TW288154B - - Google Patents

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Publication number
TW288154B
TW288154B TW084109349A TW84109349A TW288154B TW 288154 B TW288154 B TW 288154B TW 084109349 A TW084109349 A TW 084109349A TW 84109349 A TW84109349 A TW 84109349A TW 288154 B TW288154 B TW 288154B
Authority
TW
Taiwan
Application number
TW084109349A
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of TW288154B publication Critical patent/TW288154B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G03F7/70441—Optical proximity correction [OPC]
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T9/00—Image coding
    • G06T9/004—Predictors, e.g. intraframe, interframe coding

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW084109349A 1994-09-16 1995-09-07 TW288154B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP22195694 1994-09-16
JP4025595 1995-02-28
JP20483795A JPH08297692A (ja) 1994-09-16 1995-08-10 光近接補正装置及び方法並びにパタン形成方法

Publications (1)

Publication Number Publication Date
TW288154B true TW288154B (zh) 1996-10-11

Family

ID=27290415

Family Applications (1)

Application Number Title Priority Date Filing Date
TW084109349A TW288154B (zh) 1994-09-16 1995-09-07

Country Status (5)

Country Link
US (2) US5815685A (zh)
JP (1) JPH08297692A (zh)
KR (1) KR0156792B1 (zh)
DE (1) DE19534132B4 (zh)
TW (1) TW288154B (zh)

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DE19534132A1 (de) 1996-04-11
DE19534132B4 (de) 2005-06-09
US20010053964A1 (en) 2001-12-20
KR960011567A (ko) 1996-04-20
US6453274B2 (en) 2002-09-17
KR0156792B1 (ko) 1998-11-16
US5815685A (en) 1998-09-29
JPH08297692A (ja) 1996-11-12

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