NL7511804A - Modified silica sol for polishing silicon and germanium - remaining stable without depolymerisation at high pH for rapid polishing - Google Patents

Modified silica sol for polishing silicon and germanium - remaining stable without depolymerisation at high pH for rapid polishing

Info

Publication number
NL7511804A
NL7511804A NL7511804A NL7511804A NL7511804A NL 7511804 A NL7511804 A NL 7511804A NL 7511804 A NL7511804 A NL 7511804A NL 7511804 A NL7511804 A NL 7511804A NL 7511804 A NL7511804 A NL 7511804A
Authority
NL
Netherlands
Prior art keywords
polishing
depolymerisation
germanium
silica sol
sio2
Prior art date
Application number
NL7511804A
Other languages
Dutch (nl)
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Priority to NL7511804A priority Critical patent/NL7511804A/en
Publication of NL7511804A publication Critical patent/NL7511804A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing

Abstract

Si and Ge semiconductor materials are polished to a high degree of surface perfection using a modified colloidal SiO2-sol (a) having a pH 11-12.5, (11.8-12.3) (b) having an SiO2 concn. of 2-50 (5-30) wt.%, (c) in which the colloidal SiO2 particles are coated with chemically combined Al atoms to give a surface coverage of 1-50 (5-40) esp. 15-25 Al atoms on the surface/100 Si atoms on the surface of uncoated particles and (d) the particles having a specific surface area of 25-600 (59-300) esp. 75-200 m2/g. Polishing rates of about 150 mu/hr have been achieved, ef. 50 mu/hr for an unmodified SiO2. The high pH and stability also provide a high degree of scavenging and low haze.
NL7511804A 1975-10-08 1975-10-08 Modified silica sol for polishing silicon and germanium - remaining stable without depolymerisation at high pH for rapid polishing NL7511804A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
NL7511804A NL7511804A (en) 1975-10-08 1975-10-08 Modified silica sol for polishing silicon and germanium - remaining stable without depolymerisation at high pH for rapid polishing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7511804A NL7511804A (en) 1975-10-08 1975-10-08 Modified silica sol for polishing silicon and germanium - remaining stable without depolymerisation at high pH for rapid polishing

Publications (1)

Publication Number Publication Date
NL7511804A true NL7511804A (en) 1977-04-13

Family

ID=19824613

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7511804A NL7511804A (en) 1975-10-08 1975-10-08 Modified silica sol for polishing silicon and germanium - remaining stable without depolymerisation at high pH for rapid polishing

Country Status (1)

Country Link
NL (1) NL7511804A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0337556A1 (en) * 1988-04-13 1989-10-18 Koninklijke Philips Electronics N.V. Method of manufacturing a semiconductor body
EP0355913A1 (en) * 1988-08-16 1990-02-28 Koninklijke Philips Electronics N.V. Method of manufacturing a device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0337556A1 (en) * 1988-04-13 1989-10-18 Koninklijke Philips Electronics N.V. Method of manufacturing a semiconductor body
EP0355913A1 (en) * 1988-08-16 1990-02-28 Koninklijke Philips Electronics N.V. Method of manufacturing a device

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Legal Events

Date Code Title Description
BV The patent application has lapsed