KR20180099105A - Oxime ester compound and a photocurable composition comprising the same - Google Patents

Abstract

The present invention relates to an oxime ester compound and a photocurable composition containing the same. More specifically, the present invention relates to a photocurable composition comprising a photocurable compound and a photopolymerization initiator, wherein the photopolymerization initiator includes an oxime ester compound. The photocurable composition has a high sensitivity but can inhibit the generation of outgassing to reduce foreign matter defect rate, and inhibits solvent elution to alleviate the problem of liquid crystal contamination due to solvent elution resulting from contamination of the liquid crystal.

Description

TECHNICAL FIELD The present invention relates to oxime ester compounds and photocurable compositions containing the oxime ester compounds.

The present invention relates to an oxime ester compound and a photo-curing composition containing the same. More specifically, the present invention relates to an oxime ester compound and a photocurable composition containing the oxime ester compound. Oxime ester compounds and photocurable compositions containing them.

The photoactive compound is a substance that generates chemically active atoms or molecules by decomposing and absorbing light, and is widely used as a photopolymerization initiator for various compositions such as photo-curable ink, photosensitive printing plate, photoresist and the like.

As typical examples of the photopolymerization initiator, various kinds of acetophenone based compounds, benzophenone based compounds, triazine based compounds, nonimidazole based compounds, acylphosphine oxide based compounds and oxime ester based compounds are known, Absorbs ultraviolet light to hardly show color, has a high radical generation efficiency, and is excellent in compatibility and stability with photoresist composition materials.

In the case of a photopolymerization initiator having an oxime ester compound, it is easy to synthesize various photopolymerization initiators capable of regulating the absorption region of the photopolymerization initiator by introducing an appropriate substituent into the compound.

The oxime ester compound can polymerize and cure a polymerizable compound having an unsaturated bond by irradiating light of 365 to 435 nm to the photo-curable composition and is used for a black matrix, a color filter, a column spacer, an organic insulating film, a photoresist composition for an overcoat .

Therefore, the photopolymerization initiator has a high sensitivity to a long wavelength light source such as 365 to 435 nm, has good photopolymerization reactivity, is easy to produce, has high thermal stability and storage stability and is easy to handle, and has excellent properties for a solvent such as propylene glycol monomethyl ether acetate There is a continuing need for new photopolymerization initiators suitable for a variety of applications that meet the needs of industrial sites, such as satisfactory solubility.

Exemplary oxime ester compounds include oxime ester compounds using p-dialkylaminobenzene in U.S. Patent No. 4,255,513, acrylamino-substituted oxime ester compounds in U.S. Patent No. 4,202,697, U.S. Patent No. 4,590,145 Include benzophenone oxime ester compounds and the like.

However, when a conventionally known oxime ester compound is used as a photopolymerizable composition, for example, a photopolymerization initiator for a color resist of a liquid crystal display device, a large amount of outgas is generated in a curing step after the development treatment, Resulting in a problem of lowering the yield of the product due to the desorption of foreign matter, and insufficient solvent dissolution inhibiting property, thereby contaminating other materials, that is, liquid crystal.

Therefore, there is a high demand for an oxime ester compound having a novel structure capable of fundamentally solving such a problem and a photo-curable composition containing the same.

U.S. Patent No. 4,255,513 U.S. Patent No. 4,202,697 U.S. Patent No. 4,590,145

It is an object of the present invention to provide a novel oxime ester compound.

The present invention also provides a photocurable composition comprising a photocurable compound and a photopolymerization initiator. By including the novel oxime ester compound of the present invention as the photopolymerization initiator, outgas generation is suppressed while having high sensitivity, Can be reduced and the problem of liquid crystal contamination due to solvent elution in which liquid crystal is contaminated by suppressing solvent elution can be improved.

In order to achieve the above object,

The present invention provides an oxime ester compound represented by the following general formula (1).

[Chemical Formula 1]

Wherein R < ₁ > is a C1-C12 linear or branched alkyl group;

R ₂ is a straight-chain or branched alkyl group having 1 to 12 carbon atoms;

X is any one selected from the group consisting of Cl, Br and I;

Y is hydrogen, a C1 to C12 linear or branched alkyl group, a halogen atom, an amino group or a C1 to C4 alkoxy group.

The present invention also provides a photocurable composition comprising a photocurable compound and a photopolymerization initiator, wherein the photopolymerization initiator comprises an oxime ester compound represented by the following general formula (1).

[Chemical Formula 1]

Wherein R < ₁ > is a C1-C12 linear or branched alkyl group;

R ₂ is a straight-chain or branched alkyl group having 1 to 12 carbon atoms;

X is any one selected from the group consisting of Cl, Br and I;

Y is hydrogen, a C1 to C12 linear or branched alkyl group, a halogen atom, an amino group or a C1 to C4 alkoxy group.

The novel oxime ester compound of the present invention can be used as a photopolymerization initiator. In the photocurable composition containing a photocurable compound and a photopolymerization initiator, the novel oxime ester compound of the present invention is contained as the photopolymerization initiator, The generation of outgas can be suppressed and the foreign matter defect rate can be reduced and solvent leaching can be suppressed and the liquid crystal contamination problem due to the elution of the solvent contaminated with the liquid crystal can be improved.

1 is a graph showing ¹ H-NMR results of an oxime ester compound represented by the formula (2).

Hereinafter, the present invention will be described in more detail.

The present invention relates to an oxime ester compound represented by the following general formula (1).

[Chemical Formula 1]

Wherein R < ₁ > is a C1-C12 linear or branched alkyl group;

R ₂ is a straight-chain or branched alkyl group having 1 to 12 carbon atoms;

X is any one selected from the group consisting of Cl, Br and I;

Y is hydrogen, a C1 to C12 linear or branched alkyl group, a halogen atom, an amino group or a C1 to C4 alkoxy group.

In the oxime ester compound of Formula 1, R ₁ is preferably a straight-chain or branched alkyl group having from ₁ to 5 carbon atoms; Preferably, R < ₂ > is a C1-C7 linear or branched alkyl group; X is preferably Cl; Y is preferably a linear or branched alkyl group having from 1 to 5 carbon atoms.

The oxime ester compound of Formula 1 may be an oxime ester compound, but it is not limited thereto.

(2)

The present invention provides a photocurable composition using the oxime ester compound of Formula 1 as a photopolymerization initiator.

More specifically, the present invention provides a photocurable composition comprising a photocurable compound and a photopolymerization initiator, wherein the photopolymerization initiator comprises an oxime ester compound represented by the following general formula (1).

[Chemical Formula 1]

Wherein R < ₁ > is a C1-C12 linear or branched alkyl group;

R ₂ is a straight-chain or branched alkyl group having 1 to 12 carbon atoms;

X is any one selected from the group consisting of Cl, Br and I;

Y is hydrogen, a C1 to C12 linear or branched alkyl group, a halogen atom, an amino group or a C1 to C4 alkoxy group.

The photopolymerizable compound is a component for complementing light efficiency and color change, and the kind thereof is not particularly limited, but is preferably a compound having an ethylenic unsaturated bond.

Specific examples of the photocurable compound include acrylic acid, methacrylic acid, fumaric acid, maleic acid, monomethyl fumarate, monoethyl fumarate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, ethylene glycol Acrylate, methacrylic acid amide, acrylic acid amide, acrylamide, methacrylic acid amide, methacrylic acid amide, methacrylic acid amide, methacrylic acid amide, Acrylonitrile, methacrylonitrile, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, isobutyl acrylate, isobutyl methacrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate Benzyl acrylate, benzyl methacrylate, ethylene glycol diacrylate Acrylates such as ethylene glycol dimethacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, tetraethylene glycol diacrylate, tetraethylene glycol dimethacrylate, butylene glycol di Methacrylate, propylene glycol diacrylate, propylene glycol dimethacrylate, trimethylol propane triacrylate, trimethylol propane trimethacrylate, tetramethylol propane tetraacrylate, tetramethylol propane tetramethacrylate, penta But are not limited to, trimethylolpropane trimethacrylate, trimethylolpropane trimethacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, Hexaacrylate Monomers such as dipentaerythritol hexamethacrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, and cardoepoxy diacrylate; oligomers; (Meth) acrylate obtained by reacting (meth) acrylic acid with a polyester prepolymer obtained by condensing a polyhydric alcohol with a monobasic acid or a polybasic acid, a polyester (meth) acrylate obtained by reacting a polyol group with a compound having two isocyanate groups, (Meth) acrylate obtained by reacting polyurethane (meth) acrylate; Bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol or cresol novolak type epoxy resin, resol type epoxy resin, triphenol methane type epoxy resin, polycarboxylic acid polyglycidyl ester, (Meth) acrylate resins obtained by reacting an epoxy resin such as a cydyl ester, an aliphatic or alicyclic epoxy resin, an amine epoxy resin, and a dihydroxybenzene type epoxy resin with (meth) acrylic acid. Further, a resin obtained by reacting the epoxy (meth) acrylate resin with a polybasic acid anhydride can be used. These photopolymerizable compounds may be cardade resins.

The photopolymerization initiator is characterized by containing an oxime ester compound represented by the following formula (1).

[Chemical Formula 1]

Wherein R < ₁ > is a C1-C12 linear or branched alkyl group;

R ₂ is a straight-chain or branched alkyl group having 1 to 12 carbon atoms;

X is any one selected from the group consisting of Cl, Br and I;

Y is hydrogen, a C1 to C12 linear or branched alkyl group, a halogen atom, an amino group or a C1 to C4 alkoxy group.

In the oxime ester compound of Formula 1, R ₁ is preferably a straight-chain or branched alkyl group having from ₁ to 5 carbon atoms; Preferably, R < ₂ > is a C1-C7 linear or branched alkyl group; X is preferably Cl; Y is preferably a linear or branched alkyl group having from 1 to 5 carbon atoms.

The oxime ester compound of Formula 1 may be an oxime ester compound, but it is not limited thereto.

(2)

The photopolymerization initiator is contained in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the solid content of the photopolymerizable compound. If the content is less than 0.01 part by weight, the overall curability of the photopolymerizable composition is lowered. If the content is more than 10 parts by weight, the transmittance of ultraviolet light is lowered and the degree of curing at the core part is lowered.

In addition, the photopolymerizable composition of the present invention may further comprise a solvent, and if the solvent is effective for dissolving other components contained in the photopolymerizable composition, the solvent used in a conventional photopolymerizable composition is not particularly limited and may be used Ethers, aromatic hydrocarbons, ketones, alcohols, esters or amides are particularly preferred.

Examples of the ethers include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; Diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; Ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; And alkylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, and methoxypentyl acetate.

Examples of the aromatic hydrocarbons include benzene, toluene, xylene, and mesitylene.

Examples of the ketones include methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone.

Examples of the alcohols include ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin.

Examples of the esters include esters such as ethyl lactate, butyl lactate, ethyl 3-ethoxypropionate and methyl 3-methoxypropionate; And cyclic esters such as? -Butyrolactone.

Of these solvents, organic solvents having a boiling point of 100 ° C to 200 ° C are more preferably used in terms of coatability and dryness. Examples thereof include propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, ethyl lactate , Butylacetate, ethyl 3-ethoxypropionate and methyl 3-methoxypropionate.

These solvents may be used alone or in combination of two or more.

In addition, the photopolymerizable composition of the present invention may further include known additives such as a colorant, an alkali-soluble resin and a surfactant.

The photopolymerizable composition of the present invention is applicable for various purposes. For example, it can be applied to a printing ink, a finishing material, a covering material, a point / adhesive, and the like, and absorbs ultraviolet rays to hardly color, so that it can be applied as an optical composition for various image display devices requiring transparency.

It is to be understood that both the foregoing general description and the following detailed description of the present invention are exemplary and explanatory and are intended to be illustrative of the invention and are not intended to limit the scope of the claims. It will be apparent to those skilled in the art that such variations and modifications are within the scope of the appended claims.

< Oxime  Preparation of ester compounds>

Manufacturing example  1. A compound of formula Oxime  Ester compound production

(2)

1-1. Carbazole Haloalkylation  reaction

[Reaction Scheme 1]

(Molecular weight 157.44; 0.45 mol) of 1-bromo-3-chloropropane and 0.36 g of tetrabutylammonium bromide were added to 50 g of tetrahydrofuran, to which 48 g of 50% caustic soda Followed by heating and stirring at 45 to 50 ° C for 5 to 6 hours.

The reaction mixture was cooled to room temperature, and the upper layer was separated. The tetrahydrofuran was removed under reduced pressure. Subsequently, excess 1-bromo-3-chloropropane was removed to obtain 20 g of an oily compound (molecular weight: 243.73100; 0.083 mol).

(3)

1-2. The compound of formula Acylation  reaction

Obtained by the haloalkylation reaction of the carbazole of the above-mentioned 1-1 35 g of the compound of the formula (3) was dissolved in 400 ml of dichloromethane. The reaction solution was cooled and maintained at 0 캜. 35 g of aluminum chloride was slowly added thereto. The reaction solution was cooled to -10 to -5 캜. Ortho to the cooled reaction mixture-the-toluoyl chloride (o -Toluoyl chloride) 30g was slowly dropped. After completion of dropwise addition, the mixture was stirred at room temperature for 3 hours to complete the first acylation reaction. The reaction solution was cooled to 0 ° C again, 200 ml of dichloromethane and 30 g of aluminum chloride were added, 14 g of acetyl chloride was slowly added dropwise, and the mixture was stirred at room temperature for 3 hours. The reaction solution after completion of the secondary acylation reaction was slowly added to 1000 mL of water and stirred at room temperature for 4 hours. The reaction mixture was separated and the lower layer was separated and removed under reduced pressure. The resulting solid was recrystallized from toluene and normal- 43 g of a compound was obtained.

[Reaction Scheme 2]

[Chemical Formula 4]

1-3. Jade deep  reaction

9.4 g of the compound of the formula (4) obtained by the acylation of the compound of the formula (1-2), 1.8 g of the hydroxyamine hydrochloride and 3.5 g of the sodium acetate trihydrate were added and heated to reflux for 16 hours with addition of 100 ml of ethanol. After completion of the reaction, the ethanol is removed under reduced pressure, and 60 mL of water and 60 mL of dichloromethane are added to the remaining residue, and the layer is separated to obtain the lower layer. The taken dichloromethane layer was removed under reduced pressure to obtain 6.8 g of a compound represented by the following formula (5).

[Reaction Scheme 3]

[Chemical Formula 5]

1-4. Acetylation  reaction

6.8 g of the compound of the formula 5 obtained by the oximation reaction of 1-3 of the compound of the formula 4 was dissolved in 40 mL of dichloromethane, 1.89 g of acetic anhydride was slowly added dropwise, and the mixture was stirred at room temperature for 2 hours to complete the reaction. The resulting dichloromethane layer was removed under reduced pressure. The resulting solid was recrystallized from ethyl acetate and normal-hexane to obtain 6.0 g of a compound represented by the following formula (2).

[Reaction Scheme 4]

(2)

_{^{1 H-NMR (CDCl 3,}} ppm): 8.53 (d, 1H), 8.43 (d, 1H), 8.10 ~ 7.97 (m, 2H), 7.54 (m, 2H), 7.45 ~ 7.29 (m, 4H), 2H), 2.36 (s, 3H), 2.29 (s, 3H), 4.52 (s, 3H)

Manufacturing example  2. The compound of formula Oxime  Ester compound production

[Chemical Formula 6]

Manufacturing example  2-1. Carbazole Haloalkylation  reaction

The reaction was carried out in the same manner as in Production Example 1-1 except that 1-bromo-3-fluoropropane was used instead of 1-bromo-3-chloropropane. Carbazole in the same manner as in the haloalkylation reaction of carbazole to obtain the compound of formula (VII).

[Reaction Scheme 5]

(7)

Manufacturing example  2-2. The compound of formula 7 Acylation  reaction

Except that the compound of formula (7) was used instead of the compound of formula (3). The compound of the formula (8) was obtained by reacting the compound of the formula (3) under the same conditions as the acylation of the compound of the formula (3).

 [Chemical Formula 8]

2-3. Jade deep  reaction

Except that the compound of formula (8) was used instead of the compound of formula (4). The reaction was carried out under the same conditions as in the oxepizing reaction to obtain the compound of formula (9).

 [Chemical Formula 9]

2-4. Acetylation  reaction

Except that the compound of formula (9) was used instead of the compound of formula (5). The reaction was carried out under the same conditions as in the acetylation reaction to obtain the compound of formula (VI).

[Chemical Formula 6]

Manufacturing example  3. The compound of formula Oxime  Ester compound production

[Chemical formula 10]

3-1. Carbazole Haloalkylation reaction

Production Example 1-1. Carbazol in the same manner as in the haloalkylation reaction of carbazole to obtain the compound of formula (3).

(3)

3-2. The compound of formula Acylation reaction

Production Example 1-1. Rise of the reactants in the halo alkylation of carbazoles small-toluoyl chloride (o -Toluoyl chloride) was prepared except that instead of the reaction by using pivaloyl chloride (pivaloyl chloride) in Example 1-2. The compound of formula 11 was reacted under the same conditions as the acylation reaction of the compound of formula 3.

(11)

3-3. Jade deep  reaction

Except that the compound of formula (11) was used instead of the compound of formula (4). The reaction was carried out under the same conditions as in the oxepizing reaction to obtain the compound of formula (12).

 [Chemical Formula 12]

3-4. Acetylation  reaction

Except that the compound of formula (12) was used instead of the compound of formula (5). The reaction was carried out under the same conditions as in the acetylation reaction to obtain the compound of formula (10).

[Chemical formula 10]

< Photocurable  Composition Preparation>

Example  One. Photocurable  Composition manufacturing

50 g of diepoxyacrylate of bisphenol A having the following formula (13), 10 g of dipentaerythritol hexaacrylate, 40 g of carbon black as a colorant and 3 g of oxime ester compound of formula (2) were added to 100 g of propylene glycol monomethoxyacetate as a photocurable compound And the mixture was stirred for 30 minutes to prepare a photocurable composition.

[Chemical Formula 13]

Example  2. Photocurable  Composition manufacturing

5 g of 50% PGMEA solution, 5 g of dipentaerythritol hexaacrylate and 1 g of the oxime ester compound of formula (2) were dissolved in 50 ml of propylene glycol monomethoxy Acetate, and the mixture was stirred for 30 minutes to prepare a photocurable composition.

Comparative Example  One. Photocurable  Composition manufacturing

(9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethanone-1-O-acetyloxime, a compound represented by the following formula 14 as a photopolymerization initiator, Irgacure OXE- The photocurable composition was prepared in the same manner as in Example 1, except that the photocurable composition was used.

The compound of formula (14)

Comparative Example  2. Photocurable  Composition manufacturing

A photocurable composition was prepared in the same manner as in Example 1, except that the compound represented by the following formula (6) was used as a photopolymerization initiator.

[Chemical Formula 6]

Comparative Example  3. Photocurable  Composition manufacturing

A photocurable composition was prepared in the same manner as in Example 1 except that the compound of the following formula (10) was used as a photopolymerization initiator.

[Chemical formula 10]

Comparative Example  4. Photocurable  Composition manufacturing

As the photopolymerization initiator, Irgacure OXE-02 (1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethanone- ) Was used in place of the photo-curable composition.

Comparative Example  5. Photocurable  Composition manufacturing

A photocurable composition was prepared in the same manner as in Example 2, except that the compound of Chemical Formula 6 was used as a photopolymerization initiator.

Comparative Example  6. Photocurable  Composition manufacturing

A photocurable composition was prepared in the same manner as in Example 1 except that the compound of Formula 10 was used as a photopolymerization initiator.

Experimental Example  One. Photocurable  Evaluation of the sensitivity of the composition

The photocurable compositions of Example 1 and Comparative Examples 1 to 3 were applied on a glass substrate having a clean surface of 1 mm in thickness using a spin coater so as to have a dry film thickness of 1.0 占 퐉 and dried at 100 占 폚 for 5 minutes, Film. The rear sight of the 365nm wavelength ultraviolet rays through a negative mask having a line width 20㎛ the chemical conversion film, each light exposure ^{3 mJ / cm 2, 5 mJ} / cm 2, and 10 mJ / cm ² irradiated with ultraviolet rays so that the selectively, 0.5 % Sodium carbonate aqueous solution at 25 DEG C for 60 seconds to form a black matrix. The formed fractal matrix was observed with a microscope to confirm curing and uncured for each exposure dose, and the evaluation criteria were as follows.

<Sensitivity Evaluation Standard>

○: Pattern peeling due to uncured is not observed

?: Fine tearing was observed

X: The pattern is completely developed due to uncured and hardly remains.

The sensitivity evaluation results are shown in Table 1 below.

[Table 1]

The results of Table 1 indicate that the sensitivity of the photocurable composition of Example 1 using the oxime ester compound of the present invention as a photopolymerization initiator is comparable to that of Comparative Example 1 using Irgacure OXE-02, which is currently widely used as a photoinitiator, It was confirmed that the sample exhibited better sensitivity than the sample. It was also confirmed that the sensitivity of the photocurable composition of Example 1 using the oxime ester compound of the present invention as a photopolymerization initiator was significantly superior to that of Comparative Example 3.

Thus, it was confirmed that the oxime ester compound of the present invention can be used as a photopolymerization initiator.

Experimental Example  2. Photocurable  The amount of outgas of the composition NMP  (N-Methyl-2- 피리로드로one ) Solvent release rate evaluation

The photocurable compositions of Example 2 and Comparative Examples 4 to 6 were coated on a glass substrate having a clean surface of 1 mm in thickness using a spin coater so as to have a dry film thickness of 3.0 占 퐉 and dried at 100 占 폚 for 5 minutes, Ultraviolet rays were irradiated to the whole surface to be 10 mJ / cm ² with ultraviolet rays having a wavelength of 365 nm and baked at 230 degrees Celsius for 20 minutes to prepare samples.

<Method of measuring out gas amount>

The sample was cooled to room temperature and the initial weight was measured. After further baking at 250 DEG C for 12 hours, the sample was cooled and the weight was measured after heating.

(Initial weight - weight after heating) / initial weight X 100%.

The results of the outgassing evaluation are shown in Table 2 below.

< NMP  Determination of Solvent Release Rate>

The sample was cooled to room temperature, and its initial weight was measured. The sample was immersed in an 80 ° C NMP solvent for 1 hour, dried in a hot air drier at 80 ° C for 12 hours, cooled, and the weight of the NMP solvent was measured after elution.

(Initial weight - NMP solvent Weight after elution) / initial weight X 100% was calculated as NMP solvent elution amount.

The evaluation results of the NMP solvent elution amount are shown in Table 2 below.

[Table 2]

From the results of Table 2, it can be seen that the photo-curable composition of Example 2 using the oxime ester compound of the present invention as a photopolymerization initiator has significantly less outgass amount and less amount of NMP solvent than the photo-curable composition of Comparative Examples 4 to 6 there was.

Therefore, the photo-curing composition using the oxime ester compound of the present invention as a photopolymerization initiator can suppress outgas formation, reduce the foreign matter defect rate, suppress the solvent elution, and improve the liquid crystal contamination problem caused by solvent elution I can confirm that I can do it.

Claims (9)

An oxime ester compound represented by the following formula (1);
[Chemical Formula 1]

Wherein R &lt; ₁ &gt; is a C1-C12 linear or branched alkyl group;
R ₂ is a straight-chain or branched alkyl group having 1 to 12 carbon atoms;
X is any one selected from the group consisting of Cl, Br and I;
Y is hydrogen, a C1 to C12 linear or branched alkyl group, a halogen atom, an amino group or a C1 to C4 alkoxy group. The method according to claim 1,
R &lt; ₁ &gt; is a straight or branched alkyl group having from ₁ to 5 carbon atoms;
R ₂ is a straight or branched alkyl group having 1 to 7 carbon atoms;
X is Cl;
And Y is a linear or branched alkyl group having from 1 to 5 carbon atoms. The oxime ester compound according to claim 1, wherein the oxime ester compound is represented by formula (2): oxime ester compound;
(2)

. 1. A photocurable composition comprising a photocurable compound and a photopolymerization initiator, wherein the photopolymerization initiator comprises an oxime ester compound represented by the following general formula (1)
[Chemical Formula 1]

Wherein R &lt; ₁ &gt; is a C1-C12 linear or branched alkyl group;
R ₂ is a straight-chain or branched alkyl group having 1 to 12 carbon atoms;
X is any one selected from the group consisting of Cl, Br and I;
Y is hydrogen, a linear or branched alkyl group having 1 to 12 carbon atoms, a halogen atom, an amino group, or an alkoxy group having 1 to 4 carbon atoms. The method of claim 4,
R &lt; ₁ &gt; is a straight or branched alkyl group having from ₁ to 5 carbon atoms;
R ₂ is a straight or branched alkyl group having 1 to 7 carbon atoms;
X is Cl;
And Y is a straight-chain or branched alkyl group having from 1 to 5 carbon atoms. [4] The oxime ester compound according to claim 4, wherein the oxime ester compound represented by Formula 1 is a compound represented by Formula 2;
(2)

5. The photocurable composition according to claim 4, wherein the photocurable compound comprises a polymerizable compound having an ethylenic unsaturated bond. The photocurable composition according to claim 4, wherein the photopolymerization initiator is contained in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the photocurable compound. The photocurable composition of claim 4, wherein the photocurable composition further comprises a solvent.

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