KR20190040587A - Method and apparatus for high-speed 3d photolithographying using wavefront shaper - Google Patents

Abstract

Disclosed are a method of high-speed three-dimensional stereolithography using a wave surface controller, and an apparatus thereof. The method of three-dimensional stereolithography comprises the steps of: calculating a two-dimensional wave surface for controlling the intensity distribution of three-dimensional light of a three-dimensional shaped object to be shaped; projecting the calculated two-dimensional wave surface to a wave surface controller; and shaping a three-dimensional object by exposing light of which the wave surface is controlled through the wave surface controller to a photosensitivity resin positioned on the three-dimensional shaped object.

Description

[0001] METHOD AND APPARATUS FOR HIGH-SPEED 3D PHOTOLITHOGRAPHYING USING WAVEFRONT SHAPER [0002]

Embodiments of the present invention relate to a technique for rapidly forming an object having an arbitrary three-dimensional shape using a wavefront controller.

Techniques for producing customized objects having arbitrary shapes using light are expected to be widely used in manufacturing and medical fields.

A method of shaping an object having arbitrary shape using light is based on photopolymerization technology and a photopolymerization process using a multi-photon absorption phenomenon of a photosensitive resin (multi-photon absorption process) and stereolithography in which short wavelength light is incident on a photosensitive resin to polymerize and laminate the resulting product.

The multiphoton absorption photopolymerization process utilizes the multiphoton absorption phenomenon. In the multiphoton absorption phenomenon, when the substance of the high power laser light is focused on the substance, molecules constituting the substance absorb the two or more photons simultaneously and become an excited state It exhibits a nonlinear optical process that emits light of a short wavelength having energy higher than the wavelength of absorption and returns to the ground state. At this time, the emitted short wavelength light causes a photoinitiator to be excited, which reacts with the surrounding resin to cause a polymer polymerization reaction, which is called multi-photon absorption . [Non-Patent Document 1] Maruo , S., Nakamura , O. & Kawata , S. Three-dimensional microfabrication with two-photon-absorbed photopolymerization . Opt. Lett . 22, 132-134 (1997). Discloses a technique for shaping an object having a desired three-dimensional shape by changing the position of a laser focus of strong intensity and causing a polymerization reaction.

The multiphoton absorption phenomenon occurs only in the local region where the intensity of the focal light is high since two or more photons must be simultaneously absorbed by the molecule, so that it is possible to form an object having a desired three-dimensional shape with high accuracy of about 100 nm. However, Expensive equipment is required. In order to form a three-dimensional shape of an object, it is difficult to simultaneously form a plurality of objects because the position of the focus must be scanned. Also, there is a limitation that the molding time is long.

The stereolithography technique utilizes a phenomenon in which short-wavelength light such as ultraviolet light is irradiated to a photosensitive resin, and the resin reacts to cause a polymer polymerization reaction. At this time, a plurality of masks corresponding to a two-dimensional cross-section of a desired three-dimensional shape are formed using metal, and a desired three-dimensional shape can be formed by successively exposing a short wavelength light to a mask with different focus.

In recent years, by using a wavefront controller such as a spatial light modulator (SLM) or a digital micromirror device (DMD) to continuously expose a light shape corresponding to a three-dimensional cross section, I had less effort. Techniques for rapidly assembling objects of the same shape repeatedly and rapidly using microfluidics technology and automatically assembling the objects are also being developed.

However, the stereolithography technique also has a limitation in that it is difficult to simultaneously form a plurality of objects because the two-dimensional shapes of several cross-sections are sequentially exposed by changing the focus and the molding time is long.

Therefore, there is a demand for a technique of simultaneously molding various objects having a three-dimensional shape without changing the focus.

[1] Maruo, S., Nakamura, O. & Kawata, S. Three-dimensional microfabrication with two-photon-absorbed photopolymerization. Opt. Lett. 22, 132-134 (1997). [2] Bucknall, D. ed., 2005. Nanolithography and patterning techniques in microelectronics. Elsevier. [3] Linnenberger, A. et al. Three dimensional live cell lithography. Optics Express 21, 10269 (2013).

The present invention relates to a technique for simultaneously molding three-dimensional objects having different formations using a wavefront controller.

The three-dimensional stereolithography method includes the steps of calculating a two-dimensional wavefront for controlling the intensity distribution of three-dimensional light of an object of a three-dimensional shape to be formed, projecting the calculated two-dimensional wavefront to a wavefront controller And forming a three-dimensional object by exposing the wave-front-controlled light through the wavefront controller to a photosensitive resin disposed on the three-dimensional object.

According to an aspect of the present invention, the step of calculating the two-dimensional wave front can calculate the two-dimensional wave front by performing three-dimensional inverse Fourier transform and Fourier transform on the intensity distribution of the three-dimensional light.

According to another aspect of the present invention, the step of calculating the two-dimensional wavefront includes a step of performing a three-dimensional inverse Fourier transform on the intensity distribution of the three-dimensional light to calculate a three-dimensional Fourier spectrum, Calculating a two-dimensional Fourier spectrum by projecting a Fourier spectrum located on an Ewald spherical surface of the three-dimensional Fourier spectrum; calculating the two-dimensional Fourier spectrum by multiplying the calculated two- Dimensional Fourier space; computing an approximate intensity of an object having a three-dimensional shape based on the three-dimensional Fourier space; calculating the approximate intensity of the three-dimensional object based on the calculated approximate intensity; Calculating an approximate intensity based on the calculated error and a predefined reference value, The light intensity of the object of the shape.

According to another aspect of the present invention, the step of calculating the two-dimensional wavefront may further include replacing an amplitude part of the calculated two-dimensional Fourier spectrum with intensity of light incident on the wavefront controller.

According to another aspect of the present invention, the step of projecting the two-dimensional Fourier spectrum into coordinates on an Ewald spherical surface in a three-dimensional Fourier space comprises the steps of: projecting a two-dimensional Fourier spectrum, which is replaced with intensity of light incident on the wavefront controller, It can be projected to coordinates on the Baltic sphere.

According to another aspect of the present invention, the replacing step with the intensity of the light incident on the wavefront controller may include the step of, when a plane wave is incident on the wavefront controller, .

According to another aspect of the present invention, the step of calculating the two-dimensional wavefront may include calculating the two-dimensional wavefront corresponding to each of a plurality of three-dimensional objects having different shapes when the object has a plurality of objects having a shape to be shaped have.

According to another aspect, the step of shaping the three-dimensional object includes a step of controlling the size of the light controlled through the wavefront controller to be the size of a clear aperture of the light focusing device can do.

According to another aspect of the present invention, in the controlling step, the size of light controlled through the wavefront controller using the relay lens group positioned between the wavefront controller and the light focusing device is equal to the size of the opening of the light focusing device Can be controlled.

According to another aspect, the three-dimensional object may be formed based on a microfluidic chamber or a translation stage technique.

According to another aspect, when the microfluidic chamber technique is used, the injection speed of the syringe pump for moving the photosensitive resin in the liquid phase can be controlled according to the polymerization rate of the photosensitive resin.

The three-dimensional stereolithography apparatus includes a specimen portion in which a photosensitive resin is placed, a calculation portion for calculating a two-dimensional wavefront for controlling the intensity distribution of three-dimensional light of an object having a three-dimensional shape corresponding to the specimen portion, And an optical system for projecting the calculated two-dimensional wavefront to a wavefront controller, exposing the wavefront-controlled light to a photosensitive resin located on the object of three-dimensional shape through the wavefront controller to form a three- Section.

According to an aspect of the present invention, the calculation unit may calculate the two-dimensional wavefront by performing three-dimensional inverse Fourier transform and Fourier transform on the intensity distribution of the three-dimensional light.

According to another aspect of the present invention, the calculation unit may perform a three-dimensional inverse Fourier transform on the intensity distribution of the three-dimensional light to calculate a three-dimensional Fourier spectrum, Projecting the Fourier spectrum located on the Ewald spherical surface to calculate a two-dimensional Fourier spectrum, projecting the calculated two-dimensional Fourier spectrum into coordinates on the Ewald spherical surface in the three-dimensional Fourier space, Calculating an approximate intensity of an object of a three-dimensional shape based on the three-dimensional Fourier space, calculating an error between the calculated approximate intensity and intensity of light of the object of the three-dimensional shape to be formed, The approximate intensity can be replaced with the light intensity of the object of the three-dimensional shape to be shaped based on the error and the predetermined reference value.

According to another aspect of the present invention, the calculation unit may replace an amplitude portion of the calculated two-dimensional Fourier spectrum with intensity of light incident on the wavefront controller.

According to another aspect of the present invention, the calculation unit may project a two-dimensional Fourier spectrum, which is replaced with the intensity of light incident on the wavefront controller, to a coordinate on the Eulove's sphere.

According to another aspect of the present invention, when a plane wave is incident on the wavefront controller, the calculation unit may substitute a specific value defined in advance so that the entire area corresponding to the Eulhard spherical surface becomes the same intensity.

According to another aspect of the present invention, the calculation unit may calculate the two-dimensional wavefront corresponding to each of a plurality of three-dimensional objects having different shapes when the plurality of objects having a shape to be shaped are present.

According to another aspect of the present invention, the optical unit may control the magnitude of the light controlled through the wavefront controller using a relay lens group to be a size of a clear aperture of the light focusing device.

According to another aspect, the relay lens group may be positioned between the wavefront controller and the light focusing device.

According to the present invention, since a three-dimensional object is formed by a single exposure using a wavefront controller, the time required for the stereolithography process can be reduced, and a plurality of three-dimensional shapes Objects can be molded simultaneously.

1 is a block diagram showing an internal configuration of a three-dimensional stereolithography apparatus according to an embodiment of the present invention.
FIG. 2 is a flowchart illustrating a three-dimensional stereolithography method using a wavefront controller, according to an embodiment of the present invention.
FIG. 3 is a diagram provided for explaining an operation of calculating a two-dimensional wavefront based on a three-dimensional Gerchberg-Saxton algorithm in one embodiment of the present invention. FIG.
4 is a diagram showing a configuration of an optical section according to an embodiment of the present invention.
FIG. 5 is a view showing a configuration of a specimen portion fabricated by a microfluidic chamber method in an embodiment of the present invention. FIG.
FIG. 6 is a view showing the configuration of a specimen portion manufactured by a moving stage method in an embodiment of the present invention. FIG.

Hereinafter, embodiments according to the present invention will be described in detail with reference to the accompanying drawings.

The present embodiments relate to a technique of rapidly forming an object having an arbitrary three-dimensional shape (i.e., shape) by using a shape of light controlled by a wavefront shaper, and more particularly, (I.e., making) a plurality of three-dimensional objects at a high speed by irradiating the photosensitive resin with light and curing the light.

In the present embodiments, an object may represent an object having a three-dimensional shape having an arbitrary shape, and a projection may project a three-dimensional object such as the surface area of the three- Can be shown. For example, it can be said that F is projected from 0 by drawing a straight line connecting a point on a plane (for example, figure F) and a point on F (for example, O).

FIG. 1 is a block diagram illustrating an internal configuration of a three-dimensional stereolithography apparatus according to an embodiment of the present invention. FIG. 2 is a schematic diagram of a three-dimensional stereolithography method using a wave- It is a flow chart.

1, the three-dimensional stereolithography apparatus 100 may include a specimen section 110, an optical section 120, and a calculation section 130. Here, the optical unit 120 may include a light source 121, a wavefront controller 122, and a light focusing device 123. The steps (210 to 230) of FIG. 2 are performed by the respective components (for example, the sample unit 110, the optical unit 120, and the calculation unit 130) of the 3D stereolithography apparatus 100 of FIG. ). ≪ / RTI >

In step 210, the calculation unit 130 may calculate a two-dimensional wavefront for controlling the intensity distribution of three-dimensional light of an object of a three-dimensional shape to be formed. At this time, the calculation unit 130 may calculate the two-dimensional wavefront based on a three-dimensional Gerchberg-Saxton algorithm that controls the three-dimensional intensity distribution by repeatedly using Fourier and Inverse Fourier transforms. The specimen part 110 is a photosensitive resin, and may correspond to an object of a three-dimensional shape to be formed.

In step 211, the calculation unit 130 may calculate the three-dimensional Fourier spectrum based on the intensity distribution of the three-dimensional light of the three-dimensional object to be formed. For example, the calculation unit 130 can calculate the three-dimensional Fourier spectrum by performing a three-dimensional inverse Fourier transform on the intensity distribution of the three-dimensional light of a three-dimensional object to be formed.

In step 212, the calculation unit 130 may calculate the three-dimensional Fourier spectrum based on the calculated three-dimensional Fourier spectrum and the Ewald spherical surface.

For example, the calculation unit 130 can calculate a two-dimensional Fourier spectrum by projecting a Fourier spectrum located on a Baltic sphere of the calculated three-dimensional Fourier spectrum.

In step 213, the calculation unit 130 may project the two-dimensional Fourier spectrum to the coordinates on the Ewald spherical surface.

For example, the calculation unit 130 can replace the intensity portion of the projected two-dimensional Fourier spectrum with the intensity of light incident on the wavefront controller. For example, when the plane wave is incident on the wavefront controller, the calculator 130 may replace the predetermined intensity to be equal to the intensity in the entire area on the Ewald spherical surface. In addition, when a Gaussian beam is incident, the calculation unit 130 may replace the amplitude portion of the two-dimensional Fourier spectrum so as to be a Gaussian distribution. Then, the calculation unit 130 may project the replaced two-dimensional Fourier spectrum to coordinates on the Ewald spherical surface in the three-dimensional Fourier space. At this time, the calculation unit 130 can process the intensity of the region other than the Ebulid spherical surface to a predetermined specific value (e.g., 0).

In step 214, the calculation unit 130 may calculate the approximate intensity of the object having the three-dimensional shape based on the calculated three-dimensional Fourier space. For example, the calculation unit 130 may perform a Fourier transform on a three-dimensional Fourier space to calculate an incident wavefront having a light intensity distribution corresponding to a three-dimensional shape to be formed. In this way, it is possible to create a three-dimensional shape in which light is to be shaped by well-calculated wavefronts that are incident, and as a result, molding can be performed at once without scanning.

In step 215, the calculation unit 130 may calculate an error by comparing the intensity of the light of the object having a three-dimensional shape to be formed with an approximate value (e.g., approximate intensity) of the calculated three-dimensional shape.

In step 216, the calculation unit 130 may replace the approximate value (e.g., approximate intensity) of the three-dimensional shape with the intensity of the light of the three-dimensional object to be shaped based on the calculated error and the predetermined reference value .

For example, when the calculated error is larger than the reference value, the calculation unit 130 may replace the intensity part (i.e., the approximate intensity) of the approximate three-dimensional shape with the intensity of the light of the three- . Then, the calculation unit 130 may repeat steps 212 through 215. That is, after the calculation unit 130 replaces the intensity of the light of the object of the three-dimensional shape, the intensity of the intensity of the two-dimensional Fourier spectrum and the intensity of the light incident on the wavefront controller are replaced, The process of projecting, approximating, and calculating the error on a 2D Fourier spectrum with coordinates on the Ebartsphere can be repeated. At this time, the process can be repeated until the error becomes smaller than the reference value.

As another example, when the calculated error is smaller than the reference value, the calculation unit 130 can stop the calculation.

In step 220, the optical unit 120 may project the calculated two-dimensional wavefront to the wavefront controller.

In step 230, the optical unit 120 can form a three-dimensional object by exposing the wave-front-controlled light to a photosensitive resin located on a three-dimensional object through a wavefront controller.

At this time, when there are a plurality of objects having different shapes to be shaped, the calculation unit 130 can calculate a two-dimensional wavefront corresponding to each of a plurality of three-dimensional objects having different shapes, and the optical unit 120 The object corresponding to each of a plurality of different shapes can be formed by projecting the two-dimensional wavefront calculated for each shape on the wavefront controller and exposing the controlled light to the photosensitive resin.

FIG. 3 is a diagram provided for explaining an operation of calculating a two-dimensional wavefront based on a three-dimensional Gerchberg-Saxton algorithm in one embodiment of the present invention. FIG.

Referring to FIG. 3, the calculation unit 130 may calculate a two-dimensional wavefront that can control the three-dimensional intensity distribution of light by repeating Fourier and inverse Fourier operations. Then, the optical unit 120 projects the calculated two-dimensional wavefront to the wavefront controller, and reflects the light to obtain the intensity distribution of the desired three-dimensional shape.

A three-dimensional Fourier spectrum can be calculated by performing an inverse Fourier transform 320 on the three-dimensional intensity distribution of an object (i.e., target shape 310) of a three-dimensional shape to be formed. Dimensional Fourier spectrum with respect to the calculated three-dimensional Fourier spectrum, and substitute the intensity 340 of the intensity of the two-dimensional Fourier spectrum obtained by the wavefront controller 330 with the intensity of the obtained two-dimensional Fourier spectrum. Then, the replaced two-dimensional Fourier spectrum is projected again to the coordinates on the Ewald's square in the three-dimensional Fourier space, and the Fourier transform 350 is performed on the three-dimensional Fourier space to obtain an approximation of the three- 360) can be calculated. Then, by comparing the error value 370 calculated based on the approximation 360 with a predefined reference value, the intensity portion of the approximate value 360 is replaced with the light intensity of the object to be shaped, . The intensity portion can be repeatedly adjusted so that the error is below the reference value.

4 is a diagram showing a configuration of an optical section according to an embodiment of the present invention.

4, the optical units 400 and 120 may include light sources 121 and 410, wavefront controllers 122 and 420, and light focusing devices 123 and 430. The optical units 400 and 120 may further include a relay lens group 440.

The optical units 400 and 120 can project the two-dimensional wavefront calculated by the calculation unit 130 to the wavefront controllers 122 and 420 and expose it to the photosensitive resin. In this case, when a plurality of objects having different shapes are to be formed, a plurality of two-dimensional wavefronts may be calculated, and the optical units 400 and 120 may respectively calculate the two-dimensional wavefronts calculated by the wavefront controllers 122 and 420 A plurality of different three-dimensional objects can be formed simultaneously by one exposure by exposing the photosensitive resin after the projection.

The light sources 121 and 410 may use various light sources depending on the type of the light polymerization process. For example, when a stereolithography principle is used, a laser or lamp suitable for the reaction wavelength of the photosensitive resin may be used as the light sources 121 and 410. When a multiphoton absorption-photopolymerization principle is used, a long-wavelength pulse laser or the like may be used as the light sources 121 and 410.

The wavefront controllers 122 and 420 may include a digital micromirror device (DMD), a spatial light modulator (SLM), a deformable mirror, and the like.

The light focusing devices 123 and 430 may include various lenses depending on the size of the object to be shaped. For example, when the object to be formed is a fine object having a size of 100 μm or less, a microscope objective lens can be used as the light focusing devices 123 and 430. If the size of the object to be formed is larger than 100 mu m, a general lens may be used. However, when a general lens is used, the minimum size (i.e., resolution) of the object to be formed may be limited.

The optical units 400 and 120 may further include a relay lens group 440 to adjust the size of the light and the relay lens group 440 may include wavefront controllers 122 and 420 and light focusing devices 123 and 430 ). ≪ / RTI >

The relay lens group 440 can be used in the wavefront controller 122 or 420 to adjust the wavefront-controlled light size to the size of the clear aperture of the light focusing device. That is, the relay lens group 440 can adjust the magnitude of the controlled light to be the size of the aperture of the light focusing device. At this time, when the wavefront-controlled light of the wavefront controller 122 or 420 has the size equal to the size of the clear aperture of the light focusing device, the intensity of the light to be exposed and the number of modes of light that can be controlled by the wavefront controller Can all be maximized. Accordingly, the relay lens group 440 can adjust the size of the controlled light so that the size of the controlled light becomes equal to the size of the opening of the light focusing device.

와 최대 크기

는 아래의 수학식 1 및 수학식 2와 같이 표현될 수 있다.When the relay lens group 440 is used, when the light controlled by the wavefront controllers 122 and 420 is incident on the openings of the light focusing devices 123 and 430, the minimum size of the three-

And maximum size

Can be expressed by the following equations (1) and (2).

[Equation 1]

&Quot; (2) "

In Equations (1) and (2), λ denotes the wavelength of the incident light, NA denotes the numerical aperture of the light focusing device, and M denotes the number of controllable pixels of the wavefront controller 122 and 420 .

In this case, the numerical aperture NA of the light focusing devices 123 and 430 may be defined as the numerical aperture of the objective lens in the case of a microscope objective lens, and may be expressed by the following Equation 3 in the case of a general lens.

&Quot; (3) "

In the above equation (3), D is the diameter of the aperture and f is the focal length of the lens.

는 295.6nm이고, 최대 크기

는 177.3μm로 계산될 수 있다. 그리고, 개구부의 지름 D=50nm, 초점 f=300nm인 일반 렌즈를 사용하는 경우, 조형하려는 물체의 최소 크기

은 3.19μm, 최대 크기

는 1.92nm로 계산될 수 있다.For example, when the wavelength λ of the incident light is 532 nm, the number of pixels of the wavefront controller (ie, the number of pixels) M = 600, and the NA of the objective lens is 0.9, the minimum size

Is 295.6 nm, and the maximum size

Can be calculated as 177.3 [mu] m. When a general lens having an aperture diameter D = 50 nm and a focal length f = 300 nm is used, the minimum size of the object to be formed

3.19 [mu] m, maximum size

Can be calculated to be 1.92 nm.

FIG. 5 is a view showing a configuration of a specimen portion fabricated by a microfluidic chamber method in an embodiment of the present invention. FIG.

5, the photosensitive resin 520 may be placed on the specimen part 510. When the photosensitive resin 520 is manufactured by a microfluidic chamber method, the liquid photosensitive resin 520 may be syringe pump, 530 at a constant speed within the specimen section 510. [ Then, the optical unit 120 can form a three-dimensional shape by exposing the three-dimensional light controlled by the wavefront controller 122 and 420 with the photosensitive resin, and obtain the manufactured molding 540 at the end of the chamber.

At this time, the injection speed of the syringe pump 530 is controlled according to the polymerization rate of the photosensitive resin 520, so that an error due to the movement of the photosensitive resin 520 can be reduced.

FIG. 6 is a view showing the configuration of a specimen portion manufactured by a moving stage method in an embodiment of the present invention. FIG.

In the case of the moving stage system, the photosensitive resin may be located on the moving stage 610. [

Referring to FIG. 6, the optical unit 120 can form a three-dimensional shape by exposing the three-dimensional light controlled by the wavefront controllers 122 and 420 to a photosensitive resin. At this time, the above non-patent document [2] Bucknall , D. ed., 2005. Nanolithography and patterning techniques in microelectronics. Elsevier ., [3] Linnenberger , A. et al. Three dimensional live cell lithography. Optics Express 21, 10269 (2013). The optical unit 120 moves the moving stage 610 on which the specimen unit 110 is placed to a different region either manually or automatically to form a plurality of three-dimensional shapes .

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. For example, it is to be understood that the techniques described may be performed in a different order than the described methods, and / or that components of the described systems, structures, devices, circuits, Lt; / RTI > or equivalents, even if it is replaced or replaced.

Therefore, other implementations, other embodiments, and equivalents to the claims are also within the scope of the following claims.

Claims (20)

Calculating a two-dimensional wavefront for controlling an intensity distribution of three-dimensional light of an object of a three-dimensional shape to be formed;
Projecting the calculated two-dimensional wavefront to a wavefront controller; And
A step of shaping a three-dimensional object by exposing the wave-front-controlled light through the wavefront controller to a photosensitive resin located in the three-dimensional object;
Dimensional stereolithography method. The method according to claim 1,
Wherein the step of calculating the two-
Dimensional inverse Fourier transform and Fourier transform on the intensity distribution of the three-dimensional light to calculate the two-dimensional wavefront
Dimensional stereolithography method. The method according to claim 1,
Wherein the step of calculating the two-
Performing a three-dimensional inverse Fourier transform on the intensity distribution of the three-dimensional light to calculate a three-dimensional Fourier spectrum;
Calculating a two-dimensional Fourier spectrum by projecting a Fourier spectrum located on the Ewald spherical surface among the calculated three-dimensional Fourier spectrum;
Projecting the calculated two-dimensional Fourier spectrum into coordinates on the Ewald spherical surface in a three-dimensional Fourier space;
Calculating an approximate intensity of an object having a three-dimensional shape based on the three-dimensional Fourier space;
Calculating an error between the calculated approximate intensity and a light intensity of an object of the three-dimensional shape to be formed; And
Replacing the approximate intensity with light intensity of an object of a three-dimensional shape to be formed based on the calculated error and a predefined reference value
Dimensional stereolithography method. The method of claim 3,
Wherein the step of calculating the two-
Replacing the calculated amplitude of the two-dimensional Fourier spectrum with intensity of light incident on the wavefront controller
Dimensional stereolithography method. 5. The method of claim 4,
The step of projecting the two-dimensional Fourier spectrum into coordinates on the Eulal spherical surface in the three-dimensional Fourier space,
A two-dimensional Fourier spectrum that is replaced by the intensity of light incident on the wavefront controller is projected onto a coordinate on the Baltic sphere
Dimensional stereolithography method. The method of claim 3,
The step of replacing with the intensity of light incident on the wavefront controller comprises:
When a plane wave is incident on the wavefront controller, replacing the entire area corresponding to the Elliptic spherical surface with a predetermined value defined to be the same intensity
Dimensional stereolithography method. The method according to claim 1,
Wherein the step of calculating the two-
Dimensional wavefront corresponding to each of a plurality of three-dimensional objects having different shapes when the object to be shaped is a plurality of objects
Dimensional stereolithography method. The method according to claim 1,
The step of shaping the three-dimensional object includes:
Controlling the size of light controlled through the wavefront controller to be the size of a clear aperture of the light focusing device
Dimensional stereolithography method. 9. The method of claim 8,
Wherein the controlling comprises:
And controlling the size of the light controlled through the wavefront controller to be the same as the size of the opening of the light focusing device by using a relay lens group positioned between the wavefront controller and the light focusing device
Dimensional stereolithography method. The method according to claim 1,
The three-dimensional object may be formed on the basis of a microfluidic chamber or a translation stage technique
Dimensional stereolithography method. 11. The method of claim 10,
In the case of the microfluidic chamber technique, the injection rate of the syringe pump for moving the photosensitive resin in the liquid phase is controlled in accordance with the polymerization rate of the photosensitive resin
Dimensional stereolithography method. A specimen portion in which the photosensitive resin is placed;
A calculation unit for calculating a two-dimensional wavefront for controlling the intensity distribution of three-dimensional light of a three-dimensional object corresponding to the specimen and being a target of molding; And
Dimensionally projecting the calculated two-dimensional wavefront to a wavefront controller, exposing the wavefront-controlled light to a photosensitive resin located on the object of three-dimensional shape through the wavefront controller to form an object of three-
Dimensional stereolithography device. 13. The method of claim 12,
The calculation unit may calculate,
Dimensional inverse Fourier transform and Fourier transform on the intensity distribution of the three-dimensional light to calculate the two-dimensional wavefront
Dimensional stereolithography device. 13. The method of claim 12,
The calculation unit may calculate,
Dimensional Fourier spectrum by performing a three-dimensional inverse Fourier transform on the intensity distribution of the three-dimensional light, and calculating a three-dimensional Fourier spectrum by using a Fourier transform, which is located on the Ewald spherical surface, Dimensional Fourier spectrum is projected to coordinates on the Eulwart spherical surface in the three-dimensional Fourier space, and the three-dimensional Fourier spectrum based on the three-dimensional Fourier space is projected, Calculating an approximate intensity of an object of the shape, calculating an error between the calculated approximate intensity and the intensity of light of the object of the three-dimensional shape to be formed, and based on the calculated error and a predefined reference value And substituting the approximate intensity with the intensity of the light of the object having the three-dimensional shape to be shaped
Dimensional stereolithography device. 15. The method of claim 14,
The calculation unit may calculate,
And replacing an amplitude portion of the calculated two-dimensional Fourier spectrum with the intensity of light incident on the wavefront controller
Dimensional stereolithography device. 16. The method of claim 15,
The calculation unit may calculate,
A two-dimensional Fourier spectrum that is replaced by the intensity of light incident on the wavefront controller is projected onto a coordinate on the Baltic sphere
Dimensional stereolithography device. 15. The method of claim 14,
The calculation unit may calculate,
When a plane wave is incident on the wavefront controller, replacing the entire area corresponding to the Elliptic spherical surface with a predetermined value defined to be the same intensity
Dimensional stereolithography device. 13. The method of claim 12,
The calculation unit may calculate,
Dimensional wavefront corresponding to each of a plurality of three-dimensional objects having different shapes when the object to be molded is a plurality of three-dimensional objects
Dimensional stereolithography device. 13. The method of claim 12,
The optical unit includes:
And controlling the size of the light controlled through the wavefront controller to be the size of the clear aperture of the light focusing device using the relay lens group
Dimensional stereolithography device. 20. The method of claim 19,
The relay lens group includes:
Located between the wavefront controller and the light focusing device
Dimensional stereolithography device.

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