TW201229582A - Method of producing pattern retarder film - Google Patents

Method of producing pattern retarder film Download PDF

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Publication number
TW201229582A
TW201229582A TW101100824A TW101100824A TW201229582A TW 201229582 A TW201229582 A TW 201229582A TW 101100824 A TW101100824 A TW 101100824A TW 101100824 A TW101100824 A TW 101100824A TW 201229582 A TW201229582 A TW 201229582A
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Taiwan
Prior art keywords
pattern
light
film
polarizing filter
alignment
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TW101100824A
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Chinese (zh)
Inventor
Bong-Jin Choi
Yong-Hwan Kim
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Dongwoo Fine Chem Co Ltd
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Publication of TW201229582A publication Critical patent/TW201229582A/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363—Birefringent elements, e.g. for optical compensation
    • G02F1/133638—Waveplates, i.e. plates with a retardation value of lambda/n

Abstract

The present invention relates to a method of producing a pattern retarder film, more particularly to a method of producing a pattern retarder film described as below, comprising a light orientation step in which a polarization filter formed repeatedly with light shielding parts and linear grid pattern parts is placed on an orientation film, and light is irradiated from above the polarization filter to carry out orientation. As such, light loss caused by interface reflection can be reduced by using one polarization filter, and a continuous working procedure can be realized to easily enable mass production and productivity increase.

Description

201229582 I » »201229582 I » »

*1 J S J 六、發明說明： 【發明所屬之技術領域】 本發明涉及一種圖案相位差膜的製造方法，該圖案相 位差膜能夠適用於利用了偏光眼鏡方式的立體圖像顯示 裝置或者半透過型LCD等之中。 【先前技術】 最近，在如液晶顯示裝置（LCD)、電致發光（el) 顯示裝置、等離子顯示器（PDP)、場致發射顯示裝置（FED) 等的各種圖像顯示裝置中，正在向具有超越時空的實感， 且能夠立體地進行觀察、感覺、享受的超空間型三維（3d) 圖像顯示裝置的樣式變化。 一般情況下，表現出三維的立體影像是通過人的兩隻 眼睛的立體感視覺原理而實現，即利用由於兩隻眼睛之間 具有大致65mm距離而產生的兩眼視差（bin〇cular parallax )來實現立體感的方法。 兩眼視差的原理為如下方式，即，通過至少兩個立體 影像取得用攝像頭以相互不同的角度，分別對觀看者通過 左眼觀看的左眼圖像、和觀看者通過右眼觀看的右眼圖像 進行拍攝’之後將其分離並傳遞至觀看者的眼令的方式。 人的兩隻眼睛能夠分別以不同角度接收穿過視網膜的物 體’並將該兩個圖像通過兩個腦部來進行合成。 二維立體顯示技術可以大致區分為，兩眼視差方式 (stereoscopic technique )和複合視差方式 (autostereoscopic technique )。兩眼視差方式為利用立體 PHIDRAOUTWJOI100824 3/26 201229582 效果最大的左右眼的視差影像的方式，且具有偏光眼鏡方 式和無眼鏡方式。 對於曰本特開平10_232365號以及韓國專利公開第 2008 0108034號中圮載的偏光眼鏡方式的三維立體影像 裝置進行如下說明。 具有一種三維立體影像裝置，所述三維立體顯示裝置*1 JSJ VI. [Technical Field] The present invention relates to a method for producing a pattern retardation film which can be applied to a stereoscopic image display device using a polarized glasses method or a semi-transmissive type. Among LCDs, etc. [Prior Art] Recently, in various image display devices such as a liquid crystal display device (LCD), an electroluminescence (el) display device, a plasma display (PDP), a field emission display device (FED), etc., A style change of a hyperspace-type three-dimensional (3d) image display device that can observe, feel, and enjoy stereoscopically beyond the real sense of time and space. In general, the three-dimensional stereoscopic image is realized by the stereoscopic visual principle of the two eyes of the human, that is, the binocular parallax generated by the distance between the two eyes of approximately 65 mm is used. A method of achieving a three-dimensional sense. The principle of the parallax of the two eyes is such that the at least two stereoscopic image acquisition cameras respectively respectively view the left eye image viewed by the viewer through the left eye and the right eye viewed by the viewer through the right eye at different angles from each other. The way the image is taken 'after it is separated and passed to the viewer's eye. The two eyes of the person are capable of receiving the object passing through the retina at different angles respectively and synthesizing the two images through the two brains. Two-dimensional stereoscopic display technology can be roughly divided into two-eye stereoscopic technique and autostereoscopic technique. The binocular parallax method is a method in which the parallax images of the left and right eyes having the largest effect are used by the stereo PHIDRAOUTWJOI100824 3/26 201229582, and the polarized glasses method and the glasses-free method are adopted. The three-dimensional image forming apparatus of the polarized glasses method described in Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. Having a three-dimensional stereoscopic image device, the three-dimensional stereoscopic display device

包括：液晶屏，其具有右眼圖像區域R和左眼圖像區域U 偏光板，其#配置於所述液晶屏的整個面Λ ;圖案相位差 膜’其被配置於所述偏光板上，且以圓偏光進行出射，其 中，所述圓偏光為，從偏光板穿過的右眼圖像及左眼圖像 的偏光軸的旋轉方向互為反向的圓偏光。另外，還具備偏 光眼鏡，其能夠以立體影像觀賞由所述立體影像裝置出射 的右眼圖像和左眼圖像。 已知很多適用於三維立體影像裝置上的圖案相位 膜及其製造方法。如美國專利第5,327,285號所公開， 如下方法進行製造，即’通過在將TAC(三乙醯基纖維素 膜和碘處理的延伸PVA (聚乙稀醇）膜層疊而成的偏光) 上包覆光㈣料（phGt。resist)，且對預定部位進行曝: 後用氫氧化卸洛液進行處理而使固定部位的相位差3 遲功能消失的方法。 另方面，在韓國專利申請第2000-0087186號中’公 開了 -種立體影像顯示裝置的製造方法，該方法通過將相 位延遲性物質塗布於相基板上，並通過料而使所述相 位延遲性的物質部分暖本 曝光’從而形成手性特性被調製的部 分與維持原來特性的部分^ J °丨刀相互交替排列的光學濾波器（光The invention comprises: a liquid crystal screen having a right eye image region R and a left eye image region U polarizing plate, wherein # is disposed on the entire surface of the liquid crystal panel; and the pattern retardation film is disposed on the polarizing plate And the circularly polarized light is a circularly polarized light in which the rotational directions of the polarization axes of the right-eye image and the left-eye image that pass through the polarizing plate are opposite to each other. Further, it is provided with polarized glasses which can view the right-eye image and the left-eye image which are emitted by the stereoscopic image device in a stereoscopic image. Many pattern phase films suitable for use in a three-dimensional image forming apparatus and a method of manufacturing the same are known. As disclosed in U.S. Patent No. 5,327,285, the present invention is carried out by coating a TAC (polarized light obtained by laminating a TAC (triethyl fluorene-based cellulose film and an iodine-treated extended PVA (polyethyl alcohol) film). The light (four) material (phGt.resist), and the exposure of the predetermined portion: the method of treating the phase difference of the fixed portion by the treatment with the hydrolytic water to remove the delayed function. On the other hand, in the Korean Patent Application No. 2000-0087186, a method of manufacturing a stereoscopic image display device is disclosed which applies the phase retardation substance to a phase substrate and passes the material to cause the phase retardation. The material part of the warmth exposure is exposed to form a portion of the chiral characteristic that is modulated and the portion that maintains the original characteristics.

PniDRA011TW_t〇n〇〇824 4/26 201229582 學膜）。 然而，美國專利第5,327,285號的製造方法的問題在 於，由於化學蝕刻而導致的複雜的製造步驟、以及隨之產 生的較高的製造成本以及較低的生產性。韓國專利申請第 2000-00871 86號的偏光濾光片的製造方法中，由於實質上 難以通過光強度來調節延遲性材料的手性特性，因此在成 率較低、且在因溫度而造成的不穩定性等的實用化上， 存在較多問題^ 為了改善上述的問題，韓國專利公開第2〇1〇 〇〇89782 號公開了-種光取向方法（冑5)，該方法為，將圖案遮罩 50置於高分子膜的上部，其中所述圖案遮罩5〇為，在上 下以及左右方向上交替形成有透光區域以及遮光區域以 選擇性地使互不相同的偏振光通過，並將偏光板置於 上述圖案遮罩50上，其中所述偏光板6〇具有可使各自不 同的偏振光透射過的、被區分開的兩個區域’並且，通過 從上述偏光板的上部向高分子膜照射紫外線，從而在所述 咼分子膜的微小區域内形成具有相互不同的取向方向的 取向膜。 但是’在韓國專利公開第2010-0089782號中，由於會 產生由光的散射、以及偏光板和圖案遮罩的光學介面上的 介面反射等而導致的光損失，因此單位時間内到達取向膜 的光量較低’而且，由於執行經過兩次的光照射工序，因 此存在工序性以及生產性較低的問題。 PIllDRA011TW」〇ll〇0824 5/26 201229582 【發明内容】 本發明計畫提供一種圖案相位差膜的製造方法，其能 夠使由於光的散射以及光學介面上的介面反射等而導致 的光損失最小化，且能夠通過經一次光照射而實現的光取 向工序來形成具有相互不同的取向方向的取向膜，並且由 於不具備另行設置的遮罩因此曝光裝置被簡化，從而能夠 大量生產以及提高生產性。 用於解決上述課題的、本發明的圖案相位差膜的製造 方法包含光取向步驟，在所述光取向步驟中，將偏光濾光 片置於取向膜的上部，並從所述偏光濾光片的上部照射光 而進行取向，其中所述偏光濾光片上反覆形成有遮光部和 線柵格圖案部。 所述取向膜為在固定方向上被進行了取向的膜，且還 可以包含在與所述取向膜的取向方向不同的方向上進行 取向的光取向步驟》 所述線柵格圖案部的形狀可以是直線。 並且，本發明的圖案相位差膜的製造方法包含光取向 步驟’在所述光取向步驟中’將含有第—偏光濾光部和第 二偏光濾光部的偏光濾光片置於取向膜的上部並從所述 偏光慮光片的上部照射光從而進行取向，其中，所述第一 偏光濾光部上反覆形成有第一遮光部和第一線柵格圖案 部’所述第二偏光滤光部上反覆形成有第二遮光冑、和與 第一線柵格圖案部的圖案方向不同的第二線柵格圖案部^ 所述偏光遽光片可以被形成為，第—偏光滤光部的第 一遮光部與第二偏光濾光部的第二線柵格圖案部相鄰接。 PIliDRA0llTW_10! 100824 6/26 201229582 1 ，彙 , 所述取向犋可 e J以疋無取向的膜。 所述第一綠 '咏冊格圖案部及第二線柵格圖案部的形狀 可以分別為直線。 還可以包令A # , . |破光取向後的所述取向膜上形成液晶 塗布層的步驟。 迷光取向步驟可以通過曝光系統來實施，所述曝光 系、充匕括.緊貼部，其在與薄膜緊貼的同時使薄膜進行移 動’圖案形成部’其將由發光部所照射的光傳遞至緊貼在 所述溥膜緊貼部上的薄膜部分，從而在所述薄膜部分上形 成偏光圖案。 所述圖案形成部可以具備偏光濾光片。 所述圖案形成部上所具備的偏光濾光片的曲面和輥 曲面之間的距離可以在50〜150μιη的範圍内維持固定。 在本發明中’由於通過使用一個偏光濾光片而使得由 散射和介面反射而導致的光損失較少，從而到達取向膜的 光量較高’因而具有光效率優異的優點。 並且’在本發明中’可以通過由一次的光照射而實現 的光取向工序來形成具有不同的取向方向的取向膜。 由於無需具備在所述一次的光照射工序時所需的遮 罩’因此能夠簡化曝光裝備。 另外’在本發明中，可以通過連續的工序來製造圖案 相位差膜’從而可以大量生產，並且能夠提高生產性。 PI11DRA011TW 10Ϊ100824 7/26 201229582 【實施方式】 本發明涉及一種圖案相位差膜的製造方法，其能夠利 用個偏光濾光片而使由光的散射以及光學介面上的介 面反射4而導致的光損失最小化，並且能夠通過由一次的 光照射而實現的光取向工序來形成具有不同的取向方向 的取向膜。 以下，對本發明進行詳細說明。 本發明所涉及的圖案相位差膜的製造方法包含光取 向步驟，在該光取向步驟中，將反覆形成有遮光部和線柵 格圖案部的偏光濾光片置於取向膜的上部，並從所述偏光 濾光片的上部照射光從而進行取向。 本發明中的偏光濾光片是指如下的光學元件，即，能 夠使在多個方向上振動的光在通過所述偏光濾光片後，形 成僅在隊定方向上振動的偏光，且能夠形成在所述偏光濾 光片中只有一部分在同一方向上振動的偏光的光學元件。 所述取向膜使用在固定方向上被取向的膜。取向膜通 過在溥膜上塗布通常的取向膜形成組合物，之後進行乾燥 而形成。 在上述固定方向上被取向的取向膜的形成方法不被 特別限定，但是在塗布面上，與摩擦輥等的接觸式相比優 選為偏光曝光等的非接觸式。 所述使用了在固定方向上被取向的取向膜的光取向 步驟為，如圖3所示，使反覆形成有圖i的遮光部21和 線柵格圖案部22的偏光渡光片20置於形成有取向膜的薄 PI11DRA0I1TW_101100824 8/26 201229582 膜5上，並在與所述取向膜的取向方向不同的方向上進行 取向。 使用根據本發明的偏光濾光片的方法，與現有的偏光 板60和遮罩50被分離的方法相比，能夠改善曝光光的解 析度的降低。具體而言，在現有的技術中，偏光板6〇和 圖案遮罩50被分離，從而曝光光僅在它們之間的間隔内 行進並被衍射，因而曝光光的解析度會降低，但在本發明 中，由於曝光光僅通過一個偏光濾光片，因此不需要考慮 解析度降低的問題。 另外’根據本發明的圖案相位差膜的製造方法包括光 取向步驟’在所述光取向步驟中’將包括第一偏光濾光部 與第一偏光濾、光部的偏光慮光片置於取向膜的上部，並從 所述偏光濾光片的上部照射光而進行取向，其中，所述第 一偏光濾光部上反覆形成有第一遮光部和第一線柵格圖 案部’所述第二偏光濾光部上反覆形成有第二遮光部、和 與第一線柵格圖案部的圖案方向不同的第二線柵格圖案 部。 此時，取向膜使用無取向的取向膜。 在使用所述無取向的取向膜的光取向步驟中，如圖4 所示’在形成有取向膜的薄膜5上使用偏光濾光片20,如 圖2所示，所述偏光濾光器20包含：反覆形成有第一遮 光部23和第一線柵格圖案部24的第一偏光濾光部4〇、以 及反覆形成有第二遮光部25和第二線栅格圖案部26的第 二偏光濾光部41。 PI11DRA011TWJ 01100824 9/26 201229582 此時，第二線柵格圖案部26在與第一線柵格圖案部 24的圖案不同的方向上被圖案化，並且取向膜以具有相互 不同的方向的取向區域的方式而被取向。 所述偏光濾光片被形成為，第一偏光濾光部4〇和第 二偏光濾光部41在取向膜的行進方向上並排，且第一偏 光遽光部40的第-遮光部23和第二偏^慮光部41的第 二線柵格圖案部26相鄰接。 在將圖2的偏光遽光片使用於在固定方向上被取向的 取向膜中的情況下，優選使用通過取向膜形成組合物而形 成的取向膜，#中’所述取向膜形成組合物由通過曝光而 使取向方向不固定的成分構成。 所述遮光部、第一遮光部以及第二遮光部的結構為， 通過吸收以及反射各自人射的光而進行遮斷，以使光益法 到達取向膜上的構件，並且，所述線柵格圖案部、第一線 柵格圖案部以及第二線栅格圖案部的結構為，使各自入射 的光偏振以使其到達取向膜上的構件。 線拇格圖案部、第一線柵格圖案部以及第二線栅格圖 案P的形狀刀別為直線，具體而言，由多個以平行的直線 狀而犬出的金屬線以按預定週期排列而成。金屬線由鋁 (AI)銀（Ag)、鉻（Cr)、銅（Cu)、錄（Ni)、鈦（Ti)、 金（AU)或者至少2種所述金屬的合金形成。 線柵格圖案部、第一線栅格圖案部以及第二線柵格圖 案部的形成方法可以採用本領域中常用的方法。例如，在 :成主圖案之後’利用所形成的主圖案的逆像模具而製 ^並在透明保護膜或者玻璃基板上依次層疊金屬層和高 pHlDRAOIlTW_l〇l 100824 10/26 201229582 1 1 4 刀子層’之後，利用模具 形。接下來，通過傾斜蒸鑛而在::子二 格子，形成線柵格圖案。或: = = =金屬 來形成線柵格圖案，& 了乂通過如下方法 行蝕刻，並對義露在矣而出的圖案的高分子層進 式㈣而形成;屬層進行幹式'刻或者濕 殘留的高分子。 後去除在所形成的金屬圖案上 圖案柵:自圖案部、第-線柵格圖案部以及第二線栅格 案的高幻、金：線金Τ寬度(圖案的寬度)、高度(圖 如透過率及反㈣（圖㈣㈣），可以通過 對其值進行調r 偏光特性相關的光學性設計來 、 調節。例如，圖案的寬度為15〇nm以下，優選 500，1〇〇nm ’圖案的高度為6_m以下’優選為50〜 ,圖案的週期為300nm以下，優選為20〜20〇nm。 部的县^慮光片的長度、第—偏光遽光部和第二偏光濾光 、a，可以根冑取向膜的大小以及移動方向來進行調 郎。並且’遮光部和線栅格圖案部、第一遮光部和第 柵格圖案部、以及第一遮光部和第一線柵格圖案部的各自 的大J 乂及匕們之間的間隔’可以根據作為 位差膜來進行調節。 _系相 對於光*作特別限定，可以使肖f子射線、離子射 等離子射線以及放射線等，優選使用容易處理的紫外 根據本發明而製造的圖案相位差膜，優選以取向方向 相互垂直的方式來實施光取向步驟。此時，垂直不僅包含 11/26 PIHDRAOUTW_l〇n〇〇824 201229582 兩條線呈90。的狀態’也包含能夠實質性地顯示出垂直效 果的情況。 實施所述光取向步驟，並在完成取向膜的硬化之後形 成液Ba塗布層。液晶塗布層通過在硬化的取向膜上塗布液 晶塗布層形成組合物，並進行乾燥而形成，其中，所述液 晶塗布層形成組合物包含，具有光學異方性、且具有對光 的架橋性的液晶化合物。液晶化合物優選使用折射率異方 性大於等於〇.05的物質，例如反應性液晶化合物（RM )。 對所述乾燥後的塗布層進行光硬化，從而製造通過取 向膜的取向方向而使液晶被取向的圖案相位差膜。 在本發明中於取向膜上使用特定的偏光濾光片而進 行了光取向步驟，在除此之外的部分，例如取向膜以及液 B曰塗布層的種類、形成方法、厚度等的特性以及光取向條 件等方面’除了上述的說明之外也可以適當地選擇而適 用，以顯示出本技術領域中通常所需的光學特性。 另一方面’本發明所涉及的圖案相位差膜可以使用本 領域中通常所使用的裝置來進行製造。 例如’如圖6所示，可以使用如下的製造裝置，此製 造裝置包括：輸送部’其對成卷薄膜進行放卷以及/或者收 卷並進行輸送；形成部（未圖示）’其在被輸送的所述薄 膜上形成取向膜；光取向部，其向形成在所述薄膜上的取 向膜照射光而進行取向；圖案相位差膜形成部，其在所述 取向膜的上部形成液晶塗布層之後，通過照射光而形成圖 案相位差膜。 12/26 PI11DRA011TW」01100824 201229582 送部11的第一捲筒7以及第二捲筒9優選配置為， 地通過帶或者鍵等的動力傳遞部件（未圖示）而與電 機等的驅動源（未圖示）連接，從而能夠被傳遞驅動力而 進灯旋轉。此外，可以具備多個引導捲筒（未圖示），其 用於維持張力以及穩定的薄膜輸$ ;以及多個累加器 (~0Γ，未圖示），其通過工序而控制薄膜的輸送 量。另外’形《取向膜的薄膜5優選以通常的卷對卷（r〇u to roll)方式而進行移動。 ^取向膜的形成也可以通過取向膜形成部而在即將進 订取向刖的過程中實現’還可以根據情況而通過另外的取 向膜形成工序而在薄膜上形成取向膜。並且，《了根據需 要而使通過取向膜形成部而形成的取向膜硬化，可以使用 通常的乾燥裝置》 圖案相位差膜形成部3包含混合溶液塗布部3 1、混合 溶液乾燥部3 3以及硬化部3 5。 並且，本發明可以在圖案相位差膜形成部3之後包含 缺陷檢查部（未圖示），以實施圖案相位差膜的缺陷檢查。 缺陷檢查部對遽光片等進行掃描以確定規定的缺陷，並使 用油墨標記、條碼標記等的標記裝置來對所確定的缺陷進 行表不，或者將缺陷資訊（形態、大小、位置）存儲在另 外的存儲部中並在適用於立體圖像顯示裝置時進行靈活 運用。 在所述光取向部中所使用的曝光系統中，為了使連續 行進的薄膜的彎曲以及振動最小化，從而如圖7所示可 以使薄膜緊貼於圓筒狀的輥來實現。 13/26 PI11DRA0I1TW_101100824 201229582 具體而言’曝光系統可以包括：薄犋緊貼部，其在緊 貼薄膜的同時使薄膜進行移動；圖案形成部，其將由發光 部所照射的光傳遞至緊貼在所述薄臈緊貼部上的薄膜部 分，從而在所述薄膜部分上形成偏光圖案。 優選為，所述薄膜緊貼部為圓筒狀的輥16〇，且形成 有所述取向膜的薄膜5在與所述輥的曲面緊貼的同時而進 行移動。 所述圖案形成部150起到將由發光部照射的光朝向所 述輥的旋轉轴傳遞的作用。圖案形成部包括根據本發明的 偏光濾光片，並且使圖案形成部15〇上所具備的偏光濾光 片的曲面與輥160的曲面之間的距離維持固定 (ΑΑ'=ΒΒ，=(：<^)。 所述圖案形成部150上所具備的偏光渡光片的曲面與 親16〇的肖面之間的距離維持在5〇〜15〇叫，優選維持在 50〜1 ΟΟμιη 〇 並且’圖案形成部150只需位於能夠形成圖案的部分 即可，可以不作特別限定地位於輥的入口部、中央部及出 口部等處。 另外，所述圖案形成部優選包含為了調節偏光滤光片 的曲面而使内部氣壓被調節的腔室。 所述輥的表面優選經過無反射或者無散射處理。 並且，本發明的曝光系統還可以包括：第一反射部 120 ’其反射從上述發光部輸出的光11〇;聚光器其 對由所述第一反射部反射的光進行聚光並傳遞；第二反射 部140’其將從所述聚光器傳遞來的光反射至圖案形成部。 14/26 PII1DRA0MTW_!01100824 201229582 此時，圖案形成部可以直接接受所述發光部所照射的 光的輸入，並將該光傳遞至緊貼在所述薄膜緊貼部上的薄 膜部分上。 以下，雖然為了理解本發明而提供了優選實施例，但 以下的實施例僅為對本發明的示例，本領域技術人員可以 在本發明的範疇及技術思想的範圍内作出多種變更及修 正，這對於本領域技術人員而言是顯而易見的，並且這種 變更及修正顯然也屬於本發明的申請專利範圍内。 實施例1 如圖6所示的製造裝置，通過輸送部對三乙酸纖維素 薄膜進行輸送。在所輸送的薄膜上塗布丙烯酸酯類取向 液’並在40°C下熱風乾燥120秒，從而形成厚度為1〇〇〇人 的取向膜。此後，通過14mW的曝光燈在取向膜上照射偏 光後的紫外線’從而形成了在固定方向上被取向的取向 膜。 對形成有所述取向膜的薄膜進行移動的同時，在配置 有圖1的偏光濾光片的光取向部處，對以4m/min的速度 進行移動的基板以20mW/cm2的紫外線連續照射1秒鐘， 從而使光僅通過線柵格圖案部而形成了具有與上述取向 膜的方向不同的取向方向的取向膜。 在實施了所述取向膜的硬化後，塗布液晶塗布層形成 組合物，並在80°C下進行20秒的預乾燥，之後在n〇〇c 下進行5秒的乾燥’從而形成了厚度為15μΓη的塗布層。 其後’通過14 m W的曝光燈而照射紫外線5 〇 〇秒，從而製 PI 11DRAO11 TW_101100824 15/26 201229582 造了光硬化的圖案相位差膜。所述圖案相位差膜的生產速 度為 4m/min。 實施例2 雖然與所述實施例1同樣地進行實施，但區別在於： 使用無取向的取向膜及圖2的偏光濾光片來製造了圖案相 位差膜。所述圖案相位差膜的生產速度為8m/min。 實施例3 雖然與所述實施例1同樣地進行實施，但區別在於： 如圖7所示’在使薄膜緊貼於圓筒狀的輥上的同時，利用 光取向的曝光系統而製造了圖案相位差膜。此時，圖案形 成部150上所具備的偏光濾光片的曲面與親的曲面之 間的距離維持在了 70μιη。所述圖案相位差膜的生產速度 為 8m/min 〇 比較例 雖然與所述實施例1同樣地進行實施，但區別在於： 如圓5所示，將反覆形成有透光區域和遮光區域的圖案遮 罩50置於取向膜上，並將具有相互不同的偏振光分別穿 過的區域的偏光鏡60置於上述圖案遮罩5〇上，從而製造 了圖案相位差膜。所述圖案相位差膜的生產速度為 4m/min。 實驗例 PI11DRA011TW_10] 100824 16/26 201229582 通過以下方法敎了輯所述實施例及比較例的圖 案相位差膜的製造方法的光損失，並將其結果示於下述表 1 ° -光損失 將以上方式製造的圖案相&差膜裝載於與吸收轴 相互正交的偏光板上，並用顯微鏡（才y >八只社）圮錄 了通過所述偏光板及圖案相位差膜的圖像。利用數位影像 分析程式而測定了所述記錄圖像的固定區域的亮度。 此時，所記錄的圖像如下圖（左側_比較例，右側-實 施例1 )所示，發生漏光的部分通過面形狀或者線形狀（圖 案之間的間隔）來表示。在下述的記錄圖像中，零色部分 為取向形成良好的狀態，顏色模糊的部分為因衍射現象而 形成雙重取向從而取向方向不明確的部分。 此時，比較例為在上下方向上形成有圖案的示例，實 施例1為在從右上部朝向左下部的方向上形成有圖案的示PniDRA011TW_t〇n〇〇824 4/26 201229582 film)). However, the problem of the manufacturing method of U.S. Patent No. 5,327,285 is that complicated manufacturing steps due to chemical etching, and consequent higher manufacturing costs and lower productivity. In the method for producing a polarizing filter of Korean Patent Application No. 2000-00871 86, since it is substantially difficult to adjust the chiral property of the retardation material by the light intensity, the yield is low and the temperature is caused. There are many problems in the practical use of the instability, etc. In order to improve the above-mentioned problem, a photo-alignment method (胄5) is disclosed in Korean Patent Publication No. 2,89,782, which is a pattern. The mask 50 is placed on an upper portion of the polymer film, wherein the pattern mask is alternately formed with a light-transmitting region and a light-shielding region alternately in the upper and lower sides and the left-right direction to selectively pass polarized light different from each other, and The polarizing plate is placed on the above-described pattern mask 50, wherein the polarizing plate 6 has two regions that are separated by the respective polarized light, and is separated from the upper portion of the polarizing plate. The molecular film is irradiated with ultraviolet rays to form alignment films having mutually different orientation directions in minute regions of the ruthenium molecular film. However, in the Korean Patent Publication No. 2010-0089782, light loss due to scattering of light, and interface reflection on the optical interface of the polarizing plate and the pattern mask, etc., reaches the alignment film per unit time. The amount of light is low. Moreover, since the light irradiation process that has passed twice is performed, there is a problem that processability and productivity are low. PIllDRA011TW"〇ll〇0824 5/26 201229582 SUMMARY OF THE INVENTION The present invention provides a method of fabricating a pattern retardation film capable of minimizing light loss due to scattering of light and interfacial reflection on an optical interface. Further, it is possible to form an alignment film having mutually different alignment directions by a photo-alignment process by one-time light irradiation, and since the mask is not provided separately, the exposure apparatus is simplified, and mass production and productivity can be improved. A method for producing a pattern retardation film of the present invention for solving the above problems includes a photo-alignment step in which a polarizing filter is placed on an upper portion of an alignment film, and from the polarizing filter The upper portion is irradiated with light to be oriented, and the polarizing filter is repeatedly formed with a light shielding portion and a line grid pattern portion. The alignment film is a film that is oriented in a fixed direction, and may further include a photo-alignment step that is oriented in a direction different from an orientation direction of the alignment film. The shape of the line grid pattern portion may be It is a straight line. Further, the method for producing a pattern retardation film of the present invention comprises a photo-alignment step 'in the photo-alignment step' of placing a polarizing filter including a first polarizing filter portion and a second polarizing filter portion on an alignment film The upper portion is irradiated with light from the upper portion of the polarizing filter to be oriented, wherein the first polarizing filter is repeatedly formed with a first light blocking portion and a first light grid pattern portion a second light-shielding layer and a second line grid pattern portion different from the pattern direction of the first line grid pattern portion are formed on the light portion. The polarizing light sheet may be formed as a first-polarizing filter portion. The first light blocking portion is adjacent to the second line grid pattern portion of the second polarizing filter portion. PIliDRA0llTW_10! 100824 6/26 201229582 1 , sink, the orientation 犋 can be J 疋 unoriented film. The shapes of the first green '咏 grid pattern portion and the second line grid pattern portion may be straight lines, respectively. It is also possible to include a step of forming a liquid crystal coating layer on the alignment film after the photo-alignment of A # , . The step of fading can be carried out by an exposure system that is attached to the affixing portion that moves the film while being in close contact with the film. The patterning portion transmits the light irradiated by the illuminating portion to A portion of the film that is in close contact with the contact portion of the enamel film to form a polarizing pattern on the portion of the film. The pattern forming portion may be provided with a polarizing filter. The distance between the curved surface of the polarizing filter and the curved surface of the roller provided on the pattern forming portion can be maintained constant within a range of 50 to 150 μm. In the present invention, the light loss due to scattering and interface reflection is small due to the use of one polarizing filter, so that the amount of light reaching the alignment film is high, and thus the optical efficiency is excellent. Further, in the present invention, an alignment film having different orientation directions can be formed by a photo-alignment process by one-time light irradiation. Since it is not necessary to have the mask required at the one-time light irradiation process, the exposure equipment can be simplified. Further, in the present invention, the pattern retardation film can be produced by a continuous process so that mass production can be achieved, and productivity can be improved. PI11DRA011TW 10Ϊ100824 7/26 201229582 [Embodiment] The present invention relates to a method of manufacturing a pattern retardation film capable of minimizing light loss caused by scattering of light and interface reflection 4 on an optical interface by using a polarizing filter. The alignment film having different orientation directions can be formed by a photo-alignment process realized by one-time light irradiation. Hereinafter, the present invention will be described in detail. The method for producing a pattern retardation film according to the present invention includes a photo-alignment step in which a polarizing filter in which a light-shielding portion and a line grid pattern portion are repeatedly formed is placed on an upper portion of an alignment film, and The upper portion of the polarizing filter is irradiated with light to be oriented. The polarizing filter in the present invention refers to an optical element capable of causing light that vibrates in a plurality of directions to form polarized light that vibrates only in a predetermined direction after passing through the polarizing filter, and is capable of An optical element that forms a polarized light in which only a part of the polarizing filter vibrates in the same direction is formed. The alignment film uses a film that is oriented in a fixed direction. The alignment film is formed by coating a general alignment film on a ruthenium film to form a composition, followed by drying. The method of forming the alignment film to be oriented in the above-mentioned fixed direction is not particularly limited, but it is preferably a non-contact type such as polarized exposure on the coated surface as compared with a contact type such as a rubbing roller. The photo-alignment step using the alignment film oriented in the fixed direction is such that, as shown in FIG. 3, the polarizing light-passing sheet 20 on which the light-shielding portion 21 and the line grid pattern portion 22 of FIG. A thin film of PI11DRA0I1TW_101100824 8/26 201229582 on which an alignment film is formed is oriented in a direction different from the orientation direction of the alignment film. With the method of polarizing the filter according to the present invention, it is possible to improve the reduction in the degree of resolution of the exposure light as compared with the conventional method in which the polarizing plate 60 and the mask 50 are separated. Specifically, in the prior art, the polarizing plate 6 〇 and the pattern mask 50 are separated, so that the exposure light travels only within the interval between them and is diffracted, so that the resolution of the exposure light is lowered, but in the present In the invention, since the exposure light passes through only one polarization filter, there is no need to consider the problem that the resolution is lowered. Further, the manufacturing method of the pattern retardation film according to the present invention includes a photo-alignment step in which the polarizing light-receiving sheet including the first polarizing filter portion and the first polarizing filter and the light portion is placed in an orientation An upper portion of the film is irradiated with light from an upper portion of the polarizing filter, wherein the first polarizing filter portion is formed with a first light blocking portion and a first line grid pattern portion A second light blocking portion and a second line grid pattern portion different from the pattern direction of the first line grid pattern portion are formed over the second polarizing filter portion. At this time, the alignment film used a non-oriented alignment film. In the photo-alignment step using the non-oriented alignment film, as shown in FIG. 4, 'the polarizing filter 20 is used on the film 5 on which the alignment film is formed, as shown in FIG. 2, the polarizing filter 20 The method includes: a first polarizing filter portion 4 that is formed with the first light blocking portion 23 and the first line grid pattern portion 24, and a second portion that is repeatedly formed with the second light blocking portion 25 and the second line grid pattern portion 26 The polarizing filter unit 41. PI11DRA011TWJ 01100824 9/26 201229582 At this time, the second line grid pattern portion 26 is patterned in a direction different from the pattern of the first line grid pattern portion 24, and the alignment film is in an orientation region having mutually different directions. It is oriented in the way. The polarizing filter is formed such that the first polarization filter portion 4 and the second polarization filter portion 41 are arranged side by side in the traveling direction of the alignment film, and the first light-shielding portion 23 of the first polarization-lighting portion 40 and The second line grid pattern portion 26 of the second partial light portion 41 is adjacent to each other. In the case where the polarizing calender sheet of FIG. 2 is used in an alignment film oriented in a fixed direction, it is preferred to use an alignment film formed by forming a composition by an alignment film, in which the alignment film forming composition is composed of It is composed of a component whose orientation direction is not fixed by exposure. The light shielding portion, the first light shielding portion, and the second light shielding portion are configured to block by absorbing and reflecting light emitted by respective persons, so that the light gain method reaches the member on the alignment film, and the wire grid The lattice pattern portion, the first line grid pattern portion, and the second line grid pattern portion are configured to polarize the respective incident light so as to reach the member on the alignment film. The shape of the line thumb pattern portion, the first line grid pattern portion, and the second line grid pattern P is a straight line, specifically, a plurality of metal lines that are in a straight line shape in a predetermined period. Arranged. The metal wire is formed of aluminum (AI) silver (Ag), chromium (Cr), copper (Cu), Ni (Ni), titanium (Ti), gold (AU) or an alloy of at least two of the above metals. The method of forming the line grid pattern portion, the first line grid pattern portion, and the second line grid pattern portion may employ a method commonly used in the art. For example, after the main pattern is formed, 'the reverse pattern mold of the formed main pattern is used to form a metal layer and a high pHlDRIIlTW_l〇l 100824 10/26 201229582 1 1 4 knife layer on the transparent protective film or the glass substrate. 'After, use the mold shape. Next, a line grid pattern is formed by tilting the steam in the :: sub-grid. Or: = = = metal to form a line grid pattern, &; 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂 乂Or a polymer that remains wet. After removing the pattern gate on the formed metal pattern: high-magic, gold: line gold Τ width (pattern width), height from the pattern portion, the first-line grid pattern portion, and the second line grid case (such as The transmittance and inverse (4) (Fig. (4) (4)) can be adjusted by adjusting the optical characteristics of the polarization characteristics. For example, the width of the pattern is 15 〇 nm or less, preferably 500, 1 〇〇 nm 'pattern. The height is 6_m or less, preferably 50~, and the period of the pattern is 300 nm or less, preferably 20 to 20 〇 nm. The length of the section of the section, the first-polarized light-emitting portion and the second polarized filter, a, The size of the alignment film and the direction of movement may be adjusted, and the 'light shielding portion and the line grid pattern portion, the first light blocking portion and the first grating pattern portion, and the first light blocking portion and the first line grid pattern portion The spacing between the respective large J 乂 and the ' can be adjusted according to the difference film. The _ system is particularly limited to the light*, and the ray beam, the ion beam, the radiation, and the like can be preferably used. Use easy to handle UV according to this hair In the case of the pattern retardation film to be produced, it is preferable to carry out the photo-alignment step in such a manner that the orientation directions are perpendicular to each other. In this case, the vertical direction includes not only 11/26 PIHDRAOUTW_l〇n〇〇824 201229582, but the two lines are 90. A case where the vertical effect is substantially exhibited. The photo-alignment step is performed, and a liquid Ba coating layer is formed after the hardening of the alignment film is completed. The liquid crystal coating layer forms a composition by coating a liquid crystal coating layer on the cured alignment film, and It is formed by drying, wherein the liquid crystal coating layer forming composition contains a liquid crystal compound having optical anisotropy and having a bridging property to light. The liquid crystal compound preferably uses a substance having a refractive index anisotropy of 〇.05 or more. For example, the reactive liquid crystal compound (RM) is subjected to photocuring of the dried coating layer to produce a pattern retardation film in which the liquid crystal is oriented by the alignment direction of the alignment film. In the present invention, the alignment film is used. The photo-alignment step is performed on a specific polarizing filter, and other portions, such as an alignment film and a liquid B coating, are applied. The characteristics of the type of the layer, the formation method, the thickness, and the like, and the photo-alignment conditions can be appropriately selected and applied in addition to the above description to exhibit optical characteristics generally required in the art. The pattern retardation film according to the present invention can be produced by using a device generally used in the art. For example, as shown in Fig. 6, a manufacturing apparatus including a conveying portion The film is unwound and/or wound and conveyed; a forming portion (not shown) which forms an alignment film on the film to be conveyed, and a photo-aligning portion that irradiates the alignment film formed on the film Orientation by light; a pattern retardation film forming portion which forms a liquid crystal coating layer on the upper portion of the alignment film, and then forms a pattern retardation film by irradiating light. 12/26 PI11DRA011TW" 01100824 201229582 The first reel 7 and the second reel 9 of the feeding portion 11 are preferably arranged to be driven by a power transmission member (not shown) such as a belt or a key, and the like. The connection is shown so that the driving force can be transmitted and the lamp is rotated. Further, a plurality of guide rolls (not shown) for maintaining tension and a stable film load can be provided, and a plurality of accumulators (~0Γ, not shown) which control the conveyance amount of the film by the process . Further, the film 5 of the "oriented film" is preferably moved in a normal roll-to-roll manner. The formation of the alignment film can also be achieved in the process of the orientation alignment by the alignment film formation portion. The alignment film can also be formed on the film by another alignment film formation step depending on the case. In addition, "the drying film formed by the alignment film forming portion is cured as needed, and a general drying device can be used." The pattern retardation film forming portion 3 includes the mixed solution applying portion 31, the mixed solution drying portion 3 3, and the hardening. Department 3 5. Further, in the present invention, a defect inspection portion (not shown) may be included after the pattern retardation film forming portion 3 to perform defect inspection of the pattern retardation film. The defect inspection unit scans the calender sheet or the like to determine a predetermined defect, and displays the determined defect using a marking device such as an ink mark or a bar code mark, or stores the defect information (form, size, position) in the defect. The other storage unit is flexibly used when it is applied to a stereoscopic image display device. In the exposure system used in the photo-alignment portion, in order to minimize the bending and vibration of the continuously traveling film, the film can be brought into close contact with the cylindrical roller as shown in Fig. 7 . 13/26 PI11DRA0I1TW_101100824 201229582 Specifically, the 'exposure system may include: a thin crucible portion that moves the film while being in close contact with the film; and a pattern forming portion that transmits the light irradiated by the light emitting portion to be in close contact with The thin film portion on the abutting portion is formed to form a polarizing pattern on the film portion. Preferably, the film abutting portion is a cylindrical roller 16〇, and the film 5 on which the alignment film is formed is moved while being in close contact with the curved surface of the roller. The pattern forming portion 150 serves to transmit light irradiated by the light-emitting portion toward the rotation axis of the roller. The pattern forming portion includes the polarizing filter according to the present invention, and the distance between the curved surface of the polarizing filter provided on the pattern forming portion 15 and the curved surface of the roller 160 is maintained constant (ΑΑ'=ΒΒ,=(: <^) The distance between the curved surface of the polarizing light-receiving sheet provided on the pattern forming portion 150 and the pupil surface of the parent side is maintained at 5 〇 15 〇, preferably at 50 1 1 ΟΟ μη 〇 and The pattern forming portion 150 only needs to be located at a portion where the pattern can be formed, and can be located at the inlet portion, the center portion, the outlet portion, and the like of the roller without particular limitation. Further, the pattern forming portion preferably includes a polarizing filter for adjusting the polarizing filter. The curved surface is such that the internal air pressure is adjusted. The surface of the roller is preferably subjected to no reflection or no scattering treatment. Moreover, the exposure system of the present invention may further include: the first reflecting portion 120' is reflected from the light emitting portion. The light illuminator condenses and transmits the light reflected by the first reflecting portion, and the second reflecting portion 140 ′ reflects the light transmitted from the concentrator to the pattern forming portion. 14/26 PI I1DRA0MTW_!01100824 201229582 At this time, the pattern forming portion can directly receive the input of the light irradiated by the light-emitting portion, and transmit the light to the portion of the film that is in close contact with the film-contacting portion. The present invention provides a preferred embodiment, but the following embodiments are merely examples of the invention, and those skilled in the art can make various changes and modifications within the scope of the invention and the technical scope of the invention. It is obvious that such changes and modifications are also within the scope of the patent application of the present invention. Embodiment 1 The manufacturing apparatus shown in Fig. 6 transports a cellulose triacetate film through a conveying portion. An acrylate-based alignment liquid was applied onto the film and dried by hot air at 40 ° C for 120 seconds to form an oriented film having a thickness of 1 Å. Thereafter, the polarized ultraviolet ray was irradiated on the alignment film by a 14 mW exposure lamp. Thereby, an alignment film which is oriented in a fixed direction is formed. While the film on which the alignment film is formed is moved, In the photo-alignment portion of the polarizing filter of Fig. 1, a substrate moving at a speed of 4 m/min was continuously irradiated with ultraviolet rays of 20 mW/cm 2 for one second, thereby forming light only through the line grid pattern portion. An alignment film having an orientation direction different from the orientation of the alignment film. After the alignment film is cured, the liquid crystal coating layer is applied to form a composition, and pre-dried at 80 ° C for 20 seconds, after n The coating was dried for 5 seconds under 〇〇c to form a coating layer having a thickness of 15 μΓ. Thereafter, the ultraviolet light was irradiated by a 14 m W exposure lamp for 5 sec seconds, thereby making a light of 11 11 AO 11 TW_101100824 15/26 201229582 Hardened pattern retardation film. The pattern retardation film was produced at a speed of 4 m/min. Example 2 Although the same procedure as in Example 1 was carried out, the difference was that a pattern phase difference film was produced using the non-oriented alignment film and the polarizing filter of Fig. 2 . The production speed of the pattern retardation film was 8 m/min. Example 3 Although the same as in the first embodiment, the difference was that, as shown in Fig. 7, a pattern was produced by using a photo-alignment exposure system while adhering the film to a cylindrical roller. Phase difference film. At this time, the distance between the curved surface of the polarizing filter provided on the pattern forming portion 150 and the curved surface of the parent is maintained at 70 μm. The production speed of the pattern retardation film was 8 m/min. The comparative example was carried out in the same manner as in the first embodiment, but the difference was that, as shown by the circle 5, a pattern in which the light-transmitting region and the light-shielding region were repeatedly formed was formed. The mask 50 is placed on the alignment film, and a polarizer 60 having a region in which polarized light different from each other is passed through is placed on the pattern mask 5, thereby producing a pattern retardation film. The pattern retardation film was produced at a speed of 4 m/min. Experimental Example PI11DRA011TW_10] 100824 16/26 201229582 The optical loss of the method for producing a pattern retardation film of the above-described examples and comparative examples was examined by the following method, and the results are shown in the following Table 1 ° - Optical loss is more than The pattern phase & film produced by the method was placed on a polarizing plate orthogonal to the absorption axis, and an image passing through the polarizing plate and the pattern retardation film was recorded by a microscope (Yi > Eight Society). The brightness of the fixed area of the recorded image was measured using a digital image analysis program. At this time, the recorded image is as shown in the following figure (left side - comparative example, right side - embodiment 1), and the portion where light leakage occurs is indicated by the surface shape or the line shape (interval between the patterns). In the recorded image described below, the zero-color portion is in a state in which the orientation is formed well, and the portion in which the color is blurred is a portion which is double-oriented by the diffraction phenomenon and whose orientation direction is not clear. In this case, the comparative example is an example in which a pattern is formed in the up-and-down direction, and the first embodiment is a pattern in which a pattern is formed in a direction from the upper right portion toward the lower left portion.

實施例的圖案之間的分界部狹窄且鮮明，而比較例的 例。 圖案之間的分界部較寬’因此可以確認到圖案相位差旗的 精度被降低。 PI 11 DR AO 11 TW_ 101100824 17/26 201229582 若亮度為0則圖像為完全黑色，且視為光損失為〇%， 若受度為100則圖像為完全白色，且視為光損失為1〇〇%。 【表1】 區分 實施例1 實施例2 實施例3 比較例 光損失（％) 3 3 15 生產速度（m/min ) 4 8 8 4 如上表所示，可以確認到，根據本發明的實施例i〜 實施例3在顯示出與比較例同等以上的生產速度的同時， 且光損失顯著地降低。 【圖式簡單說明】 圖1表示本發明的偏光濾光片。 圖2表示本發明的偏光濾光片。 圖3表示根據本發明而位於取向膜上的偏光濾光片的一個 示例。 圖4表示根據本發明而位於取向膜上的偏光濾光片的一個 示例。 圖5表示根據比較例（韓國特許公開第2010_0089782號專 利）而位於取向膜上的遮罩及偏光鏡。 圖6表示根據本發明的一個示例的圖案相位差膜的製造裝 置的結構。 圖7表示根據本發明的一個示例的曝光系統的結構。 PI11DRA011TW_10,,00824 18/26 201229582 【主要元件符號說明】 I :光取向部 3 :圖案相位差膜形成部 5:形成有取向膜的薄膜 7 :第一捲筒 9 :第二捲筒 II :輸送部 13 :光源 20 :偏光濾光片 21 :遮光部 22 :線柵格圖案部 23 :第一遮光部 24 :第一線柵格圖案部 25 :第二遮光部 26 :第二線柵格圖案部 3 1 :混合溶液塗布部 33 :混合溶液乾燥部 35 :硬化部 40 :第一偏光濾光部 41 :第二偏光濾光部 50 :圖案遮罩 60 :偏光板 110 :光源 120 :第一反射部 130 :聚光器 140 :第二反射部 150 :圖案形成部 160 :輥 PI11DRA011TW 101100824 19/26The boundary between the patterns of the examples was narrow and sharp, and the examples of the comparative examples. The boundary between the patterns is wider' so that it can be confirmed that the accuracy of the pattern phase difference flag is lowered. PI 11 DR AO 11 TW_ 101100824 17/26 201229582 If the brightness is 0, the image is completely black and the light loss is 〇%. If the degree is 100, the image is completely white and the light loss is 1 〇〇%. [Table 1] Differentiating Example 1 Example 2 Example 3 Comparative Example Optical Loss (%) 3 3 15 Production Speed (m/min) 4 8 8 4 As shown in the above table, it can be confirmed that the embodiment according to the present invention i to Example 3 showed a production speed equal to or higher than that of the comparative example, and the light loss was remarkably lowered. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 shows a polarizing filter of the present invention. Fig. 2 shows a polarizing filter of the present invention. Fig. 3 shows an example of a polarizing filter which is positioned on an alignment film according to the present invention. Fig. 4 shows an example of a polarizing filter located on an alignment film according to the present invention. Fig. 5 shows a mask and a polarizer which are positioned on an alignment film according to a comparative example (Korean Patent Publication No. 2010_0089782). Fig. 6 shows the structure of a manufacturing apparatus of a pattern retardation film according to an example of the present invention. Fig. 7 shows the structure of an exposure system according to an example of the present invention. PI11DRA011TW_10,,00824 18/26 201229582 [Description of main component symbols] I: photo-alignment portion 3: pattern retardation film forming portion 5: film 7 having an alignment film formed: first reel 9: second reel II: transport Part 13 : Light source 20 : Polarizing filter 21 : Light blocking portion 22 : Line grid pattern portion 23 : First light blocking portion 24 : First line grid pattern portion 25 : Second light blocking portion 26 : Second line grid pattern Part 3 1 : Mixed solution application unit 33 : Mixed solution drying unit 35 : Hardened portion 40 : First polarizing filter portion 41 : Second polarizing filter portion 50 : Pattern mask 60 : Polarizing plate 110 : Light source 120 : First Reflecting portion 130: concentrator 140: second reflecting portion 150: pattern forming portion 160: roller PI11DRA011TW 101100824 19/26

Claims (1)

201229582 七、申請專利範圍： 1. 一種圖案相位差膜的製造方法，其特徵在於， 包含光取向步驟，在所述光取向步驟中， 將反覆形成有遮光部和線柵格圖案部的偏光濾光片 置於取向臈的上部， 並且從所述偏光渡光片的上部照射光從而進行取 向。 2. 如申清專利範圍第！項所述的圖案相位差膜的製造方 法，其特徵在於， 所述取向膜為在固定方向上被取向的膜。 3. 如申請專利範圍第2項所述的圖案相位差膜的製造方 法，其特徵在於， 包含在與所述取向膜的取向方向不同的方向上進行 取向的光取向步驟。 4. 如申請專利範圍第！項所述的圖案相位差膜的製造方 法，其特徵在於， 所述線柵格圖案部的形狀為直線。 5· —種圖案相位差膜的製造方法，其特徵在於， 包含光取向步驟，在所述光取向步驟中， 將包括第-偏光遽光部和第二偏光滤光部的偏光滤 光片置於取向膜的上部，其中，所述第一偏光濾光部上 反覆形成有第-遮光部和第一線柵格圖案部，所述第二 偏光濾光部上反覆形成有第二遮光部、和與第一線柵格 圖案部的圖案方向不同的第二線柵格圖案部， 20/26 PII1DRA0IITW_101100824 201229582 並且從所述偏光濾光片的上部照射光從而進行取 向。 6. 如申請專利範圍第5項所述的圖案相位差膜的製造方 法，其特徵在於， 所述偏光濾光片被形成為，第一偏光濾光部的第一 遮光部與第二偏光濾光部的第二線柵格圖案部相鄰 接。 7. 如申請專利範圍第5項所述的圖案相位差膜的製造方 法’其特徵在於， 所述取向膜是無取向的膜。 8. 如申請專利範圍帛5項所述的圖案相位差膜的製造方 法，其特徵在於， 所述第一線柵格圖案部及第二線柵格圖案部的形狀 分別為直線。 9·如中請專利範圍第丨項或第5項所述的圖案相位差膜 的製造方法，其特徵在於， 還包含在被光取向後的取向膜上形成液晶塗布層的 步驟。 :。月專利範圍第！項或第5項所述的圖案相位差膜 的製造方法，其特徵在於， 所述光取向步驟通過曝光系統來實現，所述曝光系 ::括·薄膜緊貼部’薄膜在緊貼所述緊貼部的同時 行移動’圖案形成部，其將由發光部所照射的光傳 至緊貼在所述薄膜緊貼部上的薄膜部分上，從而在 所述薄膜部分上形成偏光圖案。 21/26 PniDRA〇UTWj〇]1〇〇824 201229582 •. ; 11 ·如申°月專利&圍帛1G項所述的圖案相位差膜的製造方 法’其特徵在於， 所述圖案形成部具備偏光濾光片。 12·如申叫專利範圍第u項所述的圖案相位差膜的製造方 法，其特徵在於， 所述圖案形成部上所具備的偏光濾光片的曲面和輥 曲面之間的距離在50〜15〇μιη的範圍内維持固定。 22/26 PI11DRA0UTW 101100824201229582 VII. Patent Application Range: 1. A method for producing a pattern retardation film, comprising: a photo-alignment step in which a polarizing filter having a light-shielding portion and a line grid pattern portion is repeatedly formed The light sheet is placed on the upper portion of the orientation crucible, and light is irradiated from the upper portion of the polarizing light-receiving sheet to be oriented. 2. If the scope of patents is clear! The method for producing a pattern retardation film according to the invention, characterized in that the alignment film is a film oriented in a fixed direction. 3. The method of producing a pattern retardation film according to claim 2, comprising a photo-alignment step of orienting in a direction different from an orientation direction of the alignment film. 4. If you apply for a patent scope! The method for producing a pattern retardation film according to the invention, wherein the shape of the line grid pattern portion is a straight line. A method for producing a pattern retardation film, comprising: a photo-alignment step in which a polarizing filter including a first-polarized light-emitting portion and a second polarizing filter portion is placed In the upper portion of the alignment film, the first polarizing filter portion is repeatedly formed with a first light blocking portion and a first line grid pattern portion, and the second polarizing filter portion is repeatedly formed with a second light blocking portion. And a second line grid pattern portion different from the pattern direction of the first line grid pattern portion, 20/26 PII1DRA0IITW_101100824 201229582, and the light is irradiated from the upper portion of the polarizing filter to be oriented. 6. The method of manufacturing a pattern retardation film according to claim 5, wherein the polarizing filter is formed as a first light blocking portion and a second polarizing filter of the first polarizing filter portion. The second line grid pattern portion of the light portion is adjacent to each other. 7. The method of producing a pattern retardation film according to claim 5, wherein the alignment film is a non-oriented film. 8. The method of producing a pattern retardation film according to claim 5, wherein the shapes of the first line grid pattern portion and the second line grid pattern portion are straight lines, respectively. The method for producing a pattern retardation film according to the invention of claim 5, further comprising the step of forming a liquid crystal coating layer on the alignment film after photo-alignment. :. Monthly patent range! The method for producing a pattern retardation film according to Item 5, wherein the photo-alignment step is carried out by an exposure system: the film-contacting film is adhered to the film Simultaneously moving the abutting portion moves the pattern forming portion which transmits the light irradiated by the light emitting portion to the film portion which is in close contact with the film abutting portion, thereby forming a polarizing pattern on the film portion. 21/26 PniDRA 〇 W W 〇 〇〇 〇〇 〇〇 〇〇 〇〇 〇〇 〇〇 〇〇 〇〇 〇〇 〇〇 〇〇 〇〇 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案 图案Polarized filter. The method for producing a pattern retardation film according to the invention of claim 5, wherein the distance between the curved surface of the polarizing filter and the curved surface of the roller formed on the pattern forming portion is 50~ The range of 15 〇 μιη remains fixed. 22/26 PI11DRA0UTW 101100824
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