KR970012002A - Photomasks for Semiconductor Device Manufacturing - Google Patents
Photomasks for Semiconductor Device Manufacturing Download PDFInfo
- Publication number
- KR970012002A KR970012002A KR1019950028665A KR19950028665A KR970012002A KR 970012002 A KR970012002 A KR 970012002A KR 1019950028665 A KR1019950028665 A KR 1019950028665A KR 19950028665 A KR19950028665 A KR 19950028665A KR 970012002 A KR970012002 A KR 970012002A
- Authority
- KR
- South Korea
- Prior art keywords
- pattern
- semiconductor device
- line
- photomask
- chrome
- Prior art date
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
1. 청구 범위에 기재된 발명이 속한 기술분야1. TECHNICAL FIELD OF THE INVENTION
반도체 소자 제조용 포토마스크Photomasks for Semiconductor Device Manufacturing
2. 발명이 해결하려고 하는 기술적 과제2. The technical problem to be solved by the invention
반도체 소자 제조를 위한 노광 공정시 HALF-TONE PSM 방식을 이용하는 경우 가장 큰 문제점인 사이드로브(SIDE LOBE) 현상에 의해 노광 패턴의 해상도가 나빠지는 등의 문제점이 있었음.When the HALF-TONE PSM method is used in the exposure process for manufacturing a semiconductor device, there is a problem such that the resolution of the exposure pattern is deteriorated due to the side lobe phenomenon, which is the biggest problem.
3. 발명의 해결 방볍의 요지3. Summary of solution of invention
형성하고자 하는 마스크 패턴의 크롬 라인 지역에 대응하는 영역을 공간 라인과 크롬라인이 반복되는 패턴으로 형성한 보조 마스크를 이용하여 사이드 로브 현상을 제거하고자 함.The side lobe phenomenon is removed by using an auxiliary mask in which a region corresponding to the chrome line region of the mask pattern to be formed is formed in a pattern in which the space line and the chrome line are repeated.
4. 발명의 중요한 용도4. Important uses of the invention
반도체소자 제조시 노광 공정에 이용됨.Used in the exposure process in the manufacture of semiconductor devices.
※선택도 제 2도※ Selectivity second degree
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제 2도는 본 발명에 따른 포토마스크 패턴을 도시하는 도면.2 shows a photomask pattern in accordance with the present invention.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950028665A KR970012002A (en) | 1995-08-30 | 1995-08-30 | Photomasks for Semiconductor Device Manufacturing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950028665A KR970012002A (en) | 1995-08-30 | 1995-08-30 | Photomasks for Semiconductor Device Manufacturing |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970012002A true KR970012002A (en) | 1997-03-29 |
Family
ID=66597140
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950028665A KR970012002A (en) | 1995-08-30 | 1995-08-30 | Photomasks for Semiconductor Device Manufacturing |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970012002A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100723466B1 (en) * | 2001-01-06 | 2007-05-30 | 삼성전자주식회사 | Photomask for dual damascene process, method thereof and method of forming dual damascene interconnection using the photomask |
-
1995
- 1995-08-30 KR KR1019950028665A patent/KR970012002A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100723466B1 (en) * | 2001-01-06 | 2007-05-30 | 삼성전자주식회사 | Photomask for dual damascene process, method thereof and method of forming dual damascene interconnection using the photomask |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |