KR940016646A - Alignment Testing Method - Google Patents

Alignment Testing Method Download PDF

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Publication number
KR940016646A
KR940016646A KR1019920024499A KR920024499A KR940016646A KR 940016646 A KR940016646 A KR 940016646A KR 1019920024499 A KR1019920024499 A KR 1019920024499A KR 920024499 A KR920024499 A KR 920024499A KR 940016646 A KR940016646 A KR 940016646A
Authority
KR
South Korea
Prior art keywords
testing method
vernier
bar
wafer
alignment testing
Prior art date
Application number
KR1019920024499A
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Korean (ko)
Other versions
KR960004643B1 (en
Inventor
황준
Original Assignee
김주용
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김주용, 현대전자산업 주식회사 filed Critical 김주용
Priority to KR1019920024499A priority Critical patent/KR960004643B1/en
Publication of KR940016646A publication Critical patent/KR940016646A/en
Application granted granted Critical
Publication of KR960004643B1 publication Critical patent/KR960004643B1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

본 발명은 포토마스크 공정 작업시 실시하는 얼라인먼트(alignment) 테스팅 방법에 관한 것으로, 특히 마스크 상에 CD바/버어니어(3)를 웨이퍼(5)의 스크라이브 라인(1)에 맞추어 정렬 되도록 형성하는 제 1 단계, 상기 제 1 단계 후에 노광기의 브레이드(4)를 사용하여 웨이퍼(5)에 상기 CD바/버어니어(3)만을 노광시키는 제 2 단계, 상기 제 2 단계 후에 상기 CD바/버어니어(3) 해당하는 웨이퍼(5) 지역만을 현상하는 제 3 단계를 포함하여 이루어지는 것을 특징으로 하는 얼라인먼트 테스팅 방법에 관한 것이다.TECHNICAL FIELD The present invention relates to an alignment testing method performed during a photomask processing operation, and in particular, an agent for forming a CD bar / vernier 3 on a mask to be aligned with the scribe line 1 of the wafer 5. Step 1, a second step of exposing only the CD bar / vernier 3 to the wafer 5 using the braid 4 of the exposure machine after the first step, and the CD bar / vernier after the second step ( 3) an alignment testing method comprising a third step of developing only a region of a corresponding wafer (5).

Description

얼라인먼트 테스팅 방법Alignment Testing Method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제 2 도는 본 발명에 따른 얼라인먼트 테스팅 형성도.2 is an alignment testing formation diagram according to the present invention.

Claims (1)

얼라인먼트(alignment) 테스팅 방법에 있어서, 마스크 상에 CD바/버어니어(3)를 웨이퍼(5)의 스크라이브 라인(1)에 맞추어 정렬 되도록 형성하는 제 1 단계, 상기 제 1 단계 후에 노광기의 브레이드(4)를 사용하여 웨이퍼(5)에 상기 CD바/버어니어(3)만을 노광시키는 제 2 단계, 상기 제 2 단계 후에 상기 CD바/버어니어(3) 해당하는 웨이퍼(5) 지역만을 현상하는 제 3 단계를 포함하여 이루어지는 것을 특징으로 하는 얼라인먼트 테스팅 방법.In the alignment testing method, the first step of forming the CD bar / vernier 3 on the mask to be aligned with the scribe line 1 of the wafer 5, the braid of the exposure machine after the first step ( 4) using the second step of exposing only the CD bar / vernier 3 to the wafer 5, developing only the area of the wafer 5 corresponding to the CD bar / vernier 3 after the second step. Alignment testing method comprising a third step. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920024499A 1992-12-16 1992-12-16 Method of testing alignment KR960004643B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019920024499A KR960004643B1 (en) 1992-12-16 1992-12-16 Method of testing alignment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019920024499A KR960004643B1 (en) 1992-12-16 1992-12-16 Method of testing alignment

Publications (2)

Publication Number Publication Date
KR940016646A true KR940016646A (en) 1994-07-23
KR960004643B1 KR960004643B1 (en) 1996-04-11

Family

ID=19345783

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920024499A KR960004643B1 (en) 1992-12-16 1992-12-16 Method of testing alignment

Country Status (1)

Country Link
KR (1) KR960004643B1 (en)

Also Published As

Publication number Publication date
KR960004643B1 (en) 1996-04-11

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