TW335448B - Gas flow control method - Google Patents

Gas flow control method

Info

Publication number
TW335448B
TW335448B TW085109913A TW85109913A TW335448B TW 335448 B TW335448 B TW 335448B TW 085109913 A TW085109913 A TW 085109913A TW 85109913 A TW85109913 A TW 85109913A TW 335448 B TW335448 B TW 335448B
Authority
TW
Taiwan
Prior art keywords
gas
cavity
control method
gas flow
flow control
Prior art date
Application number
TW085109913A
Other languages
Chinese (zh)
Inventor
M Manofsky William Jr
M Kaczorowski Edward
E Wilmer Michael
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of TW335448B publication Critical patent/TW335448B/en

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F11/00—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it
    • G01F11/28—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with stationary measuring chambers having constant volume during measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Chemical Vapour Deposition (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Flow Control (AREA)
  • Output Control And Ontrol Of Special Type Engine (AREA)

Abstract

A method for injecting a specific mass of gas to a point-of-use location, including the following steps: filling with a gas a cavity in one embodiment in a known volume; measuring the pressure and temperature of the gas in the cavity; and releasing during a programmed period specific property of gas into the treatmetn chamber based on the pressure and temperature values adjusted at the transmission rate of the valve in the downstream of the cavity.
TW085109913A 1996-03-11 1996-08-14 Gas flow control method TW335448B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US61079196A 1996-03-11 1996-03-11

Publications (1)

Publication Number Publication Date
TW335448B true TW335448B (en) 1998-07-01

Family

ID=24446433

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085109913A TW335448B (en) 1996-03-11 1996-08-14 Gas flow control method

Country Status (3)

Country Link
AU (1) AU2322797A (en)
TW (1) TW335448B (en)
WO (1) WO1997034208A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI414763B (en) * 2006-03-07 2013-11-11 Ckd Corp Gas flow calibration device

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6363958B1 (en) 1999-05-10 2002-04-02 Parker-Hannifin Corporation Flow control of process gas in semiconductor manufacturing
US6119710A (en) * 1999-05-26 2000-09-19 Cyber Instrument Technologies Llc Method for wide range gas flow system with real time flow measurement and correction
GB2373054B (en) * 1999-05-26 2003-03-26 Cyber Instr Technology Llc Wide range gas flow system with real time flow measurement and correction
US6777352B2 (en) 2002-02-11 2004-08-17 Applied Materials, Inc. Variable flow deposition apparatus and method in semiconductor substrate processing
CN112269415B (en) * 2020-09-30 2022-12-16 深圳永晟中业达健康科技有限公司 Low-pressure cabin control method and device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4394871A (en) * 1980-12-31 1983-07-26 The Boeing Company Programmable pressure regulator for titanium superplastic forming apparatus
US5152309A (en) * 1991-05-29 1992-10-06 Westinghouse Electric Corp. Valve control apparatus
US5146941A (en) * 1991-09-12 1992-09-15 Unitech Development Corp. High turndown mass flow control system for regulating gas flow to a variable pressure system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI414763B (en) * 2006-03-07 2013-11-11 Ckd Corp Gas flow calibration device

Also Published As

Publication number Publication date
WO1997034208A1 (en) 1997-09-18
AU2322797A (en) 1997-10-01

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