KR101657260B1 - Preparation method of Front Electrode for Solar Cell and Front Electrode manufactured by the same - Google Patents
Preparation method of Front Electrode for Solar Cell and Front Electrode manufactured by the same Download PDFInfo
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- KR101657260B1 KR101657260B1 KR1020110000166A KR20110000166A KR101657260B1 KR 101657260 B1 KR101657260 B1 KR 101657260B1 KR 1020110000166 A KR1020110000166 A KR 1020110000166A KR 20110000166 A KR20110000166 A KR 20110000166A KR 101657260 B1 KR101657260 B1 KR 101657260B1
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Abstract
The present invention can realize a fine line width of 60 탆 or less by forming electrodes by a roll-to-roll method using an adhesive film, exhibiting a high aspect ratio, To a method of manufacturing an electrode for a solar cell and an electrode for a solar cell manufactured therefrom.
Description
The present invention relates to a method of manufacturing an electrode for a solar cell having a fine line width of 60 탆 or less and an electrode manufactured therefrom.
With the recent depletion of existing energy resources such as oil and coal, interest in alternative energy to replace them is increasing. In particular, solar cells are attracting particular attention because they are rich in energy resources and have no problems with environmental pollution.
The solar cell is a photoelectric conversion device that converts solar energy directly into electrical energy. It has a form of p-type semiconductor and n-type semiconductor, and its basic structure is similar to a diode. The solar cell is generally divided into a silicon solar cell, a compound semiconductor solar cell, and a tandem solar cell depending on the material. Of these three types of solar cells, silicon solar cells are the mainstream in the solar cell market. Further, the solar cell may be divided into a substrate type and a thin film type according to the type thereof.
Among them, the substrate-type crystalline silicon solar cell widely used for the photovoltaic power generation is characterized in that an n-type layer serving as an emitter is formed on the whole surface of the silicon substrate, a p-type layer is formed on the rear surface, And an anti-reflection layer such as a silicon nitride film or an oxide film for minimizing the reflection of light. In addition, a front electrode electrically connected to the n-type semiconductor layer and a rear electrode electrically connected to the p-type semiconductor layer may be included.
On the other hand, in the structure of the silicon solar cell, the front electrode is generally manufactured by a screen printing process. In addition, the front electrode generally contains silver, and copper is heavily contaminated with silicon after the heat treatment process, and silver paste is generally used. These pastes are viscous and form a metal pattern on a silicon wafer through a firing process at 100-200 ° C. Further, the rear electrode of the silicon solar cell can be manufactured by using a silver and aluminum as a screen printing process, forming an electrode, and then drying the electrode.
The screen printing method, which is widely used for forming electrodes of the solar cell, is a method of directly printing a paste on a substrate through a screen mask. The method has advantages of high printing speed and low process cost. However, , It is difficult to adjust the line width of 80 탆 or less and to control the line thickness, so that it is not suitable for precision pattern formation. Further, since the line width of the Ag electrode is only 60 m, the screen printing process can not form a fine line width and has a limitation in realizing a high aspect ratio, and the uniformity is remarkably deteriorated in mass productivity.
In addition, the conventional technique has a method of directly transferring a pattern onto a silicon substrate like a roll-to-plate printing method in order to form a front Ag electrode of a commercialized crystalline silicon solar cell. However, there is a high risk that the substrate is damaged by the pressure of the roll, and there is also a problem in mass productivity.
Accordingly, it is possible to realize a fine line width of 60 μm or less by forming electrodes by a roll-to-roll method using an adhesive film when patterning the electrodes constituting the front electrode of a silicon solar cell (Substrate film) of a solar cell which can exhibit a high aspect ratio and can solve the problem of substrate breakage caused by the pressure of a roll, and a method of manufacturing an electrode for a solar cell using the method .
Another object of the present invention is to provide an electrode for a solar cell manufactured by the above method and a silicon solar cell including the same as a front electrode.
The present invention
(a) forming a metal pattern on a release film using a roll-to-roll process;
(b) preparing a transfer film on which the metal pattern is formed by using a polymeric resin film provided with an adhesive film; And
(c) transferring the metal pattern to a substrate through photo-curing of the transfer film having the metal pattern formed thereon to produce an electrode;
The present invention also provides a method of manufacturing an electrode for a solar cell.
According to a preferred embodiment of the present invention,
(a) printing a metal paste on a release film using a roll-to-roll method to form a metal pattern;
(b) attaching a polymeric resin film having an adhesive film on a metal pattern formed on the release film to manufacture a transfer film on which a metal pattern including a metal pattern, an adhesive film and a polymer resin is formed; And
(c) removing the release film from the transfer film on which the metal pattern is formed, disposing a transfer film so that the surface on which the metal pattern is formed faces the substrate, and transferring the metal pattern onto the substrate through photo- Step.
The present invention also provides a transfer film for a solar cell comprising a release film, a metal pattern, a photocurable adhesive film and a polymer resin film.
The metal pattern may include any conductive metal selected from the group consisting of silver, copper, gold, chromium, aluminum, tungsten, zinc, nickel, iron and platinum, and preferably silver.
The metal pattern has a line width of 60 mu m or less, and preferably has a fine line width of at least 30 mu m to a maximum of 60 mu m.
The polymeric resin film may be a polyester film, a polyimide film, a silicone resin film, or a fluororesin film having a thickness of 50 to 200 mu m.
The present invention also provides an electrode for a solar cell having a line width of 60 mu m or less and a metal pattern having a thickness of 10 to 30 mu m manufactured by the above method.
The present invention also provides a silicon solar cell comprising the electrode as a front electrode.
Hereinafter, the present invention will be described in more detail.
The present invention relates to a method of manufacturing a front electrode of a silicon solar cell using a polymer resin film having a roll-to-roll coating method and an adhesive film. The present invention also relates to an electrode for a solar cell and a silicon solar cell including the electrode as a front electrode.
Thus, according to the present invention, there is provided a transfer film for a solar cell comprising a metal pattern formed on a release film, an adhesive film and a polymer resin film. In addition, the present invention is characterized in that an electrode for a silicon solar cell is manufactured by easily transferring a metal pattern to a substrate through photo-curing using the transfer film.
In particular, the present invention is capable of transferring a line width of up to 60 탆, preferably of at least 30 탆, in a mass production process, compared with the conventional pattern forming method using screen printing, and has a high line width, Can be mass-produced. Accordingly, the present invention can improve the cell efficiency by increasing the light absorption area of the solar cell by narrowing the width of the electrode pattern and forming a fine line width of 60 m or less. Further, the method of the present invention has an excellent linearity of a metal pattern, an accurate line width, and an excellent uniformity.
In addition, the conventional roll-to-plate type direct-printing method can not take advantage of the continuous process, deteriorates the mass productivity, and has a problem of substrate breakage. However, An electrode having a metal pattern can be easily formed by a roll-to-roll method using a polymer resin film provided with an adhesive film, so that the advantage of mass production can be taken advantage of. Further, the present invention uses a method of transferring a metal pattern onto a release film and transferring the metal pattern onto the substrate, instead of forming a pattern directly on the substrate, so that the substrate is not damaged by the pressure applied to the roll. That is, in the case of the present invention, even if the pressure due to the roll is applied to the release film, the release film can buffer the film and uniformly maintain the metal pattern on the release film. If this is transferred to a separate substrate, Can be manufactured.
In addition, in the present invention, it is possible to provide a transfer film for electrodes using a polymeric resin film provided with an adhesive film, instead of directly transferring the metal pattern formed on the release film to a substrate. Preferably, the transfer film may be a structure including a release film, a metal pattern, a photocurable adhesive film, and a polymeric resin film.
In this method of the present invention, the Ag-containing paste is printed on a release film in a roll-to-roll manner to form a metal pattern, and then transferred to a polymeric resin film provided with a UV-curable adhesive film, And curing the adhesive to minimize the tackiness of the adhesive film, and then transferring the adhesive film to a substrate to form an Ag pattern and firing to manufacture an electrode for a solar cell.
Hereinafter, a method of manufacturing an electrode for a solar cell using the roll-to-roll method of the present invention will be described with reference to the drawings.
FIG. 1 schematically shows a manufacturing process of an electrode of a solar cell according to a preferred embodiment of the present invention. 2 is a cross-sectional view of a polymer resin film provided with an adhesive film used in the process of manufacturing an electrode of a solar cell of the present invention. 3 is a cross-sectional view of a transfer film for electrodes manufactured in the process of manufacturing an electrode of a solar cell of the present invention.
First, as shown in FIG. 1, a method for manufacturing an electrode for a solar cell according to the present invention comprises:
(a) forming a metal pattern on a release film using a roll-to-roll process; (b) preparing a transfer film on which the metal pattern is formed by using a polymeric resin film provided with an adhesive film; And (c) transferring the metal pattern onto the substrate through photocuring of the transfer film having the metal pattern formed thereon.
Specifically, the present invention provides a method of manufacturing a metal mold, comprising: (a) forming a metal pattern by printing a metal paste on a release film using a roll-to-roll method; (b) attaching a polymeric resin film having an adhesive film on a metal pattern formed on the release film to manufacture a transfer film on which a metal pattern including a metal pattern, an adhesive film and a polymer resin is formed; And (c) removing the release film from the transfer film on which the metal pattern is formed, disposing a transfer film so that the surface on which the metal pattern is formed faces the substrate, transferring the metal pattern onto the substrate through photo- The method comprising the steps of:
In the step (a) of forming the metal pattern of the present invention, the roll-to-roll method is a roll-to-roll method in which a pattern is directly formed on a conventional flat substrate, to-plate method. The term " transfer method " refers to a method of transferring a release film, which is opposite in direction of rotation, to a desired direction of movement, and transferring a metal paste onto the release film to form a metal pattern Quot; means a method using a printing roll for printing and a device having a traveling roll located under the same. However, the traveling direction of the coating roll for printing and the traveling roll is not particularly limited and may be changed according to the feeding direction of the release film in consideration of the working environment when the device is installed, and may be appropriately selected in a desired direction to the left or right . Preferably, the traveling direction is such that the release film is fed from the left side and moved to the right side. Therefore, in this case, when the coating roll for printing is rotated in the counterclockwise direction, the traveling roll may rotate clockwise.
Therefore, in the step of forming the metal pattern, the roll-to-roll method includes a printing coating roll supplied with a metal paste for forming a metal pattern on the release film by rotation, A roll-to-roll apparatus, which is disposed under the coating roll and is provided with a traveling roll which travels in a reverse direction with respect to the rotating direction of the coating roll for transporting the release film before and after the metal pattern formation in the rightward traveling direction, Can be used.
That is, the present invention provides a roll-to-roll apparatus (10) of FIG. 1, comprising a metal paste feeder (3) connected to an upper portion of a coating roll A metal pattern is formed from the metal paste which is transferred from the printing coating roll onto the release film 4 passing between the
Although not specifically shown in the drawing, the
Preferably, the printing coating roll may be provided with a blanket for forming a metal pattern having a pattern groove having a line width of 60 mu m or less and a groove depth of 30 mu m or less, more preferably 20 mu m. The blanket may have a line width of at least 30 탆 to a maximum of 60 탆.
Further, when the metal paste is injected into the coating roll for printing through the nozzle of the
The
The blanket is not particularly limited as long as it is an elastic material capable of easily forming a pattern, and examples thereof include PDMS (polydimethylsiloxane) and the like. Therefore, a pattern of the same shape as the electrode pattern to be finally formed is intaglio patterned by various methods such as a photomask in a flat blanket of PDMS or the like to form pattern grooves, and then the blanket formed with pattern grooves is wound around the roll surface So that the
Further, in the printing coating roll, a
Therefore, the paste is left only in the blanket pattern groove by the doctor ring, and when transferred to the release film, the paste pattern is formed in the same shape as the blanket pattern. That is, when the coating roll having the blanket pattern is rotated while being pressed and the lower traveling roll is rotated in the opposite direction, the recess of the blanket is pressed by the pressure, and the paste in the blanket pattern groove passes through the two coating rolls And at the same time, the metal pattern is transferred onto the release film by being separated from the pattern groove.
Also, in the present invention, the metal paste may exhibit a viscosity ranging from 50,000 cps to 500,000 cps. The metal paste basically includes conductive metal particles, a binder, and an organic solvent, and may further include a dispersant, a leveling agent, and a glass frit. The binder, the organic solvent, the dispersing agent and the leveling agent refer to an organic vehicle.
In addition, in the metal paste composition, the metal powder may be an electrically conductive particle having an average particle size of 0.1 to 10 탆, and may be any of those well known to those skilled in the art. For example, silver, copper, gold, chromium, aluminum, tungsten, Iron, platinum and the like can be used. Preferably, the metal powder uses silver particles.
The binder may be an organic binder, and at least one selected from the group consisting of a cellulose-based resin and an acrylic-based resin may be used.
In addition, the metal paste composition of the present invention may contain an organic solvent in a usual amount to control flowability and viscosity. The organic solvent may be at least one selected from the group consisting of texanol, terpineol, cyclohexane, and diethylene glycol.
The composition of the metal paste composition is not particularly limited, and can be used within the above-mentioned range, preferably within a normal range so as to have a viscosity of 100,000 to 300,000 cps. For example, the metal paste composition may include 2 to 10 parts by weight of a binder and 3 to 20 parts by weight of a solvent, based on 100 parts by weight of the silver particles. However, the present invention is not limited thereto.
The metal paste of the present invention may further include glass frit powder particles for improving the bonding strength and ohmic-contact with the emitter layer. The glass frit powder can be used without limitation as long as it is used in the art. Examples of such glass frit powders may include lead oxides and / or bismuth oxides. Specifically,
The dispersing agent and the leveling agent may be used in a manner well known in the art, and the kind and content thereof are not limited.
In addition, though not shown in the figure for the sake of convenience, a conveyance belt may be provided in a lower right direction of the release film on which the metal pattern is formed. After the metal pattern is formed on the release film, if necessary, a drying device is further provided on the release film to perform the heat treatment on the metal pattern.
The step (b) for producing a transfer film is characterized by using a polymeric resin film provided with an adhesive film for transferring a metal pattern onto a substrate in a more easy manner.
Accordingly, the
As shown in FIG. 2, the polymeric resin film provided with the adhesive film may include a
In addition, when the polymeric resin film is adhered onto the metal pattern formed on the release film, the
At this time, the adhesive film can be used for transferring the metal pattern to the substrate in the step of manufacturing the electrode, described later, and the adhesion can be reduced after the light curing to easily peel off the metal pattern transferred to the substrate. Therefore, in the present invention, it is possible to reliably form the metal pattern on the substrate without damaging the substrate.
Such a pressure-sensitive adhesive film can be formed from a film-like acrylic adhesive composition or a tape form, and one side or both sides can exhibit tackiness, and preferably exhibits double-side tackiness. Therefore, the polymeric resin film provided with the adhesive film may have a structure in which a separate releasing paper is attached to the lower part of the adhesive film, and a releasing paper, an adhesive film, and a polymer resin film are attached from below.
Further, the polymeric resin film provided with the adhesive film is used by removing the release paper under the adhesive film when it is attached to the metal pattern. It is also preferable that the surface showing the tackiness of the pressure-sensitive adhesive film is disposed so as to face the surface of the metal pattern formed on the release film and attached thereto.
The type of the adhesive film is not particularly limited as long as the adhesive property can be minimized by increasing the degree of curing by light curing such as UV irradiation, and can be appropriately selected and used. Examples of the adhesive film include a UV-curable acrylate containing a hydroxyl group and a vinyl group to an acrylic adhesive binder containing a vinyl group and a dye capable of effectively reducing the peeling force between the adhesive layer and the adhesive layer after photo- A single die bonding film or the like can be used.
Further, in the present invention, the thickness of the adhesive film may be 50 to 200 mu m. The thickness of the release paper may be 50 to 200 mu m.
The polymeric resin film may be formed on the adhesive film, and may serve as a supporting substrate. After the metal pattern is transferred to the substrate, the polymeric resin film may be peeled off together with the adhesive film. The polymeric resin film may be a polyester film, a polyimide film, a silicone resin film, or a fluororesin film. More preferably, a polyethylene terephthalate (PET) film, a polyethylene film, or a polypropylene film is used. In the present invention, the thickness of the adhesive film may be 5 to 30 占 퐉.
For example, in the present invention, a polymeric resin film having a pressure-sensitive adhesive film is produced. A photo-curable composition is applied on a polymeric resin film so that the thickness after drying is 5 to 20 占 퐉, Can be obtained. Further, as another example of producing the polymer resin film provided with the adhesive film, a thermosetting adhesive film can be obtained through a process of attaching a double-faced tape having ordinary tackiness to a polymeric resin film.
The step (c) comprises transferring a metal pattern having a fine line width of 60 mu m or less from the transfer film to the substrate through photo-curing of the adhesive film included in the transfer film having the metal pattern formed thereon do.
Therefore, in the present invention, the release film is removed from the transfer film, the transfer film is disposed so that the surface on which the metal pattern is formed faces the substrate, and then the photocuring is performed to transfer the metal pattern onto the substrate.
In particular, according to the present invention, the photocurable adhesive film layer is rapidly cured to exhibit high degree of curability, thereby minimizing tackiness and causing some shrinkage upon curing. Therefore, in the process of transferring the metal pattern onto the substrate after lamination through photo-curing, the polymer resin film including the cured adhesive film can be easily separated from the metal pattern and has a fine line width of 60 탆 or less An electrode for a solar cell having a high aspect ratio can be manufactured. Therefore, when the silicon solar cell is manufactured by using the metal pattern as the front electrode, the electrode includes a metal pattern having an excellent linearity, an accurate fine line width, and an excellent uniformity. Can be improved.
At this time, when transferring the metal pattern onto the substrate, the method of lamination of the transfer film on the substrate is not limited thereto, and the present invention can be laminated on the substrate using, for example, a hot press.
The photocuring can be carried out by irradiating 100 to 300 mJ / cm < 2 > of UV in consideration of illuminance and irradiation time of high-pressure mercury.
The substrate used in the production of the electrode may be selected from those generally used in the art to which the present invention belongs. For example, the substrate may be a plastic substrate, a glass substrate, a quartz substrate, a silicon substrate, or a metal substrate, but preferably a silicon wafer is used. The plastic substrate may be made of polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), polyethersulfone, polypropylene (PP), polyimide (PI), aromatic polyester and triacetylcellulose And the like.
On the other hand, the present invention provides an electrode for a solar cell comprising a metal pattern having a line width of 60 탆 or less and a thickness of 10 to 30 탆 produced by the above method.
The present invention also provides a silicon solar cell including a solar cell electrode using the polymer resin film provided with the roll-to-roll method and the adhesive film as a front electrode. Herein, except for the method of manufacturing the electrode, a method of manufacturing a silicon solar cell can be manufactured by a method well known to those skilled in the art, so that a detailed description of each step will be omitted.
For example, the silicon solar cell may include a silicon semiconductor substrate, an emitter layer formed on the substrate, an antireflection film formed on the emitter layer, and an upper surface of the emitter layer through the antireflection film, And a rear electrode connected to the back surface of the silicon semiconductor substrate. The anti-reflection film may be made of silicon nitride or the like, and the rear electrode may be formed of silver and aluminum.
The present invention relates to a method for manufacturing Ag electrodes by forming a base film for Ag electrode formation using a roll-to-roll method using an adhesive film when patterning electrodes constituting front electrodes of a silicon solar cell, In comparison with the pattern forming method, it is possible to transfer the line width to 60 micrometers or less in the mass production process, and to produce an electrode pattern having a fine line width. Further, unlike the conventional simple direct roll-to-plate substrate direct printing method, the present invention applies a roll-to-roll method using a windable release film or the like, thereby securing the advantage of mass productivity of the film, It is possible to prevent the substrate from being damaged by the breakage.
FIG. 1 schematically shows a manufacturing process of an electrode of a solar cell according to a preferred embodiment of the present invention.
2 is a cross-sectional view of a polymer resin film provided with an adhesive film used in the process of manufacturing an electrode of a solar cell of the present invention.
3 is a cross-sectional view of a transfer film for electrodes manufactured in the process of manufacturing an electrode of a solar cell of the present invention.
FIG. 4 is a graph comparing the aspect ratio (thickness / line width) of the Ag electrode manufactured according to the embodiment of the present invention and the comparative example by measuring the thickness and line width thereof.
FIG. 5 is a graph comparing electric conversion efficiencies of solar cells when Ag electrodes are formed according to an embodiment of the present invention and a comparative example.
Best Mode for Carrying Out the Invention Hereinafter, the function and effect of the present invention will be described in more detail through a specific embodiment of the present invention. It is to be understood, however, that these embodiments are merely illustrative of the invention and are not intended to limit the scope of the invention.
[Example 1]
Manufacture of electrode for solar cell by roll-to-roll method and transfer film
As shown in FIG. 1, the release film is passed through a roll by using a roll-to-roll apparatus in which an Ag-containing paste is fed, and the paste is applied onto the release film through a blanket of a coating roll supplied with the Ag- To form an Ag pattern.
That is, the blanket was formed so as to have a pattern groove with a line width of 50 μm and a groove depth of 28 μm by a conventional photomask method, and was attached to the surface of the printing coating roll. The Ag-containing paste was prepared by mixing 2 parts by weight of glass frit (Bi 2 O 3 -B 2 O 3 -SiO 2 series) with 40 parts by weight of silver particles having an average particle size of 1 μm and 60 parts by weight of silver particles having an average particle size of 3 μm , 1 part by weight of ethyl cellulose, and 1 part by weight and 9 parts by weight of terpineol and butyl carbitol, respectively (organic viscosity: 200,000 cps). The Ag-containing paste was also injected into the blanket pattern grooves through an injection nozzle located at the top of the printing coating roll, and doctoring the paste remaining on the surface through a doctor blade at the side of the roll. A transfer roll rotating in a direction opposite to a rotation direction of the coating roll is positioned at a predetermined interval below the rotating printing coating roll and a release film is positioned at a predetermined interval between the coating roll and the transfer roll, The paste in the pattern groove was transferred to a predetermined position on the surface of the release film to form an electrode pattern.
Thereafter, a transfer film having a PET film and a release paper formed on the upper and lower sides of the adhesive film was prepared, and the release paper on the lower side was removed from the electronic film. Then, the adhesive film surface was placed so as to face the Ag pattern surface of the release film on which the Ag pattern was formed After that, the two films were stuck together. Subsequently, the release film at the bottom of the lyophilic film was removed, and the Ag pattern surface of the transfer film was faced to the silicon substrate (thickness: 200 mu m). Thereafter, UV of 150 mJ / The Ag pattern was transferred to the silicon substrate without breakage.
As described above, the Ag pattern formed on the silicon substrate had a thickness of 13 mu m and a fine line width of 50 mu m, thereby forming a pattern having a high aspect ratio.
[Example 2]
An Ag pattern was formed on a silicon substrate in the same manner as in Example 1, except that the glass frit content was changed to 4 parts by weight. The Ag pattern formed on the silicon substrate in the above manner had a thickness of 15 mu m and a fine line width of 55 mu m, thereby forming a pattern having a high aspect ratio.
[Example 3]
Except that the content of the organic vehicle contained in the Ag paste was changed to " 2 parts by weight of ethyl cellulose, 2 parts by weight of terpineol and 10 parts by weight of butyl carbitol ", Ag Pattern. The Ag pattern formed on the silicon substrate in the above manner had a thickness of 14 mu m and a fine line width of 45 mu m, thereby forming a pattern having a high aspect ratio.
[Comparative Example 1]
Manufacture of electrode for solar cell by roll-to-plate method
In Example 1, an Ag pattern was directly formed on the silicon substrate while moving the silicon substrate in place of the release film on the roll-to-roll apparatus. Thereafter, the Ag pattern formed on the silicon substrate was subjected to heat treatment at a temperature of 830 캜 for 30 seconds.
The Ag pattern formed by the above method had a thickness of 10 mu m and a line width of 50 mu m, and the problem was that the linearity of the pattern was not uniform.
[Comparative Example 2]
Manufacture of electrode for solar cell by screen printing method
An Ag-containing paste was applied to a silicon substrate to a thickness of 40 mu m using an ordinary screen printing method to form an Ag pattern on the silicon substrate.
The Ag pattern formed by the above method has a thickness of 20 탆 and a line width of 70 탆, which makes it difficult to realize a fine line width and does not allow linearization and precise line width patterning, resulting in limitations on the aspect ratio and particularly in uniformity .
[Comparative Example 3]
Manufacture of electrode for solar cell by roll-to-plate method
The Ag-containing paste was supplied to a printing coating roll with a blanket having a pattern groove having a line width of 50 mu m and a groove depth of 25 mu m, and the paste remaining on the surface through a doctor blade at the side of the printing coating roll was fed to a doctor Lt; / RTI >
A silicon substrate for a solar cell is pressed and positioned under the rotating printing coating roll, and the paste in the doctored blanket pattern groove is transferred to a predetermined position on the surface of the substrate to form an electrode pattern.
The Ag pattern formed by the method described above has a thickness of 15 탆 and a line width of 60 탆, which makes it difficult to realize a fine line width and does not allow linearization and patterning of an accurate line width, so that the aspect ratio is limited and the uniformity is remarkably decreased . Furthermore, in the case of the above method, cracks were generated in the substrate by the pressure of the roll in transferring the paste to the substrate.
[Experimental Example]
The aspect ratios of the examples and comparative examples measured by the conventional method and the results of the light conversion efficiency of the solar cell are shown in Figs. That is, FIG. 4 is a graph comparing the aspect ratio (thickness / line width) of the Ag electrode manufactured according to the embodiment of the present invention and the comparative example, by measuring the thickness and the line width. 5 is a graph comparing the electrical conversion efficiencies of the solar cells when Ag electrodes are formed according to Examples and Comparative Examples of the present invention.
From the results shown in Figs. 4 and 5, it was confirmed that Examples 1 to 3 of the present invention exhibited fine line widths and superior light conversion conversion efficiency than Comparative Examples 1 to 3. In this case, Comparative Example 2 shows an aspect ratio similar to that of the present invention, whereas Comparative Example 2 shows a line width of 70 탆, which has a limitation on accurate line width patterning, and thus has a poor light conversion efficiency. In addition, although Comparative Example 3 also shows an aspect ratio similar to that of the present invention, this may cause the substrate to be broken by the pressure of the roll using the roll-to-plate method, and thus the pattern uniformity is poor and the light conversion efficiency is also poor.
10: roll-to-roll device
1: running roll 2: printing roll for coating
3: metal paste feeder 4: release film
5: Ag pattern 6: Doctor blade
20: Adhesive film 22: Polymeric resin film
24: release paper
Claims (20)
(b) preparing a transfer film on which the metal pattern is formed by using a polymeric resin film provided with an adhesive film; And
(c) transferring the metal pattern to the silicon substrate through photo-curing of the transfer film having the metal pattern formed thereon to produce an electrode;
/ RTI >
In the step of forming the metal pattern,
Wherein a coating roll having a blanket for forming a metal pattern having a pattern groove with a line width of 60 mu m or less and a groove depth of 20 to 28 mu m is used.
(a) printing a metal paste on a release film using a roll-to-roll method to form a metal pattern;
(b) attaching a polymeric resin film having an adhesive film on a metal pattern formed on the release film to manufacture a transfer film on which a metal pattern including a metal pattern, an adhesive film and a polymer resin is formed; And
(c) removing the release film from the transfer film having the metal pattern formed thereon, disposing a transfer film so that the surface on which the metal pattern is formed faces the silicon substrate, transferring the metal pattern onto the silicon substrate through photo- Producing;
Wherein the method comprises the steps of:
A printing coating roll supplied with a metal paste for forming a metal pattern on the release film by rotation,
A traveling roll which is located at a lower portion of the coating roll by a thickness at which the supplied release film is passed and which travels in a direction opposite to the rotation direction of the coating roll to transport the release film before and after the metal pattern formation in the rightward traveling direction, A method of manufacturing an electrode for a silicon solar cell, comprising:
Wherein the metal pattern has a line width of at least 30 占 퐉 to a maximum of 60 占 퐉.
Wherein the photocuring is carried out by irradiating UV light for 100 to 300 mJ / cm < 2 >.
A metal pattern formed on the release film using a coating roll for printing provided with a blanket having a pattern groove with a line width of 60 mu m or less and a groove depth of 20 to 28 mu m,
A photocurable adhesive film formed on the metal pattern and
The polymeric resin film formed on the photo-curable adhesive film
Wherein the electrode film is made of a metal.
Priority Applications (1)
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KR1020110000166A KR101657260B1 (en) | 2011-01-03 | 2011-01-03 | Preparation method of Front Electrode for Solar Cell and Front Electrode manufactured by the same |
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KR1020110000166A KR101657260B1 (en) | 2011-01-03 | 2011-01-03 | Preparation method of Front Electrode for Solar Cell and Front Electrode manufactured by the same |
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