TW440705B - Optical articles and cathode-ray tube using the same - Google Patents

Optical articles and cathode-ray tube using the same Download PDF

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TW440705B
TW440705B TW088116158A TW88116158A TW440705B TW 440705 B TW440705 B TW 440705B TW 088116158 A TW088116158 A TW 088116158A TW 88116158 A TW88116158 A TW 88116158A TW 440705 B TW440705 B TW 440705B
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Taiwan
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film
light
layer
patent application
transparent dielectric
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TW088116158A
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Chinese (zh)
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Terufusa Kunisada
Etsuo Ogino
Chihiro Sakai
Koji Nakanishi
Yasunori Yanaka
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Nippon Sheet Glass Co Ltd
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  • Surface Treatment Of Optical Elements (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Optical Filters (AREA)

Abstract

A face panel for a cathode-ray tube is coated with an antireflection film by forming, on the outer surface thereof in this order, a 44.9 nm-thick praseodymium titanate film as a first layer, a 4.9 nm-thick film of a nickel-iron alloy as a second layer, a 53.4 nm-thick praseodymium titanate film as a third layer, a 3.9 nm-thick film of a nickel-iron alloy as a fourth layer, a 20.6 nm-thick praseodymium titanate film as a fifth layer, and an 84.7 nm-thick magnesium fluoride film as a sixth layer. This coated face panel is free from the problem that conventional cathode-ray tube face panels coated on the outer surface with an antireflection film comprising superposed metal films and transparent dielectric films make the cathode-ray tubes exhibit double images although effective in diminishing the reflection of external light on the surface of the cathode-ray tubes and in enhancing display contrast. The cathode-ray tube using the face panel coated with the specific antireflection film does not exhibit double images, is prevented from suffering static buildup on its surface or from reflecting external light thereon, and can attain higher image contrast.

Description

440704S 五、發明說明(l) 發明之領轉 本發明是關於塗佈了 — 薄膜之玻璃製品。本發明,、D :導電性和吸光性的抗反射 璃製面板、或是被接合到卜別是關於用於陰極射線管之玻 發明之背景 述面板之破璃板。 在使用陰極射線管的顯示 加強顯示的品質,而採取虚:T是電視接收器中’為了 部光線的反射。由於其中 ,來減少來自顯示器表面外 射線管的顯示器中使用高電子搶,因而這些使用陰極 電的’因此吸引浮動在空氣令的寻顯:器的表面是充靜 表面充靜電,而採取處置 為了避免顯示器的 波。特別是,這樣的顯示電薄膜,.用來遮蔽電磁 了-層導電抗反射薄犋的玻璃板技:被製造,其中塗佈 ;或是以一種技術,"面板本身的 卜邛表面,被直接塗佈一層導電抗反射薄膜。 為了加強陰極射線管的翩千σ従#H& a# a ^ &的顯不加質之目的,所使用這樣玻 璃製印的例子,包括有,在JP-A-6-263483 (”JP-A"在此 被用來指"未審查已公開的曰本專利申請案")中揭露的, 以玻璃板/ITO/鈦酸鳍/氟化鎂/鈦酸鳍/氟化鎂,440704S V. Description of the invention (l) The invention of the invention This invention relates to a glass product coated with a film. In the present invention, D: a conductive and light-absorbing anti-reflective glass panel, or a broken glass panel which is bonded to a glass substrate for the background of the invention. In the display using a cathode ray tube, the quality of the display is enhanced, and the imagination is adopted: T is the reflection of light in a television receiver '. Because of this, to reduce the use of high electrons in the display from the surface of the display tube, these cathodes use the 'cause' to attract floating display in the air: the surface of the device is charged with static electricity, and measures are taken in order to Avoid waves from the monitor. In particular, such display electric films are used to shield electromagnetic-layer conductive anti-reflective thin glass plates: they are manufactured and coated; or they are a technology, "the surface of the panel itself, Apply a conductive anti-reflection film directly. In order to strengthen the quality of the cathode-ray tube, the example of # H & a # a ^ & is not added, examples of such glass printing are included in JP-A-6-263483 ("JP- A " is used herein to refer to " unexamined and published Japanese patent application "), with glass plate / ITO / titanate fin / magnesium fluoride / titanate fin / magnesium fluoride,

多層結構。 ,衣i J 包含金屬和透明氧化物重疊層的導電抗反射薄臈的例 Η 第7頁 88]】6158,ptd 4407〇4丄一 五、發明說明(2) 子’包括有,在jp — A-64-70 70 1中揭露的,以玻璃板/金屬 /氧化鈦/氧化矽,所表述的多層結構,.在Jp —1^80333 中揭露的,以玻璃板/氟化鎂/金屬/氧化鈦/氟化鎂,所表 述的多層結構;以及在曰本專利第2, 565, 538號中揭露 的’以玻璃/鈦酸鐯/金屬/鈦酸镨/氟化鎂,所表述的多層 結構《在這些參考資料中揭露的金屬層,是以不鏽鋼、 鈦絡、錯'、翻、錦和絡合金等所組成的》 在JP A 1-200952中揭露具有四層的多層結構,包含二 層金屬層,像疋以玻璃板/不鏽鋼/鈦酸镨/不鏽鋼/氟化鎂 所表述。 ,此外,,以重疊一非金屬性吸光薄膜和透明介電薄膜,所 形成的導電抗反射薄膜,在JP_A_9_ 1 5 6 9 64中揭露。此多 層結構,以玻璃板/氮化鈦/氮化矽/二氧化矽所表述。 由包含-或多層以金屬或金屬氮化物所製的吸光薄膜和 透明介電薄膜的重疊層’所組成上述的抗反射薄膜,當直 接或間接置於陰極射線管的前部表面日夺,已知能有效地降 低透射比和加_強顯示對比。 f而,在JP-A-6-263483中所揭露的抗反射薄膜,並不 因為:有的層均是以透明氧化物所組成#。所以, 备在抗士射薄膜被置於陰極射線管的前面時,儘管具 電性和高的透射比,並不&纟# gs ' ,, 个此加強顯不對比而使得顯示器容 芴覜有。 另一方面,先前技術中,包冬么邋* 的導電抗反射薄膜,經由規定其令届思一氧物室疊層 死疋具金屬層的厚度,透射比可Multi-layered structure. Example of a conductive anti-reflective thin film including an overlapping layer of metal and transparent oxide. [Page 7 of 88]] 6158, ptd 4407〇4. 15. Description of the invention (2) Child 'includes, in jp — A-64-70 70 The multi-layer structure described in glass plate / metal / titanium oxide / silicon oxide, as disclosed in Jp-1 ^ 80333, glass plate / magnesium fluoride / metal / Titanium oxide / magnesium fluoride, as described in the multilayer structure; and the multilayer described as "glass / rhenium titanate / metal / rhenium titanate / magnesium fluoride" disclosed in Japanese Patent No. 2,565,538 Structure "The metal layer disclosed in these references is composed of stainless steel, titanium complex, stainless steel, stainless steel, alloy, etc." In JP A 1-200952, a multilayer structure with four layers is disclosed, including two A metal layer, such as rhenium, is represented by glass plate / stainless steel / rhenium titanate / stainless steel / magnesium fluoride. In addition, a conductive anti-reflection film formed by superposing a non-metallic light absorbing film and a transparent dielectric film is disclosed in JP_A_9_ 1 5 6 9 64. The multi-layer structure is expressed by glass plate / titanium nitride / silicon nitride / silicon dioxide. The above-mentioned antireflection film composed of-or an overlapping layer of a light-absorbing film and a transparent dielectric film made of a metal or a metal nitride, when directly or indirectly placed on the front surface of a cathode ray tube has been obtained. It can effectively reduce the transmittance and strengthen the display contrast. However, the anti-reflection film disclosed in JP-A-6-263483 is not because: some layers are made of transparent oxides. Therefore, when the anti-radiation film is placed in front of the cathode ray tube, despite its electrical properties and high transmittance, it does not & 纟 # gs', which enhances the contrast and makes the display look beautiful. Have. On the other hand, in the prior art, the conductive anti-reflection film of Baodong Modi * has a transmittance ratio that can be adjusted to allow the Si-oxygen chamber to be laminated with a metal layer thickness.

88116158.ptd 第8頁 五、發明說明(3) 以被控制。如此,透射比的值可以被規定在範圍3 0到5 0 % ,此範圍對加強顯示對比是有利的。然而,這些抗反射 薄膜被發現有一個問題:當調整該組成薄膜的厚度,以降 低外在光線在此抗反射薄膜外部表面的反射比時,在透明 基板和此抗反射薄膜之間界面的反射比則會增加。 陰極射線管中,在玻璃和抗反射薄膜之間界面的高反射 比,引起一個問題:不論是陰極射線管使用直接塗伸上抗 反射薄膜的玻璃板’或是陰極射線管使用面板、而以塗佈 了抗反射薄膜的玻璃基板接合的例子’陰極射線管顯示 均呈現重影(doub丨e image )。在陰極射線管中,面板本 身具有高的内部透射比時,重影的問題特別嚴重。先前技 =中,在JP-A-9-1 56964中所揭露的,由包含金屬氮化物 薄膜和透明介電薄膜的重叠層所組成的抗反射薄膜,也有 上面問題。 陪'極射線管的 為種面 部份具有 以由使用 —缺點: 暗的影像 部份具有 對影像的 内部透射 部被塗佈 板的玻 甚大的 具有降 此陰極 。為了 較大的 光亮度 比。當 以先前 面板傾 璃製品 厚度來 低的内 射線管 使玻璃 厚度, 沒有造 這樣具 技術中 ’被設 保持強 部透射 的周圍 面板確 且要使 成差別 有高的 包含吸 更平以 計使得 度。儘 比的玻 部份較 保機械 其在其 ,則玻 内部透 光金屬88116158.ptd Page 8 V. Description of Invention (3) To be controlled. In this way, the value of the transmittance can be specified in the range of 30 to 50%, which is advantageous for enhancing the display contrast. However, these antireflection films have been found to have a problem: when the thickness of the constituent film is adjusted to reduce the reflectance of external light on the outer surface of the antireflection film, the reflection at the interface between the transparent substrate and the antireflection film The ratio will increase. In the cathode ray tube, the high reflectance at the interface between the glass and the antireflection film causes a problem: whether the cathode ray tube uses a glass plate directly coated with the antireflection film, or the cathode ray tube uses a panel, and the Examples of the bonding of glass substrates coated with an anti-reflection film, 'cathode-ray tube displays all show a doub image. In a cathode ray tube, the problem of ghosting is particularly serious when the panel itself has a high internal transmittance. The prior art disclosed in JP-A-9-1 56964, an anti-reflection film composed of an overlapping layer including a metal nitride film and a transparent dielectric film, also has the above problem. The part that accompanies the polar ray tube has a reason to use—disadvantages: the dark image part has internal transmission to the image, and the glass of the plate is coated with a large cathode. For a larger brightness ratio. When the inner ray tube with the thickness of the previous panel is lower than the thickness of the inner ray tube to make the glass thickness, there is no such technology in the surrounding panel which is provided to maintain the transmission of the strong part and it is necessary to make the difference to include the flattening so as to make the degree. As much as possible, the glass part is more mechanical, and the inside of the glass is transparent metal.

其周圍部 管上述重 璃來消除 其中央部 強度而必 周圍部份 璃本身應 射比的面 或金屬氮 於是,用作 份較其中央 影的問題可 ’這表示有 份’呈現較 須在其周圍 和中央部份 具有增高的 板,在其外 化物薄膜的 44 07 0Its surrounding part manages the above heavy glass to eliminate the strength of its central part, but the surrounding part itself must have a ratio of the surface or metal nitrogen. Therefore, the problem of using it more than its central shadow can be 'this means that there is a part' Its surrounding and central parts have raised plates at 44 07 0

抗反射薄膜時,此塗板在玻璃和抗反射薄骐之間界面直有 高的反射比,因此使得此抗反射薄膜產生重影的; 發明之概沭 "本發明的一個目的是除去引起重影的問題,舉例來說, 當包含吸光薄骐的抗反射薄膜,被形成在陰極射線管面板 ”外邻表面上時;或是當被塗佈有包含吸光薄膜的抗反射 薄膜的玻璃板,被接合到陰極射線管面板上時。 本發明的另一個目的是在避免外在光線在顯示器表面的 反射’而得到高的顯示對比。 本發明提供了 一種具有抗反射塗層之光學製品,其包含 了折射率為1.4到1.7的可透光基板、以及由重疊層組成的 抗反射薄膜,以下列順序在可透光基板上形成:吸光薄膜 為第一層’折射率1.6到2.4的透明介電薄膜為第二層,吸 光薄膜為第三層’折射率1.6到2.4的透明介電薄膜為第四 層’以及折射率1,35到1.5的透明介電薄膜為第五層。 在此折射率的值是指在波長為55〇nm時,所測量的值。 吸光薄膜組成材料的例子,包括有金屬、合金、和金屬氮 化物。兩個吸光薄膜個別被夾在折射率丨.6到2. 4的透明介 電薄膜之間而被層合,此具體例是重要的;其使得通過可 透光基板而射在抗反射薄膜上的光,當在基板/抗反射薄 膜界面反射時,能夠有降低的反射比。這兩個吸光薄膜, 可以由相同或是不同的物質製得。 此光學製品的較佳製品,其中分別作為第二和第四層的 透明介電薄膜,個別的厚度為3〇到80nm ;而作為第五層的In the case of an anti-reflection film, the coated plate has a high reflection ratio at the interface between the glass and the anti-reflection film, so that the anti-reflection film has a ghost image. Summary of the invention An object of the present invention is to remove For example, when an anti-reflective film containing a light-absorbing thin film is formed on the outer surface of a cathode ray tube panel, or when a glass plate is coated with an anti-reflective film containing a light-absorbing film, When bonded to a cathode ray tube panel. Another object of the present invention is to avoid the reflection of external light on the display surface and obtain a high display contrast. The present invention provides an optical article with an anti-reflective coating, which Contains a light-transmissive substrate with a refractive index of 1.4 to 1.7, and an anti-reflective film composed of overlapping layers, formed on the light-transmissive substrate in the following order: the light-absorbing film is the first layer of a transparent substrate with a refractive index of 1.6 to 2.4 The electric film is the second layer, the light absorbing film is the third layer, and the transparent dielectric film with the refractive index of 1.6 to 2.4 is the fourth layer, and the transparent dielectric film with the refractive index of 1,35 to 1.5 is the fifth layer. Here, the value of the refractive index refers to a value measured at a wavelength of 55 nm. Examples of the material of the light-absorbing film include metals, alloys, and metal nitrides. The two light-absorbing films are individually sandwiched by the refractive index. .6 to 2.4 are laminated between transparent dielectric films. This specific example is important; it allows light that strikes the anti-reflection film through a light-transmissive substrate to pass through the substrate / anti-reflection film interface. When reflecting, it can have a reduced reflectance. These two light-absorbing films can be made of the same or different materials. The preferred products of this optical product are the transparent dielectric films of the second and fourth layers, The individual thickness is 30 to 80 nm;

88116158.ptd 第10頁 ' 4407 0 I五、發明說明(5) 一 透明介電薄膜的厚度為60到lOOnm。 分別作為第二和第四層的透明介電薄膜的厚度,以30nm 或更大為佳,而以4 Onm或更大較佳;以80nm或更小為佳, 而以60nm或更小較佳;其立足點為,使得通過可透光基板 而射在抗反射薄膜上的光,當在基板/抗反射薄臈界面反 射時’能夠有降低的反射比;因而確定避免重影的發生而 沒有失誤β 作為第五層的透明介電薄膜的厚度,以6〇nm或更大為 佳,而以6 5 n m或更大較佳;以1 〇 〇 n m或更小為佳,而以 80nm或更小較佳;其立足點為,使得通過可透光基板而射 在抗反射薄膜上的光’當在基板/抗反射薄膜界面反射時 能夠有降低的反射比;因而避免重影的發生而沒有失誤。 此光學製品的較佳製品,其中的吸光薄臈,個別為一種 元件、或是二或多種元件混合物的薄膜;此元件是由鈦、 鉻、銼、鉬、鐵、鈮、鉬、姶、鎳、鎳—鐵合金和不鏽鋼 所組成的金屬群中選擇出來的。 這些金屬和合金的任何一種、或是二或多種混合物的薄 膜’幾乎沒有顏色,所以具有透明薄膜的特性;因而並不 會損害由陰極射線管所呈現的彩色影像的色彩。 , 此光學製品的較佳製品,其中分別作為第一和第三層的 吸光薄臈,個別由金屬所組成,個別的厚度為5到1 8nm。 厚度小於5nm是不良好的,那樣的抗反射薄膜,不只是 其吸光性質不足以降低所顯示影像的對比,也損害抗靜電 性質。由此立足點而言,第一和第三層的厚度以6nm或更88116158.ptd Page 10 '4407 0 I. Description of the invention (5)-The thickness of the transparent dielectric film is 60 to 100 nm. The thickness of the transparent dielectric films as the second and fourth layers, respectively, is preferably 30 nm or more, and more preferably 4 Onm or more; preferably 80 nm or less, and more preferably 60 nm or less ; Its foothold is such that the light incident on the anti-reflection film through the light-transmissive substrate can have a reduced reflectance when reflected at the substrate / anti-reflection interface; therefore, it is determined to avoid the occurrence of ghosting without Error β The thickness of the transparent dielectric film as the fifth layer is preferably 60 nm or more, and more preferably 65 nm or more; more preferably 100 nm or less, and 80 nm or less It is smaller and better; it is based on the fact that the light that is incident on the anti-reflection film through the light-transmissive substrate can have a reduced reflectance when reflected at the substrate / anti-reflection film interface; thus avoiding ghosting and No mistakes. The preferred product of this optical product, wherein the light-absorbing thin film is an element or a thin film of a mixture of two or more elements; the element is made of titanium, chromium, file, molybdenum, iron, niobium, molybdenum, rhenium, nickel , Nickel-iron alloy and stainless steel. The thin film 'of any one of these metals and alloys, or a mixture of two or more, has almost no color and therefore has the characteristics of a transparent thin film; therefore, the color of the color image presented by the cathode ray tube is not impaired. The preferred products of this optical product, wherein the light-absorbing thin layers as the first and third layers, respectively, are composed of metal, and the individual thickness is 5 to 18 nm. A thickness of less than 5 nm is not good. Such an anti-reflection film not only has insufficient light absorption properties to reduce the contrast of the displayed image, but also impairs the antistatic properties. From this standpoint, the thickness of the first and third layers is 6 nm or more

^ 44 07 0 ii^ 44 07 0 ii

大較佳。另一方面,厚度超過丨8nm是不良好的,那樣的抗 反射薄膜具有太高的吸光性質,#致所顯示的影像變暗。 由此立足點而言’第—和第三層的厚度以1 2ηπι或更小較 佳。個別吸光薄膜的厚度的選擇,以使得此光學製品的可 見射線透射比在3 〇到5 〇 %的範圍較佳。 此光學製品的較佳製品,其中折射率為16到2 4的透明 介電薄膜,至少一層為氧化鉻的薄膜。 —此光學2品的較佳製品,其中的吸光薄膜,個別為一種 元件、或是一或多種元件混合物的薄臈;此元件是由氮化 鈦氮化鉻、氮化锆、氮化姶、和氮化鉬所組成的金屬氮 化物群中選擇出來的。 這些金屬氮化物的任何一種薄膜,幾乎沒有顏色,所以 具有透明4膜的特性;因而並不會損害由陰極射線管所呈 現的彩色影像的色彩。 ,學製品的較佳製品,其中分別作為第一和第三層的 吸光薄膜,個別由金屬氮化物所組成,個別的厚度為3到 6ηπ^ 如果厚度小於3nm,那樣的抗反射薄膜,不只是其 吸光丨生質不足以降低所顯示影像的對比,也損害抗靜電性 質。另I方面,如果厚度超過6nm,那樣的抗反射薄膜吸 收太大量的光’導致所顯示的影像變暗。個別吸光薄膜的 厚度的選擇,以使得此光學製品的可見射線透射比在3〇 5 0 %的範圍較佳。 本發明進—步提供了一種具有抗反射塗層之光學製品, 其包含了折射率為1‘4到1.7的可透光基板,以及由重疊層Big better. On the other hand, a thickness exceeding 8 nm is not good. Such an anti-reflection film has too high light absorption properties, which causes the displayed image to become dark. From this standpoint, the thicknesses of the first and third layers are preferably 12 nm or less. The thickness of the individual light absorbing film is selected so that the visible ray transmission ratio of the optical article is better in the range of 30 to 50%. A preferred article of this optical article is a transparent dielectric film having a refractive index of 16 to 24, and at least one layer is a film of chromium oxide. — The preferred product of this optical 2 product, wherein the light-absorbing film is a thin element of one element or a mixture of one or more elements; this element is made of titanium nitride chromium nitride, zirconium nitride, hafnium nitride, And molybdenum nitride selected from the group of metal nitrides. Any of these metal nitride films has almost no color, so it has the characteristics of a transparent 4 film; therefore, it does not damage the color of the color image presented by the cathode ray tube. A better product for school products, where the light absorbing films as the first and third layers, respectively, are composed of metal nitrides, and the individual thickness is 3 to 6ηπ ^ If the thickness is less than 3nm, such antireflection films are not only Its light absorption and biomass are not enough to reduce the contrast of the displayed image, and also damage the antistatic properties. On the other hand, if the thickness exceeds 6 nm, such an anti-reflection film absorbs too much light ' and causes the displayed image to become dark. The thickness of the individual light-absorbing films is selected so that the visible ray transmission ratio of this optical article is better in the range of 3050%. The invention further provides an optical article with an anti-reflection coating, which comprises a light-transmissive substrate having a refractive index of 1′4 to 1.7, and an overlapping layer

4 4 07 0(4Γ 五、發明說明(7) 組成的抗反射薄膜,以下列 射率1. 6到2. 4的透明介電薄 層,折射率1 · 6到2 · 4的透明 為第四層,以及折射率1.35 層。 順序在可透光基板上形成:折 膜為第一層,吸光薄膜為第二 介電薄膜為第三層,吸光薄膜 到1. 5的透明介電薄膜為第五 在此折射率的值是指在波長為55〇nm時所測量的值。吸 光薄膜組成材料的例子,包括有金屬、合金、和金屬氮化 物。兩個吸光薄膜個別被夾在折射率16到2 4的透明介電 薄膜之間而被層合,此具體例是重要的;其使得通過可逸 光基板而射在抗反射薄膜上的光,當在基板/抗反射薄膜 界面反射時,能夠有降低的反射比。這兩個吸光薄膜,町 以由相同或是不同的物質製得。 此光學製品的較佳製品,是有折射率丨.6到2. 4的透明介 電薄膜作為第六層,插置於作為第四層的吸光薄膜,與作 為第五層的透明介電薄膜之間。 此光學製品的較佳製品,其中分別作為第一和第三層的 透明介電薄膜,個別的厚度為3〇到8〇nm ;而作為第五層的 透明介電薄膜的厚度為6〇到l〇〇nm。 分別作為第一和第三層的透明介電薄膜的厚度,以3〇nm 或更大為佳’而以40nm或更大較佳;以8〇nm或更小為佳, 而以60nm或更小較佳;其立足點為,使得通過可透光基板 而射在抗反射薄膜上的光,當在基板/抗反射薄膜界面反 射時,能夠有降低的反射比;因而確定避免重影的發生而 沒有失誤。4 4 07 0 (4Γ V. Description of the invention (7) Anti-reflection film composed of the following, a transparent dielectric thin layer with an emissivity of 1.6 to 2.4, and a refractive index of 1.6 to 2.4 Four layers, and a refractive index of 1.35 layers are sequentially formed on the light-transmissive substrate: the folded film is the first layer, the light-absorbing film is the second dielectric film is the third layer, and the light-absorbing film is 1.5 transparent dielectric film is Fifth, the refractive index value is a value measured at a wavelength of 55 nm. Examples of the material of the light-absorbing film include metals, alloys, and metal nitrides. The two light-absorbing films are sandwiched by the refractive index individually. 16 to 24 are laminated between transparent dielectric films. This specific example is important; it allows light that is incident on the anti-reflection film through a light-transmissive substrate to be reflected at the substrate / anti-reflection film interface. , Can have a reduced reflectance. These two light-absorbing films are made of the same or different materials. The preferred product of this optical product is a transparent dielectric film with a refractive index 丨. 6 to 2.4 As the sixth layer, interposed between the light-absorbing film as the fourth layer and the fifth layer Between the transparent dielectric films. Preferred products of this optical product, wherein the transparent dielectric films are used as the first and third layers, respectively, each having a thickness of 30 to 80 nm; and the transparent dielectric as the fifth layer. The thickness of the film is 60 to 100 nm. The thicknesses of the transparent dielectric films of the first and third layers, respectively, are preferably 30 nm or more, and more preferably 40 nm or more; nm or less is preferred, and 60 nm or less is more preferred; it is based on the fact that the light incident on the anti-reflection film through the light-transmissive substrate can be reflected at the substrate / anti-reflection film interface. Reduced reflectance; therefore, it is determined to avoid the occurrence of ghosting without errors.

88116158.ptd 第13頁88116158.ptd Page 13

五、發明說明(8) 作為第五層的透明介電薄膜的厚度,以60nm或更大為 佳’而以65nm或更大較佳,以loonm或更小為佳,而以 9 5nm或更小較佳;其立足點為’使得通過可透光基板而射 在抗反射薄膜上的光’當在基板/抗反射薄膜界面反射 時’能夠有降低的反射比;因而避免重影的發生而沒有失 誤。 此光學製品的較佳製品’其中作為第六層的透明介電薄 臈的厚度不超過lOOnm。 作為第六層的透明介電薄膜的厚度超過100ηιη是不良好 的 因為造成太尚的反射比。為得到降低的反射比的立 场’第六層的厚度以70nm或更小為佳,而以3〇nm或更小較 佳。 此光學製品的較佳製品,其 几件、或是二或多種元件混合 鉻、錐、鉬、鐵、鈮、鈕、姶 所組成的金屬群中選擇出來的 令的吸光薄膜,個別為一種 物的薄膜;此元件是由鈦、 、鎳、鎳-鐵合金和不鏽鋼 這些金屬和合金的任何一種 '或是二或多種混合物的 膜,幾乎沒有顏色’所以具有透明薄膜的特性;因而並' 會損害由陰極射線管所呈現的彩色影像的色彩。 ”不 此光學製品的較佳製品,其中吸光薄膜,個別的 3到6 n m。 足為 此光學製品的較佳製品,其中折射率為丨· 6到2. 4 介電薄膜’至少一層為氧化鉻的薄膜。 、明 其中分別作為第二和第四層的吸光薄膜,個別為金屬或V. Description of the invention (8) The thickness of the transparent dielectric film as the fifth layer is preferably 60 nm or more ', more preferably 65 nm or more, more preferably loonm or less, and more preferably 9 5 nm or more Small is better; its foothold is' to make the light incident on the anti-reflection film through the light-transmissive substrate 'when reflected at the substrate / anti-reflection film interface' have a reduced reflectance; thus avoiding ghosting and No mistakes. The preferred article of this optical article 'is that the thickness of the transparent dielectric thin film as the sixth layer is not more than 100 nm. The thickness of the transparent dielectric film as the sixth layer exceeding 100 nm is not good because it causes too much reflectance. The thickness of the sixth field to obtain a reduced reflectance of the vertical field is preferably 70 nm or less, and more preferably 30 nm or less. The preferred product of this optical product is a light-absorbing film selected from the group consisting of several or two or more elements mixed with a metal group consisting of chromium, cone, molybdenum, iron, niobium, buttons, and rhenium, each of which is an object. This element is a film made of any one of these metals and alloys, such as titanium, nickel, nickel-iron alloys, and stainless steel, or a mixture of two or more, with almost no color, so it has the characteristics of a transparent film; therefore, it does not damage The color of a color image presented by a cathode ray tube. "This is not the preferred product of the optical product, in which the light absorbing film, individual 3 to 6 nm. This is the preferred product of the optical product, in which the refractive index is from 6 to 2.4. At least one layer of the dielectric film is oxidized Chromium film. The light absorbing films are the second and fourth layers, respectively, metal or metal.

五、發明說明(9) 合金的薄膜’個別吸光薄膜的厚度以3到6nm為佳。厚度小 於3nm是不良好的’那樣的抗反射薄膜,不只是其吸光性 質不足以降低所顯示影像的對比,也損害抗靜電性質。另 一方面,厚度超過6nm是不良好的,那樣的抗反射薄膜吸 收太大量的光’導致所顯示的影像變暗。個別吸光薄膜的 厚度的選擇,以使得此光學製品的可見射線透射比在3 〇到 5 0 %的範圍較佳。 此光學製品的較佳製品’其中的吸光薄膜,個別為一種 元件、或是二或多種元件混合物的薄膜;此元件是由氮化 飲、氮化絡、氮化酷、氮化铪、和氮化纽所組成的金屬氮 化物群中選擇出來的。 這些金屬氮化物的任何一種薄膜’幾乎沒有顏色,所以 具有透明薄膜的特性;因而並不會損害由陰極射線管所呈 現的彩色影像的色彩。 此光學製品的較佳製品,其中吸光薄膜,個別的厚度為 5 到 1 8 n m。 薄膜吸收太大量的光,導致所顯示的影像變暗。由此立足5. Description of the invention (9) Alloy thin film 'The thickness of the individual light absorbing film is preferably 3 to 6 nm. An anti-reflection film having a thickness of less than 3 nm is not good. Not only is its light absorption property insufficient to reduce the contrast of the displayed image, but it also impairs the antistatic property. On the other hand, a thickness exceeding 6 nm is not good, and such an anti-reflection film absorbs too much light 'and causes the displayed image to become dark. The thickness of the individual light absorbing films is selected so that the visible ray transmission ratio of this optical article is better in the range of 30 to 50%. A preferred product of this optical product is one of the light-absorbing films, which are each a film or a mixture of two or more devices; the device is made of nitride, nitride, nitride, hafnium nitride, and nitrogen. It is selected from the group of metal nitrides. Any of these thin films of metal nitride 'has almost no color, so it has the characteristics of a transparent film; therefore, the color of the color image presented by the cathode ray tube is not impaired. A preferred article of this optical article, wherein the light-absorbing film has an individual thickness of 5 to 18 nm. The film absorbs too much light, causing the displayed image to become dark. From here

其中分別作為第二和第四層的吸光薄膜,個別為金屬氮 化物所組成’個別吸光薄膜的厚度以5到丨8nm為佳。厚度 小於5nm是不良好的,那樣的抗反射薄膜,不只是其吸光 性質不足以降低所顯示影像的對比,也損害抗靜電性質。 由此立足點而s ,第二和第四層的厚度以6nm或更大較 佳。另一方面’厚度超過18_是不良好的,那樣的抗反射 五、發明說明(10) 光薄膜的厚度的選擇’以使得此光學製品的可見射線透射 比在3 0到5 0 %的範圍較佳。 此光學製品的較佳製品,其中可透光基板是一種玻璃基 板。 此玻璃基板被黏著劑接合到陰極射線管面板的外部表 面。由於這樣的面板通常具有微彎的外部表面,因此玻璃 基板則以已經被彎曲的較佳,使得可藉由具均勻厚度的黏 著劑層而被接合到該彎曲的表面。此玻璃基板可以是無色 或有色的玻璃板。玻璃的成份並不特別限制,可用的例子 包括有鹼石灰矽酸鹽成份、硼矽酸鹽成份、鋁矽酸鹽成 份、和鋁硼矽酸鹽成份。此玻璃基板可以經由氣冷使得更 強固。一般而言,具有鹼石灰矽酸鹽成份的浮製玻璃 (float glass),因為不昂貴,經常被使用。 此光學製品的較佳製品,其中可透光基板是用於陰極射 線管之玻璃製面板。 此光學製品的較佳製品,其中的玻璃包含一種有色的成 分,因而有吸光的性質。 玻璃可以包含吸光離子(有色離子)的例子,包括有 鎳、鐵、鈷、硒、鈽、和鈦。混合至少一種上述的成份於 玻璃中’得到一種吸光透明的玻璃;例如,灰色、綠色、 或青銅色可以被得到。使用具有吸光性質的玻璃是較佳 的,因為此玻璃對於在通過玻璃基板後到達抗反射薄膜的 光’可有效降低其反射在玻璃基板和抗反射薄膜之間界面 上光線的量;並將敘述於後。此玻璃可以包含其他的添加Among them, the light-absorbing films as the second and fourth layers, respectively, are each composed of a metal nitride. The thickness of the individual light-absorbing films is preferably 5 to 8 nm. A thickness of less than 5 nm is not good. Such an anti-reflection film not only has insufficient light absorption properties to reduce the contrast of the displayed image, but also impairs the antistatic properties. From this standpoint, the thickness of the second and fourth layers is preferably 6 nm or more. On the other hand, 'thickness exceeding 18_ is not good, such antireflection. 5. Description of the invention (10) Selection of thickness of light film' so that the visible ray transmittance of this optical product is in the range of 30 to 50%. Better. A preferred article of this optical article, wherein the light-transmitting substrate is a glass substrate. This glass substrate is bonded to the outer surface of the cathode ray tube panel with an adhesive. Since such a panel usually has a slightly curved outer surface, the glass substrate is preferably already curved, so that it can be bonded to the curved surface by an adhesive layer having a uniform thickness. This glass substrate may be a colorless or colored glass plate. The composition of the glass is not particularly limited, and usable examples include a soda lime silicate component, a borosilicate component, an aluminosilicate component, and an aluminoborosilicate component. This glass substrate can be made stronger by air cooling. Generally speaking, float glass with soda lime silicate composition is often used because it is not expensive. A preferred product of this optical product, wherein the light-transmitting substrate is a glass panel for a cathode ray tube. A preferred article of this optical article is one in which the glass contains a colored component and is therefore light absorbing. Glass can contain examples of light-absorbing ions (colored ions), including nickel, iron, cobalt, selenium, thallium, and titanium. Mixing at least one of the above-mentioned ingredients in the glass' gives a light-absorbing transparent glass; for example, gray, green, or bronze colors can be obtained. It is better to use glass with light absorption properties, because this glass can effectively reduce the amount of light reflected at the interface between the glass substrate and the anti-reflection film for light that reaches the anti-reflection film after passing through the glass substrate; it will be described Later. This glass can contain other additions

88116158.ptd 第16頁 以 〇7 0“’ 五、發明說明(II) 物,像是鋇、锶、銻、辞和锆。 本發明更進一步提供了一種使用上述玻璃製品的陰極射 線管。 包含於本發明的每一個光學製品中之折射率為1. 6到2. 4 的透明介電薄膜的例子,包括有鈦酸镨、氧化鐯、氧化 銦、摻雜著錫的氧化銦、氧化鈮、氧化鈦、氧化鉍、氧化 ί呂、軋化組、氧化錯、氮化石夕、氧化錫、和氧化絡的薄 膜。折射率為1. 35到1. 5的透明介電薄膜的例子,包括有 氟化鎖和二乳化石夕的薄膜。這些透明的介電薄膜,可以用 習知的技術來沉積,例如,像是真空蒸鑛法、離子電鍵 法、和濺鍍法。可透光基板可以是平板或是塑膠的薄膜。 當金屬薄膜被用作為本發明的每一個光學製品中的吸光 薄臈時,在較長的波長時,此光學製品具有較低的透射 比’因為在可見光的範圍340到780nm中,金屬薄膜對於較 長的波長比較短的波長具有較高的光吸收係數。在上面所 列舉的透明介電薄臈中,氧化鉻薄膜在可見光的範圍中, 顯示些微的吸收;而且,對於較短的波長比較長的波長, 吸收較大量的光。因此,當金屬薄膜被用作為吸光薄膜, 及氧化鉻薄膜被用作為透明介電薄膜時,然後此抗反射薄 獏可以被調整,使得在整個可見範圍中,其透射比是定 值,或是在較長的波長時透射比微高。換言之,在兩種薄 Ϊ Ϊ間’ Ϊ長ί散性質的差異,多少可以被用來控制光譜 J射比曲線。由此立足點而·g·,選擇金屬薄膜作為吸光薄 膜,以及選擇氧化鉻薄膜作為透明介電薄膜較佳。 88ll6158.ptd 第17頁 麵 0 ^ 五、發明說明(12) 圖式之簡單說明 圖1是根據本發明的光學製品的具體例之剖面圖。 圖2是根據本發明的陰極射線管的具體例之表面祝圖° 圖3是剖面圊,描述根據本發明的光學製品的具體例 中,抗反射薄膜的多層結構。 圖4是描述重影原理的圖。 圖5是描述玻璃基板的L、Tint、和q的圖。 圖6是描述根據本發明的光學製品的心、r2、和r3的圖。 圖7是光譜曲線圖,分別顯示用於實施例1中之玻璃基板 的内部透射比Tint和表面反射比q。 ' 圖8是光譜曲線圖,分別顯示在實施例1中得到光學製品 的透射&T2、其在抗反射薄膜面的表面反射比r3、以及其 在玻璃基板/抗反射薄膜界面的反射比r2。 圖9是光譜曲線圖,分別顯示在實施例1 2中得到光學製 品的透射比T2、其在抗反射薄膜面的表面反射比ra、以及 其在玻璃基板/抗反射薄膜界面的反射比r2。 元件編號之說明 1 :螢光物質 2 :可透光基板 2 a .玻璃基板 2b :玻璃製面板 3 :抗反射薄膜 1 Oa :本發明使用玻璃基板的光學製品 10b :本發明使用玻璃製面板的光學製品88116158.ptd on page 16 with 〇 0 70 "'5. Description of the invention (II), such as barium, strontium, antimony, zi and zirconium. The present invention further provides a cathode ray tube using the above glass product. Contains Examples of transparent dielectric films having a refractive index of 1.6 to 2.4 in each optical article of the present invention include hafnium titanate, hafnium oxide, indium oxide, tin-doped indium oxide, and niobium oxide , Titanium oxide, bismuth oxide, oxidized aluminum, rolled group, oxide oxide, nitride oxide, tin oxide, and oxide complex. Examples of transparent dielectric films with a refractive index of 1.35 to 1.5 include Films with fluorinated locks and di-emulsions. These transparent dielectric films can be deposited using conventional techniques, such as, for example, vacuum evaporation, ion bonding, and sputtering. Light-transmissive substrates It can be a flat plate or a plastic film. When a metal film is used as the light absorbing thin film in each optical article of the present invention, at a longer wavelength, the optical article has a lower transmittance 'because In the range 340 to 780nm, metal thin films The longer wavelength has a higher light absorption coefficient than the shorter wavelength. In the transparent dielectric thin films listed above, the chromium oxide film shows a slight absorption in the visible light range; and, for shorter wavelengths, The longer wavelength absorbs a larger amount of light. Therefore, when a metal film is used as a light absorbing film and a chromium oxide film is used as a transparent dielectric film, then this anti-reflective film can be adjusted so that it can be seen in the entire visible range The transmittance is constant or slightly higher at longer wavelengths. In other words, the difference between the two kinds of thin Ϊ 'ί long ί dispersion properties can be used to control how much the spectral J-emission ratio Curve. From this standpoint, it is better to choose a metal film as the light absorbing film and a chromium oxide film as the transparent dielectric film. 88ll6158.ptd Page 17 0 ^ V. Description of the invention (12) Brief description Fig. 1 is a sectional view of a specific example of an optical article according to the present invention. Fig. 2 is a surface view of a specific example of a cathode ray tube according to the present invention. In the specific example of the optical article of the invention, the multilayer structure of the antireflection film. Fig. 4 is a diagram describing the principle of ghosting. Fig. 5 is a diagram describing L, Tint, and q of a glass substrate. Fig. 6 is a diagram describing Figures of the heart, r2, and r3 of the optical article. Figure 7 is a graph showing the internal transmittance Tint and surface reflectance q of the glass substrate used in Example 1. 'Figure 8 The transmission & T2 of the optical article obtained in Example 1 and its surface reflectance r3 on the surface of the antireflection film and its reflectance r2 on the glass substrate / antireflection film interface are shown. Fig. 9 is a spectral graph, respectively The transmittance T2 of the optical article obtained in Example 12 and its surface reflectance ra on the surface of the antireflection film and its reflectance r2 at the glass substrate / antireflection film interface are shown. Description of element number 1: Fluorescent substance 2: Translucent substrate 2a. Glass substrate 2b: Glass panel 3: Anti-reflective film 1 Oa: Optical product using glass substrate of the present invention 10b: Glass substrate of the present invention Optical products

88116158.ptd 第18頁 五、發明說明(13) 11 :本發明的陰極射線管 1 2 ·玻璃料密封層 13 :電子搶單元 14 :漏斗形體 31 :折射率為1. 6到2, 4的透明介電薄膜 32 :吸光薄膜 3 3 :折射率為1. 3 5到1 · 5的透明介電薄膜 發明之詳細說明 、 圖1是顯示根據本發明的光學製品的具體例之剖面圖。 圖1 (a)所顯示的光學製品i〇a,包含了玻璃基板2a,和 抗反射薄臈3沉積在其表面上。此光學製品以黏著劑接合 到陰極射線管的面板上,使得抗反射薄膜面向内部^如圖 1 ( b )的剖面圖所描述,根據本發明光學製品丨〇 b的另一 個具體例,包含了用於陰極射線管之玻璃製面板2b,和抗 反射薄膜3直接被沉積在面板的外部表面上。 圖2是本發明的陰極射線管丨!的具體例之表面視圖。此 具體例使用如圖1 ( b )所示的玻璃製品丨〇b。此玻璃製品 1 0 b被螢光物質1塗佈内部,並且以破璃料1 2接合到漏斗形 體14,其中電子搶單元13已經被固定。 圖3是剖面圖,描述根據本發明的具體例中的抗反射薄 膜。此具體例包含了折射率為1>4到17的可透光基板2 ; 以及以下列順序重疊在其表面上:折射率為丨.6到2. 4的透 明介電薄膜31,金屬薄膜32,折射率為丨.6到2. 4的透明介 電薄膜31,金屬薄膜32,折射率為丨.6到2. 4的透明介電薄.88116158.ptd Page 18 V. Description of the invention (13) 11: The cathode ray tube 1 2 of the present invention · The frit sealing layer 13: the electronic grab unit 14: the funnel-shaped body 31: the refractive index is 1.6 to 2, 4 Transparent dielectric film 32: Light absorbing film 3 3: Detailed description of the invention of a transparent dielectric film having a refractive index of 1.3 to 1.5. FIG. 1 is a cross-sectional view showing a specific example of an optical article according to the present invention. The optical product i0a shown in FIG. 1 (a) includes a glass substrate 2a, and an anti-reflective sheet 3 is deposited on the surface. This optical product is bonded to the panel of the cathode ray tube with an adhesive so that the anti-reflection film faces inward. As described in the sectional view of FIG. 1 (b), another specific example of the optical product according to the present invention includes A glass panel 2b for a cathode ray tube, and an antireflection film 3 are directly deposited on the outer surface of the panel. Fig. 2 is a cathode ray tube of the present invention! Surface view of the specific example. In this specific example, a glass product as shown in FIG. 1 (b) is used. This glass article 10b is coated with a fluorescent substance 1 inside, and is bonded to the funnel-shaped body 14 with a glass frit 12, wherein the electronic grab unit 13 has been fixed. Fig. 3 is a sectional view illustrating an anti-reflection film in a specific example according to the present invention. This specific example includes a light-transmissive substrate 2 with a refractive index of 1> 4 to 17; and a superimposed on its surface in the following order: a transparent dielectric film 31 with a refractive index of 1.6 to 2.4, and a metal film 32 , The transparent dielectric film 31 with a refractive index of 丨. 6 to 2.4, the metal thin film 32, the transparent dielectric film with a refractive index of 丨. 6 to 2.4.

__

五、發明說明(14) 膜31 ’以及折射率為l. 35到1. 5的透明介電薄膜33。 圖4是光學上描述顯示器中重影的圖◊圖5是描述用於本 發明之玻璃基板的内部透射比Tint,在其沒有抗反射薄獏 一面的反射比r】,和其透射比八的圖;這些性質將會於下 文中敘述。圖6是描述本發明的光學製品中,經由玻璃基 板,射向抗反射薄膜的光之反射比r2的圖,也就是在抗反 射薄膜/玻璃界面的反射比;以及描述經由抗反射薄膜的 相反面,射向玻璃基板的光之反射比&的圖。圖7是顯示 用於實施例1中之玻璃板的光譜性質之圖式。圖8是顯示在 實施例1令所得到之光學製品的光譜性質之圖式。 在圖4中,光線由螢光物質1放射出,通過玻璃基板2a, 而到達玻璃基板2a和抗反射薄膜3之間的界面。部份的光 通過抗反射薄膜3 *所透過的光4被視為一影像。然而,所 剩餘部份的光,被玻璃基板2 a和抗反射薄膜3之間的界面 所反射’而得到反射光5。此反射光5進而被玻璃基板2a和 螢光物質1之間的界面所反射,而得到反射光6。此反射光 6通過玻璃基板2a和抗反射薄膜3,而到達觀看者。所產生 透過的光7可以被觀察視為一影像。結果,觀看者可以視 覺上同時觀察到二光線,透過的光4和透過的光7。換言 之,觀看者觀察到一重影。重影的問題因此產生。 當玻璃的内部透射比變高時,重影變得更嚴重。相反 地,在玻璃具有低的内部透射比的例子時,反射光5和6通 過玻璃時被玻璃吸收不少。結果,所透過的光7的量很 少,無法被觀看者觀察到。換言之,重影沒有發生。5. Description of the invention (14) The film 31 'and the transparent dielectric film 33 having a refractive index of 1.35 to 1.5. FIG. 4 is a diagram optically describing a ghost in a display. FIG. 5 is a diagram describing the internal transmittance Tint of the glass substrate used in the present invention, the reflectance r on the side where it does not have antireflection thin], and its transmittance Figures; these properties are described below. FIG. 6 is a diagram describing the reflection ratio r2 of the light directed to the antireflection film via the glass substrate in the optical article of the present invention, that is, the reflection ratio at the antireflection film / glass interface; A graph of the reflectance & FIG. 7 is a graph showing the spectral properties of the glass plate used in Example 1. FIG. Fig. 8 is a graph showing the spectral properties of the optical article obtained in Example 1. In FIG. 4, light is emitted from the fluorescent substance 1 and passes through the glass substrate 2 a to reach the interface between the glass substrate 2 a and the anti-reflection film 3. Part of the light 4 transmitted through the antireflection film 3 * is considered as an image. However, the remaining part of the light is reflected by the interface between the glass substrate 2a and the antireflection film 3 'to obtain reflected light 5. This reflected light 5 is further reflected by the interface between the glass substrate 2a and the fluorescent substance 1, and a reflected light 6 is obtained. This reflected light 6 passes through the glass substrate 2a and the anti-reflection film 3 and reaches the viewer. The generated transmitted light 7 can be viewed as an image. As a result, the viewer can visually observe two rays, the transmitted light 4 and the transmitted light 7 at the same time. In other words, the viewer observes a double image. The problem of ghosting arises. As the internal transmittance of the glass becomes higher, ghosting becomes more severe. In contrast, in the case where the glass has a low internal transmittance, the reflected light 5 and 6 are absorbed by the glass as it passes through the glass. As a result, the amount of transmitted light 7 is small and cannot be observed by the viewer. In other words, ghosting does not occur.

88116158^1(1 第20頁 五、發明說明(15) 下列的定義被應用此文中。 (1 )玻璃基板的表面反射比:Γι (2 )玻璃基板的透射比:Tj (3 )玻璃基板的内部透射比:Tint (4) 對於自抗反射薄膜的相反面入射之光學製品的反射 比: (5) 在玻璃基板/抗反射薄膜界面之光學製品的反射 比:r2 (6) 在塗佈著抗反射薄膜的一面之光學製品的表面反射 比:r3 (7 )光學製品的透射比:T2 在圖6所示,本發明的光學製品十,在玻璃基板/抗反射 薄膜界面的反射比r2,以下列方法測量。首先,在抗反射 薄膜形成之前,平面平行板形式的玻璃基板的透射比^被 測量。其次,玻璃基板的一面1 2被噴砂,使得表面粗糙, 此粗糙表面以黑色油性筆上色(此處理稱為"抗反射處理" )。光因此由相反面11衝擊在此玻璃基板上,來測量反射 比。此反射比被定義為表面反射比q,如圖5所示。玻璃 基板的透射比T!和表面反射比Γι的實測值,都以分光光度 計得到,並被代入方程式(1 )來計算玻璃基板的内部透 射比Tint。圖5是顯示玻璃基板的内部透射比Tint、玻璃基板 的透射比1\、和玻璃基板的表面反射比r!。 (方程式1 )88116158 ^ 1 (1 page 20 V. Description of the invention (15) The following definitions are applied in this article. (1) Surface reflectance of glass substrate: Γι (2) Transmission of glass substrate: Tj (3) of glass substrate Internal transmittance: Tint (4) Reflectance for optical products incident from the opposite side of the antireflection film: (5) Reflectance for optical products at the glass substrate / antireflection film interface: r2 (6) Coating The surface reflectance of the optical product on one side of the antireflection film: r3 (7) The transmittance of the optical product: T2 As shown in FIG. 6, the optical product of the present invention has a reflectance r2 at the glass substrate / antireflection film interface. Measured in the following way. First, the transmittance of a glass substrate in the form of a plane parallel plate was measured before the formation of the anti-reflection film. Second, one side of the glass substrate was sandblasted to make the surface rough. Coloring (this process is called " anti-reflective treatment "). Light is therefore impinged on the glass substrate by the opposite surface 11 to measure the reflectance. This reflectance is defined as the surface reflectance q, as shown in Figure 5 .Glass-based The measured values of the transmittance T! And surface reflectance Γι are both obtained spectrophotometrically and substituted into equation (1) to calculate the internal transmittance Tint of the glass substrate. Figure 5 shows the internal transmittance Tint of the glass substrate The transmittance 1 of the glass substrate and the surface reflectance r! Of the glass substrate (Equation 1)

Tint = 2V((U+ 卜〇2)Tint = 2V ((U + 〇〇2)

88116158.ptd 第21頁 L 44 07 0*4^' 五、發明說明(16) 再者,在具有和上面玻璃基板相同光學性質的玻璃基板 上,沉積抗反射薄膜,而製得的玻璃製品樣品;以由抗反 射薄臈的相反面射在玻璃基板上的光之反射比光譜心來檢 驗(見圖6)。利用方程式(2),可藉由在抗反射薄膜的相反 面之玻璃製品的反射比心、玻璃基板的表面反射比Γι、以 及玻璃基板的内部透射比Tint,以計算出在玻璃基板/抗反 射薄膜界面之光學製品的反射比r2。 (方程式2) r2 = (R1-r1)/( ((Rj-r^r^Cl-r! )2)Tint2) 由上述的方法,在玻璃基板/抗反射薄膜界面之光學製 : 品的反射比r2被確定。圖6是顯示在玻璃基板/抗反射薄膜 界面之光學製品的反射比r2,和在抗反射薄膜的相反面之 玻璃製品的反射比&。 本發明將參考下列實施例和比較例,作更詳細的解釋於 下’但本發明並不應被解釋為限制在這些例子◊在實施例 和比較例中,薄膜沉積以下列方法來處理。 鈦酸镨(PrTi〇3)層:使用PrTi 03的小柱粒為一蒸發源來 蒸鍍。 鎳-鐵合金(NiFe)層:使用鎳-鐵合金片為一蒸發源來蒸 鍵。 氟化鎂(MgFz)層:使用MgF2的小柱粒為一蒸發源來蒸 鍍。 不鏽鋼(NiFeCr)層:使用不鏽鋼片為一蒸發源來蒸鍍。 氮化矽(S i Nx)層:使用矽為靶材來反應濺鍍。88116158.ptd Page 21 L 44 07 0 * 4 ^ 'V. Description of the invention (16) Furthermore, an anti-reflection film was deposited on a glass substrate having the same optical properties as the glass substrate above, and a sample of the glass product was prepared. ; Examine with the spectral center of the reflectance of the light incident on the glass substrate from the opposite side of the anti-reflective sheet (see Figure 6). Using equation (2), the glass substrate / anti-reflection can be calculated from the reflectance of the glass product on the opposite side of the anti-reflection film, the surface reflectance of the glass substrate, and the internal transmittance of the glass substrate, Tint. The reflection ratio r2 of the optical product at the film interface. (Equation 2) r2 = (R1-r1) / (((Rj-r ^ r ^ Cl-r!) 2) Tint2) The optical method at the glass substrate / anti-reflective film interface by the method described above: reflection of the product The ratio r2 is determined. Fig. 6 shows the reflectance r2 of the optical article at the interface of the glass substrate / antireflection film, and the reflectance & of the glass article at the opposite side of the antireflection film. The present invention will be explained in more detail with reference to the following examples and comparative examples, but the present invention should not be construed as being limited to these examples. In the examples and comparative examples, the thin film deposition was processed in the following manner. PrTitanium Titanate (PrTi03) layer: Evaporation is performed using PrTi03 pellets as an evaporation source. Nickel-Iron Alloy (NiFe) Layer: The nickel-iron alloy sheet is used as an evaporation source to vaporize bonds. Magnesium fluoride (MgFz) layer: MgF2 pellets are used as an evaporation source for evaporation. Stainless steel (NiFeCr) layer: a stainless steel sheet is used as an evaporation source for evaporation. Silicon nitride (S i Nx) layer: Uses silicon as a target for reactive sputtering.

88116158.ptd 第22頁 4 4 07 0以 五、發明說明(Π) 氮化鈦(T i Νχ)層:使用鈦為靶材來反應濺鍍。 二氧化矽(Si 02)層:使用矽為靶材來濺鍍。 氧化鋁(A 1203 )層:使用鋁為靶材來濺鍍。 實施例1 具有尺寸為100mm,100_,14mm (厚度)的有色玻璃 板,檢定其在波長範圍340到780ητη中的表面反射比1^和透 射比T!。這些透射比和表面反射比的實測值,被代入方程 式1來計算玻璃基板的内部透射比Tint。内部透射比和表面 反射比的波長光譜,顯示於圊7。 其次’其内部透射比和表面反射比已經被確定了的玻璃 基板’被放入一真空蒸鍍系統中,並且以配置於蒸鍍系統 中的基板加熱器加熱至300 °C。當此玻璃基板持續被如此 加熱時’如表1所示之具有多層結構的抗反射薄膜,被沉 積在此玻璃基板上。因此,根據本發明的光學製品的樣品 1被製造。為了汽化此蒸發源,電子束蒸發法被使用。蒸 發掛禍和玻璃基板之間的距離被調整為1 00cm,並且當迴 ,玻璃基板時’沉積被形成《在個別的組成薄膜沉積之 前’真空箱以油擴散幫浦抽真空至〇. 〇 〇 3 Pa。在沉積鎳一鐵 合金(NiFe)薄膜、鈦酸镨(PrTi〇3)薄膜(折射率2. 14),和 氣化鎮(MgF2)薄膜(折射率丨.38)時,氧氣並不被導入。 得到的光學製品被取出該蒸鍍系統,NiFe薄膜以化學分 析確定其組成。結果,鎳/鐵的比例被測得為81 : 19 (以 重量計)。 得到的樣品檢定其在波長範圍34〇到78〇ηιη中之透射比和88116158.ptd Page 22 4 4 07 0 V. Description of the invention (Π) Titanium nitride (T i Νχ) layer: Use titanium as a target for reactive sputtering. Silicon dioxide (Si 02) layer: using silicon as a target for sputtering. Alumina (A 1203) layer: Use aluminum as a target for sputtering. Example 1 A colored glass plate having dimensions of 100 mm, 100 mm, and 14 mm (thickness) was examined for a surface reflection ratio 1 ^ and a transmission ratio T! In a wavelength range of 340 to 780ητη. The measured values of these transmittances and surface reflectances are substituted into Equation 1 to calculate the internal transmittance Tint of the glass substrate. The wavelength spectrum of internal transmittance and surface reflectance is shown in 圊 7. Next, 'the glass substrate whose internal transmittance and surface reflectance have been determined' is placed in a vacuum evaporation system and heated to 300 ° C with a substrate heater arranged in the evaporation system. When this glass substrate is continuously heated in this way, an antireflection film having a multilayer structure as shown in Table 1 is deposited on this glass substrate. Therefore, a sample 1 of an optical article according to the present invention was manufactured. To vaporize this evaporation source, an electron beam evaporation method is used. The distance between the evaporator and the glass substrate was adjusted to 100cm, and when the glass substrate was returned, the 'deposition was formed' before the individual composition film was deposited 'and the vacuum box was evacuated with an oil diffusion pump to 〇. 〇〇 3 Pa. During the deposition of nickel-iron alloy (NiFe) films, praseodymium titanate (PrTiO3) films (refractive index 2.14), and vaporized ballast (MgF2) films (refractive index 丨 .38), oxygen was not introduced. The obtained optical article was taken out of the evaporation system, and the composition of the NiFe film was determined by chemical analysis. As a result, the nickel / iron ratio was measured to be 81: 19 (by weight). The obtained samples were examined for their transmittances in the wavelength range of 34 to 78 nm and

88116158.ptd 第23頁 1 1 1 " ^ 五、發明說明(18) 在抗反射薄膜的相反面的反射比。這些實測值被代入方程 式2來確定在玻璃基板/抗反射薄膜界面的反射比r2。再 者,相反於抗反射薄膜樣品的那一面,以均勻地噴砂和黑 色油性筆,處以抗反射處理,然後塗佈有抗反射薄膜那一 面的表面反射比r3被測得。圖8是顯示因而確定的光學製 品的透射比T2、在玻璃基板/抗反射薄膜界面的反射比r2、 以及塗佈有抗反射薄膜一面的表面反射比r3之波長光譜。 可見光透射比Tv、塗佈有抗反射薄膜一面的可見光反射 比r3v、以及在玻璃基板/抗反射薄膜界面之可見光的反射 &r2v,可由圖8所示的光譜,根據JIS R 3 1 06 ( 1 998 ) ( 計算出來。所得到的結果顯示於表2。 具有和上面所使用的玻璃基板幾乎相同玻璃組成的陰極 射線管面板的外部表面,在和上面相同的薄膜沉積條件 下,被塗佈一層抗反射薄膜。就整個產生的塗佈面板而 言’可見光透射比為35.7% 。此面板被用來製造陰極射線 管’並且由此陰極射線管所呈現的影像,在暗室中被觀 察。結果,所顯示的對比令人滿意。 由於在面板和抗反射薄膜之間界面的可見光反射比低到 0. 1 9 % ,因此重影並沒有發生。再者,即使當陰極射線管 在以螢光燈照明的房間内被觀察時,由於在塗佈有抗反射 薄膜一面的表面反射比低到0.26% ,因此面板表面並不反 射螢光燈。故,影像呈現優良的可視性。 為了使抗反射薄膜具有抗靜電功能,抗反射薄膜被認為 具有片電阻2k Ω / □或更低為佳。為了使此抗反射薄膜能88116158.ptd Page 23 1 1 1 " ^ V. Description of the invention (18) The reflectance on the opposite side of the antireflection film. These measured values are substituted into Equation 2 to determine the reflectance r2 at the glass substrate / anti-reflective film interface. In addition, the surface reflection ratio r3 of the side opposite to the sample of the antireflection film was uniformly sandblasted and a black oil-based pen was subjected to antireflection treatment, and then the surface coated with the antireflection film was measured. Fig. 8 is a wavelength spectrum showing the transmittance T2, the reflectance r2 at the glass substrate / anti-reflective film interface, and the surface reflectance r3 of the surface coated with the anti-reflective film, which are thus determined. The visible light transmittance Tv, the visible light reflectance r3v on the side coated with the antireflection film, and the visible light reflection & r2v at the glass substrate / antireflection film interface can be obtained from the spectrum shown in FIG. 8 according to JIS R 3 1 06 ( 1 998) (Calculated. The results obtained are shown in Table 2. The outer surface of a cathode ray tube panel having almost the same glass composition as the glass substrate used above was coated under the same film deposition conditions as above. A layer of anti-reflective film. The visible coating transmittance is 35.7% for the entire coating panel produced. This panel is used to make a cathode ray tube 'and the image presented by this cathode ray tube is observed in a dark room. Results The displayed contrast is satisfactory. Since the visible light reflectance at the interface between the panel and the anti-reflection film is as low as 0.19%, ghosting does not occur. Furthermore, even when the cathode ray tube is under fluorescent light When viewed in a room illuminated by a lamp, the surface of the panel is not reflecting fluorescent light because the surface reflectance on the side coated with the anti-reflection film is as low as 0.26%. Like exhibit excellent visibility. In order to make the antireflection film having an antistatic function, the antireflection film is considered to have a sheet resistance 2k Ω / □ or less is preferred. In order for this antireflection film can

88116158.ptd 第24頁 44 07 Ο 五、發明說明(19) 遮蔽由陰極射線管放射出之對人體有害的電磁波,抗反射 薄膜更進一步被認為,具有片電阻為5 〇 〇 Ω / □或更低較 佳。抗反射薄膜的樣品1之片電阻被測量,且實測值顯示 於表2。其片電阻為112Ω/□,表示此抗反射薄膜具有抗 靜電功能,以及電磁遮蔽功能。 實施例2 和實施例1相同的玻璃基板,經由真空蒸鑛,被塗佈以 如表1所示之具有多層結構的抗反射薄膜。被用為吸光薄 膜的鎳-鐵-鉻合金薄臈,以化學分析確定其組成。結果, 鎳/鐵/鉻的比例被測得為77. 0/7. 8/15. 2,以重量計。 所得到的光學製品的樣品’檢定其透射比和在抗反射薄 膜的相反面的反射比。由這些實測值,以和實施例1相同 的方法,來確定在玻璃基板/抗反射薄膜界面的可見光反 射比。再者,相反於抗反射薄膜樣品的那一面,被處以抗 反射處理,然後’塗佈有抗反射薄膜一面的表面反射比被 測得。 由這些測量結果,根據J IS R 31 0 6,計算出可見光透射 比Tv、在塗佈面的可見光反射比r3v、以及在玻璃基板/抗 反射薄膜界面之可見光的反射比r2v。得到的結果顯示於 表2 〇 樣品的可見光透射比為35.6% ,其數值對增強顯示的對 比是有利的。因為,在塗佈有抗反射薄膜一面的表面反射 比低到0. 3 2 % ,幾乎沒有影像反射發生在樣品的塗佈面 上。再者,因為在玻璃基板/抗反射薄臈界面的反射比低88116158.ptd Page 24 44 07 Ο V. Description of the invention (19) Shields electromagnetic waves harmful to the human body emitted by the cathode ray tube, and the anti-reflection film is further considered to have a sheet resistance of 500 Ω / □ or more Low is better. The sheet resistance of Sample 1 of the antireflection film was measured, and the measured values are shown in Table 2. Its sheet resistance is 112Ω / □, which indicates that this anti-reflection film has antistatic function and electromagnetic shielding function. Example 2 The same glass substrate as in Example 1 was coated with an antireflective film having a multilayer structure as shown in Table 1 via vacuum distillation. A thin nickel-iron-chromium alloy thin film, which is used as a light-absorbing film, was determined by chemical analysis. As a result, the ratio of nickel / iron / chromium was measured to be 77.0 / 7.8.15, 2 by weight. The obtained sample of the optical article was examined for its transmittance and reflectance on the opposite side of the antireflection film. From these measured values, the visible light reflection ratio at the glass substrate / anti-reflective film interface was determined in the same manner as in Example 1. In addition, the surface opposite to the sample of the antireflection film was subjected to an antireflection treatment, and then the surface reflectance of the surface coated with the antireflection film was measured. From these measurement results, the visible light transmittance Tv, the visible light reflectance r3v on the coating surface, and the visible light reflectance r2v at the glass substrate / anti-reflective film interface were calculated from J IS R 31 0 6. The results obtained are shown in Table 2. The visible light transmittance of the sample is 35.6%, and its value is advantageous for enhancing the contrast of the display. Because the surface reflectance on the side coated with the anti-reflection film was as low as 0.32%, almost no image reflection occurred on the coated side of the sample. Furthermore, because the reflection ratio is low at the glass substrate / anti-reflective interface

88116158.ptd 第25頁 44 07 五、發明說明(20) 到0 . 1 4 % ,幾乎觀察不到重影。 此抗反射薄膜的片電阻為268Ω/□,表示其具有實用的 抗靜電功能,以及實用的電磁遮蔽功能。 表1 實施例 抗反射薄膜的多層結構和每一層的厚度(nm) 實施例1 玻璃 / PrTi03 / NiFe / PrTi03 / NiFe / PrTi03 / MgF2 | 44.9 4.9 53. 4 3. 9 20.6 84.7 實施例2 玻璃 / PrTiOa / NiFeCr / PrTi〇3 / NiFeCr / MgFz 54*1 5 6 57.6 3.3 90.3 實施例3 玻璃 / siNx / TiNx / SiNx / TiNx / SiNx / Si02 52.1 11*1 54.9 8.5 1.2 79.2 實施例4 玻璃 / SiNx / TiNx / SiNx / TiNx / SiOa 51.6 11.1 55,2 8.5 79.6 實施例5 玻璃 / Al2〇3 / TiNx / A1z03 / TiNx / Si〇2 39.5 8.0 69.8 8.4 86.4 實施例6 玻璃 / Ti〇2 / TiNx / Ti02 / TiNx / SiOa 39.5 17.5 39.0 8.3 81.4 實施例7 玻璃 / SiN, / TiNx / SiNK / TiNx / SiNx / Si02 31.0 10.5 50*1 10.8 20.3 60.3 實施例8 玻璃 / SiNx / TlNx / SiNx / TIN, / SiOz 80,0 9.9 67.8 6.9 100.0 實施例9 玻璃 / SiNx / TiNx / SiNx / TiNx / SiN* / Si02 60.0 10,0 60.0 10t0 100.0 100,0 實施例1 0 玻璃 / TiNx / SiNx / TiN^ / SiNx / Si〇2 6.3 61.1 13.1 28*6 66.9 實施例11 玻璃 / PrTi03 / NiFe / PrTi03 / NiFe / PrTi03 / MgFz 31.9 6.4 61.4 3.8 28.8 100.0 實施例1 2 玻璃 / PrTi03 / NiFe / CrOx / NiFe / PrTi03 / MgF2 50.5 8.4 4 7.7 5.5 16.9 68.9 實施例1 3 玻璃/ NiFe / CrOx / NiFe / PrTi03 / MgF2 4.1 60.1 9.6 38.9 60.5 画Hi 88116158‘pid 第26頁 44 07 0ir 五、發明說明(21) 實施例3 和用於實施例1的玻璃具有相同光學性質的玻璃,經由 磁控管濺鍍,被塗佈以如表1所示之具有多層結構的抗反 射薄膜。得到的玻璃製品’檢定其透射比和在抗反射薄膜 的相反面的反射比。由這些實測值,來確定在玻璃基板/ 抗反射薄膜界面的可見光反射比《再者,相反於抗反射薄 膜樣品的那一面,被處以抗反射處理;然後,塗佈有抗反 射薄膜一面的表面反射比被測得。由這些測量結果,根據 JIS R 3106,計算出可見光透射比Tv、在塗佈有抗反射薄 膜一面的可見光反射&r3v、以及在玻璃基板/抗反射薄膜 「 界面之可見光的反射比r2v。得到的結果顯示於表2。 樣品的可見光透射比為3 6 6 % ,其數值對增強顯示的對 比是有利的。因為’在塗佈有抗反射薄膜一面的表面反射 比低到0. 48 % ,幾乎沒有影像反射發生在樣品的塗佈面 上。再者’因為在玻璃基板/抗反射薄膜界面的反射比, 低到0. 2 3 % ,幾乎觀察不到重影。此抗反射薄膜的片電阻 為182Ω/□,表示其具有實用的抗靜電功能,以及實用的 電磁遮蔽功能。 實施例4至1 0 以和實施例3相同的方法,經由在一玻璃基板上塗伟以 如表1所示之具有個別多層結構的抗反射薄膜,而得到光 學製品的樣品。這些樣品的光學性能和片電阻被顯示於表 2。個別樣品的可見光透射比在35至40 %的範圍中,其數 值對增強顯示的對比是有利的。個別樣品在塗佈有抗反射88116158.ptd Page 25 44 07 V. Description of the invention (20) to 0.14%, almost no ghosting is observed. The sheet resistance of this anti-reflection film is 268Ω / □, which means that it has a practical antistatic function and a practical electromagnetic shielding function. Table 1 Example of the multilayer structure of the anti-reflection film and the thickness (nm) of each layer Example 1 Glass / PrTi03 / NiFe / PrTi03 / NiFe / PrTi03 / MgF2 | 44.9 4.9 53. 4 3. 9 20.6 84.7 Example 2 Glass / PrTiOa / NiFeCr / PrTi〇3 / NiFeCr / MgFz 54 * 1 5 6 57.6 3.3 90.3 Example 3 Glass / siNx / TiNx / SiNx / TiNx / SiNx / Si02 52.1 11 * 1 54.9 8.5 1.2 79.2 Example 4 Glass / SiNx / TiNx / SiNx / TiNx / SiOa 51.6 11.1 55, 2 8.5 79.6 Example 5 Glass / Al2〇3 / TiNx / A1z03 / TiNx / Si〇2 39.5 8.0 69.8 8.4 86.4 Example 6 Glass / Ti〇2 / TiNx / Ti02 / TiNx / SiOa 39.5 17.5 39.0 8.3 81.4 Example 7 Glass / SiN, / TiNx / SiNK / TiNx / SiNx / Si02 31.0 10.5 50 * 1 10.8 20.3 60.3 Example 8 Glass / SiNx / TlNx / SiNx / TIN, / SiOz 80, 0 9.9 67.8 6.9 100.0 Example 9 Glass / SiNx / TiNx / SiNx / TiNx / SiN * / Si02 60.0 10,0 60.0 10t0 100.0 100,0 Example 1 0 Glass / TiNx / SiNx / TiN ^ / SiNx / Si〇2 6.3 61.1 13.1 28 * 6 66.9 Example 11 Glass / PrTi03 / NiFe / PrTi03 / NiFe / PrTi03 / MgFz 31.9 6.4 61.4 3.8 28.8 100.0 Example 1 2 Glass / PrTi03 / NiFe / CrOx / NiFe / PrTi03 / MgF2 50.5 8.4 4 7.7 5.5 16.9 68.9 Example 1 3 Glass / NiFe / CrOx / NiFe / PrTi03 / MgF2 4.1 60.1 9.6 38.9 60.5 Draw Hi 88116158'pid Page 26 44 07 0ir V. Description of the invention (21) Example 3 and the glass used in Example 1 have the same optical properties and are sputtered through the magnetron Plated and coated with an antireflection film having a multilayer structure as shown in Table 1. The obtained glass article 'was examined for its transmittance and reflectance on the opposite side of the antireflection film. Based on these measured values, the visible light reflectance at the glass substrate / anti-reflective film interface is determined. Furthermore, the side opposite to the sample of the anti-reflective film is treated with anti-reflective treatment; then, the surface coated with the anti-reflective film The reflectance is measured. From these measurement results, according to JIS R 3106, the visible light transmittance Tv, the visible light reflection & r3v on the side coated with the antireflection film, and the visible light reflectance r2v at the glass substrate / antireflection film interface were obtained. The results are shown in Table 2. The visible light transmittance of the sample was 36.6%, and its value is advantageous for enhancing the contrast of the display. Because 'the surface reflectance on the side coated with the antireflection film is as low as 0.48%, Almost no image reflection occurred on the coated surface of the sample. Furthermore, 'because the reflection ratio at the glass substrate / anti-reflection film interface was as low as 0.23%, ghosting was hardly observed. The sheet of this anti-reflection film The resistance is 182Ω / □, which indicates that it has a practical antistatic function and a practical electromagnetic shielding function. Examples 4 to 10 In the same manner as in Example 3, coating Wei on a glass substrate as shown in Table 1 Samples of optical products were obtained with anti-reflection films having individual multilayer structures. The optical properties and sheet resistance of these samples are shown in Table 2. The visible light transmittance of individual samples was 35 to 40. In the range of%, its value is beneficial to enhance the contrast of the display. Individual samples are coated with anti-reflection

1 4 4 07 0\4^> 五、發明說明(22) ---- 薄膜一面的表面反射比低到1 %或更低,所以幾乎沒 像反射發生在樣品的塗佈面上。個別樣品在玻璃基板/ = 反射薄膜界面的可見光反射比低到1 %或更低,所以幾乎 觀察不到重影。再者’個別樣品中抗反射薄膜的月電阻為 208Ω/□或更低’由抗靜電功能和電磁遮蔽功能的立場而 言,其數值是相當低的。 ^2 施例 可見光 透射比 Τν(%) 可見光 反射比 r3v(%) 在介面的可 見光反射比 r2 v (%) 片電阻 (Ω/ □) 實施例1 35.7 0.26 0. 19 112 實施例2 35.6 0.32 0.14 268 實施例3 36. 6 0. 48 0.23 182 實施例4 36.6 0.47 0.23 196 實施例5 36, 7 0.64 0. 52 201 實施例6 36. 5 0. 76 0. 29 135 實施例7 34. 6 0. 35 0.70 164 實施例8 40. 〇 0. 93 0.54 208 實施例9 35. 〇 0. 62 0.68 175 實施例1 0 38. 〇 0. 39 0.67 185 實施例11 31. 4 0. 21 2. 61 98 實施例1 2 39.2 0. 38 1.77 330 實施例1 3 38. 9 0.69 1.25 420 [註]Tv,r3v和r2v的值,是由前文定義的性質(5) ’(6),1 4 4 07 0 \ 4 ^ > 5. Description of the invention (22) ---- The surface reflectance of the film is as low as 1% or less, so almost no reflection occurs on the coated surface of the sample. The visible light reflectance of the individual samples at the glass substrate / = reflective film interface is as low as 1% or less, so ghost images are hardly observed. Furthermore, 'the monthly resistance of the anti-reflection film in individual samples is 208 Ω / □ or less' from the standpoint of the antistatic function and the electromagnetic shielding function, the value is quite low. ^ 2 Visible light transmittance τν (%) Visible light reflectance r3v (%) Visible light reflectance r2 v (%) at the interface Sheet resistance (Ω / □) Example 1 35.7 0.26 0. 19 112 Example 2 35.6 0.32 0.14 268 Example 3 36. 6 0. 48 0.23 182 Example 4 36.6 0.47 0.23 196 Example 5 36, 7 0.64 0.52 201 Example 6 36. 5 0. 76 0. 29 135 Example 7 34.6 0.35 0.70 164 Example 8 40. 〇.93 0.54 208 Example 9 35. 〇.62 0.68 175 Example 1 0 38. 〇0.39 0.67 185 Example 11 31. 4 0. 21 2. 61 98 Example 1 2 39.2 0. 38 1.77 330 Example 1 3 38. 9 0.69 1.25 420 [Note] The values of Tv, r3v and r2v are properties defined by the above (5) '(6),

88116158.Ptd 第 28 頁 ' 4407 五、發明說明(23) 和(7)的實測值,經由S R 31 06定義的發光特性’加以 計算得到的。 實施例11 如表1所示之具有多層結構的抗反射薄膜’以和實施例1 相同的方法被沉積。樣品的光學性能被顯示於表2。此樣 品的透射比為35至40 % ,其數值對增強顯示的對比是有利 的。此樣品在塗佈有抗反射薄膜一面的表面反射比低到1 %或更低,所以幾乎沒有影像反射發生在樣品的塗佈面 上。此樣品在玻璃基板/抗反射薄膜界面的反射比低到3 % 或更低,所以幾乎觀察不到重影。 此樣品中抗反射薄膜的片電阻為98Ω/□或更低,由抗 靜電功能和電磁遮蔽功能的立場而言,其數值是相當低 的。 實施例]2 具有和實施例1 1相同之多層結構的抗反射薄膜被沉積, 除了其第三層以氧化鉻組成,取代氧化镨。如表2所示, 所得到的樣品對達到本發明的目的,有令人滿意的性質。 此樣品的光譜透射特性顯示於圖9。如圖9所示,當波長增 加時’透射比T2的曲線並沒有升高的趨向,和顯示於圖8 的透射曲線一樣;而且在可見範圍内幾乎是平的。這被認 為歸因於’氧化鉻在有效地抵消由鎳—鐵合金薄膜所吸收 的光時,在較長的波長比在較短的波長更強烈。 實施例 如表1所示之具有多層結構的光學製品的樣品被得到β88116158.Ptd p. 28 '4407 V. Measured values of invention descriptions (23) and (7), calculated from the light emission characteristics defined by S R 31 06'. Example 11 An antireflection film having a multilayer structure as shown in Table 1 was deposited in the same manner as in Example 1. The optical properties of the samples are shown in Table 2. The transmittance of this sample is 35 to 40%, and its value is advantageous for enhancing the contrast of the display. The surface reflectance of this sample on the side coated with the antireflection film was as low as 1% or less, so almost no image reflection occurred on the coated surface of the sample. This sample has a reflectance at the glass substrate / anti-reflective film interface as low as 3% or less, so almost no ghosting is observed. The sheet resistance of the anti-reflection film in this sample is 98 Ω / □ or less, and from the standpoint of the antistatic function and the electromagnetic shielding function, the value is quite low. Example] 2 An anti-reflection film having the same multilayer structure as in Example 11 was deposited, except that the third layer was composed of chromium oxide instead of hafnium oxide. As shown in Table 2, the obtained samples have satisfactory properties for achieving the object of the present invention. The spectral transmission characteristics of this sample are shown in FIG. 9. As shown in Fig. 9, the curve of the 'transmittance T2 does not tend to increase when the wavelength is increased, and is the same as the transmission curve shown in Fig. 8; and it is almost flat in the visible range. This is believed to be due to the fact that 'chrome oxide is more intense at longer wavelengths than at shorter wavelengths when it effectively cancels the light absorbed by the nickel-iron alloy thin film. Example A sample of an optical article having a multilayer structure as shown in Table 1 was obtained as β

88116158.ptd 第29頁 44 07 0 4: 五、發明說明(24) 此樣品中抗反射薄膜的片電阻為42〇 Ω/ □,和實施例12 一 樣,由抗靜電功能和電磁遮蔽功能的立場而言,其數值是 相當低的。此結果更進—步顯示樣品的反射被降低。和在 實施例1 2中得到的樣品一樣’此樣品的透射曲線在可見範 圍内是平的。 比較例1到6 如表3所示之分別具有多層結構的抗反射薄膜,分別被 沉積在和實施例1中使用的玻璃基板相同的玻璃基板上。 在比較例1到3中,以和實施例3相同的方法,磁控管濺鍵 被用於抗反射薄膜的沉積。在比較例4到6中,以和實施例 1相同的方法’使用真空蒸鍍於抗反射薄膜的沉積。 所得到比較樣品的光學性能和片電阻被顯示於表4。個 別的比較樣品之可見光透射比在25至65 %的範圍中, 當被用作陰極射線管的面板時,其顯示的對比是令人滿意 的。然而,個別的比較樣品中,在塗佈有抗反射薄膜一面 的表面反射比、和在玻璃基板/抗反射薄膜界面的反射 比’兩者中至少有一個是1%或更尚。即在每一個比較樣 品中,螢光燈的反射和顯示重影,會發生一或二者。換言 之’沒有一個比較樣品沒有外在光線的反射和重影。此比 較樣品因而被發現不適於實際使用。88116158.ptd Page 29 44 07 0 4: V. Description of the invention (24) The sheet resistance of the anti-reflection film in this sample is 42.0 Ω / □, which is the same as that of Example 12, with its antistatic function and electromagnetic shielding function. In terms of value, it is quite low. This result goes even further-it shows that the reflection of the sample is reduced. As with the sample obtained in Example 12, the transmission curve of this sample was flat in the visible range. Comparative Examples 1 to 6 As shown in Table 3, antireflection films each having a multilayer structure were deposited on the same glass substrate as the glass substrate used in Example 1, respectively. In Comparative Examples 1 to 3, in the same manner as in Example 3, a magnetron sputtering key was used for the deposition of an anti-reflection film. In Comparative Examples 4 to 6, the same method as in Example 1 was used for the deposition of the antireflection film using vacuum evaporation. The optical properties and sheet resistance of the obtained comparative samples are shown in Table 4. The visible light transmittance of the individual comparative samples was in the range of 25 to 65%, and when used as a panel of a cathode ray tube, the displayed contrast was satisfactory. However, in the individual comparative samples, at least one of the surface reflectance on the side coated with the antireflective film and the reflectance at the glass substrate / antireflective film interface 'was 1% or more. That is, in each comparative sample, one or both of reflection and display ghosting of the fluorescent lamp occur. In other words, none of the comparative samples were free of reflections and ghosts of external light. This comparative sample was therefore found to be unsuitable for practical use.

88116158.ptd 第30頁 440704^ 五、發明說明¢25) 表3 比較例 抗反射薄膜的多層結構和每一層的厚度(nm) 比較例1 比較例2 比較例3 比較例4 比較例5 比較例6 玻璃 / Tit^ / SiNx / Si02 21.5 41.3 40.2 玻璃 / SiNx / TiN天 / SiNx / Si02 72.7 11.3 3.8 82.4 玻璃 / SiNx / TiNx / SiNx / TiNx / SiNx / Si02 24.9 2.1 19.8 2.1 124.2 116.1 玻璃 / NiFe / PrTi03 / NiFe / MgF2 1.3 39.6 3.4 110.7 玻璃 / Si02 / NiFe / Si02 / NiFe / Si02 / MgF2 ^0.2 2.9 92.4 3.0 29.5 95.8 玻璃 / Ti02 / NiFe / Ti02 / NiF6 / Ti02 / PrTi03 39.5 7.6 52.1 5.6 86,3 67.6 表4 比較例 可見光 透射比 Tv(%) 可見光 反射比 r3v (%) 在介面的可 見光反射比 r2v(%) 片電阻 (Ω/D) 比較例1 37. 2 0.45 25.4 150 比較例2 54. 3 4. 06 1. 43 320 比較例3 64. 2 1.56 1. 43 2100 比較例4 48. 3 4.98 2.10 101 比較例5 35. 8 1. 37 0. 34 164 比較例6 26.3 6. 30 1. 38 74 [註]Tv,r3v和r2v的值,是由前文定義的性質(5),(6), 和(7)的實測值,經由J〖S R 3 1 0 6定義的發光特性,加以 計算得到的。88116158.ptd Page 30 440704 ^ V. Description of invention ¢ 25) Table 3 Comparative Example Anti-reflective film multilayer structure and thickness of each layer (nm) Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Comparative Example 5 Comparative Example 6 Glass / Tit ^ / SiNx / Si02 21.5 41.3 40.2 Glass / SiNx / TiN Sky / SiNx / Si02 72.7 11.3 3.8 82.4 Glass / SiNx / TiNx / SiNx / TiNx / SiNx / Si02 24.9 2.1 19.8 2.1 124.2 116.1 Glass / NiFe / PrTi03 / NiFe / MgF2 1.3 39.6 3.4 110.7 Glass / Si02 / NiFe / Si02 / NiFe / Si02 / MgF2 ^ 0.2 2.9 92.4 3.0 29.5 95.8 Glass / Ti02 / NiFe / Ti02 / NiF6 / Ti02 / PrTi03 39.5 7.6 52.1 5.6 86, 3 67.6 Table 4 Comparative example Visible light transmittance Tv (%) Visible light reflectance r3v (%) Visible light reflectance r2v (%) at the interface Sheet resistance (Ω / D) Comparative example 1 37. 2 0.45 25.4 150 Comparative example 2 54. 3 4 .06 1. 43 320 Comparative Example 3 64. 2 1.56 1. 43 2100 Comparative Example 4 48. 3 4.98 2.10 101 Comparative Example 5 35. 8 1. 37 0. 34 164 Comparative Example 6 26.3 6. 30 1. 38 74 [Note] The values of Tv, r3v, and r2v are measured values of properties (5), (6), and (7) defined above, Calculated through the light emission characteristics defined by J 〖S R 3 1 0 6.

88116158.ptd 第31頁 44 07 0 五、發明說明(26) 本發明的光學製π 和低的反射tb . ® Γ纟見把圍内’具有高的吸收性質 含有基本的多層二儿積f玻t基板上的抗反射薄膜,包 光薄膜二C!的高折射率透明介電薄膜,第二吸 、 、有疋折射率的低折射率透明介電薄膜。 板;:―定折射率的高折射率透明介電薄膜介 於玻璃土板與第―吸光薄臈之間,和 膜與低折射率透明 乐一吸尤4 憨月介電薄膜之間。由於此結構,光線通過 11 土反,然後射在可透光基板和抗反射薄膜之間的界 面在界面上顯示低的反射比。所以,配置本發明的任 何-個光學製品在陰極射線管的顯示表面上,高對比的顯 示影像可以被得到,而不引起重影。 當此吸光薄膜個別為一種元件、或是二或多種元件混合 物的薄m’此元件是由鈦、鉻、錯、鉬、鐵、鈮、鈕、 铪、鎳、鎳-鐵合金和不鏽鋼所組成的金屬群中選擇出來 的;則有利於增強由陰極射線管所呈現顯示影像之對比的 吸光性質,可以被賦予至光學製品。除此之外’由於這些 吸光薄膜的導電性,其抗靜電性質和電磁遮蔽性質也可以 被賦予。 當此吸光薄膜個別為一種元件、或是二或多種元件混合 物的薄膜,此元件是由氮化鈦、氮化鉻、氮化錯、氮化 給、和氮化鈕所組成的金屬氮化物群中選擇出來的;則有 利於增強由陰極射線管所呈現顯示影像之對比的吸光性 質’可以被賦予至光學製品。除此之外,由於這些吸光薄88116158.ptd Page 31 44 07 0 V. Description of the invention (26) The optical system π and the low reflection tb of the present invention. ® Γ 纟 See the inside of the enclosure has high absorption properties and contains a basic multi-layered product f glass. The anti-reflection film on the substrate, the high-refractive-index transparent dielectric film including the light-emitting film C, and the second, low-refractive-index transparent dielectric film with a high refractive index. Plate: ― a high refractive index transparent dielectric film with a fixed refractive index is interposed between the glass clay plate and the first light-absorbing thin film, and a film with a low-refractive index transparent Leyi suction 4 dielectric film. Due to this structure, light passes through the 11th layer, and then strikes the interface between the light-transmissive substrate and the anti-reflection film, showing a low reflectance at the interface. Therefore, by arranging any optical product of the present invention on the display surface of a cathode ray tube, a high-contrast display image can be obtained without causing ghosting. When the light-absorbing film is a single component or a thin layer of two or more components, the component is composed of titanium, chromium, tungsten, molybdenum, iron, niobium, buttons, hafnium, nickel, nickel-iron alloy, and stainless steel. It is selected from the group of metals; it is conducive to enhancing the light absorption property of the contrast image displayed by the cathode ray tube, and can be imparted to the optical product. In addition to this, due to the conductivity of these light-absorbing films, antistatic properties and electromagnetic shielding properties can also be imparted. When the light-absorbing film is an element or a film of two or more elements, the element is a metal nitride group composed of titanium nitride, chromium nitride, nitride nitride, nitride nitride, and nitride button. It can be given to optical products, which can be used to enhance the contrast of the light-absorbing properties of the display image presented by the cathode-ray tube. In addition, because these light-absorbing thin

88'16l58.ptd 第32頁 4 4 07043 一 1 — — . 五、發明說明(27) 膜的導電性,其抗靜電性質和電磁遮蔽性質也可以被賦 〇 當用於本發明的訏透光基板以含有顏色成份的有色玻璃 所組成時,重影可以更有效地棟避免。 陰極射線管中的顯示區域以本發明的任何一個光學製品 覆蓋,並不會反射外在光線,而且可以呈現高對比的影 像,而不引起重影。 雖然本發明已經參照特定的具體例,作出詳細的描述; 熟悉本技藝者一定都知道’在不離開本發明之精神和範圍 内,可作各種變化和修改。88'16l58.ptd Page 32 4 4 07043 1 1 — — 5. Explanation of the invention (27) The conductivity of the film, its antistatic properties and electromagnetic shielding properties can also be assigned. When used in the present invention, the light transmission When the substrate is composed of colored glass containing color components, ghosting can be avoided more effectively. The display area in the cathode ray tube is covered with any of the optical products of the present invention, does not reflect external light, and can present a high-contrast image without causing ghosting. Although the present invention has been described in detail with reference to specific specific examples; those skilled in the art will all know that various changes and modifications can be made without departing from the spirit and scope of the invention.

88116158.ptd 第33頁88116158.ptd Page 33

Claims (1)

六、申請專利範圍 I 一種具有抗反射塗層的光學製品,其包含,折射率為 1.4到1.7的可透光基板、以及由重疊層組成的抗反射薄 膜’以下列順序在可透光基板上形成:一吸光薄骐為第一 層’一折射率1.6到2.4的透明介電薄膜為第二層,一吸光 薄膜為第三層,一折射率1.6到2.4的透明介電薄膜為第四 層,以及一折射率1. 3 5到1. 5的透明介電薄膜為第五層。 2.如申請專利範圍第1項之具有抗反射塗層的光學製 品’其中’分別作為第二和第四層的透明介電薄臈,個別 的厚度為30到80nm ’而作為第五層的透明介電薄膜的厚度 為60 到iOOnm 。 3. 如申請專利範圍第1項之具有抗反射塗層的光學製 品,其中’吸光薄膜個別為至少包含—種金屬的薄膜,該 金屬是由鈦、鉻、錯、鉬、鐵、銳、组、給、錄、鎳—鐵 合金和不鏽鋼所組成的群中選擇出來的。 4. 如申請專利範圍第3項之具有抗反射塗層的光學製 品’其中,吸光薄膜個別的厚度為5到丨8nm。 5. 如申請專利範圍第1項之具有抗反射塗層的光學製 品’其中’折射率1. 6到2 · 4的透明介電薄膜,至少一層為 氧化鉻的薄膜。 6·如申請專利範圍第1項之具有抗反射塗層的光學製 品’其中’吸光薄膜個別為至少包含一種金屬氮化物的薄 膜,該金屬氮化物是由氮化鈦、氮化鉻、氮化錯、氮化 銓、和氮化鈕所組成的群中選擇出來的。 7 如申請專利範圍第6項之具有抗反射塗層的光學製6. Patent application scope I An optical article with an anti-reflection coating, comprising a light-transmissive substrate with a refractive index of 1.4 to 1.7, and an anti-reflection film composed of overlapping layers on the light-transmissive substrate in the following order Formation: a light-absorbing thin film is the first layer; a transparent dielectric film with a refractive index of 1.6 to 2.4 is a second layer; a light-absorbing film is a third layer; a transparent dielectric film with a refractive index of 1.6 to 2.4 is a fourth layer , And a transparent dielectric film having a refractive index of 1.3 to 1.5 is a fifth layer. 2. The optical products with anti-reflection coatings in which the scope of the patent application is No. 1 'wherein' is a transparent dielectric thin layer of the second and fourth layers, respectively, with a thickness of 30 to 80 nm, and the fifth layer is The thickness of the transparent dielectric film is 60 to 100 nm. 3. For example, the optical products with anti-reflection coating in item 1 of the patent application scope, wherein the light-absorbing films are each a film containing at least one metal, which is composed of titanium, chromium, copper, molybdenum, iron, sharp, and , Feed, record, nickel-iron alloy and stainless steel. 4. For example, the optical product with an anti-reflection coating in item 3 of the patent application range, wherein the individual thickness of the light-absorbing film is 5 to 8 nm. 5. The optical product with an anti-reflection coating according to item 1 of the patent application, wherein the transparent dielectric film with a refractive index of 1.6 to 2.4 is at least one layer of a chromium oxide film. 6. If the optical product with anti-reflection coating in item 1 of the patent application 'wherein' the light-absorbing film is a film containing at least one metal nitride, the metal nitride is composed of titanium nitride, chromium nitride, nitride It is selected from the group consisting of wrong, hafnium nitride, and nitride button. 7 An optical system with an anti-reflection coating, such as the scope of patent application No. 6 第34頁 88116158,ptd 六、申請專利範圍 品’其中’吸光薄膜個別的厚度為3到6nm。 8. —種具有抗反射塗層的光學製品,其包含,折射率為 1 _ 4到1. 7的可透光基板、以及由重疊層組成的抗反射薄 膜,以下列順序在可透光基板上形成:一折射率丨.6到2. 4 的透明介電薄膜為第一層,一吸光薄膜為第二層,一折射 率1.6到2.4的透明介電薄膜為第三層,一吸光薄膜為第四 層,以及一折射率1.35到1·5的透明介電薄膜為第五層。 9. 如申請專利範圍第8項之具有抗反射塗層的光學製 品,其更進一步具有一折射率丨 6到2 · 4的透明介電薄膜作 為第六層,介於作為第四層的吸光薄膜與作為第五層的透 明介電薄膜之間。 10·如申請專利範圍第8項之具有抗反射塗層的光學製 品,其中,分別作為第一和第三層的透明介電薄膜之個別 的厚度為30到80nm,而作為第五層的透明介電薄膜 為60到100nm。 ' 又 Π.如申請專利範圍第9項之具有抗反射塗層的光學製 品,其中,作為第六層的透明介電薄膜的厚度不 100nm 。 1 2.如申請專利範圍第8項之具有抗反射塗層的光學製 品,其中,吸光薄膜個別為至少包含—種金屬的薄膜,該 金屬是由鈦、鉻、锆、鉬、鐵、鈮、钽、铪、鎳、鎳_鐵〆 合金和不鏽鋼所組成的群中選擇出來的。 、 1 3.如申請專利範圍第1 2項之具有抗反射塗層的光 品,其中’吸光薄膜個別的厚度為3到6ηπι。 、Page 34 88116158, ptd 6. Scope of Patent Application Product ‘Where’ the individual light absorbing film is 3 to 6 nm thick. 8. An optical article having an anti-reflection coating, comprising a light-transmissive substrate having a refractive index of 1 to 4 and 1.7, and an anti-reflection film composed of an overlapping layer, and the light-transmissive substrate is formed in the following order: Formed on: a transparent dielectric film with a refractive index of .6 to 2.4 is the first layer, a light absorbing film is the second layer, a transparent dielectric film with a refractive index of 1.6 to 2.4 is the third layer, and a light absorbing film It is the fourth layer, and a transparent dielectric film with a refractive index of 1.35 to 1.5 is the fifth layer. 9. For example, an optical article with an anti-reflection coating according to item 8 of the scope of patent application, which further has a transparent dielectric film having a refractive index of 6 to 2.4 as the sixth layer, which is interposed between light absorption as the fourth layer Between the film and the transparent dielectric film as the fifth layer. 10. The optical article with an anti-reflection coating according to item 8 of the scope of patent application, wherein the individual thicknesses of the transparent dielectric films as the first and third layers are 30 to 80 nm, respectively, and the fifth layer is transparent as the transparent layer. The dielectric film is 60 to 100 nm. 'And Π. The optical product with an anti-reflection coating according to item 9 of the scope of patent application, wherein the thickness of the transparent dielectric film as the sixth layer is not 100 nm. 1 2. The optical article with an anti-reflection coating according to item 8 of the scope of patent application, wherein each of the light-absorbing films is a film containing at least one metal, which is made of titanium, chromium, zirconium, molybdenum, iron, niobium, Selected from the group consisting of tantalum, hafnium, nickel, nickel-iron hafnium alloy and stainless steel. 1) According to claim 12 of the scope of patent application, a light product with an anti-reflection coating, wherein the individual thickness of the light-absorbing film is 3 to 6ηm. , 。1,4.如申請專利範圍第〗2項之具有抗反射塗層的光學製 °° 、中’折射率i.6到2.4的透明介電薄膜,至少一層為 氧化鉻的薄膜。 1 5.如申請專利範圍第8項之具有抗反射塗層的光學製 品’其中’吸光薄膜個別為至少包含—種金屬氮化物的薄 膜,該金屬氮化物是由氮化鈦、氮化鉻' 氮化鍅、氮化 給、和氮化钽所組成的群中選擇出來的。 16.如申請專利範圍第15項之具有抗反射塗層的光學製 品’其中’吸光薄膜個別的厚度為5到〗δ麗。 17·如申請專利範圍第1或8項之具有抗反射塗層的光學 製品,其中’可透光基板是一種玻璃基板。 予 1 8.如申請專利範圍第1 7項之具有抗反射塗層的光學 品,其中,可透光基板是用於陰極射線管之玻螭製 19.如申請專利範圍第Π項之具有抗反射塗層的光幾° 品’其中,可透光的玻璃基板包含一種有色的成分 ^ 具有吸光的性質。 因而 2 0. —種陰極射線管,其係使用如申請專利範圍第 項之具有抗反射塗層的光學製品。 或8. 1, 4. The transparent dielectric thin film with an anti-reflection coating and an intermediate refractive index i. 6 to 2.4 according to item 2 of the patent application scope, at least one of which is a chromium oxide film. 1 5. The optical article with an anti-reflection coating according to item 8 of the scope of the patent application, wherein the light absorbing film is a film containing at least one metal nitride, and the metal nitride is composed of titanium nitride and chromium nitride. Hafnium nitride, nitride nitride, and tantalum nitride are selected from the group consisting of: 16. The optical product with an anti-reflection coating according to item 15 of the scope of patent application, wherein the thickness of each of the light-absorbing films is 5 to δ δ. 17. An optical article having an anti-reflection coating as claimed in item 1 or 8 of the patent application scope, wherein the 'light-transmissive substrate is a glass substrate. 8. The optical article with an anti-reflection coating according to item 17 of the scope of patent application, wherein the light-transmittable substrate is made of glass for a cathode ray tube. A few degrees of light of the reflective coating. Among them, the light-transmitting glass substrate contains a colored component ^ which has the property of absorbing light. Therefore, 20. A type of cathode ray tube, which uses an optical article having an anti-reflection coating as described in the scope of patent application. Or 8 88116158.ptd 第36頁88116158.ptd Page 36
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