SU898961A3 - Photographic method of producing screen structures on crtscreens - Google Patents

Photographic method of producing screen structures on crtscreens Download PDF

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Publication number
SU898961A3
SU898961A3 SU721799554A SU1799554A SU898961A3 SU 898961 A3 SU898961 A3 SU 898961A3 SU 721799554 A SU721799554 A SU 721799554A SU 1799554 A SU1799554 A SU 1799554A SU 898961 A3 SU898961 A3 SU 898961A3
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USSR - Soviet Union
Prior art keywords
screen
dots
exposure
mils
film
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SU721799554A
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Russian (ru)
Inventor
Эдит Эллен Маяуд
Самуэль Пирлам
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РКА Корпорейшн
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Publication of SU898961A3 publication Critical patent/SU898961A3/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/22—Applying luminescent coatings
    • H01J9/227—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines
    • H01J9/2271—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines by photographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2045—Exposure; Apparatus therefor using originals with apertures, e.g. stencil exposure masks
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/153—Multiple image producing on single receiver

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

1355308. Luminescent screens RCA CORPORATION 28 June 1972 [28 June 1971] 30260/72 Heading H1D In the manufacture of a black matrix colour television screen wherein hardened dots are formed on the screen in positions where phosphor dots are subsequently to be deposited, the whole screen then being coated with lightabsorbing material and the dots with their overlying coating removed to leave the required matrix, the dots are formed by exposing a photo-resist through apertures in a shadow mask and the exposure is limited to make them smaller than the apertures. The thickness of the photo-resist is important and may be controlled within the range 0À1 to 0À3 mg/cm<SP>2</SP> by adjusting the viscosity within the range 9-30 centipoises at 25‹ C.; the best viscosity is 11-12 cps when maximum size reduction is required, but greater viscosity may be used if the screen is subjected to flood exposure before, during, or after the exposure through the shadow mask. The light source should be smaller than usual and may have an effective diameter of 60-130 mils, preferably 80 mils. The required reduction in diameter of the dots may vary over the screen area, e.g. from 1 mil. at the centre to 3 mils. at the corners, and this may be achieved by providing in the lighthouse used for the exposure process a filter which reduces the light intensity towards the edges.

Description

Изобретение относится к методам нанесения экранов электроннолучевых трубок (ЭЛТ) с матрицей с отрицательным допуском, используемым в известных телевизионных приемниках, 5The invention relates to methods for applying cathode ray tube (CRT) screens with a negative tolerance matrix used in known television receivers, 5

Известны способы нанесения экранов ЭЛТ, в которых используется светопоглощающая матрица. Для экрана с матрицей с положительным допуском выбирают диаметр электронного пятна ю большим, чем гнездо матрицы [1].Known methods for applying CRT screens in which a light-absorbing matrix is used. For a screen with a matrix with positive tolerance, the diameter of the electron spot is chosen to be larger than the matrix slot [1].

Однако такой способ сложен в реализации в промышленных условиях. Поэтому предпочтительнее вначале производить нанесение матрицы и использо-15 вать теневую маску ЭЛТ в качестве фотошаблона.However, this method is difficult to implement in an industrial environment. Therefore, it is preferable to first apply the matrix and use a shadow CRT mask as a photomask.

Наиболее близким к предлагаемому по технической сущности является способ обратной печати. Этот способ 20 заключается в том, что поверхность экрана покрывают пленкой из полимерных материалов, растворимость которых меняется от уровня светового воздействия источника света, экспонируют 25 пленку через отверстия маски, удаляют неэкспонированные участки пленки с помощью растворителя, наносят поливиниловый спирт и затем люминофорное покрытие Г21.Closest to the proposed technical essence is the method of reverse printing. This method 20 consists in covering the surface of the screen with a film of polymeric materials, the solubility of which varies with the level of light exposure to the light source, exposing 25 films through the holes of the mask, removing unexposed portions of the film with a solvent, applying polyvinyl alcohol and then G21 phosphor coating.

При удалении участков полимерной пленки образуется светопоглощающая матрица со множеством гнезд, каждое, из которых'имеет ту же форму, но большие размеры, чем отверстия маски, через которые производилось экспонирование. Для получения экрана с матрицей с отрицательным допуском после окончания этапов фотопроцессов необходимо увеличить отверстия в маске.When sections of the polymer film are removed, a light-absorbing matrix is formed with many nests, each of which has the same shape but larger dimensions than the mask openings through which exposure was performed. To obtain a screen with a matrix with a negative tolerance, it is necessary to increase the holes in the mask after the stages of photoprocesses are completed.

На практике вначале маска изготавливается с отверстиями меньшего размера, а затем, после нанесения люминофорного покрытия, подвергается травлению для увеличения отверстий до заданных размеров. Возможно использование смежных масок и других подобных приемов. Описанный процесс позволяет получить высококачественз 898961 ный экран с матрицей с отрицательным допуском.In practice, at first the mask is made with holes of a smaller size, and then, after applying the phosphor coating, it is etched to increase the holes to a given size. It is possible to use adjacent masks and other similar techniques. The described process allows to obtain a high-quality 898961 screen with a matrix with a negative tolerance.

Однако этот процесс оказывается сложным для контроля качества экранов.However, this process is difficult to control the quality of the screens.

Целью изобретения является упрощение контроля качества экранов в процессе их изготовленияThe aim of the invention is to simplify the quality control of screens in the manufacturing process.

Указанная цель достигается тем, что согласно фотографическому способу нанесения экранных, структур на экраны ЭЛТ, включающему покрытие, поверхности экрана пленкой из светочувствительных полимерных материалов, экспонирование пленки через отверстия маски, удаление неэкранированных участков пленки с помощью растворителя, нанесение поливинилового спирта и затем люминисцентного покрытия, пленку из полимерных материалов наносят по весу до величины 0,1-0,3 мг/см , а экспонирование плёнки производят с недодержкой при чувствительности к печати не более 1,5 и эквивалентном диаметре источника света.1,53,3 мм.This goal is achieved by the fact that according to the photographic method of applying screen structures on CRT screens, including coating, the screen surface with a film of photosensitive polymer materials, exposing the film through the holes of the mask, removing unscreened portions of the film with a solvent, applying polyvinyl alcohol and then a luminescent coating, a film of polymeric materials is applied by weight to a value of 0.1-0.3 mg / cm, and the film is exposed with an underexposure with sensitivity to printing not more than 1.5 and the equivalent diameter of the light source. 1,53,3 mm.

Особенностью предложенного спосоявляется то, что полимерную пленподвергают недодержке в отличие нормальной выдержки или передержПо существу, уменьшается среднее ба ку от ки.A feature of the proposed is that the polymer film is subjected to underexposure, in contrast to normal exposure or overexposure. In essence, the average tank from ki decreases.

время освещения при экспонировании. В результате становится возможным ослабление печати, т,е. получение участков фотослоя, идентичных по форг ме, но меньших по размерам, чем отверстиямаски, которая использовалась при экспонировании. Таким образом, исключается необходимость расширения отверстий или другого изменения маски после проведения этапов фотопроцессов.exposure time during exposure. As a result, weakening of the print becomes possible, i.e., obtaining sections of the photolayer that are identical in form, but smaller in size than the holes of the mask used in the exposure. Thus, the need to expand the holes or other changes in the mask after the stages of photoprocesses is eliminated.

Выбор верхней границы чувствительности к печати обусловлен тем, что при больших величинах изделие получается кромчатым и пятнистым. Целесообразно выбирать наименьшие достижимые величины, определяемые как отношение прозрачности матрицы к уровню светового потока (уровню экспони10The choice of the upper limit of the sensitivity to printing is due to the fact that for large quantities the product is edged and spotted. It is advisable to choose the smallest achievable values, defined as the ratio of the transparency of the matrix to the level of light flux (exposure level10

IS 1 4 рования). Диапазон наиболее оптимальных диаметров источников света определяется тем, что при меньших величинах печать слишком мелкая, время экспонирования требуется большое, и возникают явления дифракции. За верхним пределом диапазона проявляется заметная неоднородность покрытия. Полученный оптимальный диапазон количественного нанесения полимерной пленки связан с компромиссным решением получения оптимальных адгезионных и резистивных характеристик покрытия.IS 1 4 tion). The range of the most optimal diameters of the light sources is determined by the fact that at smaller sizes the print is too small, the exposure time is long, and diffraction phenomena occur. Beyond the upper limit of the range, a noticeable heterogeneity of the coating appears. The obtained optimal range for the quantitative deposition of a polymer film is associated with a compromise solution for obtaining optimal adhesive and resistive characteristics of the coating.

Использование предлагаемого изобретения позволяет более точно контролировать технологические процессы при изготовлении экранов ЭЛТ и,следовательно, их качество, что приводит к увеличению выхода годной продукции.Using the proposed invention allows more precise control of technological processes in the manufacture of CRT screens and, therefore, their quality, which leads to an increase in the yield of products.

Claims (1)

Формула изобретенияClaim Фотографический способ нанесения экранных структур на экраны электроннолучевых трубок,включающий покрытие поверхности экрана пленкой из светочувствительных полимерных материалов, экспонирование пленки через отверстия маски, удаление неэкспонированных участков пленки с помощью растворителя, нанесение поливинилового спирта тия, о что, с чества ления, лов наносят по весу до величины О,ΙΟ,3 мг/см^, а экспонирование пленки производят с недовыдержкой при чувствительности к печати не более 1,5 и эквивалентном диаметре источника света 1 ,5“3,3 мм.A photographic method for applying screen structures to cathode ray tube screens, including coating the surface of the screen with a film of photosensitive polymer materials, exposing the film through the holes of the mask, removing unexposed portions of the film with a solvent, applying polyvinyl alcohol, which, by virtue of laziness, fishing is applied by weight up to the value О, ΙΟ, 3 mg / cm ^, and the film is exposed with a lack of exposure when the sensitivity to printing is not more than 1.5 and the equivalent diameter of the light source is 1.5, 3.3 m . и затем люминесцентного покрытличающийся тем, целью упрощения контроля каэкранов в процессе их изготовпленку из полимерных материаΓΛand then luminescent covering with the aim of simplifying control of the screens in the process of their fabrication from polymer materials ΓΛ
SU721799554A 1971-06-28 1972-06-21 Photographic method of producing screen structures on crtscreens SU898961A3 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15750271A 1971-06-28 1971-06-28

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SU898961A3 true SU898961A3 (en) 1982-01-15

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US (1) US3788846A (en)
JP (1) JPS51421B1 (en)
KR (1) KR780000504B1 (en)
BE (1) BE785499A (en)
CA (1) CA966347A (en)
DE (1) DE2231473C3 (en)
FR (1) FR2143756B1 (en)
GB (1) GB1355308A (en)
IT (1) IT955339B (en)
NL (1) NL179322C (en)
SU (1) SU898961A3 (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
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JPS5137138B2 (en) * 1972-01-26 1976-10-14
US4086090A (en) * 1973-07-25 1978-04-25 Hitachi, Ltd. Formation of pattern using acrylamide-diacetoneacrylamide copolymer
DE2411869C3 (en) * 1974-03-12 1982-07-08 Standard Elektrik Lorenz Ag, 7000 Stuttgart Photochemical system for coating the fluorescent screen of color television tubes
US3993516A (en) * 1974-10-07 1976-11-23 Zenith Radio Corporation Method of controlled etching in the manufacture of a color selection mask for a color cathode ray tube
US3955980A (en) * 1974-11-04 1976-05-11 Zenith Radio Corporation Method for making a color selection mask for a color cathode ray tube
US3998638A (en) * 1975-05-22 1976-12-21 Westinghouse Electric Corporation Method of developing opaquely coated sensitized matrix with a solution containing sodium meta-silicate
US4087280A (en) * 1977-03-17 1978-05-02 Corning Glass Works Method for enhancing the image contrast in color television picture tubes
US4376158A (en) * 1977-05-09 1983-03-08 Keuffel & Esser Company Color-proofing method
US4150990A (en) * 1978-01-10 1979-04-24 Gte Sylvania Incorporated Small phosphor area black matrix fabricating process
US4165396A (en) * 1978-06-19 1979-08-21 Rca Corporation Method for salvaging the light-absorbing matrix and support of a luminescent screen
US4234669A (en) * 1979-03-27 1980-11-18 Rca Corporation CRT Screen structure produced by photographic method
US4408851A (en) * 1982-05-19 1983-10-11 Rca Corporation Photographic method for printing a viewing-screen structure using a light-transmission filter
FR2547950B1 (en) * 1983-06-24 1986-01-31 Videocolor Sa METHOD FOR MANUFACTURING LOW REFLECTANCE COLOR TELEVISION TUBE OF THE SCREEN FOR AMBIENT LIGHT AND TUBE OBTAINED THEREBY
US4517224A (en) * 1983-08-18 1985-05-14 Rca Corporation Method for removing a phosphor layer from a support surface
JPH0618103B2 (en) * 1983-10-31 1994-03-09 ソニー株式会社 Method for producing fluorescent surface of cathode ray tube
JPS6166334A (en) * 1984-09-06 1986-04-05 Sony Corp Manufacture of cathode-ray tube and photosensitive phosphor paste
DE3539572A1 (en) * 1985-11-08 1987-05-14 Licentia Gmbh Process for producing a masking matrix
US4746588A (en) * 1985-11-25 1988-05-24 Rca Corporation Method for preparing a photosensitive film on a glass surface
US4778738A (en) * 1986-08-14 1988-10-18 RCA Licensing Method for producing a luminescent viewing screen in a focus mask cathode-ray tube
US4990417A (en) * 1987-02-23 1991-02-05 Sony Corporation Method of manufacturing a cathode ray tube
JP2008531248A (en) * 2005-02-16 2008-08-14 スリーエム イノベイティブ プロパティズ カンパニー Method for producing topographically patterned coatings
MX2007009840A (en) * 2005-02-16 2007-09-26 3M Innovative Properties Co Method of making morphologically patterned coatings.
CN105551912A (en) * 2015-12-21 2016-05-04 陈艳 Internal coating technology for helical energy-saving lamp tube

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Publication number Publication date
FR2143756B1 (en) 1977-07-22
DE2231473B2 (en) 1975-10-16
KR780000504B1 (en) 1978-10-25
DE2231473C3 (en) 1980-01-31
GB1355308A (en) 1974-06-05
IT955339B (en) 1973-09-29
NL7208839A (en) 1973-01-02
CA966347A (en) 1975-04-22
DE2231473A1 (en) 1973-01-18
NL179322C (en) 1986-08-18
JPS51421B1 (en) 1976-01-08
BE785499A (en) 1972-10-16
NL179322B (en) 1986-03-17
FR2143756A1 (en) 1973-02-09
US3788846A (en) 1974-01-29

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