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Priority claimed from PCT/US2004/038761external-prioritypatent/WO2006054996A1/en
Priority claimed from US11/352,124external-prioritypatent/US20060255315A1/en
Application filed by Honeywell Int IncfiledCriticalHoneywell Int Inc
Publication of TW200731390ApublicationCriticalpatent/TW200731390A/en
Removal chemistry solutions and methods of production thereof are described herein that include at least one fluorine-based constituent, at least one chelating component, surfactant component, oxidizing component or combination thereof, and at least one solvent or solvent mixture. Removal chemistry solutions and methods of production thereof are also described herein that include at least one low H2O content fluorine-based constituent and at least one solvent or solvent mixture.
TW095116492A2004-11-192006-05-10Selective removal chemistries for semiconductor applications, methods of production and uses thereof
TW200731390A
(en)