TW275671B - Manufacturing method for half-tone phase shifting mask - Google Patents

Manufacturing method for half-tone phase shifting mask

Info

Publication number
TW275671B
TW275671B TW83110648A TW83110648A TW275671B TW 275671 B TW275671 B TW 275671B TW 83110648 A TW83110648 A TW 83110648A TW 83110648 A TW83110648 A TW 83110648A TW 275671 B TW275671 B TW 275671B
Authority
TW
Taiwan
Prior art keywords
tone phase
manufacturing
layer
phase shifting
shifting mask
Prior art date
Application number
TW83110648A
Other languages
Chinese (zh)
Inventor
Ming-Jong Yang
Horng-Syh Pan
Horng-Tay Ueng
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW83110648A priority Critical patent/TW275671B/en
Application granted granted Critical
Publication of TW275671B publication Critical patent/TW275671B/en

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

A manufacturing method for half-tone phase shifting mask, suitable for a transparent base board, mainly comprising the following procedure: to form a half-tone phase shifter on the transparent base board, then an opaque layer on the half-tone phase shifter, and finally a shielded layer of the desired pattern design on the opaque layer; using the shielded layer as a mask screen, to perform isotropic etching on the opaque layer, and over-etching on the edges of the opaque layer; using the shielded layer as a mask screen, to perform anisotropic etching on the half-tone phase shifter, and to end the manufactuirng process by removing the shielded layer.
TW83110648A 1994-11-16 1994-11-16 Manufacturing method for half-tone phase shifting mask TW275671B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW83110648A TW275671B (en) 1994-11-16 1994-11-16 Manufacturing method for half-tone phase shifting mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW83110648A TW275671B (en) 1994-11-16 1994-11-16 Manufacturing method for half-tone phase shifting mask

Publications (1)

Publication Number Publication Date
TW275671B true TW275671B (en) 1996-05-11

Family

ID=51397305

Family Applications (1)

Application Number Title Priority Date Filing Date
TW83110648A TW275671B (en) 1994-11-16 1994-11-16 Manufacturing method for half-tone phase shifting mask

Country Status (1)

Country Link
TW (1) TW275671B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI718249B (en) * 2016-02-15 2021-02-11 日商關東化學股份有限公司 An etching solution and method for manufacturing gradation mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI718249B (en) * 2016-02-15 2021-02-11 日商關東化學股份有限公司 An etching solution and method for manufacturing gradation mask

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