SG11201503340XA - Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device - Google Patents
Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic deviceInfo
- Publication number
- SG11201503340XA SG11201503340XA SG11201503340XA SG11201503340XA SG11201503340XA SG 11201503340X A SG11201503340X A SG 11201503340XA SG 11201503340X A SG11201503340X A SG 11201503340XA SG 11201503340X A SG11201503340X A SG 11201503340XA SG 11201503340X A SG11201503340X A SG 11201503340XA
- Authority
- SG
- Singapore
- Prior art keywords
- electronic device
- resin composition
- semiconductor element
- photosensitive resin
- cured film
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/12—Hydrolysis
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/02—Monomers containing only one unsaturated aliphatic radical
- C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
- C08F12/22—Oxygen
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
- C08F212/22—Oxygen
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
- C08L25/18—Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
- C09D125/18—Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L24/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012240567 | 2012-10-31 | ||
JP2012282958 | 2012-12-26 | ||
PCT/JP2013/077525 WO2014069202A1 (en) | 2012-10-31 | 2013-10-09 | Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device |
Publications (1)
Publication Number | Publication Date |
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SG11201503340XA true SG11201503340XA (en) | 2015-06-29 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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SG11201503340XA SG11201503340XA (en) | 2012-10-31 | 2013-10-09 | Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device |
Country Status (7)
Country | Link |
---|---|
US (1) | US9633848B2 (en) |
EP (1) | EP2916169B1 (en) |
JP (1) | JP5679095B2 (en) |
MY (1) | MY168978A (en) |
SG (1) | SG11201503340XA (en) |
TW (1) | TWI595315B (en) |
WO (1) | WO2014069202A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6465339B2 (en) * | 2014-10-16 | 2019-02-06 | 日立化成株式会社 | Photosensitive adhesive composition and method for manufacturing semiconductor device using the same |
JP2017090849A (en) * | 2015-11-17 | 2017-05-25 | アーゼッド・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ | High heat-resistant resist composition and pattern forming method using the same |
TWI731961B (en) * | 2016-04-19 | 2021-07-01 | 德商馬克專利公司 | Positive working photosensitive material and method of forming a positive relief image |
CN109643063B (en) * | 2016-08-31 | 2022-07-22 | 富士胶片株式会社 | Actinic-ray-or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device |
MX2019011382A (en) * | 2017-04-07 | 2019-11-18 | Akzo Nobel Coatings Int Bv | Coating compositions containing a hydroxyphenyl functional polymer and a latex polymer. |
KR102216172B1 (en) * | 2017-07-14 | 2021-02-15 | 주식회사 엘지화학 | Method for manufacturing insulating film and semiconductor package |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6451502B1 (en) * | 2000-10-10 | 2002-09-17 | Kodak Polychrome Graphics Llc | manufacture of electronic parts |
KR100895364B1 (en) | 2002-01-23 | 2009-04-29 | 제이에스알 가부시끼가이샤 | Positively Photosensitive Insulating Resin Composition and Cured Object Obtained Therefrom |
JP3877605B2 (en) | 2002-02-08 | 2007-02-07 | 信越化学工業株式会社 | Negative resist material and pattern forming method using the same |
JP3894477B2 (en) * | 2002-02-27 | 2007-03-22 | Azエレクトロニックマテリアルズ株式会社 | Photosensitive resin composition |
DE602005021812D1 (en) * | 2004-10-29 | 2010-07-22 | Jsr Corp | POSITIVE LIGHT-SENSITIVE INSULATING RESIN COMPOSITION AND CURED PRODUCT THEREOF |
JP4640037B2 (en) | 2005-08-22 | 2011-03-02 | Jsr株式会社 | Positive photosensitive insulating resin composition and cured product thereof |
WO2007122929A1 (en) * | 2006-03-30 | 2007-11-01 | Jsr Corporation | Radiation-sensitive insulating resin composition |
US8309295B2 (en) * | 2006-08-29 | 2012-11-13 | Jsr Corporation | Photosensitive insulating resin composition, hardening product thereof, and circuit board equipped therewith |
JP5067028B2 (en) | 2007-06-12 | 2012-11-07 | 日立化成工業株式会社 | Positive photosensitive resin composition, method for producing resist pattern, and electronic device |
JP2009024663A (en) | 2007-07-23 | 2009-02-05 | Sanden Corp | Scroll fluid machine |
JP2009047761A (en) * | 2007-08-14 | 2009-03-05 | Jsr Corp | Positive photosensitive insulating resin composition, cured product thereof and circuit board |
JP5077023B2 (en) | 2008-03-31 | 2012-11-21 | Jsr株式会社 | Adhesion method, positive photosensitive adhesive composition used therefor, and electronic component |
JP2010073948A (en) | 2008-09-19 | 2010-04-02 | Gigaphoton Inc | Power supply device for pulse laser |
CN103091987B (en) * | 2008-12-26 | 2016-11-23 | 日立化成株式会社 | Positive type photosensitive organic compound, the manufacture method of resist pattern, semiconductor device and electronic device |
JP2012256023A (en) * | 2011-05-18 | 2012-12-27 | Jsr Corp | Photosensitive composition, cured film, and electronic part |
-
2013
- 2013-10-09 MY MYPI2015701376A patent/MY168978A/en unknown
- 2013-10-09 EP EP13850182.0A patent/EP2916169B1/en active Active
- 2013-10-09 US US14/438,744 patent/US9633848B2/en active Active
- 2013-10-09 JP JP2014544405A patent/JP5679095B2/en active Active
- 2013-10-09 SG SG11201503340XA patent/SG11201503340XA/en unknown
- 2013-10-09 WO PCT/JP2013/077525 patent/WO2014069202A1/en active Application Filing
- 2013-10-24 TW TW102138359A patent/TWI595315B/en active
Also Published As
Publication number | Publication date |
---|---|
EP2916169B1 (en) | 2020-01-01 |
JPWO2014069202A1 (en) | 2016-09-08 |
US20150325431A1 (en) | 2015-11-12 |
TWI595315B (en) | 2017-08-11 |
US9633848B2 (en) | 2017-04-25 |
MY168978A (en) | 2019-01-29 |
WO2014069202A1 (en) | 2014-05-08 |
EP2916169A1 (en) | 2015-09-09 |
EP2916169A4 (en) | 2016-10-19 |
JP5679095B2 (en) | 2015-03-04 |
TW201423269A (en) | 2014-06-16 |
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