SG11201609845VA - Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material - Google Patents

Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material

Info

Publication number
SG11201609845VA
SG11201609845VA SG11201609845VA SG11201609845VA SG11201609845VA SG 11201609845V A SG11201609845V A SG 11201609845VA SG 11201609845V A SG11201609845V A SG 11201609845VA SG 11201609845V A SG11201609845V A SG 11201609845VA SG 11201609845V A SG11201609845V A SG 11201609845VA
Authority
SG
Singapore
Prior art keywords
producing
ion beam
treatment method
beam treatment
gas ion
Prior art date
Application number
SG11201609845VA
Inventor
Denis Busardo
Frédéric Guernalec
Original Assignee
Quertech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR1401172A external-priority patent/FR3021332B1/en
Priority claimed from FR1402293A external-priority patent/FR3027120B1/en
Application filed by Quertech filed Critical Quertech
Publication of SG11201609845VA publication Critical patent/SG11201609845VA/en

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00—Compounds of aluminium
    • C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
    • C01F7/021—After-treatment of oxides or hydroxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/16—Oxides
    • C30B29/20—Aluminium oxides
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/04—After-treatment of single crystals or homogeneous polycrystalline material with defined structure using electric or magnetic fields or particle radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5826—Treatment with charged particles
    • C23C14/5833—Ion beam bombardment
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
SG11201609845VA 2014-05-23 2015-03-23 Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material SG11201609845VA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1401172A FR3021332B1 (en) 2014-05-23 2014-05-23 METHOD FOR ION BEAM TREATMENT OF MONO GAS AND MULTILOADS TO PRODUCE SYNTHETIC SAPPHIRE ANTIREFLECTION MATERIALS
FR1402293A FR3027120B1 (en) 2014-10-09 2014-10-09 HIGH-TRANSACTION CAPACITIVE TOUCH SLAB IN VISIBLE AND UNAVAILABLE FIELD
PCT/EP2015/056116 WO2015176850A1 (en) 2014-05-23 2015-03-23 Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material

Publications (1)

Publication Number Publication Date
SG11201609845VA true SG11201609845VA (en) 2016-12-29

Family

ID=52727135

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201609845VA SG11201609845VA (en) 2014-05-23 2015-03-23 Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material
SG11201609846RA SG11201609846RA (en) 2014-05-23 2015-05-22 Treatment method for modifying the reflected colour of a sapphire material surface

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201609846RA SG11201609846RA (en) 2014-05-23 2015-05-22 Treatment method for modifying the reflected colour of a sapphire material surface

Country Status (10)

Country Link
US (2) US10982312B2 (en)
EP (2) EP3146086B1 (en)
JP (2) JP6878009B2 (en)
KR (2) KR102320294B1 (en)
CN (2) CN106662958B (en)
AU (2) AU2015263472B2 (en)
CA (2) CA2949923A1 (en)
EA (2) EA035316B9 (en)
SG (2) SG11201609845VA (en)
WO (2) WO2015176850A1 (en)

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WO2017104443A1 (en) * 2015-12-16 2017-06-22 株式会社アルバック Method for manufacturing sapphire substrate, and sapphire substrate
TWI653266B (en) * 2016-05-19 2019-03-11 香港浸會大學 Sapphire film coated substrate
FR3062855B1 (en) * 2017-02-14 2019-04-19 Sa Quertech METHOD OF TREATING WITH A BEAM OF IONS TO PRODUCE A HIGH SCRATCH RESISTANT HIGH SCRATCH ANTIREFLECTION SAPHIR.
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EP3632876A1 (en) * 2017-10-12 2020-04-08 The Swatch Group Research and Development Ltd Coated ceramic powder particles
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EP3636796A1 (en) * 2018-10-10 2020-04-15 Comadur S.A. Method of curing an antiglare treatment deposited on a transparent substrate and transparent substrate comprising a cured antiglare treatment
TW202038326A (en) * 2019-01-11 2020-10-16 日商索尼半導體解決方案公司 Method for etching oxide semiconductor film
EP3696151A1 (en) * 2019-02-18 2020-08-19 Rolex Sa Coloured watch glass
EP4113220A1 (en) 2021-07-02 2023-01-04 Comadur SA Method for surface treatment of a stone, in particular for timepieces

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FR3062855B1 (en) * 2017-02-14 2019-04-19 Sa Quertech METHOD OF TREATING WITH A BEAM OF IONS TO PRODUCE A HIGH SCRATCH RESISTANT HIGH SCRATCH ANTIREFLECTION SAPHIR.
EP3389078A1 (en) * 2017-04-13 2018-10-17 The Swatch Group Research and Development Ltd Method for implanting multi-charged ions on a surface of an object to be treated and installation for implementing said method

Also Published As

Publication number Publication date
KR20170008851A (en) 2017-01-24
CA2949878A1 (en) 2015-11-26
US20170107641A1 (en) 2017-04-20
CN106662958B (en) 2020-03-06
CN106661724B (en) 2020-06-30
AU2015263472B2 (en) 2019-06-27
JP6626008B2 (en) 2019-12-25
WO2015176850A1 (en) 2015-11-26
AU2015261820B2 (en) 2020-09-10
KR102363999B1 (en) 2022-02-16
EA201692408A1 (en) 2017-04-28
EP3146416A1 (en) 2017-03-29
CN106662958A (en) 2017-05-10
EA034019B1 (en) 2019-12-19
CN106661724A (en) 2017-05-10
CA2949923A1 (en) 2015-11-26
KR102320294B1 (en) 2021-11-01
JP2017518440A (en) 2017-07-06
KR20170008302A (en) 2017-01-23
US20170114442A1 (en) 2017-04-27
EP3146086B1 (en) 2019-10-02
SG11201609846RA (en) 2016-12-29
EA035316B9 (en) 2020-07-27
US10196731B2 (en) 2019-02-05
EA201692406A1 (en) 2017-04-28
AU2015261820A1 (en) 2016-12-08
US10982312B2 (en) 2021-04-20
EA035316B1 (en) 2020-05-27
AU2015263472A1 (en) 2016-12-08
EP3146086A1 (en) 2017-03-29
JP2017516737A (en) 2017-06-22
WO2015177334A1 (en) 2015-11-26
JP6878009B2 (en) 2021-05-26

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