KR20110130237A - Imprint apparatus and imprint method using it - Google Patents

Abstract

PURPOSE: An imprint device and an imprint method using the same are provided to form uniform patterns on a substrate by pushing a stamp physically adhered to the substrate using the pressing force of gas. CONSTITUTION: An imprint device(1000) comprises a support unit(100) and a template unit(300). A substrate is placed on the support unit. The support unit moves the substrate. The template unit vacuum-sucks a stamp having patterns and supports the stamp. The template unit pushes the stamp by jetting gas to one surface of the stamp so that the other surface of the stamp can be uniformly pressed on the substrate.

Description

Imprint apparatus and imprint method using it

The present invention relates to an imprint apparatus and an imprint method using the same. In particular, the present invention relates to an imprint apparatus capable of uniformly forming a nano pattern on an object to be processed and an imprint method using the same.

In general, lithography is a technique of photographing a pattern to be formed on the surface of a target such as a semiconductor chip or a substrate with light, and fixing the photosensitive resin to the surface of the target by chemical treatment or diffusion treatment. it means. Lithography uses visible light, ultraviolet rays, electron beams (E-beams), etc., and the use of light having a short wavelength has the advantage of forming a fine pattern.

As described above, the conventional lithography technique using the optical exposure method has a problem in that it is difficult to uniformly form a pattern having a line width of 100 nm or less on the target object due to the diffraction and refraction characteristics of the light. Recently, in order to solve this problem, an imprint or an imprint lithography technique, which is a method of forming a non-exposure pattern, has been attracting attention.

Imprint technology is a technique of directly transferring a pattern of a mold or a stamp to a workpiece by a press method, and has an advantage of easily forming a complicated step on the workpiece. This imprint technique is divided into two types, one of which is hot embossing or thermal imprint lithography, which heats a polymer layer on a workpiece to make it fluid and then touches a patterned mold. And physically press to transfer the pattern to the polymer layer. The other method is light assisted imprint lithography, in which a low viscosity curable resin (or curable resin) is coated on a substrate, and the pattern is After the mold is in contact with the resin, a pattern is transferred by curing the resin by irradiating light such as ultraviolet rays. Imprint technology using light among the two types of imprint techniques described above is advantageous over the thermal transfer method requiring high pressure and high heat because the pattern can be formed even at low pressure, and is particularly advantageous for patterning at the nano scale.

However, in the process of forming a pattern on a target object using a photoimprint technique, it is difficult to manufacture a mold or a stamp that is physically in contact with the target object in a large area corresponding to the size of the target object when the target object is large. There was this. That is, in the case of a small-area to be processed, it is easy to manufacture through an E-beam writing and dry etching process, but in the case of a large-area to be processed, there is a limitation in manufacturing by a conventional method. .

In addition, the conventional method is difficult to form a pattern uniformly, there is a problem in that the manufacturing cost of the mold is excessively required, which increases the manufacturing cost of the imprint apparatus.

On the other hand, when a pattern is formed on a large-area workpiece by repeating the pressing process by using a small-area mold having a relatively small size compared to that of the large-area workpiece, the small-area area is repeated in the repeated pressing process. There was a problem that the mold is difficult to uniformly adhere to the workpiece.

The present invention provides an imprint apparatus capable of forming a uniform pattern on an object to be processed and an imprint method using the same.

In addition, the present invention provides an imprint apparatus and an imprint method using the same, which can form a uniform pattern by pushing a stamp that is physically in close contact with the workpiece with a pressing force of gas.

In addition, the present invention provides an imprint apparatus and an imprint method using the same which can form a uniform pattern on a large-area to-be-processed object by repeatedly contacting a small-area stamp to a large-area to-be-processed object.

An imprint apparatus according to an embodiment of the present invention includes a support unit for seating and moving a target object, and vacuum-adsorbing and supporting a stamp having a pattern formed on one surface thereof, so that one surface of the stamp is uniformly pressed against the target object. And a template unit which sprays and pushes gas onto the other surface of the stamp.

The imprint apparatus includes a resist supply unit for providing a curable resin to the object to be processed and a curing unit for curing the curable resin by irradiating light to the object to which the stamp is in close contact, the support unit, the template unit, And a control unit for cooperatively controlling the driving of the resist supply unit and the curing unit.

In addition, the imprinting method according to an embodiment of the present invention comprises the steps of vacuum-adsorbing a stamp having a pattern, positioning the object to be moved to be close to the stamp, and by spraying gas on the stamp, the stamp is And pressurizing to be in close contact with the object.

According to the imprint apparatus and the imprint method using the same according to the embodiments of the present invention, even if the size of a target object such as a substrate becomes large, a nanoscale pattern may be uniformly formed on the target object. That is, by pressing the stamp of a small area repeatedly contacted by varying the position on the surface of the object to be horizontally applied by the pressure of the gas can be uniformly formed nano-pattern pattern on the object.

Therefore, the pattern formation cost of the large-area to-be-processed object can be reduced and manufacturing cost of an imprint apparatus can be reduced. In addition, as the pattern formation of the large-area target object is easy, and the defective rate of the pattern is reduced, the productivity of the pattern processing process may be improved.

1 is a perspective view of an imprint apparatus according to an embodiment of the present invention.
FIG. 2 is an enlarged view of a portion A shown in FIG. 1. FIG.
FIG. 3 is a partial side view of the imprint apparatus shown in FIG. 1. FIG.
4 is a perspective view of a template unit according to the present invention;
5 is an internal configuration diagram of a template unit according to the present invention.
6 is a cutaway view taken along line BB ′ shown in FIG. 4.
7 is a driving state diagram of an imprint apparatus according to the present invention.
8 is a displacement experiment by the gas pressing force of the stamp according to the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. It should be understood, however, that the invention is not limited to the disclosed embodiments, but may be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, To provide a complete description of the category. Wherein like reference numerals refer to like elements throughout.

1 is a perspective view of an imprint apparatus according to an embodiment of the present invention, FIG. 2 is an enlarged view of a portion A shown in FIG. 1, and FIG. 3 is a partial side view of the imprint apparatus shown in FIG. 1. 4 is a perspective view of a template unit according to the present invention, FIG. 5 is an internal configuration diagram of the template unit according to the present invention, and FIG. 6 is a cutting state diagram according to the line BB ′ shown in FIG. 4. 7 is a driving state diagram of the imprint apparatus according to the present invention, Figure 8 is a displacement experiment by the gas pressing force of the stamp according to the present invention.

1 to 8, an imprint apparatus 1000 according to an embodiment of the present invention includes a support unit 100 for positioning and moving a substrate 10 as an object to be processed, and a substrate ( A resist supply unit (200) for providing the curable resin (20) to 10), and a stamp (310) of a small area in which a pattern is formed on one surface thereof by vacuum adsorption to support the stamp (310). Light L toward a template unit 300 and a substrate 10 which spray and push a gas G (see FIG. 6) to the other surface of the stamp 310 so that one surface is uniformly in contact with the curable resin 20. 7 (c)), and a curing unit 400 for curing the curable resin 20.

In addition, the imprint apparatus 1000 may include a control unit 500 that controls the driving of the support unit 100, the resist supply unit 200, the template unit 300, and the curing unit 400 in conjunction with each other. It may include a frame unit (600) for providing an installation space of these units (100 to 500).

The frame unit 600 provides an installation space on the upper surface of the substrate 10 to install the support unit 100, the resist supply unit 200, the template unit 300, and the curing unit 400 as an imprint space of the substrate 10. do. To this end, the frame unit 600 includes a shelf 610 and an auxiliary shelf 620 provided at one side of the shelf 610 to provide an installation space of the control unit 500. In the present exemplary embodiment, the frame unit 600 is formed by dividing the shelf 610 and the auxiliary shelf 620, but the frame unit 600 may be formed using an integrated shelf having the control unit 500 on one side. have.

An empty space, that is, a hollow part is formed in the inside of the shelf 610, and the power source means (not shown), various pump means (not shown), and gas (G) which receive power from the outside in the hollow part of the shelf 610. And a supply tank (not shown) such as curable resin 20 may be provided. Of course, a power supply means, a pump means, a supply tank or the like may be provided on an outer side of the shelf 610.

A plurality of movable wheels 630 are coupled to the bottom surface of the shelf 610 and the auxiliary shelf 620 to facilitate the position movement of the imprint apparatus 1000, and the bottom of the shelf 610 and the auxiliary shelf 620. A plurality of seating means 640 varying in length along the vertical direction (z direction) is coupled to the surface edge portion to stably install the imprint apparatus 1000 at an installation place in a factory without shaking. Since the seating means 540 can individually deform the upper and lower lengths, the seating means 540 can be adjusted such that the mounting surface of the imprint apparatus 1000, that is, the upper surface of the shelf 610 is horizontal to the bottom of the factory.

The upper portion of the shelf 610 may be covered with a cover means (not shown) to block the installation space from the outside. The inner side of the cover means is provided with environmental control means for adjusting the temperature, humidity and pressure of the installation space, it is possible to reduce the influence of the external temperature or humidity during the pattern forming process of the substrate 10. The cover means may be opened or closed manually or automatically by the operator, and at least one side of the cover means is provided with a transparent window through which the operator can visually check the working condition.

One side edge of the upper surface of the shelf 610 in which the various units 100 to 400 are installed, more specifically, a screen block (step) is formed at the edge of the rear surface of the imprint apparatus 1000 so that an upper surface of the shelf 610 is formed. 612 is formed to protrude. In one side of the screen block 612, the template unit 300 is positioned to be spaced apart from the top surface of the shelf 610.

The template unit 300 supports a stamp 310 or a mold having a pattern formed on one surface thereof, and once the substrate 10 seated on the support unit 100 reaches an imprint position, one surface of the stamp 310. The stamp 310 is pushed into physical contact with the substrate 10 to transfer the pattern formed thereon to the substrate 10. (In this case, the imprint position means the position of one of a plurality of positions where the stamp 310 is in close contact with the substrate 10.) In this embodiment, an 8-inch substrate was used as the large-area substrate 10, and the horizontal A stamp 310 of 25 mm in length and 25 in length was used respectively. The pattern formed on one surface of the stamp 310 is formed by an electron beam writing and dry etching process.

In the present exemplary embodiment, the template unit 300 has a pattern formed on one surface of the stamp 310 facing the substrate 10, and an insertion hole 330 into which the upper portion of the stamp 310 is partially inserted is upward and downward (z direction). A transmissive window 340 which seals the stamp chuck 320 and the open upper portion of the insertion hole 330 and penetrates the light L emitted from the curing unit 400 through the stamp 310. ) And the gas G into the pressure adjusting means 350 and the insertion hole 330 for adjusting the internal pressure of the insertion hole 330 which is sealed up and down by the transmission window 340 and the stamp 310. And a gas injection means 360 which presses the stamp 310 so as to press the stamp 310 onto the curable resin 20 provided on the substrate 10. Since the stamp 310 is partially inserted into the stamp chuck 320, one surface (lower surface) of the patterned stamp 310 protrudes downward from the lower surface of the stamp chuck 320.

On the upper surface of the stamp chuck 320 is formed a step for inserting the transmission window 340 in the extending direction of the insertion hole 330. After the transmission window 340 is inserted into the step, a ring-shaped transmission window cover 342 is coupled to prevent the transmission window 340 from being separated. Therefore, even if the pressing force of the gas G is applied to the transmission window 340, the position of the transmission window 340 is kept constant. Although not shown, an airtight means such as an O-ring is provided between the transmission window 340 and the upper surface of the stamp chuck 320 to prevent the gas G injected into the insertion hole 330 from leaking. .

The pressure regulating means 350 includes a pump means provided in the hollow part of the shelf 610, a pump nozzle 352 coupled to one side of the stamp chuck 320, a pump means or a vacuum regulator, and a vacuum nozzle 352. It includes a pump pipe 354 for connecting). In addition, the gas injection means 360 may include a gas supply tank provided in the hollow portion of the shelf 610, a gas injection nozzle (not shown) coupled to one side of the stamp chuck 320, a gas supply tank, and a gas injection nozzle. It includes a gas injection pipe (not shown) for connecting. As the gas G injected from the gas injection means 360, at least one of nitrogen (N ₂ ) gas having low chemical reactivity and an inert gas may be used.

On the upper side of the template unit 300, a light (L) from the curing unit 400 is provided to pass through the template unit 300 to reach the curable resin 20 provided on the substrate 10 ( 310 is formed of a light transmissive material. In the present embodiment, the stamp 310 and the transmission window 340 facing from the upper side of the stamp 310 are formed of a quartz material having a high light transmittance. As a material of the stamp 310 or the transmission window 340, a material having excellent light transmittance and no damage degree or deformation degree in response to pressure change may be used in addition to quartz.

As described above, the curing unit 400 includes a transmission window 340 and a stamp 310 which are respectively coupled to the upper end and the lower end of the insertion hole 330 penetrating the stamp chuck 320 up and down. The light L emitted from the surface may smoothly reach the curable resin 20 on the substrate 10 using the insertion hole 330 as an irradiation path.

Inside the stamp chuck 320 is formed a pressure adjusting passage 322 for communicating the pressure adjusting means 350 and the insertion hole 330. In addition, at least one gas injection passage 324 communicating with the gas injection means 360 and the insertion hole 330 is formed in the stamp chuck 320. That is, one end of the pressure control passage 322 is connected to the pump nozzle 352 coupled to the outer circumferential surface of the stamp chuck 320 and the other end is opened at the inner circumferential surface of the insertion hole 330. Likewise, one end of the gas injection passage 324 is connected to the gas injection nozzle coupled to the outer circumferential surface of the stamp chuck 320 and the other end is opened at the inner circumferential surface of the insertion hole 330. In the present embodiment, a plurality of gas injection passages 324 are formed along the inner circumferential surface of the insertion hole 330 at equal intervals to uniformly press the upper front surface of the stamp 310 when the gas G is injected.

The insertion hole 330 which penetrates the stamp chuck 320 up and down to form an irradiation path of light L, and forms the vacuum suction space for the stamp 310 is the light L irradiated from the curing unit 400. ) Is transmitted through the transmission window 340 and the stamp 310 to form a path that is discharged to the substrate 10, and formed to extend from the lower side of the transmission hole 332 to the outside of the stamp 310 It includes a fitting hole 334 is extended to a shape or size corresponding to the peripheral shape, the stamp 310 is partially inserted. (The size of the inner diameter r ₂ of the fitting hole 334 for the vacuum suction of the stamp 310 is formed larger than the size of the inner diameter r ₁ of the transmission hole 332. Thus, the stamp 310 is When inserted into the fitting alignment hole 334, the upper surface edge of the stamp 310 is in surface contact with the upper surface of the fitting alignment hole 334 (see Fig. 6).

The pressure regulating passage 322 and the gas injection passage 324 communicate with the permeation hole 332, and in particular, the auxiliary pressure passage 323 is stamped chuck so as to communicate with the fitting fitting hole 334 in the pressure regulating passage 322. Branches are formed through the inside of the 320.

The internal pressure of the insertion hole 330 is adjusted to a vacuum state by the pressure control passage 322, and when the inside of the insertion hole 330 is in a vacuum state, the stamp 310 partially inserted into the insertion hole 330 is vacuumed. Is adsorbed. Sealing means 328 that can be stretched and disposed at a portion where the stamp 310 and the stamp chuck 320 abut on the fitting hole 334. (In this embodiment, as the airtight means 328, the O-ring having an inner diameter size r _{3 that} is larger than the inner diameter r ₁ of the transmission hole 332 and smaller than the inner diameter r ₂ of the fitting hole 334 ( O-ring) was used.)

When the stamp 310 is partially inserted into the stamp chuck 320 and vacuum-adsorbed, the airtight means 328 such as an elastic O-ring is compressed. Subsequently, when the pressing force of the gas G having a magnitude greater than the strength of the vacuum suction force is applied to the upper surface of the stamp 310 while maintaining the vacuum suction of the stamp 310, the stamp 310 is pushed finely downward. The airtight means 328 which was compressed expands. At this time, the pressing force of the gas G is adjusted so that the gas G does not leak through the airtight means 328 so that the stamp 310 is not completely separated from the stamp chuck 320. The control unit 500 may precisely control the degree of pressurization of the stamp 310 by finely adjusting the pressing force of the gas G, and thereby the degree of physically pressing the curable resin 20 on the substrate 10. Can be adjusted in nano units. When the injection of the gas G no longer proceeds and the strength of the vacuum suction force becomes greater than the pressing force of the gas G, the stamp 310 recompresses the airtight means 328 such as an O-ring. Close to

On the other hand, a protrusion is formed on one side of the lower surface of the stamp chuck 320 to prevent separation of the stamp 310 to release the vacuum state of the insertion hole 330 or the gas G applied to the stamp 310. When the pressing force is unexpectedly large, it can be prevented that the stamp 310 is randomly separated from the stamp chuck 320 and broken.

In the present embodiment, the stamp 310 and the transmission window 340 which maintain the vacuum state of the insertion hole 330 and receive the pressing force of the gas G injected into the insertion hole 330 are formed of the gas G. It has a degree of thickness is not damage by such pressing force, in particular the thickness of the stamp (310) toward the substrate (10) (t _1), the transmission window 340, the thickness (t ₂₎ than the unexpected damage that is largely formed of Damage or contamination of the substrate 10 due to an accident can be prevented (see FIG. 6).

A support plate 380 is connected to the upper portion of the stamp chuck 320, and one side of the support plate 380 is connected to the frame unit 600. The central portion of the support plate 380 is open to confirm the open upper portion of the insertion hole 330 from the upper side of the support plate 380. Between the stamp chuck 320 and the support plate 380 is provided with a plurality of inclination adjusting means 390 that the vertical length is varied. In this embodiment, a cylinder-piston driving method is used as the inclination adjusting means 390. The cylinder is fixed to the support plate, and the end of the piston coupled to the cylinder and driven up and down reciprocally is stamp chuck ( Coupled to the top surface of 320). If the means capable of reciprocating driving with the correct length, in addition to the cylinder-piston driving method, various methods such as a motor driving method can be applied. On the other hand, in the present embodiment, a total of three inclination adjusting means 390 is used so that the angle between them on the upper surface of the stamp chuck 320 is disposed so as to have a 120 °. It is difficult to keep the stamp chuck 320 horizontal when two numbers of the tilt adjusting means 390 are used, and when the number of the tilt adjusting means 390 is 4 or more, the stamp chuck 320 is used. Inefficient to keep level. Therefore, it is preferable to arrange in a triangular shape using three inclination adjusting means 390 as in this embodiment. As such, the stamp chuck 320 may be horizontally adjusted through the plurality of inclination adjusting means 390, so that the stamp 310 that is sucked and fixed to the stamp chuck 320 may be horizontally adjusted. That is, one surface on which the pattern of the stamp 310 is formed (the lower surface of the stamp 310 facing the substrate 10) and the upper surface of the substrate 10 facing the same may be maintained in parallel. Therefore, the stamp 310, which is pushed out finely in a state horizontal to the ground without the rolling or pitching in the insertion hole 330, may be uniformly adhered to the curable resin 20 on the substrate 10.

Although not shown, one side of the tilt adjusting means 390 is provided with a tilt detection sensor means for measuring the tilt of the stamp chuck 320. Here, the inclination of the stamp chuck 320 means a degree parallel to the upper surface of the substrate 10, the upper surface of the substrate 10 has a state parallel to the ground. The inclination degree of the stamp chuck 320 measured by the inclination detecting sensor means is transmitted to the control unit 500, and the control unit 500 includes a plurality of inclinations such that the stamp chuck 320 is in a horizontal state according to the transmitted inclination degree. Each drive of the adjusting means 390 is controlled.

In the interior of the stamp chuck 310 that is horizontally maintained at the lower portion of the support plate 380 as described above, a pressure measuring sensor (not shown) for measuring the internal pressure of the insertion hole 330, and in the injection process of gas (G) A pressing force measuring sensor (not shown) for measuring the pressing force of the stamp 310 and the transmission window 340, and a pressing force for measuring the pressing force applied to the stamp 310 and the transmission window 340 by the injection of the gas G. Measurement sensor 319 is provided. The strength of the pressing force measured by the pressing force measuring sensor 319 is transmitted to the control unit 500, and the gas injection means (3) is reached and maintained by the operator so as to reach and maintain the set pressing force in comparison with the strength of the preset pressing force in the control unit 500. 360 control the driving. In this embodiment, a load cell is used as the force measurement sensor 319.

In addition, the gas pressure measuring sensor measures the internal pressure of the insertion hole 330 to determine whether the internal pressure of the insertion hole 330 is a vacuum enough to adsorb the stamp 310, and controls the measured internal pressure value. Transmit to the unit 500. The control unit 500 controls the driving of the pressure regulating means 350 by comparing the pressure value preset by the operator with the measured pressure value transmitted.

The curing unit 400 is coupled to one side of the light source means 410 and the light source means 410 for generating and irradiating light L toward the substrate 10 to adjust the imprint position of the substrate 10. The position measuring means 420 and the position changing means 430 which can change the position of the light source means 410 and the position measuring means 420 on the upper side of the template unit 300 are included. In the present embodiment, the light source means 410 used ultraviolet light as light L to cure the curable resin distributed on the substrate 10. As the position measuring means 420, an image photographing apparatus such as a camera was used. As the position changing means 430, an LM guide method is used, and the light source means 410 and the position measuring means 420 are mounted on the LM guide and are horizontally moved in one direction (x direction).

Here, the imprint position of the substrate 10 means a position where the stamp 310 is imprinted on the curable resin on the substrate 10 through an iterative pressing process. In order to manufacture a plurality of patterns at regular intervals on the large-area substrate 10, it is important to accurately position the substrate 10 below the stamp 310 before the pressing process. Before the substrate 10 reaches the correct position, the position measuring means 420 is provided above the template unit 300. The position measuring means 420 captures the position of the substrate 10 using the insertion hole 330 formed in the template unit 300 as a photographing path. The information photographed by the position measuring means 420 is transmitted to the control unit 500, and the control unit 500 controls the driving of the support unit 100 supporting the substrate 10 through the transmitted information. When the seating position of the substrate 10 is adjusted, the position measuring means 420 is pushed to one side by the driving of the position changing means 430 so that the light source means 410 is positioned at the position of the position measuring means 420 (FIG. 7 (c)).

On the other hand, curable resin 20 is supplied to substrate 10 to form a pattern. To this end, in the present embodiment, a resist supply unit 200 for dropping the curable resin 20 to the substrate 10 so that the curable resin 20 is distributed at the imprint position of the substrate 10 is provided on one side of the template unit 300. Position is fixed. In response to the driving command of the control unit 500 of the resist supply unit 200, the curable resin 20 is supplied to the substrate 10 in association with the driving of the support unit 100. Although not shown, a resin supply pipe that receives the curable resin 20 from the outside is connected to one side of the resist supply unit 200.

The support unit 100 provided on the upper surface of the shelf 610 includes a seating table 110 on which the substrate 10 is seated, a horizontal direction (x direction, y direction) parallel to the ground, and the seating table 110. It includes a seat driving means 120 for driving in the vertical direction (z direction) perpendicular to the ground. Although not shown, a vacuum suction means or the like may be provided inside the seating unit 110 to prevent shaking of the substrate 10 when the support unit 100 is driven. In addition, the seat mount driving means 120 may use a variety of driving means, including LM guide, rack-pinion gear system.

In this embodiment, before the substrate 10 is seated on the mounting table 110, the distance between the mounting table 110 and the stamp 310 is maintained at a size of about 5 mm (see Fig. 7 (a)). Subsequently, the substrate 10 is seated on the seating board 110, and the horizontal position (moving in the x and y directions) of the seating board 110 is changed by driving of the seating board driving means 120, thereby changing the board 10. When the pattern forming position on the substrate, i.e., the imprint position, lies directly below the template unit 300, the seat mounting drive unit 120 is spaced between the curable resin 20 on the substrate 10 and the stamp 310. The seating stand 110 is raised so that this space | interval is within 5 micrometers (refer FIG. 7 (b)). Subsequently, the stamp 310 is physically in close contact with the curable resin 20 on the substrate 10, and the light L of the ultraviolet light is irradiated from the light source means 410 that changes position to the position of the position measuring means 420. Curable resin 20 is cured (see Fig. 7 (c)).

The stamp 310 subjected to the pressing force of the gas G is minutely deformed by the pressing force of the gas G (see FIG. 8). In this case, the degree of displacement of the stamp 310 depends on the size of the stamp 310, the thickness (t ₁ ), the strength of the pressing force of the gas (G). In the present embodiment, the stamp 310 is uniformly pushed out by the pressing force of the gas G in the stamp chuck 320 so that the stamp 310 is brought into close contact with the curable resin 20 on the substrate 10. By adjusting the distance between the curable resin 20 and the stamp 310 on the substrate 10 to a range less than 5㎛ the deformation of the stamp 310 itself under the pressure of the gas (G) the lower surface of the stamp 310 The pattern formed in the can be transferred to the curable resin 20 on the substrate 10.

(In the experiment according to the present embodiment, when a pressing force of 6.25 kgf of nitrogen (N ₂ ) gas is applied to the stamp 310 having horizontal and vertical lengths of 25 mm, the central portion of the stamp 310 is intensively finely deformed). , The magnitude of the displacement was found to range from a minimum of -3.232㎛ to a maximum of 0.2187㎛, where minus means protruding to the lower surface of the stamp 310.)

As described above, the control unit 500 interlocks and controls the driving of the respective units 100 to 400. In this embodiment, the control unit 500 is provided on the auxiliary shelf 620, the control unit 500 is a variety of input means 510, such as a keyboard, keypad, mouse, etc. to enable the input and setting of various information by the operator And an output means 520 such as a monitor or a speaker so that the conditions, conditions, and the like of the processing process of the substrate 10 can be easily confirmed.

Hereinafter, an imprint method using the imprint apparatus according to the above-described embodiment of the present invention will be described.

The imprinting method according to an embodiment of the present invention comprises the steps of vacuum-adsorbing a stamp having a pattern formed on one surface, placing a large-area substrate as a workpiece, and moving the stamp to a position close to the stamp, and applying a gas to the other surface of the stamp. And spraying to press the stamp to be in close contact with the object to be processed.

The stamp is vacuum-adsorbed in the lower portion of the insertion hole formed in the stamp chuck, and for this purpose, the open upper portion of the insertion hole is closed by a transmission window having a high light transmittance. In the step of bringing the large area substrate close to the stamp, the position of the substrate is shifted so that a portion pressed by the stamp on one surface of the large area substrate is placed directly under the stamp.

In the step of pressing the stamp and bringing it into close contact with the workpiece, the inclination of the stamp is measured before the stamp is pressed, and a correction step is performed so that the stamp is kept horizontal with the substrate facing the stamp so that the stamp is uniformly horizontal in the stamp chuck when the gas is pressed. Pushed. In addition, the pressing force of the gas applied to the stamp in the step of pressing the stamp to be in close contact with the substrate acts more than the vacuum suction force of the stamp. At this time, when the pressing force of the gas is too large, since the stamp may be released from the stamp chuck, the pressing force is applied so that the gas pushing the stamp does not leak into the insertion hole.

On the other hand, as described above, the step of moving the substrate so that the small-area stamp is in close contact with the surface of the large-area substrate a plurality of times, the pressing step of the stamp is repeated can easily form a desired pattern on the large-area substrate.

As described above, according to the imprint apparatus and the imprint method using the same according to the embodiments of the present invention, even if the size of an object, such as a substrate, becomes large, a nanoscale pattern may be uniformly formed on the object. That is, by pressing the stamp of a small area repeatedly contacted by varying the position on the surface of the object to be horizontally applied by the pressure of the gas can be uniformly formed nano-pattern pattern on the object.

Therefore, the pattern formation cost of the large-area to-be-processed object can be reduced and manufacturing cost of an imprint apparatus can be reduced. In addition, as the pattern formation of the large-area target object is easy, and the defective rate of the pattern is reduced, the productivity of the pattern processing process may be improved.

In one embodiment of the present invention, the substrate is an object to be processed by forming a pattern by stamping a small area stamp several times, but of course, the large area stamp can be an object of pattern formation.

In addition, although an embodiment of the present invention has been described with reference to an imprint apparatus and an imprint method of an optical imprint lithography method, an imprint apparatus and method of a thermal transfer or thermal imprint lithography method also use a stamping force using gas as in the present invention. Of course it can be in close contact with the object to be processed.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. Therefore, it will be apparent to those skilled in the art that the present invention may be variously modified and modified without departing from the technical spirit of the following claims.

100: support unit 200: resist supply unit
300: template unit 310: stamp
320: stamp chuck 330: insertion hole
340: transmission window 350: pressure regulating means
360: gas injection means 380: support plate
390: tilt adjusting means 400: curing unit
410: light source means 420: position measuring means
430: position changing means 500: control unit
600: frame unit 1000: imprint apparatus

Claims (20)

A support unit for positioning and moving the object to be processed;
A template unit which vacuum-adsorbs and supports a stamp having a pattern formed on one surface, and sprays and pushes gas on the other surface of the stamp so that one surface of the stamp is uniformly pressed on the target object;
Imprint apparatus comprising a. The method according to claim 1,
And a resist supply unit for providing a curable resin to the object to be treated, and a curing unit for curing the curable resin by irradiating light to the object to which the stamp is in close contact. The method according to claim 2,
And a control unit for cooperatively controlling driving of the support unit, the template unit, the resist supply unit, and the curing unit. The method according to any one of claims 1 to 3,
And a frame unit providing an imprint space of the object to be processed. The method of claim 4,
The frame unit is provided with a cover means for blocking the imprint space from the outside, the inside of the cover means is provided with an environmental control means for adjusting the temperature, humidity and pressure of the imprint space. The method according to claim 1,
The template unit,
A stamp chuck through which an insertion hole into which an upper portion of the stamp is inserted, is vertically penetrated so that a pattern formed on one surface of the stamp faces the object to be processed;
A transmission window sealing the open upper portion of the insertion hole and transmitting light to the stamp;
Pressure regulating means for regulating an internal pressure of the insertion hole sealed by the transmission window and the stamp; And
Gas injection means for injecting gas into the insertion hole to press the stamp to be in close contact with the object to be processed;
Imprint apparatus comprising a. The method of claim 6,
The imprint apparatus is formed of a light transmissive material. The method according to claim 6 or 7,
And a pressure regulating passage communicating the pressure regulating means and the insertion hole and at least one gas injection passage communicating the gas injection means and the insertion hole in the stamp chuck. The method according to claim 8,
The insertion hole,
A transmission hole forming a path through which the light transmitted through the transmission window and the stamp is irradiated to the substrate;
A fitting fitting hole extending downward of the transmission hole and extending into a shape corresponding to an outer circumferential shape of the stamp, into which an upper portion of the stamp is inserted;
Including,
And the fitting fitting hole communicates with an auxiliary pressure passage branching from the pressure adjusting passage. The method according to claim 9,
Imprint apparatus is provided with a flexible airtight means in a portion where the stamp and the stamp chuck abuts. The method of claim 6,
The template unit includes an inclination adjusting means for maintaining one surface of the stamp in parallel with the upper surface of the object to be processed, wherein the inclination adjusting means is provided with an inclination detecting sensor means for measuring an inclination of the stamp chuck. . The method of claim 6,
In the stamp chuck,
And a pressure measuring sensor for measuring an internal pressure of the insertion hole, and a pressure measuring sensor for measuring a pressing force of the gas applied to the stamp and the transmission window. The method of claim 6,
And the gas injection means injects at least one gas of nitrogen gas and inert gas. The method according to claim 2,
The curing unit,
Light source means for generating light irradiated toward the target object;
Position measuring means coupled to one side of the light source means to measure an imprint position of the object; And
Position changing means for changing positions of said light source means and said position measuring means above said template unit;
Imprint apparatus comprising a. The method according to claim 2,
The resist supply unit,
An imprint apparatus coupled to one side of the template unit and distributing the curable resin onto the target object in association with driving of the support unit. The method according to claim 1,
The support unit,
A seating table on which the target object is mounted;
Mounting drive means for driving the seating in the horizontal direction parallel to the ground and the vertical direction perpendicular to the ground;
Imprint apparatus comprising a. Vacuum adsorbing the patterned stamp;
Positioning the object to be moved in proximity to the stamp;
Injecting gas into the stamp to press the stamp to closely adhere to the object to be processed;
Imprint method comprising a. 18. The method of claim 17,
Pressurizing the stamp to closely contact the object to be processed;
Measuring the inclination of the stamp, and correcting the stamp so that the stamp remains horizontal with the object to be opposed. The method according to claim 17 or 18,
Pressurizing the stamp to be in close contact with the object to be processed;
The pressing force of the gas applied to the stamp is greater than the vacuum suction force of the stamp. The method of claim 19,
An imprinting method of repeating the position of the object to be processed and the pressing step of the stamp so that the stamp is in close contact with the surface to be processed a plurality of times.

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