TW202113923A - Microstructure transfer device and microstructure transfer method wherein the microstructure transfer device comprises a winding-out machine, a winding machine, a stage, an imprint roller, and a curing light irradiator - Google Patents

Microstructure transfer device and microstructure transfer method wherein the microstructure transfer device comprises a winding-out machine, a winding machine, a stage, an imprint roller, and a curing light irradiator Download PDF

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TW202113923A
TW202113923A TW109121994A TW109121994A TW202113923A TW 202113923 A TW202113923 A TW 202113923A TW 109121994 A TW109121994 A TW 109121994A TW 109121994 A TW109121994 A TW 109121994A TW 202113923 A TW202113923 A TW 202113923A
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sheet
roller
mold
platen roller
microstructure transfer
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TWI754978B (en
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中山幸徳
今井裕晃
岸村敏治
中澤良仁
渡瀬樹
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日商艾美柯技術股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F16/00Transfer printing apparatus
    • B41F16/0006Transfer printing apparatus for printing from an inked or preprinted foil or band
    • B41F16/004Presses of the reciprocating type
    • B41F16/0053Presses of the reciprocating type with means for applying print under pressure only, e.g. using pressure sensitive adhesive
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F13/00Common details of rotary presses or machines
    • B41F13/02Conveying or guiding webs through presses or machines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F19/00Apparatus or machines for carrying out printing operations combined with other operations
    • B41F19/007Apparatus or machines for carrying out printing operations combined with other operations with selective printing mechanisms, e.g. ink-jet or thermal printers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F23/00Devices for treating the surfaces of sheets, webs, or other articles in connection with printing
    • B41F23/04Devices for treating the surfaces of sheets, webs, or other articles in connection with printing by heat drying, by cooling, by applying powders
    • B41F23/0403Drying webs
    • B41F23/0406Drying webs by radiation
    • B41F23/0409Ultraviolet dryers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/161Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Moulding By Coating Moulds (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Medical Uses (AREA)

Abstract

The present invention provides a microstructure transfer device and a microstructure transfer method capable of fixing a plurality of replicas to a sheet-like body (film). [Solution] The microstructure transfer device (1) comprises: a winding-out machine (5) for winding a flexible sheet-like body (4) and winding out the sheet-like body (4); a winding machine (6) for winding the sheet-like body (4) conveyed via a plurality of guide rolls (3); a stage (11) arranged between the winding-out machine (5) and the winding machine (6) for carrying a mold (14) coated with a photocurable resin on a surface having a fine uneven pattern; an imprint roller (2) to push the sheet-like body (4) against the mold (14) from above and reciprocate at least between both ends of the mold (14); and a curing light irradiator (8) to irradiate ultraviolet light on the sheet-like body (4) pushed against the mold (14) to continuously fix a plurality of replicas (20) to the sheet-like body (4).

Description

微小構造轉印裝置及微小構造轉印方法Micro structure transfer device and micro structure transfer method

本發明是有關微小構造轉印裝置及微小構造轉印方法,使用表面形成有奈米級等的微小凹凸圖案的模具,將微小構造反轉轉印在基板上。The present invention relates to a microstructure transfer device and a microstructure transfer method. The microstructure is reversely transferred onto a substrate using a mold on which a nanoscale or other microscopic uneven pattern is formed on the surface.

半導體製造所使用的曝光裝置等之微小加工技術的紫外線/電子束蝕刻在設備價格為高價且過程複雜,製造上耗費時間與成本的改善等會有問題,並隨著將形成微小凹凸圖案的模具(也稱為壓模或模板等)直接轉印在樹脂材料等的奈米壓印(Nanoimprint Lithography,以下稱NIL)技術的進展,在可以單純的裝置及過程容易實現10nm~數100nm級的微小圖案上,裝置價格與量產的成本上逐漸具有高的優勢性。例如,專利文獻1中,揭示相對於模具以無電解電鍍法,反轉轉印形成於模具表面的微小的凹凸圖案的微小構造體。尤其是專利文獻1記載在所獲得的微小構造體的上面(與形成有微小凹凸圖案的面相反側的面)配置緩衝材,並將剝離劑塗層於微小的凹凸圖案的表面形成壓模。Ultraviolet/electron beam etching, which uses micro-processing techniques such as exposure equipment used in semiconductor manufacturing, is expensive in equipment and complicated in the process, and it is time-consuming and cost-intensive in manufacturing. There are problems, and it will become a mold that will form micro-concave-convex patterns. (Also called stamper or template, etc.) The advancement of Nanoimprint Lithography (NIL) technology, which is directly transferred to resin materials, etc., can be easily realized with a simple device and process in the range of 10nm to several 100nm. In terms of patterns, device prices and mass production costs gradually have high advantages. For example, Patent Document 1 discloses a microstructure in which a minute concave-convex pattern formed on the surface of the mold is reversely transferred with respect to the mold by an electroless plating method. In particular, Patent Document 1 describes that a buffer material is arranged on the upper surface of the obtained microstructure (the surface opposite to the surface on which the microscopic uneven pattern is formed), and a release agent is coated on the surface of the microscopic uneven pattern to form a stamper.

又,專利文獻2中,提出一種為改善在加熱加壓轉印的升溫‧冷卻循環耗費的時間,使保持基板加壓面的部位的剖面積比壓模的基板加壓面的剖面積小的NIL裝置。專利文獻3提出一種設置具備暫時載放基板的暫時載放面並緩緩移動至基板載放面的暫置構件,防止基板與基板載放台的孔隙率導致的偏位可進行高精度轉印的NIL裝置。In addition, Patent Document 2 proposes to improve the time required for the heating and cooling cycle during the heating and pressurization transfer, so that the cross-sectional area of the portion holding the substrate pressurizing surface is smaller than the cross-sectional area of the substrate pressurizing surface of the stamper. NIL device. Patent Document 3 proposes a temporary placement member provided with a temporary placement surface for temporarily placement of a substrate and slowly moves to the substrate placement surface to prevent misalignment caused by the porosity of the substrate and the substrate placement table, enabling high-precision transfer NIL device.

專利文獻4中,提出一種以進一步高精度的轉印為目的,加熱加壓時可依序更換緩衝材的輥對輥方式的NIL裝置。Patent Document 4 proposes a roll-to-roll NIL device in which the buffer material can be sequentially replaced during heating and pressure for the purpose of further high-precision transfer.

又,在專利文獻5揭示一種以生產通量提升並降低量產成本為目的,即使轉印輥的旋轉速度上升仍可正確且高精度進行圖案轉印地,藉著多段式設置的輥將壓模加熱加壓於樹脂層進行轉印的方式NIL裝置。In addition, Patent Document 5 discloses a method for improving the production throughput and reducing the mass production cost. Even if the rotation speed of the transfer roller is increased, the pattern can be transferred accurately and with high accuracy. A NIL device in which the mold is heated and pressurized on the resin layer for transfer.

又,作為使用光硬化性樹脂,例如,在專利文獻6揭示一種使用紫外線硬化性樹脂所構成的薄膜朝工件推壓模具來壓縮成形,並照射紫外光進行壓模轉印的NIL裝置,作為紫外光的光源,使用與紫外光同時不連續放射熱線的光源來抑制溫度上升。並且,專利文獻7中,揭示一種以輥對輥方式,送出具有接著固定著透明薄膜的光硬化性轉印層的光硬化性轉印薄片,使光硬化性轉印層露出之後,以壓模推壓並藉UV燈進行光照射,進行壓模之微小凹凸圖案轉印的NIL裝置。 [先前技術文獻] [專利文獻]In addition, as the use of photocurable resin, for example, Patent Document 6 discloses a NIL device that uses a film made of ultraviolet curable resin to press a mold against a workpiece for compression molding, and irradiates ultraviolet light to transfer the mold. The light source uses a light source that discontinuously emits heat rays at the same time as ultraviolet light to suppress temperature rise. In addition, Patent Document 7 discloses a roll-to-roll method in which a photocurable transfer sheet with a photocurable transfer layer attached to a transparent film is fed out. After the photocurable transfer layer is exposed, the photocurable transfer sheet is then stamped. It is a NIL device that pushes and irradiates light with a UV lamp, and transfers the micro-concave and convex pattern of the stamper. [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本特開2005-189128號公報 [專利文獻2]日本特開2004-288784號公報 [專利文獻3]日本特開2006-62208號公報 [專利文獻4]日本特開2004-288804號公報 [專利文獻5]日本特開2006-326948號公報 [專利文獻6]WO 2009/110596號公報 [專利文獻7]日本特開2011-66100號公報[Patent Document 1] JP 2005-189128 A [Patent Document 2] JP 2004-288784 A [Patent Document 3] JP 2006-62208 A [Patent Document 4] JP 2004-288804 A [Patent Document 5] Japanese Patent Application Publication No. 2006-326948 [Patent Document 6] WO 2009/110596 Publication [Patent Document 7] JP 2011-66100 A

[發明所欲解決之課題][The problem to be solved by the invention]

上述專利文獻1至專利文獻6揭示的NIL裝置是使用模具在每1片基板壓印的構成。但是,由於是與模具直接接觸的壓印方式,因此會有材料或異物附著於模具導致模具損傷之虞。模具製造相關的費用極其昂貴,並且模具製造時間也要長的時間,因此有限制模具的使用次數為最小限的必要。並且,會有在模具的準備更換時之模具的落下或衝突等造成模具的破損或缺口之虞。The NIL devices disclosed in Patent Document 1 to Patent Document 6 described above have a structure in which a mold is used to imprint each substrate. However, since it is an imprint method that directly contacts the mold, there is a risk that materials or foreign matter may adhere to the mold and cause damage to the mold. The cost related to mold manufacturing is extremely expensive, and the mold manufacturing time also takes a long time, so it is necessary to limit the number of times the mold is used to a minimum. In addition, there is a risk that the mold may be damaged or chipped due to a drop or collision of the mold during the preparation for replacement of the mold.

為此在生產時不使用昂貴的標準模,而是藉標準模以軟質材料形成複製模,使用以複製模生產的方法。但是,複製模的更換頻率會因製品或材料不同而有每數百次更換的必要,期待從複製模(以下,稱複製品)的更換與準備作業所需的時間準備來降低成本。For this reason, expensive standard molds are not used in production. Instead, standard molds are used to form replica molds with soft materials, and the production method of replica molds is used. However, the frequency of replacement of the replica mold may require replacement every hundreds of times depending on the product or material, and it is expected that the cost will be reduced from the time required for replacement of the replica mold (hereinafter referred to as a replica) and preparation work.

又,上述專利文獻7揭示的NIL裝置是使用模具形成中間壓印(複製品)之後,進行中間壓模間距傳動,藉中間壓模對每1片基板進行壓印的構成。因此,昂貴的模具是經常配置在具有接著固定著形成有中間壓模之透明薄膜的光硬化性轉印層的光硬化性轉印薄片的下部的構成,因此會有因從光硬化性轉印薄片落下的異物等導致模具損傷之虞。In addition, the NIL device disclosed in Patent Document 7 described above uses a mold to form an intermediate stamp (replica), and then performs pitch transmission between the intermediate stampers, and then uses the intermediate stamper to perform stamping on each substrate. Therefore, expensive molds are often placed on the lower part of the photocurable transfer sheet with the photocurable transfer layer of the transparent film formed with the intermediate stamper. There is a risk of mold damage due to foreign objects falling from the sheet.

此外隨著近年的智慧型手機與平板電腦等的比較小型顯示器的極速普及化,液晶面板等的製造裝置是以較高通量進行製造為佳。又,電視用的顯示面板等中,以使得畫面大型化與高解析度加速,更高精細的次代型顯示器為佳。In addition, with the rapid popularization of relatively small displays such as smartphones and tablet computers in recent years, it is better to manufacture devices such as liquid crystal panels with higher throughput. In addition, in display panels for televisions, etc., higher-definition next-generation displays are preferred to increase the size of the screen and accelerate the high-resolution.

為此,本發明提供一種微小構造轉印裝置及微小構造轉印方法,可在片狀體(薄膜)固著複數個複製品。並且,本發明提供一種微小構造轉印裝置及微小構造轉印方法,使用連續於上述片狀體(薄膜)的複數個複製品,可連續地在基板形成圖案。 [用於解決課題的手段]To this end, the present invention provides a microstructure transfer device and a microstructure transfer method, which can fix a plurality of copies on a sheet (film). In addition, the present invention provides a microstructure transfer device and a microstructure transfer method, which can continuously form a pattern on a substrate by using a plurality of replicas continuous to the above-mentioned sheet-like body (film). [Means used to solve the problem]

為解決上述課題,本發明相關的微小構造轉印裝置,其特徵為,具備:將具有撓性的片狀體迴捲並捲出該片狀體的捲出機;捲繞透過複數個導輥所搬運之上述片狀體的捲繞機;配置於上述捲出機與上述捲繞機之間,載放在形成有微小凹凸圖案的表面塗佈有光硬化性樹脂的模具的載台;將上述片狀體從上方一邊朝上述模具推壓,並至少在上述模具的兩端部間往返移動的壓印輥;及朝上述模具所推壓的上述片狀體照射硬化光的硬化光照射器,在上述片狀體連續地固著複數個複製品。In order to solve the above-mentioned problems, the microstructure transfer device of the present invention is characterized by comprising: a winding machine for rewinding a flexible sheet-like body and unwinding the sheet-like body; winding through a plurality of guide rollers A winding machine for the sheet to be conveyed; a stage placed between the unwinding machine and the winding machine, and placed on a mold coated with a photocurable resin on the surface of the micro concave-convex pattern; A platen roller that pushes the sheet-like body toward the mold from above and reciprocates at least between the two ends of the mold; and a curing light irradiator that irradiates the sheet-like body pressed by the mold with curing light , A plurality of replicas are continuously fixed to the sheet-like body.

又,本發明相關的微小構造轉印裝置,其特徵為:上述壓印輥是將固著在上述片狀體的複數個複製品之中的一個複製品,透過上述片狀體,一邊朝載放於上述載台並在表面塗佈有上述光硬化性樹脂的基板推壓,並至少在上述基板的兩端部間往返移動,上述硬化光照射器是在塗佈有上述光硬化性樹脂的基板透過上述壓印輥所推壓的上述片狀體及上述複製品照射硬化光,在上述光硬化性樹脂硬化後藉著上述壓印輥將上述片狀體剝離,藉此轉印上述複製品的微小凹凸圖案。In addition, the micro-structure transfer device according to the present invention is characterized in that the platen roller is one of a plurality of copies of the sheet-like body fixed to the sheet-like body, and passes through the sheet-like body while facing the carrier. The substrate placed on the stage and coated with the photocurable resin on the surface is pushed and moved back and forth between at least both ends of the substrate. The curing light irradiator is coated with the photocurable resin. The substrate is irradiated with curing light through the sheet-like body and the replica pressed by the embossing roller, and after the photocurable resin is cured, the sheet-like body is peeled off by the embossing roller, thereby transferring the replica The tiny bump pattern.

本發明相關的微小構造轉印裝置,其特徵為,具備:上述複數個導輥之中,在上述片狀體的搬運方向與上述壓印輥鄰接並位在上游側的第1導輥,及在上述片狀體的搬運方向與上述壓印輥鄰接並位在下游側的第2導輥,上述第2導輥在上述壓印輥一邊推壓上述片狀體並移動的場合,比上述壓印輥更位在上方,與上述壓印輥一起以等速移動。The microstructure transfer device according to the present invention is characterized by comprising: among the plurality of guide rollers, a first guide roller adjacent to the platen roller in the conveying direction of the sheet-like body and positioned upstream, and When the second guide roller is adjacent to the platen roller in the conveying direction of the sheet-like body and is located on the downstream side, the second guide roller presses the plate-like body and moves on the side of the platen roller, and is higher than the pressure. The printing roller is positioned above, and moves at a constant speed together with the above-mentioned printing roller.

又,本發明相關的微小構造轉印裝置,其特徵為:具備薄膜夾,在上述壓印輥一邊推壓上述片狀體並移動的場合,上述模具或上述基板的端部之中在上述片狀體的搬運方向位於上游側的端部夾持上述片狀體。In addition, the microstructure transfer device according to the present invention is characterized in that it is provided with a film clamp, and when the platen roller presses and moves the sheet-like body, the sheet is placed in the end of the mold or the substrate. The sheet-shaped body is clamped at the end on the upstream side in the conveying direction of the shaped body.

另外,本發明相關的微小構造轉印裝置,其特徵為:上述硬化光照射器是位在上述壓印輥與上述第1導輥之間,上述壓印輥一邊推壓上述片狀體並移動的場合,一邊照射硬化光並向下游側移動追隨上述壓印輥及上述第2導輥。In addition, the microstructure transfer device according to the present invention is characterized in that the curing light irradiator is positioned between the platen roller and the first guide roller, and the platen roller moves while pressing the sheet-like body In this case, while irradiating the curing light, it moves to the downstream side to follow the platen roller and the second guide roller.

又,本發明相關的微小構造轉印裝置,其特徵為:上述硬化光照射器是位在上述壓印輥與上述第1導輥之間,上述壓印輥一邊推壓上述片狀體並與上述第2導輥一起以等速朝下游側移動之後,一邊照射硬化光並向下游側移動。In addition, the microstructure transfer device according to the present invention is characterized in that the hardening light irradiator is positioned between the platen roller and the first guide roller, and the platen roller presses the sheet-like body and interacts with it. After the above-mentioned second guide roller moves toward the downstream side at a constant speed, it moves toward the downstream side while being irradiated with curing light.

本發明相關的微小構造轉印裝置,其特徵為:具有在上述模具及/或上述基板塗佈上述光硬化性樹脂的光硬化性樹脂塗佈機構。The microstructure transfer device according to the present invention is characterized by having a photocurable resin coating mechanism for coating the photocurable resin on the mold and/or the substrate.

本發明相關的微小構造轉印裝置,其特徵為:具備可個別調整上述壓印輥的高度及推壓力的支承輥機構。The microstructure transfer device according to the present invention is characterized in that it includes a support roller mechanism capable of individually adjusting the height and pressing force of the platen roller.

本發明相關的微小構造轉印裝置,其特徵為:上述支承輥機構是沿著上述壓印輥的長方向以預定的間隔分開具備複數個。The microstructure transfer device according to the present invention is characterized in that the support roller mechanism is provided in plural at predetermined intervals along the longitudinal direction of the platen roller.

另外,本發明相關的微小構造轉印裝置,其特徵為:上述支承輥機構具有配置成在上述壓印輥的正上方與上述壓印輥的外圍面接觸的支承輥。In addition, the microstructure transfer device according to the present invention is characterized in that the support roller mechanism has a support roller arranged to be in contact with the peripheral surface of the platen roller directly above the platen roller.

本發明相關的微小構造轉印方法,係使用微小構造轉印裝置,該微小構造轉印裝置,具備:將具有撓性的片狀體迴捲並捲出該片狀體的捲出機;捲繞透過複數個導輥所搬運之上述片狀體的捲繞機;配置於上述捲出機與上述捲繞機之間,載放在形成有微小凹凸圖案的表面塗佈有光硬化性樹脂的模具的載台,其特徵為:壓印輥從上方一邊朝上述模具推壓上述片狀體,並至少在上述模具的兩端部間往返移動的期間對推壓於模具的上述片狀體照射硬化光,在上述片狀體連續地固著複數個複製品。The microstructure transfer method related to the present invention uses a microstructure transfer device. The microstructure transfer device includes: an unwinding machine for rewinding a flexible sheet-like body and unwinding the sheet-like body; A winding machine for winding the above-mentioned sheet-like body conveyed by a plurality of guide rollers; arranged between the above-mentioned unwinding machine and the above-mentioned winding machine, and placed on a surface coated with a photocurable resin on which a microscopic uneven pattern is formed The stage of the mold is characterized in that: an impression roller presses the sheet-like body toward the mold from above, and irradiates the sheet-like body pressed against the mold at least during the reciprocating movement between the two ends of the mold The curing light continuously fixes a plurality of replicas on the sheet-like body.

又,本發明相關的微小構造轉印方法,其特徵為:上述壓印輥是將固著在上述片狀體的複數個複製品之中的一個複製品,透過上述片狀體,一邊朝載放於上述載台並在表面塗佈有上述光硬化性樹脂的基板推壓,並至少在上述基板的兩端部間往返移動的期間對塗佈有上述光硬化性樹脂的基板透過上述壓印輥所推壓的上述片狀體及上述複製品照射硬化光,轉印上述複製品的微小凹凸圖案。 [發明效果]In addition, the microstructure transfer method according to the present invention is characterized in that the platen roller is one of a plurality of copies fixed on the sheet-like body, and passes through the sheet-like body while facing the carrier. Placed on the stage and coated with the photocurable resin on the surface of the substrate is pressed, and at least during the reciprocating movement between the two ends of the substrate to the substrate coated with the photocurable resin through the imprint The sheet-like body and the replica pressed by the roller are irradiated with hardening light to transfer the fine concavo-convex pattern of the replica. [Effects of the invention]

根據本發明,可提供一種在片狀體(薄膜)連續地固著複數個複製品的微小構造轉印裝置及微小構造轉印方法。According to the present invention, it is possible to provide a microstructure transfer device and a microstructure transfer method in which a plurality of copies are continuously fixed to a sheet (film).

例如,由於可在片狀體連續地固著複數個複製品,因此可謀求複製品形成之通量的提升。並且,假如,即使在固著於片狀體的複數個複製品中的一個複製品到達使用期限的場合,僅藉著間距傳動片狀體,即可成為下一個新的複製品的使用,因此可降低複製品的更換與準備作業的成本。For example, since a plurality of copies can be continuously fixed to the sheet-like body, the throughput of the formation of copies can be improved. Moreover, even if one of the multiple copies fixed to the sheet-like body reaches the expiration date, the sheet-like body can be used for the next new copy only by driving the sheet-like body with a pitch. It can reduce the cost of replacement and preparation of duplicates.

上述之以外的課題、構成及效果,可藉以下的實施形態的說明得以明確。The problems, constitution, and effects other than the above can be clarified by the description of the following embodiment.

本說明書中,稱具有一個模具或形成在一個模具表面的微小凹凸圖案的微小圖案區域為「單元」。In this specification, a small pattern area having a mold or a minute concave-convex pattern formed on the surface of a mold is referred to as a "unit".

又,本說明書中,作為藉轉印模具(金屬模)的微小圖案的複製品轉印微小圖案的被轉印體,雖以玻璃基板為一例已作說明,但不限於此,作為被轉印體,當然也包括樹脂基板或薄膜基板等種種面板材料的基板。亦即,藉著複製品,轉印微小圖案的被轉印體為基板。In addition, in this specification, although the glass substrate has been described as an example of the transfer object to which the minute pattern is transferred by the copy of the minute pattern of the transfer mold (metal mold), it is not limited to this, as the transferred object The body, of course, also includes substrates made of various panel materials such as resin substrates or film substrates. That is, by the copy, the transfer object to which the minute pattern is transferred becomes the substrate.

以下,使用圖示針對本發明的實施例說明。 [實施例1]Hereinafter, the embodiments of the present invention will be described using figures. [Example 1]

圖1是表示本發明一實施例相關之實施例1的微小構造轉印裝置的概略構成的側面圖,圖2為圖1表示之微小構造轉印裝置的平面圖。圖1及圖2表示的白色箭頭是表示片狀體(薄膜)4的搬運方向(供應方向)。FIG. 1 is a side view showing the schematic configuration of a microstructure transfer device of Example 1 related to an embodiment of the present invention, and FIG. 2 is a plan view of the microstructure transfer device shown in FIG. 1. The white arrows shown in FIGS. 1 and 2 indicate the conveyance direction (supply direction) of the sheet (film) 4.

(微小構造轉印裝置的構成)(Configuration of microstructure transfer device)

如圖1表示,微小構造轉印裝置1是從上游側,具備:將捲出薄膜(片狀體)迴捲的捲出機5;搬運從捲出機5送出的片狀體(薄膜)4的導輥3;使空氣與片狀體(薄膜)4接觸以除去附著在薄膜表面的塵埃的乾式清淨機9;將片狀體(薄膜)4朝垂直方向下方搬運的2個導輥3;在詳細後述的壓印輥2透過硬化光照射器8配置在上游側的上游側導輥(第1導輥)3a;硬化光照射器8;壓印輥2;及鄰接於壓印輥2並配置在其下游側的下游側導輥(第2導輥)3b。並且在此,硬化光照射器8是例如照射紫外線(紫外光)作為硬化光。As shown in Fig. 1, the microstructure transfer device 1 is from the upstream side, and is equipped with: an unwinder 5 for rewinding the unrolled film (sheet); and conveys the sheet (film) 4 sent out from the unwinder 5 The guide roller 3; the air and the sheet (film) 4 to remove the dust attached to the surface of the dry cleaner 9; the sheet (film) 4 is conveyed vertically downwards 2 guide rollers 3; The platen roller 2 described in detail later passes through the upstream guide roller (first guide roller) 3a arranged on the upstream side through the curing light irradiator 8; the curing light irradiator 8; the platen roller 2; and the plate adjacent to the platen roller 2 The downstream guide roller (second guide roller) 3b arranged on the downstream side thereof. Here, the curing light irradiator 8 irradiates ultraviolet rays (ultraviolet light) as curing light, for example.

又,微小構造轉印裝置1具備:朝垂直方向上方引導通過下游側導輥(第2導輥)3b之片狀體(薄膜)4的導輥3;藉該導輥3將片狀體(薄膜)4呈水平朝下游側搬運並朝著垂直方向下方引導片狀體(薄膜)4的導輥3;使該導輥3在片狀體(薄膜)4通過時相當於形成在模具(金屬模)的微小圖案區域的起始端及終端的位置為附加標識而照射雷射光的雷射標識器10;使空氣與片狀體(薄膜)4接觸以除去附著在薄膜表面的塵埃的乾式清淨機9;配置在比乾式清淨機9下方的2個導輥3;張力調節輥7;清淨輥12;2個導輥3;及捲繞片狀體(薄膜)4的捲繞機6。In addition, the microstructure transfer device 1 includes a guide roller 3 that guides the sheet (film) 4 passing through the downstream guide roller (second guide roller) 3b upward in the vertical direction; The film) 4 is a guide roller 3 that is conveyed horizontally to the downstream side and guides the sheet (film) 4 downward in the vertical direction; the guide roll 3 is equivalent to being formed in the mold (metal) when the sheet (film) 4 passes. The position of the start and end of the micro pattern area of the mold is a laser marker 10 that irradiates laser light for marking; a dry cleaner that makes air contact with the sheet (film) 4 to remove dust adhering to the surface of the film 9; Two guide rollers 3 arranged under the dry cleaner 9; a tension roller 7; a cleaning roller 12; two guide rollers 3; and a winder 6 for winding a sheet (film) 4.

清淨輥12是在成對的清淨輥的表面(外圍面),預先塗佈漿糊等,將片狀體(薄膜)4夾入成對的清淨輥12一邊接觸並通過,藉此除去附著在薄膜表面的塵埃等。此時,使詳細如後述的複製品硬化,並且,牢固地固著於片狀體(薄膜)4,因此在通過成對的清淨輥12時,複製品不致從片狀體(薄膜)4脫離或剝離。並且,本實施例中,微小構造轉印裝置1雖表示具有清淨輥12的構成,但清淨輥12的設置也可以是任意。亦即,也可不具有清淨輥12的構成。The cleaning roller 12 is a pair of cleaning rollers (peripheral surface) pre-coated with paste or the like, the sheet (film) 4 is sandwiched in the pair of cleaning rollers 12 while contacting and passing, thereby removing the adhesion Dust on the surface of the film, etc. At this time, the replica is hardened as described in detail later, and is firmly fixed to the sheet (film) 4, so when passing through the pair of cleaning rollers 12, the replica will not detach from the sheet (film) 4 Or peel off. In addition, in this embodiment, although the microstructure transfer device 1 has a configuration having the cleaning roller 12, the arrangement of the cleaning roller 12 may be arbitrary. In other words, it is not necessary to have the structure of the cleaning roller 12.

片狀體(薄膜)4為撓性,並且,具有光穿透性的性質。張力調節輥7在圖1中左右,亦即,水平面內前後位移,藉此對所搬運的片狀體(薄膜)4賦予預定的張力。例如,根據各導輥直徑的不同,假如,即使從捲出機5以預定的傳送量(速度),送出片狀體(薄膜)4的場合,在薄膜仍會產生彎曲。但是,使張力調節輥7前後位移來調整片狀體(薄膜)4的張力,即可防止上述的彎曲。The sheet-like body (film) 4 is flexible and has light-transmitting properties. The dancer roller 7 is left and right in FIG. 1, that is, moves back and forth in the horizontal plane, thereby imparting a predetermined tension to the sheet (film) 4 being conveyed. For example, depending on the diameter of each guide roller, even if the sheet (film) 4 is fed out from the unwinder 5 at a predetermined conveying amount (speed), the film will still be bent. However, by displacing the dancer roller 7 back and forth to adjust the tension of the sheet (film) 4, the aforementioned bending can be prevented.

如圖1及圖2表示,微小構造轉印裝置1具備載放模具(金屬模)14,可在水平面內X-Y方向移動,並可在旋轉方向(θ)位移的載台11。在形成於模具(金屬模)14的表面的微小凹凸圖案,預先塗佈有光硬化性樹脂的樹脂,藉未圖示的機械手臂等的搬運機構,進行往載台11的搬入(負載)及從載台11的搬出(卸載)(圖2的箭頭)。並且,在載台11,例如設有真空夾頭,將所載放的模具(金屬模)14藉真空夾頭固定於載台11上。As shown in FIGS. 1 and 2, the microstructure transfer device 1 includes a mounting mold (metal mold) 14 and a stage 11 that can move in the X-Y direction in a horizontal plane and can be displaced in the rotation direction (θ). The minute concave-convex pattern formed on the surface of the mold (metal mold) 14 is pre-coated with a photocurable resin resin, and the loading (loading) and loading of the stage 11 are carried out by a transport mechanism such as a robot arm not shown in the figure. Unloading (unloading) from the stage 11 (arrow in FIG. 2). In addition, the stage 11 is provided with, for example, a vacuum chuck, and the placed mold (metal mold) 14 is fixed on the stage 11 by the vacuum chuck.

又,如圖2表示,微小構造轉印裝置1是在上游側導輥(第1導輥)3a與硬化光照射器8之間,具備兩端可移動支撐於門型架13之攝影部支撐部18的2處,沿著片狀體(薄膜)4的寬方向彼此分開保持的2個上游側攝影部17a。並且,在壓印輥2與下游側導輥(第2導輥)3b之間,具備兩端可移動支撐於門型架13之攝影部支撐部18的2處,沿著片狀體(薄膜)4的寬方向彼此分開保持的2個下游側攝影部17b。作為該等上游側攝影部17a及下游側攝影部17b,例如使用CCD等。上游側攝影部17a及下游側攝影部17b在進行後述之片狀體(薄膜)4的定位時,使用於藉雷射標識器10所附加之片狀體(薄膜)4上的4處的標識檢測。在下游側導輥(第2導輥)3b與載台11之間,設有薄膜夾16。In addition, as shown in FIG. 2, the microstructure transfer device 1 is provided between the upstream guide roller (first guide roller) 3a and the hardening light irradiator 8, and has both ends movably supported by the portal frame 13 for the photographing part support At the two locations of the portion 18, there are two upstream side imaging portions 17a held apart from each other along the width direction of the sheet-like body (film) 4. In addition, between the platen roller 2 and the downstream guide roller (second guide roller) 3b, there are two places where both ends are movably supported by the photographing unit support portion 18 of the portal frame 13, along the sheet (film ) 4 is the two downstream side imaging units 17b held apart from each other in the width direction. As the upstream imaging unit 17a and downstream imaging unit 17b, for example, a CCD or the like is used. The upstream side photographing section 17a and the downstream side photographing section 17b are used for marking four places on the sheet-like body (film) 4 attached by the laser marker 10 when positioning the sheet-like body (film) 4 described later Detection. A film clamp 16 is provided between the downstream guide roller (second guide roller) 3b and the stage 11.

(複製品形成時之微小構造轉印裝置的動作)(The action of the transfer device for microstructures when the copy is formed)

圖3A至圖3E表示複製品形成時的各步驟。圖3A表示藉攝影部的定位步驟中,下游側導輥(第2導輥)3b是與載放於載台11的模具(金屬模)14的表面一邊維持著預定的間隔一邊向下游側,移動至超過載台11的端部的位置。並且,上游側攝影部17a及下游側攝影部17b是分別在片狀體(薄膜)4的垂直方向上方,移動至相當於模具(金屬模)14表面的微小圖案區域的起始端(片狀體(薄膜)4之搬運方向的上游側的端部),及相當於微小圖案區域的終端(片狀體(薄膜)4之搬運方向的下游側的端部)的位置。並且,上游側攝影部17a及下游側攝影部17b一旦檢測出附加於所搬運之片狀體(薄膜)4的標識時,捲繞機6停止片狀體(薄膜)4的捲繞動作。Figures 3A to 3E show the steps in the formation of the replica. Fig. 3A shows that in the positioning step by the photographing unit, the downstream guide roller (second guide roller) 3b faces the downstream side while maintaining a predetermined distance from the surface of the mold (metal mold) 14 placed on the stage 11. Move to a position beyond the end of the stage 11. In addition, the upstream side photographing section 17a and the downstream side photographing section 17b are respectively moved above the vertical direction of the sheet-like body (film) 4 to the start end (sheet-like body) corresponding to the minute pattern area on the surface of the mold (metal mold) 14 (Film) 4 at the upstream end of the conveying direction), and a position corresponding to the end of the minute pattern area (the end on the downstream side of the sheet (film) 4 in the conveying direction). When the upstream imaging unit 17a and the downstream imaging unit 17b detect the mark attached to the sheet (film) 4 being conveyed, the winder 6 stops the winding operation of the sheet (film) 4.

接著,圖3B表示的薄膜夾及壓印輥推壓步驟中,首先,使薄模夾16下降夾持片狀體(薄膜)4。藉此,固定片狀體(薄膜)4。並且,使壓印輥2下降推壓片狀體(薄膜)4。在此狀態下,下游側導輥(第2導輥)3b是與配置在垂直方向上方的導輥3一起向上游側移動,在與壓印輥2成為預定的距離的位置停止。Next, in the film clamp and impression roller pressing step shown in FIG. 3B, first, the thin mold clamp 16 is lowered to clamp the sheet-shaped body (film) 4. Thereby, the sheet-like body (film) 4 is fixed. Then, the platen roller 2 is lowered to press the sheet-shaped body (film) 4. In this state, the downstream guide roller (second guide roller) 3b moves to the upstream side together with the guide roller 3 arranged vertically upward, and stops at a predetermined distance from the platen roller 2.

如圖3C表示的奈米壓印動作步驟中,壓印輥2一邊推壓片狀體(薄膜)4,並且,與下游側導輥(第2導輥)3b以等速向下游側移動。此時,圖4C表示的例中,硬化光照射器8是追隨壓印輥2及下游側導輥(第2導輥)3b及配置在其垂直方向上方的導輥3而移動。壓印輥2是與下游側導輥(第2導輥)3b以等速向下游側移動,藉以使該等的位置關係,即距離保持為一定,因此片狀體(薄膜)4的路徑長度不會變化,壓印輥2即使一邊推壓片狀體(薄膜)4一邊移動,賦予片狀體(薄膜)4的張力也不致變動。In the nanoimprint operation step shown in FIG. 3C, the imprint roller 2 presses the sheet (film) 4 while moving toward the downstream side at a constant speed with the downstream guide roller (second guide roller) 3b. At this time, in the example shown in FIG. 4C, the curing light irradiator 8 moves following the platen roller 2 and the downstream guide roller (second guide roller) 3b, and the guide roller 3 arranged above the vertical direction. The impression roller 2 and the downstream guide roller (second guide roller) 3b move downstream at a constant speed, so that the positional relationship, that is, the distance, is kept constant, so the path length of the sheet (film) 4 There is no change, and even if the platen roller 2 moves while pressing the sheet (film) 4, the tension applied to the sheet (film) 4 does not change.

圖3D表示的硬化光照射步驟是如上述,硬化光照射器8追隨壓印輥2地向下游側移動,一邊照射紫外線(硬化光)一邊向下游側移動,預先塗佈在具有微小圖案區域的模具(金屬模)14的表面的光硬化性樹脂是與壓印輥2的推壓力協同動作,固著於片狀體(薄膜)4。藉此,將形成在模具(金屬模)14表面的微小凹凸圖案反轉轉印於片狀體(薄膜)4。本實施例中,同時執行奈米壓印動作步驟與硬化光照射步驟。The curing light irradiation step shown in FIG. 3D is as described above. The curing light irradiator 8 moves to the downstream side following the platen roller 2 and moves to the downstream side while irradiating ultraviolet rays (curing light). The photocurable resin on the surface of the mold (metal mold) 14 acts in cooperation with the pressing force of the platen roller 2 and is fixed to the sheet (film) 4. Thereby, the minute concavo-convex pattern formed on the surface of the mold (metal mold) 14 is reversely transferred to the sheet-like body (film) 4. In this embodiment, the nanoimprinting action step and the hardening light irradiation step are performed at the same time.

接著,圖3E表示的剝離步驟中,壓印輥2是與下游側導輥(第2導輥)3b及配置在其垂直方向上方的導輥3以等速向上游側移動,藉此使固著於片狀體(薄膜)4的複製品以均一的狀態,從模具(金屬模)14的表面剝離。亦即,可對固著於片狀體(薄膜)4的複製品及模具(金屬模)14不造成損傷地剝離。Next, in the peeling step shown in FIG. 3E, the platen roller 2 moves to the upstream side at a constant speed with the downstream guide roller (second guide roller) 3b and the guide roller 3 arranged vertically above it, thereby solidifying The replica attached to the sheet-like body (film) 4 is peeled from the surface of the mold (metal mold) 14 in a uniform state. That is, the replica fixed to the sheet-shaped body (film) 4 and the mold (metal mold) 14 can be peeled off without damage.

如以上說明,根據本實施例的微小構造轉印裝置1,使壓印輥2與下游側導輥(第2導輥)3b及配置在其垂直方向上方的導輥3以等速,向下游側及上游側往返移動,可藉此容易形成複製品。As explained above, according to the microstructure transfer device 1 of the present embodiment, the platen roller 2 and the downstream guide roller (second guide roller) 3b and the guide roller 3 arranged vertically above are moved downstream at a constant speed The side and the upstream side move back and forth, which can easily form a replica.

接著,使用圖4A至圖4K,針對上游側導輥(第1導輥)3a、壓印輥2及下游側導輥(第2導輥)3b的動作詳細說明。如圖4A表示,下游側導輥(第2導輥)3b是向下游側移動,在超過模具(金屬模)14的下游側端部的位置停止。此時,上游側導輥(第1導輥)3a與下游側導輥(第2導輥)3b的軸心間的距離L1是例如4000mm。又,形成在模具(金屬模)14表面的微小凹凸圖案的存在區域的微小圖案區域的長度L2是例如65inch等。在上游側導輥(第1導輥)3a、壓印輥2及下游側導輥(第2導輥)3b之間搬運的片狀體(薄膜)4的垂直方向上方,定位有2個上游側攝影部17a及2個下游側攝影部17b,檢測藉雷射標識器10預先附加於片狀體(薄膜)4之對應微小圖案區域的起始端及終端的位置的標識。並且,片狀體(薄膜)4的搬運是藉捲繞機6的驅動間距傳動相當於一個單元的長度的量。Next, the operations of the upstream guide roller (first guide roller) 3a, the platen roller 2, and the downstream guide roller (second guide roller) 3b will be described in detail using FIGS. 4A to 4K. As shown in FIG. 4A, the downstream guide roller (second guide roller) 3 b moves to the downstream side and stops at a position beyond the downstream end of the mold (metal mold) 14. At this time, the distance L1 between the axial centers of the upstream guide roller (first guide roller) 3a and the downstream guide roller (second guide roller) 3b is, for example, 4000 mm. In addition, the length L2 of the minute pattern area in the area where the minute concave-convex pattern exists on the surface of the mold (metal mold) 14 is, for example, 65 inches. The sheet (film) 4 conveyed between the upstream guide roller (first guide roller) 3a, the platen roller 2 and the downstream guide roller (second guide roller) 3b is positioned vertically above the two upstream The side photographing section 17a and the two downstream side photographing sections 17b detect the positions of the start and end positions of the corresponding micro-patterned area of the sheet-like body (film) 4 that are pre-attached by the laser marker 10. In addition, the sheet-like body (film) 4 is conveyed by the drive pitch of the winder 6 by an amount equivalent to the length of one unit.

如圖4B表示,藉上游側攝影部17a及下游側攝影部17b檢測4處的標識時,以該所檢測的4處標識為基準,將載放模具(金屬模)14的載台11,例如往旋轉方向(θ)旋轉,定位使4處的標識與微小圖案區域的起始端及終端重疊。針對定位的確認,也是根據上游側攝影部17a及下游側攝影部17b的攝影影像來執行。As shown in Fig. 4B, when four marks are detected by the upstream side photographing section 17a and the downstream side photographing section 17b, based on the four detected marks, the stage 11 on which the mold (metal mold) 14 is placed is, for example, Rotate in the direction of rotation (θ), and position the 4 marks to overlap the start and end of the tiny pattern area. The confirmation of the positioning is also performed based on the captured images of the upstream side imaging unit 17a and the downstream side imaging unit 17b.

定位結束時,如圖4C表示,縱剖面為大致L字型的薄膜夾16將片狀體(薄膜)4朝著模具(金屬模)14的表面推壓並夾持。並且,上游側導輥(第1導輥)3a也夾持。When the positioning is completed, as shown in FIG. 4C, the film clip 16 having a substantially L-shaped longitudinal section presses and clamps the sheet-shaped body (film) 4 toward the surface of the mold (metal mold) 14. In addition, the upstream guide roller (first guide roller) 3a is also sandwiched.

接著,如圖4D表示,使壓印輥2下降,並如圖4E表示,至此在超過模具(金屬模)14的下游側端部的位置停止的下游側導輥(第2導輥)3b往上游側移動與壓印輥2形成預定的位置關係。此時,下游側導輥(第2導輥)3b是比壓印輥2位在垂直方向上方,比上游側導輥(第1導輥)3a更位於上游側。因此,從壓印輥2所推壓的位置跨下游側導輥(第2導輥)3b的片狀體(薄膜)4是與模具(金屬模)14的表面形成預定的角度。Next, as shown in FIG. 4D, the platen roller 2 is lowered, and as shown in FIG. 4E, the downstream guide roller (second guide roller) 3b stopped at a position beyond the downstream end of the mold (metal mold) 14 to The upstream movement forms a predetermined positional relationship with the platen roller 2. At this time, the downstream guide roller (second guide roller) 3b is vertically above the platen roller 2, and is positioned on the upstream side than the upstream guide roller (first guide roller) 3a. Therefore, the sheet (film) 4 that straddles the downstream guide roller (second guide roller) 3b from the position pressed by the platen roller 2 forms a predetermined angle with the surface of the mold (metal mold) 14.

如圖4F表示,壓印輥2一邊推壓片狀體(薄膜)4,一邊與下游側導輥(第2導輥)3b以等速移動至超過模具(金屬模)14的下游側端部。藉著壓印輥2與下游側導輥(第2導輥)3b以等速移動,使該等的位置關係以一定的狀態往下游側移動,藉此不致產生賦予片狀體(薄膜)4之張力的變動。在此,例如,壓印輥2及下游側導輥(第2導輥)3b的移動速度為150mm/s。As shown in Figure 4F, while pressing the sheet (film) 4, the platen roller 2 moves at the same speed with the downstream guide roller (second guide roller) 3b to exceed the downstream end of the mold (metal mold) 14 . With the impression roller 2 and the downstream guide roller (second guide roller) 3b moving at a constant speed, the positional relationship between them is moved to the downstream side in a certain state, thereby preventing the generation of the sheet-like body (film) 4 The change of tension. Here, for example, the moving speed of the platen roller 2 and the downstream guide roller (second guide roller) 3b is 150 mm/s.

接著,如圖4G表示,硬化光照射器8下降至薄膜夾16的正上方。並且,硬化光照射器8是對預先塗佈於模具(金屬模)14表面的微小圖案區域,藉壓印輥2之推壓力壓接於片狀體(薄膜)4的光硬化性樹脂,一邊從片狀體(薄膜)4的上方照射紫外線(硬化光),一邊移動至位在超過模具(金屬模)14之下游側端部的位置的壓印輥2的附近。藉此,使光硬化性樹脂硬化,將形成在模具(金屬模)14表面的微小凹凸圖案反轉轉印至片狀體(薄膜)4。Next, as shown in FIG. 4G, the curing light irradiator 8 is lowered to just above the film clamp 16. In addition, the curing light irradiator 8 presses the photocurable resin of the sheet (film) 4 on the micro-pattern area previously coated on the surface of the mold (metal mold) 14 by the pressing force of the embossing roller 2. The sheet-like body (film) 4 is irradiated with ultraviolet rays (curing light) from above, and moves to the vicinity of the platen roller 2 which is positioned beyond the downstream end of the mold (metal mold) 14. Thereby, the photocurable resin is cured, and the minute concave-convex pattern formed on the surface of the mold (metal mold) 14 is reversely transferred to the sheet-like body (film) 4.

如圖4I表示,接著,使薄膜夾16上升,從模具(金屬模)14退避。並且,壓印輥2是與下游側導輥(第2導輥)3b一起開始以等速往上游移動。如圖4J表示,壓印輥2與下游側導輥(第2導輥)3b一起以等速往上游側移動,藉以使固著於片狀體(薄膜)4的複製品以均一的狀態,從形成於模具(金屬模)14表面的微小凹凸圖案剝離。壓印輥2到達模具(金屬模)14的上游側端部附近為止,上游側導輥(第1導輥)3a持續地夾持。最後,如圖4K表示,壓印輥2到達模具(金屬模)14的上游側端部附近時,上游側導輥(第1導輥)3a被從夾持開放,使壓印輥2及下游測導輥(第2導輥)3b上升,獲得固著於片狀體(薄膜)4之1單位量的複製品。As shown in FIG. 4I, next, the film clamp 16 is raised and retracted from the mold (metal mold) 14. In addition, the platen roller 2 starts to move upstream at a constant speed together with the downstream guide roller (second guide roller) 3b. As shown in Figure 4J, the platen roller 2 and the downstream guide roller (second guide roller) 3b move to the upstream side at a constant speed, so that the copy fixed to the sheet (film) 4 is in a uniform state. It peels off from the minute concave-convex pattern formed on the surface of the mold (metal mold) 14. Until the platen roller 2 reaches the vicinity of the upstream end of the mold (metal mold) 14, the upstream guide roller (first guide roller) 3a continues to nip. Finally, as shown in FIG. 4K, when the impression roller 2 reaches the vicinity of the upstream end of the mold (metal mold) 14, the upstream guide roller (first guide roller) 3a is opened from the nip, so that the impression roller 2 and the downstream The measuring guide roller (second guide roller) 3b rises, and a copy of 1 unit amount fixed to the sheet (film) 4 is obtained.

雖未圖示,在隨後,捲繞機6至少捲繞1單位量的長度(間距)的片狀體(薄膜)4,藉此捲出機5間距傳動片狀體(薄膜)4。之後,重複圖4A至圖4K表示的動作(step・and・repeat),藉此在片狀體(薄膜)4固著從相同的模具(金屬模)14所轉印的複數個複製品。Although not shown, afterwards, the winder 6 winds at least one unit of length (pitch) of the sheet-shaped body (film) 4 so that the unwinder 5 drives the sheet-shaped body (film) 4 at intervals. After that, the operations (step and repeat) shown in FIGS. 4A to 4K are repeated, whereby a plurality of copies transferred from the same mold (metal mold) 14 are fixed to the sheet (film) 4.

並且,上述的圖3A至圖3E中,雖表示同時執行奈米壓印動作步驟與硬化光照射步驟的場合,但圖4A至圖4K中,在奈米壓印動作步驟結束後執行硬化光照射步驟之構成的點不同。如上述,也可以同時執行奈米壓印動作步驟與硬化光照射步驟,或者,奈米壓印動作步驟結束後執行硬化光照射步驟的其中任一步驟。並且,硬化光照射步驟相關的策略是鑒於與光硬化性樹脂的光硬化特性、樹脂的塗佈量、薄膜及基板材料之固著特性等的照射過程特性(照射速度‧照射能等),藉未圖示的硬化光照射器控制機構,任意地控制照射開始時機、硬化光照射器移動速度及照射時間。3A to 3E described above, although the nanoimprint operation step and the curing light irradiation step are performed at the same time, but in FIGS. 4A to 4K, the curing light irradiation is performed after the nanoimprint operation step is completed. The composition of the steps is different. As described above, the nanoimprint operation step and the hardening light irradiation step may be performed at the same time, or any one of the hardening light irradiation steps may be performed after the nanoimprint operation step is completed. In addition, the strategy related to the curing light irradiation step is based on the characteristics of the irradiation process (irradiation speed, irradiation energy, etc.) such as the photocuring characteristics of the photocurable resin, the amount of resin applied, the fixing characteristics of the film and the substrate material, etc. The curing light irradiator control mechanism, not shown, arbitrarily controls the irradiation start timing, the moving speed of the curing light irradiator, and the irradiation time.

圖5是表示複製品形成時之過程的概要的圖,(A)為薄膜定位,(B)為推壓(壓印),(C)為硬化光照射,(D)為剝離及(E)為複製品形成結束時的圖。圖5(A)是以在表面形成有微小凹凸圖案的模具(金屬模)14預先塗佈著光硬化性樹脂的樹脂19的狀態,進行片狀體(薄膜)4對位。之後,圖5(B)是藉壓印輥2將片狀體(薄膜)4一邊往樹脂19推壓一邊朝下游側移動。圖5(C)是在壓接於樹脂19的片狀體(薄膜)4,一邊從硬化光照射器8照射紫外線(硬化光),一邊使硬化光照射器8向下游側移動。圖5(D)是藉壓印輥2向上游側移動,使固著硬化後的樹脂的片狀體(薄膜)4從模具(金屬模)14剝離。圖5(E)是完全地從模具(金屬模)14剝離,藉此形成固著於片狀體(薄膜)4的複製品20。Figure 5 is a diagram showing the outline of the process when the copy is formed, (A) is film positioning, (B) is pressing (imprint), (C) is curing light irradiation, (D) is peeling, and (E) This is the picture at the end of the copy formation. FIG. 5(A) is a state in which a mold (metal mold) 14 having a fine concave-convex pattern formed on the surface is pre-coated with a resin 19 of a photocurable resin, and the sheet-like body (film) 4 is aligned. After that, in FIG. 5(B), the sheet-shaped body (film) 4 is moved to the downstream side while being pressed against the resin 19 by the platen roller 2. FIG. 5(C) shows the sheet-like body (film) 4 which is crimped to the resin 19, while the curing light irradiator 8 is irradiated with ultraviolet rays (curing light), and the curing light irradiator 8 is moved to the downstream side. In FIG. 5(D), the platen roller 2 moves to the upstream side, and the sheet-like body (film) 4 of the fixed and hardened resin is peeled from the mold (metal mold) 14. FIG. 5(E) is completely peeled from the mold (metal mold) 14, thereby forming a replica 20 fixed to the sheet-shaped body (film) 4. As shown in FIG.

(朝玻璃基板的圖案形成時之微小構造轉印裝置的動作)(Operation of the transfer device for microstructures during pattern formation on the glass substrate)

以下,藉微小構造轉印裝置1,針對朝玻璃基板藉複製品形成(轉印)微小凹凸圖案的動作說明。圖6為圖1表示的微小構造轉印裝置之概略構成的側面圖,對玻璃基板藉複製品進行微小凹凸圖案轉印時的側面圖,圖7為圖6表示之微小構造轉印裝置的平面圖。與上述圖1及圖2不同的點是在載台11,以載放玻璃基板15的構成來取代載放模具(金屬模)14的構成。因而,在此省略針對圖6及圖7的說明。Hereinafter, the microstructure transfer device 1 is used to describe the operation of forming (transferring) a micro concave-convex pattern on a glass substrate by a replica. 6 is a side view of the schematic configuration of the microstructure transfer device shown in FIG. 1, a side view of the transfer of the micro-concave pattern on a copy of the glass substrate, and FIG. 7 is a plan view of the microstructure transfer device shown in FIG. 6 . The difference from FIGS. 1 and 2 described above is that the glass substrate 15 is placed on the stage 11 instead of the placement mold (metal mold) 14. Therefore, the description of FIGS. 6 and 7 is omitted here.

表示於上述圖3A至圖3E的各步驟是在載台11載放著預先塗佈有光硬化性樹脂的玻璃基板15,將表面具有固著於片狀體(薄膜)4的微小凹凸圖案的複製品,藉壓印輥2一邊朝玻璃基板15的光硬化性樹脂推壓,一邊與下游側導輥(第2導輥)3b以等速向下游側移動。並且,藉著追隨壓印輥2一邊照射紫外線(硬化光)一邊向下游側移動的硬化光照射器8,使玻璃基板15的光硬化性樹脂硬化,如圖3E表示,將複製品從具有硬化後之光硬化性樹脂的玻璃基板15剝離,在玻璃基板15的表面形成有微小凹凸圖案。Each step shown in the above-mentioned FIGS. 3A to 3E is to mount a glass substrate 15 pre-coated with a photocurable resin on the stage 11, and to have the surface of the glass substrate 15 fixed to the sheet (film) 4 with a fine uneven pattern The copy is pushed by the platen roller 2 toward the photocurable resin of the glass substrate 15 and moves downstream at the same speed as the downstream guide roller (second guide roller) 3b. And, by following the impression roller 2 while irradiating ultraviolet rays (curing light) while moving to the downstream side, the curing light irradiator 8 hardens the photocurable resin of the glass substrate 15, as shown in FIG. After that, the glass substrate 15 of the photocurable resin is peeled off, and a fine concavo-convex pattern is formed on the surface of the glass substrate 15.

並且,針對如上述的圖4A至圖4K之上游側導輥(第1導輥)3a、壓印輥2及下游側導輥(第2導輥)3b的動作,也是以預先塗佈有光硬化性樹脂的玻璃基板15來取代預先塗佈有光硬化性樹脂的模具(金屬模)14,藉上述之上游側導輥(第1導輥)3a、壓印輥2及下游側導輥(第2導輥)3b的動作,將固著於片狀體(薄膜)4的複製品的微小凹凸圖案形成(轉印)於玻璃基板15上。並且,在複製品到達使用界限數,例如數百次的時間點,捲繞機6至少捲繞1單元量的長度(間距)的片狀體(薄膜)4,捲出機5進行片狀體(薄膜)4的間距傳動。藉此,利用新的複製品,再度,重複圖4A至圖4K的動作,在複數個玻璃基板15上轉印複製品的微小凹凸圖案進行圖案形成。In addition, the actions of the upstream guide roller (first guide roller) 3a, platen roller 2 and downstream guide roller (second guide roller) 3b in FIGS. 4A to 4K are also pre-coated with light. The glass substrate 15 of curable resin replaces the mold (metal mold) 14 pre-coated with the photocurable resin, and uses the above-mentioned upstream guide roller (first guide roller) 3a, impression roller 2, and downstream guide roller ( The operation of the second guide roller) 3b forms (transfers) the fine concavo-convex pattern of the replica fixed to the sheet-like body (film) 4 on the glass substrate 15. In addition, when the copy reaches the limit of use, for example, hundreds of times, the winder 6 winds at least one unit of the sheet (film) 4 in length (pitch), and the unwinder 5 performs the sheet (Film) 4 pitch transmission. Thereby, using a new replica, the operations of FIGS. 4A to 4K are repeated again, and the micro concave and convex patterns of the replica are transferred onto a plurality of glass substrates 15 to form a pattern.

如上述,僅間距傳動片狀體(薄膜)4,即可進行新的複製品的更換,因此可降低複製品更換與準備作業的成本。As described above, only the pitch transmission sheet (film) 4 can be replaced with a new copy, so the cost of copy replacement and preparation work can be reduced.

又,可以相同的微小構造轉印裝置1將複製品連續地固著於複數片狀體(薄膜),並且,隨後可對玻璃基板使用複製品進行圖案形成。可獲得通量的提升。In addition, the copy can be continuously fixed to a plurality of sheet-like bodies (films) with the same microstructure transfer device 1, and then the glass substrate can be patterned using the copy. An increase in throughput can be obtained.

圖8是表示在玻璃基板的圖案形成時之過程的概要的圖,(A)為複製品定位,(B)為推壓(壓印),(C)為硬化光照射,(D)為剝離及(E)是在玻璃基板的圖案形成結束時的圖。圖8(A)是將固著在片狀體(薄膜)4的複製品20定位於表面預先塗佈有光硬化性樹脂的樹脂19的玻璃基板15。之後,圖8(B)是藉壓印輥2將固著於片狀體(薄膜)4的複製品20,一邊朝塗佈有樹脂19的玻璃基板15推壓一邊向下游側移動。圖8(C)是朝玻璃基板15上的樹脂19,穿透固著於片狀體(薄膜)4的複製品20,從硬化光照射器8一邊照射紫外線(紫外光),一邊使硬化光照射器8向下游側移動。圖8(D)是藉著壓印輥2向上游側的移動,從具有硬化後的樹脂19的玻璃基板15,將固著於片狀體(薄膜)4的複製品20剝離。圖8(E)是從玻璃基板15完全將固著於片狀體(薄膜)4的複製品20剝離,藉此在玻璃基板15上形成複製品的微小凹凸圖案。Figure 8 is a diagram showing the outline of the process at the time of pattern formation of the glass substrate, (A) is the positioning of the replica, (B) is the pressing (imprint), (C) is the curing light irradiation, (D) is the peeling And (E) are diagrams at the end of pattern formation of the glass substrate. FIG. 8(A) shows that the replica 20 fixed to the sheet-like body (film) 4 is positioned on the glass substrate 15 on which the resin 19 is pre-coated with a photocurable resin. 8(B) shows that the replica 20 fixed to the sheet (film) 4 is moved to the downstream side while being pressed against the glass substrate 15 coated with the resin 19 by the platen roller 2. Fig. 8(C) is directed to the resin 19 on the glass substrate 15, penetrating the replica 20 fixed to the sheet (film) 4, and irradiating ultraviolet light (ultraviolet light) from the curing light irradiator 8 while irradiating the curing light The illuminator 8 moves to the downstream side. FIG. 8(D) shows that by the movement of the platen roller 2 to the upstream side, the replica 20 fixed to the sheet (film) 4 is peeled from the glass substrate 15 having the cured resin 19. FIG. 8(E) shows that the replica 20 fixed to the sheet (film) 4 is completely peeled off from the glass substrate 15, thereby forming a fine concavo-convex pattern of the replica on the glass substrate 15.

並且,本實施例是以微小構造轉印裝置1,在片狀體(薄膜)4連續地固著複數個複製品20之後,在預先塗佈有光硬化性樹脂的玻璃基板15藉著複製品20,轉印(形成)微小凹凸圖案的構成,但並非僅限於此。例如,也可以本實施例的微小構造轉印裝置1,在片狀體(薄膜)4連續地固著複數個複製品20之後,使用該複製品以其他的裝置將複製品的微小凹凸圖案轉印於玻璃基板的構成。In addition, in this embodiment, a microstructure transfer device 1 is used to continuously fix a plurality of replicas 20 on a sheet (film) 4, and then apply the replicas to a glass substrate 15 pre-coated with a photocurable resin. 20. The structure of transferring (forming) the minute concavo-convex pattern, but it is not limited to this. For example, in the microstructure transfer device 1 of this embodiment, after a plurality of replicas 20 are continuously fixed to the sheet (film) 4, the replicas can be used to transfer the microscopic uneven patterns of the replicas with other devices. The composition printed on the glass substrate.

根據本實施例,可提供將複數個複製品連續固著於片狀體(薄膜)的微小構造轉印裝置及微小構造轉印方法。According to this embodiment, it is possible to provide a microstructure transfer device and a microstructure transfer method that continuously fix a plurality of copies to a sheet (film).

又,根據本實施例,藉著將複數個複製品連續固著於片狀體,可獲得複製品形成之通量的提升。In addition, according to this embodiment, by continuously fixing a plurality of replicas to the sheet-like body, the throughput of replica formation can be increased.

又,假如以本實施例的微小構造轉印裝置,朝複製品形成與玻璃基板上之複製品的微小凹凸圖案的轉印進行圖案形成時,固著於片狀體的複數個複製品之中,即使在一個複製品到達使用期限的場合,僅藉著間距傳動片狀體,即可成為下一個新的複製品的使用,因此可降低複製品的更換與準備作業的成本。 [實施例2]Moreover, if the micro-structure transfer device of this embodiment is used to form a pattern to transfer the micro-concave pattern of the replica and the replica on the glass substrate, it will be fixed to the plurality of replicas of the sheet-like body. , Even when a copy reaches its expiration date, only by using the pitch transmission sheet, it can be used as the next new copy, so the cost of replacement and preparation of the copy can be reduced. [Example 2]

圖9是表示本發明其他實施例相關之實施例2的微小構造轉印裝置的平面圖。如圖9表示,本實施例中,以複製品連續形成裝置21、光硬化性樹脂塗佈機構22、複製品形狀檢查裝置31及圖案形成裝置41構成的點與實施例1不同。尤其是在複製品形成用設置複製品連續形成裝置21,在該複製品連續形成裝置21設置有將光硬化性樹脂塗佈於模具(金屬模)的光硬化性樹脂塗佈機構22的點不同,另外,在玻璃基板上使用複製品形成微小凹凸圖案之前,設置檢查複製品的形狀的複製品形狀檢查裝置31的點與實施例1不同。對與實施例1相同的構成元件賦予相同符號,以下省略與實施例1重複的說明。Fig. 9 is a plan view showing a microstructure transfer device of Example 2 related to another embodiment of the present invention. As shown in FIG. 9, the present embodiment is different from the first embodiment in that the replica continuous forming device 21, the photocurable resin coating mechanism 22, the replica shape inspection device 31, and the pattern forming device 41 are constituted. Particularly, the continuous copy forming device 21 is provided for the copy forming, and the photocurable resin coating mechanism 22 for applying the photocurable resin to the mold (metal mold) is installed in the continuous copy forming device 21. The point is different In addition, the point that the replica shape inspection device 31 for inspecting the shape of the replica is installed before forming the fine concavo-convex pattern on the glass substrate is different from the first embodiment. The same reference numerals are given to the same constituent elements as those of the first embodiment, and the descriptions that overlap with those of the first embodiment are omitted below.

如圖9表示,複製品連續形成裝置21的構成是與上述實施例1表示的微小構造轉印裝置1大致相同。在將模具(金屬模)14搬入載台之前,以光硬化性樹脂塗佈機構22在形成於模具(金屬模)14表面的微小凹凸圖案塗佈光硬化性樹脂。並且,作為光硬化性樹脂塗佈機構22,例如使用噴射印表機等。塗佈有光硬化性樹脂的模具(金屬模)14是載放於載台,藉壓印輥2、導輥3、捲出機5及捲繞機6等的動作,與上述實施例1同樣,在片狀體(薄膜)4連續地固著複數個複製品20。As shown in FIG. 9, the structure of the continuous copy forming device 21 is substantially the same as that of the minute structure transfer device 1 shown in the first embodiment. Before the mold (metal mold) 14 is loaded into the stage, the photocurable resin coating mechanism 22 is used to apply a photocurable resin to the minute concave-convex pattern formed on the surface of the mold (metal mold) 14. In addition, as the photocurable resin coating mechanism 22, for example, a jet printer or the like is used. The mold (metal mold) 14 coated with the photocurable resin is placed on the stage, and the operations of the impression roller 2, the guide roller 3, the unwinder 5, and the winder 6 are the same as those in the first embodiment. , A plurality of replicas 20 are continuously fixed to the sheet-like body (film) 4.

將複製品連續形成裝置21所形成的複製品20送至複製品形狀檢查裝置31,對形成(轉印)於複製品20的微小凹凸圖案,執行是否有缺陷或不良產生的檢查。作為複製品形狀檢查裝置31使用的形狀檢查裝置,例如,可使用原子間力顯微鏡(Atomic Force Microscope:AFM),或掃描型電子顯微鏡(Scanning Electron Microscope:SEM)、光學式檢查裝置之散射測量(Scatterometory)等。其中以使用AFM為佳。The copy 20 formed by the copy continuous forming device 21 is sent to the copy shape inspection device 31, and the micro concave and convex pattern formed (transferred) on the copy 20 is inspected for defects or defects. As the shape inspection device used in the replica shape inspection device 31, for example, an atomic force microscope (Atomic Force Microscope: AFM), a scanning electron microscope (Scanning Electron Microscope: SEM), or scattering measurement of an optical inspection device can be used. Scatterometory) and so on. Among them, it is better to use AFM.

以複製品形狀檢查裝置31在判定為不良複製品的場合,辨識特定不良之單元的資訊(配置、不良內容等),記憶於未圖示的記憶部。複製品形狀檢查裝置31與圖案形成裝置41是透過網路等,共享不良單元的不良資訊。When the copy shape inspection device 31 determines that it is a defective copy, the information (arrangement, defective content, etc.) of a specific defective unit is identified and stored in a memory unit not shown. The replica shape inspection device 31 and the pattern forming device 41 share the defective information of the defective unit through a network or the like.

圖案形成裝置41具備:將塗佈有從上游裝置所搬入之光硬化性樹脂的玻璃基板15朝圖案形成裝置41搬運,或者將以圖案形成裝置41形成有微小凹凸圖案的玻璃基板15朝下游裝置搬運的搬運機構42。又,圖案形成裝置41是將塗佈有搬運機構42所搬入之光硬化性樹脂的玻璃基板15收容於門型架13內,並由此,具備與上述實施例1表示的微小構造轉印裝置1相同的捲出機5及捲繞機6,進一步未圖示的各種輥,將複製品20的微小凹凸圖案對玻璃基板15進行圖案形成(轉印)。The patterning device 41 is equipped with: a glass substrate 15 coated with a photocurable resin carried in from an upstream device is transported to the patterning device 41, or a glass substrate 15 with a fine concave-convex pattern formed by the patterning device 41 is moved to a downstream device Transporting mechanism 42 for transporting. In addition, the pattern forming device 41 houses the glass substrate 15 coated with the photocurable resin carried by the transport mechanism 42 in the gantry 13, and thus is equipped with the microstructure transfer device shown in the above-mentioned embodiment 1. 1. The same unwinder 5 and winder 6, and various rollers not shown in the figure, pattern (transfer) the fine concavity and convexity pattern of the replica 20 on the glass substrate 15.

根據本實施例,由於可以複製品連續形成裝置21連續地將複數個複製品固著於片狀體,因此與實施例1同樣,可降低複製品更換的準備時間。According to this embodiment, since the continuous copy forming device 21 can continuously fix a plurality of copies to the sheet-like body, as in the first embodiment, the preparation time for replacement of the copies can be reduced.

又,根據本實施例,以複製品形狀檢查裝置31將判定為不良的單元,可以圖案形成裝置41自動地跳過,可進行僅使用良品之複製品的微小凹凸圖案形成,因此可提升表面形成有微小凹凸圖案之玻璃基板的良率。 [實施例3]In addition, according to this embodiment, the unit that is judged as defective by the copy shape inspection device 31 can be automatically skipped by the pattern forming device 41, and it is possible to perform the formation of minute concavo-convex patterns using only good copies, thereby improving the surface formation. The yield rate of glass substrates with tiny concave-convex patterns. [Example 3]

圖10是表示本發明其他實施例相關之實施例3的微小構造轉印裝置的平面圖。本實施例中,微小構造轉印裝置具備複製品用光硬化性樹脂塗佈機構及玻璃基板用光硬化性樹脂塗佈機構的點與實施例1及實施例2不同。對與實施例1及實施例2相同的構成元件賦予相同符號,以下省略重複的說明。Fig. 10 is a plan view showing a small structure transfer device of Example 3 related to another embodiment of the present invention. In this example, the microstructure transfer device is different from Example 1 and Example 2 in that the photocurable resin coating mechanism for replicas and the photocurable resin coating mechanism for glass substrates are provided. The same reference numerals are given to the same constituent elements as those of the embodiment 1 and the embodiment 2, and repeated descriptions are omitted below.

如圖10表示,微小構造轉印裝置1a是隔著門型架13在其兩側,分別具備複製品用光硬化性樹脂塗佈機構22a及玻璃基板用光硬化性樹脂塗佈機構22b。在此,圖10中,微小構造轉印裝置1a的長方向定義為X方向,微小構造轉印裝置1a的寬方向定義為Y方向。載放於載台11並配置在搬入門型架13內之模具(金屬模)14定位側的複製品用光硬化性樹脂塗佈機構22a是構成可在Y方向往返移動,將光硬化性樹脂塗佈於載放在載台11並搬入門型架13內的模具(金屬模)14。又,載放於載台11並配置在搬入門型架13內之玻璃基板15定位側的玻璃基板用光硬化性樹脂塗佈機構22b是構成可在Y方向往返移動,將光硬化性樹脂塗佈於載放在載台11並搬入門型架13內的玻璃基板15。該等作為複製品用光硬化性樹脂塗佈機構22a及玻璃基板用光硬化性樹脂塗佈機構22b,例如可使用噴射印表機。As shown in FIG. 10, the microstructure transfer device 1a is provided with a photocurable resin coating mechanism 22a for replicas and a photocurable resin coating mechanism 22b for glass substrates on both sides of the portal frame 13, respectively. Here, in FIG. 10, the longitudinal direction of the minute structure transfer device 1 a is defined as the X direction, and the width direction of the minute structure transfer device 1 a is defined as the Y direction. The photo-curable resin coating mechanism 22a for the replica placed on the stage 11 and placed on the positioning side of the mold (metal mold) 14 in the carrier 13 is configured to move back and forth in the Y direction to remove the photo-curable resin The coating is applied to a mold (metal mold) 14 placed on the stage 11 and carried in the portal frame 13. In addition, the photocurable resin coating mechanism 22b for the glass substrate placed on the stage 11 and arranged on the positioning side of the glass substrate 15 in the carrying portal 13 is configured to move back and forth in the Y direction to coat the photocurable resin. The glass substrate 15 is placed on the stage 11 and carried in the portal type rack 13. As the photocurable resin coating mechanism 22a for replicas and the photocurable resin coating mechanism 22b for glass substrates, for example, a jet printer can be used.

接著,針對複製品形成過程的微小構造轉印裝置1a的動作說明。圖11A是表示複製品形成過程之模具朝著載台的設定狀態的圖。如圖11A表示,將模具(金屬模)14設定(載放)於載台11。此時,複製品用光硬化性樹脂塗佈機構22a在初始位置待機。圖11B是表示複製品形成過程之光硬化性樹脂塗佈及模具定位狀態的圖。複製品用光硬化性樹脂塗佈機構22a是在Y方向移動,並使得載放於載台11的模具(金屬模)14朝搬入門型架13內的位置移動。複製品用光硬化性樹脂塗佈機構22a在將載放於載台11的模具(金屬模)14搬入門型架13內時,在模具(金屬模)14的表面塗佈光硬化性樹脂。圖11C是表示複製品形成過程之複製品連續形成狀態的圖。圖11C是如上述實施例1表示,在未圖示的片狀體(薄膜),形成有將反轉轉印著形成於模具(金屬模)14的表面之微小凹凸圖案的複製品。圖11D是表示複製品形成過程之模具復位狀態的圖。在複製品形成後,模具(金屬模)14是以載放於載台11的狀態搬出門型架外。Next, the operation of the microstructure transfer device 1a in the copy forming process will be described. Fig. 11A is a diagram showing the setting state of the mold toward the stage during the copy forming process. As shown in FIG. 11A, the mold (metal mold) 14 is set (mounted) on the stage 11. At this time, the photocurable resin coating mechanism 22a for a copy stands by at the initial position. Fig. 11B is a diagram showing the photocurable resin coating and mold positioning state during the copy formation process. The photocurable resin coating mechanism 22 a for the copy moves in the Y direction, and moves the mold (metal mold) 14 placed on the stage 11 toward the position in the carrying portal frame 13. The photocurable resin coating mechanism 22a for replicas applies a photocurable resin to the surface of the mold (metal mold) 14 when the mold (metal mold) 14 placed on the stage 11 is carried into the portal frame 13. Fig. 11C is a diagram showing a state in which a copy is continuously formed during the copy forming process. FIG. 11C is a sheet-like body (film) not shown in the figure, as shown in the above-mentioned Example 1, in which a replica of the fine uneven pattern formed on the surface of the mold (metal mold) 14 is formed by reverse transfer transfer. Fig. 11D is a diagram showing the state of the mold reset during the formation of the replica. After the replica is formed, the mold (metal mold) 14 is carried out of the portal frame while being placed on the stage 11.

接著,針對玻璃基板之圖案形成過程的微小構造轉印裝置1a的動作說明。圖12A是表示玻璃基板的圖案形成過程之玻璃基板朝著載台的設定狀態的圖。如圖12A表示,將玻璃基板15設定(載放)於載台11。此時,玻璃基板用光硬化性樹脂塗佈機構22b在初始位置待機。圖12B是表示玻璃基板的圖案形成過程之光硬化性樹脂塗佈及玻璃基板定位狀態的圖。如圖12B表示,玻璃基板用光硬化性樹脂塗佈機構22b是在Y方向移動,朝載放於載台11的玻璃基板15之中進行圖案形成的區域並搬入門型架13內的位置移動。玻璃基板用光硬化性樹脂塗佈機構22b在將載放於載台11的玻璃基板15搬入門型架13內時,在玻璃基板15之中進行圖案形成的區域塗佈光硬化性樹脂。圖12C是表示玻璃基板的圖案形成過程之圖案連續形成狀態的圖。在門型架13內,成為載台11的玻璃基板15之中,藉玻璃基板用光硬化性樹脂塗佈機構22b朝塗佈有光硬化性樹脂的區域形成(轉印)複製品20的微小凹凸圖案。圖12D是表示玻璃基板的圖案形成過程之玻璃基板復位狀態的圖。在對玻璃基板15的圖案形成後,玻璃基板15是以載放於載台11的狀態搬出門型架外。Next, the operation of the microstructure transfer device 1a in the pattern formation process of the glass substrate will be described. It is a figure which shows the setting state of the glass substrate toward a stage in the pattern formation process of a glass substrate. As shown in FIG. 12A, the glass substrate 15 is set (mounted) on the stage 11. At this time, the photocurable resin coating mechanism 22b for a glass substrate stands by in an initial position. Fig. 12B is a diagram showing the photocurable resin coating and the positioning state of the glass substrate in the pattern formation process of the glass substrate. As shown in FIG. 12B, the glass substrate photocurable resin coating mechanism 22b moves in the Y direction, and moves toward the area where the pattern is formed among the glass substrate 15 placed on the stage 11 and moves into the gate holder 13 . When the glass substrate 15 placed on the stage 11 is carried into the portal frame 13, the photocurable resin coating mechanism for glass substrate 22 b applies the photocurable resin to the patterned area of the glass substrate 15. Fig. 12C is a diagram showing a state in which a pattern is continuously formed in a pattern forming process of a glass substrate. In the portal frame 13, among the glass substrates 15 that become the stage 11, the photocurable resin coating mechanism 22b for glass substrates is used to form (transfer) microscopic replicas 20 toward the area coated with the photocurable resin. Bump pattern. Fig. 12D is a diagram showing the reset state of the glass substrate in the pattern formation process of the glass substrate. After patterning the glass substrate 15, the glass substrate 15 is carried out of the portal frame in a state of being placed on the stage 11.

根據本實施例,在複製品形成過程時及對玻璃基板之圖案形成過程時,分別具備可獨立動作的複製品用光硬化性樹脂塗佈機構22a及玻璃基板用光硬化性樹脂塗佈機構22b,藉此可以相同的微小構造轉印裝置1a,在光硬化性樹脂的塗佈之後,複製品連續形成,並進一步進行對玻璃基板15的圖案形成為止,提升作業性。 [實施例4]According to this embodiment, the photocurable resin coating mechanism 22a for the replica and the photocurable resin coating mechanism 22b for the glass substrate that can operate independently during the process of forming the replica and the process of forming the pattern on the glass substrate are provided. As a result, the same microstructure transfer device 1a can continuously form replicas after the application of the photocurable resin and further pattern formation on the glass substrate 15 to improve workability. [Example 4]

圖13是表示本發明其他實施例相關之實施例4的微小構造轉印裝置的正面圖(圖1及圖6的A方向箭頭圖),圖14為圖13的A方向箭頭圖。本實施例是在壓印輥的外圍面具有聚氨酯橡膠襯墊,在壓印輥的正上方設置支承輥機構的點與實施例1至實施例3不同。FIG. 13 is a front view (arrow view in the direction of A in FIGS. 1 and 6) showing a microstructure transfer device of Example 4 related to another embodiment of the present invention, and FIG. 14 is an arrow view in the direction of A in FIG. 13. This embodiment is different from Embodiment 1 to Embodiment 3 in that a urethane rubber liner is provided on the outer surface of the impression roller, and the support roller mechanism is arranged directly above the impression roller.

如圖13表示,本實施例的微小構造轉印裝置,具備:分別配置在壓印輥2的長方向兩端部附近的上方的一對Z軸驅動部51,及配置在各個Z軸驅動部51的下方,監視負載用的負載感測器52。又,如圖14表示,壓印輥2在其外圍面具有聚氨酯橡膠襯墊56,在壓印輥2的正上方具備支承輥機構55。如圖13表示,支承輥機構55是沿著壓印輥2的長方向,以預定的間隔分開設有複數個。可藉該等複數個支承輥機構,個別調整高度及推壓力。並且,圖13表示的例雖是以在載台11載放模具(金屬模)14的狀態,亦即,在片狀體(薄膜)4連續固著複數個複製品的場合,但是在玻璃基板15使用複製品轉印微小凹凸圖案的場合,可將玻璃基板15載放於載台11。As shown in FIG. 13, the microstructure transfer device of this embodiment includes: a pair of Z-axis drive portions 51 respectively arranged above the vicinity of both ends in the longitudinal direction of the platen roller 2, and the respective Z-axis drive portions Below 51, a load sensor 52 for monitoring the load. Furthermore, as shown in FIG. 14, the platen roller 2 has a urethane rubber gasket 56 on its outer peripheral surface, and a support roller mechanism 55 is provided directly above the platen roller 2. As shown in Fig. 13, the support roller mechanism 55 is provided in plural along the longitudinal direction of the platen roller 2 at predetermined intervals. The height and pushing force can be adjusted individually by these plural supporting roller mechanisms. In addition, although the example shown in FIG. 13 is in the state where the mold (metal mold) 14 is placed on the stage 11, that is, when a plurality of replicas are continuously fixed on the sheet (film) 4, the glass substrate 15 When using a replica to transfer a fine concavo-convex pattern, the glass substrate 15 can be placed on the stage 11.

根據本實施例,可藉支承輥機構55個別調整壓印輥2的高度及推壓力,因此可抑制壓印輥2本身的彎曲。According to this embodiment, the height and pressing force of the platen roller 2 can be adjusted individually by the support roller mechanism 55, and therefore the bending of the platen roller 2 itself can be suppressed.

並且,另外由於可藉支承輥機構55個別調整壓印輥2的高度及推壓力,因此可藉壓印輥2使片狀體(薄膜)平順地追隨模具(金屬模)以均一的壓力進行壓印。In addition, since the height and pressing force of the impression roller 2 can be adjusted individually by the support roller mechanism 55, the impression roller 2 can make the sheet (film) follow the mold (metal mold) smoothly and press uniformly. Printed.

又,另外由於可藉支承輥機構55個別調整壓印輥2的高度及推壓力,因此在複數個模具(金屬模)使用時可吸收模具(金屬模)間的彼此階差,平順地追隨並以均一的壓力進行壓印。又,另外,相對於高黏度的樹脂材料,藉支承輥機構55傳達均一的壓力而可成為高精度的壓印。又,另外,在壓印結束光硬化性樹脂的硬化後,對於剝離性不良的薄膜或固著力強的光硬化性樹脂,可藉支承輥機構55防止剝離時的輥脫離並可藉均一的剝離力(張力)確實進行薄膜剝離。In addition, since the height and pressing force of the platen roller 2 can be adjusted individually by the support roller mechanism 55, when a plurality of molds (metal molds) are used, the level difference between the molds (metal molds) can be absorbed, and the steps can be smoothly followed. Imprint with uniform pressure. In addition, with respect to high-viscosity resin materials, uniform pressure can be transmitted by the support roller mechanism 55, so that high-precision imprinting can be achieved. In addition, after the curing of the photocurable resin is completed by imprinting, for films with poor peelability or photocurable resins with strong fixing power, the support roller mechanism 55 can be used to prevent roller detachment during peeling, and uniform peeling can be achieved. Force (tension) surely peels off the film.

並且,圖13中,雖是將支承輥機構55沿著壓印輥2的長方向,以預定的間隔分開設置複數個的構成,但並非僅限於此,也可以是配置在壓印輥2之長方向任意的一處的構成。並且,支承輥機構55的設置數量,根據需要適當設定即可。In addition, in FIG. 13, although the support roller mechanism 55 is arranged at predetermined intervals along the longitudinal direction of the platen roller 2 in a plurality of configurations, but it is not limited to this, and it may be arranged between the platen roller 2. An arbitrary configuration in the longitudinal direction. In addition, the installation number of the support roller mechanism 55 may be appropriately set as required.

並且,支承輥機構55之設置時的配列不限於圖示的1列。例如,也可以是在壓印輥2的外圍上配置2列、3列等、複數列、支承輥機構55的構成。In addition, the arrangement at the time of installation of the support roller mechanism 55 is not limited to the one shown in the figure. For example, a configuration in which two rows, three rows, etc., multiple rows, and the support roller mechanism 55 are arranged on the periphery of the platen roller 2 may be used.

並且,本發明不限於上述的實施例,並包括種種的變形例。例如,上述的實施例是為容易理解本發明而作說明之詳細的說明,並非僅限定於具備說明之所有的構成。並且,也可將某實施例的構成的一部分置換成其他實施例的構成,並且,也可在某實施例的構成外加其他實施例的構成。又,針對各實施例的構成的一部分,可進行其他實施例之構成的追加、刪除、置換。In addition, the present invention is not limited to the above-mentioned embodiments, and includes various modifications. For example, the above-mentioned embodiments are detailed descriptions for easy understanding of the present invention, and are not limited to all the configurations provided for the description. In addition, a part of the configuration of a certain embodiment may be replaced with a configuration of another embodiment, and the configuration of a certain embodiment may be added to the configuration of another embodiment. In addition, for a part of the configuration of each embodiment, addition, deletion, and replacement of the configuration of other embodiments can be performed.

1,1a:微小構造轉印裝置 2:壓印輥 3:導輥 3a:上游側導輥(第1導輥) 3b:下游側導輥(第2導輥) 4:片狀體(薄膜) 5:捲出機 6:捲繞機 7:張力調節輥 8:硬化光照射器 9:乾式清淨機 10:雷射標識器 11:載台 12:清淨輥 13:門型架 14:模具(金屬模) 15:玻璃基板 16:薄膜夾 17a:上游側攝影部 17b:下游側攝影部 18:攝影部支撐部 19:樹脂 20:複製品 21:複製品連續形成裝置 22:光硬化性樹脂塗佈機構 22a:複製品用光硬化性樹脂塗佈機構 22b:玻璃基板用光硬化性樹脂塗佈機構 31:複製品形狀檢查裝置 41:圖案形成裝置 42:搬運機構 51:Z軸驅動部 52:負載感測器 55:支承輥機構 56:聚氨酯橡膠襯墊1,1a: Micro structure transfer device 2: Embossing roller 3: Guide roller 3a: Upstream guide roller (1st guide roller) 3b: Downstream guide roller (2nd guide roller) 4: Flake (film) 5: Unwinding machine 6: Winding machine 7: Tension adjusting roller 8: Hardening light irradiator 9: Dry cleaning machine 10: Laser marker 11: Stage 12: Cleaning roller 13: Door frame 14: Mold (metal mold) 15: Glass substrate 16: film clip 17a: Upstream side photography department 17b: Downstream side photography department 18: Photography department support 19: Resin 20: Replica 21: Replica continuous forming device 22: Light-curable resin coating mechanism 22a: Light-curing resin coating mechanism for replicas 22b: Light-curing resin coating mechanism for glass substrates 31: Replica shape inspection device 41: Pattern forming device 42: Transport mechanism 51: Z-axis drive unit 52: Load sensor 55: Support roller mechanism 56: Polyurethane rubber liner

[圖1]是表示本發明一實施例相關之實施例1的微小構造轉印裝置的概略構成的側面圖。 [圖2]為圖1表示之微小構造轉印裝置的平面圖。 [圖3A]是表示複製品形成時藉攝影部之定位步驟的圖。 [圖3B]是表示複製品形成時之薄膜夾及壓印輥推壓步驟的圖。 [圖3C]是表示複製品形成時之奈米壓印動作步驟的圖。 [圖3D]是表示複製品形成時之硬化光照射步驟的圖。 [圖3E]是表示複製品形成時之剝離步驟的圖。 [圖4A]是表示上游側導輥、壓印輥及下游側導輥的動作的圖,並表示附加於片狀體之標識檢測時的狀態的圖。 [圖4B]是表示上游側導輥、壓印輥及下游側導輥的動作的圖,並表示定位動作及定位確認時的狀態的圖。 [圖4C]是表示上游側導輥、壓印輥及下游側導輥的動作的圖,並表示薄膜夾及上游側導輥夾持時的狀態的圖。 [圖4D]是表示上游側導輥、壓印輥及下游側導輥的動作的圖,並表示壓印輥下降時的狀態的圖。 [圖4E]是表示上游側導輥、壓印輥及下游側導輥的動作的圖,並表示壓印輥及下游側導輥開始推壓時的狀態的圖。 [圖4F]是表示上游側導輥、壓印輥及下游側導輥的動作的圖,並表示壓印輥及下游側導輥一起往下游側移動推壓時的狀態的圖。 [圖4G]是表示上游側導輥、壓印輥及下游側導輥的動作的圖,並表示硬化光照射器下降時的狀態的圖。 [圖4H]是表示上游側導輥、壓印輥及下游側導輥的動作的圖,並表示硬化光照射時的狀態的圖。 [圖4I]是表示上游側導輥、壓印輥及下游側導輥的動作的圖,並表示薄膜夾上升/退避,及壓印輥及下游側導輥一起往上游側開始移動時的狀態的圖。 [圖4J]是表示上游側導輥、壓印輥及下游側導輥的動作的圖,並表示剝離時的狀態的圖。 [圖4K]是表示上游側導輥、壓印輥及下游側導輥的動作的圖,並表示壓印輥及下游側導輥一起往上游側開始移動時的狀態的圖。 [圖5]是表示複製品形成時之過程的概要的圖,(A)為薄膜定位,(B)為推壓(壓印),(C)為硬化光照射,(D)為剝離及(E)為複製品形成結束時的圖。 [圖6]為圖1表示的微小構造轉印裝置之概略構成的側面圖,對玻璃基板藉複製品進行微小凹凸圖案轉印時的側面圖。 [圖7]為圖6表示之微小構造轉印裝置的平面圖。 [圖8]是表示在玻璃基板的圖案形成時之過程的概要的圖,(A)為複製品定位,(B)為推壓(壓印),(C)為硬化光照射,(D)為剝離及(E)是在玻璃基板的圖案形成結束時的圖。 [圖9]是表示本發明其他實施例相關之實施例2的微小構造轉印裝置的平面圖。 [圖10]是表示本發明其他實施例相關之實施例3的微小構造轉印裝置的平面圖。 [圖11A]是表示複製品形成過程之模具朝著載台的設定狀態的圖。 [圖11B]是表示複製品形成過程之光硬化性樹脂塗佈及模具定位狀態的圖。 [圖11C]是表示複製品形成過程之複製品連續形成狀態的圖。 [圖11D]是表示複製品形成過程之模具復位狀態的圖。 [圖12A]是表示玻璃基板的圖案形成過程之玻璃基板朝著載台的設定狀態的圖。 [圖12B]是表示玻璃基板的圖案形成過程之光硬化性樹脂塗佈及模具定位狀態的圖。 [圖12C]是表示玻璃基板的圖案形成過程之圖案連續形成狀態的圖。 [圖12D]是表示玻璃基板的圖案形成過程之玻璃基板復位狀態的圖。 [圖13]是表示本發明其他實施例相關之實施例4的微小構造轉印裝置的正面圖。 [圖14]為圖13的A方向箭頭顯示圖,支承輥機構的剖面圖。[Fig. 1] Fig. 1 is a side view showing the schematic configuration of a microstructure transfer device of Example 1 related to an embodiment of the present invention. [Fig. 2] is a plan view of the microstructure transfer device shown in Fig. 1. [Fig. [Fig. 3A] is a diagram showing the positioning procedure of the borrowing and photographing section when the copy is formed. [Fig. 3B] is a diagram showing the pressing step of the film clamp and the platen roller when the copy is formed. [Fig. 3C] is a diagram showing the steps of the nanoimprint operation when the replica is formed. [Fig. 3D] is a diagram showing the step of irradiating the hardening light when the replica is formed. [Fig. 3E] is a diagram showing the peeling step when the replica is formed. [Fig. 4A] is a diagram showing the actions of the upstream guide roller, the platen roller, and the downstream guide roller, and shows the state at the time of detection of the mark attached to the sheet. [FIG. 4B] is a diagram showing the operations of the upstream guide roller, the platen roller, and the downstream guide roller, and shows the state of the positioning operation and the positioning confirmation. [Fig. 4C] is a diagram showing the operations of the upstream guide roller, the platen roller, and the downstream guide roller, and shows the state when the film clamp and the upstream guide roller are nipped. [Fig. 4D] is a diagram showing the actions of the upstream guide roller, the platen roller, and the downstream side guide roller, and shows the state when the platen roller is lowered. [FIG. 4E] is a diagram showing the actions of the upstream guide roller, the platen roller, and the downstream side guide roller, and shows the state when the platen roller and the downstream guide roller start pressing. [FIG. 4F] is a diagram showing the actions of the upstream guide roller, the platen roller, and the downstream guide roller, and shows the state when the platen roller and the downstream guide roller are moved and pressed to the downstream side together. [Fig. 4G] is a diagram showing the actions of the upstream guide roller, the platen roller, and the downstream guide roller, and shows the state when the curing light irradiator is lowered. [FIG. 4H] is a diagram showing the operations of the upstream guide roller, the platen roller, and the downstream guide roller, and shows the state when the curing light is irradiated. [Figure 4I] is a diagram showing the actions of the upstream guide roller, platen roller, and downstream guide roller, and shows the state when the film clamp rises/retracts, and the platen roller and the downstream guide roller start moving to the upstream side together Figure. [FIG. 4J] is a figure which shows the operation|movement of an upstream guide roller, a platen roller, and a downstream guide roller, and shows the state at the time of peeling. [FIG. 4K] is a diagram showing the actions of the upstream guide roller, the platen roller, and the downstream side guide roller, and shows a state when the platen roller and the downstream guide roller start moving to the upstream side together. [Figure 5] is a diagram showing the outline of the process when the copy is formed, (A) is film positioning, (B) is pressing (imprint), (C) is curing light irradiation, (D) is peeling and ( E) is the picture at the end of the copy formation. [Fig. 6] is a side view of the schematic configuration of the microstructure transfer device shown in Fig. 1, and is a side view when the micro-concave-convex pattern is transferred to a copy of a glass substrate. [Fig. 7] is a plan view of the minute structure transfer device shown in Fig. 6. [Fig. [Figure 8] is a diagram showing the outline of the process at the time of pattern formation on the glass substrate, (A) is the positioning of the replica, (B) is the pressing (imprint), (C) is the curing light irradiation, (D) To peel and (E) are diagrams at the end of pattern formation of the glass substrate. [FIG. 9] is a plan view showing a microstructure transfer device of Example 2 related to another example of the present invention. Fig. 10 is a plan view showing a microstructure transfer device of Example 3 related to another embodiment of the present invention. [Fig. 11A] is a diagram showing the setting state of the mold toward the stage during the replica formation process. [Fig. 11B] is a diagram showing the photocurable resin coating and mold positioning state during the copy formation process. [Fig. 11C] is a diagram showing the continuous formation state of the copy during the copy formation process. [Fig. 11D] is a diagram showing the state of mold reset in the process of forming a replica. [Fig. 12A] is a diagram showing the setting state of the glass substrate toward the stage in the pattern formation process of the glass substrate. [Fig. 12B] is a diagram showing the photocurable resin coating and mold positioning state in the pattern formation process of the glass substrate. [Fig. 12C] is a diagram showing the pattern continuous formation state in the pattern formation process of the glass substrate. [Fig. 12D] is a diagram showing the reset state of the glass substrate in the pattern formation process of the glass substrate. [Fig. 13] is a front view showing a microstructure transfer device of Example 4 related to another embodiment of the present invention. Fig. 14 is a view showing the arrow in the direction of A in Fig. 13 and a cross-sectional view of the support roller mechanism.

1:微小構造轉印裝置 1: Micro structure transfer device

2:壓印輥 2: Embossing roller

3a:上游側導輥(第1導輥) 3a: Upstream guide roller (1st guide roller)

3b:下游側導輥(第2導輥) 3b: Downstream guide roller (2nd guide roller)

4:片狀體(薄膜) 4: Flake (film)

5:捲出機 5: Unwinding machine

6:捲繞機 6: Winding machine

8:硬化光照射器 8: Hardening light irradiator

11:載台 11: Stage

13:門型架 13: Door frame

14:模具(金屬模) 14: Mold (metal mold)

16:薄膜夾 16: film clip

17a:上游側攝影部 17a: Upstream side photography department

17b:下游側攝影部 17b: Downstream side photography department

18:攝影部支撐部 18: Photography department support

Claims (18)

一種微小構造轉印裝置,其特徵為,具備: 捲出機,將具有撓性的片狀體迴捲並捲出該片狀體; 捲繞機,捲繞透過複數個導輥所搬運的上述片狀體; 載台,配置於上述捲出機與上述捲繞機之間,載放在形成有微小凹凸圖案之表面塗佈有光硬化性樹脂的模具; 壓印輥,將上述片狀體從上方一邊朝上述模具推壓,一邊至少在上述模具的兩端部間往返移動;及 硬化光照射器,朝上述模具所推壓的上述片狀體照射硬化光, 在上述片狀體連續地固著複數個複製品。A microstructure transfer device, which is characterized in that it has: The unwinding machine rewinds the flexible sheet and unwinds the sheet; Winding machine to wind the above-mentioned sheet conveyed by a plurality of guide rollers; The carrier is arranged between the unwinding machine and the winder, and is placed on a mold coated with a photocurable resin on the surface of the micro concave-convex pattern; An embossing roller, which pushes the sheet-shaped body toward the mold from above, while at least moving back and forth between the two ends of the mold; and A hardening light irradiator irradiates hardening light to the sheet body pressed by the mold, and A plurality of replicas are continuously fixed to the sheet-like body. 如請求項1記載的微小構造轉印裝置,其中,上述壓印輥是將固著在上述片狀體的複數個複製品之中的一個複製品,透過上述片狀體,一邊朝載放於上述載台並在表面塗佈有上述光硬化性樹脂的基板推壓,一邊至少在上述基板的兩端部間往返移動, 上述硬化光照射器是在塗佈有上述光硬化性樹脂的基板透過上述壓印輥所推壓的上述片狀體及上述複製品照射硬化光,在上述光硬化性樹脂硬化後藉著上述壓印輥將上述片狀體剝離,藉此轉印上述複製品的微小凹凸圖案。The microstructure transfer device according to claim 1, wherein the platen roller is one of a plurality of copies fixed on the sheet-like body, and is placed on the side facing through the sheet-like body The stage is pressed against a substrate coated with the photocurable resin on the surface, and one side moves back and forth at least between both ends of the substrate, The curing light irradiator irradiates the substrate coated with the photocurable resin with curing light through the sheet-like body and the replica pressed by the embossing roller, and the photocurable resin is cured by the press The printing roller peels off the sheet-like body, thereby transferring the fine concavo-convex pattern of the replica. 如請求項1或請求項2記載的微小構造轉印裝置,其中,具備:上述複數個導輥之中,在上述片狀體的搬運方向與上述壓印輥鄰接並位在上游側的第1導輥,及在上述片狀體的搬運方向與上述壓印輥鄰接並位在下游側的第2導輥, 上述第2導輥在上述壓印輥一邊推壓上述片狀體一邊移動時,比上述壓印輥更位在上方,與上述壓印輥一起以等速移動。The micro-structure transfer device according to claim 1 or claim 2, which includes: among the plurality of guide rollers, the first roller is adjacent to and located on the upstream side in the conveying direction of the sheet-like body. A guide roller, and a second guide roller that is adjacent to the platen roller and located on the downstream side in the conveying direction of the sheet-like body, The second guide roller is positioned above the platen roller when the platen roller moves while pressing the sheet-like body, and moves at a constant speed together with the platen roller. 如請求項3記載的微小構造轉印裝置,其中,具備薄膜夾,在上述壓印輥一邊推壓上述片狀體一邊移動時,上述模具或上述基板的端部之中在上述片狀體的搬運方向位於上游側的端部夾持上述片狀體。The microstructure transfer device according to claim 3, wherein a film clamp is provided, and when the platen roller moves while pushing the sheet-like body, the end of the mold or the substrate is in the middle of the sheet-like body The above-mentioned sheet-shaped body is clamped at the end located on the upstream side in the conveying direction. 如請求項4記載的微小構造轉印裝置,其中,上述硬化光照射器是位在上述壓印輥與上述第1導輥之間,上述壓印輥一邊推壓上述片狀體一邊移動時,一邊照射硬化光一邊向下游側移動以使追隨上述壓印輥及上述第2導輥。The microstructure transfer device according to claim 4, wherein the curing light irradiator is positioned between the platen roller and the first guide roller, and when the platen roller moves while pressing the sheet-like body, It moves to the downstream side while irradiating the curing light so as to follow the platen roller and the second guide roller. 如請求項4記載的微小構造轉印裝置,其中,上述硬化光照射器是位在上述壓印輥與上述第1導輥之間,上述壓印輥一邊推壓上述片狀體一邊與上述第2導輥一起以等速朝下游側移動之後,一邊照射硬化光向下游側移動。The microstructure transfer device according to claim 4, wherein the hardening light irradiator is located between the platen roller and the first guide roller, and the platen roller presses the sheet-like body while contacting the first guide roller. After the 2 guide rollers move toward the downstream side at a constant speed, they move toward the downstream side while being irradiated with curing light. 如請求項5記載的微小構造轉印裝置,其中,具有在上述模具及/或上述基板塗佈上述光硬化性樹脂的光硬化性樹脂塗佈機構。The microstructure transfer device according to claim 5, further comprising a photocurable resin coating mechanism for coating the photocurable resin on the mold and/or the substrate. 如請求項6記載的微小構造轉印裝置,其中,具有在上述模具及/或上述基板塗佈上述光硬化性樹脂的光硬化性樹脂塗佈機構。The microstructure transfer device according to claim 6, which has a photocurable resin coating mechanism for coating the photocurable resin on the mold and/or the substrate. 如請求項4記載的微小構造轉印裝置,其中,具有可個別調整上述壓印輥的高度及推壓力的支承輥機構。The microstructure transfer device according to claim 4, which has a support roller mechanism capable of individually adjusting the height and pressing force of the platen roller. 如請求項9記載的微小構造轉印裝置,其中,上述支承輥機構是沿著上述壓印輥的長方向以預定的間隔分開具備複數個。The microstructure transfer device according to claim 9, wherein the support roller mechanism is provided in plural at predetermined intervals along the longitudinal direction of the platen roller. 如請求項9或請求項10記載的微小構造轉印裝置,其中,上述支承輥機構具有配置成在上述壓印輥的正上方與上述壓印輥的外圍面接觸的支承輥。The microstructure transfer device according to claim 9 or claim 10, wherein the support roller mechanism has a support roller arranged to be in contact with the outer peripheral surface of the platen roller directly above the platen roller. 一種微小構造轉印方法,係使用微小構造轉印裝置,該微小構造轉印裝置,具備:將具有撓性的片狀體迴捲並捲出該片狀體的捲出機;捲繞透過複數個導輥所搬運之上述片狀體的捲繞機;及配置於上述捲出機與上述捲繞機之間,載放在形成有微小凹凸圖案的表面塗佈有光硬化性樹脂的模具的載台,其特徵為: 壓印輥從上方一邊朝上述模具推壓上述片狀體,一邊至少在上述模具的兩端部間往返移動的期間對推壓於模具的上述片狀體照射硬化光,在上述片狀體連續地固著複數個複製品。A microstructure transfer method using a microstructure transfer device. The microstructure transfer device is provided with: an unwinding machine that rewinds a flexible sheet-like body and unwinds the sheet-like body; A winding machine for the sheet-like body conveyed by a guide roller; and a mold arranged between the unwinding machine and the winding machine, and placed on a mold coated with a photocurable resin on the surface of the micro concave-convex pattern formed The carrier is characterized by: The embossing roller presses the sheet-like body toward the mold from above, and irradiates the sheet-like body pressed against the mold with curing light at least during the reciprocating movement between the two end portions of the mold, so that the sheet-like body is continuous Multiple copies are fixed on the ground. 如請求項12記載的微小構造轉印方法,其中,上述壓印輥是將固著在上述片狀體的複數個複製品之中的一個複製品,透過上述片狀體,一邊朝載放於上述載台並在表面塗佈有上述光硬化性樹脂的基板推壓,一邊至少在上述基板的兩端部間往返移動的期間對塗佈有上述光硬化性樹脂的基板透過上述壓印輥所推壓的上述片狀體及上述複製品照射硬化光,轉印上述複製品的微小凹凸圖案。The microstructure transfer method according to claim 12, wherein the embossing roller is one of a plurality of copies of the sheet-like body fixed on the sheet-like body, and is placed on the side facing the sheet-like body. The stage is pressed against the substrate coated with the photocurable resin on the surface, and the substrate coated with the photocurable resin passes through the imprint roller at least while moving back and forth between the two ends of the substrate. The pressed sheet-like body and the replica are irradiated with hardening light to transfer the fine concavo-convex pattern of the replica. 如請求項12或請求項13記載的微小構造轉印方法,其中,具備:上述複數個導輥之中,在上述片狀體的搬運方向與上述壓印輥鄰接並位在上游側的第1導輥,及在上述片狀體的搬運方向與上述壓印輥鄰接並位在下游側的第2導輥, 上述第2導輥在上述壓印輥一邊推壓上述片狀體一邊移動時,比上述壓印輥更位在上方,與上述壓印輥一起以等速移動。The microstructure transfer method according to claim 12 or claim 13, which includes: among the plurality of guide rollers, a first that is adjacent to and located on the upstream side of the platen roller in the conveying direction of the sheet-like body A guide roller, and a second guide roller that is adjacent to the platen roller and located on the downstream side in the conveying direction of the sheet-like body, The second guide roller is positioned above the platen roller when the platen roller moves while pressing the sheet-like body, and moves at a constant speed together with the platen roller. 如請求項14記載的微小構造轉印方法,其中,在上述壓印輥一邊推壓上述片狀體一邊移動時,上述模具或上述基板的端部之中在上述片狀體的搬運方向位於上游側的端部夾持上述片狀體。The microstructure transfer method according to claim 14, wherein when the platen roller moves while pressing the sheet-like body, the end of the mold or the substrate is located upstream in the conveying direction of the sheet-like body The end of the side sandwiches the sheet-like body. 如請求項15記載的微小構造轉印方法,其中,上述壓印輥一邊推壓上述片狀體一邊移動時,在與上述壓印輥及上述第2導輥一起以等速向下游側移動的期間照射硬化光。The microstructure transfer method according to claim 15, wherein when the platen roller moves while pressing the sheet-like body, the platen roller and the second guide roller move to the downstream side at a constant speed. During the irradiating of hardening light. 如請求項16記載的微小構造轉印方法,其中,在上述模具及/或上述基板塗佈上述光硬化性樹脂。The microstructure transfer method according to claim 16, wherein the photocurable resin is applied to the mold and/or the substrate. 如請求項15記載的微小構造轉印方法,其中,個別調整上述壓印輥的高度及推壓力。The microstructure transfer method according to claim 15, wherein the height and pressing force of the platen roller are individually adjusted.
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