KR20210059591A - An optic and method for producing the same - Google Patents

Abstract

The present invention relates to a method for producing an optical device, which uses a plurality of intermediate bodies to produce an optical device and comprises the following steps of: patterning a substrate to form a first intermediate body, wherein the first intermediate body has a first surface with a first gradient and includes a first burr and a second burr on the first surface; forming a second intermediate body based on the first intermediate body, wherein the second intermediate body has a second surface with a second gradient and includes a third burr and a fourth burr on the second surface; polishing the second intermediate body in order to remove the third burr, wherein the third burr is based on the first burr; forming a third intermediate body based on the second intermediate body where the third burr is removed, wherein the third intermediate body has a third surface with the first gradient and includes a fifth burr on the third surface; polishing the third intermediate body in order to remove the fifth burr, wherein the fifth burr is based on the fourth burr; forming a mold based on the third intermediate body where the fifth burr is removed; and producing an optical device having surfaces with the first gradient or the second gradient based on the mold. According to the present invention, the surface roughness of an optical device can be made uniform.

Description

Optics and their manufacturing method {AN OPTIC AND METHOD FOR PRODUCING THE SAME}

The present invention relates to optics, and more particularly, to an efficient method for removing burrs that may occur during manufacture of optics.

In the process of manufacturing optics, burrs may occur. A method of removing burrs that makes the surface roughness of the optics non-uniform may be essential in the method of manufacturing the optics. The optic from which the burrs have been removed has a uniform surface roughness and can refract the laser beam in a desired direction.

An object of the present invention relates to a method of making the surface roughness of an optic uniform.

An object of the present invention relates to a method of efficiently removing burrs existing on the surface of an optic.

In the optical manufacturing method according to an embodiment, in the method of manufacturing optics using a plurality of intermediates, a first intermediate body by patterning a substrate-the first intermediate body includes a first surface having a first slope, and the first Forming a first burr and a second burr on the first surface, the second intermediate based on the first intermediate, the second intermediate comprising a second surface having a second slope, Forming a third burr and a fourth burr on the second surface-polishing the second intermediate to remove the third burr-the third burr is based on the first burr , A third intermediate based on the second intermediate from which the third burrs have been removed-the third intermediate includes a third surface having the first slope, and includes a fifth burr on the third surface- Forming, polishing the third intermediate to remove the fifth burr-the fifth burr is based on the fourth burr -, a mold based on the third intermediate from which the fifth burr has been removed And forming an optic including a surface having the first slope or the second slope based on the mold.

In another exemplary embodiment, in a method of manufacturing an optic using a plurality of intermediates, the method of manufacturing an optic according to another embodiment includes the steps of forming a first intermediate by patterning a substrate, a second intermediate based on the first intermediate-the second The intermediate comprises a first surface having a first slope, and a first burr and a second burr are included on the first surface, the second intermediate body to remove the first burr Polishing, the third intermediate based on the second intermediate from which the first burrs have been removed-the third intermediate includes a second surface having a second slope, and a third burr is formed on the second surface. Polishing the third intermediate to remove the third burr, wherein the third burr is based on the second burr, wherein the third burr is removed from the third intermediate. Forming a mold based on the mold, and manufacturing an optic including a surface having the first slope or the second slope based on the mold.

An optic according to an embodiment is an optic manufactured based on a substrate, a plurality of intermediates, and a mold, wherein the plurality of intermediates include a first intermediate formed by patterning the substrate, a second intermediate formed based on the first intermediate, and the It includes a third intermediate formed on the basis of the second intermediate, the first intermediate includes a first surface having a first slope, a first burr and a second burr are included on the first surface, , The second intermediate body includes a second surface having a second slope, and a third burr and a fourth burr are included on the second surface, and the third intermediate body is the third burr by a primary polishing process. -The third burr is based on the first burr-is formed on the basis of the second intermediate body from which-is removed, the third intermediate body comprises a third surface having the first slope, on the third surface A fifth burr is included, and the mold is formed on the basis of the third intermediate from which the fifth burr-the fifth burr is based on the fourth burr-has been removed by a secondary polishing process, and the optics It may include a surface having the first slope or the second slope based on the mold.

In the lidar apparatus according to an embodiment, a laser output unit for irradiating a laser toward an object, an optic for steering a laser beam output from the laser output unit, and a laser irradiated from the laser output unit are reflected back to the object. It includes a laser light receiving unit for receiving the coming laser, and the optics are manufactured based on a substrate, a plurality of intermediates, and a mold, wherein the plurality of intermediates are a first intermediate formed by patterning the substrate, and formed based on the first intermediate. A second intermediate and a third intermediate formed on the basis of the second intermediate, wherein the first intermediate includes a first surface having a first slope, and a first burr and a first burr on the first surface 2 burrs are included, and the second intermediate body includes a second surface having a second slope, a third burr and a fourth burr are included on the second surface, and the third intermediate body is subjected to a primary polishing process. The third burr-the third burr is based on the first burr-is formed on the basis of the removed second intermediate, the third intermediate includes a third surface having the first slope, the A fifth burr is included on the third surface, and the mold is formed on the basis of the third intermediate from which the fifth burr-the fifth burr is based on the fourth burr-has been removed by a secondary polishing process, , The optic may include a surface having the first slope or the second slope based on the mold.

According to an embodiment of the present invention, a method of making the surface roughness of an optic uniform may be provided.

According to an embodiment of the present invention, a method of efficiently removing burrs existing on the surface of an optic may be provided.

1 is a diagram for describing a lidar device according to an exemplary embodiment.
2 is a diagram illustrating a lidar device according to an embodiment.
3 is a diagram illustrating a lidar device according to another embodiment.
4 is a view showing a laser output unit according to an embodiment.
5 is a diagram showing a VCSEL unit according to an embodiment.
6 is a diagram illustrating a VCSEL array according to an embodiment.
7 is a side view showing a VCSEL array and a metal contact according to an embodiment.
8 is a diagram illustrating a VCSEL array according to an embodiment.
9 is a diagram for describing a lidar device according to an exemplary embodiment.
10 is a diagram for describing a collimation component according to an embodiment.
11 is a diagram for describing a collimation component according to an embodiment.
12 is a diagram for describing a collimation component according to an embodiment.
13 is a diagram for describing a collimation component according to an embodiment.
14 is a diagram for describing a steering component according to an exemplary embodiment.
15 and 16 are diagrams for describing a steering component according to an exemplary embodiment.
17 is a diagram for describing a steering component according to an exemplary embodiment.
18 is a diagram for describing a steering component according to an exemplary embodiment.
19 is a diagram for describing a meta surface according to an exemplary embodiment.
20 is a diagram for describing a metasurface according to an exemplary embodiment.
21 is a diagram for describing a meta surface according to an exemplary embodiment.
22 is a diagram for describing a rotating faceted mirror according to an exemplary embodiment.
23 is a top view for explaining a viewing angle of a rotating faceted mirror in which the number of reflective surfaces is three and the upper and lower portions of the body are equilateral triangles.
24 is a top view for explaining the viewing angle of a rotating multi-faceted mirror in which the number of reflective surfaces is four and the upper and lower portions of the body are square.
25 is a top view for explaining the viewing angle of a rotating multi-faceted mirror in which the number of reflective surfaces is 5 and the upper and lower portions of the body are regular pentagons.
26 is a view for explaining an irradiation portion and a light receiving portion of a multi-faceted rotating mirror according to an exemplary embodiment.
27 is a diagram for describing an optical unit according to an exemplary embodiment.
28 is a diagram for describing an optical unit according to an exemplary embodiment.
29 is a diagram for describing a meta component according to an embodiment.
30 is a diagram for describing a meta component according to another embodiment.
31 is a diagram for describing an SPAD array according to an embodiment.
32 is a diagram for describing a histogram of SPAD according to an embodiment.
33 is a diagram for describing a SiPM according to an embodiment.
34 is a diagram for describing a histogram of SiPM according to an exemplary embodiment.
35 is a diagram for describing a semi-flash lidar according to an embodiment.
36 is a diagram for describing a configuration of a semi-flash lidar according to an embodiment.
37 is a diagram for describing a semi-flash lidar according to another embodiment.
38 is a diagram for describing a configuration of a semi-flash lidar according to another embodiment.
39 is a view showing burrs present on the surface of an optical or intermediate body.
40 is a flowchart illustrating a method of manufacturing an optic according to an exemplary embodiment.
41 is a diagram for describing a method of manufacturing an optic according to an exemplary embodiment.
42 is a flowchart illustrating a method of manufacturing an optic including a polishing process according to an exemplary embodiment.
43 is a diagram for describing a method of manufacturing an optic including a polishing process according to an exemplary embodiment.
44 is a flowchart illustrating a method of manufacturing an optic including a polishing process according to another exemplary embodiment.
45 is a diagram for describing a method of manufacturing an optic including a polishing process according to another exemplary embodiment.
46 is a diagram for describing a positional relationship of a burr according to an exemplary embodiment.
47 is a diagram for describing a shape of a burr according to an exemplary embodiment.
48 is a diagram for describing a correlation between burrs according to an exemplary embodiment.

The embodiments described in the present specification are intended to clearly explain the spirit of the present invention to those of ordinary skill in the technical field to which the present invention belongs, and thus the present invention is not limited to the embodiments described in the present specification. The scope should be construed as including modifications or variations that do not depart from the spirit of the present invention.

The terms used in this specification have been selected as general terms that are currently widely used in consideration of functions in the present invention, but this varies depending on the intention of a person of ordinary skill in the art, precedents, or the emergence of new technologies. I can. However, if a specific term is defined and used in an arbitrary meaning unlike this, the meaning of the term will be separately described. Therefore, the terms used in the present specification should be interpreted based on the actual meaning of the term and the entire contents of the present specification, not a simple name of the term.

The drawings attached to the present specification are for easy explanation of the present invention, and the shapes shown in the drawings may be exaggerated and displayed as necessary to aid understanding of the present invention, so the present invention is not limited by the drawings.

In the present specification, when it is determined that a detailed description of a well-known configuration or function related to the present invention may obscure the subject matter of the present invention, a detailed description thereof will be omitted as necessary.

According to an embodiment, in a method of manufacturing an optic using a plurality of intermediates, a first intermediate body by patterning a substrate-the first intermediate body includes a first surface having a first slope, and on the first surface Including a first burr and a second burr-forming a second intermediate body based on the first intermediate body-the second intermediate body includes a second surface having a second slope, and the second Forming a third burr and a fourth burr on the surface-polishing the second intermediate to remove the third burr-the third burr is based on the first burr, the second burr 3 Forming a third intermediate based on the second intermediate from which the burrs have been removed-the third intermediate includes a third surface having the first slope, and includes a fifth burr on the third surface. Step, polishing the third intermediate to remove the fifth burr-the fifth burr is based on the fourth burr-forming a mold based on the third intermediate from which the fifth burr has been removed An optical manufacturing method may be provided, including the step of, and manufacturing an optic including a surface having the first slope or the second slope based on the mold.

Here, the optic may be a prism.

Here, a sine value of the first burr with respect to the first surface may be smaller than a sine value of the second burr.

Here, a cosine value of the first burr with respect to the first surface may be smaller than a cosine value of the second burr.

Here, a sine value of the third burr with respect to the second surface may be greater than a sine value of the fourth burr.

Here, a cosine value of the third burr with respect to the second surface may be greater than a cosine value of the fourth burr.

Here, the vertical position of the first burr from the lower base of the first intermediate body may be smaller than the vertical position of the second burr.

Here, the vertical position of the third burr from the lower base of the second intermediate body may be greater than the vertical position of the fourth burr.

Here, the first burr may have one of a concave portion and a convex portion on the first surface, and the third burr may have another shape on the second surface.

Here, the absolute value of the first slope may be the same as the absolute value of the second slope.

Here, a material of the substrate and a material of the second intermediate may be different.

Here, the second intermediate may include at least one of nickel, chromium, and titanium.

Here, the first intermediate may include a fourth surface having the fourth inclination so that an optic having a surface having a fourth inclination different from the first inclination is formed.

According to another embodiment, in a method of manufacturing an optic using a plurality of intermediates, the step of forming a first intermediate by patterning a substrate, a second intermediate based on the first intermediate-the second intermediate 1 comprising a first surface having an inclination, and including a first burr and a second burr on the first surface, polishing the second intermediate to remove the first burr Step, A third intermediate based on the second intermediate from which the first burrs have been removed-The third intermediate includes a second surface having a second slope, and includes a third burr on the second surface- Forming, polishing the third intermediate to remove the third burr-the third burr is based on the second burr -, a mold based on the third intermediate from which the third burr has been removed A method of manufacturing optics may be provided, including forming an optic, and fabricating an optic including a surface having the first tilt or the second tilt based on the mold.

According to an embodiment, as an optic manufactured based on a substrate, a plurality of intermediates, and a mold, the plurality of intermediates include a first intermediate formed by patterning the substrate, a second intermediate formed based on the first intermediate, and the second intermediate. 2 It includes a third intermediate formed on the basis of the intermediate, the first intermediate includes a first surface having a first slope, a first burr and a second burr are included on the first surface, The second intermediate body includes a second surface having a second slope, a third burr and a fourth burr are included on the second surface, and the third intermediate body is the third burr- The third burr is formed on the basis of the second intermediate body from which-based on the first burr-is removed, and the third intermediate body comprises a third surface having the first slope, and a first burr is formed on the third surface. 5 burrs are included, and the mold is formed on the basis of the third intermediate body from which the fifth burr-the fifth burr is based on the fourth burr-is removed by a secondary polishing process, and the optic is the mold An optic including a surface having the first slope or the second slope based on may be provided.

According to an embodiment, a laser output unit that irradiates a laser toward an object, an optic that steers a laser beam output from the laser output unit, and a laser that is reflected from the laser output unit and returns to the object A laser light receiving unit for receiving light, wherein the optics are manufactured based on a substrate, a plurality of intermediates, and a mold, wherein the plurality of intermediates are a first intermediate formed by patterning the substrate, and a second intermediate formed based on the first intermediate And a third intermediate formed on the basis of the second intermediate, wherein the first intermediate includes a first surface having a first slope, and a first burr and a second burr are formed on the first surface. And the second intermediate body includes a second surface having a second slope, and a third burr and a fourth burr are included on the second surface, and the third intermediate body is subjected to the first polishing process. The third burr-the third burr is based on the first burr-is formed on the basis of the second intermediate body from which the third burr has been removed, and the third intermediate body comprises a third surface having the first slope, and the third surface A fifth burr is included on the top, and the mold is formed on the basis of the third intermediate body from which the fifth burr-the fifth burr is based on the fourth burr-is removed by a secondary polishing process, and the optics A lidar device including a surface having the first slope or the second slope based on the mold may be provided.

Hereinafter, the lidar device of the present invention will be described.

)로 표현될 수 있다. 다만, 이에 한정되는 것은 아니며, 직교좌표계(X, Y, Z) 또는 원통 좌표계(r, θ, z) 등으로 표현될 수 있다.The lidar device is a device for detecting a distance to an object and a location of the object using a laser. For example, the lidar device may output a laser, and when the output laser is reflected from the object, the reflected laser may be received to measure the distance between the object and the lidar device and the position of the object. In this case, the distance and position of the object may be expressed through a coordinate system. For example, the distance and position of the object are in the spherical coordinate system (r, θ,

) Can be expressed. However, the present invention is not limited thereto, and may be expressed in a Cartesian coordinate system (X, Y, Z) or a cylindrical coordinate system (r, θ, z).

In addition, the lidar device may use a laser that is output from the lidar device and reflected from the object in order to measure the distance of the object.

The lidar apparatus according to an exemplary embodiment may use a time of flight (TOF) of the laser until it is sensed after the laser is output in order to measure the distance of the object. For example, the lidar device may measure the distance of the object by using a difference between a time value based on an output time of an output laser and a time value based on a sensed time of a laser reflected and sensed by the object.

In addition, the LiDAR device may measure the distance of the object by using a difference between a time value immediately sensed by the output laser without passing through the object and a time value based on the sensed time of the laser reflected and sensed by the object.

There may be a difference between the timing at which the lidar device transmits the trigger signal for emitting the laser beam by the control unit and the actual timing at which the laser beam is output from the actual laser output device. Since the laser beam is not actually output between the timing of the trigger signal and the timing of the actual light emission, accuracy may decrease if included in the flight time of the laser.

In order to improve the accuracy in measuring the flight time of the laser beam, the actual outgoing timing of the laser beam can be used. However, it may be difficult to determine when the laser beam actually exits. Therefore, the laser beam output from the laser output element must be transmitted to the sensor unit as soon as it is output or without passing through the object.

For example, since an optic is disposed on the laser output element, a laser beam output from the laser output element by the optic may be immediately sensed by a light receiving unit without passing through an object. The optic may be a mirror, a lens, a prism, or a meta surface, but is not limited thereto. The number of optics may be one, but there may be a plurality of optics.

In addition, for example, a sensor unit is disposed above the laser output device, so that a laser beam output from the laser output device may be immediately sensed by the sensor unit without passing through an object. The sensor unit may be spaced apart from the laser output device by a distance of 1mm, 1um, 1nm, etc., but is not limited thereto. Alternatively, the sensor unit may be disposed adjacent to the laser output device without being spaced apart. An optic may exist between the sensor unit and the laser output device, but is not limited thereto.

In addition, in order to measure the distance of the object, the LiDAR device according to an embodiment may use a triangulation method, an interferometry method, a phase shift measurement, etc., in addition to the flight time. Not limited.

The lidar device according to an embodiment may be installed in a vehicle. For example, the lidar device may be installed on the roof, hood, headlamp, or bumper of a vehicle.

In addition, a plurality of lidar devices according to an embodiment may be installed in a vehicle. For example, when two lidar devices are installed on the roof of a vehicle, one lidar device may be for observing the front and the other may be for observing the rear, but is not limited thereto. In addition, for example, when two lidar devices are installed on the roof of a vehicle, one lidar device may be for observing the left side and the other one for observing the right side, but is not limited thereto.

In addition, the lidar device according to an embodiment may be installed in a vehicle. For example, when the lidar device is installed inside the vehicle, it may be for recognizing a driver's gesture while driving, but is not limited thereto. In addition, for example, when the lidar device is installed inside the vehicle or outside the vehicle, it may be for recognizing a driver's face, but is not limited thereto.

The lidar device according to an embodiment may be installed on an unmanned aerial vehicle. For example, the lidar device is an unmanned aerial vehicle system (UAV system), a drone, a remote piloted vehicle (RPV), an unmanned aerial vehicle system (UAVs), an unmanned aircraft system (UAS), a remote piloted air/aerial system (RPAV). Vehicle) or RPAS (Remote Piloted Aircraft System).

In addition, a plurality of lidar devices according to an embodiment may be installed on the unmanned aerial vehicle. For example, when two lidar devices are installed on an unmanned aerial vehicle, one lidar device may be for observing the front and the other may be for observing the rear, but is not limited thereto. In addition, for example, when two lidar devices are installed on the unmanned aerial vehicle, one lidar device may be for observing the left side and the other one for observing the right side, but is not limited thereto.

The lidar device according to an embodiment may be installed in a robot. For example, the lidar device may be installed in a personal robot, a professional robot, a public service robot, another industrial robot, or a manufacturing robot.

In addition, a plurality of lidar devices according to an embodiment may be installed on the robot. For example, when two lidar devices are installed in the robot, one lidar device may be for observing the front side and the other one for observing the rear side, but is not limited thereto. In addition, for example, when two lidar devices are installed in the robot, one lidar device may be for observing the left and the other may be for observing the right, but is not limited thereto.

In addition, the lidar device according to an embodiment may be installed in the robot. For example, when a lidar device is installed in a robot, it may be for recognizing a human face, but is not limited thereto.

In addition, the lidar device according to an embodiment may be installed for industrial security. For example, LiDAR devices can be installed in smart factories for industrial security.

In addition, a plurality of lidar devices according to an embodiment may be installed in a smart factory for industrial security. For example, when two lidar devices are installed in a smart factory, one lidar device may be for observing the front and the other may be for observing the rear, but is not limited thereto. In addition, for example, when two lidar devices are installed in a smart factory, one lidar device may be for observing the left and the other may be for observing the right, but is not limited thereto.

In addition, the lidar device according to an embodiment may be installed for industrial security. For example, when the lidar device is installed for industrial security, it may be for recognizing a person's face, but is not limited thereto.

Hereinafter, various embodiments of the components of the lidar device will be described in detail.

1 is a diagram for describing a lidar device according to an exemplary embodiment.

Referring to FIG. 1, a lidar device 1000 according to an embodiment may include a laser output unit 100.

In this case, the laser output unit 100 according to an embodiment may emit a laser.

In addition, the laser output unit 100 may include one or more laser output devices. For example, the laser output unit 100 may include a single laser output device, may include a plurality of laser output devices, and in the case of including a plurality of laser output devices, a plurality of laser output devices You can configure an array.

In addition, the laser output unit 100 is a laser diode (LD), a solid-state laser, a high power laser, a light entitling diode (LED), a vertical cavity surface emitting laser (VCSEL), an external cavity diode laser (ECDL). It may include, but is not limited thereto.

In addition, the laser output unit 100 may output a laser having a predetermined wavelength. For example, the laser output unit 100 may output a laser of a 905 nm band or a laser of a 1550 nm band. Also, for example, the laser output unit 100 may output a laser in a 940 nm band. Also, for example, the laser output unit 100 may output a laser including a plurality of wavelengths between 800 nm and 1000 nm. In addition, when the laser output unit 100 includes a plurality of laser output devices, some of the plurality of laser output devices may output a laser of a 905 nm band, and other parts may output a laser of a 1500 nm band.

Referring back to FIG. 1, the lidar apparatus 1000 according to an exemplary embodiment may include an optical unit 200.

In the description of the present invention, the optical unit may be variously expressed as a steering unit and a scan unit, but is not limited thereto.

In this case, the optical unit 200 according to an embodiment may change the flight path of the laser. For example, the optical unit 200 may change the flight path of the laser so that the laser emitted from the laser output unit 100 faces the scan area. Also, for example, the flight path of the laser may be changed so that the laser reflected from the object located in the scan area is directed to the sensor unit.

In addition, the optical unit 200 according to an embodiment may change the flight path of the laser by reflecting the laser. For example, the optical unit 200 may reflect a laser emitted from the laser output unit 100 and change the flight path of the laser so that the laser faces the scan area. Also, for example, the flight path of the laser may be changed so that the laser reflected from the object located in the scan area is directed to the sensor unit.

In addition, the optical unit 200 according to an exemplary embodiment may include various optical means to reflect a laser. For example, the optics 200 may include a mirror, a resonance scanner, a MEMS mirror, a Voice Coil Motor (VCM), a polygonal mirror, a rotating mirror, or It may include a galvano mirror or the like, but is not limited thereto.

In addition, the optical unit 200 according to an embodiment may change the flight path of the laser by refracting the laser. For example, the optical unit 200 may refract the laser emitted from the laser output unit 100 to change the flight path of the laser so that the laser is directed toward the scan area. Also, for example, the flight path of the laser may be changed so that the laser reflected from the object located in the scan area is directed to the sensor unit.

In addition, the optical unit 200 according to an exemplary embodiment may include various optical means to refract a laser. For example, the optical unit 200 may include, but is not limited to, a lens, a prism, a micro lens, a microfluidie lens, and the like.

In addition, the optical unit 200 according to an embodiment may change the flight path of the laser by changing the phase of the laser. For example, the optical unit 200 may change the phase of the laser emitted from the laser output unit 100 to change the flight path of the laser so that the laser faces the scan area. Also, for example, the flight path of the laser may be changed so that the laser reflected from the object located in the scan area is directed to the sensor unit.

In addition, the optical unit 200 according to an embodiment may include various optical means to change the phase of the laser. For example, the optical unit 200 may include an optical phased array (OPA), a meta lens, or a meta surface, but is not limited thereto.

In addition, the optical unit 200 according to an exemplary embodiment may include one or more optical means. In addition, for example, the optical unit 200 may include a plurality of optical means.

Referring back to FIG. 1, the lidar device 100 according to an embodiment may include a sensor unit 300.

In the description of the present invention, the sensor unit may be variously expressed as a light receiving unit and a receiving unit, but is not limited thereto.

In this case, the sensor unit 300 according to an embodiment may detect a laser. For example, the sensor unit may detect a laser reflected from an object located in the scan area.

In addition, the sensor unit 300 according to an embodiment may receive a laser, and may generate an electric signal based on the received laser. For example, the sensor unit 300 may receive a laser reflected from an object positioned within the scan area, and generate an electric signal based on this. In addition, for example, the sensor unit 300 may receive a laser reflected from an object located in the scan area through one or more optical means, and may generate an electric signal based on this. In addition, for example, the sensor unit 300 may receive a laser reflected from an object located in the scan area through an optical filter, and may generate an electrical signal based on this.

In addition, the sensor unit 300 according to an embodiment may detect a laser based on the generated electrical signal. For example, the sensor unit 300 may detect a laser by comparing a predetermined threshold value with a magnitude of the generated electrical signal, but is not limited thereto. Also, for example, the sensor unit 300 may detect a laser by comparing a predetermined threshold value with a rising edge, a falling edge, or a median value of a rising edge and a falling edge of the generated electrical signal, but is not limited thereto. Also, for example, the sensor unit 300 may detect a laser by comparing a predetermined threshold value with a peak value of the generated electrical signal, but is not limited thereto.

In addition, the sensor unit 300 according to an embodiment may include various sensor elements. For example, the sensor unit 300 includes a PN photodiode, a phototransistor, a PIN photodiode, APD (Avalanche Photodiode), SPAD (Single-photon avalanche diode), SiPM (Silicon Photo Multipliers), TDC (Time to Digital Converter), It may include a comparator, a complementary metal-oxide-semiconductor (CMOS), or a charge coupled device (CCD), but is not limited thereto.

For example, the sensor unit 300 may be a 2D SPAD array, but is not limited thereto. Also, for example, the SPAD array may include a plurality of SPAD units, and the SPAD unit may include a plurality of SPADs (pixels).

In this case, the sensor unit 300 may stack N histograms using a 2D SPAD array. For example, the sensor unit 300 may detect a light-receiving point of a laser beam reflected from an object and received light using a histogram.

For example, the sensor unit 300 may use the histogram to detect a peak point of the histogram as a light-receiving point of a laser beam reflected from an object and received, but is not limited thereto. In addition, for example, the sensor unit 300 may use the histogram to detect a point where the histogram is equal to or greater than a predetermined value as a light-receiving point of the laser beam reflected from the object and received, but is not limited thereto.

In addition, the sensor unit 300 according to an embodiment may include one or more sensor elements. For example, the sensor unit 300 may include a single sensor element, or may include a plurality of sensor elements.

In addition, the sensor unit 300 according to an embodiment may include one or more optical elements. For example, the sensor unit 300 may include an aperture, a micro lens, a converging lens, or a diffuser, but is not limited thereto.

In addition, the sensor unit 300 according to an embodiment may include one or more optical filters. The sensor unit 300 may receive the laser reflected from the object through an optical filter. For example, the sensor unit 300 may include, but is not limited to, a band pass filter, a dichroic filter, a guided-mode resonance filter, a polarizer, and a wedge filter.

Referring back to FIG. 1, the lidar apparatus 1000 according to an embodiment may include a control unit 400.

The control unit may be variously expressed as a controller or the like in the description for the present invention, but is not limited thereto.

In this case, the control unit 400 according to an embodiment may control the operation of the laser output unit 100, the optics unit 200, or the sensor unit 300.

In addition, the control unit 400 according to an embodiment may control the operation of the laser output unit 100.

For example, the control unit 400 may control the timing of the laser output from the laser output unit 100. Also, the control unit 400 may control the power of the laser output from the laser output unit 100. In addition, the control unit 400 may control a pulse width of a laser output from the laser output unit 100. In addition, the control unit 400 may control the period of the laser output from the laser output unit 100. In addition, when the laser output unit 100 includes a plurality of laser output elements, the control unit 400 may control the laser output unit 100 so that some of the plurality of laser output elements are operated.

In addition, the control unit 400 according to an embodiment may control the operation of the optical unit 200.

For example, the controller 400 may control the operating speed of the optics 200. Specifically, when the optical unit 200 includes a rotating mirror, the rotational speed of the rotating mirror can be controlled, and when the optical unit 200 includes a MEMS mirror, the repetition period of the MEMS mirror can be controlled. However, it is not limited thereto.

In addition, for example, the control unit 400 may control the degree of operation of the optical unit 200. Specifically, when the optical unit 200 includes a MEMS mirror, the operation angle of the MEMS mirror may be controlled, but the present invention is not limited thereto.

In addition, the control unit 400 according to an embodiment may control the operation of the sensor unit 300.

For example, the control unit 400 may control the sensitivity of the sensor unit 300. Specifically, the controller 400 may control the sensitivity of the sensor unit 300 by adjusting a predetermined threshold value, but is not limited thereto.

Also, for example, the control unit 400 may control the operation of the sensor unit 300. Specifically, the control unit 400 may control On/Off of the sensor unit 300, and when the control unit 300 includes a plurality of sensor elements, the sensor unit may operate some of the plurality of sensor elements. The operation of 300 can be controlled.

In addition, the controller 400 according to an exemplary embodiment may determine a distance from the lidar device 1000 to an object located in the scan area based on the laser detected by the sensor unit 300.

For example, the controller 400 may determine a distance to an object located in the scan area based on a time when the laser is output from the laser output unit 100 and a time when the laser is detected by the sensor unit 300 . In addition, for example, the control unit 400 may output a laser from the laser output unit 100 so that the laser is immediately sensed by the sensor unit 300 without passing through the object and the laser reflected from the object is transmitted to the sensor unit 300. The distance to the object located in the scan area may be determined based on the viewpoint detected at.

There may be a difference between the timing at which the lidar apparatus 1000 transmits the trigger signal for emitting the laser beam by the control unit 400 and the actual timing at which the laser beam is output from the laser output device. Since the laser beam is not actually output between the timing of the trigger signal and the timing of the actual light emission, accuracy may decrease if included in the flight time of the laser.

In order to improve the accuracy in measuring the flight time of the laser beam, the actual outgoing timing of the laser beam can be used. However, it may be difficult to determine when the laser beam actually exits. Therefore, the laser beam output from the laser output device must be transmitted to the sensor unit 300 as soon as it is output or without passing through the object.

For example, since an optic is disposed on the laser output element, a laser beam output from the laser output element by the optic may be sensed by the sensor unit 300 directly without passing through an object. The optic may be a mirror, a lens, a prism, or a meta surface, but is not limited thereto. The number of optics may be one, but there may be a plurality of optics.

In addition, for example, since the sensor unit 300 is disposed above the laser output device, the laser beam output from the laser output device may be detected by the sensor unit 300 directly without passing through the object. The sensor unit 300 may be spaced apart from the laser output device by a distance of 1 mm, 1 um, 1 nm, or the like, but is not limited thereto. Alternatively, the sensor unit 300 may be disposed adjacent to the laser output device without being spaced apart. An optic may exist between the sensor unit 300 and the laser output element, but is not limited thereto.

Specifically, the laser output unit 100 may output a laser, the control unit 400 may obtain a time point at which the laser is output from the laser output unit 100, and the laser output from the laser output unit 100 When is reflected from an object located in the scan area, the sensor unit 300 may detect a laser reflected from the object, and the control unit 400 may acquire a time point at which the laser is sensed by the sensor unit 300, The controller 400 may determine a distance to an object located in the scan area based on the laser output timing and detection timing.

In addition, specifically, a laser may be output from the laser output unit 100, and the laser output from the laser output unit 100 will be detected by the sensor unit 300 without passing through an object located in the scan area. In addition, the control unit 400 may acquire a point in time when a laser that has not passed through the object is sensed. When the laser output from the laser output unit 100 is reflected from an object located in the scan area, the sensor unit 300 may detect the laser reflected from the object, and the controller 400 may detect the laser from the sensor unit 300. A time point at which is sensed may be obtained, and the controller 400 may determine a distance to an object located in the scan area based on a time point when a laser is detected without passing through the object and a time point when a laser reflected from the object is sensed.

2 is a diagram illustrating a lidar device according to an embodiment.

Referring to FIG. 2, a lidar device 1100 according to an exemplary embodiment may include a laser output unit 100, an optical unit 200, and a sensor unit 300.

Since the laser output unit 100, the optical unit 200, and the sensor unit 300 have been described in FIG. 1, detailed descriptions will be omitted below.

The laser beam output from the laser output unit 100 may pass through the optical unit 200. In addition, the laser beam passing through the optical unit 200 may be irradiated toward the object 500. In addition, the laser beam reflected from the object 500 may be received by the sensor unit 300.

3 is a diagram illustrating a lidar device according to another embodiment.

Referring to FIG. 3, a lidar device 1150 according to another embodiment may include a laser output unit 100, an optical unit 200, and a sensor unit 300.

Since the laser output unit 100, the optical unit 200, and the sensor unit 300 have been described in FIG. 1, detailed descriptions will be omitted below.

The laser beam output from the laser output unit 100 may pass through the optical unit 200. In addition, the laser beam passing through the optical unit 200 may be irradiated toward the object 500. In addition, the laser beam reflected from the object 500 may pass through the optical unit 200 again.

In this case, the optical unit through which the laser beam is applied before being irradiated to the object and the optical unit through which the laser beam reflected from the object is applied may be physically the same optical unit, but may be physically different optical units.

The laser beam passing through the optical unit 200 may be received by the sensor unit 300.

Hereinafter, various embodiments of the laser output unit including the VCSEL will be described in detail.

4 is a view showing a laser output unit according to an embodiment.

Referring to FIG. 4, the laser output unit 100 according to an embodiment may include a VCSEL emitter 110.

The VCSEL emitter 110 according to an embodiment includes an upper metal contact 10, an upper DBR layer 20, an upper Distributed Bragg reflector, an active layer 40, a quantum well, and a lower DBR layer 30, lower Distributed Bragg reflector. , A substrate 50 and a lower metal contact 60 may be included.

In addition, the VCSEL emitter 110 according to an embodiment may emit a laser beam vertically from the top surface. For example, the VCSEL emitter 110 may emit a laser beam in a direction perpendicular to the surface of the upper metal contact 10. Also, for example, the VCSEL emitter 110 may emit a laser beam perpendicular to the acvite layer 40.

The VCSEL emitter 110 according to an embodiment may include an upper DBR layer 20 and a lower DBR layer 30.

The upper DBR layer 20 and the lower DBR layer 30 according to an embodiment may be formed of a plurality of reflective layers. For example, in the plurality of reflective layers, a reflective layer having a high reflectivity and a reflective layer having a low reflectance may be alternately disposed. In this case, the thickness of the plurality of reflective layers may be a quarter of the laser wavelength emitted from the VCSEL emitter 110.

In addition, the upper DBR layer 20 and the lower DBR layer 30 according to an embodiment may be doped with p-type and n-type. For example, the upper DBR layer 20 may be doped with a p-type, and the lower DBR layer 30 may be doped with an n-type. Alternatively, for example, the upper DBR layer 20 may be doped with n-type and the lower DBR layer 30 may be doped with p-type.

In addition, according to an embodiment, a substrate 50 may be disposed between the lower DBR layer 30 and the lower metal contact 60. When the lower DBR layer 30 is doped with a p-type, the substrate 50 may also be a p-type substrate, and when the lower DBR layer 30 is doped with an n-type, the substrate 50 may also become an n-type substrate. have.

The VCSEL emitter 110 according to an embodiment may include an active layer 40.

The active layer 40 according to an embodiment may be disposed between the upper DBR layer 20 and the lower DBR layer 30.

The active layer 40 according to an embodiment may include a plurality of quantum wells generating a laser beam. The active layer 40 may emit a laser beam.

The VCSEL emitter 110 according to an embodiment may include a metal contact for electrical connection with a power source or the like. For example, the VCSEL emitter 110 may include an upper metal contact 10 and a lower metal contact 60.

In addition, the VCSEL emitter 110 according to an embodiment may be electrically connected to the upper DBR layer 20 and the lower DBR layer 30 through a metal contact.

For example, when the upper DBR layer 20 is doped with p-type and the lower DBR layer 30 is doped with n-type, p-type power is supplied to the upper metal contact 10 so that the upper DBR layer 20 and It is electrically connected, and n-type power is supplied to the lower metal contact 60 to be electrically connected to the lower DBR layer 30.

In addition, for example, for example, when the upper DBR layer 20 is doped with n-type and the lower DBR layer 30 is doped with p-type, n-type power is supplied to the upper metal contact 10 to provide the upper DBR. It is electrically connected to the layer 20, and p-type power is supplied to the lower metal contact 60 to be electrically connected to the lower DBR layer 30.

The VCSEL emitter 110 according to an embodiment may include an oxidation area. Oxidation area may be disposed on top of the active layer.

The oxidation area according to an embodiment may be insulating. For example, electrical flow may be restricted in the oxidation area. For example, electrical connections may be limited in the oxidation area.

In addition, the oxidation area according to an embodiment may serve as an aperture. Specifically, since the oxidation area has insulating properties, the beam generated from the active layer 40 may be emitted only in a portion other than the oxidation area.

The laser output unit according to an embodiment may include a plurality of VCSEL emitters 110.

In addition, the laser output unit according to an embodiment may turn on a plurality of VCSEL emitters 110 at once or individually.

The laser output unit according to an embodiment may emit laser beams of various wavelengths. For example, the laser output unit may emit a laser beam having a wavelength of 905 nm. Also, for example, the laser output unit may emit a laser beam having a wavelength of 1550 nm.

In addition, the wavelength to be output to the laser output unit according to an exemplary embodiment may be changed according to the surrounding environment. For example, as the temperature of the surrounding environment increases, the output wavelength may also increase. Or, for example, as the temperature of the surrounding environment decreases, the output wavelength may also decrease. The ambient environment may include, but is not limited to, temperature, humidity, pressure, concentration of dust, ambient light amount, altitude, gravity, acceleration, and the like.

The laser output unit may emit a laser beam in a direction perpendicular to the support surface. Alternatively, the laser output unit may emit a laser beam in a direction perpendicular to the emission surface.

5 is a diagram showing a VCSEL unit according to an embodiment.

Referring to FIG. 5, the laser output unit 100 according to an embodiment may include a VCSEL unit 130.

The VCSEL unit 130 according to an embodiment may include a plurality of VCSEL emitters 110. For example, the plurality of VCSEL emitters 110 may be arranged in a honeycomb structure, but the present invention is not limited thereto. At this time, one honeycomb structure may include seven VCSEL emitters 110, but is not limited thereto.

In addition, all VCSEL emitters 110 included in the VCSEL unit 130 according to an embodiment may be irradiated in the same direction. For example, all 400 VCSEL emitters 110 included in the VCSEL unit 130 may be irradiated in the same direction.

In addition, the VCSEL unit 130 may be distinguished by the irradiation direction of the output laser beam. For example, when all of the N VCSEL emitters 110 output a laser beam in a first direction, and all of the M VCSEL emitters 110 output a laser beam in a second direction, the N VCSEL emitters 110 ) May be classified as a first VCSEL unit, and the M VCSEL emitters 110 may be classified as a second VCSEL unit.

In addition, the VCSEL unit 130 according to an embodiment may include a metal contact. For example, the VCSEL unit 130 may include a p-type metal and an n-type metal. In addition, for example, a plurality of VCSEL emitters 110 included in the VCSEL unit 130 may share a metal contact.

6 is a diagram illustrating a VCSEL array according to an embodiment.

Referring to FIG. 6, the laser output unit 100 according to an embodiment may include a VCSEL array 150. 6 illustrates an 8X8 VCSEL array, but is not limited thereto.

The VCSEL array 150 according to an embodiment may include a plurality of VCSEL units 130. For example, the plurality of VCSEL units 130 may be arranged in a matrix structure, but the present invention is not limited thereto.

For example, the plurality of VCSEL units 130 may be an N X N matrix, but are not limited thereto. Also, for example, the plurality of VCSEL units 130 may be an N X M matrix, but are not limited thereto.

In addition, the VCSEL array 150 according to an embodiment may include a metal contact. For example, the VCSEL array 150 may include p-type metal and n-type metal. In this case, the plurality of VCSEL units 130 may share a metal contact, but they may not share the metal contact and may each have an independent metal contact.

7 is a side view showing a VCSEL array and a metal contact according to an embodiment.

Referring to FIG. 7, the laser output unit 100 according to an embodiment may include a VCSEL array 151. 6 illustrates a 4X4 VCSEL array, but is not limited thereto. The VCSEL array 151 may include a first metal contact 11, a wire 12, a second metal contact 13, and a VCSEL unit 130.

The VCSEL array 151 according to an embodiment may include a plurality of VCSEL units 130 arranged in a matrix structure. In this case, each of the plurality of VCSEL units 130 may be independently connected to a metal contact. For example, the plurality of VCSEL units 130 share the first metal contact 11 and are connected together to the first metal contact, and the second metal contact 13 is not shared, so that they are independently connected to the second metal contact. I can. In addition, for example, the plurality of VCSEL units 130 may be directly connected to the first metal contact 11 and connected to the second metal contact through a wire 12. In this case, the number of required wires 12 may be the same as the number of a plurality of VCSEL units 130. For example, when the VCSEL array 151 includes a plurality of VCSEL units 130 arranged in an N X M matrix structure, the number of wires 12 may be N * M.

In addition, the first metal contact 11 and the second metal contact 13 according to an exemplary embodiment may be different from each other. For example, the first metal contact 11 may be an n-type metal, and the second metal contact 13 may be a p-type metal. Conversely, the first metal contact 11 may be a p-type metal, and the second metal contact 13 may be an n-type metal.

8 is a diagram illustrating a VCSEL array according to an embodiment.

Referring to FIG. 8, the laser output unit 100 according to an embodiment may include a VCSEL array 153. 7 illustrates a 4X4 VCSEL array, but is not limited thereto.

The VCSEL array 153 according to an embodiment may include a plurality of VCSEL units 130 arranged in a matrix structure. In this case, the plurality of VCSEL units 130 may share metal contacts, but may not share metal contacts and may have independent metal contacts. For example, the plurality of VCSEL units 130 may share the first metal contact 15 in a row unit. In addition, for example, the plurality of VCSEL units 130 may share the second metal contact 17 in a column unit.

In addition, the first metal contact 15 and the second metal contact 17 according to an exemplary embodiment may be different from each other. For example, the first metal contact 15 may be an n-type metal, and the second metal contact 17 may be a p-type metal. Conversely, the first metal contact 15 may be a p-type metal, and the second metal contact 17 may be an n-type metal.

In addition, the VCSEL unit 130 according to an embodiment may be electrically connected to the first metal contact 15 and the second metal contact 17 through the wire 12.

The VCSEL array 153 according to an embodiment may operate to be addressable. For example, a plurality of VCSEL units 130 included in the VCSEL array 153 may operate independently of other VCSEL units.

For example, when power is supplied to the first metal contacts 15 in the first row and the second metal contacts 17 in the first row, the VCSEL units in the first row and the first column may operate. In addition, for example, if power is supplied to the first metal contact 15 in the first row and the second metal contact 17 in the first and third columns, the VCSEL units in the first row and the third columns and the VCSEL units in the first row and the third columns will operate. I can.

According to an embodiment, the VCSEL units 130 included in the VCSEL array 153 may operate with a certain pattern.

For example, after the operation of the VCSEL unit in row 1, column 1, VCSEL unit in row 1, column 2, VCSEL unit in row 1, column 3, VCSEL unit in row 1, column 4, VCSEL unit in row 2, column 2, VCSEL unit in column 2, etc. It operates, and can have a certain pattern lasting the VCSEL unit of 4 rows and 4 columns.

In addition, for example, after the operation of the VCSEL unit in 1 row 1 column, the VCSEL unit in 2 rows 1 column, 3 rows 1 column VCSEL unit, 4 row 1 column VCSEL unit, 1 row 2 column VCSEL unit, 2 row 2 column VCSEL unit, etc. It operates as it is, and can have a certain pattern with the last VCSEL unit of 4 rows and 4 columns.

According to another embodiment, the VCSEL units 130 included in the VCSEL array 153 may operate with an irregular pattern. Alternatively, the VCSEL units 130 included in the VCSEL array 153 may operate without having a pattern.

For example, the VCSEL units 130 may operate at random. When the VCSEL units 130 operate at random, interference between the VCSEL units 130 may be prevented.

There may be various methods of directing a laser beam emitted from the laser output unit to an object. Among them, the flash method is a method in which a laser beam is spread to an object by the divergence of the laser beam. In the flash method, a laser beam of high power is required to direct a laser beam to an object existing at a distance. The high power laser beam increases the power because a high voltage must be applied. In addition, since it can damage the human eye, there is a limit to the distance that can be measured by a lidar using the flash method.

The scanning method is a method of directing a laser beam emitted from the laser output unit in a specific direction. Laser power loss can be reduced by directing the scanning method laser beam in a specific direction. Since laser power loss can be reduced, compared to the flash method, even if the same laser power is used, the distance that the lidar can measure is longer in the scanning method. In addition, compared to the flash method, since the scanning method has a lower laser power for measuring the same distance, stability to the human eye may be improved.

Laser beam scanning can be accomplished by collimation and steering. For example, laser beam scanning may be performed by performing a steering method after collimating the laser beam. Further, for example, laser beam scanning may be performed in a manner of performing a collimation after steering.

Hereinafter, various embodiments of an optical unit including a beam collimation and steering component (BCSC) will be described in detail.

9 is a diagram for describing a lidar device according to an exemplary embodiment.

Referring to FIG. 9, a lidar device 1200 according to an exemplary embodiment may include a laser output unit 100 and an optical unit. In this case, the optical unit may include the BCSC 250. In addition, the BCSC 250 may include a collimation component 210 and a steering component 230.

BCSC 250 according to an embodiment may be configured as follows. The collimation component 210 first collimates the laser beam, and the collimated laser beam may be steered through the steering component 230. Alternatively, the steering component 230 may first steer the laser beam, and the steered laser beam may be collimated through the collimation component 210.

In addition, the optical path of the lidar device 1200 according to an embodiment is as follows. The laser beam emitted from the laser output unit 100 may be directed to the BCSC 250. The laser beam incident on the BCSC 250 may be collimated by the collimation component 210 and directed to the steering component 230. The laser beam incident on the steering component 230 may be steered and directed toward the object. The laser beam incident on the object 500 may be reflected by the object 500 and directed to the sensor unit.

Although the laser beam emitted from the laser output unit has directivity, there may be some degree of divergence as the laser beam travels straight. Due to such divergence, the laser beam emitted from the laser output unit may not be incident on the object, or the amount may be very small even when incident.

When the degree of divergence of the laser beam is large, the amount of the laser beam incident on the object is reduced, and the amount of the laser beam reflected from the object and directed to the sensor unit is also very small due to the divergence, so that a desired measurement result may not be obtained. Alternatively, when the degree of divergence of the laser beam is large, the distance that can be measured by the LiDAR device decreases, so that a distant object may not be able to measure.

Therefore, before the laser beam is incident on the object, the efficiency of the lidar device may be improved as the degree of divergence of the laser beam emitted from the laser output unit is reduced. The collimation component of the present invention can reduce the degree of divergence of the laser beam. The laser beam that has passed through the collimation component can be parallel light. Alternatively, the laser beam passing through the collimation component may have a divergence of 0.4 degrees to 1 degree.

When the degree of divergence of the laser beam is reduced, the amount of light incident on the object may be increased. When the amount of light incident on the object is increased, the amount of light reflected from the object is also increased, so that the laser beam can be efficiently received. In addition, when the amount of light incident on the object is increased, compared to before collimating the laser beam, it may be possible to measure an object at a greater distance with the same laser beam power.

10 is a diagram for describing a collimation component according to an embodiment.

Referring to FIG. 10, the collimation component 210 according to an exemplary embodiment may be disposed in a direction in which a laser beam emitted from the laser output unit 100 is directed. The collimation component 210 may adjust the degree of divergence of the laser beam. The collimation component 210 may reduce the degree of divergence of the laser beam.

For example, the divergence angle of the laser beam emitted from the laser output unit 100 may be 16 degrees to 30 degrees. At this time, after the laser beam emitted from the laser output unit 100 passes through the collimation component 210, the divergence angle of the laser beam may be 0.4 degrees to 1 degree.

11 is a diagram for describing a collimation component according to an embodiment.

Referring to FIG. 11, the collimation component 210 according to an embodiment may include a plurality of micro lenses 211 and a substrate 213.

The microlens may have a diameter of millimeters (mm), micrometers (um), nanometers (nm), picometers (pm), and the like, but is not limited thereto.

A plurality of micro lenses 211 according to an embodiment may be disposed on the substrate 213. The plurality of micro lenses 211 and the substrate 213 may be disposed on the plurality of VCSEL emitters 110. In this case, one of the plurality of micro lenses 211 may be disposed to correspond to one of the plurality of VCSEL emitters 110, but is not limited thereto.

In addition, the plurality of micro lenses 211 according to an embodiment may collimate laser beams emitted from the plurality of VCSEL emitters 110. In this case, the laser beam emitted from one of the plurality of VCSEL emitters 110 may be collimated by one of the plurality of micro lenses 211. For example, the divergence angle of the laser beam emitted from one of the plurality of VCSEL emitters 110 may be decreased after passing through one of the plurality of micro lenses 211.

In addition, the plurality of microlenses according to an embodiment may be a refractive index distribution lens, a micro-curved lens, an array lens, a Fresnel lens, or the like.

In addition, a plurality of microlenses according to an exemplary embodiment may be manufactured by molding, ion exchange, diffusion polymerization, sputtering, and etching.

In addition, the plurality of micro lenses according to an embodiment may have a diameter of 130um to 150um. For example, the diameter of the plurality of micro lenses may be 140 μm. In addition, the plurality of micro lenses may have a thickness of 400um to 600um. For example, the thickness of the plurality of micro lenses may be 500 μm.

12 is a diagram for describing a collimation component according to an embodiment.

Referring to FIG. 12, the collimation component 210 according to an embodiment may include a plurality of micro lenses 211 and a substrate 213.

A plurality of micro lenses 211 according to an embodiment may be disposed on the substrate 213. For example, the plurality of micro lenses 211 may be disposed on the front and rear surfaces of the substrate 213. In this case, an optical axis of the microlens 211 disposed on the surface of the substrate 213 and the microlens 211 disposed on the rear surface of the substrate 213 may be coincident.

13 is a diagram for describing a collimation component according to an embodiment.

Referring to FIG. 13, a collimation component according to an embodiment may include a metasurface 220.

The metasurface 220 according to an embodiment may include a plurality of nanopillars 221. For example, the plurality of nanopillars 221 may be disposed on one side of the meta surface 220. In addition, for example, the plurality of nanopillars 221 may be disposed on both sides of the meta surface 220.

The plurality of nanopillars 221 may have a sub-wavelength dimension. For example, the spacing between the plurality of nanopillars 221 may be smaller than the wavelength of the laser beam emitted from the laser output unit 100. Alternatively, the width, diameter, and height of the nanopillars 221 may be smaller than the length of the wavelength of the laser beam.

The meta surface 220 may refract the laser beam by adjusting the phase of the laser beam emitted from the laser output unit 100. The meta surface 220 may refract laser beams output from the laser output unit 100 in various directions.

The meta surface 220 may collimate a laser beam emitted from the laser output unit 100. In addition, the meta-surface 220 may reduce the divergence angle of the laser beam emitted from the laser output unit 100. For example, a divergence angle of a laser beam emitted from the laser output unit 100 may be 15 to 30 degrees, and a divergence angle of the laser beam after passing through the meta surface 220 may be 0.4 to 1.8 degrees.

The meta surface 220 may be disposed on the laser output unit 100. For example, the meta surface 220 may be disposed on the emission surface side of the laser output unit 100.

Alternatively, the meta surface 220 may be deposited on the laser output unit 100. The plurality of nanopillars 221 may be formed on the laser output unit 100. The plurality of nanopillars 221 may form various nanopatterns on the laser output unit 100.

The nanopillars 221 may have various shapes. For example, the nanopillar 221 may have a shape such as a cylinder, a polygonal column, a cone, and a polygonal pyramid. In addition, the nanopillars 221 may have an irregular shape.

14 is a diagram for describing a steering component according to an exemplary embodiment.

Referring to FIG. 14, the steering component 230 according to an exemplary embodiment may be disposed in a direction in which a laser beam emitted from the laser output unit 100 is directed. The steering component 230 may adjust the direction in which the laser beam is directed. The steering component 230 may adjust an angle between the optical axis of the laser light source and the laser beam.

For example, the steering component 230 may steer the laser beam such that an angle between the optical axis of the laser light source and the laser beam is 0 to 30 degrees. Alternatively, for example, the steering component 230 may steer the laser beam such that an angle between the optical axis of the laser light source and the laser beam is -30 degrees to 0 degrees.

15 and 16 are diagrams for describing a steering component according to an exemplary embodiment.

15 and 16, the steering component 231 according to an exemplary embodiment may include a plurality of micro lenses 231 and a substrate 233.

The plurality of micro lenses 232 according to an embodiment may be disposed on the substrate 233. The plurality of micro lenses 232 and the substrate 233 may be disposed on the plurality of VCSEL emitters 110. In this case, one of the plurality of micro lenses 232 may be disposed to correspond to one of the plurality of VCSEL emitters 110, but is not limited thereto.

In addition, the plurality of micro lenses 232 according to an embodiment may steer the laser beams emitted from the plurality of VCSEL emitters 110. In this case, the laser beam emitted from one of the plurality of VCSEL emitters 110 may be steered by one of the plurality of micro lenses 232.

In this case, the optical axis of the micro lens 232 and the optical axis of the VCSEL emitter 110 may not coincide. For example, referring to FIG. 14, when the optical axis of the VCSEL emitter 110 is to the right of the optical axis of the micro lens 232, the laser beam emitted from the VCSEL emitter 110 and passed through the micro lens 232 is left Can be headed to. In addition, for example, referring to FIG. 15, when the optical axis of the VCSEL emitter 110 is to the left of the optical axis of the micro lens 232, the laser beam emitted from the VCSEL emitter 110 and passed through the micro lens 232 Can face to the right.

Also, as the distance between the optical axis of the microlens 232 and the optical axis of the VCSEL emitter 110 increases, the degree of steering of the laser beam may increase. For example, when the distance between the optical axis of the microlens 232 and the optical axis of the VCSEL emitter 110 is 10 μm, the angle formed by the optical axis of the laser light source and the laser beam may be greater than when the distance between the optical axis of the VCSEL emitter 110 is 1 μm.

17 is a diagram for describing a steering component according to an exemplary embodiment.

Referring to FIG. 17, the steering component 234 according to an embodiment may include a plurality of micro prisms 235 and a substrate 236.

A plurality of micro prisms 235 according to an embodiment may be disposed on the substrate 236. The plurality of micro prisms 235 and the substrate 236 may be disposed on the plurality of VCSEL emitters 110. In this case, the plurality of micro prisms 235 may be disposed to correspond to one of the plurality of VCSEL emitters 110, but is not limited thereto.

In addition, the plurality of micro prisms 235 according to an embodiment may steer the laser beams emitted from the plurality of VCSEL emitters 110. For example, the plurality of micro prisms 235 may change an angle between the optical axis of the laser light source and the laser beam.

In this case, as the angle of the micro prism 235 decreases, the angle formed by the optical axis of the laser light source and the laser beam increases. For example, when the angle of the micro prism 235 is 0.05 degrees, the laser beam is steered by 35 degrees, and when the angle of the micro prism 235 is 0.25 degrees, the laser beam is steered by 15 degrees.

In addition, the plurality of micro prism 235 according to an embodiment may be a Porro prism, Amici roof prism, Pentaprism, Dove prism, Retroreflector prism, or the like. In addition, the plurality of micro prisms 235 may be made of glass, plastic, or fluorspar. In addition, the plurality of micro prisms 235 may be manufactured by molding, etching, or the like.

At this time, by smoothing the surface of the micro prism 235 through a polishing process, it is possible to prevent diffuse reflection due to surface roughness.

According to an embodiment, the micro prism 235 may be disposed on both sides of the substrate 236. For example, a micro prism disposed on the first side of the substrate 236 steers the laser beam to the first axis, and the micro prism disposed on the second side of the substrate 236 steers the laser beam to the second axis. I can make it.

18 is a diagram for describing a steering component according to an exemplary embodiment.

Referring to FIG. 18, the steering component according to an embodiment may include a meta surface 240.

The metasurface 240 may include a plurality of nanopillars 241. For example, the plurality of nanopillars 241 may be disposed on one side of the meta surface 240. In addition, for example, the plurality of nanopillars 241 may be disposed on both sides of the meta surface 240.

The meta surface 240 may refract the laser beam by adjusting the phase of the laser beam emitted from the laser output unit 100.

The meta surface 240 may be disposed on the laser output unit 100. For example, the meta surface 240 may be disposed on the emission surface side of the laser output unit 100.

Alternatively, the meta surface 240 may be deposited on the laser output unit 100. The plurality of nanopillars 241 may be formed on the laser output unit 100. The plurality of nanopillars 241 may form various nanopatterns on the laser output unit 100.

The nanopillars 241 may have various shapes. For example, the nanopillar 241 may have a shape such as a cylinder, a polygonal column, a cone, and a polygonal pyramid. In addition, the nanopillars 241 may have an irregular shape.

The plurality of nanopillars 241 may form various nanopatterns. The meta surface 240 may steer a laser beam emitted from the laser output unit 100 based on the nano pattern.

The nanopillars 241 may form nanopatterns based on various characteristics. The characteristics may include a width (Width, hereinafter W), a pitch (hereinafter P), a height (Height, hereinafter H), and the number per unit length of the nanopillars 241.

Hereinafter, nanopatterns formed based on various characteristics and steering of a laser beam according thereto will be described.

19 is a diagram for describing a meta surface according to an exemplary embodiment.

Referring to FIG. 19, the metasurface 240 according to an exemplary embodiment may include a plurality of nanopillars 241 having different widths (W).

The plurality of nanopillars 241 may form a nanopattern based on the width W. For example, the plurality of nanopillars 241 may be arranged such that the widths W1, W2, and W3 increase in one direction. In this case, the laser beam emitted from the laser output unit 100 may be steered in a direction in which the width W of the nanopillars 241 increases.

For example, the meta surface 240 has a first nanopillar 243 having a first width W1, a second nanopillar 245 having a second width W2, and a third width W3. A third nanopillar 247 may be included. The first width W1 may be larger than the second width W2 and the third width W3. The second width W2 may be larger than the third width W3. That is, the width W of the nanopillars 241 may decrease as the first nanopillar 243 goes toward the third nanopillar 247. At this time, when the laser beam emitted from the laser output unit 100 passes through the meta-surface 240, the first nanopillars 243 from the first direction and the third nanopillars 247 emitted from the laser output unit 100 It may be steered in a direction between the second direction, which is a direction toward ).

Meanwhile, the steering angle θ of the laser beam may vary according to an increase/decrease rate of the width W of the nanopillars 241. Here, the increase/decrease rate of the width W of the nanopillars 241 may mean a numerical value representing an average increase/decrease of the width W of the plurality of adjacent nanopillars 241.

Based on the difference between the first width W1 and the second width W2 and the difference between the second width W2 and the third width W3, the increase/decrease rate of the width W of the nanopillars 241 will be calculated. I can.

The difference between the first width W1 and the second width W2 may be different from the difference between the second width W2 and the third width W3.

The steering angle θ of the laser beam may vary depending on the width W of the nanopillars 241.

Specifically, the steering angle θ may increase as the increase/decrease rate of the width W of the nanopillar 241 increases.

For example, the nanopillars 241 may form a first pattern having a first increase/decrease rate based on the width W. In addition, the nanopillars 241 may form a second pattern having a second increase/decrease rate smaller than the first increase/decrease rate based on the width W.

In this case, the first steering angle according to the first pattern may be greater than the second steering angle according to the second pattern.

Meanwhile, the range of the steering angle θ may be from -90° to 90°.

20 is a diagram for describing a metasurface according to an exemplary embodiment.

Referring to FIG. 20, the metasurface 240 according to an embodiment may include a plurality of nanopillars 241 having different spacings P between adjacent nanopillars 241.

The plurality of nanopillars 241 may form a nanopattern based on a change in the gap P between adjacent nanopillars 241. The meta surface 240 may steer a laser beam emitted from the laser output unit 100 based on a nano pattern formed based on a change in the gap P between the nano pillars 241.

According to an embodiment, the distance P between the nanopillars 241 may decrease in one direction. Here, the interval P may mean a distance between the centers of two adjacent nanopillars 241. For example, the first interval P1 may be defined as a distance between the center of the first nanopillar 243 and the center of the second nanopillar 245. Alternatively, the first interval P1 may be defined as the shortest distance between the first nanopillars 243 and the second nanopillars 245.

The laser beam emitted from the laser output unit 100 may be steered in a direction in which the spacing P between the nanopillars 241 decreases.

The metasurface 240 may include a first nanopillar 243, a second nanopillar 245, and a third nanopillar 247. In this case, the first interval P1 may be obtained based on the distance between the first nanopillars 243 and the second nanopillars 245. Likewise, the second interval P2 may be obtained based on the distance between the second nanopillars 245 and the third nanopillars 247. In this case, the first interval P1 may be smaller than the second interval P2. That is, the distance P may increase from the first nanopillar 243 toward the third nanopillar 247.

At this time, when the laser beam emitted from the laser output unit 100 passes through the meta surface 240, the laser beam is emitted from the first direction and the third nanopillar 247 from the laser output unit 100. It may be steered in a direction between the first direction, which is a direction toward the 1 nanopillar 243.

The steering angle θ of the laser beam may vary according to the distance P between the nanopillars 241.

Specifically, the steering angle θ of the laser beam may vary according to an increase/decrease rate of the spacing P between the nanopillars 241. Here, the increase/decrease rate of the interval P between the nanopillars 241 may mean a numerical value representing an average degree of change in the interval P between adjacent nanopillars 241.

The steering angle θ of the laser beam may increase as the increase/decrease rate of the gap P between the nanopillars 241 increases.

For example, the nanopillars 241 may form a first pattern having a first increase/decrease rate based on the gap P. In addition, the nanopillars 241 may form a second pattern having a second increase/decrease rate based on the interval P.

In this case, the first steering angle according to the first pattern may be larger than the second steering angle according to the second pattern.

Meanwhile, the principle of steering a laser beam according to a change in the spacing P of the nanopillars 241 described above can be similarly applied even when the number of nanopillars 241 per unit length changes.

For example, when the number of nanopillars 241 per unit length varies, the laser beam emitted from the laser output unit 100 is a first direction emitted from the laser output unit 100 and nanopillars per unit length ( It may be steered in the inter-direction of the second direction in which the number of 241) increases.

21 is a diagram for describing a meta surface according to an exemplary embodiment.

Referring to FIG. 21, the metasurface 240 according to an embodiment may include a plurality of nanopillars 241 having different heights H of the nanopillars 241.

The plurality of nanopillars 241 may form a nanopattern based on a change in the height H of the nanopillars 241.

According to an embodiment, the heights H1, H2, and H3 of the plurality of nanopillars 241 may increase in one direction. The laser beam emitted from the laser output unit 100 may be steered in a direction in which the height H of the nanopillars 241 increases.

For example, the meta surface 240 has a first nanopillar 243 having a first height H1, a second nanopillar 245 having a second height H2, and a third height H3. A third nanopillar 247 may be included. The third height H3 may be greater than the first height H1 and the second height H2. The second height H2 may be greater than the first height H1. That is, the height H of the nanopillars 241 may increase from the first nanopillar 243 toward the third nanopillar 247. At this time, when the laser beam emitted from the laser output unit 100 passes through the meta-surface 240, the laser beam is a first direction emitted from the laser output unit 100 and a third from the first nanopillar 243 It may be steered in a direction between the second direction, which is a direction toward the nanopillars 247.

The steering angle θ of the laser beam may vary according to the height H of the nanopillars 241.

Specifically, the steering angle θ of the laser beam may vary according to an increase/decrease rate of the height H of the nanopillars 241. Here, the increase/decrease rate of the height (H) of the nano-pillars 241 may mean a numerical value representing an average degree of change in the height (H) of the adjacent nano-pillars 241.

Based on the difference between the first height (H1) and the second height (H2) and the difference between the second height (H2) and the third height (H3), the increase/decrease rate of the height (H) of the nanopillar 241 will be calculated. I can. The difference between the first height H1 and the second height H2 may be different from the difference between the second height H3 and the third height H3.

The steering angle θ of the laser beam may increase as the increase/decrease rate of the height H of the nanopillar 241 increases.

For example, the nanopillars 241 may form a first pattern having a first increase/decrease rate based on the height H. In addition, the nanopillars 241 may form a second pattern having a second increase/decrease rate based on the height H.

In this case, the first steering angle according to the first pattern may be larger than the second steering angle according to the second pattern.

According to one embodiment, the steering component 230 may include a mirror that reflects the laser beam. For example, the steering component 230 may include a planar mirror, a multifaceted mirror, a resonant mirror, a MEMS mirror, and a galvano mirror.

Alternatively, the steering component 230 may include a polygonal mirror that rotates 360 degrees along one axis and a nodding mirror that is repeatedly driven in a preset range along one axis.

22 is a diagram for describing a multi-faceted mirror that is a steering component according to an exemplary embodiment.

Referring to FIG. 22, a rotating multi-faceted mirror 600 according to an embodiment may include a reflective surface 620 and a body, and vertically penetrates the center of the upper 615 and the lower 610 of the body. It can be rotated around the rotating shaft 630. However, the rotating multi-faceted mirror 600 may be configured with only some of the above-described configurations, and may include more components. For example, the rotating multi-faceted mirror 600 may include a reflective surface 620 and a body, and the body may be composed of only the lower portion 610. In this case, the reflective surface 620 may be supported on the lower portion 610 of the body.

The reflective surface 620 is a surface for reflecting the received laser, and may include a reflective mirror, reflective plastic, etc., but is not limited thereto.

In addition, the reflective surface 620 may be installed on a side surface other than the upper portion 610 and the lower portion 615 of the body, and may be installed so that the rotation shaft 630 and the normal line of each reflective surface 620 are orthogonal. have. This may be for repetitively scanning the same scan area by making the scan area of the laser irradiated from each of the reflective surfaces 620 the same.

In addition, the reflective surface 620 may be installed on a side surface other than the upper portion 610 and the lower portion 615 of the body, and the normal line of each reflective surface 620 has a different angle from the rotation axis 630, respectively. Can be installed This may be for expanding the scan area of the lidar device by making the scan area of the laser irradiated from each reflective surface 620 different.

In addition, the reflective surface 620 may have a rectangular shape, but is not limited thereto, and may have various shapes such as a triangle and a trapezoid.

In addition, the body is for supporting the reflective surface 620 and may include an upper portion 615, a lower portion 610, and a pillar 612 connecting the upper portion 615 and the lower portion 610. At this time, the pillar 612 may be installed to connect the center of the upper portion 615 and the lower portion 610 of the body, and installed to connect each vertex of the upper portion 615 and the lower portion 610 of the body It may be, or it may be installed to connect each corner of the upper portion 615 and lower portion 610 of the body, but there is no limitation on the structure for connecting and supporting the upper portion 615 and the lower portion 610 of the body. .

In addition, the body may be fastened to the driving unit 640 to receive the driving force for rotation, and may be fastened to the driving unit 640 through the lower portion 610 of the body, or through the upper portion 615 of the body. It may be fastened to the driving unit 640.

In addition, the upper portion 615 and the lower portion 610 of the body may have a polygonal shape. In this case, the shape of the upper portion 615 of the body and the lower portion 610 of the body may be the same, but are not limited thereto, and the shapes of the upper portion 615 of the body and the lower portion 610 of the body are different from each other. You may.

In addition, the upper portion 615 and the lower portion 610 of the body may have the same size. However, the present invention is not limited thereto, and sizes of the upper portion 615 of the body and the lower portion 610 of the body may be different from each other.

In addition, the upper portion 615 and/or the lower portion 610 of the body may include an empty space through which air can pass.

In FIG. 22, the rotating multi-faceted mirror 600 is described as a hexahedron in the form of a quadrilateral column including four reflective surfaces 620, but the reflective surfaces 620 of the rotating multi-faceted mirror 600 are necessarily four. It is not, and it is not necessarily a six-sided structure in the form of a quadrilateral column.

In addition, in order to detect the rotation angle of the multi-faceted mirror 600, the lidar device may further include an encoder. In addition, the lidar device may control the operation of the multi-faceted rotating mirror 600 by using the detected rotation angle. In this case, the encoder unit may be included in the multi-faceted rotating mirror 600 or disposed to be spaced apart from the multi-faceted rotating mirror 600.

The required field of view (FOV) of the lidar device may be different depending on the application. For example, in the case of a fixed type lidar device for 3D mapping, the widest possible viewing angle in the vertical and horizontal directions may be required, and in the case of a lidar device disposed in a vehicle, a relatively wide viewing angle in the horizontal direction. Compared to that, it may require a relatively narrow viewing angle in the vertical direction. In addition, in the case of a lidar disposed on a drone, the widest viewing angle in the vertical and horizontal directions may be required.

In addition, the scan area of the lidar device may be determined based on the number of reflective surfaces of the rotating multi-faceted mirror, and accordingly, the viewing angle of the lidar device may be determined. Therefore, it is possible to determine the number of reflective surfaces of the rotating multi-faceted mirror based on the required viewing angle of the lidar device.

23 to 25 are views for explaining the relationship between the number of reflective surfaces and the viewing angle.

In FIGS. 23 to 25, three, four, and five reflective surfaces are described, but the number of reflective surfaces is not determined, and when the number of reflective surfaces is different, the following description may be inferred and calculated easily. In addition, in FIGS. 22 to 24, a case in which the upper and lower portions of the body are regular polygons will be described, but even when the upper and lower portions of the body are not regular polygons, the following description can be inferred and calculated easily.

23 is a top view for explaining the viewing angle of the rotating faceted mirror 650 in which the number of reflective surfaces is three and the upper and lower portions of the body are equilateral triangles.

Referring to FIG. 23, the laser 653 may be incident in a direction coincident with the rotation axis 651 of the multi-faceted rotating mirror 650. Here, since the upper portion of the rotating faceted mirror 650 has an equilateral triangle shape, an angle formed by the three reflective surfaces may be 60 degrees. And referring to FIG. 23, when the rotating facet mirror 650 rotates slightly in a clockwise direction, the laser is reflected upwards in the drawing, and the rotating facet mirror is positioned slightly rotated counterclockwise. The laser may be reflected downward on the drawing. Therefore, when the path of the reflected laser is calculated with reference to FIG. 23, the maximum viewing angle of the rotating multi-faceted mirror can be known.

For example, when reflected through the No. 1 reflective surface of the rotating multi-faceted mirror 650, the reflected laser may be reflected upwards with the incident laser 653 at an angle of 120 degrees. In addition, when reflected through the third reflective surface of the rotating multi-faceted mirror, the reflected laser may be reflected at an angle of 120 degrees downward to the incident laser.

Therefore, when the number of reflective surfaces of the rotating multi-faceted mirror 650 is three, and the upper and lower portions of the body have an equilateral triangle shape, the maximum viewing angle of the rotating multi-faceted mirror may be 240 degrees.

24 is a top view for explaining a viewing angle of a rotating multi-faceted mirror in which the number of reflective surfaces is four and the upper and lower portions of the body are square.

Referring to FIG. 24, the laser 663 may be incident in a direction coincident with the rotation axis 661 of the multi-faceted rotating mirror 660. Here, since the upper portion of the rotating faceted mirror 660 has a square shape, an angle formed by the four reflective surfaces may be 90 degrees. And referring to FIG. 24, when the rotating facet mirror 660 rotates slightly in the clockwise direction, the laser is reflected upwards in the drawing, and the rotating facet mirror 660 rotates slightly counterclockwise to the position. In this case, the laser may be reflected downward on the drawing. Therefore, when the path of the reflected laser is calculated with reference to FIG. 24, the maximum viewing angle of the rotating faceted mirror 660 can be known.

For example, when reflected through the No. 1 reflective surface of the rotating multi-faceted mirror 660, the reflected laser may be reflected upwards with the incident laser 663 at an angle of 90 degrees. In addition, when reflected through the fourth reflective surface of the rotating multi-faceted mirror 660, the reflected laser may be reflected downward to the incident laser 663 at an angle of 90 degrees.

Therefore, when the number of reflective surfaces of the rotating multi-faceted mirror 660 is four, and the upper and lower portions of the body have a square shape, the maximum viewing angle of the rotating multi-faceted mirror 660 may be 180 degrees.

24 is a top view for explaining a viewing angle of a rotating multi-faceted mirror in which the number of reflective surfaces is 5 and the upper and lower portions of the body are regular pentagons.

Referring to FIG. 24, the laser 673 may be incident in a direction coincident with the rotation axis 671 of the multi-faceted rotating mirror 670. Here, since the upper portion of the rotating faceted mirror 670 has a regular pentagon shape, an angle formed by the five reflective surfaces may be 108 degrees each. And, referring to FIG. 24, when the rotating mirror 670 rotates slightly in the clockwise direction, the laser is reflected upwards in the drawing, and the rotating mirror 670 rotates slightly counterclockwise. When positioned, the laser can be reflected downwards in the drawing. Therefore, if the path of the reflected laser is calculated with reference to FIG. 24, the maximum viewing angle of the rotating multi-faceted mirror can be known.

For example, when reflected through the No. 1 reflective surface of the rotating multi-faceted mirror 670, the reflected laser may be reflected upwardly to the incident laser 673 at an angle of 72 degrees. In addition, when reflected through the 5th reflective surface of the rotating multi-faceted mirror 670, the reflected laser may be reflected downwards from the incident laser 673 at an angle of 72 degrees.

Accordingly, when the number of reflective surfaces of the rotating multi-faceted mirror 670 is 5, and the upper and lower portions of the body have a regular pentagonal shape, the maximum viewing angle of the rotating multi-faceted mirror may be 144 degrees.

As a result, referring to FIGS. 23 to 25 described above, when the number of reflective surfaces of the rotating multi-faceted mirror is N, and the upper and lower portions of the body are N-shaped, if the inner angle of the N-shaped is theta, the rotating surface The maximum viewing angle of the mirror can be 360 degrees -2 theta.

However, since the above-described viewing angle of the rotating multi-faceted mirror is only calculated as a maximum value, the viewing angle determined by the rotating multi-faceted mirror in the lidar device may be smaller than the calculated maximum value. In this case, the lidar device may use only a portion of each reflective surface of the rotating multi-faceted mirror for scanning.

When the scanning unit of the lidar device includes a rotating multi-faceted mirror, the rotating multi-faceted mirror can be used to irradiate the laser emitted from the laser output unit toward the scan area of the lidar device, and is reflected from an object existing in the scan area. It can be used to receive the laser light to the sensor unit.

Here, a part of each reflective surface of the rotating multi-faceted mirror used to irradiate the emitted laser into the scan area of the lidar device will be referred to as an irradiation part. In addition, a portion of each reflective surface of the rotating multi-faceted mirror for receiving the laser reflected from the object present on the scan area to the sensor unit will be referred to as a light receiving portion.

26 is a view for explaining an irradiation portion and a light receiving portion of a multi-faceted rotating mirror according to an embodiment.

Referring to FIG. 26, a laser emitted from the laser output unit 100 may have a dot-shaped irradiation area and may be incident on a reflective surface of the mirror 700 if it is rotated. However, although not shown in FIG. 26, the laser emitted from the laser output unit 100 may have an irradiation area in the form of a line or a surface.

When the laser emitted from the laser output unit 100 has an irradiation area in the form of a dot, the irradiation portion 720 in the rotating multi-faceted mirror 700 rotates the point where the emitted laser meets the rotating multi-faceted mirror. If it is, it can be in the form of a line connected in the direction of rotation of the mirror. Accordingly, in this case, the irradiated portion 720 of the multi-faceted rotating mirror 700 may be positioned on each reflective surface in a line shape in a direction perpendicular to the rotating shaft 710 of the multi-faceted rotating mirror 700.

In addition, the laser irradiated from the irradiated portion 720 of the rotating multi-faceted mirror 700 and irradiated to the scan area 510 of the lidar device 1000 is transferred to the object 500 on the scan area 510. The laser 735 reflected from the object 500 may be reflected in a larger range than the irradiated laser 725. Accordingly, the laser 735 reflected from the object 500 is parallel to the irradiated laser, and may be received by the lidar device 1000 in a wider range.

In this case, the laser 735 reflected from the object 500 may be transmitted larger than the size of the reflective surface of the rotating mirror 700. However, the light-receiving part 730 of the rotating multi-faceted mirror 700 is a part for receiving the laser 735 reflected from the object 500 by the sensor unit 300, and is a part of the reflective surface of the rotating multi-faceted mirror 700. It may be a portion of the reflective surface that is smaller than the size.

For example, as shown in FIG. 26, when the laser 735 reflected from the object 500 is transmitted toward the sensor unit 300 through the rotating multi-faceted mirror 700, the rotating multi-faceted mirror 700 A portion of the reflective surface of which is reflected so as to be transmitted toward the sensor unit 300 may be the light receiving portion 730. Therefore, the light-receiving part 730 of the multi-faceted rotating mirror 700 may be a part of the reflective surface extending in the direction of rotation of the multi-faceted mirror 700 to be reflected so as to be transmitted toward the sensor unit 300. have.

In addition, when a condensing lens is further included between the rotating multi-faceted mirror 700 and the sensor unit 300, the light-receiving portion 730 of the rotating multi-faceted mirror 700 is transmitted toward the condensing lens among the reflective surfaces. If the part to be reflected is rotated, it may be a part extending in the rotation direction of the mirror 700.

However, in FIG. 26, the irradiation portion 720 and the light-receiving portion 730 of the rotating facet mirror 700 are described as being spaced apart, but the irradiation portion 720 and the light-receiving portion 730 of the rotating facet mirror 1550 Some of the silver may overlap, and the irradiation part 720 may be included in the light receiving part 730.

In addition, according to an embodiment, the steering component 230 may include an optical phased array (OPA) or the like to change the phase of the emitted laser and change the irradiation direction through it, but is not limited thereto.

The lidar device according to an exemplary embodiment may include an optical unit that directs a laser beam emitted from a laser output unit to an object.

The optical unit may include a beam collimation and steering component (BCSC) for collimating and steering a laser beam emitted from the laser output unit. The BCSC may be composed of one component or may be composed of a plurality of components.

27 is a diagram for describing an optical unit according to an exemplary embodiment.

Referring to FIG. 27, the optical unit according to an embodiment may include a plurality of components. For example, it may include a collimation component 210 and a steering component 230.

According to an embodiment, the collimation component 210 may perform a role of collimating the beam emitted from the laser output unit 100, and the steering component 230 may perform a collimation of the collimation component 210. It can play a role of steering the formed beam. As a result, the laser beam emitted from the optic may be directed in a predetermined direction.

The collimation component 210 may be a micro lens or a meta surface.

When the collimation component 210 is a micro lens, a micro lens array may be disposed on one side of the substrate, or a micro lens array may be disposed on both sides of the substrate.

When the collimation component 210 is a meta surface, the laser beam may be collimated by a nano pattern formed by a plurality of nano pillars included in the meta surface.

The steering component 230 may be a micro lens, a micro prism, or a meta surface.

When the steering component 230 is a micro lens, a micro lens array may be disposed on one side of the substrate, or a micro lens array may be disposed on both sides of the substrate.

When the steering component 230 is a micro prism, it can be steered by the angle of the micro prism.

When the steering component 230 is a meta surface, the laser beam may be steered by a nano pattern formed by a plurality of nano pillars included in the meta surface.

According to an embodiment, when the optical unit includes a plurality of components, correct placement may be required between the plurality of components. At this time, the collimation component and the steering component can be correctly arranged through an alignment mark. In addition, a printed circuit board (PCB), a VCSEL array, a collimation component, and a steering component can be correctly arranged through an alignment mark.

For example, by inserting an alignment mark between the VCSEL units included in the VCSEL array or at the edge of the VCSEL array, the VCSEL array and the collimation component can be correctly arranged.

In addition, for example, by inserting an alignment mark between the collimation components or at the edge portion, the collimation component and the steering component can be correctly positioned.

28 is a diagram for describing an optical unit according to an exemplary embodiment.

Referring to FIG. 28, the optical unit according to an embodiment may include one single component. For example, it may include a meta component 270.

According to an embodiment, the meta component 270 may collimate or steer a laser beam emitted from the laser output unit 100.

For example, the meta component 270 includes a plurality of meta-surfaces, collimating a laser beam emitted from the laser output unit 100 in one meta-surface, and collimating a laser beam in the other meta-surface. Can be steered. It will be described in detail in FIG. 29 below.

Alternatively, for example, the meta component 270 may collimate and steer a laser beam emitted from the laser output unit 100 including one meta surface. It will be described in detail in FIG. 24 below.

29 is a diagram for describing a meta component according to an embodiment.

Referring to FIG. 29, the meta component 270 according to an embodiment may include a plurality of meta surfaces 271 and 273. For example, it may include a first meta surface 271 and a second meta surface 273.

The first meta surface 271 may be disposed in a direction in which the laser beam is emitted from the laser output unit 100. The first metasurface 271 may include a plurality of nanopillars. The first metasurface may form a nanopattern by a plurality of nanopillars. The first meta-surface 271 may collimate the laser beam emitted from the laser output unit 100 by the formed nanopatterns.

The second meta-surface 273 may be disposed in a direction in which the laser beam is output from the first meta-surface 271. The second metasurface 273 may include a plurality of nanopillars. The second meta-surface 273 may form a nano pattern by a plurality of nano-pillars. The second meta-surface 273 may steer the laser beam emitted from the laser output unit 100 by the formed nanopatterns. For example, as shown in FIG. 24, the laser beam can be steered in a specific direction by the increase/decrease rate of the width W of the plurality of nanopillars. In addition, the laser beam may be steered in a specific direction by the distance P, the height H, and the number per unit length of the plurality of nanopillars.

30 is a diagram for describing a meta component according to another embodiment.

Referring to FIG. 30, the meta component 270 according to an embodiment may include one meta surface 274.

The meta surface 275 may include a plurality of nanopillars on both sides. For example, the meta-surface 275 may include a first nano-pillar set 276 on a first surface and a second nano-pillar set 278 on a second surface.

The meta-surface 275 may be steered after collimating the laser beam emitted from the laser output unit 100 by a plurality of nano-pillars forming respective nano patterns on both sides.

For example, the first set of nanopillars 276 disposed on one side of the metasurface 275 may form a nanopattern. The laser beam emitted from the laser output unit 100 may be collimated by the nano pattern formed by the first nano-pillar set 276. The second nano-pillar set 278 disposed on the other side of the meta-surface 275 may form a nano pattern. The laser beam passing through the first nanopillar 276 may be steered in a specific direction by the nanopattern formed by the second nanopillar set 278.

31 is a diagram for describing an SPAD array according to an embodiment.

Referring to FIG. 31, the sensor unit 300 according to an embodiment may include a SPAD array 750. 31 illustrates an 8X8 SPAD array, but is not limited thereto, and may be 10X10, 12X12, 24X24, 64X64, or the like.

The SPAD array 750 according to an embodiment may include a plurality of SPADs 751. For example, the plurality of SPADs 751 may be disposed in a matrix structure, but are not limited thereto, and may be disposed in a circular, elliptical, honeycomb structure, or the like.

When a laser beam is incident on the SPAD array 750, photons may be detected by an avalanche phenomenon. According to an embodiment, a result of the SPAD array 750 may be accumulated in the form of a histogram.

32 is a diagram for describing a histogram of SPAD according to an embodiment.

Referring to FIG. 32, the SPAD 751 according to an embodiment may detect photons. When the SPAD 751 detects a photon, signals 766 and 767 may be generated.

After the SPAD 751 detects a photon, it may take a recovery time to return to a state capable of detecting the photon again. If the recovery time has not elapsed after the SPAD 751 detects the photon, even if the photon enters the SPAD 751 at this time, the SPAD 751 cannot detect the photon. Thus, the resolution of the SPAD 751 may be determined by the recovery time.

According to an embodiment, the SPAD 751 may detect photons for a predetermined time after the laser beam is output from the laser output unit. At this time, the SPAD 751 may detect photons during a cycle of a predetermined period. For example, SPAD 751 may detect photons multiple times during a cycle according to the time resolution of SPAD 751. At this time, the time resolution of the SPAD 751 may be determined by the recovery time of the SPAD 751.

According to an embodiment, the SPAD 751 may detect photons reflected from the object and other photons. For example, the SPAD 751 may generate a signal 767 when detecting a photon reflected from an object.

Also, for example, when the SPAD 751 detects photons other than the photons reflected from the object, the signal 766 may be generated. In this case, photons other than photons reflected from the object may include sunlight or a laser beam reflected from a window.

According to an embodiment, the SPAD 751 may detect photons for a predetermined period of time after outputting a laser beam from the laser output unit.

For example, the SPAD 751 may detect photons during a first cycle after outputting a first laser beam from the laser output unit. In this case, the SPAD 751 may generate a first detecting signal 761 after detecting a photon.

Also, for example, the SPAD 751 may detect photons during a second cycle after outputting a second laser beam from the laser output unit. In this case, the SPAD 751 may generate a second detecting signal 762 after detecting a photon.

Also, for example, the SPAD 751 may detect photons during a third cycle after outputting a third laser beam from the laser output unit. In this case, the SPAD 751 may generate a third detecting signal 763 after detecting a photon.

Also, for example, the SPAD 751 may detect photons during the Nth cycle after outputting the Nth laser beam from the laser output unit. In this case, the SPAD 751 may generate an Nth detecting signal 764 after detecting a photon.

At this time, the first detecting signal 761, the second detecting signal 762, and the third detecting signal 763? The Nth detecting signal 764 may include a signal 767 due to photons reflected from the object or a signal 766 due to photons other than photons reflected from the object.

In this case, the Nth detecting signal 764 may be a photon detecting signal during the Nth cycle after outputting the Nth laser beam. For example, N may be 5, 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 200, 300, etc.

Signals by the SPAD 751 may be accumulated in the form of a histogram. The histogram may have a plurality of histogram bins. The signals generated by the SPAD 751 correspond to each histogram bin and may be accumulated in the form of a histogram.

For example, the histogram may be formed by accumulating signals by one SPAD 751 or by accumulating signals by a plurality of SPADs 751.

For example, the first detecting signal 761, the second detecting signal 762, the third detecting signal 763 ?? The histogram 765 may be created by accumulating the Nth detecting signals 764. In this case, the histogram 765 may include a signal due to photons reflected from the object or a signal due to other photons.

In order to obtain distance information of an object, it is necessary to extract a signal by a photon reflected from the object from the histogram 765. The signal by photons reflected from the object may be more positive and more regular than signals by other photons.

In this case, a signal due to photons reflected from the object within a cycle may be regularly present at a specific time. On the other hand, the amount of signal caused by sunlight is small and may exist irregularly.

There is a high possibility that a signal with a large amount of histogram accumulated at a specific time is a signal caused by a photon reflected from the object. Accordingly, a signal having a large amount of accumulation among the accumulated histogram 765 may be extracted as a signal by photons reflected from the object.

For example, a signal having the highest value among the histogram 765 may be extracted as a signal by photons reflected from the object. Also, for example, a signal of a certain amount 768 or more of the histogram 765 may be extracted as a signal by photons reflected from the object.

In addition to the method described above, among the histogram 765, there may be various algorithms capable of extracting a signal by photons reflected from an object.

After extracting a signal by photons reflected from the object from the histogram 765, distance information of the object may be calculated based on the generation time of the corresponding signal or the reception time of the photon.

For example, the signal extracted from the histogram 765 may be a signal at one scan point. In this case, one scan point may correspond to one SPAD.

For another example, signals extracted from a plurality of histograms may be signals at one scan point. In this case, one scan point may correspond to a plurality of SPADs.

According to another embodiment, a weight is applied to signals extracted from a plurality of histograms to calculate a signal at one scan point. In this case, the weight may be determined by the distance between SPADs.

For example, the signal at the first scan point has a weight of 0.8 for the signal by the first SPAD, a weight of 0.6 for the signal by the second SPAD, a weight of 0.4 for the signal by the third SPAD, and a weight of 0.4 for the signal by the third SPAD. It can be calculated by putting a weight of 0.2 on the signal.

When the signals extracted from a plurality of histograms are weighted and calculated as a signal at one scan point, the effect of accumulating the histogram several times with one histogram accumulation can be obtained. Accordingly, the effect of reducing the scan time and reducing the time to obtain the entire image can be derived.

According to another embodiment, the laser output unit may output a laser beam in an addressable manner. Alternatively, the laser output unit may output a laser beam addressably for each big cell unit.

For example, the laser output unit outputs the laser beam of the BIXEL unit in 1 row and 1 column once, and then outputs the laser beam of the BIXEL unit in 1 row and 3 columns once, and then outputs the laser beam of the BIXEL unit in 2 rows and 4 columns once. Can be printed. In this way, the laser output unit may output the laser beam of the big cell unit in row A and column B N times, and then output the laser beam of the big cell unit in column C and column D M times.

In this case, the SPAD array may receive a laser beam reflected from the object and returned from among the laser beams output from the corresponding big cell unit.

For example, in the case where the BIXEL unit in the first row and one column of the laser beam output sequence of the laser output unit outputs the Nth laser beam, the SPAD unit in the first row and one column corresponding to the first row and one column is reflected on the object. Can be received up to N times.

In addition, for example, if the laser beam reflected in the histogram of the SPAD must be accumulated N times, and there are M big cell units in the laser output unit, the M big cell units can be operated N times at once. Alternatively, one M big cell unit may be operated M*N times, or M big cell units may be operated 5 times M*N/5 times.

33 is a diagram for describing a SiPM according to an embodiment.

Referring to FIG. 33, the sensor unit 300 according to an embodiment may include a SiPM 780. The SiPM 780 according to an embodiment may include a plurality of microcells 781 and a plurality of microcell units 782. For example, the microcell may be SPAD. Also, for example, the microcell unit 782 may be an SPAD array that is a set of a plurality of SPADs.

The SiPM 780 according to an embodiment may include a plurality of microcell units 782. FIG. 33 shows the SiPM 780 in which the microcell units 782 are arranged in a 4X6 matrix, but is not limited thereto, and may be a 10X10, 12X12, 24X24, 64X64 matrix, or the like. Further, the microcell unit 782 may be disposed in a matrix structure, but is not limited thereto, and may be disposed in a circular, elliptical, honeycomb structure, or the like.

When a laser beam is incident on the SiPM 780, photons may be detected by the avalanche phenomenon. According to an embodiment, a result of the SiPM 780 may be accumulated in the form of a histogram.

There are several differences between the histogram of the SiPM 780 and the histogram of the SPAD 751.

As described above, the histogram by the SPAD 751 may be accumulated as N detecting signals formed by receiving the N-th laser beam of one SPAD 751. In addition, the histogram of the SPAD 751 may be accumulated as X*Y detecting signals formed by receiving the Y-numbered laser beam of the X SPADs 751.

On the other hand, the histogram by the SiPM 780 may be formed by accumulating signals by one microcell unit 782 or by accumulating signals by a plurality of microcell units 782.

According to an embodiment, one microcell unit 782 may output the first laser beam from the laser output unit and then detect photons reflected from the object to form a histogram.

For example, the histogram of the SiPM 780 may be formed by accumulating a signal generated by detecting photons reflected from an object by a plurality of microcells included in one microcell unit 782.

According to another embodiment, the plurality of microcell units 782 may generate a histogram by detecting photons reflected from the object after outputting the first laser beam from the laser output unit.

For example, the histogram of the SiPM 780 may be formed by accumulating a signal generated by detecting photons reflected from an object by a plurality of microcells included in the plurality of microcell units 782.

As for the histogram by the SPAD 751, one SPAD 751 or a plurality of SPADs 751 may require the N-th laser beam output of the laser output unit. However, the histogram by the SiPM 780 may require only one laser beam output from one microcell unit 782 or a plurality of microcell units 782.

Accordingly, the histogram of the SPAD 751 may take a longer time to accumulate the histogram than the histogram of the SiPM 780. The histogram by the SiPM 780 has the advantage that it is possible to quickly form a histogram with only one laser beam output.

34 is a diagram for describing a histogram of SiPM according to an exemplary embodiment.

Referring to FIG. 34, the SiPM 780 according to an embodiment may detect photons. For example, the microcell unit 782 may detect photons. When the microcell unit 782 detects a photon, signals 787 and 788 may be generated.

After the microcell unit 782 detects the photons, a recovery time may be required before returning to a state capable of detecting the photons again. When the recovery time has not elapsed after the microcell unit 782 detects the photons, even if the photons are incident on the microcell unit 782 at this time, the microcell unit 782 cannot detect the photons. Accordingly, the resolution of the microcell unit 782 may be determined by the recovery time.

According to an embodiment, the microcell unit 782 may detect photons for a predetermined time after the laser beam is output from the laser output unit. At this time, the microcell unit 782 may detect photons during a cycle of a predetermined period. For example, the microcell unit 782 may detect a photon multiple times during a cycle according to the time resolution of the microcell unit 782. In this case, the time resolution of the microcell unit 782 may be determined by the recovery time of the microcell unit 782.

According to an embodiment, the microcell unit 782 may detect photons reflected from an object and other photons. For example, when the microcell unit 782 detects a photon reflected from an object, it may generate a signal 787.

Also, for example, when the microcell unit 782 detects photons other than the photons reflected from the object, the microcell unit 782 may generate a signal 788. In this case, photons other than photons reflected from the object may include sunlight or a laser beam reflected from a window.

According to an embodiment, the microcell unit 782 may detect photons for a predetermined period of time after outputting a laser beam from the laser output unit.

For example, the first microcell 783 included in the microcell unit 782 may detect photons during a first cycle after outputting a laser beam from the laser output unit. In this case, the first microcell 783 may generate a first detecting signal 791 after detecting a photon.

Also, for example, the second microcell 784 included in the microcell unit 782 may detect photons during a first cycle after outputting a laser beam from the laser output unit. In this case, the second microcell 784 may generate a first detecting signal 792 after detecting a photon.

Also, for example, the third microcell 785 included in the microcell unit 782 may detect photons during a first cycle after outputting a laser beam from the laser output unit. In this case, the third microcell 785 may detect a photon and then generate a third detecting signal 793.

Also, for example, the Nth microcell 786 included in the microcell unit 782 may detect photons during a first cycle after outputting a laser beam from the laser output unit. In this case, the Nth microcell 786 may generate an Nth detecting signal 794 after detecting a photon.

At this time, the first detecting signal 791, the second detecting signal 792, and the third detecting signal 793? The Nth detecting signal 794 may include a signal 787 due to photons reflected from the object or a signal 788 due to photons other than photons reflected from the object.

In this case, the Nth detecting signal 764 may be a photon detecting signal of the Nth microcell included in the microcell unit 782. For example, N may be 5, 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 200, 300, etc.

Signals from microcells can be accumulated in the form of a histogram. The histogram can have multiple histogram bins. Signals generated by the microcells correspond to histogram bins and may be accumulated in the form of a histogram.

For example, the histogram may be formed by accumulating signals by one microcell unit 782 or by accumulating signals by a plurality of microcell units 782.

For example, the first detecting signal 791, the second detecting signal 792, and the third detecting signal 793? The histogram 795 may be created by accumulating the Nth detecting signals 794. In this case, the histogram 795 may include a signal due to photons reflected from the object or a signal due to other photons.

In order to obtain distance information of an object, it is necessary to extract a signal by photons reflected from the object from the histogram 795. The signal by photons reflected from the object may be more positive and more regular than signals by other photons.

In this case, a signal due to photons reflected from the object within a cycle may be regularly present at a specific time. On the other hand, the amount of signal caused by sunlight is small and may exist irregularly.

There is a high possibility that a signal with a large amount of histogram accumulated at a specific time is a signal caused by a photon reflected from the object. Accordingly, a signal having a large amount of accumulation among the accumulated histogram 795 may be extracted as a signal by photons reflected from the object.

For example, a signal having the highest value among the histogram 795 may be extracted as a signal caused by photons reflected from the object. In addition, for example, a signal of a certain amount 797 or more of the histogram 795 may be extracted as a signal by photons reflected from the object.

In addition to the method described above, among the histogram 795, there may be various algorithms capable of extracting a signal by a photon reflected from an object.

After extracting a signal by photons reflected from the object from the histogram 795, distance information of the object may be calculated based on the generation time of the corresponding signal or the reception time of the photon.

According to another embodiment, the laser output unit may output a laser beam in an addressable manner. Alternatively, the laser output unit may output a laser beam addressably for each big cell unit.

For example, the laser output unit outputs the laser beam of the BIXEL unit in 1 row and 1 column once, and then outputs the laser beam of the BIXEL unit in 1 row and 3 columns once, and then outputs the laser beam of the BIXEL unit in 2 rows and 4 columns once. Can be printed. In this way, the laser output unit may output the laser beam of the big cell unit in row A and column B N times, and then output the laser beam of the big cell unit in column C and column D M times.

In this case, the SiPM may receive a laser beam reflected from the object and returned from among the laser beams output from the corresponding big cell unit.

For example, in the case that the BICCELL unit in the 1st row and 1st column of the laser beam output sequence of the laser output unit outputs the Nth laser beam, the microcell unit in the 1st row and 1st column corresponding to the 1st row 1st column is reflected on the object The beam can be received up to N times.

In addition, for example, if the laser beam reflected in the histogram of the SiPM should be accumulated N times, and there are M big cell units in the laser output unit, the M big cell units can be operated N times at once. Alternatively, one M big cell unit may be operated M*N times, or M big cell units may be operated 5 times M*N/5 times.

Lida can be implemented in several ways. For example, there may be a flash method and a scanning method for lidar.

As described above, the flash method is a method in which a laser beam is spread to an object by the divergence of the laser beam. Since the flash method collects distance information of an object by illuminating a single laser pulse to the FOV, the resolution of the flash type lidar may be determined by a sensor unit or a receiver.

In addition, as described above, the scanning method is a method of directing a laser beam emitted from the laser output unit in a specific direction. Since the scanning method illuminates the laser beam to the FOV using a scanner or a steering unit, the resolution of the scanning type lidar may be determined by the scanner or the steering unit.

According to an embodiment, the lidar may be implemented in a mixed method of a flash method and a scanning method. In this case, the combination of the flash method and the scanning method may be a semi-flash method or a semi-scanning method. Alternatively, a mixed method of a flash method and a scanning method may be a quasi-flash method or a quasi-scanning method.

The semi-flash type lidar or the quasi-flash type lidar may mean a semi-flash type lidar rather than a complete flash type. For example, one unit of the laser output unit and one unit of the receiving unit may be a flash type lidar, but a plurality of units of the laser output unit and a plurality of units of the reception unit are gathered, so that the semi-flash type is not a complete flash type lidar It can be is.

In addition, for example, since the laser beam output from the laser output unit of the semi-flash type lidar or the quasi flash type lidar may pass through the steering unit, it may be a semi-flash type lidar instead of a complete flash type lidar.

The semi-flash type lidar or the quasi-flash type lidar may overcome the disadvantages of the flash type lidar. For example, a flash type radar may be vulnerable to interference between laser beams, a strong flash is required to detect an object, and there is a problem that the detection range cannot be limited.

However, the semi-flash type lidar or the quasi-flash type lidar allows laser beams to pass through a steering unit to overcome interference between laser beams, and control each laser output unit, thereby controlling the detection range. You can, and you may not need a strong flash.

35 is a diagram for describing a semi-flash lidar according to an embodiment.

Referring to FIG. 35, a semi-flash lidar 800 according to an embodiment may include a laser output unit 810, a beam collimation & steering component (BCSC) 820, a scanning unit 830, and a receiving unit 840. I can.

The semi-flash lidar 800 according to an embodiment may include a laser output unit 810. For example, the laser output unit 810 may include a big cell array. In this case, the laser output unit 810 may include a big cell array in which units including a plurality of big cell emitters are gathered.

The semi-flash lidar 800 according to an embodiment may include a BCSC 820. For example, BCSC 820 may include a collimation component 210 and a steering component 230.

According to an embodiment, the laser beam output from the laser output unit 810 is collimated by the collimation component 210 of the BCSC 820, and the collimated laser beam is the steering component 230 of the BCSC 820. ) Can be steered.

For example, a laser beam output from a first bixel unit included in the laser output unit 810 may be collimated by a first collimation component and steered in a first direction by a first steering component.

Also, for example, the laser beam output from the second big cell unit included in the laser output unit 810 may be collimated by the second collimation component and steered in the second direction by the second steering component.

In this case, the big cell units included in the laser output unit 810 may be steered in different directions. Therefore, unlike the flash method by diffusion of a single pulse, the laser beam of the laser output unit of the semi-flash method LiDAR can be steered in a specific direction by BCSC. Therefore, the laser beam output from the laser output unit of the semi-flash type lidar can be directional by BCSC.

The semi-flash lidar 800 according to an embodiment may include a scanning unit 830. For example, the scanning unit 830 may include an optical unit 200. For example, the scanning unit 830 may include a mirror that reflects the laser beam.

For example, the scanning unit 830 may include a planar mirror, a multifaceted mirror, a resonant mirror, a MEMS mirror, and a galvano mirror. In addition, for example, the scanning unit 830 may include a multifaceted mirror rotating 360 degrees along one axis and a noding mirror repeatedly driven in a preset range along one axis.

The semi-flash type radar may include a scanning unit. Therefore, unlike a flash method in which an entire image is acquired at once by spreading a single pulse, a semi-flash radar can scan an image of an object by a scanning unit.

In addition, the object may be randomly scanned by laser output from the laser output unit of the semi-flash type lidar. Therefore, the semi-flash type radar can intensively scan only a desired region of interest among the entire FOV.

The semi-flash lidar 800 according to an embodiment may include a receiver 840. For example, the receiving unit 840 may include a sensor unit 300. Also, for example, the receiving unit 840 may be a SPAD array 750. Also, for example, the receiving unit 840 may be a SiPM 780.

The receiving unit 850 may include various sensor elements. For example, the receiving unit 840 may include a PN photodiode, a phototransistor, a PIN photodiode, an APD, SPAD, SiPM, TDC, CMOS, or CCD, but is not limited thereto.

In this case, the receiving unit 840 may stack a histogram. For example, the receiving unit 840 may detect a light-receiving point of a laser beam reflected from the object 850 and received by using a histogram.

The receiving unit 840 according to an embodiment may include one or more optical elements. For example, the receiving unit 840 may include an aperture, a micro lens, a converging lens, or a diffuser, but is not limited thereto.

In addition, the receiving unit 840 according to an embodiment may include one or more optical filters. The receiver 840 may receive the laser reflected from the object through an optical filter. For example, the receiving unit 840 may include a band pass filter, a dichroic filter, a guided-mode resonance filter, a polarizer, and a wedge filter, but is not limited thereto.

According to an embodiment, the semi-flash type lidar 800 may have a constant optical path between components.

For example, light output from the laser output unit 810 may be incident on the scanning unit 830 through the BCSC 820. In addition, light incident on the scanning unit 830 may be reflected and incident on the object 850. In addition, light incident on the object 850 may be reflected and again incident on the scanning unit 830. In addition, light incident on the scanning unit 830 may be reflected and received by the receiving unit 840. A lens for increasing transmission and reception efficiency may be additionally inserted into the above optical path.

36 is a diagram for describing a configuration of a semi-flash lidar according to an embodiment.

Referring to FIG. 36, a semi-flash lidar 800 according to an embodiment may include a laser output unit 810, a scanning unit 830, and a receiving unit 840.

According to an embodiment, the laser output unit 810 may include a big cell array 811. Although only the big cell array 811 in one column is shown in FIG. 36, the big cell array 811 is not limited thereto, and the big cell array 811 may have an N X M matrix structure.

According to an embodiment, the big cell array 811 may include a plurality of big cell units 812. In this case, the big cell unit 812 may include a plurality of big cell emitters. For example, the big cell array 811 may include 25 big cell units 812. In this case, the 25 big cell units 812 may be arranged in one row, but the present invention is not limited thereto.

According to an embodiment, the big cell unit 812 may have a diverging angle. For example, the big cell unit 812 may have a horizontal diffusion angle 813 and a vertical diffusion angle 814. For example, the big cell unit 812 may have a horizontal diffusion angle 813 of 1.2 degrees and a vertical diffusion angle 814 of 1.2 degrees, but the present invention is not limited thereto.

According to an embodiment, the scanning unit 830 may receive a laser beam output from the laser output unit 810. In this case, the scanning unit 830 may reflect the laser beam toward the object. Also, the scanning unit 830 may receive a laser beam reflected from an object. In this case, the scanning unit 830 may transmit the laser beam reflected from the object to the receiving unit 840.

In this case, the area reflecting the laser beam toward the object and the area receiving the laser beam reflected from the object may be the same or different. For example, an area reflecting a laser beam toward the object and an area receiving the laser beam reflected from the object may be in the same reflective surface. In this case, the areas may be divided up and down or left and right within the same reflective surface.

Also, for example, an area reflecting a laser beam toward the object and an area receiving the laser beam reflected from the object may be different reflective surfaces. For example, an area reflecting a laser beam toward an object may be a first reflective surface of the scanning unit 830, and an area receiving a laser beam reflected from the object may be a second reflective surface of the scanning unit 830 .

According to an embodiment, the scanning unit 830 may reflect the 2D laser beam output from the laser output unit 810 toward the object. In this case, the lidar device may scan the object in 3D due to rotation or scanning of the scanning unit 830.

According to an embodiment, the receiving unit 840 may include a SPAD array 841. Although only one column of SPAD array 841 is shown in FIG. 36, the present invention is not limited thereto, and the SPAD array 841 may have an N X M matrix structure.

According to an embodiment, the SPAD array 841 may include a plurality of SPAD units 842. In this case, the SPAD unit 842 may include a plurality of SPAD pixels 847. For example, the SPAD unit 842 may include a 12 X 12 SPAD pixel 847. In this case, the SPAD pixel 847 may mean one SPAD element, but is not limited thereto.

Also, for example, the SPAD array 841 may include 25 SPAD units 842. In this case, the 25 SPAD units 842 may be arranged in one row, but the present invention is not limited thereto. In this case, the arrangement of the SPAD unit 842 may correspond to the arrangement of the big cell unit 812.

According to an embodiment, the SPAD unit 842 may have a FOV capable of receiving light. For example, the SPAD unit 842 may have a horizontal FOV 843 and a vertical FOV 844. For example, the SPAD unit 842 may have a horizontal FOV 843 of 1.2 degrees and a vertical FOV 844 of 1.2 degrees.

In this case, the FOV of the SPAD unit 842 may be proportional to the number of SPAD pixels 847 included in the SPAD unit 842. Alternatively, the FOV of each SPAD pixel 847 included in the SPAD unit 842 may be determined by the FOV of the SPAD unit 842.

For example, when the horizontal FOV 845 and the vertical FOV 846 of the individual SPAD pixel 847 is 0.1 degrees, if the SPAD unit 842 includes the SPAD pixel 847 of NXM, the SPAD unit 842 The horizontal FOV 843 may be 0.1*N, and the vertical FOV 844 may be 0.1*M.

Also, for example, when the horizontal FOV 843 and the vertical FOV 844 of the SPAD unit 842 are 1.2 degrees, and the SPAD unit 842 includes 12 X 12 SPAD pixels 847, individual SPAD pixels The horizontal FOV 845 and the vertical FOV 846 of 847 may be 0.1 degrees (1.2/12).

According to another embodiment, the receiving unit 840 may include a SiPM array 841. Although only one column of SiPM array 841 is shown in FIG. 36, the present invention is not limited thereto, and the SiPM array 841 may have an N X M matrix structure.

According to an embodiment, the SiPM array 841 may include a plurality of microcell units 842. In this case, the microcell unit 842 may include a plurality of microcells 847. For example, the microcell unit 842 may include a 12 X 12 microcell 847.

Also, for example, the SiPM array 841 may include 25 microcell units 842. In this case, the 25 microcell units 842 may be arranged in one row, but the present invention is not limited thereto. Also, at this time, the arrangement of the microcell units 842 may correspond to the arrangement of the big cell units 812.

According to an embodiment, the microcell unit 842 may have a FOV capable of receiving light. For example, the microcell unit 842 may have a horizontal FOV 843 and a vertical FOV 844. For example, the microcell unit 842 may have a horizontal FOV 843 of 1.2 degrees and a vertical FOV 844 of 1.2 degrees.

In this case, the FOV of the microcell unit 842 may be proportional to the number of microcells included in the microcell unit 842. Alternatively, the FOV of the individual microcells 847 included in the microcell unit 842 may be determined by the FOV of the microcell unit 842.

For example, when the horizontal FOV 845 and the vertical FOV 846 of the individual microcells 847 are 0.1 degrees, if the microcell unit 842 includes the microcells 847 of the NXM, the microcell unit 842 ), the horizontal FOV 843 may be 0.1*N, and the vertical FOV 844 may be 0.1*M.

Also, for example, when the horizontal FOV 843 and the vertical FOV 844 of the microcell unit 842 are 1.2 degrees, and the microcell unit 842 includes a 12×12 microcell 847, the individual The horizontal FOV 845 and the vertical FOV 846 of the microcell 847 may be 0.1 degrees (1.2/12).

According to another embodiment, one big cell unit 812 and a plurality of SPAD units or microcell units 842 may correspond. For example, the laser beam output from the BIXEL unit 812 in one row and one column is reflected by the scanning unit 830 and the object 850, so that the SPAD unit or microcell unit 842 in the first row and the first row and the second row is reflected. ) Can be received.

According to another embodiment, a plurality of big cell units 812 and one SPAD unit or microcell unit 842 may correspond. For example, the laser beam output from the BIXEL unit 812 in one row and one column may be reflected by the scanning unit 830 and the object 850 and received by the SPAD unit or the microcell unit 842 in one row and one column. have.

According to an embodiment, the big cell unit 812 of the laser output unit 810 and the SPAD unit or the microcell unit 842 of the receiving unit 840 may correspond to each other.

For example, the horizontal diffusion angle and the vertical diffusion angle of the big cell unit 812 may be the same as the horizontal FOV 845 and the vertical FOV 846 of the SPAD unit or microcell unit 842.

For example, the laser beam output from the BIXEL unit 812 in one row and one column may be reflected by the scanning unit 830 and the object 850 and received by the SPAD unit or the microcell unit 842 in one row and one column. have.

In addition, for example, the laser beam output from the BIXEL unit 812 in N rows and M columns is reflected by the scanning unit 830 and the object 850 to be received by the SPAD unit or microcell unit 842 in the N rows and M columns. I can.

At this time, the laser beam output from the big cell unit 812 in N rows and M columns and reflected by the scanning unit 830 and the object 850 is received by the SPAD unit or microcell unit 842 in the N rows and M columns, and is a lidar. Device 800 may have resolution by means of a SPAD unit or microcell unit 842.

For example, if the SPAD unit or microcell unit 842 includes SPAD pixels or microcells 847 in N rows and M columns, the FOV to which the big cell unit 812 is irradiated is divided into the NXM area to determine the distance information of the object. I can.

According to another embodiment, one big cell unit 812 and a plurality of SPAD units or microcell units 842 may correspond. For example, the laser beam output from the BIXEL unit 812 in one row and one column is reflected by the scanning unit 830 and the object 850, so that the SPAD unit or microcell unit 842 in the first row and the first row and the second row is reflected. ) Can be received.

According to another embodiment, a plurality of big cell units 812 and one SPAD unit or microcell unit 842 may correspond. For example, the laser beam output from the BIXEL unit 812 in one row and one column may be reflected by the scanning unit 830 and the object 850 and received by the SPAD unit or the microcell unit 842 in one row and one column. have.

According to an embodiment, the plurality of big cell units 812 included in the laser output unit 810 may operate according to a certain sequence or may operate randomly. In this case, the SPAD unit or the microcell unit 842 of the receiving unit 840 may also operate in response to the operation of the big cell unit 812.

For example, after a first row big cell unit of the big cell array 811 operates, a third row big cell unit may operate. Then, the fifth big cell unit may operate, and then the seventh big cell unit may operate.

In this case, after the first row SPAD unit or microcell unit 842 of the receiving unit 840 operates, the third row SPAD unit or microcell unit 842 may operate. Then, the fifth SPAD unit or microcell unit 842 may operate, and then the seventh SPAD unit or microcell unit 842 may operate.

Also, for example, the big cell unit of the big cell array 811 may operate randomly. In this case, the SPAD unit or the microcell unit 842 of the receiver existing at a position corresponding to the position of the randomly operated big cell unit 812 may operate.

37 is a diagram for describing a semi-flash lidar according to another embodiment.

Referring to FIG. 37, a semi-flash lidar 900 according to another embodiment may include a laser output unit 910, a BCSC 920, and a reception unit 940.

The semi-flash lidar 900 according to an embodiment may include a laser output unit 910. Since the description of the laser output unit 910 may be duplicated with the laser output unit 810 of FIG. 35, a detailed description will be omitted.

The semi-flash lidar 900 according to an embodiment may include a BCSC 920. The description of the BCSC 920 may be duplicated with the BCSC 820 of FIG. 35, and a detailed description thereof will be omitted.

The semi-flash lidar 900 according to an embodiment may include a receiver 940. Since the description of the receiving unit 940 may be duplicated with the receiving unit 840 of FIG. 35, a detailed description will be omitted.

According to an embodiment, the semi-flash type lidar 900 may have a constant optical path between components.

For example, light output from the laser output unit 910 may be incident on the object 950 through the BCSC 920. In addition, light incident on the object 950 may be reflected and received by the receiving unit 940. A lens for increasing transmission and reception efficiency may be additionally inserted into the above optical path.

Compared with the semi-flash lidar 800 of FIG. 35, the semi-flash lidar 900 of FIG. 37 may not include a scanning unit. The scanning role of the scanning unit may be performed by the laser output unit 910 and the BCSC 920.

For example, the laser output unit 910 may include an addressable big cell array and may partially output a laser beam to an ROI by an addressable operation.

Also, for example, the BCSC 920 may include a collimation component and a steering component to provide a specific direction to the laser beam to irradiate the laser beam to a desired region of interest.

In addition, compared to the semi-flash lidar 800 of FIG. 35, the optical path of the semi-flash lidar 900 of FIG. 37 may be simplified. By simplifying the optical path, light loss during light reception can be minimized, and the possibility of occurrence of crosstalk can be reduced.

38 is a diagram for describing a configuration of a semi-flash lidar according to another embodiment.

Referring to FIG. 38, a semi-flash lidar 900 according to an embodiment may include a laser output unit 910 and a reception unit 940.

According to an embodiment, the laser output unit 910 may include a big cell array 911. For example, the big cell array 99110 may have an N X M matrix structure.

According to an embodiment, the big cell array 911 may include a plurality of big cell units 914. In this case, the big cell unit 914 may include a plurality of big cell emitters. For example, the big cell array 811 may include 1250 big cell units 914 having a 50 X 25 matrix structure, but is not limited thereto.

According to an embodiment, the big cell unit 914 may have a diverging angle. For example, the big cell unit 914 may have a horizontal diffusion angle 915 and a vertical diffusion angle 916. For example, the big cell unit 914 may have a horizontal diffusion angle 813 of 1.2 degrees and a vertical diffusion angle 814 of 1.2 degrees, but are not limited thereto.

According to an embodiment, the receiving unit 940 may include a SPAD array 941. For example, the SPAD array 841 may have an N X M matrix structure.

According to an embodiment, the SPAD array 941 may include a plurality of SPAD units 944. In this case, the SPAD unit 944 may include a plurality of SPAD pixels 947. For example, the SPAD unit 944 may include a 12 X 12 SPAD pixel 947.

Also, for example, the SPAD array 941 may include 1250 SPAD units 944 in a 50 X 25 matrix structure. In this case, the arrangement of the SPAD unit 944 may correspond to the arrangement of the big cell unit 914.

According to an embodiment, the SPAD unit 944 may have a FOV capable of receiving light. For example, the SPAD unit 944 may have a horizontal FOV 945 and a vertical FOV 946. For example, the SPAD unit 944 may have a horizontal FOV 945 of 1.2 degrees and a vertical FOV 946 of 1.2 degrees.

In this case, the FOV of the SPAD unit 944 may be proportional to the number of SPAD pixels 947 included in the SPAD unit 944. Alternatively, the FOV of the individual SPAD pixel 947 included in the SPAD unit 944 may be determined by the FOV of the SPAD unit 944.

For example, when the horizontal FOV 948 and the vertical FOV 949 of the individual SPAD pixel 947 are 0.1 degrees, if the SPAD unit 944 includes the SPAD pixel 947 of NXM, the SPAD unit 944 The horizontal FOV 945 can be 0.1*N, and the vertical FOV 946 can be 0.1*M.

Also, for example, when the horizontal FOV 945 and the vertical FOV 946 of the SPAD unit 944 is 1.2 degrees, and the SPAD unit 944 includes a 12 X 12 SPAD pixel 947, the individual SPAD pixel The horizontal FOV 948 and the vertical FOV 949 of 947 may be 0.1 degrees (1.2/12).

According to another embodiment, the receiving unit 840 may include a SiPM array 941. For example, the SiPM array 841 may have an N X M matrix structure.

According to an embodiment, the SiPM array 941 may include a plurality of microcell units 944. In this case, the microcell unit 944 may include a plurality of microcells 947. For example, the microcell unit 944 may include a 12 X 12 microcell 947.

Also, for example, the SiPM array 941 may include 1250 microcell units 944 of a 50 X 25 matrix structure. In this case, the arrangement of the microcell units 944 may correspond to the arrangement of the big cell units 914.

According to an embodiment, the microcell unit 944 may have a FOV capable of receiving light. For example, the microcell unit 944 may have a horizontal FOV 945 and a vertical FOV 946. For example, the microcell unit 944 may have a horizontal FOV 945 of 1.2 degrees and a vertical FOV 946 of 1.2 degrees.

In this case, the FOV of the microcell unit 944 may be proportional to the number of microcells 947 included in the microcell unit 944. Alternatively, the FOV of the individual microcells 947 included in the microcell unit 944 may be determined by the FOV of the microcell unit 944.

For example, when the horizontal FOV 948 and the vertical FOV 949 of the individual microcells 947 are 0.1 degrees, if the microcell unit 944 includes the microcells 947 of NXM, the microcell unit 944 ), the horizontal FOV 945 may be 0.1*N, and the vertical FOV 946 may be 0.1*M.

Also, for example, when the horizontal FOV 945 and the vertical FOV 946 of the microcell unit 944 is 1.2 degrees, and the microcell unit 944 includes a 12 X 12 microcell 947, the individual The horizontal FOV 948 and the vertical FOV 949 of the microcell 947 may be 0.1 degrees (1.2/12).

According to an embodiment, the big cell unit 914 of the laser output unit 910 and the SPAD unit or the microcell unit 944 of the receiving unit 940 may correspond to each other.

For example, the horizontal diffusion angle and the vertical diffusion angle of the big cell unit 914 may be the same as the horizontal FOV 945 and the vertical FOV 946 of the SPAD unit or microcell unit 944.

For example, a laser beam output from the big cell unit 914 in one row and one column may be reflected by the object 850 and received by the SPAD unit or the microcell unit 944 in one row and one column.

Also, for example, a laser beam output from the big cell unit 914 in N rows and M columns may be reflected by the object 850 and received by the SPAD unit or microcell unit 944 in the N rows and M columns.

At this time, the laser beam output from the big cell unit 914 in N rows and M columns and reflected by the object 850 is received by the SPAD unit or microcell unit 944 in the N rows and M columns, and the lidar device 900 is SPAD. It may have resolution by unit or microcell unit 944.

For example, if the SPAD unit or microcell unit 944 includes SPAD pixels or microcells 947 in N rows and M columns, the FOV to which the big cell unit 914 is irradiated is divided into the NXM area to determine distance information of the object. I can.

According to another embodiment, one big cell unit 914 and a plurality of SPAD units or microcell units 944 may correspond. For example, a laser beam output from the bixel unit 914 in one row and one column may be reflected by the object 850 and received by the SPAD unit or microcell unit 944 in the first row and the first row and the second row. .

According to another embodiment, a plurality of big cell units 914 and one SPAD unit or microcell unit 944 may correspond. For example, a laser beam output from the big cell unit 914 in one row and one column may be reflected by the object 850 and received by the SPAD unit or the microcell unit 944 in one row and one column.

According to an embodiment, the plurality of big cell units 914 included in the laser output unit 910 may operate according to a certain sequence or may operate randomly. In this case, the SPAD unit or the microcell unit 944 of the receiving unit 940 may also operate in response to the operation of the big cell unit 914.

For example, after the big cell units of the 1st row and 1st column of the bigcell array 911 operate, the bigcell units of the 1st row and 3rd columns may operate. Then, the big cell units in the 1st row and 5th columns may operate, and then the bigcell units in the 1st row and 7th columns may operate.

At this time, after the SPAD unit or microcell unit 944 in the first row and the first column of the receiving unit 940 operates, the SPAD unit or the microcell unit 944 in the first row and the third column may operate. Then, the SPAD unit or microcell unit 944 in the first row and five columns may operate, and then the SPAD unit or the microcell unit 944 in the first row and seven columns may operate.

Also, for example, the big cell unit of the big cell array 911 may operate randomly. In this case, the SPAD unit or the microcell unit 944 of the receiver existing at a position corresponding to the position of the randomly operated big cell unit 914 may operate.

Hereinafter, a method of manufacturing the optics of the optical unit will be described.

Optics manufactured by the optical manufacturing method described below may be a prism, a prism array, a micro prism, or a micro prism array. In addition, the optics manufactured by the following optical manufacturing method may be an optic including a plurality of sub-optics having a slope.

39 is a view showing burrs present on the surface of an optical or intermediate body.

Referring to FIG. 39, the optics or intermediates formed in the process of manufacturing the optics may include burrs on the surface.

If the burrs included on the surface of the intermediate body are not removed during the optical manufacturing process, the resulting optic may include burrs on the surface.

When the optic includes burrs on the surface, the surface roughness of the optic may be non-uniform. When the surface roughness of the optics is non-uniform, the refraction direction of the laser through the optics may be different from a preset direction.

For example, when the optic is a prism, when the prism has a non-uniform surface roughness including burrs on the surface, the laser beam incident on the prism may be refracted in a direction different from a preset direction.

In addition, for example, when the optic is a prism, a direction in which a laser beam incident on a surface including a burr is refracted and a direction in which a laser beam incident on a surface not including a burr is refracted may be different.

Therefore, in order for the laser beam that has passed through the optic to be output in a predetermined direction, the surface roughness of the optic may need to be uniform. The surface roughness of the optic can be made uniform by removing the burrs.

Burrs can be removed by a polishing process. For example, burrs can be removed by means of a platen dressing. Also, for example, the burr can be polished by a platen driven by revolution, rotation, or a combination thereof. Also, for example, the burr can be removed by dressing of a platen located above or below the optics or intermediate.

According to an embodiment, when a burr is included in a surface having an inclination, a burr positioned on the upper surface may be removed more easily than a burr positioned at the lower portion.

According to another embodiment, when the optical or intermediate body has a plurality of inclined surfaces, burrs located at the peaks of the inclined surfaces are more easily removed than burrs located in the valleys between the inclined surfaces. Can be.

For example, when the optical or intermediate body has a plurality of prisms, burrs located at the peaks of the prisms can be removed more easily than burs located at the valleys between the prisms.

40 is a flowchart illustrating a method of manufacturing an optic according to an exemplary embodiment.

Referring to FIG. 40, the method of manufacturing an optic according to an embodiment includes forming an intermediate by patterning a substrate (S10110), forming a mold based on the intermediate (S10120), and manufacturing an optic based on the mold. It may include (S10130).

According to an embodiment, the optical manufacturing apparatus may perform at least one or more steps of S10110 to S10130. In this case, the optical manufacturing device may be physically a single device or a plurality of devices.

The step of forming an intermediate by patterning the substrate (S10110) may include deposition, lithography, and etching. The material of the substrate may include a transparent material such as glass, plastic, fluorite, and acrylic. Alternatively, the substrate may include a material having a refractive index similar to that of glass. For example, the substrate may be glass having a thickness of 1 mm to 2 mm.

The intermediate may have a shape of a prism, a prism array, a micro prism, and a micro prism array. For example, the intermediate may be a prism array including prisms having different inclinations. At this time, deep valleys may occur between prisms having different inclinations. Alternatively, deep valleys may be formed between prisms with the same inclination.

Forming a mold based on the intermediate (S10120) may be performed by an electroforming method. In addition, forming the mold may include forming a mold in which the intermediate body and the shape are inverted. For example, when the intermediate body has a concave shape, the mold may have a convex shape in which the shape of the intermediate body is reversed.

In addition, for example, when the intermediate body has a right-angled triangle shape, the mold may also have a right-angled triangle shape. At this time, the peak point of the intermediate body may be a valley of the mold, and the valley of the intermediate body may be a peak point of the mold.

The mold or the intermediate may include plastic, glass, metal, or ceramic. For example, the mold may include nickel, chromium, or titanium.

The step of manufacturing the optics based on the mold (S10130) may be performed by an electroforming method. In addition, the step of manufacturing the optic may include forming the mold and the optic in which the shape is reversed. For example, when the mold has a concave shape, the optic may have a convex shape in which the mold and the shape are reversed.

In addition, for example, when the mold has a right-angled triangle shape, the optics may also have a right-angled triangle shape. At this time, the peak point of the mold may be a valley of the optic, and the valley of the mold may be a peak of the optic.

The optic may be of the same material as the substrate or may be of a different material. For example, the material of the optic may include a transparent material such as glass, plastic, fluorspar, and acrylic. Alternatively, the optic may include a material having a refractive index similar to that of glass.

41 is a diagram for describing a method of manufacturing an optic according to an exemplary embodiment.

Referring to FIG. 41, in the method of manufacturing an optic according to an embodiment, the steps of forming an intermediate body 10112 by patterning a substrate 10111, forming a mold 10113 based on the intermediate body 10112, and a mold 10113 ) Based on the manufacturing of the optics 10114 may be included.

According to an embodiment, the intermediate body 10112 may be formed by etching the substrate 10111. In this case, the intermediate body 10112 may be a prism array including a plurality of prisms having different inclinations. In this case, the width of the plurality of prisms included in the intermediate body 10112 may be the same, but is not limited thereto.

The intermediate body 10112 shown in FIG. 41 has a shape in which the inclination of the prisms included in the intermediate body 10112 increases from left to right, but is not limited thereto, and the inclination may decrease from left to right. Regardless, they can have their own slopes.

In addition, an object formed by patterning the substrate 10111 may include a plurality of intermediate bodies 10112. For example, three or more intermediates 10112 may be in a continuous form, and two intermediates 10112 may be in a continuous form. In this case, the object formed by patterning may have a continuous form in which one intermediate body 10112 and one intermediate body 10112 are left and right inverted.

According to an embodiment, the mold 10113 may be formed based on the intermediate body 10112. In this case, the shape of the mold 10113 and the shape of the intermediate body 10112 may be reversed. For example, the peak of the intermediate body 10112 may be a valley of the mold 10113. Also, for example, the valley of the intermediate body 10112 may be a peak of the mold 10113.

According to an embodiment, the optics 10114 may be formed based on the mold 10113. In this case, the shape of the optic 10114 and the shape of the mold 10113 may be reversed. For example, the peak of the mold 10113 may be a valley of the optic 10114. Also, for example, the valley of the mold 10113 may be a peak of the optic 10114.

In this case, the shape of the optic 10114 and the shape of the intermediate body 10112 may be the same. For example, the peak of the intermediate 10112 may be the peak of the optic 10114. Also, for example, the bone of the intermediate body 10112 may be the bone of the optic 10114.

42 is a flowchart illustrating a method of manufacturing an optic including a polishing process according to an exemplary embodiment.

Referring to FIG. 42, a polishing process may be added to the optical manufacturing methods S10110, S10120, and S10130. By performing the polishing process, the surface roughness of the intermediate or mold can be made uniform.

An optical manufacturing method including a polishing process according to an embodiment includes forming an intermediate by patterning a substrate (S10210), polishing the intermediate (S10220), forming a mold based on the polished intermediate (S10230), and It may include manufacturing an optic based on the mold (S10240).

According to an embodiment, the optical manufacturing apparatus may perform at least one or more steps of S10210 to S10240. In this case, the optical manufacturing device may be physically a single device or a plurality of devices.

The step of forming the intermediate by patterning the substrate (S10210) may overlap with the step of forming the intermediate by patterning the substrate of FIG. 40 (S10110), and a detailed description thereof will be omitted.

Polishing the intermediate (S10220) may include removing burrs included in the intermediate during the process of patterning the substrate. For example, removing the burr may include removing the concave portion and the convex portion.

The polishing process may include mechanical polishing, electrolytic polishing, chemical polishing, or a combination thereof.

The step of forming a mold based on the polished intermediate (S10230) may be duplicated with the step of forming a mold based on the intermediate of FIG. 40 (S10120), and a detailed description thereof will be omitted.

The step of manufacturing the optics based on the mold (S10240) may be duplicated with the step of manufacturing the optics (S10130) based on the mold of FIG. 40, and a detailed description thereof will be omitted.

43 is a diagram for describing a method of manufacturing an optic including a polishing process according to an exemplary embodiment.

Referring to FIG. 43, the method of manufacturing an optic according to an embodiment includes forming an intermediate body 10212 by patterning a substrate 10211, polishing the intermediate body 10212, and a mold based on the polished intermediate body 10213. It may include forming the optics 10215 based on the mold 10214 and forming the 10214.

According to an embodiment, the intermediate body 10212 formed by the substrate 10211 may include a plurality of burrs 10216. At this time, the shape of the bur 10216 may be a concave shape or a convex shape.

When a mold is manufactured by the intermediate body 10212 including the burrs 10216 and an optic is manufactured based on the mold, the burrs may be included on the surface of the optic. If there are burrs on the surface of the optic, the surface roughness of the optic may not be uniform. If the surface roughness of the optic is not uniform, the laser may not be refracted in a desired direction.

Therefore, it is necessary to make the surface roughness of the optic uniform by removing the burrs. Therefore, the surface roughness of the intermediate body 10212 formed by the substrate 10211 can be made uniform by the polishing process.

Burrs 10216 can be removed by polishing intermediate 10212. The intermediate body 10213 from which the burrs 10216 are removed may be formed. However, the intermediate body 10213 may also include burrs that are not removed. A method of removing the unremoved burr will be described later.

According to an embodiment, the mold 10214 may be formed based on the intermediate body 10213 from which the burrs 10216 are removed. The shape of the mold 10214 and the shape of the intermediate body 10213 may be reversed. A detailed description may be repeated with FIG. 41 and will be omitted.

According to an embodiment, the optic 10215 may be manufactured based on the mold 10214. In this case, a step of polishing the mold 10214 may be added.

The shape of the mold 10214 and the shape of the optic 10215 may be reversed. In addition, the shape of the intermediate body 10213 and the shape of the optic 10215 may be the same. A detailed description may be repeated with FIG. 41 and will be omitted.

44 is a flowchart illustrating a method of manufacturing an optic including a polishing process according to another exemplary embodiment.

Referring to FIG. 44, in the method of manufacturing an optic according to another embodiment, the step of forming a first intermediate by patterning a substrate (S10310), forming a second intermediate based on the first intermediate (S10320), and the second Polishing the intermediate (S10330), forming a third intermediate based on the polished second intermediate (S10340), polishing the third intermediate (S10350), forming a mold based on the polished third intermediate It may include a step (S10360) and a step (S10370) of manufacturing an optic based on the mold.

According to an embodiment, the optical manufacturing apparatus may perform at least one or more steps of S10310 to S10370. In this case, the optical manufacturing device may be physically a single device or a plurality of devices.

The optical manufacturing method of FIG. 44 may form a plurality of intermediate bodies unlike the optical manufacturing method of FIG. 40. By forming a plurality of intermediates and repeating the polishing process, the surface roughness of the mold and optics can be made more uniform than that of FIG. 40.

The step of forming the first intermediate by patterning the substrate (S10310) may overlap with the step of forming the intermediate by patterning the substrate of FIG. 40 (S10110), and a detailed description thereof will be omitted.

The step of forming the second intermediate body based on the first intermediate body (S10320) may be performed by an electroforming method. In addition, the step of forming the second intermediate may include forming a second intermediate whose shape is inverted with the first intermediate. In this case, a process of polishing the first intermediate may be added, but is not limited thereto.

Polishing the second intermediate (S10330) may include removing burrs included in the second intermediate. For example, it may include removing the concave portion and the iron portion included in the surface of the second intermediate body.

The step of forming the third intermediate body based on the polished second intermediate body (S10340) may be performed by electroforming. In addition, forming the third intermediate may include forming a third intermediate in which the shape of the second intermediate body is inverted. In this case, the shape of the third intermediate may be the same as the shape of the first intermediate, but is not limited thereto.

Polishing the third intermediate (S10350) may include removing burrs included in the third intermediate. For example, it may include removing the concave portion and the iron portion included in the surface of the third intermediate.

Forming a mold based on the polished third intermediate (S10360) may be performed by an electroforming method. The step of forming the mold (S10360) may be duplicated with the step of forming the mold (S10120) based on the intermediate body of FIG. 40, and a detailed description will be omitted.

The step of manufacturing the optics based on the mold (S10370) may additionally include polishing the mold. The step of manufacturing the optic (S10370) may be duplicated with the step (S10130) of manufacturing the optic based on the mold of FIG. 40, and a detailed description thereof will be omitted.

45 is a diagram for describing a method of manufacturing an optic including a polishing process according to another exemplary embodiment.

Referring to FIG. 45, in a method of fabricating an optic according to another embodiment, the step of forming a first intermediate body 10312 by patterning a substrate 10311, and forming a second intermediate body 10313 based on the first intermediate body 10312 Forming, polishing the second intermediate (10313), forming a third intermediate (10315) based on the polished second intermediate (10314), polishing the third intermediate (10315), polished It may include forming a mold 10317 based on the third intermediate body 10316 and manufacturing an optic 10318 based on the mold 10317.

When an optic including a plurality of sub-optics having different inclinations is manufactured, burrs on a valley of a sub-optic having a large inclination may be difficult to remove easily. Therefore, by forming a plurality of intermediate bodies through the electroforming method and inverting the valleys to peaks, the burrs can be removed in the form of removing burrs on the peaks.

That is, in the optical fabrication method described in the present specification, by repeating the polishing process by forming a plurality of intermediate bodies, burrs that are difficult to remove can be easily removed, and the surface roughness of the mold and the optic can be made uniform.

According to an embodiment, the first intermediate body 10312 may include a first burr 10321 and a second burr 10322 on a surface. The second intermediate body 10313 formed based on the first intermediate body 10312 may include a third burr 10323 and a fourth burr 10324 on a surface.

In this case, the third burr 10323 may be based on the first burr 10321, and the fourth burr 10324 may be based on the second burr 10322. For example, when the first burr 10321 is a concave portion, the third burr 10323 may be an iron portion, and when the first burr 10321 is an iron portion, a third burr (10323) may be a concave.

Also, for example, when the second burr 10322 is a concave portion, the fourth burr 10324 may be an iron portion, and when the second burr 10322 is an iron portion, the fourth burr 10322 Burr 10324 may be a concave (凹).

In this case, the third burr 10323 may be a position that is easier to remove than the fourth burr 10324. For example, the third burr 10323 is a position closer to the peak of the second intermediate body 10313 than the fourth burr 10324, and the fourth burr 10324 is the second intermediate body 10313 than the third burr 10323 ) May be close to the goal.

In addition, for example, the sign value for the surface side where the third burr 10323 of the third burr 10323 is located is greater than the sign value for the surface side where the fourth burr 10324 of the fourth burr 10324 is located. I can.

In addition, for example, the cosine value of the surface side where the third burr 10323 of the third burr 10323 is located is greater than the cosine value of the surface side where the fourth burr 10324 of the fourth burr 10324 is located. I can.

In addition, for example, the vertical position of the third burr 10323 from the lower base 10326 of the second intermediate body 10313 may be greater than the vertical position of the fourth burr 10324. In this case, the lower base 10326 of the second intermediate body 10313 may be a surface having a constant slope or a flat surface. In addition, the lower base 10326 of the second intermediate body 10313 may be an opposite surface on which the peak of the second intermediate body 10313 is generated.

In this case, the vertical distance between the valleys of the lower base 10326 and the second intermediate body 10313 may be different according to the slope of the sub-optics included in the second intermediate body 10313.

For example, among the sub-optics of the second intermediate body 10313 shown in FIG. 45, the most inclination located at the right is greater than the vertical distance between the valley and the lower base 10326 of the sub-optic with the smallest inclination located at the leftmost. The vertical gap between the bone of the large sub-optic and the lower base 10326 may be smaller.

That is, the vertical distance between the valleys of the sub-optics of the second intermediate body 10313 shown in FIG. 45 and the lower base 10326 may decrease from left to right. However, the shape of the second intermediate body 10313 is not limited to the second intermediate body 10313 shown in FIG. 45.

Also, for example, the orthogonal projection value of the third burr 10323 on the surface side where the third burr 10323 is located is greater than the orthogonal projection value on the surface side where the fourth burr 10324 of the fourth burr 10324 is located. I can.

The fourth bur (10324) is located closer to the bone of the second intermediate body (10313) than the third bur (10323), the second intermediate body (10313) includes a plurality of sub intermediate bodies, the fourth bur (10324) May not be easily removed by the polishing process.

Therefore, since the third burr 10323 is easy to remove from the second intermediate body 10313 and the fourth burr 10324 is difficult to remove, the third burr 10323 is removed by polishing the second intermediate body 10313 , The fourth burr 10324 can be removed by polishing by forming another intermediate body by an electroforming method.

However, the fourth burr 10324 may also be removed by polishing the second intermediate body 10313.

According to an embodiment, polishing the second intermediate body 10313 may include removing the third burr 10323. In this case, the third burr 10323 positioned closer to the peak of the second intermediate body 10313 than the fourth burr 10324 may be removed. In this case, the fourth burr 10324 positioned closer to the valley of the second intermediate body 10313 than the third burr 10323 may not be removed, but is not limited thereto.

The step of forming the third intermediate body 10315 based on the polished second intermediate body 10314 may be performed by electroforming. In this case, the polished second intermediate body 10314 may include a fourth burr 10324 on the surface. In this case, the polished second intermediate body 10314 may have a surface from which the third burr 10323 is removed.

According to an embodiment, the third intermediate body 10315 may include a fifth burr 10325 on its surface. In this case, the fifth burr 10325 may be based on the fourth burr 10324. For example, when the fourth burr 10324 is a concave portion, the fifth burr 10325 may be an iron portion, and when the fourth burr 10324 is an iron portion, the fifth burr (10325) may be a concave.

In this case, the fifth burr 10325 may be a position that is easier to remove than the fourth burr 10324. For example, the fifth burr 10325 may be a position closer to the peak than the valley of the third intermediate body 10315.

Also, for example, the vertical position from the lower base 10327 of the third intermediate body 10315 of the fifth burr 10325 is from the lower base 10326 of the second intermediate body 10314 of the fourth burr 10324 May be larger than the vertical position.

Polishing the third intermediate body 10315 may include removing the fifth burr 10325. The mold 10317 may be formed based on the third intermediate body 10316 from which the fifth burr 10325 has been removed due to polishing. In this case, a process of polishing the mold 10317 may be additionally performed.

It may include the step of manufacturing the optics 10318 based on the mold 10317. The manufactured optic 10318 may have a uniform surface roughness through a process of polishing a plurality of intermediates. The fabricated optic 10318 has a uniform surface roughness, so that when the laser beam is incident, the laser beam can be refracted in a desired direction.

46 is a diagram for describing a positional relationship of a burr according to an exemplary embodiment.

Referring to FIG. 46, the N+1th intermediate 10420 according to an embodiment may be formed based on the Nth intermediate 10410. For example, the N+1th intermediate 10420 may be formed based on the Nth intermediate 10410 by an electroforming method.

For example, the Nth intermediate 10410 may be an intermediate formed by patterning a substrate. Also, for example, the N+1th intermediate body 10420 may be a mold for manufacturing an optic.

According to an embodiment, the Nth intermediate body 10410 may include a first burr 10421 and a second burr 10422 on a surface. In addition, the N+1th intermediate body 10420 may include a third burr 10423 and a fourth burr 10424 on the surface.

In this case, the third burr 10423 may be formed based on the first burr 10421. In addition, at this time, the fourth burr 10424 may be formed based on the second burr 10422.

In this case, the second burr 10422 may be a position closer to the peak of the Nth intermediate body 10410 compared to the first burr 10421. In addition, at this time, the first burr 10421 may be a position closer to the bone of the Nth intermediate body 10410 compared to the second burr 10422. Accordingly, the second burr 10422 may be a position that is easier to remove than the first burr 10421.

On the other hand, the third burr 10423 may be located closer to the peak of the N+1th intermediate 10420 compared to the fourth burr 10424. In this case, the fourth burr 10424 may be located closer to the N+1th bone than the third burr 10423. Accordingly, the third burr 10423 may be a position that is easier to remove than the fourth burr 10424.

As described above, the second burr 10422 at a position that is easily removed from the Nth intermediate body 10410 may be the fourth burr 10424 at a position that is difficult to remove from the N+1th intermediate body 10420.

In addition, the first burr 10421 located at a position that is difficult to be removed from the Nth intermediate body 10410 may be a third burr 10423 located at a position that is easily removed from the N+1th intermediate body 10420.

That is, by performing polishing by reversing the positions of the burrs while forming a plurality of intermediate bodies, the surface roughness of the final mold and optics can be made uniform.

47 is a diagram for describing a shape of a burr according to an exemplary embodiment.

Referring to FIG. 47, the N+1th intermediate 10520 according to an embodiment may be formed based on the Nth intermediate 10510. For example, the N+1th intermediate 10520 may be formed based on the Nth intermediate 10510 by an electroforming method.

For example, the Nth intermediate 10510 may be an intermediate formed by patterning a substrate. Also, for example, the N+1th intermediate body 10520 may be a mold for manufacturing an optic.

According to an embodiment, the Nth intermediate body 10510 may include a first concave burr 10521 and a first iron burr 10522 on a surface. The N+1th intermediate body 10520 formed on the basis of the Nth intermediate body 10510 may include a second concave burr 10523 and a second iron burr 10524 on a surface.

In this case, the second concave burr 10523 may be formed based on the first convex burr 10422. In addition, at this time, the second iron (凸) burr (10524) may be formed based on the first concave (凹) bur (10521).

That is, in the process of forming a plurality of intermediate bodies, if the shape of the previous bur was the concave portion, the shape of the next bur may be the iron portion. Also, if the shape of the previous bur was a convex portion, the shape of the next bur could be a concave portion.

48 is a diagram for describing a correlation between burrs according to an exemplary embodiment.

Referring to FIG. 48, the intermediate body according to an embodiment may include a plurality of elements 10610. 48 shows one element 10610 included in the intermediate.

The element 10610 may include a first burr 10621 and a second burr 10632. In this case, the first burr 10621 may be closer to the peak of the element 10610 than the second burr 10631, and the second burr 10631 may be closer to the valley of the element 10610 than the first burr 10621. In addition, the first burr 10621 may be positioned above the second burr 10631. Accordingly, the first burr 10621 may be in a position that is easier to remove than the second burr 10631.

According to an embodiment, the sine value 10622 for the surface side of the first burr 10621 where the first burr 10621 is located is with respect to the surface side where the second burr 10631 of the second burr 10631 is located. It may be greater than the sign value 10632. That is, the vertical position of the first burr 10621 from the lower base of the element 10610 may be greater than the vertical position of the second burr 10631.

In addition, according to an embodiment, the cosine value 10623 of the surface side where the first burr 10621 of the first burr 10621 is located is on the surface side where the second burr 10631 of the second burr 10631 is located. It may be greater than the cosine value of 10633. That is, the orthogonal projection on the surface side of the first burr 10621 may be longer than the orthogonal projection on the surface side of the second burr 10631.

As described above, the larger the vertical position from the lower base of the element 10610 of the burr, the larger the sine value and the cosine value on the surface side, or the larger the orthogonal projection value on the surface side, the more easily the burr may be removed.

Although the embodiments have been described by the limited embodiments and drawings as described above, various modifications and variations can be made from the above description to those of ordinary skill in the art. For example, the described techniques are performed in a different order from the described method, and/or components such as systems, structures, devices, circuits, etc. described are combined or combined in a form different from the described method, or other components Alternatively, even if substituted or substituted by an equivalent, an appropriate result can be achieved.

Therefore, other implementations, other embodiments, and those equivalent to the claims also fall within the scope of the claims to be described later.

10311: substrate
10312: first intermediate
10313: second intermediate
10314: polished second intermediate
10315: third intermediate
10316: polished third intermediate
10317: mold
10318: Optics

Claims (16)

In the method of manufacturing an optic using a plurality of intermediates,
Patterning the substrate to form a first intermediate, the first intermediate comprising a first surface having a first slope, and including a first burr and a second burr on the first surface;
Forming a second intermediate based on the first intermediate, the second intermediate including a second surface having a second slope, and including third and fourth burrs on the second surface;
Polishing the second intermediate to remove the third burr-the third burr is based on the first burr;
A third intermediate based on the second intermediate from which the third burrs have been removed-the third intermediate includes a third surface having the first slope, and includes a fifth burr on the third surface. Forming;
Polishing the third intermediate to remove the fifth burr-the fifth burr is based on the fourth burr;
Forming a mold based on the third intermediate from which the fifth burr has been removed; And
Including the step of manufacturing an optic including a surface having the first slope or the second slope based on the mold
How to make optics.
The method of claim 1,
The optic is a prism
How to make optics.
The method of claim 1,
The sine value of the first burr with respect to the first surface is smaller than the sine value of the second burr
How to make optics.
The method of claim 1,
The cosine value of the first burr with respect to the first surface is smaller than the cosine value of the second burr
How to make optics.
The method of claim 1,
The sine value of the third burr with respect to the second surface is greater than the sine value of the fourth burr
How to make optics.
The method of claim 1,
The cosine value of the third burr with respect to the second surface is greater than the cosine value of the fourth burr
How to make optics.
The method of claim 1,
The vertical position of the first bur from the lower base of the first intermediate body is smaller than the vertical position of the second bur
How to make optics.
The method of claim 1,
The vertical position of the third burr from the lower base of the second intermediate body is greater than the vertical position of the fourth burr
How to make optics.
The method of claim 1,
The first burr is one of a concave portion and a convex portion on the first surface, and the third burr is another shape on the second surface.
How to make optics.
The method of claim 1,
The absolute value of the first slope is the same as the absolute value of the second slope
How to make optics.
The method of claim 1,
The material of the substrate and the material of the second intermediate are different
How to make optics.
The method of claim 1,
The second intermediate includes at least one of nickel, chromium, and titanium.
How to make optics.
The method of claim 1,
The first intermediate body includes a fourth surface having the fourth slope such that an optic having a surface having a fourth slope different from the first slope is formed.
How to make optics.
In the method of manufacturing an optic using a plurality of intermediates,
Patterning the substrate to form a first intermediate;
Forming a second intermediate based on the first intermediate-the second intermediate includes a first surface having a first slope, and includes a first burr and a second burr on the first surface step;
Polishing the second intermediate to remove the first burr;
Forming a third intermediate based on the second intermediate from which the first burrs have been removed-the third intermediate includes a second surface having a second slope, and includes a third burr on the second surface The step of doing;
Polishing the third intermediate to remove the third burr-the third burr is based on the second burr;
Forming a mold based on the third intermediate from which the third burrs have been removed; And
Including the step of manufacturing an optic including a surface having the first slope or the second slope based on the mold
How to make optics.
As an optic manufactured based on a substrate, a plurality of intermediates and a mold,
The plurality of intermediates include a first intermediate formed by patterning the substrate, a second intermediate formed based on the first intermediate, and a third intermediate formed based on the second intermediate,
The first intermediate body includes a first surface having a first slope, a first burr and a second burr on the first surface,
The second intermediate body includes a second surface having a second slope, a third burr and a fourth burr on the second surface,
The third intermediate is formed on the basis of the second intermediate from which the third burr-the third burr is based on the first burr-has been removed by a primary polishing process,
The third intermediate includes a third surface having the first slope, and a fifth burr is included on the third surface,
The mold is formed on the basis of the third intermediate body from which the fifth burr-the fifth burr is based on the fourth burr-has been removed by a secondary polishing process,
The optic includes a surface having the first slope or the second slope based on the mold
Optics.
A laser output unit that irradiates a laser toward the object;
An optic for steering the laser beam output from the laser output unit; And
And a laser light receiving unit configured to receive a laser reflected from the object and returned by the laser irradiated from the laser output unit,
The optics are manufactured based on a substrate, a plurality of intermediates and a mold,
The plurality of intermediates include a first intermediate formed by patterning the substrate, a second intermediate formed based on the first intermediate, and a third intermediate formed based on the second intermediate,
The first intermediate body includes a first surface having a first slope, a first burr and a second burr on the first surface,
The second intermediate body includes a second surface having a second slope, a third burr and a fourth burr on the second surface,
The third intermediate is formed on the basis of the second intermediate from which the third burr-the third burr is based on the first burr-has been removed by a primary polishing process,
The third intermediate includes a third surface having the first slope, and a fifth burr is included on the third surface,
The mold is formed on the basis of the third intermediate body from which the fifth burr-the fifth burr is based on the fourth burr-has been removed by a secondary polishing process,
The optic includes a surface having the first slope or the second slope based on the mold
Lida device.

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