TW275671B - Manufacturing method for half-tone phase shifting mask - Google Patents
Manufacturing method for half-tone phase shifting maskInfo
- Publication number
- TW275671B TW275671B TW83110648A TW83110648A TW275671B TW 275671 B TW275671 B TW 275671B TW 83110648 A TW83110648 A TW 83110648A TW 83110648 A TW83110648 A TW 83110648A TW 275671 B TW275671 B TW 275671B
- Authority
- TW
- Taiwan
- Prior art keywords
- tone phase
- manufacturing
- layer
- phase shifting
- shifting mask
- Prior art date
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
A manufacturing method for half-tone phase shifting mask, suitable for a transparent base board, mainly comprising the following procedure: to form a half-tone phase shifter on the transparent base board, then an opaque layer on the half-tone phase shifter, and finally a shielded layer of the desired pattern design on the opaque layer; using the shielded layer as a mask screen, to perform isotropic etching on the opaque layer, and over-etching on the edges of the opaque layer; using the shielded layer as a mask screen, to perform anisotropic etching on the half-tone phase shifter, and to end the manufactuirng process by removing the shielded layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW83110648A TW275671B (en) | 1994-11-16 | 1994-11-16 | Manufacturing method for half-tone phase shifting mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW83110648A TW275671B (en) | 1994-11-16 | 1994-11-16 | Manufacturing method for half-tone phase shifting mask |
Publications (1)
Publication Number | Publication Date |
---|---|
TW275671B true TW275671B (en) | 1996-05-11 |
Family
ID=51397305
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW83110648A TW275671B (en) | 1994-11-16 | 1994-11-16 | Manufacturing method for half-tone phase shifting mask |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW275671B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI718249B (en) * | 2016-02-15 | 2021-02-11 | 日商關東化學股份有限公司 | An etching solution and method for manufacturing gradation mask |
-
1994
- 1994-11-16 TW TW83110648A patent/TW275671B/en active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI718249B (en) * | 2016-02-15 | 2021-02-11 | 日商關東化學股份有限公司 | An etching solution and method for manufacturing gradation mask |
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