NL7109647A - - Google Patents

Info

Publication number
NL7109647A
NL7109647A NL7109647A NL7109647A NL7109647A NL 7109647 A NL7109647 A NL 7109647A NL 7109647 A NL7109647 A NL 7109647A NL 7109647 A NL7109647 A NL 7109647A NL 7109647 A NL7109647 A NL 7109647A
Authority
NL
Netherlands
Application number
NL7109647A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7109647A publication Critical patent/NL7109647A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
NL7109647A 1970-07-23 1971-07-13 NL7109647A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702036585 DE2036585A1 (de) 1970-07-23 1970-07-23 Photopolymensierbares Kopiermaterial

Publications (1)

Publication Number Publication Date
NL7109647A true NL7109647A (xx) 1972-01-25

Family

ID=5777654

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7109647A NL7109647A (xx) 1970-07-23 1971-07-13

Country Status (12)

Country Link
US (1) US3753715A (xx)
AT (1) AT308784B (xx)
AU (1) AU3159171A (xx)
BE (1) BE770285A (xx)
CA (1) CA976799A (xx)
DE (1) DE2036585A1 (xx)
ES (1) ES393548A1 (xx)
FR (1) FR2099334A5 (xx)
GB (1) GB1364678A (xx)
NL (1) NL7109647A (xx)
SU (1) SU424373A3 (xx)
ZA (1) ZA714857B (xx)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3881942A (en) * 1971-12-23 1975-05-06 Borden Inc Fast drying, solvent-free printing ink
JPS5614976B2 (xx) * 1973-10-17 1981-04-07
US3873319A (en) * 1974-01-31 1975-03-25 Minnesota Mining & Mfg Dry-film negative photoresist having amidized styrene-maleic anhydride binder material
US4086093A (en) * 1974-10-11 1978-04-25 Toray Industries, Inc. Dry planographic printing plate
JPS53119025A (en) * 1977-03-26 1978-10-18 Sumitomo Chemical Co Light forming material
US4226927A (en) * 1978-05-10 1980-10-07 Minnesota Mining And Manufacturing Company Photographic speed transfer element with oxidized polyethylene stripping layer
US4615665A (en) * 1983-05-06 1986-10-07 Dentsply International Inc. Method for making dental prosthetic device with oxygen barrier layer and visible light irradiation to cure polymer
US4927737A (en) * 1985-08-02 1990-05-22 Hoechst Celanese Corporation Radiation polymerizable composition and element containing a photopolymerizable acrylic monomer
US5273862A (en) * 1988-07-29 1993-12-28 Hoechst Aktiengesellschaft Photopolymerizable recording material comprising a cover layer substantially impermeable to oxygen, binds oxygen and is soluble in water at 20°C.
DE3825836A1 (de) * 1988-07-29 1990-02-08 Hoechst Ag Photopolymerisierbares aufzeichnungsmaterial
GB2237023B (en) * 1989-10-06 1993-09-29 Toa Gosei Chem Ind A catalytic composition for photopolymerization and a photopolymerizable composition containing the same
US5151340A (en) * 1990-07-02 1992-09-29 Ocg Microelectronic Materials, Inc. Selected photoactive methylolated cyclohexanol compounds and their use in radiation-sensitive mixtures
US5225318A (en) * 1990-07-02 1993-07-06 Ocg Microelectronic Materials, Inc. Selected photoactive methylolated cyclohexanol compounds and their use in forming positive resist image patterns
US5677108A (en) * 1995-04-28 1997-10-14 Polaroid Corporation On-press removable quenching overcoat for lithographic plates
US5821030A (en) * 1995-07-20 1998-10-13 Kodak Polychrome Graphics Lithographic printing plates having a photopolymerizable imaging layer overcoated with an oxygen barrier layer
US5786127A (en) * 1996-08-15 1998-07-28 Western Litho Plate & Supply Co. Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
US5912105A (en) * 1996-12-23 1999-06-15 Agfa-Gevaert Thermally imageable material
DE19944073A1 (de) * 1999-09-14 2001-03-15 Agfa Gevaert Ag Strahlungsempfindliches Aufzeichnungsmaterial mit Deckschicht

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2732304A (en) * 1956-01-24 Poly vinyl butyral
NL286171A (xx) * 1961-12-01
US3240604A (en) * 1963-02-18 1966-03-15 Polaroid Corp Photographic products containing polytetrafluoroethylene layer
US3458311A (en) * 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers

Also Published As

Publication number Publication date
ES393548A1 (es) 1975-02-16
US3753715A (en) 1973-08-21
FR2099334A5 (xx) 1972-03-10
GB1364678A (en) 1974-08-29
SU424373A3 (ru) 1974-04-15
ZA714857B (en) 1972-04-26
AT308784B (de) 1973-07-25
AU3159171A (en) 1973-01-25
DE2036585A1 (de) 1972-02-03
BE770285A (fr) 1972-01-20
CA976799A (en) 1975-10-28

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