SG134187A1 - Stacked wafer for 3d integration - Google Patents

Stacked wafer for 3d integration

Info

Publication number
SG134187A1
SG134187A1 SG200600330-5A SG2006003305A SG134187A1 SG 134187 A1 SG134187 A1 SG 134187A1 SG 2006003305 A SG2006003305 A SG 2006003305A SG 134187 A1 SG134187 A1 SG 134187A1
Authority
SG
Singapore
Prior art keywords
wafer
copper pads
forming
integration
stacked wafer
Prior art date
Application number
SG200600330-5A
Inventor
Hong Sangki
Ramasamy Chockalingam
Gupta Subhash
Original Assignee
Tezzaron Semiconductor S Pte L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tezzaron Semiconductor S Pte L filed Critical Tezzaron Semiconductor S Pte L
Priority to SG200600330-5A priority Critical patent/SG134187A1/en
Priority to CN2006101018991A priority patent/CN101000880B/en
Priority to TW096101429A priority patent/TWI441308B/en
Publication of SG134187A1 publication Critical patent/SG134187A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93Batch processes
    • H01L2224/94Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices

Abstract

A method of forming a stacked wafer device comprising the steps of : providing a first wafer; forming a plurality of copper pads in a first surface of the first wafer; forming at least one embedded vertical connector in the first wafer in isolation from the copper pads of the first wafer; providing a second wafer; forming a plurality of copper pads in a first surface of the second wafer, the placement of the copper pads to coincide with the location of the copper pads of the first wafer; forming at least one embedded vertical connector in the second wafer in isolation from the copper pads of the second wafer; bringing the first surfaces of the wafers into contact, so as to contact the copper pads; applying a force to the wafers at a pre-determined pressure and at a pre-determined temperature until the copper pads are bonded, and so forming the stacked wafer device from the bonded first and second wafer.
SG200600330-5A 2006-01-13 2006-01-13 Stacked wafer for 3d integration SG134187A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
SG200600330-5A SG134187A1 (en) 2006-01-13 2006-01-13 Stacked wafer for 3d integration
CN2006101018991A CN101000880B (en) 2006-01-13 2006-07-14 Stacked wafer for 3-D integration
TW096101429A TWI441308B (en) 2006-01-13 2007-01-15 Stacked wafer for 3d integration

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG200600330-5A SG134187A1 (en) 2006-01-13 2006-01-13 Stacked wafer for 3d integration

Publications (1)

Publication Number Publication Date
SG134187A1 true SG134187A1 (en) 2007-08-29

Family

ID=38692787

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200600330-5A SG134187A1 (en) 2006-01-13 2006-01-13 Stacked wafer for 3d integration

Country Status (3)

Country Link
CN (1) CN101000880B (en)
SG (1) SG134187A1 (en)
TW (1) TWI441308B (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9299736B2 (en) 2014-03-28 2016-03-29 Taiwan Semiconductor Manufacturing Company, Ltd. Hybrid bonding with uniform pattern density
KR102352677B1 (en) * 2014-08-27 2022-01-17 삼성전자주식회사 Semiconductor device and method for manufacturing the same
JP6387850B2 (en) * 2015-02-10 2018-09-12 株式会社デンソー Semiconductor device and manufacturing method thereof
CN106653720A (en) * 2016-12-30 2017-05-10 武汉新芯集成电路制造有限公司 Mixed bonding structure and mixed bonding method
CN109384192B (en) * 2017-08-04 2020-11-06 上海珏芯光电科技有限公司 Microsystem packaging module and manufacturing method thereof
CN108541131B (en) * 2018-05-30 2020-04-17 业成科技(成都)有限公司 Circuit board connecting structure and display device using same
KR102482697B1 (en) 2018-11-30 2022-12-28 양쯔 메모리 테크놀로지스 씨오., 엘티디. Bonded memory device and manufacturing method thereof
KR102618755B1 (en) 2019-01-30 2023-12-27 양쯔 메모리 테크놀로지스 씨오., 엘티디. Hybrid bonding using dummy bonded contacts and dummy interconnects
EP3847698A4 (en) 2019-01-30 2023-07-12 Yangtze Memory Technologies Co., Ltd. Hybrid bonding using dummy bonding contacts
KR102601225B1 (en) 2019-04-15 2023-11-10 양쯔 메모리 테크놀로지스 씨오., 엘티디. Integration of 3D NAND memory devices with multiple functional chips
CN110854116A (en) * 2019-10-28 2020-02-28 中国科学院上海微系统与信息技术研究所 Three-dimensional heterogeneous integrated chip and preparation method thereof
US11599299B2 (en) 2019-11-19 2023-03-07 Invensas Llc 3D memory circuit
TW202307717A (en) 2021-08-04 2023-02-16 義守大學 Method and electronic device for configuring signal pads between three-dimensional stacked chips

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3646719B2 (en) * 2003-06-19 2005-05-11 セイコーエプソン株式会社 Semiconductor device and manufacturing method thereof, circuit board, and electronic apparatus
JP4263953B2 (en) * 2003-06-23 2009-05-13 三洋電機株式会社 Semiconductor device and manufacturing method thereof
JP3990347B2 (en) * 2003-12-04 2007-10-10 ローム株式会社 Semiconductor chip, manufacturing method thereof, and semiconductor device

Also Published As

Publication number Publication date
CN101000880A (en) 2007-07-18
CN101000880B (en) 2010-08-25
TWI441308B (en) 2014-06-11

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