TW201117347A - Multi-chip stack structure - Google Patents

Multi-chip stack structure Download PDF

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TW201117347A
TW201117347A TW098138383A TW98138383A TW201117347A TW 201117347 A TW201117347 A TW 201117347A TW 098138383 A TW098138383 A TW 098138383A TW 98138383 A TW98138383 A TW 98138383A TW 201117347 A TW201117347 A TW 201117347A
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substrate
interposer
stack structure
wafer
disposed
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TW098138383A
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Chinese (zh)
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TWI381512B (en
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Ji-Cheng Lin
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Powertech Technology Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • H01L2224/13001Core members of the bump connector
    • H01L2224/1302Disposition
    • H01L2224/13025Disposition the bump connector being disposed on a via connection of the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16135Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/16145Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • H01L2224/16146Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked the bump connector connecting to a via connection in the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/16227Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73253Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19107Disposition of discrete passive components off-chip wires
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping

Abstract

A multi-chip stack structure is disclosed herein. The present invention includes a substrate, a plurality of memory chips, an interposer substrate, a logic chip and a plurality of wires. Those memory chips are stacked on the substrate and electrically connects to the upper surface of the substrate. The interposer substrate are set on those memory chips, wherein a plurality of first contacts and plurality of second contacts are set on a upper surface of the interposer substrate, and those second contacts are arranged around the edge of the interposer substrate; and a plurality of first bumps are set on the botton surface of the interposer substrate to electrically connect with those memory chips. The logic chip set on the upper surface of the interposer substrate and electrically connected to those first contacts. Those wires utilized to electrically connect those second contacts with the upper surface of the substrate. An interposer substrate is set between the memory chip and the logic chip to reduce the fabrication process and economize the use of the substrate.

Description

201117347 六、發明說明: 【發明所屬之技術領域】 本發明係有關一種多晶片堆疊結構。 【先前技術】201117347 VI. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates to a multi-wafer stack structure. [Prior Art]

馨於料體科技隨著電腦與網路通訊等產品功能急速提昇,因 此必需具備多元化、可攜性與輕薄微小化之需求,使晶片封裝製程業 脫離傳統驗_高神、高密度、輕、薄與微小化等高精密度製程 且隨著微小化以及高運作速度需求的增加,多晶片封裝構裝在 I夕電子裝置越來越常見。多晶片構造可藉由將兩個或兩個以上之晶 合在f—缝結構中,來«統運作速度之_最小化。 立體式封裝目前大致有兩種方式,分別是封裝上缝(pa «package ’ PoP)以及封裝内封裝办冰嗯匕化咖明,pip)。州 二種很典型的3D封襄,係將兩侧蜀立的封裝體經封裝與測試擬 ΓίΓ麟方式疊合,可減少製程風險,進而提高產品時。然而’ 不节人兩侧立_裝體加輯疊,因此堆疊後的封裝厚度己 不符合現今產品輕薄短小之趨勢。 到尺寸進仃二維空間垂直整合之技術已被提出,以達 垂吉離2Fs取彳:效益。與現有平面的晶片整合有解同,三維空間 時間均較構,_賴嶋度及延遲 耗。惟,同時提升^效能並降低晶片功 合時,因輸入輸出佈線設計大不相同,故整 【發明内容】 201117347 為了解決上述問題,本發明目的之一係提供一種多晶片堆疊 結構,利用在記憶體晶片與邏輯晶片中間設置中介基板來簡 化製程複雜度並節省基板成本。 本發明目的之一係提供一種多晶片堆疊結構包括:一基板; 複數記憶體晶片設置於基板上並與基板上表面電性連接;一 中介基板設置於記憶體晶片上方,其中複數第一接點與複數 第二接點設置於中介基板一上表面,且第二接點係位於中介 基板之週緣;及複數第一凸塊設置於中介基板一下表面,且 第一凸塊係與記憶體晶片電性連接;一邏輯晶片設置於中介 • 基板之上表面並與第一接點電性連接;以及,複數金線係用 以電性連接中介基板的第二接點與基板上表面。 以下藉由具體實施例配合所附的圖式詳加說明,當更容 易瞭解本發明之目的、技術内容、特點及其所達成之功效。 【實施方式】 其詳細說明如下,所述較佳實施例僅做一說明非用以限 定本發明。 • 請參考圖1,圖1為本發明一實施例之一種多晶片堆疊結 構之示意圖。如圖所示,多晶片封裝結構包括:一基板10、 複數記憶體晶片20、一中介基板30、一邏輯晶片40與複數 條金線50。如圖所示,記憶體晶片20係堆疊設置於基板10 上並與基板10的上表面11電性連接。中介基板30,例如石夕 材質所構成,設置於記憶體晶片20上方,其中中介基板30 含有複數第一接點32與複數第二接點34設置於其一上表面 31,且第二接點34係位於中介基板30之週緣。以及複數第 一凸塊36設置於中介基板30之一下表面35,且第一凸塊36 係與設置於其下之記憶體晶片20電性連接。邏輯晶片40設 201117347 置於中介基板30之上表面31並與第一接點32電性連接。以 及複數金線50用以電性連接中介基板30的第二接點34與基 板10上表面11。其中中介基板30的使用可改善因為記憶體 -晶片20與邏輯晶片40的輸入/輸出佈線設計(I/Olayout)與 功能的不同所產生的複雜製程。 接續上述,請參考圖2 ’於此實施例中’邏輯晶片40設 置於多晶片堆疊結構最上方有利於散熱管理,故本發明一實 施例中更包括一散熱片60設置於邏輯晶片40上以加強散 熱,更者,將邏輯晶片40設置於多晶片堆疊結構最上方亦可 φ 降低下方基板10設計的複雜度,進而降低基板成本。接續參 考圖2,此結構中更包括複數銲球70設置於基板10的下表 面13以構裝於外界裝置上。 繼續參考圖1,於一實施例中,記憶體晶片20係利用複數矽 通孔結構22相互電性連接。且如圖1所示’更可包括複數第二凸瑰 26設置於矽通孔結構22下,使得位於上方的記憶體晶片2〇藉由第二 凸塊26與位於下方之記憶體晶片20的矽通孔結構22電性連接。此 外,中介基板30的第一凸塊36與設置於其下之記憶體晶片2〇也是 利用矽通孔結構22電性連接。利用矽通孔結構作為電性連接的橋標 φ 可減少打線堆疊的空間以縮小多晶片堆疊結構的尺寸。於一實施例 中,如圖1所示’複數銲球42設置於邏輯晶片40下方,用 以電性連接邏輯晶片40與中介基板30上的第一接點32。邏 輯晶片40利用録球42的方式、結構與中介基板3 〇電性連 接,可改善因熱膨脹係數不同而可能產生的翹曲問題。 於又一實施例中,如圖3A所示,多晶片封裝結構更包括 '一封裝膠體80包覆基板丨〇的上表面11、記憶體晶片2〇、中 介基板30、邏輯晶片40與金線50。於再一實施例中,如圖 3B所示,其中封裝膠體80曝露部分邏輯晶片4〇,例如邏輯 晶片40的上表面41 ’且一散熱片62設置於封裝膠體上With the rapid improvement of functions such as computer and network communication, it is necessary to have the needs of diversification, portability and lightness and miniaturization, so that the chip packaging process industry is out of the traditional test_高神, high density, light High-precision processes such as thinness and miniaturization, and with the increasing demand for miniaturization and high operating speeds, multi-chip package structures are becoming more and more common. The multi-wafer construction can be minimized by combining two or more crystals in the f-slit structure. There are roughly two ways to install a three-dimensional package, namely the package upper seam (pa «package ’ PoP) and the package package bing 匕 咖 咖 咖, pip). The state's two typical 3D seals are designed to be packaged and tested on both sides to reduce process risk and increase product time. However, the combination of the two sides of the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The technology of vertical integration into the two-dimensional space has been proposed to achieve the benefits of 2Fs. The integration with the existing planar wafers has the same solution, and the three-dimensional space is relatively time-dependent, _ 嶋 嶋 and delay consumption. However, when the power efficiency is improved and the wafer work is reduced, the input/output wiring design is greatly different. Therefore, in order to solve the above problems, one of the objects of the present invention is to provide a multi-wafer stack structure, which is utilized in memory. An interposer is placed between the bulk wafer and the logic wafer to simplify process complexity and save substrate cost. An object of the present invention is to provide a multi-wafer stack structure comprising: a substrate; a plurality of memory chips disposed on the substrate and electrically connected to the upper surface of the substrate; an interposer substrate disposed above the memory wafer, wherein the plurality of first contacts And the plurality of second contacts are disposed on an upper surface of the interposer, and the second contacts are located on the periphery of the interposer; and the plurality of first bumps are disposed on the lower surface of the interposer, and the first bumps and the memory pads are electrically The logic chip is disposed on the upper surface of the substrate and electrically connected to the first contact; and the plurality of gold wires are used to electrically connect the second contact of the interposer with the upper surface of the substrate. The purpose, technical contents, features and effects achieved by the present invention will be more readily understood from the following detailed description of the embodiments. [Embodiment] The detailed description is as follows, and the preferred embodiment is not intended to limit the invention. Please refer to FIG. 1. FIG. 1 is a schematic diagram of a multi-wafer stack structure according to an embodiment of the present invention. As shown, the multi-chip package structure includes a substrate 10, a plurality of memory chips 20, an interposer substrate 30, a logic wafer 40, and a plurality of gold lines 50. As shown, the memory chips 20 are stacked on the substrate 10 and electrically connected to the upper surface 11 of the substrate 10. The interposer substrate 30, for example, is formed on the memory chip 20, wherein the interposer substrate 30 includes a plurality of first contacts 32 and a plurality of second contacts 34 disposed on an upper surface 31 thereof, and the second contacts The 34 series is located on the periphery of the interposer substrate 30. The plurality of first bumps 36 are disposed on a lower surface 35 of the interposer substrate 30, and the first bumps 36 are electrically connected to the memory chip 20 disposed therebelow. The logic chip 40 is placed on the upper surface 31 of the interposer substrate 30 and electrically connected to the first contact 32. The plurality of gold wires 50 are electrically connected to the second contact 34 of the interposer substrate 30 and the upper surface 11 of the substrate 10. The use of the interposer substrate 30 can improve the complicated process resulting from the difference in the input/output wiring design (I/Olayout) of the memory-wafer 20 and the logic chip 40. Continuing the above, please refer to FIG. 2 'In this embodiment, the logic chip 40 is disposed at the top of the multi-wafer stack structure to facilitate heat dissipation management. Therefore, an embodiment of the present invention further includes a heat sink 60 disposed on the logic chip 40. The heat dissipation is enhanced. Further, the logic wafer 40 is disposed at the top of the multi-wafer stack structure to reduce the complexity of the design of the lower substrate 10, thereby reducing the substrate cost. Referring to Figure 2, the structure further includes a plurality of solder balls 70 disposed on the lower surface 13 of the substrate 10 for mounting on an external device. With continued reference to FIG. 1, in one embodiment, the memory chips 20 are electrically connected to each other using a plurality of turns via structures 22. As shown in FIG. 1 , a plurality of second protrusions 26 may be disposed under the via hole structure 22 such that the memory chip 2 located above is supported by the second bump 26 and the memory chip 20 located below. The through-hole structure 22 is electrically connected. In addition, the first bumps 36 of the interposer substrate 30 and the memory chip 2's disposed underneath are also electrically connected by the via via structure 22. Utilizing the via structure as the bridge of the electrical connection φ can reduce the space of the wire stacking to reduce the size of the multi-wafer stack structure. In one embodiment, as shown in FIG. 1, a plurality of solder balls 42 are disposed under the logic wafer 40 for electrically connecting the logic wafer 40 with the first contact 32 on the interposer substrate 30. The logic wafer 40 is electrically connected to the interposer 3 by the manner and structure of the recording ball 42, and the warpage problem which may occur due to the difference in thermal expansion coefficient can be improved. In another embodiment, as shown in FIG. 3A, the multi-chip package structure further includes an upper surface 11 of the package substrate 80, the memory chip 2, the interposer substrate 30, the logic wafer 40, and the gold line. 50. In still another embodiment, as shown in FIG. 3B, the encapsulant 80 exposes a portion of the logic die 4, such as the upper surface 41' of the logic die 40, and a heat sink 62 is disposed on the encapsulant.

r C 201117347 並貼附曝露出的部份邏輯晶片40,如邏輯晶片40的上表面 41,以加強散熱功能。於另一實施例中,如圖3C所示,多 晶片堆疊封裝更包括一底膠90填充於基板10與記憶體晶片 20之間、記憶體晶片20與記憶體晶片20之間、與中介基板 30與記憶體晶片20之間。於又一實施例中,請參考圖3D, 在堆疊各記憶體晶片20時,亦可直接利用矽通孔結構22作 為電性連接的橋樑,不需設置凸塊。 依據上述,本發明特徵之一係將邏輯晶片設置於多晶片 堆疊結構的最上方以加強散熱功能。此外,邏輯晶片利用複 數銲球與令介基板上的第一接點電性連接,可改善中介基板 與邏輯晶片因熱膨脹係數不同而可能產生的翹曲、電性接合 不良的問題。更者,將邏輯晶片設置於中介基板上,可在中 介基板上針對不同的邏輯晶片的輸入輸出佈線設計重新佈 線,製程上相當彈性。再來,中介基板與複數堆疊的記憶體 晶片皆可使用矽通孔結構相互電性連接,亦可有效改善多晶片堆疊 封裝後的厚度。 綜合上述,本發明利用在記憶體晶片與邏輯晶片中間設 置中介基板來簡化製程複雜度並節省基板成本。 以上所述之實施例僅係為說明本發明之技術思想及特 點,其目的在使熟習此項技藝之人士能夠瞭解本發明之内容 並據以實施,當不能以之限定本發明之專利範圍,即大凡依 本發明所揭示之精神所作之均等變化或修飾,仍應涵蓋在本 發明之專利範圍内。 201117347 【圖式簡單說明】 圖1為本發明一實施例之多晶片堆疊結構之剖視圖。 圖2為本發明又一實施例之多晶片堆疊結構之剖視圖。 圖3A、圖B、圖3C、圖3D為本發明不同實施例多晶片堆疊結構 之剖視圖。 【要元件符號說明】r C 201117347 and a portion of the exposed logic die 40, such as the upper surface 41 of the logic die 40, is attached to enhance the heat dissipation function. In another embodiment, as shown in FIG. 3C, the multi-wafer stack package further includes a primer 90 filled between the substrate 10 and the memory wafer 20, between the memory chip 20 and the memory wafer 20, and an interposer substrate. 30 is between the memory chip 20. In another embodiment, referring to FIG. 3D, when stacking the memory chips 20, the through-hole structure 22 can also be directly used as a bridge for electrical connection without providing bumps. In accordance with the above, one of the features of the present invention is to place a logic die at the top of the multi-wafer stack structure to enhance the heat dissipation function. In addition, the logic wafer is electrically connected to the first contact on the substrate by the plurality of solder balls, thereby improving the problem of warpage and electrical joint failure which may occur due to the difference in thermal expansion coefficient between the interposer substrate and the logic chip. Moreover, the logic chip is disposed on the interposer substrate, and the input and output wiring design of the different logic chips can be re-wired on the intermediate substrate, which is quite flexible in the process. Furthermore, the interposer substrate and the plurality of stacked memory chips can be electrically connected to each other using a via via structure, and the thickness of the multi-wafer stack package can be effectively improved. In summary, the present invention utilizes an interposer between the memory chip and the logic die to simplify process complexity and save substrate cost. The embodiments described above are merely illustrative of the technical spirit and the features of the present invention, and the objects of the present invention can be understood by those skilled in the art, and the scope of the present invention cannot be limited thereto. That is, the equivalent variations or modifications made by the spirit of the present invention should still be included in the scope of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view showing a multi-wafer stack structure according to an embodiment of the present invention. 2 is a cross-sectional view showing a multi-wafer stack structure according to still another embodiment of the present invention. 3A, B, 3C, and 3D are cross-sectional views showing a multi-wafer stack structure in accordance with various embodiments of the present invention. [Requires symbol description]

10 基板 11,31,41 上表面 13,35 下表面 20 記憶體晶片 22 石夕通孔結構 26,36 凸塊 30 中介基板 32 第一接點 34 第二接點 40 邏輯晶片 42, 70 鲜·球 50 金線 60, 62 散熱片 80 封裝膠體 90 底膠 810 Substrate 11, 31, 41 Upper surface 13, 35 Lower surface 20 Memory chip 22 Stone-to-ear hole structure 26, 36 Bump 30 Interposer 32 First contact 34 Second contact 40 Logic wafer 42, 70 Ball 50 Gold wire 60, 62 Heat sink 80 Encapsulant 90 Primer 8

Claims (1)

201117347 七、申請專利範圍: L 一種多晶片堆疊結構,包含: 一基板; 複數記憶體晶片’堆疊設置於絲板上並與該基板 連接; 一中介基板’設置於該些記憶體晶片上方,其中 複數第-接點與複數第三接點,設置於該中介基板一上表 面,且該些第二接點係位於該中介基板之週 複數第-凸塊,設置於該中介基板_下表面,且該些第_ 凸塊係與該些記憶體晶片電性連接; 電性2輯=,設置於該巾介基板之社絲並與該些第一接點 板上=金線’係用以電性連接該中介基板的該些第二接點與該基 2·如請求項i所述之多晶片堆疊結構,其中該些 數石夕通孔結構相互電性連接。 ·⑹阳片係複 4. 3.=請求項2所述之多晶片堆疊結構,更包含複數第二凸塊設置於該 =石夕通孔結構下,使得位於上方的該記紐晶片藉由該些第二凸塊 ,、位於下方之航憶體晶片的該㈣通孔結構電性連接。 如請求項2職之多以轉、轉,其巾射 凸塊係與設置於其下之該記憶體晶片的該些石夕 ^性雜第 片下方,用以電性連接該邏輯晶片與該中介基板嫌 6· ==1所述之多晶片堆疊結構,更包含複數銲球設置於該基板 7. 項1所述之多晶片堆疊結構,更包含一散熱片設置於該邏輯 8.如請求項1所述之多晶片堆疊結構,更包含 上表面、該些記憶體晶片、該中介基板與該邏輯晶片Ί以土 201117347 9. 如請求項7所述之多晶片堆疊結構,其中該封裝膠體曝露部分該邏 輯晶片,且一散熱片設置於該封裝膠體上並貼附曝露出的部份該邏 輯晶片。 10. 如請求項1所述之多晶片堆疊結構,更包含一底膠填充於該基板與 該些記憶體晶片之間、該些記憶體晶片之間'與該中介基板與該記 憶體晶片之間。201117347 VII. Patent Application Range: L A multi-wafer stack structure comprising: a substrate; a plurality of memory chips are stacked on the wire board and connected to the substrate; and an interposer substrate is disposed above the memory chips, wherein a plurality of first contacts and a plurality of third contacts are disposed on an upper surface of the interposer, and the second contacts are located on the periphery of the interposer, and are disposed on the lower surface of the interposer. And the first _ bumps are electrically connected to the memory chips; the electrical slab = the social filaments disposed on the towel substrate and the first contact plates = gold wire The plurality of wafer contacts electrically connected to the interposer substrate and the multi-wafer stack structure as described in claim i, wherein the plurality of diametrical via structures are electrically connected to each other. The multi-wafer stack structure described in claim 2, further comprising a plurality of second bumps disposed under the 石 通 通 结构 , , , , , , , , , , , , , , , , , , , , , The second bumps are electrically connected to the (four) via structure of the underlying memory cell wafer. If the request item 2 is used for turning and turning, the towel projection is below the plurality of the memory chips of the memory chip disposed under it, for electrically connecting the logic chip and the The multi-wafer stack structure of the interposer substrate 6·==1, further comprising a plurality of solder balls disposed on the substrate 7. The multi-wafer stack structure described in Item 1 further includes a heat sink disposed on the logic 8. The multi-wafer stack structure of item 1, further comprising an upper surface, the memory wafers, the interposer substrate and the logic wafer, the earth wafer 201117347. The multi-wafer stack structure according to claim 7, wherein the encapsulant A portion of the logic chip is exposed, and a heat sink is disposed on the encapsulant and attached to the exposed portion of the logic chip. 10. The multi-wafer stack structure of claim 1, further comprising a primer filled between the substrate and the memory chips, between the memory chips, and the interposer and the memory chip. between.
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Publication number Priority date Publication date Assignee Title
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