200847451 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種晶片鍍膜系統，特別是關於一種薄膜太陽 能電池之晶片鑛膜系統。 【先前技術】 工業革命的展開，促使人類生活方式發生改變，地球上各項 資源因被大量開採而急遽減少，有部分資源經轉化後，卻產生種 ^ 種污染問題，形成地球環境無形的殺手，甚而引發種種氣候異常 現象’因此’各種減少使用後污染的替代性能源便應運發展。 太陽能因其用之不盡、取之不竭的特性，而成為注目的替代 性能源來源，太陽能電池的發展可回溯至1954年，當時由貝爾實 驗室所發展的太陽能電池係希望能提供偏遠地區供電系統所需之 能源，但當時的太陽能電池卻只有6%之光電效率；目前太陽能電 池的研發大致可分為：1·單晶石夕、2·多晶石夕、3·非晶石夕、4·銅銦鎵 二硒（Copper Indium Gallium Diselenide Solar Cells)、5·鎘碲 (Cadmium Telluride Solar Cells) ’隨著積體電路的蓬勃發展，矽 L)晶圓太陽能電池一躍成為市場主流，目前實驗室規模所製造之矽 晶圓單一系統電池已可達25%之光電效率。 目剷發晶太1%能電池製造廠商亦稱太陽能電池為晶片（⑶叫， 因太陽能電池係由多個晶片焊上箔條導線(焊帶），再將許多焊好的 晶片用箱條串聯成組，再和乙烯-乙酸乙醋共聚物(Ethylene vinly acetate copolymer ^ EVA) > ^a6#*^(Tedlar)^^f 紋玻璃(白玻璃)層層疊疊，同放入層壓機(Laminate)的機台上做真 空封裝，製成-太陽能模組（亦稱太陽能板），將若干太陽能板組 成方陣(array)，接配上過充放保護控制器(c〇ntr〇uer)及深(循環)放 5 200847451 電蓄電池(網)以及逆觀流器即成為太陽能電力系統。 柱德現ίίΐί電池之製祕由純化之二氧切在拉晶爐長成晶 毫乎之。角ΐ為四方柱形，該日日日柱以切片機_成厚度。.4-0.5 片再以化學方法或拋光成為約G·3毫米之薄片， I T1 _ 片後，以擴散爐將該薄片兩面分別鍍膜形成n型 以光列及顯電路路線，即可成為—商細晶片，此外亦可 雷路式製造抗反㈣與表_輸㈣線取代前述之 量轉換功率1，並加以其他特殊技術，便可提高太陽能電池之能 Ο Ο 民^465120專利公告號，專利名稱「太陽能薄膜電池 τΊ t i 二 Ϊ供了—種太陽能電池 Cu α (InxGal_x)⑽eyS1_y) 質的薄膜:ΐί，化了一般薄膜生成的程序，並可提供高品 雷極厚、隹=+ 但疋此類晶片為提高供電效率，往往會在晶片之 用形成一條狀串接模式’但所使用之切割法多為利 : 進行不同層面切割，或是利用機械力將鍍膜層劃 一手、，Λ繁雜，也容易產生微細粉塵影響晶片良率。 ㈣iff述’目前湖之習知方式都仍有待改善之處，本發明 改ί ^丨=於上述習知晶片鑛膜塗裝方法的各項缺失，乃虽思 法。'c 1 —難成步驟簡單且祕操作之晶片鍍膜塗裝方 【發明内容】 絲月之ί要目的係提供—種薄膜太陽能電池之鍍膜塗裝系 ίν Γ則見有晶片鑛膜、_之時程；包括：-遮罩，由一中 複數個遮蔽件所組成；及—基板鍍膜塗裝裝置；當在太 535=)顧塗糾，藉由在欲進行鍍膜之—基板上設 立該遮罩關化_太陽能電池晶^程中鍍膜及侧的程序， 200847451 雜序包括下列步驟：步驟Α:將—基板設置於半導 -定位：步驟Β :在該基板上加設一遮蔽物；步驟c D: j 膜涂另Γ目ΐ為提供—種可應用於全真空製程之晶片鍍 真工而Μ、、Λ進行下一道真空製程，該遮罩包括一中空框架；及 設於該框架中空區域上之複數個遮蔽件。 t 其中，該框架可為四邊形。 Ο ϋ 其中，該遮蔽件可為一金屬細弦。 其中，該遮蔽件可為一垂直版金之薄金屬片。 其中，該遮蔽件可為一水平版金之薄金屬片。 其中，該遮敝件可為長條狀。 其中’該遮蔽件可為網狀。 其中，該遮蔽件之切面可為一圓形。 其中，該遮蔽件可為非直線狀。 本發明之又一目的為提供一種薄膜太陽能電池之鍍膜塗裝方 法，该方法係在晶片鍍膜塗裝時，藉由在欲進行鍍膜之一基板上 设立该遮罩以簡化薄膜太陽能電池晶片製程中鑛膜及姓刻的程 序，該程序包括下列步驟： 步驟A:將一基板設置於半導體製程上之一定位； 步驟B:在該基板上加設一遮蔽物； 步驟C ··進行該基板之鍍膜塗裝；及 步驟D:移除該遮蔽物，形成一具有複數個相鄰鍍膜區之 基板。 7 200847451 , 藉由本發明可簡化太陽能電池晶片製作中的鍍膜及蝕刻步 驟’大大簡化了現有之刻劃設備的支出與全程製造的時程，為使 •熟悉該項技藝人士暸解本創作之目的、特徵及功效，茲藉由下述 具體實施例，並配合所附之圖式，對本創作詳加說明，說明如后。 【實施方式】 以下將參照相關圖示，說明依本發明之較佳實施例，說明中 提及之符號係參照圖示符號，為便於理解，相同的元件將以相同 的參照符號加以說明。 c 第一圖為本發明之薄膜太陽能電池鍍膜塗裝用遮罩之實施方 式立體圖’本發明包括一遮罩丨及一基板鍍膜塗裝裝置，盆中該 遮罩1由一中空框架11及複數個遮蔽件12所組成，該框架'u係 由一平板挖空内部所組成，該挖空處可為一四邊形，並架設該遮 蔽件12,該遮蔽件12可為一金屬細弦，利用張力調整 平行排列。 )本發明之薄膜太陽能電池鍍膜塗裝實施方式係利用該遮罩J 調整-基板A上鍍膜之區域，當鍍膜過程進行時，先將該基板A 放置於-基板托盤2上，再將_罩i固定於該基板A上方，使 I 該基板A上受到該遮蔽件12遮擔之區域，便不會產生薄膜，鍛膜 完成後該基板A之薄膜具有如_效果般之區隔，_使該^板 A上具有複數個相鄰之鑛膜區。 本發明有翁難先將_整塊基板賴後，再糊雷射戍機 =方法刻畫不同鑛膜層之繁瑣程序，本發明之太陽能電池鑛膜塗 裝之糸統可將鍍膜及蝕刻程序於同一步驟同時進行，且該遮罩丄 體，與，紐A近似，具有輕巧之伽，可使整體料於全真空 ，不需另行搬移破真空，可減少大氣粉塵附著於該i 扳A之機罕。 8 200847451 第二圖為本發明之薄膜太陽能電池鍍膜塗裝 佳實施例平面圖，本發明之實施方式係先將—遮罩 鍍，塗裝之基板Α上，該遮罩丨係為—四邊形平板狀裝置，中心 挖空成為與該基板A近似之大小區域，該遮罩】之外圍則形成一 ，架1卜雜架可鑲設複數個遮· 12，該敍件12係為長條 狀，另外，該遮蔽件12亦可為非直線形或網狀（未圖示）。 Ο200847451 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD The present invention relates to a wafer coating system, and more particularly to a wafer ore film system for a thin film solar cell. [Prior Art] The development of the industrial revolution has led to changes in the way of life of human beings. The resources on the earth have been drastically reduced due to the massive exploitation. Some of the resources have been transformed, but they have produced pollution problems and formed an invisible killer of the global environment. It has even triggered various climate anomalies. Therefore, various alternative energy sources that reduce post-use pollution will develop. Solar energy has become an attractive alternative source of energy because of its inexhaustible and inexhaustible nature. The development of solar cells dates back to 1954, when solar cells developed by Bell Labs hope to provide remote areas. The energy required for the power supply system, but the solar cell at that time was only 6% of the photoelectric efficiency; the current research and development of solar cells can be roughly divided into: 1 · single crystal stone, 2 · polycrystalline stone eve, 3 · amorphous stone eve 4·Copper Indium Gallium Diselenide Solar Cells and Cadmium Telluride Solar Cells' With the development of integrated circuits, )L) wafer solar cells have become the mainstream in the market. Lab-scale single-system batteries manufactured on a laboratory scale have achieved 25% photovoltaic efficiency. The eye shovel is too 1%. The battery manufacturer also calls the solar cell as a wafer ((3), because the solar cell is made of a plurality of wafers, the foil strips (welding strips) are soldered, and then many soldered wafers are connected in series. In a group, a layer of Ethylene vinly acetate copolymer (EVA) >^a6#*^(Tedlar)^^f grain glass (white glass) is laminated and placed in a laminating machine ( Laminate's machine is vacuum-packed to make a solar module (also known as a solar panel). A number of solar panels are formed into an array, and a charge and discharge protection controller (c〇ntr〇uer) is connected. Deep (circulation) put 5 200847451 Electric battery (net) and counter-current flow device become the solar power system. Plexiglas ίίΐί The secret of the battery is purified by the dioxotomy in the crystal pulling furnace. In the shape of a square prism, the daily column is sliced to a thickness of .4 to 0.5 pieces and then chemically or polished to a sheet of about G·3 mm. After the I T1 _ sheet, the sheet is spread on both sides in a diffusion furnace. The coating film is formed into an n-type light column and an explicit circuit route, which can be used as a thin wafer, and also a lightning path. Manufacturing anti-reverse (four) and table _transmission (four) lines to replace the aforementioned amount of conversion power 1, and other special techniques, can improve the performance of solar cells Ο ^ ^ 465120 Patent Bulletin No., patent name "solar film battery τ Ί ti Ϊ Provided a solar cell Cu α (InxGal_x) (10) eyS1_y) quality film: ΐί, the general film generation process, and can provide high-quality, extremely thick, 隹 = + but such wafers to improve power efficiency, often in the wafer It is used to form a string-connected mode', but the cutting method used is mostly beneficial: cutting at different levels, or using mechanical force to make the coating layer a hand, which is complicated and complicated, and it is easy to produce fine dust to affect the wafer yield. It is said that there are still some areas for improvement in the conventional methods of the lake. The present invention is modified in the above-mentioned conventional wafer coating method, but it is a method of thinking. 'c 1 - difficult steps are simple And the wafer coating coating method of the secret operation [invention content] The purpose of the silk moon is to provide a film coating system for the thin film solar cell ίν Γ see the wafer film, _ time course; - a mask consisting of a plurality of shielding members; and - a substrate coating coating device; when the coating is performed at 535 =), the mask is set on the substrate to be coated - solar energy Procedure for coating and side of the cell crystal, 200847451 The sequence includes the following steps: Step Α: Place the substrate in the semi-conducting-positioning: step Β: add a mask on the substrate; step c D: j film Another method is to provide a wafer plating process that can be applied to a full vacuum process, and the next vacuum process is performed, the mask includes a hollow frame; and a plurality of frames disposed on the hollow region of the frame Covering piece. t where the frame can be quadrilateral. Ο ϋ wherein the shielding member can be a metal string. Wherein, the shielding member can be a thin metal sheet of vertical plate. Wherein, the shielding member can be a thin metal sheet of a horizontal plate. Wherein, the concealer can be elongated. Wherein the shield can be meshed. Wherein, the cutting surface of the shielding member can be a circular shape. Wherein, the shielding member can be non-linear. It is still another object of the present invention to provide a coating method for a thin film solar cell, which is to simplify the process of a thin film solar cell wafer by applying the mask on one of the substrates to be coated during wafer coating. a procedure for depositing a film and a surname, the program comprising the following steps: Step A: positioning a substrate on one of the semiconductor processes; Step B: adding a mask to the substrate; Step C: performing the substrate Coating coating; and step D: removing the mask to form a substrate having a plurality of adjacent coating regions. 7 200847451 , The invention can simplify the coating and etching steps in the fabrication of solar cell wafers by the invention, which greatly simplifies the expenditure of the existing scribing equipment and the time course of the whole manufacturing process, so that the skilled person can understand the purpose of the creation, Features and effects, the present invention will be explained in detail by the following specific embodiments and with the accompanying drawings, as explained later. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In the following, the preferred embodiments of the present invention will be described with reference to the accompanying drawings. c is a perspective view of an embodiment of a mask for coating a thin film solar cell coating according to the present invention. The present invention includes a mask and a substrate coating device. The mask 1 includes a hollow frame 11 and a plurality of The cover member 12 is composed of a flat hollowed out interior, the hollowed out portion may be a quadrilateral shape, and the shielding member 12 is erected, and the shielding member 12 can be a metal thin string, using tension Adjust the parallel arrangement. The thin film solar cell coating coating embodiment of the present invention uses the mask J to adjust the area of the coating on the substrate A. When the coating process is performed, the substrate A is first placed on the substrate tray 2, and then the mask is placed. I is fixed on the substrate A so that the area of the substrate A that is covered by the shielding member 12 does not produce a film, and after the forging film is completed, the film of the substrate A has an interval of _ effect. The plate A has a plurality of adjacent film areas. The invention has the cumbersome procedure of the lining of the whole substrate, and then the method of depicting different mineral film layers, and the coating method of the solar cell ore film coating of the invention can be applied to the coating and etching process. The same step is carried out at the same time, and the mask body is similar to the button A, and has a light weight, so that the whole material can be completely vacuumed, and the vacuum is not required to be moved separately, thereby reducing the adhesion of atmospheric dust to the machine. rare. 8 200847451 The second figure is a plan view of a preferred embodiment of coating and coating of a thin film solar cell according to the present invention. The embodiment of the present invention firstly coats a coated, coated substrate, and the mask is a quadrilateral flat plate. In the device, the central hollowing becomes a size area similar to the substrate A, and the periphery of the mask is formed, and the frame 1 can be provided with a plurality of covers 12, the article 12 is elongated, and the article 12 is elongated The shielding member 12 may also be non-linear or mesh (not shown). Ο
本巧之_太陽能電池鍍膜塗裝實施方式係_該遮罩】 上鍍膜之區域，當鍍膜過程進行時，先將該基板A ，置於-基板托盤2上，再將該遮罩i固定於該基板a上方，使 孩基板A上文到该遮蔽件遮擋之區域，便不會產生薄膜，鑛膜 完成後該5板A之_具有如侧絲般之使該基板 A上具有複數個相鄰之鑛膜區。 第二圖為本發明之薄膜太陽能電池鍍膜塗裝用遮罩之第一較 ^實施例狀態示意圖，本發明係利用一遮蔽件12在欲鑛膜之絲 5形Ϊ:阻擋空間，使鍍膜時，該薄膜6會生長於該遮蔽件 &及文該遮蔽件丨2遮棺之區域，本發明所使用之該遮蔽件 U可為-長條狀金屬細弦，具有一圓形切面，相互平行排列 該基板A上會產生複數個相鄰之鍍膜區。 第四圖為本發明之薄膜太陽能電池鍍職制遮罩之第一較 成圖，利用本發明之太陽能電池賴塗裝裝置係為一 ^^遮罩1具有—方形框架11及複數個遮蔽件12，該遮蔽 主^ ☆t、一直條狀金屬細弦，以張力調整組裝於該框架12，鍍膜 日 ==1固定於絲板A上方，完成鍍膜後之該基板A受到該 *遮擋之區域薄膜無法生成，未受到該遮蔽件12遮播之 品3、’可產生_B，使該基板A上具有複數姉鄰之鍍膜區。 外二本發明之遮罩1由一中空框架11及複數個遮蔽件12 m其中’如第五騎示’說明薄膜太陽能電池賴塗聚用 9 200847451 遮罩之第二較佳實施例圖，該遮蔽件12可為一垂直版金之薄金屬 請參料六® ’說明細太陽能電池鍍膜錄用遮罩之 又實把例圖’其中，該遮蔽件12為一水平版金之薄金屬片。 變 創作具體實施例之詳述’係希望能更加清楚描述本 本創作之i二限Ξ並述具體實施例來對 及具相等性的安排於本創作所欲申㈣$範圍^^各種改_ _ _ solar cell coating coating implementation _ the mask _ the upper coating area, when the coating process is carried out, the substrate A is first placed on the - substrate tray 2, and then the mask i is fixed Above the substrate a, the substrate A is blocked from the shielding member, and no film is formed. After the mineral film is completed, the 5 plate A has a plurality of phases on the substrate A as a side wire. Neighboring membrane area. The second figure is a schematic view of the first embodiment of the mask for coating a thin film solar cell coating according to the present invention. The present invention utilizes a shielding member 12 in the shape of a wire 5 of a desired film: a barrier space for coating The film 6 is grown in the masking member and the area where the shielding member 棺2 is concealed. The shielding member U used in the present invention may be a long strip-shaped metal string having a circular cut surface and mutual Arranging the substrates A in parallel produces a plurality of adjacent coating regions. The fourth figure is a first comparative diagram of the thin film solar cell plating mask of the present invention. The solar cell coating device of the present invention is a mask 1 having a square frame 11 and a plurality of shielding members 12 The shielding main ☆t, the strip-shaped metal string is assembled to the frame 12 by tension adjustment, and the coating day==1 is fixed above the silk plate A, and the substrate A after the coating is subjected to the film of the *blocking region The product 3, which is not covered by the shielding member 12, can generate _B, so that the substrate A has a plurality of coating regions adjacent to each other. The second cover of the present invention comprises a hollow frame 11 and a plurality of shielding members 12 m, wherein 'the fifth riding device' illustrates a second preferred embodiment of the thin film solar cell coating 9 200847451 mask, the shielding member 12 can be a vertical version of the thin metal of gold, please refer to the six ® 'Description of the thin solar cell coating mask." The shield 12 is a horizontal sheet metal thin metal sheet. The details of the specific embodiments are intended to more clearly describe the limitations of the present invention and to describe the specific embodiments and the equivalence of the arrangements in this creation (4) $ range ^^ various changes
200847451 【圖式簡單說明】 、第一圖為本發明之薄膜太陽能電池鍍膜塗裝用遮罩之實施方 式立體圖； 、 佳實第施;r平為面本圓發明之薄膜太陽能電池魏咖 第一較 佳實第施三二=薄膜太陽能電池嫂膜塗裝用遮罩之 第四圖為本發明之薄膜太陽能電池鍍膜塗裝用遮罩之 佳實施例完成圖； ^平乂 〇 你杳第#五圖為本發明之薄臈太陽能電池鍍膜塗裝用遮罩之第二較 隹貫施例圖；及 不平乂 佳實發明之薄臈太陽能電池鍍膜塗裝用遮罩之第三較 【主要元件符號說明】 1遮罩 11框架 12遮蔽件 2基板拖盤 Α基板 B薄臈 11200847451 [Simple description of the drawing], the first figure is a perspective view of the embodiment of the mask for coating and coating of the thin film solar cell of the present invention; The fourth embodiment of the thin film solar cell coating film coating is a complete diagram of the embodiment of the thin film solar cell coating coating for the present invention; ^平乂〇你杳第# Figure 5 is a second comparative example of the mask for coating of thin-film solar cells for coating according to the present invention; and the third component of the mask for coating of thin-film solar cells coated by the company DESCRIPTION OF SYMBOLS 1 Mask 11 Frame 12 Mask 2 Substrate Tray Α Substrate B Thin 11