TW362170B - Method for tuning an attenuating phase shift mask - Google Patents
Method for tuning an attenuating phase shift maskInfo
- Publication number
- TW362170B TW362170B TW087117056A TW87117056A TW362170B TW 362170 B TW362170 B TW 362170B TW 087117056 A TW087117056 A TW 087117056A TW 87117056 A TW87117056 A TW 87117056A TW 362170 B TW362170 B TW 362170B
- Authority
- TW
- Taiwan
- Prior art keywords
- phase shift
- tuning
- shift mask
- phase
- attenuating phase
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The present invention provides a method and an apparatus for tuning the phase shifting of a phase shift mask having an attenuating phase shifting material providing at least 160 degree of phase shift the method comprising the utilization of a phase measurement and etch operation which reduces the challenge of making an exacting 180 degree phase shifting mask. An attenuated phase shift mask structure is also disclosed in the present invention.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US94991697A | 1997-10-14 | 1997-10-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW362170B true TW362170B (en) | 1999-06-21 |
Family
ID=57940782
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW087117056A TW362170B (en) | 1997-10-14 | 1998-10-14 | Method for tuning an attenuating phase shift mask |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR100277006B1 (en) |
TW (1) | TW362170B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101140301B1 (en) * | 2009-09-21 | 2012-05-02 | 오토코리아 주식회사 | Processing apparatus |
-
1998
- 1998-10-14 KR KR1019980042996A patent/KR100277006B1/en not_active IP Right Cessation
- 1998-10-14 TW TW087117056A patent/TW362170B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100277006B1 (en) | 2001-01-15 |
KR19990037084A (en) | 1999-05-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |