SG10201607265WA - Laser assisted device alteration using two-photon absorption - Google Patents
Laser assisted device alteration using two-photon absorptionInfo
- Publication number
- SG10201607265WA SG10201607265WA SG10201607265WA SG10201607265WA SG10201607265WA SG 10201607265W A SG10201607265W A SG 10201607265WA SG 10201607265W A SG10201607265W A SG 10201607265WA SG 10201607265W A SG10201607265W A SG 10201607265WA SG 10201607265W A SG10201607265W A SG 10201607265WA
- Authority
- SG
- Singapore
- Prior art keywords
- photon absorption
- laser assisted
- assisted device
- device alteration
- alteration
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/302—Contactless testing
- G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
- G01R31/311—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/636—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited using an arrangement of pump beam and probe beam; using the measurement of optical non-linear properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/302—Contactless testing
- G01R31/303—Contactless testing of integrated circuits
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US38102310P | 2010-09-08 | 2010-09-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201607265WA true SG10201607265WA (en) | 2016-10-28 |
Family
ID=44651256
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201507213UA SG10201507213UA (en) | 2010-09-08 | 2011-09-08 | Laser assisted device alteration using two-photon absorption |
SG2011064391A SG179362A1 (en) | 2010-09-08 | 2011-09-08 | Laser assisted device alteration using two-photon absorption |
SG10201607265WA SG10201607265WA (en) | 2010-09-08 | 2011-09-08 | Laser assisted device alteration using two-photon absorption |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201507213UA SG10201507213UA (en) | 2010-09-08 | 2011-09-08 | Laser assisted device alteration using two-photon absorption |
SG2011064391A SG179362A1 (en) | 2010-09-08 | 2011-09-08 | Laser assisted device alteration using two-photon absorption |
Country Status (6)
Country | Link |
---|---|
US (1) | US8860447B2 (en) |
EP (1) | EP2428807A3 (en) |
JP (1) | JP5873669B2 (en) |
CN (1) | CN102401632B (en) |
SG (3) | SG10201507213UA (en) |
TW (1) | TWI440869B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10352995B1 (en) | 2018-02-28 | 2019-07-16 | Nxp Usa, Inc. | System and method of multiplexing laser triggers and optically selecting multiplexed laser pulses for laser assisted device alteration testing of semiconductor device |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2428807A3 (en) | 2010-09-08 | 2014-10-29 | DCG Systems, Inc. | Laser assisted fault localization using two-photon absorption |
US9201096B2 (en) | 2010-09-08 | 2015-12-01 | Dcg Systems, Inc. | Laser-assisted device alteration using synchronized laser pulses |
WO2013188046A1 (en) * | 2012-05-16 | 2013-12-19 | Dcg Systems, Inc. | Laser-assisted device alteration using synchronized laser pulses |
US9733297B2 (en) | 2013-02-19 | 2017-08-15 | Hamamatsu Photonics K.K. | Electric field concentration location observation device and electric field concentration location observation method |
SG11201507735RA (en) * | 2013-03-24 | 2015-10-29 | Dcg Systems Inc | Pulsed lada for acquisition of timing diagrams |
TWI619954B (en) * | 2014-10-16 | 2018-04-01 | Dcg系統公司 | Systems and method for laser voltage imaging |
JP6820184B2 (en) * | 2016-10-26 | 2021-01-27 | 浜松ホトニクス株式会社 | Semiconductor device inspection method and semiconductor device inspection equipment |
JP6927690B2 (en) | 2016-11-04 | 2021-09-01 | 浜松ホトニクス株式会社 | Semiconductor device inspection equipment and semiconductor device inspection method |
US10782343B2 (en) | 2018-04-17 | 2020-09-22 | Nxp Usa, Inc. | Digital tests with radiation induced upsets |
CN113162694B (en) * | 2021-02-23 | 2022-12-20 | 复旦大学 | Photon auxiliary vector millimeter wave signal generation system |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5095262A (en) | 1988-09-01 | 1992-03-10 | Photon Dynamics, Inc. | Electro-optic sampling system clock and stimulus pattern generator |
JP3352239B2 (en) * | 1994-08-19 | 2002-12-03 | 浜松ホトニクス株式会社 | Voltage measuring device |
US6316950B1 (en) * | 1997-05-15 | 2001-11-13 | Lucent Technologies Inc. | Method and apparatus for imaging semiconductor devices |
US6400165B1 (en) * | 2000-02-02 | 2002-06-04 | Lucent Technologies Inc. | Ultra-fast probe |
US6621275B2 (en) * | 2001-11-28 | 2003-09-16 | Optonics Inc. | Time resolved non-invasive diagnostics system |
US6882170B2 (en) * | 2002-12-05 | 2005-04-19 | Intel Corporation | Device speed alteration by electron-hole pair injection and device heating |
JP4421319B2 (en) * | 2004-02-13 | 2010-02-24 | 独立行政法人科学技術振興機構 | Laser apparatus and laser oscillation method |
US7516379B2 (en) * | 2004-04-06 | 2009-04-07 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Circuit and method for comparing circuit performance between functional and AC scan testing in an integrated circuit (IC) |
JP4683869B2 (en) * | 2004-07-08 | 2011-05-18 | 独立行政法人理化学研究所 | Semiconductor device failure diagnosis method and apparatus |
US7450245B2 (en) | 2005-06-29 | 2008-11-11 | Dcg Systems, Inc. | Method and apparatus for measuring high-bandwidth electrical signals using modulation in an optical probing system |
US9130344B2 (en) | 2006-01-23 | 2015-09-08 | Raydiance, Inc. | Automated laser tuning |
US8072589B2 (en) * | 2007-01-18 | 2011-12-06 | Dcg Systems, Inc. | System and method for photoemission-based defect detection |
JP2008300486A (en) * | 2007-05-30 | 2008-12-11 | Toshiba Corp | Testing system, method, and apparatus of semiconductor device |
FR2919402B1 (en) * | 2007-07-23 | 2009-10-30 | Eads Europ Aeronautic Defence | METHOD FOR TESTING A SOFTWARE APPLICATION |
US20090147255A1 (en) * | 2007-12-07 | 2009-06-11 | Erington Kent B | Method for testing a semiconductor device and a semiconductor device testing system |
TWI424479B (en) | 2008-02-29 | 2014-01-21 | Ind Tech Res Inst | Method for patterning crystalline indium tin oxide by using femtosecond laser |
JP2010181288A (en) * | 2009-02-05 | 2010-08-19 | Renesas Electronics Corp | Analyzer and analysis method of semiconductor integrated circuit |
JP2011075441A (en) * | 2009-09-30 | 2011-04-14 | Hamamatsu Photonics Kk | Semiconductor device failure analysis apparatus |
EP2428807A3 (en) | 2010-09-08 | 2014-10-29 | DCG Systems, Inc. | Laser assisted fault localization using two-photon absorption |
US9201096B2 (en) | 2010-09-08 | 2015-12-01 | Dcg Systems, Inc. | Laser-assisted device alteration using synchronized laser pulses |
WO2013188046A1 (en) | 2012-05-16 | 2013-12-19 | Dcg Systems, Inc. | Laser-assisted device alteration using synchronized laser pulses |
-
2011
- 2011-09-07 EP EP11180399.5A patent/EP2428807A3/en not_active Withdrawn
- 2011-09-07 TW TW100132283A patent/TWI440869B/en not_active IP Right Cessation
- 2011-09-08 SG SG10201507213UA patent/SG10201507213UA/en unknown
- 2011-09-08 JP JP2011195895A patent/JP5873669B2/en active Active
- 2011-09-08 SG SG2011064391A patent/SG179362A1/en unknown
- 2011-09-08 US US13/228,369 patent/US8860447B2/en active Active
- 2011-09-08 SG SG10201607265WA patent/SG10201607265WA/en unknown
- 2011-09-08 CN CN201110319332.2A patent/CN102401632B/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10352995B1 (en) | 2018-02-28 | 2019-07-16 | Nxp Usa, Inc. | System and method of multiplexing laser triggers and optically selecting multiplexed laser pulses for laser assisted device alteration testing of semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JP2012058247A (en) | 2012-03-22 |
SG10201507213UA (en) | 2015-10-29 |
JP5873669B2 (en) | 2016-03-01 |
SG179362A1 (en) | 2012-04-27 |
EP2428807A3 (en) | 2014-10-29 |
TW201211561A (en) | 2012-03-16 |
CN102401632A (en) | 2012-04-04 |
US20120056626A1 (en) | 2012-03-08 |
TWI440869B (en) | 2014-06-11 |
EP2428807A2 (en) | 2012-03-14 |
CN102401632B (en) | 2017-03-01 |
US8860447B2 (en) | 2014-10-14 |
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