SG118380A1 - Composition and method comprising same for removing residue from a substrate - Google Patents

Composition and method comprising same for removing residue from a substrate

Info

Publication number
SG118380A1
SG118380A1 SG200503875A SG200503875A SG118380A1 SG 118380 A1 SG118380 A1 SG 118380A1 SG 200503875 A SG200503875 A SG 200503875A SG 200503875 A SG200503875 A SG 200503875A SG 118380 A1 SG118380 A1 SG 118380A1
Authority
SG
Singapore
Prior art keywords
substrate
composition
same
removing residue
residue
Prior art date
Application number
SG200503875A
Inventor
Yi Hsu Jiun
Wu Aiping
Matthew I Egbe
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Publication of SG118380A1 publication Critical patent/SG118380A1/en

Links

SG200503875A 2004-06-15 2005-06-11 Composition and method comprising same for removing residue from a substrate SG118380A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US58000104P 2004-06-15 2004-06-15

Publications (1)

Publication Number Publication Date
SG118380A1 true SG118380A1 (en) 2006-01-27

Family

ID=36102724

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200503875A SG118380A1 (en) 2004-06-15 2005-06-11 Composition and method comprising same for removing residue from a substrate

Country Status (2)

Country Link
CN (1) CN1776532A (en)
SG (1) SG118380A1 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101561641A (en) * 2008-04-14 2009-10-21 安集微电子（上海）有限公司 Plasma etching residual washing liquid
KR20120073228A (en) * 2009-09-02 2012-07-04 와코 쥰야꾸 고교 가부시키가이샤 Processing agent composition for semiconductor surface and method for processing semiconductor surface using same
CN102998915A (en) * 2012-07-17 2013-03-27 张峰 Positive photoresist and stripping agent composition
CN103383529B (en) * 2012-07-18 2015-12-02 张峰 Fluid composition removed by positive photo glue
CN103383530B (en) * 2012-07-18 2015-12-02 张峰 Positive photoresist-cleaningagent agent composition
TWI593783B (en) * 2012-07-24 2017-08-01 Ｌｔｃ股份有限公司 Composition for removal and prevention of formation of oxide on surface of metal wiring
CN102880017B (en) * 2012-09-28 2014-07-23 京东方科技集团股份有限公司 Stripping liquid composition for photoresist and preparation and applications of stripping liquid composition
CN104238287A (en) * 2013-06-20 2014-12-24 安集微电子科技(上海)有限公司 Cleaning solution for removing photoresist residues
KR20160017477A (en) * 2014-08-06 2016-02-16 동우 화인켐 주식회사 Cleaning composition
CN104845768B (en) * 2015-05-12 2017-12-05 深圳市美克科技有限公司 A kind of neutral water-base cleaning agent composition of wiring board
CN105543008A (en) * 2015-12-30 2016-05-04 上海新阳半导体材料股份有限公司 Detergent composition for cleaning treatment of low-K dielectric material
WO2018058341A1 (en) * 2016-09-28 2018-04-05 Dow Global Technologies Llc Sulfoxide/glycol ether based solvents for use in the electronics industry
US11035044B2 (en) * 2017-01-23 2021-06-15 Versum Materials Us, Llc Etching solution for tungsten and GST films
CN107312662A (en) * 2017-07-03 2017-11-03 中山翰华锡业有限公司 A kind of scolding tin residue environment-friendlywater-based water-based cleaning agent and its preparation and application method
US11175587B2 (en) * 2017-09-29 2021-11-16 Versum Materials Us, Llc Stripper solutions and methods of using stripper solutions
JP7204760B2 (en) * 2018-02-14 2023-01-16 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング photoresist remover composition

Also Published As

Publication number Publication date
CN1776532A (en) 2006-05-24

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