SG11201806624XA - Deposition of molybdenum thin films using a molybdenum carbonyl precursor - Google Patents

Deposition of molybdenum thin films using a molybdenum carbonyl precursor

Info

Publication number
SG11201806624XA
SG11201806624XA SG11201806624XA SG11201806624XA SG11201806624XA SG 11201806624X A SG11201806624X A SG 11201806624XA SG 11201806624X A SG11201806624X A SG 11201806624XA SG 11201806624X A SG11201806624X A SG 11201806624XA SG 11201806624X A SG11201806624X A SG 11201806624XA
Authority
SG
Singapore
Prior art keywords
international
llc
louis
aldrich
sigma
Prior art date
Application number
SG11201806624XA
Inventor
Charles Dezelah
Jean-Sebastien Lehn
Guo Liu
Mark C Potyen
Original Assignee
Merck Patent Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent Gmbh filed Critical Merck Patent Gmbh
Publication of SG11201806624XA publication Critical patent/SG11201806624XA/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/16—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45553—Atomic layer deposition [ALD] characterized by the use of precursors specially adapted for ALD

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 24 August 2017 (24.08.2017) WIPO I PCT (10) International Publication Number WO 2017/143246 Al 111111111111110111011111111111010111110111010111110111010111111111111111111110111111 (51) International Patent Classification: C23C 16/16 (2006.01) C23C 16/455 (2006.01) (21) International Application Number: PCT/US2017/018455 (22) International Filing Date: 17 February 2017 (17.02.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/297,469 19 February 2016 (19.02.2016) US (71) Applicant: SIGMA-ALDRICH CO., LLC [US/US]; 3050 Spruce Street, St. Louis, Missouri 63103 (US). AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). arations under Rule 4.17: as to applicant's entitlement to apply for and be granted a patent (Rule 4.17(ii)) as to the applicant's entitlement to claim the priority of the earlier application (Rule 4.17(iii)) Published: — with international search report (Art. 21(3)) (72) Inventors: DEZELAH, Charles; Sigma-Aldrich Co., LLC, 3050 Spruce St., St. Louis, Missouri 63103 (US). LEHN, Jean-Sebastien; Sigma-Aldrich Co., LLC, 3050 Spruce St., St. Louis, Missouri 63103 (US). LIU, Guo; Sigma-Aldrich Co., LLC, 3050 Spruce St., St. Louis, Mis- Decl souri 63103 (US). POTYEN, Mark C.; Sigma-Aldrich Co., LLC, 3050 Spruce St., St. Louis, Missouri 63103 (US). (74) Agents: KORAL, Elisabeth A. et al.; Harness, Dickey & Pierce, P.L.C., 7700 Bonhomme, Suite 400, Clayton, Mis- souri 63105 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, W O 20 17 / 143 246 Al (54) Title: DEPOSITION OF MOLYBDENUM THIN FILMS USING A MOLYBDENUM CARBONYL PRECURSOR (57) : Transition metal precursors are disclosed herein along with methods of using these precursors to deposit metal thin films. Advantageous properties of these precursors and methods are also disclosed, as well as superior films that can be achieved with the precursors and methods.
SG11201806624XA 2016-02-19 2017-02-17 Deposition of molybdenum thin films using a molybdenum carbonyl precursor SG11201806624XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201662297469P 2016-02-19 2016-02-19
PCT/US2017/018455 WO2017143246A1 (en) 2016-02-19 2017-02-17 Deposition of molybdenum thin films using a molybdenum carbonyl precursor

Publications (1)

Publication Number Publication Date
SG11201806624XA true SG11201806624XA (en) 2018-09-27

Family

ID=58231714

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201806624XA SG11201806624XA (en) 2016-02-19 2017-02-17 Deposition of molybdenum thin films using a molybdenum carbonyl precursor

Country Status (8)

Country Link
US (1) US10995405B2 (en)
EP (1) EP3417087A1 (en)
JP (1) JP2019510877A (en)
KR (1) KR20180114159A (en)
CN (1) CN109072424A (en)
SG (1) SG11201806624XA (en)
TW (1) TW201741325A (en)
WO (1) WO2017143246A1 (en)

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