SG11201903421VA - Semiconductor device inspection apparatus and semiconductor device inspection method - Google Patents
Semiconductor device inspection apparatus and semiconductor device inspection methodInfo
- Publication number
- SG11201903421VA SG11201903421VA SG11201903421VA SG11201903421VA SG11201903421VA SG 11201903421V A SG11201903421V A SG 11201903421VA SG 11201903421V A SG11201903421V A SG 11201903421VA SG 11201903421V A SG11201903421V A SG 11201903421VA SG 11201903421V A SG11201903421V A SG 11201903421VA
- Authority
- SG
- Singapore
- Prior art keywords
- semiconductor device
- device inspection
- inspection apparatus
- output
- stimulation
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/302—Contactless testing
- G01R31/303—Contactless testing of integrated circuits
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/265—Contactless testing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2601—Apparatus or methods therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/302—Contactless testing
Abstract
A semiconductor device inspection apparatus is an apparatus for inspecting a semiconductor device which is an object to be inspected based on a result signal which is output in accordance with input of a test pattern signal to the semiconductor device, the apparatus including: an ultrasonic transducer, disposed to face the semiconductor device, which generates ultrasonic waves; a stage for moving a relative position of the semiconductor device and the ultrasonic transducer; a stimulation condition control unit for controlling a condition of stimulation by the 10 ultrasonic waves applied to the semiconductor device; and an analysis unit for generating a measurement image based on the result signal which is output from the semiconductor device. Figure 1 35
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016216307A JP6927690B2 (en) | 2016-11-04 | 2016-11-04 | Semiconductor device inspection equipment and semiconductor device inspection method |
PCT/JP2017/033944 WO2018083904A1 (en) | 2016-11-04 | 2017-09-20 | Semiconductor device inspection apparatus and semiconductor device inspection method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201903421VA true SG11201903421VA (en) | 2019-05-30 |
Family
ID=62076015
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201903421VA SG11201903421VA (en) | 2016-11-04 | 2017-09-20 | Semiconductor device inspection apparatus and semiconductor device inspection method |
Country Status (8)
Country | Link |
---|---|
US (1) | US10955458B2 (en) |
JP (1) | JP6927690B2 (en) |
KR (1) | KR102328606B1 (en) |
CN (1) | CN109891255B (en) |
DE (1) | DE112017005568T5 (en) |
SG (1) | SG11201903421VA (en) |
TW (1) | TWI746669B (en) |
WO (1) | WO2018083904A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6745196B2 (en) * | 2016-11-04 | 2020-08-26 | 浜松ホトニクス株式会社 | Ultrasonic inspection equipment |
JP7276744B2 (en) * | 2019-02-26 | 2023-05-18 | 国立大学法人豊橋技術科学大学 | Ultrasonic inspection device and ultrasonic inspection method |
TWI776502B (en) * | 2021-05-11 | 2022-09-01 | 日商新川股份有限公司 | Electronic circuit abnormality detection device |
KR20230023957A (en) * | 2021-08-11 | 2023-02-20 | 삼성전자주식회사 | Apparatus and method for inspecting semiconductor |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0763732A (en) * | 1993-08-31 | 1995-03-10 | Hitachi Constr Mach Co Ltd | Method and device for ultrasonic inspection |
JP2666772B2 (en) * | 1995-05-26 | 1997-10-22 | 日本電気株式会社 | Inspection method and apparatus for semiconductor integrated circuit wiring system using ultrasonic heating |
JPH11304769A (en) * | 1998-04-22 | 1999-11-05 | Hitachi Constr Mach Co Ltd | Ultrasonic inspection method |
JP2008102071A (en) * | 2006-10-20 | 2008-05-01 | Matsushita Electric Ind Co Ltd | Ultrasonic flaw detecting method and ultrasonic imaging device |
US8098362B2 (en) * | 2007-05-30 | 2012-01-17 | Nikon Corporation | Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method |
CN102579082B (en) * | 2007-06-04 | 2014-05-28 | 柯尼卡美能达株式会社 | Ultrasonic diagnosis device and ultrasonic probe for use in ultrasonic diagnosis device |
GB0813014D0 (en) * | 2008-07-16 | 2008-08-20 | Groveley Detection Ltd | Detector and methods of detecting |
JP4759597B2 (en) * | 2008-07-28 | 2011-08-31 | ルネサスエレクトロニクス株式会社 | Failure analysis method and failure analysis apparatus for semiconductor integrated circuit |
EP2182352A3 (en) * | 2008-10-29 | 2011-08-03 | Hitachi Ltd. | Apparatus and method for ultrasonic testing |
JP2011053126A (en) * | 2009-09-03 | 2011-03-17 | Disco Abrasive Syst Ltd | Ultrasonic inspection method and ultrasonic inspection device |
EP2428807A3 (en) | 2010-09-08 | 2014-10-29 | DCG Systems, Inc. | Laser assisted fault localization using two-photon absorption |
US9164066B1 (en) * | 2012-06-19 | 2015-10-20 | The Boeing Company | Laser ultrasound array system |
JP5892745B2 (en) * | 2011-08-18 | 2016-03-23 | 株式会社東芝 | Ultrasonic diagnostic equipment |
TWI455223B (en) * | 2011-09-22 | 2014-10-01 | Orise Technology Co Ltd | Apparatus and method for testing the embedded memory of display panel driving integrated circuit |
JP5972581B2 (en) * | 2012-01-23 | 2016-08-17 | 東芝メディカルシステムズ株式会社 | Ultrasonic diagnostic equipment |
JP5873773B2 (en) * | 2012-07-19 | 2016-03-01 | 株式会社日立パワーソリューションズ | Measurement frequency variable ultrasonic imaging system |
JP2016057187A (en) * | 2014-09-10 | 2016-04-21 | 株式会社東芝 | Analyzer |
JP5996687B2 (en) * | 2015-02-10 | 2016-09-21 | 浜松ホトニクス株式会社 | Inspection apparatus and inspection method |
JP6380194B2 (en) * | 2015-03-27 | 2018-08-29 | コニカミノルタ株式会社 | Ultrasonic signal processing apparatus and ultrasonic diagnostic apparatus |
-
2016
- 2016-11-04 JP JP2016216307A patent/JP6927690B2/en active Active
-
2017
- 2017-09-20 US US16/346,594 patent/US10955458B2/en active Active
- 2017-09-20 SG SG11201903421VA patent/SG11201903421VA/en unknown
- 2017-09-20 DE DE112017005568.7T patent/DE112017005568T5/en active Pending
- 2017-09-20 WO PCT/JP2017/033944 patent/WO2018083904A1/en active Application Filing
- 2017-09-20 CN CN201780066179.2A patent/CN109891255B/en active Active
- 2017-09-20 KR KR1020197014004A patent/KR102328606B1/en active IP Right Grant
- 2017-10-18 TW TW106135739A patent/TWI746669B/en active
Also Published As
Publication number | Publication date |
---|---|
DE112017005568T5 (en) | 2019-08-29 |
KR20190079632A (en) | 2019-07-05 |
WO2018083904A1 (en) | 2018-05-11 |
TW201819937A (en) | 2018-06-01 |
KR102328606B1 (en) | 2021-11-19 |
US20190271734A1 (en) | 2019-09-05 |
JP2018072292A (en) | 2018-05-10 |
CN109891255A (en) | 2019-06-14 |
US10955458B2 (en) | 2021-03-23 |
JP6927690B2 (en) | 2021-09-01 |
CN109891255B (en) | 2022-09-20 |
TWI746669B (en) | 2021-11-21 |
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