SG11201405569YA - Manufacturing method for magnetic recording medium - Google Patents

Manufacturing method for magnetic recording medium

Info

Publication number
SG11201405569YA
SG11201405569YA SG11201405569YA SG11201405569YA SG11201405569YA SG 11201405569Y A SG11201405569Y A SG 11201405569YA SG 11201405569Y A SG11201405569Y A SG 11201405569YA SG 11201405569Y A SG11201405569Y A SG 11201405569YA SG 11201405569Y A SG11201405569Y A SG 11201405569YA
Authority
SG
Singapore
Prior art keywords
manufacturing
recording medium
magnetic recording
magnetic
medium
Prior art date
Application number
SG11201405569YA
Inventor
Narumi Sato
Akiyasu Kumagai
Tomonori Katano
Katsumi Taniguchi
Hiromi Ono
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Publication of SG11201405569YA publication Critical patent/SG11201405569YA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/72—Protective coatings, e.g. anti-static or antifriction
    • G11B5/726—Two or more protective coatings
    • G11B5/7262—Inorganic protective coating
    • G11B5/7264—Inorganic carbon protective coating, e.g. graphite, diamond like carbon or doped carbon
    • G11B5/7268—Inorganic carbon protective coating, e.g. graphite, diamond like carbon or doped carbon comprising elemental nitrogen in the inorganic carbon coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8408—Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/029—Graded interfaces
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
    • G11B5/82—Disk carriers
SG11201405569YA 2012-09-14 2013-06-25 Manufacturing method for magnetic recording medium SG11201405569YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012202233A JP5578215B2 (en) 2012-09-14 2012-09-14 Method for manufacturing magnetic recording medium
PCT/JP2013/003952 WO2014041728A1 (en) 2012-09-14 2013-06-25 Manufacturing method for magnetic recording medium

Publications (1)

Publication Number Publication Date
SG11201405569YA true SG11201405569YA (en) 2014-11-27

Family

ID=50277875

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201405569YA SG11201405569YA (en) 2012-09-14 2013-06-25 Manufacturing method for magnetic recording medium

Country Status (6)

Country Link
US (1) US9758873B2 (en)
JP (1) JP5578215B2 (en)
CN (1) CN104170014B (en)
MY (1) MY167627A (en)
SG (1) SG11201405569YA (en)
WO (1) WO2014041728A1 (en)

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* Cited by examiner, † Cited by third party
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JP2015191905A (en) * 2014-03-27 2015-11-02 株式会社大木工藝 electric double layer capacitor
JP6485868B2 (en) * 2015-07-21 2019-03-20 昭和電工株式会社 Perpendicular magnetic recording medium and magnetic recording / reproducing apparatus
JP6485866B2 (en) * 2015-07-21 2019-03-20 昭和電工株式会社 Method for manufacturing perpendicular magnetic recording medium and magnetic recording / reproducing apparatus
JP6485867B2 (en) * 2015-07-21 2019-03-20 昭和電工株式会社 Perpendicular magnetic recording medium and magnetic recording / reproducing apparatus

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JPS61222024A (en) 1985-03-28 1986-10-02 Sony Corp Magnetic disk
JP3364694B2 (en) * 1993-12-28 2003-01-08 株式会社アルバック Method of forming protective film
JPH08167138A (en) 1994-12-15 1996-06-25 Fuji Electric Co Ltd Magnetic recording medium
JPH08180363A (en) * 1994-12-22 1996-07-12 Tdk Corp Magnetic recording medium and its production
JPH09138943A (en) 1995-11-14 1997-05-27 Nec Corp Magnetic disk medium
JPH09237415A (en) 1995-12-28 1997-09-09 Nippon Sheet Glass Co Ltd Magnetic recording medium and its production
JP3916868B2 (en) * 1997-09-17 2007-05-23 昭和電工株式会社 Method for manufacturing magnetic recording medium
JP2001266328A (en) 2000-01-13 2001-09-28 Fuji Electric Co Ltd Magnetic recording medium and method for improving wettability of its protective film
JP4008933B2 (en) * 2005-05-16 2007-11-14 株式会社東芝 Magnetic recording medium, method for manufacturing the same, and magnetic recording apparatus
JP2008047253A (en) * 2006-08-21 2008-02-28 Fuji Electric Device Technology Co Ltd Longitudinal magnetic recording medium and manufacturing method therefor
JP2008090919A (en) * 2006-09-30 2008-04-17 Hoya Corp Method for manufacturing magnetic disk
US7782569B2 (en) * 2007-01-18 2010-08-24 Sae Magnetics (Hk) Ltd. Magnetic recording head and media comprising aluminum oxynitride underlayer and a diamond-like carbon overcoat
US20080187781A1 (en) * 2007-02-05 2008-08-07 Sae Magnetics (Hk) Ltd. Magnetic recording head and media overcoat
JP5123930B2 (en) * 2007-03-27 2013-01-23 昭和電工株式会社 Manufacturing method of recording medium
JP2009169993A (en) * 2008-01-10 2009-07-30 Fuji Electric Device Technology Co Ltd Method of manufacturing patterned magnetic recording medium
GB0813490D0 (en) * 2008-07-23 2008-08-27 Element Six Ltd Solid state material
JP5256993B2 (en) * 2008-10-23 2013-08-07 富士電機株式会社 Magnetic recording medium and method for manufacturing the same
JP2010146683A (en) * 2008-12-22 2010-07-01 Fuji Electric Device Technology Co Ltd Method of forming protective film, protective film obtained by the method and magnetic recording medium including the protective film
JP2010250929A (en) * 2009-03-27 2010-11-04 Wd Media Singapore Pte Ltd Lubricant compound for magnetic disk, magnetic disk, and method of manufacturing the same
EP2578413B8 (en) * 2010-05-28 2019-03-20 Taiyo Yuden Co., Ltd. Screen-printing stencil having amorphous carbon films and manufacturing method therefor
JP2010238359A (en) * 2010-06-22 2010-10-21 Wd Media Singapore Pte Ltd Method for manufacturing magnetic disk
JP5811672B2 (en) * 2011-08-04 2015-11-11 富士電機株式会社 Perpendicular magnetic recording medium and manufacturing method thereof
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SG11201502574PA (en) * 2012-10-15 2015-05-28 Fuji Electric Co Ltd Magentic recording medium for heat assisted recording and method for fabricating same
JP2014146401A (en) * 2013-01-29 2014-08-14 Showa Denko Kk Method and device for manufacturing magnetic recording medium
JP6118130B2 (en) * 2013-02-25 2017-04-19 昭和電工株式会社 Method and apparatus for manufacturing magnetic recording medium
JP6175265B2 (en) * 2013-04-02 2017-08-02 昭和電工株式会社 Method for manufacturing magnetic recording medium
US20170022607A1 (en) * 2014-01-28 2017-01-26 Taiyo Yuden Chemical Technology Co., Ltd. Structure provided with carbon film and method for forming carbon film

Also Published As

Publication number Publication date
JP2014056633A (en) 2014-03-27
MY167627A (en) 2018-09-21
CN104170014B (en) 2015-12-09
WO2014041728A1 (en) 2014-03-20
US20150004328A1 (en) 2015-01-01
JP5578215B2 (en) 2014-08-27
US9758873B2 (en) 2017-09-12
CN104170014A (en) 2014-11-26

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