KR20110131835A - Wafer processing system having linear wafer transfering apparatus - Google Patents

Abstract

PURPOSE: A substrate processing system which includes a linear substrate transfer apparatus is provided to load/unload multiple sheets of substrates to a process chamber at the same time, thereby improving productivity by reducing substrate return time. CONSTITUTION: A process chamber(300a,300b) comprises a substrate support stand in which a substrate is loaded. A transfer chamber(400) is arranged in an edge area of the process chamber. A load-lock chamber(200) respectively loads an unprocessed substrate and a processed substrate. A substrate transfer apparatus(500) loads/unloads the substrate within the process chamber while being included in the inside of the transfer chamber. The substrate transfer apparatus includes a vertical transfer rail, a support bar, and an end effecter.

Description

Substrate Processing System with Linear Substrate Transfer System {WAFER PROCESSING SYSTEM HAVING LINEAR WAFER TRANSFERING APPARATUS}

The present invention relates to a substrate processing system, and more particularly, to a substrate processing system that can linearly move and load / unload a plurality of substrates into a process chamber at the same time, thereby saving substrate transport time and improving productivity. .

BACKGROUND Recently, substrate processing systems for manufacturing liquid crystal display devices, plasma display devices, and semiconductor devices are provided to process a plurality of substrates consistently.

1 is a schematic diagram showing a substrate exchange process of a conventional substrate processing system 1.

As shown in the drawing, a substrate processing system 1 includes a process chamber 2 having a plurality of substrate supports 3 on which a substrate is processed, and a substrate transfer robot 5 for transferring a substrate into the process chamber 2. It includes a transfer chamber (4) provided. In the conventional substrate transfer robot 5, the end effector 6 loads / unloads the substrate into the substrate support 3 while the transfer arm is rotated about the rotation shaft 7.

However, since the substrate transfer robot 5 transfers the substrate while the transfer arm rotates, the design constraint that the substrate support 3 is disposed circumferentially along the rotation radius R of the transfer arm is limited in the process chamber 2. there was.

In addition, when the substrate support 3 is disposed in the process chamber 2 as described above, the dead space 8 in which the substrate support 3 is not disposed is increased compared to the overall size of the process chamber 2 so that the space is efficiently saved. There was a problem that could not be utilized.

SUMMARY OF THE INVENTION An object of the present invention is to provide a substrate processing system in which a substrate transfer apparatus linearly moves inside a transfer chamber to reduce transfer time of a substrate and at the same time solve space design constraints.

One aspect of the present invention for achieving the above technical problem relates to a substrate processing system. The substrate processing system of the present invention includes at least one process chamber including a plurality of substrate supports on which a substrate is loaded; A transfer chamber in which the process chamber is disposed in an edge region; A load lock chamber connected to the transfer chamber and to which an untreated substrate and a substrate are respectively loaded; A substrate transfer apparatus provided in the transfer chamber to load / unload a substrate into the process chamber, wherein the substrate transfer apparatus linearly moves the substrate in the transfer chamber and simultaneously moves the substrate to the plurality of substrate supports. It is characterized in that the loading / unloading.

According to one embodiment, the substrate transfer device, a vertical transfer rail formed on both side walls of the transfer chamber; A support bar which is linearly moved along the longitudinal feed rail; Coupled to the support bar at different heights and aligned in the same position, respectively moving along the support bar to correspond to the initial position for loading / unloading the substrate from the load lock chamber and the position of the plurality of substrate supports. A plurality of end effectors provided to be movable between the transferred positions; The plurality of end effectors are moved from the initial position along the support bar to the transfer position, and the support bars are moved to the process chamber along the longitudinal transfer rail so that the plurality of end effectors load / submit a substrate on the substrate support. It includes a drive for unloading.

According to an embodiment, the substrate transfer apparatus includes a loading unit for loading an unprocessed substrate into the plurality of substrate supports, and an unloading unit for unloading a substrate from the plurality of substrate supports. The unloading portions are vertically disposed vertically and move linearly together in the transfer chamber.

According to one embodiment, the end of the end effector is provided with a coupling ring which is movably coupled on the support, the plurality of end effectors are arranged differently from each other in the position of the coupling ring in the line from the initial position There is no mutual interference during alignment.

According to one embodiment, the drive unit, and the vertical drive unit for linearly moving the support along the longitudinal transfer rail; A plurality of end effector includes a horizontal driving unit for moving along the support, wherein the vertical driving unit and the horizontal driving unit is driven by a magnetic force.

In the substrate processing system according to the present invention, since the substrate transfer apparatus linearly moves the inside of the transfer chamber along the guide rail and loads / unloads the substrate, a plurality of substrate supports in the process chamber may be arranged in a straight line. As a result, when the area of the process chamber is the same, more substrate supports can be disposed as compared with the case in which the substrate is disposed in the radial direction of the conventional substrate transfer device, thereby allowing the space to be efficiently disposed and increasing the substrate yield.

In addition, since the plurality of end effectors simultaneously move along the guide rail in the horizontal direction and the vertical direction, the transfer time is short and the substrate exchange time can be significantly reduced.

1 is a schematic view showing a substrate exchange process of a conventional substrate processing system,
Figure 2 is a schematic diagram showing the configuration of the standby position during the substrate exchange process of the substrate processing system according to the present invention,
Figure 3 is a schematic diagram showing the configuration of the alignment position during the substrate exchange process of the substrate processing system according to the present invention,
Figure 4 is a schematic diagram showing the configuration of the exchange position during the substrate exchange process of the substrate processing system according to the present invention,
5 is a perspective view showing the configuration of a substrate transfer apparatus of a substrate processing system according to the present invention;
6 is a side view showing a side configuration of a substrate transfer apparatus of the substrate processing system according to the present invention;
7 is a schematic diagram schematically showing the configuration of a drive unit of the substrate transfer apparatus of the substrate processing system according to the present invention;
8A to 8D are schematic views showing a substrate exchange process of the substrate transfer apparatus of the substrate processing system according to the present invention;
9A and 9B are exemplary views showing embodiments of the longitudinal transfer rail of the substrate transfer apparatus of the substrate processing system according to the present invention;
10A and 10B are exemplary views showing embodiments of a process chamber of a substrate processing system according to the present invention.

In order to fully understand the present invention, preferred embodiments of the present invention will be described with reference to the accompanying drawings. Embodiment of the present invention may be modified in various forms, the scope of the invention should not be construed as limited to the embodiments described in detail below. This embodiment is provided to more completely explain the present invention to those skilled in the art. Therefore, the shape of the elements in the drawings and the like may be exaggerated to emphasize a more clear description. It should be noted that the same members in each drawing are sometimes shown with the same reference numerals. Detailed descriptions of well-known functions and configurations that are determined to unnecessarily obscure the subject matter of the present invention are omitted.

2 to 4 are schematic diagrams showing a substrate exchange process of the substrate processing system 10 according to the present invention.

The substrate processing system 10 according to the preferred embodiment of the present invention includes a first process chamber 300a and a second process chamber 300b provided with a plurality of substrate supports 310a, 310b, 310c up and down, and The transfer chamber 400 is disposed therebetween. The transfer chamber 400 includes a transfer chamber 400 that linearly moves and includes a substrate transfer apparatus 500 for loading / unloading a substrate into the process chambers 300a and 300b.

An index 100 on which the carrier 110 is mounted is provided in front of the substrate processing system 10, and a load lock chamber 200 is provided between the index 100 and the transfer chamber 400. The load lock chamber 200 may be provided with a cooling chamber 220 for cooling the substrate after processing as needed. When preheating of the substrates proceeding to the first and second process chambers 300a and 300b is required, a separate preheating chamber (not shown) may be provided.

Index 100 is also referred to as an equipment front end module (EFEM) and can sometimes be defined encompassing a load lock chamber. The index 100 includes a mounting table (also called a load port) installed in the front part, and on the mounting table accommodates a plurality of wafers W (for example, 24 sheets) at predetermined intervals (for example, 11 mm pitch). One carrier (also referred to as a storage container or cassette) 110 is loaded. The carrier 110 is a hermetically sealed container provided with the removable cover which is not shown in the front surface.

A first substrate entrance (not shown) is opened between the transfer chamber 400 and the first and second process chambers 300a and 300b, and a second substrate entrance (between the transfer chamber 400 and the load lock chamber 200). Not shown). The first and second substrate entrances (not shown) are respectively opened and closed by slit valves (not shown) or other valve drive mechanisms.

The load lock chamber 200 is provided with an atmospheric pressure transport robot 210 operated at atmospheric pressure. Atmospheric pressure transfer robot 210 is responsible for the substrate transfer between the transfer chamber 400 and the carrier 110, it is possible to rotate, lift and lower. Atmospheric pressure conveying robot 210 is changed in length as the transfer arms (211,213) are mutually folded, the substrate adsorption arm 215 is coupled to the end of the transfer arm 213 is loaded with a substrate transfer device 500 The substrates are exchanged with the parts 510a and 510b and the unloading part 520.

The atmospheric transfer robot 210 according to the preferred embodiment of the present invention carries out six substrates W in one operation to bring the substrates into the loading units 510a and 510b, and six substrates from the unloading unit 520. It is provided to bring in. To this end, the atmospheric transfer robot 210 is provided in the form of a double arm, the six transfer arms are arranged in a stack up and down on the basis of the rotation axis.

The first process chamber 300a and the second process chamber 300b are disposed in a straight line above and below the transfer chamber 400. A plurality of substrate supports 310a, 310b and 310c are disposed in a straight line in each of the first process chamber 300a and the second process chamber 300b. The substrate support 310a, 310b, 310c is provided with a plurality of lift pins 311 for supporting the substrate.

Process chambers 300a and 300b according to a preferred embodiment of the present invention have been described as having three substrate supports, but in some cases, three or more substrate supports may be provided.

Here, the first and second process chambers 300a and 300b may be configured to perform various substrate processing operations. For example, it can be an ashing chamber that removes photoresist, a chemical vapor deposition (CVD) chamber configured to deposit an insulating film, and apertures or openings in the insulating film to form interconnect structures. An etch chamber configured to etch them. Or a PVD chamber configured to deposit a barrier film, and may be a PVD chamber configured to deposit a metal film.

The substrate transfer apparatus 500 of the substrate processing system 10 according to the present invention includes a plurality of substrate supports 310a, 310b, 310c linearly moving inside the transfer chamber 400 as shown in FIGS. 2 to 4. Transfer the substrates simultaneously.

5 is a perspective view showing the structure of the substrate transfer apparatus 500. As shown in the drawing, the substrate transfer apparatus 500 is disposed in the lower portions of the loading parts 510a and 510b for loading the substrate into the process chambers 300a and 300b and the lower parts of the loading parts 510a and 510b. 300b) an unloading part 520 for unloading the substrate therein, and a driving part 530 for driving the loading parts 510a and 510b and the unloading part 520.

The loading units 510a and 510b and the unloading units 520 are respectively disposed on both sides of the transfer chamber 400 to load / unload the substrate into the first process chamber 300a and the second process chamber 300b.

Here, since the configuration of the first loading part 510a, the second loading part 510b, the first unloading part 520 and the second unloading part (not shown) are the same, the first loading part 510a and the first loading part 510a are not the same. Only the configuration of the first unloading unit 520 will be described in detail.

In addition, only the positions in which the first loading part 510a and the first unloading part 520 are arranged up and down are different, and thus the configuration is the same. Therefore, only the configuration of the first loading part 510a will be described in detail.

The first loading part 510a includes a loading support bar 511 to which a plurality of loading end effectors 515, 517 and 519 are coupled, and a loading support bar 511 on both side walls of the transfer chamber 400 to process the process chamber 300a. Loading longitudinal transfer rail 512 to guide to, 300b, a loading transverse rail 513 coupled to the loading support bar 511 to support a plurality of loading end effectors (515, 517, 519), and the loading transverse rail (513) A plurality of loading end effectors 515, 517, 519 movably coupled to the < RTI ID = 0.0 >

The loading support bar 511 supports both sides of the loading transverse rail 513 to which the loading end effectors 515, 517, 519 are coupled so that the loading end effectors 515, 517, 519 exchange the substrate with the atmospheric transfer robot 210 (FIG. Position) and the loading end effectors 515, 517, 519 enter the process chambers 300a, 300b to move between the substrate supports 310a, 310b, 310c and the exchange position (position in FIG. 4) to exchange the substrate. do.

Both ends of the loading support bar 511 are coupled on the loading longitudinal transfer rail 512, and move along the loading longitudinal transfer rail 512 by driving control of the longitudinal driving unit 530. Both sides of the loading support bar 511 is provided with a longitudinal rail coupling portion 511a coupled to the loading longitudinal transport rail 512.

The loading support bar 511 is perpendicular to the vertical rail coupling portion 511a so that the loading end effectors 515, 517, 519 coupled to the loading transverse rail 513 can be inserted into the process chambers 300a, 300b at the exchange position. It is bent and formed. Accordingly, the loading support bar 511 is provided spaced apart from the loading longitudinal transfer rail 512 by a predetermined interval, it can be inserted into the process chamber (300a, 300b) in the exchange position.

The loading longitudinal transfer rail 512 is coupled to both chamber walls 410 of the transfer chamber 400 to guide the loading support bar 511 to move to the standby position and the exchange position. The loading longitudinal transfer rail 512 is designed to allow the loading support bar 511 of the exchange position to be inserted into the process chambers 300a and 300b in consideration of the length of the loading support bar 511.

Both ends of the loading transverse rail 513 are fixedly coupled to a pair of loading support bars 511 and support the plurality of loading end effectors 515, 517, 519 to move left and right. The loading transverse rail 513 has a plurality of loading end effectors 515, 517, 519 aligned in a row for substrate exchange in the standby position shown in FIG. 2, or as shown in FIG. Supported to be moved to the alignment position to correspond to the position of 310c).

That is, in the loading transverse rail 513, the first loading end effector 515, the second loading end effector 517, and the third loading end effector 519 move from side to side and are the same as shown in FIG. 2. Positioned in a straight line in position, or as shown in Fig. 3, each loading end effector 515, 517, 519 is supported to be moved to an alignment position coaxially arranged with the substrate supports 310a, 310b, 310c to exchange the substrate. .

The first loading end effector 515, the second loading end effector 517, and the third loading end effector 519 move linearly along the loading transverse rail 513 and the load lock chamber 200 and the process chamber. The substrate is exchanged between 300a and 300b. At each end of the first loading end effector 515, the second loading end effector 517, and the third loading end effector 519, respective loading rail coupling rings 515a and 517a are coupled to the loading transverse rail 513. , 519a). The loading rail coupling rings 515a, 517a, 519a are driven and controlled by the horizontal driving unit 540 so that the first loading end effector 515, the second loading end effector 517, and the third loading end effector 519 are loaded. It may move along the transverse rail 513.

Each of the loading end effectors 515, 517, 519 is provided in a fork shape in which two plates are adjacently coupled to each other so that a substrate may be loaded on the upper surface. At this time, the shape of the loading end effectors 515, 517, 519 is replaced by considering the shape of the substrate adsorption arm 215 of the atmospheric transfer robot 210 and the arrangement of the lift pins 311 of the substrate supports 310a, 310b, 310c. It is provided so that mutual interference does not occur.

In the loading end effectors 515, 517, 519 according to the preferred embodiment of the present invention, the substrate adsorption arm 215 is inserted into the groove between the two plates, and three lift pins 311 are disposed outside the two plates to interfere with each other. It is designed not to occur.

The first loading end effector 515, the second loading end effector 517, and the third loading end effector 519 are aligned in a straight line from the standby position to the same position as shown in FIG. Take over from the substrate. At this time, the first loading end effector 515, the second loading end effector 517 and the third loading end effector 519 are provided at different heights as shown in Figure 6 to avoid mutual interference when the substrate is taken over. do.

The loading unit 510a according to the preferred embodiment of the present invention has the first loading end effector 515 at the lowest height, and the second loading end effector 517 has a first loading end effector 515 compared to the first loading end effector 515. It is provided as high as one height (h1), the third loading end effector 519 is provided as high as the second height (h2) compared to the first loading end effector (515).

To this end, the first loading rail coupling ring 515a, the second loading rail coupling ring 517a and the third loading rail coupling ring 519a are provided to be coupled at different heights on the loading transverse rail 513. That is, as shown in FIG. 5, the second loading rail coupling ring 517a is provided horizontally with the loading transverse rail 513, and the first loading rail coupling ring 515a is connected to the loading transverse rail 513. Compared to the lower region is provided to be bent, the third loading rail coupling ring 519a is provided to be bent into the upper region compared to the loading transverse rail 513.

The first loading end effector 515 and the second loading end effector 517 are formed by the shapes of the first loading rail coupling ring 515a, the second loading rail coupling ring 517a, and the third loading rail coupling ring 519a. ) And the third loading end effector 519 may freely move on the loading transverse rail 513 without being interfered with each other.

On the other hand, the first loading rail coupling ring 515a, the second loading rail coupling ring 517a and the third loading rail coupling ring 519a are the first loading end effector 515, the second loading end effector ( 517 and the third loading end effector 519 are disposed at different positions to be aligned in a line. That is, as shown in FIG. 5, the first loading rail coupling ring 515a is located inside the first loading end effector 515, and the second loading rail coupling ring 517a is the second loading end effector 517. The third loading rail coupling ring 519a is located outside the third loading end effector 519. As a result, since the positions of the three loading rail coupling rings 515a, 517a and 519a are arranged adjacent to each other, the three loading end effectors 515, 517 and 519 may be disposed in a straight line.

The first loading end effector 515, the second loading end effector 517, and the third loading end effector 519 move from the standby position to the alignment position, respectively, as shown in FIG. 3. The third loading end effector 519 moves to be disposed in a straight line with the third substrate support 310c, and the second loading end effector 517 moves to be disposed in a straight line with the second substrate support 310b. The first loading end effector 515 moves to be disposed in a straight line with the first substrate support 310a.

In this case, since the moving distances of the respective loading end effectors 515, 517, 519 are different, the horizontal driving unit 540 may control the feeding speeds of the loading end effectors 515, 517, 519 differently.

As illustrated in FIGS. 5 and 6, the first unloading unit 520 is disposed at a predetermined height lower in the lower region of the first loading unit 510a. The first unloading unit 520 supports the three unloading end effectors 525, 527, and 529 to be moved to the standby position, the alignment position, and the exchange position. The first unloading unit 520 is moved together with the first loading unit 510a and exchanges a substrate between the first process chamber 300a and the load lock chamber 200. Since the configuration of the first unloading unit 520 is the same as that of the first loading unit 510a, a detailed description thereof will be omitted.

The driving units 530 and 540 control the first loading unit 510a and the first unloading unit 520 to be linearly moved along the horizontal conveying rail 513 and the vertical conveying rail 512. The driving units 530 and 540 are provided to minimize dust and particle generation since the first loading unit 510a and the first unloading unit 520 move in the vacuum transfer chamber 400.

To this end, the driving units 530 and 540 drive the first loading unit 510a and the first unloading unit 520 by a magnetic gear method.

7 is a schematic diagram schematically showing the configuration of the driving units 530 and 540. As the driving method of the driving unit 530 is the same as the first loading unit 510a and the first unloading unit 520, the first loading unit 510a will be described as an example. The driving unit 530 may include a vertical driving unit 530 for driving the longitudinal direction to move the loading support bar 511 along the loading longitudinal conveying rail 512, and a plurality of loading end effectors along the loading transverse conveying rail 513. It includes a horizontal drive unit 540 for driving the horizontal transfer so that the (515, 517, 519) is moved.

The first coupling magnet 511b is provided at the vertical rail coupling portion 511a of the loading support bar 511 for the magnetic driving method. The first coupling magnet 511b is provided in an annular shape in a coupling area with the loading longitudinal transfer rail 512. In addition, second coupling magnets 515b, 517b and 519b are provided inside the loading rail coupling rings 515a, 517a and 519a of the respective loading end effectors 515, 517 and 519a.

The vertical driving part 530 is disposed in the opposite polarity with the vertical driving motor 531 and the first coupling magnet 511b which generates the driving force, and the first driving magnet is moved along the vertical driving rail 534. 535 and a connecting shaft 533 for connecting the vertical drive motor 531 and the first coupling magnet 535.

The vertical driving unit 530 is provided in the form of an LM guide so that the first driving magnet 535 is moved along the vertical driving rail 534 by the driving force of the vertical driving motor 531. When the first driving magnet 535 moves, the first coupling magnet 511b is moved in the moving direction of the first driving magnet 535 by the magnetic force, and the loading support bar 511 moves along the loading longitudinal transfer rail 512. Done.

The horizontal driving unit 540 is disposed in the opposite polarity with the horizontal driving motor 541 and the second coupling magnets 515b, 517b, and 519b so that mutual attraction is applied and moved along the horizontal driving rail 544. It includes a two driving magnets 545, the horizontal drive motor 541 and the connecting shaft 543 for interconnecting the plurality of second driving magnets (545).

The horizontal driving unit 540 is also provided in the form of an LM guide so that the second driving magnet 545 is moved along the horizontal driving rail 544 by the driving force of the horizontal driving motor 541. When the plurality of second driving magnets 545 moves, the loading end effectors 515, 517, 519b having the second coupling magnets 515b, 517b, 519b move along the loading transverse rail 513.

In this case, one horizontal driving motor 541 may be provided to drive the plurality of second driving magnets 545 together, or may be separately provided to drive the plurality of second driving magnets 545.

The controller 550 controls the vertical driver 530 and the horizontal driver 540 so that the plurality of loading end effectors 515, 517, 519 exchanges the substrate between the load lock chamber 200 and the process chamber 300a.

The controller 550 controls the horizontal drive unit 540 such that the plurality of aligned end-loading end effectors 515, 517, 519 aligned with each other in the standby position (state of FIG. 2) are moved to the alignment position (state of FIG. 3). When the loading end effectors 515, 517, 519 are moved to the alignment position by the horizontal driving unit 540, the loading support bar 511 is moved to the process chambers 300a and 300b by controlling the vertical driving unit 530 so that the loading end effector is moved. (515, 517, 519) are arranged in the exchange position (state of FIG. 4).

A substrate exchange process of the substrate processing system 10 according to the present invention having such a configuration will be described with reference to FIGS. 2 to 4 and 8A to 8D.

First, as shown in FIG. 2, the substrate transfer device 500 is moved to a standby position to exchange a substrate with the load lock chamber 200. At this time, the first loading part 510a, the second loading part 510b, the second unloading part 520 and the second loading part (not shown) are arranged to cross each other. For example, the three loading end effectors of the first loading unit 510a and the three loading end effectors of the second loading unit 510b are arranged to be alternately arranged in a row on the same axis. Accordingly, the atmospheric transfer robot 210 can load and unload six substrates at a time.

Atmospheric pressure transport robot 210, the loading unit 510a, 510b and the unloading unit 520 is completed, the loading end effectors (515, 517, 519) and the unloading end effectors (515, 517, 519) as shown in Figure 3 The transfer rails 513 and the unloading horizontal transfer rails 523 are moved to alignment positions, respectively.

When the movement to the alignment position is completed, the loading support bar 511 and the unloading support bar 521 are moved to the exchange position along the loading longitudinal transfer rail 512 and the unloading longitudinal transfer rail 522.

8A to 8D are schematic diagrams illustrating a substrate exchange process between the second loading end effector 517 and the second unloading end effector 527.

 As shown in Fig. 8A, the second loading end effector 517 and the second unloading end effector 527 are moved together from the alignment position to the exchange position shown in Fig. 8B and placed on the second substrate support 310b. do. At this time, the lift pin 311 of the second substrate support 310b is raised by the height l1 of the second unloading end effector 527 so that the substrate W1 is second unloaded end effector 527. It is seated on the phase.

When the substrate W1 is loaded, the second unloading end effector 527 is first moved to the alignment position as shown in Fig. 8C, and the second loading end effector 517 maintains the exchange position. At this time, the lift pin 311 is further raised to the height l2 of the second loading end effector 517 to take over the unprocessed substrate W2 from the second loading end effector 517.

The second loading end effector 517 taking over the unprocessed substrate W2 moves to the alignment position, the lift pin 311 descends, and the unprocessed substrate W2 is loaded on the substrate support 310b.

The second loading end effector 517 and the second unloading end effector 527 moved to the alignment position move to the standby position again to exchange the substrate with the atmospheric pressure transport robot 210.

Meanwhile, the first loading end effector 515, the second loading end effector 517, and the third loading end effector 519 are provided with different heights as described above. Accordingly, the substrate supports 310a, 310b, 310c and the substrate must be compensated for the different heights.

To this end, as shown in Figure 9a, the height of the substrate support (310a, 310b, 310c) and the lift pins 311 are the same, and the height of the horizontal loading rail 560 loading step to compensate for the height Can be. That is, the height of the horizontal conveyance rail 560 is formed to be stepped low by the first height difference h1 between the second loading end effector 517 and the first loading end effector 515 at the alignment position, and the third loading. The height of the transverse conveyance rail 560 is stepped by the second height h2 between the end effector 519 and the second loading end effector 517.

As a result, the first loading end effector 515, the second loading end effector 517, and the third loading end effector 519 are disposed at the same height as each other so that the respective substrate supports 310a, 310b, and 310c are aligned. It is possible to exchange the substrate smoothly.

At this time, the stepped region 561 of the loading transverse rail 560 is preferably provided to be gently inclined so that the loading rail coupling rings (515a, 517a, 519a) can be moved smoothly.

In addition, as shown in FIG. 9B, the entire loading transverse rail 570 may be inclined to compensate for the height.

Meanwhile, in order to compensate for different heights between the substrate supports 310a, 310b, 310c and the loading end effectors 515, 517, 519 when the substrate is exchanged, as shown in FIG. 10A, the substrate supports 310a, 310b, 310c) can be arranged stepped with each other. That is, the second substrate support 310b is disposed higher by the first height h1 than the first substrate support 310a, and the third substrate support 310c is second than the first substrate support 310a. It can arrange | position as high as height difference h2.

In addition, as shown in FIG. 10B, the heights of the three substrate supports 310a, 310b, and 310c are the same, and the lifting heights of the lift pins 311 of each of the substrate supports 310a, 310b, and 310c are adjusted for each loading end effector. The height may be compensated by controlling differently corresponding to the height of 515, 517, 519.

As described above, in the substrate processing system according to the present invention, since the substrate transfer apparatus linearly moves the inside of the transfer chamber along the guide rail and loads / unloads the substrate, a plurality of substrate supports in the process chamber are arranged in a straight line. Can be. As a result, when the area of the process chamber is the same, more substrate supports can be disposed as compared with the case in which the substrate is disposed in the radial direction of the conventional substrate transfer device, thereby allowing the space to be efficiently disposed and increasing the substrate yield.

In addition, since the plurality of end effectors simultaneously move along the guide rail in the horizontal direction and the vertical direction, the transfer time is short and the substrate exchange time can be significantly reduced.

Embodiment of the substrate processing system of the present invention described above is merely illustrative, and those skilled in the art to which the present invention pertains that various modifications and equivalent other embodiments are possible from this. Could be. Therefore, it will be understood that the present invention is not limited to the forms mentioned in the above detailed description. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims. It is also to be understood that the invention includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention as defined by the appended claims.

10: substrate processing system 100: index
110 carrier 200 load lock chamber
210: atmospheric transfer robot 211: first transfer arm
213: second transfer arm 215: substrate adsorption arm
220: cooling part 300a, 300b: process chamber
310a, 310b, 310c: substrate support 311: lift pin
400: transfer chamber 410: chamber wall
500: substrate transfer device 510a, 510b: loading unit
511: loading support bar 511a: longitudinal rail coupling portion
511b: first coupling magnet 512: loading longitudinal feed rail
513: horizontal loading rail 515: the first loading end effector
515a: first loading rail coupling ring 515b: second coupling magnet
517: second loading end effector 517a: second loading rail coupling ring
519: third loading end effector 519a: third loading rail coupling ring
520a, 520b: unloading unit 521: unloading support bar
521a: longitudinal rail coupling portion 521b: coupling magnet
522: vertical unloading rail 523: horizontal unloading rail
525: first unloading end effector 525a: first unloading rail coupling ring
527: second unloading end effector 527a: second unloading rail coupling ring
529: third unloading end effector 529a: third unloading rail coupling ring
530: vertical drive unit 531: vertical drive motor
533: driving magnet 534: vertical driving rail
535: vertical drive magnet 540: horizontal drive unit
541: horizontal drive motor 543: horizontal drive rail
545: horizontal driving magnet 550: control unit

Claims (5)

At least one process chamber including a plurality of substrate supports on which a substrate is loaded;
A transfer chamber in which the process chamber is disposed in an edge region;
A load lock chamber connected to the transfer chamber and to which an untreated substrate and a substrate are respectively loaded;
A substrate transfer apparatus provided in the transfer chamber to load / unload a substrate into the process chamber,
The substrate transfer device,
And linearly moving the substrate in the transfer chamber and simultaneously loading / unloading substrates into the plurality of substrate supports. The method of claim 1,
The substrate transfer device,
Longitudinal conveying rails formed on both side walls of the conveying chamber;
A support bar which is linearly moved along the longitudinal feed rail;
Coupled to the support bar at different heights and aligned in the same position, respectively moving along the support bar to correspond to the initial position for loading / unloading the substrate from the load lock chamber and the position of the plurality of substrate supports. A plurality of end effectors provided to be movable between the transferred positions;
The plurality of end effectors are moved from the initial position along the support bar to the transfer position, and the support bars are moved to the process chamber along the longitudinal transfer rail so that the plurality of end effectors load / submit a substrate on the substrate support. A substrate processing system comprising a driver for unloading. The method of claim 2,
The substrate transfer device,
A loading unit for loading an unprocessed substrate into the plurality of substrate supports, and an unloading unit for unloading a substrate from the plurality of substrate supports,
And the loading portion and the unloading portion are vertically disposed vertically and moved linearly together in the transfer chamber. 4. The method according to any one of claims 1 to 3,
The end of the end effector is provided with a coupling ring that is movably coupled to the support,
The plurality of end effectors are disposed in the position of the coupling ring different from each other substrate processing system, characterized in that mutual interference does not occur when aligned in a row in the initial position. The method of claim 2,
The driving unit,
A vertical driving part for linearly transferring the support along the vertical conveying rail;
It includes a horizontal drive unit for moving the plurality of end effectors along the support,
And the vertical driving part and the horizontal driving part are driven by a magnetic force.

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