TW202234046A - Detection device and method thereof - Google Patents

Detection device and method thereof Download PDF

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TW202234046A
TW202234046A TW111117084A TW111117084A TW202234046A TW 202234046 A TW202234046 A TW 202234046A TW 111117084 A TW111117084 A TW 111117084A TW 111117084 A TW111117084 A TW 111117084A TW 202234046 A TW202234046 A TW 202234046A
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filter
thin film
light
reflective
optical thin
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TWI839728B (en
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謝一帆
陳宥霖
張耀宗
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緯創資通股份有限公司
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Abstract

A detection device including a light-emitting component, a light-detecting component, at least one reflective optical thin film element and a control unit is provided. The light-emitting component is used for providing an excitation light beam, wherein a part of the excitation beam whose dominant wavelength falls within a excitation wavelength band forms a fluorescence beam after passing through the object to be detected. The light-detecting component is used for receiving a part of the fluorescence beam whose dominant wavelength falls within a detection wavelength band. The control unit is coupled to the at least one reflective optical thin film element. The control unit controls the at least one reflective optical thin film element to filter out a part of a wavelength range of the incident light beam, and the incident beam is at least one of the excitation beam and the fluorescence beam. A method thereof is also provided.

Description

檢測裝置與檢測方法Detection device and detection method

本發明為申請號109115198號的分割案。本發明是有關於一種檢測裝置與檢測方法,且特別是有關於一種光致螢光應用的檢測裝置與檢測方法。The present invention is a division case of Application No. 109115198. The present invention relates to a detection device and detection method, and in particular, to a detection device and detection method for photoluminescence applications.

現有的螢光即時定量聚合酶連鎖反應(real-time polymerase chain reaction / quantitative polymerase chain reaction, real-time PCR/qPCR)應用的檢測技術主要包含溫控部分、檢測部份及分析部份。在溫控部分,是利用溫度控制裝置產生所需要的熱循環,而使得待測物中檢測對象的量於每次熱循環後倍增,並可於經過N次熱循環後待測物的量變成2的N次方倍。在檢測部份,是利用主發光波長落於特定波段範圍內的激發光束在照射待測物後產生主發光波長落於另一特定波段範圍內的螢光光束,再用光檢測元件接收此螢光光束,並對此螢光光束的特性進行檢測。在分析部份,是利用分析軟體即時地監測整個聚合酶連鎖反應的溫度變化與螢光變化,對待測物作量化分析。Existing detection technologies applied in real-time polymerase chain reaction / quantitative polymerase chain reaction (real-time PCR/qPCR) mainly include a temperature control part, a detection part and an analysis part. In the temperature control part, the temperature control device is used to generate the required thermal cycle, so that the amount of the object to be tested is multiplied after each thermal cycle, and the amount of the object to be tested can be changed after N thermal cycles. 2 times the N power. In the detection part, the excitation beam with the main emission wavelength falling within a specific wavelength range is used to generate a fluorescent light beam with the main emission wavelength falling within another specific wavelength range after irradiating the object to be tested, and then the light detection element is used to receive the fluorescent light beam. light beam, and the characteristics of this fluorescent beam are detected. In the analysis part, the analysis software is used to monitor the temperature change and fluorescence change of the entire polymerase chain reaction in real time, and quantitatively analyze the object to be tested.

一般而言,由於市面上用於添加在待測物中的螢光試劑有許多種,而每種螢光試劑都有其相對較適合的激發光譜,因此需根據螢光試劑的種類而在激發光束通過待測物前的光路上設置適合的帶通濾鏡(帶通濾光片,optical bandpass filter),以於照射到待測物中的螢光試劑時有效形成所需的螢光光束,其中,帶通濾鏡(帶通濾光片)是一種可讓某一段波長的光線透過並且不讓其他波長的光線透過之濾光片。並且,由於螢光光束的訊號一般而言相當微弱,容易被其他雜訊光的訊號掩蓋,因此在光檢測元件接收此另一特定波段範圍內的螢光光束前的光路上,通常也會設有具一或數片帶通濾鏡的濾光模組以濾除此另一特定波段範圍外的雜訊光的訊號並純化螢光光束的特性。為了確保檢測精度,許多帶通濾鏡(Band pass filter)的OD值皆被要求須達到OD6等級,即通過各帶通濾鏡的截止波段的光線通過率須小於等於10的負6次方。Generally speaking, since there are many kinds of fluorescent reagents used to be added to the analyte in the market, and each fluorescent reagent has its relatively suitable excitation spectrum, it is necessary to select the excitation spectrum according to the type of fluorescent reagent. A suitable bandpass filter (optical bandpass filter) is set on the optical path before the light beam passes through the object to be tested, so as to effectively form the required fluorescent light beam when irradiating the fluorescent reagent in the object to be tested, Among them, a band-pass filter (band-pass filter) is a filter that allows light of a certain wavelength to pass through and does not allow light of other wavelengths to pass through. In addition, since the signal of the fluorescent light beam is generally quite weak and easily concealed by the signal of other noise light, the optical path before the light detection element receives the fluorescent light beam in another specific wavelength range is usually also set. There is a filter module with one or several band-pass filters to filter out the signal of the noise light outside the other specific wavelength range and purify the characteristics of the fluorescent light beam. In order to ensure the detection accuracy, the OD value of many band pass filters is required to reach the OD6 level, that is, the light transmission rate passing through the cut-off band of each band pass filter must be less than or equal to 10 to the negative 6th power.

另一方面,市面上現有的檢測裝置,當需檢測搭配多種不同螢光試劑的待測物時,就會設置多種螢光通道(即自光源、激發光束產生、至待測物形成螢光光束、一直到光檢測元件前後的整體光路徑)來對應多種不同螢光試劑的需求,並需在各螢光通道上設置包含多個具有不同帶通濾鏡的不同濾光模組,以符合形成具有適合的激發光譜的激發光束以及純化螢光光束特性的需求。On the other hand, when the existing detection devices on the market need to detect the analyte with a variety of different fluorescent reagents, a variety of fluorescent channels (ie, from the light source, the excitation beam is generated, to the analyte to form a fluorescent beam) , up to the overall light path before and after the photodetection element) to meet the needs of a variety of different fluorescent reagents, and it is necessary to set up multiple different filter modules with different bandpass filters on each fluorescent channel to meet the formation of Excitation beams with suitable excitation spectra and requirements for purification of fluorescence beam properties.

如此一來,依據現有技術,當一檢測裝置被設計成可以同時檢測多種不同螢光試劑的待測物而使得螢光通道的數量增加時,所需的帶通濾鏡的數量也必須增加,進而大幅增加產品成本。並且,當檢測裝置設置多種螢光通道時,隨著設置的光路系統複雜化,裝置空間也會因此難以縮小而相對較為龐大,且組裝複雜性高亦增加組裝與維修的成本。此外,一旦待測物中的螢光試劑更換或需增加一種新的螢光試劑時,位於螢光通道上的激發光束的光源以及所有的帶通濾鏡都須對應替換或增加,故而不易進行設備更新,更無法進行功能擴充。In this way, according to the prior art, when a detection device is designed to simultaneously detect a variety of different fluorescent reagents to be tested, so that the number of fluorescent channels increases, the number of required bandpass filters must also increase, This will greatly increase the cost of the product. In addition, when the detection device is provided with various fluorescent channels, with the complicated optical path system, the device space is difficult to be reduced and relatively large, and the high assembly complexity also increases the cost of assembly and maintenance. In addition, once the fluorescent reagent in the test object is replaced or a new fluorescent reagent needs to be added, the light source of the excitation beam on the fluorescent channel and all the bandpass filters must be replaced or added accordingly, so it is not easy to carry out The equipment is updated, and the function expansion cannot be carried out.

本發明提供一種檢測裝置、檢測方法以及螢光即時定量聚合酶連鎖反應系統,其具有良好的檢測精度以及低廉的成本。The invention provides a detection device, a detection method and a fluorescent real-time quantitative polymerase chain reaction system, which have good detection accuracy and low cost.

本發明的一種檢測裝置,包括一發光元件、一光檢測元件、至少一反射式光學薄膜元件以及一控制單元。至少一反射式光學薄膜元件係設置於發光元件與光檢測元件間之螢光通道上。控制單元與至少一反射式光學薄膜元件耦接,用以控制一至少一反射式光學薄膜元件的反射光線的波段範圍。A detection device of the present invention includes a light-emitting element, a light detection element, at least one reflective optical thin film element and a control unit. At least one reflective optical thin film element is disposed on the fluorescent channel between the light-emitting element and the light-detecting element. The control unit is coupled to the at least one reflective optical thin film element for controlling the wavelength range of the reflected light of the at least one reflective optical thin film element.

在本發明的一實施例中,上述的至少一反射式光學薄膜元件每一者包括一或多個反射式濾光單元。In an embodiment of the present invention, each of the above-mentioned at least one reflective optical thin film element includes one or more reflective filter units.

在本發明的一實施例中,上述的一或多個反射式濾光單元係為一微機電系統反射式濾光單元。In an embodiment of the present invention, the above-mentioned one or more reflective filter units are a MEMS reflective filter unit.

在本發明的一實施例中,上述的一或多個反射式濾光單元各具有一共振腔,且共振腔係具有一深度距離,深度距離係用以決定被反射式濾光單元所反射之光線之主發光波長的波段範圍。In an embodiment of the present invention, each of the above-mentioned one or more reflective filter units has a resonant cavity, and the resonant cavity has a depth distance, and the depth distance is used to determine the amount of light reflected by the reflective filter unit. The band range of the main emission wavelength of light.

在本發明的一實施例中,上述的至少一反射式光學薄膜元件包括一第一反射式光學薄膜元件,且共振腔的深度距離為第一深度距離的一或多個反射式濾光單元係設置於第一反射式光學薄膜元件上,用以產生並反射主發光波長落於激發波段範圍內且與第一深度距離相對應的出射光束。In an embodiment of the present invention, the above-mentioned at least one reflective optical thin film element includes a first reflective optical thin film element, and one or more reflective optical filter units whose depth distance of the resonant cavity is the first depth distance It is arranged on the first reflective optical thin film element, and is used to generate and reflect the outgoing light beam whose main emission wavelength falls within the excitation wavelength range and corresponds to the first depth distance.

在本發明的一實施例中,上述的至少一反射式光學薄膜元件包括一第二反射式光學薄膜元件,且共振腔的深度距離為第二深度距離的一或多個反射式濾光單元設置於第二反射式光學薄膜元件上,用以產生並反射主發光波長落於檢測波段範圍內且與第二深度距離相對應的出射光束。In an embodiment of the present invention, the above-mentioned at least one reflective optical thin-film element includes a second reflective optical thin-film element, and one or more reflective filter units whose depth distance of the resonant cavity is the second depth distance are provided The second reflective optical thin film element is used to generate and reflect the outgoing light beam whose main emission wavelength falls within the detection wavelength range and corresponds to the second depth distance.

在本發明的一實施例中,上述的至少一光學薄膜元件包括一或多個濾光區域,各一或多個濾光區域包含一或多個反射式濾光單元,且位於相同濾光區域的一或多個反射式濾光單元的共振腔的作動深度距離彼此相同,位於不同濾光區域的一或多個反射式濾光單元的共振腔的作動深度距離彼此不同。In an embodiment of the present invention, the above-mentioned at least one optical thin film element includes one or more filter regions, and each of the one or more filter regions includes one or more reflective filter units and is located in the same filter region The actuation depth distances of the resonant cavities of the one or more reflective filter units are the same as each other, and the actuation depth distances of the resonator cavities of the one or more reflective filter units located in different filter regions are different from each other.

在本發明的一實施例中,上述的一或多個濾光區域包括一第一濾光區域,且位於第一濾光區域的反射式濾光單元用於反射主發光波長落於一激發波段範圍的光線。In an embodiment of the present invention, the above-mentioned one or more filter regions include a first filter region, and the reflective filter unit located in the first filter region is used to reflect that the main emission wavelength falls within an excitation wavelength band range of light.

在本發明的一實施例中,上述的一或多個濾光區域包括一第二濾光區域,且位於第二濾光區域的反射式濾光單元的反射光線受到控制單元的控制而落於一檢測波段範圍。In an embodiment of the present invention, the above-mentioned one or more filter regions include a second filter region, and the reflected light of the reflective filter unit located in the second filter region is controlled by the control unit to fall within the A detection band range.

在本發明的一實施例中,上述的檢測裝置還包括一容置框架,用以容置一待測物,且容置框架具有一開口,用以接收主發光波長落於激發波段範圍內的部分激發光束。In an embodiment of the present invention, the above-mentioned detection device further includes an accommodating frame for accommodating an object to be tested, and the accommodating frame has an opening for receiving the main emission wavelength falling within the excitation wavelength range. Part of the excitation beam.

本發明的一種檢測方法,適用於一檢測裝置,檢測裝置包括一發光元件、一光檢測元件、一控制單元以及至少一反射式光學薄膜元件,其中反射式光學薄膜元件係設置於發光元件與光檢測元件間之螢光通道上,且檢測方法包括下列步驟。利用發光元件提供激發光束,其中激發光束係用以在照射一待測物後產生一螢光光束。利用光檢測元件接收螢光光束。利用至少一反射式光學薄膜元件用以濾除入射光束的部分波段範圍,且入射光束為激發光束與螢光光束的其中一者。利用控制單元控制反射式光學薄膜元件,以反射所設定波段範圍之光線。A detection method of the present invention is suitable for a detection device. The detection device includes a light-emitting element, a light detection element, a control unit, and at least one reflective optical thin film element, wherein the reflective optical thin film element is disposed between the light-emitting element and the light-emitting element. On the fluorescent channel between the detection elements, and the detection method includes the following steps. A light-emitting element is used to provide an excitation beam, wherein the excitation beam is used to generate a fluorescent beam after irradiating an object to be tested. The fluorescent light beam is received by the photodetecting element. At least one reflective optical thin film element is used to filter out part of the wavelength range of the incident light beam, and the incident light beam is one of the excitation light beam and the fluorescent light beam. The reflective optical thin film element is controlled by the control unit to reflect the light in the set wavelength range.

在本發明的一實施例中,上述的至少一反射式光學薄膜元件包括一或多個反射式濾光單元,且其中利用至少一反射式光學薄膜元件用以濾除入射光束的部分波段範圍,係利用控制單元來控制一或多個反射式濾光單元以濾除入射光束的部分波段範圍。In an embodiment of the present invention, the above-mentioned at least one reflective optical thin film element includes one or more reflective optical filter units, and the at least one reflective optical thin film element is used to filter part of the wavelength range of the incident light beam, The control unit is used to control one or more reflective filter units to filter out part of the wavelength range of the incident light beam.

在本發明的一實施例中,上述的一或多個反射式濾光單元係為一微機電系統反射式濾光單元,且其中利用控制單元係控制一或多個反射式濾光單元以濾除入射光束的部分波段範圍,係利用控制單元來控制微機電系統反射式濾光單元以濾除入射光束的部分波段範圍。In an embodiment of the present invention, the above-mentioned one or more reflective filter units are MEMS reflective filter units, and the control unit controls the one or more reflective filter units to filter In addition to the partial wavelength range of the incident light beam, the control unit is used to control the MEMS reflective filter unit to filter out the partial wavelength range of the incident light beam.

在本發明的一實施例中,上述的反射式濾光單元具有一共振腔,且控制單元係控制共振腔的深度距離,以反射主發光波長與深度距離對應的光線。In an embodiment of the present invention, the above-mentioned reflective filter unit has a resonant cavity, and the control unit controls the depth distance of the resonant cavity to reflect the light corresponding to the main emission wavelength and the depth distance.

在本發明的一實施例中,上述的檢測方法,其中當發光元件提供的一激發光束入射至少一反射式光學薄膜元件時,控制單元控制激發光束照射的一或多個反射式濾光單元的至少一共振腔的深度距離為第一深度距離,以使經由至少一反射式光學薄膜元件反射的激發光束的主發光波長落於激發波段範圍內且與第一深度距離相對應。In an embodiment of the present invention, in the above-mentioned detection method, when an excitation beam provided by the light-emitting element enters at least one reflective optical thin film element, the control unit controls one or more reflective filter units illuminated by the excitation beam. The depth distance of the at least one resonant cavity is the first depth distance, so that the main emission wavelength of the excitation beam reflected by the at least one reflective optical thin film element falls within the excitation wavelength range and corresponds to the first depth distance.

在本發明的一實施例中,上述的當一螢光光束入射至少一反射式光學薄膜元件時,控制單元控制螢光光束照射的一或多個反射式濾光單元的至少一共振腔的深度距離為第二深度距離,以使經由至少一反射式光學薄膜元件反射的螢光光束的主發光波長落於檢測波段範圍內且與第二深度距離相對應。In an embodiment of the present invention, when a fluorescent beam is incident on at least one reflective optical thin film element, the control unit controls the depth of at least one resonant cavity of one or more reflective filter units illuminated by the fluorescent beam The distance is the second depth distance, so that the main emission wavelength of the fluorescent light beam reflected by the at least one reflective optical thin film element falls within the detection wavelength range and corresponds to the second depth distance.

在本發明的一實施例中,上述的檢測方法,更包括在至少一光學薄膜元件上提供一或多個濾光區域,各一或多個濾光區域包含一或多個反射式濾光單元,且位於相同濾光區域的一或多個反射式濾光單元的共振腔的作動深度距離彼此相同,位於不同濾光區域的一或多個反射式濾光單元的共振腔的作動深度距離彼此不同。In an embodiment of the present invention, the above-mentioned detection method further includes providing one or more filter regions on at least one optical thin film element, and each one or more filter regions includes one or more reflective filter units , and the operating depth distances of the resonant cavities of one or more reflective filter units located in the same filter area are the same as each other, and the operating depth distances of the resonant cavities of one or more reflective filter units located in different filter areas are mutually different.

在本發明的一實施例中,上述的一或多個濾光區域包括第一濾光區域,且更包括以下之步驟:利用控制單元控制位於第一濾光區域的反射式濾光單元而使得反射光線而落於一激發波段範圍。In an embodiment of the present invention, the above-mentioned one or more filter regions include a first filter region, and further includes the following step: using the control unit to control the reflective filter unit located in the first filter region to make The reflected light falls within an excitation wavelength range.

在本發明的一實施例中,上述的多個濾光區域包括一第二濾光區域,且更包括以下之步驟:利用控制單元控制位於第二濾光區域的反射式濾光單元而使得反射光線而落於一檢測波段範圍。In an embodiment of the present invention, the above-mentioned filter regions include a second filter region, and further includes the following step: using the control unit to control the reflective filter unit located in the second filter region to cause reflection The light falls within a detection band range.

在本發明的一實施例中,上述的檢測裝置還包括容置框架,用以容置待測物,且容置框架具有一開口,且更包括以下之步驟:利用開口形成光路而構成一螢光通道。In an embodiment of the present invention, the above-mentioned detection device further includes an accommodating frame for accommodating the object to be tested, and the accommodating frame has an opening, and further includes the following steps: using the opening to form an optical path to form a fluorescent light channel.

本發明的一種螢光即時定量聚合酶連鎖反應系統,包括: 一上述的檢測裝置,一溫控模組及一分析模組,溫控模組係用以控制系統之一溫度,且具有一加熱模組。分析模組係用以分析來自光檢測元件之一訊號。 A fluorescent real-time quantitative polymerase chain reaction system of the present invention includes: The above detection device, a temperature control module and an analysis module, the temperature control module is used to control a temperature of the system and has a heating module. The analysis module is used for analyzing a signal from the light detection element.

在本發明的一實施例中,上述的至少一反射式光學薄膜元件,包括一第一反射式光學薄膜元件用以反射主發光波長落於激發波段範圍的出射光束及包括一第二反射式光學薄膜元件用以反射主發光波長落於檢測波段範圍的出射光束。In an embodiment of the present invention, the above-mentioned at least one reflective optical thin film element includes a first reflective optical thin film element for reflecting the outgoing light beam whose main emission wavelength falls within the excitation wavelength range and a second reflective optical thin film element The thin film element is used to reflect the outgoing light beam whose main emission wavelength falls within the detection band range.

在本發明的一實施例中,上述的至少一反射式光學薄膜元件每一者包括一或多個反射式濾光單元,其中一或多個反射式濾光單元各具有一共振腔,且共振腔係具有一深度距離,深度距離係用以決定被反射式濾光單元所反射之光線之主發光波長的波段範圍。In an embodiment of the present invention, each of the above-mentioned at least one reflective optical thin film element includes one or more reflective filter units, wherein each of the one or more reflective filter units has a resonant cavity and resonates The cavity has a depth distance, and the depth distance is used to determine the wavelength band range of the main emission wavelength of the light reflected by the reflective filter unit.

在本發明的一實施例中,上述的檢測裝置還包括一容置框架,用以容置一待測物,且容置框架具有一開口,用以接收主發光波長落於激發波段範圍內的部分激發光束。In an embodiment of the present invention, the above-mentioned detection device further includes an accommodating frame for accommodating an object to be tested, and the accommodating frame has an opening for receiving the main emission wavelength falling within the excitation wavelength range. Part of the excitation beam.

在本發明的一實施例中,上述的溫控模組更具有一溫度感測器與一散熱模組。In an embodiment of the present invention, the above-mentioned temperature control module further has a temperature sensor and a heat dissipation module.

基於上述,本發明的檢測裝置與檢測方法,係藉由至少一反射式光學薄膜元件的配置來進行螢光檢測。依據本發明之一實施例,只需設置至少一反射式光學薄膜元件,不需設置由帶通濾鏡組成的濾光模組,即可進行螢光檢測,也易於進行設備的更新與擴充。依據本發明之另一實施例,利用同一光路或螢光通道,即可支援多種不同的螢光試劑種類的待測物的檢測,因此能簡化光路與降低裝置複雜性。Based on the above, the detection device and the detection method of the present invention perform fluorescence detection through the configuration of at least one reflective optical thin film element. According to an embodiment of the present invention, only at least one reflective optical thin film element is required, and no filter module composed of band-pass filters is required to perform fluorescence detection, and it is easy to update and expand the equipment. According to another embodiment of the present invention, the same optical path or fluorescent channel can be used to support the detection of various types of fluorescent reagents to be tested, thus simplifying the optical path and reducing the complexity of the device.

圖1是依照本發明的一種實施例的一種檢測裝置的系統方塊圖。圖2是圖1的一種檢測裝置的架構示意圖。圖3A是圖2的反射式光學薄膜元件的一種實施例的正視示意圖。圖3B是入射光束垂直入射圖3A的反射式光學薄膜元件的反射式濾光單元的一種實施例時的光路示意圖。圖3C是入射光束斜向入射圖3B的反射式濾光單元FU時的光路示意圖。圖3D至圖3F是反射式光學薄膜元件的工作原理說明示意圖。圖3G是採用圖3A的反射式光學薄膜元件時的一種檢測方法的流程示意圖。圖4A是圖2的檢測裝置在入射光束為激發光束時的光路示意圖。圖4B是圖2的檢測裝置在入射光束為螢光光束時的光路示意圖。圖4C是圖4A的套筒結構的局部放大示意圖。圖4D是圖4A的另一種套筒結構的局部放大示意圖。請參照圖1與圖2中本發明的實施例,本實施例的檢測裝置100包括發光元件110、容置框架120、光檢測元件130、控制單元150以及至少一反射式光學薄膜元件140,其中所述至少一光學薄膜元件140包括一第一反射式光學薄膜元件141與一第二反射式光學薄膜元件142。此外,在本實施例中檢測裝置100的螢光通道,係由發光元件110至第一反射式光學薄膜元件141的激發光束Eli的光路、第一反射式光學薄膜元件141至容置框架120(的待測物O)的激發光束ELo的光路、容置框架120(的待測物O)至第二反射式光學薄膜元件142的螢光光束FLi的光路、第二反射式光學薄膜元件142至光檢測元件130的螢光光束FLo的光路整體所構成。FIG. 1 is a system block diagram of a detection apparatus according to an embodiment of the present invention. FIG. 2 is a schematic structural diagram of a detection apparatus of FIG. 1 . FIG. 3A is a schematic front view of an embodiment of the reflective optical thin film element of FIG. 2 . FIG. 3B is a schematic diagram of an optical path when an incident light beam is vertically incident on an embodiment of a reflective filter unit of the reflective optical thin film element of FIG. 3A . FIG. 3C is a schematic diagram of an optical path when an incident light beam is obliquely incident on the reflective filter unit FU of FIG. 3B . 3D to 3F are schematic diagrams illustrating the working principle of the reflective optical thin film element. FIG. 3G is a schematic flowchart of a detection method when the reflective optical thin film element of FIG. 3A is used. FIG. 4A is a schematic diagram of the optical path of the detection device of FIG. 2 when the incident light beam is an excitation light beam. 4B is a schematic diagram of the optical path of the detection device of FIG. 2 when the incident light beam is a fluorescent light beam. FIG. 4C is a partial enlarged schematic view of the sleeve structure of FIG. 4A . FIG. 4D is a partial enlarged schematic view of another sleeve structure of FIG. 4A . Please refer to the embodiments of the present invention in FIG. 1 and FIG. 2 , the detection device 100 of this embodiment includes a light-emitting element 110 , a accommodating frame 120 , a light-detecting element 130 , a control unit 150 and at least one reflective optical thin-film element 140 , wherein The at least one optical thin film element 140 includes a first reflective optical thin film element 141 and a second reflective optical thin film element 142 . In addition, in this embodiment, the fluorescence channel of the detection device 100 is the optical path of the excitation beam Eli from the light-emitting element 110 to the first reflective optical thin film element 141, and the first reflective optical thin film element 141 to the accommodating frame 120 ( The optical path of the excitation beam ELo of the object to be tested (O), the optical path of the fluorescent light beam FLi of the accommodating frame 120 (the object to be tested O) to the second reflective optical thin film element 142, the optical path of the second reflective optical thin film element 142 to The entire optical path of the fluorescent light beam FLo of the photodetecting element 130 is constituted.

依照本發明的一種實施例,發光元件110用以提供激發光束ELi。舉例而言,發光元件110可為白光發光二極體,而可用以提供發光波長落在400奈米左右至700奈米左右之間的激發光束ELi。再舉例而言,發光元件110可為紫外光發光二極體,其所提供的發光波長範圍包含至少一部份的紫外光波長範圍。又舉例而言,發光元件110可為包含可見光與紫外光的光源,其所提供的發光波長範圍包含至少可見光與紫外光的波長範圍。According to an embodiment of the present invention, the light-emitting element 110 is used to provide the excitation light beam ELi. For example, the light emitting element 110 can be a white light emitting diode, and can be used to provide an excitation light beam ELi with an emission wavelength between about 400 nm and about 700 nm. For another example, the light-emitting element 110 can be an ultraviolet light-emitting diode, and the light-emitting wavelength range provided by the light-emitting element 110 includes at least a part of the ultraviolet light wavelength range. For another example, the light-emitting element 110 can be a light source including visible light and ultraviolet light, and the light-emitting wavelength range provided by the light-emitting element 110 includes at least the wavelength range of visible light and ultraviolet light.

本實施例的容置框架120係用以容置待測物O。依照本發明如圖2所示的一種實施例,容置框架120具有至少一套筒結構121,其中至少一套筒結構121用以容置待測物O。舉例而言,如圖2所示,具有螢光試劑的待測物O放置在其中一套筒結構121中,而當此螢光試劑所適合的激發光譜落在激發波段範圍時,則當主發光波長落於激發波段範圍內的部分激發光束ELo在照射待測物O時,待測物O中的螢光試劑可產生螢光光束FLi。The accommodating frame 120 in this embodiment is used for accommodating the object O to be tested. According to an embodiment of the present invention as shown in FIG. 2 , the accommodating frame 120 has at least one sleeve structure 121 , wherein the at least one sleeve structure 121 is used for accommodating the object O to be tested. For example, as shown in FIG. 2, the analyte O with a fluorescent reagent is placed in one of the sleeve structures 121, and when the excitation spectrum suitable for the fluorescent reagent falls within the excitation wavelength range, when the main When the part of the excitation light beam ELo whose emission wavelength falls within the excitation wavelength range irradiates the test object O, the fluorescent reagent in the test object O can generate a fluorescent light beam FLi.

根據本發明之一實施例,如圖2及圖3A至圖3C所示,至少一反射式光學薄膜元件140可以當光線射入時利用光線的干涉作用來濾除入射光束IL的部分波段範圍,以形成並反射出主發光波長落於特定波段範圍的出射光束OL。根據本發明之一實施例,至少一反射式光學薄膜元件140包括第一反射式光學薄膜元件141及/或第二反射式光學薄膜元件142,且第一反射式光學薄膜元件141及/或第二反射式光學薄膜元件142可為一微機電系統(MEMS, microelectromechanical systems)的反射式光學薄膜元件,能在控制單元150的控制下反射具有特定波長的入射光束IL。根據本發明之一實施例,該反射式光學薄膜元件140是一微機電系統反射式光學薄膜元件140,可在控制單元150的控制下而將入射光束IL中具有特定波長的光線反射出而成為出射光束OL。依據本發明之一實施例,該微機電系統反射式光學薄膜元件140係具有一或多個濾光單元FU,可在控制單元150的控制下而將入射光束IL中具有特定波長的光線反射出而成為出射光束OL。依據本發明之一實施例,每一濾光單元FU具有一光學共振腔,該光學共振腔具有一共振腔的深度距離dx,可在控制單元150控制所述深度距離dx之下而將入射光束IL中具有特定波長的光線反射出而成為出射光束OL。依據本發明之另一實施例,該微機電系統反射式光學薄膜元件140之濾光單元FU可為一干涉式調變顯示單元(Interferometric modulator display, IMOD),其係為高通(Qualcomm)所開發之米拉索爾顯示單元(Mirasol Display),其係在一反射鏡層之上設置有一薄吸收層而可控制其間之光學共振腔距離,以將入射光束IL中具有特定波長的光線反射出而成為出射光束OL (圖3B與圖3C)。依據本發明之又一實施例,該微機電系統反射式光學薄膜元件140之濾光單元FU可為複數組不同的濾光單元FU1、FU2、FU3,各自可在控制單元150控制下,分別反射不同特定波長的入射光束IL而成為出射光束OL(圖5B)。According to an embodiment of the present invention, as shown in FIG. 2 and FIG. 3A to FIG. 3C , at least one reflective optical thin film element 140 can filter out part of the wavelength range of the incident light beam IL by using the interference effect of the light when the light is incident. In order to form and reflect the outgoing light beam OL whose main emission wavelength falls within a specific wavelength range. According to an embodiment of the present invention, at least one reflective optical thin film element 140 includes a first reflective optical thin film element 141 and/or a second reflective optical thin film element 142, and the first reflective optical thin film element 141 and/or the second reflective optical thin film element 141 The two reflective optical thin film element 142 can be a reflective optical thin film element of a microelectromechanical system (MEMS), which can reflect the incident light beam IL with a specific wavelength under the control of the control unit 150 . According to an embodiment of the present invention, the reflective optical thin film element 140 is a MEMS reflective optical thin film element 140 , which can reflect light with a specific wavelength in the incident light beam IL under the control of the control unit 150 to become Outgoing beam OL. According to an embodiment of the present invention, the MEMS reflective optical thin film element 140 has one or more filter units FU, which can reflect light with a specific wavelength in the incident light beam IL under the control of the control unit 150. It becomes the outgoing light beam OL. According to an embodiment of the present invention, each filter unit FU has an optical resonant cavity, and the optical resonant cavity has a depth distance dx of the resonant cavity, and the control unit 150 can control the depth distance dx to transmit the incident beam. The light having a specific wavelength in the IL is reflected to become the outgoing light beam OL. According to another embodiment of the present invention, the filter unit FU of the MEMS reflective optical thin film element 140 may be an interferometric modulator display (IMOD), which was developed by Qualcomm The Mirasol display unit (Mirasol Display) is a thin absorbing layer arranged on a mirror layer and the distance between the optical resonant cavity can be controlled, so as to reflect the light with a specific wavelength in the incident light beam IL. It becomes the outgoing light beam OL (FIG. 3B and FIG. 3C). According to another embodiment of the present invention, the filter unit FU of the MEMS reflective optical thin film element 140 may be a plurality of different filter units FU1, FU2, FU3, each of which can be controlled by the control unit 150 to reflect The incident light beams IL of different specific wavelengths become outgoing light beams OL ( FIG. 5B ).

依據本發明之一實施例,如圖3A至圖3C所示,第一反射式光學薄膜元件141與第二反射式光學薄膜元件142分別包括多個濾光單元FU,各濾光單元FU分別具有第一界面S1與第二界面S2,各濾光單元FU的第一界面S1與第二界面S2之間形成各濾光單元FU的共振腔,第一界面S1與第二界面S2之間的距離定義為各濾光單元FU的共振腔的深度距離dx。依據本發明之一實施例,如圖3A至圖3C所示,第一反射式光學薄膜元件141與第二反射式光學薄膜元件142分別包括多個濾光單元FU,濾光單元FU之構造可以用微機電系統技術來實現,其中於最上方係設有一抗反射層310,並於抗反射層310之下設有一吸收層320,且於吸收層320相隔一段距離處再設一鏡面層340,而吸收層320與鏡面層340之間的空間則形成一共振腔330,共振腔330中可以填入空氣或是其他氣體或是其他材料,且吸收層320與鏡面層340之間的距離dx定義為此共振腔的深度距離,則藉由控制元件150來控制深度距離dx即可調變而將入射光束IL中具有特定波長的光線反射出而成為出射光束OL。According to an embodiment of the present invention, as shown in FIGS. 3A to 3C , the first reflective optical thin film element 141 and the second reflective optical thin film element 142 respectively include a plurality of filter units FU, and each filter unit FU has The first interface S1 and the second interface S2, the resonant cavity of each filter unit FU is formed between the first interface S1 and the second interface S2 of each filter unit FU, and the distance between the first interface S1 and the second interface S2 Defined as the depth distance dx of the resonant cavity of each filter unit FU. According to an embodiment of the present invention, as shown in FIGS. 3A to 3C , the first reflective optical thin film element 141 and the second reflective optical thin film element 142 respectively include a plurality of filter units FU, and the structure of the filter units FU can be It is realized by MEMS technology, wherein an anti-reflection layer 310 is arranged on the uppermost part, an absorption layer 320 is arranged under the anti-reflection layer 310, and a mirror layer 340 is arranged at a distance from the absorption layer 320, The space between the absorption layer 320 and the mirror layer 340 forms a resonance cavity 330. The resonance cavity 330 can be filled with air or other gases or other materials, and the distance dx between the absorption layer 320 and the mirror layer 340 is defined by For this purpose, the depth distance of the resonant cavity can be modulated by controlling the depth distance dx by the control element 150 to reflect the light having a specific wavelength in the incident light beam IL to become the outgoing light beam OL.

茲簡單介紹反射式光學薄膜元件的工作原理如下。請參閱圖3D,依據薄膜光學干涉原理,當光線由疏介質進入密介質且被反射時光的相位會改變180度,而當光線由密介質進入疏介質且被反射時則否。因此,當入射光束IL從界面S1垂直射入薄膜(共振腔)時,其經由第一界面S1垂直反射後離開薄膜的出射光束OL1與其射入薄膜後經由第二界面S2垂直反射後再從界面S1透射離開薄膜的出射光束OL2之間的光程差(optical path difference,OPD)若符合其波長λ的整數倍再多波長λ的一半時,亦即:光程差OPD = (λm-λ/2), m為正整數1,2,3…,則分別經由第一界面S1與第二界面S2所反射的出射光束OL1與出射光束OL2就會同相位而產生相長性干涉(constructive interference),而其加總的射光束OL的強度就會顯著增加,其中光程差為薄膜厚度dx的兩倍與薄膜折射率nx 的積:光程差OPD = 2(dx)*(nx) = 2(nx)(dx)。然而,當入射光束IL的波長不符合上述情形時,則無法被薄膜大幅反射。換言之,光學薄膜的厚度將可決定能被大幅反射的出射光束OL的波長。舉例而言,當選擇m=1時,光程差OPD =λ/2,光學薄膜的厚度與出射光束OL的相長性干涉可通過下列關係式決定:λ=4(nx)(dx)。Here is a brief introduction to the working principle of the reflective optical thin film element as follows. Referring to FIG. 3D, according to the principle of thin film optical interference, when light enters a dense medium from a sparse medium and is reflected, the phase of the light changes by 180 degrees, but not when the light enters a sparse medium from a dense medium and is reflected. Therefore, when the incident light beam IL enters the film (resonant cavity) vertically from the interface S1, the outgoing light beam OL1 that leaves the film after being vertically reflected by the first interface S1 and the outgoing light beam OL1 that enters the film are vertically reflected by the second interface S2 and then exit the interface. If the optical path difference (OPD) between the outgoing beams OL2 transmitted by S1 and leave the film is equal to an integer multiple of its wavelength λ and then a half of the wavelength λ, that is, the optical path difference OPD = (λm-λ/ 2), m is a positive integer 1, 2, 3, . And the intensity of the total incident beam OL will increase significantly, where the optical path difference is the product of twice the film thickness dx and the film refractive index nx: optical path difference OPD = 2(dx)*(nx) = 2( nx)(dx). However, when the wavelength of the incident light beam IL does not meet the above conditions, it cannot be largely reflected by the thin film. In other words, the thickness of the optical film will determine the wavelength of the outgoing light beam OL that can be largely reflected. For example, when m=1, the optical path difference OPD=λ/2, the constructive interference between the thickness of the optical film and the outgoing beam OL can be determined by the following relation: λ=4(nx)(dx).

請參閱圖3E,當外界入射光束IL並非垂直射入薄膜而具有一入射角θ0時,分別經由第一界面S1與第二界面S2所反射的出射光束OL1與出射光束OL2的光程差則需考慮外界介質的折射率n0、共振腔中的介質的折射率nx、入射光束IL進入共振腔中的入射角θ0與折射角θx等參數關係,且考慮當外界為真空或空氣時之折射率n0約等於1時,則會符合下式:光程差OPD=2(nx)(dx)cos(θx),其中可利用sin(θx) = (n0)sin(θ0)/(nx) = sin(θ0)/(nx) (依據司乃耳定律,Snell’s Law)算出cos(θx),再考慮相長性干涉時,光程差OPD = (λm-λ/2),m為正整數1,2,3…,即可藉由控制dx而達成波長λ的光線的相長性干涉。舉例而言,當選擇m=1時,光程差OPD =λ/2,薄膜厚度dx與出射光束OL的波長λ的關係可通過下式決定:λ=4(nx)(dx)cos(θx),其中sin(θx) = sin(θ0)/(nx),且nx可由介質材料得知,故當入射角θ0決定後即可得出折射角θx,進而算出cos(θx)。並且,為了取得具有所需波長λ的值的出射光束OL,則可經由上式基於出射光束OL的所需波長λ的值來控制厚度dx。Referring to FIG. 3E, when the incident light beam IL is not perpendicular to the film but has an incident angle θ0, the optical path difference between the outgoing light beam OL1 and the outgoing light beam OL2 reflected by the first interface S1 and the second interface S2 respectively needs to be Consider the relationship between the refractive index n0 of the external medium, the refractive index nx of the medium in the resonant cavity, the incident angle θ0 of the incident beam IL entering the resonant cavity and the refraction angle θx and other parameters, and consider the refractive index n0 when the outside is vacuum or air When it is approximately equal to 1, it will conform to the following formula: Optical path difference OPD=2(nx)(dx)cos(θx), where sin(θx) = (n0)sin(θ0)/(nx) = sin( θ0)/(nx) (according to Snell's Law) to calculate cos(θx), and considering constructive interference, the optical path difference OPD = (λm-λ/2), m is a positive integer 1, 2 , 3..., the constructive interference of light with wavelength λ can be achieved by controlling dx. For example, when m=1 is selected, the optical path difference OPD =λ/2, the relationship between the film thickness dx and the wavelength λ of the outgoing beam OL can be determined by the following formula: λ=4(nx)(dx)cos(θx ), where sin(θx) = sin(θ0)/(nx), and nx can be known from the dielectric material, so when the incident angle θ0 is determined, the refraction angle θx can be obtained, and then cos(θx) can be calculated. Furthermore, in order to obtain the outgoing light beam OL having the required value of the wavelength λ, the thickness dx can be controlled based on the value of the required wavelength λ of the outgoing light beam OL through the above formula.

請參閱圖3F,再進一步考慮有更多層薄膜時之情形,其中由上而下的外界層L0,第一介質層L1,第二介質層L2,第三介質層L3的折射率分別例如為n0,n1,n2,n3,且n0<n1,n2<n1,n2<n3,其中外界層L0例如為外界(例如是空氣或真空),第一介質層L1例如為光學薄膜,及第二介質層L2例如為光學薄膜或空腔(例如其中為空氣或真空),第三介質層L3例如為光學薄膜或鏡面(例如為全反射鏡面),此時由上而下,各介質層分別為光疏介質、光密介質、光疏介質、光密介質。當外界的入射光束IL並非垂直射入薄膜而具有一角度時,假設入射角為入射角θ0,於點A通過第一界面S1(外界層L0與第一介質層L1之間)時之折射角為第一夾角θ1,且再於點B通過第二界面S2(第一介質層L1與第二介質層L2之間)時之折射角為第二夾角θ2,且光束於點C遇到第三界面S3(第二介質層L2與第三介質層L3之間)時僅考慮反射而向上直接通過第二界面S2的點D與第一界面S1的點E出來的部份,其中第一介質層L1具有一厚度du且第二介質層L2具有一厚度dv,則可得到出射光束OL3相對於出射光束OL1的光程差OPD = 2(n1)(du)cos(θ1) + 2(n2)(dv)cos(θ2),其中(n0)sin(θ0) = (n1)sin(θ1) = (n2)sin(θ2) (依據司乃耳定律),且另外再考慮n0<n1與n2<n3,故第一界面S1與第三界面S3反射光線時皆有相位轉換180度,因而在相長性干涉時,光程差OPD = λm,m為正整數1,2,3…,即可藉由控制深度距離而達成波長為λ的光線的相長性干涉,出射光束OL2的效應公式則是已於圖3E中得到,而出射光束OL則是加總考慮出射光束OL1,出射光束OL2,出射光束OL3及其他反射光線的干涉效應總合。當光學薄膜的層數再增加時,可以由前述輕易推知相對應的光程差公式,故於此不再贅述。當有多層薄膜堆疊時可以進一步的設定其光學性質,增強波長λ的光線的相長性干涉效果,進而達到波長選擇的目的。藉由前述薄膜光學干涉原理,若將此光學薄膜視為一光學共振腔,且將此光學薄膜元件之厚度視為共振腔的深度距離,則可以利用調整共振腔的深度距離而選擇反射出的所希望的光線的主波段範圍。Please refer to FIG. 3F, and further consider the situation when there are more layers of thin films, wherein the refractive indices of the outer layer L0, the first dielectric layer L1, the second dielectric layer L2, and the third dielectric layer L3 from top to bottom are, for example, n0, n1, n2, n3, and n0<n1, n2<n1, n2<n3, wherein the external layer L0 is, for example, the outside world (such as air or vacuum), the first dielectric layer L1 is, for example, an optical film, and the second dielectric The layer L2 is, for example, an optical film or a cavity (such as air or vacuum), and the third dielectric layer L3 is, for example, an optical film or a mirror surface (such as a total reflection mirror surface). Thin medium, optically dense medium, optically thin medium, optically dense medium. When the external incident light beam IL is not perpendicular to the film but has an angle, assuming the incident angle is the incident angle θ0, the refraction angle when point A passes through the first interface S1 (between the external layer L0 and the first dielectric layer L1) is the first angle θ1, and the refraction angle when point B passes through the second interface S2 (between the first dielectric layer L1 and the second dielectric layer L2) is the second angle θ2, and the light beam meets the third angle at point C. The interface S3 (between the second dielectric layer L2 and the third dielectric layer L3) only considers the reflection and directly passes through the point D of the second interface S2 and the point E of the first interface S1. The first dielectric layer L1 has a thickness du and the second dielectric layer L2 has a thickness dv, then the optical path difference OPD of the outgoing beam OL3 relative to the outgoing beam OL1 can be obtained as OPD = 2(n1)(du)cos(θ1) + 2(n2)( dv)cos(θ2), where (n0)sin(θ0) = (n1)sin(θ1) = (n2)sin(θ2) (according to Snell's law), and additionally consider n0<n1 and n2<n3 , so the first interface S1 and the third interface S3 both have a phase conversion of 180 degrees when they reflect light, so during constructive interference, the optical path difference OPD = λm, m is a positive integer 1, 2, 3..., you can borrow The constructive interference of the light with wavelength λ is achieved by controlling the depth distance. The effect formula of the outgoing beam OL2 has been obtained in Fig. 3E, and the outgoing beam OL is a summation considering the outgoing beam OL1, the outgoing beam OL2, and the outgoing beam OL2. The sum of the interference effects of beam OL3 and other reflected rays. When the number of layers of the optical film is further increased, the corresponding optical path difference formula can be easily deduced from the foregoing, so it is not repeated here. When a multilayer thin film is stacked, its optical properties can be further set to enhance the constructive interference effect of light with wavelength λ, thereby achieving the purpose of wavelength selection. According to the aforementioned thin film optical interference principle, if the optical film is regarded as an optical resonant cavity, and the thickness of the optical thin film element is regarded as the depth distance of the resonant cavity, then the reflected light can be selected by adjusting the depth distance of the resonant cavity. The main wavelength range of the desired light.

如圖2及圖3A至圖3B所示,在本實施例中,入射光束IL可為激發光束ELi及/或螢光光束FLi,而其對應的出射光束OL則分別為激發光束ELo及/或螢光光束FLo。進一步而言,如圖2與圖4A所示,當入射光束IL為激發光束ELi時,至少一反射式光學薄膜元件140包括第一反射式光學薄膜元件141,第一反射式光學薄膜元件141位於激發光束ELi的傳遞路徑上,且位於發光元件110與容置框架120之間。換言之,當入射光束IL為激發光束ELi時,即為激發光束ELi入射第一反射式光學薄膜元件141的情況。當激發光束ELi通過第一光學薄膜元件141時,則可透過控制第一反射式光學薄膜元件141的各濾光單元FU的共振腔的深度距離dx,來形成主發光波長落於激發波段範圍內的激發光束ELo。並且,如圖2所示,在本實施例中,檢測裝置100還包括第一外殼HS1以形成一第一暗房,用以容置發光元件110以及第一反射式光學薄膜元件141,以隔絕外部之雜訊光而利於螢光檢測之進行。並且,第一外殼HS1具有一出口EX,用以供主發光波長落於激發波段範圍內的激發光束ELo通過。依照本發明的一種實施例,檢測裝置100係設有至少一暗房容置待測物O,以隔絕外部之雜訊光而利於螢光檢測。依照本發明的另一種實施例,待測物O係設於一暗房中而由容置框架120所支持,以隔絕外部之雜訊光,但暗房具有一開口讓待測物O可接收激發光束ELo及一開口讓待測物O可發送螢光光束FLi。As shown in FIGS. 2 and 3A to 3B, in this embodiment, the incident light beam IL can be the excitation light beam ELi and/or the fluorescent light beam FLi, and the corresponding outgoing light beam OL is the excitation light beam ELo and/or the fluorescent light beam FLi, respectively Fluorescent beam FLo. Further, as shown in FIG. 2 and FIG. 4A , when the incident light beam IL is the excitation light beam ELi, at least one reflective optical thin film element 140 includes a first reflective optical thin film element 141 , and the first reflective optical thin film element 141 is located at The excitation light beam ELi is on the transmission path, and is located between the light-emitting element 110 and the accommodating frame 120 . In other words, when the incident light beam IL is the excitation light beam ELi, it is the case where the excitation light beam ELi is incident on the first reflective optical thin film element 141 . When the excitation light beam ELi passes through the first optical thin film element 141 , the main emission wavelength can be formed to fall within the excitation wavelength range by controlling the depth distance dx of the resonant cavity of each filter unit FU of the first reflective optical thin film element 141 The excitation beam ELo. Furthermore, as shown in FIG. 2 , in this embodiment, the detection device 100 further includes a first housing HS1 to form a first darkroom for accommodating the light-emitting element 110 and the first reflective optical film element 141 to isolate the outside The noise light is favorable for the fluorescent detection. In addition, the first housing HS1 has an outlet EX for passing the excitation light beam ELo whose main emission wavelength falls within the excitation wavelength range. According to an embodiment of the present invention, the detection device 100 is provided with at least one darkroom to accommodate the object to be tested O, so as to isolate external noise light and facilitate fluorescence detection. According to another embodiment of the present invention, the object to be tested O is set in a darkroom and supported by the accommodating frame 120 to isolate external noise light, but the darkroom has an opening for the object to be tested O to receive the excitation beam. The ELo and an opening allow the object to be tested O to transmit the fluorescent light beam FLi.

更詳細而言,如圖2與圖4A所示,由於發光元件110的位置、激發光束ELi的入射方向與待測物O的位置皆為固定,因此,第一反射式光學薄膜元件141的法線方向N1以及激發光束ELi與法線方向N1之間的第一入射角α1也會保持為固定不變的定值,因此只要將第一外殼HS1的出口EX設置為位於激發光束ELo的傳遞路徑上的小孔,激發光束ELo即可通過出口EX並入射至待測物O處。依照本發明的一種實施例,第一外殼HS1的內側會採用黑色材質或濆塗黑色材質的漆的吸光物質,以降低激發光束ELi經由第一外殼HS1內部結構反射而通過第一外殼HS1的出口EX的可能性,而可進一步濾除雜訊光的影響。In more detail, as shown in FIG. 2 and FIG. 4A , since the position of the light-emitting element 110 , the incident direction of the excitation beam ELi and the position of the test object O are all fixed, the method of the first reflective optical thin film element 141 The line direction N1 and the first incident angle α1 between the excitation beam ELi and the normal direction N1 will also remain constant and constant, so as long as the outlet EX of the first housing HS1 is set to be located in the transmission path of the excitation beam ELo The small hole on the top, the excitation beam ELo can pass through the exit EX and be incident on the object to be tested O. According to an embodiment of the present invention, the inner side of the first housing HS1 is made of a black material or a light-absorbing substance coated with a black material to reduce the reflection of the excitation light beam ELi through the internal structure of the first housing HS1 and the exit of the first housing HS1. The possibility of EX, which can further filter out the influence of noise light.

接著,如圖2與圖4C所示,依據本發明之一實施例,至少一套筒結構121位於激發光束ELo的傳遞路徑上。在本實施例中,至少一套筒結構121之各者具有一開口OP,主發光波長落於激發波段範圍內的激發光束ELo在通過第一外殼HS1的出口EX後,會對準開口OP,而使開口OP可用以接收激發光束ELo。舉例而言,開口OP的寬度尺寸可介於大約0.5毫米至1毫米之間,以使減少環境雜訊光通過開口OP的可能性,並維持開口OP所能接收到的激發光束ELo的最大值即可。此外,在本實施例中,開口OP的形狀可為狹縫,但本發明不以此為限。在其他的實施例中,開口OP的形狀也可為圓形開口OP(如圖4D的實施例的套筒結構121A的開口OP)、矩形開口OP等等。Next, as shown in FIG. 2 and FIG. 4C , according to an embodiment of the present invention, at least one sleeve structure 121 is located on the transmission path of the excitation beam ELo. In this embodiment, each of the at least one sleeve structure 121 has an opening OP, and the excitation light beam ELo whose main emission wavelength falls within the excitation wavelength range will be aimed at the opening OP after passing through the outlet EX of the first housing HS1, Instead, the opening OP is made available to receive the excitation light beam ELo. For example, the width dimension of the opening OP can be between about 0.5 mm and 1 mm, so as to reduce the possibility of ambient noise light passing through the opening OP and maintain the maximum value of the excitation beam ELo that the opening OP can receive That's it. In addition, in this embodiment, the shape of the opening OP may be a slit, but the present invention is not limited thereto. In other embodiments, the shape of the opening OP can also be a circular opening OP (such as the opening OP of the sleeve structure 121A in the embodiment of FIG. 4D ), a rectangular opening OP, and the like.

另一方面,如圖2與圖4B所示,當入射光束IL為螢光光束FLi時,至少一反射式光學薄膜元件140包括第二反射式光學薄膜元件142,第二反射式光學薄膜元件142位於螢光光束FLi的傳遞路徑上,且位於容置框架120與光檢測元件130之間。並且,至少一套筒結構121之各者的下方還具有一開孔,可用以供主發光波長落於激發波段範圍內的部分激發光束ELo在照射待測物O後產生的螢光光束FLi出射。換言之,當入射光束IL為螢光光束FLi,即為螢光光束FLi入射第二反射式光學薄膜元件142時的情況。依照本發明的一種實施例,如圖2所示,檢測裝置100還包括第二外殼HS2以形成一第二暗房,用以容置第二反射式光學薄膜元件142以及光檢測元件130,以隔絕外部之雜訊光而利於螢光檢測之進行。第二外殼HS2具有一入口IN,以供螢光光束FLi通過。On the other hand, as shown in FIG. 2 and FIG. 4B , when the incident light beam IL is the fluorescent light beam FLi, at least one reflective optical thin film element 140 includes a second reflective optical thin film element 142 , and the second reflective optical thin film element 142 It is located on the transmission path of the fluorescent light beam FLi, and is located between the accommodating frame 120 and the light detection element 130 . In addition, each of the at least one sleeve structure 121 also has an opening under it, which can be used for the fluorescence beam FLi generated by the part of the excitation beam ELo whose main emission wavelength falls within the excitation wavelength range to be emitted after irradiating the test object O . In other words, when the incident light beam IL is the fluorescent light beam FLi, that is, the situation when the fluorescent light beam FLi is incident on the second reflective optical thin film element 142 . According to an embodiment of the present invention, as shown in FIG. 2 , the detection device 100 further includes a second housing HS2 to form a second darkroom for accommodating the second reflective optical film element 142 and the light detection element 130 to isolate the The external noise light is beneficial to the fluorescent detection. The second housing HS2 has an inlet IN for the fluorescent light beam FLi to pass through.

並且,類似地,如圖2與圖4B所示,由於待測物O的位置、螢光光束FLi的入射方向、第二反射式光學薄膜元件142與光檢測元件130的位置皆為固定,因此,第二反射式光學薄膜元件142的法線方向N2以及螢光光束FLi與法線方向N2之間的第二入射角α2也會保持為固定不變的定值,因此只要將第二外殼HS2的入口IN設置為位於螢光光束FLi的傳遞路徑上的小孔,螢光光束FLi即可通過入口IN並傳遞至第二反射式光學薄膜元件142,並可藉此遮擋環境光線,而可進一步濾除雜訊光的影響。進一步而言,當螢光光束FLi通過第二反射式光學薄膜元件142時,也可透過控制第二反射式光學薄膜元件142的各濾光單元FU的共振腔的深度距離dx,來形成主發光波長落於檢測波段範圍內的螢光光束FLo,其中檢測波段範圍為螢光光束FL的特性較為顯著的波段範圍。雖然在圖2、圖4A及圖4B包含第一暗房與第二暗房,但是依照本發明的另一種實施例,檢測裝置100係設有至少一暗房於發光元件110與光檢測元件130二者之一上而使其相互阻隔而僅有螢光通道之光路相通,以降低光檢測元件130所收到的雜訊光而利於螢光檢測。依照本發明的又一種實施例,檢測裝置100的由發光元件110以至於光檢測元件130間的螢光通道,係設置於至少一暗房中,以隔絕外部之雜訊光。依照本發明的再一種實施例,檢測裝置100的由發光元件110以至於光檢測元件130間的螢光通道,係通過至少二暗房中,以減少外部之雜訊光。Also, similarly, as shown in FIG. 2 and FIG. 4B , since the position of the object to be tested O, the incident direction of the fluorescent light beam FLi, the positions of the second reflective optical thin film element 142 and the light detection element 130 are all fixed, therefore , the normal direction N2 of the second reflective optical thin film element 142 and the second incident angle α2 between the fluorescent light beam FLi and the normal direction N2 will also remain constant, so as long as the second housing HS2 The inlet IN is set as a small hole on the transmission path of the fluorescent light beam FLi, and the fluorescent light beam FLi can pass through the inlet IN and be transmitted to the second reflective optical thin film element 142, thereby blocking the ambient light, and further Filter out the influence of noise light. Further, when the fluorescent light beam FLi passes through the second reflective optical thin film element 142 , the main light emission can also be formed by controlling the depth distance dx of the resonant cavity of each filter unit FU of the second reflective optical thin film element 142 The wavelength of the fluorescent light beam FLo falls within the detection wavelength range, wherein the detection wavelength range is a wavelength range in which the characteristics of the fluorescent light beam FL are more pronounced. Although FIG. 2 , FIG. 4A and FIG. 4B include the first darkroom and the second darkroom, according to another embodiment of the present invention, the detection device 100 is provided with at least one darkroom between the light-emitting element 110 and the light-detecting element 130 On top of each other, they are mutually blocked and only the optical paths of the fluorescent channels communicate with each other, so as to reduce the noise light received by the photodetecting element 130 and facilitate fluorescent detection. According to another embodiment of the present invention, the fluorescent channel between the light-emitting element 110 and the light-detecting element 130 of the detection device 100 is disposed in at least one darkroom to isolate external noise light. According to another embodiment of the present invention, the fluorescent channel between the light-emitting element 110 and the light-detecting element 130 of the detection device 100 passes through at least two darkrooms to reduce external noise light.

並且,如圖2所示,光檢測元件130位於螢光光束FLo的傳遞路徑上,而可用以接收螢光光束FLo。舉例而言,光檢測元件130為能夠偵測光強度的光電感測器,而可為光電二極體(光二極體,Photodiode)。具體而言,光檢測元件130用以接收主發光波長落於檢測波段範圍內的部分螢光光束FLo。Moreover, as shown in FIG. 2 , the light detection element 130 is located on the transmission path of the fluorescent light beam FLo, and can be used for receiving the fluorescent light beam FLo. For example, the light detection element 130 is a photoelectric sensor capable of detecting light intensity, and can be a photodiode (Photodiode). Specifically, the light detection element 130 is used for receiving part of the fluorescent light beam FLo whose main emission wavelength falls within the detection wavelength range.

另一方面,如圖1所示,在本實施例中,檢測裝置100還包括控制單元150。舉例而言,控制單元150可為微控制器或中央處理單元,其包含記憶體,輸入控制器、輸出控制器。根據本發明之一種實施例中,控制單元150可以執行程式以控制發光元件110的發光波長範圍的設定以及控制發光元件110的開關。根據本發明之另一種實施例中,控制單元150可控制光檢測元件130對偵測到的光強度進行調校,舉例而言,當光檢測元件130對於不同波長之光的感測強度不相同時,可以透過控制單元150對感測強度進行校正(offset)調整。On the other hand, as shown in FIG. 1 , in this embodiment, the detection device 100 further includes a control unit 150 . For example, the control unit 150 can be a microcontroller or a central processing unit, which includes a memory, an input controller, and an output controller. According to an embodiment of the present invention, the control unit 150 may execute a program to control the setting of the light-emitting wavelength range of the light-emitting element 110 and control the switching of the light-emitting element 110 . According to another embodiment of the present invention, the control unit 150 can control the light detection element 130 to adjust the detected light intensity. For example, when the light detection element 130 has different sensing intensities for different wavelengths of light When , the sensing intensity can be adjusted (offset) through the control unit 150 .

根據本發明之另一種實施例中,控制單元150可控制激發光束ELi或螢光光束FLi通過至少一光學薄膜元件140的第一光學薄膜元件141及/或第二光學薄膜元件142的濾光單元FU的共振腔的深度距離dx。更具體而言,控制單元150能夠調整至少一光學薄膜元件140的濾光單元FU的共振腔的深度距離dx的大小,來進一步調整激發光束ELo及/或螢光光束FLo的主發光波長的範圍,以使激發光束ELo的主發光波長能落於激發波段範圍內及/或螢光光束FLo的主發光波長能落於檢測波段範圍內。According to another embodiment of the present invention, the control unit 150 can control the excitation light beam ELi or the fluorescent light beam FLi to pass through the filter unit of the first optical thin film element 141 and/or the second optical thin film element 142 of the at least one optical thin film element 140 The depth distance dx of the resonant cavity of the FU. More specifically, the control unit 150 can adjust the depth distance dx of the resonant cavity of the filter unit FU of the at least one optical thin film element 140 to further adjust the range of the main emission wavelength of the excitation beam ELo and/or the fluorescent beam FLo. , so that the main emission wavelength of the excitation light beam ELo can fall within the excitation wavelength range and/or the main emission wavelength of the fluorescent light beam FLo can fall within the detection wavelength range.

以下將針對控制單元150如何執行圖3G的檢測方法進行進一步的解說。請參照圖3G,在本實施例中,圖3G的檢測方法例如可利用圖1與圖2中的檢測裝置100來執行。How the control unit 150 performs the detection method of FIG. 3G will be further explained below. Referring to FIG. 3G , in this embodiment, the detection method of FIG. 3G can be performed by, for example, the detection apparatus 100 shown in FIGS. 1 and 2 .

首先,執行步驟S110,控制單元150開啟發光元件110。具體而言,如圖2所示,在步驟S110中,發光元件110提供的激發光束ELi可經過準直透鏡CL1而被準直化為平行光束。First, step S110 is executed, and the control unit 150 turns on the light-emitting element 110 . Specifically, as shown in FIG. 2 , in step S110 , the excitation light beam ELi provided by the light-emitting element 110 may be collimated into a parallel light beam through a collimating lens CL1 .

接著,執行步驟S120,控制單元150依據激發波段範圍,控制第一反射式光學薄膜元件141的濾光單元FU的共振腔的深度距離dx為第一深度距離,以使待測物接收到主發光波長落於激發波段範圍的激發光束ELo而產生螢光光束FLi。更具體而言,如圖2與圖3B所示,當激發光束ELi入射第一反射式光學薄膜元件141時,控制單元150控制第一反射式光學薄膜元件141的濾光單元FU的共振腔的深度距離dx為第一深度距離,且第一深度距離的值與激發波段範圍的值相對應,因此共振腔反射出主發光波長落於激發波段範圍的激發光束ELo,並為待測物O接收到而產生螢光光束FLi。Next, step S120 is executed, the control unit 150 controls the depth distance dx of the resonant cavity of the filter unit FU of the first reflective optical thin film element 141 to be the first depth distance according to the excitation wavelength range, so that the object to be tested receives the main light emission The fluorescent light beam FLi is generated by the excitation light beam ELo whose wavelength falls within the excitation wavelength range. More specifically, as shown in FIGS. 2 and 3B , when the excitation light beam ELi is incident on the first reflective optical thin film element 141 , the control unit 150 controls the resonant cavity of the filter unit FU of the first reflective optical thin film element 141 . The depth distance dx is the first depth distance, and the value of the first depth distance corresponds to the value of the excitation band range, so the resonant cavity reflects the excitation beam ELo whose main emission wavelength falls within the excitation band range, and is received by the test object O to generate a fluorescent light beam FLi.

依照本發明的一種實施例,激發波段範圍的設定值約可為介於400奈米至700奈米之間以符合各種螢光試劑的規格需求。茲列舉數種市售的螢光試劑的額定的吸收激發波長(激發波長波峰值)及其所產生的對應額定螢光波長(螢光波長波峰值)如下:綠光(FAM)的激發波長494nm對應至螢光波長520nm、黃光(Cy3)的激發波長550nm對應至螢光波長570nm、橘光(ROX)的激發波長575nm對應至螢光波長602nm、紅光(Cy5)的激發波長646nm對應至螢光波長662nm。所謂一螢光試劑的額定激發波長(激發波長波峰值)是指,該螢光試劑反應物對某一激發波段範圍的激發光線皆有螢光產生效果,但是在該激發波段範圍中的該額定激發波長有最佳的螢光產生效果。換句話說,該螢光試劑反應物對於在其額定激發波長附近的激發光線(即該激發波段範圍)有產生螢光的效果,但是以該額定激發波長之產生螢光的效果為最佳。並且,當此一激發波段範圍為激發波段範圍所涵蓋之波段範圍時,此螢光試劑即可適用於本檢測裝置100中,而藉由檢測裝置100通過控制單元150來控制第一反射式光學薄膜元件141的深度距離dx,進而使激發光束ELo能激發待測物O而產生較佳的螢光產生效果。According to an embodiment of the present invention, the set value of the excitation wavelength range may be approximately between 400 nm and 700 nm to meet the specifications of various fluorescent reagents. The rated absorption excitation wavelength (peak value of excitation wavelength) of several commercially available fluorescent reagents and their corresponding rated fluorescence wavelength (peak value of fluorescence wavelength) are listed as follows: The excitation wavelength of green light (FAM) corresponds to 494 nm. To fluorescence wavelength 520nm, yellow light (Cy3) excitation wavelength 550nm corresponds to fluorescence wavelength 570nm, orange light (ROX) excitation wavelength 575nm corresponds to fluorescence wavelength 602nm, red light (Cy5) excitation wavelength 646nm corresponds to fluorescence wavelength 646nm Light wavelength 662nm. The so-called rated excitation wavelength (excitation wavelength peak) of a fluorescent reagent means that the fluorescent reagent reactant has a fluorescent effect on excitation light in a certain excitation wavelength range, but the rated excitation wavelength in the excitation wavelength range. The excitation wavelength has the best fluorescence generation effect. In other words, the fluorescent reagent reactant has the effect of generating fluorescence for excitation light near its rated excitation wavelength (ie, the excitation wavelength range), but the effect of generating fluorescence at the rated excitation wavelength is the best. In addition, when the excitation wavelength range is the wavelength range covered by the excitation wavelength range, the fluorescent reagent can be used in the detection device 100 , and the detection device 100 controls the first reflective optical system through the control unit 150 . The depth distance dx of the thin film element 141 enables the excitation beam ELo to excite the object to be tested O to produce better fluorescence generation effect.

類似的,所謂一螢光試劑的額定螢光波長(螢光波長波峰值)是指,該螢光試劑反應物對於激發光線所產生的螢光會落在某一螢光波段範圍內,但是在反應物受到額定激發波長的光線照射時,其所產生的螢光波長會落在額定螢光波長附近(即該螢光波段範圍),但以該額定螢光波長有最佳的螢光產生效果。並且,當此一螢光波段範圍為檢測波段範圍所涵蓋之波段範圍時,此螢光試劑即可適用於本檢測裝置100中,而藉由檢測裝置100通過控制單元150來控制第二反射式光學薄膜元件142的深度距離dx,進而純化螢光光束FLo的色純度,以純化螢光光束FLo的特性。Similarly, the so-called rated fluorescence wavelength (fluorescence wavelength peak) of a fluorescent reagent means that the fluorescence generated by the fluorescent reagent reactant for excitation light will fall within a certain fluorescence wavelength range, but in the reaction When the object is irradiated by the light of the rated excitation wavelength, the fluorescence wavelength generated by it will fall near the rated fluorescence wavelength (ie, the fluorescence wavelength range), but the rated fluorescence wavelength has the best fluorescence generation effect. Moreover, when the fluorescent wavelength range is the wavelength range covered by the detection wavelength range, the fluorescent reagent can be used in the detection device 100 , and the detection device 100 controls the second reflective type through the control unit 150 . The depth distance dx of the optical thin film element 142 further purifies the color purity of the fluorescent light beam FLo, so as to purify the characteristics of the fluorescent light beam FLo.

依據本發明之一實施例,該激發波段範圍可以是包含額定激發波長的40nm的範圍內;依據本發明之另一實施例,該激發波段範圍可以是包含額定激發波長的20nm的範圍內;依據本發明之又一實施例,該激發波段範圍可以是包含額定激發波長的10nm的範圍內;依據本發明之再一實施例,該激發波段範圍可以是包含額定激發波長的6nm的範圍內。另外,依據本發明之一實施例,該激發波段範圍是以該額定激發波長為中心而增減某一特定波長為其範圍,例如增減20nm,另例如增減10nm,又例如增減5nm,再例如增減3nm。茲舉上述市售的綠光(FAM)的額定激發波長494nm對應至額定螢光波長520nm為例說明,其激發波段範圍可以是包含額定激發波長494nm的40nm的範圍內(例如在460nm至500nm的範圍內,又例如在470nm至510nm的範圍內),又或可以是包含494nm的20nm的範圍內(例如在480nm至500nm的範圍內,又例如在490nm至510nm的範圍內),又或可以是包含494nm的10nm的範圍內(例如在490nm至500nm的範圍內),又或可以是包含494nm的6nm的範圍內(例如在490nm至496nm的範圍內);或者,該激發波段範圍是以該額定激發波長494nm為中心而增減某一特定波長為其範圍,例如增減20nm的範圍內(亦即在474nm至514nm的範圍內),又或增減10nm的範圍內(亦即在484nm至504nm的範圍內),又或增減5nm的範圍內(亦即在489nm至499nm的範圍內),又或增減3nm的範圍內(亦即在491nm至497nm的範圍內)。According to an embodiment of the present invention, the excitation wavelength range may be within a range of 40 nm including the rated excitation wavelength; according to another embodiment of the present invention, the excitation wavelength range may be within a range of 20 nm including the rated excitation wavelength; In yet another embodiment of the present invention, the excitation wavelength range may be within a range of 10 nm including the rated excitation wavelength; according to yet another embodiment of the present invention, the excitation wavelength range may be within a range of 6 nm including the rated excitation wavelength. In addition, according to an embodiment of the present invention, the excitation wavelength range is centered on the rated excitation wavelength and increases or decreases by a specific wavelength as the range, such as increasing or decreasing by 20 nm, or by increasing or decreasing by 10 nm, or by increasing or decreasing by 5 nm. For another example, increase or decrease by 3 nm. The above-mentioned commercially available green light (FAM) has the rated excitation wavelength of 494 nm corresponding to the rated fluorescence wavelength of 520 nm as an example, and the excitation wavelength range can be within the range of 40 nm including the rated excitation wavelength of 494 nm (for example, in the range of 460 nm to 500 nm). range, again for example in the range of 470 nm to 510 nm), or may be in the range of 20 nm including 494 nm (for example in the range of 480 nm to 500 nm, for example in the range of 490 nm to 510 nm), or may be In the range of 10 nm including 494 nm (eg, in the range of 490 nm to 500 nm), or may be in the range of 6 nm including 494 nm (eg, in the range of 490 nm to 496 nm); The excitation wavelength is centered at 494nm and a certain wavelength is increased or decreased as its range, such as within the range of 20nm (that is, within the range of 474nm to 514nm), or within the range of 10nm (that is, within the range of 484nm to 504nm) ), or within the range of 5 nm (that is, within the range of 489 nm to 499 nm), or within the range of 3 nm (that is, within the range of 491 nm to 497 nm).

並且,當需要激發光束ELo具有特定的主發光波長時,則可對第一深度距離進行進一步地限定。例如,當需要激發光束ELo的主發光波長(即激發波長)為494奈米左右時,可控制第一深度距離為與494奈米相對應的一值而達成此目的;又如,當需要激發光束ELo的主發光波長(即激發波長)為550奈米左右時,可控制第一深度距離為與550奈米相對應的另一值而達成此目的,以此類推。如此,只要調整第一深度距離的大小,就可得到所需的激發光束ELo。再者,依據本發明之一實施例,可以調整第一反射式光學薄膜元件141的濾光單元FU的共振腔的第一深度距離的不同大小,即可在其中兩種不同色光的激發波長之間切換,例如綠色切換至黃色,或黃色切換至橘色,或是橘色切換至紅色;依據本發明之另一實施例,可以調整濾光單元FU的共振腔的第一深度距離的不同大小,即可在其中三種不同色光的激發波長之間切換,例如綠色、黃色及橘色,或是黃色、橘色及紅色;依據本發明之又一實施例,可以調整濾光單元FU的共振腔的第一深度距離的不同大小,即可在其中四種或以上的不同色光的激發波長之間切換,例如綠色、黃色、橘色及紅色。Moreover, when the excitation light beam ELo needs to have a specific main emission wavelength, the first depth distance can be further defined. For example, when the main emission wavelength (ie, the excitation wavelength) of the excitation beam ELo is required to be about 494 nm, the first depth distance can be controlled to a value corresponding to 494 nm to achieve this purpose; for another example, when the excitation beam ELo needs to be excited When the main emission wavelength (ie, the excitation wavelength) of the light beam ELo is about 550 nm, the first depth distance can be controlled to another value corresponding to 550 nm to achieve this purpose, and so on. In this way, as long as the size of the first depth distance is adjusted, the desired excitation beam ELo can be obtained. Furthermore, according to an embodiment of the present invention, different sizes of the first depth distance of the resonant cavity of the filter unit FU of the first reflective optical thin film element 141 can be adjusted, that is, between the excitation wavelengths of two different color lights. For example, green to yellow, or yellow to orange, or orange to red; according to another embodiment of the present invention, different sizes of the first depth distance of the resonant cavity of the filter unit FU can be adjusted , the excitation wavelengths of three different colors of light can be switched, such as green, yellow and orange, or yellow, orange and red; according to another embodiment of the present invention, the resonant cavity of the filter unit FU can be adjusted The different sizes of the first depth distance can switch among the excitation wavelengths of four or more different color lights, such as green, yellow, orange and red.

如此一來,控制單元150可依據待測物O中帶有的螢光試劑種類所需的激發光束ELo的適合波段範圍,來設定第一深度距離的值,即可有效地形成所需的螢光光束FLi,而不需如習知技術一般地設置各種不同的由帶通濾鏡組成的濾光模組及/或各種不同的螢光通道,並且控制單元150僅需調整第一反射式光學薄膜元件141的第一深度距離,就可支援多種不同的螢光試劑種類的檢測,因此易於進行設備的更新與擴充。此外,由於在進行多種不同的螢光試劑種類的檢測時,不同的待測物O所需的激發光束ELo可共用同一光路或螢光通道,因此也能簡化光路與減少生產、組裝、維修、調整的複雜性,而減少產品成本以及提升生產品質。In this way, the control unit 150 can set the value of the first depth distance according to the suitable wavelength range of the excitation beam ELo required by the type of fluorescent reagent contained in the object to be tested O, so as to effectively form the desired fluorescent light. The light beam FLi does not need to set up various filter modules composed of band-pass filters and/or various fluorescent channels as in the prior art, and the control unit 150 only needs to adjust the first reflective optical The first depth distance of the thin film element 141 can support the detection of various types of fluorescent reagents, so it is easy to update and expand the equipment. In addition, since the excitation beam ELo required by different analytes O can share the same optical path or fluorescent channel when performing the detection of a variety of different fluorescent reagents, it can also simplify the optical path and reduce production, assembly, maintenance, etc. Adjustment complexity while reducing product cost and improving production quality.

類似地,由於隨著螢光試劑種類的不同,待測物O所生成的螢光光束FLi的主要發光光譜的範圍也會有所差異,因此,檢測裝置100亦可通過位於容置框架120與光檢測元件130之間的第二反射式光學薄膜元件142的配置,來執行步驟S130,依據檢測波段範圍,控制第二反射式光學薄膜元件142的濾光單元FU的共振腔的深度距離dx為第二深度距離,而藉此來濾除特定波段範圍外的雜訊光的訊號,並純化螢光光束的色純度,以純化螢光光束的特性,以提升檢測精度。Similarly, since the range of the main emission spectrum of the fluorescent light beam FLi generated by the object to be tested O is also different with the different types of fluorescent reagents, the detection device 100 can also be located between the accommodating frame 120 and the accommodating frame 120. The configuration of the second reflective optical thin film element 142 between the light detection elements 130 is performed to perform step S130, and according to the detection wavelength range, the depth distance dx of the resonant cavity of the filter unit FU of the second reflective optical thin film element 142 is controlled to be The second depth distance is used to filter out the signal of noise light outside the specific wavelength range, and to purify the color purity of the fluorescent beam, so as to purify the characteristics of the fluorescent beam, so as to improve the detection accuracy.

依照本發明的一種實施例,類似上方與控制第一反射式光學薄膜元件141的原理所述,如圖2與圖3B所示,當螢光光束FLi入射第二反射式光學薄膜元件142時,控制單元150控制第二反射式光學薄膜元件142的濾光單元FU的共振腔的深度距離dx為第二深度距離,且第二深度距離的值與檢測波段範圍的值相對應。According to an embodiment of the present invention, similar to the above and the principle of controlling the first reflective optical thin film element 141, as shown in FIG. 2 and FIG. 3B, when the fluorescent light beam FLi enters the second reflective optical thin film element 142, The control unit 150 controls the depth distance dx of the resonant cavity of the filter unit FU of the second reflective optical thin film element 142 to be the second depth distance, and the value of the second depth distance corresponds to the value of the detection wavelength range.

依照本發明的一種實施例,檢測波段範圍的值約可介於450奈米至730奈米之間以符合各種螢光試劑的規格需求,請參閱前文市售的螢光試劑的額定的吸收激發波長及其所產生的對應額定螢光波長的例子。並且,當不同的螢光試劑的規格所對應的額定螢光波長附近的波段範圍(即某一螢光波段範圍)為檢測波段範圍所涵蓋之波段範圍時,此螢光試劑即可適用於本檢測裝置100中,而藉由檢測裝置100通過控制單元150來控制第二反射式光學薄膜元件142的深度距離dx,進而純化螢光光束FLo的色純度,以純化螢光光束FLo的特性。According to an embodiment of the present invention, the value of the detection wavelength range can be approximately between 450 nm and 730 nm to meet the specifications of various fluorescent reagents. Please refer to the above-mentioned rated absorption excitation of commercially available fluorescent reagents. Examples of wavelengths and the corresponding nominal fluorescence wavelengths they produce. In addition, when the wavelength range near the rated fluorescent wavelength corresponding to the specifications of different fluorescent reagents (that is, a certain fluorescent wavelength range) is the wavelength range covered by the detection wavelength range, the fluorescent reagent can be applied to this product. In the detection device 100, the detection device 100 controls the depth distance dx of the second reflective optical thin film element 142 through the control unit 150, thereby purifying the color purity of the fluorescent light beam FLo and purifying the characteristics of the fluorescent light beam FLo.

再者,依據本發明之一實施例,該螢光波段範圍可以是包含額定螢光波長的40nm的範圍內;依據本發明之另一實施例,該螢光波段範圍可以是包含額定螢光波長的20nm的範圍內;依據本發明之又一實施例,該螢光波段範圍可以是包含額定螢光波長的10nm的範圍內;依據本發明之又一實施例,該螢光波段範圍可以是包含額定螢光波長的6nm的範圍內。此外,依據本發明之一實施例,該螢光波段範圍是以該額定螢光波長為中心而增減某一特定波長為其範圍,例如增減20nm,另例如增減10nm,又例如增減5nm,再例如增減3nm。茲舉上述市售的綠光(FAM)的額定激發波長494nm對應至額定螢光波長520nm為例說明,其螢光波段範圍可以是包含額定螢光波長520nm的40nm的範圍內(例如在485nm至525nm的範圍內,又例如在495nm至535nm的範圍內),又或可以是包含520nm的20nm的範圍內(例如在505nm至525nm的範圍內,又例如在515nm至535nm的範圍內),又或可以是包含520nm的10nm的範圍內(例如在515nm至525nm的範圍內),又或可以是包含520nm的6nm的範圍內(例如在518nm至524nm的範圍內);或者,該螢光波段範圍是以該額定螢光波長520nm為中心而增減某一特定波長為其範圍,例如增減20nm的範圍內(亦即在500nm至540nm的範圍內),又或增減10nm的範圍內(亦即在510nm至530nm的範圍內),又或增減5nm的範圍內(亦即在515nm至525nm的範圍內),又或增減3nm的範圍內(亦即在517nm至523nm的範圍內)。Furthermore, according to an embodiment of the present invention, the fluorescent wavelength range may be within a range of 40 nm including the rated fluorescent wavelength; according to another embodiment of the present invention, the fluorescent wavelength range may include the rated fluorescent wavelength According to another embodiment of the present invention, the fluorescent wavelength range can be within the range of 10 nm including the rated fluorescent wavelength; within the 6nm range of the rated fluorescence wavelength. In addition, according to an embodiment of the present invention, the range of the fluorescent wavelength range is centered on the rated fluorescent wavelength and a certain wavelength is increased or decreased as the range, such as increasing or decreasing by 20 nm, or by increasing or decreasing by 10 nm, or by increasing or decreasing 5nm, for example, increase or decrease by 3nm. The above-mentioned commercially available green light (FAM) has a rated excitation wavelength of 494 nm corresponding to a rated fluorescence wavelength of 520 nm as an example, and its fluorescence wavelength range can be within the range of 40 nm including the rated fluorescence wavelength of 520 nm (for example, from 485 nm to 520 nm). in the range of 525nm, for example in the range of 495nm to 535nm), or in the range of 20nm including 520nm (for example in the range of 505nm to 525nm, for example in the range of 515nm to 535nm), or It can be in the range of 10nm including 520nm (eg, in the range of 515nm to 525nm), or it can be in the range of 6nm including 520nm (eg, in the range of 518nm to 524nm); or, the fluorescence wavelength range is Taking the rated fluorescent wavelength 520nm as the center, increase or decrease a certain wavelength as the range, for example, within the range of 20nm (that is, within the range of 500nm to 540nm), or within the range of 10nm (that is, within the range of increase or decrease) In the range of 510nm to 530nm), or in the range of 5nm (that is, in the range of 515nm to 525nm), or in the range of 3nm (that is, in the range of 517nm to 523nm).

並且當需要螢光光束FLo具有特定的主發光波長時,則可對第二深度距離進行進一步地限定。例如,當需要螢光光束FLo的主發光波長(即檢測波長)為520奈米左右時,可控制第二深度距離為與520奈米相對應的一值而達成此目的;又如,當需要螢光光束FLo的主發光波長(即檢測波長)為573奈米左右時,可控制第二深度距離為與573奈米相對應的另一值而達成此目的,以此類推。如此,只要調整第二深度距離的大小,就可得到所需的螢光光束FLo。再者,市售的螢光試劑的吸收激發波長及其所產生的對應螢光波長如先前所述,則依據本發明之一實施例,可以調整第二反射式光學薄膜元件142的濾光單元FU的共振腔的第二深度距離的不同大小,即可在其中兩種、三種、四種或以上不同色光的螢光波長之間切換,類似於調整第一反射式光學薄膜元件141的濾光單元FU的共振腔的第二深度距離的情形。And when the fluorescent light beam FLo is required to have a specific main emission wavelength, the second depth distance can be further defined. For example, when the main emission wavelength (ie detection wavelength) of the fluorescent light beam FLo is required to be about 520 nanometers, the second depth distance can be controlled to a value corresponding to 520 nanometers to achieve this purpose; When the main emission wavelength (ie the detection wavelength) of the fluorescent light beam FLo is about 573 nm, the second depth distance can be controlled to another value corresponding to 573 nm to achieve this purpose, and so on. In this way, as long as the size of the second depth distance is adjusted, the desired fluorescent light beam FLo can be obtained. Furthermore, the absorption excitation wavelengths of commercially available fluorescent reagents and the corresponding fluorescence wavelengths generated by them are as described above. According to an embodiment of the present invention, the filter unit of the second reflective optical thin film element 142 can be adjusted Different sizes of the second depth distance of the resonant cavity of the FU can switch between the fluorescence wavelengths of two, three, four or more different colors of light, which is similar to adjusting the filter of the first reflective optical thin film element 141 The case of the second depth distance of the resonant cavity of the unit FU.

接著,請參照圖2與圖3G,控制單元150可執行步驟S140,偵測主發光波長落於檢測波段範圍的螢光光束FLo的光強度,並將其轉換成電訊號進行後續分析。2 and 3G, the control unit 150 may perform step S140 to detect the light intensity of the fluorescent light beam FLo whose main emission wavelength falls within the detection wavelength range, and convert it into an electrical signal for subsequent analysis.

依照本發明的一種實施例,控制單元150可依據待測物O中帶有的螢光試劑種類的主要發光光譜的波段範圍,來設定第二深度距離的值,即可濾除特定波段範圍外的雜訊光的訊號,並純化螢光光束FLo的特性,而不需設置由帶通濾鏡組成的濾光模組,並且控制單元150僅需調整第二反射式光學薄膜元件142的第二深度距離,就可支援多種不同的螢光試劑種類的檢測,因此易於進行設備的更新與擴充。此外,由於在進行多種不同的螢光試劑種類的檢測時,不同的待測物O所形成的螢光光束FLo可共用同一光路,因此也能簡化光路與減少生產組裝的複雜性,進而減少產品成本以及提升生產品質。According to an embodiment of the present invention, the control unit 150 can set the value of the second depth distance according to the wavelength range of the main luminescence spectrum of the fluorescent reagent type contained in the object to be tested O, which can filter out the specific wavelength range. signal of noise light, and purify the characteristics of the fluorescent light beam FLo, without setting up a filter module composed of a band-pass filter, and the control unit 150 only needs to adjust the second reflective optical thin film element 142. The depth distance can support the detection of a variety of different types of fluorescent reagents, so it is easy to update and expand the equipment. In addition, since the fluorescent light beams FLo formed by different analytes O can share the same optical path during the detection of various types of fluorescent reagents, the optical path can also be simplified and the complexity of production and assembly can be reduced, thereby reducing the number of products. cost and improve production quality.

值得注意的是,在上述的實施例中,控制單元150控制至少一反射式光學薄膜元件140的第一反射式光學薄膜元件141與第二反射式光學薄膜元件142的控制方式雖以調整至少一反射式光學薄膜元件140的濾光單元FU的共振腔的深度距離dx的大小為例示,但本發明不以此為限。以下將另舉部分實施例作為說明。It should be noted that, in the above-mentioned embodiment, the control unit 150 controls the control method of the first reflective optical thin film element 141 and the second reflective optical thin film element 142 of the at least one reflective optical thin film element 140 to adjust at least one The size of the depth distance dx of the resonant cavity of the filter unit FU of the reflective optical thin film element 140 is an example, but the present invention is not limited to this. Some examples will be given below for illustration.

圖5A是圖2的反射式光學薄膜元件的另一種實施例的正視示意圖。圖5B是圖5A的反射式光學薄膜元件的不同的反射式濾光單元FU1、FU2、FU3的一種實施例示意圖。圖5C是採用圖5A的反射式光學薄膜元件時的一種檢測方法的流程示意圖。請參照圖5A至圖5C,反射式光學薄膜元件540與圖1的反射式光學薄膜元件140類似,其主要差異如下所述。如圖5A所示,在本實施例中,至少一反射式光學薄膜元件540的第一反射式光學薄膜元件541以及第二反射式光學薄膜元件542分別包括多個濾光區域FR1、濾光區域FR2、濾光區域FR3,多個濾光區域FR1、濾光區域FR2、濾光區域FR3的反射式濾光單元FU1、反射式濾光單元FU2、反射式濾光單元FU3各自的共振腔的作動深度距離d1、作動深度距離d2、作動深度距離d3分別為固定值,係為該反射式濾光單元開啟狀態時(非關閉狀態時)而可以進行濾光反射時之深度距離,而位於相同濾光區域FR1(或是濾光區域FR2、濾光區域FR3)的反射式濾光單元FU1(或是反射式濾光單元FU2、反射式濾光單元FU3)的共振腔的作動深度距離d1(或是深度距離d2、深度距離d3)彼此相同,且位於不同的濾光區域FR1、濾光區域FR2、濾光區域FR3的反射式濾光單元FU1、反射式濾光單元FU2、反射式濾光單元FU3的共振腔的作動深度距離d1、作動深度距離d2、作動深度距離d3彼此不同。請注意,由於圖5A是反射式光學薄膜元件540的示意圖,因而分別例示了第一反射式光學薄膜元件541以及第二反射式光學薄膜元件542,惟,第一反射式光學薄膜元件541的作動深度距離d1(或深度距離d2、深度距離d3)與第二反射式光學薄膜元件542的作動深度距離d1(或深度距離d2、深度距離d3)並不需要相同而可以不同,且兩者經常是不同的,因為通常一螢幕試劑的吸收光線波長較短而其放射螢光波長較長,故若用同一規格的兩個反射式濾光單元的部件時,需要不同的作動深度距離設定來得到不同波長的濾光效果。舉例而言,如前述綠光(FAM)是激發波長494nm而螢光波長520nm,且其分別對應的是第一反射式光學薄膜元件541的濾光區域FR1與第二反射式光學薄膜元件542的濾光區域FR1,則對於同一規格部件的第一反射式光學薄膜元件541的濾光區域FR1的作動深度距離d1(第一深度距離)與第二反射式光學薄膜元件542的濾光區域FR1的作動深度距離d1(第二深度距離)並不相同。FIG. 5A is a schematic front view of another embodiment of the reflective optical thin film element of FIG. 2 . FIG. 5B is a schematic diagram of an embodiment of different reflective filter units FU1 , FU2 , and FU3 of the reflective optical thin film element of FIG. 5A . FIG. 5C is a schematic flowchart of a detection method when the reflective optical thin film element of FIG. 5A is used. Referring to FIGS. 5A to 5C , the reflective optical thin film element 540 is similar to the reflective optical thin film element 140 of FIG. 1 , and the main differences are as follows. As shown in FIG. 5A , in this embodiment, the first reflective optical thin film element 541 and the second reflective optical thin film element 542 of the at least one reflective optical thin film element 540 respectively include a plurality of filter regions FR1 and filter regions FR2, filter region FR3, the respective resonant cavities of the plurality of filter regions FR1, filter region FR2, filter region FR3, reflective filter unit FU1, reflective filter unit FU2, and reflective filter unit FU3 The depth distance d1, the actuation depth distance d2, and the actuation depth distance d3 are fixed values, respectively, which are the depth distances when the reflective filter unit is in the open state (not in the closed state) and can perform filter reflection. The operating depth distance d1 (or It is the reflective filter unit FU1, the reflective filter unit FU2, and the reflective filter unit that are located in different filter regions FR1, FR2, and FR3 with the same depth distance d2 and depth distance d3). The operating depth distance d1, the operating depth distance d2, and the operating depth distance d3 of the resonant cavity of the FU3 are different from each other. Please note that since FIG. 5A is a schematic diagram of the reflective optical thin film element 540 , the first reflective optical thin film element 541 and the second reflective optical thin film element 542 are respectively illustrated, but the operation of the first reflective optical thin film element 541 The depth distance d1 (or depth distance d2, depth distance d3) and the actuation depth distance d1 (or depth distance d2, depth distance d3) of the second reflective optical thin film element 542 do not need to be the same but can be different, and the two are often the same. Differently, because the absorption light wavelength of a screen reagent is usually shorter and its emission fluorescence wavelength is longer, so if two reflective filter units of the same specification are used, different operating depth and distance settings are required to obtain different results. Wavelength filter effect. For example, the green light (FAM) has an excitation wavelength of 494 nm and a fluorescence wavelength of 520 nm, and they correspond to the filter region FR1 of the first reflective optical thin film element 541 and the filter region FR1 of the second reflective optical thin film element 542 respectively. The filter region FR1 is the difference between the operating depth distance d1 (first depth distance) of the filter region FR1 of the first reflective optical film element 541 and the filter region FR1 of the second reflective optical film element 542 of the same specification. The actuation depth distance d1 (the second depth distance) is not the same.

並且,控制單元150還可控制至少一反射式光學薄膜元件540中位於不同的濾光區域的反射式濾光單元FU1、反射式濾光單元FU2、反射式濾光單元FU3的開啟或關閉,來進一步調整激發光束ELo與螢光光束FLo的主發光波長的範圍,以使激發光束ELo的主發光波長能落於激發波段範圍內及/或螢光光束FLo的主發光波長能落於檢測波段範圍內。以下將針對控制單元150如何執行圖5C的檢測方法進行進一步的解說。請參照圖5C,在本實施例中,圖5C的檢測方法例如可利用圖1與圖2中的檢測裝置100來執行。In addition, the control unit 150 can also control the opening or closing of the reflective filter unit FU1, the reflective filter unit FU2, and the reflective filter unit FU3 located in different filter regions in the at least one reflective optical thin film element 540, to Further adjusting the range of the main emission wavelengths of the excitation light beam ELo and the fluorescent light beam FLo, so that the main emission wavelength of the excitation light beam ELo can fall within the excitation wavelength range and/or the main emission wavelength of the fluorescent light beam FLo can fall within the detection wavelength range. Inside. How the control unit 150 performs the detection method of FIG. 5C will be further explained below. Referring to FIG. 5C , in this embodiment, the detection method of FIG. 5C can be performed by, for example, the detection apparatus 100 shown in FIGS. 1 and 2 .

首先,執行步驟S110,執行步驟S110的方式與圖3G的控制方法相同,在此就不再贅述。First, step S110 is executed, and the manner of executing step S110 is the same as that of the control method in FIG. 3G , which will not be repeated here.

接著,執行步驟S520,控制單元150依據激發波段範圍,控制位於第一濾光區域的反射式濾光單元處於開啟狀態,並控制位於第一濾光區域外的其他濾光區域的反射式濾光單元處於關閉狀態,以使待測物接收到主發光波長落於激發波段範圍的激發光束ELo而產生螢光光束FLi,其中位於第一濾光區域的反射式濾光單元的共振腔的深度距離為第一深度距離而為作動深度距離。Next, step S520 is executed, the control unit 150 controls the reflective filter unit located in the first filter area to be in an on state according to the excitation wavelength range, and controls the reflective filter units located in other filter areas outside the first filter area The unit is turned off, so that the object to be tested receives the excitation beam ELo with the main emission wavelength falling within the excitation wavelength range to generate the fluorescent beam FLi, wherein the depth distance of the resonant cavity of the reflective filter unit located in the first filter area is the first depth distance and is the actuation depth distance.

依照本發明的一種實施例,控制單元150控制第一反射式光學薄膜元件541的反射式濾光單元FU1(或是反射式濾光單元FU2、反射式濾光單元FU3)處於關閉狀態的方式例如是以靜電施加於反射式濾光單元FU1(或是反射式濾光單元FU2、反射式濾光單元FU3)的共振腔,此時形成第一反射式光學薄膜元件541的反射式濾光單元FU1(或是反射式濾光單元FU2、反射式濾光單元FU3)的第一界面S1與第二界面S2的反射薄膜會塌陷,造成這些處於關閉狀態的反射式濾光單元FU1(或是反射式濾光單元FU2、反射式濾光單元FU3)的共振腔的深度距離變得非常窄,如此,能通過這些處於關閉狀態的反射式濾光單元FU1(或是反射式濾光單元FU2、反射式濾光單元FU3)的出射光束OL的波長就變得非常短,而會落在激發波段範圍外或是落在檢測波段範圍外,且其強度也會衰減。換言之,當入射光束IL入射處於關閉狀態的第一反射式光學薄膜元件541的這些反射式濾光單元FU1(或是反射式濾光單元FU2、反射式濾光單元FU3)時,可以被濾除。如此,當第一反射式光學薄膜元件541中位於某一濾光區域(例如:第一濾光區域)的反射式濾光單元被設定於處於開啟狀態的話,也就會只有通過該一濾光區域(即:第一濾光區域)的反射式濾光單元的激發光束能夠成為第一反射式光學薄膜元件541的出射光束OL,並且,由於本實施例的第一反射式光學薄膜元件541中位於第一濾光區域的濾光單元的共振腔的作動深度距離為第一深度距離,而第一深度距離的值與激發波段範圍的值相對應,因此激發光束ELo的主發光波長能落於激發波段範圍。According to an embodiment of the present invention, the control unit 150 controls the reflective filter unit FU1 (or the reflective filter unit FU2 and the reflective filter unit FU3) of the first reflective optical thin film element 541 to be in an off state, for example, Static electricity is applied to the resonant cavity of the reflective filter unit FU1 (or the reflective filter unit FU2, the reflective filter unit FU3), and the reflective filter unit FU1 of the first reflective optical thin film element 541 is formed at this time. (or the reflective filter unit FU2 and the reflective filter unit FU3) the reflective films on the first interface S1 and the second interface S2 will collapse, causing these reflective filter units FU1 (or the reflective filter unit FU1) in the closed state to collapse. The depth distance of the resonant cavity of the filter unit FU2, the reflective filter unit FU3) becomes very narrow, so that the reflective filter unit FU1 (or the reflective filter unit FU2, the reflective filter unit FU1, the reflective filter unit FU2, the reflective filter unit FU1, the The wavelength of the outgoing light beam OL of the filter unit FU3) becomes very short, and falls outside the excitation band range or the detection band range, and its intensity will also be attenuated. In other words, when the incident light beam IL is incident on the reflective filter units FU1 (or the reflective filter unit FU2 and the reflective filter unit FU3 ) of the first reflective optical thin film element 541 in the off state, it can be filtered out. . In this way, when the reflective filter unit located in a certain filter area (for example, the first filter area) in the first reflective optical thin film element 541 is set to be in an on state, only the filter unit will pass through the filter. The excitation light beam of the reflective filter unit in the region (ie: the first filter region) can become the outgoing light beam OL of the first reflective optical thin film element 541, and since the first reflective optical thin film element 541 in this embodiment The action depth distance of the resonant cavity of the filter unit located in the first filter area is the first depth distance, and the value of the first depth distance corresponds to the value of the excitation wavelength range, so the main emission wavelength of the excitation beam ELo can fall within Excitation band range.

更具體而言,在本實施例中,控制單元150能夠基於激發波段範圍,來選擇第一反射式光學薄膜元件541的濾光區域FR1、濾光區域FR2、濾光區域FR3的其中一者為第一反射式濾光區域,亦即選擇作動深度距離d1、作動深度距離d2、作動深度距離d3的其中一者來做為第一深度距離。如此,控制單元150即可透過第一反射式光學薄膜元件541的濾光區域FR1、濾光區域FR2、濾光區域FR3的選取來對第一深度距離進行設定,並藉此使激發光束ELo的主發光波長能落於激發波段範圍。More specifically, in this embodiment, the control unit 150 can select one of the filter region FR1 , the filter region FR2 and the filter region FR3 of the first reflective optical thin film element 541 based on the excitation wavelength range to be In the first reflective filter area, one of the actuation depth distance d1, the actuation depth distance d2, and the actuation depth distance d3 is selected as the first depth distance. In this way, the control unit 150 can set the first depth distance through the selection of the filter region FR1 , the filter region FR2 and the filter region FR3 of the first reflective optical thin film element 541 , and thereby make the excitation beam ELo The main emission wavelength can fall within the excitation wavelength range.

根據本發明之一實施例,第一反射式光學薄膜元件541的濾光區域FR1的作動深度d1距離大於濾光區域FR2的作動深度距離d2以及濾光區域FR3的作動深度距離d3,因此當所需的激發波段範圍的值較大時,可選擇具有較大的作動深度距離d1的濾光區域FR1來作為第一濾光區域;反之,當所需的激發波段範圍的值較小時,可選擇具有較小的作動深度距離d2的濾光區域FR2或具有作動深度距離d3的濾光區域FR3來作為第一濾光區域。根據本發明之另一實施例,濾光區域FR3的作動深度距離小於濾光區域FR1的作動深度距離d1以及濾光區域FR2的作動深度距離d2,因此當所需的激發波段範圍的值較小時,可選擇具有較小的深度距離d3的濾光區域FR3來作為第一濾光區域;反之,當所需的激發波段範圍的值較大時,可選擇具有較大的深度距離d1的濾光區域FR1或具有深度距離d2的濾光區域FR2來作為第一濾光區域。如此,只要選擇適當的濾光區域,就可得到所需的激發光束ELo。According to an embodiment of the present invention, the operating depth d1 of the filter region FR1 of the first reflective optical thin film element 541 is larger than the operating depth d2 of the filter region FR2 and the operating depth d3 of the filter region FR3, so when the When the value of the required excitation wavelength range is large, the filter region FR1 with a larger operating depth distance d1 can be selected as the first filter region; on the contrary, when the value of the required excitation wavelength range is small, the filter region FR1 can be selected as the first filter region. The filter region FR2 with the smaller actuation depth distance d2 or the filter region FR3 with the actuation depth distance d3 is selected as the first filter region. According to another embodiment of the present invention, the action depth distance of the filter region FR3 is smaller than the action depth distance d1 of the filter region FR1 and the action depth distance d2 of the filter region FR2, so when the required excitation wavelength range is smaller , the filter region FR3 with a smaller depth distance d3 can be selected as the first filter region; on the contrary, when the value of the required excitation wavelength range is larger, a filter region with a larger depth distance d1 can be selected. The light region FR1 or the filter region FR2 with the depth distance d2 is used as the first filter region. In this way, as long as an appropriate filter region is selected, the desired excitation beam ELo can be obtained.

接著,執行步驟S530,根據本發明之一實施例,控制單元150依據檢測波段範圍,控制位於第二反射式光學薄膜元件542的第二濾光區域的反射式濾光單元處於開啟狀態,並控制位於第二濾光區域外的其他濾光區域的反射式濾光單元處於關閉狀態,其中位於第二濾光區域的反射式濾光單元的共振腔的深度距離為第二深度距離。Next, step S530 is executed. According to an embodiment of the present invention, the control unit 150 controls the reflective filter unit located in the second filter region of the second reflective optical thin film element 542 to be in an on state according to the detection wavelength range, and controls The reflective filter units located in other filter areas outside the second filter area are in an off state, wherein the depth distance of the resonant cavity of the reflective filter units located in the second filter area is the second depth distance.

類似地,由於位於第二濾光區域外的其他濾光區域的反射式濾光單元處於關閉狀態,因此,就只有通過第二濾光區域的反射式濾光單元的螢光光束FLo能夠成為第二反射式光學薄膜元件542的出射光束OL,並且,由於位於第二濾光區域的反射式濾光單元的共振腔的深度距離為第二深度距離,而第二深度距離的值與檢測波段範圍的值相對應,因此螢光光束FLo的主發光波長能落於檢測波段範圍。Similarly, since the reflective filter units in other filter areas outside the second filter area are in a closed state, only the fluorescent light beam FLo passing through the reflective filter units in the second filter area can become the first filter unit. The outgoing beams OL of the two reflective optical thin film elements 542, and since the depth distance of the resonant cavity of the reflective filter unit located in the second filter region is the second depth distance, and the value of the second depth distance is related to the detection band range The value of , so the main emission wavelength of the fluorescent light beam FLo can fall within the detection band range.

根據本發明之一實施例,在本實施例中,控制單元150也可基於檢測波段範圍,來選擇濾光區域FR1、濾光區域FR2、濾光區域FR3的其中一者作為第二濾光區域,亦即選作動擇深度距離d1、作動深度距離d2、作動深度距離d3的其中一者來做為第二深度距離。如此,控制單元150也可透過濾光區域的選取來對第二深度距離進行設定,並藉此使螢光光束FLo的主發光波長能落於檢測波段範圍。如此,只要選擇具有適當作動深度距離的濾光區域,就可得到所需的螢光光束FLo。根據本發明之另一實施例,當一第一待測物的第一螢光試劑所適合的激發光譜落於第一激發波段範圍(第一螢光試劑適合的激發波段範圍)及其所發出的螢光其主發光波長落於第一檢測波段範圍(第一螢光試劑適合的檢測波段範圍)時,可以將第一反射式光學薄膜元件541的濾光區域FR1的反射式濾光單元FU1設置成其主發光波長至少部份落於第一激發波段範圍,且可以將第二光反射式學薄膜元件542的濾光區域FR1的反射式濾光單元FU1設置成其主發光波長至少部份落於第一檢測波段範圍;當一第二待測物的第二螢光試劑所適合的激發光譜落於第二激發波段範圍(第二螢光試劑適合的激發波段範圍)及其所發出的螢光其主發光波長落於第二檢測波段範圍(第二螢光試劑適合的檢測波段範圍)時,可以將第一反射式光學薄膜元件541的濾光區域FR2的反射式濾光單元FU2設置成其主發光波長至少部份落於第二激發波段範圍,且可以將第二反射式光學薄膜元件542的濾光區域FR2的反射式濾光單元FU2設置成其主發光波長至少部份落於第二檢測波段範圍;當一第三待測物的第三螢光試劑所適合的激發光譜落於第三激發波段範圍(第三螢光試劑適合的激發波段範圍)及其所發出的螢光其主發光波長落於第三檢測波段範圍(第三螢光試劑適合的檢測波段範圍)時,可以將第一反射式光學薄膜元件541的濾光區域FR3的反射式濾光單元FU3設置成其主發光波長至少部份落於第三激發波段範圍,且可以將第二反射式光學薄膜元件542的濾光區域FR3的反射式濾光單元FU3設置成其主發光波長至少部份落於第三檢測波段範圍;其中該第一螢光試劑、該第二螢光試劑與該第三螢光試劑係為不同之螢光試劑。根據本發明之又一實施例,該等第一激發波段範圍(第一螢光試劑適合的激發波段範圍)、第二激發波段範圍(第二螢光試劑適合的激發波段範圍)以及第三激發波段範圍(第三螢光試劑適合的激發波段範圍)、及其所分別對應的該等第一檢測波段範圍(第一螢光試劑適合的檢測波段範圍)、第二檢測波段範圍(第二螢光試劑適合的檢測波段範圍)以及第三檢測波段範圍(第三螢光試劑適合的檢測波段範圍),可以分別設置或設定其反射式濾光單元的共振腔深度距離而達成。According to an embodiment of the present invention, in this embodiment, the control unit 150 may also select one of the filter region FR1, the filter region FR2, and the filter region FR3 as the second filter region based on the detection wavelength range. , that is, one of the action selection depth distance d1, the action depth distance d2, and the action depth distance d3 is selected as the second depth distance. In this way, the control unit 150 can also set the second depth distance through the selection of the filter region, thereby enabling the main emission wavelength of the fluorescent light beam FLo to fall within the detection wavelength range. In this way, the desired fluorescent light beam FLo can be obtained as long as a filter region with an appropriate operating depth distance is selected. According to another embodiment of the present invention, when the excitation spectrum suitable for the first fluorescent reagent of a first analyte falls within the first excitation wavelength range (the suitable excitation wavelength range for the first fluorescent reagent) and the emission When the main emission wavelength of the fluorescent light falls within the first detection wavelength range (the detection wavelength range suitable for the first fluorescent reagent), the reflective filter unit FU1 of the filter region FR1 of the first reflective optical thin film element 541 can be The reflective filter unit FU1 of the filter region FR1 of the second light reflective thin film element 542 can be set so that its main emission wavelength at least partially falls within the first excitation wavelength range It falls within the first detection wavelength range; when the excitation spectrum suitable for the second fluorescent reagent of a second analyte falls within the second excitation wavelength range (the suitable excitation wavelength range for the second fluorescent reagent) and its emission When the main emission wavelength of the fluorescence falls within the second detection wavelength range (the detection wavelength range suitable for the second fluorescent reagent), the reflective filter unit FU2 in the filter region FR2 of the first reflective optical thin film element 541 can be set So that its main emission wavelength at least partially falls within the second excitation wavelength range, and the reflective filter unit FU2 in the filter region FR2 of the second reflective optical thin film element 542 can be set so that its main emission wavelength at least partially falls within The second detection wavelength range; when the excitation spectrum suitable for the third fluorescent reagent of a third analyte falls within the third excitation wavelength range (the suitable excitation wavelength range for the third fluorescent reagent) and the fluorescence emitted by it When its main emission wavelength falls within the third detection wavelength range (the detection wavelength range suitable for the third fluorescent reagent), the reflective filter unit FU3 of the filter region FR3 of the first reflective optical thin film element 541 can be set to its The main emission wavelength at least partially falls within the third excitation wavelength range, and the reflective filter unit FU3 in the filter region FR3 of the second reflective optical thin film element 542 can be set so that its main emission wavelength at least partially falls within the third excitation wavelength range. Detection wavelength range; wherein the first fluorescent reagent, the second fluorescent reagent and the third fluorescent reagent are different fluorescent reagents. According to another embodiment of the present invention, the first excitation wavelength range (excitation wavelength range suitable for the first fluorescent reagent), the second excitation wavelength range (excitation wavelength range suitable for the second fluorescent reagent) and the third excitation wavelength range The wavelength range (the suitable excitation wavelength range for the third fluorescent reagent), and the corresponding first detection wavelength ranges (the suitable detection wavelength range for the first fluorescent reagent), the second detection wavelength range (the second fluorescent reagent The detection wavelength range suitable for the photoreagent) and the third detection wavelength range (the detection wavelength range suitable for the third fluorescent reagent) can be achieved by setting or setting the resonant cavity depth distance of the reflective filter unit respectively.

接著,請參照圖2與圖5C,控制單元150可執行步驟S140,偵測主發光波長落於檢測波段範圍的螢光光束FL的光強度,並將其轉換成電訊號進行後續分析。2 and 5C, the control unit 150 may perform step S140 to detect the light intensity of the fluorescent light beam FL whose main emission wavelength falls within the detection wavelength range, and convert it into an electrical signal for subsequent analysis.

此外,值得注意的是,雖然第一反射式光學薄膜元件541與第二反射式光學薄膜元件542的濾光區域及其所包含的反射式濾光單元分別皆利用同一個圖(圖5A)來說明,但是第一反射式光學薄膜元件541與第二反射式光學薄膜元件542是兩個不同的元件,因而第一光學薄膜元件541的濾光區域FR1、濾光區域FR2、濾光區域FR3與第二光學薄膜元件542濾光區域FR1、濾光區域FR2、濾光區域FR3之形狀、大小、共振腔深度距離與排列並不需要相同,且其各自的反射式濾光單元FU1、反射式濾光單元FU2、反射式濾光單元FU3之形狀、大小、排列、共振腔深度距離、數量與光學特性也不需要相同。再者,如圖5B所示,至少一反射式光學薄膜元件540的第一反射式光學薄膜元件541以及第二反射式光學薄膜元件542的濾光區域的數量雖以三個為例示,但本發明不以此為限;根據本發明之另一實施例,該至少一反射式光學薄膜元件540的第一反射式光學薄膜元件541以及第二反射式光學薄膜元件542的濾光區域及其所包含的反射式濾光單元的數量可以為二個、四個、五個或六個或更多個。在其他的實施例中,亦可視螢光試劑種類的數量來決定至少一反射式光學薄膜元件540的濾光區域及其所包含的反射式濾光單元的數量,並再視螢光試劑種類的特性來同時調整各濾光區域的深度距離的設定值以符合實際產品的需求。In addition, it is worth noting that although the filter regions of the first reflective optical thin film element 541 and the second reflective optical thin film element 542 and the reflective filter units included in them use the same diagram ( FIG. 5A ) to However, the first reflective optical thin film element 541 and the second reflective optical thin film element 542 are two different elements, so the filter region FR1, filter region FR2, filter region FR3 of the first optical thin film element 541 and The second optical thin film element 542 does not need to be the same in shape, size, cavity depth, distance and arrangement of the filter region FR1, filter region FR2, filter region FR3, and its respective reflective filter unit FU1, reflective filter The shape, size, arrangement, depth, distance, quantity and optical characteristics of the optical unit FU2 and the reflective filter unit FU3 do not need to be the same. Furthermore, as shown in FIG. 5B , although the number of filter regions of the first reflective optical thin film element 541 and the second reflective optical thin film element 542 of the at least one reflective optical thin film element 540 is exemplified by three, the present The invention is not limited to this; according to another embodiment of the present invention, the filter regions of the first reflective optical thin film element 541 and the second reflective optical thin film element 542 of the at least one reflective optical thin film element 540 and the filter regions thereof are not limited thereto. The number of included reflective filter units may be two, four, five or six or more. In other embodiments, the filter area of the at least one reflective optical thin film element 540 and the number of reflective filter units included in the filter area can also be determined according to the number of fluorescent reagent types, and then the number of fluorescent reagent types can be determined. Features to adjust the depth distance of each filter area at the same time to meet the needs of the actual product.

,當反射式光學薄膜元件540的第一反射式光學薄膜元件541及/或第二反射式光學薄膜元件542被採用至檢測裝置100時,檢測裝置100的控制單元150也可依據待測物O中帶有的螢光試劑種類所需的激發光束ELo的適合波段範圍(即激發波段範圍)或待測物O所生成的螢光光束FLo的主要發光光譜的範圍(即檢測波段範圍),來選取適當的第一反射式光學薄膜元件541的濾光區域及/或第二反射式光學薄膜元件542的濾光區域處於開啟狀態,並藉此使激發光束ELi或螢光光束FLi能通過具有適當深度距離的濾光區域,以藉此形成所需的激發光束ELo及/或螢光光束FLo。如此,檢測裝置100即可支援多種不同的螢光試劑種類的檢測,因此也不需設置由帶通濾鏡組成的濾光模組,而易於進行設備的更新與擴充,進而達到前述的檢測裝置100的效果與優點,在此就不再贅述。, when the first reflective optical thin film element 541 and/or the second reflective optical thin film element 542 of the reflective optical thin film element 540 are used in the detection device 100, the control unit 150 of the detection device 100 can also The suitable wavelength range of the excitation beam ELo (ie the excitation wavelength range) required by the type of fluorescent reagent contained in it or the range of the main luminescence spectrum of the fluorescent beam FLo generated by the object to be tested (ie the detection wavelength range), to Select the appropriate filter area of the first reflective optical thin film element 541 and/or the filter area of the second reflective optical thin film element 542 to be in an open state, so that the excitation beam ELi or the fluorescent beam FLi can pass through the The filter area of the depth distance to thereby form the desired excitation beam ELo and/or fluorescent beam FLo. In this way, the detection device 100 can support the detection of a variety of different types of fluorescent reagents, so there is no need to set up a filter module composed of a band-pass filter, and it is easy to update and expand the equipment, thereby achieving the aforementioned detection device. The effects and advantages of 100 will not be repeated here.

雖然依照圖1與圖2的實施例的檢測裝置100包括發光元件110、容置框架120、光檢測元件130以及至少一反射式光學薄膜元件140,且所述至少一反射式光學薄膜元件140包括第一反射式光學薄膜元件141與一第二反射式光學薄膜元件142,但是依照本發明的另一實施例,所述至少一反射式光學薄膜元件140僅包括所述第一反射式光學薄膜元件141或僅包括所述第二反射式光學薄膜元件142中之一者。依照本發明的一實施例,在所述至少一反射式光學薄膜元件140僅包括所述第一反射式光學薄膜元件141而不包括所述第二反射式光學薄膜元件142的實施中(圖未示),只要待測物O的螢光光束的品質夠好或螢光通道的光路設計夠好或是有其他原因而能使光檢測元件130所檢測到的光線符合規格的話,就可以正確地進行檢測,則亦有改善現有技術的缺點的效果;此時螢光通道係由發光元件110、第一反射式光學薄膜元件141、容置框架120(或其待測物O)、光檢測元件130之間的各段光路所構成。依照本發明的又一實施例,在所述至少一反射式光學薄膜元件140僅包括所述第一反射式光學薄膜元件141而不包括所述第二反射式光學薄膜元件142的實施中(圖未示),亦可以包括一習知的帶通濾光片(圖未示)來取代圖1與圖2的實施例中所述第二反射式光學薄膜元件142以濾除檢測波段範圍以外的光線,則亦有改善現有技術的缺點的效果;此時螢光通道係由發光元件110、第一反射式光學薄膜元件141、容置框架120(或其待測物O)、帶通濾光片 (圖未示)、光檢測元件130之間的各段光路所構成。依照本發明的一實施例,在所述至少一反射式光學薄膜元件140僅包括所述第二反射式光學薄膜元件142而不包括所述第一反射式光學薄膜元件141的實施中,只要發光元件110的激發光束的品質夠好或待測物O的螢光光束的品質夠好或螢光通道的光路設計夠好或是有其他原因而能使光檢測元件130所檢測到的光線符合規格的話,就可以正確地進行檢測,則亦有改善現有技術的缺點的效果;此時螢光通道係由發光元件110、容置框架120(或其待測物O)、第二反射式光學薄膜元件142、光檢測元件130之間的各段光路所構成。依照本發明的又一實施例,在所述至少一反射式光學薄膜元件140僅包括所述第二反射式光學薄膜元件142而不包括所述第一反射式光學薄膜元件141的實施中(圖未示),亦可以包括一習知的帶通濾光片(圖未示)來取代圖1與圖2的實施例中所述第一反射式光學薄膜元件141以濾除激發波段範圍以外的光線,則亦有改善現有技術的缺點的效果;此時螢光通道係由發光元件110、帶通濾光片(圖未示)、容置框架120(或其待測物O)、第二反射式光學薄膜元件142、光檢測元件130之間的各段光路所構成。雖然上述提及的檢測裝置100的實施例係包括至少一反射式光學薄膜元件140,且所述至少一反射式光學薄膜元件140包括第一反射式光學薄膜元件141與一第二反射式光學薄膜元件142,但是依照本發明的另一實施例,將前述實施例中的至少一反射式光學薄膜元件140、第一反射式光學薄膜元件141與一第二反射式光學薄膜元件142分別替換為至少一反射式光學薄膜元件540、第一反射式光學薄膜元件541與一第二反射式光學薄膜元件542亦能成立。Although the detection device 100 according to the embodiment of FIG. 1 and FIG. 2 includes a light-emitting element 110 , an accommodating frame 120 , a light detection element 130 and at least one reflective optical thin film element 140 , and the at least one reflective optical thin film element 140 includes The first reflective optical thin film element 141 and the second reflective optical thin film element 142, but according to another embodiment of the present invention, the at least one reflective optical thin film element 140 only includes the first reflective optical thin film element 141 or only one of the second reflective optical thin film elements 142 is included. According to an embodiment of the present invention, in the implementation in which the at least one reflective optical thin film element 140 only includes the first reflective optical thin film element 141 and does not include the second reflective optical thin film element 142 (not shown in the figure) (shown), as long as the quality of the fluorescent beam of the object to be tested O is good enough or the optical path design of the fluorescent channel is good enough or there are other reasons to make the light detected by the photodetecting element 130 meet the specifications, it can be correctly It also has the effect of improving the shortcomings of the prior art. At this time, the fluorescent channel is composed of the light emitting element 110, the first reflective optical thin film element 141, the accommodating frame 120 (or the object to be tested O), and the light detecting element. 130 between each section of the optical path is formed. According to yet another embodiment of the present invention, in the implementation in which the at least one reflective optical thin film element 140 includes only the first reflective optical thin film element 141 but not the second reflective optical thin film element 142 (Fig. (not shown), a conventional band-pass filter (not shown) may also be included to replace the second reflective optical thin film element 142 in the embodiment of FIG. 1 and FIG. 2 to filter out the detection wavelength range. It also has the effect of improving the shortcomings of the prior art; at this time, the fluorescent channel is composed of the light-emitting element 110, the first reflective optical thin film element 141, the accommodating frame 120 (or the object to be tested O), the band-pass filter It is constituted by each section of optical path between the chip (not shown in the figure) and the light detection element 130 . According to an embodiment of the present invention, in the implementation in which the at least one reflective optical thin film element 140 only includes the second reflective optical thin film element 142 and does not include the first reflective optical thin film element 141, as long as the light is emitted The quality of the excitation beam of the element 110 is good enough, the quality of the fluorescent beam of the object to be tested O is good enough, the optical path design of the fluorescent channel is good enough, or there are other reasons, so that the light detected by the light detection element 130 can meet the specifications If so, the detection can be performed correctly, which also has the effect of improving the shortcomings of the prior art; at this time, the fluorescent channel is composed of the light-emitting element 110, the accommodating frame 120 (or the object to be tested O), the second reflective optical film Each segment of the optical path between the element 142 and the light detection element 130 is formed. According to yet another embodiment of the present invention, in the implementation in which the at least one reflective optical thin film element 140 only includes the second reflective optical thin film element 142 and does not include the first reflective optical thin film element 141 (Fig. (not shown), a conventional band-pass filter (not shown) can also be included to replace the first reflective optical thin film element 141 in the embodiments of FIG. 1 and FIG. 2 to filter out the excitation wavelength range. It also has the effect of improving the shortcomings of the prior art. At this time, the fluorescent channel is composed of the light-emitting element 110, the band-pass filter (not shown), the accommodating frame 120 (or the object to be tested O), the second Each section of the optical path between the reflective optical thin film element 142 and the light detection element 130 is formed. Although the above-mentioned embodiment of the detection device 100 includes at least one reflective optical thin film element 140, and the at least one reflective optical thin film element 140 includes a first reflective optical thin film element 141 and a second reflective optical thin film element 142, but according to another embodiment of the present invention, the at least one reflective optical thin film element 140, the first reflective optical thin film element 141 and the second reflective optical thin film element 142 in the foregoing embodiments are respectively replaced with at least one reflective optical thin film element 142. A reflective optical thin film element 540 , a first reflective optical thin film element 541 and a second reflective optical thin film element 542 can also be established.

綜上所述,本發明的檢測裝置藉由光學薄膜元件的配置,即可支援多種不同的螢光試劑種類的檢測,而不需設置由帶通濾鏡組成的濾光模組,也易於進行設備的更新與擴充。此外,由於在進行多種不同的螢光試劑種類的檢測時,不同的待測物所需的激發光束(或所形成的螢光光束)可共用同一光路及/或或螢光通道,因此也能簡化光路與減少生產組裝的複雜性,而減少產品成本以及提升生產品質。To sum up, the detection device of the present invention can support the detection of various types of fluorescent reagents through the configuration of the optical thin film elements, without the need to set up a filter module composed of band-pass filters, and it is also easy to perform Equipment updates and expansions. In addition, since the excitation beams (or the formed fluorescent beams) required by different analytes can share the same optical path and/or fluorescent channel when performing the detection of a variety of different fluorescent reagents, it is also possible to Simplify the optical path and reduce the complexity of production assembly, thereby reducing product cost and improving production quality.

請參閱圖6,其中係例示有依照本發明的檢測裝置的一種螢光即時定量聚合酶連鎖反應系統的應用例的方塊圖。本發明之檢測裝置100係可應用於一螢光即時定量聚合酶連鎖反應系統10中,其中該螢光即時定量聚合酶連鎖反應系統10包含所述檢測裝置100、一溫控模組700及一分析模組800。依據本發明之一應用例,如圖7所例示,所述溫控模組700,係具有加熱模組710與散熱模組720,而在控制單元的控制下產生所需要的熱循環並對待測物進行溫控,進而使得待測物中檢測對象的量於每一次熱循環後倍增,並使得中檢測對象的量經過N次熱循環後變成2的N次方倍;其中,依據本發明之一實施例,所述溫控模組700係具有一溫度感測器730用以感測系統上之一溫度,例如容置框架120或待測物等的溫度,而可透過容置框架120對待測物進行溫控;且依據本發明之一實施例,溫度感測器730與檢測裝置100的容置框架120連接用以感測容置框架120之溫度;且依據本發明之另一實施例,溫度感測器730與容置框架120的套筒結構121連接用以感測套筒結構121之溫度。所述檢測裝置100,係包含一發光元件110、一光檢測元件130、至少一反射式光學薄膜元件140(540),係設置於所述發光元件110與所述光檢測元件130間之螢光通道上,及一控制單元150,與所述至少一反射式光學薄膜元件140(540)耦接,用以控制一所述至少一反射式光學薄膜元件140(540)的反射光線的波段範圍,其細節與操作方法及其各種實施態樣已於前文說明,於此不再贅述。所述分析模組800,係在控制單元150的控制下,對待測物在整個聚合酶連鎖反應過程中的溫度變化與螢光變化,即時地監測、記錄與定量及/或定性分析;依據本發明之一實施例,所述分析模組800利用一分析軟體進行分析;依據本發明之一實施例,所述分析模組800係對光檢測元件130所測得之訊號進行分析。Please refer to FIG. 6 , which is a block diagram illustrating an application example of a fluorescent real-time quantitative polymerase chain reaction system of the detection device according to the present invention. The detection device 100 of the present invention can be applied to a fluorescent real-time quantitative polymerase chain reaction system 10, wherein the fluorescent real-time quantitative polymerase chain reaction system 10 includes the detection device 100, a temperature control module 700 and a Analysis module 800 . According to an application example of the present invention, as shown in FIG. 7 , the temperature control module 700 has a heating module 710 and a heat dissipation module 720, and the required thermal cycle is generated under the control of the control unit and is to be measured. The temperature of the object is controlled, so that the amount of the detection object in the object to be tested is multiplied after each thermal cycle, and the amount of the detection object in the test object becomes the N power of 2 after N thermal cycles; wherein, according to the present invention In one embodiment, the temperature control module 700 has a temperature sensor 730 for sensing a temperature on the system, such as the temperature of the accommodating frame 120 or the object to be measured, which can be treated through the accommodating frame 120 The measured object is temperature controlled; and according to an embodiment of the present invention, the temperature sensor 730 is connected to the accommodating frame 120 of the detection device 100 to sense the temperature of the accommodating frame 120 ; and according to another embodiment of the present invention , the temperature sensor 730 is connected with the sleeve structure 121 of the accommodating frame 120 to sense the temperature of the sleeve structure 121 . The detection device 100 includes a light-emitting element 110 , a light-detecting element 130 , and at least one reflective optical thin-film element 140 ( 540 ), which is a fluorescent light disposed between the light-emitting element 110 and the light-detecting element 130 on the channel, and a control unit 150 coupled to the at least one reflective optical thin film element 140 (540) for controlling the wavelength range of the reflected light of the at least one reflective optical thin film element 140 (540), The details, operation methods and various implementation aspects thereof have been described above, and will not be repeated here. The analysis module 800, under the control of the control unit 150, monitors, records and quantitatively and/or qualitatively analyzes the temperature change and fluorescence change of the substance to be tested during the entire polymerase chain reaction process in real time; According to an embodiment of the invention, the analysis module 800 uses an analysis software to analyze; according to an embodiment of the invention, the analysis module 800 analyzes the signal measured by the light detection element 130 .

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed above by the embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, The protection scope of the present invention shall be determined by the scope of the appended patent application.

10:螢光即時定量聚合酶連鎖反應系統 100:檢測裝置 110:發光元件 120:容置框架 121:套筒結構 130:光檢測元件 140、540:反射式光學薄膜元件 141、541:第一反射式光學薄膜元件 142、542:第二反射式光學薄膜元件 150:控制單元 700:溫控模組 710:加熱模組 720:散熱模組 730:溫度感測器 800:分析模組 A、B、C、D、E:點 CL1、CL2:準直透鏡 d1、d2、d3:作動深度距離 du、dv:厚度 dx:深度距離 ELi、ELo:激發光束 EX:出口 FLi、FLo:螢光光束 FR1、FR2、FR3:濾光區域 FU、FU1、FU2、FU3:反射式濾光單元 IL:入射光束 IN:入口 HS1、HS2:外殼 O:待測物 OL、OL1、OL2、OL3:出射光束 OP:開口 L0:外界層 L1:第一介質層 L2:第二介質層 L3:第三介質層 N1:第一法線方向 N2:第一法線方向 S1:第一界面 S2:第二界面 S3:第三界面 S110、S120、S130、S140、S520、S530:步驟 θ0:入射角 θ1:第一夾角 θ2:第二夾角 θx:折射角 α1:第一入射角 α2:第二入射角 10: Fluorescent real-time quantitative polymerase chain reaction system 100: Detection device 110: Light-emitting element 120: accommodating frame 121: Sleeve structure 130: Light detection element 140, 540: Reflective optical thin film element 141, 541: The first reflective optical thin film element 142, 542: The second reflective optical thin film element 150: Control unit 700: Temperature control module 710: Heating Module 720: cooling module 730: Temperature sensor 800: Analysis Module A, B, C, D, E: point CL1, CL2: collimating lens d1, d2, d3: Action depth distance du, dv: thickness dx: depth distance ELi, ELo: Excitation beam EX:Export FLi, FLo: Fluorescent beam FR1, FR2, FR3: filter area FU, FU1, FU2, FU3: Reflective filter unit IL: Incident beam IN: entrance HS1, HS2: Shell O: analyte OL, OL1, OL2, OL3: Outgoing beam OP: opening L0: outer layer L1: first dielectric layer L2: Second dielectric layer L3: The third dielectric layer N1: The first normal direction N2: The first normal direction S1: The first interface S2: Second interface S3: The third interface S110, S120, S130, S140, S520, S530: Steps θ0: Incident angle θ1: The first included angle θ2: Second included angle θx: refraction angle α1: The first incident angle α2: Second angle of incidence

圖1是依照本發明的實施例的一種檢測裝置的系統方塊圖。 圖2是圖1的一種檢測裝置的架構示意圖。 圖3A是圖2的反射式光學薄膜元件的一種實施例的正視示意圖。 圖3B是入射光束垂直入射圖3A的反射式光學薄膜元件的反射式濾光單元的一種實施例時的光路示意圖。 圖3C是入射光束斜向入射圖3B的反射式濾光單元時的光路示意圖。 圖3D至圖3F是反射式光學薄膜元件的工作原理說明示意圖。 圖3G是採用圖3A的反射式光學薄膜元件時的一種檢測方法的流程示意圖。 圖4A是圖2的檢測裝置在入射光束為激發光束時的光路示意圖。 圖4B是圖2的檢測裝置在入射光束為螢光光束時的光路示意圖。 圖4C是圖4A的套筒結構的局部放大示意圖。 圖4D是圖4A的另一種套筒結構的局部放大示意圖。 圖5A是圖2的反射式光學薄膜元件的另一種實施例的正視示意圖。 圖5B是圖5A的反射式光學薄膜元件的不同的反射式濾光單元的一種實施例示意圖。 圖5C是採用圖5A的反射式光學薄膜元件時的一種檢測方法的流程示意圖。 圖6是依照本發明的檢測裝置的一種螢光即時定量聚合酶連鎖反應系統的應用例的方塊圖。 圖7是圖6中的溫控模組的一種實施例的系統方塊圖。 FIG. 1 is a system block diagram of a detection apparatus according to an embodiment of the present invention. FIG. 2 is a schematic structural diagram of a detection apparatus of FIG. 1 . FIG. 3A is a schematic front view of an embodiment of the reflective optical thin film element of FIG. 2 . FIG. 3B is a schematic diagram of an optical path when an incident light beam is vertically incident on an embodiment of a reflective filter unit of the reflective optical thin film element of FIG. 3A . FIG. 3C is a schematic diagram of an optical path when an incident light beam is obliquely incident on the reflective filter unit of FIG. 3B . 3D to 3F are schematic diagrams illustrating the working principle of the reflective optical thin film element. FIG. 3G is a schematic flowchart of a detection method when the reflective optical thin film element of FIG. 3A is used. FIG. 4A is a schematic diagram of the optical path of the detection device of FIG. 2 when the incident light beam is an excitation light beam. 4B is a schematic diagram of the optical path of the detection device of FIG. 2 when the incident light beam is a fluorescent light beam. FIG. 4C is a partial enlarged schematic view of the sleeve structure of FIG. 4A . FIG. 4D is a partial enlarged schematic view of another sleeve structure of FIG. 4A . FIG. 5A is a schematic front view of another embodiment of the reflective optical thin film element of FIG. 2 . FIG. 5B is a schematic diagram of an embodiment of a different reflective filter unit of the reflective optical thin film element of FIG. 5A . FIG. 5C is a schematic flowchart of a detection method when the reflective optical thin film element of FIG. 5A is used. 6 is a block diagram of an application example of a fluorescent real-time quantitative polymerase chain reaction system of the detection device according to the present invention. FIG. 7 is a system block diagram of an embodiment of the temperature control module in FIG. 6 .

100:檢測裝置 100: Detection device

110:發光元件 110: Light-emitting element

120:容置框架 120: accommodating frame

121:套筒結構 121: Sleeve structure

130:光檢測元件 130: Light detection element

140、540:反射式光學薄膜元件 140, 540: Reflective optical thin film element

141、541:第一反射式光學薄膜元件 141, 541: The first reflective optical thin film element

142、542:第二反射式光學薄膜元件 142, 542: The second reflective optical thin film element

CL1、CL2:準直透鏡 CL1, CL2: collimating lens

ELi、ELo:激發光束 ELi, ELo: Excitation beam

EX:出口 EX:Export

FLi、FLo:螢光光束 FLi, FLo: Fluorescent beam

HS1、HS2:外殼 HS1, HS2: Shell

IN:入口 IN: entrance

OP:開口 OP: opening

Claims (12)

一種檢測裝置,包括: 一發光元件; 一光檢測元件; 至少一反射式光學薄膜元件,係設置於所述發光元件與所述光檢測元件間之螢光通道上;以及 一控制單元,與所述至少一反射式光學薄膜元件耦接,用以控制一所述至少一反射式光學薄膜元件的反射光線的波段範圍,其中所述至少一反射式光學薄膜元件每一者包括一或多個反射式濾光單元,且所述一或多個反射式濾光單元各具有一共振腔,其中所述至少一光學薄膜元件包括多個濾光區域,各所述多個濾光區域包含一或多個所述反射式濾光單元,且位於相同所述濾光區域的一或多個所述反射式濾光單元的所述共振腔的作動深度距離彼此相同,位於不同所述濾光區域的一或多個所述反射式濾光單元的所述共振腔的作動深度距離彼此不同。 A detection device, comprising: a light-emitting element; a light detection element; At least one reflective optical thin film element is disposed on the fluorescent channel between the light-emitting element and the light-detecting element; and a control unit, coupled to the at least one reflective optical thin film element, for controlling the wavelength range of the reflected light of the at least one reflective optical thin film element, wherein each of the at least one reflective optical thin film element Including one or more reflective filter units, and each of the one or more reflective filter units has a resonant cavity, wherein the at least one optical thin film element includes a plurality of filter regions, each of the plurality of filter The light area includes one or more of the reflective filter units, and the resonant cavities of the one or more reflective filter units located in the same filter area have the same operating depth distance from each other, and are located in different places. The operating depth distances of the resonant cavities of one or more of the reflective filter units in the filter region are different from each other. 如請求項1所述的檢測裝置,其中所述多個濾光區域包括一第一濾光區域,且位於所述第一濾光區域的所述反射式濾光單元用於反射主發光波長落於一激發波段範圍的光線。The detection device according to claim 1, wherein the plurality of filter regions includes a first filter region, and the reflective filter unit located in the first filter region is used to reflect the main emission wavelength drop. light in an excitation wavelength range. 如請求項1所述的檢測裝置,其中所述多個濾光區域包括一第二濾光區域,且位於所述第二濾光區域的所述反射式濾光單元的反射光線受到所述控制單元的控制而落於一檢測波段範圍。The detection device according to claim 1, wherein the plurality of filter regions includes a second filter region, and the reflected light of the reflective filter unit located in the second filter region is controlled by the control The control of the unit falls within a detection band range. 如請求項2所述的檢測裝置,還包括: 一容置框架,用以容置一待測物,且所述容置框架具有一開口,用以接收主發光波長落於所述激發波段範圍內的部分所述激發光束。 The detection device according to claim 2, further comprising: An accommodating frame is used for accommodating an object to be tested, and the accommodating frame has an opening for receiving part of the excitation beam whose main emission wavelength falls within the excitation wavelength range. 一種檢測方法,適用於一檢測裝置,所述檢測裝置包括一發光元件、一光檢測元件、一控制單元以及至少一反射式光學薄膜元件,其中所述至少一反射式光學薄膜元件包括一或多個反射式濾光單元,且所述反射式濾光單元具有一共振腔,所述至少一反射式光學薄膜元件係設置於所述發光元件與所述光檢測元件間之螢光通道上,且所述檢測方法包括: 利用所述發光元件提供激發光束,其中所述激發光束係用以在照射一待測物後產生一螢光光束; 利用所述光檢測元件接收所述螢光光束; 在所述至少一光學薄膜元件上提供多個濾光區域,各所述多個濾光區域包含一或多個所述反射式濾光單元,且位於相同所述濾光區域的一或多個所述反射式濾光單元的所述共振腔的作動深度距離彼此相同,位於不同所述濾光區域的一或多個所述反射式濾光單元的所述共振腔的作動深度距離彼此不同;以及 利用所述控制單元來控制各所述多個濾光區域的狀態,以濾除入射光束的部分波段範圍,且所述入射光束為所述激發光束與所述螢光光束的其中一者,且其中利用所述至少一反射式光學薄膜元件用以濾除入射光束的部分波段範圍,係利用所述一或多個反射式濾光單元以濾除入射光束的部分波段範圍。 A detection method, suitable for a detection device, the detection device includes a light-emitting element, a light detection element, a control unit and at least one reflective optical thin film element, wherein the at least one reflective optical thin film element includes one or more a reflective filter unit, and the reflective filter unit has a resonant cavity, the at least one reflective optical thin film element is disposed on the fluorescent channel between the light-emitting element and the light-detecting element, and The detection method includes: Using the light-emitting element to provide an excitation beam, wherein the excitation beam is used to generate a fluorescent beam after irradiating an object to be tested; receiving the fluorescent light beam with the light detection element; A plurality of filter regions are provided on the at least one optical film element, and each of the plurality of filter regions includes one or more of the reflective filter units and is located in one or more of the same filter regions The operating depth distances of the resonant cavities of the reflective filter units are the same as each other, and the operating depth distances of the resonant cavities of one or more of the reflective filter units located in different filter regions are different from each other; as well as The control unit is used to control the state of each of the plurality of filter regions, so as to filter out part of the wavelength range of the incident light beam, and the incident light beam is one of the excitation light beam and the fluorescent light beam, and The at least one reflective optical thin film element is used to filter out part of the wavelength range of the incident light beam, and the one or more reflective optical filter units are used to filter out the part of the wavelength band range of the incident light beam. 如請求項5所述的檢測方法,所述多個濾光區域包括一第一濾光區域,且更包括以下之步驟:利用所述控制單元控制位於所述第一濾光區域的所述反射式濾光單元而使得反射光線而落於一激發波段範圍。The detection method according to claim 5, wherein the plurality of filter regions includes a first filter region, and further comprises the following step: using the control unit to control the reflection located in the first filter region A filter unit is used to make the reflected light fall within an excitation wavelength range. 如請求項5所述的檢測方法,所述多個濾光區域包括一第二濾光區域,且更包括以下之步驟:利用所述控制單元控制位於所述第二濾光區域的所述反射式濾光單元而使得反射光線而落於一檢測波段範圍。The detection method according to claim 5, wherein the plurality of filter areas includes a second filter area, and further includes the following step: using the control unit to control the reflection located in the second filter area A filter unit is used to make the reflected light fall within a detection wavelength range. 如請求項5所述的檢測方法,其中所述檢測裝置還包括: 容置框架,用以容置待測物,且所述容置框架具有一開口,且更包括以下之步驟:利用所述開口形成光路而構成一螢光通道。 The detection method according to claim 5, wherein the detection device further comprises: The accommodating frame is used for accommodating the object to be tested, and the accommodating frame has an opening, and further includes the following steps: forming an optical path by using the opening to form a fluorescent channel. 一種螢光即時定量聚合酶連鎖反應系統,包括: 一檢測裝置,一溫控模組及一分析模組,其中 所述檢測裝置包括: 一發光元件; 一光檢測元件; 至少一反射式光學薄膜元件,係設置於所述發光元件與所述光檢測元件間之螢光通道上;以及 一控制單元,與所述至少一反射式光學薄膜元件耦接,用以控制一所述至少一反射式光學薄膜元件的反射光線的波段範圍,其中所述至少一反射式光學薄膜元件每一者包括一或多個反射式濾光單元,且所述一或多個反射式濾光單元各具有一共振腔,其中所述至少一光學薄膜元件包括多個濾光區域,各所述多個濾光區域包含一或多個所述反射式濾光單元,且位於相同所述濾光區域的一或多個所述反射式濾光單元的所述共振腔的作動深度距離彼此相同,位於不同所述濾光區域的一或多個所述反射式濾光單元的所述共振腔的作動深度距離彼此不同; 所述溫控模組係用以控制系統之一溫度,且具有一加熱模組,以及 所述分析模組係用以分析來自所述光檢測元件之一訊號。 A fluorescent real-time quantitative polymerase chain reaction system, comprising: A detection device, a temperature control module and an analysis module, wherein The detection device includes: a light-emitting element; a light detection element; At least one reflective optical thin film element is disposed on the fluorescent channel between the light-emitting element and the light-detecting element; and a control unit, coupled to the at least one reflective optical thin film element, for controlling the wavelength range of the reflected light of the at least one reflective optical thin film element, wherein each of the at least one reflective optical thin film element Including one or more reflective filter units, and each of the one or more reflective filter units has a resonant cavity, wherein the at least one optical thin film element includes a plurality of filter regions, each of the plurality of filter The light area includes one or more of the reflective filter units, and the resonant cavities of the one or more reflective filter units located in the same filter area have the same operating depth distance from each other, and are located in different places. The actuation depth distances of the resonant cavities of one or more of the reflective filter units in the filter region are different from each other; The temperature control module is used to control a temperature of the system, and has a heating module, and The analysis module is used for analyzing a signal from the light detection element. 如請求項9所述的螢光即時定量聚合酶連鎖反應系統,其中所述至少一反射式光學薄膜元件,包括一第一反射式光學薄膜元件用以反射主發光波長落於激發波段範圍的出射光束及包括一第二反射式光學薄膜元件用以反射主發光波長落於檢測波段範圍的出射光束。The fluorescent real-time quantitative polymerase chain reaction system according to claim 9, wherein the at least one reflective optical thin film element includes a first reflective optical thin film element for reflecting the emission whose main emission wavelength falls within the excitation wavelength range The light beam and a second reflective optical thin film element are used to reflect the outgoing light beam whose main emission wavelength falls within the detection wavelength range. 如請求項10所述的螢光即時定量聚合酶連鎖反應系統,其中所述檢測裝置還包括一容置框架,用以容置一待測物,且所述容置框架具有一開口,用以接收主發光波長落於所述激發波段範圍內的部分所述激發光束。The fluorescent real-time quantitative polymerase chain reaction system according to claim 10, wherein the detection device further comprises an accommodating frame for accommodating a test object, and the accommodating frame has an opening for A part of the excitation beam whose main emission wavelength falls within the excitation wavelength range is received. 如請求項9所述的螢光即時定量聚合酶連鎖反應系統,其中所述溫控模組更具有一溫度感測器與一散熱模組。The fluorescent real-time quantitative polymerase chain reaction system according to claim 9, wherein the temperature control module further has a temperature sensor and a heat dissipation module.
TW111117084A 2020-05-07 Detection device and method thereof TWI839728B (en)

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