subjected to a desired development process. Specific examples of such an alkali-soluble resin include a (meth)acrylic resin, a hydroxystyrene resin, a novolac resin, and a polyester resin. Among such alkali-soluble resins, particularly preferred are copolymers of the following monomers (i) and monomers (1 1 1), monomers (i), monomers (ii) and monomers (i 1 i ). An acrylic resin such as a copolymer. Monomer (1): monomeric acrylic acid, methacrylic acid, maleic acid, fumaric acid, crotonic acid, itaconic acid, citraconic acid, mesaconic acid, cinnamic acid, succinic acid containing a carboxyl group Mono(2-(meth)acryloyloxyethyl)ester, ω-carboxy-polybutyrolactone mono(meth)acrylate, and the like. Monomer (11): a hydroxyl group containing a monomer such as 2-hydroxyethyl (meth)acrylate, 2-propyl propylate, 3-hydroxypropyl (meth)acrylate, or the like. Body type, the paper size of the neighbor is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -----------•装:----:---订--- ------ (Please read the notes on the back and fill out this page) 1272450 Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperatives Print A7 B7 V. Description of Invention (11) Monohydroxystyrene, m-hydroxystyrene, A phenolic hydroxy monomer or the like which is p-hydroxystyrene or the like. Monomer (iii): other copolymerizable monomers such as methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, n-lauryl (meth)acrylate, (methyl) a (meth) acrylate other than the monomer (1) such as benzyl acrylate, glycidyl (meth)acrylate or dicyclopentanyl (meth)acrylate; styrene, α-methylstyrene, etc. Aromatic vinyl monomer; conjugated diene such as butadiene or isoprene; polystyrene, poly(methyl) acrylate, poly(ethyl) acrylate, poly(A) A macromonomer having a polymerizable unsaturated group such as a (meth) acrylonitrile group at the terminal of one of the polymer chains, such as benzyl acrylate. a copolymer of the above monomer (1) and a monomer (i 1 1 ), a monomer (i), a monomer (1 i ) and a monomer (1 1 1 ) via a monomer (i) and / or a monomer having a phenolic hydroxyl group in the presence of a monomer component (1 i ), which is an alkali-soluble substance. Among them, a copolymer of the monomer (1), the monomer (1 1 ), and the monomer (1 1 1 ) is derived from (A) the dispersion stability of the inorganic particles and the solubility of the alkaline developing solution described later. The words are especially good. The copolymerization component content of the monomer (1) in the copolymer is preferably from 1 to 50% by mass, particularly preferably from 5 to 30% by mass, and the copolymer component content from the monomer (1 1 ) is preferably contained. It is 1 to 50% by mass, and particularly preferably 5 to 30% by mass. In addition, the monomer (1 1) component is 2-hydroxyethyl (meth)acrylate or 2-(meth)acrylic acid - the paper is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) --- --------装--------订------ !# (Please read the notes on the back and fill out this page) 1272450 A7 ^一—_B7 ___ V. Invention Description (12) A hydroxyl group-containing monomer such as propyl ester or 3-hydroxypropyl (meth)acrylate is preferred. (Please read the precautions on the back and fill in this page.) The molecular weight of the alkali-soluble resin constituting the photosensitive composition is the weight average molecular weight of polystyrene based on G pc (hereinafter 'also referred to as the weight average molecular weight (Mw). ))) is preferably 5,000 to 5,0,0, 000, and more preferably 10,000 to 30,000. The content of the alkali-soluble resin in the photosensitive composition is usually from 1 to 500 parts by mass, preferably from 10 to 200 parts by mass, per 100 parts by mass of the inorganic particles. Further, a resin other than the soluble resin may be contained in the photosensitive composition. (c) a compound containing an ethylenically unsaturated group and a compound containing an ethylenically unsaturated group as a photosensitive composition. If it contains an ethylenically unsaturated group, it can carry out radical polymerization by the photoinitiator which mentions later. The compound may be, and is not particularly limited to, and usually a (meth) acrylate compound is used. The Ministry of Economic Affairs Intellectual Property Office employee consumption cooperative prints a compound containing an ethylenically unsaturated group, preferably using a compound having two or more methacryl fluorenyl groups in one molecule, and at least 4 in one molecule. a compound of an acrylonitrile group. By containing a compound having two or more methacryl fluorenyl groups in one molecule, a pattern having high accuracy can be formed, and a photosensitive transfer film having a photosensitive transfer layer excellent in thermal decomposition property can be obtained. And 'through a compound containing at least 4 (meth) acryloyl groups in one molecule, it can provide the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1272450 which can be formed under high sensitivity. Ministry of Economic Affairs, Intellectual Property Bureau, Staff and Consumer Cooperatives, Printed A7 B7 V. Invention Description (13) Photosensitive transfer film with high dimensional accuracy. Specific examples of the compound having two or more methacryl fluorenyl groups in one molecule include dimethyl propionate of an alkyl diol such as ethylene dioxime or propylene glycol; polyethylene glycol, polypropylene glycol, etc. Dialkyl acrylates of alkyl diols; two terminal hydroxylated polymers of two terminal hydroxy polybutadienes, two terminal hydroxy polyisoprene, two terminal hydroxy polycaprolactones, etc. a methacrylate; a polymethacrylic acid of a trivalent or higher polyhydric alcohol such as glycerin, 1 ' 2 ' 4 - butane triol, trimethylol alkane, tetramethylol alkane, pentaerythritol or dipentaerythritol; Esters; polymethacrylates of polyalkylene glycol adducts of trivalent or higher polyhydric alcohols; ring type of 1,4-cyclohexanediol, 1,4-benzenediol, etc. Polymethacrylates of polyhydric alcohols; polyester methacrylates, epoxy methacrylates, urethane methacrylates, alkanol resins methacrylates, polyoxyxyl methacrylates, Low methacrylate such as snail resin methacrylate. Among them, dimethacrylates of alkyl diols such as ethylene glycol and propylene glycol; dimethacrylates of polyalkyl diols such as polyethylene glycol and polypropylene glycol; glycerin, Polymethacrylates of trivalent or higher polyhydric alcohols such as monobutane triol, trimethylol alkane, tetramethylol alkane, pentaerythritol, dipentaerythritol, etc.; A polymethacrylate of a polyalkylene glycol adduct of an alcohol is preferred, and ethylene glycol dimethacrylate, propylene glycol dimethacrylate, polyethylene glycol dimethacrylate, Polypropylene glycol dimethacrylate, glyceryl dimethacrylate, glyceryl trimethacrylate, trimethyl methacrylate paper size applicable to China National Standard (CNS) A4 specification (210 X 297 mm) -- --------Install one---1---book--------- (please read the notes on the back and fill out this page) 1272450 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative System A7 B7 V. Description of invention (14) Propyl ester, bis(trimethylol)propane tetramethacrylate, three Acrylate, pentaerythritol-yl, pentaerythritol tetramethacrylate, dipentaerythritol penta methacrylic acid hexamethyl ester, and dipentaerythritol acrylate, dipentaerythritol is more preferred, and trimethyl acrylate, trimethylolpropane ester is particularly preferred. Further, specific examples of the compound having at least four (meth)acryl fluorenyl groups in one molecule may be a tetravalent or higher polyvalent such as bis(trimethylol)alkane, tetramethylolalkane, pentaerythritol or dipentaerythritol. Poly(meth)acrylates of alcohols; poly(meth)acrylates of polyalkylene glycol adducts of tetravalent or higher polyols; polyester (meth)acrylates, (methyl) Epoxy acrylate, (meth) acrylate, alkanol resin (meth) acrylate, polyoxymethylene (meth) acrylate, stear resin (meth) acrylate, etc. Low (meth) acrylates and the like. Among these compounds containing an ethylenically unsaturated group, polymethacrylates of a polyvalent or higher polyvalent alcohol such as bis(trimethylol)alkane, tetramethylolalkane, pentaerythritol or dipentaerythritol; Polymethacrylates of polyalkylene glycol adducts of tetravalent or higher polyhydric alcohols are preferred and are bis(trimethylol)propane, tetrakis(methyl) More preferably, pentaerythritol ester of acrylic acid, dipentaerythritol penta(meth)acrylate or dipentaerythritol hexa(meth)acrylate is preferred, and dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, etc. The compound having a dipentaerythritol skeleton is particularly preferable. These compounds may be used alone or in combination of two or more. The other (meth) acrylate compound may, for example, be a methacrylic paper in a compound having two or more methacryl fluorenyl groups in the above-mentioned molecule. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297). Mm) ---------! Install i·- -I! Booking·丨! ----- (Please read the notes on the back and fill out this page) 1272450 A7 B7 V. Inventions (15) (Please read the notes on the back and fill out this page) The olefinic group is changed to propylene fluorenyl The compound (except for a compound having four or more acrylonitrile groups in one molecule) constitutes a compound represented by the monomers (1), (1i) and (1 1 1 ) of the above binder resin. The molecular weight of the ethylenically unsaturated group-containing compound used in the present invention is not particularly limited, but usually the molecular weight is 5,0 0 or less. The amount of the compound containing an ethylenically unsaturated group is usually from 20 to 500 parts by mass, more preferably from 40 to 250 parts by mass, per 100 parts by mass of the alkali-soluble resin. In addition, the amount of the other ethylenically unsaturated compound to be used is usually 1.0% by mass or less based on 100 parts by mass of the alkali-soluble resin. (D) Photopolymerization Initiator, Ministry of Economic Affairs, Intellectual Property Office, Employees' Consumer Cooperative, which prints a photopolymerization initiator which constitutes a photosensitive composition, as long as it can generate radicals in the exposure process described later, and initiates the aforementioned ethylenically unsaturated group. The compound 'polymerization reaction of the compound' is not particularly limited, and it is preferably such that the weight reduction at 40 ° C is 90% or more. Namely, in the case where several kinds of photopolymerization initiators are used, the photopolymerization initiator is in an amount of 4,000. (The weight reduction is preferably 90% or more. By containing the photopolymerization initiator, a pattern having high accuracy can be formed, and a photosensitive transfer film excellent in thermal decomposition property can be provided. Here, " The weight reduction in 40 ° C refers to the photopolymerization initiator, which is subjected to thermogravimetric analysis at a temperature increase rate of 1 〇 ° C per minute according to { 1 - (weight at 400 ° C / 50 ° C) Medium weight)}X 100 (%) This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1272450 A7 B7 ____ V. Invention description (16) The enthalpy obtained by this photopolymerization The agent is not particularly limited as long as it can generate a radical in the exposure process to be described later and initiates a polymerization reaction of the compound containing an ethylenically unsaturated group, and two or more kinds thereof may be used singly or in combination, and it is preferred to use two or more. The compound of the above formula (1) is more preferably exemplified by the compound of the following formula (1) (hereinafter, also referred to as "photopolymerization initiation". Compound (1)") and a compound of the following formula (2) (below , also known as "photopolymerization initiator (2)" (please read the notes on the back and fill out this page)

Ministry of Economic Affairs, Intellectual Property Bureau, employee consumption cooperative, printing

5 6 R R Ν 2 (In the formula (1), R1 and R2 independently of each other represent an alkyl group having 1 to 6 carbon atoms)

(In the formula (2), R 3 , R '1, R 5 and R 6 independently of each other represent a group having 1 to 6 carbon atoms. In the above formula (1), R1 and R 2 are carbon numbers 1 to 4 The base of the house is specifically based on the Chinese National Standard (CNS) A4 specification (210 X 297 mm) for methyl, ethyl, n-propyl, isopropyl, n-butyl and isobutyl paper. 1272450 A7 B7 _ V. Description of the Invention (17) The group, the second butyl group and the third butyl group are preferred, and a methyl group is particularly preferred. (Please read the precautions on the back and fill out this page.) R3, R4, R5 and R6 in the above formula (2) are alkyl groups having 1 to 4 carbon atoms, specifically methyl, ethyl and n-propyl. The group is preferably an isopropyl group, an isopropyl group, an isobutyl group, a second butyl group or a third butyl group, and particularly preferably an ethyl group. In the photosensitive composition of the present invention, it is particularly preferred to contain both the photopolymerization hair styling agent (1) and the photopolymerization initiator (2). When both of the photopolymerization initiator (1) and the photopolymerization initiator (2) are contained, the sensitivity at the time of exposure can be increased more than when they are separately contained, and a good pattern shape can be obtained. The content ratio of the photopolymerization initiator (1) to the photopolymerization initiator (2) is preferably in the range of not more than the photopolymerization initiator (1) in terms of mass, and a particularly preferable content ratio. Photoinitiator (1) · Photopolymerization initiator (2) is a photopolymerization initiator of 5 〇:5 〇 to 9 5 : 5 ° 4 0 0 ° C and a weight reduction of 90% or more. A thioxanthone-based photopolymerization initiator such as 2,4-diethylthioxanthone. Specific examples of other photopolymerization initiators printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs include benzyl, benzoin, benzophenone, camphorquinone, 2-hydroxy-2-methyl-1-phenylpropane-1 Monoketone, 1-hydroxycyclohexyl phenyl ketone, 2,2-dimethoxy-2-phenyl phenyl benzene, 2-benzyl-2-dimethylamino 1- 1 (4-morpholinophenyl) a carbonyl compound such as monobutane-1-one, bis(2,6-dimethoxybenzhydryl)-2,4,4-trimethylpentylphosphine oxide, bis(2,4,6- Phosphine oxide such as trimethyl benzhydryl)-phenylphosphine oxide. This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm). 1272450 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed A7 B7 , invention description (18) compound; 4 - azido compound such as azidobenzaldehyde; organic sulfur compound such as mercaptan disulfide; 2, 4 a double (trichloromethyl)-6-(2^- Chlorophenyl)-1,3,5 - three tillage, 2-[2(2-furyl)extended ethyl]-4,6-bis(trichloromethyl)-1,3,5-three Imidazole dimers such as trihalomethanes, 2,2 >-bis(2-chlorophenyl)-4,5,4 ',5 / -tetraphenyl 1 ' 2 / -biimidazole And they may be used alone or in combination of two or more. Further, in the photosensitive composition used in the present invention, a sensitizer, a sensitizing aid, a hydrogen donor, a chain shifting agent or the like may be used. The content ratio of the photopolymerization initiator is usually from 0.1 to 100 parts by mass, preferably from 1 to 50 parts by mass, based on 100 parts by mass of the total of the alkali-soluble resin and the compound containing an ethylenically unsaturated group. . (E) Solvent The photosensitive composition usually contains a solvent. The solvent is an affinity for (A) inorganic particles, (B) an alkali-soluble resin, (C) a compound containing an ethylenically unsaturated group, (D) a photopolymerization initiator, and, if necessary, various (F) The solubility of the additive is good, and the photosensitive composition can be imparted with a moderate viscosity, and can be dried and easily evaporated. Specific examples of such a solvent include ketones such as diethyl ketone, methyl butyl ketone, dipropyl ketone, and cyclohexanone; pentanol, 4-methyl-2-pentanol, and cyclohexanol. Alcohols such as diacetone alcohol; ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, etc. The paper scale is applicable to the Chinese National Standard (CNS) A4 specification. (210 X 297 mm) nn ϋ t ί «I ϋ «ϋ mmmae n I- n I ϋ I ϋ one: 0, · I emme in ϋ ϋ ϋ I (please read the notes on the back and fill out this page) 1272450 A7 B7 V. INSTRUCTIONS (19) Ether alcohols; saturated aliphatic monocarboxylic acid alkyl esters such as n-butyl acetate and amyl acetate; lactate such as ethyl lactate and n-butyl lactate; An ester of cellulose acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, ethyl 3-methoxypropionate, etc., and may be used singly or in combination. the above. The solvent content ratio in the photosensitive composition can be appropriately selected within a range in which good photosensitive transfer layer formation properties (fluidity or plasticity) are obtained, and usually, relative to (A) inorganic particles of 100 parts by mass, 1 to 10, 000 parts by mass, preferably 10 to 1, and 0 parts by mass. (F) various additives in the photosensitive composition may contain, in addition to the above components (A) to (E), a plasticizer, an adhesion aid, a dispersant, a storage stabilizer, an antifoaming agent, an antioxidant, and an ultraviolet ray. Various additives such as an absorbent, a leveling agent, and a development accelerator are used as optional components. (Please read the notes on the back and fill out this page.) Ministry of Economic Affairs, Intellectual Property Bureau, Staff and Consumer Cooperatives, Printing 1 Plasticizer, Plasticizer, added to make the photosensitive transfer layer formed with good flexibility and flammability. . Specifically, the compound represented by the following formula (3) or (4) is preferably used since it can be easily decomposed and removed by heat and does not adversely affect the performance of the obtained pattern. R-

(3) The paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -22 - 1272450 A7 V. Inventive Note (20) (where R7 and R1 represent the same or different carbon, respectively The number of alkyl groups, R8 and R respectively represent the same or different methylene groups or alkyl groups having 2 to 30 carbon atoms, s is the number of 〇~5, and t is the number of 1~1〇 ) Η Η 11 (4) (Please read the notes on the back and fill out this page)

H3C——C——C——〇——〇——R

OH H (wherein R11 is a hospital base or a storage group of 1 to 30), wherein the alkyl group represented by 'R7 or _R1Q in the above formula (3), and the extension represented by r8 or R9 The alkyl group may be linear or branched, and may be a saturated group or an unsaturated group. The number of carbon atoms of the alkyl group represented by R9 or R1() is from 1 to 30, preferably from 2 to 20, more preferably from 4 to 1. When the number of carbon atoms of the alkyl group exceeds 30, the solubility of the plasticizer with respect to the solvent is lowered, and the IL transfer film cannot achieve good flexibility. Specific examples of the compound represented by the above formula (3) printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs include dibutyl adipate, diisobutyl adipate, and di-2-hexyl adipate. , adipic acid di-2-hexyl ester, dibutyl sebacate, dibutyl diethylene glycol adipate and the like. Preferably, the compound represented by η is 2 to 6. In the above formula (4), the alkyl group and the alkenyl group represented by R 1 1 may be linear or branched, and may be a saturated group or an unsaturated group. The number of carbon atoms of the alkyl group or the alkenyl group represented by R 1 1 is from 1 to 30, preferably from 2 to 2, and more preferably from 10 to 18. Specific examples of the compound represented by the above formula (4) include a single lauric acid paper size applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1272450 A/B7 5. Inventive Note (21) Propylene glycol ester, Propylene glycol monooleate and the like. The content ratio of the plasticizer in the photosensitive composition is preferably from 0. 1 to 20 parts by weight, and more preferably from 5% to 5 parts by weight, based on 100 parts by weight of the inorganic particles. 0 Adhesive Adhesive Adhesive Adhesive A broth coupling agent (alkoxy alkane containing a saturated alkyl group) of a compound represented by the following formula (5) is suitable for use (please read the back of the back) Please fill out this page again)

CpH2p+1

Si oc OCmH2m+1 ) (5) (CnH2n+1) wherein P is an integer of 3 to 20, m is an integer of 1 to 3, η is an integer of 〜3, and a is an integer of 1 to 3. In the above formula (5), P representing a saturated alkyl carbon number is an integer of 3 to ◦, and preferably an integer of 4 to 16. Specific examples of the decane coupling agent represented by the above formula (5) in the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs can be cited as n-propylene dimethyl decane, n-butyl dimethyl methoxy decane, and positive a saturated alkyl dimethyl methoxy decane such as mercaptomethyl methoxy decane, n-hexadecyldimethyl methoxy decane, n-dioxane dimethyl methoxy decane, etc. Ethyl methoxy decane, n-butyldiethyl methoxy fluorene, n-decyldiethyl methoxy sand, and hexadecanthyl-ethyl methoxy sand paper scale applicable to Chinese national standards ( CNS) A4 size (210 X 297 mm) 1272450 A7 ________ —__^_ V. Description of invention (22) Saturated alkyl diethyl methoxy decane such as alkane, n-eicosyl diethyl methoxy decane Class (a = 1, m = 1, η = 2); Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed rc-based 1 alkyl alkoxy oxyalkyl 2 oxazane oxalate II thiol thiol Ethylene oxide II mercaptopropyl methoxymethyloxy oxy, oxyethoxyethoxy ethoxy, oxypropyl Oxypropyl propanyl 1 ethyl diethyldiethyl propionate 1 propyl dipropyl bis II methyl methyl ethyl dimethyl ethyl propyl propane a methyl dialkyl ethane dialkyl propane a methyl dialkyl Twenty-two {diyl and diyl and twenty-diyl and diyldiyl-based alkyl-saturated s-alkyl-saturated, s-diyl-based alkyl-saturated; 2) 癸正烷丁六之1) 丁六正,矽正十等=1正十等一一正,矽正十等一一正十, alkyl, n-alkane π, n-alkane π, alkyl , n-alkane η, n-alkyl oxane, decane, alkane, anthracene, alkane oxyalkylene, hydrazine, alkane, fluorenylalkylene 2 fluorenyl 2 decyl ethane alkyl 3 fluorenyloxy oxalate||矽 矽 矽 | 基 基 基 基 | | | | | | | | | | | | | | | | | | | | | | | | | | | | | | | | | | Oxyl, propoxypropylethylmethyl 1 ethyl ethyl propyl propyl propyl 1 propyl propane methyl di II ethyl di II propylene dialkyl methyl di II ethyl diyl and Methane a diethane a di group and dimethane a di饱 } 基 基 基 { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { { n-Alkyl n-n-n-n-n-n-n-n-n-n-n-n-n-n- n- n- n- n- n- n- n-, n-, n- n- n- n- n- n-, n-, n-, n-, n- Read the notes on the back and fill out this page.) The paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). 1272450 A7 _B7 _ V. Description of invention (23) Alkane, n-icosane diethyl Saturated alkyl diethylpropoxy sands such as propoxy decane (a = 1, m = 3 ' η = 2 ); (Please read the back note first and then fill out this page) n-butyldipropyl a saturated alkyldipropyl group such as propyl propoxy decane, n-decyldipropylpropoxy decane, hexadecanthyl dipropylpropoxylate, or a tenth hospital-propyl propane decane Propoxy decanes (a = 1 , m 2 3 , η = 3 ); n-propylmethyldimethoxydecane, n-butylmethyldimethoxydecane, n-decylmethyldimethoxydecane, N-hexadecyl a saturated alkylmethyldimethoxydecane such as dimethoxydecane or n-icosanemethyldimethoxydecane (a = 2, m = 1, η = 1); n-propylethyl Dimethoxydecane, n-butylethyldimethoxydecane, n-decylethyldimethoxydecane, n-hexadecylethyldimethoxydecane, n-icosaneethyldimethoxy Saturated alkyl ethyl dimethoxy oxalates such as decane and the like (a = 2, m = 1, η = 2); n-butyl propyl dimethoxy decane, n-decyl propyl dimethoxy a saturated alkylpropyl dimethoxydecane such as decane, n-hexadecylpropyldimethoxydecane or n-eicosanyldimethoxydecane (a = 2 ' m = 1 ' η = 3), Ministry of Economic Affairs, Intellectual Property Office, Staff Consumer Cooperative, printing n-propylmethyldiethoxydecane, n-butylmethyldiethoxydecane, n-decylmethyldiethoxydecane, n-hexadecyl a saturated alkylmethyldiethoxy 5 oxime (a = 2 ' m 2 ' η = 1 ), a positive propyl group, such as a diethoxy oxa alkane or an n-eicosanyl methyl diethoxy decane Base ethyl diethoxy decane, N-butylethyl diethoxy fluorene, n-decyl ethyl diethoxy decane, n-hexadecyl ethyl diethoxy sand paper size applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) 1272450 A7 _B7 ____ V. Description of invention (24) Saturated alkyl ethyl diethoxy decanes such as alkane, n-eicosylethyldiethoxydecane (a = 2, m=2, n = 2); (Please read the note on the back and fill out this page) n-butyl propyl diethoxy decane, n-decyl propyl diethoxy decane, n-hexadecyl propyl di ethoxy a saturated alkyl propyl diethoxy decane such as decane, n-icosylpropyldiethoxy decane or the like (a = 2 ' m = 2 , η = 3 ); n-propylmethyldipropoxy Decane, n-butylmethyldipropoxydecane, n-decylmethyldipropoxydecane, hexadecylmethyldimethoxyoxyphthalate, Ortho 20th Methyldipropoxy-5, etc. Saturation of the group of methyl-propoxylates (a = 2, m = 3, η 2); n-propylethyldipropoxy sand, n-butylethyl-propoxy 5兀火兀, n-decylethyldipropoxyfluorene Alkyl, n-hexadecylethyldipropoxydecane, n-hexadecaneethyldipropoxydecane, etc., saturated alkylethyldipropoxylates (a = 2, m = 3, η = 2 ); n-butylpropyldipropoxydecane, n-decylpropyldipropoxydecane, n-hexadecylpropyldipropoxydecane, n-icosylpropyl-propoxydecane Saturated alkyl propyl dipropoxy decanes (a = 2 ' m = 3 , η = 3 ); Ministry of Economic Affairs, Intellectual Property Office, Staff Consumer Cooperative, Printing n-propyl trimethoxy sand, n-butyl Saturated courtyard-based trimethoxy sulfonate class of alkoxy sand, n-decyltrimethoxydecane, n-hexadecyltrimethoxydecane, n-hexadecane trimethoxy sands (a = 3 ' m = 1 )·, n-propyl triethoxy sand, n-butyl triethoxy sand, n-decyl triethoxy decane, n-hexadecyl triethoxy decane, n-icosane triethyl This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1272450 A7 B7 V. Description of invention (25) Saturated alkyl triethoxy decanes such as oxydecane (a = 3 ' m = 2 ) (Please read the precautions on the back and then fill out this page) n-propyl tripropoxydecane, n-butyl tripropoxy decane, n-decyl tripropoxy sand, and hexamethylene dipropoxy A saturated alkyltripropoxydecane (a = 3 'm 2 ) or the like, which may be used alone or in combination of two or more. Among them, n-butyltrimethoxydecane, n-decyltrimethoxydecane, n-hexyl dimethoxyl 5 yyyin, n-decyl-methylmethyloxy-5 oxime, Zhengshi Hexacyclodimethylmethoxydecane, n-butyltriethoxydecane, n-decyltriethoxydecane, n-hexadecyltriethoxydecane, n-decylethyldiethoxydecane It is particularly preferred that n-hexadecylethyldiethoxydecane, n-butyltripropoxydecane, n-decyltripropoxydecane, n-hexadecane dipropoxydecane, and the like. The content of the adhesion aid in the photosensitive composition is preferably from 0.001 to 10 parts by weight, and more preferably from 0.001 to 5 parts by weight, per 100 parts by weight of the inorganic particles. 3 Dispersant Printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs. The dispersant of inorganic particles is preferably made of fatty acids. In particular, a fatty acid having 8 to 30 carbon atoms is preferred. Preferred examples of the above fatty acid include saturated fatty acids such as caprylic acid, undecanoic acid, lauric acid, myristic acid, palmitic acid, pentadecanoic acid, stearic acid, and arachidic acid; and oleic acid and oleic acid; An unsaturated fatty acid such as linoleic acid, linolenic acid or arachidonic acid may be used alone or in combination of two or more. -Ζό - This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 1272450 A7 B7 V. Invention description (26) (Please read the note on the back and fill in this page) Photosensitive composition The content ratio of the dispersant is preferably from 0 to 〇〇1 to 10% by weight and more preferably from 0. 0 to 5 parts by weight with respect to 100 parts by weight of the inorganic particles. Method of Forming The photosensitive transfer film of the present invention is particularly suitably used for forming a pattern having a height of 10/im or less. In the pattern forming method using the photosensitive transfer film of the present invention, 'the printing process having the photosensitive transfer layer of [1] [2] the exposure engineering of the photosensitive transfer layer, [3] the sensitivity and the conversion The imaging project of the printed layer, [4] The various projects of the photosensitive transfer layer pattern calcination project. [1] Transferring of photosensitive transfer layer The transfer process is to transfer the photosensitive transfer layer constituting the photosensitive transfer film onto the substrate by using the photosensitive transfer film of the present invention. Printed by the Intellectual Property Office of the Ministry of Economic Affairs, the employee's consumer cooperative. The substrate material may be a plate-like element made of, for example, glass, polyfluorene, alumina, or the like, and a glass substrate may be used for P D P . It is also possible to use the surface of the plate member to form a desired pattern in advance. The surface of the substrate may be subjected to a drug treatment such as a decane coupling agent, a plasma treatment, an appropriate pretreatment such as a film formation treatment such as an ion plating method, a sputtering method, a gas phase reaction method or a vacuum deposition method. An example of a transfer project is as follows. After peeling off the protective film of the photosensitive transfer film to be used as needed, the surface of the photosensitive transfer layer is brought into contact with the photosensitive transfer film on the substrate, and the photosensitive property is transferred to _ZV - the paper The scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) A7 1272450 B7___ V. Invention description (27 ) (Please read the note on the back and fill in this page) The printed film is hot pressed with a heating roller. By this, the photosensitive transfer layer can be transferred onto the substrate and brought into close contact with each other. Here, the transfer condition is, for example, that the surface temperature of the heating roller is 20 to 140 ° C, the roller pressure of the heating roller is 1 to 5 kg/cm 2 , and the moving speed of the heating roller is 〇·1 to 1 0 · 0 m / min. Further, the substrate may be preheated, and the preheating temperature may be, for example, 40 to 10 °C. [2] Exposure process of photosensitive transfer layer In the exposure process, the surface of the photosensitive transfer layer is passed through an exposure cover, and radiation is selectively irradiated to form a latent image of the photosensitive transfer layer. Thereafter, the support film on the photosensitive transfer layer may be peeled off before the exposure process, or may be peeled off after the exposure process and before the development process described later. From the viewpoint of an increase in sensitivity, the support film on the photosensitive transfer layer is preferably peeled off after exposure engineering, and before the development process described later. The Ministry of Economic Affairs, the Intellectual Property Office, the employee consumption cooperative, which prints radiation that selectively emits radiation (exposure) in the exposure project, including visible light, ultraviolet light, far ultraviolet light, electron beam or X-ray, etc., preferably using visible light, ultraviolet light, and Far ultraviolet rays, more preferably used ultraviolet rays. The exposure pattern of the cover for exposure differs depending on the purpose, and a stripe of, for example, 1 0 to 5 0 0 // m width can be used. The radiation irradiation device is not particularly limited as long as it is an ultraviolet irradiation device used in an optical lithography method, an exposure device used in the production of a semiconductor or a liquid crystal display device, and the like. -30- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed 1272450 A7 B7 V. Invention Description (28) [3] Photosensitive transfer layer In the image development project, the photosensitive transfer layer to be exposed is subjected to development processing, so that the pattern (latent image) of the photosensitive transfer layer appears. An alkaline developing solution can be used as the developing solution used in the image processing of the photosensitive transfer layer. Thereby, the alkali-soluble resin contained in the photosensitive transfer layer can be easily dissolved and removed. In other words, the inorganic particles contained in the photosensitive transfer layer can be uniformly dispersed through the alkali-soluble resin. Therefore, by dissolving and washing the alkali-soluble resin of the binder, the inorganic particles can be simultaneously removed. Examples of the active component of the alkaline developing solution include lithium hydroxide, sodium hydroxide, potassium hydroxide, sodium hydrogen phosphate, diammonium hydrogen phosphate, dipotassium hydrogen phosphate, disodium hydrogen phosphate, ammonium dihydrogen phosphate, and dihydrogen phosphate. Inorganic basic compound of potassium, sodium dihydrogen phosphate, lithium niobate, sodium citrate, potassium citrate, lithium carbonate, sodium carbonate, potassium carbonate, lithium borate, sodium borate, potassium borate, ammonia, etc.; Ammonium, trimethylhydroxyethylammonium hydroxide, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diiso An organic basic compound such as propylamine or ethanolamine. The alkaline developing solution used in the development of the photosensitive transfer layer can be prepared by dissolving one or two or more of the above-mentioned basic compounds in water. Here, the concentration of the basic compound in the alkaline developing solution is usually from 0. 00 to 10% by mass, preferably from 0, 0 to 5% by mass. An additive such as a nonionic surfactant and an organic solvent may be contained in the test development liquid.尙, after the development process with an alkaline imaging solution / usually applied to a water wash. In addition, if necessary, it can be included in the development process, and the photosensitive transfer layer paper size is applied to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) --------—丨- 1^^^·丨! I -定-------- (Please read the note on the back and fill out this page) 1272450 A7 _______Β7___ V. INSTRUCTIONS (29) The side of the type and the exposed part of the substrate are not partially wiped. (Please read the precautions on the back and fill out this page.) Here, the development processing conditions are appropriate selection of the type, composition, concentration, development time, development temperature, and development method of the developing solution (for example, dipping method, shaking) Method, elution method, spray method, paddle method), developing device, and the like. According to this development, a photosensitive transfer layer pattern (corresponding to the pattern of the exposure cover) composed of the photosensitive transfer layer remaining portion and the photosensitive transfer layer removing portion can be formed. [4] Calcination process of photosensitive transfer layer pattern In this process, the photosensitive transfer layer pattern is calcined to form a pattern. Thereby, the organic substance in the residual portion of the photosensitive transfer layer can be burned off to obtain an inorganic pattern on the surface of the substrate. Here, the temperature of the calcination treatment must be the temperature at which the organic substance in the residual portion of the resin layer is burned off, usually in the atmosphere at 400 to 600 °C. Also, the calcination time is usually from 1 9 to 90 minutes. The pattern of the pattern formed on the substrate as described above is not less than 0 0 A m, preferably 1 to 8 // m, more preferably 2 to 6 &quot; m, Ministry of Economic Affairs Intellectual Property Office employees Printed by a consumer cooperative [Embodiment] Hereinafter, an embodiment of the present invention will be described, but the present invention is not limited thereto.尙, the following “parts” means “parts by mass”. Further, the weight average molecular weight (Mw) is an average molecular weight converted to polystyrene measured by gel permeation chromatography (GPC) manufactured by Tosoh Corporation, trade name HL (-800 2A). China National Standard (CNS) A4 Specification (210 X 297 mm) 1272450 A7 B7 Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed This paper scale applies China National Standard (CNS) A4 specification (210 X 297 mm) V. Invention Description (3Q) &lt;Example 1&gt; (1) Preparation of photosensitive composition: A g particles (granular) having an average particle diameter of 1 / m of (A) inorganic particles of 10 parts, average particle diameter 2 // m of B i 2〇3 — zn〇—Β2〇3 — S i〇2 — A 1 2〇3 is a low-melting point frit (no more open, softening point 5 2 0 °C) 10 parts, As (B) alkali-soluble resin n-butyl methacrylate / 3-hydroxypropyl methacrylate / methacrylic acid = 6 0 / 2 0 / 2 0 (% by mass) copolymer (M w = 10 0, 0 0 0 ) 30 parts, as (C) 20 parts of trimethylolpropane triacrylate containing a compound containing an ethylenically unsaturated group, as a (D) photopolymerization initiator 2 - benzyl group 2 -5 parts of dimethylamino-1-(4-morpholinophenyl)-butane-one-one, 150 parts of propylene glycol monomethyl ether as (Ε) solvent and as (F) dispersant One part of oleic acid was kneaded by an ingot mill, and then filtered with a stainless steel sieve (200 mesh, 2 5 // m diameter) to prepare a photosensitive composition. (2) Production of photosensitive transfer film: The photosensitive transfer film of the present invention in which a photosensitive transfer layer was formed on a support film was produced in accordance with the following operation (i). (i) a support film (width 200 nm, length 3 〇m, thickness 38 /zm) composed of a P Ε T film previously subjected to release treatment with a photosensitive composition, coated with a blade coater, and Apply the film to 1〇0. (: completely remove the solvent after 5 minutes of drying) to form a thickness of 10 on the support film ---- ---------- Pack-------------- (Please read the note on the back and fill out this page) 1272450 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed A7 B7___ V. Invention description (31) // m photosensitive resin layer. Transfer of photosensitive transfer layer Stalk: On the surface of the glass substrate for the 6-inch panel, the photosensitive transfer film is superposed on the surface contacting the photosensitive transfer layer, and the photosensitive transfer film is thermally pressed by a heating roller. The pressure-bonding condition is such that the surface temperature of the heating roller is 1 2 0 ° C, the roller pressure is 4 kg / cm 2 , and the moving speed of the heating roller is 0 · 5 m / min. The surface of the photosensitive transfer layer is in a state of being transferred and adhered. The film thickness of the photosensitive transfer layer is measured to be in the range of 10 // m ± 1 / m. Exposure of the photosensitive transfer layer, Development Project: For the photosensitive transfer layer, a 1 ray (wavelength of 3 6 5 nm) is irradiated with an ultra-high pressure mercury lamp through an exposure cover [5 0 // m width stripe pattern). Outside). Here, the irradiation amount is 40 m J / cm 2 ο After the exposure process is finished, after the support film is peeled off by the photosensitive transfer layer, the photosensitive transfer layer subjected to the exposure treatment is 0.5% by mass of carbonic acid. The sodium aqueous solution (30 ° C) was subjected to a development method of a developing solution for 1 minute. Next, the water-washing treatment is carried out with ultrapure water, whereby the uncured photosensitive transfer layer which is not irradiated with ultraviolet rays is removed to form a pattern. Calcination of photosensitive transfer layer pattern: The glass substrate of the photosensitive transfer layer pattern will be formed in the calciner with I----IIIII ·1111111 ^ « — —— — — — I— (please Read the notes on the back and fill out this page. This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) =-33^ 1272450 A7 B7 V. Description of invention (32) Temperature of 6 0 0 °C The calcination treatment was carried out for 30 minutes under an atmosphere. Thereby, a panel material in which an electrode pattern is formed on the surface of the glass substrate can be obtained. (Please read the precautions on the back and fill out this page.) For the electrode pattern in the obtained sheet, use a scanning electron microscope to measure the line width and height of the electrode pattern, and the accuracy of the pattern width. Degrees were evaluated as 〇 in the range of 50 // m ± 5 m, and others were evaluated as X. Also, the observation of the pattern missing is performed. Next, the quality of the pattern before and after the photosensitive transfer layer pattern calcination was measured, and the mass loss was calculated. The results are shown in Table 1. <Example 2 &gt; In addition to using n-butyl methacrylate/3-hydroxypropyl methacrylate/methacrylic acid = 6 0 / 2 0/2 0 (% by mass) copolymer (M w 2 〇〇, 0 0 〇) 60 parts as (Β) Alkali Soluble Resin Ministry of Economics, Intellectual Property Bureau, Staff Consumer Cooperative, printed, 40 parts of trimethylolpropane triacrylate as (C) compounds containing ethylenically unsaturated groups The photosensitive composition was prepared by the same treatment as in Example 1. In the same manner as in Example 1, except that the photosensitive composition was used, a photosensitive transfer film of the present invention having a photosensitive transfer layer having a thickness of 15 // m was formed on a support film. In the same manner as in Example 1, except that the photosensitive transfer film was used, a panel material forming an electrode pattern was produced and evaluated. The results are shown in Table 1. &lt;Example 3 &gt; In addition to using n-butyl methacrylate/3-hydroxypropyl methacrylate/methacrylic acid = 6 0/2 0/2 0 (% by mass) copolymer (this paper scale is applicable to China) Standard (CNS) A4 size (210 X 297 mm) ~ 35 ; 1272450 A7 ____B7____ V. Description of invention (33 ) M w = 1 〇〇, 0 0 0 ) 9 0 parts as (Β) alkali soluble 忭Resin Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing group, έΜ. 2| 311 olefinic ethics sensation 1 containing the example} adjustment C, the real The application of the 6 ester esters in the same group, the external propylene external light base with the sensate, the hydroxy combination of the three to make the acid of the alkenyl group in addition to C and. The three-satisfaction, the non-existence of the film, the thin film, the transferability, the light-sensing sensation, the sense of sensation, the use of ο, the degree of thickness is removed. The film-forming thin film is transferred to the thin film to support the pattern of the surface of the material and the surface of the material is electrically formed. System 1 , the analysis is shown in the case of 1 case. The same price, the same acid, the acid propyl propyl group II &gt; with acid 4 to make a woman to remove the base &lt; / 6 〇〇2 烯 烯 烯 匕曰酉 匕曰酉 内 内 内 内 内 内 内 内 内 ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) ) For the sake of serving CXI 8 1 I ester - alko propyl ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο &lt;The example of the application is the same as the practice, 1 the external case is made into the same group by the object, and 14 Jr Mang’s combination of the senses makes the basis division. The film is not printed, and the film is printed with a transfer-transfer sensitization. The β is reduced by 5 with a degree of 5 . The film-forming thin film is transferred to the thin film to support the pattern of the surface of the material and the surface of the material is electrically formed. System 1 , the analysis is shown in the case of 1 case. The same price evaluation ‘ Orthoacid propyl propyl group II &gt; using acid 5 to make the case of C &lt;/ 6 〇2 ------------装--------Book--- (Please read the notes on the back and fill out this page) ·· 匕曰 烯Propyl methyl ester propyl hydroxy group \) / % Quantitative / IV 〇 2 This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) -00 - 1272450 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative Printed A7 B7 V. Inventive Note (34) M w = 1 0 0, 0 0 〇) 2 7 parts as (Β) test soluble resin, trimethylolpropane triacrylate 13 parts as (C) The photosensitive composition was prepared by treating in the same manner as in Example 1 except for the compound containing an ethylenically unsaturated group. A photosensitive transfer film of the present invention in which a photosensitive transfer layer having a thickness of 2 Ο ν was formed on the support film was embedded in the same manner as in Example 1 except that the photosensitive composition was used. In the same manner as in Example 1, except that the photosensitive transfer film was used, a panel material forming an electrode pattern was produced and evaluated. The results are shown in Table 1. &lt;Example 6 &gt; In addition to the use of C u - F e - Μ η composite oxide particles (spherical) having an average particle diameter of 0 · 3 # m, 1 Ο 0 parts, and an average particle diameter of 2 # m of B i2 〇 3 — Zn〇—B2〇3—S i〇2 — A 12〇3 series low melting glass frit (unshaped, softening point 5 2 0 °C) 10 parts as (A) inorganic particles, butyl methacrylate Ester / 3-hydroxypropyl methacrylate / methacrylic acid = 60 / 20 / 20 (% by mass) copolymer (Mw = 1 0 0, 0 0 0) 20 parts as (B) alkali-soluble resin, three The photosensitive composition was prepared by treating in the same manner as in Example 1 except that 80 parts of trimethylolpropane acrylate was used as the compound (C) containing an ethylenically unsaturated group. A photosensitive transfer film of the present invention having a photosensitive transfer layer having a thickness of 1 μm formed on a support film was produced in the same manner as in Example 1 except that the photosensitive composition was used. In the same manner as in Example 1, except that the photosensitive transfer film was used, a black panel pattern was formed, and the black matrix pattern was evaluated. The results are shown in Table 1. This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) -37 - -------------------- Order ------- (Please read the notes on the back and fill out this page) 1272450 Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperatives Print A7 B7 V. Invention Description (35) &lt;Example 7 &gt; In addition to using n-butyl methacrylate/3-hydroxypropyl methacrylate/methacrylic acid = 6 0/2 0/2 0 (% by mass) copolymer (M w = 1 〇〇) , 0〇〇) 1 8 parts as (Β) alkali-soluble resin, trimethylolpropane triacrylate 120 parts as (C) compound containing ethylenically unsaturated group, treated as in Example 6 A photosensitive composition is prepared. A photosensitive transfer film of the present invention having a photosensitive transfer layer having a thickness of 15 // m was formed on the support film in the same manner as in Example 6 except that the photosensitive composition was used. A panel material of a black matrix pattern was produced and evaluated in the same manner as in Example 6 except that the photosensitive transfer film was used. The results are shown in Table 1. &lt;Example 8 &gt; In addition to using n-butyl methacrylate/3-hydroxypropyl methacrylate/methacrylic acid = 6 0/2 0/2 0 (% by mass) copolymer (M w = 1 〇〇 , 0 〇〇) 3 6 parts as (Β) alkali-soluble resin, trimethylolpropane triacrylate 24 parts as (C) compound containing an ethylenically unsaturated group, treated in the same manner as in Example 6, prepared Photosensitive composition. A photosensitive transfer film of the present invention having a photosensitive transfer layer having a thickness of 10 V was formed on the support film in the same manner as in Example 6 except that the photosensitive composition was used. In the same manner as in Example 6, except that the photosensitive transfer film was used, a panel material forming a black matrix pattern was produced and evaluated. The results are shown in Table 1. This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) ------------Installation--------Set--------- (Please read the notes on the back and fill out this page) 1272450 A7 B7 V. Description of invention (36) &lt;Example 9 &gt; (Please read the note on the back side and then fill out this page) In addition to using n-butyl methacrylate/3-hydroxypropyl methacrylate/methacrylic acid = 60/20/20 (% by mass) Copolymer (M w = 1 0 0, 0 0 0 ) 60 parts as (Β) alkali soluble resin, 40 parts of trimethylolpropane triacrylate as (C) containing ethylenically unsaturated groups Other than the compound, it was treated in the same manner as in Example 6 to prepare a photosensitive composition. In the same manner as in Example 6, except that the photosensitive composition was used, a photosensitive transfer film of the present invention having a photosensitive transfer layer having a thickness of 15 // m was formed on a support film. In the same manner as in Example 6, except that the photosensitive transfer film was used, a panel material forming a black matrix pattern was produced and evaluated. The results are shown in Table 1. &lt;Example 1 0 &gt; In addition to using n-butyl methacrylate/3-hydroxypropyl methacrylate/methacrylic acid = 6 0/2 0/2 0 (% by mass) copolymer (M w = 1 0 〇, 0〇〇)9 〇 as (Β) Alkali Soluble Resin Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed, 100 parts of trimethylolpropane triacrylate as (C) contains ethylenically unsaturated groups The photosensitive composition was prepared by treating in the same manner as in Example 6 except for the compound. In the same manner as in Example 6, except that the photosensitive composition was used, a photosensitive transfer film of the present invention having a thickness of 2 0 ν m formed on a support film was formed. In the same manner as in Example 6, except that the photosensitive transfer film was used, a panel material forming a black matrix pattern was produced and evaluated. The results are shown in Table 1. This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm). 1272450 A7 B7 V. Description of invention (37) &lt;Comparative Example 1 &gt; (Please read the note on the back side and then fill out this page) In addition to using n-butyl methacrylate / 3-hydroxypropyl methacrylate / methacrylic acid = 60/20/20 (% by mass) Copolymer (M w 二 1 0 0, 〇〇0 ) 9 parts as (Β) test soluble resin, trimethylolpropane triacrylate 6 parts as (C) compounds containing ethylenically unsaturated groups The same as in Example 1 was treated to 'modulate the photosensitive composition. A photosensitive transfer film of the present invention which was formed on a support film to form a photosensitive transfer layer having a thickness of 4 // m was treated in the same manner as in Example 1 except that the photosensitive composition was used. The panel material forming the electrode pattern was produced and evaluated in the same manner as in Example 1 except that the photosensitive transfer film was used. The results are shown in Table 1. &lt;Comparative Example 2 &gt; In addition to using n-butyl methacrylate/3-hydroxypropyl methacrylate/methacrylic acid=60/20/20 (% by mass) copolymer (Ministry of Commerce, Intellectual Property Office, Staff Consumption Cooperative Mw = 1 0 0, 0 0 0 ) 60 parts as (Β) alkali-soluble resin, 40 parts of trimethylolpropane triacrylate as (C) a compound containing an ethylenically unsaturated group, The photosensitive composition was prepared by the same treatment as in Example 1. In the same manner as in Example 1, except that the photosensitive composition was used, the photosensitive transfer film of the present invention having a photosensitive transfer layer having a thickness of 40% was formed on the support film. In the same manner as in Example 1, except that the photosensitive transfer film was used, a panel material forming an electrode pattern was produced and evaluated. The results are shown in Table 1. -40 - This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm). 1272450 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing A7 B7 V. Invention description (38) &lt;Comparative Example 3 &gt; In addition to using n-butyl methacrylate/3-hydroxypropyl methacrylate/methacrylic acid = 6 0/2 0/2 0 (% by mass) copolymer (M w = 1 〇〇 , 〇〇〇) 3 6 parts as (Β) alkali soluble resin, trimethylolpropane triacrylate 24 parts as (C) compound containing ethylenically unsaturated group, treated in the same manner as in Example 6 Photosensitive composition. In the same manner as in Example 6, except that the photosensitive composition was used, a photosensitive transfer film of the present invention having a photosensitive transfer layer having a thickness of 4 // m was formed on a support film. A panel material forming a black matrix pattern was produced and evaluated in the same manner as in Example 6 except that the photosensitive transfer film was used. The results are shown in Table 1. &lt;Comparative Example 4 &gt; In addition to using n-butyl methacrylate/3-hydroxypropyl methacrylate/methacrylic acid 2 60/2 0/2 0 (% by mass) copolymer (M w = 1 〇〇) , 〇〇〇) 1 8 parts as (Β) alkali-soluble resin, trimethylolpropane triacrylate 120 parts as (C) compounds containing ethylenically unsaturated groups, Tongbao Example 6 The photosensitive composition is prepared and processed. A photosensitive transfer film of the present invention having a photosensitive transfer layer having a thickness of 40 // m was formed on the support film in the same manner as in Example 6 except that the photosensitive composition was used. In the same manner as in Example 6, except that the photosensitive transfer film was used, a face material sheet forming a black matrix pattern was produced and evaluated. The results are shown in Table 1. This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) ------------ -- - Order --------- (Please read the back Note: Please fill in this page again) 1272450 V. INSTRUCTIONS (39) [Table 1] A7 B7 Height (accuracy) Loss weight loss Example 1 2 μ m 〇 34% by weight Example 2 2 β m 〇M jw \49 wt% Example 3 2 ii m 〇M j \ \ \ 59 wt% Example 4 5 // m 〇 EJ v \\ 25 wt% Example 5 5 // m 〇 and j\\\ 32 weight % Example 6 2 β m 〇M ^ \ \\ 65 wt% Example 7 2 // m 〇M j \\\ 74% by weight Example 8 5 β m 〇te / i 38% by weight Example 9 5 β m 〇 and J\\\ 49% by weight Example 10 5 μ. m 〇MJ w\ 59% by weight Comparative Example 1 2 pt m 〇 16% by weight Comparative Example 2 5 /zm X j \ \\ 49% by weight Comparison Example 3 2 β m 〇 has 38% by weight Comparative Example 4 5 u 111 XJ \ w 74% by weight r ---------------- (Please read the back note first and then fill in this page) # · Ministry of Economic Affairs Intellectual Property Bureau Co-op work printed in this paper scale applicable Chinese National Standard (CNS) A4 size (210 X 297 mm) 1272450 A7 ___B7__ V. Description (4Q) invention &lt;Example 1 1 &gt; (1) Modulation of photosensitive composition: (Please read the precautions on the back side and then fill out this page) The average particle diameter of the inorganic particles (A) will be 〇. 5 # m的cr a C u composite oxide particle (granular) 60 parts, an average particle size of 4 // πί P b〇-B 2〇3 — S i〇2 is a low-melting glass frit (unshaped, softening point 5 0 0 °C) 40 parts 'as (B) alkali-soluble resin n-butyl methacrylate / 3-hydroxypropyl methacrylate / methacrylic acid = 60 / 20 / 20 (% by mass) copolymer (Mw = 10 0, 0 0 0 ) 40 parts, as (C) 40 parts of trimethylolpropane triacrylate containing a compound containing an ethylenically unsaturated group, as a (D) photopolymerization initiator 2-benzyl 5 parts of bis-dimethylamino-1-(4-morpholinylphenyl)-butane- 1 ketone, 150 parts of propylene glycol monomethyl ether acetate as (E) solvent and as F) 1 part of oleic acid of the dispersing agent, kneaded by a press grinder, and then filtered with a stainless steel sieve (200 mesh, 1 2 // m diameter) to prepare a photosensitive composition. (2) Production of transfer film: According to the following operations (i) and (ii), the production is carried out in the order of the printed film economics department intellectual property bureau employee consumption cooperative printing, photosensitive transfer layer, and protective film. The transfer film of the present invention. (i) The photosensitive composition was coated on a support film (width 200 mm, length 30 m, thickness 38/m) composed of a PET film using a blade coater, and the coating film was applied at 100 ° C. The solvent is completely removed after drying for 5 minutes, and the average film thickness is formed on the support film. The sensitivity of the paper is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -43 - A7 1272450 ___B7 ____ DESCRIPTION OF THE INVENTION (41) Transfer layer. (ii) on the photosensitive transfer layer formed in the above (i), the protective film composed of the PET film previously subjected to the release treatment is subjected to thermocompression bonding to prepare a support film, a photosensitive transfer layer, and a protective film. The laminated transfer film is sequentially arranged. With respect to the portion of the transfer film corresponding to the 6-inch panel (aspect ratio 4:3), visual observation of pinholes and protruding foreign matter was performed, and evaluation of the defect of the transfer film was performed. Further, the photosensitive transfer layer was mixed with propylene glycol monomethyl ether acetate to completely dissolve the organic component in the photosensitive transfer layer, and then the photosensitive transfer was measured by a laser diffraction/scattering type particle size distribution measuring apparatus. The particle size distribution of the inorganic particles in the layer. (3) Formation of element Transferring of photosensitive transfer layer: After the protective film was peeled off from the transfer film, the transfer of the photosensitive transfer layer was carried out in the same manner as in the example. Exposure engineering and development of photosensitive transfer layer: For the photosensitive transfer layer 'transmission exposure cover (L / S = 1 0 0 / m / 4 0 0 # ni stripe pattern), Ultra-high pressure mercury lamp that emits i-rays (ultraviolet light with a wavelength of 3 6 5 nm). Here, the irradiation amount was 400 mJ/cm2. After the exposure project is finished, the support film is peeled off from the photosensitive transfer layer. In addition to the paper size, the Chinese National Standard (CNS) A4 specification (210 X 297 gong i ^-------- order--- Read the notes on the back and fill out this page) Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1272450 Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed A7 B7 V. Invention Description (42) After exposure, the sensitivity of exposure treatment The transfer layer was subjected to a development treatment of 1 minute by mass of a sodium carbonate aqueous solution (30 ° C) as a developing solution, followed by a water washing treatment with ultrapure water, thereby removing unirradiated. The uncured photosensitive transfer layer of ultraviolet light is formed into a pattern. The calcination process of the photosensitive transfer layer pattern: The glass substrate of the photosensitive transfer layer pattern is formed in a calciner at 580 ° C. The calcination treatment is carried out for 45 minutes in a temperature atmosphere, whereby a panel material of a black matrix pattern can be formed on the surface of the glass substrate. The black matrix pattern in the obtained enamel sheet is observed by an optical microscope, and the pattern is lacking. Fall Estimation results are shown in Table 2. &lt;Example 1 2 &gt; Evaluation of the transfer film and measurement of pinholes and protruding foreign matter were carried out in the same manner as in Example 1 except that a photosensitive transfer layer having an average film thickness of 15 m was formed on the support film. And a particle size distribution of the inorganic particles in the photosensitive transfer layer. In the same manner as in Example 11, except that the transfer film was used, a panel material which forms a black matrix pattern was produced, and evaluation of pattern missing was performed. The results are not in Table 2.尙After the completion of the development of the photosensitive transfer layer, the dielectric paste (YPT 〇30 from Asahi Glass Co., Ltd.) is filtered on the glass substrate on which the photosensitive transfer layer pattern is formed. After printing at 100 ° C for 5 minutes, the glass substrate was calcined in a calciner at a temperature of 850 ° C for 30 minutes, and was prepared on the paper scale for Chinese national standards. (CNS) A4 size (210 X 297 mm) (Please read the notes on the back and fill out this page)

1272450 A7 ____B7__ V. INSTRUCTIONS (43) A panel material of a black matrix pattern and a dielectric layer is formed on the surface of the glass substrate. When the dielectric layer on the black matrix pattern in the obtained panel material was observed under an optical microscope, bubbles having a diameter of 2 〇 // m or more were not observed in the dielectric layer. &lt;Example 1 3&gt; The photosensitive composition was prepared in the same manner as in Example 1 except that it was filtered through a stainless steel sieve (500 mesh, 25/5 m diameter). In addition to the use of the photosensitive composition, a photosensitive transfer layer having an average film thickness of 15 μm was formed on the support film, and a transfer film was produced in the same manner as in Example 1 to measure pinholes and raised foreign matter. The particle size distribution of the inorganic particles in the photosensitive transfer layer. In the same manner as in the case of using the transfer film, the panel material of the black matrix pattern was produced in the same manner as in Example 1, and the evaluation of the pattern missing was performed. The results are not in Table 2. [Table 2] (Please read the precautions on the back and fill out this page.) Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed Example 11 12 13 Average film thickness of inorganic resin layer (// m ) 10 15 15 rpm Number of defects in printed film (a) 5 0 20 Ratio of inorganic particles exceeding the film thickness of inorganic resin layer (%) Number of pattern missing or number of film defects (units) 0.1 This paper size applies to Chinese national standards (CNS) ) A4 size (210 X 297 mm) -40 - 1272450 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 5, invention description (44) &lt;Example 1 4> In addition to the use of dipentaerythritol pentaacrylate / hexaacrylic acid 40 parts of a mixture of dipentaerythritol ester (2 7 / 7 5 ) as a (C) compound containing an ethylenically unsaturated group, which was treated in the same manner as in Example 1 to prepare a transfer film, and a panel which formed a black matrix pattern was produced. material. For the black matrix pattern in the obtained panel material, when the line width measurement of the black matrix pattern is performed using a scanning electron microscope, it is a range of 50 //m 2 2 //ni, which is excellent in dimensional accuracy. substance. Also, no pattern defects were observed. &lt;Example 1 5 &gt; As a (A) inorganic particle having an average particle diameter of 0 · 5 // m, C r -C u composite oxide particles (granular) 60 parts, average particle diameter 1 # m P b〇一B 2〇3 — S i〇2 is a low-melting glass frit (unshaped, softening point 500 ° C) 40 parts, as (B) alkali-soluble resin n-butyl methacrylate /3-hydroxypropyl methacrylate / methacrylic acid == 60/20/20 (% by mass) copolymer (Mw = 1 0 0, 0 0 0 ) 40 parts, as (C) contains ethylene 40 parts of a saturated group of compounds, trimethylolpropane triacrylate, as a (D) photopolymerization initiator, 2-methyl-[4/-(methylthio)phenyl-2-phenylmorpholinyl 1 - Acetone (reduced by 7 7 % at 40 ° C) 5 parts, 4,4 / - bis diethylamino benzophenone (at 400. (: weight reduction of 9 6 %) 5 parts, do 150 parts of propylene glycol monomethyl ether acetate of (E) solvent and 1 part of oleic acid as (F) dispersing agent, and the size of the paper is applied to the paper. The Chinese National Standard (CNS) A4 specification (210 X 297) is applied. PCT) -47 - 1⁄4'--------Book--------- (Please read the notes on the back first) Fill in this page) 1272450 A7 B7 V. INSTRUCTIONS (45) After mixing, filter the non-recorded steel screen (500 mesh, 2 5 # m diameter) to prepare a photosensitive composition. 尙, the photosensitive composition The amount of the (D) photopolymerization initiator in the total amount of the photopolymerization initiator is reduced to 79% by weight at 40 ° C. (Please read the note on the back side and fill out this page.) In addition to using the obtained photosensitive composition, the same implementation Example 1 2: A transfer film was produced, and a panel material of a black matrix pattern and a dielectric layer was formed on the surface of the glass substrate in the same manner as in Example 12 except that the transfer film was used. When the dielectric layer on the black matrix pattern was observed under an optical microscope, pores, pinholes, and the like having a diameter of 2 0 // m or more were not observed in the dielectric layer. <Example 1 6 &gt; In addition to using A g particles (granular) 9 5 parts, average particle size 3 // m B i2〇3—Zn〇-B2〇3—S i〇2 — A ]_2〇3 series low melting glass frit (unshaped, softening point 5 2 0 t ) 5 parts as (A) inorganic particles, 2-methyl-[4/mono(methylthio)phenyl] 2- 2 morpholinyl-1 acetone (70% reduction in weight of 70 ° C) 7 parts, 4 ' 4 &gt; a pair of diethylamino benzophenone (40 Ot: weight reduction 9 6 Printed by the Intellectual Property Office of the Ministry of Economic Affairs, Employees' Consumer Cooperatives, 3 parts, as the (D) photopolymerization initiator, in the same manner as in Example 15 to prepare a photosensitive composition. That is, the total amount of the (D) 1 polymerization initiator in the photosensitive composition is 4,000. (The weight was reduced to 97%. The transfer film was produced in the same manner as in Example 12 except that the obtained photosensitive composition was used, and the same procedure as in Example J 1 2 was carried out except that the transfer film was used. The electrode pattern and the panel material of the dielectric layer are formed on the surface of the glass substrate. For the dielectric material on the electrode pattern of the obtained panel material, the Chinese National Standard (CNS) A4 specification (21〇χ 297 mm) is applied. A7 B7 V. Inventive Note (46) When the layer was observed by an optical microscope, pores, pinholes, and the like having a diameter of 2 Å/m or more were not observed in the dielectric layer. [Example 1 7 &gt; Methyl-[4 /-(methylthio)phenyl]. 2- 2-morpholinyl-1-propanone (weight of 400 ° C. Reduction of 9 7 %) 5 parts, 2 ' 4 1 2 5-thioxanthone (9 3% by weight reduction at 400 ° C) 5 parts of the photosensitive composition in the same manner as in Example 15 except that (D) photopolymerization initiator was used. The total amount of the (D) photopolymerization initiator is reduced to 90% by weight at 400 ° C. In the same manner as in the example of the photosensitive composition, the transfer film was produced in the same manner as in Example 12 except that the transfer film was used, and the same procedure as in Example 12 was carried out to form a black matrix pattern and a dielectric layer on the surface of the glass substrate. Panel material. When observing the dielectric layer on the black matrix pattern in the obtained panel material, a few pores with a diameter of more than 20 // m were observed in the dielectric layer, but there was no problem in use. Graphical accuracy of degree. <Example 1 8 &gt; In addition to using 40 parts of tripropylene glycol diacrylate as (C) a compound containing an ethylenically unsaturated group, the treatment was carried out in the same manner as in Example 1 to prepare photosensitivity. In the same manner as in Example 12, except that the obtained photosensitive composition was used, a transfer film was produced, and in the same manner as in Example 12 except that the transfer film was used, a black matrix was formed on the surface of the glass substrate. The paper scale applies to the Chinese National Standard (CNS) A4 specification (21〇X 297 mm). (Please read the notes on the back and fill out this page.) Order---------· Ministry of Economic Affairs Production Bureau Staff Consumer Cooperative Printed 1272450 A7 B7 V. Invention Description (47) (Please read the note on the back and fill out this page) Panel material and dielectric layer panel material. For the black matrix diagram of the resulting panel material On the dielectric layer of the type, when observed by optical microscopy, no pores having a diameter of more than 20 // m were observed in the dielectric layer. <Example 1 9 &gt; In addition to using A g particles (granular) 9 5 parts, B i 2〇3—Zn〇B2〇3—S i〇2 — A 1 2〇3 series low melting point glass frit with average particle size 3 # m (unshaped, softening point 5 2 0 °C) The photosensitive composition was prepared by treating in the same manner as in Example 1 except for 5 parts. Except that the obtained photosensitive composition was used, the transfer film was produced in the same manner as in Example 12, and the electrode pattern and dielectric were formed on the surface of the glass substrate in the same manner as in Example 12 except that the transfer film was used. The panel material of the body layer. When the dielectric layer 'on the electrode pattern in the obtained panel material was observed under an optical microscope, no pores having a diameter of 20/zm or more were observed in the dielectric layer. [Effects of the Invention] Printing by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs According to the photosensitive transfer film of the present invention, it is possible to easily form a pattern excellent in adhesion to the substrate and high in dimensional accuracy. The photosensitive transfer film of the present invention is preferably used for forming an electrode, a phosphor, a color filter, and a black matrix of a plasma display panel. [Description of the drawing] [Fig. 1] shows the cross-sectional shape of the AC type plasma display panel. This paper size is applicable to the Chinese National Standard (CNS) A4 specification (21〇X 297 mm): 5ϋ · 1272450 A7 B7 V. Description of the model of the invention (48). [Description of Symbols] 1 Glass substrate (front substrate) 2 Glass substrate (back substrate) 3 Spacer 4 Transparent electrode 5 Bus electrode 6 Address electrode 7 Phosphor 8 Dielectric layer (front substrate) 9 Dielectric layer (back) Substrate) 10 Protective film (please read the precautions on the back and fill out this page)

T. • -ϋ a- ·1 ·ϋ mmmMm n 1 ^ ϋ 1 mat an an Ml I Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) )

Claims (1)

__________ One, one 〆... 1272450 ί 公管6, the scope of application for patents 8 9 1 2 3 4 7 No. 3 Patent application Chinese patent application scope amendments Amendments to the Republic of China on June 3, 2003 A photosensitive transfer film which is a photosensitive transfer film having a support film composed of a resin film and a photosensitive transfer layer, characterized in that the photosensitive old printing layer contains (A) inorganic particles (B) The alkali-soluble resin (C) contains a compound of an ethyl unsaturation group and (D) a photopolymerization initiator, wherein (A) the content of the inorganic particles is 20 to 80% by mass, and when the calcination treatment is carried out at 60, the mass loss is 2 0 to 80% by mass, and the film thickness is 5 to 3 0//ni. 2. The photosensitive transfer film of claim 1, wherein the number of inorganic particles having a thickness larger than a film thickness of the photosensitive transfer layer is less than 10% of the total number of inorganic particles in the photosensitive transfer layer. . 3. The photosensitive transfer film of claim 1, which is a compound containing at least two methacryl fluorenyl groups in one molecule as (C) a compound containing an ethylenically unsaturated group. 4. The photosensitive transfer film of claim 3, which comprises trimethylolpropane trimethyl acrylate as (C) a compound containing an ethylenically unsaturated group. 5 · The photosensitive transfer film of claim 1 is a compound containing at least four (meth) acrylonitrile groups in one molecule. The paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297). (1) (1) Please read the note on the back and fill out this page. 1) Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed 1272450 A8 B8 C8 D8 compound as (D) photopolymerization initiator h3cs 6. The scope of application for the patent is (C) a compound containing an ethylenically unsaturated group. 6. The photosensitive transfer film of claim 5, which comprises a compound having a dipentaerythritol skeleton as (C) a compound containing an ethylenically unsaturated group. 7. The photosensitive transfer film of claim 1, which is a photopolymerization initiator containing a weight reduction of more than 90% in a temperature of 40 ° C as a (D) photopolymerization initiator. 8. The photosensitive transfer film of claim 1, which is a photopolymerization initiator containing two or more kinds of photopolymerization initiators having a weight reduction of 40% or more in 40 Ot: . 9. The photosensitive transfer film of claim 1, which comprises a compound represented by the following formula (1) and a compound represented by the following formula (2) (1) (In the formula (2), R3, R4, R5 and R6 independently of each other represent an alkyl group having 1 to 6 carbon atoms) 1 0 · as claimed in the first item; ^ photosensitive transfer film, which is suitable for the paper scale China National Standard (CNS) A4 Specification (210X297 mm)&quot;2 ' -------------- Order ------ΛΎ (Please read the notes on the back and fill in this Page) Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1272450 A8 B8 C8 D8 VI. The patent application scope is at least selected for the electrode, phosphor, color filter and black matrix used to form the plasma display panel. An element. (Please read the notes on the back and fill out this page), 1T f Ministry of Economic Affairs, Intellectual Property Office, Staff Consumer Cooperatives Print This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) -3-