NL1032863A1 - Inrichting voor het opwekken van kortgolvige straling op basis van een door gasontlading opgewekt heet plasma, alsmede werkwijze voor de vervaardiging van een met koelmiddel doorstroomd elektrodehuis. - Google Patents

Inrichting voor het opwekken van kortgolvige straling op basis van een door gasontlading opgewekt heet plasma, alsmede werkwijze voor de vervaardiging van een met koelmiddel doorstroomd elektrodehuis.

Info

Publication number
NL1032863A1
NL1032863A1 NL1032863A NL1032863A NL1032863A1 NL 1032863 A1 NL1032863 A1 NL 1032863A1 NL 1032863 A NL1032863 A NL 1032863A NL 1032863 A NL1032863 A NL 1032863A NL 1032863 A1 NL1032863 A1 NL 1032863A1
Authority
NL
Netherlands
Prior art keywords
coolant
basis
production
gas discharge
plasma generated
Prior art date
Application number
NL1032863A
Other languages
English (en)
Other versions
NL1032863C2 (nl
Inventor
Sven Goetze
Harald Ebel
Juergen Kleinschmidt
Imtiaz Ahmad
Original Assignee
Xtreme Tech Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xtreme Tech Gmbh filed Critical Xtreme Tech Gmbh
Publication of NL1032863A1 publication Critical patent/NL1032863A1/nl
Application granted granted Critical
Publication of NL1032863C2 publication Critical patent/NL1032863C2/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00—Gas-filled discharge tubes with solid cathode
    • H01J17/02—Details
    • H01J17/28—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/24—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
    • H01J7/26—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space by flow of fluid through passages associated with tube or lamp
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
NL1032863A 2005-11-18 2006-11-14 Inrichting voor het opwekken van kortgolvige straling op basis van een door gasontlading opgewekt heet plasma, alsmede werkwijze voor de vervaardiging van een met koelmiddel doorstroomd elektrodehuis. NL1032863C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102005055686 2005-11-18
DE102005055686A DE102005055686B3 (de) 2005-11-18 2005-11-18 Anordnung zur Erzeugung kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas sowie Verfahren zur Herstellung von kühlmitteldurchströmten Elektrodengehäusen

Publications (2)

Publication Number Publication Date
NL1032863A1 true NL1032863A1 (nl) 2007-05-21
NL1032863C2 NL1032863C2 (nl) 2010-05-12

Family

ID=38038010

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1032863A NL1032863C2 (nl) 2005-11-18 2006-11-14 Inrichting voor het opwekken van kortgolvige straling op basis van een door gasontlading opgewekt heet plasma, alsmede werkwijze voor de vervaardiging van een met koelmiddel doorstroomd elektrodehuis.

Country Status (4)

Country Link
US (1) US7541604B2 (nl)
JP (1) JP4328798B2 (nl)
DE (1) DE102005055686B3 (nl)
NL (1) NL1032863C2 (nl)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005007884A1 (de) * 2005-02-15 2006-08-24 Xtreme Technologies Gmbh Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter (EUV-) Strahlung
DE102005055686B3 (de) * 2005-11-18 2007-05-31 Xtreme Technologies Gmbh Anordnung zur Erzeugung kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas sowie Verfahren zur Herstellung von kühlmitteldurchströmten Elektrodengehäusen
US8202272B2 (en) 2007-07-19 2012-06-19 Avedro, Inc. Eye therapy system
US8992516B2 (en) * 2007-07-19 2015-03-31 Avedro, Inc. Eye therapy system
US8348935B2 (en) 2008-01-23 2013-01-08 Avedro, Inc. System and method for reshaping an eye feature
US8469952B2 (en) 2008-01-23 2013-06-25 Avedro, Inc. System and method for positioning an eye therapy device
US8409189B2 (en) * 2008-01-23 2013-04-02 Avedro, Inc. System and method for reshaping an eye feature
US20090187173A1 (en) * 2008-01-23 2009-07-23 David Muller System and method for reshaping an eye feature
US20090224182A1 (en) * 2008-02-21 2009-09-10 Plex Llc Laser Heated Discharge Plasma EUV Source With Plasma Assisted Lithium Reflux
US8398628B2 (en) * 2008-09-19 2013-03-19 Avedro, Inc. Eye therapy system
JP2012504472A (ja) * 2008-10-01 2012-02-23 アヴェドロ・インコーポレーテッド 眼治療システム
JP2012508087A (ja) * 2008-11-11 2012-04-05 アヴェドロ・インコーポレーテッド 眼治療システム
TWI400739B (zh) * 2008-11-19 2013-07-01 Ind Tech Res Inst 陰極放電裝置
US20100280509A1 (en) * 2009-04-02 2010-11-04 Avedro, Inc. Eye Therapy System
US8712536B2 (en) * 2009-04-02 2014-04-29 Avedro, Inc. Eye therapy system
US20100256626A1 (en) * 2009-04-02 2010-10-07 Avedro, Inc. Eye therapy system
WO2011053768A2 (en) * 2009-10-30 2011-05-05 Avedro, Inc. System and method for stabilizing corneal tissue after treatment
US20110192348A1 (en) * 2010-02-05 2011-08-11 Atomic Energy Council-Institute Of Nuclear Energy Research RF Hollow Cathode Plasma Generator
DE102010050947B4 (de) 2010-11-10 2017-07-13 Ushio Denki Kabushiki Kaisha Verfahren und Anordnung zur Stabilisierung des Quellortes der Erzeugung extrem ultravioletter (EUV-)Strahlung auf Basis eines Entladungsplasmas
CN103903934B (zh) * 2012-12-26 2016-08-03 核工业西南物理研究院 一种用于大功率高压电真空器件的油冷却器
KR101872752B1 (ko) 2013-12-13 2018-06-29 에이에스엠엘 네델란즈 비.브이. 방사선 소스, 계측 장치, 리소그래피 시스템 및 디바이스 제조 방법
WO2015086258A1 (en) 2013-12-13 2015-06-18 Asml Netherlands B.V. Radiation source, metrology apparatus, lithographic system and device manufacturing method
GB2552711B (en) * 2016-08-05 2020-04-22 Hydrogen Universe Ltd Energy transfer method and system
EP3416181A1 (en) * 2017-06-15 2018-12-19 Koninklijke Philips N.V. X-ray source and method for manufacturing an x-ray source

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7180081B2 (en) * 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source
RU2206186C2 (ru) * 2000-07-04 2003-06-10 Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований Способ получения коротковолнового излучения из газоразрядной плазмы и устройство для его реализации
DE10151080C1 (de) * 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung
SG129259A1 (en) * 2002-10-03 2007-02-26 Asml Netherlands Bv Radiation source lithographic apparatus, and device manufacturing method
US7002168B2 (en) * 2002-10-15 2006-02-21 Cymer, Inc. Dense plasma focus radiation source
DE10260458B3 (de) * 2002-12-19 2004-07-22 Xtreme Technologies Gmbh Strahlungsquelle mit hoher durchschnittlicher EUV-Strahlungsleistung
DE102005055686B3 (de) * 2005-11-18 2007-05-31 Xtreme Technologies Gmbh Anordnung zur Erzeugung kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas sowie Verfahren zur Herstellung von kühlmitteldurchströmten Elektrodengehäusen

Also Published As

Publication number Publication date
DE102005055686B3 (de) 2007-05-31
JP2007142432A (ja) 2007-06-07
NL1032863C2 (nl) 2010-05-12
US20070114946A1 (en) 2007-05-24
US7541604B2 (en) 2009-06-02
JP4328798B2 (ja) 2009-09-09

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