TW201910282A - Cracking device - Google Patents

Cracking device Download PDF

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Publication number
TW201910282A
TW201910282A TW107122925A TW107122925A TW201910282A TW 201910282 A TW201910282 A TW 201910282A TW 107122925 A TW107122925 A TW 107122925A TW 107122925 A TW107122925 A TW 107122925A TW 201910282 A TW201910282 A TW 201910282A
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Taiwan
Prior art keywords
substrate
breaking
floating
air
scribing
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TW107122925A
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Chinese (zh)
Inventor
上野勉
高松生芳
西尾仁孝
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日商三星鑽石工業股份有限公司
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Publication of TW201910282A publication Critical patent/TW201910282A/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D1/00Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
    • B28D1/22Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising
    • B28D1/222Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising by pressing, e.g. presses
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D1/00Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
    • B28D1/22Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising
    • B28D1/225Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising for scoring or breaking, e.g. tiles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D7/00Accessories specially adapted for use with machines or devices of the preceding groups
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D7/00Accessories specially adapted for use with machines or devices of the preceding groups
    • B28D7/02Accessories specially adapted for use with machines or devices of the preceding groups for removing or laying dust, e.g. by spraying liquids; for cooling work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D7/00Accessories specially adapted for use with machines or devices of the preceding groups
    • B28D7/04Accessories specially adapted for use with machines or devices of the preceding groups for supporting or holding work or conveying or discharging work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063Transporting devices for sheet glass
    • B65G49/064Transporting devices for sheet glass in a horizontal position
    • B65G49/065Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mining & Mineral Resources (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)

Abstract

An object of the present invention is to provide a breaking device capable of suppressing occurrence of scratches or adhesion of minute foreign matter on a surface of a substrate during transportation, and obtaining a high-quality product. The present invention has the following configuration, that is, comprises an air floating device which ejects air from the surface of a floating tables 1 and 11 to float a substrate W during the conveyance of the substrate W and scribbing a line; fixtures 2 and 12 which are used to fix an end portion of the floated substrate W and move the floated substrate W horizontally, and to fixedly hold the substrate W during breaking; and a breaking mechanism which breaks the floated substrate W along the scribbed line.

Description

裂斷裝置Breaking device

本發明係關於一種將玻璃等脆性材料基板沿著劃線(切槽)分斷之裂斷裝置。尤其,本發明係關於如下一種裂斷裝置,其於可撓性之OLED(Organic Light Emitting Diode:有機發光二極體)顯示器之製造過程中,將於玻璃基板之上表面積層有成為可撓性基材之樹脂膜(聚醯亞胺膜(亦稱為PI膜))的母板之有機膜形成前之玻璃基板沿著劃線(切槽)分斷。The present invention relates to a breaking device for cutting a substrate of a brittle material such as glass along a scribe line (groove). In particular, the present invention relates to a fracturing device in which during the manufacturing process of a flexible OLED (Organic Light Emitting Diode) display, the surface area layer on the glass substrate becomes flexible. The glass substrate before the formation of the organic film of the mother film of the resin film (polyimide film (also called PI film)) of the base material is divided along the scribe line (groove).

於分斷玻璃基板等脆性材料基板之加工中,先前,將切割輪推壓至基板表面形成劃線,其後,沿著劃線自與劃線形成面相反側之面施加外力使基板彎曲,藉此分斷成各個單位基板(參照專利文獻1)。In the process of breaking a substrate of a fragile material such as a glass substrate, previously, a cutting wheel is pushed against the surface of the substrate to form a scribe line, and thereafter, an external force is applied along the scribe line from a surface opposite to the scribe line forming surface to bend the substrate. Thereby, it is divided | segmented into each unit substrate (refer patent document 1).

近年來,由於要求顯示器之高精細化,故必須進一步改善基板之表面品質或端面強度。又,根據擴大顯示器之用途之觀點而言亦有採用可撓性之顯示器之需求,而製造使用可撓性基板之OLED。於此種OLED顯示器中,於製造過程中於玻璃基板上形成樹脂膜(PI膜),且於其上形成具有電極層或有機EL層之有機膜。由於電極層或有機EL層等之膜厚較薄,且組成非常纖細,故即便為極微小之異物亦會附著於樹脂膜表面,成為產生缺陷之原因,而影響良率之降低。In recent years, since high definition of a display is required, it is necessary to further improve the surface quality or end face strength of a substrate. In addition, from the viewpoint of expanding the use of the display, there is also a need to adopt a flexible display, and an OLED using a flexible substrate is manufactured. In such an OLED display, a resin film (PI film) is formed on a glass substrate during a manufacturing process, and an organic film having an electrode layer or an organic EL layer is formed thereon. Since the film thickness of the electrode layer or the organic EL layer is thin, and the composition is very slim, even very small foreign matter may adhere to the surface of the resin film, which may cause defects and affect the reduction of yield.

為了獲得高品質且生產性較高之OLED顯示器之製造技術,必須避免於有機膜形成前之形成有樹脂膜(PI膜)之玻璃板產生傷痕或附著粉塵等微小異物。即,玻璃板之傷痕會成為強度劣化之原因,且附著之異物會被運送至有機膜形成步驟而成為使作業環境劣化之原因。 此外,若於玻璃板背面附著有傷痕或微小異物,則於進行有機膜形成後之製品之玻璃基板與樹脂膜之分離的Lift-Off(剝離)步驟中可能成為剝離不良之原因,故除玻璃基板之表面側(有機膜形成側)外,亦必須極力避免於背面側產生傷痕或附著粉塵。 [先前技術文獻] [專利文獻]In order to obtain a high-quality and highly productive OLED display manufacturing technology, it is necessary to avoid the generation of scratches or adhesion of fine foreign matter on the glass plate on which the resin film (PI film) is formed before the organic film is formed. That is, the flaw of a glass plate will become a cause of strength deterioration, and the adhering foreign material will be conveyed to an organic film formation process, and will become a cause of deterioration of a working environment. In addition, if there are scratches or tiny foreign matter on the back of the glass plate, the lift-off (peeling) step of separating the glass substrate and the resin film of the product after the formation of the organic film may be a cause of poor peeling, so the glass is removed. In addition to the front side of the substrate (the side where the organic film is formed), it is also necessary to prevent the generation of scratches or dust on the back side as much as possible. [Prior Art Literature] [Patent Literature]

[專利文獻1]日本專利第5210356號公報[Patent Document 1] Japanese Patent No. 5210356

[發明所欲解決之問題][Problems to be solved by the invention]

於一般之裂斷裝置中,由於使應加工之基板移動至分斷位置時係將其載置於輸送機或工作台之上表面而搬送,故基板之背面始終接觸輸送機或工作台面。又,由於劃線時亦隔著劃線將其左右兩側之背面保持於輸送機或工作台,故基板背面仍然接觸。此種情形時,接觸時間越長,又,接觸狀態下之移動距離越長,則於基板背面產生小傷痕之概率增大,且附著位於輸送機或工作台上之粉塵等微小異物之概率增大,對良率降低造成影響,而對製造高精度且品質優異之製品帶來障礙。In a general cracking device, since the substrate to be processed is moved to the breaking position, it is carried on the upper surface of a conveyor or a workbench for transportation, so the back surface of the substrate is always in contact with the conveyor or the workbench. In addition, since the back surfaces of the left and right sides of the substrate are held on the conveyor or the table via the scribe line, the back surface of the substrate is still in contact. In this case, the longer the contact time and the longer the moving distance in the contact state, the greater the probability of small scratches on the back of the substrate, and the higher the probability of adhesion of small foreign matter such as dust on the conveyor or the workbench. Large, it will affect the reduction of yield, and it will hinder the manufacture of high-precision and excellent quality products.

因此,本發明之目的在於提供一種裂斷裝置,其用以解決上述問題,良率較高,且獲得高品質之製品。 [解決問題之技術手段]Therefore, an object of the present invention is to provide a cracking device for solving the above problems, which has a high yield and obtains a high-quality product. [Technical means to solve the problem]

為了解決上述問題,於本發明中採用如下所述之技術手段。即,本發明之裂斷裝置採用如下構成:其係用以分斷包含脆性材料之基板者,且具備:氣浮器件,其於基板搬送時及分斷時自浮台表面噴出空氣而使基板浮起;夾具,其固持浮起之基板之端部並於水平方向移動,且於劃線時固定保持基板;及裂斷機構,其將浮起之基板沿著劃線分斷。 此處,上述氣浮器件較佳為自於浮台之表面開口之多個小孔噴出壓力空氣。 又,上述裂斷機構較佳為由以下構件形成:分斷用輥,其與上述基板之一面接觸並滾動;及承受輥,其對向於該分斷用輥且承受上述基板之相反側之面。 [發明之效果]In order to solve the above problems, the following technical means are adopted in the present invention. That is, the breaking device of the present invention is configured to break a substrate containing a brittle material, and is provided with an air-floating device that ejects air from the surface of the floating table during substrate transfer and breaking to make the substrate Floating; a clamp that holds the end of the floating substrate and moves in a horizontal direction, and fixedly holds the substrate when scribing; and a breaking mechanism that breaks the floating substrate along the scribing line. Here, it is preferable that the above-mentioned air floating device ejects pressurized air from a plurality of small holes opened on the surface of the floating platform. In addition, the breaking mechanism is preferably formed of a breaking roller that is in contact with one surface of the substrate and rolls; and a receiving roller that faces the breaking roller and receives the opposite side of the substrate. surface. [Effect of the invention]

本發明之裂斷裝置於應分斷之基板移動至劃線位置時,以藉由氣浮器件浮起之姿勢輸送,故基板背面不會接觸工作台上,又,分斷時亦藉由夾具以浮起之水平姿勢保持,因此有可防止因接觸而於基板背面產生傷痕或附著微小異物,並能獲得高精度且品質優異之製品的效果。When the substrate to be cut is moved to the scribing position, the cracking device of the present invention is conveyed in a posture of being floated by an air floating device, so the back surface of the substrate does not contact the worktable, and it is also clamped by a clamp during cutting. It is held in a floating horizontal posture, so it has the effect of preventing scratches on the back surface of the substrate due to contact or adhesion of small foreign matter, and can obtain high-precision and excellent quality products.

於本發明中,較佳為採用如下之構成:將上述氣浮器件及上述夾具隔著上述裂斷機構而分別配置於兩側位置,且將其一者設為上游搬送部,另一者設為下游搬送部。 藉此,用以將基板送入至分斷位置之上游側搬送、及用以於分斷後使基板向下游側移動而排出至裝置外之下游側搬送之任一者皆可以使基板浮起之水平姿勢進行。In the present invention, it is preferable to adopt a configuration in which the air-floating device and the jig are respectively disposed on both sides via the breaking mechanism, and one of them is set as an upstream conveying unit, and the other is set It is the downstream transportation department. With this, any one of the upstream side conveyance for feeding the substrate to the breaking position and the downstream side conveyance for moving the substrate to the downstream side after the breaking and discharging to the outside of the device can float the substrate. Performed in a horizontal posture.

又,本發明亦可採用如下之構成:其係用以分斷包含脆性材料之基板者;且具備:氣浮器件,其於基板之搬送時、劃線之加工時及分斷時自浮台表面噴出空氣而使基板浮起;夾具,其固持浮起之基板之端部並於水平方向移動且於劃線時及裂斷時固定保持基板;劃線機構,其於浮起之基板加工出劃線;及裂斷機構,其沿著由上述劃線機構加工出之劃線分斷基板。 藉此,可由同一裝置進行劃線之加工、與沿著該劃線之分斷,且於基板之搬送時或劃線時及分斷時亦藉由夾具以浮起之水平姿勢保持,因此可防止因接觸而於基板背面產生傷痕或附著微小異物,並能獲得高精度且品質優異之製品。In addition, the present invention can also adopt the following structure: it is used to cut off a substrate containing a brittle material; and it is provided with an air floating device that is self-floating when the substrate is transported, when the scribing is processed, and when it is cut off Air is ejected from the surface to float the substrate; the clamp holds the end of the floating substrate and moves in the horizontal direction and fixedly holds the substrate during scribing and breaking; the scribing mechanism processes the floating substrate Scribing; and a severing mechanism that breaks the substrate along the scribe line processed by the scribing mechanism. Thereby, the processing of the scribing line and the cutting along the scribing line can be performed by the same device, and it can also be held in a floating horizontal posture by the fixture during the transportation of the substrate or the scribing line and the breaking line, so it can be held It can prevent scratches or small foreign matters from adhering to the back of the substrate due to contact, and can obtain high-precision and excellent quality products.

以下,對本發明之裂斷裝置之一實施例,參照圖式進行詳細說明。 圖1係概略性顯示包含本發明之裂斷裝置之基板加工裝置A之整體之側視圖,圖2係其俯視圖。Hereinafter, an embodiment of the breaking device of the present invention will be described in detail with reference to the drawings. FIG. 1 is a side view schematically showing the entire substrate processing apparatus A including the breaking device of the present invention, and FIG. 2 is a plan view thereof.

基板加工裝置A具備:上游搬送部B,其將應加工之基板W以水平姿勢自上游朝向下游直線地搬送;劃線/裂斷機構部C,其於搬送來之基板W之背面沿與搬送方向正交之方向加工出劃線,且沿著該劃線分斷基板W;及下游搬送部D,其將分斷後之基板W朝向下游搬送。再者,於上游搬送部B之上游側配置有用以將應加工之基板W供給至基板加工裝置A之上游搬送部B之基板供給部E。另,以下,將基板W之搬送方向設為X方向,將與其正交之方向設為Y方向。The substrate processing apparatus A includes an upstream transfer unit B that linearly transfers a substrate W to be processed from upstream to downstream in a horizontal posture, and a scribing / breaking mechanism unit C that transfers and transports the back surface of the substrate W that is transferred. A scribe line is processed in a direction orthogonal to the direction, and the substrate W is divided along the scribe line; and a downstream transfer unit D, which transfers the separated substrate W toward the downstream. Furthermore, a substrate supply unit E for supplying a substrate W to be processed to the upstream transfer unit B of the substrate processing apparatus A is disposed on the upstream side of the upstream transfer unit B. In the following description, the transport direction of the substrate W is referred to as the X direction, and the direction orthogonal thereto is referred to as the Y direction.

藉由該基板加工裝置A加工之基板W係於OLED顯示器之製造過程中用作為母板者,如圖5所示,於玻璃板W2之上表面形成有成為可撓性基材之有機膜生成用之薄樹脂膜W1。另,未沿著劃線預定線L設置樹脂膜W1之區域形成為帶狀。對樹脂膜W1使用聚醯亞胺膜(PI膜)。The substrate W processed by the substrate processing device A is used as a mother board in the manufacturing process of the OLED display. As shown in FIG. 5, an organic film forming a flexible substrate is formed on the upper surface of the glass plate W2. Used a thin resin film W1. In addition, a region where the resin film W1 is not provided along the planned scribe line L is formed in a band shape. For the resin film W1, a polyimide film (PI film) was used.

基板加工裝置A之上游搬送部B具備:浮台1,其藉由噴出氣壓而使基板W以水平姿勢浮起;及夾具2,其固持浮起之基板W之上游側端緣部並向下游側搬送。夾具2由沿Y方向延伸之橫樑構件2a支持,橫樑構件2a可相對於沿著基板W之輸送方向(X方向)平行配置之左右之軌道2b、2b移動地裝配。於本實施例中,作為為了使基板W浮起而自浮台1噴出空氣使基板浮起之浮起機構(氣浮器件),乃形成在浮台1之上表面開口之多個小孔1a作為空氣噴出用之噴嘴,但亦可沿著浮台1另外設置空氣噴出噴嘴。另,浮台1設置於架台10上。The upstream transfer unit B of the substrate processing apparatus A includes a floating stage 1 that floats the substrate W in a horizontal posture by blowing out air pressure, and a clamp 2 that holds the upstream edge portion of the floating substrate W and moves downstream. Side transport. The jig 2 is supported by a beam member 2a extending in the Y direction, and the beam member 2a can be movably assembled with respect to the left and right rails 2b, 2b arranged in parallel along the conveyance direction (X direction) of the substrate W. In this embodiment, as a floating mechanism (air-floating device) that ejects air from the floating platform 1 to float the substrate W to float the substrate W, a plurality of small holes 1a are formed on the upper surface of the floating platform 1. As a nozzle for air ejection, an air ejection nozzle may be separately provided along the floating platform 1. In addition, the floating platform 1 is installed on a stand 10.

劃線/裂斷機構部C具備以跨越輸送來之基板W之方式配置的門型之立橋3。於立橋3,如圖3及圖4所示,以自上下隔著輸送來之基板W之方式沿著Y方向配置有上下一對導軌4a、4b,且各自可沿Y方向移動且可藉由升降機構(未圖示)上下移動調整地於上部導軌4a安裝有上部劃線頭5a,於下部導軌4b安裝有下部劃線頭5b。The scribing / breaking mechanism unit C includes a gate-type standing bridge 3 arranged so as to straddle the conveyed substrate W. As shown in FIG. 3 and FIG. 4, a pair of upper and lower guide rails 4 a and 4 b are arranged along the Y direction as shown in FIG. 3 and FIG. 4, and the substrate W is transported from above and below. An upper scribing head 5a is attached to the upper rail 4a by an upward and downward movement adjustment by a lifting mechanism (not shown), and a lower scribing head 5b is attached to the lower rail 4b.

又,於上部劃線頭5a可藉由升降機構(未圖示)上下移動調整地安裝有具有平坦的外周面之承受輥6,於下部劃線頭5b可藉由升降機構(未圖示)上下移動調整地安裝有劃線加工用之切割輪7與分斷用輥8。分斷用輥8於外周面具備V字形之槽8a(參照圖9)。 再者,於上部導軌4a,經由頭9a可沿Y方向移動地設置有吸引去除劃線形成後之微小異物之清潔器9。清潔器9如圖6所示,具備:細長之空氣吸引口9b,其以X方向為長邊方向;及複數個空氣吹出口9c,其等於該空氣吸引口9b之周邊吹出空氣;藉由使清潔器9於基板W之劃線之上方沿著劃線移行,而由空氣吸引口9b吸引粉塵等微小異物,且防止因來自空氣吹出口9c之吹出空氣使基板W密接於清潔器9之下表面。In addition, a receiving roller 6 having a flat outer peripheral surface is mounted on the upper scribing head 5a by a lifting mechanism (not shown) to move up and down, and the lower scribing head 5b can be adjusted by a lifting mechanism (not shown). A cutting wheel 7 and a cutting roller 8 for scribing are mounted to move up and down. The breaking roller 8 is provided with a V-shaped groove 8a on the outer peripheral surface (see FIG. 9). Furthermore, a cleaner 9 is provided on the upper rail 4a to move in the Y direction via the head 9a to attract and remove minute foreign matter formed after the scribe line is formed. As shown in FIG. 6, the cleaner 9 is provided with: an elongated air suction port 9b whose X direction is the long side direction; and a plurality of air blowing ports 9c which are equal to the air blown out from the periphery of the air suction port 9b; The cleaner 9 moves along the scribe line above the scribe line of the substrate W, and attracts small foreign matters such as dust by the air suction port 9b, and prevents the substrate W from being closely contacted with the cleaner 9 by the air blown out from the air blowout port 9c. surface.

基板加工裝置A之下游搬送部D與上述之上游搬送部B相同,具備:浮台11,其藉由來自小孔11a之噴出氣壓使基板W以水平姿勢浮起;及夾具12,其固持浮起之基板W之下游側側端部並向下游側搬送。夾具12支持於沿Y方向延伸之橫樑構件12a,橫樑構件12a可相對於沿著X方向平行配置之左右之軌道12b、12b移動地裝配。又,於浮台11之下游側設置有用以將分斷後之基板Wa、Wb送出至基板加工裝置A之外部之排出用輸送機13。The downstream conveying section D of the substrate processing apparatus A is the same as the upstream conveying section B described above, and includes: a floating table 11 that floats the substrate W in a horizontal posture by the ejection air pressure from the small hole 11a; and a clamp 12 that holds the floating The raised end of the substrate W is conveyed downstream. The jig 12 is supported by a beam member 12a extending in the Y direction, and the beam member 12a can be movably assembled with respect to the left and right rails 12b and 12b arranged in parallel along the X direction. A discharge conveyor 13 is provided on the downstream side of the floating stage 11 to send the separated substrates Wa and Wb to the outside of the substrate processing apparatus A.

再者,於該基板加工裝置A中,設置有以各自區分開之狀態個別地覆蓋上游搬送部B、劃線/裂斷機構部C以及下游搬送部D的外罩14、15、16。於各外罩14、15、16設置有放入取出基板W之出入口14a、15a、16a,於各個出入口安裝有可開閉之擋板14b、15b、16b。Furthermore, the substrate processing apparatus A is provided with covers 14, 15, and 16 that individually cover the upstream transfer section B, the scribe / break mechanism section C, and the downstream transfer section D in a state of being distinguished from each other. Each of the housings 14, 15, 16 is provided with entrances 14a, 15a, 16a into which the substrate W is taken out, and shutters 14b, 15b, 16b that can be opened and closed are installed at each entrance and exit.

於上游搬送部B以及下游搬送部D之外罩14、16設置有壓力空氣流入口17、18,藉由來自該壓力空氣流入口17、18之經加壓之壓力空氣而將外罩14、16之內部始終加壓,且為了可持續供給空氣,於外罩14、16之側壁形成小狹縫狀之開口而排出空氣之一部分。藉此,防止自劃線/裂斷機構部C流入粉塵,減少浮游於內部之粉塵等微小異物附著於基板W。 又,於劃線/裂斷機構部C之外罩15之內部,配置有空氣真空機構19,藉由該空氣真空機構19之空氣吸引而將外罩15內部始終減壓。藉此,吸引去除於劃線之加工時及分斷步驟中產生之微小異物而防止外罩15內部之污染。Pressurized air inlets 17 and 18 are provided on the outer covers 14 and 16 of the upstream conveying section B and the downstream conveying section D. The pressurized pressurized air from the pressurized air inlets 17 and 18 converts The interior is always pressurized, and in order to continuously supply air, a small slit-like opening is formed in the side walls of the outer covers 14, 16 to discharge part of the air. This prevents dust from flowing into the scribing / breaking mechanism section C, and reduces the adhesion of minute foreign matter such as dust floating inside the substrate W. An air vacuum mechanism 19 is disposed inside the cover 15 of the scribing / breaking mechanism section C, and the inside of the cover 15 is always decompressed by the air suction of the air vacuum mechanism 19. Thereby, the minute foreign matter generated during the processing of the scribing and the breaking step is sucked and removed to prevent the contamination inside the cover 15.

再者,於上游搬送部B以及下游搬送部D之外罩14、16之內部,設置有防止基板W帶電之除電裝置(Ionizer)20。除電裝置20較佳為使用不產生臭氧之軟X光之Photo-Ionizer,於外罩14、16之頂板下表面沿著基板W之搬送方向設置複數個。藉由將除電裝置20設置於密閉之外罩14、16內,可謀求除電之效率化且防止軟X光之外部洩漏。Furthermore, an Ionizer 20 is provided inside the outer covers 14 and 16 of the upstream transfer section B and the downstream transfer section D to prevent the substrate W from being charged. The static elimination device 20 is preferably a Photo-Ionizer that does not generate soft X-rays of ozone, and a plurality of the static elimination devices 20 are provided on the lower surface of the top plates 14 and 16 along the conveying direction of the substrate W. By providing the static elimination device 20 in the hermetically sealed outer covers 14 and 16, it is possible to improve the efficiency of static elimination and prevent external leakage of soft X-rays.

又,於上游搬送部B以及下游搬送部D之基板搬送區域,隔開一定間隔而設置有複數個檢測浮起之基板W與浮台1、11之間隔即浮起量之感測器21。若檢測出浮起量異常,可增減空氣之噴出壓力而始終保持浮起姿勢。 另,若將浮台1、11分割成複數個而區塊化,於各區塊形成感測器21與多個小孔1a,且可調整對每個區塊噴出之空氣量,則可進而精細地調整浮起姿勢。In addition, a plurality of sensors 21 are provided at a predetermined interval in the substrate transfer area of the upstream transfer section B and the downstream transfer section D to detect the floating substrate W and the floating tables 1 and 11, that is, the floating amount. If an abnormal floating amount is detected, the ejection pressure of the air can be increased or decreased to maintain the floating posture at all times. In addition, if the floating platforms 1 and 11 are divided into a plurality of blocks, the sensors 21 and the plurality of small holes 1a are formed in each block, and the amount of air sprayed to each block can be adjusted. Finely adjust the floating posture.

對上游搬送部B之浮台1供給基板W之基板供給部E於本實施例中,使用具有可藉由驅動機構(未圖示)於上下及前後移動且與基板W之接觸面較小之叉爪22的升降機。另,亦可替代此,藉由例如輸送機或曲柄爪等送入基板W。In this embodiment, a substrate supply section E that supplies a substrate W to the floating stage 1 of the upstream transfer section B is used. The substrate supply section E has a small contact surface with the substrate W that can be moved up and down and back and forth by a drive mechanism (not shown). Lift of the fork claw 22. Alternatively, the substrate W may be fed in by a conveyor, a crank claw, or the like.

上述之基板加工裝置A之浮台1、11中之空氣噴出用之小孔1a、11a、清潔器9之空氣吸引口9b以及空氣吹出口9c、上游搬送部B以及下游搬送部D之外罩14、16之壓力空氣流入口17、18及外罩15之空氣真空機構19係分別經由配管而連接於空氣源(未圖示)。The small holes 1a, 11a for the air ejection in the floating tables 1 and 11 of the substrate processing apparatus A described above, the air suction port 9b and the air blowing port 9c of the cleaner 9, the upstream transfer section B, and the downstream transfer section D cover 14 The pressure air inlets 17, 18 of 16 and 16 and the air vacuum mechanism 19 of the cover 15 are connected to an air source (not shown) through piping, respectively.

接著,對基板加工裝置A之動作,基於圖2、圖8~圖17而依序追加說明。 圖2顯示即將要將基板W送入基板加工裝置A前之狀態,以將劃線預定線L朝向Y方向之姿勢,且以基板W之玻璃板W2(參照圖5)為下側而載置於基板供給部E之叉爪22。且,開放上游搬送部B之上游側出入口14a之擋板14b而插入叉爪22,將基板W送入至上游搬送部B之浮台1上。其後,使叉爪22返回原始位置並關閉擋板14b,使基板W浮起並由夾具2保持其上游側端部(參照圖11)。Next, the operation of the substrate processing apparatus A will be sequentially described based on FIGS. 2, 8 to 17. FIG. 2 shows a state immediately before the substrate W is sent to the substrate processing apparatus A, with a posture in which the scribe line L is directed toward the Y direction, and the glass plate W2 (see FIG. 5) of the substrate W is placed on the lower side. The fork claw 22 on the substrate supply portion E. Then, the baffle 14b of the upstream inlet / outlet 14a of the upstream transfer section B is opened, the fork claw 22 is inserted, and the substrate W is transferred to the floating stage 1 of the upstream transfer section B. Thereafter, the fork claw 22 is returned to the original position, the shutter 14 b is closed, and the substrate W is floated and the upstream end portion thereof is held by the jig 2 (see FIG. 11).

接著,藉由開放上游搬送部B之下游側出入口14a、劃線/裂斷機構部C之兩側之出入口15a、15a及下游搬送部D之上游側出入口16a之擋板且使夾具2朝下游方向移動,一面使基板W浮起一面將其搬送至基板W之劃線預定線L位於劃線/裂斷機構部C之切割輪7正上方之位置。於該位置,以下游側之夾具12固持基板W之下游側之側端部,以使基板W水平浮起之姿勢於上游側與下游側穩定地保持(參照圖12及圖7)。Next, the shutters of the downstream side inlet and outlet 14a of the upstream conveying section B, the entrances 15a and 15a on both sides of the scribing / breaking mechanism section C, and the upstream side inlet and outlet 16a of the downstream conveying section D are opened, and the clamp 2 is moved downstream. Moving in the direction, the substrate W is transported to a position where the scribe line L of the substrate W is located directly above the cutting wheel 7 of the scribe / break mechanism unit C while floating the substrate W. At this position, the downstream end portion of the substrate W is held by the clamp 12 on the downstream side, and the substrate W is stably held on the upstream side and the downstream side in a posture of horizontally floating the substrate W (see FIGS. 12 and 7).

接著,如圖8所示,使劃線/裂斷機構部C之切割輪7與承受輥6接觸浮起狀態之基板W之表面,且一面推壓切割輪7一面使上下之劃線頭5a、5b沿著導軌4a、4b移動,藉此加工出沿著Y方向之劃線L1(參照圖13)。Next, as shown in FIG. 8, the cutting wheel 7 of the scribing / breaking mechanism part C is brought into contact with the surface of the substrate W in the floating state, and the cutting wheel 7 is pressed to make the upper and lower scribing heads 5a 5b moves along the guide rails 4a, 4b, thereby processing the scribe line L1 along the Y direction (see FIG. 13).

接著,如圖9所示,一面使切割輪7後退並將分斷用輥8推壓於劃線L1,一面使劃線頭5a、5b與上部之承受輥6一起移動至原始位置。藉此,基板W彎曲而沿著劃線L1被分斷(參照圖14)。 如此,可藉由劃線頭5a、5b之1次往復移動而進行劃線L1之加工與沿著該劃線L1之分斷。Next, as shown in FIG. 9, the cutting wheels 7 are moved backward and the cutting roller 8 is pushed against the scribe line L1 while the scribe heads 5 a and 5 b are moved to the original position together with the upper receiving roller 6. Thereby, the board | substrate W bends and is divided | segmented along the scribe line L1 (refer FIG. 14). In this way, processing of the scribing line L1 and division along the scribing line L1 can be performed by one reciprocating movement of the scribing heads 5a, 5b.

其後,如圖10及圖15所示,藉由使清潔器9沿著基板W之劃線L1於Y方向與基板W非接觸地移行,而由空氣吸引口9b吸引去除劃線加工時或分斷時產生之粉塵等微小異物。此時,防止因來自空氣吹出口9c之吹出空氣使基板W密接於清潔器9之下表面。Thereafter, as shown in FIG. 10 and FIG. 15, the cleaner 9 moves along the scribe line L1 of the substrate W in a non-contact manner with the substrate W in the Y direction, and is sucked and removed by the air suction port 9 b during the scribe process or Small foreign matter such as dust generated during breaking. At this time, the substrate W is prevented from coming into close contact with the lower surface of the cleaner 9 due to the blown air from the air blow-out port 9c.

分斷後之下游側之基板Wa以保持浮起姿勢之狀態由夾具12朝下游方向搬送,且藉由排出用輸送機13而自下游側出入口16b排出(參照圖16)。分斷後之上游側之基板Wb亦由返回之下游側夾具12承接,且與先行之下游側基板Wa相同地由排出用輸送機13排出(參照圖17)。The separated substrate Wa on the downstream side is transported in the downstream direction by the clamper 12 while maintaining the floating posture, and is discharged from the downstream inlet / outlet 16b by the discharge conveyor 13 (see FIG. 16). The separated substrate Wb on the upstream side is also received by the returned downstream-side clamp 12, and is discharged by the discharge conveyor 13 in the same manner as the preceding downstream-side substrate Wa (see FIG. 17).

如上所述,於上游搬送部B及下游搬送部D中,由於被搬送之基板藉由浮起機構(氣浮器件)、即自多個小孔1a噴出之壓力空氣而浮起,故可將有機膜形成前於玻璃板背面產生因接觸引起之傷痕或附著微小異物的情形抑制在最小限度。As described above, in the upstream conveying section B and the downstream conveying section D, since the substrate to be conveyed is floated by a floating mechanism (air-floating device), that is, pressurized air ejected from a plurality of small holes 1a, the substrate can be lifted. Before the formation of the organic film, the occurrence of scratches due to contact or adhesion of minute foreign matter on the back of the glass plate is minimized.

又,由於覆蓋上游搬送部B以及下游搬送部D之外罩14、16之內部由壓力空氣始終加壓,故可防止自劃線/裂斷機構部C流入浮游粉塵,可防止微小異物附著於搬送過程之基板表面。In addition, since the inside of the outer covers 14, 16 covering the upstream conveying section B and the downstream conveying section D is constantly pressurized by the pressurized air, the inflow of floating dust from the scribing / breaking mechanism section C can be prevented, and the tiny foreign matter can be prevented from adhering to the conveying. The substrate surface of the process.

再者,由於覆蓋劃線/裂斷機構部C之外罩15之內部由空氣真空機構19始終減壓,故浮游於內部之粉塵等微小異物會由空氣真空機構19吸引去除,可將外罩15之內部保持潔淨。藉此,可與上述清潔器9之於劃線L1上之直接吸引去除塵垢物之動作相輔,防止對基板表面附著微小異物。In addition, since the inside of the cover 15 covering the scribe / break mechanism section C is always decompressed by the air vacuum mechanism 19, fine foreign matters such as dust floating inside will be sucked and removed by the air vacuum mechanism 19, and the cover 15 can be removed. The interior is kept clean. Thereby, it can be supplemented with the action of the cleaner 9 directly attracting and removing dirt on the scribe line L1 to prevent tiny foreign matter from adhering to the substrate surface.

以上,對本發明之代表性之實施例進行了說明,但本發明未必特定為上述實施形態。例如,於上述實施例中,將清潔器9配置於基板W之上側,但亦可配置於基板W之下側。又,對於劃線/裂斷機構部C,亦可與上述實施例相反地,將切割輪7與分斷用輥8配置於基板W之上側,將承受輥6配置於下側而進行劃線及分斷。As mentioned above, although the typical embodiment of this invention was described, this invention is not necessarily limited to the said embodiment. For example, in the above embodiment, the cleaner 9 is disposed on the upper side of the substrate W, but may be disposed on the lower side of the substrate W. Further, as for the scribing / breaking mechanism section C, the cutting wheel 7 and the breaking roller 8 may be arranged on the upper side of the substrate W and the receiving roller 6 may be arranged on the lower side to perform scribing, contrary to the above-mentioned embodiment. And breaking.

又,於上述實施例中,由劃線/裂斷機構部C進行劃線L1之加工與沿著該劃線L1之分斷,但亦可省略劃線機構而由裂斷機構僅進行分斷。該情形時,劃線加工由其他劃線裝置進行。 又,於上述實施例中,對在玻璃基板W2之上表面形成有成為可撓性基材之樹脂膜(PI膜)W1的OLED用之母板之加工例進行了說明,但亦可作為用於其他用途之玻璃基板之劃線裝置而使用。 此外於本發明中,得於可達成其目的且不脫離申請專利範圍之範圍內適當修正、變更。 [產業上之可利用性]In the above-mentioned embodiment, the scribing / breaking mechanism portion C performs the processing of the scribing line L1 and the cutting along the scribing line L1. However, the scribing mechanism may be omitted and only the cutting mechanism may perform the cutting. . In this case, the scribing process is performed by another scribing device. Moreover, in the above-mentioned embodiment, the processing example of the OLED mother board in which the resin film (PI film) W1 which becomes a flexible base material was formed on the upper surface of the glass substrate W2 was demonstrated, but it can also be used as Used for scribing devices of glass substrates for other purposes. In addition, in the present invention, appropriate modifications and changes can be made within the scope that can achieve its purpose without departing from the scope of patent application. [Industrial availability]

本發明可應用於將玻璃等脆性材料基板沿著劃線分斷之裂斷裝置。The invention can be applied to a breaking device for cutting a substrate of a brittle material such as glass along a scribe line.

1‧‧‧浮台1‧‧‧floating platform

1a‧‧‧小孔1a‧‧‧small hole

2‧‧‧夾具2‧‧‧ Fixture

2a‧‧‧橫樑構件2a‧‧‧ beam member

2b‧‧‧軌道2b‧‧‧ track

3‧‧‧立橋3‧‧‧ Ferry

4a‧‧‧上部導軌4a‧‧‧ Upper rail

4b‧‧‧下部導軌4b‧‧‧Lower guide

5a‧‧‧上部劃線頭5a‧‧‧ Upper scribing head

5b‧‧‧下部劃線頭5b‧‧‧Lower scribing head

6‧‧‧承受輥6‧‧‧bearing roller

7‧‧‧切割輪7‧‧‧ cutting wheel

8‧‧‧分斷用輥8‧‧‧ breaking roller

8a‧‧‧槽8a‧‧‧slot

9‧‧‧清潔器9‧‧‧ Cleaner

9a‧‧‧頭9a‧‧‧head

9b‧‧‧空氣吸引口9b‧‧‧Air suction port

9c‧‧‧空氣吹出口9c‧‧‧Air blowing outlet

10‧‧‧架台10‧‧‧stand

11‧‧‧浮台11‧‧‧ floating platform

11a‧‧‧小孔11a‧‧‧small hole

12‧‧‧夾具12‧‧‧ Fixture

12a‧‧‧橫樑構件12a‧‧‧ beam member

12b‧‧‧軌道12b‧‧‧ track

13‧‧‧排出用輸送機13‧‧‧Discharge conveyor

14‧‧‧上游搬送部之外罩14‧‧‧ Outer cover of upstream transfer department

14a‧‧‧出入口14a‧‧‧Entrance

14b‧‧‧擋板14b‧‧‧ bezel

15‧‧‧劃線/裂斷機構部之外罩15‧‧‧ Cover for scribe / split mechanism section

15a‧‧‧出入口15a‧‧‧Entrance

15b‧‧‧擋板15b‧‧‧ bezel

16‧‧‧下游搬送部之外罩16‧‧‧ Outer cover of downstream conveying department

16a‧‧‧出入口16a‧‧‧Entrance

16b‧‧‧擋板16b‧‧‧ bezel

17‧‧‧壓力空氣流入口17‧‧‧Pressure air inlet

18‧‧‧壓力空氣流入口18‧‧‧Pressure air inlet

19‧‧‧空氣真空機構19‧‧‧air vacuum mechanism

20‧‧‧除電裝置20‧‧‧ static elimination device

21‧‧‧感測器21‧‧‧Sensor

22‧‧‧叉爪22‧‧‧ Fork Claw

A‧‧‧基板加工裝置A‧‧‧ substrate processing equipment

B‧‧‧上游搬送部B‧‧‧ Upstream Transport Department

C‧‧‧劃線/裂斷機構部C‧‧‧Scribing / Cracking Mechanism Department

D‧‧‧下游搬送部D‧‧‧ Downstream Transport Department

E‧‧‧基板供給部E‧‧‧ Substrate Supply Department

L‧‧‧劃線預定線L‧‧‧ underline scheduled

L1‧‧‧劃線L1‧‧‧ crossed

W‧‧‧基板W‧‧‧ substrate

W1‧‧‧樹脂膜W1‧‧‧Resin film

W2‧‧‧玻璃板W2‧‧‧ glass plate

Wa‧‧‧基板Wa‧‧‧ substrate

Wb‧‧‧基板Wb‧‧‧ substrate

X‧‧‧方向X‧‧‧ direction

Y‧‧‧方向Y‧‧‧ direction

圖1係包含本發明之裂斷裝置之基板加工裝置之概略性側視圖。 圖2係圖1之基板加工裝置之概略性俯視圖。 圖3係圖1之基板加工裝置之劃線/裂斷機構部之放大前視圖。 圖4係與圖3相同之放大側視圖。 圖5係顯示本發明之加工對象基板之立體圖。 圖6(a)、(b)係顯示本發明之清潔器之剖視圖及仰視圖。 圖7係顯示以上游側夾具與下游側夾具固持基板之狀態之立體圖。 圖8係顯示劃線/裂斷機構部之劃線加工時之剖視圖。 圖9係顯示劃線/裂斷機構部之裂斷動作時之剖視圖。 圖10係顯示清潔器之動作時之剖視圖。 圖11係顯示基板加工裝置之動作之第1步驟之俯視圖。 圖12係顯示基板加工裝置之動作之第2步驟之俯視圖。 圖13係顯示基板加工裝置之動作之第3步驟之俯視圖。 圖14係顯示基板加工裝置之動作之第4步驟之俯視圖。 圖15係顯示基板加工裝置之動作之第5步驟之俯視圖。 圖16係顯示基板加工裝置之動作之第6步驟之俯視圖。 圖17係顯示基板加工裝置之動作之第7步驟之俯視圖。FIG. 1 is a schematic side view of a substrate processing apparatus including a breaking device of the present invention. FIG. 2 is a schematic plan view of the substrate processing apparatus of FIG. 1. FIG. FIG. 3 is an enlarged front view of a scribing / fracture mechanism portion of the substrate processing apparatus of FIG. 1. FIG. FIG. 4 is an enlarged side view similar to FIG. 3. FIG. 5 is a perspective view showing a substrate to be processed according to the present invention. 6 (a) and 6 (b) are a sectional view and a bottom view of the cleaner of the present invention. FIG. 7 is a perspective view showing a state where the substrate is held by the upstream-side clamp and the downstream-side clamp. FIG. 8 is a cross-sectional view showing a scribing / fracture mechanism portion during scribing. FIG. 9 is a cross-sectional view showing the breaking operation of the scribing / breaking mechanism portion. Fig. 10 is a sectional view showing the operation of the cleaner. FIG. 11 is a plan view showing the first step of the operation of the substrate processing apparatus. FIG. 12 is a plan view showing a second step of the operation of the substrate processing apparatus. FIG. 13 is a plan view showing a third step of the operation of the substrate processing apparatus. FIG. 14 is a plan view showing a fourth step of the operation of the substrate processing apparatus. FIG. 15 is a plan view showing the fifth step of the operation of the substrate processing apparatus. FIG. 16 is a plan view showing a sixth step of the operation of the substrate processing apparatus. FIG. 17 is a plan view showing the seventh step of the operation of the substrate processing apparatus.

Claims (9)

一種裂斷裝置,其特徵在於:其係用以分斷包含脆性材料之基板者,且具備: 氣浮器件,其於基板之搬送時及分斷時自浮台表面噴出空氣而使基板浮起; 夾具,其固持浮起之基板之端部並於水平方向移動,且於劃線時固定保持基板;及 裂斷機構,其將浮起之基板沿著劃線分斷。A breaking device is characterized in that it is used to break a substrate containing a brittle material, and is provided with: an air-floating device that ejects air from the surface of a floating table during the transportation of the substrate and breaks the substrate to cause the substrate to float A jig, which holds the end of the floating substrate and moves in the horizontal direction, and fixedly holds the substrate when scribing; and a breaking mechanism, which breaks the floating substrate along the scribing. 如請求項1之裂斷裝置,其中上述氣浮器件係使壓力空氣自於浮台之表面開口之多個小孔噴出。The breaking device according to claim 1, wherein the above-mentioned air-floating device ejects pressurized air from a plurality of small holes opened on the surface of the floating platform. 如請求項1之裂斷裝置,其中上述氣浮器件及上述夾具隔著上述裂斷機構而分別配置於兩側位置,且將其一者設為上游搬送部,將另一者設為下游搬送部。For example, the breaking device of claim 1, wherein the air-floating device and the jig are respectively disposed on both sides via the breaking mechanism, and one of them is set as an upstream transfer unit, and the other is set as a downstream transfer. unit. 如請求項2之裂斷裝置,其中上述氣浮器件及上述夾具隔著上述裂斷機構而分別配置於兩側位置,且將其一者設為上游搬送部,將另一者設為下游搬送部。For example, the breaking device of claim 2, wherein the air-floating device and the jig are respectively disposed on both sides via the breaking mechanism, and one of them is set as an upstream transfer unit, and the other is set as a downstream transfer unit. unit. 如請求項1至4中任一項之裂斷裝置,其中上述裂斷機構包含:分斷用輥,其與上述基板之一面接觸並滾動;及承受輥,其對向於該分斷用輥且承受上述基板之相反側之面。The breaking device according to any one of claims 1 to 4, wherein the breaking mechanism includes: a breaking roller, which is in contact with one surface of the substrate and rolls; and a receiving roller, which faces the breaking roller. And bear the surface on the opposite side of the substrate. 如請求項1至4中任一項之裂斷裝置,其中上述基板係於玻璃板之上表面積層有用以生成有機膜之樹脂膜的OLED顯示器用之母板。The breaking device according to any one of claims 1 to 4, wherein the substrate is a mother board for an OLED display having a surface area layer above a glass plate for forming a resin film of an organic film. 如請求項5之裂斷裝置,其中上述基板係於玻璃板之上表面積層有用以生成有機膜之樹脂膜的OLED顯示器用之母板。The breaking device according to claim 5, wherein the substrate is a mother board for an OLED display having a surface area layer above a glass plate for forming a resin film of an organic film. 一種裂斷裝置,其特徵在於:其係用以分斷包含脆性材料之基板者,且具備: 氣浮器件,其於基板之搬送時、劃線之加工時及分斷時自浮台表面噴出空氣而使基板浮起; 夾具,其固持浮起之基板之端部並於水平方向移動,且於劃線時及裂斷時固定保持基板; 劃線機構,其於浮起之基板加工出劃線;及 裂斷機構,其沿著由上述劃線機構加工出之劃線分斷基板。A breaking device is characterized in that it is used to break a substrate containing a brittle material, and is provided with: an air-floating device, which is ejected from the surface of the floating table when the substrate is transported, when the scribing is processed, and when the cutting is broken The substrate is floated by air; the clamp holds the end of the floating substrate and moves in the horizontal direction, and fixedly holds the substrate during scribing and breaking; the scribing mechanism processes the scratch on the floating substrate A wire; and a breaking mechanism that breaks the substrate along the scribe line processed by the scribe mechanism. 如請求項8之裂斷裝置,其中上述基板係於玻璃板之上表面積層有用以生成有機膜之樹脂膜的OLED顯示器用之母板。The breaking device according to claim 8, wherein the substrate is a mother board for an OLED display having a surface area layer above a glass plate for forming a resin film of an organic film.
TW107122925A 2017-07-31 2018-07-03 Cracking device TW201910282A (en)

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US4018372A (en) * 1975-12-05 1977-04-19 The Fletcher-Terry Company Glass cutting method and apparatus
US7770500B2 (en) * 2004-03-15 2010-08-10 Mitsuboshi Diamond Industrial Co., Ltd. Substrate dividing system, substrate manufacturing equipment, substrate scribing method and substrate dividing method
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