TWI226077B - Liquid processing apparatus and liquid processing method - Google Patents

Abstract

The developing process unit (DEV) 24 comprises a roller transferring mechanism 14 for transferring an LCD substrate G in a single direction almost in the horizontal attitude, a main developer discharge nozzle 51a and a sub-developer discharge nozzle 51b for discharging the developer to the LCD substrate G, and a nozzle moving mechanism 60a for scanning the main and sub-developer discharge nozzles 51a, 51b over the LCD substrate G. While the main and sub-developer discharge nozzles 51a, 51b are scanned over the LCD substrate G by driving the nozzle moving mechanism 60a, these developer discharge nozzles 51a, 51b discharge the developer to the LCD substrate G. Accordingly, uniform developing process can be performed in the entire part of the LCD substrate G by shortening the supply period of the developer.

Description

1226077 A7 B7 V. Description of the invention (彳) [Objective of the invention] [Technical field to which the invention belongs and its prior art] (Please read the notes on the back before filling out this page) The present invention relates to the use of, for example, liquid crystal displays A liquid processing apparatus and a liquid processing method for performing a development process such as a substrate such as a glass substrate of a device (LCD). [Previous Technology] In the manufacture of LCDs, a resist film is formed on an LCD glass substrate (hereinafter referred to as "LCD substrate"), and then the resist film is exposed with a specific circuit pattern, and then The so-called photolithography, which is used for development processing, forms a circuit pattern on the LCD substrate. Here, for example, a needle development process, JP 1 1-8 7 2 1 0A has been disclosed in which a developing solution is coated on the surface of a substrate conveyed in a horizontal posture to form an immersion development (puddle) on the substrate and held for a specific time. Method and device for developing reaction. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. However, recently, there has been a strong demand for large-scale LCD substrates, and large-scale products that have reached 1 meter on the side have appeared. When the large-sized LCD substrate is transported horizontally and the developer is coated on the surface of the LCD substrate, the time difference between the first developer-applied developer solution and the last developer-applied developer developer is greater. Therefore, unevenness occurs during the development reaction, and it is difficult to obtain a uniform development pattern on the entire LCD substrate. Although it is possible to apply the developing solution in a short time by accelerating the conveying speed of the LCD substrate, if the conveying speed of the LCD substrate is accelerated, in order to convey the LCD substrate at the same speed within the time required for the development reaction, the paper size Applicable to China National Standard (CNS) A4 specification (21〇 < 297 mm) -4- 1226077 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (2) Therefore, the LCD substrate must be extended for transportation Distance, a new problem that the footprint of the device becomes larger (foot print) occurs. In order to shorten the conveying distance of the LCD substrate, it is necessary to stop the LCD base of the immersion development (puddle) that forms the developing solution urgently. At this time, the developing solution on the LCD substrate overflows due to acceleration and cannot fully develop the reaction. . In addition, due to the emergency stop of the L C D substrate, the L C D substrate is subjected to a strong load, so that the L C D substrate may be cracked. [Technical Issues to Be Solved by the Invention] The present invention has been made in consideration of such problems, and an object thereof is to provide a liquid processing apparatus and a liquid processing method, which can perform uniform liquid processing on the entire substrate even with a large substrate. Do not enlarge the coverage area of the device. According to a first aspect of the present invention, there is provided a liquid processing apparatus including: a transport mechanism that transports a substrate to a direction in a substantially horizontal posture; a processing liquid nozzle that discharges a processing liquid on a surface of the substrate transported by the transport mechanism; and A nozzle moving mechanism that moves the processing liquid nozzle on the substrate at a specific speed, and uses the nozzle moving mechanism to move the processing liquid nozzle while discharging the processing liquid from the processing liquid nozzle and coating the processing liquid on the substrate. A second aspect of the present invention provides a liquid processing method including a process of transferring a substrate to a liquid processing region where liquid processing is performed in a substantially horizontal posture, and in the liquid processing region, stopping the transportation of the substrate or stopping the substrate. The substrate transportation speed is delayed compared to the above-mentioned liquid processing area — 丨 L — f I, (Please read the precautions on the back before filling this page) Order

Jn.. &Quot; τ · This paper size applies to the Chinese National Standard (CNS) A4 specification (210 × 297 mm) -5- 1226077 A7 B7 V. Description of the invention (3) (Please read the precautions on the back before filling this page) A process in which a substrate is conveyed at a slower speed, and a process in which a processing liquid nozzle that applies a processing liquid to the substrate while discharging the processing liquid onto the substrate and applying the processing liquid to the substrate. A third aspect of the present invention provides a liquid processing apparatus including a transfer mechanism that transfers a substrate to a direction in a substantially horizontal posture, a developing solution nozzle that discharges a developing solution on a surface of the substrate that is transferred by the transfer mechanism, and A nozzle moving mechanism that moves the developing liquid nozzle on the substrate at a specific speed in a direction opposite to the conveyance direction of the substrate, and uses the nozzle moving mechanism to discharge the developing liquid nozzle while moving the developing liquid nozzle The developer is coated on the substrate with the developer. A fourth aspect of the present invention is a liquid processing method for performing a development process on a substrate subjected to an exposure process, and the method includes: transporting the substrate to a developing solution application area where a developing solution is applied in a substantially horizontal posture; The project is printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs in the above-mentioned developer coating area, stopping the substrate transfer or delaying the substrate transfer speed to a substrate transfer speed that reaches the developer coating area. For a slower process, while the developing solution nozzle to which the developing solution is to be applied on the substrate is horizontally moved onto the substrate, the developing solution nozzle is used to discharge the developing solution and apply the developing solution to the substrate. Process of developing solution, and process of transferring the substrate coated with the developing solution to a liquid removal processing area where the developing solution is removed. Use of the liquid processing devices and liquids of the first to fourth aspects of the present invention The Chinese paper standard (CNS) A4 specification (21〇 > < 297 mm) is applied to the paper size of this paper. (4) (Please read the precautions on the back before filling in this page) The processing method can move the processing liquid nozzle at a specific speed and apply the processing liquid on the substrate in a short time. In this way, uniform liquid processing can be performed on the entire substrate. In addition, because it is not necessary to transport the substrate coated with the processing liquid at high speed, it is not necessary to stop the substrate urgently. Therefore, the processing liquid does not overflow from the substrate, so that the development reaction is stopped, or the stress caused by the emergency stop is caused. The substrate is distorted, causing the substrate to overrun and break. In addition, since the space required for substrate transportation is the same as before, it is possible to suppress the expansion of the footprint of the device. [The Structure and Function of the Invention] Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs The structure and function of the present invention will be described in detail below with reference to the drawings. Here, in this embodiment, a case where the development processing unit (D E V) of the present invention is used to perform the development processing of the L C D substrate subjected to the exposure processing will be described as an example. FIG. 1 is a schematic diagram of a resist application and development processing system 100 that includes a development processing unit (DEV) according to an embodiment of the present invention and continuously performs processing from formation of a resist film to development. Constructed floor plan. This resist coating and development processing system 100 is provided with a cassette station (carry-in / out section) 1 for mounting a cassette C which houses a plurality of LCD substrates G, and includes a plurality of processing units for processing the LCD substrates. A processing station (processing section) 2 that performs a series of processes including coating and development, and an interface station (interface portion) 3 that transfers the LCD substrate G to the exposure device 4 at both ends of the processing station 2 Cassette station 1 and interface station 3 are configured separately. In addition, this paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 1226077 A7 B7 V. Description of the invention (5) In addition, in Figure 1, the length of the resist coating and development processing system 100 is set. The direction is the X direction, and the direction orthogonal to the X direction on the plane is the Y direction. (Please read the precautions on the back before filling in this page.) Cassette station 1 is equipped with a conveying device 1 for loading and unloading the LCD substrate G between the stage 9 and the processing station 2 in which cassettes c are arranged in the Y direction. The cassette C is transported between the mounting table 9 and the outside. In addition, the conveying device 11 has a conveying arm 11a, and can move along the conveying path 10 provided in the Y direction of the arrangement direction of the cassettes C. The LCD substrate is processed between the processing stations 2 by the conveying arm 1a G's moving in and out. The Printing and Processing Station 2 of the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs basically has two parallel rows of conveying lines A and B for conveying LCD substrates G in the X direction. 3 arranges a scrub processing unit (SCR) 21, a first heat treatment unit area 26, a resist treatment unit 23, and a second heat treatment unit area 27. In addition, along the transfer line B, a second heat treatment unit area 27, a development processing unit (DEV) 24, and an i-ray ultraviolet irradiation unit (i-UV) 2 5 are arranged from the interface station 3 to the cassette station 1. And the third heat treatment unit region 28. An excimer U V irradiation unit (.e-U V) 2 2 is provided on a part of the scrub processing unit (SCR) 2 1. In addition, the excimer 11 ¥ irradiation unit (6-11 ¥) 2 2 is provided for removing organic matter of the LCD substrate G before scrubbing, and the i-ray ultraviolet irradiation unit (i-UV) 2 5 is used for decolorization of development On the other hand, a scrubbing treatment unit (SCR) 2 is provided. 1 In the structure, the LCD substrate G can be cleaned and dried while being transported in a slightly horizontal posture. Development processing unit (DEV) 2 4 As explained in detail later, this paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) -8-Ϊ226077 A7 B7 5. Description of the invention (6), LCD substrate G can also The developer is applied while being carried in a slightly horizontal posture, and the developer of the developer is washed and dried. In the scrub processing unit (S CR) 2 1 and the development processing unit (DEV) 2 4, the LCD substrate G is conveyed by, for example, a roller conveyance or a conveyor belt, and the conveyance inlet and the conveyance outlet of the LCD substrate G are Set on opposite short sides. In addition, the transfer of the L C D substrate G to the i-line U V irradiation unit (i-U V) 25 is performed continuously by the same mechanism as the transport mechanism of the development processing unit (D E V) 24. A resist application processing device (CT) 23 a is sequentially arranged in the resist processing unit 23, and the resist liquid is dripped on the LCD substrate G which is held substantially horizontally, and the LCD substrate G is rotated. The number of rotations is to expand the resist solution to the entire LCD substrate G to form a resist film, and a vacuum drying device (VD) 2 3 b is used to dry the resist film formed on the LCD substrate G under reduced pressure. The etchant removal device (ER) 2 3 c uses a solvent discharge head that can scan the four sides of the LCD substrate G to remove excess resist attached to the periphery of the LCD substrate G. In the resist processing unit 2 3, the resist coating processing device (C) 2 3 a, the reduced-pressure drying device (VD) 2 3 b, and the peripheral resist removing device (ER) 2 3 A carrying arm is provided between c to carry the LCD substrate G. The first heat treatment unit area 2 6 has two heat treatment unit sections (TB) 31, 32, which are formed by laminating heat treatment units for applying heat treatment to the LCD substrate G. The heat treatment unit sections (TB) 3 1 are provided for scrubbing Unit (SCR) 2 1 side, and heat treatment unit segment (TB) This paper size applies to Chinese National Standard (CNS) A4 specification (210X297 mm)! "—— ?! (Please read the precautions on the back before filling this page )

1T Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs g £ Consumer Cooperatives -9-1226077 A7 __B7_ _ V. Description of the Invention (7) 3 2 is set on the resist processing unit 2 3. A first transfer device 3 3 is provided between the two heat treatment unit sections (TB) 3 1 and 3 2. (Please read the precautions on the back before filling in this page.) As shown in the side view of the first heat treatment unit area 2 6 of FIG. 2, the heat treatment unit segment (TB) 3 1 has a transfer for transferring the LCD substrate D from the bottom in order. Unit (PASS) 61, a dehydration baking unit (D Η p) 6 2 and 6 3 for dehydrating and baking the LCD substrate G, and an adhesion processing unit (AD) 6 4 for applying hydrophobic treatment to the LCD substrate G Laminated structure of 4 stages. In addition, the heat treatment unit stage (TB) 3 2 has a transfer unit (PASS) 6 for transferring the LCD substrate G in order from the bottom, and two cooling units (C〇) for cooling the LCD substrate G. L) 6 and 6 7 and a four-stage laminated structure of an adhesion processing unit (AD) 6 8 that hydrophobizes the LCD substrate G. The first conveying device 3 3 is a transmission unit (PASS) 6 1 receives the LCD substrate G from the scrubbing processing unit (SCR) 21, the LCD substrate G between the heat treatment units is carried in and out, and the transmission unit (PASS) 65 resists the transfer of the LCD substrate G of the uranium agent processing unit 23. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, the first conveying device 3 3 is provided with a guide rail 9 1 extending up and down, a lifting member 9 2 for lifting and lowering along the guide rail, and a support member 9 3 provided on the lifting member 9 2 so as to rotate thereon The substrate holding arm 94 is provided to be movable forward and backward on the supporting member 93 and holds the LCD substrate G. The lifting of the lifting member 92 is driven by a motor 95, the rotation of the support member 93 is driven by a motor 96, and the advancing and retreating motion of the substrate holding arm 94 is driven by a motor 97. The first conveying device 3 3 can move up and down in this way. The size of this paper is applicable to the Chinese national standard (CNS) A4 (210X297 mm) -10- 1226077 A7 B7. 5. Description of the invention (8) Movement and rotation can also be stored. Take any one of the heat treatment unit segments (τ B) 3 1 and 3 2. (Please read the precautions on the back before filling in this page} The second heat treatment unit area 2 7 has two heat treatment unit sections (TB) 3 4 and 35, which are laminated by heat treatment units that apply heat treatment to the LCD substrate G. Therefore, the heat treatment unit segment (TB) 3 4 is disposed near the resist processing unit 2 3, and the heat treatment unit segment (τ B) 3 5 is disposed near the development processing unit (DEV) 2 3. A heat transfer unit section (TB) 3 4 and 3 5 are provided with a second conveying device 36. As shown in the side view of the second heat treatment unit area 27 of FIG. 3, the heat treatment unit (TB) 3 4 is sequentially processed from below by the LCD The pass-through unit (PASS) 69 of the substrate G and three pre-baked units (PREBAKE) 70, 71, 72 for pre-baking the LCD substrate G are laminated in four layers, and the heat treatment unit segment (TB) 35 The transfer unit (PASS) 73 for transferring the LCD substrate G, the cooling unit for cooling the LCD substrate G (COL printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs) 7 4 and the LCD substrate G Two pre-baking units (PREBAKE) 75 and 76 for pre-baking The second conveying device 36 receives the LCD substrate G from the resist processing unit 2 3 through the transfer unit (PASS) 69, carries in and out the LCD substrate G between the heat treatment units, and passes through the transfer unit (PASS) 7 3 to the development processing unit (DEV) 2 4 to transfer the LCD substrate G, and to the substrate transfer section extension cooling stage (EXT · COL) 4 of the interface station 3 to be described later. China National Standard (CNS) A4 specification (210X297 mm) -11-1226077 A7 B7 5. Description of the invention (9). In addition, the second conveying device 36 has the same structure as the first conveying device 33, and can also be stored. Take heat treatment unit segments (TB) 3 4 and 35 (please read the notes on the back before filling out this page) one unit. The third heat treatment unit area 2 8 has two heat treatment unit segments (TB) 37 and 38. Yes It is formed by laminating a heat treatment unit that applies heat treatment to the LCD substrate G. The heat treatment unit segment (TB) 3 7 is disposed near the development processing unit (DEV) 24, and the heat treatment unit segment (TB) 3 8 is disposed in the cassette. Box stand 1 Pong. And in these two The third heat treatment unit section (TB) 3 7 and 3 8 are provided with a third conveying device 39. As shown in the side view of the third heat treatment unit section 2 8 of FIG. 4, the heat treatment unit section (TB) 3 7 is in order from below The transfer unit (PASS) 7 7 which transfers the LCD substrate G and the three post-baking units (POBAKE) 78, 79 and 80 which post-bake the LCD substrate G are laminated in four layers. In addition, the heat treatment unit segment (TB) 38 has a transfer cooling unit (PASS · COL) 8 2 that transfers and cools the LCD substrate G from the post-bake unit 81 (P0BAKE) 81 in this order, and the LCD The consumer co-operatives of the two employees of the Intellectual Property Bureau of the Ministry of Economic Affairs printed a post-baking unit (P0BAKE) 8 3 and 8 4 with a four-layer laminated structure on the substrate G. The third conveying device 39 receives the LCD substrate G from the i-ray ultraviolet irradiation unit (i-UV) 2 5 through a transmission unit (PASS) 77, carries the LCD substrate G in and out between the heat treatment units, and transmits the LCD substrate G through the transmission cooling unit ( PASS · COL) 8 2 pair of cassette stations 1 transfers the L CD substrate G. In addition, the third conveying device 39 also has the Chinese national standard (CNS) A4 specification (210X 297 mm) that is compatible with this paper size. -12- 1226077 A7 ___ B7 V. Description of the invention (10) The first conveying device 3 3 With the same structure, it is also possible to access any one of the heat treatment unit sections (TB) 37 and 38. (Please read the precautions on the back before filling out this page} Each processing unit and conveying device in processing station 2 is configured to form two rows of conveying lines A and B as described above, and basically becomes the order of processing. There is a space 40 between the transfer lines A and B. Furthermore, there is a feeding device (substrate mounting member) 41 that can move back and forth. This feeding member 41 can hold the LCD 'substrate G in structure and transmit through The component device 41 transfers the LCD substrate G between the transfer lines. The transfer of the L CD substrate G to the transfer device 41 is performed by the above-mentioned first to third transfer devices 3 3, 3 6 and 39. Economy The Intellectual Property Bureau employee consumer cooperative print interface station 3 is provided with a transport device 4 2 for carrying in and out of the LCD substrate G between the processing station 2 and the exposure device 4, and is used to configure a buffer box table (BUF) 4 3, And an extension cooling stage (EXT-COL) 44 for the substrate transfer part with a cooling function, and an external device block 45, which is laminated on top and bottom with the peripheral exposure device (EE), is disposed adjacent to the conveying device 42. The conveying device 4 2 has a carrying arm 4 2 a, and using this carrying arm 4 2 a The LCD substrate G is carried in and out between the processing station 2 and the exposure device 4. In the resist coating and development processing system 100 configured as described above, it is first placed on the mounting table of the cassette station 1 The L CD substrate G in the cassette C of 9 is directly carried into the excimer UV irradiation unit (e-UV) 22 of the processing station 2 by the carrying device 11 for polishing treatment. Then, the LCD substrate is carried by the carrying device 11 G is moved into the polishing and cleaning processing unit (SCR) 21 for polishing. After the polishing and cleaning process, the LCD substrate G is used in this paper. The standard is 8I (CNS) A4 (210X297 mm). " " -13- 1226077 A7 B7 V. Description of the invention (M) For example, the roller conveying method is used to transfer the pass unit (PASS) 61 which belongs to the heat treatment unit section (TB) of the first heat treatment unit area 26. (Please read first) Note on the back, please fill in this page again.) The LCD substrate G placed in the pass unit (PASS) 6 1 is first transferred to the heat treatment unit section (TB) 3 1 of the dehydration baking unit (DHP) 62 and 63 for heating Process and then transfer to cooling unit of heat treatment unit section (TB) 32 COL) 66 and 6 7 After cooling, in order to improve the stability of the uranium-resistant agent, it was transferred to the bonding unit (AD) 64 and the heat treatment unit (TB) 3 2 of the heat treatment unit (TB) 3 1 Adhesion processing unit (AD) 6 8 Any one of them is subjected to an adhesion treatment (hydrophobization treatment) with HMD S there. Then, the L C D substrate G is transferred to one of the cooling units (C0L) 6 6 and 6 7 to be cooled, and then transferred to the transfer unit (PASS) 65 of the thermal processing unit section (TB) 32. All the conveyance processing of the L C D substrate G when performing such a series of processing is performed by the first conveying device 33. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The LCD substrate G disposed in the pass unit (PASS) 6 5 is moved into the uranium-resistant agent processing unit 2 3 by the carrying arm of the uranium-resistant agent processing unit 2 3. After the LCD substrate G is spin-coated in the resist application processing device (CT) 23a, it is transported to a reduced-pressure drying device (VD) 2 3 b for reduced-pressure drying, and then transferred to a peripheral resist removal device ( ER) 2 3 c to remove excess resist on the periphery of the LCD substrate G. After the peripheral resist is removed, the L C D substrate G is transferred from the resist processing unit 23 to the transfer unit (PASS) 69 of the heat treatment unit section (TB) 34 belonging to the second heat treatment unit area 27 by the carrying arm. ^ The paper size applies the Chinese National Standard (CNS) A4 specification (210X29? Mm) " -14- 1226077 A7 ^ ~ E_ V. Description of the invention (12) (Please read the precautions on the back before filling this page} Configuration The LCD substrate G in the transfer unit (PASS) 6 9 is transported to the heat treatment unit section (tb) 3 by the second conveying device 3 6 4 PREEBAKE units 70, 71 and 72 and the heat treatment unit section (TB) 3 5 pre-baking unit (? Feet £ 8 厶 狂) 7 5 and 7 6 are pre-baked, and then transferred to the heat treatment unit section (TB) 3 5 cooling unit (C0l) 74 to cool to a specific temperature. Then, the second transfer device 36 is transferred to the transfer unit (PASS) 73 of the heat treatment unit section (TB) 3 5. The LCD substrate G is then transferred to the interface station by the second transfer device 36. 3 extended cooling stage (EXT · COL) 44 and is carried by the interface device 3's conveyance device 4 2 to the external device section 4 5's peripheral exposure device (EE) for exposure to remove peripheral resist, and then, the conveyed device 4 2 is transferred to the exposure device 4 where the resist film on the L CD substrate G is exposed to form a specific Depending on the situation, sometimes the LCD substrate G is stored in the buffer box (3) on the buffer table (BUF) 4 3 before being transferred to the exposure device 4. After printing is completed, the LCD substrate G of the Intellectual Property Department of the Ministry of Economic Affairs and the Consumer Cooperative will print the LCD substrate. G is transferred from the transfer device 4 2 of the interface station 3 to the upper head lift (TI TL ER) of the external device section 4 5. After the LCD substrate G notes specific information, it is placed on the extension cooling stage (EXT · COL) 44 The LCD substrate G is transferred by the second transfer device 36 from the extended cooling stage (EXT · COL) 44 to the transfer unit (PASS) 73 of the heat treatment section (TB) 3 5 to which the second heat treatment unit area 27 belongs. Extending from the transmission unit (PASS) 7 3 to the development process The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) -15- 1226077 A7 B7__ 5. Description of the invention (13) Unit (DEV) 2 4 For example, the roller mechanism works, and the LCD base (please read the precautions on the back before filling in this page). The plate G is moved into the development processing unit (DEV) 2 4 by the transfer unit (PASS) 7 3, and there Development process is performed. The details will be described later. After the development process is completed, the LCD substrate G is transferred to the i-line UV irradiation unit (i-UV) by a transport mechanism, such as a roller transport mechanism, connected to the development processing unit (DEV) 2 4 2 5 The LCD substrate G is subjected to a decoloring treatment. Then, the LCD substrate G is carried out by the roller conveyance mechanism in the i-ray UV irradiation unit (i-UV) 2 5 to the heat treatment unit section (TB) 3 7 belonging to the third heat treatment zone 2 8 3 PASS 7 7 . The LCD substrate G disposed in the transfer unit (PASS) 77 is transferred by the third transfer device 39 to the heat treatment unit section (TB) 37, and the post-baking unit 78, 79, and 80 and the heat treatment unit section (TB ) 38 post-baking unit (P0BAKE) 81, 8 3 and 8 4 for post-baking treatment, and then transferred to the heat treatment unit section (TB) 38 transfer cooling unit (PASS · Ministry of Economy wisdom) The property bureau employee consumer cooperative prints COL) 8 2 to cool to a specific temperature, and then it is stored in the specific box 0 arranged in the box station 1 by the carrying device 11 of the box station 1 ° Next, it will be explained in detail Structure of a development processing unit (DEV) 24. FIG. 5 shows a schematic structure of the development processing unit (D E V) 24, and FIG. 6 is a plan view. The development processing unit (DEV) 24 is composed of a lead-in area 2 4 a, a first developer supply area 2 4 b, a second developer supply area 2 4 c, a developer removal area 2 4 d, and washing. Zone 2 4 e, and the size of this paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -16- 1226077 A7 B7_ 5. Description of the invention (14) (Please read the precautions on the back before filling this page) Area 2 4 f. The lead-in area 2 a is adjacent to the transfer unit (P A S S) 7 3 of the heat treatment unit section (TB) 35, and the drying area 2 f is adjacent to the i-line U V irradiation unit (i-u V) 2 5. Between the transfer unit (PASS) 7 3 and the i-ray UV irradiation unit (i-UV) 2 5, a roller conveying mechanism 1 4 that rotates a roller driven by a motor or the like to convey the LCD substrate G to a specific direction is provided. The roller conveying mechanism 14 can carry the LCD substrate G from the transfer unit (PASS) 73 through the development processing unit (DEV) 24 to the i-ray UV irradiation unit (i-u V) 2 5. In order to prevent the LCD substrate G from being bent or the like, the rollers 17 are provided in a certain number in the conveying direction of the LCD substrate G and the vertical direction of the conveying direction. The roller conveyance mechanism 14 is not shown in FIG. 6. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs As shown in Fig. 5, in the development processing unit (DEV) 24, the roller conveying mechanism 14 is divided into 3 regions, and each region can be driven independently. The transfer unit (PASS) 73 and the lead-in area 24a carry the L C D substrate G by the drive of the first motor 15a. In addition, the first developer supply area 2 4 b, the second developer supply area 2 4 c, and the developer removal area 2 4 d are used to transport the L C D substrate G by the drive of the second motor 15 b. In addition, the cleaning zone 2 4 e and the drying zone 2 4 f are used to transport the L C D substrate G by the drive of the third motor 15 c. Such a separate driving of the roller conveyance mechanism 14 may be performed, for example, for each area constituting the development processing unit (D E V) 2 4. The transfer unit (P A S S) 7 3 has a lifting pin 1 6 which can be raised and lowered freely. The second conveying device holding the LCD substrate G. The paper size is in accordance with the Chinese National Standard (CNS) A4 specification (210X297 mm) — " -17- 1226077 A7 B7 __ 5. Description of the invention (15) (Please read the back first Please note that this page is to be filled in again.) When the substrate holding arm 94 of 36 enters the transfer unit (PASS) 73 and the jack 16 is raised, the LCD substrate G is transferred from the substrate holding arm 9 4 to the top outer rod 1 6. Next, when the substrate holding arm 94 is pulled out by the transfer unit (PASS) 7 3 and the jack 16 is lowered, the LCD substrate G is placed on the rollers 17 inside the transfer unit (PASS) 7 3. By driving the first motor 15a, the LCD substrate G can be carried out by the transfer unit (PAS S) 7 3 to the lead-in area 2 4 a 〇 The lead-in area 24a is provided in the transfer unit (PASS) 73 and the first developing liquid supply Areas 2 4 b are used as buffer areas. The introduction area 2 4 a is used to prevent the developing solution from being scattered from the first developing solution supply area 2 4 b to the transfer unit (PASS) 73 and so on to contaminate the transfer unit ( PASS) 7 3. The first developing liquid supply area 2 4 b is an area for coating the LCD substrate G carried from the introduction area 2 4 a with the initial coating thickness (forming immersion development), and is provided with an LCD substrate. G. A developer supply mechanism 60 for applying developer. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. Fig. 7 shows the structure of the first developer supply area 2 4 b as seen from the upstream side in the conveyance direction of the LCD substrate G. The developing liquid supply mechanism 60 has two main developing liquid nozzles 5 1 a and a sub developing liquid nozzle 5 1 b (hereinafter referred to as developing nozzles 5 1 a and 5 1 b) that discharge the developing liquid to the LCD substrate G. A nozzle, a nozzle fixing member 5 5 for fixing the two nozzles, a nozzle holding member 5 6 for holding the nozzle fixing member 5 5, a lifting device for lifting the nozzle holding member 5 6, and a developing nozzle 5 1 a and this paper size apply the Chinese National Standard (CNS) A4 specification (210X297 mm) -18- 1226077 A7 _ B7 _ V. Description of the invention (16) 5 1 b Nozzle moving mechanism scanned in the X direction 6 0 a.

(Please read the precautions on the back before filling in this page. J Nozzle moving mechanism 6 0 a: Drive mechanism for holding the arched arm 5 8 and guide rail 5 9 a and scanning the arched arm 5 8 along the rail 5 9 a 46, a rail holding member 5 9 b for holding the rail 5 9 a, and a rail fixing stand 5 9 c for fixing the rail holding member 5 9 b. In addition, the developing liquid supply mechanism 60 includes a lifting device 5 7 With the control mechanism 47 controlling the driving mechanism 46, the control mechanism 47 can control the discharge amount of the developing liquid from the developing nozzles 5 1 a and 5 1 b, and the start and stop of the discharge. Employees of the Bureau of Intellectual Property, Ministry of Economic Affairs Printed by a consumer cooperative. In addition, the structure of the roller conveyance mechanism 1_4 is shown in FIG. 7. That is, the roller conveyance mechanism 14 is provided with the conveyance direction (X direction) of the LCD substrate G, and it is extended by the 2nd motor 15b ( 7 is not shown, refer to FIG. 5) A pivot 19 rotating around the X axis, a first gear 19 a fixed to the pivot 19 and rotating around the X axis, in a wide direction of the LCD substrate G ( Y direction) The rollers 17 are provided with longer pivots 18 at a certain interval, and are mounted on one of the pivots 18 The second gear 1 8 a that meshes with the first gear 1 9 a and converts the rotation around the X axis of the first gear 1 9 a into the rotation around the Y axis is mounted on the other end of the pivot 18 and borrows The third gear 1 8 b rotated by the rotation of the second gear 1 8 a through the pivot 18, the pivot 19 9 ′ that rotates freely around the X-axis, and the pivot 1 9 ′ and the gear 1 8 b The third gear 1 8 b meshes with the rotation around the Y axis to convert the rotation around the X axis to the fourth gear 1 9 b. In the roller transport mechanism 14, a driving unit for rotating the pivot 18 It is composed of the pivot 19, the first gear 1 9 a, and the second gear 1 8 a. The Chinese national standard (CNS) A4 specification (210X 297 mm) is applied to this paper size. 1 ~ -19- 1226077 A7 __ _B7__ 5 2. Description of the invention (17) (Please read the precautions on the back before filling out this page) and the second motor 15b, the third gear 18b, the pivot 19 ', and the fourth gear 1 9b make the pivot 18 It rotates smoothly and plays the role of supporting the pivot 18. Figure 8 is a perspective view showing the structure of the main developing liquid nozzle 5 1 a. The main developing liquid nozzle 5 1 a has a width direction (Y direction of the LCD substrate G) A long structure. At the center of the upper part of the main developing liquid nozzle 5 1 a, a developing liquid supply pipe 4 9 a for supplying the developing liquid to the main developing liquid nozzle 5 1 a is provided, so that it can be along the length direction at the lower end. The formed discharge port 4 9 b discharges the developing solution into a band shape. The sub developing solution nozzle 5 1 b has the same structure as the main developing solution nozzle 5 1 a. The developing nozzles 5 1 a and 5 1 b are aligned in the longitudinal direction with the Y direction, and are held in parallel by a fixed interval between the nozzle fixing members 55. In addition, the 8th Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs printed that the development nozzles 5 1 a and 5 1 b can be raised and lowered by driving the lifting device 5 7 to raise and lower the nozzle holding member 5 6, whereby the development nozzle 5 1 can be adjusted. The clearance between the discharge ports 4 9 b of a and 5 1 b and the surface of the L CD substrate G. In addition, fitting parts 5 8 a fitted to the guide rails 5 9 a are formed at both ends of the arched arms 5 8, and the arched arms 5 8 can be slid freely in the X direction by the driving mechanism 4 6 in the longitudinal direction of the rails 5 9 a. . In the developing liquid supply mechanism 60, the developing nozzle 5 1 a, 5 1 b is discharged from the developing substrate 5 toward the CD substrate G toward the Y direction, and the developing nozzle 5 is discharged. 1 a and 5 1 b scan in the X direction (that is, the arcuate arm 5 8 slides in the X direction), that is, the surface of the substrate L c D can be coated with a developing solution. In order to perform uniform development processing on the entire LCD substrate G, it is necessary to apply the Chinese national standard (CNS) A4 specification (21〇〆297 mm) to the paper size -20- 1226077 A7 _ B7. 5. Description of the invention (18) ( Please read the precautions on the back before filling in this page.) Apply the amount of developer necessary for the development reaction on the LCD substrate G in a short amount of time. By using two developing nozzles 5 1 a and ^ 1 b, a specific amount of developing liquid can be stably discharged in a short time. The scanning speeds of the imaging nozzles 5 1 a and 5 1 b should be more than 100 m / s and less than 500 m / s. When the scanning speeds of the developing nozzles 5 1 a and 5 1 b are less than 1000 mm / sec, it is not necessary to scan the developing nozzles 5 1 a and 5 1 b to change the conveying speed of the LCD substrate G to perform the same Therefore, the benefits of scanning the imaging nozzles 5 1 a and 5 1 b cannot be seen. On the other hand, if it is more than 500 m / s, the application speed is too fast, so that the parts that are not coated with the developing solution, or the developing solution is liable to overflow from the LCD substrate G, and other disadvantages. If the scanning speeds of the developing nozzles 5 1 a and 5 1 b are within this range, the application time of the developing liquid can be applied regardless of the difference between the length of the L C D substrate G and the time between the start of coating and the completion of coating. Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs (printed by the Industrial and Consumer Cooperative) In addition, the number of coatings on the LCD substrate G is not limited to one, and multiple coating processes may be performed. It is also possible to raise the developing nozzles 5 1 a and 5 1 b and then return to the original position to perform the coating operation. Fig. 9A shows the arrangement of the developing nozzles 5 1 a and 5 1 b shown in Fig. 5. FIG. 9B is a side view showing the image in more detail, and FIG. 9B is an explanatory diagram showing a state in which the developing nozzles 5 1 a and 5 1 b are scanned while the developing liquid is discharged from the developing nozzles 5 1 a and 5 1 b. In the developing solution supply mechanism 60, when applying the developing solution on the surface of the LCD substrate G, the arcuate arm 5 8 should be scanned with the LCD substrate G, and the paper size shall conform to the Chinese National Standard (CNS) A4. Specifications (210X297mm) -21-1226077 A7 B7 V. Description of the invention (19) (Please read the precautions on the back before filling this page) The direction of transport is opposite. The main developing liquid nozzle 5 1 a is arranged at The upstream side of the substrate conveyance direction, and the sub developing liquid nozzle 5 1 b is arranged on the downstream side of the substrate conveyance direction. First, the main developing liquid nozzle 5 1 a is coated with a developing liquid on the LCD substrate G first. The developing liquid coated on the LCD substrate G is discharged by the main developing liquid nozzle 5 1 a and supplemented by a sub-development image. The developing liquid discharged from the liquid nozzle 5 1 b can supply a sufficient developing liquid to the LCD substrate G for developing reaction, thereby shortening the developing time and improving the developing precision. To scan the developing nozzle 5 1 When a and 5 1 b, the gap width (gap) D of the sub developing liquid nozzle 5 1 b and the LCD substrate G should be set to be wider than the gap width d of the main developing liquid nozzle 5 1 a and the LCD substrate G, 俾Prevent the lower end of the sub developing liquid nozzle 5 1 b from pushing the developing liquid of the main developing liquid nozzle 5 1 a on the LCD substrate G out of the scanning directions of the developing nozzles 5 1 a and 5 1 b (see FIG. 9). B) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. For example, suppose the gap width d is 1.5 mm to 2.5 mm, and the gap width D is 3 mm to 5 mm. When the gap width is less than 1.5 mm, the main The positioning of the developing solution nozzle 5 1 a is slightly difficult. In addition, if the gap width d is greater than 2.5 mm, the developing solution may be caught in the developing solution when it is discharged. The bubbles cause bubbles to adhere to the surface of the LCD substrate G, and there is a concern of poor development in this part. If the gap width D is greater than 5 mm, the developing solution that has been applied to the LCD substrate G is excessively stirred, resulting in uniform line width. In addition, since the distance from the developing solution applied to the LCD substrate G from the main developing solution nozzle 5 1 a is set to less than 1 mm, it is possible to prevent the inclusion of bubbles and the like. This paper size applies to Chinese National Standard (CNS) A4 specification (210X297 mm) -22- 1226077 A7 _ _B7___ V. Description of the invention (20) The imaging nozzles 5 1 a and 5 1 b are kept above 5 degrees in the vertical direction An inclination of an angle Θ within 15 degrees. (Please read the precautions on the back before filling in this page.) For example, the developer discharged from the main developer nozzle 5 1 a to the LCD substrate G easily expands forward in the scanning direction of the main developer nozzle 5 1 a. At this time, the impact of the developing liquid discharged from the main developing liquid nozzle 5 1 a to the LCD substrate G on the LCD substrate G (impact, that is, the force of the developing liquid impacting the LCD substrate G) was previously applied to the LCD substrate G. The upper developing liquid is applied on the upper side, and therefore, it is weaker than when the developing liquid is directly discharged from the LCD substrate G. Therefore, a problem occurs in that the development precision is reduced. Since the main developing liquid nozzle 5 1 a is inclined only by a certain angle Θ, it is difficult to scan the developing liquid discharged from the main developing liquid nozzle 5 1 a to the developing nozzles 5 1 a and 5 1 b. Direction forward expansion. Therefore, since the impact of the developing liquid discharged from the developing liquid nozzle 5 1 a is directly applied to the L C D substrate G, the developing precision can be improved. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs because the developing solution is discharged from the developing solution nozzle 5 1 a by the auxiliary developing solution nozzle 5 1 b. Compared with the case of the main developing nozzle 5 1 a, the developing liquid discharged from 5 1 b does not give a large impact to the LCD substrate G. In order to prevent the developing solution previously applied to the LCD substrate G from being strongly stirred by the developing solution discharged from the auxiliary developing solution nozzle 5 1 b, the auxiliary developing solution nozzle 5 1 b should also be inclined only at a specific angle 0. As described above, in the first image supply area 2 4 b, the developing nozzles 5 1 a and 5 1 b are scanned while the developing liquid is discharged from the L C D substrate G, so it is not necessary to carry the L C D substrate G at high speed. Therefore, this paper standard can be prevented from applying the Chinese National Standard (CNS) A4 specification (21〇 > < 297 mm) -23- 1226077 A7 £ 7 _______ V. Description of the invention (21) (Please read the precautions on the back before (Fill in this page) The LCD board G is bent or damaged due to the overrun during the conveyance of the LCD substrate G and the emergency stop of the conveyance. In addition, it is not necessary to stop the LCD substrate G immediately after the developer is supplied, so that the developer liquid applied to the LCD substrate G can be prevented from overflowing, and the developer can be effectively used. In the first developing liquid supply area 2 4 b, although the LCD substrate G can be conveyed at a low speed or the LCD substrate G can be stopped to apply the developing liquid, if the LCD substrate G is stopped to apply the developing liquid, The method can be carried out in a stable state, so the uniformity of the line width can be improved. When the L C D substrate G coated with the developer in the first developer supply area 2 4 b is transferred to the developer removal area 24 4 d, the developer may overflow from the upper surface of the L C D substrate G. In the second developing liquid supply area 2 4 c, in order to prevent the developing liquid from overflowing from the LCD substrate G during the transportation of the LCD substrate and the development reaction cannot proceed, the LCD substrate G may be replenished with the imaging liquid. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs in the second developer supply area 2 4 c, the developer supplement nozzle 5 1 c having the same structure as the main developer nozzle 5 1 a is fixed to the bow A fixed arm (not shown) having the same structure as the arm 588 has a length direction of the Y direction. A specific amount of the developing solution is discharged from the developing solution replenishing nozzle 5 1 c in a slightly long strip shape onto the LCD substrate G conveyed by the roller conveying mechanism 14, thereby replenishing the developing liquid overflowing from the LCD substrate G during conveyance. Like liquid. The developing solution removing area 2 4 d is provided with a posture conversion mechanism (not shown) that converts the LCD substrate G into, for example, an oblique posture, and discharges the diametral scale. The Chinese National Standard (CNS) A4 specification (210X297 mm) is applied. ) " " -24- 1226077 A7 B7 V. Description of the invention (22) (Please read the precautions on the back before filling in this page) 淸 Cleaning solution (eg pure water) of the developing solution on the surface of LCD substrate G Washing liquid nozzle 5 2. The developing reaction on the L C D substrate G is carried out from the first developing solution supply area 2 4 b to the developing solution removal area 2 4 d. In the developing solution removing area 24 d, the LCD substrate G is converted into an oblique posture to drain the developing liquid on the LCD substrate G, and then the LCD substrate G is kept in the oblique posture, and the upper end of the LCD substrate G is oriented The lower edge of the LCD substrate G indicates that while scanning the cleaning liquid nozzle 5 2 and discharging pure water on the surface of the LCD substrate G, the developing liquid on the LCD substrate G can be washed away. The washing liquid nozzle 52 is structured so that it can scan at a speed of, for example, 500 m / s, in order to wash the developing liquid in a short time. In fact, the scanning speed of the cleaning liquid nozzle 52 is adjusted to 100 mm / sec to 300 mm / sec, and more preferably 200 mm / sec to 300 mm / sec. , You can improve the line width uniformity of the development pattern. Rinse solution nozzles 5 2 and development nozzles 5 1 a and 5 1 b-It is also possible to use nozzles capable of discharging the Rinse solution into a film structure, thereby preventing development unevenness. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A washing nozzle 5 3 for discharging washing liquid such as pure water to the LCD substrate G is installed in the washing area 2 4 e. In the cleaning area 2 4e, the LCD substrate G is conveyed at a specific speed, and the cleaning liquid is discharged to the surface and the inside of the LCD substrate G to remove and clean the developing solution attached to the LCD substrate G. The cleaning nozzle 53 has a shape longer than the width of the LCD substrate G so as to discharge the cleaning liquid in the entire width direction of the LCD substrate G. This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) -25- 1226077 A7 B7 V. Description of the invention (23) In the drying area 2 4 f where the LCD substrate G passing through the washing area 2 4 e is transported An air nozzle (i.e., an air knife) 5 4 for spraying dry gas such as nitrogen at a certain wind pressure is provided. In the drying zone 2 4 f, the L CD substrate G is sprayed with a dry gas on the surface and the inside of the L CD substrate G while being transported at a certain speed, and the cleaning liquid adhering to the LCD substrate G is blown away to dry the LCD substrate G. . The nozzle 54 has a shape longer than the width of the L C D substrate G, and can discharge the dry gas to the entire width direction of the L C D substrate G. The dried CD substrate G is transferred to the i-line U V irradiation unit (i — U V) 2 5 by a roller transfer mechanism 1 4. Next, the development processing process of the development processing unit (DEV) 24 will be explained. FIG. 10 is a flow chart showing the status of the development processing process. The LCD substrate G carried in the transfer unit (PASS) 73 is carried by the roller conveyance mechanism 14 through the introduction area 2 4 a and enters the first developer supply area 2 4 b (step 1). The speed at which the L C D substrate G is conveyed by the transfer unit (PASS) 7 3 to the first developer supply area 2 4b is, for example, 6 5 m / s. In the first developing solution supply area 2 4 b, the LCD substrate G is stopped at a specific position (step 2), and the developing nozzles 5 1 a and 5 1 b are set at, for example, 2 40 mm / sec. At a local speed, the developer is discharged from the surface of the LCD substrate G while scanning the cat to apply the developer (step 3). If the L C D substrate is in a stopped state, it is easy to control the driving of the developing nozzles 5 1 a and 5 1 b. In addition, the developing solution can be stably applied on the upper surface of the LCD substrate. ^ The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the precautions on the back before filling this page), 11 Printed by the Intellectual Property Bureau Staff Consumer Cooperatives of the Ministry of Economic Affairs -26- 1226077 A7 B7 V. Description of the Invention (24) (Please read the precautions on the back before filling out this page) Figure 1 1 is an explanatory diagram showing the scanning form of the developing nozzles 5 1 a and 5 1 b. The imaging nozzles 5 1 a and 5 1 b are assumed to be scanned from the right side to the left side in FIG. 11. The right end of the L c D substrate G shown in FIG. 11 is set as the “coating start end” and the left end is “coated End. " After the height positions of the developing nozzles 5 1 a and 5 1 b are adjusted by the lifting device 5 7, the driving mechanism 4 6 is operated to start scanning of the developing nozzles 5 1 a and 5 1 b. When the main developing liquid nozzle 5 1 a reaches a specific position on the right side from the coating start end, for example, a position 1 cm to the right of the coating starting end (hereinafter referred to as the "discharge start position"), the main developing liquid nozzle 5 1 a a Start to drain the developer (step 3a). Thereby, the developer can be reliably applied from the application start end. Similarly, when the sub developing solution nozzle 5 1 b reaches the discharge start position, the developing solution is started to be discharged from the sub developing solution nozzle 5 1 b (step 3 b). Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. Then, the developing nozzles 5 1 a and 5 1 b are scanned on the upper surface of the LCD substrate G, and the entire surface of the LCD substrate G is coated with a developing solution (step 3 c). At this time, as described earlier with reference to FIGS. 9A and 9B, when the developing nozzles 5 1 a and 5 1 b scan the upper surface of the L CD substrate G, the developing solution is directed toward the developing nozzles 5 1 a and 5 1. The obliquely lower back is discharged. In addition, the sub developing liquid nozzle 51 applies the developing liquid to the LCD substrate G without the main developing liquid nozzle 5 1 a coated on the LCD substrate G. The developing nozzles 5 la and 5 are pulled out. Scanning direction of lb. Although the developer liquid may be continuously discharged to the LCD substrate G until the sub developer liquid nozzle 5 1 b passes through the coating end, it is best to stop the main developer after the main developer liquid nozzle 5 1 a reaches the coating end. Discharge the imaging liquid from the image liquid nozzle 5 1 a (step 3 d), and spray it at the secondary imaging liquid discharge. V. Description of the invention (25) (Please read the precautions on the back before filling in this page) Mouth 5 1 a Stops the discharge of the developer liquid from the sub developer liquid nozzle 5 1 b after reaching the coating end (step 3 e ), And move the developing liquid nozzles 5 1 a and 5 1 b to bring the lower end of the sub developing liquid nozzle 5 1 b close to or in contact with the coating end of the LCD substrate G (step 3 f). 5 1 b moves to this position to prevent the developer liquid applied on the L CD substrate G from overflowing from the end of application. For example, when the auxiliary developer nozzle 5 1 b is attached to the LCD substrate G, Extremely fine control is performed so as not to damage the LCD substrate G due to this attachment. After finishing one coating operation shown in FIG. The image nozzles 5 1 a and 5 1 b are returned to the application start end to apply the developing liquid to the L CD substrate G again (step 3 g). By applying the LCD substrate G multiple times, one side can be used. Maintaining high development precision while shortening the development time. Figure 12A, Figure 12B and Figure 12C are printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, respectively, showing the coating conditions for the LCD substrate G and the developed pattern. An explanatory diagram of the relationship between characteristics, FIG. 1 A is a relationship between the scanning speed of the developing nozzles 5 1 a and 5 1 b and the uniformity of the line width, and FIG. 1 2 B is a relationship between the number of coatings and the line width. Figure 1 2C shows the relationship between the number of coatings and the uniformity of the line width.

The results shown in FIGS. 1 2 A to C are that the LCD substrate G is exposed and processed under specific conditions using a mask with a specific pattern forming a wire width of 8 # m or 1 0 // m. Then, the LCD substrate G is exposed under various conditions. The LCD substrate G was developed, and then the pattern of the anti-uranium film prepared by this method was observed with a scanning electron microscope (SEM), and the line width (the width of the convex portion in the development pattern) was measured and determined. In this SEM observation, in order to apply the Chinese National Standard (CNS) A4 specification (210X297 mm) to the paper size of the entire LCD substrate G, this paper printed A7 ____B7 by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. In the observation of the invention (26), a plurality of radial observation points are provided near the center of the LCD substrate G in eight directions that intersect at an equal angle. The result is shown in FIG. 1A. The result is that the discharge flow rate of the developing solution from the developing nozzles 5 1 a and 5 1 b and the developing nozzle 5 1 a are formed by using a mask formed with a pattern with a line width of 10 mm. Regardless of the scanning speed of 5 1 b, it is set to be fixed, and the development time (the time from the start of application of the developer to the removal of the developer by the LCD substrate G) is set to be fixed. In addition, a histogram in FIG. 12A corresponds to an LCD substrate G. As shown in FIG. 1A, when the application times of the developing nozzles 5 1 a and 5 1 b are once, the scanning speed of the developing nozzles 5 1 a and 5 1 b is faster, and the coating uniformity is higher. Will improve. This is because the retention amount of the developing solution at the beginning of the imaging application is reduced, a part of the excessive reaction of the imaging occurring at the beginning of the imaging is suppressed, and the entire coating time of the LCD substrate G is short, so that The substrate G is uniformly caused to undergo a development reaction. The so-called "excessive reaction at a part of the beginning of image development coating" means as follows. That is, the developing solution is supplied to the cat scanning direction with the scanning of the developing nozzles 5 1 a and 5 1 b. However, at this time, a part of the developing solution will flow in the direction opposite to the scanning direction. The developer liquid returned by this item cannot exceed the beginning of application of the developer and stay there. Therefore, at the end of the development application, the developer is in an oversupply state, and the development reaction is excessively caused by the excess reaction at other parts. As a result of part of this phenomenon, an excessive reaction increases the unevenness of the line width in the plane. This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling this page) "Packing--Ordering. L --- Γ · -29-1226077 A7 _ΒΊ ___ 5 2. Description of the invention (27) (Please read the precautions on the back before filling in this page) Because the scanning speed of the imaging nozzles 5 1 a and 5 1 b can be increased, the amount of imaging fluid flowing back can be reduced, so Excessive reaction at a part of the beginning of application of the developer is suppressed. In addition, since the discharge flow rate and the development time of the developing solution from the developing nozzles 5 1 a and 5 1 b are fixed, the average line width is close to that of the photomask at a scanning speed of 100 mm / sec. The pattern is 9 · 9 4 // m, but the variation in line width across the entire LCD substrate G becomes large. On the other hand, when the scanning speed is 210 m / s, the average line width becomes slightly smaller than the pattern of the mask 9 · 7 8 // m, but the overall unevenness of the width of the LCD substrate G becomes smaller. As a result, when the scanning speeds of the developing nozzles 5 1 a and 5 1 b are fast, the impact of the resist on the developing solution increases and the developing reaction is promoted. Therefore, the scanning speed is 2 10 mm When the imaging response per second is exceeded, it should be one of the reasons. Therefore, if the imaging nozzles 5 1 a and 5 1 b are scanned at high speed, the average line width can be brought closer to the pattern of the mask by shortening the development time, and the line width uniformity should be improved. The results shown in Figure 1 2B are printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The result shows that a mask with a pattern of 8 // m in width is used, and the scanning speeds of the imaging nozzles 5 1 a and 5 1 b are scanned. The scanning speed is set at 80 mm / sec, and the scanning liquid discharge rate is 5.6 liters / minute, and the imaging nozzles 5 1 a and 5 1 b are set at 160 mm / sec. At 9.4 liters / minute, the average line width when a fixed development time is set and the number of application times is changed. As shown in Figure 1 2B, as the number of coatings increases, the average line width decreases. This means that as the number of application times increases, the development reaction speeds up, so it should be possible to shorten the development time by increasing the number of application times. This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) -30- 1226077 A7 _____ B7 V. Description of the invention (28) The results shown in Figure 1 2 c indicate the use of a pattern with 8 // m Mask, and set the scanning speeds of the imaging nozzles 5 1 a and 5 1 b to 80 mm / sec, and the imaging fluid discharge volume at 5.6 liters / minute, and the imaging nozzles 5 1 a and 5 When the sweep speed of 1 b is set to 160 mm / sec, and the developer discharge amount is 9.4 liters / minute, a fixed development time is set and the line width is uniform when the number of application times is changed. In addition, a histogram in FIG. 12C corresponds to a piece of the LCD substrate G. As shown in FIG. 1C, when the number of coatings is the same, the faster the scanning speed of the developing nozzles 5 1 a and 5 1 b is, the more uniform the line width is. In addition, when the scanning speeds of the developing nozzles 5 1 a and 5 1 b are fast (160 mm / sec), if the number of application times is increased, the line width uniformity is improved. From this result, it can be seen that the scanning speeds of the developing nozzles 5 1 a and 5 1 b are fast and the number of application times is increased, which is effective for improving the uniformity of the line width. The LCD substrate G after the coating process in the first developing solution supply area 2 4 b is finished is transferred to the second developing solution supply area 2 4 c by a roller conveying mechanism 1 4 at a transfer speed of 4 6 mm / sec. (.Step 4). When the L C D substrate G passes through the second developer liquid supply area 2 4 c, the developer liquid replenishing nozzle 5 1 c may be used to replenish the developer liquid on the L C D substrate G (step 5). The LCD substrate G transferred to the second developing solution supply area 2 4 c is further transferred to the developing solution removal area 2 4 d (step 6), where the LCD substrate G is converted into an oblique posture to flow away. The developing solution on the LCD substrate (step 7), and then the LCD substrate G is maintained in an oblique posture, and the cleaning solution nozzle 5 2 discharges the cleaning solution to the surface of the LCD substrate G. For example, this paper size applies the Chinese national standard (CNS) Α4 specification (210 × 297 mm) (Please read the precautions on the back before filling this page)

Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs of the 1T -31-1226077 A7 B7 V. Description of the invention (29) If pure water is used, rinse the developing liquid on the substrate G of the LCD substrate (step 8). (Please read the precautions on the back before filling in this page.) Then, the LCD substrate G is transported to the cleaning area 2 4e (step 9), where the LCD substrate G is transported at a specific speed and on the surface of the LCD substrate G. Then, the cleaning solution is discharged to remove and clean the developing solution attached to the LCD substrate G (step 10). While performing this dewashing process, the L C D substrate G passing through the dewashing zone 2 4 e is transferred to the drying zone 2 4 f (step 1 1). In the drying zone 2 4 f, the L C D substrate is conveyed at a specific speed, and the drying process is performed by the air knife 5 4 (step 1 2). The L C D substrate G after the drying process is transferred to the i-line U V irradiation unit (i-U V) 2 5 (step 1 3) by the roller transfer mechanism 1, and a specific ultraviolet irradiation process is applied there. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs The embodiments of the present invention have been described above, but the present invention is not limited to the above forms. For example, the number of the developer nozzles arranged in the first developer supply area 2 4 b may be one or three. When using one developer nozzle, the flow rate of developer solution discharged from the developer nozzle must be increased. Therefore, the ejection state of developer solution from the developer nozzle must be controlled. The discharge intensity is such that the discharge tendency of the developing liquid becomes strong so that the developing liquid discharged on the LCD substrate G overflows from the LCD substrate G. In addition, in the first developing solution supply region 2 4 b, the developing solution may be applied to the LCD substrate G while being conveyed at a speed that does not cause the developing solution applied on the LCD substrate G to overflow. Without having to stop the LCD substrate G. In addition, although the scanning directions of the developing nozzles 5 1 a and 5 1 b are assumed to be opposite to the conveying direction of the LCD substrate G, if the LCD substrate G is to be stopped, the developing nozzles 5 1 a and 5 1 may be used. b Apply the Chinese National Standard (CNS) A4 specification (210X297 mm) to this paper size. '• 32-1226077 A7 B7_______ V. Description of the invention (30) Scanning in a direction perpendicular to the conveying direction of the LCD substrate G. (Please read the precautions on the back before filling in this page) [Effects of the invention] As explained above, with the liquid processing device and liquid processing method of the present invention, the processing liquid nozzle can be scanned at a specific speed in a short period of time. Since the processing liquid is applied to the substrate, uniform liquid processing can be performed on the entire substrate. Thereby, the effects of improving the quality of the substrate and reducing the incidence of defective products can be obtained. In addition, since it is not necessary to quickly transfer the substrate coated with the processing liquid, it is not necessary to stop the substrate urgently, and the processing liquid does not hinder the progress of the liquid processing due to the overflow of the processing liquid. . Furthermore, it is possible to prevent the substrate from being distorted due to the stress of the emergency stop or the substrate from being broken due to overrun of the substrate, so that the manufacturing yield is improved and the maintenance burden is reduced. In addition, the space required to transport the substrate may be the same as before, and the expansion of the coverage area of the device can be suppressed. [Brief description of the figure] Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Figure 1 is a schematic plan view of a resist coating and development processing system provided with the development processing unit of the present invention. Fig. 2 is a side view showing a first heat treatment unit area of the anti-uranium agent coating and developing processing system shown in Fig. 1. Fig. 3 is a side view showing a second heat treatment unit region of the resist application and development processing system shown in Fig. 1. Fig. 4 shows the paper size of the resist coating and development processing system shown in Fig. 1. Applicable to China National Standard (CNS) A4 (mm) ~ -33. Printed by the Consumer Cooperative of Intellectual Property Bureau, Ministry of Economic Affairs 1226077 A7 _ B7___ V. Description of the invention (31) Side view of the third heat treatment unit area. FIG. 5 is a schematic side view of a development processing unit of the present invention. FIG. 6 is a schematic plan view of the development processing unit shown in FIG. 5. FIG. Fig. 7 is a front view of the structure of a first developing solution supply region having the developing processing unit shown in Fig. 5 as viewed from the upstream side in the conveyance direction of the LCD substrate. Fig. 8 is a perspective view showing a structure of a main developing liquid nozzle provided in a first developing liquid supply area of the developing processing unit shown in Fig. 5; Fig. 9A is a side view showing the arrangement of the main developer liquid nozzle and the sub developer liquid nozzle shown in Fig. 5; Fig. 9B is a side view showing the application form of the developing solution formed by the main developing solution nozzle and the sub developing solution nozzle shown in Fig. 5. FIG. 10 is a flowchart showing the state of the development processing process. Fig. 11 is an explanatory view showing scanning states of a main developing liquid nozzle and a sub developing liquid nozzle. Fig. 12A is an explanatory diagram showing the relationship between the scanning speed of the main developing liquid nozzle and the sub developing liquid nozzle and the line width uniformity of the prepared developing pattern. Fig. 12B is an explanatory diagram showing the relationship between the number of application times of the main developing liquid nozzle and the sub developing liquid nozzle and the line width of the developed developing pattern. Fig. 12C is an explanatory diagram showing the relationship between the number of application times of the main developing liquid nozzle and the sub developing liquid nozzle and the line width uniformity of the prepared developing pattern. 〔Symbols〕 1 ...... Box box station, this paper size is applicable to Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling in this page} Binding-Book-34 -1226077 A7 B7 V. Description of the invention (32) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economy 2…… processing station, 3…… interface station, 1 4… roller conveying mechanism, 1 7… roller, 2 4… imaging Processing unit (DVD) 2 4 a ... lead-in area, 2 4 b ... first developer supply area, 2 4 c ... second developer supply area ， 2 4 d …… Developing solution removing area 2 4 e …… Washing area 2 4 f …… Drying area> 5 1 a ...... Main developing liquid nozzle y 5 1 b ...... Developing liquid nozzle y 5 1 c ...... Developing liquid replenishing nozzle 5 2…… washing liquid nozzle 5 3…… washing nozzle y 5 4… Air nozzle (air knife) y 5 5… nozzle fixing member, 5 6…… nozzle holding member, 5 7…… lifting device y 5 8…… arched arm y 5 9 a ...... rail y 6 0…… developing liquid supply mechanism 6 0 a… nozzle moving mechanism (please read the precautions on the back before filling this page) This paper size applies to China National Standard (CNS) A4 specification (210X297 mm) -35- 1226077 A7 B7 V. Description of the invention (33) 10 0 …… Resist coating and development processing system (processing device) (Please read the note on the back first Please fill in this page again) The paper printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs applies the Chinese National Standard (CNS) A4 (210X297 mm) -36-

Claims (1)

1226077 A8 B8 C8 _ ^ _ § _____ VI. Patent application scope 1 1. A liquid processing device including: a transport mechanism that transports a substrate in a slightly horizontal posture in one direction, and discharges processing on the surface of the substrate transported by the transport mechanism Liquid processing liquid nozzle, and a nozzle moving mechanism for moving the processing liquid nozzle on the substrate at a specific speed, while using the nozzle moving mechanism to move the processing liquid nozzle, the processing liquid nozzle is discharged from the processing liquid nozzle and the substrate is discharged onto the substrate. Apply the treatment liquid. 2. The liquid processing device according to item 1 of the patent application scope, wherein the surface of the substrate which is coated with the processing liquid by the processing liquid nozzle and transported by the conveying mechanism is further provided with a fixed processing liquid replenishing nozzle for recoating the processing liquid . 3. The liquid processing device according to item 2 of the patent application scope, wherein the processing liquid replenishing nozzle has an elongated shape in a direction orthogonal to the substrate conveyance direction, and the substrate below the nozzle is passed through the processing liquid replenishing nozzle. The treatment liquid is replenished in a substantially band shape in the entire direction orthogonal to the conveyance direction. 4. The liquid processing apparatus according to claim 1, 2, or 3, wherein the nozzle moving mechanism moves the processing liquid nozzle to a direction opposite to a conveyance direction of the substrate. 5. The liquid processing device according to claim 1, 2, or 3, wherein the processing liquid nozzle is an elongated main processing liquid nozzle and a sub-processing liquid nozzle in a direction orthogonal to the moving direction of the nozzle moving mechanism. The two paper sizes are applicable to the Chinese National Standard (CNS) A4 (210X297). (Please read the notes on the back before filling out this page.) A8 B8 C8 ___D8 6. The scope of patent application is composed of 2 nozzles. (Please read the precautions on the back before filling this page.) The main processing liquid nozzle and the sub processing liquid nozzle are arranged side by side so that the main processing liquid nozzle is located above The nozzle moving mechanism is forward of the moving direction, and the sub-processing liquid nozzle is located rearward of the moving direction, and the main processing liquid nozzle and the sub-processing liquid nozzle as a whole process the processing on the substrate in a direction orthogonal to the moving direction. The liquid discharge is roughly band-shaped. 6 _ The liquid processing device according to item 5 of the application, wherein the gap between the sub-processing liquid nozzle and the substrate is wider than the gap between the main processing liquid nozzle and the substrate. 7 · The liquid processing device according to item 5 or 6 of the scope of patent application, wherein the main processing liquid nozzle and the sub processing liquid nozzle are maintained in an inclined state of 5 degrees or more and less than 15 degrees in the vertical direction, so that the above-mentioned When the nozzle moving mechanism is moved, the processing liquid can be discharged obliquely downward and rearward in the moving direction. Printed by the Employees' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 8 _If the liquid treatment device in the scope of patent application No. 5 or 6, it also has a lifting mechanism for lifting and lowering the main processing liquid nozzle and the sub processing liquid nozzle, the lifting mechanism will The bottom surface of the sub-processing liquid nozzle is close to the vicinity of the end surface. When the sub-processing liquid nozzle reaches a specific position near the end surface of the substrate to end the discharge of the processing liquid, the processing liquid applied to the substrate will not overflow from the end surface. drop. 9 · If the liquid processing device of the scope of patent application No. 1, 2 or 3, in which the above-mentioned substrate is to be coated with the above-mentioned processing liquid, the above-mentioned paper size for transfer is applicable to the Chinese National Standard (CNS) A4 specification (210X297) (Centi) I ~ 1226077 A8 B8 C8 _ D8 VI. Patent application scope 3 The transport mechanism stops operation to stop the substrate. (Please read the precautions on the back before filling this page) 1 〇 · If the liquid treatment device of the patent application scope item 1, 2 or 3, where the nozzle moving mechanism makes the processing liquid nozzle above 100 mm / sec It moves in the horizontal direction below 500 mm / sec. 1 1 · A liquid processing method comprising: a process of transferring a substrate to a liquid processing area in a slightly horizontal posture to perform liquid processing; in the liquid processing area, stopping the transfer of the substrate or setting a transfer speed of the substrate A process that is slower than conveying to the liquid processing area, and horizontally moving a processing liquid nozzle for applying a processing liquid onto the substrate onto the substrate while discharging the processing liquid nozzle onto the substrate The processing liquid is a process of applying a processing liquid on the substrate. 1 2. The liquid processing method according to item 11 of the scope of patent application, wherein while the substrate coated with the processing liquid is transported at a constant speed, the fixed processing liquid for coating the processing liquid on the substrate is transferred. The replenishing nozzle discharges the processing liquid, and then applies the processing liquid to the substrate. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 1 3 · If the liquid treatment method of item 11 or 12 of the scope of patent application is applied, in the process of applying the treatment liquid to the substrate, the nozzle of the treatment liquid should be terminated When the processing liquid is discharged near the end surface of the substrate, the processing liquid nozzle is stopped from being discharged from the processing liquid nozzle, and the processing liquid nozzle is approached near the end surface, so that the processing liquid applied on the substrate is caused Do not spill from the above-mentioned end surface. 1 4 · If you apply for liquid treatment of item 11 or 12 in the scope of patent application, the paper size of the paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -39-1226077 AS B8 C8 D8 __ VI. Application scope 4 (Please read the precautions on the back before filling out this page) method, in the process of coating the substrate with the processing liquid, while the processing liquid is discharged from the processing liquid nozzle, the processing liquid is moved substantially horizontally on the substrate The nozzle was applied to the substrate several times to apply the processing solution. 15. The liquid processing method according to item 11 or 12 of the scope of patent application, wherein in the process of coating the substrate with the processing liquid, when the processing liquid nozzle is moved in a substantially horizontal direction, the processing liquid nozzle The processing liquid is discharged obliquely downward and rearward in a moving direction of the processing liquid nozzle. 16. The liquid processing method according to item 11 or 12 of the scope of patent application, wherein in the process of coating the substrate with the processing liquid, two nozzles are used as the processing liquid nozzles to apply the processing liquid to the substrate. on. 17. A liquid processing device for developing a substrate that has been subjected to exposure processing, comprising: a transport mechanism that transports the substrate to a direction in a substantially horizontal posture, and discharges the display on the surface of the substrate transported by the transport mechanism. The developing liquid nozzle of the imaging liquid, and the nozzle moving mechanism for moving the developing liquid nozzle on the substrate to a direction opposite to the carrying direction of the substrate at a specific speed printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, and use The nozzle moving mechanism discharges the developing solution from the developing solution nozzle while moving the developing solution nozzle to apply the developing solution to the substrate. 1 8 · The liquid processing device according to item 17 of the patent application scope, further comprising a fixing device for applying the developing solution to the developing solution nozzle and applying the developing solution to the substrate surface transported by the conveying mechanism. The size of the developer solution paper is in accordance with Chinese National Standard (CNS) A4 (210X297 mm)-40-1226077 A8 Β8 C8 D8 々, patent application scope 5 supplementary nozzle. 19. A liquid processing method for developing an exposed-processed substrate, the method comprising: carrying the substrate in a substantially horizontal posture to a developer-applying region to which developer is applied; and In the image liquid application region, the process of stopping the substrate transfer or making the substrate transfer speed slower than the speed of transferring the substrate to the developer coating region is to apply the substrate onto the substrate while coating the substrate. A process in which a developing solution nozzle of the developing solution is horizontally moved on the substrate, while the developing solution is discharged from the developing solution nozzle to apply the developing solution on the substrate, and the process of applying the developing solution to the developing solution is performed. Process for transferring a substrate to a liquid removal processing area from which the above-mentioned developing liquid is removed. 2 〇. The liquid processing method according to item 19 of the patent application scope, wherein after the process of coating the developing liquid on the substrate, before the substrate is transferred to the liquid removal processing area, the coated developing image is transferred at a specific speed. While the substrate is liquid, the developing solution is discharged from the fixed developing solution replenishing nozzle that applies the developing solution to the substrate, and the process of applying the developing solution to the substrate is performed again. This paper size applies to China National Standard (CNS) A4 (210X297 mm) _ -41-(Please read the precautions on the back before filling out this page)-Equipment _ Order Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs