SG11201504565SA - Metal-insulator-metal capacitor formation techniques - Google Patents
Metal-insulator-metal capacitor formation techniquesInfo
- Publication number
- SG11201504565SA SG11201504565SA SG11201504565SA SG11201504565SA SG11201504565SA SG 11201504565S A SG11201504565S A SG 11201504565SA SG 11201504565S A SG11201504565S A SG 11201504565SA SG 11201504565S A SG11201504565S A SG 11201504565SA SG 11201504565S A SG11201504565S A SG 11201504565SA
- Authority
- SG
- Singapore
- Prior art keywords
- metal
- insulator
- capacitor formation
- formation techniques
- metal capacitor
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/82—Electrodes with an enlarged surface, e.g. formed by texturisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
- H10B61/10—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having two electrodes, e.g. diodes or MIM elements
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Integrated Circuits (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/748,277 US8993404B2 (en) | 2013-01-23 | 2013-01-23 | Metal-insulator-metal capacitor formation techniques |
| PCT/US2014/011856 WO2014116496A1 (en) | 2013-01-23 | 2014-01-16 | Metal-insulator-metal capacitor formation techniques |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201504565SA true SG11201504565SA (en) | 2015-07-30 |
Family
ID=51207082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201504565SA SG11201504565SA (en) | 2013-01-23 | 2014-01-16 | Metal-insulator-metal capacitor formation techniques |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US8993404B2 (en) |
| KR (1) | KR102179206B1 (en) |
| CN (1) | CN104885211B (en) |
| DE (1) | DE112014000519B4 (en) |
| GB (1) | GB2523956B (en) |
| SG (1) | SG11201504565SA (en) |
| TW (2) | TWI590471B (en) |
| WO (1) | WO2014116496A1 (en) |
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| TWI529808B (en) | 2010-06-10 | 2016-04-11 | Ａｓｍ國際股份有限公司 | Method for selectively depositing film on substrate |
| US9112003B2 (en) | 2011-12-09 | 2015-08-18 | Asm International N.V. | Selective formation of metallic films on metallic surfaces |
| US8993404B2 (en) | 2013-01-23 | 2015-03-31 | Intel Corporation | Metal-insulator-metal capacitor formation techniques |
| US9281203B2 (en) * | 2013-08-23 | 2016-03-08 | Taiwan Semiconductor Manufacturing Co., Ltd. | Silicon dot formation by direct self-assembly method for flash memory |
| TWI739285B (en) | 2014-02-04 | 2021-09-11 | 荷蘭商Ａｓｍ Ｉｐ控股公司 | Selective deposition of metals, metal oxides, and dielectrics |
| US10047435B2 (en) | 2014-04-16 | 2018-08-14 | Asm Ip Holding B.V. | Dual selective deposition |
| US9816180B2 (en) | 2015-02-03 | 2017-11-14 | Asm Ip Holding B.V. | Selective deposition |
| US9490145B2 (en) | 2015-02-23 | 2016-11-08 | Asm Ip Holding B.V. | Removal of surface passivation |
| US10428421B2 (en) | 2015-08-03 | 2019-10-01 | Asm Ip Holding B.V. | Selective deposition on metal or metallic surfaces relative to dielectric surfaces |
| US10566185B2 (en) | 2015-08-05 | 2020-02-18 | Asm Ip Holding B.V. | Selective deposition of aluminum and nitrogen containing material |
| US10121699B2 (en) | 2015-08-05 | 2018-11-06 | Asm Ip Holding B.V. | Selective deposition of aluminum and nitrogen containing material |
| US10343186B2 (en) | 2015-10-09 | 2019-07-09 | Asm Ip Holding B.V. | Vapor phase deposition of organic films |
| US10814349B2 (en) | 2015-10-09 | 2020-10-27 | Asm Ip Holding B.V. | Vapor phase deposition of organic films |
| US10695794B2 (en) | 2015-10-09 | 2020-06-30 | Asm Ip Holding B.V. | Vapor phase deposition of organic films |
| US9391069B1 (en) | 2015-12-03 | 2016-07-12 | International Business Machines Corporation | MIM capacitor with enhanced capacitance formed by selective epitaxy |
| WO2017111822A1 (en) * | 2015-12-24 | 2017-06-29 | Intel Corporation | Pitch division using directed self-assembly |
| US9981286B2 (en) | 2016-03-08 | 2018-05-29 | Asm Ip Holding B.V. | Selective formation of metal silicides |
| US10204782B2 (en) | 2016-04-18 | 2019-02-12 | Imec Vzw | Combined anneal and selective deposition process |
| KR102182550B1 (en) | 2016-04-18 | 2020-11-25 | 에이에스엠 아이피 홀딩 비.브이. | Method of forming induced self-assembly layer on a substrate |
| US11081342B2 (en) | 2016-05-05 | 2021-08-03 | Asm Ip Holding B.V. | Selective deposition using hydrophobic precursors |
| US10453701B2 (en) | 2016-06-01 | 2019-10-22 | Asm Ip Holding B.V. | Deposition of organic films |
| US10373820B2 (en) | 2016-06-01 | 2019-08-06 | Asm Ip Holding B.V. | Deposition of organic films |
| US10014212B2 (en) | 2016-06-08 | 2018-07-03 | Asm Ip Holding B.V. | Selective deposition of metallic films |
| US9805974B1 (en) | 2016-06-08 | 2017-10-31 | Asm Ip Holding B.V. | Selective deposition of metallic films |
| US9803277B1 (en) | 2016-06-08 | 2017-10-31 | Asm Ip Holding B.V. | Reaction chamber passivation and selective deposition of metallic films |
| US20180102315A1 (en) * | 2016-10-11 | 2018-04-12 | Globalfoundries Inc. | Surface area-dependent semiconductor device with increased surface area |
| US9899372B1 (en) * | 2016-10-31 | 2018-02-20 | International Business Machines Corporation | Forming on-chip metal-insulator-semiconductor capacitor |
| US11430656B2 (en) | 2016-11-29 | 2022-08-30 | Asm Ip Holding B.V. | Deposition of oxide thin films |
| US11094535B2 (en) | 2017-02-14 | 2021-08-17 | Asm Ip Holding B.V. | Selective passivation and selective deposition |
| US20180240861A1 (en) | 2017-02-23 | 2018-08-23 | International Business Machines Corporation | Multilayer dielectric for metal-insulator-metal capacitor (mimcap) capacitance and leakage improvement |
| US10090378B1 (en) | 2017-03-17 | 2018-10-02 | International Business Machines Corporation | Efficient metal-insulator-metal capacitor |
| US11121209B2 (en) | 2017-03-27 | 2021-09-14 | International Business Machines Corporation | Surface area enhancement for stacked metal-insulator-metal (MIM) capacitor |
| US10741410B2 (en) * | 2017-04-28 | 2020-08-11 | Taiwan Semiconductor Manufacturing Co., Ltd. | Material composition and methods thereof |
| US11501965B2 (en) | 2017-05-05 | 2022-11-15 | Asm Ip Holding B.V. | Plasma enhanced deposition processes for controlled formation of metal oxide thin films |
| CN115233183A (en) | 2017-05-16 | 2022-10-25 | Asm Ip 控股有限公司 | Selective PEALD of oxide on dielectric |
| US9947582B1 (en) | 2017-06-02 | 2018-04-17 | Asm Ip Holding B.V. | Processes for preventing oxidation of metal thin films |
| EP3428955A1 (en) * | 2017-07-10 | 2019-01-16 | Murata Manufacturing Co., Ltd. | Substrates employing surface-area amplification, for use in fabricating capacitive elements and other devices |
| US10900120B2 (en) | 2017-07-14 | 2021-01-26 | Asm Ip Holding B.V. | Passivation against vapor deposition |
| US10600656B2 (en) | 2017-11-21 | 2020-03-24 | International Business Machines Corporation | Directed self-assembly for copper patterning |
| US10910320B2 (en) | 2017-11-30 | 2021-02-02 | Mediatek Inc. | Shielded MOM capacitor |
| US11664172B2 (en) * | 2018-03-30 | 2023-05-30 | The Research Foundation For The State University Of New York | Performance of capacitors |
| JP7146690B2 (en) | 2018-05-02 | 2022-10-04 | エーエスエム アイピー ホールディング ビー．ブイ． | Selective layer formation using deposition and removal |
| US11398545B2 (en) | 2018-06-25 | 2022-07-26 | Intel Corporation | Single-mask, high-q performance metal-insulator-metal capacitor (MIMCAP) |
| KR20200025728A (en) * | 2018-08-31 | 2020-03-10 | 삼성전자주식회사 | Semiconductor device and method for fabricating the same |
| JP2020056104A (en) | 2018-10-02 | 2020-04-09 | エーエスエム アイピー ホールディング ビー．ブイ． | Selective passivation and selective deposition |
| US10964779B2 (en) | 2018-11-13 | 2021-03-30 | International Business Machines Corporation | Vertical plate capacitors exhibiting high capacitance manufactured with directed self-assembly |
| KR20210087550A (en) * | 2018-11-30 | 2021-07-12 | 램 리써치 코포레이션 | Metal interconnect structure by subtractive process |
| US11222946B2 (en) * | 2018-11-30 | 2022-01-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device including a high density MIM capacitor and method |
| US11965238B2 (en) | 2019-04-12 | 2024-04-23 | Asm Ip Holding B.V. | Selective deposition of metal oxides on metal surfaces |
| US11139163B2 (en) | 2019-10-31 | 2021-10-05 | Asm Ip Holding B.V. | Selective deposition of SiOC thin films |
| TW202204658A (en) | 2020-03-30 | 2022-02-01 | 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 | Simultaneous selective deposition of two different materials on two different surfaces |
| TW202140833A (en) | 2020-03-30 | 2021-11-01 | 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 | Selective deposition of silicon oxide on dielectric surfaces relative to metal surfaces |
| TW202140832A (en) | 2020-03-30 | 2021-11-01 | 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 | Selective deposition of silicon oxide on metal surfaces |
| CN113594367B (en) * | 2021-07-30 | 2023-09-26 | 长鑫存储技术有限公司 | Method for forming capacitor hole |
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| US6753250B1 (en) | 2002-06-12 | 2004-06-22 | Novellus Systems, Inc. | Method of fabricating low dielectric constant dielectric films |
| JP2006510229A (en) * | 2002-08-28 | 2006-03-23 | ユニバーシティー オブ ピッツバーグ | Self-organized nanopore arrays with controlled symmetry and order |
| US6750115B1 (en) | 2002-11-25 | 2004-06-15 | Infineon Technologies Ag | Method for generating alignment marks for manufacturing MIM capacitors |
| KR100576854B1 (en) * | 2003-12-20 | 2006-05-10 | 삼성전기주식회사 | Fabrication method for nitride semiconductor and nitride semiconductor fabricated thereby |
| US7405147B2 (en) | 2004-01-30 | 2008-07-29 | International Business Machines Corporation | Device and methodology for reducing effective dielectric constant in semiconductor devices |
| JP2007059761A (en) * | 2005-08-26 | 2007-03-08 | Hitachi Ltd | Semiconductor device and method of manufacturing same |
| TWI283475B (en) | 2005-12-29 | 2007-07-01 | Ind Tech Res Inst | Bottom electrode of a metal-insulator-metal capacitor and method of manufacturing the same |
| US7723009B2 (en) | 2006-06-02 | 2010-05-25 | Micron Technology, Inc. | Topography based patterning |
| KR100808012B1 (en) | 2006-06-13 | 2008-02-28 | 나이넥스 주식회사 | Light emitting diode having improved efficiency and manufacuring method thereof |
| US7553760B2 (en) * | 2006-10-19 | 2009-06-30 | International Business Machines Corporation | Sub-lithographic nano interconnect structures, and method for forming same |
| US7670921B2 (en) | 2006-12-28 | 2010-03-02 | International Business Machines Corporation | Structure and method for self aligned vertical plate capacitor |
| US8940117B2 (en) * | 2007-02-27 | 2015-01-27 | Microcontinuum, Inc. | Methods and systems for forming flexible multilayer structures |
| US8557128B2 (en) * | 2007-03-22 | 2013-10-15 | Micron Technology, Inc. | Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers |
| US20090001045A1 (en) * | 2007-06-27 | 2009-01-01 | International Business Machines Corporation | Methods of patterning self-assembly nano-structure and forming porous dielectric |
| US8003425B2 (en) * | 2008-05-14 | 2011-08-23 | International Business Machines Corporation | Methods for forming anti-reflection structures for CMOS image sensors |
| US20100224960A1 (en) | 2009-03-04 | 2010-09-09 | Kevin John Fischer | Embedded capacitor device and methods of fabrication |
| US8048795B2 (en) * | 2009-07-10 | 2011-11-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Self-assembly pattern for semiconductor integrated circuit |
| US8258037B2 (en) | 2009-08-26 | 2012-09-04 | International Business Machines Corporation | Nanopillar decoupling capacitor |
| US8623458B2 (en) * | 2009-12-18 | 2014-01-07 | International Business Machines Corporation | Methods of directed self-assembly, and layered structures formed therefrom |
| US8696918B2 (en) * | 2010-05-05 | 2014-04-15 | Micron Technology, Inc. | Methods of utilizing block copolymer to form patterns |
| US8241992B2 (en) | 2010-05-10 | 2012-08-14 | International Business Machines Corporation | Method for air gap interconnect integration using photo-patternable low k material |
| US8445355B2 (en) | 2010-12-15 | 2013-05-21 | International Business Machines Corporation | Metal-insulator-metal capacitors with high capacitance density |
| US8993404B2 (en) | 2013-01-23 | 2015-03-31 | Intel Corporation | Metal-insulator-metal capacitor formation techniques |
-
2013
- 2013-01-23 US US13/748,277 patent/US8993404B2/en active Active
-
2014
- 2014-01-08 TW TW104142710A patent/TWI590471B/en active
- 2014-01-08 TW TW103100657A patent/TWI524538B/en active
- 2014-01-16 SG SG11201504565SA patent/SG11201504565SA/en unknown
- 2014-01-16 DE DE112014000519.3T patent/DE112014000519B4/en active Active
- 2014-01-16 CN CN201480003629.XA patent/CN104885211B/en active Active
- 2014-01-16 WO PCT/US2014/011856 patent/WO2014116496A1/en active Application Filing
- 2014-01-16 KR KR1020157016631A patent/KR102179206B1/en active IP Right Grant
- 2014-01-16 GB GB1512181.7A patent/GB2523956B/en not_active Expired - Fee Related
-
2015
- 2015-02-13 US US14/622,157 patent/US9443922B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| GB201512181D0 (en) | 2015-08-19 |
| US20150155349A1 (en) | 2015-06-04 |
| US20140203400A1 (en) | 2014-07-24 |
| TWI590471B (en) | 2017-07-01 |
| TW201503378A (en) | 2015-01-16 |
| GB2523956A (en) | 2015-09-09 |
| KR102179206B1 (en) | 2020-11-16 |
| WO2014116496A1 (en) | 2014-07-31 |
| US8993404B2 (en) | 2015-03-31 |
| CN104885211B (en) | 2018-07-27 |
| GB2523956B (en) | 2018-07-18 |
| TWI524538B (en) | 2016-03-01 |
| KR20150109340A (en) | 2015-10-01 |
| TW201611305A (en) | 2016-03-16 |
| CN104885211A (en) | 2015-09-02 |
| DE112014000519B4 (en) | 2024-01-18 |
| DE112014000519T5 (en) | 2015-11-05 |
| US9443922B2 (en) | 2016-09-13 |
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