KR101816327B1 - Substrate processing device - Google Patents
Substrate processing device Download PDFInfo
- Publication number
- KR101816327B1 KR101816327B1 KR1020127021746A KR20127021746A KR101816327B1 KR 101816327 B1 KR101816327 B1 KR 101816327B1 KR 1020127021746 A KR1020127021746 A KR 1020127021746A KR 20127021746 A KR20127021746 A KR 20127021746A KR 101816327 B1 KR101816327 B1 KR 101816327B1
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- KR
- South Korea
- Prior art keywords
- sheet substrate
- substrate
- roller
- processed
- projection
- Prior art date
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
Abstract
The substrate processing apparatus includes a conveying section that conveys a belt-shaped sheet substrate in a first direction, a plurality of processing sections that respectively process the plurality of sections of the sheet substrate in the second direction crossing the first direction, And a stage device for supporting the sheet substrate.
Description
The present invention relates to a substrate processing apparatus.
BACKGROUND ART As display elements constituting a display device such as a display device, there are known liquid crystal display elements, organic electroluminescence (EL) elements, electrophoretic elements used in electronic paper, and the like. At present, active devices (active devices) for forming respective display devices thereon have become mainstream after forming a switching element (Thin Film Transistor: TFT) called a thin film transistor on the substrate surface as their display elements .
In recent years, a technique of forming a display element on a sheet-like substrate (for example, a film member or the like) has been proposed. As such a technique, for example, a technique called a roll-to-roll process (hereinafter simply referred to as "roll process") is known (see, for example, Patent Document 1). In the roll method, a single sheet-like substrate (for example, a strip-shaped film member) wound on a supply roller on a substrate supply side is fed out, and the outgoing substrate is wound on a return roller on the substrate recovery side, .
A plurality of processing apparatuses are used to transfer a substrate, such as a gate electrode, a gate oxide film, and a semiconductor constituting a TFT, while transferring the substrate by using a plurality of transport rollers or the like, for example, A source, a drain electrode, and the like are formed, and the constituent elements of the display element are sequentially formed on the surface of the substrate to be processed. For example, in the case of forming an organic EL device, a light emitting layer, a cathode, a cathode, an electric circuit and the like are sequentially formed on a substrate. In recent years, large-sized display elements are required more and more, and it is necessary to use a substrate having a larger dimension.
However, when the dimension of the substrate in the direction orthogonal to the carrying direction of the substrate (direction of the substrate) is increased, for example, the substrate may be rolled in the width direction during transportation. Such warpage of the substrate may be a cause of, for example, a decrease in alignment accuracy of each constituent element of the display element formed on the surface of the substrate to be processed.
It is an object of the present invention to provide a substrate processing apparatus capable of highly precisely performing processing with respect to a surface to be processed of a substrate regardless of the size of the substrate.
According to the aspect of the present invention, there is provided a sheet processing apparatus comprising: a conveying section for conveying a belt-shaped sheet substrate in a first direction; and a plurality of processing sections each for performing a process on a plurality of sections of the sheet substrate in a second direction crossing the first direction And a stage device provided corresponding to each of the plurality of processing sections and supporting the sheet substrate.
According to the aspect of the present invention, it is possible to perform processing on the substrate with high precision irrespective of the dimensions of the substrate.
BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing the configuration of a substrate processing apparatus according to the embodiment; Fig.
2 is a view showing a configuration of a stage device according to the embodiment;
3 is a view showing the configuration of an exposure apparatus and a stage apparatus according to the present embodiment.
4 is a view showing a configuration of an exposure apparatus and a stage apparatus according to this embodiment.
5 is a view showing the configuration of an exposure apparatus and a stage apparatus according to the present embodiment.
6 is a view showing an exposure operation of the exposure apparatus;
7 is a view showing an aligning operation of the exposure apparatus and the stage apparatus;
8 is a view showing an alignment operation between the stage device and the sheet substrate;
9 is a view showing an alignment operation between the stage apparatus and the exposure apparatus;
10 is a view showing another configuration of the substrate processing apparatus according to the embodiment;
11 is a view showing another configuration of the substrate processing apparatus according to the embodiment;
12 is a view showing another configuration of the substrate processing apparatus according to the embodiment;
13 is a view showing another configuration of the substrate processing apparatus according to the embodiment;
14 is a view showing another configuration of the substrate processing apparatus according to the embodiment;
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
1 is a view showing a configuration of a substrate processing apparatus (FPA) according to an embodiment.
1, the substrate processing apparatus FPA includes a substrate supply section SU for supplying a sheet substrate (for example, a strip-shaped film member FB), a surface (an object surface) of the sheet substrate FB, A substrate processing unit PR for carrying out processing on the sheet substrate FB, a substrate recovery unit CL for recovering the sheet substrate FB, and a control unit CONT for controlling these parts. The substrate processing apparatus (FPA) is installed in, for example, a factory.
The substrate processing apparatus FPA includes a sheet substrate FB in which the sheet substrate FB is discharged from the substrate supply unit SU until the sheet substrate FB is recovered from the substrate recovery unit CL, (Hereinafter simply referred to as " roll system ") in which various treatments are carried out on the surface of a substrate. The substrate processing apparatus FPA can be used in the case of forming display elements (electronic devices) such as organic EL elements and liquid crystal display elements on the sheet substrate FB. Of course, the processing apparatus (FPA) can also be used when forming elements other than these elements.
As the sheet substrate FB to be processed in the substrate processing apparatus (FPA), for example, a foil such as a resin film or stainless steel can be used. For example, the resin film may be formed of a resin such as polyethylene resin, polypropylene resin, polyester resin, ethylene vinyl copolymer resin, polyvinyl chloride resin, cellulose resin, polyamide resin, polyimide resin, polycarbonate resin, polystyrene resin, A resin or the like can be used.
The dimension of the sheet substrate FB in the Y direction (short direction) is, for example, about 1 m to 2 m, and the dimension in the X direction (long direction) is, for example, 10 m or more. Of course, this dimension is merely an example, and the present invention is not limited thereto. For example, the size of the sheet substrate FB in the Y direction may be 1 m or less, or 50 cm or less, or 2 m or more. In the present embodiment, a sheet substrate FB having a dimension in the Y direction exceeding 2 m is very suitably used. The size of the sheet substrate FB in the X direction may be 10 m or less.
The sheet substrate FB is formed, for example, to have flexibility. Here, the flexibility refers to a property that, for example, even when a predetermined force of at least its own weight is applied to the substrate, the substrate can be bent without breaking or breaking. Also, for example, the property of bending by the predetermined force is included in the flexibility. In addition, the flexibility varies depending on the material, size, thickness, temperature, etc. of the substrate, and the like. As the sheet substrate FB, one strip-shaped substrate may be used, but a configuration in which a plurality of unit substrates are connected and formed in a band shape may be employed.
It is preferable that the sheet substrate FB has a relatively small coefficient of thermal expansion such as that the dimension does not substantially change (the thermal deformation is small) even when the heat is applied at a relatively high temperature (for example, about 200 DEG C). For example, an inorganic filler may be mixed with a resin film to reduce the thermal expansion coefficient. Examples of the inorganic filler include titanium oxide, zinc oxide, alumina, silicon oxide and the like.
The substrate feed unit SU feeds and feeds the sheet substrate FB wound, for example, in a roll shape to the substrate processing unit PR. The substrate supply unit SU is provided with, for example, a shaft portion around which the sheet substrate FB is wound, a rotation drive source for rotating the shaft portion, and the like. Alternatively, and / or additionally, the substrate supply section SU may be constituted by a cover section or the like which covers, for example, a sheet substrate FB wound in a roll shape.
The substrate collecting section CL collects the sheet substrate FB from the substrate processing section PR, for example, in the form of a roll. The substrate recovery unit CL is provided with a shaft for winding the sheet substrate FB, a rotation drive source for rotating the shaft, and a cover unit for covering the recovered sheet substrate FB, as in the case of the substrate supply unit SU. Alternatively, and / or additionally, in the case where the sheet substrate FB is cut, for example, in the form of a panel in the substrate processing section PR, for example, the sheet substrates FB are collected in an overlapped state, The portion CL may be configured to recover the sheet substrate FB in a state different from the state of being rolled up.
The substrate processing section PR transports the sheet substrate FB fed from the substrate feed section SU to the substrate return section CL and also performs the process on the processed surface Fp of the sheet substrate FB in the conveying process . The substrate processing section PR has, for example, a
The
The
The
In the present embodiment, for example, a case where the
2 is a perspective view showing a configuration of the stage device FST.
2, the stage device FST has a
The cone-shaped
The support table 75 is disposed, for example, at the central portion in the X direction on the
The + Z side surface of the
Although only two stage reference marks SFM are shown in Fig. 2, the two stage reference marks SFM may be formed on a pair of stage bases so that the respective supporting
In the
The
Each of the
In other words, these roller portions can be removed one by one from the
In the present embodiment, as shown in Fig. 3,
The
4 is a view showing the arrangement of the processing apparatus 10 (the
4, the
4, the
The illumination optical system IL illuminates a predetermined illumination area on the mask M with exposure light EL of uniform illumination distribution. As the exposure light EL that is emitted from the illumination optical system IL, for example, a bright line (bright line, g line, h line, i line) emitted from a mercury lamp is used. The mask stage MST is movable in the X direction at a constant speed and at least in the Y direction, the Z direction, and the Z direction so as to be movable in the X direction on the upper surface (plane parallel to the XY plane) and is movable in the &thetas; Z direction.
The two-dimensional position of the mask stage MST is measured by a laser interferometer not shown. Based on the measurement information, the control unit CONT controls the position and speed of the mask stage MST through the
The
In this embodiment, after the exposure of the pattern of the mask M with respect to one to-be-processed region Fp in the surface (the surface to be processed) of the sheet substrate FB is completed, the exposure of the next to-be- The mask stage MST is moved in the -X direction. Then, the mask stage MST and the sheet substrate FB are synchronized with each other again in the X direction to perform exposure of the exposure area in the next area to be processed.
The mask M is synchronously moved in the X direction with respect to the sheet substrate FB continuously conveyed in the X direction as described above and the mask M is moved in the -X direction after the completion of one to- The image of the pattern of the mask M can be exposed to a plurality of regions to be processed on the sheet substrate FB.
Further, as shown in Fig. 5, the
On the other hand, the
5, the roller portions of the
Concretely, the
Similarly, the
The stage reference marks (the reference marks for detecting the stage position, the reference marks, and the SFM) are provided so as to face the respective projection optical systems PL1 to PL3. For example, the stage reference mark SFM is provided on the upstream side of the illumination area of the projection optical system PL of the
The substrate processing apparatus FPA configured as described above produces a display element (electronic device) such as an organic EL element or a liquid crystal display element by a roll system under the control of the control unit CONT. Hereinafter, a process for manufacturing a display device using the substrate processing apparatus (FPA) having the above-described structure will be described.
First, a belt-like sheet substrate FB wound on a roller is mounted on a substrate supply unit SU. The control unit CONT rotates the roller so that the sheet substrate FB is fed from the substrate supply unit SU in this state. Then, the sheet substrate FB that has passed through the substrate processing section PR is wound by a roller of the substrate recovery section CL. By controlling the substrate supply unit SU and the substrate recovery unit CL, the surface to be processed of the sheet substrate FB can be continuously transported to the substrate processing unit PR.
The control unit CONT controls the
In the case of performing the processing by the
6, the surface to be processed of the sheet substrate FB is divided into a plurality of areas to be processed (a plurality of sections, an exposure area, an F1 area, To F5). Here, the exposure area F1 is a portion (section) exposed only by the image projected onto the projection area EA1. The exposure area F2 is a part (section) exposed by a part of the image projected onto the projection area EA1 and a part of the image projected onto the projection area EA3. The exposure area F3 is a portion (section) exposed only due to an image projected onto the projection area EA3. The exposure area F4 is a part (section) exposed by a part of the image projected onto the projection area EA2 and a part of the image projected onto the projection area EA3. The exposure area F5 is a portion (section) exposed only due to an image projected onto the projection area EA2.
As described above, in each stage device FST, since the pair of
Next, an operation of performing alignment between the
In this operation, the aligning operation is performed between the stage device FST and the sheet substrate FB before the exposure of the sheet substrate FB with the
In this embodiment, rough alignment of the sheet substrate FB with respect to the
In this embodiment, the alignment operation between the stage device FST, the sheet substrate FB and the
7 is a perspective view showing the positional relationship between the stage device FST, the sheet substrate FB and the
An image of a pair of mask reference marks (reference mark for processing position detection, MFM) provided on the mask M of the
The projection position of the mask reference mark MFM is set to the stage reference mark SFM of the stage device FST as an end portion in the Y direction in the two masks M used in the
8 is a view showing an alignment operation between the stage device FST and the sheet substrate FB.
As shown in Fig. 8, the sheet substrate FB has a to-be-processed region Fpa in which, for example, a display element is formed in the surface (the surface to be processed). The substrate reference mark FFM is formed in the sheet substrate FB, for example, in an area Fpb deviating from the to-be-processed area Fpa. The control unit CONT notifies the control unit CONT of the timing at which the exposure process by the
It is also possible to perform a normal alignment operation by forming a reference scale or the like in a portion corresponding to the stage reference mark SFM in the back surface of the sheet substrate FB, for example. In this case, since the position of the sheet substrate FB can be continuously detected, the position and the moving speed of the mask M, or the illuminance of the illumination optical system IL, for example, And so on. The imaging characteristics of each of the projection optical system PL1 and the projection optical system PL2 of the
For example, even when the conveyance speed of the sheet substrate FB is not constant, the position and the moving speed of the mask M, the illuminance of the illumination optical system IL, the image formation characteristics of the projection optical system (image position, Surface) shape) of the sheet substrate FB is adjusted, exposure of high precision is performed without adjusting the conveying speed of the sheet substrate FB. The configuration for detecting the position of the sheet substrate FB is not limited to the above-described configuration, and a position detection sensor or the like may be provided separately.
9 is a view showing the alignment operation between the stage device FST and the
When the exposure areas F1 to F5 are overlapped in the exposure operation, for example, after the exposure process by the
As described above, according to the present embodiment, the
According to the present embodiment, after the exposure processing of the area to be processed is performed by the
The technical scope of the present invention is not limited to the above-described embodiment, but can be appropriately changed within the scope not deviating from the gist of the present invention.
In the above embodiment, the sheet substrate FB is supported on the support table 75 having the flat surface parallel to the XY plane of the stage device FST. However, the present invention is not limited to this. For example, as shown in Fig. 10, a roller stage RST may be used as a stage corresponding to the
In the above embodiment, when using the rollers such as the cone roller (71, 72) and the adsorption rollers (73, 74), the diameter of a part of the rollers may be changed. For example, as shown in Fig. 11, when the roller RR is divided into a plurality of roller portions Ra to Rc (having a plurality of divided circumferential surfaces), the roller portions Ra to Rc But it may be configured to be deformable. The roller RR may be deformable so that its diameter becomes larger as the entire roller RR reaches the central portion.
As a configuration for deforming the roller RR or the roller portions Ra to Rc, for example, a flexible member may be used as the roller surface (guide surface for guiding the sheet substrate FB) So as to be deformable. In addition, the roller surface is deformed by adjusting, for example, heat, oil pressure, air pressure or the like inside the roller. Thus, the roller RR or the roller portions Ra to Rc can be deformed into a desired shape. By deforming the roller RR and the roller portions Ra to Rc in this manner, for example, the wrinkles locally formed on the sheet substrate FB are stretched or the guide speed of the sheet substrate FB is changed So that the advancing direction or the positional deviation of the sheet substrate FB can be adjusted.
Before the back surface of the sheet substrate FB is supported on the support surfaces 75a, 75b and 75c of the stage device FST, the
In the above embodiment, for example, the
13, the projection areas EA11, EA12, EA21 and EA22 by the
In the above embodiment, the
In the above description, the projection area of a plurality of exposure apparatuses is shifted in the X direction. However, the present invention is not limited to this. Alternatively and / or additionally, for example, a configuration in which the projection areas by a plurality of exposure apparatuses are aligned in the X direction, that is, arranged in a line in the Y direction can be applied.
In the above description, all of the stage devices FST arranged corresponding to a plurality of exposure apparatuses are provided with the first detection mechanism and the second detection mechanism, but the present invention is not limited thereto. Alternatively, the first detection mechanism and the second detection mechanism may be provided only in some of the stage devices FST.
In the above description, the exposure apparatus has been described as an example of the
FPA ... Substrate processing device FB ... Sheet substrate
PR ... Substrate processing part CONT ... The control unit
Fp ... If you take the FST ... Stage device
DC ... Detection camera M ... Mask
MST ... Mask Stage IL ... Illumination optical system
PL ... Projection optical system CA ... Detection camera
SFM ... Stage reference mark FFM ... Substrate reference mark
MFM ... Mask reference marks F1 to F5 ... Exposure area
PL (PL1 to PL3) ... The projection optical system EA (EA1 to EA42) ... Projection area
10 ... The
11 ... Stage driving
50 ...
71, 72 ... The
73a to 73e, 74a to 74e, Ra to Rc, Roller portion
75 ... Support table 76 ... Groove
Claims (20)
Wherein a predetermined pattern is exposed to each of a plurality of regions to be processed which are divided in a width direction intersecting with the long direction among the to-be-processed surfaces of the sheet substrate, And a plurality of projection areas arranged at intervals in the longitudinal direction,
A support table disposed on the back surface side of the sheet substrate and having a plurality of flat support surfaces divided in the width direction and the long direction respectively corresponding to the plurality of projection areas of the processing unit, And a plurality of roller stages arranged in the longitudinal direction corresponding to each of the plurality of projection regions, wherein the plurality of support surfaces of the support table, or the stage supporting the back surface of the sheet substrate by the plurality of roller stages, And a substrate processing apparatus.
A first detection mechanism for detecting a first positional relationship between the stage device and the sheet substrate in at least one of the long direction and the width direction of the sheet substrate,
And a first position adjustment mechanism that adjusts the first positional relationship based on the detection result of the first detection mechanism.
The stage device has a reference mark provided at a portion for supporting the sheet substrate,
Wherein the first detection mechanism measures the reference mark and a substrate mark provided on the sheet substrate and detects the first positional relationship based on the measurement result.
Wherein the substrate mark is mounted corresponding to one or more of the plurality of regions to be processed.
Wherein the first detection mechanism is provided in the stage apparatus.
A second detection mechanism for detecting a second positional relationship between the stage device and the plurality of projection areas of the processing unit in at least one of the long direction and the width direction of the sheet substrate,
And a second position adjustment mechanism that adjusts the second positional relationship based on the detection result of the second detection mechanism.
Wherein the stage device has a first reference mark provided at a portion for supporting the sheet substrate,
The processing section photographs a second reference mark at a predetermined position in the plurality of projection regions,
Wherein the second detection mechanism is provided between the divided plurality of support surfaces of the support table of the stage device to measure the first reference mark and the second reference mark, And detects the positional relationship.
A processing state detecting mechanism for detecting a processing state of the region to be processed exposed by the projection region among the processed surfaces of the sheet substrate;
And a processing control section for controlling exposure processing by each of the plurality of projection regions of the processing section with respect to the sheet substrate based on a detection result by the processing state detecting mechanism.
Wherein the roller of the carry section has a groove portion formed so as to face at least one of the back surface of the sheet substrate and the end portion in the width direction of the to-be-processed region on the sheet substrate.
Wherein the groove portion of the roller is formed so as to face both ends of the region to be processed in the width direction.
Wherein the roller has a divided structure corresponding to each of the plurality of target areas on the sheet substrate.
Wherein at least a part of the roller is formed to be deformable in a radial direction.
A processing state detecting mechanism for detecting a processing state of the region to be processed exposed by the projection region among the processed surfaces of the sheet substrate;
And a processing control section for controlling exposure processing by each of the plurality of projection regions of the processing section with respect to the sheet substrate based on a detection result by the processing state detecting mechanism.
Wherein a predetermined pattern is exposed for each of a plurality of regions to be treated which are divided in a width direction intersecting with the long direction among the to-be-processed surfaces of the sheet substrate, A processing unit having a plurality of projection areas arranged at intervals in respective directions;
Wherein the projected regions are disposed on the back side of the sheet substrate and corresponding to positions of the projected regions adjacent to each other in the width direction among the plurality of projection regions, And a stage device for supporting the back surface of the sheet substrate by each of the plurality of roller stages.
A first detection mechanism for detecting a first positional relationship between the stage device and the sheet substrate in at least one of the long direction and the width direction of the sheet substrate,
And a first position adjustment mechanism that adjusts the first positional relationship based on the detection result of the first detection mechanism.
A second detection mechanism for detecting a second positional relationship between the stage device and the plurality of projection areas of the processing unit in at least one of the long direction and the width direction of the sheet substrate,
And a second position adjustment mechanism that adjusts the second positional relationship based on the detection result of the second detection mechanism.
Wherein the roller of the carry section has a groove portion formed so as to face at least one of the back surface of the sheet substrate and the end portion in the width direction of the to-be-processed region on the sheet substrate.
Wherein the groove portion of the roller is formed so as to face both ends of the region to be processed in the width direction.
Wherein the roller has a divided structure corresponding to each of the plurality of target areas on the sheet substrate.
Wherein at least a part of the roller is formed to be deformable in a radial direction.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US30398610P | 2010-02-12 | 2010-02-12 | |
| US61/303,986 | 2010-02-12 | ||
| PCT/JP2011/052879 WO2011099563A1 (en) | 2010-02-12 | 2011-02-10 | Substrate processing device |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020177037335A Division KR101948467B1 (en) | 2010-02-12 | 2011-02-10 | Substrate processing device and substrate processing method |
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| Publication Number | Publication Date |
|---|---|
| KR20120138751A KR20120138751A (en) | 2012-12-26 |
| KR101816327B1 true KR101816327B1 (en) | 2018-01-08 |
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| Application Number | Title | Priority Date | Filing Date |
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| KR1020127021746A KR101816327B1 (en) | 2010-02-12 | 2011-02-10 | Substrate processing device |
| KR1020177037335A KR101948467B1 (en) | 2010-02-12 | 2011-02-10 | Substrate processing device and substrate processing method |
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| KR1020177037335A KR101948467B1 (en) | 2010-02-12 | 2011-02-10 | Substrate processing device and substrate processing method |
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| Country | Link |
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| JP (1) | JP5761034B2 (en) |
| KR (2) | KR101816327B1 (en) |
| CN (1) | CN102741754B (en) |
| HK (1) | HK1171820A1 (en) |
| TW (2) | TWI557840B (en) |
| WO (1) | WO2011099563A1 (en) |
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| KR102126421B1 (en) * | 2012-04-13 | 2020-06-24 | 가부시키가이샤 니콘 | Cassette for roll |
| TWI653187B (en) * | 2012-05-18 | 2019-03-11 | 日商尼康股份有限公司 | Substrate processing device |
| CN102790002B (en) * | 2012-07-27 | 2015-02-11 | 京东方科技集团股份有限公司 | Flexible substrate treatment device |
| JP6459234B2 (en) * | 2014-06-16 | 2019-01-30 | 株式会社ニコン | Substrate processing equipment |
| CN107255908B (en) * | 2013-07-08 | 2019-08-06 | 株式会社尼康 | Device inspection apparatus and patterning device |
| EP3124649A4 (en) * | 2014-03-25 | 2017-08-16 | ULVAC, Inc. | Film-formation device and film-formation method |
| CN107748486B (en) * | 2014-04-01 | 2020-03-24 | 株式会社尼康 | Substrate processing apparatus, method of adjusting the same, device manufacturing method, and direct writing exposure apparatus |
| TWI661280B (en) * | 2014-04-01 | 2019-06-01 | 日商尼康股份有限公司 | Substrate processing method and substrate processing device |
| TW201732444A (en) * | 2015-11-30 | 2017-09-16 | Nippon Kogaku Kk | Exposure apparatus, exposure system, substrate processing method, and device manufacturing apparatus |
| JP6723831B2 (en) * | 2016-06-01 | 2020-07-15 | 株式会社オーク製作所 | Exposure equipment |
| JP7023620B2 (en) * | 2017-05-30 | 2022-02-22 | 株式会社オーク製作所 | Exposure equipment and substrate mounting method |
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| JP5117243B2 (en) * | 2008-03-27 | 2013-01-16 | 株式会社オーク製作所 | Exposure equipment |
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2011
- 2011-02-10 WO PCT/JP2011/052879 patent/WO2011099563A1/en active Application Filing
- 2011-02-10 CN CN201180007819.5A patent/CN102741754B/en active Active
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- 2011-02-10 KR KR1020177037335A patent/KR101948467B1/en active IP Right Grant
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| JP2001235877A (en) * | 1999-12-14 | 2001-08-31 | Sony Chem Corp | Exposure method |
| JP2007067355A (en) * | 2005-09-02 | 2007-03-15 | Sharp Corp | Apparatus and method for substrate surface treatment |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011099563A1 (en) | 2011-08-18 |
| CN102741754B (en) | 2015-12-02 |
| HK1171820A1 (en) | 2013-04-05 |
| TWI492326B (en) | 2015-07-11 |
| KR20120138751A (en) | 2012-12-26 |
| KR101948467B1 (en) | 2019-02-14 |
| TWI557840B (en) | 2016-11-11 |
| JP5761034B2 (en) | 2015-08-12 |
| KR20180004833A (en) | 2018-01-12 |
| TW201207980A (en) | 2012-02-16 |
| CN102741754A (en) | 2012-10-17 |
| TW201535576A (en) | 2015-09-16 |
| JPWO2011099563A1 (en) | 2013-06-17 |
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