TW202105000A - Display panel - Google Patents
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- TW202105000A TW202105000A TW109106499A TW109106499A TW202105000A TW 202105000 A TW202105000 A TW 202105000A TW 109106499 A TW109106499 A TW 109106499A TW 109106499 A TW109106499 A TW 109106499A TW 202105000 A TW202105000 A TW 202105000A
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本發明是有關於一種電子裝置,且特別是有關於一種顯示面板。The present invention relates to an electronic device, and particularly relates to a display panel.
隨著顯示科技的發展,顯示面板應用範圍日益廣泛。舉例而言,在早期,顯示面板多用做電子裝置(例如:電視、電腦、手機等)的螢幕,而應用在電子裝置上的顯示面板多為硬質顯示面板;在近期,則有人將顯示面板應用在穿戴裝置(例如:手錶、衣服等),而應用在穿戴裝置上的顯示面板多為可撓式顯示面板。可撓式顯示面板需具備相當的可彎曲程度。換言之,當可撓式顯示面板彎曲時,可撓基板上的構件(例如:薄膜電晶體、資料線、掃描線、周邊走線等)需隨之彎曲並維持正常功能。With the development of display technology, the application range of display panels has become increasingly widespread. For example, in the early days, display panels were mostly used as screens for electronic devices (such as TVs, computers, mobile phones, etc.), while display panels used on electronic devices were mostly rigid display panels; in the recent past, some people have used display panels In wearable devices (for example: watches, clothes, etc.), the display panels applied to wearable devices are mostly flexible display panels. The flexible display panel needs to have a considerable degree of flexibility. In other words, when the flexible display panel is bent, the components on the flexible substrate (such as thin film transistors, data lines, scan lines, peripheral wiring, etc.) need to be bent accordingly and maintain normal functions.
為了達到上述的目的,在彎折區配置額外的膜層以使上述的電路構件設置在中性軸(neutral axis)附近,可將電路構件所承受的應力(stress)最小化。然而,此額外膜層與顯示區內的功能性膜層之間的段差在顯示面板的製程中容易產生氣泡的堆積。當顯示面板彎折時,位於段差附近的電路走線在氣泡的形變擠壓下容易斷裂,造成可撓式顯示面板失效。In order to achieve the above-mentioned purpose, an additional film layer is arranged in the bending area so that the above-mentioned circuit component is arranged near the neutral axis, so that the stress on the circuit component can be minimized. However, the step difference between the additional film layer and the functional film layer in the display area is likely to cause the accumulation of bubbles during the manufacturing process of the display panel. When the display panel is bent, the circuit traces located near the level difference are easily broken under the deformation and extrusion of the bubbles, causing the flexible display panel to fail.
本發明提供一種顯示面板,其具有較佳的生產良率。The present invention provides a display panel with better production yield.
本發明的顯示面板,包括基板、多個顯示畫素、封裝結構以及輔助層。基板具有顯示區、可彎折區以及位於顯示區與可彎折區之間的緩衝區。多個顯示畫素設置於顯示區內。封裝結構重疊設置於顯示區且覆蓋這些顯示畫素。輔助層重疊設置於可彎折區,且具有頂面。輔助層的頂面與基板的表面之間具有第一高度。輔助層與封裝結構定義出重疊於緩衝區的凹槽。凹槽位於緩衝區內的底面與基板的表面之間具有第二高度。第一高度與第二高度的差值大於0微米且小於等於4微米。The display panel of the present invention includes a substrate, a plurality of display pixels, a packaging structure and an auxiliary layer. The substrate has a display area, a bendable area, and a buffer area between the display area and the bendable area. A plurality of display pixels are arranged in the display area. The packaging structure is overlapped in the display area and covers these display pixels. The auxiliary layer is overlapped and arranged in the bendable area and has a top surface. There is a first height between the top surface of the auxiliary layer and the surface of the substrate. The auxiliary layer and the packaging structure define a groove overlapping the buffer zone. The groove has a second height between the bottom surface in the buffer zone and the surface of the substrate. The difference between the first height and the second height is greater than 0 micrometers and less than or equal to 4 micrometers.
在本發明的一實施例中,上述的顯示面板的輔助層從可彎折區延伸至緩衝區內。In an embodiment of the present invention, the auxiliary layer of the above-mentioned display panel extends from the bendable area into the buffer area.
在本發明的一實施例中,上述的顯示面板更包括設置於顯示區內的隔離結構層。隔離結構層定義多個畫素區,且多個顯示畫素重疊於這些畫素區。輔助層具有延伸至緩衝區內的第一子層,且第一子層與隔離結構層為同一膜層。In an embodiment of the present invention, the above-mentioned display panel further includes an isolation structure layer disposed in the display area. The isolation structure layer defines a plurality of pixel regions, and a plurality of display pixels overlap these pixel regions. The auxiliary layer has a first sub-layer extending into the buffer zone, and the first sub-layer and the isolation structure layer are the same film layer.
在本發明的一實施例中,上述的顯示面板更包括平坦層。平坦層設置於顯示區內,且位於基板與隔離結構層之間。輔助層還具有延伸至緩衝區內的第二子層,且第二子層與平坦層為同一膜層。In an embodiment of the present invention, the above-mentioned display panel further includes a flat layer. The flat layer is disposed in the display area and between the substrate and the isolation structure layer. The auxiliary layer also has a second sub-layer extending into the buffer zone, and the second sub-layer and the flat layer are the same film layer.
在本發明的一實施例中,上述的顯示面板更包括金屬圖案。金屬圖案設置於緩衝區內,且位於凹槽與基板之間。In an embodiment of the present invention, the above-mentioned display panel further includes a metal pattern. The metal pattern is arranged in the buffer zone and between the groove and the substrate.
在本發明的一實施例中,上述的顯示面板的金屬圖案具有一浮置電位。In an embodiment of the present invention, the metal pattern of the above-mentioned display panel has a floating potential.
在本發明的一實施例中,上述的顯示面板的顯示區、緩衝區與可彎折區在第一方向上排列,且金屬圖案的延伸方向垂直於第一方向。In an embodiment of the present invention, the display area, the buffer area, and the bendable area of the above-mentioned display panel are arranged in a first direction, and the extending direction of the metal pattern is perpendicular to the first direction.
在本發明的一實施例中,上述的顯示面板更包括絕緣層。絕緣層重疊設置於顯示區,且延伸至緩衝區內。絕緣層位於顯示區的第一部分具有第一厚度。絕緣層位於緩衝區的第二部分具有第二厚度,且第二厚度大於第一厚度。In an embodiment of the present invention, the above-mentioned display panel further includes an insulating layer. The insulating layer is overlapped and arranged in the display area and extends into the buffer zone. The first portion of the insulating layer located in the display area has a first thickness. The second part of the insulating layer in the buffer zone has a second thickness, and the second thickness is greater than the first thickness.
在本發明的一實施例中,上述的顯示面板更包括訊號線以及重疊設置於顯示區的絕緣層。訊號線電性連接多個顯示畫素。絕緣層覆蓋訊號線,且延伸至緩衝區內。In an embodiment of the present invention, the above-mentioned display panel further includes a signal line and an insulating layer overlapped in the display area. The signal line is electrically connected to a plurality of display pixels. The insulating layer covers the signal line and extends into the buffer zone.
在本發明的一實施例中,上述的顯示面板的絕緣層位於顯示區內的第一部分的表面與基板的表面之間具有第三高度。絕緣層位於緩衝區內的第二部分的表面與基板之間具有第四高度,且第四高度大於第三高度。In an embodiment of the present invention, the insulating layer of the above-mentioned display panel has a third height between the surface of the first part in the display area and the surface of the substrate. The insulating layer has a fourth height between the surface of the second part in the buffer zone and the substrate, and the fourth height is greater than the third height.
在本發明的一實施例中,上述的顯示面板更包括金屬圖案。金屬圖案設置於緩衝區內,且位於絕緣層上。輔助層從可彎折區延伸至緩衝區內,且覆蓋金屬圖案。In an embodiment of the present invention, the above-mentioned display panel further includes a metal pattern. The metal pattern is arranged in the buffer zone and on the insulating layer. The auxiliary layer extends from the bendable area to the buffer area and covers the metal pattern.
在本發明的一實施例中,上述的顯示面板的輔助層的材質包括有機材料。In an embodiment of the present invention, the material of the auxiliary layer of the above-mentioned display panel includes an organic material.
在本發明的一實施例中,上述的顯示面板的凹槽在顯示區往可彎折區的方向上具有寬度,且寬度大於10微米。In an embodiment of the present invention, the above-mentioned groove of the display panel has a width in the direction from the display area to the bendable area, and the width is greater than 10 microns.
基於上述,在本發明的一實施例的顯示面板中,重疊於顯示區的封裝結構與重疊於可彎折區的輔助層定義出位於緩衝區的凹槽。透過輔助層的頂面與凹槽的底面之間的高度差值大於0微米且小於等於4微米,可避免在顯示面板的製程中於凹槽靠近輔助層的一側產生氣泡的堆積以及位於緩衝區的電路走線因氣泡的形變擠壓而斷裂,有助於提升顯示面板的製程裕度與生產良率。Based on the foregoing, in the display panel of an embodiment of the present invention, the packaging structure overlapping the display area and the auxiliary layer overlapping the bendable area define a groove in the buffer zone. The height difference between the top surface of the auxiliary layer and the bottom surface of the groove is greater than 0 micrometers and less than or equal to 4 micrometers, which can avoid the accumulation of bubbles on the side of the groove close to the auxiliary layer during the manufacturing process of the display panel and the buffer The circuit traces in the area are broken due to the deformation and extrusion of the bubbles, which helps to improve the manufacturing process margin and production yield of the display panel.
本文使用的「約」、「近似」、「本質上」、或「實質上」包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,「約」可以表示在所述值的一個或多個標準偏差內,或例如±30%、±20%、±15%、±10%、±5%內。再者,本文使用的「約」、「近似」、「本質上」、或「實質上」可依量測性質、切割性質或其它性質,來選擇較可接受的偏差範圍或標準偏差,而可不用一個標準偏差適用全部性質。As used herein, "approximately", "approximately", "essentially", or "substantially" includes the stated value and the average value within the acceptable deviation range of the specific value determined by a person of ordinary skill in the art, taking into account all The measurement in question and the specific number of errors associated with the measurement (ie, the limitations of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or, for example, within ±30%, ±20%, ±15%, ±10%, ±5%. Furthermore, "about", "approximately", "essentially", or "substantially" used in this article can be based on measurement properties, cutting properties, or other properties to select a more acceptable deviation range or standard deviation. Not one standard deviation applies to all properties.
在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件「上」或「連接到」另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為「直接在另一元件上」或「直接連接到」另一元件時,不存在中間元件。如本文所使用的,「連接」可以指物理及/或電性連接。再者,「電性連接」可為二元件間存在其它元件。In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. It should be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or Intermediate elements can also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements. As used herein, "connection" can refer to physical and/or electrical connection. Furthermore, "electrical connection" can mean that there are other components between the two components.
此外,諸如「下」或「底部」和「上」或「頂部」的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖所示。應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。例如,如果一個附圖中的裝置翻轉,則被描述為在其它元件的「下」側的元件將被定向在其它元件的「上」側。因此,示例性術語「下」可以包括「下」和「上」的取向,取決於附圖的特定取向。類似地,如果一個附圖中的裝置翻轉,則被描述為在其它元件「下方」或「下方」的元件將被定向為在其它元件「上方」。因此,示例性術語「上面」或「下面」可以包括上方和下方的取向。In addition, relative terms such as "lower" or "bottom" and "upper" or "top" can be used herein to describe the relationship between one element and another element, as shown in the figure. It should be understood that relative terms are intended to include different orientations of the device in addition to the orientation shown in the figures. For example, if the device in one figure is turned over, elements described as being on the "lower" side of other elements will be oriented on the "upper" side of the other elements. Therefore, the exemplary term "lower" may include an orientation of "lower" and "upper," depending on the specific orientation of the drawing. Similarly, if the device in one figure is turned over, elements described as "below" or "below" other elements will be oriented "above" the other elements. Thus, the exemplary terms "above" or "below" can include an orientation of above and below.
現將詳細地參考本發明的示範性實施方式,示範性實施方式的實例說明於所附圖式中。只要有可能,相同元件符號在圖式和描述中用來表示相同或相似部分。Reference will now be made in detail to the exemplary embodiments of the present invention, and examples of the exemplary embodiments are illustrated in the accompanying drawings. Whenever possible, the same component symbols are used in the drawings and descriptions to indicate the same or similar parts.
圖1是本發明的第一實施例的顯示面板的俯視示意圖。圖2是圖1的顯示面板的剖視示意圖。圖2對應於圖1的剖線A-A’。特別說明的是,為清楚呈現起見,圖1省略了圖2的基板100’、絕緣層110、絕緣層120、訊號線130、絕緣層140、平坦層150、隔離結構層160以及填充層200的繪示。FIG. 1 is a schematic top view of a display panel according to a first embodiment of the invention. FIG. 2 is a schematic cross-sectional view of the display panel of FIG. 1. Fig. 2 corresponds to the section line A-A' of Fig. 1. In particular, for the sake of clarity, FIG. 1 omits the substrate 100', the insulating
請參照圖1及圖2,顯示面板10包括基板100以及設置於基板100上的多個顯示畫素PX。在本實施例中,基板100例如是軟性基板,且軟性基板的材質可包括聚醯亞胺(polyimide,PI)、聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)與聚碳酸酯(polycarbonate,PC),但本發明不以此為限。在其他實施例中,基板100的材質也可包括玻璃、石英、或其他適合的有機聚合物。1 and FIG. 2, the
基板100具有顯示區DR、周邊區PR、緩衝區BR以及可彎折區BDR。緩衝區BR位於可彎折區BDR與顯示區DR之間。周邊區PR位於顯示區DR與緩衝區BR之間。顯示區DR、緩衝區BR以及可彎折區BDR沿著方向X依序排列。舉例而言,在本實施例中,周邊區PR可圍繞顯示區DR而設,但本發明不以此為限。在其他實施例中,周邊區PR也可根據實際的設計需求而僅設置在顯示區DR的相對兩側,例如顯示區DR在方向X上的相對兩側。The
在本實施例中,設置於顯示區DR內的多個顯示畫素PX可陣列排列於基板100上,例如:這些顯示畫素PX可分別沿著方向X與方向Y排成多個畫素列與多個畫素行,但本發明不以此為限。應可理解的是,顯示面板10還可包括多條訊號線(未繪示於圖1)。這些訊號線分別在方向X與方向Y上延伸,且分別與這些顯示畫素PX電性連接。舉例而言,這些訊號線可包括資料線(data line)、掃描線(scan line)、電源線(power line)或感測線(sensing line)。In this embodiment, a plurality of display pixels PX arranged in the display area DR may be arranged in an array on the
進一步而言,顯示面板10還可包括依序堆疊於基板100上的絕緣層110、絕緣層120、訊號線130、絕緣層140、平坦層150以及隔離結構層160。詳細而言,覆蓋顯示區DR的絕緣層110與絕緣層120延伸至可彎折區BDR,且此兩絕緣層所形成的堆疊結構在可彎折區BDR的部分,其橫截面(例如XZ平面)呈現階梯狀的輪廓。據此,可降低訊號線130於此處斷線的風險。值得注意的是,覆蓋顯示區DR的絕緣層140僅延伸至周邊區PR與緩衝區BR的交界處,並未延伸至緩衝區BR與可彎折區BDR,但本發明不以此為限。在本實施例中,絕緣層110、絕緣層120與絕緣層140的材質包括無機材料(例如:氧化矽、氮化矽、氮氧化矽、其它合適的材料、或上述至少兩種材料的堆疊層)、有機材料、或其它合適的材料、或上述之組合。Furthermore, the
另一方面,設置於顯示區DR內的隔離結構層160可定義出顯示面板10的多個畫素區PXR,且多個顯示畫素PX在基板100的法線方向上(例如方向Z)分別重疊於這些畫素區PXR。顯示畫素PX包括依序堆疊於平坦層150上的第一電極PE1、第二電極PE2以及發光結構EML。發光結構EML夾設於第一電極PE1與第二電極PE2之間。舉例而言,發光結構EML可包括依序堆疊於第一電極PE1上的電洞注入層(未繪示)、電洞傳輸層(未繪示)、發光層(未繪示)及電子傳輸層(未繪示),但不以此為限。On the other hand, the
顯示畫素PX還可包括主動元件T。第一電極PE1貫穿平坦層150與絕緣層140以電性連接主動元件T的汲極DE。主動元件T的源極(未繪示)與訊號線130電性連接。在本實施例中,訊號線130與主動元件T的汲極DE可屬於同一膜層,但不以此為限。在本實施例中,訊號線130例如是電源線,第一電極PE1與第二電極PE2分別為陽極與陰極。當主動元件T被致能時,電流可經由自可彎折區BDR延伸至顯示區DR內的訊號線130傳輸至顯示畫素PX的第一電極PE1。此時,發光結構EML可被電流驅動而發出(可見)光束,且此光束的發光強度可藉由電流的大小或驅動時間來控制。據此,顯示面板10的多個顯示畫素PX可各自獨立地被驅動以產生不同強度的光束,這些光束在傳遞至人眼後形成顯示畫面。The display pixel PX may also include an active element T. The first electrode PE1 penetrates the
在本實施例中,第一電極PE1例如是反射式電極,反射式電極的材質包括金屬、合金、金屬材料的氮化物、金屬材料的氧化物、金屬材料的氮氧化物、或其他合適的材料、或是金屬材料與其他導電材料的堆疊層。第二電極PE2例如是光穿透式電極,光穿透式電極的材質包括金屬氧化物,例如:銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、或其它合適的氧化物、或者是上述至少兩者之堆疊層。也就是說,本實施例的顯示面板10為頂發光(top emission)型態的顯示面板。然而,本發明不限於此,根據其他實施例,顯示面板也可以是底發光(bottom emission)型態的顯示面板。In this embodiment, the first electrode PE1 is, for example, a reflective electrode. The material of the reflective electrode includes metal, alloy, nitride of metal material, oxide of metal material, oxynitride of metal material, or other suitable materials. , Or stacked layers of metal materials and other conductive materials. The second electrode PE2 is, for example, a light-transmitting electrode. The material of the light-transmitting electrode includes metal oxides, such as indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, or other suitable materials. Oxide, or a stacked layer of at least two of the above. In other words, the
另一方面,平坦層150的材質例如是有機絕緣材料,有機絕緣材料可包括聚亞醯胺、聚酯、苯並環丁烯(benzocyclobutene,BCB)、聚甲基丙烯酸甲酯(polymethylmethacrylate,PMMA)、聚乙烯苯酚(poly(4-vinylphenol),PVP)、聚乙烯醇(polyvinyl alcohol,PVA)、聚四氟乙烯(polytetrafluoroethene,PTFE)、六甲基二矽氧烷(hexamethyldisiloxane,HMDSO)。隔離結構層160的材質可以是相似於平坦層150的材料或其他適合的高分子材料,但本發明不以此為限。On the other hand, the material of the
進一步而言,顯示面板10更包括封裝結構ES,覆蓋多個顯示畫素PX並延伸至周邊區PR內。在本實施例中,顯示面板10還可選擇性地包括設置於周邊區PR內的擋牆結構190。擋牆結構190於基板100上的垂直投影圍繞顯示區DR,並大致上界定出封裝結構ES的邊界。舉例來說,在封裝結構材料塗佈的過程中,擋牆結構190的設置可避免封裝結構材料溢流至緩衝區BR。在本實施例中,擋牆結構190可以是多層堆疊結構,例如:依序堆疊於絕緣層140上的第一子層191與第二子層192,且第一子層191與位於顯示區DR的隔離結構層160可屬於同一膜層,但本發明不以此為限。需說明的是,在本實施例中,擋牆結構190的數量是以兩個為例進行示範性地說明,本發明並不以此為限制。在其他實施例中,擋牆結構190的數量以及配置方式也可根據實際的設計或製程需求而調整。Furthermore, the
舉例而言,封裝結構ES可包括依序堆疊於絕緣層140(或顯示畫素PX)上的第一封裝層171、第二封裝層172以及第三封裝層173。第二封裝層172填充於第一封裝層171與第三封裝層173之間。在本實施例中,第一封裝層171與第三封裝層173的材質可選擇性地相同,例如是氮化矽(SiNx
),但本發明不以此為限。在其他實施例中,第一封裝層171與第三封裝層173的材質也可不相同。另一方面,第二封裝層172的材料例如是壓克力(acrylic)、環氧樹脂(Epoxy)、六甲基二矽氧烷(hexamethyldisiloxane,HMDSO)、或其他適合的有機材料。For example, the packaging structure ES may include a
顯示面板10更包括輔助層AXL與填充層200。輔助層AXL設置於可彎折區BDR,且填充層200覆蓋封裝結構ES與輔助層AXL。值得注意的是,輔助層AXL與封裝結構ES可定義出重疊於緩衝區BR的凹槽RS。輔助層AXL具有頂面AXLs,此頂面AXLs與基板100的表面100s之間具有第一高度H1。凹槽RS位於緩衝區BR內的底面RSs與基板100的表面100s之間具有第二高度H2。舉例來說,在本實施例中,輔助層AXL的頂面AXLs的第一高度H1與凹槽RS的底面RSs的第二高度H2的差值為1.5微米,但不以此為限。The
透過第一高度H1與第二高度H2的差值(即輔助層AXL的頂面AXLs與凹槽RS的底面RSs之間的段差)大於0微米且小於等於4微米,可避免在填充層200的製作過程中,於緩衝區BR與可彎折區BDR的交界處(即凹槽RS靠近輔助層AXL的一側)產生氣泡的堆積。也因此,在填充層200的擠壓過程中,可避免位於緩衝區BR的電路走線(例如訊號線130)因氣泡的形變擠壓而斷裂,有助於提升顯示面板10的生產良率與製程裕度。Through the difference between the first height H1 and the second height H2 (that is, the step difference between the top surface AXLs of the auxiliary layer AXL and the bottom surface RSs of the groove RS) is greater than 0 micrometers and less than or equal to 4 micrometers, which can avoid the
在本實施例中,輔助層AXL可以是包含多個子層的堆疊結構,例如包括依序堆疊於基板100上的子層181、子層182以及子層183。應注意的是,輔助層AXL的子層181與封裝結構ES可定義出凹槽RS’。由於此凹槽RS’的底面(即訊號線130或絕緣層120的表面)與輔助層AXL的頂面AXLs之間的高度差過大,透過輔助層AXL的子層182從可彎折區BDR延伸至緩衝區BR並填入凹槽RS’,可形成前述的凹槽RS。換句話說,顯示面板10是透過輔助層AXL的子層182延伸至緩衝區BR並覆蓋絕緣層120與訊號線130以形成具有較小深度(例如第一高度H1與第二高度H2的差值)的凹槽RS。據此,可避免在填充層200的製作過程中,於緩衝區BR與可彎折區BDR的交界處(即凹槽RS靠近輔助層AXL的一側)產生氣泡的堆積。In this embodiment, the auxiliary layer AXL may be a stacked structure including a plurality of sub-layers, for example, including a sub-layer 181, a sub-layer 182, and a sub-layer 183 that are sequentially stacked on the
值得一提的是,輔助層AXL的子層181與封裝結構ES之間的區域(即凹槽RS’所占區域)於基板100上的垂直投影在顯示區DR往可彎折區BDR的方向(例如方向X)上具有寬度W,且寬度W大於10微米。據此,可進一步降低製程中氣泡堆積於緩衝區BR與可彎折區BDR的交界處的風險。It is worth mentioning that the vertical projection of the area between the sub-layer 181 of the auxiliary layer AXL and the package structure ES (that is, the area occupied by the groove RS') on the
舉例而言,在本實施例中,輔助層AXL的子層181與位於顯示區DR的平坦層150的材質可相同,輔助層AXL的子層182與位於顯示區DR的隔離結構層160的材質可相同。也就是說,輔助層AXL的子層181與位於顯示區DR內的平坦層150可屬於同一膜層,輔助層AXL的子層182與位於顯示區DR的隔離結構層160可屬於同一膜層,但本發明不以此為限。輔助層AXL的子層183與位於周邊區PR的擋牆結構190的第二子層192的材質可相同。也就是說,輔助層AXL的子層183與位於周邊區PR的擋牆結構190的第二子層192可屬於同一膜層,但本發明不以此為限。For example, in this embodiment, the material of the sub-layer 181 of the auxiliary layer AXL and the
另一方面,填充層200的材料可包括壓克力(acrylic)、環氧樹脂(Epoxy)、六甲基二矽氧烷(hexamethyldisiloxane,HMDSO)、或其他適合的有機材料。特別一提的是,透過輔助層AXL的子層182延伸至緩衝區BR並覆蓋訊號線130,可避免顯示面板10彎折時應力集中在電路走線(例如訊號線130)附近。另外,本實施例的輔助層AXL的子層182的材質可以是與平坦層150相同的材料或其他適合的高分子材料。填充層200的材料可選自壓克力(acrylic)、環氧樹脂(Epoxy)、六甲基二矽氧烷(hexamethyldisiloxane,HMDSO)、或其他適合的有機材料。當顯示面板10彎折時,具有較軟質地的有機材料可進一步分散緩衝區BR內的應力。換句話說,可避免電路走線在顯示面板10彎折時被填充層200與輔助層AXL的子層182擠壓而斷裂。On the other hand, the material of the
進一步而言,顯示面板10還可包括與基板100對向設置的基板100’。舉例來說,此基板100’上可選擇性地設有彩色濾光層、遮光圖案層、或其他具有功能性的膜層或結構,本發明並不加以限定。在本實施例中,基板100’例如是軟性基板,且軟性基板的材質可包括聚醯亞胺(polyimide,PI)、聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)與聚碳酸酯(polycarbonate,PC),但本發明不以此為限。在其他實施例中,基板100’的材質也可包括玻璃、石英、或其他適合的有機聚合物。Further, the
以下將列舉另一些實施例以詳細說明本揭露,其中相同的構件將標示相同的符號,並且省略相同技術內容的說明,省略部分請參考前述實施例,以下不再贅述。Other embodiments will be listed below to describe the disclosure in detail, wherein the same components will be marked with the same symbols, and the description of the same technical content will be omitted. For the omitted parts, please refer to the foregoing embodiments, and will not be repeated hereafter.
圖3是本發明的第二實施例的顯示面板的剖視示意圖。請參照圖3,本實施例的顯示面板11與圖2的顯示面板10的差異在於:輔助層的配置方式不同。具體而言,顯示面板11的輔助層AXL-A的子層181A與子層182A都從可彎折區BDR延伸至緩衝區BR並覆蓋絕緣層120與訊號線130以形成具有較小深度(例如第一高度H1與第二高度H2的差值)的凹槽RS-A。3 is a schematic cross-sectional view of a display panel according to a second embodiment of the invention. Please refer to FIG. 3, the difference between the
舉例而言,在本實施例中,輔助層AXL-A的頂面AXLs的第一高度H1與凹槽RS-A的底面RSs的第二高度H2的差值為1.0微米,但不以此為限。據此,可避免在填充層200的製作過程中,於緩衝區BR與可彎折區BDR的交界處(即凹槽RS-A靠近輔助層AXL-A的一側)產生氣泡的堆積。也因此,在填充層200的擠壓過程中,可避免位於緩衝區BR的電路走線(例如訊號線130)因氣泡的形變擠壓而斷裂,有助於提升顯示面板11的生產良率與製程裕度。For example, in this embodiment, the difference between the first height H1 of the top surface AXLs of the auxiliary layer AXL-A and the second height H2 of the bottom surface RSs of the groove RS-A is 1.0 μm, but this is not limit. Accordingly, it is possible to avoid the accumulation of air bubbles at the junction of the buffer zone BR and the bendable area BDR (that is, the side of the groove RS-A close to the auxiliary layer AXL-A) during the manufacturing process of the
圖4是本發明的第三實施例的顯示面板的剖視示意圖。圖5是圖4的顯示面板的剖視示意圖。圖5對應於圖4的剖線B-B’。特別說明的是,為清楚呈現起見,圖4省略了圖5的絕緣層110、絕緣層120A、絕緣層121、訊號線130A、絕緣層140A、平坦層150、隔離結構層160以及填充層200的繪示。4 is a schematic cross-sectional view of a display panel according to a third embodiment of the invention. FIG. 5 is a schematic cross-sectional view of the display panel of FIG. 4. Fig. 5 corresponds to the section line B-B' of Fig. 4. In particular, for the sake of clarity, FIG. 4 omits the insulating
請參照圖4及圖5,本實施例的顯示面板12與圖1及圖2的顯示面板10的主要差異在於:輔助層AXL的配置方式以及顯示面板於緩衝區的組成不同。具體而言,顯示面板12的輔助層AXL-B並未從可彎折區BDR延伸至緩衝區BR。顯示面板12更包括設置於緩衝區BR的多個金屬圖案(例如:金屬圖案115與金屬圖案125)以及絕緣層121,且顯示面板12可不具有圖2的基板100’。詳細而言,金屬圖案115設置於絕緣層110與絕緣層120A之間,金屬圖案125設置於絕緣層120A與絕緣層121之間。在本實施例中,兩金屬圖案於基板100上的垂直投影可選擇性地完全重疊。然而,本發明不限於此,在其他實施例中,兩金屬圖案於基板100上的垂直投影也可部分重疊。另一方面,金屬圖案125(或金屬圖案115)可在方向Y(即垂直於顯示區DR、緩衝區BR以及可彎折區BDR的排列方向X)上延伸,但本發明不以此為限。在其他實施例中,金屬圖案的延伸方向可根據實際的設計需求(例如顯示面板的可彎折方向)而調整。Referring to FIGS. 4 and 5, the main difference between the
值得注意的是,透過在緩衝區BR內設置兩金屬圖案,可使封裝結構ES與輔助層AXL-B之間所形成的凹槽RS-B具有較小的深度(例如第一高度H1與第二高度H2的差值)。舉例而言,在本實施例中,輔助層AXL-B的頂面AXLs的第一高度H1與凹槽RS-B的底面RSs的第二高度H2的差值為2.5微米,但不以此為限。據此,可避免在填充層200的製作過程中,於緩衝區BR與可彎折區BDR的交界處(即凹槽RS-B靠近輔助層AXL-B的一側)產生氣泡的堆積。也因此,在填充層200的擠壓過程中,可避免位於緩衝區BR的電路走線(例如訊號線130A)因氣泡的形變擠壓而斷裂,有助於提升顯示面板12的生產良率與製程裕度。It is worth noting that by arranging two metal patterns in the buffer zone BR, the groove RS-B formed between the package structure ES and the auxiliary layer AXL-B can have a smaller depth (for example, the first height H1 and the first height H1). The difference between two heights H2). For example, in this embodiment, the difference between the first height H1 of the top surface AXLs of the auxiliary layer AXL-B and the second height H2 of the bottom surface RSs of the groove RS-B is 2.5 microns, but this is not limit. Accordingly, it is possible to avoid the accumulation of air bubbles at the junction of the buffer zone BR and the bendable area BDR (that is, the side of the groove RS-B close to the auxiliary layer AXL-B) during the manufacturing process of the
特別一提的是,在本實施例中,絕緣層121位於顯示區DR的一部分的厚度不同於絕緣層121位於緩衝區BR的另一部分的厚度。更具體地說,絕緣層121位於顯示區DR與緩衝區BR的兩部分分別具有第一厚度t1與第二厚度t2,且第二厚度t2大於第一厚度t1。據此,可進一步縮減封裝結構ES與輔助層AXL-B之間所形成的凹槽RS-B的深度(例如第一高度H1與第二高度H2的差值)。另一方面,在本實施例中,輔助層AXL-B的子層181B與子層182B的交界面可切齊凹槽RS-B的底面RSs,但不以此為限。另外,輔助層AXL-B的子層182B與子層183B靠近緩衝區BR的一側表面的橫截面輪廓為弧形狀,如此可進一步降低製程中氣泡堆積於緩衝區BR與可彎折區BDR的交界處的風險。In particular, in this embodiment, the thickness of the insulating
在本實施例中,絕緣層140A可從顯示區DR延伸至可彎折區BDR,並覆蓋緩衝區BR內的電路走線(例如訊號線130A)以避免填充層200直接接觸電路走線,有助於提升顯示面板12的耐久性。特別一提的是,絕緣層140A位於顯示區DR內的一部分的表面140As1與基板100的表面100s之間具有第三高度H3,絕緣層140A位於緩衝區BR內的另一部分的表面140As2(即凹槽RS-B的底面RSs)與基板100的表面100s之間具有第四高度H4,且第四高度H4大於第三高度H3。In this embodiment, the insulating
進一步而言,本實施例的金屬圖案115與金屬圖案125可具有浮置電位(floating potential);亦即,兩金屬圖案並未電性連接至任何訊號走線或外接電源。在本實施例中,金屬圖案115與多條掃描線(未繪示)的材質可選擇性地相同,金屬圖案125與多條感測訊號線(未繪示)的材質可可選擇性地相同。也就是說,金屬圖案115與多條掃描線可屬於同一膜層,金屬圖案125與多條感測訊號線可屬於同一膜層,但本發明不以為限。透過將金屬圖案的製作整合於其他功能性膜層的製程中,可避免額外的生產成本支出。Furthermore, the
圖6是本發明的第四實施例的顯示面板的剖視示意圖。請參照圖6,本實施例的顯示面板13與圖5的顯示面板12的主要差異在於:金屬圖案與輔助層的配置方式不同。具體而言,顯示面板13的金屬圖案125A是設置在絕緣層140B上。也就是說,顯示面板13可不具有圖5的絕緣層121。進一步而言,透過輔助層AXL-C的子層181C從可彎折區BDR延伸至緩衝區BR並覆蓋金屬圖案125A,可使封裝結構ES與輔助層AXL-C之間所形成的凹槽RS-C具有較小的深度(例如第一高度H1與第二高度H2的差值)。據此,可避免在填充層200的製作過程中,於緩衝區BR與可彎折區BDR的交界處(即凹槽RS-C靠近輔助層AXL-C的一側)產生氣泡的堆積。也因此,在填充層200的擠壓過程中,降低位於緩衝區BR的電路走線(例如訊號線130)因氣泡的形變擠壓而斷裂的風險,有助於提升顯示面板13的生產良率與製程裕度。6 is a schematic cross-sectional view of a display panel according to a fourth embodiment of the invention. Please refer to FIG. 6, the main difference between the
綜上所述,在本發明的一實施例的顯示面板中,重疊於顯示區的封裝結構與重疊於可彎折區的輔助層定義出位於緩衝區的凹槽。透過輔助層的頂面與凹槽的底面之間的高度差值大於0微米且小於等於4微米,可避免在顯示面板的製程中於凹槽靠近輔助層的一側產生氣泡的堆積以及位於緩衝區的電路走線因氣泡的形變擠壓而斷裂,有助於提升顯示面板的製程裕度與生產良率。In summary, in the display panel of an embodiment of the present invention, the packaging structure overlapping the display area and the auxiliary layer overlapping the bendable area define a groove in the buffer zone. The height difference between the top surface of the auxiliary layer and the bottom surface of the groove is greater than 0 micrometers and less than or equal to 4 micrometers, which can avoid the accumulation of bubbles on the side of the groove close to the auxiliary layer during the manufacturing process of the display panel and the buffer The circuit traces in the area are broken due to the deformation and extrusion of the bubbles, which helps to improve the manufacturing process margin and production yield of the display panel.
10、11、12、13:顯示面板
100、100’:基板
100s、140As1、140As2:表面
110、120、121、140、140A、140B:絕緣層
115、125、125A:金屬圖案
130、130A:訊號線
150:平坦層
160:隔離結構層
171:第一封裝層
172:第二封裝層
173:第三封裝層
181、181A、181B、181C、182、182A、182B、183、183B:子層
190:擋牆結構
191、192:子層
200:填充層
AXL、AXL-A、AXL-B、AXL-C:輔助層
AXLs:頂面
BDR:可彎折區
BR:緩衝區
DE:汲極
DR:顯示區
EML:發光結構
ES:封裝結構
H1、H2、H3、H4:高度
PE1:第一電極
PE2:第二電極
PR:周邊區
PX:顯示畫素
PXR:畫素區
RS、RS’、RS-A、RS-B、RS-C:凹槽
RSs:底面
T:主動元件
t1、t2:厚度
W:寬度
X、Y、Z:方向
A-A’、B-B’:剖線10, 11, 12, 13:
圖1是本發明的第一實施例的顯示面板的俯視示意圖。 圖2是圖1的顯示面板的剖視示意圖。 圖3是本發明的第二實施例的顯示面板的剖視示意圖。 圖4是本發明的第三實施例的顯示面板的剖視示意圖。 圖5是圖4的顯示面板的剖視示意圖。 圖6是本發明的第四實施例的顯示面板的剖視示意圖。FIG. 1 is a schematic top view of a display panel according to a first embodiment of the invention. FIG. 2 is a schematic cross-sectional view of the display panel of FIG. 1. 3 is a schematic cross-sectional view of a display panel according to a second embodiment of the invention. 4 is a schematic cross-sectional view of a display panel according to a third embodiment of the invention. FIG. 5 is a schematic cross-sectional view of the display panel of FIG. 4. 6 is a schematic cross-sectional view of a display panel according to a fourth embodiment of the invention.
10:顯示面板 10: Display panel
100、100’:基板 100, 100’: Substrate
100s:表面 100s: surface
110、120、140:絕緣層 110, 120, 140: insulating layer
130:訊號線 130: signal line
150:平坦層 150: flat layer
160:隔離結構層 160: Isolation structure layer
171:第一封裝層 171: The first encapsulation layer
172:第二封裝層 172: The second encapsulation layer
173:第三封裝層 173: The third encapsulation layer
181、182、183:子層 181, 182, 183: sub-layer
190:擋牆結構 190: retaining wall structure
191、192:子層 191, 192: sub-layer
200:填充層 200: Filling layer
AXL:輔助層 AXL: auxiliary layer
AXLs:頂面 AXLs: top surface
BDR:可彎折區 BDR: bendable area
BR:緩衝區 BR: buffer
DE:汲極 DE: Dip pole
DR:顯示區 DR: display area
EML:發光結構 EML: light-emitting structure
ES:封裝結構 ES: Package structure
H1、H2:高度 H1, H2: height
PE1:第一電極 PE1: first electrode
PE2:第二電極 PE2: second electrode
PR:周邊區 PR: Peripheral area
PX:顯示畫素 PX: Display pixels
PXR:畫素區 PXR: pixel area
RS、RS’:凹槽 RS, RS’: Groove
RSs:底面 RSs: bottom surface
T:主動元件 T: Active component
W:寬度 W: width
X、Y、Z:方向 X, Y, Z: direction
A-A’:剖線 A-A’: Sectional line
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TW109108162A TWI728741B (en) | 2019-07-26 | 2020-03-12 | Device array substrate and display device |
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TW109110879A TWI724847B (en) | 2019-07-26 | 2020-03-30 | Display method |
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