SG10201902967TA - Electron beam vaporizer and method for vaporizing a vaporization material by means of an electron beam - Google Patents

Electron beam vaporizer and method for vaporizing a vaporization material by means of an electron beam

Info

Publication number
SG10201902967TA
SG10201902967TA SG10201902967TA SG10201902967TA SG 10201902967T A SG10201902967T A SG 10201902967TA SG 10201902967T A SG10201902967T A SG 10201902967TA SG 10201902967T A SG10201902967T A SG 10201902967TA
Authority
SG
Singapore
Prior art keywords
electron beam
vaporization material
vaporizing
vaporizer
power density
Prior art date
Application number
Inventor
Carsten Deus
Original Assignee
Ardenne Asset Gmbh & Co Kg Von
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ardenne Asset Gmbh & Co Kg Von filed Critical Ardenne Asset Gmbh & Co Kg Von
Publication of SG10201902967TA publication Critical patent/SG10201902967TA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/152—Magnetic means
    • H01J2237/1526—For X-Y scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H01J2237/30483—Scanning
    • H01J2237/30488—Raster scan
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3132—Evaporating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Electron beam vaporizer and method for vaporizing a vaporization material by means of an electron beam 5 According to various embodiments, a method (300) for vaporizing a vaporization material by means of an electron beam may include the following: generating a first deflection pattern having a first power density at least on 10 an end face of a rod-shaped vaporization material (310); and, subsequently, generating a second deflection pattern having a second power density on a portion of an outer edge of the rod-shaped vaporization material and a portion of an inner edge of a ring crucible, which encloses the rod- 15 shaped vaporization material, wherein the second power density is greater than the first power density (320). Figure 2A
SG10201902967T 2018-04-12 2019-04-03 Electron beam vaporizer and method for vaporizing a vaporization material by means of an electron beam SG10201902967TA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102018108726.8A DE102018108726B4 (en) 2018-04-12 2018-04-12 Electron beam evaporator and method for evaporating a vaporized material by means of an electron beam

Publications (1)

Publication Number Publication Date
SG10201902967TA true SG10201902967TA (en) 2019-11-28

Family

ID=68053083

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201902967T SG10201902967TA (en) 2018-04-12 2019-04-03 Electron beam vaporizer and method for vaporizing a vaporization material by means of an electron beam

Country Status (4)

Country Link
US (1) US11133154B2 (en)
CN (1) CN110373635B (en)
DE (1) DE102018108726B4 (en)
SG (1) SG10201902967TA (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111607762B (en) * 2020-05-13 2021-03-16 北京航空航天大学 Device for realizing automatic evaporation of ceramic target material by electron beam physical vapor deposition
CN115094389B (en) * 2022-07-11 2023-12-29 威科赛乐微电子股份有限公司 Method for evaporating palladium by electron beam

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1361771A (en) * 1972-02-15 1974-07-30 Leybold Heraeus Verwaltung Apparatus for heating material by means of a electron beam in a vacuum
DE2544725C3 (en) * 1975-10-07 1981-01-08 Leybold-Heraeus Gmbh, 5000 Koeln Electron beam evaporator
DE3834154A1 (en) * 1988-10-07 1990-04-12 Ap & T Advanced Products & Tec Electron beam evaporator
GB2252979A (en) * 1991-02-25 1992-08-26 Secr Defence A metastable solid solution titanium-based alloy produced by vapour quenching.
DE19745771B4 (en) * 1997-10-16 2005-12-22 Unaxis Deutschland Holding Gmbh Method for operating a high-power electron beam
UA71572C2 (en) 1999-08-04 2004-12-15 Дженерал Електрік Компані An electron beam physical vapor deposition apparatus for application of coating on articles
WO2001090438A1 (en) * 2000-05-23 2001-11-29 University Of Virginia Patent Foundation A process and apparatus for plasma activated deposition in a vacuum
EP1275750B1 (en) * 2001-07-11 2009-07-01 Carl Zeiss Vision GmbH Vapor deposition apparatus
DE102007063364A1 (en) * 2006-12-28 2008-07-03 Von Ardenne Anlagentechnik Gmbh Coating of substrates with large area is carried out in vacuum using electron beam which produces arc from coating material, second arc being produced by separate beam from hot cathode
EP2540859B1 (en) * 2010-02-22 2017-12-20 ULVAC, Inc. Electron beam vacuum processing device
DE102010035315A1 (en) * 2010-08-25 2012-03-01 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vapor deposition of substrate within vacuum chamber, by evaporating a material in crucible by electron beam so that vaporous coating material is reflected on surface of vaporization material and producing plasma by arc discharge on surface
DE102011080810B4 (en) 2011-08-11 2015-09-17 Von Ardenne Gmbh Process for the long-term stable coating of substrates
WO2013153604A1 (en) * 2012-04-09 2013-10-17 株式会社シンクロン Electron gun device
US9758858B2 (en) * 2012-10-05 2017-09-12 Tyco Electronics Corporation Methods of manufacturing a coated structure on a substrate

Also Published As

Publication number Publication date
CN110373635A (en) 2019-10-25
US11133154B2 (en) 2021-09-28
DE102018108726B4 (en) 2019-11-07
CN110373635B (en) 2022-03-22
US20190318909A1 (en) 2019-10-17
DE102018108726A1 (en) 2019-10-17

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